Magnetic field adjustment mechanism, reaction chamber and plasma apparatus

Abstract

The embodiment of the present application provides a magnetic field adjusting mechanism, a reaction chamber and a plasma equipment. The magnetic field adjusting mechanism is applied to the reaction chamber of the plasma equipment, the reaction chamber is provided with a reaction cavity, the magnetic field adjusting mechanism comprises a magnetic component and a guide component, the magnetic component is used for generating a first magnetic field in the reaction cavity; the magnetic component is movably connected to the guide component, the magnetic component can move along the circumference of the guide component and can move along the axial direction or / and the radial direction of the guide component, so as to adjust the first magnetic field. In the embodiment of the present application, the magnetic component is movably connected to the guide component, the magnetic component can move in multiple directions on the guide component, so that the position and direction of the magnetic component can be flexibly adjusted, the flexibility of adjusting the distribution of the plasma in the reaction cavity by using the first magnetic field to adjust the magnetic field distribution in the reaction chamber is enhanced.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of semiconductor, in particular to a magnetic field adjusting mechanism, a reaction chamber and a plasma equipment. BACKGROUND

[0002] In a plasma equipment using a spiral coil to generate plasma, due to the influence of the geomagnetic field (or other magnetic field source), the relatively uniform region of the plasma does not completely coincide with the region required by the process, that is, the so-called plasma edge deviation problem. The method used in the prior art has little effect on the adjustment of the plasma edge deviation problem, low adjustment efficiency and poor application flexibility. SUMMARY

[0003] Embodiments of the present application provide a magnetic field adjusting mechanism, a reaction chamber and a plasma equipment. The magnetic field adjusting mechanism of the embodiments of the present application can flexibly adjust the magnetic field distribution of the magnetic field generating mechanism, and further adjust the distribution of the plasma in the reaction chamber, so as to realize the uniform distribution of the plasma in the required region, which is convenient to operate and has high adjustment efficiency.

[0004] In a first aspect, the embodiments of the present application provide a magnetic field adjusting mechanism. The magnetic field adjusting mechanism is applied to a reaction chamber of a plasma equipment, the reaction chamber is provided with a reaction chamber, and the magnetic field adjusting mechanism comprises: a magnetic component, the magnetic component is used to generate a first magnetic field in the reaction chamber; and a guide component, the magnetic component is movably connected to the guide component, and the magnetic component can move along the circumference of the guide component and can move along the axial direction or / and the radial direction of the guide component to adjust the first magnetic field.

[0005] In the embodiments of the present application, the magnetic component is movably connected to the guide component and can move in multiple directions on the guide component, so that the position and direction of the first magnetic field generated by the magnetic component can be flexibly adjusted, and the flexibility of applying the first magnetic field is enhanced.

[0006] In a possible implementation, the magnetic component can move along the circumference and the axial direction of the guide component, the guide component comprises a first guide piece and a second guide piece, the second guide piece is movably arranged on the first guide piece, the second guide piece can move on the first guide piece along the circumference, and the magnetic component is movably arranged on the second guide piece, and the magnetic component can move on the second guide piece along the axial direction.

[0007] Or, the magnetic component can move along the circumference and the radial direction of the guide component, the guide component comprises a first guide piece and a third guide piece, the third guide piece is movably arranged on the first guide piece, the third guide piece can move on the first guide piece along the circumference, and the magnetic component is movably arranged on the third guide piece, and the magnetic component can move on the third guide piece along the radial direction.

[0008] Since the guide assembly of the magnetic field adjustment mechanism includes a first guide member and a second guide member, or the guide assembly includes a first guide member and a third guide member, the second guide member or the third guide member can move circumferentially on the first guide member, and at the same time the magnetic assembly can move axially on the second guide member or move radially on the third guide member, the magnetic assembly can move flexibly in multiple directions, thereby enhancing the flexibility and accuracy of the magnetic field adjustment.

[0009] In one possible embodiment, the magnetic component can move circumferentially and axially along the guide component. The guide component includes a first guide member and a second guide member. The magnetic component is movably arranged on the first guide member. The magnetic component can move circumferentially on the first guide member. The magnetic component is movably arranged on the second guide member. The magnetic component can move axially on the second guide member.

[0010] Since the magnetic component can move in different directions on the first guide member and the second guide member respectively, the magnetic field adjustment mechanism has the ability to adjust in multiple directions and flexibly control the magnetic field, thereby achieving the technical effect of enhancing the magnetic field adjustment range, improving the adjustment accuracy and adapting to various application scenarios.

[0011] In one possible implementation, the magnetic assembly is capable of moving circumferentially, axially, and radially along the guide assembly, and the guide assembly includes a first guide member, a second guide member, and a third guide member;

[0012] The second guide is movably provided on the first guide, and the second guide can move circumferentially on the first guide; the third guide is movably provided on the second guide, and the third guide can move axially on the second guide; the magnetic assembly is movably provided on the third guide, and the magnetic assembly can move radially on the third guide;

[0013] Or, the third guide member is movably provided on the first guide member and the second guide member, the third guide member can move circumferentially on the first guide member, the third guide member can move axially on the second guide member, and the magnetic component is movably provided on the third guide member, the magnetic component can move radially on the third guide member.

[0014] By setting up a guide assembly including a first guide member, a second guide member and a third guide member, the magnetic assembly can not only move circumferentially and axially on the first guide member and the second guide member respectively, but also move radially on the third guide member. This arrangement enables the magnetic assembly to move in three-dimensional space, significantly enhancing the magnetic field adjustment range and magnetic field adjustment accuracy.

[0015] In a possible implementation manner, the third guide member is rotatably disposed on the first guide member or the second guide member, and the magnetic component can rotate around a preset direction following the third guide member.

[0016] By setting up a guide component including a first guide member, a second guide member and a third guide member, and the third guide member can be rotatably set on the first guide member or the second guide member, and the magnetic component is fixedly or movably set on the third guide member, such a setting enables the magnetic component to move not only in the circumferential, axial and radial directions, but also to rotate in the fourth direction, thereby enhancing the multi-dimensional adjustment ability and flexibility of the magnetic field adjustment mechanism, thereby achieving more precise magnetic field control, a wider adjustment range and adaptability to more complex magnetic field environments. Technical effects.

[0017] In a possible implementation, the magnetic field adjustment mechanism has a plurality of magnetic components, wherein the plurality of magnetic components are distributed in the circumferential direction, or / and the plurality of magnetic components are distributed in the axial direction, or / and the plurality of magnetic components are distributed in the radial direction.

[0018] In the embodiment of the present application, multiple magnetic components are distributed in different directions (circumferential, axial and / or radial), so that the magnetic field adjustment mechanism can adjust the magnetic field independently or simultaneously in different directions to meet various complex application scenarios.

[0019] In a possible implementation, the magnetic assembly is capable of moving along the circumferential, axial, and radial directions of the guide assembly, with the circumferential, axial, and radial directions being perpendicular to each other.

[0020] In the embodiment of the present application, the circumferential, axial and radial directions are perpendicular to each other, forming a three-dimensional rectangular coordinate system. The magnetic field adjustment mechanism can accurately adjust the magnetic field along any direction within this three-dimensional space. This setting makes the magnetic field control more three-dimensional and comprehensive, and improves the flexibility and efficiency of the magnetic field adjustment.

[0021] In one possible embodiment, the magnetic assembly includes a movable portion, the guide assembly includes a guide portion, and the movable portion is movably connected to the guide portion. By arranging the movable portion of the magnetic assembly and the guide portion of the guide assembly to be movably connected, the magnetic assembly can be flexibly moved under the guidance of the guide assembly, ensuring that the magnetic assembly maintains stable guidance during movement, reducing deviation and shaking, and improving the stability of the magnetic assembly's movement.

[0022] In one possible embodiment, the movable portion is a slider, and the guide portion is a guide rail. The slider slides within the guide rail, enabling the magnetic assembly to move relative to the guide assembly. Because the guide rail provides stable support for the magnetic assembly, the magnetic assembly can easily move on the guide assembly, reducing the impact of external interference on magnetic field regulation and improving the stability of magnetic field regulation.

[0023] In one possible embodiment, at least one locking member is provided between the magnetic component and the guide component. When the at least one locking member is in a first state, the at least one locking member fixes the magnetic component and the guide component. When the at least one locking member is in a second state, the magnetic component can move relative to the guide component.

[0024] In an embodiment of the present application, when the locking member is in the first state, the locking member can firmly fix the magnetic component and the guide component together, ensuring that the magnetic field adjustment mechanism remains stable when it does not need to move, helping to prevent the position of the magnetic component from changing due to external interference or vibration, thereby maintaining the stability of the magnetic field; when the locking member is in the second state, the magnetic component can move flexibly relative to the guide component, so the position of the magnetic component can be easily adjusted, thereby changing the distribution and intensity of the magnetic field in the reaction chamber, thereby improving the flexibility of the magnetic field adjustment mechanism.

[0025] In one possible embodiment, the guide assembly includes at least one locking position. When the magnetic assembly is in at least one locking position, the magnetic assembly is fixed to the guide assembly. When the magnetic assembly is not in at least one locking position, the magnetic assembly can move relative to the guide assembly.

[0026] In an embodiment of the present application, when the magnetic component is in a locking position on the guide component, the magnetic component is fixed to the guide component, so that when a stable magnetic field is required, the magnetic component can be firmly fixed in a specific position and will not move due to external interference or vibration, which helps to maintain the stability of the magnetic field; when the magnetic component is not in a locking position, the magnetic component can move relative to the guide component, so that the user or the driving device for driving the magnetic component to move can easily adjust the position of the magnetic component, thereby changing the distribution and intensity of the magnetic field. Since the locking position setting provides a clear moving path and positioning point, the magnetic field adjustment is more precise and controllable.

[0027] In a possible implementation, the magnetic assembly includes a mounting frame and at least one magnet, the mounting frame is connected to the guide assembly, and the at least one magnet is disposed in the mounting frame.

[0028] By setting up a mounting frame movably connected to the guide assembly and setting the magnet in the mounting frame, while achieving flexible installation and stable fixation of the magnetic assembly, the magnet can also move on the guide assembly with the mounting frame, which not only achieves flexible installation and stable fixation of the magnetic assembly, but also significantly enhances the flexibility and accuracy of magnetic field adjustment.

[0029] In one possible embodiment, at least one magnet is movably mounted within a mounting bracket, and the first magnetic field is adjusted by changing the position of the at least one magnet. The movability of the magnet within the mounting bracket allows the position of the magnetic assembly to be changed by changing the mounting bracket, increasing flexibility in adjusting the first magnetic field and facilitating precise control of magnetic field strength and distribution.

[0030] In one possible embodiment, the magnetic assembly further includes at least one filler. After the at least one magnet is mounted on the mounting bracket, the mounting bracket defines a receiving space, and the at least one filler fills the receiving space. Because the filler fills the gap between the magnet and the mounting bracket, it reduces shaking or instability of the magnetic field adjustment mechanism caused by the gap, thereby improving the overall stability of the magnetic field adjustment mechanism.

