Lithographic data storage method and equipment for electron beam lithography equipment and medium

Abstract

The invention discloses a lithographic pattern data storage method and equipment for electron beam lithographic equipment and a medium. The method comprises the following steps: acquiring a design layout of target electron beam lithographic equipment; segmenting all graphs in the design layout into basic graphs of a specified type to obtain graph distribution; dividing the design layout into a plurality of segment regions according to a photoetching sequence and the pattern distribution; dividing each segment region into a plurality of field regions, wherein each sub-region corresponds to a field region of electron beam lithography; according to the pattern distribution in each sub-region, dividing the pattern in each sub-region into more than one storage unit; and obtaining the position information, the segment area information and the type information of the basic graph of each storage unit, and carrying out coding storage. According to the method, the photoetching graph data of the electron beam photoetching equipment can be quickly and efficiently compressed and stored, and meanwhile, quick retrieval and reading of the graph data can be conveniently realized.

Description

Technical Field

[0001] The present invention relates to the technical field of electron beam lithography equipment, and in particular, to a method, device, and medium for storing lithography graphic data of an electron beam lithography equipment. Background Art

[0002] In the semiconductor chip manufacturing process, the lithography process generally adopts optical lithography technology. The process accuracy of optical lithography highly depends on the mask used in the manufacturing process, and the accuracy of the mask is higher than the requirements of chip devices. The core of preparing a high-precision mask is an electron beam lithography (EBL) equipment, which uses a high-energy electron beam to expose and develop a photoresist pre-coated on the surface of a substrate to achieve micron-level or nanometer-level patterning of the sample surface. The electron beam lithography equipment has high processing accuracy and fast efficiency, and is the mainstream equipment for making high-precision masks. It is widely used in the production of high-precision masks, the preparation of small-batch customized devices, and the prototype development of micro-nano devices. The lithography graphic data of the electron beam lithography equipment is used to control the electron beam to draw a pattern on the surface of the photoresist, so as to guide the electron beam lithography equipment to accurately transfer the design pattern to the photoresist. In electron beam lithography, in order to meet the requirements of quickly reading and retrieving graphic data, while ensuring that the graphic data is close to the processed graphics of the equipment and storing the most graphics in the smallest storage file, an efficient data storage method is required.

[0003] Regarding the storage of graphic data of electron beam lithography equipment, the existing technology generally uses a multi-point, single-file storage method, that is, multiple graphic data points or patterns are stored in a single file. Each point represents a specific pattern or design area, and each point stores the graphic data in a graphic format. This type of multi-point, single-file storage method requires a large amount of storage space. However, the amount of graphic data used by current electron beam lithography equipment is increasing day by day. The above multi-point, single-file storage method is difficult to meet the requirements of graphic data storage under current advanced process nodes, and will cause problems such as low data reading and retrieval efficiency. The graphic data format used by the electron beam lithography equipment needs to be able to quickly read and retrieve relevant graphic data. When storing a large amount of graphic data using the above multi-point, single-file storage method, the electron beam lithography equipment cannot quickly retrieve and find the corresponding graphic data from the storage file or cut the graphic in the specified area for electron beam processing, thereby affecting the processing efficiency of the electron beam lithography equipment. Summary of the Invention

[0004] The technical problem to be solved by the present invention is: aiming at the technical problems existing in the prior art, the present invention provides a method, device, and medium for storing lithography graphic data of an electron beam lithography equipment, which has a simple implementation method, low cost, small storage space, and high efficiency. It can compress and store the lithography graphic data of the electron beam lithography equipment, and at the same time facilitate the quick retrieval of graphic data and the reading of graphic data.

