Multi-fluid material continuous circulation distribution valve of fixed continuous bed

Abstract

The invention relates to a multi-fluid material continuous circulation distribution valve of a fixed continuous bed. Comprising an upper valve body and a lower valve body. The upper valve body and the lower valve body are each composed of a fixed disc and a rotating disc. A stepping speed reducer shaft is connected with and drives an upper valve body shaft through a coupler, and the upper valve body shaft and the lower valve body shaft are connected through a coupler. Different materials are distributed to a reaction tower and a discharging device through mutually separated annular flow grooves in the upper valve body and the lower valve body, a rotary disc distribution pipe and a fixed disc feeding and discharging flange pipe. A connecting process pipeline is arranged between the distribution holes of the upper rotating disc and the lower rotating disc according to process requirements, and multiple processes can be carried out at the same time. And the process cycle operation is realized through timing stepping rotation switching of the upper and lower rotating discs. The problem of heavy load caused by simultaneous rotation of all reaction towers and valve bodies in the operation of the existing continuous bed device is solved, and the switching time, the engineering facility investment and the operation energy consumption are saved. Meanwhile, the requirement for changing the process can be met conveniently through adjustment of the process pipeline, and the flexibility of the production process is guaranteed.

Description

Technical Field

[0001] The present invention relates to the technical field of chemical machinery and equipment, and particularly relates to a fixed continuous bed multi-fluid material continuous circulation distribution valve. Background Art

[0002] In modern industrial production, continuous beds are widely used in many fields such as chemical industry, pharmaceuticals, environmental protection, and food. Due to the diversity of application scenarios, continuous beds face many complex situations in different fields and production processes, such as different numbers of reaction towers, different types and flow rates of materials to be transported, and greatly different process flows. The existing distribution devices and methods have obvious limitations when facing these complex situations.

[0003] The existing continuous beds can be roughly divided into two categories according to their equipment characteristics: one is a simulated continuous bed using what is called "valve array" control, and the other is a mobile continuous bed that intermittently drives a large reaction tower group to rotate.

[0004] The characteristics of the simulated continuous bed technology are: each reaction tower group in each set of reaction devices is fixedly installed according to a certain layout, each tower is connected to various materials by pipelines and controlled by valves, and the towers are also connected by pipelines and controlled by valves according to the series-parallel process requirements. During operation, by frequently switching the on / off states of the valves on each pipeline, the cyclic operation of the production process is realized. Its advantages are that large reaction towers can be fixedly installed and process adjustment can be achieved by changing pipeline connections, but the disadvantages are that there are numerous pipelines and complex connections; there are more valves and controllers on each pipeline, forming a "valve array", with complex control, and the equipment investment, failure rate, and maintenance rate increase greatly accordingly.

[0005] The material distribution device of the moving continuous bed is connected by a fixed part and a rotatable part. The material distribution required by the process is realized inside the internal structure of the distribution device. The reaction tower group in the overall reaction device is arranged in a ring shape and installed on a circular track, and is connected to the rotatable part of the distribution device through pipelines. During operation, the entire reaction tower group rotates synchronously with the rotatable part of the distribution device and the connecting pipelines, finally completing the entire production process flow and realizing cyclic operation. The advantage of the moving continuous bed is that, compared with the simulated continuous bed, the number of connecting pipelines and valves is greatly reduced, the layout of the overall reaction device is more concise and reasonable, and the operation is more stable. However, its disadvantages are as follows: all the reaction tower groups, the rotatable part of the distribution device, and the connecting pipelines must rotate intermittently on the track during switching, which requires a large driving weight. Especially for large chemical production devices such as adsorption, the reaction towers, the filled materials, and the auxiliary devices, plus the fluid materials in the reaction towers and pipelines, the total weight can be as high as nearly a thousand tons. During the switching rotation, it is necessary to frequently start and brake, which not only requires a large amount of foundation engineering work and high quality requirements, but also requires large, complex, and high-power driving equipment. The energy consumption during the overall operation is high, and the switching time is long. Since the reaction tower group must rotate on the track, it is difficult or infeasible to pressurize through a pump in the middle of the series-connected towers during multi-tower series connection, which greatly limits the application of the multi-stage series process. Therefore, it is of great practical significance and urgency to develop an efficient distribution valve system and its operation method that can overcome the above defects and is applicable to continuous reaction tower groups in multiple fields. Summary of the Invention

[0006] Object of the Invention: The object of the present invention is to provide a lightweight and highly efficient fluid material distribution valve applicable to continuous reaction tower groups in multiple fields, so as to solve the problems of the existing distribution device such as complex structure, large volume, heavy weight, large amount of foundation engineering work, high investment, high energy consumption, and inconvenient process adjustment, and to improve the key technical equipment in the continuous bed system.

[0007] Technical Solution - Structure of the Distribution Valve System: The distribution valve system of the present invention is generally composed of an upper valve body, a lower valve body, and other accessories. The installation bracket is fixedly installed on the concrete floor and is divided into three platforms. Each platform has a circular installation hole and bolt holes around it. The upper platform is fixedly installed with a stepping reduction gear through bolts. The middle platform is fixedly installed with the upper fixed disk of the upper valve body of the distribution valve, and the lower platform is fixedly installed with the lower fixed disk of the lower valve body. The driving shaft of the stepping reduction gear is connected to the upper end of the upper driving shaft of the upper valve body through a coupling. The lower end of the upper driving shaft of the upper valve body is connected to the upper end of the lower driving shaft of the lower valve body through a coupling. Finally, the stepping reduction gear drives the rotation distribution mechanism to rotate step by step.

[0008] The zero - parts and assembly structures of the upper valve body and the lower valve body are basically the same, which is convenient for unified manufacturing and mutual replacement. The lower valve body mainly includes a fixed disk (including assembly accessories), a rotating disk (including assembly accessories), and other assembly accessories. On the front of the fixed disk, there is a central shaft hole. On both sides above and below the shaft hole, there are paired front bearing holes and reverse bearing holes for installing aligning thrust ball bearings. Radially outward from the shaft hole, there are 8 annular grooves in sequence, including a support spring chute, a fixed - disk water - isolating ring chute, a fixed - disk annular water - collecting trough, a fixed - disk seal ring B chute, a B - material annular flow chute, a seal ring A chute, an A - material annular flow chute, and a fixed - disk annular gasket chute. Each annular groove has a specific function. For example, at the bottom of the support spring chute, there is a support spring tension - adjusting bolt group in the support spring tension - adjusting screw hole group for adjusting the tension degree of the support spring; at the bottom of the fixed - disk annular water - collecting trough, there is a drain screw hole group for draining possible accumulated water. At the bottom of the B - material annular flow chute and the A - material annular flow chute, there are installation holes for the main discharge pipes, and the main B - material discharge pipe and the main A - material discharge pipe are installed respectively. On the outermost side of the fixed disk, there are through - holes for installing the support platform for fixing on the support platform.

[0009] In the middle of the front of the rotating disk is the rotating - disk shaft hole (through - hole). Outward in sequence, there are 6 annular grooves, including a thrust ball bearing and support spring installation groove, a rotating - disk water - isolating ring clamping groove, a rotating - disk annular water - collecting trough, a rotating - disk seal ring B installation groove, a rotating - disk seal ring A installation groove, and a rotating - disk annular gasket installation groove. Between the rotating - disk seal ring A installation groove and the rotating - disk annular gasket installation groove is annular surface A, and between the rotating - disk seal ring B installation groove and the rotating - disk seal ring A installation groove is annular surface B. On the inner surface of the shaft hole, there is a set of cylindrical pin clamping grooves, which cooperate with the cylindrical pins on the driving shaft so that the rotating disk can move axially along the driving shaft but cannot rotate relatively. Each annular groove also has corresponding functions. For example, the thrust ball bearing and support spring installation groove installs the thrust ball bearing, the support spring frame, and the support spring; at the bottom of the rotating - disk annular water - collecting trough, there is a drain screw hole group; the rotating - disk seal ring installation groove places the seal ring; the rotating - disk annular gasket installation groove has a set of distribution holes corresponding to the installation holes of the inlet - outlet flange pipes on the fixed disk. On annular surface B, there is a set of conversion holes corresponding to the B - material annular flow chute on the fixed disk, and on annular surface A, there is a set of conversion holes corresponding to the A - material annular flow chute on the fixed disk.

[0010] After assembly, the A - material annular flow chute of the fixed disk, the annular surface A of the lower rotating disk, and the annular gaskets and seal ring A on both sides together form an A - material annular flow chamber. In the A - material annular flow chamber, one side of the chamber is connected to the A - material inlet - outlet main pipe installed on the reverse side of the fixed disk through the installation hole at the bottom of the A - material annular flow chute of the fixed disk; the other side of the chamber is connected to the corresponding distribution hole through the distribution pipe on the reverse side of the rotating disk and further connected to the corresponding flange pipe.

[0011] Similarly, the annular flow channel of Material B on the fixed disk, the annular surface B of the rotating disk, and the sealing rings A and B on both sides together form an annular flow chamber for Material B. In the annular flow chamber of Material B, one side of the chamber is connected to the main inlet / outlet pipe for Material B installed on the reverse side of the fixed disk through the Material B installation hole at the bottom of the annular flow channel of Material B, and is connected to the corresponding distribution hole through the distribution pipe on the reverse side of the rotating disk and further connected to the corresponding flange pipe.

[0012] The rotating distribution mechanism composed of the upper rotating disk, the lower rotating disk and the attached pipe fittings is such that the upper rotating disk and the lower rotating disk are in a concentric position; the distribution hole groups on the upper rotating disk and the distribution hole groups on the lower rotating disk are concentric and correspond to each other one by one, and their relative positions remain unchanged during the rotation and switching process. According to the process requirements, the series pipes for Materials A and B can be respectively connected to the lower distribution holes on different lower rotating disks and the upper distribution holes on the upper rotating disk, that is, the series relationship of the flows of Materials A and B can be completed respectively according to the process requirements.

