Electrochemical polishing device

Abstract

The invention provides an electrochemical polishing device which comprises an anode part, cathode parts and a seat body, the anode part is electrically connected with a positive electrode of a power supply, the anode part is used for being connected with a polished workpiece, the cathode parts are electrically connected with a negative electrode of the power supply and are configured to be annular, and the cathode parts are arranged on the periphery of the polished workpiece at intervals in a winding mode. The anode piece and the cathode piece are coaxially arranged and connected to the same side of the base body. The anode piece comprises at least two tangent circle structures with different sizes, and the two tangent circle structures with different sizes are selectively connected with the polished workpiece through at least one tangent circle structure during polishing, so that the anode piece can be connected with tubular polished workpieces with different sizes; the electrochemical polishing device can adapt to tubular polished workpieces of different sizes, and has high adaptability.

Description

Technical Field

[0001] This application relates to the technical field of polishing, and particularly to an electrochemical polishing device. Background Art

[0002] Electrochemical polishing uses the workpiece to be polished as the anode and an insoluble metal as the cathode (such as metals like stainless steel that do not directly react with the electrochemical polishing solution). The two electrodes are simultaneously immersed in the electrolytic cell, and a direct current is passed to produce selective anodic dissolution, thereby increasing the surface brightness of the workpiece and achieving a mirror effect.

[0003] In aerospace, medical treatment, and civilian equipment, there are a large number of parts with tubular structures, and the surface treatment requirements for these tubular structures are relatively high. During the process of electrochemical polishing, process parameters such as current density, reaction temperature, electrode distance, and polishing time will all affect the polishing effect. In the related art, when the electrochemical polishing device polishes a device, the distance between the anode and the cathode needs to be precisely controlled and preferably kept consistent to prevent uneven current distribution on the workpiece to be polished, resulting in different thinning degrees at different parts and reducing the impact on the surface effect. Therefore, currently, different anode auxiliary positioning devices are often used for workpieces with high surface requirements, and the adaptability is poor. Summary of the Invention

[0004] In view of the above problems, this application provides an electrochemical polishing device that can adapt to tubular workpieces to be polished with different sizes and precisely control the distance between the anode and the cathode.

[0005] In a first aspect, this application provides an electrochemical polishing device, which includes an anode member, a cathode member, and a seat body. The anode member is electrically connected to the positive electrode of the power supply. The anode member has an axis. Along the axis, the anode member includes at least two cutting circle structures with different sizes. The at least two cutting circle structures are coaxially arranged with the anode member. The cutting circle structure is used to insert into the workpiece to be polished, and at least one cutting circle structure is connected to the workpiece to be polished during polishing. The cathode member is electrically connected to the negative electrode of the power supply. The cathode member has an axis. The cathode member is arranged around the outer circumference of the workpiece to be polished. The anode member and the cathode member are coaxially arranged and connected to the same side of the seat body.

[0006] In the above structure, since the cathode member is arranged around the outer circumference of the workpiece to be polished connected to the anode member, the difference in the distance between each part of the workpiece to be polished and the cathode member is small, making the current distribution on the workpiece to be polished relatively uniform, which is beneficial to improving the uniformity of polishing the workpiece to be polished.

[0007] According to the electrochemical polishing device provided by some embodiments of this application, the seat body is provided with an annular groove, the notch of the annular groove faces the side where the anode member is located relative to the seat body, and at least part of the cathode member is inserted into the annular groove.

[0008] According to the electrochemical polishing device provided by some embodiments of the present application, a plurality of annular grooves are provided, and the plurality of annular grooves are coaxial with and spaced from the anode member.

[0009] According to the electrochemical polishing device provided by some embodiments of the present application, the anode member includes an elastic structure, and the elastic structure can elastically deform to form at least two cutting circle structures with different sizes, and the elastic structure is connected to the workpiece to be polished under the action of elastic force.

[0010] According to the electrochemical polishing device provided by some embodiments of the present application, the elastic structure is coaxially arranged with the cathode member, and the elastic structure is configured to be able to deform radially along the anode member.