[0005] To solve the above technical problems, the technical solution proposed by the present invention is as follows:

[0006] A method for storing lithography pattern data of an electron beam lithography device, the steps including:

[0007] Obtain the design layout of the target electron beam lithography device;

[0008] Divide all the patterns in the design layout into basic patterns of specified types to obtain a pattern distribution;

[0009] Divide the design layout into multiple segment regions according to the lithography sequence and the pattern distribution;

[0010] Divide each of the segment regions into sub-regions, and each of the sub-regions corresponds to a field region of electron beam lithography;

[0011] According to the pattern distribution in each of the sub-regions, divide the patterns in each sub-region into more than one storage unit;

[0012] Obtain the segment region information, position information, and basic pattern information of each of the storage units for encoded storage.

[0013] Further, the basic patterns include squares, rectangles, right triangles, and right trapezoids. If it is a non-right trapezoid, it is divided into triangles and right trapezoids. If it is a quadrilateral, a large rectangle is divided out from the center, and the remaining regions are divided into multiple right triangles.

[0014] Further, the dividing the design layout into multiple segment regions according to the lithography sequence and the pattern distribution includes:

[0015] Divide a segment region from the starting position of lithography of the design layout according to a preset height;

[0016] Merge the divided current segment region and the patterns intersecting with the current segment region, and determine the final segment region size of the current segment region by taking the circumscribed rectangle region of the patterns in the merged segment region;

[0017] Take the next segment region with a height of the preset height from the design layout according to the lithography sequence, and re-execute the pattern merging and determining the final segment region size of the current segment region until all the segment regions of the design layout are divided.

[0018] Further, the dividing the patterns in each sub-region into more than one storage unit according to the pattern distribution in each of the sub-regions includes: dividing two or more mutually connected basic patterns or two or more basic patterns having an intersecting relationship in each sub-region into the same storage unit.

[0019] Further, the encoding and storing of the position information, segment area information, and basic graphic type information of each storage unit includes:

[0020] Assigning a corresponding number to each segment area to form a segment serial number;

[0021] Encoding the information of each sub-region within each segment area in sequence to form a position information file;

[0022] Encoding the information of each storage unit within each sub-region in sequence to form a link information file;

[0023] Encoding the storage unit information and basic graphic information within each segment area to form a graphic information file, where the basic graphic information includes graphic type and position information;

[0024] Storing the position information file, the link information file, and the graphic information file corresponding to each segment serial number.

[0025] Further, the position information includes coordinate position and position length. The coordinate position is stored in a compressed signed integer data format, and the position length is stored in a compressed unsigned integer data format. The compressed unsigned integer data format includes a control bit and a data bit, and the compressed signed integer data format includes a control bit, a data bit, and a sign bit. The control bit is used to indicate whether there is more data subsequently.

[0026] Further, the compressed unsigned integer data format includes 8 bytes, with the sign bit and the control bit being 1 byte each, and the remaining 6 bytes being data bits; the compressed unsigned integer data includes 8 bytes, with the control bit being 1 byte and the remaining 7 bytes being data bits.

[0027] Further, during the process of encoding and storing the segment area information, position information, and basic graphic information of each storage unit, if there are multiple identical basic graphics within a storage unit, one of the basic graphics is selected as the target graphic for storage, and the distance information between each of the remaining identical basic graphics and the target graphic is stored; if there are multiple identical storage units, one of the storage units is selected as the target storage unit, and the segment area information, position information, and basic graphic information of the target storage unit are encoded and stored, and the distance information between each of the remaining identical storage units and the target storage unit is stored.

[0028] A computer device includes a processor and a memory. The memory is used to store a computer program, and the processor is used to execute the computer program to perform the method as described above.

[0029] A computer-readable storage medium storing a computer program, which when executed by a processor implements the method as described above.

