Method and device for calibrating alignment and exposure motion of maskless photoetching equipment

Abstract

The invention provides a maskless photoetching equipment alignment and exposure motion calibration method and device, and belongs to the technical field of photoetching equipment alignment and exposure. The alignment and exposure motion calibration method for the maskless photoetching equipment comprises the following steps: S1, acquiring a first coordinate conversion relation and a second coordinate conversion relation; s2, acquiring a first to-be-measured coordinate; s3, acquiring a second to-be-measured coordinate, and acquiring a third to-be-measured coordinate; and S4, controlling the DMD center to perform exposure dotting on the first to-be-measured point based on the second to-be-measured coordinate, and controlling the camera to align the first to-be-measured point based on the third to-be-measured coordinate. According to the method, the limitation of projection transformation is avoided when coordinate transformation is carried out by applying a calibration algorithm and an interpolation algorithm, the perspective effect can be simulated, alignment of cameras with different height distances can be carried out, three-dimensional space or more complex transformation can be processed, and the method can adapt to more coordinate transformation.

Description

Technical Field

[0001] The present invention relates to the technical field of alignment and exposure of lithography equipment, and more specifically, to an optimized design in the coordinate transformation process during the positioning process of a workbench. Background Art

[0002] In the operation of a Laser Direct Imaging (LDI) lithography machine, in order to achieve precise positioning of the workbench position and precise mapping of graphic content, two steps are required. One is to move the alignment system to align the visual center of its industrial camera with the point to be exposed to determine the coordinates of the position to be exposed. The other is to move the exposure system to align the center of its laser engine (DMD center) with the position to be exposed to achieve exposure. Since the alignment system and the exposure system are two independent motion devices, the motion axis coordinates of the two are not an orthogonal rectangular coordinate system. Therefore, the alignment motion coordinates of the position to be exposed need to be converted into corresponding engine motion coordinates to achieve precise positioning and exposure.

[0003] Affine transformation is a geometric transformation that includes linear transformation and translation transformation. Mathematically, an affine transformation can be expressed as y = Ax + b, where A is the linear transformation matrix, x is the input vector, b is the translation vector, and y is the output vector, that is, it is achieved through matrix multiplication and vector addition. It has wide applications in fields such as computer graphics, image processing, and data analysis, such as image registration, rendering, and data preprocessing.

[0004] In the prior art, affine transformation is used to convert the alignment motion coordinates into engine motion coordinates, but there are the following problems with using affine transformation: 1. Angle and distance distortion: Although affine transformation preserves collinearity and ratio, it does not preserve angles and distances, which means that the transformation may distort the shape and size of the graphic; 2. Limitation: Affine transformation does not include projective transformation, so it cannot simulate perspective effects. For example, two parallel lines may intersect under perspective transformation, but always remain parallel under affine transformation; 3. Increased complexity: Affine transformation is only applicable to the case where the axes are straight axes. Affine transformation can only solve the problem of non-perpendicularity of two straight axes, while the actual axes are curved, and the straightness error of the axes is not considered. When applying affine transformation, the curved axes are directly regarded as straight axes for coordinate transformation, resulting in a large error. When dealing with three-dimensional space or more complex transformations, affine transformation may not be sufficient to describe all geometric changes, and a more complex transformation model is required. Summary of the Invention

[0005] The object of the present invention is to provide a method and device for calibrating the alignment and exposure movement of a maskless lithography device, in which the pattern is distortion-free during the transformation process, there is no limitation on projective transformation, the perspective effect can be simulated, the versatility is better, more geometric transformations can be adapted, it can be applied to the coordinate transformation of a curved axis, the straightness error of the axis is considered, and the error is reduced.

[0006] In the first aspect, the present application provides a method for calibrating the alignment and exposure movement of a maskless lithography device in real time, including the following steps: S1: Calculate and obtain the first coordinate conversion relationship between the K1Y1 coordinate system and the base coordinate system based on the coordinates of multiple first marking points on the calibration plate and the calibration algorithm, and calculate and obtain the second coordinate conversion relationship between the K1Y1 coordinate system and the K2Y1 coordinate system based on the coordinates of multiple first marking points on the calibration plate and the interpolation algorithm; S2: Control the camera to align with the first point to be measured and obtain the first measured coordinate of the first point to be measured in the K1Y1 coordinate system; S3: Obtain the second measured coordinate of the first point to be measured in the base coordinate system based on the first measured coordinate and the first coordinate conversion relationship, and obtain the third measured coordinate of the first point to be measured in the K2Y1 coordinate system based on the first measured coordinate and the second coordinate conversion relationship; S4: Control the DMD center to perform exposure dotting on the first point to be measured based on the second measured coordinate, and control the camera to align with the first point to be measured based on the third measured coordinate.

[0007] Preferably, in step S4, controlling the DMD center to perform exposure dotting on the first point to be measured based on the second measured coordinate specifically includes: Translate the second measured coordinate by a first preset length to obtain the fourth measured coordinate of the first point to be measured in the exposure coordinate system, and control the DMD center to perform exposure dotting on the first point to be measured based on the fourth measured coordinate.

[0008] Preferably, step S1 specifically includes: S11: Obtain multiple first marking coordinates of multiple first marking points on the calibration plate in the K1Y1 coordinate system, multiple second marking coordinates in the base coordinate system, and multiple third marking coordinates in the K2Y1 coordinate system; S12: Calculate and obtain the first coordinate conversion relationship between the K1Y1 coordinate system and the base coordinate system based on the multiple first marking coordinates, multiple second marking coordinates and the calibration algorithm, and calculate and obtain the second coordinate conversion relationship between the K1Y1 coordinate system and the K2Y1 coordinate system based on the multiple first marking coordinates, multiple third marking coordinates and the interpolation algorithm.

[0009] Preferably, in step S12, calculating and obtaining the first coordinate conversion relationship between the K1Y1 coordinate system and the base coordinate system based on the multiple first marking coordinates, multiple second marking coordinates and the calibration algorithm specifically includes: The calibration algorithm is used to calculate and obtain multiple first optimal estimations corresponding to multiple first marker coordinates respectively, and based on the multiple first marker coordinates and the multiple first optimal estimations, the first coordinate transformation relationship between the K1Y1 coordinate system and the base coordinate system is calculated and obtained.

[0010] Preferably, in step S12, calculating and obtaining the second coordinate transformation relationship between the K1Y1 coordinate system and the K2Y1 coordinate system based on the multiple first marker coordinates, the multiple third marker coordinates and the interpolation algorithm specifically includes: The interpolation algorithm is used to calculate and obtain multiple second optimal estimations corresponding to multiple first marker coordinates respectively, and based on the multiple first marker coordinates and the multiple second optimal estimations, the second coordinate transformation relationship between the K1Y1 coordinate system and the K2Y1 coordinate system is calculated and obtained.

