Radio frequency power supply device and radio frequency power supply system

Abstract

The invention provides a radio frequency power supply device and a radio frequency power supply system. The radio frequency power supply device comprises a radio frequency source, a waveform shaping unit and an oscillation processing unit. The radio frequency source is used for outputting initial radio frequency electric energy, and the waveform of the initial radio frequency electric energy is sine wave. The waveform shaping unit is connected between the radio frequency source and the load, the waveform shaping unit is used for conducting and disconnecting alternately according to a preset period so as to shape the waveform of the initial radio frequency electric energy, obtain pulse radio frequency electric energy and output the pulse radio frequency electric energy to the load, and the preset period is larger than the period of the initial radio frequency electric energy. And the oscillation processing unit is connected to a connection point between the waveform shaping unit and the load, and the oscillation processing unit is used for complementary conduction with the waveform shaping unit, so that the oscillation processing unit is conducted to be in an enabled state when the waveform shaping unit is disconnected, and oscillation electric energy in the pulse radio frequency electric energy is eliminated when the waveform shaping unit is disconnected. According to the invention, oscillation electric energy generated in an output process of pulse radio frequency electric energy can be eliminated.

Description

Technical Field

[0001] The present application relates to the field of radio frequency technology, and particularly to a radio frequency power supply device and a radio frequency power supply system. Background Art

[0002] Currently, with the development of radio frequency power supply technology, a pulsed radio frequency power supply has been proposed and widely used in various semiconductor devices. During the output process of pulsed radio frequency electrical energy, relatively large oscillating electrical energy may be generated in each low-level stage of the pulsed radio frequency electrical energy. The oscillating electrical energy comes from the discharge of electronic components such as capacitors and inductors in the radio frequency power supply device, thus affecting the output effect. Therefore, during the output process of pulsed radio frequency electrical energy, how to eliminate the oscillating electrical energy in the pulsed radio frequency electrical energy has become an issue to be considered. Summary of the Invention

[0003] The present application provides a radio frequency power supply device and a radio frequency power supply system, which can eliminate the oscillating electrical energy generated during the output process of pulsed radio frequency electrical energy.

[0004] In a first aspect, a radio frequency power supply device is provided. The radio frequency power supply device includes a radio frequency source, a waveform shaping unit, and an oscillation processing unit. The radio frequency source is used to output initial radio frequency electrical energy, and the waveform of the initial radio frequency electrical energy is a sine wave. The waveform shaping unit is connected between the radio frequency source and the load. The waveform shaping unit is used to alternately conduct and disconnect at a preset period to shape the waveform of the initial radio frequency electrical energy to obtain pulsed radio frequency electrical energy, and output the pulsed radio frequency electrical energy to the load, where the preset period is greater than the period of the initial radio frequency electrical energy. The oscillation processing unit is connected to the connection point between the waveform shaping unit and the load. The oscillation processing unit is used to conduct complementarily with the waveform shaping unit, so as to conduct and be in an enabled state when the waveform shaping unit disconnects, and eliminate the oscillating electrical energy in the pulsed radio frequency electrical energy when the waveform shaping unit disconnects.

[0005] In a possible implementation manner, when the waveform shaping unit disconnects, the oscillation processing unit conducts and is in the enabled state to eliminate the electrical energy in the electrical energy transmission path from the waveform shaping unit to the load, so that the amplitude of the pulsed radio frequency electrical energy output to the load is zero; when the waveform shaping unit conducts, the oscillation processing unit disconnects and is in a disabled state to stop eliminating the electrical energy in the electrical energy transmission path from the waveform shaping unit to the load, so that the amplitude of the pulsed radio frequency electrical energy output to the load is the same as the amplitude of the pulsed radio frequency electrical energy obtained by the waveform shaping unit.

[0006] In a possible implementation, the waveform shaping unit includes a first switch, the first switch is connected between the radio frequency source and the load, and the first switch is alternately turned on and off at the preset period, so that the waveform shaping unit is alternately turned on and off at the preset period. Wherein, when the first switch is turned on, the initial radio frequency electrical energy continuously passes through the first switch, and when the first switch is turned off, the initial radio frequency electrical energy is prohibited from passing through the first switch, so as to obtain the pulsed radio frequency electrical energy.