[0031] In one possible embodiment, at least one filler is movably disposed within the mounting frame, and the first magnetic field is adjusted by varying the relative position of at least one magnet and at least one filler. By movably disposing the filler within the mounting frame, the first magnetic field can be flexibly adjusted by adjusting the relative position of the filler and magnet, thereby achieving the technical effect of precisely controlling the magnetic field strength and distribution.

[0032] In a second aspect, an embodiment of the present application provides a reaction chamber. The reaction chamber includes a reaction chamber, a magnetic field generating mechanism, and a magnetic field regulating mechanism as in any of the aforementioned embodiments. The magnetic field generating mechanism is used to generate a second magnetic field in the reaction chamber, and the magnetic field regulating mechanism uses the first magnetic field to regulate the second magnetic field. By providing the reaction chamber with a magnetic field generating mechanism and a magnetic field regulating mechanism, the reaction chamber can not only generate a magnetic field through the magnetic field generating mechanism when needed, but also accurately adjust the magnetic field through the magnetic field regulating mechanism according to actual needs, thereby achieving flexible and precise control of the magnetic field in the reaction chamber, thereby improving the flexibility and practicality of the reaction chamber.

[0033] In one possible embodiment, the magnetic field regulating mechanism is located outside the magnetic field generating mechanism, with a cover provided between the magnetic field regulating mechanism and the magnetic field generating mechanism, to which the magnetic field regulating mechanism is fixedly mounted. By fixing the magnetic field regulating mechanism to the cover, the magnetic field regulating mechanism is prevented from moving or shaking due to external forces during operation, maintaining the stability and consistency of the magnetic field and enhancing the structural stability of the reaction chamber.

[0034] Thirdly, embodiments of the present application provide a plasma device. The plasma device includes the aforementioned reaction chamber. The reaction chamber includes a magnetic field generating mechanism and a magnetic field regulating mechanism, which enable precise control of the intensity and distribution of the magnetic field during processing, significantly enhancing the processing equipment's ability to control the magnetic field environment and thereby improving processing quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] The following is an introduction to the drawings used in the embodiments of this application.

[0036] Figure 1 This is a schematic structural diagram of a plasma device provided in an embodiment of the present application;

[0037] Figure 2This is a schematic diagram of plasma distribution in a reaction chamber in the prior art;

[0038] Figure 3 Schematic diagram of plasma distribution in a reaction chamber provided in an embodiment of the present application;

[0039] Figure 4 yes Figure 1 The schematic diagram of a portion of the reaction chamber in some embodiments is shown;

[0040] Figure 5 yes Figure 4 The schematic diagram of the cross-sectional structure of a portion of the reaction chamber shown is at AA;

[0041] Figure 6 yes Figure 4 The schematic diagram of the cross-sectional structure of a portion of the reaction chamber shown is at position BB;

[0042] Figure 7 yes Figure 4 Schematic diagram of the top view of the reaction chamber shown;

[0043] Figure 8 yes Figure 4 A schematic diagram of a portion of the structure of the magnetic assembly shown;

[0044] Figure 9 yes Figure 4 A schematic structural diagram of the second guide member shown;

[0045] Figure 10 yes Figure 4 A schematic structural diagram of the third guide member shown;

[0046] Figure 11 yes Figure 1 The partial structure of the reaction chamber shown is a schematic diagram of the partial structure in other embodiments;

[0047] Figure 12 yes Figure 1 The partial structure of the reaction chamber shown is a schematic diagram of the partial structure in other embodiments;

[0048] Figure 13 yes Figure 1 A partial structural schematic diagram of another structure of the reaction chamber shown;

[0049] Figure 14 yes Figure 1 A partial structural schematic diagram of another structure of the reaction chamber shown;

[0050] Figure 15 yes Figure 1 A partial structural schematic diagram of another structure of the reaction chamber shown;

[0051] Figure 16 yes Figure 1 A partial structural schematic diagram of another structure of the reaction chamber is shown.

[0052] Description of reference numerals:

[0053] 1- Plasma equipment;

[0054] 100-magnetic field generating mechanism;

[0055] 1000-reaction chamber, 1001-coil winding;

[0056] 200-reaction chamber;

[0057] 2001-air intake;

[0058] 300-hood;

[0059] 41-magnetic component, 42-guide component, 43-locking member;

[0060] 400 - magnetic field adjustment mechanism, 411 - mounting frame, 412 - magnet, 413 - filling member, 414 - movable portion, 421 - guide portion, 422 - first guide member, 423 - second guide member, 424 - third guide member, 425 - latch;

[0061] 4111 - Accommodation space, 4141 - Slider, 4211 - Guide rail, 4221 - First slide rail, 4231 - First connecting block, 4232 - Second slide rail, 4233 - First connecting rod, 4241 - Second connecting block, 4243 - Second connecting rod, 4251 - First latching position, 4252 - Second latching position, 4253 - Third latching position;

[0062] O1-the plasma uniform area required by the process in the prior art; O2-the plasma uniform area in actual production in the reaction chamber in the prior art; O3-the area where plasma is distributed in the reaction chamber in the prior art; O1'-the plasma uniform area required by the process in the present application; O2'-the plasma uniform distribution area in actual production in the reaction chamber provided in the present application; O3'-the area where plasma is distributed in the reaction chamber provided in the present application; X1-axial; X2-circumferential; X3-radial, F1-the direction of the geomagnetic field. DETAILED DESCRIPTION

[0063] The following embodiments of the present application are described below in conjunction with the drawings in the embodiments of the present application.

[0064] In the description of the embodiments of the present application, it should be noted that, unless otherwise clearly specified and limited, the terms "installation" and "connection" should be understood in a broad sense. For example, "connection" can be a detachable connection or a non-detachable connection; it can be a direct connection or an indirect connection through an intermediate medium. The directional terms mentioned in the embodiments of the present application, such as "up", "down", "left", "right", "inside", "outside", etc., are only references to the directions of the accompanying drawings. Therefore, the directional terms used are for better and clearer explanation and understanding of the embodiments of the present application, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the embodiments of the present application.

[0065] The terms "first," "second," "third," etc. are used for descriptive purposes only and should not be understood to imply or suggest relative importance or implicitly specify the number of technical features. Thus, a feature specified as "first," "second," or "third" may explicitly or implicitly include one or more of such features.

[0066] See also Figure 1 , Figure 1 1 is a schematic diagram of the structure of a plasma device 1 provided in an embodiment of the present application. The plasma device 1 may be an inductively coupled plasma generating device, etc. The plasma device 1 may include a reaction chamber 1000, and the reaction chamber 1000 may include a magnetic field generating mechanism 100 and a reaction chamber 200. The magnetic field generating mechanism 100 is used to generate a second magnetic field in the reaction chamber 200. In some embodiments, the magnetic field generating mechanism 100 may be a coil winding or a magnet, or other device capable of generating a magnetic field. The magnetic field generating mechanism 100 is a coil winding 1001 (as described in the subsequent Figure 5 Taking the embodiment shown in FIG. 1 as an example, the coil winding 1001 can be wound outside the reaction chamber 200 along the axial direction of the reaction chamber 200, or wound outside the reaction chamber 200 along the radial direction of the reaction chamber 200, or arranged on the upper side or the lower side of the reaction chamber 200. It is only necessary that the magnetic field generated by the coil winding passes through the reaction chamber 200 along the axial direction of the reaction chamber 200, and no limitation is made here.

[0067] For example, the reaction chamber 200 may be provided with a gas inlet 2001. When gas enters the reaction chamber 200 through the gas inlet 2001, the magnetic field generating mechanism 100 may be energized to generate a second magnetic field. This second magnetic field may couple to the interior of the reaction chamber 200 to generate gas discharge and ignite plasma. Part of the reaction chamber 200 may also extend into the magnetic field generating mechanism 100.

[0068] Exemplarily, the plasma device 1 may further include a cover 300 . The cover 300 and the reaction chamber 200 may be arranged along the axial direction of the reaction chamber 1000 , and the magnetic field generating mechanism 100 may be located inside the cover 300 .

[0069] The cover 300 may be a hollow structure for housing the magnetic field generating mechanism 100, thereby isolating the second magnetic field generated by the magnetic field generating mechanism 100 from the magnetic field radiation outside the cover 300. It can also, to a certain extent, isolate the second magnetic field generated by the magnetic field generating mechanism 100 from the influence of the Earth's magnetic field on the second magnetic field. For example, the cover 300 may be made of a magnetically conductive material, such as an alloy material such as Sendust or silicon steel. Alternatively, the cover 300 may be made of a metal material such as aluminum, and the outer surface of the cover 300 may be covered with a magnetically conductive material.

[0070] In the embodiment of the present application, the cover body 300 is described as a hollow cylinder. In other embodiments, the cover body 300 can also be a hollow elliptical cylinder, a hollow square cylinder, a hollow rhombus, or other shapes, which is not limited in the embodiment of the present application.

[0071] Figure 1 The positions, shapes and sizes of the cover 300, magnetic field generating mechanism 100, reaction chamber 200 and air inlet 2001 are only schematic representations and can be adjusted as needed. Figure 1 The schematic diagram is only a schematic diagram showing the structure of a plasma device 1 , and the embodiment of the present application does not limit the structure of the plasma device 1 .

[0072] Please refer to Figure 1 and Figure 2 , Figure 2 Schematic diagram of plasma distribution in a reaction chamber 200 in the prior art. Figure 2 O1 in the figure can represent the plasma uniform area required by the process in the existing technology. Figure 2 O2 in the figure can represent the plasma uniform area in the actual production in the reaction chamber 200 in the prior art. Figure 2 O3 in the figure may represent a region in the prior art where plasma is distributed in the reaction chamber 200. In some embodiments, when etching or deposition processes are performed on a wafer, the plasma uniform region required by the process may be the region on the wafer to be processed. Figure 2 The concentration of plasma in the area shown by O2 is relatively uniform. Figure 2 In the prior art, the plasma region O3 is distributed in the reaction chamber 200. Figure 2 The concentration of plasma in the region between the plasma uniform regions O2 in the reaction chamber 200 in the prior art is less than Figure 2The concentration of plasma in the area shown by the plasma uniform area O2 in actual production in the reaction chamber 200 in the prior art.

[0073] It is understandable that in the process of the magnetic field generating mechanism 100 being energized to generate plasma, due to the influence of the earth's magnetic field (or other magnetic field sources), the region O2 where the plasma is evenly distributed in the reaction chamber 200 in the prior art during actual production does not completely coincide with the plasma uniform region O1 required by the process in the prior art, that is, there is a plasma deviation problem, so that some places (such as the plasma uniform region O1 required by the process in the prior art) are not completely coincident with each other. Figure 2 When the plasma uniformity region O1 required by the prior art process overlaps with the plasma uniformity region O2 in the actual production in the reaction chamber 200 in the prior art, the plasma concentration is relatively high. When applied to etching the wafer, it can play an effective etching role. However, in some places (such as Figure 2 When the plasma concentration is relatively low in the area O3 where plasma is distributed in the reaction chamber 200 in the prior art, insufficient etching may occur when the wafer is etched, and the process manufacturing requirements cannot be met.

