Correction method of metal island-shaped structure
By adjusting the edges of the metal island-shaped structure to ensure that its area is minimized and avoiding too small graphics spacing, the problem of too small area and bridge of the metal island-shaped structure is solved, and the performance and yield of SRAM is improved.
Patent Information
- Application Number
- CN202510268609.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-07
- Publication Date
- 2025-06-13
AI Technical Summary
The area of the metal island-shaped structure is too small or the pattern spacing is too small, resulting in the inability to fill the vias or bridges, which affects the performance and yield of SRAM.
By adjusting the sides of the metal island-shaped structure in different directions, ensuring that its area reaches the minimum area and avoiding too small graphics spacing, the balance between the area and graphics spacing of the metal island-shaped structure is achieved.
Improve product yield and device performance, avoiding the phenomenon of too small metal island structure and bridging.
Smart Images
Figure CN120147403A_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the field of semiconductor manufacturing technology, and particularly to a method for correcting a metal island structure. Background Art
[0002] Static Random Access Memory (SRAM) is a high-speed random access memory widely used in computer systems and embedded devices. With the increasing requirements for integrated circuits, the data read and write speed of SRAM has become increasingly important. To improve the read performance and stability of memory cells, the power metal layer in SRAM is often not arranged continuously, but is spaced apart into islands to increase the space between the power metal layer and the bit line metal layer, thereby weakening the capacitive coupling effect between them.
[0003] The size of the metal island structure will affect the performance and power consumption of SRAM. If the area of the metal island structure is too small, it may cause the transistor to be unable to effectively hold enough charge, thereby affecting the data retention ability and may also affect the read and write speed. During the metallization process, areas with a small metal island area may also cause insufficient filling of vias, thereby affecting the product yield. In addition, with the increasing requirement for integration density, the area of the basic unit of SRAM is getting smaller and smaller, and the spacing between different patterns of the metal layer is also getting smaller and smaller, which will cause bridging between metal layer patterns. Metal layer bridging will affect the normal function of SRAM cells, and may cause problems such as data read and write errors, decreased storage stability, or circuit failure. Summary of the Invention
[0004] Based on this, in view of the problems in the above background art, it is necessary to provide a method for correcting a metal island structure, which can at least avoid the problems of too small an area of the metal island structure and bridging between metal island structures, and improve the product yield and device performance.
[0005] To achieve the above object and other related objects, one aspect of the present application provides a method for correcting a metal island structure, including the following steps:
[0006] Obtain a target pattern, the target pattern including a first type of metal island structure and a second type of metal island structure that are adjacent to each other in a first direction;
[0007] When the area of the first type of metal island structure is smaller than the minimum area, adjust the side of the first type of metal island structure in a second direction until the pattern spacing of the side of the first type of metal island structure in the second direction reaches the minimum;
[0008] When adjusting the sides of the first type of metal island structure in the first direction until the pitch of the pattern of the sides of the first type of metal island structure in the first direction reaches the minimum, and the area of the first type of metal island structure is still smaller than the minimum area, simultaneously adjust the sides of the first type of metal island structure and the second type of metal island structure in the first direction until the area of the first type of metal island structure reaches the minimum area.
[0009] In one embodiment, the method for correcting the metal island structure further includes: when the area of the first type of metal island structure reaches the minimum area and the area of the second type of metal island structure is smaller than the minimum area, adjust the sides of the second type of metal island structure in the first direction until the pitch of the pattern of the sides of the second type of metal island structure in the first direction reaches the minimum, and adjust the sides of the second type of metal island structure in the second direction until the area of the second type of metal island structure reaches the minimum area.
[0010] In one embodiment, the first type of metal island structure and the second type of metal island structure include first type of sides and / or third type of sides in the first direction, where the first type of sides represent the sides opposite to different types of metal island structures, and the third type of sides represent the sides opposite to the same type of metal island structures; the first type of metal island structure and the second type of metal island structure include second type of sides in the second direction, and the second type of sides represent the sides opposite to the long line structures.
[0011] In one embodiment, when adjusting the sides of the first type of metal island structure in the second direction, the second type of sides of the first type of metal island structure shift outward in the second direction; when adjusting the sides of the first type of metal island structure in the first direction, the first type of sides of the first type of metal island structure shift outward in the first direction.