[0013] When the stepping reduction gear is driven to switch, the upper and lower rotating disks rotate simultaneously. The distribution holes on the upper and lower rotating disks are in one-to-one correspondence and connected to the inlet / outlet flange pipes on the upper and lower fixed disks. After the switching is completed, the distribution holes on the upper and lower rotating disks are re-connected to the inlet / outlet flange pipes on the fixed disk in a new position in one-to-one correspondence, realizing the cyclic operation of the same process in the reaction tower group.

[0014] After the overall assembly of the upper valve body and the lower valve body is completed, when the upper valve body is used as the inlet distribution valve body for Material A, the corresponding lower valve body is used as the outlet valve body for Material A, and vice versa; when the upper valve body is used as the inlet distribution valve body for Material B, the corresponding lower valve body is used as the outlet valve body for Material B, and vice versa.

[0015] The operation mode is characterized in that: The operation method of the distribution valve system of the present invention is based on the above structure and can realize the cyclic distribution of multiple materials in different numbers of reaction towers. Taking a typical adsorption and desorption process as an example, the inlets and outlets of the upper and lower valve bodies are numbered. According to the process requirements, the synchronous rotation of the rotary distribution mechanism composed of the upper and lower rotary disks and connecting pipe fittings is driven by a stepping reduction gear to realize the switching of the material distribution path. In the initial stage, the distribution hole groups on the upper and lower rotary disks are aligned with the feed flange pipes and discharge flange pipes on the upper and lower fixed disks respectively, and the materials flow according to the set process path. For example, Material A enters the annular flow channel of Material A on the fixed disk in the upper valve body through the feed buffer tank and the main feed pipe, and is divided into two strands to enter the corresponding reaction towers through the conversion holes, distribution pipes, distribution holes, and feed flange pipes, and after completing the reaction process required by the process between the towers through the series pipes, it finally discharges from the device through the discharge port, pump, and the discharge flange pipe, distribution holes, annular flow channel of Material A, and the main discharge pipe in the lower valve body; the same applies to Material B. When the reaction reaches the specified time, the upper and lower rotary disks rotate synchronously counterclockwise by 60 degrees, switching to the next process state, and the material distribution path changes accordingly. After six switches, the entire device returns to the initial process state to achieve cyclic operation.

[0016] The distribution valve system of the present invention is not only applicable to the case of two materials and six reaction towers, but can also be expanded according to actual needs. When multiple materials need to be processed, only the number of annular flow channels and seal ring chute grooves equal to the number of material types needs to be added on the fixed disk, and at the same time, the corresponding annular surfaces, conversion hole groups, and seal ring installation grooves are added on the rotary disk to realize the simultaneous processing of multiple materials. When the number of reaction tower groups required is different, only according to the actual number of reaction towers in the reaction tower group, by matching the same number and evenly distributed discharge flange pipe installation holes and discharge flange pipes on the annular seal washer chute grooves and annular seal washers of the upper and lower fixed disks, and matching the corresponding number of conversion holes and distribution holes in each conversion hole group on the upper and lower rotary disks, the material distribution of the corresponding number of reaction towers can be realized. At the same time, the distribution valve device of the present invention is not limited to the process in this example. By adjusting the positions of the upper and lower distribution holes connected by the series pipes, increasing the number of series pipes (simultaneously reducing the connection number of the distribution pipes and distribution holes), or replacing the multi-way distribution pipes and multi-way series pipes, it can be easily adjusted to various series and parallel reaction processes without modifying or remanufacturing other components of the distribution valve. Beneficial effects

[0017] Simplify system structure: The existing simulated continuous bed has many pipelines and complex connections, and the valves and controllers form a "valve array". Although the mobile continuous bed reduces the number of connecting pipelines and valves, the reaction tower group needs to rotate intermittently on the track. The new high-efficiency distribution valve system can break through these limitations and greatly simplify the system structure of the entire continuous reaction tower group. It no longer relies on a complex "valve array" and does not require the reaction tower group to perform high-energy intermittent rotation on the track, reducing unnecessary equipment and making the overall layout more compact and reasonable. Reduce equipment investment and maintenance costs: The complex piping and valve systems of simulated continuous beds lead to a significant increase in equipment investment, failure rate, and maintenance rate; the mobile continuous bed also brings high equipment costs and operation and maintenance costs due to its large rotating parts and high energy consumption requirements. The new system directly reduces equipment investment costs by simplifying the structure, reducing valves, controllers, large rotating drive equipment, and basic engineering. At the same time, the reduction in the number of equipment and the improvement of operating stability have significantly reduced the failure rate and maintenance rate of the system, further saving maintenance costs. Improve operational stability and reliability: Frequent valve switching of simulated continuous beds can easily cause failures, and mobile continuous beds, including heavily loaded reaction towers, need to be frequently started and braked due to intermittent rotation, which affects operational stability. The new high-efficiency distribution valve system and its operation method avoid these unstable factors, ensure stable material transportation and distribution during the production process through innovative material distribution methods, reduce mechanical wear and failure probability of equipment, and greatly improve the stability and reliability of the continuous reaction tower group operation. Reduce energy consumption: When the mobile continuous bed is switched to rotate, the reaction tower group and the rotating part rotate at the same time. The large continuous bed even needs to drive nearly a thousand tons of weight, which consumes a lot of energy. The new system only needs to drive the upper and lower rotating disks to achieve the same distribution function. It adopts a more energy-saving material distribution and operation mechanism. While ensuring the smooth progress of the production process, it greatly reduces energy consumption, conforms to the green production concept of sustainable development, and saves a lot of energy costs for enterprises.

[0018] Efficient operation: The stepper reducer drives the upper and lower rotating disks to rotate synchronously, and the rotating part achieves a simple and lightweight structure. The switching between different process states is fast and stable, which reduces the downtime in the production process and improves production efficiency. At the same time, the assembly structure of the distribution valve system is reasonably designed, easy to install and maintain, reducing maintenance costs and downtime, and further improving production efficiency.

[0019] Precise distribution: The unique valve body structure design, especially the precisely arranged annular grooves, conversion hole groups, and distribution hole groups on the fixed disk and the rotating disk, can ensure the precise distribution of materials between the reaction towers, meeting the strict requirements of different processes for material flow rate and distribution sequence. Compared with traditional distribution valves, it greatly improves the accuracy of material distribution, reduces production problems caused by distribution errors, and improves product quality and production efficiency.

[0020] High adaptability: It can flexibly adapt to various requirements of continuous reaction tower groups in different fields and different production processes, including different numbers of reaction towers, various materials, and complex process flows. By simply increasing the number of annular flow grooves and seal ring sliding grooves on the fixed disk, the annular surface, conversion hole groups, and seal ring installation grooves on the rotating disk, the processing of various materials can be achieved. By increasing the distribution holes, conversion holes, and inlet / outlet flange pipes, the material distribution for the corresponding number of reaction towers can be realized.

[0021] Expanding the scope of process applications: In the moving continuous bed, due to the rotation of the reaction tower group on the track, it is impossible or inconvenient to increase the pressure of the booster pump before and after the reaction tower, which limits the application of the multi-stage series process. The new high-efficiency distribution valve system breaks this limitation and can flexibly adapt to different process requirements of continuous reaction tower groups in multiple fields. In particular, it provides the possibility for the wide application of the multi-stage series process, enabling enterprises to choose more diverse and optimized process flows according to actual needs during production, improving production efficiency and product quality. Description of the drawings