[0007] In a possible implementation, the oscillation processing unit includes a first resistor and a second switch, the first resistor and the second switch are sequentially connected between the connection point between the waveform shaping unit and the load and the ground, the second switch is alternately turned on and off at the preset period, and is complementary to the waveform shaping unit in conduction, so that the oscillation processing unit is complementary to the waveform shaping unit in conduction. Wherein, when the second switch is turned off, the electrical energy transmission path of the pulsed radio frequency electrical energy from the waveform shaping unit to the load outputs to the load, and when the second switch is turned on, the first resistor is used to consume the oscillating electrical energy in the pulsed radio frequency electrical energy.

[0008] In a possible implementation, the resistance value of the first resistor is less than a first preset resistance value, wherein the first preset resistance value is determined according to the power value of the pulsed radio frequency electrical energy and the impedance value of the load.

[0009] In a possible implementation, the radio frequency power supply device further includes an isolation unit, the isolation unit is connected between the connection point between the waveform shaping unit and the load and the load, and the isolation unit is used to conduct synchronously with the waveform shaping unit, so as to disconnect the electrical energy transmission path from the waveform shaping unit to the load when the waveform shaping unit is turned off.

[0010] In a possible implementation, the isolation unit includes a third switch, the third switch is connected between the connection point between the waveform shaping unit and the load and the load, the third switch is alternately turned on and off at the preset period, and is synchronously conducted with the waveform shaping unit, so that the isolation unit is complementary to the waveform shaping unit in conduction. Wherein, when the third switch is turned on, the pulsed radio frequency electrical energy continuously passes through the third switch and outputs to the load, and when the third switch is turned off, the pulsed radio frequency electrical energy is prohibited from passing through the third switch.

[0011] In a possible implementation, the radio frequency power supply device further includes a coupling unit. The coupling unit is connected to the waveform shaping unit, the oscillation processing unit, and the load. The coupling unit is configured to couple the pulsed radio frequency electrical energy obtained by the waveform shaping unit to the oscillation processing unit and the load.

[0012] In a possible implementation, the radio frequency power supply device further includes an acquisition unit and a control unit. The acquisition unit is connected to the connection point between the waveform shaping unit and the load. The acquisition unit is configured to acquire the amplitude of the pulsed radio frequency electrical energy when the waveform shaping unit switches from off to on, and output the amplitude of the pulsed radio frequency electrical energy to the control unit. The control unit is connected to the acquisition unit, the waveform shaping unit, and the oscillation processing unit. The control unit is configured to receive the amplitude of the pulsed radio frequency electrical energy, and control and adjust at least the preset period and / or the conduction duty cycle of the waveform shaping unit and the oscillation processing unit according to the amplitude of the pulsed radio frequency electrical energy.

[0013] In a second aspect, a radio frequency power supply system is further provided. The radio frequency power supply system includes a radio frequency power supply device. The radio frequency power supply device includes a radio frequency source, a waveform shaping unit, and an oscillation processing unit. The radio frequency source is configured to output initial radio frequency electrical energy, and the waveform of the initial radio frequency electrical energy is a sine wave. The waveform shaping unit is connected between the radio frequency source and the load. The waveform shaping unit is configured to alternately conduct and disconnect at a preset period to shape the waveform of the initial radio frequency electrical energy to obtain pulsed radio frequency electrical energy, and output the pulsed radio frequency electrical energy to the load, where the preset period is greater than the period of the initial radio frequency electrical energy. The oscillation processing unit is connected to the connection point between the waveform shaping unit and the load. The oscillation processing unit is configured to conduct complementary to the waveform shaping unit, so as to conduct and be in an enabled state when the waveform shaping unit is off, so as to eliminate the oscillating electrical energy in the pulsed radio frequency electrical energy when the waveform shaping unit is off.