[0012] In one embodiment, the second type of sides at both ends of the first type of metal island structure have opposite offset directions and the same offset amount in the second direction, and the first type of sides at both ends of the first type of metal island structure have opposite offset directions and the same offset amount in the first direction.
[0013] In one embodiment, when simultaneously adjusting the sides of the first type of metal island structure and the second type of metal island structure in the first direction, the first type of sides of the second type of metal island structure shift in the first direction, and the third type of sides of the second type of metal island structure are fixed.
[0014] In one embodiment, when simultaneously adjusting the sides of the first type of metal island structure and the second type of metal island structure in the first direction, the first type of sides of the first type of metal island structure shift outward in the first direction, the first type of sides of the second type of metal island structure shift inward in the first direction, and the offset amounts of the first type of sides of the first type of metal island structure and the first type of sides of the second type of metal island structure are the same.
[0015] In one embodiment, adjusting the sides of the second type of metal island structure in the first direction includes: the first type of edges of the second type of metal island structure are offset outward in the first direction until the graphic pitch of the first type of edges of the second type of metal island structure in the first direction reaches the minimum, and the third type of edges of the second type of metal island structure are offset outward in the first direction until the graphic pitch of the third type of edges of the second type of metal island structure in the first direction reaches the minimum; adjusting the sides of the second type of metal island structure in the second direction includes: the second type of edges at both ends of the second type of metal island structure are offset outward in the second direction.
[0016] In one embodiment, the area of the first type of metal island structure is not greater than the area of the second type of metal island structure.
[0017] In one embodiment, when the graphic pitch of the sides of the first type of metal island structure or the second type of metal island structure in the first direction or the second direction reaches the minimum, the distance between the sides of the first type of metal island structure or the second type of metal island structure and the adjacent graphics reaches the minimum, and the offset of the sides of the first type of metal island structure or the second type of metal island structure in this direction reaches the maximum.
[0018] According to the method for correcting the metal island structure provided by the present invention, for the first type of metal island structure and the second type of metal island structure arranged adjacent to each other in the first direction, when adjusting the sides in the second direction and the sides in the first direction of the first type of metal island structure still cannot meet the minimum area requirement, the sides of the first type of metal island structure and the second type of metal island structure in the first direction are adjusted simultaneously, so that the area of the first type of metal island structure reaches the minimum area, and at the same time, it is ensured that the distance between the first type of metal island structure and the second type of metal island structure avoids bridging, achieving the balance between the area and the graphic pitch of the metal island structure, and improving the product yield and device performance. Description of the Drawings
[0019] To better describe and illustrate the embodiments and / or examples of those applications disclosed herein, one or more drawings may be referred to. Additional details or examples used to describe the drawings should not be considered as limiting the scope of any of the disclosed applications, the currently described embodiments and / or examples, and the currently understood best mode of these applications.