[0011] According to the electrochemical polishing device provided by some embodiments of the present application, the elastic deformation amount of the elastic structure in the radial direction of the anode member is A, and 30% ≤ A ≤ 80%.

[0012] According to the electrochemical polishing device provided by some embodiments of the present application, the elastic structure includes a plurality of bow-shaped strips, the bow-shaped strips arch along the radial direction of the anode member, and the plurality of bow-shaped strips are spaced along the circumferential direction of the elastic structure.

[0013] According to the electrochemical polishing device provided by some embodiments of the present application, the electrochemical polishing device further includes a stirrer and a driver, the stirrer is rotatably connected to the side of the seat body where the cathode member is connected, and the driver can drive the stirrer to rotate.

[0014] According to the electrochemical polishing device provided by some embodiments of the present application, the stirrer is a magnetic stirrer, and the driver can drive the stirrer to rotate through a magnetic field.

[0015] According to the electrochemical polishing device provided by some embodiments of the present application, the seat body is provided with a communicating annular groove and a receiving cavity, the notch of the annular groove faces the side where the anode member is located relative to the seat body, and the stirrer is located in the receiving cavity.

[0016] According to the electrochemical polishing device provided by some embodiments of the present application, the electrochemical polishing device further includes a container, the container forms a cavity, and the cavity is used to accommodate the electrolyte, the workpiece to be polished, the anode member, the cathode member and the seat body.

[0017] According to the electrochemical polishing device provided by some embodiments of the present application, the electrochemical polishing device further includes a temperature control mechanism, and the temperature control mechanism is used to maintain the temperature of the electrolyte within a preset range.

[0018] The technical solutions provided by the embodiments of the present disclosure at least bring the following beneficial effects:

[0019] The present application provides an electrochemical polishing device, which includes an anode member, a cathode member and a seat body. The anode member is electrically connected to the positive electrode of a power source. The anode member has an axis. Along the axis, the anode member includes at least two tangent circle structures of different sizes. The at least two tangent circle structures are coaxially arranged with the anode member. The tangent circle structures are used to be inserted into the workpiece to be polished, and at least one tangent circle structure is connected to the workpiece to be polished during polishing. The cathode member is electrically connected to the negative electrode of the power source and has an axis. The cathode member is disposed around the outer periphery of the workpiece to be polished. The anode member and the cathode member are coaxially arranged and connected to the same side of the seat body. Since the anode member includes at least two tangent circle structures of different sizes, the two tangent circle structures of different sizes can be selectively connected to the workpiece to be polished through at least one tangent circle structure during polishing, so that the anode member can be connected to tubular workpieces to be polished of different sizes, enabling the electrochemical polishing device to adapt to tubular workpieces to be polished of different sizes and having strong adaptability. In addition, the cathode member is coaxially arranged with the anode member and is spaced around the outer periphery of the workpiece to be polished connected to the anode member, so that the difference in the distance between each part of the workpiece to be polished and the cathode member is small, making the current distribution more uniform on each part of the workpiece to be polished, which is beneficial to improving the polishing uniformity of the workpiece to be polished. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] By reading the following detailed description of the preferred embodiments, various other advantages and benefits will become clear to those of ordinary skill in the art. The drawings are only for the purpose of showing the preferred embodiments and are not considered to be a limitation of the present application. Moreover, throughout the drawings, the same reference numerals are used to represent the same components.

[0021] Figure 1 is a partial structural schematic diagram of the electrochemical polishing device provided by some embodiments of the present application;

[0022] Figure 2 is a partial structural schematic diagram of the electrochemical polishing device provided by other embodiments of the present application;

[0023] Figure 3 is a partial structural schematic diagram of the electrochemical polishing device provided by still other embodiments of the present application;

[0024] Figure 4 is a cross-sectional view of a part of the structure of the electrochemical polishing device provided by some embodiments of the present application;

[0025] Figure 5 is a cross-sectional view of a part of the structure of the electrochemical polishing device provided by other embodiments of the present application;

[0026] Figure 6 is a structural schematic diagram of the electrochemical polishing device provided by some embodiments of the present application.