[0014] For the radio frequency power supply device and the radio frequency power supply system of the present application, by configuring the waveform shaping unit to shape the initial radio frequency electrical energy with a sine wave waveform, pulsed radio frequency electrical energy can be obtained. And since the preset period is greater than the period of the initial radio frequency electrical energy, in each high-level stage of the pulsed radio frequency electrical energy, the waveform of the pulsed radio frequency electrical energy output to the load is the same as the waveform of the initial radio frequency electrical energy. And in each low-level stage of the pulsed radio frequency electrical energy, by setting the oscillation processing unit to conduct complementary to the waveform shaping unit, and specifically conduct and be in an enabled state when the waveform shaping unit is off, so as to eliminate the oscillating electrical energy in the pulsed radio frequency electrical energy, so that the waveform of the pulsed radio frequency electrical energy output to the load is a straight line wave with an amplitude equal to zero, and the oscillating electrical energy generated during the output of the pulsed radio frequency electrical energy can be effectively eliminated. Brief Description of the Drawings

[0015] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the background art, the drawings required for use in the embodiments of the present application or the background art will be described below.

[0016] Figure 1 It is a schematic diagram of a radio frequency power supply device in some embodiments of the present application.

[0017] Figure 2 It is another schematic diagram of a radio frequency power supply device in some embodiments of the present application.

[0018] Figure 3 For Figure 1 It is a schematic diagram of the radio frequency power supply device shown further including an isolation unit.

[0019] Figure 4 It is yet another schematic diagram of a radio frequency power supply device in some embodiments of the present application.

[0020] Figure 5 For Figure 1 It is a schematic diagram of the radio frequency power supply device shown further including a coupling unit.

[0021] Figure 6 It is still another schematic diagram of a radio frequency power supply device in some embodiments of the present application.

[0022] Figure 7 It is a schematic diagram of a radio frequency power supply system in some embodiments of the present application.

[0023] Description of Reference Numerals: 1, radio frequency power supply system; 10, radio frequency power supply device; 100, radio frequency source; RF1, initial radio frequency electrical energy; 200, waveform shaping unit; S1, first switch; RF2, pulsed radio frequency electrical energy; 300, oscillation processing unit; R1, first resistor; S2, second switch; 400, isolation unit; S3, third switch; 500, coupling unit; 600, acquisition unit; RFV, amplitude; 700, control unit; RL, load; GND, ground. Detailed Description of the Embodiments

[0024] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all of the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present application without creative efforts shall fall within the protection scope of the present application.

[0025] In the description of the embodiments of the present application, it should be noted that, unless otherwise clearly specified and limited, the terms "connected" and "coupled" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium. For those of ordinary skill in the art, the specific meanings of the above terms in the present application can be understood according to specific circumstances.

[0026] Hereinafter, the terms "first", "second", and "third" are only used for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, the features defined with "first", "second", and "third" may explicitly or implicitly include one or more of such features. In the description of the embodiments of the present application, unless otherwise stated, the meaning of "a plurality" is two or more.

[0027] In addition, the terms "comprising" and "having" and any variations thereof are intended to cover non-exclusive inclusion. For example, a process, method, system, product, or server that includes a series of steps or units does not necessarily have to be limited to those steps or units clearly listed, but may include other steps or units not clearly listed or inherent to these processes, methods, products, or devices.

[0028] Please refer to Figure 1 , Figure 1 which is a schematic diagram of a radio frequency power supply device in some embodiments of the present application. As Figure 1 shown, the present application provides a radio frequency power supply device 10, which includes a radio frequency source 100, a waveform shaping unit 200, and an oscillation processing unit 300. The radio frequency source 100 is configured to output initial radio frequency electrical energy RF1, and the waveform of the initial radio frequency electrical energy RF1 is a sine wave. The waveform shaping unit 200 is connected between the radio frequency source 100 and the load RL. The waveform shaping unit 200 is configured to alternately conduct and disconnect at a preset period to shape the waveform of the initial radio frequency electrical energy RF1 to obtain pulsed radio frequency electrical energy RF2, and output the pulsed radio frequency electrical energy RF2 to the load RL, where the preset period is greater than the period of the initial radio frequency electrical energy RF1. The oscillation processing unit 300 is connected to the connection point between the waveform shaping unit 200 and the load RL. The oscillation processing unit 300 is configured to conduct complementarily with the waveform shaping unit 200, so as to be in an enabled state when conducting when the waveform shaping unit 200 is disconnected, so as to eliminate the oscillating electrical energy in the pulsed radio frequency electrical energy RF2 when the waveform shaping unit 200 is disconnected.