[0074] Please refer to Figures 1 to 3 , Figure 3 Schematic diagram of plasma distribution in a reaction chamber 200 provided in an embodiment of the present application. Figure 3 O1' in the figure can represent the plasma uniform area required by the process in this application. Figure 3 O2' may represent the plasma uniform area in the actual production in the reaction chamber 200 provided by the present application. Figure 3 O3' in the figure may represent a region where plasma is distributed in the reaction chamber 200 provided in the present application.

[0075] The reaction chamber 1000 may further include a magnetic field adjustment mechanism 400, which may be used to generate a first magnetic field, and then utilize the first magnetic field to adjust the distribution of the second magnetic field of the magnetic field generating mechanism 100, thereby adjusting the distribution of the plasma within the reaction chamber 200. By combining the magnetic field generating mechanism 100 and the magnetic field adjustment mechanism 400, the reaction chamber 1000 is not only capable of generating a second magnetic field via the magnetic field generating mechanism 100 when needed, but is also capable of precisely adjusting the second magnetic field via the magnetic field adjustment mechanism 400 according to actual needs. This allows for precise control of the intensity and distribution of the magnetic field within the reaction chamber 200 during processing, thereby increasing the flexibility and practicality of the reaction chamber 200, significantly enhancing the processing equipment's ability to control the magnetic field environment, and thereby improving processing quality. In addition, the magnetic field adjustment mechanism 400 can compensate for the influence of the earth's magnetic field (or other magnetic field sources) on the distribution position of the plasma, and adjust the distribution of the plasma in the reaction chamber 200, so that the plasma uniform area O2' in actual production in the reaction chamber 200 provided by the present application can overlap with the plasma uniform area O1' required by the process in the present application, so as to achieve the uniformity of the plasma concentration in the plasma uniform area O1' required by the process in the present application, and improve the accuracy and uniformity of the plasma when etching or otherwise processing other structural parts such as wafers. Figure 2 Where F1 is the direction of the geomagnetic field, which can schematically represent the direction of the geomagnetic field (or other magnetic field sources) in the embodiment of the present application. In other embodiments, the magnetic field direction of the geomagnetic field (or other magnetic field sources) can also be other directions, which is not limited in the embodiment of the present application.

[0076] Exemplarily, the magnetic field regulating mechanism 400 can be located outside the magnetic field generating mechanism 100, and the cover 300 is located between the magnetic field regulating mechanism 400 and the magnetic field generating mechanism 100. The magnetic field regulating mechanism 400 is fixedly arranged on the cover 300, which can prevent the magnetic field regulating mechanism 400 from moving or shaking due to external forces during operation, maintain the stability and consistency of the first magnetic field, and enhance the structural stability of the reaction chamber 1000. In addition, the cover 300 can achieve geomagnetic field shielding, shielding and filtering complex magnetic fields. In the embodiment of the present application, the magnetic field regulating mechanism 400 is provided to achieve fine adjustment to compensate for the influence of magnetic field sources such as the geomagnetic field on the plasma distribution in different application scenarios. In the embodiment of the present application, the geomagnetic field shielding and the adjustment of the magnetic field regulating mechanism 400 can be combined to achieve a better elimination and compensation effect on the geomagnetic field.

[0077] The cover 300 is an isolation structure located between the magnetic field regulating mechanism 400 and the magnetic field generating mechanism 100, effectively separating the magnetic field regulating mechanism 400 from the magnetic field generating mechanism 100. The cover 300 can be cylindrical, box-shaped, or other suitable shapes, and can be made of metal, plastic, ceramic, etc. The main function of the cover 300 is to isolate the magnetic field regulating mechanism 400 from the magnetic field generating mechanism 100, preventing direct physical contact and electromagnetic interference between them. At the same time, the cover 300 can also protect the magnetic field regulating mechanism 400 from adverse effects such as heat and radiation that may be generated by the magnetic field generating mechanism 100. The cover 300 can also serve as a support structure for the magnetic field regulating mechanism 400. The magnetic field regulating mechanism 400 can be fixed to the cover 300 by bolting, welding, snapping, or other fixing methods to ensure its stability and reliability during operation.

[0078] The magnetic field regulating mechanism 400 is arranged on the outside of the magnetic field generating mechanism 100, which means that the magnetic field regulating mechanism 400 does not directly contact the magnetic field generating mechanism 100, but is located outside it. Such a design helps to reduce the interference of the magnetic field regulating mechanism 400 on the working state of the magnetic field generating mechanism 100, and at the same time facilitates independent adjustment and control of the magnetic field.

[0079] Please refer to Figures 4 to 7 , Figure 4 yes Figure 1 The shown diagram is a partial structural diagram of the reaction chamber 1000 in some embodiments. Figure 5 yes Figure 4 The cross-sectional structure diagram of a part of the reaction chamber 1000 is shown at AA. Figure 6 yes Figure 4 The cross-sectional structural diagram of a portion of the reaction chamber 1000 is shown at point BB. Figure 7 yes Figure 4 FIG. 1 is a schematic diagram of the top view of the reaction chamber 1000 .

[0080] The magnetic field adjustment mechanism 400 may include a magnetic assembly 41 and a guide assembly 42. The magnetic assembly 41 is configured to generate a first magnetic field within the reaction chamber 200. The magnetic assembly 41 is movably connected to the guide assembly 42. The magnetic assembly 41 is movable along the circumferential direction X2 of the guide assembly 42, and along the axial direction X1 and / or radial direction X3 of the guide assembly 42 to adjust the first magnetic field. By arranging the magnetic assembly 41 movably connected to the guide assembly 42, the magnetic assembly 41 can move in multiple directions on the guide assembly 42. Therefore, the position and direction of the magnetic assembly 41 can be flexibly adjusted, thereby enhancing the flexibility of magnetic field application.

[0081] The magnetic assembly 41 is the core part of the magnetic field adjustment mechanism 400, and is used to generate a first magnetic field in the reaction chamber 200. The magnetic assembly 41 can be composed of one or more permanent magnets or electromagnets. The specific number and arrangement are determined according to the required magnetic field shape and strength. The shape and size of the magnetic assembly 41 also need to be determined according to the reaction chamber 200 (such as Figure 1 The structure and process requirements of the device are determined to ensure that a uniform and stable magnetic field can be generated.

[0082] The guide assembly 42 supports and guides the movement of the magnetic assembly 41. It is movably connected to the magnetic assembly 41, enabling the magnetic assembly 41 to move in the circumferential direction X2, the axial direction X1, and / or the radial direction X3 under the guidance of the guide assembly 42. Specifically, the guide assembly 42 may include circumferential guide rails, axial guide rails, and / or radial guide rails, as well as corresponding components such as sliding blocks or rollers. These guide rails and sliding components must have sufficient rigidity and wear resistance to ensure stable guiding performance during long-term use.

[0083] The circumferential direction X2, axial direction X1, and radial direction X3 of the guide assembly 42 are perpendicular to each other. That is, the axial direction X1 of the guide assembly 42 is perpendicular to the circumferential direction X2 of the guide assembly 42, the radial direction X3 of the guide assembly 42 is perpendicular to the axial direction X1, and the radial direction X3 of the guide assembly 42 is perpendicular to the circumferential direction X2 of the guide assembly 42. The perpendicularity of the radial direction X3 of the guide assembly 42 to the circumferential direction X2 of the guide assembly 42 can be understood as: when the radial direction X3 of the guide assembly 42 is perpendicular to the circumferential direction X2, it means that at any point of the guide assembly 42, the radial direction X3 forms an angle of 90 degrees with the tangent direction of the point. In addition, Figure 4 The direction of the radial direction X3 shown is only for illustration, and the direction of the radial direction X3 can change with the movement of the guide assembly 42 relative to the cover body 300, and the embodiment of the present application does not limit this. In the embodiment of the present application, the circumferential direction X2, axial direction X1 and radial direction X3 of the guide assembly 42 can constitute a three-dimensional rectangular coordinate system, so that the magnetic field adjustment mechanism 400 can accurately adjust the second magnetic field along any direction in this three-dimensional space. This arrangement makes the magnetic field control more three-dimensional and comprehensive, and improves the flexibility and efficiency of the magnetic field adjustment. Among them, when the magnetic field adjustment mechanism 400 is applied to the reaction chamber 1000 (such as Figure 1 , the circumferential direction of the reaction chamber 1000 is parallel to the circumferential direction X2 of the guide assembly 42, and the axial direction of the reaction chamber 1000 is parallel to the axial direction X1 of the guide assembly 42, that is, the magnetic field generating mechanism 100 can be arranged along the axial direction X1 of the guide assembly 42, and the cover body 300 and the reaction chamber 200 can be arranged along the axial direction X1 of the guide assembly 42.

[0084] When the magnetic field adjustment mechanism 400 is in operation, the magnetic assembly 41 can be moved in the circumferential direction X2, axial direction X1, or / and radial direction X3 along the guide assembly 42 through the action of an external drive mechanism (such as a motor, cylinder, etc.). This movement can change the position of the magnetic assembly 41 in the reaction chamber 200, thereby changing the distribution and intensity of the first magnetic field. For example, when it is necessary to adjust the circumferential distribution X2 of the first magnetic field, the drive mechanism can be used to move the magnetic assembly 41 along the circumferential guide rail; when it is necessary to adjust the axial distribution X2 or / and radial distribution X3 of the first magnetic field, the drive mechanism can be used to move the magnetic assembly 41 along the axial guide rail or / and radial guide rail.

[0085] Please refer to Figure 4 、 Figure 7 and Figure 8 , Figure 8 yes Figure 4 A partial structural diagram of the magnetic assembly 41 is shown. In some embodiments, the magnetic assembly 41 may include a mounting frame 411 and at least one magnet 412. The mounting frame 411 is connected to the guide assembly 42, and the at least one magnet 412 is disposed within the mounting frame 411. Because the mounting frame 411 is movably connected to the guide assembly 42 and the magnet 412 is connected to the mounting frame 411, while achieving flexible installation and stable fixation of the magnetic assembly 41, the magnet 412 can also move on the guide assembly 42 along with the mounting frame 411. This not only achieves flexible installation and stable fixation of the magnet 412, but also significantly enhances the flexibility and accuracy of magnetic field regulation.

[0086] Mounting frame 411 is used to support and secure magnet 412 and can be made of a strong yet lightweight material, such as aluminum alloy or stainless steel, to ensure stability and durability during use. Mounting frame 411 can be connected to guide assembly 42 via connectors, such as bolts, nuts, and pins, to ensure that magnetic assembly 41 is securely secured to guide assembly 42 when adjustment of the first magnetic field is not required, and can be moved along guide assembly 42 when adjustment of the first magnetic field is required.

