Etching and soaking device and method for manufacturing anti-glare (AG) glass anti-dazzle layer

Abstract

The invention relates to the technical field of etching, and discloses an etching and soaking device and method for manufacturing an AG glass anti-dazzle layer, the etching and soaking device comprises a machine body and a protective shell installed at the top of the machine body, the machine body is internally provided with an etching tank and two cleaning tanks, and the etching tank is located between the two cleaning tanks; a liftable stabilizing frame is arranged in the machine body, a placing frame for the AG glass is placed on the stabilizing frame, and the AG glass on the placing frame is driven by the stabilizing frame to repeatedly move up and down in etching liquid of the etching groove so as to remove bubbles attached to the surface of the AG glass. The multi-electric-field partition technology is adopted, the anode electrode plates and the cathode electrode plates which are distributed in a staggered mode form an independent electric field, each piece of AG glass is located in an exclusive electric field area, the problem of edge electric field attenuation is effectively avoided, ions can be driven to migrate under the action of the electric field, and the etching uniformity is improved.

Description

Technical Field

[0001] The invention relates to the technical field of etching, and in particular to an etching immersion device and method for manufacturing an anti-glare layer of an AG glass. Background Art

[0002] AG glass anti-glare layer etching is a key technology that forms a microstructure on the glass surface through a specific process to reduce the reflected light on the glass surface and reduce glare. It is widely used in many fields. AG glass anti-glare layer etching is mainly based on the principles of chemical etching and physical etching. Chemical etching usually uses etching solutions such as hydrofluoric acid to react chemically with silicon dioxide in the glass. By controlling the reaction conditions, tiny concave and convex structures are formed on the glass surface, changing the reflection and scattering characteristics of light, thereby achieving the purpose of anti-glare; physical etching uses high-energy beams such as ion beams and lasers to bombard the glass surface, so that the atoms on the glass surface are peeled off, forming a microstructure with anti-glare function.

[0003] The glass is immersed in an etching solution and etched through a chemical reaction. This method has simple equipment and low cost, but the ion utilization rate is not high during the etching process, the consumption of etching solution (such as hydrofluoric acid, etc.) is large, and the local concentration difference of the etching solution is large, which further aggravates the problem of uneven etching and is difficult to meet the needs of modern high-precision and high-quality AG glass anti-glare layer manufacturing. For this reason, an AG glass anti-glare layer manufacturing etching immersion device and method are needed. Summary of the invention

[0004] In view of the above-mentioned deficiencies in the prior art, the present invention provides an etching immersion device and method for manufacturing an anti-glare layer of AG glass, which adopts electric field technology to drive the directional migration of hydrogen ions and fluorine ions, reduce the thickness of the diffusion layer, and greatly improve the etching accuracy and consistency.

[0005] The present invention provides the following technical solution: an AG glass anti-glare layer manufacturing etching and immersion device, comprising a body and a protective shell installed on the top of the body, wherein an etching tank and two cleaning tanks are arranged inside the body, and the etching tank is located between the two cleaning tanks;

[0006] The machine body is provided with a stabilizing frame that can be raised and lowered, on which a placing frame for AG glass is placed, and the AG glass on the placing frame is driven by the stabilizing frame to repeatedly move up and down in the etching liquid of the etching tank to remove bubbles attached to the surface;

[0007] The stabilizing rack is provided with an electric field structure, through which multiple separate electric fields are constructed inside the etching tank, and each AG glass on the placement rack is placed in each local electric field, and the local electric field drives the ions to migrate, thereby improving the etching uniformity. After the stabilizing rack drives the electric field structure out of the etching tank, the positive and negative electrodes of the electric field structure are separated and introduced into two cleaning tanks for separate cleaning;

[0008] The electric field structure includes flippable anode electrode sheets and cathode electrode sheets that are staggered and equidistantly distributed. A single electric field is formed between each anode electrode sheet and cathode electrode sheet. Under the action of the electric field, etching of the AG glass is assisted.