[0030] Compared with the prior art, the advantages of the present invention are as follows: By dividing all the graphics in the design layout of the electron beam lithography equipment into basic graphics, and dividing them into multiple segment regions according to the lithography sequence and graphic distribution, each segment region is further divided into multiple field regions, and then the graphics within each field region are divided into storage units according to the graphic distribution. The segment region information, position information, and basic graphic information of each storage unit are encoded and stored, forming a three-level division method of segment region, field region, and storage unit. This method can adapt to the lithography sequence of the electron beam lithography equipment, divide a large number of graphics into small unit graphics for storage, not only can greatly compress and store the graphic data, but also can facilitate the rapid retrieval of graphics and the reading of regional graphic data during electron beam lithography, thus facilitating the efficient completion of lithography processing. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] Figure 1 It is a schematic diagram of the lithography sequence and processing sequence principle of the lithography graphics of the electron beam lithography equipment.

[0032] Figure 2 It is a schematic diagram of the implementation process of the lithography graphic data storage method of the electron beam lithography equipment in this embodiment.

[0033] Figure 3 It is a schematic diagram of the principle of basic graphic division in the specific application embodiment of the present invention.

[0034] Figure 4 It is a schematic diagram of the principle of segment region and field region division in the specific application embodiment of the present invention.

[0035] Figure 5 It is a schematic diagram of the principle of storage unit division in the specific application embodiment of the present invention.

[0036] Figure 6 It is a schematic diagram of the principle of the composition of the file directory in the specific application embodiment of the present invention.

[0037] Figure 7 It is a schematic diagram of the principle of storage unit information storage in the specific application embodiment of the present invention.

[0038] Figure 8 It is a schematic diagram of the principle of the compressed signed integer data format adopted in the specific application embodiment of the present invention.

[0039] Figure 9 It is a schematic diagram of the principle of the compressed unsigned integer data format adopted in the specific application embodiment of the present invention.

[0040] Figure 10 It is a schematic diagram of the principle for implementing compressed storage of multiple identical basic graphics in a specific application embodiment of the present invention.

[0041] Figure 11 It is a schematic diagram of the principle for implementing compressed storage of multiple identical storage units in a specific application embodiment of the present invention. Detailed implementation manners

[0042] The present invention will be further described below in conjunction with the accompanying drawings of the specification and specific preferred embodiments, but the protection scope of the present invention is not limited thereby.

[0043] The lithography patterns of an electron beam lithography device usually have a specific lithography sequence. For example, Figure 1 as shown, it is usually in the order from left to right and then from right to left. Therefore, during processing, it is also in the order from left to right and then from right to left. At the same time, the electron beam deflector of the electron beam lithography device has a travel limit. Therefore, when lithographing patterns, it will be divided into field areas of a fixed size for electron beam lithography. The present invention realizes the storage of lithography pattern data of an electron beam lithography device by combining the lithography sequence of the electron beam lithography device and adopting the method of multi-file storage and area division. First, all the patterns in the design layout of the electron beam lithography device are divided into basic graphics, and then they are divided into multiple segment areas according to the lithography sequence and pattern distribution. Then each segment area is divided into multiple field areas, and the storage units in each field area are further divided according to the pattern distribution. Finally, the segment area information, position information, and basic graphic information of each storage unit are encoded and stored, which can adapt to the lithography sequence of the electron beam lithography device and divide the massive patterns into small unit patterns for storage in a three-level manner of segment area, field area, and storage unit. It can not only compress and store the graphic data to a large extent, but also facilitate the rapid retrieval of graphics and the reading of regional graphic data during electron beam lithography, thereby facilitating the efficient completion of lithography processing.

[0044] For example, Figure 2 as shown, the steps of the method for storing lithography pattern data of the electron beam lithography device in this embodiment include:

[0045] Step S01. Obtain the design layout of the target electron beam lithography device.

[0046] The design layout is the layout file after the design is completed, which is a graphic file used to guide the electron beam lithography to ensure that the lithography device can accurately transfer the design pattern to the photoresist or substrate material. The specific pattern to be processed is defined on the design layout. The design layout can be specifically drawn using software such as electronic design automation (EDA).

[0047] Step S02. Divide all the patterns in the design layout into basic graphics of a specified type to obtain the pattern distribution.

