Preparation method of antibacterial composite coating on surface of alloy material medical device

Abstract

The invention belongs to the technical field of preparation of antibacterial composite coatings, and particularly relates to a preparation method of an antibacterial composite coating on the surface of an alloy material medical instrument, which comprises the following steps: S1, thoroughly cleaning a medical instrument base material to remove pollutants and oxides on the surface; s2, putting the cleaned medical instrument base material into a vacuum sputtering chamber, and reducing the indoor pressure to a specific range by using a high vacuum pump so as to reduce the influence of oxygen and impurities on the coating quality; s3, the sputtering chamber is filled with a silver target, and the filling position and shape of the target need to be adjusted according to specific requirements; s4, argon is introduced into the sputtering chamber to generate plasma, the argon is ionized under the action of the high-voltage electric field to form high-energy argon ions, the thickness and uniformity of the coating can be monitored in real time, technological parameters can be adjusted in time, and the quality of the coating is ensured.

Description

Technical Field

[0001] The present invention relates to the technical field of the preparation of antibacterial composite coatings, and particularly relates to a method for preparing an antibacterial composite coating on the surface of a medical device made of alloy material. Background Art

[0002] The functions of the antibacterial composite coating on the surface of the medical device made of alloy material are mainly reflected in the following aspects: inhibiting the growth of bacteria: the antibacterial composite coating can effectively inhibit the growth of bacteria, fungi and viruses on the surface of the medical device, thereby reducing the risk of infection; improving biocompatibility: the coating material has good biocompatibility to ensure that no rejection reaction or infection will occur when contacting with human tissues; enhancing durability: the coating can improve the wear resistance and corrosion resistance of the medical device and extend its service life; improving cleanliness: the antibacterial coating can reduce the odor on the surface of the medical device, improve the cleanliness of the medical environment and reduce the spread of germs and bacteria; realizing specific functions: some antibacterial coatings can also realize specific treatment or diagnosis functions, such as local drug slow release or promoting tissue regeneration; preventing the formation of biofilms: the antibacterial coating can effectively prevent bacteria from colonizing on the surface of the device and the formation of biofilms, thereby preventing the occurrence of medical device-related infections.

[0003] In the prior art, it is not convenient to monitor the coating thickness and uniformity in real time and adjust the process parameters in time, resulting in poor control of the coating quality. Therefore, we propose a method for preparing an antibacterial composite coating on the surface of a medical device made of alloy material to solve the above problems. Summary of the Invention

[0004] The purpose of the present invention is to solve the disadvantages that it is not convenient to monitor the coating thickness and uniformity in real time and adjust the process parameters in time, resulting in poor control of the coating quality, and to propose a method for preparing an antibacterial composite coating on the surface of a medical device made of alloy material.

[0005] In order to achieve the above purpose, the present invention adopts the following technical scheme:

[0006] A method for preparing an antibacterial composite coating on the surface of a medical device made of alloy material includes the following steps:

[0007] S1. Thoroughly clean the medical device substrate to remove surface contaminants and oxides;

[0008] S2. Put the cleaned medical device substrate into a vacuum sputtering chamber, and use a high vacuum pump to reduce the indoor pressure to a specific range to reduce the influence of oxygen and impurities on the coating quality;

[0009] S3. Load the silver target into the sputtering chamber, and the loading position and shape of the target need to be adjusted according to specific requirements;

[0010] S4. Introduce argon gas into the sputtering chamber to generate plasma. The argon gas is ionized under the action of a high-voltage electric field to form high-energy argon ions.

[0011] S5. Apply a negative bias voltage to the substrate to attract the sputtered silver atoms. At the same time, apply a magnetic field near the target to form magnetron sputtering. The magnetic field makes the electrons form a closed trajectory near the target, increasing the density and sputtering rate of the plasma.

[0012] S6. The high-energy argon ions hit the silver target, sputtering out silver atoms and depositing them on the surface of the substrate to form a uniform silver coating. Real-time monitor the coating thickness and uniformity, and adjust the process parameters in a timely manner.

[0013] S7. After sputtering, inspect the silver coating and perform annealing treatment.

