Radio frequency power supply device and radio frequency power supply system

Abstract

The invention provides a radio frequency power supply device and a radio frequency power supply system, and relates to the technical field of radio frequency. The radio frequency power supply device comprises a radio frequency source, a waveform modulation unit, a harmonic processing unit and an output end, the waveform modulation unit is connected between the radio frequency source and the output end, the harmonic processing unit is connected between a connection point between the waveform modulation unit and the output end and the ground, and the output end is used for being connected with a load. The radio frequency source is used for outputting initial radio frequency electric energy, and the waveform of the initial radio frequency electric energy is sine wave. And the waveform modulation unit is used for receiving the initial radio frequency electric energy and alternately conducting or disconnecting according to a preset period so as to obtain pulse radio frequency electric energy and transmit the pulse radio frequency electric energy to a load through the output end. The harmonic wave processing unit is used for working at a preset resonant frequency to filter target harmonic waves in the pulse radio frequency electric energy, and the preset resonant frequency is related to the angular frequency of the target harmonic waves. According to the invention, the target harmonic wave in the pulse radio frequency electric energy can be filtered.

Description

Technical Field

[0001] This application relates to the field of radio frequency technology, and particularly to a radio frequency power supply device and a radio frequency power supply system. Background Art

[0002] Currently, with the development of radio frequency power supply technology, a pulsed radio frequency power supply has been proposed and widely used in various semiconductor devices. However, during the output process of pulsed radio frequency electrical energy, there are still many problems to be solved. In particular, a large number of harmonics with unknown waveform parameters are generated in the pulsed radio frequency electrical energy, which greatly affects the output effect. Therefore, during the output process of pulsed radio frequency electrical energy, how to filter out the target harmonics in the pulsed radio frequency electrical energy and thereby improve the output effect has become an issue to be considered. Summary of the Invention

[0003] This application provides a radio frequency power supply device and a radio frequency power supply system that can accurately filter out the target harmonics in pulsed radio frequency electrical energy.

[0004] In a first aspect, a radio frequency power supply device is provided. The radio frequency power supply device includes a radio frequency source, a waveform modulation unit, a harmonic processing unit, and an output terminal. The waveform modulation unit is connected between the radio frequency source and the output terminal. The harmonic processing unit is connected between a connection point between the waveform modulation unit and the output terminal and the ground. The output terminal is used to connect to a load. The radio frequency source is used to output initial radio frequency electrical energy, and the waveform of the initial radio frequency electrical energy is a sine wave. The waveform modulation unit is used to receive the initial radio frequency electrical energy and alternately conduct or disconnect at a preset period to obtain pulsed radio frequency electrical energy and transmit it to the load through the output terminal. The harmonic processing unit is used to operate at a preset resonance frequency to filter out the target harmonics in the pulsed radio frequency electrical energy, where the preset resonance frequency is related to the angular frequency of the target harmonics.

[0005] In a possible implementation manner, the preset resonance frequency includes a first resonance frequency and a second resonance frequency, and the target harmonics include a first sub-target harmonic and a second sub-target harmonic. Among them, the harmonic processing unit is used to operate at the first resonance frequency and the second resonance frequency to correspondingly filter out the first sub-target harmonic and the second sub-target harmonic in the pulsed radio frequency electrical energy, where both the first resonance frequency and the second resonance frequency are obtained based on the angular frequency of the initial radio frequency electrical energy and the angular frequency of the pulsed radio frequency electrical energy.

[0006] In a possible implementation manner, the first resonance frequency is the frequency corresponding to the sum of the angular frequency of the initial radio frequency electrical energy and the angular frequency of the pulsed radio frequency electrical energy, and the second resonance frequency is the frequency corresponding to the difference between the angular frequency of the initial radio frequency electrical energy and the angular frequency of the pulsed radio frequency electrical energy.

[0007] In a possible implementation manner, the harmonic processing unit includes a first harmonic processing module and a second harmonic processing module. Both the first harmonic processing module and the second harmonic processing module are connected between the connection point between the waveform modulation unit and the load and the ground. Wherein, the first harmonic processing module is used to operate at the first resonance frequency to filter out the first sub-target harmonic in the pulsed RF electrical energy, and the second harmonic processing module is used to operate at the second resonance frequency to filter out the second sub-target harmonic in the pulsed RF electrical energy.

[0008] In a possible implementation manner, the first harmonic processing module includes a first capacitor and a first inductor. The first capacitor and the first inductor are sequentially connected between the connection point between the waveform modulation unit and the load and the ground. Wherein, the first resonance frequency of the first capacitor and the first inductor corresponds to the angular frequency of the first sub-target harmonic to filter out the first sub-target harmonic. The second harmonic processing module includes a second capacitor and a second inductor. The second capacitor and the second inductor are sequentially connected between the connection point between the waveform modulation unit and the load and the ground. Wherein, the second resonance frequency of the second capacitor and the second inductor corresponds to the angular frequency of the second sub-target harmonic to filter out the second sub-target harmonic.