[0027] In the drawings:

[0028] 1. Anode member; 11. Main body portion; 12. Support portion; 121. Elastic structure; 122. Abuttment layer; 123. Bow-shaped strip; 13. Tangent circle structure; 2. Cathode member; 3. Base body; 300. Ring groove; 400. Accommodation cavity; 31. Bottom plate; 32. Protruding component; 321. Connecting member; 322. Baffle; 3221. Notch; 323. Ring body; 4. Container; 5. Stirring bar; 6. Temperature control mechanism; 61. Controller; 62. Temperature control tank. Detailed implementation manner

[0029] Hereinafter, embodiments of the technical solutions of the present application will be described in detail with reference to the accompanying drawings. The following embodiments are only used to more clearly illustrate the technical solutions of the present application, so they are only examples and cannot be used to limit the protection scope of the present application.

[0030] It should be noted that unless otherwise specified, the technical terms or scientific terms used in the embodiments of the present application should be the ordinary meanings understood by those skilled in the art to which the embodiments of the present application belong.

[0031] In the description of the embodiments of the present application, the technical terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings. It is only for the convenience of describing the embodiments of the present application and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation to the embodiments of the present application.

[0032] In addition, the technical terms "first", "second", etc. are only used for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. In the description of the embodiments of the present application, the meaning of "plurality" is more than two, unless otherwise specifically defined.

[0033] In the description of the embodiments of the present application, unless otherwise clearly specified and limited, the technical terms "installation", "connection", "connection", "fixation", etc. should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or integrated; it can also be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the communication inside two elements or the interaction relationship between two elements. For those of ordinary skill in the art, the specific meanings of the above terms in the embodiments of the present application can be understood according to specific circumstances.

[0034] In the description of the embodiments of the present application, unless otherwise clearly specified and limited, the first feature being "on" or "under" the second feature may be that the first and second features are in direct contact, or the first and second features are indirectly in contact through an intermediate medium. Moreover, the first feature being "above", "over" and "on top of" the second feature may be that the first feature is directly above or obliquely above the second feature, or merely indicates that the first feature has a higher horizontal height than the second feature. The first feature being "under", "below" and "beneath" the second feature may be that the first feature is directly below or obliquely below the second feature, or merely indicates that the first feature has a lower horizontal height than the second feature.

[0035] Polishing is a kind of ultra-precision machining, which refers to a machining method that can reduce the surface roughness of a workpiece under the action of mechanical, chemical or electrochemical means to obtain a bright and flat surface. Among them, mechanical polishing is a machining method that grinds the surface of the workpiece flat by extruding abrasives. Chemical polishing is a machining method that regularly dissolves the surface of the workpiece to make the surface bright and smooth. Electrochemical polishing is a machining method in which the workpiece to be polished is used as the anode, an insoluble metal (such as stainless steel, etc., a metal that does not directly react with the electrochemical electrolyte) is used as the cathode, and the two electrodes are immersed in the electrolyte at the same time, and a direct current is passed to generate selective anodic dissolution to increase the brightness of the workpiece surface.

[0036] In electrochemical polishing, when an electric current is applied, a viscous mucous membrane with a high resistivity will be generated on the surface of the workpiece to be polished, and its thickness is uneven on the surface of the workpiece to be polished. The viscous mucous membrane is thinner at the microscopically protruding parts of the surface, the current density is larger, and the metal dissolution is faster; it is thicker at the microscopically concave parts of the surface, the current density is smaller, and the metal dissolution is slower, so that the size of the microscopically protruding parts decreases faster, and the size of the microscopically concave parts decreases slower, reducing the surface roughness of the workpiece to be polished. Since the roughness of the polished surface of electrochemical polishing is small, it is more suitable for precision instruments such as medical devices.