[0014] Preferably, the steps of real-time monitoring the coating thickness and uniformity and timely adjusting the process parameters are as follows: Install a high-precision film thickness monitor in the sputtering chamber and ensure its accurate calibration to measure the coating thickness in real time. Collect the coating thickness data in real time through the film thickness monitor and transmit the data to the control system for analysis. Set multiple measurement points on the surface of the substrate, use the film thickness monitor to measure the coating thickness at each point, evaluate the uniformity, improve the sputtering uniformity and reduce the thickness difference by rotating the substrate or the target. According to the real-time monitoring data, adjust the sputtering power and voltage to ensure that the coating thickness and uniformity meet the requirements. Optimize the argon gas flow rate and sputtering pressure to improve the plasma distribution and enhance the coating uniformity. According to the monitoring results, adjust the distance between the target and the substrate to optimize the sputtering effect. Analyze the collected data in real time through the control system to identify abnormal thickness and uniformity. According to the analysis results, automatically or manually adjust the process parameters to ensure the stable coating quality. Record the monitoring data and adjusted parameters in the process log for subsequent analysis and optimization.

[0015] Preferably, in S1, when cleaning the substrate, use ultrasonic cleaning combined with plasma cleaning technology to improve the cleanliness of the substrate surface and enhance the coating adhesion. After cleaning, add a plasma activation or chemical activation step to improve the activity of the substrate surface and promote the uniform deposition of silver atoms.

[0016] Preferably, in S2, put the cleaned substrate into the vacuum sputtering chamber, and use a high vacuum pump to reduce the indoor pressure to a specific range, which is 10^-4 to 10^-5 Pa, to reduce the influence of oxygen and impurities on the coating quality.

[0017] Preferably, in S6, the high-energy argon ions hit the silver target, sputtering out silver atoms and depositing them on the surface of the substrate to form a uniform silver coating with a thickness controlled at 10 - 20 nanometers. Real-time monitor the coating thickness and uniformity, and adjust the process parameters in a timely manner.

[0018] Preferably, in S7, after sputtering is completed, the silver coating can be inspected and annealed if necessary. The annealing temperature is 200-300 °C to improve its antibacterial performance and adhesion. The quality and performance of the silver coating are inspected using a scanning electron microscope and X-ray diffraction technology to ensure that it meets the antibacterial requirements.

[0019] Preferably, in S4, the purity of argon is above 99.99%.

[0020] Preferably, in S5, the magnetic field strength is 500-1000 gauss.

[0021] Preferably, in S7, the medical device is placed in a high-temperature and high-humidity environment to detect its stability and durability.

[0022] Preferably, the temperature and humidity parameters are set according to the test requirements. The test temperature is 85 °C - 110 °C and the humidity is 85%.

[0023] Compared with the prior art, the advantages of the present invention are as follows:

[0024] The steps of real-time monitoring of the coating thickness and uniformity and timely adjustment of process parameters are as follows: Install a high-precision film thickness monitor in the sputtering chamber and ensure its accurate calibration to measure the coating thickness in real time. The coating thickness data is collected in real time by the film thickness monitor and transmitted to the control system for analysis. Multiple measurement points are set on the substrate surface, and the coating thickness at each point is measured using the film thickness monitor to evaluate the uniformity. By rotating the substrate or the target, the sputtering uniformity is improved, and the thickness difference is reduced. According to the real-time monitoring data, the sputtering power and voltage are adjusted to ensure that the coating thickness and uniformity meet the requirements. The argon flow rate and sputtering pressure are optimized to improve the plasma distribution and the coating uniformity. According to the monitoring results, the distance between the target and the substrate is adjusted to optimize the sputtering effect. The control system performs real-time analysis on the collected data to identify thickness and uniformity anomalies. According to the analysis results, the process parameters are automatically or manually adjusted to ensure the stable quality of the coating. The monitoring data and adjusted parameters are recorded in the process log for subsequent analysis and optimization;

[0025] The present invention can real-time monitor the coating thickness and uniformity, timely adjust the process parameters, and ensure the quality of the coating. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 It is a flowchart of a method for preparing an antibacterial composite coating on the surface of a medical device made of an alloy material proposed by the present invention. DETAILED DESCRIPTION OF THE INVENTION

[0027] Next, the technical solutions in this embodiment will be clearly and completely described in conjunction with the accompanying drawings in this embodiment. Obviously, the described embodiments are only a part of the embodiments of this embodiment, rather than all of the embodiments.