[0009] In a possible implementation manner, both the first capacitor and the second capacitor are adjustable capacitors. The RF power supply device further includes an adjustment unit. The adjustment unit is connected to both the first capacitor and the second capacitor. The adjustment unit is used to adjust the capacitance value of the first capacitor and the capacitance value of the second capacitor to correspondingly adjust the first resonance frequency of the first harmonic processing module and the second resonance frequency of the second harmonic processing module. Wherein, the first resonance frequency changes with the change of the angular frequency of the first sub-target harmonic, and the second resonance frequency changes with the change of the angular frequency of the second sub-target harmonic.

[0010] In a possible implementation manner, the harmonic processing unit includes a plurality of third harmonic processing modules. Each third harmonic processing module is selectively connected or disconnected from the connection point between the waveform modulation unit and the load. Each third harmonic processing module is connected to the ground. Wherein, the target harmonic processing module among the plurality of third harmonic processing modules is used to be connected to the connection point between the waveform modulation unit and the load and operate at the preset resonance frequency to filter out the target harmonic, and the other third harmonic processing modules are all disconnected from the connection point between the waveform modulation unit and the load.

[0011] In a possible implementation, the radio frequency power supply device further includes a control unit, the control unit is connected to each third harmonic processing module, and the control unit is configured to determine the angular frequency of the target harmonic according to the angular frequency of the initial radio frequency electrical energy and the angular frequency of the pulsed radio frequency electrical energy, and control the connection point between the target harmonic processing module, the waveform modulation unit and the load to be connected, and control the connection points between the other third harmonic processing modules, the waveform modulation unit and the load to be disconnected.

[0012] In a possible implementation, the radio frequency power supply device further includes a control unit, the control unit is connected to the harmonic processing unit, and the control unit is configured to determine the preset resonance frequency according to the angular frequency of the initial radio frequency electrical energy and the angular frequency of the pulsed radio frequency electrical energy, and control the harmonic processing unit to operate at the preset resonance frequency.

[0013] In a second aspect, a radio frequency power supply system is further provided. The radio frequency power supply system includes a radio frequency power supply device. The radio frequency power supply device includes a radio frequency source, a waveform modulation unit, a harmonic processing unit, and an output terminal. The waveform modulation unit is connected between the radio frequency source and the output terminal. The harmonic processing unit is connected between the connection point between the waveform modulation unit and the output terminal and the ground. The output terminal is used to connect to a load. The radio frequency source is configured to output initial radio frequency electrical energy, and the waveform of the initial radio frequency electrical energy is a sine wave. The waveform modulation unit is configured to receive the initial radio frequency electrical energy, and alternately conduct or disconnect at a preset period to obtain pulsed radio frequency electrical energy and transmit it to the load through the output terminal. The harmonic processing unit is configured to operate at a preset resonance frequency to filter out the target harmonic in the pulsed radio frequency electrical energy, where the preset resonance frequency is related to the angular frequency of the target harmonic.

[0014] The radio frequency power supply device and the radio frequency power supply system of the present application can modulate and output pulsed radio frequency electrical energy by configuring a waveform modulation unit to modulate the initial radio frequency electrical energy, and configure the harmonic processing unit to operate at a preset resonance frequency related to the angular frequency of the target harmonic, which can accurately filter out the target harmonic in the pulsed radio frequency electrical energy and improve the output effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the background art, the drawings required to be used in the embodiments of the present application or the background art will be described below.

[0016] Figure 1 It is a block diagram of a radio frequency power supply device in some embodiments of the present application.

[0017] Figure 2It is a block diagram of a harmonic processing unit in some embodiments of the present application.

[0018] Figure 3 It is a circuit diagram of a harmonic processing unit in some embodiments of the present application.

[0019] Figure 4 It is another circuit diagram of a harmonic processing unit in some embodiments of the present application.

[0020] Figure 5 It is another block diagram of a radio frequency power supply device in some embodiments of the present application.

[0021] Figure 6 It is a block diagram of a radio frequency power supply system in some embodiments of the present application.

[0022] Explanation of reference numerals: 1, radio frequency power supply system; 10, radio frequency power supply device; 100, radio frequency source; RF1, initial radio frequency electrical energy; 200, waveform modulation unit; RF2, pulsed radio frequency electrical energy; 300, harmonic processing unit; 310, first harmonic processing module; C1, first capacitor; L1, first inductor; 320, second harmonic processing module; C2, second capacitor; L2, second inductor; 330, third harmonic processing module; S1, first switch; C3, third capacitor; L3, third inductor; 400, output terminal; 500, adjustment unit; 600, control unit; 700, impedance matching unit; GND, ground. Detailed implementation manners

[0023] Next, the technical solutions in the embodiments of the present application will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present application.