[0011] Preferably, step S11 specifically includes: S111: Control the camera to align with the calibration plate, grab multiple points on the calibration plate as multiple first marker points, and respectively obtain multiple first marker coordinates of the multiple first marker points in the K1Y1 coordinate system; S112: Control the DMD center to expose and dot the multiple first marker points respectively, and respectively obtain multiple second marker coordinates of the multiple first marker points in the base coordinate system; S113: Control the camera to align with the multiple first marker points respectively, and respectively obtain multiple third marker coordinates of the multiple first marker points in the K2Y1 coordinate system.

[0012] In a second aspect, an alignment and exposure motion calibration device for a maskless lithography apparatus according to an embodiment of the present application includes a transformation relationship acquisition module, a calculation module, and a control module; The transformation relationship acquisition module is used to calculate and obtain the first coordinate transformation relationship between the K1Y1 coordinate system and the base coordinate system based on the coordinates of multiple first marker points on the calibration plate and the calibration algorithm, and calculate and obtain the second coordinate transformation relationship between the K1Y1 coordinate system and the K2Y1 coordinate system based on the coordinates of multiple first marker points on the calibration plate and the interpolation algorithm; The control module is used to control the camera to align with the first point to be measured and obtain the first measured coordinate of the first point to be measured in the K1Y1 coordinate system; The calculation module is used to obtain the second measured coordinate of the first point to be measured in the base coordinate system based on the first measured coordinate and the first coordinate transformation relationship, and obtain the third measured coordinate of the first point to be measured in the K2Y1 coordinate system based on the first measured coordinate and the second coordinate transformation relationship; The control module is used to control the DMD center to expose and dot the first point to be measured based on the second measured coordinate, and control the camera to align with the first point to be measured based on the third measured coordinate.

[0013] Preferably, the conversion relationship acquisition module includes a coordinate acquisition unit and a relationship establishment unit; The coordinate acquisition unit is used to acquire a plurality of first marker coordinates of a plurality of first marker points on the calibration board in the K1Y1 coordinate system, a plurality of second marker coordinates in the basic coordinate system, and a plurality of third marker coordinates in the K2Y1 coordinate system; The relationship establishment unit is used to calculate and obtain the first coordinate conversion relationship between the K1Y1 coordinate system and the basic coordinate system based on a plurality of first marker coordinates, a plurality of second marker coordinates and a calibration algorithm, and calculate and obtain the second coordinate conversion relationship between the K1Y1 coordinate system and the K2Y1 coordinate system based on a plurality of first marker coordinates, a plurality of third marker coordinates and an interpolation algorithm.

[0014] In a third aspect, an embodiment of the present application provides an electronic device, including a memory, a processor, and a computer program stored on the memory and executable on the processor. When the processor executes the computer program, the steps of the method provided in the first aspect or any possible implementation manner of the first aspect are implemented.

[0015] In a fourth aspect, an embodiment of the present application provides a computer-readable storage medium, on which a computer program is stored. When the computer program is executed by a processor, the steps of the method provided in the first aspect or any possible implementation manner of the first aspect are implemented.

[0016] The beneficial effects of the present invention are as follows: 1. The first coordinate conversion relationship is obtained based on the coordinates of a plurality of first marker points and a calibration algorithm, and the second coordinate conversion relationship is obtained based on the coordinates of a plurality of first marker points and an interpolation algorithm. When applying the calibration algorithm and the interpolation algorithm for coordinate transformation, there is no limitation of projective transformation, and the perspective effect can be simulated. It can be applied to the camera alignment at different heights and distances, can handle three-dimensional space or more complex transformations, and can adapt to more coordinate transformations; 2. When applying the calibration algorithm and the interpolation algorithm for coordinate transformation, the straightness error of the axis is considered. Compared with the prior art where affine transformation does not consider the straightness error of the axis, the present application can improve the accuracy of the first coordinate conversion relationship and the second coordinate conversion relationship and reduce errors; 3. The calibration board is equivalent to a ruler. The first coordinate conversion relationship is obtained based on the first marker points on the calibration board and a calibration algorithm, which can ensure the unity of distance and angle. The coordinate transformation will not distort the shape and size of the graph, ensuring that the graph is undistorted; 4. Translating the second to-be-measured coordinate by a first preset length to obtain the fourth to-be-measured coordinate of the first to-be-measured point in the exposure coordinate system, and performing exposure dotting according to the fourth to-be-measured coordinate can improve the exposure accuracy; 5. By calculating and obtaining the first optimal estimate through a calibration algorithm, and then obtaining the first coordinate conversion relationship based on the first optimal estimate and the first marker coordinates, the influence of system error on position measurement can be reduced; 6. By calculating and obtaining the second optimal estimate through an interpolation algorithm, and then obtaining the second coordinate conversion relationship based on the second optimal estimate and the first marker coordinates, the original data can be better approximated. Especially in the case of fewer data points, the interpolation error can be effectively reduced. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts.

[0018] Figure 1 It is a schematic flowchart of a method for calibrating the alignment and exposure movement of a maskless lithography apparatus provided by an embodiment of the present application; Figure 2 It is a schematic structural diagram of a device for calibrating the alignment and exposure movement of a maskless lithography apparatus provided by an embodiment of the present application; Figure 3 It is a schematic structural diagram of an electronic device provided by an embodiment of the present application; Figure 4 It is a schematic flowchart of the alignment calibration in a method for calibrating the alignment and exposure movement of a maskless lithography apparatus provided by an embodiment of the present application; Figure 5 It is a schematic flowchart of the exposure alignment in a method for calibrating the alignment and exposure movement of a maskless lithography apparatus provided by an embodiment of the present application; Figure 6 It is a schematic flowchart of the coordinate conversion in a method for calibrating the alignment and exposure movement of a maskless lithography apparatus provided by an embodiment of the present application; Figure 7 It is a structural diagram of the quadrilateral ABCD in a method for calibrating the alignment and exposure movement of a maskless lithography apparatus provided by an embodiment of the present application. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0019] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application.

[0020] In the following description, the terms "first" and "second" are for descriptive purposes only and should not be construed as indicating or implying relative importance. The following description provides multiple embodiments of the present application. Different embodiments can be replaced or combined, so the present application can also be considered to include all possible combinations of the same and / or different embodiments described. Thus, if one embodiment includes features A, B, and C, and another embodiment includes features B and D, then the present application should also be considered to include embodiments that contain one or more of all other possible combinations of A, B, C, and D, even though such embodiments may not be explicitly recited in the following content.