[0029] Therefore, in the above radio frequency power supply device 10 of the present application, by configuring the waveform shaping unit 200 to shape the initial radio frequency electrical energy RF1 with a sine wave waveform, pulsed radio frequency electrical energy RF2 can be obtained. Moreover, since the preset period is greater than the period of the initial radio frequency electrical energy RF1, in each high-level stage of the pulsed radio frequency electrical energy RF2, the waveform of the pulsed radio frequency electrical energy RF2 output to the load RL is the same as the waveform of the initial radio frequency electrical energy RF1. In each low-level stage of the pulsed radio frequency electrical energy RF2, by setting the oscillation processing unit 300 to be complementary to the waveform shaping unit 200 in conduction, specifically, the oscillation processing unit 300 is turned on and in an enabled state when the waveform shaping unit 200 is turned off, so as to eliminate the oscillating electrical energy in the pulsed radio frequency electrical energy RF2, thereby making the waveform of the pulsed radio frequency electrical energy RF2 output to the load RL a straight-line wave with an amplitude equal to zero, and effectively eliminating the oscillating electrical energy generated during the output of the pulsed radio frequency electrical energy RF2.

[0030] In some embodiments, the ratio of the preset period to the period of the initial radio frequency electrical energy RF1 is greater than a first ratio.

[0031] In some embodiments, the duty cycle of the waveform shaping unit 200 can be set according to the needs of the load RL. For example, it can be set to 50%, 60%, etc.

[0032] Among them, when the waveform shaping unit 200 is turned off, the oscillation processing unit 300 is turned on and in an enabled state to eliminate the electrical energy in the power transmission path from the waveform shaping unit 200 to the load RL, so that the amplitude of the pulsed radio frequency electrical energy RF2 output to the load RL is zero; when the waveform shaping unit 200 is turned on, the oscillation processing unit 300 is turned off and in a disabled state to stop eliminating the electrical energy in the power transmission path from the waveform shaping unit 200 to the load RL, so that the amplitude of the pulsed radio frequency electrical energy RF2 output to the load RL is the same as the amplitude of the pulsed radio frequency electrical energy RF2 obtained by the waveform shaping unit 200.

[0033] Therefore, in the above radio frequency power supply device 10 of the present application, when the waveform shaping unit 200 is turned off, electronic components such as capacitors and inductors in the radio frequency power supply device 10 discharge, and by configuring the oscillation processing unit 300 in an enabled state to eliminate the electrical energy in the power transmission path from the waveform shaping unit 200 to the load RL, the amplitude of the pulsed radio frequency electrical energy RF2 output to the load RL is zero; when the waveform shaping unit 200 is turned on, by configuring the oscillation processing unit 300 in a disabled state to stop eliminating the electrical energy in the power transmission path from the waveform shaping unit 200 to the load RL, so as to avoid affecting the output of the pulsed radio frequency electrical energy RF2, and make the amplitude of the pulsed radio frequency electrical energy RF2 output to the load RL the same as the amplitude of the pulsed radio frequency electrical energy RF2 obtained by the waveform shaping unit 200, that is, the amplitude of the pulsed radio frequency electrical energy RF2 output to the load RL is the same as the amplitude of the initial radio frequency electrical energy RF1.

[0034] Please refer to Figure 2 , Figure 2 , which is another schematic diagram of the radio frequency power supply device in some embodiments of the present application. As Figure 2 shown, the waveform shaping unit 200 includes a first switch S1. The first switch S1 is connected between the radio frequency source 100 and the load RL. The first switch S1 is alternately turned on and off at a preset period, so that the waveform shaping unit 200 is alternately turned on and off at a preset period. Among them, when the first switch S1 is turned on, the initial radio frequency electrical energy RF1 continuously passes through the first switch S1, and when the first switch S1 is turned off, the initial radio frequency electrical energy RF1 is prohibited from passing through the first switch S1, so as to obtain pulsed radio frequency electrical energy RF2.