[0024] In the description of the embodiments of the present application, it should be noted that unless otherwise clearly defined and limited, the terms "connected" and "connection" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium. For those of ordinary skill in the art, the specific meanings of the above terms in the present application can be understood according to specific situations.

[0025] Hereinafter, the terms "first", "second", and "third" are for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, features defined with "first", "second", and "third" may explicitly or implicitly include one or more of such features. In the description of the embodiments of the present application, unless otherwise specified, the meaning of "a plurality" is two or more.

[0026] In addition, the terms "comprising" and "having" and any variations thereof are intended to cover non-exclusive inclusion. For example, a process, method, system, product, or server comprising a series of steps or units need not be limited to those steps or units clearly listed, but may include other steps or units not clearly listed or inherent to such process, method, product, or device.

[0027] Please refer to Figure 1 , Figure 1 which is a block diagram of a radio frequency power supply device in some embodiments of the present application. As Figure 1 shown, the present application provides a radio frequency power supply device 10, which includes a radio frequency source 100, a waveform modulation unit 200, a harmonic processing unit 300, and an output terminal 400. The waveform modulation unit 200 is connected between the radio frequency source 100 and the output terminal 400. The harmonic processing unit 300 is connected between the connection point between the waveform modulation unit 200 and the output terminal 400 and the ground GND. The output terminal 400 is used to connect to a load. The radio frequency source 100 is used to output initial radio frequency electrical energy RF1, and the waveform of the initial radio frequency electrical energy RF1 is a sine wave. The waveform modulation unit 200 is used to receive the initial radio frequency electrical energy RF1 and alternately turn on or off at a preset period to obtain pulsed radio frequency electrical energy RF2 and transmit it to the load through the output terminal 400. The harmonic processing unit 300 is used to operate at a preset resonance frequency to filter out the target harmonics in the pulsed radio frequency electrical energy RF2, where the preset resonance frequency is related to the angular frequency of the target harmonics.

[0028] Thus, in the above radio frequency power supply device 10 of the present application, by configuring the waveform modulation unit 200 to modulate the initial radio frequency electrical energy RF1, the modulation and output of the pulsed radio frequency electrical energy RF2 can be achieved, and by configuring the harmonic processing unit 300 to operate at a preset resonance frequency related to the angular frequency of the target harmonics, the target harmonics in the pulsed radio frequency electrical energy RF2 can be accurately filtered out, improving the output effect.

[0029] In some embodiments, the preset period is greater than the period of the initial radio frequency electrical energy RF1.

[0030] Furthermore, the ratio of the preset period to the period of the initial radio frequency electrical energy RF1 is greater than a first ratio.

[0031] In some embodiments, the duty cycle of the waveform modulation unit 200 that alternately conducts or disconnects at a preset period can be set according to the needs of the load. For example, it can be set to 50%, 60%, etc.

[0032] Among them, when the waveform modulation unit 200 is disconnected, the waveform modulation unit 200 is in a disabled state, and the waveform of the pulsed RF energy RF2 is a straight-line wave with an amplitude equal to zero. When the waveform modulation unit 200 is conducting, the waveform modulation unit 200 is in an enabled state, and the waveform of the pulsed RF energy RF2 is the same as the waveform of the initial RF energy RF1.

[0033] Among them, the preset resonance frequencies include a first resonance frequency and a second resonance frequency, and the target harmonics include a first sub-target harmonic and a second sub-target harmonic. Among them, the harmonic processing unit 300 is used to operate at the first resonance frequency and the second resonance frequency to correspondingly filter out the first sub-target harmonic and the second sub-target harmonic in the pulsed RF energy RF2. Among them, both the first resonance frequency and the second resonance frequency are obtained according to the angular frequency of the initial RF energy RF1 and the angular frequency of the pulsed RF energy RF2.

[0034] Thus, for the periodic pulsed RF energy RF2 in the present application, and the pulsed RF energy RF2 has two different states in each preset period, so the target harmonics include a first sub-target harmonic and a second sub-target harmonic, and the preset resonance frequencies correspondingly include a first resonance frequency and a second resonance frequency. Furthermore, by configuring the harmonic processing unit 300 to operate at the first resonance frequency and the second resonance frequency, the first sub-target harmonic and the second sub-target harmonic in the pulsed RF energy RF2 can be correspondingly filtered out. And according to the angular frequency of the initial RF energy RF1 and the angular frequency of the pulsed RF energy RF2, the first resonance frequency and the second resonance frequency can be obtained.