[0048] After obtaining the design layout of the target electron beam lithography equipment, all the patterns in the design layout are divided into basic patterns. After the division is completed, the pattern distribution state of the basic patterns can be obtained, and the subsequent segment area can be divided by using this pattern distribution state.

[0049] Optionally, the basic patterns may include squares, rectangles, right triangles, right trapezoids, etc. As Figure 3 shown, for basic patterns such as squares, rectangles, right triangles, and right trapezoids, the patterns are kept unchanged without being segmented; for non-basic patterns, they can be segmented into two or more basic patterns. For example, a non-right triangle can be segmented into two right triangles, a non-right trapezoid can be segmented into a triangle and a right trapezoid, and a quadrilateral can be segmented into a large rectangle from the center and then the remaining edge areas can be segmented into multiple right triangles. Other types of polygons can be processed in a similar way as above to be segmented into multiple quadrilaterals and multiple triangles.

[0050] Furthermore, for a basic pattern with an area exceeding a preset area threshold, it can be segmented into two or more basic patterns with an area smaller than the preset area threshold, that is, a basic pattern with an overly large area can be segmented into two or more small-area basic patterns. For example, a large-area right triangle can be divided into multiple small-area right triangles for convenient compression storage.

[0051] Step S03. Divide the design layout into multiple segment areas according to the lithography sequence and pattern distribution.

[0052] Considering that the lithography patterns of the electron beam lithography equipment usually have a specific lithography sequence (for example, in the order from left to right and then from right to left), the design layout can be divided into multiple segment areas according to the lithography sequence and a specified height. At the same time, considering that the patterns in the divided segment areas may not be evenly distributed, if the segment areas are divided according to a fixed height, it may cause the same pattern to be divided into different segment areas at the same time. For example, a certain right triangle can be divided into the upper and lower different segment areas, which cannot maintain the integrity of the pattern data storage, making it difficult to quickly retrieve and read the pattern data during the subsequent processing. In this embodiment, the design layout is divided into segment areas by considering both the lithography sequence and the pattern distribution, so that the divided segment areas can not only adapt to the lithography sequence of the electron beam lithography equipment, but also dynamically adjust the size of the segment areas according to the pattern distribution, avoiding the same pattern being divided into different segment areas, thereby ensuring the integrity of each pattern data storage and facilitating the electron beam lithography equipment to quickly retrieve and find the corresponding pattern data from the storage file for electron beam processing.

[0053] As an alternative implementation, according to the lithography sequence and pattern distribution, the design layout can be divided into multiple segment regions according to the following steps:

[0054] Step S301. Divide a segment region from the starting position of lithography of the design layout according to a preset height L0;

[0055] Step S302. Merge the divided current segment region and the patterns intersecting with the current segment region, and determine the final segment region size of the current segment region by taking the circumscribed rectangle region of the patterns within the merged segment region;

[0056] Step S303. Take the next segment region with a height of the preset height L0 from the design layout in the lithography sequence, and return to execute Step S302 to re-execute the pattern merging of the next segment region and determine the final segment region size of the current segment region until all segment regions of the design layout are divided.

[0057] Taking Figure 1 the lithography sequence as an example, when dividing the design layout into segment regions, the design layout patterns can be divided into the initial first segment from the lower left corner according to the preset height L0, and the initial first segment and the patterns intersecting with the initial first segment are all divided into the first segment. Then, the circumscribed rectangle region of the patterns within the first segment is used as the segment region size of the final first segment, and so on to form each segment region. As Figure 4 shown, after first dividing the first segment (segment 1) according to the preset height L0, segment 1 and the intersecting patterns (rectangles) are regarded as the same segment, and then the circumscribed rectangle region is taken to obtain the final segment 1 containing segment 1 and related patterns. The segment 2, segment 3... are divided by the same principle.

[0058] Step S04. Divide each segment region into sub-regions, and each sub-region corresponds to a field region of electron beam lithography.