[0028] Embodiment 1

[0029] Referring to Figure 1 , a method for preparing an antibacterial composite coating on the surface of an alloy material medical device, comprising the following steps:

[0030] S1. Thoroughly clean the medical device substrate to remove surface contaminants and oxides.

[0031] S2. Place the cleaned medical device substrate into a vacuum sputtering chamber, and use a high vacuum pump to reduce the indoor pressure to a specific range to reduce the influence of oxygen and impurities on the coating quality.

[0032] S3. Load the silver target into the sputtering chamber, and the loading position and shape of the target need to be adjusted according to specific requirements.

[0033] S4. Introduce argon gas into the sputtering chamber to generate plasma. The argon gas is ionized under the action of a high-voltage electric field to form high-energy argon ions.

[0034] S5. Apply a negative bias voltage to the substrate to attract the sputtered silver atoms. At the same time, apply a magnetic field near the target to form magnetron sputtering. The magnetic field makes the electrons form a closed trajectory near the target, increasing the density and sputtering rate of the plasma.

[0035] S6. The high-energy argon ions bombard the silver target, sputter out the silver atoms and deposit them on the surface of the substrate to form a uniform silver coating. Real-time monitor the coating thickness and uniformity, and adjust the process parameters in a timely manner.

[0036] S7. After sputtering is completed, inspect the silver coating and perform annealing treatment.

[0037] In this embodiment, the steps of real-time monitoring the coating thickness and uniformity and timely adjusting the process parameters are as follows: Install a high-precision film thickness monitor in the sputtering chamber and ensure its accurate calibration to measure the coating thickness in real time. Collect the coating thickness data in real time through the film thickness monitor and transmit the data to the control system for analysis. Set multiple measurement points on the surface of the substrate, use the film thickness monitor to measure the coating thickness at each point, evaluate the uniformity, improve the sputtering uniformity and reduce the thickness difference by rotating the substrate or the target. According to the real-time monitoring data, adjust the sputtering power and voltage to ensure that the coating thickness and uniformity meet the requirements. Optimize the argon flow rate and sputtering pressure to improve the plasma distribution and enhance the coating uniformity. According to the monitoring results, adjust the distance between the target and the substrate to optimize the sputtering effect. Perform real-time analysis on the collected data through the control system to identify abnormalities in thickness and uniformity. According to the analysis results, automatically or manually adjust the process parameters to ensure the stable coating quality. Record the monitoring data and adjusted parameters in the process log for subsequent analysis and optimization.

[0038] In this embodiment, in S1, when cleaning the substrate, ultrasonic cleaning is combined with plasma cleaning technology to improve the cleanliness of the substrate surface and enhance the coating adhesion. After cleaning, add a plasma activation or chemical activation step to improve the activity of the substrate surface and promote the uniform deposition of silver atoms.

[0039] In this embodiment, in S2, put the cleaned substrate into the vacuum sputtering chamber, and use a high vacuum pump to reduce the chamber pressure to a specific range, which is 10^-4 to 10^-5 Pa, to reduce the influence of oxygen and impurities on the coating quality.

[0040] In this embodiment, in S6, high-energy argon ions bombard the silver target, sputter out silver atoms and deposit them on the substrate surface to form a uniform silver coating with a thickness of 10 nanometers. Real-time monitor the coating thickness and uniformity and timely adjust the process parameters.

[0041] In this embodiment, in S7, after sputtering, the silver coating can be inspected and annealed at 200°C when necessary to improve its antibacterial performance and adhesion. Use a scanning electron microscope and X-ray diffraction technology to inspect the quality and performance of the silver coating to ensure that it meets the antibacterial requirements.

[0042] In this embodiment, in S4, the purity of argon is above 99.99%.

[0043] In this embodiment, in S5, the magnetic field strength is 500 gauss.

[0044] In this embodiment, in S7, place the medical device in a high-temperature and high-humidity environment to detect its stability and durability.

[0045] In this embodiment, the temperature and humidity parameters are set according to the test requirements. The test temperature is 85°C and the humidity is 85%.