[0035] Among them, since the target harmonics in the pulsed RF energy RF2, such as the first sub-target harmonic and the second sub-target harmonic, are related to the angular frequency of the initial RF energy RF1 and the angular frequency of the pulsed RF energy RF2, therefore, when both the first resonance frequency and the second resonance frequency are obtained according to the angular frequency of the initial RF energy RF1 and the angular frequency of the pulsed RF energy RF2, the preset resonance frequencies including the first resonance frequency and the second resonance frequency can be made related to the angular frequencies of the target harmonics including the first sub-target harmonic and the second sub-target harmonic. Furthermore, the harmonic processing unit 300 can be made to operate at the preset resonance frequencies including the first resonance frequency and the second resonance frequency to correspondingly filter out the target harmonics including the first sub-target harmonic and the second sub-target harmonic in the pulsed RF energy RF2.

[0036] Further, the first resonance frequency is the frequency corresponding to the sum of the angular frequencies of the initial RF energy RF1 and the pulsed RF energy RF2, and the second resonance frequency is the frequency corresponding to the difference between the angular frequencies of the initial RF energy RF1 and the pulsed RF energy RF2.

[0037] Thus, for the above RF power supply device 10 in the present application, the first resonance frequency and the second resonance frequency can be obtained only based on the frequencies corresponding to the sum and the difference between the angular frequencies of the initial RF energy RF1 and the pulsed RF energy RF2, with simple calculation, being convenient and fast.

[0038] Specifically, during actual output, according to the waveform of the pulsed RF energy RF2, the relational expression of the waveform of the pulsed RF energy RF2 can be D×cos(ω1×t)+[sin(2π×D) / 4π]×[cos(ω2×t)+cos(ω3×t)], where ω1 is the angular frequency of the initial RF energy RF1, ω2 is the angular frequency of the first sub-target harmonic, that is, the sum of the angular frequencies of the initial RF energy RF1 and the pulsed RF energy RF2, ω3 is the angular frequency of the second sub-target harmonic, that is, the difference between the angular frequencies of the initial RF energy RF1 and the pulsed RF energy RF2, and D is the conduction duty cycle of the pulsed RF energy RF2 in each preset period. Among them, D×cos(ω1×t) is the pulsed RF energy RF2 for targeted output, while [sin(2π×D) / 4π]×[cos(ω2×t)+cos(ω3×t)] are the target harmonics that are not desired to be output, and the target harmonics are composed of two parts, namely the first sub-target harmonic and the second sub-target harmonic, which are cos(ω2×t) and cos(ω3×t) respectively. The angular frequencies of the first sub-target harmonic and the second sub-target harmonic are ω2 and ω3 respectively. Furthermore, ω2 and ω3 are respectively determined according to the sum value and the difference value of the angular frequencies of the initial RF energy RF1 and the pulsed RF energy RF2.

[0039] Please refer to Figure 2 , Figure 2 which is the block diagram of the harmonic processing unit in some embodiments of the present application. As Figure 1 , Figure 2 shown, the harmonic processing unit 300 includes a first harmonic processing module 310 and a second harmonic processing module 320. Both the first harmonic processing module 310 and the second harmonic processing module 320 are connected between the connection point between the waveform modulation unit 200 and the load and the ground GND. Among them, the first harmonic processing module 310 is used to operate at the first resonance frequency to filter out the first sub-target harmonic in the pulsed RF energy RF2, and the second harmonic processing module 320 is used to operate at the second resonance frequency to filter out the second sub-target harmonic in the pulsed RF energy RF2.

[0040] Therefore, the above-mentioned radio frequency power supply device 10 in the present application can correspondingly filter the first sub-target harmonic and the second sub-target harmonic in the pulsed radio frequency electric energy RF2 through two harmonic processing modules and by using the resonance method for filtering.

[0041] Please refer to Figure 3 , Figure 3 which is a circuit schematic diagram of the harmonic processing unit in some embodiments of the present application. As Figure 1 , Figure 2 , Figure 3 shown, the first harmonic processing module 310 includes a first capacitor C1 and a first inductor L1. The first capacitor C1 and the first inductor L1 are sequentially connected between the connection point between the waveform modulation unit 200 and the load and the ground GND. Among them, the first resonance frequency of the first capacitor C1 and the first inductor L1 corresponds to the angular frequency of the first sub-target harmonic to filter the first sub-target harmonic. The second harmonic processing module 320 includes a second capacitor C2 and a second inductor L2. The second capacitor C2 and the second inductor L2 are sequentially connected between the connection point between the waveform modulation unit 200 and the load and the ground GND. Among them, the second resonance frequency of the second capacitor C2 and the second inductor L2 corresponds to the angular frequency of the second sub-target harmonic to filter the second sub-target harmonic.