[0037] In electrochemical polishing, the current density has a greater impact on the polishing effect. In the existing electrochemical polishing devices, since it is difficult to control the distance between each part of the workpiece to be polished and the cathode, and the gap is large, the current distribution on the workpiece to be polished is uneven, and the thinning degree of different parts makes the uniformity of the polished surface of the workpiece to be polished poor. For medical devices, which are precision instruments, people have higher requirements for their size and surface quality. Therefore, there is an urgent need to develop an electrochemical polishing device that can polish the workpiece to be polished evenly.

[0038] In order to be able to polish the workpiece to be polished evenly, the embodiments of the present application design an electrochemical polishing device, such as Figure 1 、 Figure 2 and Figure 3As shown in the figure, the electrochemical polishing device includes an anode member 1, a cathode member 2 and a base body 3. The anode member 1 is electrically connected to the positive electrode of the power supply. The anode member 1 has an axis. Along the axis, the anode member 1 includes at least two cutting circle structures 13 of different sizes. The at least two cutting circle structures 13 are coaxially arranged with the anode member 1. The cutting circle structure 13 is used to insert into the workpiece to be polished, and at least one cutting circle structure 13 is connected to the workpiece to be polished during polishing. The cathode member 2 is electrically connected to the negative electrode of the power supply and has an axis. The cathode member 2 is disposed around the outer periphery of the workpiece to be polished. The anode member 1 and the cathode member 2 are coaxially arranged and connected to the same side of the base body 3. In this electrochemical polishing device, the anode member 1 includes at least two cutting circle structures 13 of different sizes. The two cutting circle structures 13 of different sizes can be selectively connected to the workpiece to be polished through at least one cutting circle structure 13 during polishing, so that the anode member 1 can be connected to tubular workpieces to be polished of different sizes, enabling this electrochemical polishing device to adapt to tubular workpieces to be polished of different sizes and having strong adaptability. Additionally, the cathode member 2 is coaxially arranged with the anode member 1 and is spaced around and disposed around the outer periphery of the workpiece to be polished connected to the anode member 1, such that the difference in the distance between each part of the workpiece to be polished and the cathode member 2 is small, making the distribution of current on the workpiece to be polished relatively uniform and facilitating the improvement of the uniformity of polishing the workpiece to be polished.

[0039] The technical solution of the electrochemical polishing device provided by the present application will be further described below in conjunction with the accompanying drawings and through specific embodiments.

[0040] The present application provides an electrochemical polishing device, which includes an anode member 1, a cathode member 2 and a base body 3. The anode member 1 is electrically connected to the positive electrode of the power supply. The anode member 1 has an axis. Along the axis, the anode member 1 includes at least two cutting circle structures 13 of different sizes. The at least two cutting circle structures 13 are coaxially arranged with the anode member 1. The cutting circle structure 13 is used to insert into the workpiece to be polished, and at least one cutting circle structure 13 is connected to the workpiece to be polished during polishing. The cathode member 2 is electrically connected to the negative electrode of the power supply. The cathode member 2 has an axis. The cathode member 2 is disposed around the outer periphery of the workpiece to be polished. The anode member 1 and the cathode member 2 are coaxially arranged and connected to the same side of the base body 3.

[0041] The anode member 1 can be the component in this electrochemical polishing device that is electrically connected to the positive electrode of the power supply. It is used to contact and connect with the workpiece to be polished. The anode member 1 can not only realize the electrical connection between the workpiece to be polished and the positive electrode of the power supply, and can act as the anode in the electrochemical reaction together with the workpiece to be polished, but also play a role in supporting and fixing the workpiece to be polished, and can affect the distance between the workpiece to be polished and the cathode member, thereby affecting the uniformity of the current distribution on the workpiece to be polished.