[0020] Figure 1 It is the situation that the area of the metal island structure in the prior art does not meet the minimum area, resulting in the inability to fully fill the via holes;
[0021] Figure 2 It is the situation that bridging occurs when the graphic pitch of the metal island structure in the prior art is too small;
[0022] Figure 3 Flow chart of the correction method for the metal island structure provided in one embodiment;
[0023] Figure 4 Schematic diagram of the target pattern provided in one embodiment;
[0024] Figure 5 Schematic diagram of the relevant parameters of the metal island structure provided in one embodiment;
[0025] Figure 6 Schematic diagram of the correction process of the metal island structure provided in one embodiment;
[0026] Figure 7 Schematic diagram of adjusting the side of the first type of metal island structure in the second direction in the correction method of the metal island structure provided in one embodiment;
[0027] Figure 8 Schematic diagram of the minimum graphic spacing of the side of the first type of metal island structure in the second direction in the correction method of the metal island structure provided in one embodiment;
[0028] Figure 9 Schematic diagram of adjusting the side of the first type of metal island structure in the first direction in the correction method of the metal island structure provided in one embodiment;
[0029] Figure 10 Schematic diagram of the minimum graphic spacing of the side of the first type of metal island structure in the first direction in the correction method of the metal island structure provided in one embodiment;
[0030] Figure 11 Schematic diagram of simultaneously adjusting the sides of the first type of metal island structure and the second type of metal island structure in the first direction in the correction method of the metal island structure provided in one embodiment;
[0031] Figure 12 Schematic diagram of adjusting the first type of side of the second type of metal island structure in the correction method of the metal island structure provided in one embodiment;
[0032] Figure 13 Schematic diagram of the minimum graphic spacing of the first type of side of the second type of metal island structure in the correction method of the metal island structure provided in one embodiment;
[0033] Figure 14 Schematic diagram of adjusting the third type of side of the second type of metal island structure in the correction method of the metal island structure provided in one embodiment;
[0034] Figure 15Schematic diagram showing the minimum graphic pitch of the third type of edge of the second type of metal island structure in the correction method of the metal island structure provided in an embodiment;
[0035] Figure 16 Schematic diagram showing the adjustment of the second type of edge of the second type of metal island structure in the correction method of the metal island structure provided in an embodiment. Detailed implementation manners
[0036] To facilitate the understanding of the present application, the present application will be described more comprehensively below with reference to the relevant drawings. The preferred embodiments of the present application are given in the drawings. However, the present application can be implemented in many different forms and is not limited to the embodiments described herein. On the contrary, these embodiments are provided to make the disclosure of the present application more thorough and comprehensive.
[0037] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by those of ordinary skill in the technical field to which this application belongs. The terms used in the description of this application herein are only for the purpose of describing specific embodiments and are not intended to limit this application. The term "and / or" used herein includes any and all combinations of one or more of the related listed items.
[0038] It should be understood that when an element or layer is referred to as "on", "adjacent to", "connected to" or "coupled to" another element or layer, it can be directly on, adjacent to, connected or coupled to the other element or layer, or there may be intervening elements or layers. In contrast, when an element is referred to as "directly on", "directly adjacent to", "directly connected to" or "directly coupled to" another element or layer, there are no intervening elements or layers. It should be understood that although the terms first, second, third, etc. may be used to describe various elements, components, regions, layers and / or parts, these elements, components, regions, layers and / or parts should not be limited by these terms. These terms are only used to distinguish one element, component, region, layer or part from another element, component, region, layer or part. Therefore, without departing from the teachings of this application, the first element, component, region, layer or part discussed below may be referred to as the second element, component, region, layer or part.
[0039] Spatial relationship terms such as "under", "below", "beneath", "underneath", "above", "over", etc. may be used herein for convenience of description to describe the relationship of one element or feature shown in the figures with other elements or features. It should be understood that, in addition to the orientation shown in the figures, spatial relationship terms are also intended to include different orientations of the device in use and operation. For example, if the device in the figures is flipped, then an element or feature described as "under other elements" or "beneath them" or "underneath them" will be oriented "over" the other elements or features. Thus, the exemplary terms "under" and "beneath" can include both an upper and a lower orientation. The device may be otherwise oriented (rotated 90 degrees or other orientations) and the spatial descriptors used herein are to be interpreted accordingly.
[0040] The purpose of the terms used herein is only to describe specific embodiments and is not a limitation of the present application. As used herein, the singular forms "a", "an" and "the" are also intended to include the plural forms unless the context clearly dictates otherwise. It should also be understood that the terms "comprising" and / or "including", when used in this specification, specify the presence of the stated features, integers, steps, operations, elements and / or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components and / or groups. As used herein, the term "and / or" includes any and all combinations of the associated listed items.
[0041] Embodiments of the application are described herein with reference to cross-sectional views that are schematic illustrations of ideal embodiments (and intermediate structures) of the present application. Thus, variations from the shapes shown are to be expected, for example, due to manufacturing techniques and / or tolerances. Accordingly, embodiments of the present application should not be limited to the particular shapes of regions shown herein, but include shape deviations resulting from, for example, manufacturing. The regions shown in the figures are substantially schematic, and their shapes are not intended to show the actual shape of regions of the device and are not intended to limit the scope of the present application.