[0042] In some embodiments, the control unit 600 can determine a preset resonance frequency according to the angular frequency of the initial radio frequency electric energy RF1 and the angular frequency of the pulsed radio frequency electric energy RF2, and then control the adjustment unit 500 to adjust the capacitance values of the first capacitor C1 and the second capacitor C2 to control the harmonic processing unit 300 to work at the preset resonance frequency, that is, to work at the first resonance frequency and the second resonance frequency.

[0043] In some embodiments, after the control unit 600 determines the preset resonance frequency, such as the first resonance frequency and the second resonance frequency, according to the angular frequency of the initial radio frequency electric energy RF1 and the angular frequency of the pulsed radio frequency electric energy RF2, it can determine the target capacitance values of the first capacitor C1 and the second capacitor C2 corresponding to the first resonance frequency and the second resonance frequency according to the corresponding relationship between the preset capacitance value and the resonance frequency, and then control the adjustment unit 500 to adjust the capacitance values of the first capacitor C1 and the second capacitor C2 to the corresponding target capacitance values, so that the resonance frequencies of the first harmonic processing module 310 and the second harmonic processing module 320 are respectively the determined first resonance frequency and the second resonance frequency.

[0044] Therefore, in the above radio frequency power supply device 10 of the present application, by providing a first capacitor C1 and a first inductor L1 connected in sequence between the connection point between the waveform modulation unit 200 and the load and the ground GND, and a second capacitor C2 and a second inductor L2 connected in sequence between the connection point between the waveform modulation unit 200 and the load and the ground GND, the first harmonic processing module 310 and the second harmonic processing module 320 can respectively have a first resonance frequency and a second resonance frequency.

[0045] Specifically, the resonance frequency and the angular frequency are converted by f = ω / 2π, where f is the frequency and ω is the angular frequency.

[0046] As Figure 1 、 Figure 2 、 Figure 3 shown, both the first capacitor C1 and the second capacitor C2 are adjustable capacitors. The radio frequency power supply device 10 further includes an adjustment unit 500. The adjustment unit 500 is connected to both the first capacitor C1 and the second capacitor C2. The adjustment unit 500 is configured to adjust the capacitance value of the first capacitor C1 and the capacitance value of the second capacitor C2 to correspondingly adjust the first resonance frequency of the first harmonic processing module 310 and the second resonance frequency of the second harmonic processing module 320. Among them, the first resonance frequency changes with the angular frequency of the first sub-target harmonic, and the second resonance frequency changes with the angular frequency of the second sub-target harmonic.

[0047] Among them, according to the correspondence relationship defining the capacitance value of the first capacitor C1 and the first resonance frequency, the capacitance value of the first capacitor C1 is controlled and adjusted, and according to the relationship defining the capacitance value of the second capacitor C2 and the second resonance frequency, the capacitance value of the second capacitor C2 is controlled and adjusted.

[0048] Therefore, in the above radio frequency power supply device 10 of the present application, in some embodiments, both the first capacitor C1 and the second capacitor C2 are adjustable capacitors. By configuring the adjustment unit 500 to adjust the capacitance value of the first capacitor C1 and the capacitance value of the second capacitor C2, the first resonance frequency of the first harmonic processing module 310 and the second resonance frequency of the second harmonic processing module 320 can be correspondingly adjusted.

[0049] As Figure 1 、 Figure 2 、 Figure 3 shown, the radio frequency power supply device 10 further includes a control unit 600. The control unit 600 is connected to the adjustment unit 500. The control unit 600 is configured to control the adjustment unit 500 to adjust the capacitance value of the first capacitor C1 and the capacitance value of the second capacitor C2 so that the first resonance frequency and the second resonance frequency respectively correspond to the angular frequencies of the first sub-target harmonic and the second sub-target harmonic.

[0050] Please refer to Figure 4, Figure 4 Another circuit schematic diagram of the harmonic processing unit in some embodiments of the present application. As Figure 1 , Figure 2 , Figure 4 shown, the harmonic processing unit 300 includes a plurality of third harmonic processing modules 330. Each third harmonic processing module 330 is selectively connected or disconnected from the connection point between the waveform modulation unit 200 and the load, and each third harmonic processing module 330 is connected to the ground GND. Among them, the target harmonic processing module among the plurality of third harmonic processing modules 330 is used to connect to the connection point between the waveform modulation unit 200 and the load, operate at a preset resonance frequency to filter out the target harmonic, and the other third harmonic processing modules 330 are all disconnected from the connection point between the waveform modulation unit 200 and the load.