[0021] The following description provides examples and does not limit the scope, applicability, or examples set forth in the claims. Changes can be made to the functions and arrangements of the described elements without departing from the scope of the content of the present application. Various processes or components can be appropriately omitted, substituted, or added to each example. For example, the described method can be executed in a different order than the described order, and various steps can be added, omitted, or combined. In addition, the features described for some examples can be combined into other examples.

[0022] Please refer to Figure 1 、 4 -7. Figure 1 is a schematic flowchart of a method for calibrating the alignment and exposure movement of a maskless lithography device provided by an embodiment of the present application; Figure 4 is a schematic flowchart of alignment calibration in a method for calibrating the alignment and exposure movement of a maskless lithography device provided by an embodiment of the present application; Figure 5 is a schematic flowchart of exposure alignment in a method for calibrating the alignment and exposure movement of a maskless lithography device provided by an embodiment of the present application; Figure 6 is a schematic flowchart of coordinate transformation in a method for calibrating the alignment and exposure movement of a maskless lithography device provided by an embodiment of the present application; Figure 7 is a structural diagram of quadrilateral ABCD in a method for calibrating the alignment and exposure movement of a maskless lithography device provided by an embodiment of the present application. In the embodiment of the present application, the method includes the following steps: S1: Calculate and obtain the first coordinate transformation relationship between the K1Y1 coordinate system and the basic coordinate system based on the coordinates of multiple first marker points on the calibration plate and the calibration algorithm, and calculate and obtain the second coordinate transformation relationship between the K1Y1 coordinate system and the K2Y1 coordinate system based on the coordinates of the multiple first marker points and the interpolation algorithm; S2: Control the camera to align with the first measurement point and obtain the first measurement coordinate of the first measurement point in the K1Y1 coordinate system; S3: Obtain the second coordinate to be measured of the first point to be measured in the basic coordinate system based on the first coordinate to be measured and the first coordinate conversion relationship, and obtain the third coordinate to be measured of the first point to be measured in the K2Y1 coordinate system based on the first coordinate to be measured and the second coordinate conversion relationship; S4: Control the center of the DMD to perform exposure dotting on the first point to be measured based on the second coordinate to be measured, and control the camera to align with the first point to be measured based on the third coordinate to be measured.

[0023] In the embodiment of the present application, the first coordinate conversion relationship is calculated and obtained based on the coordinates of multiple first marker points and the calibration algorithm, and the second coordinate conversion relationship is calculated and obtained based on the coordinates of multiple first marker points and the interpolation algorithm. The coordinates obtained by performing coordinate conversion between the K1Y1 coordinate system and the basic coordinate system through the first coordinate conversion relationship have high accuracy. The coordinates obtained by performing coordinate conversion between the K1Y1 coordinate system and the K2Y1 coordinate system through the second coordinate conversion relationship have high accuracy; the second coordinate to be measured obtained based on the first coordinate to be measured and the first coordinate conversion relationship has high accuracy, and the third coordinate to be measured obtained based on the first coordinate to be measured and the second coordinate conversion relationship has high accuracy; controlling the center of the DMD to perform exposure dotting on the first point to be measured based on the second coordinate to be measured has high exposure accuracy, and controlling the camera to align with the first point to be measured based on the third coordinate to be measured has high alignment accuracy, significantly reducing the system error.

[0024] In the embodiment of the present application, in the prior art, projective transformation is used for coordinate transformation, and the straightness error of the axis is not considered. When the actual axis is bent, the crankshaft is directly regarded as a straight axis for coordinate transformation, resulting in a large error. However, when the calibration algorithm performs coordinate transformation in the present application, the straightness error of the axis is considered, and the crankshaft will not be directly regarded as a straight axis for coordinate transformation. The first marker points on the calibration plate are constrained by the calibration plate to ensure the accuracy of the calibration process. During the calibration process, the accuracy of the parameters is increased through an iterative optimization method to improve the accuracy of the first coordinate conversion relationship; when the interpolation algorithm performs coordinate transformation, the straightness error of the axis is considered, and the crankshaft will not be directly regarded as a straight axis for coordinate transformation. Polynomials are used instead of linear functions to fit the data in each direction, which can capture the non-linear changes of more data, and the result is smoother, and can better approximate the original data, improving the accuracy of the second coordinate conversion relationship.

[0025] In an embodiment of the present application, the first point to be measured can be a point at any position on the calibration plate; after obtaining the first coordinate conversion relationship and the second coordinate conversion relationship, alignment and exposure are performed. First, a first point to be measured is designated as the exposure point, and the first coordinate to be measured of the first point to be measured in the K1Y1 coordinate system is obtained; then, based on the first coordinate conversion relationship between the obtained K1Y1 coordinate system and the base coordinate system and the first coordinate to be measured of the first point to be measured in the K1Y1 coordinate system, the second coordinate to be measured of the first point to be measured in the base coordinate system is obtained, and the DMD center is controlled according to the second coordinate to be measured to perform exposure dotting on the first point to be measured; finally, based on the second coordinate conversion relationship between the obtained K2Y1 coordinate system and the K1Y1 coordinate system and the first coordinate to be measured of the first point to be measured in the K1Y1 coordinate system, the third coordinate to be measured of the first point to be measured in the K2Y1 coordinate system is obtained, and the camera is controlled according to the third coordinate to be measured to align with the first point to be measured.

[0026] In an implementable manner, in step S4, controlling the DMD center to perform exposure dotting on the first point to be measured based on the second coordinate to be measured specifically includes: The second coordinate to be measured is translated by a first preset length to obtain the fourth coordinate to be measured of the first point to be measured in the exposure coordinate system, and the DMD center is controlled based on the fourth coordinate to be measured to perform exposure dotting on the first point to be measured.

[0027] In an embodiment of the present application, after obtaining the second coordinate to be measured, the second coordinate to be measured is translated to obtain the fourth coordinate to be measured of the first point to be measured in the exposure coordinate system, and the DMD center is controlled according to the fourth coordinate to be measured to perform exposure dotting on the first point to be measured, improving the exposure accuracy; the K1Y1 coordinate system is the coordinate system corresponding to the left workbench, the base coordinate system can be the left platform base coordinate system, the exposure coordinate system is based on the DataSvr convention, and the exposure coordinate system is roughly at the table scale.