[0022] Figure 1 : Three-dimensional view of the fixed continuous bed multi-material continuous circulation distribution valve Figure 2 : Exploded view of the total assembly of the fixed continuous bed continuous circulation distribution valve Figure 3 : Schematic assembly diagram of the lower valve body of the continuous circulation distribution valve Figure 4 : Schematic front view structure of the fixed disk of the lower valve body of the distribution valve Figure 5 : Schematic front view assembly relationship diagram of the fixed disk of the lower valve body of the distribution valve Figure 6 : Schematic reverse view assembly relationship diagram of the fixed disk of the lower valve body of the distribution valve Figure 7 : Three-dimensional sectional view of the assembly of the lower fixed disk of the distribution valve and the drive shaft Figure 8 : Sectional view of the assembly of the lower fixed disk of the distribution valve and the drive shaft Figure 9 : Schematic three-dimensional front view assembly diagram of the rotating disk of the lower valve body Figure 10 : Three-dimensional sectional view of the reverse side of the rotating disk of the lower valve body Figure 11 : Three-dimensional sectional view of the front assembly of the lower valve body rotating disk Figure 12 : Schematic diagram of the assembly of the drive shaft of the lower valve body Figure 13 : Schematic diagram of the assembly of the lower valve body rotating disk and the drive shaft Figure 14 : Three-dimensional sectional view of the lower valve body assembly-- Figure 9 : Three-dimensional sectional view of the lower valve body assembly Figure 15 : Material hole numbers of the upper and lower valve body assemblies of the distribution valve Figure 1 Figure 16 : Material hole numbers of the upper and lower valve body assemblies of the distribution valve Figure 2 Figure 17 : Schematic diagram of the pipeline connection relationship of the upper valve body Figure 18 : Schematic diagram of the pipeline connection relationship of the lower valve body Figure 19 : Sectional view of the pipeline connection relationship between the upper and lower valve bodies Figure 20 : Assembly relationship diagram of the distribution valve in the fixed continuous bed device Figure 21 : Schematic diagram of the process at the initial stage of continuous bed operation Figure 22 : Schematic diagram of the process after the first switch in continuous bed operation Figure 23 : Schematic diagram of the process after the second switch in continuous bed operation Figure 24 : Schematic diagram of the process after the fifth switch in continuous bed operation Figure 25 : Simplified diagram of the material flow path in process state A at the initial stage Figure 26 : Simplified diagram of the material flow path in process state B at the initial stage Figure 27 : Simplified diagram of the material flow path in process state A after the first switch Figure 28 : Simplified diagram of the material flow path in process state B after the first switch Figure 29 : Simplified diagram of the material flow path in process state A after the second switch Figure 30 : Simplified diagram of the material flow path in process state B after the second switch Figure 31 : Schematic diagram of other typical processes of the continuous bed In the figure: 1. Continuous distribution valve; 2. Installation bracket; 3. Step - by - step reduction gear 4. Upper fixed disk of the upper valve body of the distribution valve 5. Upper rotating disk of the upper valve body of the distribution valve 6. Process pipelines and accessories 7. Lower rotating disk of the lower valve body of the distribution valve 8. Lower fixed disk of the lower valve body of the distribution valve 9. Main A - material feed pipe 10. Main A - material discharge pipe 11. Main B - material feed pipe 12. Main B - material discharge pipe 13. Coupling A (connecting the upper drive shaft of the upper valve body and the lower drive shaft of the lower valve body) 14. Coupling B (connecting the drive shaft of the step - by - step reduction gear and the upper end of the upper drive shaft of the upper valve body) 15. Upper valve body drive shaft 16. Lower valve body drive shaft 17. Stepping motor 18. Reduction gear drive shaft 19. Compression spring 20. Compression spring gasket 21. Compression spring adjusting nut 22. Compression spring locking nut 23. Upper waterproof cover 24. Reverse self - aligning thrust ball bearing 25. Bearing retaining ring 26. Bearing fixing nut 27. Bearing locking nut 28. Waterproof protective sleeve 29. Discharge flange pipe group 30. Installation hole for the main A - material discharge pipe (located at the bottom of the A - material annular flow channel of the fixed disk, through - hole) 31. Installation hole A for the main A - material discharge pipe (located at the bottom of the A - material annular flow channel of the fixed disk, through - hole) 32. Installation hole for the main B - material discharge pipe (located at the bottom of the B - material annular flow channel of the fixed disk, through - hole) 33. Reverse bearing hole (for installing the reverse self - aligning thrust ball bearing, on the reverse side of the lower fixed disk) 34. Front self - aligning thrust ball bearing 35. Front bearing hole (for installing the front self - aligning thrust ball bearing, on the front side of the lower fixed disk) 36. Shaft hole (located at the center of the front side of the lower fixed disk) 37. Support spring chute (located on the front of the lower fixed disk, radially distributed outward from the shaft hole); 38. Fixed disk water isolation ring chute (located on the front of the lower fixed disk, radially distributed outward from the shaft hole); 39. Fixed disk annular water collecting tank (located on the front of the lower fixed disk, radially distributed outward from the shaft hole); 40. Annular water collecting tank drain screw hole group (located at the bottom of the fixed disk annular water collecting tank); 41. Fixed disk sealing ring B chute (located on the front of the lower fixed disk, radially distributed outward from the shaft hole); 42. B material annular flow channel (located on the front of the lower fixed disk, radially distributed outward from the shaft hole); 43. Sealing ring A chute (located on the front of the lower fixed disk, radially distributed outward from the shaft hole); 44. Lower part A material annular flow channel (located on the front of the lower fixed disk, radially distributed outward from the shaft hole); 45. Lower fixed disk annular sealing gasket chute (located on the front of the lower fixed disk, radially distributed outward from the shaft hole); 46. Discharge flange pipe mounting hole group (located above the fixed disk annular sealing gasket chute); 47. Fixed disk support platform mounting hole; 48. Support spring tension adjustment screw hole group (located at the bottom of the support spring chute, leading to the reverse side of the fixed disk); 49. Fixed disk waterproof cover mounting screw hole; 50. Annular sealing gasket; 51. Sealing ring A; 52. Sealing ring B; 53. Water isolation ring; 54. Thrust ball bearing; 55. Support spring bracket; 56. Support spring; 57. Rotating disk shaft hole (located at the center of the front of the lower valve body rotating disk); 58. Thrust ball bearing and support spring installation groove (located on the front of the lower valve body rotating disk, radially distributed outward from the shaft hole); 59. Lower rotating disk water isolation ring card slot (located on the front of the lower valve body rotating disk, radially distributed outward from the shaft hole); 60. Lower rotating disk annular water collecting tank (located on the front of the lower valve body rotating disk, radially distributed outward from the shaft hole); 61. Rotating disk annular water collecting tank drain screw hole group (located at the bottom of the rotating disk annular water collecting tank); 62. Lower rotating disk sealing ring B installation groove (located on the front of the lower valve body rotating disk, radially distributed outward from the shaft hole); 63. Lower rotating disk seal ring A installation groove (located on the front of the lower valve body rotating disk, distributed outward from the shaft hole); 64. Lower rotating disk annular sealing washer installation groove (located on the front of the lower valve body rotating disk, distributed outward from the shaft hole); 65. Distribution hole group (located in the lower rotating disk annular sealing washer installation groove); 66. A material conversion hole group (located on the annular surface 95 between the lower rotating disk seal ring A installation groove and the lower rotating disk annular sealing washer installation groove); 67. B material conversion hole group (located on the annular surface 96 between the lower rotating disk seal ring B installation groove and the lower rotating disk seal ring A installation groove); 68. Cylindrical pin card slot group (located on the inner surface of the rotating disk shaft hole); 69. Compression spring card slot (located on the upper reverse side of the rotating disk for installing the compression spring); 72. Semi-circular card slot (located on the inner and outer edges of the lower rotating disk annular sealing washer installation groove); 73. Snap fastener (located on the inner and outer edges of the annular sealing washer to prevent it from sliding); 74. Cylindrical pin group; 75. Semi-circular cross-section cylindrical pin slot group (located on the shaft section where the drive shaft is installed in the rotating disk shaft hole); 76. Upper part A material distribution pipe; 77. Upper part A material distribution pipe A; 78. Upper part B material distribution pipe; 79. Material A series connection pipe; 80. Material A series connection pipe A; 81. Material B series connection pipe; 82. Lower part A material distribution pipe; 83. Lower part A material distribution pipe A; 84. Lower part B material distribution pipe; 85. Plug; 86. Upper valve body; 87. Lower valve body; 88. Support spring adjustment bolt group; 89. A material feed buffer tank; 90. B material feed buffer tank; 91. Upper fixed disk A material annular flow channel; 92. Upper fixed disk B material annular flow channel; 93. A material feed pump; 94. B material feed pump; 95. Annular surface A; 96. Annular surface B; 101. Upper conversion hole A for Material B (located on the upper rotating disk 5 in the upper part of the upper valve body 86); 102. Upper conversion hole B for Material B (located on the upper rotating disk 5 in the upper part of the upper valve body 86); 103. Upper conversion hole C for Material B (located on the upper rotating disk 5 in the upper part of the upper valve body 86); 104. Upper conversion hole D for Material B (located on the upper rotating disk 5 in the upper part of the upper valve body 86); 105. Upper conversion hole E for Material B (located on the upper rotating disk 5 in the upper part of the upper valve body 86); 106. Upper conversion hole F for Material B (located on the upper rotating disk 5 in the upper part of the upper valve body 86); 111. Upper conversion hole A for Material A (located on the upper rotating disk 5 in the upper part of the upper valve body 86); 112. Upper conversion hole B for Material A (located on the upper rotating disk 5 in the upper part of the upper valve body 86); 113. Upper conversion hole C for Material A (located on the upper rotating disk 5 in the upper part of the upper valve body 86); 114. Upper conversion hole D for Material A (located on the upper rotating disk 5 in the upper part of the upper valve body 86); 115. Upper conversion hole E for Material A (located on the upper rotating disk 5 in the upper part of the upper valve body 86); 116. Upper conversion hole F for Material A (located on the upper rotating disk 5 in the upper part of the upper valve body 86); 121. Upper distribution hole A (located on the upper rotating disk 5 in the upper part of the upper valve body 86); 122. Upper distribution hole B (located on the upper rotating disk 5 in the upper part of the upper valve body 86); 123. Upper distribution hole C (located on the upper rotating disk 5 in the upper part of the upper valve body 86); 124. Upper distribution hole D (located on the upper rotating disk 5 in the upper part of the upper valve body 86); 125. Upper distribution hole E (located on the upper rotating disk 5 in the upper part of the upper valve body 86); 126. Upper distribution hole F (located on the upper rotating disk 5 in the upper part of the upper valve body 86); 131. Feed flange pipe A (located on the upper fixed disk 4 in the upper part of the upper valve body 86); 132. Feed flange pipe B (located on the upper fixed disk 4 in the upper part of the upper valve body 86); 133. Feed flange pipe C (located on the upper fixed plate 4 in the upper part of the upper valve body 86); 134. Feed flange pipe D (located on the upper fixed plate 4 in the upper part of the upper valve body 86); 135. Feed flange pipe E (located on the upper fixed plate 4 in the upper part of the upper valve body 86); 136. Feed flange pipe F (located on the upper fixed plate 4 in the upper part of the upper valve body 86); 151. Reaction tower A; 152. Reaction tower B; 153. Reaction tower C; 154. Reaction tower D; 155. Reaction tower E; 156. Reaction tower F; 161. Lower discharge outlet A of the reaction tower (corresponding to reaction tower No. 151); 162. Lower discharge outlet B of the reaction tower (corresponding to reaction tower No. 152); 163. Lower discharge outlet C of the reaction tower (corresponding to reaction tower No. 153); 164. Lower discharge outlet D of the reaction tower (corresponding to reaction tower No. 154); 165. Lower discharge outlet E of the reaction tower (corresponding to reaction tower No. 155); 166. Lower discharge outlet F of the reaction tower (corresponding to reaction tower No. 156); 171. Discharge flange pipe A (located on the lower fixed plate 8 in the lower part of the lower valve body 87); 172. Discharge flange pipe B (located on the lower fixed plate 8 in the lower part of the lower valve body 87); 173. Discharge flange pipe C (located on the lower fixed plate 8 in the lower part of the lower valve body 87); 174. Discharge flange pipe D (located on the lower fixed plate 8 in the lower part of the lower valve body 87); 175. Discharge flange pipe E (located on the lower fixed plate 8 in the lower part of the lower valve body 87); 176. Discharge flange pipe F (located on the lower fixed plate 8 in the lower part of the lower valve body 87); 181. Lower distribution hole A (located on the lower rotating disk 7 in the lower part of the lower valve body 87); 182. Lower distribution hole B (located on the lower rotating disk 7 in the lower part of the lower valve body 87); 183. Lower distribution hole C (located on the lower rotating disk 7 in the lower part of the lower valve body 87); 184. Lower distribution hole D (located on the lower rotating disk 7 in the lower valve body 87); 185. Lower distribution hole E (located on the lower rotating disk 7 in the lower valve body 87); 186. Lower distribution hole F (located on the lower rotating disk 7 in the lower valve body 87); 191. Lower conversion hole A for Material A (located on the lower rotating disk 7 in the lower valve body 87); 192. Lower conversion hole B for Material A (located on the lower rotating disk 7 in the lower valve body 87); 193. Lower conversion hole C for Material A (located on the lower rotating disk 7 in the lower valve body 87); 194. Lower conversion hole D for Material A (located on the lower rotating disk 7 in the lower valve body 87); 195. Lower conversion hole E for Material A (located on the lower rotating disk 7 in the lower valve body 87); 196. Lower conversion hole F for Material A (located on the lower rotating disk 7 in the lower valve body 87); 201. Lower conversion hole A for Material B (located on the lower rotating disk 7 in the lower valve body 87); 202. Lower conversion hole B for Material B (located on the lower rotating disk 7 in the lower valve body 87); 203. Lower conversion hole C for Material B (located on the lower rotating disk 7 in the lower valve body 87); 204. Lower conversion hole D for Material B (located on the lower rotating disk 7 in the lower valve body 87); 205. Lower conversion hole E for Material B (located on the lower rotating disk 7 in the lower valve body 87); 206. Lower conversion hole F for Material B (located on the lower rotating disk 7 in the lower valve body 87); 211. Booster pump A (connected in series with the outlet of the 151st reaction tower); 212. Booster pump B (connected in series with the outlet of the 152nd reaction tower); 213. Booster pump C (connected in series with the outlet of the 153rd reaction tower); 214. Booster pump D (connected in series with the outlet of the 154th reaction tower); 215. Booster pump E (connected in series with the outlet of the 155th reaction tower); 216. Booster pump F (connected in series with the outlet of the 156th reaction tower); Detailed implementation mode