[0059] In this embodiment, each segment region can be divided into different sub-regions according to a fixed size, and each region corresponds to a field region of electron beam lithography, as Figure 4 shown. It can be understood that, of course, other methods can also be used to divide the field region according to actual needs. For example, the field regions can be divided into different sizes according to prior information.

[0060] Step S05. Divide the patterns within each sub-region into one or more memory cells according to the pattern distribution within each sub-region.

[0061] After dividing the field regions, each field region may contain multiple basic units. In this embodiment, further according to the pattern distribution within each sub-region, the patterns within each sub-region are further divided into memory cells, so as to divide the patterns within each sub-region into one or more memory cells according to the connection or intersection relationship between the patterns.

[0062] Specifically, two or more basic graphics that are connected to each other or two or more basic graphics that have an intersection relationship within each sub-region can be divided into the same storage unit, that is, graphics with a connection or intersection are divided and stored as one storage unit.

[0063] Take Figure 5 as an example. There is a connection relationship between the basic graphics inside the rectangular dotted line. Therefore, the basic graphics with a connection relationship are jointly divided into the same storage unit, and the isolated basic graphics do not form a unit.

[0064] Step S06. Obtain the segment region information, position information, and basic graphic information of each storage unit for encoding and storage.

[0065] According to steps S01 to S05, the layout design has been hierarchically divided according to the segment region, field region, and storage unit. Furthermore, each storage unit is encoded and stored according to the segment region information, position information, and basic graphic information, which can realize the compressed storage of the lithography graphic data of the electron beam lithography equipment, greatly reduce the data storage space, and at the same time facilitate the rapid retrieval and reading of the graphic data.

[0066] As an alternative implementation, the position information, segment region information, and type information of the basic graphics of each storage unit can be obtained and encoded and stored according to the following steps:

[0067] Step S601. Assign a corresponding number to each segment region to form a segment serial number;

[0068] Step S602. Encode the information of each sub-region within each segment region in sequence to form a position information file;

[0069] Step S603. Encode the information of each storage unit within each sub-region in sequence to form a link information file;

[0070] Step S604. Encode the storage unit information and basic graphic information within each segment region to form a graphic information file, and the basic graphic information includes the graphic type and position information;

[0071] Step S605. Store the position information file, link information file, and graphic information file corresponding to each segment serial number.

[0072] For example, different segments can be numbered as segment sequence numbers. After binary encoding the regional information within a segment in sequence, it is stored in a location information file with the suffix ".posf", and the file name is the segment sequence number. For example, for segment 2, the location information file is 2.posf; after binary encoding the unit sequence numbers within the region of this segment in sequence, it is stored in a link information file with the suffix ".athf", and the file name is the segment sequence number. For example, the link information file corresponding to segment 2 is 2.Athf; after binary encoding the unit information and basic graphic information within this segment, it is stored in a graphic information file with the suffix ".ptnf", and the file name is the segment sequence number. For example, the graphic information file corresponding to segment 2 is 2.Ptnf. Thus, a graphic segment will be stored as three types of files: a location file, a link file, and a graphic file. These files are stored in the same directory, as Figure 6 shown.

[0073] When storing the information of each storage unit, it is necessary to store segment region information, location information, and basic graphic information. The segment region information includes information such as the segment sequence number, and the basic graphic information includes information such as the type code of the basic graphic. The location information includes coordinate position and location length, etc. The coordinate position can be the point position at the lower left corner and the X and Y direction coordinate information, etc., as Figure 7 shown. For the location information of a graphic, if the traditional 8-byte information is used to store the location information, 16 bytes are required to store the X and Y direction coordinate information, and the required storage bytes are relatively large, which will increase the data storage volume. In this embodiment, when storing the location information, a compressed signed integer data format is further adopted to store the coordinate position, and a compressed unsigned integer data format is adopted to store the location length. The compressed unsigned integer data format includes a control bit and a data bit, and the compressed signed integer data format includes a control bit, a data bit, and a sign bit. The control bit is used to indicate whether there is still data following, and can minimize the storage volume of information while meeting the data accuracy.