[0028] In an implementable manner, step S1 specifically includes: S11: Obtain multiple first marker coordinates of multiple first marker points on the calibration plate in the K1Y1 coordinate system, multiple second marker coordinates in the base coordinate system, and multiple third marker coordinates in the K2Y1 coordinate system; S12: Calculate and obtain the first coordinate conversion relationship between the K1Y1 coordinate system and the base coordinate system based on the multiple first marker coordinates, multiple second marker coordinates, and the calibration algorithm, and calculate and obtain the second coordinate conversion relationship between the K1Y1 coordinate system and the K2Y1 coordinate system based on the multiple first marker coordinates, multiple third marker coordinates, and the interpolation algorithm.

[0029] In an implementable manner, in step S12, calculating and obtaining the first coordinate conversion relationship between the K1Y1 coordinate system and the base coordinate system based on the multiple first marker coordinates, multiple second marker coordinates, and the calibration algorithm specifically includes: Through the calibration algorithm, multiple first optimal estimates corresponding to multiple first marker coordinates are respectively calculated, and based on the multiple first marker coordinates and the multiple first optimal estimates, the first coordinate conversion relationship between the K1Y1 coordinate system and the base coordinate system is calculated.

[0030] In the embodiment of the present application, the first optimal estimate in the calibration algorithm is the alignment coordinate (measurement value) of the points on the calibration plate according to the constraint relationship of the calibration plate. Using the least squares method, a calibrated coordinate system is established, and the calibrated coordinates are obtained accordingly.

[0031] In the embodiment of the present application, specifically, calculating the first optimal estimate corresponding to the first marker coordinate through the calibration algorithm includes: The first marker coordinate of the first marker point Two equations that satisfy , Represented by a matrix as , where , , , , Are the first preset parameters, And Reflect the inclination degree of the family of straight lines passing through the first marker point, And Reflect the overall translation of this family of straight lines, Represents the distance between two adjacent points horizontally or vertically; Denote this matrix as , where , , Is the parameter matrix; Traverse all To obtain And ; Substitute And Into the least squares solution formula To obtain multiple least squares solutions; Take the minimum value among the multiple least squares solutions as the first optimal estimate. By calculating the transformation matrix between the K1Y1 coordinate system and the base coordinate system, the obtained three-dimensional point cloud data of the measured object can be transformed into the base coordinate system. In this way, it is possible to determine whether the current object is within the measurement range according to the z coordinate value of the point cloud data, thereby improving the efficiency and accuracy of subsequent point cloud processing and three-dimensional measurement; In one implementable manner, specifically, calculating the second coordinate conversion relationship between the K1Y1 coordinate system and the K2Y1 coordinate system based on multiple first marker coordinates, multiple third marker coordinates and the interpolation algorithm in step S12 includes: Calculate and obtain multiple second optimal estimates corresponding to multiple first marker coordinates respectively through an interpolation algorithm, and calculate and obtain a second coordinate conversion relationship between the K1Y1 coordinate system and the K2Y1 coordinate system based on the multiple first marker coordinates and the multiple second optimal estimates.

[0032] In the embodiment of the present application, calculating and obtaining multiple second optimal estimates corresponding to multiple first marker coordinates respectively through an interpolation algorithm specifically includes: selecting a first calculation point, a second calculation point, a third calculation point, and a fourth calculation point from the multiple first marker points, where the first calculation point, the second calculation point, the third calculation point, and the fourth calculation point are arbitrarily distributed on a plane and form the vertices of an irregular quadrilateral; respectively obtaining a fifth calculation point on the first connection line between the first calculation point and the second calculation point and located between the first calculation point and the second calculation point, and a sixth calculation point on the second connection line between the third calculation point and the fourth calculation point and located between the third calculation point and the fourth calculation point, where the third calculation point and the sixth calculation point are equi-proportion points on the first connection line and the second connection line; performing interpolation calculation on the first calculation point and the second calculation point based on the interpolation algorithm to obtain a first function formula of the fifth calculation point, and performing interpolation calculation on the third calculation point and the fourth calculation point based on the interpolation algorithm to obtain a second function formula of the sixth calculation point; obtaining a seventh calculation point on the third connection line between the fifth calculation point and the sixth calculation point and located between the fifth calculation point and the sixth calculation point; performing interpolation calculation on the fifth calculation point and the sixth calculation point based on the interpolation algorithm to obtain a third function formula of the seventh calculation point; substituting the first function formula and the second function formula into the third function formula to obtain a fourth function formula, and solving the fourth function formula to obtain the second optimal estimate.

[0033] In the embodiments of the present application, a method for position calibration using a calibration board or a calibration ruler is proposed, which can significantly reduce systematic errors. The calibration board or the calibration ruler is made of materials with stable physical and chemical properties (such as quartz, invar, etc.). A series of marker points are arranged in a rectangular lattice on it. The distance between adjacent marker points is fixed and does not change with environmental factors (temperature, humidity, etc.). The positional constraint relationship of such adjacent marker points can be represented by a system of linear equations of a set of criss-crossing straight line families. The measured value of the position of the marker point in the i-th row and j-th column should satisfy the linear equations of the i-th row and the j-th column simultaneously. Then, for a set of marker points with M rows and N columns, there are M×N linear equations, and each of these linear equations has 4 unknown characteristic parameters. The least squares solution of these M×N linear equations is the optimal estimate of these 4 unknown characteristic parameters in the sense of least squares. Furthermore, the intersection point of the i-th horizontal line and the j-th vertical line in the straight line family determined by these optimal parameters can be calculated, which is the optimal estimate of the position of the marker point in the i-th row and j-th column. By calculating the position offset from the measured position of the marker point to its optimal position estimate, the calibration of the position measurement error is completed. Since this calibration method utilizes the geometric constraints of all calibration points, it can effectively reduce the overall systematic error and is used for the interpolation of the calibration positions of non-calibration points. The interpolation on an irregular quadrilateral region and the interpolation on a straight line are respectively realized by the inverse bilinear algorithm and the straight line projection algorithm. The calibration algorithm is used to calculate the optimal estimate according to the position measurements of all marker points , and take it as its calibration value. The interpolation algorithm is used to calculate the optimal estimate according to the position measurements of any non-marker points , and take it as its calibration value. , and take it as its calibration value. , and take it as its calibration value.

[0034] In the embodiments of the present application, the marker points arranged in a rectangle are located on a series of horizontal and vertical straight line families. The equation of the i-th horizontal straight line of this straight line family is , and the equation of the j-th vertical straight line is , where , , , , are the first preset parameters, and reflect the inclination degree of the straight line family passing through the first marker point, and reflect the overall translation of this straight line family, represents the distance between two adjacent points horizontally or vertically, indicates that there are two possible forms of equation parameter expressions. The coordinates of any marker point on the calibration board should satisfy the above two equations, that is, , , represented by a matrix as , denoted as , where , and and are parameter matrices. Traverse all to obtain and , then , so the least - squares solution is , take the least - squares solution with the smallest one as the first optimal estimate of the parameter X of the line family. Determine the first preset parameters , , , , , solve the linear equations , , to obtain , .