[0087] The magnet 412 can be a permanent magnet or an electromagnetic component, which is not limited in the embodiment of the present application. The number of magnets 412 can be determined according to the required magnetic field shape and strength. Specifically, the number of magnets 412 can be one, two, three or more. By providing a mounting bracket 411, the multiple magnets 412 installed therein can move together, reducing the difficulty of moving the magnetic component 41 and making it easier for users to use. The magnetic field strength of the magnetic component 41 can be changed by changing the number of magnets 412. For example, increasing the number of magnets 412 can increase the magnetic field strength of the magnetic component 41; reducing the number of magnets 412 can weaken the magnetic field strength of the magnetic component 41. In the embodiment of the present application, the number of magnets 412 can be five. In other embodiments, the number of magnets 412 can also be one, two, three, four, six or more, which is not limited in the embodiment of the present application.

[0088] The arrangement of the magnets 412 can also be determined according to the desired magnetic field shape and strength. For example, within the mounting frame 411 , the magnets 412 can be evenly distributed within the mounting frame 411 to ensure that the generated magnetic field has a uniform distribution within the reaction chamber 200 .

[0089] When the magnetic field adjustment mechanism 400 is working, the magnetic assembly 41 is connected to the guide assembly 42 through the mounting bracket 411 and moves along the guide assembly 42 to change the position of the magnet 412 in the reaction chamber 200, thereby adjusting the distribution and intensity of the first magnetic field.

[0090] Exemplarily, at least one magnet 412 is movably disposed within mounting bracket 411, and the first magnetic field is adjusted by changing the position of at least one magnet 412. It will be appreciated that the movability of magnet 412 within mounting bracket 411 means that the first magnetic field can be flexibly adjusted by changing the position of magnet 412, thereby facilitating the technical effect of precisely controlling the intensity and distribution of the magnetic field.

[0091] In some embodiments, the first magnetic field can be adjusted by changing the position of the magnet 412 in the mounting bracket 411. Specifically, the position of the magnet 412 is adjusted manually or automatically by a sliding mechanism or an adjusting mechanism, thereby changing the direction, shape or intensity of the magnetic field. Exemplarily, the magnet 412 can be connected to the mounting bracket 411 by a slide rail, a slider or a similar sliding mechanism, so that the magnet 412 can slide along a predetermined path in the mounting bracket 411; an adjusting screw, an adjusting rod or other adjusting mechanism can also be provided to adjust the position of the magnet 412 manually or automatically; elastic elements such as springs and elastic sheets can also be used to support and position the magnet 412 while allowing the magnet 412 to move within a certain range.

[0092] In other embodiments, the first magnetic field can also be adjusted by adjusting the relative positions between the magnets 412. Specifically, if the magnetic assembly 41 includes multiple magnets 412, the magnetic field can be adjusted by adjusting the relative positions between the magnets 412. For example, if the magnetic assembly 41 includes three magnets 412, the three magnets 412 are spaced apart, and their spacing is 5 cm. The magnetic field distribution generated is M1. Now, two of the magnets 412 are brought close together so that the distance between them is 2 cm. The magnetic field at this time is M2, and M1 is not equal to M2.

[0093] In some examples, the mounting bracket 411 may be approximately in the shape of a hollow column, and the mounting bracket 411 may have an accommodating space 4111 , and the at least one magnet 412 may be located in the accommodating space 4111 .

[0094] In some other embodiments, the mounting frame may also include a mounting groove, and the magnet 412 can be embedded in the mounting groove. The groove wall of the mounting groove can not only accommodate the magnet 412 but also prevent the magnet 412 from moving during the movement of the mounting frame, thereby limiting the position of the magnet 412 in the mounting frame.

[0095] Exemplarily, the magnetic assembly 41 further includes at least one filler 413. After at least one magnet 412 is disposed on the mounting bracket 411, the at least one filler 413 can be filled in the receiving space 4111. It is understood that when the magnet 412 is located in a portion of the receiving space 4111, by disposing the filler 413, the filler 413 can fill the area in the receiving space 4111 where the magnet 412 is not disposed, thereby filling the gap between the magnet 412 and the mounting bracket 411. This prevents the magnet 412 from moving within the mounting bracket 411 during movement of the mounting bracket 411, thereby reducing the mechanism shaking or instability caused by the presence of the gap, thereby improving the overall stability of the magnetic field adjustment mechanism 400. It is understood that when the magnet 412 completely fills the receiving space 4111, the magnetic assembly 41 may not include the filler 413.

[0096] Filler 413 can be of any shape and size to accommodate different accommodation spaces 4111 within mounting frame 411. Common shapes of filler 413 include blocks, strips, and sheets. The material selection for filler 413 depends on its intended function and the operating environment of magnetic field adjustment mechanism 400. For example, non-magnetic materials (such as plastic, rubber, ceramic, etc.) can be selected to avoid interference with the magnetic field, or magnetic materials (such as soft magnetic materials, hard magnetic materials, etc.) can be selected to assist in adjusting the magnetic field.

[0097] The filler 413 can be fixed in the mounting frame 411 by bonding, mechanical fixing, etc., and will not loosen or fall off due to the operation of the magnetic field adjusting mechanism 400. Among them, the bonding is to bond the filler 413 on the inner wall of the mounting frame 411 by using an adhesive (such as glue, epoxy resin, etc.), and the mechanical fixing is to fix the filler 413 on the mounting frame 411 by mechanical connectors such as screws, bolts, buckles, etc.

[0098] The filler 413 plays multiple roles in the magnetic assembly 41. Specifically, the filler 413 can enhance the structural strength of the mounting frame 411 to prevent it from deforming under the action of a magnetic field or external force. The filler 413 can also enhance the structural strength of the mounting frame 411 to prevent it from deforming under the action of a magnetic field or external force. In addition, when using a magnetic material as the filler, the position and number of the filler 413 can be adjusted to fine-tune the magnetic field distribution.

[0099] For example, assuming that the mounting frame 411 of the magnetic field adjusting mechanism 400 is cylindrical, and the magnet 412 is a cylindrical permanent magnet arranged along the axial direction of the mounting frame 411. After the magnet 412 is installed, some annular or sector-shaped accommodation spaces 4111 will be formed inside the mounting frame 411. At this time, the filler 413 can be an annular or sector-shaped block matching the shape of the accommodation space 4111, which is installed in the mounting frame 411 by bonding or mechanical fixing. In this way, not only can the structural strength of the mounting frame 411 be enhanced, but also unnecessary interference with the magnetic field can be avoided.

[0100] For example, at least one filler 413 is movably arranged in the mounting frame 411, and the first magnetic field is adjusted by changing the relative position of at least one magnet 412 and at least one filler 413. The filler 413 is movably arranged in the mounting frame 411, so that by adjusting the relative position of the filler 413 and the magnet 412, the first magnetic field can be flexibly adjusted, thereby achieving the technical effect of accurately controlling the strength and distribution of the magnetic field.

[0101] The movable arrangement of the filler 413 in the mounting frame 411 can be achieved in various ways, including but not limited to sliding mechanism, rotating mechanism or elastic connection mechanism. These mechanisms allow the filler to move or adjust its position in the mounting frame 411 flexibly to adapt to different magnetic field adjustment needs. The position of the filler 413 can be adjusted manually or automatically. For example, adjustment screws, adjustment rods or other adjustment mechanisms can be designed so that users can accurately adjust the position of the filler 413 as needed.

[0102] By changing the relative positions of the magnets 412 and filler 413 within the mounting frame 411, the distribution and strength of the magnetic field can be altered. For example, assume that the magnetic field adjustment mechanism 400 includes a mounting frame 411, two magnets 412, and a filler 413. Each magnet 412 is fixedly mounted at a predetermined position on the mounting frame 411, while each filler 413 is movably positioned within the mounting frame 411 via a sliding mechanism. Users can adjust the position of the filler 413 by adjusting the screws to achieve different relative positions relative to the magnets 412. Initially, the filler 413 is located to one side of the mounting frame 411, away from the magnets 412. At this point, the first magnetic field generated by the magnets 412 is relatively weak or unevenly distributed. Subsequently, the user rotates the adjustment screw, pushing the filler 413 along the sliding mechanism toward the magnets 412. As the distance between the filler 413 and the magnets 412 decreases, the first magnetic field gradually strengthens and becomes more uniform. When the filling piece 413 reaches the predetermined position, the first magnetic field reaches the required intensity and distribution. At this time, the magnetic field adjustment mechanism 400 has completed the precise adjustment of the first magnetic field.

[0103] The magnetic component 41 can be provided with a movable part 414, and the guide component 42 can be provided with a guide part 421. The movable part 414 is movably connected to the guide part 421, so that the magnetic component 41 can move flexibly under the guidance of the guide component 42, which can ensure that the magnetic component 41 maintains stable guidance during the movement, reduces deviation and shaking, and improves the stability of the movement of the magnetic component 41.

[0104] The movable portion 414 is the portion of the magnetic assembly 41 that mates with the guide portion 421 of the guide assembly 42. The movable portion 414 is able to move smoothly within the guide portion 421. The movable portion 414 can be a protruding slider, roller, guide rail, or the like. Its specific shape and size are determined by the overall structure of the magnetic field adjustment mechanism 400. The movable portion 414 can be made of metal materials such as stainless steel, alloy steel, and copper alloy, as well as wear-resistant plastic materials such as polytetrafluoroethylene and nylon.

[0105] The guide portion 421 is the part of the guide assembly 42 that guides and supports the movable portion 414 of the magnetic assembly 41. Its shape and size must match the movable portion 414 to ensure smooth movement of the magnetic assembly 41 along the predetermined path. The guide portion 421 can be a groove, a guide rail, a slide, or other similar material. The guide portion 421 can be made of metal materials such as cast iron, steel, and aluminum alloy, as well as elastic materials such as polyurethane and rubber, to provide the necessary friction and shock absorption.

[0106] The movable connection between the movable portion 414 and the guide portion 421 can be achieved through various means, such as sliding connection, rolling connection, magnetic attraction, etc. To ensure a stable and reliable connection between the movable portion 414 and the guide portion 421, a locking mechanism, increased frictional resistance, or the use of elastic elements can be used to prevent the magnetic assembly 41 from shaking or falling off during movement, thereby ensuring the stability and safety of the magnetic field adjustment mechanism.

[0107] Exemplarily, the movable portion 414 may be a slider 4141 , and there may be two sliders 4141 . The two sliders 4141 may be disposed on opposite sides of the mounting bracket 411 , so that the mounting bracket 411 drives the magnet 412 to move relative to the guide assembly 42 via the sliders 4141 .

[0108] Exemplarily, the guide portion 421 can be a guide rail 4211, and the slider 4141 slides in the guide rail 4211 to achieve the movement of the magnetic component 41 relative to the guide component 42. The design of the guide rail 4211 provides stable support for the magnetic component 41, allowing the magnetic component 41 to move easily on the guide component 42, reducing the impact of external interference on the magnetic field regulation and improving the stability of the magnetic field regulation. The guide rail 4211 can be set in different components of the guide component 42 and extend along the circumferential direction X2, axial direction X1 or radial direction X3 of the guide component 42 to achieve the movement of the magnetic component 41 in the circumferential direction X2, axial direction X1 or radial direction X3 of the guide component 42, which is not limited in this embodiment of the present application.