[0009] Preferably, the electric field structure includes an anode shaft rod and a cathode shaft rod arranged on a stabilizing frame, and rectangular frames are installed on the anode shaft rod and the cathode shaft rod in a staggered manner. Anode electrode sheets and cathode electrode sheets are respectively installed in the rectangular frames of the anode shaft rod and the cathode shaft rod. The anode electrode sheets and cathode electrode sheets are staggered and equidistantly distributed inside the etching groove to form multiple electric fields.

[0010] Preferably, the electric field structure also includes a transmission structure for driving the anode shaft and the cathode shaft to rotate, and the transmission structure drives the anode shaft and the cathode shaft to rotate, so that the anode electrode sheet and the cathode electrode sheet are flipped and separated, and introduced into two cleaning tanks for electrode cleaning.

[0011] Preferably, the stabilizing frame includes two movable tables arranged in the machine body, and the two movable tables are driven to rise and fall by an electric cylinder at the bottom, and two U-shaped brackets extending into the interior of the etching groove are installed between the two movable tables, and several groups of equidistantly distributed recessed blocks are installed on the U-shaped bracket, and the rectangular frame is in contact with the recessed grooves of the recessed blocks to stabilize the electric field structure.

[0012] Preferably, the placement rack includes four support beams, and fixed beams are installed on the top of both ends of the four support beams, handles are installed on two of the fixed beams, and positioning racks for fixing the AG glass are equidistantly installed on the top of the two support beams, so that the AG glass on the positioning rack is located between the anode electrode sheet and the cathode electrode sheet and distributed in each electric field.

[0013] Preferably, the positioning frame includes a support block and a guide column installed on the support block, the support block is provided with a positioning groove, the guide column is provided with a slidable counterweight block, and a downward-facing L-shaped clip is installed on the side of the counterweight block, the bottom of the AG glass is located in the positioning groove of the support block, and the top of the AG glass is inserted and fixed by the counterweight block and the L-shaped clip.

[0014] Preferably, the installation directions of two adjacent positioning frames are opposite, so that the fixing directions of the two adjacent positioning frames to the AG glass are opposite, so that the anti-glare layer of the AG glass always faces the anode in the electric field.

[0015] Preferably, the four support beams are respectively placed between the bottom of the U-shaped bracket, and the parts of the two ends of the four support beams extending from the fixed beam are clamped on the side frame of the U-shaped bracket, which limits the placement position of the positioning frame and allows the positioning frame to be accurately placed on the placement frame.

[0016] Preferably, a guide shell is installed inside the etching tank, and a water pump is installed inside the guide shell, and a row of obliquely spraying drain pipes and water inlets are installed at the bottom of the guide shell, and the drain pipes and the water inlets are respectively connected to the water pump through pipes, and the etching liquid is pushed to circulate around the guide shell by spraying through the drain pipe, driving the etching liquid to pass through the AG glass, thereby improving the uniformity of anti-glare etching.

[0017] An AG glass anti-glare layer manufacturing etching and immersion method, the specific operation is as follows:

[0018] S1, placing the AG glass on a placement rack in the forward and reverse directions, and placing the placement rack on a stable rack, and then flipping the electric field structure so that the anode electrode sheet and the cathode electrode sheet are inserted between each AG glass;

[0019] S2, the stabilizing frame drives the placement frame and the AG glass thereon to move downward and immerse them in the etching solution in the etching tank, and the stabilizing frame repeatedly drives the AG glass to move up and down repeatedly in the etching solution to remove bubbles attached to the surface;

[0020] S3, the stabilizing frame stops moving, the electric field structure starts to be energized, an electric field is generated between the anode electrode sheet and the cathode electrode sheet, and ion migration is accelerated;

[0021] S4. After etching, the electric field structure stops being energized, and the stabilizing frame drives the placement frame to move upward and out of the etching tank. Then the electric field structure flips over, so that the anode electrode sheet and the cathode electrode sheet flip 270 degrees, and the placement frame is taken out, and the stabilizing frame drives the electric field structure to move downward, so that the anode electrode sheet and the cathode electrode sheet are respectively introduced into two cleaning tanks for cleaning.