[0035] In the embodiment of the present application, the role of interpolation is to, from the measured coordinates of the known calibration points, and their calibration coordinates , i = 1,..., M, j = 1,..., N, for any measured coordinate , find its calibration coordinate . For this purpose, the inverse bilinear interpolation algorithm is adopted, which is widely used for irregular quadrilateral interpolation in computer graphics.

[0036] In the embodiment of the present application, referring to Figure 7 , points A, B, C, D are arbitrarily distributed on the plane and form the vertices of an irregular quadrilateral, and point X is inside the quadrilateral. Points P and Q are the equal - ratio points on AB and CD (i.e., ‖AP‖ / ‖PB‖ = ‖DQ‖ / ‖QC‖), and X is located on the line segment PQ. Now, it is necessary to interpolate the function value f(X) at X based on the function values f(A), f(B), f(C), f(D) at the four vertices. For this purpose, first interpolate the function value of point P from points A and B, then interpolate the function value of point Q from points D and C, and finally interpolate the function value of point X from points P and Q. In the above formulas, is the interpolation variable. Substitute the function values of point P and point Q into the function value of point X respectively to obtain , solve this formula to obtain the second optimal estimate Points A, B, C, D, P, Q, and X can be the first calculation point, the second calculation point, the third calculation point, the fourth calculation point, the fifth calculation point, the sixth calculation point, and the seventh calculation point respectively.

[0037] In the embodiment of the present application, the first coordinate transformation relationship between the K1Y1 coordinate system and the base coordinate system obtained by calculating based on multiple first marker coordinates and multiple first optimal estimates can be that there is a proportional relationship between the first marker coordinates and the first optimal estimates, or there is a proportional relationship between the sum of the first marker coordinates and the first constant and the first optimal estimates. The second coordinate transformation relationship between the K1Y1 coordinate system and the K2Y1 coordinate system obtained by calculating based on multiple first marker coordinates and multiple second optimal estimates can be that there is a proportional relationship between the second marker coordinates and the second optimal estimates, or there is a proportional relationship between the sum of the second marker coordinates and the second constant and the second optimal estimates.

[0038] In the embodiment of the present application, the interpolation algorithm can be bilinear interpolation, inverse bilinear interpolation, or two-dimensional cubic convolution interpolation algorithm. The purpose of the interpolation algorithm is to estimate the values of unknown data points between known data points. Smoothness: Smooth interpolation algorithms (such as cubic spline interpolation) can ensure that the interpolation function and its first and second derivatives are continuous, thus generating a smooth curve. This makes the interpolation result more natural visually and is suitable for applications that require high-quality graphics, such as image processing and computer graphics. Accuracy: Smooth interpolation can usually approximate the original data better, especially when the number of data points is small, and can effectively reduce the interpolation error. Adaptability: Some smooth interpolation methods (such as wavelet-based interpolation) can adaptively adjust the interpolation strategy according to the local characteristics of the data and provide better results. Diversity: There are various forms of smooth interpolation methods, such as cubic spline and Hermite interpolation, and different algorithms can be selected according to specific requirements. Calibration algorithm: It can reduce or even eliminate the influence of systematic errors on position measurement. Bilinear interpolation: Smoothness: It can ensure that the interpolation function and its first and second derivatives are continuous, thus generating a smooth curve. This makes the interpolation result more natural visually and is suitable for applications that require high-quality graphics, such as image processing and computer graphics. Accuracy: It can approximate the original data better, especially when the number of data points is small, and can effectively reduce the interpolation error.

[0039] In an implementable manner, step S11 specifically includes: S111: Control the camera to align with the calibration board, grab multiple points on the calibration board as multiple first marker points, and respectively obtain multiple first marker coordinates of the multiple first marker points in the K1Y1 coordinate system; S112: Control the center of the DMD to expose and mark the multiple first marker points respectively, and respectively obtain multiple second marker coordinates of the multiple first marker points in the base coordinate system; S113: Control the camera to align with each of the multiple first marker points respectively, and obtain the multiple third marker coordinates of the multiple first marker points in the K2Y1 coordinate system.

[0040] In the embodiment of the present application, step S11 mainly includes three steps. First, the camera aligns with the calibration plate. Then, central exposure dotting is performed on the DMD. Finally, the camera aligns. These three steps respectively correspond to steps S111, S112, and S113. These three steps are to obtain the corresponding coordinate data, so as to facilitate the subsequent establishment of a coordinate conversion relationship. By calibrating the camera parameters, it can be ensured that the camera can accurately record the actual size and position of the object during the shooting process. This includes calibrating the internal parameters of the camera (such as focal length, optical center position) and external parameters (such as the attitude and position of the camera). By obtaining the calibration whiteboard image and establishing the K1Y1 coordinate system, the geometric characteristics of the laser plane can be accurately determined, thereby improving the accuracy of the point cloud data.

[0041] In the embodiment of the present application, when the camera aligns in step S111, the coordinate values of all points on the calibration plate will be saved. The camera aligns with the calibration plate, which does not involve the DMD. There are only the camera and the calibration plate. When the camera aligns with the calibration plate, it is to obtain the coordinate values of all points on the calibration plate. In step S112, a series of points XY (similar to the dot matrix of the calibration plate) are specified, and central dotting is performed with the DMD. In step S113, the camera (two) is used to align with a first marker point again, and the camera needs to obtain the first marker coordinates of this point. At this time, these first marker coordinates, second marker coordinates, and third marker coordinates are saved. These data are used for calibration algorithms and interpolation to establish a coordinate conversion.

[0042] In the embodiment of the present application, in step S112, a series of first marker points are specified for central exposure dotting by the DMD. In step S113, when the camera aligns, a rough value is calculated according to the size of the mechanical structure for alignment. When the camera aligns, the coordinate values of all points on the calibration plate are saved to obtain an accurate coordinate, and the motor is controlled to drive the camera to reach that point, and the camera can identify the coordinates of that point.

[0043] In the embodiment of the present application, refer to Figure 4 Specifically, in step S111, it includes: placing the marker plate on the tabletop and vacuum adsorbing the marker plate on the tabletop; controlling the camera to align with the calibration plate, and respectively obtaining the coordinate values of the first preset number of points on the calibration plate in the K1Y1 coordinate system, selecting at least one point from the first preset number of points as the first marker point, and obtaining the first marker coordinates of the first marker point in the K1Y1 coordinate system; saving the first marker coordinate data corresponding to the first marker point.