[0023] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present invention without creative efforts shall fall within the protection scope of the present invention.

[0024] Embodiment 1: A fixed continuous bed multi-fluid material continuous circulation distribution valve Structure and assembly: As Figure 1 and Figure 20 shown, a device of a fixed continuous bed multi-fluid material continuous circulation distribution valve 1, which is a material distribution device in a continuous bed production system, and its assembly relationship in the overall continuous bed system is as Figure 20 shown. The multi-fluid material continuous circulation distribution valve 1 includes a mounting bracket 2, an upper valve body 86, a lower valve body 87 and attached pipe fittings 6; the mounting bracket 2 is fixed to the concrete floor and is provided with three platforms with circular mounting holes and bolt holes. The upper platform mounts a stepping speed reducer 3, the upper part of the stepping speed reducer mounts a stepping motor 17, the lower part mounts a speed reducer drive shaft 18, the middle platform mounts an upper fixing plate 4 of the upper valve body 86 of the distribution valve, and the lower platform mounts a lower fixing plate 8 of the lower valve body 87. The upper valve body 86 and the lower valve body 87 have the same structure and are symmetrically installed; the vertical parts of the inlet and outlet flange pipe groups on the upper fixing plate 4 and the lower fixing plate 8 are in one-to-one vertical concentric correspondence. The upper rotating disk 5 in the upper valve body 86, the lower rotating disk 7 in the lower valve body 87 and the assembled attached pipe fittings 6 together form a rotating distribution mechanism. The drive shaft 18 of the stepping speed reducer 3 is connected to the upper end of the upper drive shaft 15 of the upper valve body 86 through coupling B 14, and the lower end of the upper drive shaft 15 is connected to the upper end of the lower drive shaft 16 of the lower valve body 87 through coupling A13; As Figure 1 and Figure 2 shown, the lower valve body 87 includes a lower rotating disk 7, a lower fixing plate 8 and A, B material lower distribution pipes 82, 83, 84 required by the process. The lower rotating disk 7 and the lower fixing plate 8 are concentrically assembled, and the relative mating surfaces of the lower rotating disk 7 and the lower fixing plate 8 are both the front surfaces, and sealing members 50, 51, 52 that seal between the lower rotating disk 7 and the lower fixing plate 8 and at the same time separate the A and B material tanks are installed in the middle.

[0025] The zero-matching parts and assembly structures of the upper valve body 86 and the lower valve body 87 are the same, except that the thrust ball bearing 54, the support spring frame 55 and the support spring 56 that play a supporting role are not assembled in the upper valve body 86.

[0026] AsFigure 3 , Figure 4 , Figure 5 and Figure 6 As shown in Figure 3 , Figure 4 , Figure 5 and Figure 6 , on the front of the lower fixed disk 8 of the lower valve body 87, the center of the lower fixed disk 8 is a shaft hole 36 (through hole). On both sides of the shaft hole 36, there are front and reverse bearing holes 35 and 33 for installing self-aligning thrust ball bearings 34 and 24. Radially outward from the shaft hole 36 on the front of the lower fixed disk 8, there are successively a fixed disk support spring chute 37, a fixed disk water isolation ring chute 38, a fixed disk annular water collecting trough 39, a fixed disk seal ring B chute 41, a B material annular flow chute 42, a seal ring A chute 43, an A material annular flow chute 44, and a fixed disk annular seal gasket chute 45. At the bottom of the support spring chute 37, there is a support spring tension adjustment screw hole group 48 which is a through hole. Between the support spring tension adjustment screw hole group 48 and the reverse bearing hole 33 beside it, there is also a fixed disk waterproof cover installation screw hole 49. At the bottom of the fixed disk annular water collecting trough 39, there is a drainage screw hole group 40 which is a through hole. At the bottoms of the B material and A material annular flow chutes 42 and 44, there are discharge main pipe installation holes 32, 30, and 31 which are through holes. At the bottom of the fixed disk annular seal gasket chute 45, there are evenly distributed discharge flange installation holes 46 which are through holes. On the outermost side of the lower fixed disk 8, there is a support platform installation through hole group 47 which is a through hole, corresponding to the screw holes around the lower circular installation hole of the installation platform. The lower fixed disk 8 is fixedly installed on the lower platform. The upper fixed disk 4 is also installed in the circular installation hole of the middle layer platform. The structure of the upper fixed disk 4 of the upper valve body 86 is the same.

[0027] As Figure 5 , Figure 6 shown, one end of the A material discharge main pipe 10 of the lower fixed disk 8 is fixedly installed in the A material discharge main pipe installation holes 30 and 31 on the reverse side of the bottom of the A material annular flow chute 44, and the other end is the A material discharge port, discharging the reacted A material from the device; one end of the B material discharge main pipe 12 is fixedly installed in the B material discharge main pipe installation hole 32 on the reverse side of the lower fixed disk 8 and is communicated with the B material annular flow chute 42, and the other end is the B material discharge port, discharging the reacted B material from the device. Similarly, one end of the A and B material inlet and outlet main pipes 9 and 11 of the upper valve body is installed on the reverse side of the upper fixed disk 4 and is communicated with the A and B material annular flow chutes 91 and 92 on the front of the upper fixed disk 4, and the other end is connected to the A and B material inlet buffer tanks 89 and 90 through pipes, respectively inputting the fluid materials entering the A and B material inlet and outlet main pipes 9 and 11 into the A and B material annular flow chutes 91 and 92.

[0028] As Figure 6 , Figure 20As shown in the figure, on the annular sealing washer chute 45 on the front side of the lower fixed disk 8, 6 through holes are evenly distributed as the installation hole group 46 for the discharge flange pipe. The vertical ends of the feed flange pipe group 29, namely 171 - 176, installed from the reverse side of the lower fixed disk 8 are 90-degree elbow flange pipes. The horizontal ends, namely the ends with flanges, face outwards and are evenly arranged radially around the axis of the fixed disk. They are respectively fixedly connected to the corresponding reaction tower discharge ports 161 - 166 or the outlet booster pumps 211 - 216 through pipes. The assembly of the upper fixed disk 4 is the same as that of the lower fixed disk. The feed flange pipe groups 131 - 136 installed on the reverse side of the upper fixed disk 4 are respectively fixedly connected to the corresponding reaction tower inlets 141 - 146 through pipes.

[0029] As Figure 9 shown, on the front side of the lower rotating disk 7 in the lower valve body 87, the center of the axis is the rotating disk shaft hole 57. Outwardly, there are successively distributed a thrust ball bearing and a support spring installation groove 58, a rotating disk water isolation ring clamping groove 59, a rotating disk annular water collecting groove 60, a rotating disk sealing ring B installation groove 62, an annular surface B 96, a rotating disk sealing ring A installation groove 63, an annular surface A 95, and a rotating disk annular sealing washer installation groove 64. On the inner surface of the rotating disk shaft hole 57, there is a cylindrical pin clamping groove group 68. At the bottom of the rotating disk annular water collecting groove 60, there is a drainage screw hole group 61 which is a through hole. On the annular surface B 96 between the rotating disk sealing ring B installation groove 62 and the rotating disk sealing ring A installation groove 63, there are evenly distributed B material conversion hole groups 67 which are through holes. The number is the same as that of the distribution hole group 65 and corresponds to and communicates with the fixed disk B material annular flow groove 42. On the annular surface A 95 between the rotating disk sealing ring A chute 43 and the annular sealing washer chute 45, there are evenly distributed A material conversion hole groups 66 which are through holes. The number is the same as that of the distribution hole group 65 and corresponds to and communicates with the A material annular flow groove 44. In the rotating disk annular sealing washer installation groove 64, there are evenly distributed vertical distribution hole groups 65 which are through holes. They are the same in size, position, and number as the installation holes 46 for the inlet and outlet flange pipes on the annular sealing washer chute 45 on the lower fixed disk 8 and are evenly distributed. The structure of the upper rotating disk 5 is the same as that of the lower rotating disk 7.