[0074] Specifically, in this embodiment, the compressed unsigned integer data uses multi-byte data, that is, N bytes of data, N >= 1, specifically including 8 bytes. The sign bit and the control bit are each one byte, and the remaining 6 bytes are data bits; only 7 bits in 8 bits represent the actual data, and the lowest bit of each byte indicates whether there is still data following, which is called the control bit. As Figure 8As shown, where the C code control bit, S represents the sign bit. Using 0 indicates that it is the last byte. The sign bit is placed at the highest bit (bit) of the lowest byte (the byte that appears first in the file), and 0 is used to represent positive and 1 to represent negative. The lowest byte is placed at the front of the file, and only 6 bits of the first byte can represent the actual number. Using the above compressed unsigned integer data format to store the position length can reduce the storage space and effectively compress the information. For example, for ordinary 4-byte signed integer data, only 1 byte of data space is required at the lowest after storing using the above method.

[0075] Specifically, in this embodiment, the compressed unsigned integer data uses multi-byte data, that is, N bytes, N >= 1, including 8 bytes. The control bit is 1 byte, and the remaining 7 bytes are control bits. Only 7 bits out of 8 bits represent the actual data. The lowest bit of each byte is the control bit to indicate whether there is still data behind. Using 0 indicates that it is the last byte, and the lowest byte is placed at the front of the file, as Figure 9 shown, where the C code control bit.

[0076] In this embodiment, by using the above compressed signed integer data storage format, only 2 bytes are required at the lowest to store the X and Y direction coordinate information. At the same time, only 2 bytes are required at the lowest to store the compressed signed integer storage length information. Compared with using the traditional method to store the graphic length information which requires 16 bytes, it can greatly reduce the storage space of information and achieve further compression of information.

[0077] Furthermore, when storing the information of each storage unit, if there are multiple identical basic graphics in the storage unit, one of the basic graphics is selected as the target graphic for storage, and the spacing information between the remaining identical basic graphics and the target graphic is stored. That is, for multiple identical basic graphics, since the basic information is the same, only the information of one target basic graphic can be stored, and the remaining basics only store the spacing between them and the target basic graphic. For example, when storing each identical basic graphic by using the single identical basic graphic information plus the starting position plus the interval information, the compression processing of the identical basic graphics can be realized, and a large amount of repeated information storage can be avoided, further reducing the amount of stored data.

[0078] Take Figure 10 as an example. For the information of multiple identical basic primitives (rectangles), when storing, it is stored as: basic information + X direction interval + Y direction interval + X direction quantity + Y direction quantity, instead of storing each unit information. Among them, the direction interval and quantity will use unsigned integer data for information compression.

[0079] Further, when storing information in each storage unit, if there are multiple identical storage units, one of the storage units is selected as the target storage unit, and the segment area information, position information, and basic graphic information of the target storage unit are encoded and stored. The remaining identical storage units store the spacing information between them and the target storage unit. That is, for multiple identical storage units, since the information of each storage unit is the same, only the information of one target storage unit needs to be stored, and the remaining units only store the spacing between them and the target storage unit. For example, when storing each identical storage unit by using single identical unit information plus starting position plus interval information, the compression processing of identical storage units can be realized, which can further avoid the storage of a large amount of duplicate information and greatly reduce the amount of stored data.

[0080] Take Figure 11 as an example. Each dashed box corresponds to a storage unit. For the information of multiple identical storage units, during storage, it will adopt: unit graphic information + X-direction interval + Y-direction interval + X-direction quantity + Y-direction quantity for storage, rather than storing the information of each unit. The direction interval and quantity will use unsigned integer data for information compression.