[0044] In the embodiment of the present application, refer to Figure 5, specifically in step S112, it includes: laying a color-changing film on the tabletop and vacuum-absorbing the color-changing film on the tabletop; controlling the center of the DMD to perform exposure dotting at the position of the first marking point on the color-changing film; controlling the camera to capture the exposed dots and obtaining the second marking coordinates of the first marking point in the base coordinate system; saving the second marking coordinate data corresponding to the first marking point.

[0045] In the embodiments of the present application, in the operation of a Laser Direct Imaging (LDI) lithography machine, in order to achieve precise positioning of the workbench position and precise mapping of graphic content, two steps are required. One is to move the alignment system to align the visual center of its industrial camera with the point to be exposed to determine the coordinates of the position to be exposed. The other is to move the exposure system to align the center of its laser engine (DMD center) with the position to be exposed to achieve exposure. Since the alignment system and the exposure system are two independent motion devices, the motion axis coordinates of the two are not an orthogonal rectangular coordinate system and are not always the same as each other. Therefore, the alignment motion coordinates of the position to be exposed need to be converted into the corresponding engine motion coordinates to achieve precise positioning and exposure. Although this problem is very similar to the "hand-eye coordination" problem in robot operation in terms of mathematics, it still has some characteristics of the lithography equipment itself. For example, when the lithography machine has multiple laser engines and multiple alignment cameras, this problem becomes a specific "multi-hand multi-eye coordination problem".

[0046] In the embodiments of the present application, refer to Figure 6 , both Route 1 and Route 2 use the calibration algorithm for transformation. Route 1 and Route 2 respectively represent the coordinate transformation of points in different regions in the K1Y1 coordinate system to the coordinates of the left platform base coordinate system. Route 3 represents the coordinate transformation between the K1Y1 coordinate system and the K2Y1 coordinate system. Route 4 represents the coordinate transformation between the K1Y1 coordinate system and the XY1 coordinate system. Both Route 3 and Route 4 use the interpolation algorithm for transformation. The rigid body transformation is the coordinate translation of the base coordinate system into the coordinates in the exposure coordinate system.

[0047] Next, a device for calibrating the alignment and exposure motion of a maskless lithography equipment provided by the embodiments of the present application will be introduced in detail in conjunction with the attached Figure 2 , which is used to execute the method of the embodiments of the present application. For the sake of convenience of description, only the parts related to the embodiments of the present application are shown. For the specific technical details not disclosed, please refer to the embodiments shown in Figure 2 A device for calibrating the alignment and exposure motion of a maskless lithography equipment shown, which is used to execute the method of the embodiments of the present application. For the sake of convenience of description, only the parts related to the embodiments of the present application are shown. For the specific technical details not disclosed, please refer to the embodiments shown in Figure 1 the present application shown in Figure 1 the embodiments shown.

[0048] Please refer to Figure 2 , Figure 2This is a schematic structural diagram of an alignment and exposure motion calibration device for a maskless lithography apparatus provided by an embodiment of the present application. As Figure 2 shown, the device includes a conversion relationship acquisition module 201, a calculation module 202, and a control module 203; The conversion relationship acquisition module 201 is configured to calculate and obtain a first coordinate conversion relationship between the K1Y1 coordinate system and the base coordinate system based on the coordinates of multiple first marker points on the calibration plate and a calibration algorithm, and calculate and obtain a second coordinate conversion relationship between the K1Y1 coordinate system and the K2Y1 coordinate system based on the coordinates of multiple first marker points on the calibration plate and an interpolation algorithm; The control module 203 is configured to control the camera to align with a first measurement point and obtain a first measurement coordinate of the first measurement point in the K1Y1 coordinate system; The calculation module 202 is configured to obtain a second measurement coordinate of the first measurement point in the base coordinate system based on the first measurement coordinate and the first coordinate conversion relationship, and obtain a third measurement coordinate of the first measurement point in the K2Y1 coordinate system based on the first measurement coordinate and the second coordinate conversion relationship; The control module 203 is configured to control the DMD center to perform exposure dotting on the first measurement point based on the second measurement coordinate, and control the camera to align with the first measurement point based on the third measurement coordinate.

[0049] In an implementable manner, the conversion relationship acquisition module 201 includes a coordinate acquisition unit and a relationship establishment unit; The coordinate acquisition unit is configured to obtain multiple first marker coordinates of multiple first marker points on the calibration plate in the K1Y1 coordinate system, multiple second marker coordinates in the base coordinate system, and multiple third marker coordinates in the K2Y1 coordinate system; The relationship establishment unit is configured to calculate and obtain a first coordinate conversion relationship between the K1Y1 coordinate system and the base coordinate system based on the multiple first marker coordinates, the multiple second marker coordinates, and a calibration algorithm, and calculate and obtain a second coordinate conversion relationship between the K1Y1 coordinate system and the K2Y1 coordinate system based on the multiple first marker coordinates, the multiple third marker coordinates, and an interpolation algorithm.

[0050] Those skilled in the art can clearly understand that the technical solutions of the embodiments of the present application can be implemented by means of software and / or hardware. The "unit", "module", and "section" in this specification refer to software and / or hardware that can independently complete or cooperate with other components to complete a specific function, where the hardware can be, for example, a Field-Programmable Gate Array (FPGA), an Integrated Circuit (IC), etc.

[0051] Each processing unit and / or module in the embodiments of the present application can be implemented by an analog circuit that implements the functions described in the embodiments of the present application, or can be implemented by software that executes the functions described in the embodiments of the present application.

[0052] Refer to Figure 3 , which shows a schematic structural diagram of an electronic device related to the embodiments of the present application. This electronic device can be used to implement Figure 1 the method in the illustrated embodiments. As Figure 3 shown, the electronic device 300 may include: at least one central processing unit 301, at least one network interface 304, a user interface 303, a memory 305, and at least one communication bus 302.

[0053] Among them, the communication bus 302 is used to realize the connection and communication between these components.

[0054] Among them, the user interface 303 may include a display screen (Display) and a camera (Camera). Optionally, the user interface 303 may further include a standard wired interface and a wireless interface.

[0055] Among them, the network interface 304 may optionally include a standard wired interface and a wireless interface (such as a WI-FI interface).