[0051] Thus, in some embodiments of the above radio frequency power supply device 10 of the present application, a plurality of third harmonic processing modules 330 are all selectively connected or disconnected from the connection point between the waveform modulation unit 200 and the load, and each third harmonic processing module 330 is connected to the ground GND. Thus, it can be ensured that the target harmonic processing module among the plurality of third harmonic processing modules 330 is connected to the connection point between the waveform modulation unit 200 and the load, operates at a preset resonance frequency to filter out the target harmonic, and can also realize the adjustment of the preset resonance frequency.

[0052] As Figure 1 , Figure 2 , Figure 4 shown, each third harmonic processing module 330 includes a first switch S1, a third capacitor C3, and a third inductor L3. The first switch S1, the third capacitor C3, and the third inductor L3 are sequentially connected between the connection point between the waveform modulation unit 200 and the load and the ground GND. Among them, the first switch S1 is turned on or off to connect or disconnect the corresponding third harmonic processing module 330 from the connection point between the waveform modulation unit 200 and the load.

[0053] As Figure 1 , Figure 2 , Figure 4 shown, the radio frequency power supply device 10 further includes a control unit 600. The control unit 600 is connected to each third harmonic processing module 330. The control unit 600 is used to determine the angular frequency of the target harmonic according to the angular frequency of the initial radio frequency electrical energy RF1 and the angular frequency of the pulsed radio frequency electrical energy RF2, and control the target harmonic processing module to connect to the connection point between the waveform modulation unit 200 and the load, and control the other third harmonic processing modules 330 to disconnect from the connection point between the waveform modulation unit 200 and the load.

[0054] Thus, in the above radio frequency power supply device 10 of the present application, by configuring the control unit 600 to switch the connection or disconnection of the connection points between each third harmonic processing module 330 and the waveform modulation unit 200 and the load, it is possible to make the target harmonic processing module among the plurality of third harmonic processing modules 330 operate at a preset resonance frequency.

[0055] Among them, the control unit 600 is used to control the target harmonic processing module among the plurality of third harmonic processing modules 330 to operate at a first resonance frequency and a second resonance frequency, so as to correspondingly filter out the first sub-target harmonic and the second sub-target harmonic in the pulsed radio frequency electrical energy RF2. For example, the number of target harmonic processing modules can be three, two of which operate at the first resonance frequency, and the other operates at the second resonance frequency.

[0056] Please refer to Figure 5 , Figure 5 which is another block diagram of the radio frequency power supply device in some embodiments of the present application. As Figure 5 shown, the radio frequency power supply device 10 further includes a control unit 600. The control unit 600 is connected to the harmonic processing unit 300. The control unit 600 is used to determine a preset resonance frequency according to the angular frequency of the initial radio frequency electrical energy RF1 and the angular frequency of the pulsed radio frequency electrical energy RF2, and control the harmonic processing unit 300 to operate at the preset resonance frequency.

[0057] In some embodiments, the control unit 600 can also be connected to the radio frequency source 100 and the waveform modulation unit 200 to obtain the angular frequency of the initial radio frequency electrical energy RF1 and the angular frequency of the pulsed radio frequency electrical energy RF2. Among them, the angular frequency of the initial radio frequency electrical energy RF1 is also the angular frequency of the high-level stage of the pulsed radio frequency electrical energy RF2 in each preset period.

[0058] As Figure 5 shown, the radio frequency power supply device 10 further includes an impedance matching unit 700. The impedance matching unit 700 is connected to the waveform modulation unit 200, and the impedance matching unit 700 is also connected to the harmonic processing unit 300 and the output terminal 400. Among them, the impedance matching unit 700 is used to perform impedance matching on the radio frequency source 100, the harmonic processing unit 300, and the load.

[0059] Thus, in the above radio frequency power supply device 10 of the present application, since the harmonic processing unit 300 is provided and the harmonic processing unit 300 has a certain impedance value, the impedance matching unit 700 needs to perform impedance matching on the radio frequency source 100, the harmonic processing unit 300, and the load to reduce the reflected power and avoid adverse effects on the radio frequency source 100.

[0060] In some embodiments, the control unit 600 may determine the first resonance frequency and the second resonance frequency according to the angular frequency of the initial radio frequency electrical energy RF1 and the angular frequency of the pulsed radio frequency electrical energy RF2, and control the harmonic processing unit 300 to operate at the first resonance frequency and the second resonance frequency. For example, as described above, the control unit 600 may determine a preset resonance frequency according to the angular frequency of the initial radio frequency electrical energy RF1 and the angular frequency of the pulsed radio frequency electrical energy RF2, and then control the adjustment unit 500 to adjust the capacitance values of the first capacitor C1 and the second capacitor C2, so as to control the harmonic processing unit 300 to operate at the preset resonance frequency, that is, to operate at the first resonance frequency and the second resonance frequency.