[0042] It should be noted that the illustrations provided in this embodiment only schematically illustrate the basic concept of the present application. Although only the components related to the present application are shown in the illustrations and are not drawn according to the number, shape and size of the components in actual implementation, the types, numbers and proportions of the components in actual implementation can be arbitrarily changed, and the component layout type may also be more complex.
[0043] When the area of the metal island structure is too small, it is easy to occur the situation that the vias cannot be fully filled during the metallization process, as Figure 1 shown. In addition, when the pattern pitch is too small, bridging will occur between the metal layer patterns, as Figure 2As shown in the figure. Therefore, during the optical proximity correction (OPC) process of the metal island structure, while enlarging the area, it is necessary to ensure that the pattern pitch is not too small, and the balance between the area of the metal island and the pattern pitch between the metal islands or metal lines must be considered.
[0044] To address the above problems, the present invention provides a correction method for the metal island structure, as Figure 3 shown, including the following steps:
[0045] Step S301: Obtain a target pattern, where the target pattern includes a first type of metal island structure and a second type of metal island structure that are adjacent to each other in the first direction;
[0046] Step S302: When the area of the first type of metal island structure is less than the minimum area, adjust the side of the first type of metal island structure in the second direction until the pattern pitch of the side of the first type of metal island structure in the second direction reaches the minimum;
[0047] Step S303: When adjusting the side of the first type of metal island structure in the first direction until the pattern pitch of the side of the first type of metal island structure in the first direction reaches the minimum, and the area of the first type of metal island structure is still less than the minimum area, simultaneously adjust the sides of the first type of metal island structure and the second type of metal island structure in the first direction until the area of the first type of metal island structure reaches the minimum area.
[0048] Optionally, the correction method for the metal island structure further includes Step S304: When the area of the second type of metal island structure is less than the minimum area, adjust the side of the second type of metal island structure in the first direction until the pattern pitch of the side of the second type of metal island structure in the first direction reaches the minimum, and adjust the side of the second type of metal island structure in the second direction until the area of the second type of metal island structure reaches the minimum area.
[0049] First, execute Step S301. Referring to Figure 4 shown, obtain a target pattern, where the target pattern includes a first type of metal island structure A (i.e., type A) and a second type of metal island structure B (i.e., type B) that are adjacent to each other in the first direction.
[0050] Exemplarily, the first type of metal island structure and the second type of metal island structure include a first type of side and / or a third type of side in the first direction. The first type of side represents the side opposite to different types of metal island structures, and the third type of side represents the side opposite to the same type of metal island structures; the first type of metal island structure and the second type of metal island structure include a second type of side in the second direction, and the second type of side represents the side opposite to the long line structure.
[0051] In Figure 4 the illustrated embodiment, both ends of the first type of metal island structure A in the first direction are opposite to the second type of metal island structure B. Therefore, both ends of the first type of metal island structure A in the first direction are the first type of edges A1. Both ends of the first type of metal island structure A in the second direction are opposite to the long line structure. Therefore, both ends of the first type of metal island structure A in the second direction are the second type of edges A2. One end of the second type of metal island structure B in the first direction is opposite to the first type of metal island structure A and the other end is opposite to the second type of metal island structure B. Therefore, the two ends of the second type of metal island structure B in the first direction are the first type of edge B1 and the third type of edge B3 respectively. Both ends of the second type of metal island structure B in the second direction are opposite to the long line structure. Therefore, both ends of the second type of metal island structure B in the second direction are the second type of edges B2.
[0052] In one embodiment, referring to Figure 5 shown, the area of the first type of metal island structure A is Area A , the length of the first type of edge A1 of the first type of metal island structure A is L A1 , the length of the second type of edge A2 is L A2 , the pattern pitch between the first type of edge A1 and the adjacent pattern is S A1 , the pattern pitch between the second type of edge A2 and the adjacent pattern is S A2 . The area of the second type of metal island structure B is Area B , the length of the first type of edge B1 of the second type of metal island structure B is L B1 , the length of the second type of edge B2 is L B2 , the length of the third type of edge B3 is L B3 , the pattern pitch between the first type of edge B1 and the adjacent pattern is S B1 , the pattern pitch between the second type of edge B2 and the adjacent pattern is S B2 , the pattern pitch between the third type of edge B3 and the adjacent pattern is S B3 . Among them, the area of the first type of metal island structure A is not greater than the area of the second type of metal island structure B, that is, Area A ≤Area B .