[0056] Among them, the central processing unit 301 may include one or more processing cores. The central processing unit 301 uses various interfaces and lines to connect various parts within the entire electronic device 300. By running or executing instructions, programs, code sets, or instruction sets stored in the memory 305, and by calling data stored in the memory 305, it executes various functions of the terminal 300 and processes data. Optionally, the central processing unit 301 may be implemented in at least one hardware form of digital signal processing (DSP), field-programmable gate array (FPGA), or programmable logic array (PLA). The central processing unit 301 may integrate a combination of one or several of a central processing unit (CPU), a graphics processing unit (GPU), and a modem, etc. Among them, the CPU mainly processes the operating system, user interface, and application programs, etc.; the GPU is responsible for the rendering and drawing of the content to be displayed on the display screen; the modem is used to process wireless communication. It can be understood that the above-mentioned modem may not be integrated into the central processing unit 301 and may be implemented separately by a single chip.

[0057] Among them, the memory 305 may include a Random Access Memory (RAM), or may also include a Read-Only Memory. Optionally, the memory 305 includes a non-transitory computer-readable storage medium. The memory 305 can be used to store instructions, programs, codes, code sets or instruction sets. The memory 305 may include a program storage area and a data storage area. Among them, the program storage area can store instructions for implementing the operating system, instructions for at least one function (such as touch function, sound playback function, image playback function, etc.), instructions for implementing the above-mentioned method embodiments, etc.; the data storage area can store the data involved in the above-mentioned method embodiments. Optionally, the memory 305 may also be at least one storage device located far from the aforementioned central processor 301. As Figure 3 shown, the memory 305 as a computer storage medium may include an operating system, a network communication module, a user interface module, and program instructions.

[0058] In Figure 3 the electronic device 300 shown, the user interface 303 is mainly used to provide an input interface for the user to obtain the data input by the user; while the central processor 301 can be used to call the application program of the method for calibrating the alignment and exposure movement of a maskless lithography device stored in the memory 305, and specifically perform the following operations: S1: Calculate and obtain the first coordinate conversion relationship between the K1Y1 coordinate system and the base coordinate system based on the coordinates of multiple first marker points on the calibration plate and the calibration algorithm, and calculate and obtain the second coordinate conversion relationship between the K1Y1 coordinate system and the K2Y1 coordinate system based on the coordinates of multiple first marker points on the calibration plate and the interpolation algorithm; S2: Control the camera to align with the first measurement point to be measured and obtain the first measurement coordinate of the first measurement point to be measured in the K1Y1 coordinate system; S3: Obtain the second measurement coordinate of the first measurement point to be measured in the base coordinate system based on the first measurement coordinate and the first coordinate conversion relationship, and obtain the third measurement coordinate of the first measurement point to be measured in the K2Y1 coordinate system based on the first measurement coordinate and the second coordinate conversion relationship; S4: Control the center of the DMD to perform exposure dotting on the first measurement point to be measured based on the second measurement coordinate, and control the camera to align with the first measurement point to be measured based on the third measurement coordinate.

[0059] The present application also provides a computer-readable storage medium, on which a computer program is stored. When the program is executed by a processor, the steps of the above method are implemented. Among them, the computer-readable storage medium may include, but is not limited to, any type of disk, including floppy disks, optical disks, DVDs, CD-ROMs, microdrives, and magneto-optical disks, ROMs, RAMs, EPROMs, EEPROMs, DRAMs, VRAMs, flash memory devices, magnetic cards or optical cards, nanosystems (including molecular memory ICs), or any type of medium or device suitable for storing instructions and / or data.

[0060] It should be noted that, for the foregoing method embodiments, for the sake of simple description, they are all expressed as a series of action combinations. However, those skilled in the art should know that the present application is not limited by the described action sequence, because according to the present application, certain steps can be performed in other sequences or simultaneously. Secondly, those skilled in the art should also know that the embodiments described in the specification are all preferred embodiments, and the actions and modules involved are not necessarily essential to the present application.

[0061] In the above embodiments, the descriptions of the respective embodiments have their own emphases. For the parts not detailed in a certain embodiment, reference can be made to the relevant descriptions of other embodiments.

[0062] In several embodiments provided by the present application, it should be understood that the disclosed device can be implemented in other ways. For example, the device embodiments described above are merely illustrative. For example, the division of the modules or units is only a logical function division. In actual implementation, there may be other division methods. For example, multiple units or components can be combined or integrated into another system, or some features can be ignored or not executed. Another point is that the displayed or discussed coupling or direct coupling or communication connection between each other can be through some service interfaces. The indirect coupling or communication connection of the device or unit can be in an electrical or other form.

[0063] The unit described as a separate component may or may not be physically separated. The component displayed as a unit may or may not be a physical unit, that is, it may be located in one place, or it may be distributed to multiple network units. Some or all of the units can be selected according to actual needs to achieve the purpose of the solution of this embodiment.

[0064] In addition, in each embodiment of the present application, the functional units can be integrated into one processing unit, or each unit can exist physically alone, or two or more units can be integrated into one unit. The above integrated unit can be implemented in the form of hardware or in the form of a software functional unit.

[0065] If the integrated unit is implemented in the form of a software functional unit and sold or used as an independent product, it can be stored in a computer-readable memory. Based on such understanding, the technical solution of this application, in essence, or the part that contributes to the prior art, or all or part of this technical solution, can be embodied in the form of a software product. This computer software product is stored in a memory and includes several instructions for causing a computer device (which can be a personal computer, a server, or a network device, etc.) to execute all or part of the steps of the methods described in various embodiments of this application. The aforementioned memory includes: USB flash drives, read-only memory (ROM), random access memory (RAM), mobile hard disks, magnetic disks, or optical discs, etc., which are various media that can store program codes.

[0066] Those of ordinary skill in the art can understand that all or part of the steps in the various methods of the above embodiments can be completed by instructing relevant hardware through a program. This program can be stored in a computer-readable memory, and the memory can include: flash drives, read-only memory (ROM), random access memory (RAM), magnetic disks, or optical discs, etc.

[0067] The foregoing are only exemplary embodiments of the present disclosure and should not be used to limit the scope of the present disclosure. That is, any equivalent changes and modifications made in accordance with the teachings of the present disclosure still fall within the scope covered by the present disclosure. After considering the specification and practicing the present disclosure herein, those skilled in the art will readily think of other embodiments of the present disclosure. This application aims to cover any variations, uses, or adaptations of the present disclosure that follow the general principles of the present disclosure and include common general knowledge or conventional technical means in the technical field not described in the present disclosure. The specification and embodiments are only regarded as exemplary, and the scope and spirit of the present disclosure are defined by the claims.