[0022] Compared with the prior art, the present invention has the following beneficial effects:

[0023] (1) The multi-electric field partitioning technology is adopted to form an independent electric field through the staggered distribution of anode electrode sheets and cathode electrode sheets. Each piece of AG glass is in an exclusive electric field area, which effectively avoids the problem of edge electric field attenuation. Under the action of the electric field, it can drive the migration of ions and improve the etching uniformity. At the same time, the electric field drives the directional migration of hydrogen ions and fluorine ions, reduces the thickness of the diffusion layer, allows the reactants to quickly contact the glass surface, selectively enhances the target reaction, reduces the interference of inactive ions, strictly controls the difference in etching depth within a reasonable range, and greatly improves the etching accuracy and consistency.

[0024] (2) The positioning frame on the placement frame can firmly fix the AG glass through the positioning groove, counterweight block and L-shaped clamp, and the adjacent positioning frames are installed in opposite directions to ensure that the anti-glare layer of the AG glass always faces the anode in the electric field; at the same time, the support beam and the U-shaped bracket cooperate to accurately define the placement position of the positioning frame to avoid excessive obstruction of the anti-glare layer of the AG glass, which affects the etching effect.

[0025] (3) The stabilizing rack can drive the AG glass on the placement rack to move up and down repeatedly in the etching liquid in the etching tank, effectively removing bubbles attached to the surface, preventing bubbles from affecting the etching process, and preventing uneven etching, thereby improving the etching quality; in addition, the etching liquid is driven to circulate in the etching tank by a water pump, and bubbles on the glass can also be removed before the electric field is established, further ensuring the etching effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 It is a schematic diagram of the overall structure of the present invention;

[0027] Figure 2 It is a schematic diagram of the internal structure of the body of the present invention;

[0028] Figure 3 It is a schematic diagram of the internal structure of the etching tank of the present invention;

[0029] Figure 4 It is a schematic diagram of the positions of the stabilizing frame, the placing frame and the electric field structure of the present invention;

[0030] Figure 5 This is a schematic diagram of the coordination structure of the stabilizing frame and the placing frame of the present invention;

[0031] Figure 6 It is a structural schematic diagram of the placement rack of the present invention;

[0032] Figure 7 It is a structural schematic diagram of the positioning frame of the present invention;

[0033] Figure 8 It is a structural schematic diagram of the guide housing of the present invention;

[0034] Fig. 9 For the present invention Figure 8 Schematic diagram of the internal structure.

[0035] In the figure: 1. body; 2. protective shell; 3. etching tank; 4. cleaning tank; 5. stabilizing frame; 6. placement frame; 7. electric field structure; 8. guide shell; 9. drain pipe; 10. water inlet; 71. anode shaft; 72. cathode shaft; 73. rectangular frame; 74. anode electrode sheet; 75. cathode electrode sheet; 51. movable table; 52. U-shaped bracket; 53. concave block; 54. electric cylinder; 61. support beam; 62. fixed beam; 63. handle; 64. positioning frame; 641. support block; 642. guide column; 643. positioning groove; 644. counterweight block; 645. L-shaped clamp. DETAILED DESCRIPTION

[0036] In order to make the objectives, technical solutions and advantages of the embodiments of the present disclosure clearer, the technical solutions of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings of the embodiments of the present disclosure. In order to keep the following description of the embodiments of the present disclosure clear and concise, the present disclosure omits detailed descriptions of known functions and known components to avoid unnecessary confusion of the concepts of the present invention.

[0037] See also Figure 1 The AG glass anti-glare layer manufacturing etching and soaking device of the present invention has a body 1 as the basic supporting structure of the entire device, providing installation space for various internal components. A protective shell 2 is installed on the top of the body 1, and an observation window is provided on the protective shell 2 for monitoring the internal etching process, which can effectively protect the internal structure from the influence of external environmental factors and provide certain safety protection for the operator.