[0035] Thus, in the above radio frequency power supply device 10 of the present application, by setting the first switch S1 connected between the radio frequency source 100 and the load RL and configuring the first switch S1 to be alternately turned on and off at a preset period, so that the initial radio frequency electrical energy RF1 continuously passes through or is prohibited from passing through the first switch S1, thereby obtaining pulsed radio frequency electrical energy RF2.

[0036] As Figure 2 shown, the oscillation processing unit 300 includes a first resistor R1 and a second switch S2. The first resistor R1 and the second switch S2 are sequentially connected between the connection point between the waveform shaping unit 200 and the load RL and the ground GND. The second switch S2 is alternately turned on and off at a preset period and is complementary to the waveform shaping unit 200 in conduction, so that the oscillation processing unit 300 is complementary to the waveform shaping unit 200 in conduction. Among them, when the second switch S2 is turned off, the pulsed radio frequency electrical energy RF2 is output to the load RL through the power transmission path from the waveform shaping unit 200 to the load RL, and when the second switch S2 is turned on, the first resistor R1 is used to consume the oscillation electrical energy in the pulsed radio frequency electrical energy RF2.

[0037] Thus, in the above radio frequency power supply device 10 of the present application, by setting the first resistor R1 and the second switch S2 sequentially connected between the connection point between the waveform shaping unit 200 and the load RL and the ground GND and configuring the second switch S2 to be complementary to the waveform shaping unit 200 in conduction, so that the first resistor R1 stops consuming or consumes the oscillation electrical energy in the pulsed radio frequency electrical energy RF2.

[0038] Among them, when the second switch S2 is turned off, the oscillation processing unit 300 is in a disabled state, and when the second switch S2 is turned on, the oscillation processing unit 300 is in an enabled state.

[0039] In some embodiments, the resistance value of the first resistor R1 is less than a first preset resistance value, where the first preset resistance value is determined according to the power value of the pulsed radio frequency electrical energy RF2 and the impedance value of the load RL.

[0040] Thus, for the above-mentioned radio frequency power supply device 10 in the present application, according to the power value of the pulsed radio frequency electric energy RF2 and the impedance value of the load RL, a corresponding first preset resistance value is set. Furthermore, the resistance value of the first resistor R1 is configured to be less than the first preset resistance value, and the first resistor R1 can better consume the oscillating electric energy in the pulsed radio frequency electric energy RF2.

[0041] Furthermore, when the power value of the pulsed radio frequency electric energy RF2 increases and the impedance value of the load RL increases, the first preset resistance value can increase. When the power value of the pulsed radio frequency electric energy RF2 decreases and the impedance value of the load RL decreases, the first preset resistance value can decrease.

[0042] Please refer to Figure 3 , Figure 3 For Figure 1 the schematic diagram of the radio frequency power supply device shown also includes an isolation unit. As Figure 3 shown, the radio frequency power supply device 10 further includes an isolation unit 400. The isolation unit 400 is connected between the connection point between the waveform shaping unit 200 and the load RL and the load RL. The isolation unit 400 is used to conduct synchronously with the waveform shaping unit 200 to disconnect the power transmission path from the waveform shaping unit 200 to the load RL when the waveform shaping unit 200 is disconnected.

[0043] Thus, for the above-mentioned radio frequency power supply device 10 in the present application, the isolation unit 400 conducts synchronously with the waveform shaping unit 200, that is, the isolation unit 400 conducts complementarily with the oscillation processing unit 300. By configuring the isolation unit 400 to disconnect the power transmission path from the waveform shaping unit 200 to the load RL when the waveform shaping unit 200 is disconnected, the situation that part of the oscillating electric energy is consumed by the oscillation processing unit 300 and there is still some remaining oscillating electric energy transmitted to the load RL when the waveform shaping unit 200 is disconnected is avoided, further improving the output effect.