[0109] Please refer again Figures 4 to 7 In some embodiments, the magnetic assembly 41 can move along the circumferential direction X2, axial direction X1, and radial direction X3 of the guide assembly 42. The guide assembly 42 can include a first guide member 422, a second guide member 423, and a third guide member 424. The second guide member 423 can be movably mounted on the first guide member 422 and can move on the first guide member 422 along the circumferential direction X2. The third guide member 424 can be movably mounted on the second guide member 423 and can move on the second guide member 423 along the axial direction X1. The magnetic assembly 41 can be movably mounted on the third guide member 424 and can move on the third guide member 424 along the radial direction X3. In this case, the guide rail 4211 is a portion of the third guide member 424. The extension direction of the guide rail 4211 can be parallel to the radial direction X3. The magnetic assembly 41 can be movably connected to the guide rail 4211 via a slider 4141, enabling movement of the magnetic assembly 41 along the radial direction X3. In an embodiment of the present application, the magnetic component 41 can not only move along the circumferential direction X2 and the axial direction X1 on the first guide member 422 and the second guide member 423 respectively, but also move along the radial direction X3 on the third guide member 424. This arrangement enables the magnetic component 41 to move in three-dimensional space, significantly enhancing the magnetic field adjustment range and magnetic field adjustment accuracy.

[0110] The first guide member 422 is used to support and guide the second guide member 423 to move circumferentially. The first guide member 422 can be annular, disc-shaped, or other shapes suitable for circumferential movement, and is provided with a guide rail, a slide groove, or a similar guide structure. Figure 4 and Figure 5 For example, the first guide member 422 may include a first slide rail 4221, and the first slide rail 4221 may extend along the circumferential direction X2 of the guide assembly 42. The first slide rail 4221 is the circumferential guide rail of the guide assembly 42. In some examples, the number of the first slide rails 4221 may be two, and the two first slide rails 4221 are spaced apart along the axial direction X1 of the guide assembly 42, and the two first slide rails 4221 are both fixedly connected to the cover body 300 to achieve the fixed setting of the magnetic field adjustment mechanism 400 on the cover body 300. In some other embodiments, the number of the first slide rails 4221 may also be one, three or more, and the first slide rails 4221 may also be movably set on the cover body 300, which is not limited in the embodiments of the present application.

[0111] The second guide member 423 is movably mounted on the first guide member 422 and is capable of smooth movement along the circumference of the first guide member 422. The second guide member 423 is also provided with a guide rail, a slide groove, or a guide structure to facilitate subsequent engagement with the third guide member 424. The second guide member 423 achieves movement in the circumferential direction X2 by engaging a movable portion (e.g., a slider, roller, etc.) on the second guide member 423 with the guide structure on the first guide member 422.

[0112] See also Figure 4 、 Figure 5 and Figure 9 , Figure 9 yes Figure 4 Schematic diagram of the structure of the second guide member 423 shown. The second guide member 423 is movably arranged between the two first slide rails 4221. By setting the second guide member 423 to be movably arranged on the first slide rail 4221, and the first slide rail 4221 extending along the circumferential direction X2 of the guide component 42, in the process of the second guide member 423 moving along the extension direction of the first slide rail 4221, that is, the circumferential direction X2 of the guide component 42, the second guide member 423 can drive the third guide member 424 connected thereto and the magnetic component 41 to move along the circumferential direction X2, so as to change the compensation direction of the magnet 412 for magnetic field sources such as the geomagnetic field, realize compensation for magnetic field sources such as the geomagnetic field at different angles, expand the application scenarios of the magnetic component 41, and improve the flexibility of the compensation process of the magnetic component 41.

[0113] Exemplarily, the second guide member 423 can include a first connecting block 4231, which can be slidingly connected to the first sliding rail 4221 to achieve that the second guide member 423 is movably arranged on the first guide member 422. In some examples, the second guide member 423 can include at least two first connecting blocks 4231, which can be respectively located on opposite sides of the second guide member 423 in the axial direction X1 of the guide assembly 42, and connected to the two first sliding rails 4221 respectively.

[0114] Exemplarily, the second guide member 423 can be approximately in the shape of a frame, and can further include two second sliding rails 4232 and two first connecting rods 4233, the two first connecting rods 4233 being respectively connected to two ends of the second sliding rails 4232, and the first connecting block 4231 being connected to the first connecting rod 4233 and / or the second sliding rail 4232 on the side facing the corresponding first sliding rail 4221. By arranging the first connecting rod 4233, the synchronization and consistency of the two second sliding rails 4232 during the movement of the second guide member 423 along the circumferential direction X2 of the guide assembly 42 can be ensured. The second sliding rail 4232 can extend along the axial direction X1 of the guide assembly 42, and the two second sliding rails 4232 can be arranged at intervals along the circumferential direction X2 of the guide assembly 42. In other examples, the second guide member 423 can not include the first connecting rod 4233, or the number of the second sliding rails 4232 can be one, three or more, which are not limited in the examples of the present application.

[0115] The third guide member 424 is movably arranged on the second guide member 423, and is used to support and guide the movement of the magnetic assembly 41 in the radial direction X3. The third guide member 424 can be linear, arc-shaped or other shapes suitable for radial movement, and is provided with corresponding guide rails, sliding grooves or guide structures. The third guide member 424 is movably arranged on the second guide member 423 through the active part thereon and the guide structure on the second guide member 423, so that the third guide member 424 can move smoothly along the axial direction X1 of the second guide member 423. The magnetic assembly 41 is movably arranged on the third guide member 424 through the active part (such as a sliding block, a guide rail, etc.) thereon and the guide structure on the third guide member 424, so as to realize the movement in the radial direction X3. The movement of the magnetic assembly 41 can also be realized by manual adjustment, motor driving or other ways.

[0116] For reference Figure 4 , Figure 9 and Figure 10 , Figure 10 is Figure 4A structural schematic view of the third guide 424 is shown. Exemplarily, the third guide 424 can include a second connecting block 4241, which can be slidingly connected to the second sliding rail 4232 to enable the third guide 424 to drive the magnetic assembly 41 connected thereto to move on the second guide 423 in the axial direction X1 of the guide assembly 42. In some examples, the third guide 424 can include at least two second connecting blocks 4241, which can be respectively located on opposite sides of the third guide 424 in the circumferential direction X2 of the guide assembly 42.

[0117] In the embodiments of the present application, when the third guide 424 moves on the second guide 423, the third guide 424 can drive the magnetic assembly 41 connected thereto to move in the axial direction X1 from the first position to the second position.

[0118] The first position and the second position are two different positions, and the first position can be closer to or farther away from the reaction chamber 200 than the second position (as shown in FIG. 4). Figure 1 It can be understood that the magnetic assembly 41 can also move from the second position to the first position. The magnetic assembly 41 can be used to generate a magnetic field, to adjust the magnetic field distribution of the magnetic field generating mechanism 100, and to further adjust the plasma distribution in the reaction chamber 200. The closer the magnetic assembly 41 is to the reaction chamber 200, the greater the degree of influence of the magnetic assembly 41 on the plasma distribution in the reaction chamber 200.

[0119] By setting the movement of the magnetic assembly 41 between the first position and the second position, the embodiments of the present application can adjust the degree of influence of the magnetic assembly 41 on the plasma distribution in the reaction chamber 200, compensate for the influence of the magnetic field source such as the geomagnetic field in different application scenarios on the plasma distribution, and have high flexibility and convenience for adjustment. The coil winding 1001 in the embodiments of the present application (as shown in FIG. 1) can be used to generate a magnetic field, to adjust the magnetic field distribution of the magnetic field generating mechanism 100, and to further adjust the plasma distribution in the reaction chamber 200. Figure 6The coil windings 1001 are stacked along the axial direction X1, and the coil windings 1001 closer to the reaction chamber 200 have a greater impact on the plasma distribution within the reaction chamber 200 than the coil windings 1001 farther away from the reaction chamber 200. By moving the magnetic assembly 41 between the first and second positions, the magnetic assembly 41 can correspond to different coil windings 1001 according to different needs, thereby affecting the plasma distribution within the reaction chamber 200. For example, in some scenarios, when the intensity of the geomagnetic field or other magnetic field source is relatively small, the magnetic component 41 can be moved away from the reaction chamber 200, and the magnetic component 41 corresponds to the coil winding 1001 away from the reaction chamber 200, so as to weaken the influence of the magnetic component 41 on the reaction chamber 200 and compensate for the influence of the geomagnetic field on the plasma distribution. For another example, in some scenarios, when the intensity of the geomagnetic field or other magnetic field source is relatively large, the magnetic component can be moved toward the reaction chamber 200, and the magnetic component corresponds to the coil winding 1001 close to the reaction chamber 200, so as to enhance the influence of the magnetic component on the reaction chamber 200 and compensate for the influence of the geomagnetic field on the plasma distribution.

[0120] Please refer to Figure 1 、 Figure 5 and Figure 6 In some embodiments, the magnetic assembly 41 can be positioned corresponding to the coil winding 1001 of the magnetic field generating mechanism 100 near the reaction chamber 200. In this case, the magnetic assembly 41 is closer to the reaction chamber 200. Compared to the coil winding 1001 farther from the reaction chamber 200, the coil winding 1001 near the reaction chamber 200 has a greater impact on the plasma distribution within the reaction chamber 200. By positioning the magnetic component corresponding to the coil winding 1001 near the reaction chamber 200, the magnetic field generated by the magnetic assembly 41 can be fully utilized, achieving optimal compensation and improving the energy coupling efficiency within the reaction chamber 1000. It is understood that even when the magnetic assembly 41 is positioned corresponding to the coil winding 1001 of the magnetic field generating mechanism 100 near the reaction chamber 200, the magnetic assembly 41 can still slide along the axial direction X1.

[0121] Please refer again Figure 4 、 Figure 5 and Figure 10, exemplarily, the third guide member 424 may also be approximately frame-shaped, and the third guide member 424 may also include two third slide rails and two second connecting rods 4243, the two second connecting rods 4243 are respectively connected to the two ends of the third slide rail, and the second connecting block 4241 can be connected to the second connecting rod 4243 and / or the side of the third slide rail facing the corresponding second slide rail 4232. By setting the second connecting rod 4243, the synchronization and consistency of the two third slide rails during the movement of the third guide member 424 along the axial direction X1 of the guide assembly 42 can be ensured. The third slide rail extends along the radial direction X3 of the guide assembly 42, and the two third slide rails are arranged at intervals along the circumferential direction X2 of the guide assembly 42. In some other embodiments, the number of third slide rails may be one, three or more, which is not limited in the embodiment of the present application.

[0122] The mounting frame 411 is positioned between the two third rails, and the two sliders 4141 at either end of the mounting frame 411 can be slidably connected to the two third rails, respectively, to enable the magnetic assembly 41 to move along the radial direction X3 on the guide assembly 42. In other words, in the embodiment of the present application, the third rail is the guide rail 4211, which can also be referred to as a radial guide rail. The movable connection between the slider 4141 and the third rail enables the magnetic assembly 41 to flexibly move along the radial direction X3 under the guidance of the third guide member 424, moving closer to or further away from the magnetic field generating mechanism 100. This can change the magnetic assembly 41's compensation for the influence of magnetic field sources such as the Earth's magnetic field, thereby facilitating the expansion of the compensation range of the magnetic assembly 41.