[0038] See also Figure 2 and Figure 3 The etching tank 3 and two cleaning tanks 4 are arranged inside the body 1, wherein the etching tank 3 is located between the two cleaning tanks 4, forming a reasonable functional zoning layout. The etching tank 3 is used to hold etching liquid to etch the AG glass; the cleaning tank 4 is used to clean the electrode sheet of the electric field structure 7 to ensure the cleanliness of the electrode sheet to maintain its good working performance.

[0039] See also Figure 4 and Figure 5 , the stabilizing frame 5 plays a key role in the device. It includes two movable tables 51 arranged in the body 1, and the two movable tables 51 are driven by the electric cylinder 54 at the bottom to realize the lifting function. The electric cylinder 54 provides a stable and precise driving force, and can flexibly control the lifting height of the movable table 51 according to the actual etching requirements. Two U-shaped brackets 52 extending into the inside of the etching groove 3 are installed between the two movable tables 51, and several groups of equidistantly distributed concave blocks 53 are installed on the U-shaped bracket 52. During actual installation, the rectangular frame 73 is in close contact with the groove of the concave block 53. Through this matching method, it plays a stabilizing supporting role for the electric field structure 7, ensuring that the electric field structure 7 remains stable during operation without shaking or deviation.

[0040] The AG glass on the placement frame 6 is driven by the stabilizing frame 5 to move up and down repeatedly in the etching solution of the etching tank 3 to remove bubbles attached to the surface. Since the glass is immersed in the etching solution, air bubbles may be attached to the glass, which affects the etching process and therefore needs to be removed.

[0041] See also Figure 6The placement rack 6 is used to carry the AG glass. It includes four support beams 61, and fixed beams 62 are installed on the tops of both ends of the four support beams 61. Handles 63 are installed on the two fixed beams 62, and the handles 63 are convenient for operators to carry the placement rack 6. Positioning racks 64 are installed at equal distances on the tops of the two support beams 61, and the positioning racks 64 are used to fix the AG glass.

[0042] See also Figure 7 The positioning frame 64 includes a support block 641 and a guide column 642 installed on the support block 641. The support block 641 is provided with a positioning groove 643. The guide column 642 is provided with a slidable counterweight block 644, and a downward-facing L-shaped clamp 645 is installed on the side of the counterweight block 644. When fixing the AG glass, the bottom of the AG glass is placed in the positioning groove 643 of the support block 641, and then the counterweight block 644 is slid to insert the L-shaped clamp 645 into the top of the AG glass to achieve a firm fixation of the AG glass.

[0043] The installation directions of two adjacent positioning frames 64 are opposite. This design makes the fixing directions of the two adjacent positioning frames 64 to the AG glass opposite, thereby ensuring that the anti-glare layer of the AG glass always faces the anode in the electric field to obtain a better etching effect. The four support beams 61 are respectively placed between the bottoms of the U-shaped brackets 52, and the parts of the two ends of the four support beams 61 extending from the fixed beams 62 are stuck on the side frame of the U-shaped bracket 52. In this way, the placement position of the positioning frame 64 is precisely defined to ensure that the positioning frame 64 is accurately placed on the placement frame 6, thereby ensuring the position accuracy of the AG glass during the etching process.

[0044] The electric field structure 7 is one of the core components of the present device. It includes an anode shaft 71, a cathode shaft 72, a rectangular frame 73, an anode electrode sheet 74 and a cathode electrode sheet 75. The rectangular frame 73 is staggeredly installed on the anode shaft 71 and the cathode shaft 72, and the anode electrode sheet 74 and the cathode electrode sheet 75 are respectively installed in the rectangular frame 73. The rectangular frame 73 is used to protect the anode electrode sheet 74 and the cathode electrode sheet 75 to prevent them from being deformed. The anode electrode sheet 74 and the cathode electrode sheet 75 are staggered and equidistantly distributed inside the etching tank 3 to form multiple independent electric field areas. An electric field can be generated between each anode electrode sheet 74 and the cathode electrode sheet 75, and under the action of the etching solution of the mixed conductive liquid, ions can be driven to migrate, thereby improving the etching uniformity.