[0053] It should be noted that the first direction and the second direction represent different directions, and the first direction intersects with the second direction. In this embodiment, the first direction represents the horizontal direction, the second direction represents the vertical direction, and the first direction is perpendicular to the second direction.
[0054] Next, step S302 is executed. When the area of the first type of metal island structure is smaller than the minimum area, the side of the first type of metal island structure in the second direction is adjusted until the graphic pitch of the side of the first type of metal island structure in the second direction reaches the minimum.
[0055] Exemplarily, when the graphic pitch of the side of the first type of metal island structure or the second type of metal island structure in the first direction or the second direction reaches the minimum, the pitch between the side of the first type of metal island structure or the second type of metal island structure and the adjacent graphic reaches the minimum, and the offset of the side of the first type of metal island structure or the second type of metal island structure in this direction reaches the maximum.
[0056] Exemplarily, when adjusting the side of the first type of metal island structure in the second direction, the second type of side of the first type of metal island structure offsets outward in the second direction. Further, the offset directions of the second type of sides at both ends of the first type of metal island structure in the second direction are opposite and the offset amounts are the same.
[0057] In one embodiment, first, it is determined whether the first type of metal island structure A (i.e., type A) meets the minimum area Area min . When the area of the first type of metal island structure A is greater than or equal to the minimum area required by the process, there is no need to adjust the first type of metal island structure A. When the area of the first type of metal island structure A is smaller than the minimum area required by the process, the second type of side A2 of the first type of metal island structure A is adjusted to extend outward. Specifically, referring to Figure 7 and Figure 8 shown, the second type of sides A2 at both ends of type A both extend outward, and their offset directions are opposite but the offset amount △A2 is the same.
[0058] In one embodiment, if the area of the first type of metal island structure A reaches the minimum graphic area required by the process after extending the second type of side A2, the extension stops, as Figure 7 shown. At this time, the offset amount of the second type of side A2 . If until the graphic pitch S A2 between the second type of side A2 and its opposite long line structure has reached the specified minimum graphic pitch S min after extending the second type of side A2, but the area of the first type of metal island structure A still fails to meet the minimum area required by the process at this time, the second type of side A2 cannot be offset any further. At this time, the offset amount of the second type of side A2 , as Figure 8 shown. Therefore, in step S1 shown in Figure 6 , first, it is determined whether the area of type A meets the specified minimum area. When , the second type of side of type A is preferentially adjusted , and the offset amount .
[0059] In one embodiment, after the second type of side A2 of the first type of metal island structure A extends outward, it is re-determined whether the first type of metal island structure A (i.e., type A) meets the minimum area requirement. When the graphic pitch of the sides of the first type of metal island structure A in the second direction reaches the minimum, that is, the graphic pitch S between the second type of side A2 and its opposite long line structure A2 has reached the specified minimum graphic pitch S min , but at this time the area of the first type of metal island structure A (i.e., type A) still fails to meet the minimum area required by the process, then adjust the first type of side A1 of the first type of metal island structure A to extend outward.
[0060] Exemplarily, when adjusting the sides of the first type of metal island structure in the first direction, the first type of side of the first type of metal island structure offsets outward in the first direction. Further, the offset directions of the first type of sides at both ends of the first type of metal island structure in the first direction are opposite and the offset amounts are the same. Specifically, referring to Figure 9 and Figure 10 shown, the first type of sides A1 at both ends of type A both extend outward, and their offset directions are opposite but the offset amount △A1 is the same.
[0061] In one embodiment, after the first type of side A1 of the first type of metal island structure A extends outward, it is re-determined whether the first type of metal island structure A (i.e., type A) meets the minimum area requirement. If the area of the first type of metal island structure A reaches the minimum graphic area required by the process after extending the first type of side A1, stop extending, as Figure 9 shown, at this time the offset amount of the first type of side A1 . If until the distance S between the first type of side A1 and the first type of side B1 of the opposite type B after extending the first type of side A1 A1 has reached the specified minimum graphic pitch S min , then the first type of side A1 of type A cannot be offset any further, and the offset amount of the first type of side A1 at this time , as Figure 10 shown. Therefore, in step S2 shown in Figure 6 , it is determined whether the area of type A meets the specified minimum area. When , adjust the first type of side A1 of type A, and the offset amount .