[0123] For example, it is assumed that the magnetic field adjustment mechanism 400 is used to accurately adjust the strength and direction of the magnetic field at a position or area in three-dimensional space. The magnetic component 41 includes a magnet 412 with adjustable strength. The magnet 412 is arranged on the third guide 424 and can move in the radial direction X3 to change the effective distance of the magnetic field. The third guide 424 is arranged on the second guide 423 and can move in the axial direction X1 to change one dimension of the effective direction of the magnetic field. The second guide 423 is arranged on the first guide 422 and can move in the circumferential direction X2 to change another direction dimension of the magnetic field. Therefore, by designing a precise drive mechanism and control system, the user can accurately control the movement of the magnetic component 41 in three-dimensional space, thereby achieving the desired magnetic field adjustment effect.

[0124] Please refer to Figure 4 and Figure 6 , Figure 6The dotted box in the middle represents the possible position of the third guide member 424. Exemplarily, the third guide member 424 can also be rotatably set on the second guide member 423, and the magnetic component 41 can follow the third guide member 424 to rotate around a preset direction. Since the guide component 42 includes the third guide member 424, and the third guide member 424 can be rotatably set on the second guide member 423, and the magnetic component 41 is movably set on the third guide member 424, such a setting enables the magnetic component 41 to move not only in the circumferential direction X2, the axial direction X1 and the radial direction X3, but also in the fourth direction (a direction other than the circumferential direction X2, the axial direction X1 and the radial direction X3), thereby enhancing the multi-dimensional adjustment capability and flexibility of the magnetic field adjustment mechanism 400, thereby achieving more precise magnetic field control, a wider adjustment range and the technical effect of adapting to more complex magnetic field environments.

[0125] Please refer to Figure 4 and Figure 11 , Figure 11 yes Figure 1 The partial structure of the reaction chamber 1000 shown is a schematic diagram of the partial structure in other embodiments.

[0126] Exemplarily, at least one latch 43 is provided between the magnetic assembly 41 and the guide assembly 42. When the at least one latch 43 is in a first state, the at least one latch 43 secures the magnetic assembly 41 and the guide assembly 42. When the at least one latch 43 is in a second state, the magnetic assembly 41 is movable relative to the guide assembly 42. For example, the latch 43 may be located between the guide rail 4211 and the slider 4141. When the latch 43 is in the first state, it securely secures the magnetic assembly 41 and the guide rail 4211 together, ensuring that the magnetic field adjustment mechanism 400 remains stable when movement is not required. This helps prevent the position of the magnetic assembly 41 from changing due to external interference or vibration, thereby maintaining the stability of the magnetic field. When the latch 43 is in the second state, the magnetic assembly 41 is able to flexibly move relative to the guide rail 4211, thereby easily adjusting the position of the magnetic assembly 41, thereby changing the distribution and intensity of the magnetic field and improving the flexibility of the magnetic field adjustment mechanism 400. In some other embodiments, the locking member 43 can also be fixed to the internal structural member of the guide assembly 42 (for example, between the first guide member 422, the second guide member 423 and / or the third guide member 424 described later), and can be set as needed, which will not be repeated in the embodiments of the present application.

[0127] It can be understood that when the locking member 43 is in the first state, the locking member 43 fixes the magnetic component 41 and the guide component 42, which means that the position of the magnetic component 41 in the extension direction of the guide rail 4211 does not change, and the magnetic component 41 can move relative to the guide component 42 in other directions by other means (for example, when the third slide rail is the guide rail 4211, when the guide rail 4211 extends along the radial direction X3, the magnetic component 41 can move in the circumferential direction X2 and / or axial direction X1); when the locking member 43 is in the second state, the magnetic component 41 can slide along the guide rail 4211, which means that the magnetic component 41 slides relative to the guide component 42 in the extension direction of the guide rail 4211.

[0128] In some examples, the locking member 43 can be a nut, for example, a hexagonal nut. When the locking member 43 is in the first state, it can be understood that the nut between the guide rail 4211 and the slider 4141 is tightened, and the magnetic assembly 41 is fixed on the guide rail 4211. When the locking member 43 is in the second state, it can be understood that the nut is loosened, so that the magnetic assembly 41 can slide on the guide rail 4211, which is conducive to achieving the movement of the magnetic assembly 41 while allowing the magnetic assembly 41 to stay at the desired position for the reaction chamber 200 (such as Figure 1 By providing the latch 43, the magnetic assembly 41 can be easily and quickly switched between being fixed or sliding relative to the guide assembly 42 in the direction in which the guide rail 4211 extends, thereby simplifying the process of fixing and moving the magnetic assembly 41 in the direction in which the guide rail 4211 extends.

[0129] Please refer to Figure 11 and Figure 12 , Figure 12 yes Figure 1 The partial structure of the reaction chamber 1000 shown is a schematic diagram of the partial structure in other embodiments.

[0130] Illustratively, the guide assembly 42 includes at least one latching position 425. When the magnetic assembly 41 is in the at least one latching position 425, the magnetic assembly 41 is fixed to the guide assembly 42. When the magnetic assembly 41 is not in the at least one latching position 425, the magnetic assembly 41 can move relative to the guide assembly 42. When the magnetic assembly 41 is in the latching position 425 on the guide assembly 42, the magnetic assembly 41 is fixed to the guide assembly 42. This arrangement ensures that when a stable magnetic field is required, the magnetic assembly 41 can be firmly fixed in a specific position and will not move due to external interference or vibration, thereby helping to maintain the stability of the magnetic field.

[0131] When the magnetic assembly 41 is not in the detent 425, the magnetic assembly 41 can be moved relative to the guide assembly 42, wherein the magnetic assembly 41 can be pushed by a user manually or by other devices such as a driving device or other equipment in a mechanized manner, which makes it easy for the user or the driving device to adjust the position of the magnetic assembly 41, so as to change the distribution and strength of the magnetic field. Since the detent 425 provides a clear movement path and positioning point, the adjustment of the magnetic field is more accurate and controllable.

[0132] Wherein, the magnetic assembly 41 is in the detent 425, which can be that the slider 4141 of the magnetic assembly 41 is in the detent 425, or other structures connected with the magnetic assembly 41 are in the detent 425. For example, in the embodiment of the present application, the plurality of detents 425 can include a first detent 4251, a second detent 4252 and / or a third detent 4253, the first detent 4251 can be formed on the first guide 422, and a plurality of first detents 4251 can be arranged along the extension direction (i.e. the circumferential direction X2) of the first sliding rail 422. When the second guide 423 is in the first detent 4251 on the first guide 422, the third guide 424 and the magnetic assembly 41 connected to the second guide 423 are considered to be in the first detent 4251. On the circumferential direction X2 of the guide assembly 42, the magnetic assembly 41 is fixedly arranged on the guide assembly 42, and the magnetic assembly 41 can be moved relative to the guide assembly 42 in the axial direction X1 and / or the radial direction X3 by other means; for another example, the second detent 4252 can be formed on the second guide 423, and a plurality of second detents 4252 can be arranged along the extension direction (i.e. the axial direction X1) of the second sliding rail 423. When the third guide 424 is in the second detent 4252 on the second guide 423, the magnetic assembly 41 connected to the third guide 424 is considered to be in the second detent 4252. On the axial direction X1 of the guide assembly 42, the magnetic assembly 41 is fixedly arranged on the guide assembly 42, and the magnetic assembly 41 can be moved relative to the guide assembly 42 in the circumferential direction X2 and / or the radial direction X3 by other means; for another example, as shown in the figure, the third detent 4253 can be formed on the third guide 424, and a plurality of third detents 4253 can be arranged along the extension direction of the third sliding rail. When the slider 4141 of the magnetic assembly 41 is in the third detent 4253, the magnetic assembly 41 is fixedly arranged on the guide assembly 42 in the radial direction X3, and the magnetic assembly 41 can be moved relative to the guide assembly 42 in the circumferential direction X2 and / or the axial direction X1 by other means. Figure 11

[0133] ​For example, the latching position 425 can be a groove. When the magnetic component 41 is located in the groove, the positions of the magnetic component 41 and the guide component 42 in the arrangement direction of the multiple latching positions 425 are relatively fixed. When the magnetic component 41 is located between two grooves, the magnetic component 41 slides relative to the guide component 42. By setting multiple latching positions 425, multi-gear quantitative adjustment of the magnetic component 41 in the arrangement direction of the latching positions 425 can be achieved. Different gear positions can be selected to place the magnetic component 41 according to needs, which reduces the difficulty of installing the magnetic component 41 and is highly practical. Figure 11 In the embodiment, the number of the third locking positions 4253 can be five. When the slider 4141 of the magnetic assembly 41 is located in the groove, the positions of the magnetic assembly 41 and the guide rail 4211 in the radial direction X3 are relatively fixed. When the slider 4141 is located between the two grooves, the magnetic assembly 41 slides relative to the guide rail 4211. In other embodiments, the number of the locking positions 425 can be two, three, four, six, or more, which is not limited in this embodiment of the present application.

[0134] Please refer again Figure 11 and Figure 12 For example, the magnetic field adjustment mechanism 400 may include multiple magnetic assemblies 41 , which may be distributed in the circumferential direction X2 , or / and in the axial direction X1 , or / and in the radial direction X3 . The multiple magnetic assemblies 41 are distributed in different directions (circumferential direction X2 , axial direction X1 , and / or radial direction X3 ), allowing the magnetic field adjustment mechanism 400 to independently or simultaneously adjust the magnetic field in different directions to meet various complex application scenarios.

[0135] The plurality of magnetic assemblies 41 may be distributed in the radial direction X3. It is understood that in the embodiment of the present application, the plurality of magnetic assemblies 41 may be mounted on the same third guide member 424, and the plurality of magnetic assemblies 41 may be arranged along the radial direction X3. Alternatively, the plurality of magnetic assemblies 41 may be mounted on different third guide members 424, which is not limited in the embodiment of the present application.

[0136] By arranging multiple magnetic components 41 along the radial direction X3, the distances between the multiple magnetic components 41 and the magnetic field generating mechanism 100 are different, and the multiple magnetic components 41 can be adjusted independently. The positions of the multiple magnetic components 41 on the radial direction X3 and the magnetic field strength of each magnetic component 41 can be adjusted as needed. It has high flexibility and a wide adjustable range, and can effectively compensate for the influence of magnetic field sources such as the geomagnetic field on the plasma distribution in different application scenarios.

[0137] See also Figure 12, multiple magnetic assemblies 41 are distributed in the axial direction X1, that is, the number of third guide members 424 can be multiple, and the multiple third guide members 424 can be distributed in the axial direction X1. It is understandable that in the embodiment of the present application, the multiple third guide members 424 can all be installed on the same second guide member 423, and the multiple third guide members 424 and the multiple magnetic assemblies 41 are arranged along the axial direction X1. Alternatively, the multiple magnetic assemblies 41 can also be installed on different second guide members 423, and the embodiment of the present application is not limited to this.