[0045] The electric field structure 7 also includes a transmission structure for driving the anode shaft 71 and the cathode shaft 72 to rotate. The transmission structure can be a combination of a motor and a gear transmission, etc., and the anode shaft 71 and the cathode shaft 72 are driven to rotate by the transmission structure to realize the flipping and separation of the anode electrode sheet 74 and the cathode electrode sheet 75. After the etching is completed, the anode electrode sheet 74 and the cathode electrode sheet 75 are flipped 270 degrees by the transmission structure, and are respectively introduced into two cleaning tanks 4 for cleaning, effectively removing the etching solution and impurities remaining on the surface of the electrode sheet, and ensuring the cleanliness and stable performance of the electrode sheet. At the same time, during the flipping process of the anode shaft 71 and the cathode shaft 72, the anode electrode sheet 74 and the cathode electrode sheet 75 will not contact the anode shaft 71 and the cathode shaft 72, and the anode electrode sheet 74 and the cathode electrode sheet 75 can be flipped smoothly.

[0046] Electric field (usually 10-20VDC or pulse) drive (hydrogen ions) and (fluoride ions) directional migration, reducing the thickness of the diffusion layer, allowing the reactants to quickly contact the glass surface; the electric field selectively enhances the target reaction ( ), reducing inactive ions (such as ) interference; the electric field direction guides ion migration to form regular micro-pits (such as hexagonal honeycomb structure), which are used for anti-glare (Haze value 8±1%) or grating (period accuracy ±50nm); the ion utilization rate is improved, the HF consumption is reduced by 20-30%, and the cost of waste liquid treatment is reduced.

[0047] See also Figure 8 and Fig. 9 A guide housing 8 is installed inside the etching tank 3, a water pump is installed inside the guide housing 8, and a row of obliquely sprayed drain pipes 9 and water inlets 10 are installed at the bottom of the guide housing 8. The drain pipes 9 and the water inlets 10 are connected to the water pump through pipelines. When the water pump is working, the etching liquid is sucked from the water inlet 10, and then obliquely sprayed through the drain pipe 9, pushing the etching liquid to circulate around the guide housing 8. This circulating etching liquid can evenly pass through the surface of the AG glass, further improving the uniformity of anti-glare etching.

[0048] The etching liquid is driven to circulate by a water pump (flow rate 0.3-0.5m / s) to eliminate local concentration differences and avoid over-etching or under-etching. During the construction of the electric field, the etching liquid circulates to impact the glass and remove bubbles on the glass.

[0049] When the device is actually used to perform etching and soaking of the AG glass anti-glare layer, the specific operation steps are as follows:

[0050] S1. The operator places the AG glass accurately in the positioning frame 64 on the placement frame 6 in the forward and reverse directions, and fixes the AG glass through the positioning frame 64 to ensure the stability of the position of the AG glass. After that, the transmission structure of the electric field structure 7 is started to turn the anode electrode sheet 74 and the cathode electrode sheet 75 over and insert them between each AG glass to form multiple electric field areas, so as to prepare for the subsequent etching work.

[0051] S2, start the electric cylinder 54, the stabilizing frame 5 drives the placing frame 6 and the AG glass thereon to move downward and immerse in the etching solution of the etching tank 3. During the immersion process, the stabilizing frame 5 repeatedly drives the AG glass to move up and down in the etching solution, in this way, the bubbles attached to the surface of the AG glass are effectively removed. Because the presence of bubbles will affect the etching effect and cause uneven etching, removing bubbles is an important step to ensure the etching quality.

[0052] S3, when the stabilizing frame 5 stops moving, the electric field structure 7 is powered on. At this time, an electric field is generated between the anode electrode sheet 74 and the cathode electrode sheet 75, and under the action of the electric field, ion migration is accelerated, thereby achieving efficient etching of the AG glass and improving etching uniformity and etching quality.