[0042] By setting the anode member 1 with an axis, the anode member 1 can have a certain length along its own axis direction, so that after the anode member 1 is inserted into the workpiece to be polished, the inter-pole distance between the workpiece to be polished and the cathode member 2 can be kept basically the same. The tangent circle structure 13 can be a structure whose cross-sectional shape includes at least three points located on the same circumference. The tangent circle structure 13 can be a structural part of the anode member 1 with a cylindrical outer peripheral surface, which is used to be inserted into the workpiece to be polished. By making the anode member 1 include at least two tangent circle structures 13 with different sizes, the two tangent circle structures 13 with different sizes can be selectively connected to the workpiece to be polished through at least one tangent circle structure 13 during polishing, so that the anode member 1 can be connected to the tubular workpieces to be polished with different sizes, enabling the electrochemical polishing device to adapt to tubular workpieces with different sizes, which is beneficial to improving the adaptability of the electrochemical polishing device. Exemplarily, the tangent circle structures 13 are evenly distributed along the axis direction of the anode member 1, so that after the anode member 1 is inserted into the workpiece to be polished, the workpiece to be polished can be evenly stressed, maintaining the stability of the electrochemical reaction process.

[0043] Exemplarily, the anode member 1 can be made of a metal or metal alloy with corrosion resistance. For example, the anode member 1 can be made of lead, lead alloy, titanium, steel or stainless steel, which is beneficial to extending the service life of the anode member 1.

[0044] The cathode member 2 can be a component in the electrochemical polishing device that is electrically connected to the negative pole of the power supply, which serves as the cathode in the electrochemical reaction and can form a complete circuit with the anode, electrolyte and battery.

[0045] Exemplarily, the cathode member 2 can be made of an active metal that is easy to release electrons. For example, the cathode member 2 can be made of copper, silver, gold, pure iron, zinc or aluminum. The cathode member 2 can also be made of a material converted from a hydride or carbonate. For example, the cathode member 2 can be made of perovskite or sodium hydride.

[0046] The power supply can refer to a DC power supply, and the positive and negative poles of the power supply are electrically connected to the anode member 1 and the cathode member 2 respectively.

[0047] By arranging the cathode member 2 around the outer periphery of the workpiece to be polished, the cathode member 2 is spaced from the workpiece to be polished, so that the cathode member 2 and the workpiece to be polished can be electrically connected through the electrolyte, and the electrical energy of the power supply can be converted into the chemical energy of the electrolyte.

[0048] The seat body 3 can be a component for supporting and fixing the anode member 1 and the cathode member 2, which is used to maintain the stability of the positions of the anode member 1 and the cathode member 2 in the electrochemical reaction, and is beneficial to making the current flowing through the workpiece to be polished stable.

[0049] By coaxially arranging the anode member 1 and the cathode member 2, the distances between various parts of the workpiece to be polished and the cathode member 2 are made substantially the same, so that the current is more evenly distributed over all parts of the workpiece to be polished. By connecting the anode member 1 and the cathode member 2 to the same side of the base body 3, it is also possible to achieve the electrical connection between the anode member 1 and the cathode member 2 by arranging the electrolyte on one side of the base body 3, which is beneficial to the filling or arrangement of the electrolyte.

[0050] In the above structure, since the anode member 1 includes at least two tangent circle structures 13 of different sizes, the two tangent circle structures 13 of different sizes can be selectively connected to the workpiece to be polished during polishing through at least one tangent circle structure 13, so that the anode member 1 can be connected to tubular workpieces to be polished of different sizes, enabling the electrochemical polishing device to adapt to tubular workpieces to be polished of different sizes and having strong adaptability; in addition, the cathode member 2 is coaxially arranged with the anode member 1 and is spaced around the outer periphery of the workpiece to be polished connected to the anode member 1, so that the difference in the distances between various parts of the workpiece to be polished and the cathode member 2 is small, making the current more evenly distributed over all parts of the workpiece to be polished, which is beneficial to improving the uniformity of polishing the workpiece to be polished.

[0051] Exemplarily, the at least two tangent circle structures 13 included in the anode member 1 can be such that the tangent circle structures 13 in the anode member 1 obtain at least two different sizes through elastic deformation or the like, or the tangent circle structures 13 in the anode member 1 themselves have at least two different sizes in the natural state.