[0138] By arranging multiple magnetic components 41 along the axial direction X1, the positions and distances of the multiple magnetic components 41 on the axial direction X1 are different, and the multiple magnetic components 41 can be adjusted independently. The positions of the multiple magnetic components 41 on the axial direction X1 and the distance of each magnetic component 41 to the reaction chamber 200 (such as Figure 1 It can compensate for the influence of magnetic field sources such as the geomagnetic field on the plasma distribution in different application scenarios, with high flexibility and easy adjustment.

[0139] Multiple magnetic assemblies 41 are distributed along the circumferential direction X2. That is, the number of second guide members 423 can also be multiple, and multiple second guide members 423 can be distributed along the circumferential direction X2. By arranging multiple magnetic assemblies 41 along the circumferential direction X2, the multiple magnetic assemblies 41 can be adjusted independently. The position of the multiple magnetic assemblies 41 along the circumferential direction X2 and the magnetic field strength of each magnetic assembly 41 can be adjusted as needed. This provides high flexibility and a wide range of adjustability, and can effectively compensate for the impact of magnetic field sources such as the Earth's magnetic field on plasma distribution in different application scenarios.

[0140] See also Figure 4 For the implementation shown, see Figure 13 , Figure 13 yes Figure 1 FIG. 1 is a partial structural diagram of another structure of the reaction chamber 1000. Figure 13 The magnetic field adjustment mechanism 400 shown is Figure 4 The difference of the magnetic field adjustment mechanism 400 shown is that Figure 13 The guide assembly 42 in the illustrated magnetic field adjustment mechanism 400 may also not include the third guide member 424 .

[0141] like Figure 13As shown, the magnetic assembly 41 can move along the circumferential direction X2 and the axial direction X1 of the guide assembly 42. The guide assembly 42 may include a first guide member 422 and a second guide member 423. The second guide member 423 is movably disposed on the first guide member 422 and can move on the first guide member 422 along the circumferential direction X2. The magnetic assembly 41 is movably disposed on the second guide member 423 and can move on the second guide member 423 along the axial direction X1. Since the guide assembly 42 of the magnetic field adjustment mechanism 400 includes the first guide member 422 and the second guide member 423, the second guide member 423 can move on the first guide member 422 along the circumferential direction X2, thereby driving the magnetic assembly 41 connected thereto to move relative to the guide assembly 42 along the circumferential direction X2. This allows the magnetic assembly 41 to move flexibly in multiple directions, thereby enhancing the flexibility and accuracy of magnetic field adjustment.

[0142] In an embodiment of the present application, the magnetic field adjustment mechanism 400 is mainly composed of a magnetic component 41, a first guide member 422 and a second guide member 423, wherein the second guide member 423 is movably arranged on the first guide member 422 and can move along the circumferential direction X2, and the magnetic component 41 is movably arranged on the second guide member 423 and can move along the axial direction X1.

[0143] Specifically, the second guide member 423 is movably arranged on the first guide member 422, and cooperates with the circumferential guide rail or slide groove on the first guide member 422 through the movable part thereon (such as a slider, roller or guide rail, etc.) to achieve circumferential movement X2. The second guide member 423 can be moved along the circumferential direction X2 on the first guide member 422 by manual adjustment, motor drive or other suitable driving methods. In order to ensure the smoothness and accuracy of the movement, an appropriate lubrication device or friction-reducing material can be provided between the first guide member 422 and the second guide member 423. Exemplarily, the second slide rail of the second guide member 423 can be a guide rail 4211, and the slider 4141 is slidably connected to the second slide rail of the second guide member 423. The slider 4141 slides in the second guide member 423 to achieve axial movement X1 of the magnetic component 41 relative to the guide component 42.

[0144] The magnetic assembly 41 achieves axial movement by engaging an active portion (such as a slider, guide rail, or roller) thereof with an axial guide rail or slot on the second guide member 423. To enhance the stability and accuracy of movement, a locking mechanism or positioning device may be provided between the magnetic assembly 41 and the second guide member 423.

[0145] For example, assume that the magnetic field adjustment mechanism 400 is used to adjust the magnetic field within a cylindrical region. The magnetic assembly 41 includes a permanent magnet, which is mounted on a second guide member 423 and can be moved axially in the direction X1 to change the range or intensity of the magnetic field. The second guide member 423 can be moved along the circumferential direction X2 of the first guide member 422 to change the distribution of the magnetic field.

[0146] Combine Figure 4 For the implementation shown, see Figure 14 , Figure 14 yes Figure 1 FIG. 1 is a partial structural diagram of another structure of the reaction chamber 1000. Figure 14 The magnetic field adjustment mechanism 400 shown is Figure 4 The difference of the magnetic field adjustment mechanism 400 shown is that Figure 14 The guide assembly 42 in the magnetic field adjustment mechanism 400 shown may also not include the second guide member 423 .

[0147] like Figure 14 As shown, the magnetic assembly 41 is capable of moving along the circumferential direction X2 and radial direction X3 of the guide assembly 42. The guide assembly 42 includes a first guide member 422 and a third guide member 424. The third guide member 424 is movably disposed on the first guide member 422 and is capable of moving on the first guide member 422 along the circumferential direction X2. The magnetic assembly 41 is movably disposed on the third guide member 424 and is capable of moving on the third guide member 424 along the radial direction X3. Since the guide assembly 42 of the magnetic field adjustment mechanism 400 includes the first guide member 422 and the third guide member 424, the third guide member 424 is capable of moving on the first guide member 422 along the circumferential direction X2, thereby driving the magnetic assembly 41 connected thereto to move relative to the guide assembly 42 along the circumferential direction X2. This allows the magnetic assembly 41 to move flexibly in multiple directions, thereby enhancing the flexibility and accuracy of magnetic field adjustment.

[0148] Specifically, the first guide member 422 may have a circumferential guide rail or slide groove structure for guiding the third guide member 424 to move smoothly and stably along the circumferential direction. The first guide member 422 may be annular, disc-shaped, or other shapes suitable for circumferential movement.

[0149] The third guide member 424 is movably arranged on the first guide member 422, and cooperates with the circumferential guide rail or slide groove on the first guide member 422 through the movable part (such as a slider, roller or guide rail, etc.) thereon, thereby realizing circumferential movement. In addition to having a part that cooperates with the first guide member 422, the third guide member 424 is also provided with a radial guide rail or slide groove for supporting and guiding the radial movement of the magnetic component 41. The third guide member 424 can be moved along the circumferential direction X2 on the first guide member 422 by manual adjustment, motor drive (such as through a transmission device such as a gear, chain, belt) or other suitable driving methods. In order to ensure the smoothness and accuracy of the movement, a lubrication device or anti-friction material can be provided between the first guide member 422 and the third guide member 424.

[0150] The magnetic assembly 41 is movable along the radial direction X3 on the third guide member 424 to adjust the range or intensity of the magnetic field. The magnetic assembly 41 achieves radial movement by engaging a movable portion (such as a slider, guide rail, roller, or threaded connection) with a radial guide rail or slot on the third guide member 424. This radial movement can be controlled manually, by motor drive (e.g., via a transmission device such as a lead screw or slide rail), or by other drive methods. To enhance the stability and accuracy of movement, a locking mechanism or positioning device may be provided between the magnetic assembly 41 and the third guide member 424.

[0151] For example, assume that the magnetic field adjustment mechanism 400 is used to precisely adjust the strength and direction of a magnetic field at a location or region within a plane. The magnetic assembly 41 includes an adjustable-strength magnet 412 , which is mounted on a third guide member 424 and can be moved in a radial direction X3 to change the effective range of the magnetic field. The third guide member 424 can be moved along the circumferential direction X2 of the first guide member 422 to change the magnetic field distribution.

[0152] Combine Figure 13 For the implementation shown, see Figure 15 , Figure 15 yes Figure 1 FIG. 1 is a partial structural diagram of another structure of the reaction chamber 1000. Figure 15 The magnetic field adjustment mechanism 400 shown is Figure 13 The difference of the magnetic field adjustment mechanism 400 shown is that Figure 13 The first guide member 422 in the magnetic field adjustment mechanism 400 is fixedly connected to the cover 300, and the second guide member 423 is movably arranged on the first guide member 422. Figure 15 In the magnetic field adjustment mechanism 400 shown, the first guide member 422 and the second guide member 423 are both fixedly disposed on the cover 300 , and the first guide member 422 is fixedly disposed relative to the second guide member 423 .

[0153] Specifically, the magnetic assembly 41 can move along the circumferential direction X2 and the axial direction X1 of the guide assembly 42. The guide assembly 42 includes a first guide 422 and a second guide 423. The magnetic assembly 41 is movably arranged on the first guide 422 and can move along the circumferential direction X2 of the first guide 422. The magnetic assembly 41 is movably arranged on the second guide 423 and can move along the axial direction X1 of the second guide 423.

[0154] The first sliding rail of the first guide 422 and the second sliding rail of the second guide 423 are guide rails 4211. The magnetic assembly 41 can move along the circumferential direction X2 and the axial direction X1 of the guide assembly 42, so that the magnetic field adjusting mechanism 400 has the ability to adjust and flexibly control the magnetic field, thereby achieving the technical effects of enhancing the magnetic field adjusting range, improving the adjusting precision, and adapting to various application scenarios.

[0155] The first guide 422 is a part of the magnetic field adjusting mechanism 400 for guiding the movement of the magnetic assembly 41 along the circumferential direction X2. It can be annular, arc-shaped, or other shapes suitable for the movement of the magnetic assembly 41 along the circumferential direction X2. The inner surface or outer surface of the first guide 422 is provided with guide rails, sliding grooves, or similar guide structures to cooperate with the corresponding parts on the magnetic assembly 41 to realize the movement along the circumferential direction X2. The magnetic assembly 41 cooperates with the guide structure on the first guide 422 through the movable parts (such as sliding blocks, rollers, etc.) on it, so that the magnetic assembly 41 can move smoothly along the circumferential direction X2 of the first guide 422.

[0156] The second guide 423 is a part of the magnetic field adjusting mechanism 400 for guiding the movement of the magnetic assembly 41 along the axial direction X1. It can be linear, arc-shaped, or other shapes suitable for the movement of the magnetic assembly 41 along the axial direction X1. The second guide 423 is provided with guide rails, sliding grooves, or similar guide structures to cooperate with the corresponding parts on the magnetic assembly 41 to realize the movement along the axial direction X1. The magnetic assembly 41 also cooperates with the guide structure on the second guide 423 through the movable parts on it, so that the magnetic assembly 41 can move smoothly along the axial direction X1 of the second guide 423.

[0157] To realize the movement of the magnetic assembly 41 on the guide assembly 42, the movement of the magnetic assembly 41 on the guide assembly 42 can be driven by a driving structure such as a motor, a manual knob, a pneumatic or hydraulic device. The driving mechanism can be connected to the magnetic assembly 41 through a transmission mechanism (such as gears, chains, belts, etc.) to realize the movement along the circumferential direction X2 and the axial direction X1.