[0046] Embodiment 2

[0047] A method for preparing an antibacterial composite coating on the surface of a medical device made of alloy material, comprising the following steps:

[0048] S1. Thoroughly clean the medical device substrate to remove contaminants and oxides on the surface;

[0049] S2. Place the cleaned medical device substrate into a vacuum sputtering chamber, and use a high vacuum pump to reduce the indoor pressure to a specific range to reduce the influence of oxygen and impurities on the coating quality;

[0050] S3. Load the silver target into the sputtering chamber, and the loading position and shape of the target need to be adjusted according to specific requirements;

[0051] S4. Introduce argon gas into the sputtering chamber to generate plasma. The argon gas is ionized under the action of a high-voltage electric field to form high-energy argon ions;

[0052] S5. Apply a negative bias voltage to the substrate to attract the sputtered silver atoms. At the same time, apply a magnetic field near the target to form magnetron sputtering. The magnetic field makes the electrons form a closed trajectory near the target, increasing the density and sputtering rate of the plasma;

[0053] S6. The high-energy argon ions bombard the silver target, sputter out the silver atoms and deposit them on the surface of the substrate to form a uniform silver coating. Real-time monitor the coating thickness and uniformity, and adjust the process parameters in a timely manner;

[0054] S7. After sputtering, inspect the silver coating and perform annealing treatment.

[0055] In this embodiment, the steps of real-time monitoring the coating thickness and uniformity and timely adjusting process parameters are as follows: Install a high-precision film thickness monitor in the sputtering chamber and ensure its accurate calibration to measure the coating thickness in real time. Collect the coating thickness data in real time through the film thickness monitor and transmit the data to the control system for analysis. Set multiple measurement points on the substrate surface, use the film thickness monitor to measure the coating thickness at each point, evaluate the uniformity, improve the sputtering uniformity and reduce the thickness difference by rotating the substrate or the target. According to the real-time monitoring data, adjust the sputtering power and voltage to ensure that the coating thickness and uniformity meet the requirements. Optimize the argon flow rate and sputtering pressure to improve the plasma distribution and enhance the coating uniformity. According to the monitoring results, adjust the distance between the target and the substrate to optimize the sputtering effect. Analyze the collected data in real time through the control system to identify thickness and uniformity anomalies. According to the analysis results, automatically or manually adjust the process parameters to ensure stable coating quality. Record the monitoring data and adjusted parameters in the process log for subsequent analysis and optimization.

[0056] In this embodiment, in S1, when cleaning the substrate, ultrasonic cleaning is combined with plasma cleaning technology to improve the cleanliness of the substrate surface and enhance the coating adhesion. After cleaning, an additional plasma activation or chemical activation step is added to improve the activity of the substrate surface and promote the uniform deposition of silver atoms.

[0057] In this embodiment, in S2, the cleaned substrate is placed in a vacuum sputtering chamber, and the pressure in the chamber is reduced to a specific range by using a high vacuum pump. The specific range is from 10^-4 to 10^-5 Pa to reduce the influence of oxygen and impurities on the coating quality.

[0058] In this embodiment, in S6, high-energy argon ions bombard the silver target, sputter out silver atoms and deposit them on the substrate surface to form a uniform silver coating with a thickness controlled at 15 nm. Real-time monitor the coating thickness and uniformity and timely adjust the process parameters.

[0059] In this embodiment, in S7, after sputtering, the silver coating can be inspected and annealed at a temperature of 260°C when necessary to improve its antibacterial performance and adhesion. Use a scanning electron microscope and X-ray diffraction technology to inspect the quality and performance of the silver coating to ensure that it meets the antibacterial requirements.

[0060] In this embodiment, in S4, the purity of argon is above 99.99%.

[0061] In this embodiment, in S5, the magnetic field strength is 700 Gauss.

[0062] In this embodiment, in S7, the medical device is placed in a high-temperature and high-humidity environment to detect its stability and durability.

[0063] In this embodiment, the temperature and humidity parameters are set according to the test requirements. The test temperature is 100°C and the humidity is 85%.