[0052] In some embodiments, the cathode member 2 is configured in a spiral shape or a circular ring shape, which not only enables the cathode member 2 to be wound around the outer periphery of the workpiece to be polished and the anode member 1, but also enables the cathode member 2 to extend along the axial direction of the workpiece to be polished, facilitating the co-directional extension of the cathode member 2 and the workpiece to be polished and facilitating the control of the distance between the workpiece to be polished and the cathode member 2.

[0053] In some embodiments, the base body 3 is provided with an annular groove 300, the notch of the annular groove 300 faces the side where the anode member 1 is located relative to the base body 3, and at least part of the cathode member 2 is inserted into the annular groove 300.

[0054] The annular groove 300 can be a circular groove-like structure provided on the base for inserting the cathode member 2 so that the cathode member 2 can be connected to the base. The notch of the annular groove 300 facing the side where the anode member 1 is located relative to the base body 3 can be such that the orientation of the notch of the annular groove 300 is set along the direction where the anode member 1 is located relative to the base body 3, so that when at least part of the cathode member 2 is inserted into the annular groove 300 from the notch, the cathode member 2 can be on the same side of the base body 3 as the anode member 1.

[0055] Exemplarily, the annular groove 300 can be set as an annular groove, and the annular groove can cooperate with the cathode member 2 in a spiral or annular shape, facilitating the insertion of the cathode member 2 into the annular groove 300.

[0056] In some embodiments, a plurality of annular grooves 300 are provided, and the plurality of annular grooves 300 are coaxial with and spaced from the anode member 1.

[0057] By providing a plurality of annular grooves 300 on the base body 3 and making the plurality of annular grooves 300 coaxial with and spaced from each other, the plurality of annular grooves 300 are all coaxial with the anode member 1 and have different radial dimensions, enabling the cathode member 2 to be inserted into the annular groove 300 with a matching dimension among the plurality of annular grooves 300, so that the cathode members 2 with different radial dimensions can all be connected to the base body 3. This not only enables the electrochemical polishing device to adapt to workpieces to be polished with different dimensions by replacing the cathode member 2, which is beneficial to improving the adaptability of the electrochemical polishing device, but also enables the electrochemical polishing device to adjust the distance from the workpiece to be polished by replacing the cathode member 2.

[0058] In some embodiments, the anode member includes an elastic structure, and the elastic structure can undergo elastic deformation to form at least two tangent circle structures 13 with different dimensions. The elastic structure is connected to the workpiece to be polished under the action of elastic force.

[0059] The elastic structure can refer to a structure that can undergo elastic deformation. By making the anode member include an elastic structure, the anode member can undergo elastic deformation through the elastic structure to form at least two tangent circle structures 13 with different dimensions, enabling the anode member to be inserted into the workpiece to be polished through at least one tangent circle structure 13 matching the tubular workpiece to be polished and using the elastic restoring force to abut and connect to the inner wall surface of the tubular workpiece to be polished, so that the electrochemical polishing device can adapt to tubular workpieces to be polished with different dimensions, which is beneficial to improving the adaptability of the electrochemical polishing device. In some embodiments, the elastic structure is coaxial with the cathode member, and the elastic structure is configured to be able to deform in the radial direction of the anode member.

[0060] By coaxial setting the elastic structure with the cathode member and configuring the elastic structure to be able to deform in the radial direction of the anode member, the elastic structure can adapt to tubular workpieces to be polished with different radial dimensions through its own radial deformation.

[0061] In some embodiments, the elastic deformation amount of the elastic structure in the radial direction of the anode member is A, and 30% ≤ A ≤ 80%.

[0062] The elastic deformation amount can refer to the ratio of the deformation amount of the length in a certain direction to the original length. By setting the elastic deformation amount A of the elastic structure in the radial direction of the anode member to 30% ≤ A ≤ 80%, the elastic structure has good elastic deformation ability in the radial direction of the anode member, enabling the elastic structure to adapt to more workpieces to be polished through its own deformation in the radial direction, which is beneficial to improving the adaptability of the electrochemical polishing device.