[0044] Please refer to Figure 4 , Figure 4 For another schematic diagram of the radio frequency power supply device in some embodiments of the present application. As Figure 4 shown, the isolation unit 400 includes a third switch S3. The third switch S3 is connected between the connection point between the waveform shaping unit 200 and the load RL and the load RL. The third switch S3 alternately conducts and disconnects at a preset period and conducts synchronously with the waveform shaping unit 200, so that the isolation unit 400 conducts complementarily with the waveform shaping unit 200. Among them, when the third switch S3 conducts, the pulsed radio frequency electric energy RF2 continuously outputs to the load RL through the third switch S3, and when the third switch S3 disconnects, the pulsed radio frequency electric energy RF2 is prohibited from passing through the third switch S3.

[0045] Thus, in the above radio frequency power supply device 10 of the present application, by providing a third switch S3 between the connection point between the waveform shaping unit 200 and the load RL and the load RL, and configuring the third switch S3 to conduct synchronously with the waveform shaping unit 200, so that the pulsed radio frequency electrical energy RF2 continuously passes through or is prohibited from passing through the third switch S3, the isolation effect is achieved.

[0046] Please refer to Figure 5 , Figure 5 as Figure 1 a schematic diagram of the radio frequency power supply device further including a coupling unit. As Figure 5 shown, the radio frequency power supply device 10 further includes a coupling unit 500. The coupling unit 500 is connected to the waveform shaping unit 200, the oscillation processing unit 300, and the load RL. The coupling unit 500 is configured to couple the pulsed radio frequency electrical energy RF2 obtained by the waveform shaping unit 200 to the oscillation processing unit 300 and the load RL.

[0047] Thus, in the above radio frequency power supply device 10 of the present application, since both the initial radio frequency electrical energy RF1 and the pulsed radio frequency electrical energy RF2 are bidirectional alternating current electrical energy, by providing a coupling unit 500 to isolate the waveform shaping unit 200 from the oscillation processing unit 300 and couple the pulsed radio frequency electrical energy RF2 to the oscillation processing unit 300 and the load RL through the coupling unit 500, the isolation effect is further improved.

[0048] Among them, the coupling unit 500 is connected to the waveform shaping unit 200 and is connected to the connection point between the oscillation processing unit 300 and the load RL.

[0049] In some embodiments, the coupling unit 500 may include a first winding and a second winding that are magnetically coupled. The first winding is connected to the waveform shaping unit 200, and the second winding is connected to the connection point between the oscillation processing unit 300 and the load RL.

[0050] Please refer to Figure 6 , Figure 6 as Figure 6As shown, the radio frequency power supply device 10 further includes an acquisition unit 600 and a control unit 700. The acquisition unit 600 is connected to the connection point between the waveform shaping unit 200 and the load RL. The acquisition unit 600 is configured to acquire the amplitude RFV of the pulsed radio frequency electrical energy RF2 when the waveform shaping unit 200 switches from off to on, and output the amplitude RFV of the pulsed radio frequency electrical energy RF2 to the control unit 700. The control unit 700 is connected to the acquisition unit 600, the waveform shaping unit 200, and the oscillation processing unit 300. The control unit 700 is configured to receive the amplitude RFV of the pulsed radio frequency electrical energy RF2, and control and adjust at least the preset period and / or the conduction duty ratio of the waveform shaping unit 200 and the oscillation processing unit 300 according to the amplitude RFV of the pulsed radio frequency electrical energy RF2.

[0051] Thus, in the above radio frequency power supply device 10 of the present application, by configuring the acquisition unit 600 to acquire the amplitude RFV of the pulsed radio frequency electrical energy RF2 when the waveform shaping unit 200 switches from off to on, the control unit 700 can determine whether the oscillating electrical energy in the pulsed radio frequency electrical energy RF2 is completely consumed by the oscillation processing unit 300 when the waveform shaping unit 200 switches from off to on, so as to determine how to control and adjust the preset period and / or the conduction duty ratio of the waveform shaping unit 200 and the oscillation processing unit 300.