[0064] Embodiment III

[0065] A method for preparing an antibacterial composite coating on the surface of a medical device made of alloy material, comprising the following steps:

[0066] S1. Thoroughly clean the medical device substrate to remove contaminants and oxides on the surface;

[0067] S2. Place the cleaned medical device substrate into a vacuum sputtering chamber, and use a high vacuum pump to reduce the indoor pressure to a specific range to reduce the influence of oxygen and impurities on the coating quality;

[0068] S3. Load the silver target into the sputtering chamber, and the loading position and shape of the target need to be adjusted according to specific requirements;

[0069] S4. Introduce argon gas into the sputtering chamber to generate plasma. The argon gas is ionized under the action of a high-voltage electric field to form high-energy argon ions;

[0070] S5. Apply a negative bias voltage to the substrate to attract the sputtered silver atoms. At the same time, apply a magnetic field near the target to form magnetron sputtering. The magnetic field makes the electrons form a closed trajectory near the target, increasing the density and sputtering rate of the plasma;

[0071] S6. The high-energy argon ions bombard the silver target, sputter out the silver atoms and deposit them on the surface of the substrate to form a uniform silver coating. Real-time monitor the coating thickness and uniformity, and adjust the process parameters in a timely manner;

[0072] S7. After sputtering, check the silver coating and perform annealing treatment.

[0073] In this embodiment, the steps of real-time monitoring the coating thickness and uniformity and timely adjusting the process parameters are as follows: Install a high-precision film thickness monitor in the sputtering chamber and ensure its accurate calibration to measure the coating thickness in real time. Collect the coating thickness data in real time through the film thickness monitor and transmit the data to the control system for analysis. Set multiple measurement points on the surface of the substrate, use the film thickness monitor to measure the coating thickness at each point, evaluate the uniformity, improve the sputtering uniformity and reduce the thickness difference by rotating the substrate or the target. According to the real-time monitoring data, adjust the sputtering power and voltage to ensure that the coating thickness and uniformity meet the requirements. Optimize the argon flow rate and sputtering pressure to improve the plasma distribution and enhance the coating uniformity. According to the monitoring results, adjust the distance between the target and the substrate to optimize the sputtering effect. Perform real-time analysis on the collected data through the control system to identify abnormalities in thickness and uniformity. According to the analysis results, automatically or manually adjust the process parameters to ensure the stable coating quality. Record the monitoring data and adjusted parameters in the process log for subsequent analysis and optimization.

[0074] In this embodiment, in S1, when cleaning the substrate, ultrasonic cleaning is combined with plasma cleaning technology to improve the cleanliness of the substrate surface and enhance the coating adhesion. After cleaning, an additional plasma activation or chemical activation step is added to improve the activity of the substrate surface and promote the uniform deposition of silver atoms.

[0075] In this embodiment, in S2, the cleaned substrate is placed in a vacuum sputtering chamber, and the pressure in the chamber is reduced to a specific range by using a high vacuum pump. The specific range is 10^-4 to 10^-5 Pa to reduce the influence of oxygen and impurities on the coating quality.

[0076] In this embodiment, in S6, high-energy argon ions bombard the silver target, sputtering out silver atoms and depositing them on the surface of the substrate to form a uniform silver coating with a thickness of 20 nm. Real-time monitor the coating thickness and uniformity and timely adjust the process parameters.

[0077] In this embodiment, in S7, after sputtering, the silver coating can be inspected and annealed at 300°C when necessary to improve its antibacterial performance and adhesion. Use a scanning electron microscope and X-ray diffraction technology to inspect the quality and performance of the silver coating to ensure that it meets the antibacterial requirements.

[0078] In this embodiment, in S4, the purity of argon is above 99.99%.

[0079] In this embodiment, in S5, the magnetic field strength is 1000 gauss.

[0080] In this embodiment, in S7, the medical device is placed in a high-temperature and high-humidity environment to detect its stability and durability.

[0081] In this embodiment, the temperature and humidity parameters are set according to the test requirements. The test temperature is 110°C and the humidity is 85%.

[0082] As mentioned above, the above is only the preferred specific implementation manner of this embodiment, but the protection scope of this embodiment is not limited thereto. Any person skilled in the art within the technical scope disclosed by this embodiment, according to the technical solution and inventive concept of this embodiment, makes equivalent substitutions or changes, and should be covered within the protection scope of this embodiment.