[0062] Next, step S303 is executed. When adjusting the side of the first type of metal island structure in the first direction until the graphic spacing of the side of the first type of metal island structure in the first direction reaches the minimum, and the area of the first type of metal island structure is still smaller than the minimum area, the sides of the first type of metal island structure and the second type of metal island structure in the first direction are adjusted simultaneously until the area of the first type of metal island structure reaches the minimum area.
[0063] Exemplarily, when adjusting the sides of the first type of metal island structure and the second type of metal island structure in the first direction simultaneously, the first type of side of the second type of metal island structure offsets in the first direction, and the third type of side of the second type of metal island structure is fixed. Further, when adjusting the sides of the first type of metal island structure and the second type of metal island structure in the first direction simultaneously, the first type of side of the first type of metal island structure offsets outward in the first direction, the first type of side of the second type of metal island structure offsets inward in the first direction, and the offset amounts of the first type of side of the first type of metal island structure and the first type of side of the second type of metal island structure are the same.
[0064] In one embodiment, when the distance S between the first type of side A1 of type A and the first type of side B1 of the opposite type B A1 has reached the specified minimum graphic spacing S min , but at this time the area of type A still fails to meet the minimum area required by the process, then the sides of type A and type B in the first direction are adjusted simultaneously. Specifically, the first type of side B1 of type B is adjusted to indent inward, so as to provide space for the first type of side A1 of type A to extend outward until the area of type A reaches the minimum graphic area required by the process. As Figure 11 shown, at this time the moving amount of the first type of side A1 of type A extending outward is the same as the moving amount of the first type of side B1 of type B indenting inward. , . To maintain the balance of the areas of type A and type B under extreme conditions, the maximum moving amount of the first type of side A1 of type A and the first type of side B1 of type B during this step operation should be the corresponding moving amount when the length of the second type of side A2 of type A is equal to the length of the second type of side B2 of type B. . Therefore, in Figure 6 the step S3 shown, it is judged whether the area of type A meets the specified minimum area. When , the first type of side A1 of type A and the first type of side B1 of type B are adjusted, and the offset amount , .
[0065] Next, step S304 is executed. When the area of the second-type metal island structure is smaller than the minimum area, the sides of the second-type metal island structure in the first direction are adjusted until the graphic pitch of the sides of the second-type metal island structure in the first direction reaches the minimum, and the sides of the second-type metal island structure in the second direction are adjusted until the area of the second-type metal island structure reaches the minimum area.
[0066] Exemplarily, adjusting the sides of the second-type metal island structure in the first direction includes: the first type of side of the second-type metal island structure offsets outward in the first direction until the graphic pitch of the first type of side of the second-type metal island structure in the first direction reaches the minimum, and the third type of side of the second-type metal island structure offsets outward in the first direction until the graphic pitch of the third type of side of the second-type metal island structure in the first direction reaches the minimum; adjusting the sides of the second-type metal island structure in the second direction includes: the second type of sides at both ends of the second-type metal island structure offset outward in the second direction.
[0067] In one embodiment, it is judged whether the second-type metal island structure B (i.e., type B) meets the minimum area. When the area of type B is greater than or equal to the minimum area required by the process, type B does not need to be adjusted. When the area of type B is smaller than the minimum area required by the process, the first type of side B1 of type B is adjusted to extend outward. Specifically, referring to Figure 12 and Figure 13 as shown, the first type of side B1 of type B in the first direction extends outward, and the third type of side B3 of type B in the first direction does not offset.
[0068] In one embodiment, after the first type of side B1 of type B is extended outward, it is re-judged whether type B meets the minimum area requirement. If the area of type B reaches the minimum graphic area required by the process after the first type of side B1 is extended, the extension stops, as Figure 12 shown, and at this time the offset of the first type of side B1 . If until the distance between the first type of side B1 of type B and the first type of side A1 of the opposite type A reaches the specified minimum graphic pitch S min after the first type of side B1 is extended, but at this time the area of the first type of side B1 still fails to meet the minimum area required by the process, the first type of side B1 cannot be offset further, and at this time the offset of the first type of side B1 , as Figure 13 shown. Therefore, in step S4 shown in Figure 6 , it is judged whether the area of type B meets the specified minimum area. When , the first type of side of type B is preferentially adjusted , and the offset .