[0158] For example, assume that the magnetic field adjustment mechanism 400 is used to adjust the magnetic field within a cylindrical region. The magnetic assembly 41 comprises a permanent magnet that can move along a first guide member 422 (an annular guide rail) in a circumferential direction X2 to change the direction of the magnetic field. Simultaneously, the magnetic assembly 41 can also move along an axial direction X1 on a second guide member 423 (a linear guide rail) to change the intensity or range of the magnetic field.

[0159] Combine Figure 15 For the implementation shown, see Figure 16 , Figure 16 yes Figure 1 FIG. 1 is a partial structural diagram of another structure of the reaction chamber 1000. Figure 16 The magnetic field adjustment mechanism 400 shown is Figure 15 The difference of the magnetic field adjustment mechanism 400 shown is that Figure 16 The magnetic field adjustment mechanism 400 may further include a third guide member 424 .

[0160] The magnetic assembly 41 is movable along the circumferential direction X2, axial direction X1, and radial direction X3 of the guide assembly 42. The guide assembly 42 includes a first guide 422, a second guide 423, and a third guide 424. The third guide 424 is movably disposed on the first guide 422 and the second guide 423. The third guide 424 is movable on the first guide 422 and the second guide 423 in the circumferential direction X2 and in the axial direction X1, respectively, on the second guide 423. The magnetic assembly 41 is movably disposed on the third guide 424 and is movable on the third guide 424 in the radial direction X3. Due to the addition of the third guide 424, the magnetic assembly 41 can not only move along the first guide 422 and the second guide 423 in the circumferential direction X2 and in the axial direction X1, respectively, but can also move along the third guide 424 in the radial direction X3. This arrangement enables the magnetic assembly 41 to move in three dimensions, significantly enhancing the magnetic field adjustment range and magnetic field adjustment accuracy.

[0161] In the embodiment of the present application, the third guide member 424 has a unique dual movement capability, which can move along the circumferential direction X2 of the first guide member 422 and along the axial direction X1 of the second guide member 423, and the magnetic component 41 is arranged on the third guide member 424 and can move along the radial direction X3.

[0162] Specifically, the first guide member 422 can be annular or disc-shaped and provided with a circumferential guide rail or slide groove to cooperate with a corresponding portion on the third guide member 424. The third guide member 424 cooperates with the circumferential guide rail or slide groove on the first guide member 422 through a movable portion (such as a slider, roller, or guide rail, etc.), allowing the third guide member 424 to move smoothly along the circumferential direction X2 of the first guide member 422. The second guide member 423 can be linear or arc-shaped and provided with an axial guide rail or slide groove to cooperate with a corresponding portion on the third guide member 424. The third guide member 424 also cooperates with the axial guide rail or slide groove on the second guide member 423 through a movable portion, allowing the third guide member 424 to move smoothly along the axial direction X1 of the second guide member 423. In addition to the portions that cooperate with the first guide member 422 and the second guide member 423, the third guide member 424 also has a radial guide rail or slide groove for supporting and guiding the radial movement of the magnetic assembly 41.

[0163] In order to achieve precise movement of the magnetic component 41 in three-dimensional space, a driving mechanism including multiple motors can be designed, which are responsible for controlling the circumferential X2 movement of the third guide 424 on the first guide 422, the axial X1 movement of the third guide 424 on the second guide 423, and the radial X3 movement of the magnetic component 41 on the third guide 424.

[0164] For example, assuming that the magnetic field adjustment mechanism 400 is used to precisely adjust the strength and direction of the magnetic field at a location or region in three-dimensional space, the magnetic assembly 41 includes an adjustable-strength magnet 412 mounted on a third guide member 424. The magnet 412 can be moved in a radial direction X3 to change the effective range of the magnetic field. The third guide member 424 can simultaneously move in a circumferential direction X2 relative to the first guide member 422 and in an axial direction X1 relative to the second guide member 423, thereby changing the effective direction of the magnetic field.

[0165] See Figure 16 , the third guide member 424 can also be rotatably arranged on the first guide member 422 and / or the second guide member 423, and the magnetic component 41 can rotate around a preset direction following the third guide member 424. Since the guide component 42 includes the third guide member 424, and the third guide member 424 can be rotatably arranged on the first guide member 422 or the second guide member 423, and the magnetic component 41 is fixed or movably arranged on the third guide member 424, such an arrangement enables the magnetic component 41 to move not only in the circumferential direction X2, the axial direction X1, and the radial direction X3, but also to rotate in other directions, thereby enhancing the multi-dimensional adjustment capability and flexibility of the magnetic field adjustment mechanism 400, thereby achieving more precise magnetic field control, a wider adjustment range, and the technical effect of adapting to more complex magnetic field environments.

[0166] It is understood that the preset direction refers to the axis direction around which the third guide member 424 rotates, and is also the direction around which the magnetic assembly 41 rotates. This direction can be set according to actual needs, for example, horizontal, vertical, clockwise, counterclockwise, or any other direction.

[0167] The third guide member 424 can rotate relative to the first guide member 422 or the second guide member 423 via a transmission device such as a bearing, a rotating shaft, a gear, a chain, or a belt. Specifically, the third guide member 424 can be fixed to a rotating shaft, which is connected to the first guide member 422 or the second guide member 423 via a supporting component such as a bearing, allowing the third guide member 424 to rotate about the centerline of the rotating shaft. The magnetic assembly 41 is connected to the third guide member 424 so that when the third guide member 424 rotates, the magnetic assembly 41 rotates with it. The connection structure can be rigid, such as bolts or welding, or flexible, such as a connection via a rope or chain. When the third guide member 424 rotates in a predetermined direction, due to the connection between the magnetic assembly 41 and the third guide member 424, the magnetic assembly 41 also rotates with the third guide member 424.

[0168] For example, assuming that the magnetic field adjustment mechanism is used to precisely adjust the strength and direction of the magnetic field at a location or region in three-dimensional space, the magnetic assembly 41 is mounted on the third guide member 424 and can change the effective range of the magnetic field by moving in the radial direction X3. The third guide member 424 can rotate about the axis of the first guide member 422 or the second guide member 423 to change the direction of the magnetic field.

[0169] It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of this application can be combined with each other, and any combination of features in different embodiments is also within the scope of protection of this application. That is to say, the multiple embodiments described above can also be arbitrarily combined according to actual needs.

[0170] It should be noted that all the above drawings are for illustrative purposes only and do not represent the actual size of the product. Furthermore, the dimensional ratios between the components in the drawings are not intended to limit the actual product of the present application.

[0171] The above are only some of the embodiments and implementations of this application. The scope of protection of this application is not limited thereto. Any changes or substitutions that can be easily conceived by a person skilled in the art within the technical scope disclosed in this application should be included in the scope of protection of this application. Therefore, the scope of protection of this application should be based on the scope of protection of the claims.

Claims

1. A magnetic field regulating mechanism, applied to a reaction chamber of a plasma device, wherein the reaction chamber is provided with a reaction chamber, characterized in that: include: a magnetic component, the magnetic component being configured to generate a first magnetic field in the reaction chamber; a guide assembly, the magnetic assembly being movably connected to the guide assembly, the magnetic assembly being capable of moving circumferentially, axially, and radially along the guide assembly to adjust the first magnetic field; The guide assembly includes a first guide member, a second guide member and a third guide member. The third guide member is movably arranged on the second guide member and can move on the second guide member along the axial direction. The magnetic component is movably arranged on the third guide member and can move on the third guide member along the radial direction.

2. The magnetic field adjustment mechanism according to claim 1, characterized in that: The second guide member is movably provided on the first guide member, and the second guide member is capable of moving on the first guide member along the circumferential direction; Alternatively, the third guide member is movably provided on the first guide member, and the third guide member can move on the first guide member along the circumferential direction.

3. The magnetic field adjustment mechanism according to claim 2, characterized in that: The third guide member is rotatably disposed on the first guide member or the second guide member, and the magnetic component can rotate around a preset direction following the third guide member.

4. The magnetic field adjustment mechanism according to any one of claims 1 to 3, characterized in that: The magnetic field adjustment mechanism has a plurality of magnetic components, and the plurality of magnetic components are distributed in the circumferential direction, or / and the plurality of magnetic components are distributed in the axial direction, or / and the plurality of magnetic components are distributed in the radial direction.

5. The magnetic field adjustment mechanism according to any one of claims 1 to 3, characterized in that: The magnetic assembly can move along the circumferential, axial and radial directions of the guide assembly, and the circumferential, axial and radial directions are perpendicular to each other.

6. The magnetic field adjustment mechanism according to any one of claims 1 to 3, characterized in that: The magnetic component is provided with a movable part, the guide component is provided with a guiding part, and the movable part is movably connected to the guiding part.

7. The magnetic field adjustment mechanism according to claim 6, characterized in that: The movable portion is a slider, and the guiding portion is a guide rail. The slider slides in the guide rail, thereby enabling the magnetic component to move relative to the guide component.

8. The magnetic field adjustment mechanism according to any one of claims 1 to 3, characterized in that: At least one locking member is further provided between the magnetic component and the guide component. When the at least one locking member is in a first state, the at least one locking member fixes the magnetic component and the guide component. When the at least one locking member is in a second state, the magnetic component can move relative to the guide component.

9. The magnetic field adjustment mechanism according to any one of claims 1 to 3, characterized in that: The guide assembly includes at least one locking position. When the magnetic assembly is in the at least one locking position, the magnetic assembly is fixed to the guide assembly. When the magnetic assembly is not in the at least one locking position, the magnetic assembly can move relative to the guide assembly.

10. The magnetic field adjustment mechanism according to any one of claims 1 to 3, characterized in that: The magnetic assembly includes a mounting frame and at least one magnet. The mounting frame is connected to the guide assembly, and the at least one magnet is arranged in the mounting frame.

11. The magnetic field adjustment mechanism according to claim 10, characterized in that: At least one magnet is movably arranged in the mounting frame, and the first magnetic field is adjusted by changing the position of the at least one magnet.

12. The magnetic field adjustment mechanism according to claim 10, characterized in that: The magnetic assembly further includes at least one filling piece. After the at least one magnet is arranged on the mounting frame, the mounting frame has a receiving space, and the at least one filling piece is filled in the receiving space.

13. The magnetic field adjustment mechanism according to claim 12, characterized in that: The at least one filling piece is movably arranged in the mounting frame, and the first magnetic field is adjusted by changing the relative position of the at least one magnet and the at least one filling piece.

14. A reaction chamber, characterized in that: include: reaction chamber; a magnetic field generating mechanism, the magnetic field generating mechanism being configured to generate a second magnetic field in the reaction chamber; The magnetic field adjustment mechanism according to any one of claims 1 to 13, wherein the magnetic field adjustment mechanism uses the first magnetic field to adjust the second magnetic field.

15. The reaction chamber according to claim 14, characterized in that The magnetic field regulating mechanism is located outside the magnetic field generating mechanism. A cover is provided between the magnetic field regulating mechanism and the magnetic field generating mechanism. The magnetic field regulating mechanism is fixedly provided on the cover.

16. A plasma device, characterized in that: include: A reaction chamber as claimed in claim 14 or 15.

Images