Claims

1. A method for preparing an antibacterial composite coating on the surface of an alloy material medical device, characterized in that: The following steps are involved: S1. Thoroughly clean the medical device substrate to remove surface contaminants and oxides; S2. Place the cleaned medical device substrate into a vacuum sputtering chamber and use a high vacuum pump to reduce the pressure in the chamber to a specific range to reduce the impact of oxygen and impurities on the coating quality; S3. Load the silver target into the sputtering chamber. The loading position and shape of the target need to be adjusted according to specific needs; S4. Introduce argon gas into the sputtering chamber to generate plasma. The argon gas is ionized under the action of the high voltage electric field to form high-energy argon ions; S5. Apply a negative bias voltage to the substrate to attract the sputtered silver atoms. At the same time, apply a magnetic field near the target to form magnetron sputtering. The magnetic field causes the electrons to form a closed trajectory near the target, increasing the density of the plasma and the sputtering rate. S6. High-energy argon ions impact the silver target, sputtering out silver atoms and depositing them on the surface of the substrate to form a uniform silver coating. The coating thickness and uniformity are monitored in real time, and the process parameters are adjusted in time. S7. After sputtering, the silver coating is inspected and annealed.

2. The method for preparing an antibacterial composite coating on the surface of an alloy material medical device according to claim 1, characterized in that: The specific steps for real-time monitoring of coating thickness and uniformity and timely adjustment of process parameters are as follows: install a high-precision film thickness monitor in the sputtering chamber and ensure that it is accurately calibrated to measure the coating thickness in real time; collect coating thickness data in real time through the film thickness monitor and transmit the data to the control system for analysis; set multiple measurement points on the surface of the substrate, use the film thickness monitor to measure the coating thickness at each point, evaluate the uniformity, improve the sputtering uniformity and reduce the thickness difference by rotating the substrate or target; adjust the sputtering power and voltage according to the real-time monitoring data to ensure that the coating thickness and uniformity meet the requirements; optimize the argon flow rate and sputtering pressure, improve the plasma distribution, and improve the coating uniformity; adjust the distance between the target and the substrate according to the monitoring results to optimize the sputtering effect; analyze the collected data in real time through the control system to identify thickness and uniformity anomalies; adjust the process parameters automatically or manually according to the analysis results to ensure stable coating quality; record the monitoring data and adjustment parameters in the process log for subsequent analysis and optimization.

3. The method for preparing an antibacterial composite coating on the surface of an alloy material medical device according to claim 2, characterized in that: In S1, when cleaning the substrate, ultrasonic cleaning combined with plasma cleaning technology is used to improve the cleanliness of the substrate surface and enhance the adhesion of the coating. After cleaning, a plasma activation or chemical activation step is added to improve the activity of the substrate surface and promote the uniform deposition of silver atoms.

4. The method for preparing an antibacterial composite coating on the surface of an alloy material medical device according to claim 3, characterized in that: In S2, the cleaned substrate is placed in a vacuum sputtering chamber, and a high vacuum pump is used to reduce the pressure in the chamber to a specific range, which is 10^-4 to 10^-5 Pa, so as to reduce the influence of oxygen and impurities on the coating quality.

5. The method for preparing an antibacterial composite coating on the surface of an alloy material medical device according to claim 4, characterized in that: In S6, high-energy argon ions impact the silver target, sputtering silver atoms and depositing them on the surface of the substrate to form a uniform silver coating controlled at 10-20 nanometers. The coating thickness and uniformity are monitored in real time, and the process parameters are adjusted in time.

6. The method for preparing an antibacterial composite coating on the surface of an alloy material medical device according to claim 5, characterized in that: In S7, after sputtering is completed, the silver coating can be inspected and annealed if necessary at a temperature of 200-300°C to improve its antibacterial properties and adhesion. The quality and performance of the silver coating can be inspected using a scanning electron microscope and X-ray diffraction technology to ensure that it meets the antibacterial requirements.

7. The method for preparing an antibacterial composite coating on the surface of an alloy material medical device according to claim 6, characterized in that: In the above-mentioned S4, the purity of the argon gas is 99.99% or more.

8. The method for preparing an antibacterial composite coating on the surface of an alloy material medical device according to claim 7, characterized in that: In the S5, the magnetic field strength is 500-1000 Gauss.

9. The method for preparing an antibacterial composite coating on the surface of an alloy material medical device according to claim 8, characterized in that: In S7, the medical device is placed in a high temperature and high humidity environment to test its stability and durability.

10. The method for preparing an antibacterial composite coating on the surface of an alloy material medical device according to claim 9, characterized in that: Set the temperature and humidity parameters according to the test requirements, the test temperature is 85℃-110℃, and the humidity is 85%.

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