[0069] In one embodiment, when the graphic pitch of the first type of side B1 of the second type of metal island structure B reaches the minimum, that is, the graphic pitch S between the first type of side B1 and the opposite first type of metal island structure A B1 has reached the specified minimum graphic pitch S min , but at this time, the area of the second type of metal island structure B (i.e., type B) still fails to meet the minimum area required by the process, then the third type of side B3 of the second type of metal island structure B is adjusted to extend outwards.
[0070] In one embodiment, after the third type of side B3 of type B is extended outwards, it is re-determined whether type B meets the minimum area requirement. If the area of type B reaches the minimum graphic area required by the process after the third type of side B3 is extended, stop extending, as Figure 14 shown, at this time the offset of the third type of side B3 . If until the distance S between the third type of side B3 and its opposite third type of side B3 after the third type of side B3 is extended B3 has reached the specified minimum graphic pitch S min , but at this time the area of type B still fails to meet the minimum area required by the process, then the third type of side B3 cannot be offset any further, and the offset of the third type of side B3 at this time , as Figure 15 shown. Therefore, in the step S5 shown in Figure 6 , it is determined whether the area of type B meets the specified minimum area. When , adjust the third type of side B3 of type B, and the offset .
[0071] In one embodiment, when the graphic pitch of the third type of side B3 of the second type of metal island structure B reaches the minimum, that is, the graphic pitch S between the third type of side B3 and the opposite second type of metal island structure B B3 has reached the specified minimum graphic pitch S min , but at this time the area of the second type of metal island structure B (i.e., type B) still fails to meet the minimum area required by the process, then the second type of side B2 of the second type of metal island structure B is adjusted to extend outwards, as Figure 16 shown. If the area of type B reaches the minimum graphic area required by the process after the second type of side B2 is extended, stop extending, and the offset of the second type of side B2 at this time ; if until the distance S between the second type of side B2 and its opposite line after the second type of side B2 is extended B2 has reached the specified minimum graphic pitch, then the second type of side B2 cannot be moved any further, and the offset of the second type of side B2 at this time , and the area of type B reaches the optimum. Therefore, in Figure 6In step S6 shown above, it is determined whether the area of type B meets the specified minimum area. When this is the case, the second type of side B2 of type B is adjusted, and the offset .
[0072] Thus, the adjustment of the first type of metal island structure A and the second type of metal island structure B is completed. The areas of both the first type of metal island structure A and the second type of metal island structure B meet the minimum area, and the graphic spacing between the first type of metal island structure A and the second type of metal island structure B meets the minimum graphic spacing.
[0073] According to the correction method of the metal island structure provided by the present invention, for the first type of metal island structure and the second type of metal island structure that are adjacent in the first direction, when adjusting the side in the second direction and the side in the first direction of the first type of metal island structure still cannot meet the minimum area requirement, the sides of both the first type of metal island structure and the second type of metal island structure in the first direction are adjusted simultaneously, so that the area of the first type of metal island structure reaches the minimum area, while ensuring that the spacing between the first type of metal island structure and the second type of metal island structure avoids bridging, achieving the balance between the area and the graphic spacing of the metal island structure, and improving the product yield and device performance.
[0074] Please note that the above embodiments are for illustrative purposes only and do not imply any limitation to this application.
[0075] Each embodiment in this specification is described in a progressive manner. The key point of each embodiment is to illustrate the differences from other embodiments. The same or similar parts among the embodiments can be referred to each other.
[0076] The technical features of the above-described embodiments can be combined arbitrarily. For the sake of brevity of description, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, it should be considered as the scope described in this specification.
[0077] The above-described embodiments only represent several implementation manners of this application. Their descriptions are relatively specific and detailed, but they should not be construed as limitations to the scope of the patent application. It should be noted that for those of ordinary skill in the art, without departing from the concept of this application, several modifications and improvements can still be made, and these all belong to the protection scope of this application.