[0052] In some embodiments, the control unit 700 is configured to control to increase the preset period of the waveform shaping unit 200 and the oscillation processing unit 300 and / or decrease the conduction duty ratio of the waveform shaping unit 200 and the oscillation processing unit 300 when the received amplitude RFV of the pulsed radio frequency electrical energy RF2 is not zero. Thus, more time can be provided for the oscillation processing unit 300 to completely consume the oscillating electrical energy.

[0053] In some embodiments, the acquisition unit 600 may include a voltage sensor.

[0054] In some embodiments, the control unit 700 may be a general-purpose processor such as a Central Processing Unit (CPU), or may be a logic control device such as a Digital Signal Processor (DSP), an Application Specific Integrated Circuit (ASIC), a Field-Programmable Gate Array (FPGA), or other programmable logic devices, discrete gate logic devices, transistor logic devices, or may also be a microprocessor such as a Micro Control Unit (MCU).

[0055] The RF power supply device 10 of the present application, through the above structure, can effectively eliminate the oscillating electrical energy generated during the output of the pulsed RF electrical energy RF2, reduce the reflected power of the pulsed RF electrical energy RF2 in each low-level stage, improve the output effect, and avoid damage to the RF power supply device 10.

[0056] Please refer to Figure 7 , Figure 7 which is a schematic diagram of an RF power supply system in some embodiments of the present application. As Figure 7 shown, the present application also provides an RF power supply system 1, and the RF power supply system 1 includes the RF power supply device 10 in any of the foregoing embodiments.

[0057] Please refer to again Figure 1 . As Figure 1 shown, the RF power supply device 10 includes an RF source 100, a waveform shaping unit 200, and an oscillation processing unit 300. The RF source 100 is used to output the initial RF electrical energy RF1, and the waveform of the initial RF electrical energy RF1 is a sine wave. The waveform shaping unit 200 is connected between the RF source 100 and the load RL. The waveform shaping unit 200 is used to alternately conduct and disconnect at a preset period to shape the waveform of the initial RF electrical energy RF1 to obtain the pulsed RF electrical energy RF2, and output the pulsed RF electrical energy RF2 to the load RL, where the preset period is greater than the period of the initial RF electrical energy RF1. The oscillation processing unit 300 is connected to the connection point between the waveform shaping unit 200 and the load RL. The oscillation processing unit 300 is used to conduct complementarily with the waveform shaping unit 200, so as to conduct and be in an enabled state when the waveform shaping unit 200 is disconnected, so as to eliminate the oscillating electrical energy in the pulsed RF electrical energy RF2 when the waveform shaping unit 200 is disconnected.

[0058] Among them, for the more specific structure of the RF power supply device 10, reference can be made to the relevant content of the RF power supply device 10 in any of the foregoing embodiments, which will not be elaborated here.

[0059] The RF power supply device 10 and the RF power supply system 1 of the present application, through the above structure, can effectively eliminate the oscillating electrical energy generated during the output of the pulsed RF electrical energy RF2, reduce the reflected power of the pulsed RF electrical energy RF2 in each low-level stage, improve the output effect, and avoid damage to the RF power supply system 1.

[0060] The above description is only the specific implementation manner of the present application, but the protection scope of the present application is not limited thereto. Any person skilled in the art within the technical scope disclosed by the present application can easily think of changes or substitutions, which should all be covered within the protection scope of the present application; without conflict, the embodiments of the present application and the features in the embodiments can be combined with each other. Therefore, the protection scope of the present application shall be subject to the protection scope of the claims.

Claims

1. A radio frequency power supply device, characterized in that: include: A radio frequency source, used for outputting initial radio frequency electric energy, wherein the waveform of the initial radio frequency electric energy is a sine wave; a waveform shaping unit connected between the RF source and the load, the waveform shaping unit being used to alternately turn on and off at a preset period to shape the waveform of the initial RF power to obtain pulsed RF power, and output the pulsed RF power to the load, wherein the preset period is greater than the period of the initial RF power; An oscillation processing unit is connected to a connection point between the waveform shaping unit and the load, and is used for complementarily conducting with the waveform shaping unit, so that the oscillation processing unit is conducted and is in an enabled state when the waveform shaping unit is disconnected, so as to eliminate the oscillating electric energy in the pulsed RF electric energy when the waveform shaping unit is disconnected.