[0030] As Figure 10As shown in the figure, on the reverse side of the lower rotating disk 7 of the distribution valve device, the lower distribution pipes 82 and 83 of Material A are assembled according to the process requirements to communicate with the lower conversion holes 193 and 194 and the lower distribution holes 183 and 184 in the Material A conversion hole group respectively. The remaining conversion holes 191, 192, 195, and 196 in the Material A conversion hole group are blocked with plugs and used as spare holes for process adjustment. The lower distribution pipe 84 of Material B is assembled according to the process requirements to communicate between the lower conversion hole 206 and the distribution hole 186 in the Material B conversion hole group, and the remaining Material B conversion holes 201, 202, 203, 204, and 205 are blocked with plugs and used as spare holes for process adjustment.

[0031] As Figure 2 , Figure 15 , Figure 16 , Figure 19 shown, the rotating distribution mechanism composed of the upper rotating disk 5, the lower rotating disk 7 and the attached pipe fittings 6. The upper rotating disk 5 and the lower rotating disk 7 are in a concentric position; the distribution hole groups 121 - 126 of the upper rotating disk 5 and the distribution hole groups 181 - 186 of the lower rotating disk 7 are respectively concentric and correspond one by one, and their relative positions remain unchanged during the rotation and switching process. The A-material series pipes 79 and 80 in the attached pipe fittings 6 are respectively connected to the lower distribution holes 181 and 182 on the lower rotating disk 7 and the upper distribution holes 124 and 123 on the upper rotating disk 5, and the B-material series pipe 81 in the attached pipe fittings 6 is connected to the lower distribution hole 185 on the lower rotating disk 7 and the upper distribution hole 126 on the upper rotating disk 5, that is, the series relationships of the flows of Materials A and B are respectively completed according to the process requirements.

[0032] As Figure 6 , Figure 7 , Figure 8 , Figure 9 , Figure 11 , Figure 14 and Figure 19As shown, after the lower valve body is assembled, the support spring installation groove 58 of the lower rotating disk 7 corresponds to the support spring slide groove 37 of the fixed disk, and the thrust ball bearing 54, the support spring frame 55 and the support spring 56 are installed in the middle; the rotating disk water isolation ring groove 59 corresponds to the fixed disk water isolation ring slide groove 38, and the water isolation ring 53 is installed in the middle; the rotating disk annular water collecting groove 60 corresponds to the fixed disk annular water collecting groove 39; the rotating disk sealing ring B, A installation grooves 62, 63 correspond to the fixed disk sealing ring B, A slide grooves 41, 43, respectively, and the sealing ring B and the sealing ring A 52, 51 are placed in the middle respectively; the rotating disk annular sealing gasket installation groove 64 corresponds to the fixed disk annular sealing gasket slide groove 45, and the annular sealing gasket 50 is placed in the middle, and the annular sealing gasket 50 is distributed with the distribution hole group 65 on the rotating disk A through hole group with consistent position, size and number; the annular sealing gasket 50 is relatively fixedly installed in the annular sealing gasket mounting groove 64 of the rotating disk, so that the through hole group of the annular sealing gasket 50 and the distribution hole group 65 on the rotating disk always maintain a one-to-one correspondence and connection; when the rotation is switched, the annular sealing gasket 50 rotates together with the rotating disk, and slides in the annular sealing gasket slide groove 45 of the fixed disk; when the stop position is in a working state, the distribution hole group 65, the through hole group on the annular sealing gasket 50 and the fixed disk discharge flange pipe mounting hole group 46 are realigned one by one at a new angle, that is, they are maintained in a one-to-one correspondence with the discharge flange pipe group 29.

[0033] Among them, the A material annular flow groove 44 of the lower fixed disk 8, the annular surface A 95 of the lower rotating disk 7, and the annular sealing gaskets 50 and sealing rings A 51 on both sides together constitute an annular flow chamber for the A material. In the A material annular flow chamber, the lower part of the chamber is connected to the A material discharge main pipe 10 installed on the back side of the lower fixed disk 8 through the installation holes 30 and 31 at the bottom of the A material annular flow groove 44 of the lower fixed disk 8; the upper part of the chamber is connected to the corresponding lower distribution holes through the lower distribution pipes 82 and 83 on the back side of the lower rotating disk 7 and further connected to the corresponding lower flange pipe.

[0034] Similarly, the B material annular flow groove 42 of the lower fixed disk 8, the annular surface B96 of the lower rotating disk 7, and the sealing rings A51 and B52 on both sides together constitute an annular flow chamber for the B material. In the B material annular flow chamber, the B material installation hole 32 at the bottom of the B material annular flow groove 42 is connected to the B material discharge main pipe 12 installed on the back side of the lower fixed disk 8 below the chamber, and is connected to the corresponding lower distribution hole through the lower distribution pipe 84 on the back side of the lower rotating disk 7 and further connected to the corresponding lower flange pipe.

[0035] like Figure 12 , Figure 13As shown, the lower valve body drive shaft 16 is installed in the shaft hole 57 of the lower rotating disk 7, so that the cylindrical pin groups 74 installed in the semi-circular cross-section cylindrical pin groove groups 75 on the drive shaft are respectively wedged into the cylindrical pin slot groups 68 on the inner surface of the rotating disk shaft hole 57, enabling the lower rotating disk 7 to move axially along the drive shaft 16 but not to rotate relatively. The assembly method of the upper valve body drive shaft 15 in the upper rotating disk 5 is similar.

[0036] As Figure 5 , Figure 6 , Figure 7 , Figure 8 , Figure 14 shown, the lower end of the lower valve body drive shaft 16 is axially fixedly installed in the shaft hole 36 of the lower fixed disk 8 through the self-aligning thrust ball bearings 34, 24. The lower valve body drive shaft 16 can rotate relative to the lower fixed disk 8 but cannot move axially. The assembly method of the upper valve body drive shaft 15 in the upper fixed disk 4 is similar.

[0037] As Figure 1 , Figure 2 , Figure 15 and Figure 20 shown, after the assembly is completed, after the drive shaft 15 of the upper valve body and the drive shaft 16 of the lower valve body are connected by a coupling, the upper rotating disk 5 and the lower rotating disk 7 rotate synchronously. While the upper fixed disk 4 and the lower fixed disk remain fixed.

[0038] As Figure 11 , Figure 14 , Figure 19 shown, in the lower valve body 87 of the distribution valve device, after the lower rotating disk 7 and the lower fixed disk 8 are assembled, the compression degree of the compression spring 19 can be adjusted by the compression spring adjusting nut 21, and the tension degree of the support spring 56 can be adjusted by adjusting the support spring adjusting bolt group 88. By comprehensively adjusting the compression spring adjusting nut 21 and the support spring adjusting bolt group 88, the sealing degree and rotational friction resistance between the sealing ring B52 between the lower rotating disk 7 and the lower fixed disk 8, and the annular sealing gasket 50 of the sealing ring A and the upper and lower corresponding mating surfaces can be adjusted; no support spring and components are installed in the upper valve body, and the gravity effect and the compression spring adjusting nut are used to adjust the sealing degree.

[0039] As Figure 20 shown, since the distribution valve device realizes the rotation of the valve body rotating mechanism while the feeding part and the reaction tower group are fixed, it is convenient to install booster pumps 211 - 216 at the discharge ends of each tower of the reaction tower group. Further, booster pumps can also be installed at the front ends of the inlets of each reaction tower to boost the materials of each tower before feeding and after discharging, which is more beneficial to the operation of the device.

[0040] Implementation steps of the operation method: This case is for simplified description purposes. Only a case with six reaction towers (such as the six reaction towers 151, 152, 153, 154, 155, and 156 in this embodiment), material types (such as material A and material B), and the corresponding series process flow is used as an example for illustration. The principles of cases with more reaction towers and more material types are the same and will not be elaborated here.

[0041] Such as Figure 15 , Figure 16As shown, when the overall assembly of the distribution valve is completed and running, starting from the initial state, the upper distribution holes 121, 122, 123, 124, 125, 126 are respectively aligned and connected one-to-one with the upper feed flange pipes 131, 132, 133, 134, 135, 136 and further connected to the corresponding reaction tower feed ports 141, 142, 143, 144, 145, 146. At the same time, the lower distribution holes 181, 182, 183, 184, 185, 186 are respectively aligned and connected one-to-one with the lower discharge flange pipes 171, 172, 173, 174, 175, 176 and further connected to the corresponding reaction tower discharge ports 161, 162, 163, 164, 165, 166; when rotated and switched by 60 degrees, the upper distribution holes 121, 122, 123, 124, 125, 126 are respectively aligned and connected one-to-one with the upper feed flange pipes 132, 133, 134, 135, 136, 131 and further connected to the corresponding reaction tower discharge ports 142, 143, 144, 145, 146, 141. At the same time, the lower distribution holes 181, 182, 183, 184, 185, 186 are respectively aligned and connected one-to-one with the lower discharge flange pipes 172, 173, 174, 175, 176, 171 and further connected to the corresponding reaction tower discharge ports 162, 163, 164, 165, 166, 161. By analogy, after six rotations and switches, that is, after rotating 360 degrees, it returns to the corresponding situation of the initial state, and this cycle continues, thereby realizing the cyclic distribution of materials A and B. According to the aforementioned assembly and connection relationship, materials A and B enter the main A and B material feed pipes on the reverse side of the upper fixed disk 4 from the A and B material feed buffer tanks respectively, and then pass through the upper A and B material annular flow channels 91, 92, A and B material distribution pipes 76, 77, 78, and the corresponding distribution holes to reach the corresponding A and B material feed flange pipes, distribute materials A and B to the corresponding reaction towers, and after completing the reactions required by the series process between the reaction towers, finally pass through the corresponding discharge flange pipes on the lower fixed disk 8, the corresponding distribution holes and distribution pipes 82, 83, 84 on the lower rotating disk 7 and converge into the lower A and B material annular flow channels, and finally are discharged from the overall device through the A and B material discharge main pipes 11, 12. Further, through the step reduction gear shaft 18, the upper valve body shaft 15 and the lower valve body shaft 16 that are interconnected, the step reduction gear is driven to step-rotate the rotation distribution mechanism composed of the interconnected upper and lower rotating disks and process pipelines for rotation and switching, so as to realize the cyclic operation of the aforementioned process in the reaction tower group.