[0053] S4. After etching is completed, first, the electric field structure 7 is powered off, and then the electric cylinder 54 is started, and the stabilizing frame 5 drives the placement frame 6 to move up and out of the etching tank 3. Then, the transmission structure of the electric field structure 7 is started again, so that the anode electrode sheet 74 and the cathode electrode sheet 75 are turned over 270 degrees, and then the placement frame 6 is taken out. The stabilizing frame 5 continues to drive the electric field structure 7 to move down, so that the anode electrode sheet 74 and the cathode electrode sheet 75 are respectively introduced into the two cleaning tanks 4, and the cleaning liquid in the cleaning tank 4 is used to clean the electrode sheets, remove the etching liquid and impurities remaining on the surface of the electrode sheets, and prepare for the next etching work.

[0054] Through the above specific implementation methods, the AG glass anti-glare layer manufacturing etching and immersion device of the present invention can achieve efficient and uniform etching work, while ensuring the cleanliness of the electrode sheet and improving the service life and working stability of the device.

[0055] The above embodiments are only exemplary embodiments of the present invention and are not intended to limit the present invention. The protection scope of the present invention is defined by the claims. Those skilled in the art may make various modifications or equivalent substitutions to the present invention within the essence and protection scope of the present invention, and such modifications or equivalent substitutions shall also be deemed to fall within the protection scope of the present invention.

Claims

1. An AG glass anti-glare layer manufacturing etching and immersion device, characterized in that: It comprises a machine body (1) and a protective shell (2) mounted on the top of the machine body (1), wherein an etching tank (3) and two cleaning tanks (4) are provided inside the machine body (1), and the etching tank (3) is located between the two cleaning tanks (4); The machine body (1) is provided with a stabilizing frame (5) that can be raised and lowered, and a placement frame (6) for AG glass is placed on the stabilizing frame (5). The stabilizing frame (5) drives the AG glass on the placement frame (6) to repeatedly move up and down in the etching liquid in the etching tank (3) to remove bubbles attached to the surface; The stabilizing frame (5) is provided with an electric field structure (7), and a plurality of separate electric fields are constructed inside the etching groove (3) through the electric field structure (7), and each AG glass on the placement frame (6) is placed in each local electric field, and the local electric field drives the ions to migrate, thereby improving the etching uniformity. After the stabilizing frame (5) drives the electric field structure (7) to move out of the etching groove (3), the positive and negative electrodes of the electric field structure (7) are separated and introduced into two cleaning grooves (4) for separate cleaning; The electric field structure (7) comprises flippable anode electrode sheets (74) and cathode electrode sheets (75) that are staggered and equidistantly distributed, and a single electric field is formed between each anode electrode sheet (74) and cathode electrode sheet (75). Under the action of the electric field, etching of the AG glass is assisted.

2. The etching and immersion device for manufacturing an anti-glare layer of AG glass according to claim 1, characterized in that: The electric field structure (7) comprises an anode shaft (71) and a cathode shaft (72) arranged on a stabilizing frame (5); rectangular frames (73) are installed on the anode shaft (71) and the cathode shaft (72) in a staggered manner; anode electrode sheets (74) and cathode electrode sheets (75) are installed in the rectangular frames (73) of the anode shaft (71) and the cathode shaft (72), respectively; the anode electrode sheets (74) and the cathode electrode sheets (75) are staggered and equidistantly distributed inside the etching groove (3), forming a plurality of electric fields.

3. The etching and immersion device for manufacturing an anti-glare layer of AG glass according to claim 1, characterized in that: The electric field structure (7) further comprises a transmission structure for driving the anode shaft (71) and the cathode shaft (72) to rotate. The transmission structure drives the anode shaft (71) and the cathode shaft (72) to rotate, so that the anode electrode sheet (74) and the cathode electrode sheet (75) are flipped and separated, and introduced into two cleaning tanks (4) for electrode cleaning.

4. The etching and immersion device for manufacturing an anti-glare layer of AG glass according to claim 1, characterized in that: The stabilizing frame (5) comprises two movable platforms (51) arranged in the machine body (1), and the two movable platforms (51) are driven to rise and fall by electric cylinders (54) at the bottom, and two U-shaped brackets (52) extending into the interior of the etching groove (3) are installed between the two movable platforms (51), and a plurality of groups of equidistantly distributed concave blocks (53) are installed on the U-shaped brackets (52), and the rectangular frame (73) is in contact with the grooves of the concave blocks (53), so as to stabilize the electric field structure (7).