[0061] In some embodiments, the control unit 600 may also determine the angular frequency of the target harmonic according to the angular frequency of the initial radio frequency electrical energy RF1 and the angular frequency of the pulsed radio frequency electrical energy RF2, and control the connection point between the target harmonic processing module and the waveform modulation unit 200 and the load to be connected according to the angular frequency of the target harmonic, and control the connection point between other third harmonic processing modules 330 and the waveform modulation unit 200 and the load to be disconnected, so that the current third harmonic processing module 330 operates at the corresponding preset resonance frequency.

[0062] In some embodiments, the control unit 600 may also be connected to the impedance matching unit 700, and the control unit 600 is used to control the impedance matching unit 700 to perform impedance matching on the radio frequency source 100, the harmonic processing unit 300, and the load.

[0063] In some embodiments, the control unit 600 may be a general-purpose processor such as a Central Processing Unit (CPU), or may be a Digital Signal Processor (DSP), an Application Specific Integrated Circuit (ASIC), a Field-Programmable Gate Array (FPGA), or other programmable logic devices, discrete gate logic devices, transistor logic devices, etc. logical control devices, or may also be a microprocessor such as a Micro Control Unit (MCU).

[0064] The RF power supply device 10 of the present application, through the above structure, can determine that the target harmonics in the output process of the pulsed RF electrical energy RF2 specifically include the first sub-target harmonic and the second sub-target harmonic, and can respectively determine the angular frequencies of the first sub-target harmonic and the second sub-target harmonic. Furthermore, by controlling and adjusting the first resonance frequency and the second resonance frequency of the harmonic processing unit 300 to correspond to the angular frequencies of the first sub-target harmonic and the second sub-target harmonic respectively, all the target harmonics in the pulsed RF electrical energy RF2 can be accurately filtered out, improving the output effect.

[0065] Please refer to Figure 6 , Figure 6 which is a block schematic diagram of the RF power supply system in some embodiments of the present application. As Figure 6 shown, the present application also provides an RF power supply system 1, and the RF power supply system 1 includes the RF power supply device 10 in any of the foregoing embodiments.

[0066] Please refer to again Figure 1 . As Figure 1 shown, the RF power supply device 10 includes an RF source 100, a waveform modulation unit 200, a harmonic processing unit 300, and an output terminal 400. The waveform modulation unit 200 is connected between the RF source 100 and the output terminal 400. The harmonic processing unit 300 is connected between the connection point between the waveform modulation unit 200 and the output terminal 400 and the ground GND. The output terminal 400 is used to connect to a load. The RF source 100 is used to output the initial RF electrical energy RF1, and the waveform of the initial RF electrical energy RF1 is a sine wave. The waveform modulation unit 200 is used to receive the initial RF electrical energy RF1 and alternately conduct or disconnect at a preset period to obtain the pulsed RF electrical energy RF2 and transmit it to the load through the output terminal 400. The harmonic processing unit 300 is used to operate at a preset resonance frequency to filter out the target harmonics in the pulsed RF electrical energy RF2, where the preset resonance frequency is related to the angular frequency of the target harmonics.

[0067] Among them, for the more specific structure of the RF power supply device 10, reference can be made to the relevant content of the RF power supply device 10 in any of the foregoing embodiments, which will not be elaborated here.

[0068] The RF power supply device 10 and the RF power supply system 1 of the present application, through the above structure, can determine that the target harmonics in the output process of the pulsed RF electrical energy RF2 specifically include the first sub-target harmonic and the second sub-target harmonic, and can respectively determine the angular frequencies of the first sub-target harmonic and the second sub-target harmonic. Furthermore, by controlling and adjusting the first resonance frequency and the second resonance frequency of the harmonic processing unit 300 to correspond to the angular frequencies of the first sub-target harmonic and the second sub-target harmonic respectively, all the target harmonics in the pulsed RF electrical energy RF2 can be accurately filtered out, improving the output effect.

[0069] The above description is only a specific implementation manner of the present application, but the protection scope of the present application is not limited thereto. Any person skilled in the art within the technical scope disclosed by the present application can easily think of changes or substitutions, which should all be covered within the protection scope of the present application; without conflict, the embodiments of the present application and the features in the embodiments can be combined with each other. Therefore, the protection scope of the present application shall be subject to the protection scope of the claims.