[0042] To more clearly illustrate the pipeline assembly principle and the distribution valve operation principle, the inlets and outlets of the upper and lower valve bodies are further numbered in detail according to the material flow sequence of this process case, as Figure 15 , Figure 16 and Figure 17 shown.

[0043] Figure 15 It is a perspective view of the upper side of the entire valve body. Figure 16 It is a perspective view of the lower side of the entire valve body. As shown in the two figures: In the upper valve body 86, the six groups of upper conversion holes for Material B on the upper rotating disk 5 are numbered 101, 102, 103, 104, 105, and 106 respectively; the six groups of upper conversion holes for Material A are numbered 111, 112, 113, 114, 115, and 116 respectively; the six upper groups are numbered 121, 122, 123, 124, 125, and 126 respectively; the six feed flange pipes on the upper fixed disk 4 are numbered 131, 132, 133, 134, 135, and 136 respectively. In the lower valve body 87, the six discharge flange pipes 29 on the lower fixed disk 8 are numbered 171, 172, 173, 174, 175, and 176 respectively. The six lower distribution hole groups 65 on the lower rotating disk 7 are numbered 181, 182, 183, 184, 185, and 186 respectively; the six lower conversion hole groups 66 for Material A are numbered 191, 192, 193, 194, 195, and 196 respectively; the six lower conversion hole groups 67 for Material B are numbered 201, 202, 203, 204, 205, and 206 respectively. As Figure 17 , Figure 18 and Figure 19 and as Figure 20 shown, the corresponding six reaction towers are numbered 151, 152, 153, 154, 155, and 156 respectively, corresponding to the 1# - 6# towers in the process Figure 13 ; the upper feed ports of the six reaction towers from 1# to 6# are numbered 141, 142, 143, 144, 145, and 146 respectively; the lower discharge ports of the six reaction towers are numbered 161, 162, 163, 164, 165, and 166 respectively. The booster pumps fixedly configured behind each discharge port are numbered 211, 212, 213, 214, 215, and 216 in sequence, and the reaction towers are connected in series with the pumps and the discharge flange pipes one by one.

[0044] Initial stage process operation: Adjust the upper and lower rotating disks to the starting positions so that the distribution hole groups on the upper and lower rotating disks are respectively aligned with the feed flange pipes and discharge flange pipes on the upper and lower fixed disks. The six upper distribution hole groups 121, 122, 123, 124, 125, and 126 on the upper rotating disk 5 are respectively aligned vertically with the six feed flange pipes 131, 132, 133, 134, 135, and 136 on the upper fixed disk 4, and the six lower distribution hole groups 181, 182, 183, 184, 185, and 186 on the lower rotating disk 7 are aligned vertically with the six discharge flange pipes 171, 172, 173, 174, 175, and 176 on the lower fixed disk 8.

[0045] As shown in the process flow Figure 21 shown, turn on the material feed pump so that Material A is input from the Material A feed buffer tank through a pipeline into the Material A feed main pipe 9 and enters the Material A upper annular flow channel 44 of the upper fixed disk. Material A is divided into two streams. One stream enters the feed port 141 of the 1# tower 151 through the Material A upper conversion hole 111, the Material A upper distribution pipe 76, the upper distribution hole 121, and the feed flange pipe 131, and the other stream enters the feed port 142 of the 2# tower 152 through the Material A upper conversion hole 112, the Material A upper distribution pipe 77, the upper distribution hole 122, and the feed flange pipe 132. After the reaction is completed in the reaction tower, the material in the 1# tower 151 enters the feed port 144 of the 4# tower 154 through the discharge port 161, the pump 211, the discharge flange pipe 171, the lower distribution hole 181, the Material A series connection pipe 79, the upper distribution hole 124, and the feed flange pipe 134; the material in the 2# tower 152 enters the feed port 143 of the 3# tower 153 through the discharge port 162, the pump 212, the discharge flange pipe 172, the lower distribution hole 182, the Material A series connection pipe 80, the upper distribution hole 123, and the feed flange pipe 133. Finally, the materials in the 3# tower 153 and the 4# tower 154 enter the Material A lower annular flow channel 44 through their respective discharge ports, pumps, discharge flange pipes, lower distribution holes, and the Material A lower distribution pipe. After collection, they are discharged from the device through the Material A discharge main pipe 10 on the lower fixed disk.

[0046] Similarly, for the flow path of Material B, it is input from the Material B feed buffer tank through a pipeline into the main Material B feed pipe 11 and enters the upper annular chute 42 of Material B. Material B enters the feed port 145 of the 5# tower 155 through the upper conversion hole 105 of Material B, the upper distribution pipe 78 of Material B, the upper distribution hole 125, and the feed flange pipe 135. After the reaction is completed in the 5# tower 155, the material enters the feed port 146 of the 6# tower 156 through the discharge port 165, the pump 215, the discharge flange pipe 175, the lower distribution hole 185, the Material B series pipe 81, the upper distribution hole 126, and the feed flange pipe 136. After the reaction is completed in the 6# tower 156, the material enters the lower annular chute 42 of Material B through the discharge port 166, the pump 216, the discharge flange pipe 176, the lower distribution hole 186, and the lower distribution pipe 84 of Material B, and then is discharged from the device through the lower main Material B discharge pipe 12.

[0047] Process operation after the first switch: After the reaction reaches the specified time at the initial stage, the first switch is carried out, that is, the upper and lower rotating disks rotate synchronously counterclockwise by 60 degrees. After the switch, it enters the second reaction stage. The six distribution holes 121, 122, 123, 124, 125, and 126 on the upper rotating disk 5 are respectively aligned vertically with the six feed flange pipes 132, 133, 134, 135, 136, and 131 on the upper fixed disk 4, that is, the six distribution holes 181, 182, 183, 184, 185, and 186 on the lower rotating disk 7 are respectively aligned vertically with the six discharge flange pipes 172, 173, 174, 175, 176, and 171 on the lower fixed disk 8, and it enters the process state as Figure 22 shown. The operation is similar to Figure 21 the description, which will not be elaborated. The simplified flow path diagrams of Material A and Material B are as Figure 27 and Figure 28 .

[0048] Process operation after the second switch: After the reaction reaches the specified time at the initial stage, the second switch is carried out, that is, the upper and lower rotating disks rotate synchronously counterclockwise by 60 degrees again, that is, the upper and lower rotating disks rotate synchronously counterclockwise by 60 degrees again. After the switch, it enters the third reaction stage. The six distribution holes 121, 122, 123, 124, 125, and 126 on the upper rotating disk 5 are respectively aligned vertically with the six feed flange pipes 133, 134, 135, 136, 131, and 132 on the upper fixed disk 4, that is, the six distribution holes 181, 182, 183, 184, 185, and 186 on the lower rotating disk 7 are respectively aligned vertically with the six discharge flange pipes 173, 174, 175, 176, 171, and 172 on the lower fixed disk 8, and it enters the process state as Figure 23The process state shown. The description is similar to Figure 21 and will not be elaborated. The simplified flow path diagrams of Material A and Material B are as shown in Figure 29 and Figure 30 .

[0049] During the sequential switching process, after the sixth switch, the entire device returns to the initial stage process operation state as shown in Figure 21 , that is, the six distribution holes 121, 122, 123, 124, 125, and 126 on the upper rotating disk 5 are respectively aligned vertically with the six feed flange pipes 131, 132, 133, 134, 135, and 136 on the upper fixed disk 4, and the six distribution holes 181, 182, 183, 184, 185, and 186 on the lower rotating disk 7 are respectively aligned vertically with the six discharge flange pipes 171, 172, 173, 174, 175, and 176 on the lower fixed disk 8. After the reaction is completed and the switching continues, the entire device enters a cyclic operation similar to the description in Figure 21 .

[0050] In the above-mentioned embodiment, only two materials, A and B, are described, mainly to make this description simple and clear. The said distribution valve device is not only applicable to the treatment of two materials in this example, but can also be extended to multiple materials according to actual needs. When multiple materials need to be processed, only the number of annular flow grooves and corresponding conversion holes equal to the number of material types need to be added on the front of the upper and lower fixed disks, with a sealing ring chute spaced in the middle. At the same time, corresponding annular surfaces, sealing ring installation grooves, and conversion hole groups are added on the front of the upper and lower rotating disks, and the simultaneous treatment of multiple materials can be achieved.

[0051] In this multi-fluid material continuous circulation distribution valve device, the discharge direction of the material is not limited to the way of upper inlet and lower outlet. The feed and discharge directions can be adjusted according to process requirements. Taking the main feed pipes (9) of Material A and (11) of Material B as the discharge main pipes, and at the same time taking the main discharge pipes (10) of Material A and (12) of Material B as the feed main pipes, it is convenient to change the feed and discharge directions of Material A, Material B, or one of them without modifying other devices and components.

[0052] In this multi-fluid material continuous circulation distribution valve device, Figure 31Shown is one of the numerous process flows of a continuous bed composed of six reaction towers for processing two materials. According to the principle of this continuous rotary distribution valve, the same process requirements in the reaction tower group can also be achieved. Therefore, in addition to the processes listed in this description, by adjusting the positions of the upper and lower distribution holes connected by the series pipes, increasing the number of series pipes (simultaneously reducing the number of connections between the distribution pipes and the distribution holes), or replacing the multi-way distribution pipes and multi-way series pipes, it can be conveniently adjusted to various series and parallel reaction processes without modifying or remanufacturing other components of the distribution valve. Other processes will not be listed one by one.

[0053] The continuous bed system composed of this multi-fluid material continuous circulation distribution valve device is not limited to the case of six reaction towers listed in this description. Just according to the actual number of reaction towers in the reaction tower group, by matching the same number of conversion holes on each annular surface of the upper and lower rotating disks, matching the same number of distribution holes at the bottom of the annular seal washer chute, matching the same number of corresponding through holes on the annular seal washer, and matching the same number of inlet and outlet flange pipe mounting holes and inlet and outlet flange pipes on the fixed disk, and evenly distributing them, the purpose of material distribution for the corresponding number of reaction towers can be achieved.