Claims
1. A method for correcting a metal island structure, characterized in that: The steps include: Acquire a target pattern, wherein the target pattern includes a first type of metal island structure and a second type of metal island structure adjacently arranged in a first direction; When the area of the first type of metal island structure is smaller than the minimum area, adjusting the edge of the first type of metal island structure in the second direction until the pattern spacing of the edge of the first type of metal island structure in the second direction reaches a minimum; When the edges of the first type of metal island structure in the first direction are adjusted until the graphic spacing of the edges of the first type of metal island structure in the first direction is minimum, and the area of the first type of metal island structure is still smaller than the minimum area, the edges of the first type of metal island structure and the second type of metal island structure in the first direction are adjusted simultaneously until the area of the first type of metal island structure reaches the minimum area.
2. The method for correcting a metal island structure according to claim 1, characterized in that: Also includes: When the area of the first type of metal island structure reaches the minimum area and the area of the second type of metal island structure is less than the minimum area, adjust the edges of the second type of metal island structure in the first direction until the graphic spacing of the edges of the second type of metal island structure in the first direction is minimum, and adjust the edges of the second type of metal island structure in the second direction until the area of the second type of metal island structure reaches the minimum area.
3. The method for correcting a metal island structure according to claim 2, characterized in that: The first type of metal island structure and the second type of metal island structure include first type of edges and / or third type of edges in the first direction, the first type of edges represent edges opposite to metal island structures of different types, and the third type of edges represent edges opposite to metal island structures of the same type; the first type of metal island structure and the second type of metal island structure include second type of edges in the second direction, and the second type of edges represent edges opposite to long line structures.
4. The method for correcting a metal island structure according to claim 3, characterized in that: When adjusting the edge of the first type of metal island structure in the second direction, the second type of edge of the first type of metal island structure is offset outward in the second direction; When the sides of the first-type metal island structures in the first direction are adjusted, the first-type sides of the first-type metal island structures are offset outward in the first direction.
5. The method for correcting a metal island structure according to claim 4, characterized in that: The second type edges at both ends of the first type metal island structure have opposite offset directions and the same offset amount along the second direction, and the first type edges at both ends of the first type metal island structure have opposite offset directions and the same offset amount along the first direction.
6. The method for correcting a metal island structure according to claim 3, characterized in that: When the edges of the first type metal island structure and the second type metal island structure in the first direction are adjusted simultaneously, the first type of edge of the second type metal island structure is offset along the first direction, and the third type of edge of the second type metal island structure is fixed.
7. The method for correcting a metal island structure according to claim 6, characterized in that: When the edges of the first type of metal island structure and the second type of metal island structure in the first direction are adjusted at the same time, the first type of edge of the first type of metal island structure is offset outward along the first direction, and the first type of edge of the second type of metal island structure is offset inward along the first direction, and the offset amount of the first type of edge of the first type of metal island structure is the same as the first type of edge of the second type of metal island structure.
8. The method for correcting a metal island structure according to claim 3, characterized in that: Adjusting the edges of the second type of metal island structures in the first direction includes: shifting the first type of edges of the second type of metal island structures outward along the first direction until the pattern spacing of the first type of edges of the second type of metal island structures in the first direction reaches a minimum, and shifting the third type of edges of the second type of metal island structures outward along the first direction until the pattern spacing of the third type of edges of the second type of metal island structures in the first direction reaches a minimum; Adjusting the edges of the second-type metal island structures in the second direction includes: the second-type edges at both ends of the second-type metal island structures are offset outward along the second direction.
9. The method for correcting a metal island structure according to claim 1, characterized in that: An area of the first type metal island structure is not greater than an area of the second type metal island structure.
10. The method for correcting a metal island structure according to any one of claims 1 to 9, characterized in that: When the graphic spacing of the edges of the first type of metal island structure or the second type of metal island structure in the first direction or the second direction reaches a minimum, the spacing between the edges of the first type of metal island structure or the second type of metal island structure and adjacent graphics reaches a minimum, and the offset of the edges of the first type of metal island structure or the second type of metal island structure in this direction reaches a maximum.