Claims

1. A radio frequency power supply device, characterized in that: It includes a radio frequency source, a waveform modulation unit, a harmonic processing unit and an output end, wherein the waveform modulation unit is connected between the radio frequency source and the output end, the harmonic processing unit is connected between the connection point between the waveform modulation unit and the output end and the ground, and the output end is used to be connected to a load; The radio frequency source is used to output initial radio frequency electric energy, and the waveform of the initial radio frequency electric energy is a sine wave; The waveform modulation unit is used to receive the initial radio frequency power and to be alternately turned on or off at a preset period to obtain pulsed radio frequency power and transmit it to the load through the output end; The harmonic processing unit is used to operate at a preset resonant frequency to filter out target harmonics in the pulsed RF power, wherein the preset resonant frequency is related to an angular frequency of the target harmonics.

2. The radio frequency power supply device according to claim 1, characterized in that: The preset resonant frequency includes a first resonant frequency and a second resonant frequency, and the target harmonic includes a first sub-target harmonic and a second sub-target harmonic; The harmonic processing unit is used to operate at the first resonant frequency and the second resonant frequency to filter out the first sub-target harmonic and the second sub-target harmonic in the pulsed RF power, wherein the first resonant frequency and the second resonant frequency are both obtained according to the angular frequency of the initial RF power and the angular frequency of the pulsed RF power.

3. The radio frequency power supply device according to claim 2, characterized in that: The first resonant frequency is the frequency corresponding to the sum of the angular frequency of the initial RF power and the angular frequency of the pulsed RF power, and the second resonant frequency is the frequency corresponding to the difference between the angular frequency of the initial RF power and the angular frequency of the pulsed RF power.

4. The radio frequency power supply device according to claim 2, characterized in that: The harmonic processing unit includes a first harmonic processing module and a second harmonic processing module, wherein the first harmonic processing module and the second harmonic processing module are both connected between a connection point between the waveform modulation unit and the load and the ground; The first harmonic processing module is used to operate at the first resonant frequency to filter out the first sub-target harmonic in the pulsed RF power, and the second harmonic processing module is used to operate at the second resonant frequency to filter out the second sub-target harmonic in the pulsed RF power.

5. The radio frequency power supply device according to claim 4, characterized in that: The first harmonic processing module includes a first capacitor and a first inductor, wherein the first capacitor and the first inductor are sequentially connected between a connection point between the waveform modulation unit and the load and ground, wherein the first resonant frequency of the first capacitor and the first inductor corresponds to an angular frequency of the first sub-target harmonic, so as to filter out the first sub-target harmonic; The second harmonic processing module includes a second capacitor and a second inductor, and the second capacitor and the second inductor are connected in sequence between a connection point between the waveform modulation unit and the load and ground, wherein the second resonant frequency of the second capacitor and the second inductor corresponds to an angular frequency of the second sub-target harmonic to filter out the second sub-target harmonic.

6. The radio frequency power supply device according to claim 5, characterized in that: The first capacitor and the second capacitor are both adjustable capacitors; The RF power supply device further includes an adjustment unit, the adjustment unit being connected to both the first capacitor and the second capacitor, and the adjustment unit being used to adjust the capacitance value of the first capacitor and the capacitance value of the second capacitor to correspondingly adjust the first resonant frequency of the first harmonic processing module and the second resonant frequency of the second harmonic processing module; The first resonant frequency changes as the angular frequency of the first sub-target harmonic changes, and the second resonant frequency changes as the angular frequency of the second sub-target harmonic changes.

7. The radio frequency power supply device according to claim 1, characterized in that: The harmonic processing unit includes a plurality of third harmonic processing modules, each of which is selectively connected to or disconnected from a connection point between the waveform modulation unit and the load, and each of which is connected to the ground; Among them, the target harmonic processing module among the multiple third harmonic processing modules is used to be connected to the connection point between the waveform modulation unit and the load, and to operate at the preset resonant frequency to filter out the target harmonic, and the other third harmonic processing modules are disconnected from the connection point between the waveform modulation unit and the load.

8. The radio frequency power supply device according to claim 7, characterized in that: The RF power supply device also includes a control unit, which is connected to each third harmonic processing module. The control unit is used to determine the angular frequency of the target harmonic according to the angular frequency of the initial RF power and the angular frequency of the pulsed RF power, and control the target harmonic processing module to be connected to the connection point between the waveform modulation unit and the load according to the angular frequency of the target harmonic, and control the other third harmonic processing modules to be disconnected from the connection point between the waveform modulation unit and the load.

9. The radio frequency power supply device according to claim 1, characterized in that: The RF power supply device also includes a control unit, which is connected to the harmonic processing unit. The control unit is used to determine the preset resonant frequency according to the angular frequency of the initial RF power and the angular frequency of the pulsed RF power, and control the harmonic processing unit to operate at the preset resonant frequency.

10. A radio frequency power supply system, characterized in that: Comprising a radio frequency power supply device as described in any one of claims 1 to 9.

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