[0054] The continuous bed system composed of this multi-fluid material continuous circulation distribution valve device is also not limited to the case of distributing two materials listed in this description. According to the number of material types to be distributed actually, match the same number of annular flow channels and corresponding closed ring chute on the front of the fixed disk, set the same number of main material inlet and outlet pipes to communicate with them respectively, and at the same time match the same number of annular surfaces and corresponding closed ring mounting grooves on the rotating disk. After matching, the same number of annular flow chambers are formed, and the number of material types to be distributed actually can be processed and distributed.

[0055] Therefore, the number of material types that can be distributed is related to the number of annular flow channels, main material inlet and outlet pipes on the fixed disk, and annular surfaces on the rotating disk, etc., and has nothing to do with the number of reaction towers. The number of reaction towers is related to and the same as the number of conversion holes, distribution holes at the bottom of each annular flow channel on the fixed disk, and the number of inlet and outlet flange pipes assembled on the fixed disk, and has nothing to do with the number of annular flow channels, that is, the number of material types to be distributed.

Claims

1. A fixed continuous bed multi-fluid material continuous circulation distribution valve device, characterized in that: The invention comprises a mounting bracket (2), an upper valve body (86), a lower valve body (87) and an accompanying pipe fitting (6); the mounting bracket (2) is fixed to a concrete floor and is provided with a three-layer platform with circular mounting holes and bolt holes; the upper platform is provided with a stepping reducer (3); the middle platform is provided with an upper fixing plate (4) of the upper valve body (86) of the distribution valve; the lower platform is provided with a lower fixing plate (8) of the lower valve body (87); the upper valve body (86) and the lower valve body (87) have the same structure and are symmetrically installed; the vertical parts of the inlet and outlet flange pipe groups on the upper fixing plate (4) and the lower fixing plate (8) are both in the same and concentric correspondence; the upper rotating plate (5) in the upper valve body (86) and the lower rotating plate (7) in the lower valve body (87) and the assembled accompanying pipe fitting (6) together constitute a rotating distribution mechanism; the driving shaft (18) of the stepping reducer (3) is connected to the distribution valve via a coupling B (14) The upper end of the upper drive shaft (15) of the upper valve body (86) is connected, and the lower end of the upper drive shaft (15) is connected to the upper end of the lower drive shaft (16) of the lower valve body (87) via a coupling A (13); The lower valve body (87) comprises a lower rotating disk (7) and a lower fixed disk (8) and lower distribution pipes (82, 83, 84) for materials A and B required by the process. The lower rotating disk (7) and the lower fixed disk (8) are concentrically assembled. The relative mating surfaces of the lower rotating disk (7) and the lower fixed disk (8) are both front surfaces. A sealing member (50, 51, 52) is installed in the middle to seal between the lower rotating disk (7) and the lower fixed disk (8) and to separate the A and B material tanks. The upper valve body (86) and the lower valve body (87) have the same components and assembly structure, except that the upper valve body (86) is not equipped with a thrust ball bearing (54), a support spring frame (55) and a support spring (56) for supporting.

2. The multi-fluid material continuous circulation distribution valve device according to claim 1, characterized in that: On the front side of the lower fixed plate (8) of the lower valve body (87), the center of the lower fixed plate (8) is an axial hole (36) (through hole), and the front and rear bearing holes (35, 33) for mounting the self-aligning thrust ball bearings (34, 24) are arranged on both sides of the axial hole (36). The front side of the lower fixed plate (8) is provided with a fixed plate support spring slide groove (37), a fixed plate water isolation ring slide groove (38), a fixed plate annular water collecting groove (39), a fixed plate sealing ring B slide groove (41), a B material annular flow groove (42), a sealing ring A slide groove (43), an A material annular flow groove (44), and a fixed plate annular sealing gasket slide groove (45) in order from the axial hole (36) to the outside in radial direction. The support spring slide groove (37) has a support spring tension adjustment screw hole group (48) as a through hole at the bottom, and the fixed plate annular water collecting groove (39) has a drainage screw hole group (40) as a through hole. The bottom of the material annular flow trough (42, 44) has discharge main pipe mounting holes (32, 30, 31) as through holes, the fixed plate annular sealing gasket slide groove (45), and the bottom has evenly distributed discharge flange mounting holes (46) as through holes, the outermost side of the lower fixed plate (8) has a bracket platform mounting through hole group 47 as through holes, which corresponds to the screw holes around the lower circular mounting holes of the mounting platform, and the lower fixed plate (8) is fixedly mounted on the lower platform, and the upper fixed plate (4) is also mounted in the circular mounting hole of the middle platform. The upper fixed plate (4) of the upper valve body (86) has the same structure; One end of the A material discharge main pipe (10) of the lower fixed plate (8) is fixedly installed in the A material discharge main pipe installation hole (30, 31) on the reverse side of the bottom of the A material annular flow groove (44), and the other end is the A material discharge port, which discharges the A material after the reaction is completed from the device; one end of the B material discharge main pipe (12) is fixedly installed in the B material discharge main pipe installation hole (32) on the reverse side of the lower fixed plate (8) and communicates with the B material annular flow groove (42), and the other end is the B material discharge port, which discharges the B material after the reaction is completed from the device. Similarly, one end of the A and B material inlet and outlet main pipes (9, 11) of the upper valve body is installed on the reverse side of the upper fixed plate (4) and communicates with the A and B material annular flow grooves (91, 92) on the front side of the upper fixed plate (4), and the other end is connected to the A and B material feed buffer tanks (89, 90) through a pipeline, so as to discharge the A and B material into the A and B material buffer tanks (89, 90) The fluid materials from the material inlet and outlet main pipes (9, 11) are respectively input into the A and B material annular flow grooves (91, 92); Six through holes are evenly distributed on the annular sealing gasket slide groove (45) on the front side of the lower fixed plate (8) as the discharge flange pipe installation hole group (46). The feed flange pipe group (29) installed from the back side of the lower fixed plate (8), i.e., the vertical end (171-176), is a 90-degree elbow flange pipe; the horizontal end, i.e., one end with a flange facing outward, is evenly arranged in a radial shape with the fixed plate axis as the center, and is fixedly connected to the corresponding reaction tower discharge port (161-166) or the outlet booster pump (211-216) through pipelines. The assembly of the upper fixed plate (4) is the same as that of the lower fixed plate. The feed flange pipe group (131-136) installed on the back side of the upper fixed plate (4) is fixedly connected to the corresponding reaction tower inlet (141-146) through pipelines.

3. The multi-fluid material continuous circulation distribution valve device according to claim 1, characterized in that: The front side of the lower rotating disk (7) in the lower valve body (87) has a rotating disk shaft hole (57) at the center of the axis, and is provided with a thrust ball bearing and support spring mounting groove (58), a rotating disk water isolation ring groove (59), a rotating disk annular water collecting groove (60), a rotating disk sealing ring B mounting groove (62), annular surface B (96), a rotating disk sealing ring A mounting groove (63), annular surface A (95), and a rotating disk annular sealing gasket mounting groove (64) in sequence. The inner surface of the rotating disk shaft hole (57) has a cylindrical pin groove group (68), and the bottom of the rotating disk annular water collecting groove (60) has a drain screw hole group (61) as a through hole; on the annular surface B (96) between the rotating disk sealing ring B mounting groove (62) and the rotating disk sealing ring A mounting groove (63), there are evenly distributed B material conversion hole groups (67) as through holes, the number of which is the same as the distribution hole group (65), and is connected to the fixed disk B material annular flow groove (42) The rotating disk sealing ring A slide groove (43) and the annular sealing gasket slide groove (45) have uniformly distributed A material conversion hole groups (66) as through holes, the number of which is the same as the distribution hole group (65), and are correspondingly connected with the A material annular flow groove (44); the rotating disk annular sealing gasket installation groove (64) has uniformly distributed vertical distribution hole groups (65) as through holes, which are consistent in size, position, and number with the inlet and outlet flange pipe installation holes (46) of the annular sealing gasket slide groove (45) on the lower fixed disk (8) and are uniformly distributed. The structure of the upper rotating disk (5) is the same as that of the lower rotating disk (7); On the reverse side of the lower rotating disk (7) of the distribution valve device, the lower distribution pipes (82, 83) of the A material are installed according to the process requirements to respectively connect the lower conversion holes (193, 194) and the lower distribution holes (183, 184) in the A material conversion hole group, and the remaining conversion holes (191, 192, 195, 196) in the A material conversion hole group are closed with plugs to serve as spare holes for adjusting the process, and the lower distribution pipe (84) of the B material is installed according to the process requirements to connect the lower conversion hole (206) in the B material conversion hole group and the distribution hole (186), and the remaining B material conversion holes (201, 202, 203, 204, 205) are closed with plugs to serve as spare holes for adjusting the process; The rotary distribution mechanism is composed of an upper rotary disk (5), a lower rotary disk (7) and an attached pipe fitting (6), wherein the upper rotary disk (5) and the lower rotary disk (7) are in concentric positions; the distribution hole group (121-126) of the upper rotary disk (5) and the distribution hole group (181-186) of the lower rotary disk (7) correspond to each other concentrically, and their relative positions remain unchanged during the rotation switching process; the A material series pipes (79, 80) in the attached pipe fitting (6) respectively connect the lower distribution holes (181, 182) on the lower rotary disk (7) and the upper distribution holes (124, 123) on the upper rotary disk (5); and the B material series pipe (81) in the attached pipe fitting (6) connects the lower distribution hole (185) on the lower rotary disk (7) and the upper distribution hole (126) on the upper rotary disk (5), that is, the series relationship of the flow of A and B materials is respectively completed according to process requirements.