[0081] In summary, in this embodiment, by adopting multi-file storage and the division of segments, regions, units, and basic graphics, the lithography graphic data of the electron beam lithography equipment can be effectively compressed, and at the same time, it can adapt to the lithography sequence of the electron beam lithography equipment, enabling the rapid retrieval of graphic data and the reading of regional graphic data; further, when storing graphic data, compressed integer data is used for data storage, and the compression processing of identical storage units or identical basic graphics can greatly compress the storage of graphic data, which can well meet the current requirements of the electron beam lithography equipment for the rapid retrieval of graphic data and small data storage.

[0082] This embodiment further provides a computer device, including a processor and a memory. The memory is used to store a computer program, and the processor is used to execute the computer program to execute the method as described above.

[0083] It can be understood that the above method of this embodiment can be executed by a single device, such as a computer or a server, etc., or can also be applied to a distributed scenario where multiple devices cooperate with each other to complete. In the case of a distributed scenario, one of the multiple devices can only execute one or more steps of the above method of this embodiment, and the multiple devices interact with each other to complete the above method. The processor can be implemented in the form of a general-purpose CPU, a microprocessor, an application-specific integrated circuit, or one or more integrated circuits, etc., and is used to execute relevant programs to implement the above method of this embodiment. The memory can be implemented in the form of a read-only memory ROM, a random access memory RAM, a static storage device, and a dynamic storage device, etc. The memory can store an operating system and other application programs. When implementing the above method of this embodiment through software or firmware, the relevant program codes are stored in the memory and are called and executed by the processor.

[0084] This embodiment further provides a computer-readable storage medium storing a computer program, and when the computer program is executed by a processor, the above method is implemented.

[0085] Those skilled in the art should understand that the above embodiments of the present application can be provided as a method, a system, or a computer program product. Therefore, the present application can adopt the form of a complete hardware embodiment, a complete software embodiment, or an embodiment combining software and hardware aspects. Moreover, the present application can adopt the form of a computer program product implemented on one or more computer-readable storage media (including but not limited to disk memories, CD-ROMs, optical memories, etc.) containing computer-usable program codes. The present application is described with reference to the flowcharts and / or block diagrams of the method, device (system), and computer program product according to the embodiments of the present application. It should be understood that each flow and / or block in the flowchart and / or block diagram, as well as the combination of flows and / or blocks in the flowchart and / or block diagram, can be implemented by computer program instructions. These computer program instructions can be provided to the processor of a general-purpose computer, a special-purpose computer, an embedded processor, or other programmable data processing devices to generate a machine, so that the instructions executed by the processor of the computer or other programmable data processing devices generate a device for implementing the functions specified in Figure 1 one flow or multiple flows and / or blocks Figure 1 one block or multiple blocks. These computer program instructions can also be stored in a computer-readable memory capable of guiding a computer or other programmable data processing devices to work in a specific manner, so that the instructions stored in the computer-readable memory generate a manufactured product including an instruction device, and the instruction device implements the functions in Figure 1 one flow or multiple flows and / or blocks Figure 1The functions specified in one or more boxes. These computer program instructions can also be loaded onto a computer or other programmable data processing device, so that a series of operation steps are executed on the computer or other programmable device to generate a computer-implemented process. Thus, the instructions executed on the computer or other programmable device provide steps for implementing the functions specified in one or more processes and / or boxes Figure 1 One process or more processes and / or boxes Figure 1 The steps of the functions specified in one or more boxes.

[0086] The above are only the preferred embodiments of the present invention, and do not impose any form of limitation on the present invention. Although the present invention has been disclosed above with the preferred embodiments, it is not intended to limit the present invention. Therefore, any simple modifications, equivalent changes and modifications made to the above embodiments according to the technical essence of the present invention without departing from the technical solution of the present invention shall fall within the scope of the protection of the technical solution of the present invention.