Claims

1. A method for calibrating the alignment and exposure motion of a maskless lithography device, characterized in that: The steps include: S1: based on the coordinates of the plurality of first marking points on the calibration plate and the calibration algorithm, a first coordinate conversion relationship between the K1Y1 coordinate system and the base coordinate system is obtained; based on the coordinates of the plurality of first marking points on the calibration plate and the interpolation algorithm, a second coordinate conversion relationship between the K1Y1 coordinate system and the K2Y1 coordinate system is obtained; S2: Control the camera to align with the first point to be measured and obtain the first coordinates of the first point to be measured in the K1Y1 coordinate system; S3: acquiring the second coordinates to be measured of the first point to be measured in the basic coordinate system based on the first coordinates to be measured and the first coordinate conversion relationship, and acquiring the third coordinates to be measured of the first point to be measured in the K2Y1 coordinate system based on the first coordinates to be measured and the second coordinate conversion relationship; S4: Based on the second coordinates to be measured, the DMD center is controlled to expose and mark the first point to be measured, and based on the third coordinates to be measured, the camera is controlled to align the first point to be measured.

2. A method for calibrating the alignment and exposure motion of a maskless lithography device according to claim 1, characterized in that: In step S4, controlling the DMD center to perform exposure and dotting on the first point to be measured based on the second coordinate to be measured specifically includes: The second coordinate to be measured is translated by a first preset length to obtain a fourth coordinate to be measured of the first point to be measured in the exposure coordinate system, and the DMD center is controlled to perform exposure marking on the first point to be measured based on the fourth coordinate to be measured.

3. A method for calibrating the alignment and exposure motion of a maskless lithography device according to claim 1 or 2, characterized in that: Step S1 specifically includes: S11: Acquire a plurality of first marking coordinates of a plurality of first marking points on the calibration plate in the K1Y1 coordinate system, a plurality of second marking coordinates in the base coordinate system, and a plurality of third marking coordinates in the K2Y1 coordinate system; S12: Based on multiple first marker coordinates, multiple second marker coordinates and a calibration algorithm, a first coordinate conversion relationship between the K1Y1 coordinate system and the basic coordinate system is obtained; based on multiple first marker coordinates, multiple third marker coordinates and an interpolation algorithm, a second coordinate conversion relationship between the K1Y1 coordinate system and the K2Y1 coordinate system is obtained.

4. A method for calibrating the alignment and exposure motion of a maskless lithography device as claimed in claim 3, characterized in that: In step S12, the first coordinate conversion relationship between the K1Y1 coordinate system and the basic coordinate system is calculated based on the plurality of first marker coordinates, the plurality of second marker coordinates and the calibration algorithm, specifically comprising: A plurality of first optimal estimates corresponding to the plurality of first marker coordinates are respectively calculated and acquired through a calibration algorithm, and a first coordinate conversion relationship between the K1Y1 coordinate system and the basic coordinate system is calculated and acquired based on the plurality of first marker coordinates and the plurality of first optimal estimates.

5. A method for calibrating the alignment and exposure motion of a maskless lithography device as claimed in claim 3, characterized in that: In step S12, the second coordinate conversion relationship between the K1Y1 coordinate system and the K2Y1 coordinate system is calculated based on the plurality of first marker coordinates, the plurality of third marker coordinates and the interpolation algorithm, specifically comprising: A plurality of second optimal estimates corresponding to the plurality of first marker coordinates are respectively calculated and acquired through an interpolation algorithm, and a second coordinate conversion relationship between the K1Y1 coordinate system and the K2Y1 coordinate system is calculated and acquired based on the plurality of first marker coordinates and the plurality of second optimal estimates.

6. A method for calibrating the alignment and exposure motion of a maskless lithography device according to claim 3, characterized in that: Step S11 specifically includes: S111: Control the camera to align the calibration plate, capture multiple points on the calibration plate as multiple first marking points, and respectively obtain multiple first marking coordinates of the multiple first marking points in the K1Y1 coordinate system; S112: Control the DMD center to expose and mark the plurality of first marking points respectively, and obtain a plurality of second marking coordinates of the plurality of first marking points in the basic coordinate system respectively; S113: Control the camera to align the multiple first marking points respectively, and respectively obtain multiple third marking coordinates of the multiple first marking points in the K2Y1 coordinate system.

7. A maskless lithography equipment alignment and exposure motion calibration device, characterized in that: It includes a conversion relationship acquisition module, a calculation module, and a control module; A conversion relationship acquisition module, used to calculate and acquire a first coordinate conversion relationship between the K1Y1 coordinate system and the basic coordinate system based on the coordinates of the plurality of first marking points on the calibration plate and the calibration algorithm, and to calculate and acquire a second coordinate conversion relationship between the K1Y1 coordinate system and the K2Y1 coordinate system based on the coordinates of the plurality of first marking points on the calibration plate and the interpolation algorithm; A control module, used for controlling the camera to align the first point to be measured and obtain the first coordinates of the first point to be measured in the K1Y1 coordinate system; A calculation module, used for obtaining the second coordinates to be measured of the first point to be measured in the basic coordinate system based on the first coordinates to be measured and the first coordinate conversion relationship, and obtaining the third coordinates to be measured of the first point to be measured in the K2Y1 coordinate system based on the first coordinates to be measured and the second coordinate conversion relationship; The control module is used to control the DMD center to expose and mark the first point to be measured based on the second coordinate to be measured, and to control the camera to align the first point to be measured based on the third coordinate to be measured.

8. The alignment and exposure motion calibration device for maskless lithography equipment according to claim 7, characterized in that: The conversion relationship acquisition module includes a coordinate acquisition unit and a relationship establishment unit; The coordinate acquisition unit is used to acquire a plurality of first marking coordinates of a plurality of first marking points on the calibration plate in a K1Y1 coordinate system, a plurality of second marking coordinates in a basic coordinate system, and a plurality of third marking coordinates in a K2Y1 coordinate system; The relationship establishing unit is used to calculate and obtain the first coordinate transformation relationship between the K1Y1 coordinate system and the basic coordinate system based on multiple first marker coordinates, multiple second marker coordinates and a calibration algorithm, and to calculate and obtain the second coordinate transformation relationship between the K1Y1 coordinate system and the K2Y1 coordinate system based on multiple first marker coordinates, multiple third marker coordinates and an interpolation algorithm.

9. An electronic device comprising a memory, a processor, and a computer program stored in the memory and executable on the processor, characterized in that: When the processor executes the computer program, the steps of the method according to any one of claims 1 to 6 are implemented.

10. A computer-readable storage medium having a computer program stored thereon, characterized in that: When the computer program is executed by a processor, the steps of the method according to any one of claims 1 to 6 are implemented.

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