4. The multi-fluid material continuous circulation distribution valve device according to claim 1, characterized in that: After the lower valve body is assembled, the support spring installation groove (58) of the lower rotating disk (7) corresponds to the support spring slide groove (37) of the fixed disk, and a thrust ball bearing (54), a support spring frame (55) and a support spring (56) are installed in the middle; the rotating disk water isolation ring groove (59) corresponds to the fixed disk water isolation ring slide groove (38), and a water isolation ring (53) is installed in the middle; the rotating disk annular water collecting groove (60) corresponds to the fixed disk annular water collecting groove (39); the rotating disk sealing ring B, A installation grooves (62, 63) correspond to the fixed disk sealing ring B, A slide grooves (41, 43), respectively, and sealing ring B and sealing ring A (52, 51) are placed in the middle; the rotating disk annular sealing gasket installation groove (64) corresponds to the fixed disk annular sealing gasket slide groove (45), and an annular sealing gasket (50) is placed in the middle, and the annular sealing gasket (50) is distributed with the distribution hole group (65) on the rotating disk. The annular sealing gasket (50) is relatively fixedly installed in the annular sealing gasket installation groove (64) of the rotating disk, so that the through hole group of the annular sealing gasket (50) and the distribution hole group (65) on the rotating disk are always connected in a one-to-one correspondence; when the rotation is switched, the annular sealing gasket (50) rotates together with the rotating disk and slides in the annular sealing gasket slide groove (45) of the fixed disk; when the stop position is in a working state, the distribution hole group (65), the through hole group on the annular sealing gasket (50) and the fixed disk discharge flange pipe installation hole group (46) are kept aligned one by one at a new angle, that is, aligned with the discharge flange pipe group (29) One-to-one correspondence is maintained in communication; wherein the A material annular flow groove (44) of the lower fixed disk (8), the annular surface A (95) of the lower rotating disk (7) and the annular sealing gaskets (50) and the sealing rings A (51) on both sides together constitute an annular flow chamber for the A material, in which the lower part of the chamber is connected to the A material discharge main pipe (10) installed on the back side of the lower fixed disk (8) through the mounting holes (30, 31) at the bottom of the A material annular flow groove (44) of the lower fixed disk (8); the upper part of the chamber is connected to the corresponding lower distribution holes through the lower distribution pipes (82, 83) on the back side of the lower rotating disk (7) and further connected to the corresponding lower flange pipe; similarly, the B material annular flow groove (42) of the lower fixed disk (8), the annular surface B (96) of the lower rotating disk (7) and the sealing rings A (51) and the sealing rings B (52) on both sides together constitute the B material annular flow chamber. The material annular flow chamber, in which the B material annular flow chamber is connected to the B material discharge main pipe (12) installed on the back side of the lower fixed plate (8) through the B material installation hole (32) at the bottom of the B material annular flow groove (42), and is connected to the corresponding lower distribution hole through the lower distribution pipe (84) on the back side of the lower rotating plate (7) and further connected to the corresponding lower flange pipe.

5. The multi-fluid material continuous circulation distribution valve device according to claim 1, characterized in that: The lower valve body drive shaft (16) is installed in the shaft hole (57) of the lower rotating disk (7), so that the cylindrical pin group (74) installed in the semicircular cross-section cylindrical pin groove group (75) on the drive shaft respectively fits into the cylindrical pin clamping groove group (68) on the inner surface of the rotating disk shaft hole (57), so that the lower rotating disk (7) can move along the axial direction of the drive shaft (16) but cannot rotate relatively. The upper valve body drive shaft (15) is assembled in the upper rotating disk (5) in a similar manner.

6. The multi-fluid material continuous circulation distribution valve device according to claim 1, characterized in that: The lower end of the lower valve body drive shaft (16) is axially fixedly installed in the shaft hole (36) of the lower fixed plate (8) through a self-aligning thrust ball bearing (34, 24). The lower valve body drive shaft (16) can rotate relative to the lower fixed plate (8) but cannot move axially. The upper valve body drive shaft (15) is assembled in the upper fixed plate (4) in a similar manner.

7. The multi-fluid material continuous circulation distribution valve device according to claim 1, characterized in that: When the overall assembly of the distribution valve is completed and in operation, taking the initial state as an example, the upper distribution holes (121, 122, 123, 124, 125, 126) are aligned and connected with the upper feed flange pipes (131, 132, 133, 134, 135, 136) one by one and further connected with the corresponding reaction tower feed ports (141, 142, 143, 144, 145, 146), and at the same time, the lower distribution holes (181, 182, 183, 184, 185, 186) are aligned and connected with the lower discharge flange pipes (171, 172, 173, 174, 175, 176) one by one and further connected with the corresponding reaction tower discharge ports (141, 142, 143, 144, 145, 146). The material ports (161, 162, 163, 164, 165, 166) are rotated and switched by 60 degrees, and the upper distribution holes (121, 122, 123, 124, 125, 126) are aligned and connected with the upper feed flange pipes (132, 133, 134, 135, 136, 131) and further connected with the corresponding reaction tower discharge ports (142, 143, 144, 145, 146, 141), and the lower distribution holes (181, 182, 183, 184, 185, 186) are aligned and connected with the lower discharge flange pipes (172, 173, 174, 175, 176, 171) respectively. The A and B materials are connected and further connected to the corresponding reaction tower discharge ports (162, 163, 164, 165, 166, 161), and so on. After six rotations, i.e., 360 degrees of rotation, the corresponding situation is restored to the initial state, and the cycle is repeated, thereby realizing the cyclic distribution of A and B materials. According to the aforementioned assembly connection relationship, A and B materials enter the A and B material feed main pipes on the back of the upper fixed plate (4) from the A and B material feed buffer tanks respectively, and then pass through the upper A and B material annular flow grooves (91, 92), the A and B material distribution pipes (76, 77, 78), and the corresponding distribution holes to reach the corresponding A and B material feed flange pipes, and the A and B materials are After being distributed to the corresponding reaction towers and completing the series process requirements between the reaction towers, they are finally collected to the lower A and B material annular flow grooves through the corresponding discharge flange pipes on the lower fixed plate (8), the corresponding distribution holes and distribution pipes (82, 83, 84) on the lower rotating plate (7), and finally discharged from the overall device through the A and B material discharge main pipes (11, 12). Furthermore, through the mutually connected step reducer shaft 18, the upper valve body shaft 15 and the lower valve body shaft 16, the step reducer 3 is driven by the stepping reducer 3 to rotate and switch the rotating distribution mechanism composed of the mutually connected upper and lower rotating plates and process pipelines, so as to realize the cyclic operation of the above-mentioned process in the reaction tower group.

8. The multi-fluid material continuous circulation distribution valve device according to claim 1, characterized in that: Since the distribution valve device realizes the rotation of the valve body rotating mechanism while the feed part and the reaction tower group are fixed, it is convenient to add a booster pump (211-216) to the discharge end of each tower of the reaction tower group. Furthermore, a booster pump can be added to the front end of each reaction tower to increase the pressure of the materials in each tower before feeding and after discharging, which is more conducive to the operation of the device.

9. The multi-fluid material continuous circulation distribution valve device according to claim 1, characterized in that: In the lower valve body (87) of the distribution valve device, after the lower rotating disk (7) and the lower fixed disk (8) are assembled, the compression degree of the compression spring (19) can be adjusted by the compression spring adjusting nut (21), and the tension degree of the support spring (56) can be adjusted by adjusting the support spring adjusting bolt group (88). By comprehensively adjusting the compression spring adjusting nut (21) and the support spring adjusting bolt group (88), the sealing degree and rotational friction resistance of the sealing ring B (52) and the sealing ring A (51) annular sealing gasket (50) between the lower rotating disk (7) and the lower fixed disk (8) can be improved. The support spring and components are not installed in the upper valve body, and the sealing degree is adjusted by gravity and the compression spring adjusting nut.

10. The multi-fluid material continuous circulation distribution valve device according to claim 1, characterized in that: The feeding and discharging directions can be adjusted according to the process requirements. By using the A material feeding main pipe (9) and the B material feeding main pipe (11) as the discharging main pipes, and the A material discharging main pipe (10) and the B material discharging main pipe (12) as the feeding main pipes, the feeding and discharging directions of the A material, the B material or one of the materials can be easily changed without modifying other devices and parts.

11. The multi-fluid material continuous circulation distribution valve device according to claim 1, characterized in that: The distribution valve device is not only suitable for the processing of two materials in this example, but can also be expanded to multiple materials according to actual needs. When multiple materials need to be processed, it is only necessary to add the same number of annular flow grooves and corresponding conversion holes as the number of material types on the front of the fixed disk, with a sealing ring slide groove in the middle, and at the same time, add corresponding annular surfaces, sealing ring installation grooves and conversion hole groups on the front of the upper and lower rotating disks, so as to realize the simultaneous processing of multiple materials.

12. The multi-fluid material continuous circulation distribution valve device according to claim 1, characterized in that: The distribution valve system is not limited to the six reaction towers listed in this specification. It only needs to match the same number of evenly distributed discharge flange pipe mounting holes and discharge flange pipes on the annular sealing gasket slide grooves of the upper and lower fixed plates and the annular sealing gaskets according to the actual number of reaction towers in the reaction tower group, and match the same number of evenly distributed distribution holes on the upper and lower rotating plates, the corresponding number of evenly distributed conversion holes in each conversion hole group, and the same number of evenly distributed through holes on the annular sealing gaskets, so as to achieve material distribution for the corresponding number of reaction towers.

13. The multi-fluid material continuous circulation distribution valve device according to claim 1, characterized in that: The lower valve body of the distribution valve device is connected to different lower rotating disk distribution holes (181-186) and upper rotating disk distribution holes (121-126) through material A series pipes (79, 80) and material B series pipes (81), so that material distribution required by the series process between reaction towers can be realized; in addition to the processes listed in this specification, by adjusting the positions of the upper and lower distribution holes connected by the series pipes, increasing the number of series pipes (simultaneously reducing the number of distribution pipes connected to the distribution holes), or replacing multi-way distribution pipes and multi-way series pipes, it can be conveniently adjusted to a variety of series and parallel reaction processes without the need to modify or re-manufacture other components of the distribution valve.

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