5. The etching and immersion device for manufacturing an anti-glare layer of AG glass according to claim 4, characterized in that: The placement frame (6) comprises four support beams (61), and fixed beams (62) are installed on the tops of both ends of the four support beams (61), and handles (63) are installed on the two fixed beams (62), and positioning frames (64) for fixing AG glass are installed at equal distances on the tops of the two support beams (61), so that the AG glass on the positioning frames (64) is located between the anode electrode sheet (74) and the cathode electrode sheet (75) and is distributed in each electric field.

6. The etching and immersion device for manufacturing an anti-glare layer of AG glass according to claim 5, characterized in that: The positioning frame (64) comprises a support block (641) and a guide column (642) mounted on the support block (641); a positioning groove (643) is provided on the support block (641); a slidable counterweight block (644) is provided on the guide column (642); and a downward-facing L-shaped clamp (645) is mounted on the side of the counterweight block (644); the bottom of the AG glass is located in the positioning groove (643) of the support block (641), and the top of the AG glass is inserted and fixed by the counterweight block (644) and the L-shaped clamp (645).

7. The etching and immersion device for manufacturing an anti-glare layer of AG glass according to claim 5, characterized in that: The installation directions of two adjacent positioning frames (64) are opposite, so that the fixing directions of the two adjacent positioning frames (64) on the AG glass are opposite, so that the anti-glare layer of the AG glass always faces the anode in the electric field.

8. The etching and immersion device for manufacturing an anti-glare layer of AG glass according to claim 5, characterized in that: The four support beams (61) are respectively placed between the bottoms of the U-shaped brackets (52), and the portions of the two ends of the four support beams (61) extending from the fixed beams (62) are clamped on the side frames of the U-shaped brackets (52), thereby limiting the placement position of the positioning frame (64) so ​​that the positioning frame (64) is accurately placed on the placement frame (6).

9. The etching and immersion device for manufacturing an anti-glare layer of AG glass according to claim 1, characterized in that: A guide housing (8) is installed inside the etching tank (3), and a water pump is installed inside the guide housing (8). A row of obliquely spraying drain pipes (9) and a water inlet (10) are installed at the bottom of the guide housing (8), and the drain pipes (9) and the water inlet (10) are respectively connected to the water pump through pipelines. The etching liquid is pushed by the drain pipes (9) to circulate around the guide housing (8), driving the etching liquid to pass through the AG glass, thereby improving the uniformity of the anti-glare etching.

10. An etching and immersion method for manufacturing an anti-glare layer of AG glass, characterized in that: The etching and immersion device for manufacturing the anti-glare layer of AG glass according to any one of claims 1 to 9 is specifically operated as follows: S1, placing the AG glass on a placement rack (6) in the forward and reverse directions, and placing the placement rack (6) on a stabilizing rack (5), and then flipping the electric field structure (7) so that the anode electrode sheet (74) and the cathode electrode sheet (75) are inserted between each AG glass; S2, the stabilizing frame (5) drives the placement frame (6) and the AG glass thereon to move downward and immerse them in the etching solution in the etching tank (3), and the stabilizing frame (5) repeatedly drives the AG glass to move up and down repeatedly in the etching solution to remove bubbles attached to the surface; S3, the stabilizing frame (5) stops moving, the electric field structure (7) starts to be energized, an electric field is generated between the anode electrode sheet (74) and the cathode electrode sheet (75), and ion migration is accelerated; S4. After etching, the electric field structure (7) stops being energized, and the stabilizing frame (5) drives the placement frame (6) to move upward and out of the etching tank (3). Then, the electric field structure (7) is flipped, so that the anode electrode sheet (74) and the cathode electrode sheet (75) are flipped 270 degrees, and the placement frame (6) is taken out, and the stabilizing frame (5) drives the electric field structure (7) to move downward, so that the anode electrode sheet (74) and the cathode electrode sheet (75) are respectively introduced into two cleaning tanks (4) for cleaning.

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