2. The radio frequency power supply device according to claim 1, characterized in that: When the waveform shaping unit is disconnected, the oscillation processing unit is turned on and is in the enabled state to eliminate the electric energy in the electric energy transmission path from the waveform shaping unit to the load, so that the amplitude of the pulsed RF electric energy output to the load is zero; when the waveform shaping unit is turned on, the oscillation processing unit is turned off and is in the disabled state to stop eliminating the electric energy in the electric energy transmission path from the waveform shaping unit to the load, so that the amplitude of the pulsed RF electric energy output to the load is the same as the amplitude of the pulsed RF electric energy obtained by the waveform shaping unit.

3. The radio frequency power supply device according to claim 1, characterized in that: The waveform shaping unit includes a first switch, the first switch is connected between the RF source and the load, the first switch is alternately turned on and off at the preset period, so that the waveform shaping unit is alternately turned on and off at the preset period; When the first switch is turned on, the initial RF power continues to pass through the first switch, and when the first switch is turned off, the initial RF power is prohibited from passing through the first switch to obtain the pulsed RF power.

4. The radio frequency power supply device according to claim 1, characterized in that: The oscillation processing unit includes a first resistor and a second switch, the first resistor and the second switch are sequentially connected between a connection point between the waveform shaping unit and the load and the ground, the second switch is alternately turned on and off at the preset period, and is complementarily turned on with the waveform shaping unit, so that the oscillation processing unit and the waveform shaping unit are complementarily turned on; Wherein, when the second switch is disconnected, the pulsed RF power is output to the load through the power transmission path from the waveform shaping unit to the load, and when the second switch is turned on, the first resistor is used to consume the oscillating power in the pulsed RF power.

5. The radio frequency power supply device according to claim 4, characterized in that: The resistance value of the first resistor is less than a first preset resistance value, wherein the first preset resistance value is determined according to the power value of the pulsed RF electric energy and the impedance value of the load.

6. The radio frequency power supply device according to claim 1, characterized in that: The RF power supply device also includes an isolation unit, which is connected between a connection point between the waveform shaping unit and the load and the load, and is used to be turned on synchronously with the waveform shaping unit so as to disconnect the power transmission path from the waveform shaping unit to the load when the waveform shaping unit is disconnected.

7. The radio frequency power supply device according to claim 6, characterized in that: The isolation unit includes a third switch, the third switch is connected between the connection point between the waveform shaping unit and the load and the load, the third switch is alternately turned on and off at the preset period, and is turned on synchronously with the waveform shaping unit, so that the isolation unit and the waveform shaping unit are turned on complementarily; Wherein, when the third switch is turned on, the pulsed RF power is continuously output to the load through the third switch, and when the third switch is turned off, the pulsed RF power is prohibited from passing through the third switch.

8. The radio frequency power supply device according to claim 1, characterized in that: The RF power supply device also includes a coupling unit, which is connected to the waveform shaping unit, the oscillation processing unit and the load, and is used to couple the pulsed RF power obtained by the waveform shaping unit to the oscillation processing unit and the load.

9. The radio frequency power supply device according to claim 1, characterized in that: The radio frequency power supply device also includes an acquisition unit and a control unit; The acquisition unit is connected to a connection point between the waveform shaping unit and the load, and is used to acquire the amplitude of the pulsed radio frequency electric energy when the waveform shaping unit is switched from off to on, and output the amplitude of the pulsed radio frequency electric energy to the control unit; The control unit is connected to the acquisition unit, the waveform shaping unit and the oscillation processing unit, and is used to receive the amplitude of the pulsed radio frequency electric energy, and control and adjust the preset period and / or conduction duty cycle of the waveform shaping unit and the oscillation processing unit at least according to the amplitude of the pulsed radio frequency electric energy.

10. A radio frequency power supply system, characterized in that: Comprising a radio frequency power supply device as described in any one of claims 1 to 9.

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