Claims

1. A method for storing lithography pattern data of an electron beam lithography device, characterized in that the steps include: Obtaining the design layout of the target electron beam lithography equipment; Dividing all graphics in the design layout into basic graphics of specified types to obtain a graphic distribution; Dividing the design layout into a plurality of segment areas according to the photolithography sequence and the pattern distribution; Dividing each of the segment regions into sub-regions, each of the sub-regions corresponds to a field region of electron beam lithography; According to the distribution of the graphics in each of the sub-areas, the graphics in each sub-area are divided into more than one storage unit; The segment area information, position information, and basic graphic information of each storage unit are obtained for encoding and storage.

2. The method for storing lithography pattern data of an electron beam lithography device according to claim 1, characterized in that: The basic figures include squares, rectangles, right triangles and right trapezoids. If it is a non-right trapezoid, it is divided into triangles and right trapezoids. If it is a quadrilateral, a large rectangle is divided from the center and the remaining area is divided into multiple right triangles.

3. The method for storing lithography pattern data of electron beam lithography equipment according to claim 1, characterized in that: The step of dividing the design layout into a plurality of segment areas according to the photolithography sequence and the pattern distribution comprises: Divide the design layout into an area according to a preset height starting from the starting position of the photolithography; The divided current segment area and the graphics intersecting with the current segment area are merged, and the circumscribed rectangular area of ​​the graphics in the merged segment area is taken to determine the final segment area size of the current segment area; According to the order of photolithography, the next segment area with a preset height is taken from the design layout, and the graphic merging and the final segment area size of the current segment area are determined again until all segment area divisions of the design layout are completed.

4. The method for storing lithography pattern data of an electron beam lithography device according to claim 1, characterized in that: Dividing the graphics in each sub-region into more than one storage unit according to the distribution of graphics in each sub-region includes: dividing more than two basic graphics connected to each other or more than two basic graphics having an intersection relationship in each sub-region into the same storage unit.

5. The method for storing lithography pattern data of electron beam lithography equipment according to claim 1, characterized in that: The obtaining of the position information, segment area information, and type information of the basic graphics of each storage unit for encoding and storing includes: Assign a corresponding number to each segment area to form a segment sequence number; Encode the information of each sub-region in each segment region in sequence to form a position information file; Encode the information of each storage unit in each sub-area in sequence to form a link information file; Encoding the storage unit information and basic graphic information in each segment area to form a graphic information file, wherein the basic graphic information includes graphic type and position information; The position information file, the link information file, and the graphic information file are stored corresponding to each segment number.

6. The method for storing lithography pattern data of an electron beam lithography device according to any one of claims 1 to 5, characterized in that: The position information includes a coordinate position and a position length. The coordinate position is stored in a compressed signed integer data format, and the position length is stored in a compressed unsigned integer data format. The compressed unsigned integer data format includes a control bit and a data bit. The compressed signed integer data format includes a control bit, a data bit and a sign bit. The control bit is used to indicate whether there is subsequent data.

7. The method for storing lithography pattern data of electron beam lithography equipment according to claim 6, characterized in that: The compressed unsigned integer data format includes 8 bytes, the sign bit and the control bit are each one byte, and the remaining 6 bytes are data bits; the compressed unsigned integer data includes 8 bytes, the control bit is one byte, and the remaining 7 bytes are control bits.

8. The method for storing lithography pattern data of an electron beam lithography device according to any one of claims 1 to 5, characterized in that: In the process of obtaining the segment area information, position information, and basic graphic information of each storage unit for encoding and storing, if there are multiple identical basic graphics in the storage unit, one of the basic graphics is selected as the target graphic for storage, and the spacing information between the remaining identical basic graphics and the target graphic is stored; If there are multiple identical storage units, one of them is selected as the target storage unit, and the segment area information, position information, and basic graphic information of the target storage unit are encoded and stored, and the remaining identical storage units store the spacing information between the target storage unit.

9. A computer device comprising a processor and a memory, wherein the memory is used to store a computer program, wherein: The processor is configured to execute the computer program to perform the method according to any one of claims 1 to 8.

10. A computer-readable storage medium storing a computer program, characterized in that: When the computer program is executed by a processor, the method according to any one of claims 1 to 8 is implemented.

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