[0063] In some embodiments, the anode member 1 includes a main body portion 11 and a support portion 12. The support portion 12 is connected to the outer periphery of the main body portion 11. The end portion of the main body portion 11 in the axial direction of the cathode member 2 is connected to the seat body 3, and the support portion 12 is used to connect with the workpiece to be polished.

[0064] The main body portion 11 and the support portion 12 can be different parts of the anode member 1 and are connected to each other. Among them, the main body portion 11 is the main body portion of the anode member 1. Its end portion in the axial direction of the cathode member 2 is connected to the seat body 3, and it can transfer the load of the workpiece to be polished borne by the anode member 1 to the seat body 3. In some embodiments, the main body portion 11 can be set as a columnar structure extending along the axial direction of the cathode member 2, which not only facilitates the coaxial setting of the anode member 1 and the cathode member 2 but also enables the main body portion 11 to better transfer the load to the seat body 3.

[0065] The support portion 12 is the part of the anode member 1 used to connect with and support the workpiece to be polished. It is connected to the outer periphery of the main body portion 11, and the workpiece to be polished can be connected to the anode member 1 through the support portion 12, so that the workpiece to be polished can be supported and fixed.

[0066] Exemplarily, a tangent circle structure 13 is arranged on the support portion 12, so that the tangent circle structure 13 can be connected with the workpiece to be polished to realize the support of the workpiece to be polished.

[0067] In some embodiments, as Figure 4 shown, the support portion 12 includes an elastic structure 121. The support portion 12 is inserted into the workpiece to be polished, and the support portion 12 can be connected with the workpiece to be polished under the elastic force of the elastic structure 121.

[0068] Exemplarily, the elastic structure 121 can be a structure in the support portion 12 that can undergo elastic deformation, which can cause the support portion 12 to undergo elastic deformation, facilitating the insertion into the tubular structure of the workpiece to be thrown by undergoing elastic deformation. When the support portion 12 is inserted into the workpiece to be thrown, it can also be that the workpiece to be thrown is provided with a socket hole, and the support portion 12 undergoes elastic deformation and is inserted into the socket hole of the workpiece to be thrown. The support portion 12 abuts against the inner wall of the socket hole under the elastic force of the elastic structure 121, enabling the support portion 12 to be firmly inserted into the socket hole and realizing the connection between the support portion 12 and the workpiece to be thrown. In some embodiments, the elastic structure 121 can also be a structure that can elastically expand and contract in the radial direction of the main body portion 11. When the support portion 12 is externally squeezed, the elastic structure 121 can be compressed in the radial direction of the main body portion 11, causing the size of the support portion 12 in the radial direction of the main body portion 11 to become smaller, enabling the support portion 12 to be inserted into the workpiece to be thrown.

[0069] The elastic structure 121 can be made of an elastic conductive material such as conductive nylon, which not only enables the elastic structure 121 to have sufficient elastic deformation ability, so that when the support portion 12 is externally squeezed, the elastic structure 121 can undergo elastic deformation to deform the support portion 12 for insertion into the workpiece to be thrown, but also enables current to flow smoothly between the anode member 1 and the workpiece to be thrown.

[0070] Exemplarily, the support portion 12 can further include a abutting layer 122, which is wound around the outer surface of the elastic structure 121 and is used to abut against the workpiece to be thrown. The outer surface of the abutting layer 122 is roughened by setting indentations or scratches, so that when the abutting layer 122 abuts against the workpiece to be thrown, relative sliding between the abutting layer 122 and the workpiece to be thrown is not likely to occur, which is beneficial to improving the firmness of the connection between the support portion 12 and the workpiece to be thrown.

[0071] In some embodiments of the present application, as Figure 5 shown, the elastic structure 121 includes a plurality of arcuate strips 123 connected to the outer peripheral surface of the main body portion 11. The arcuate strips 123 arch in the radial direction of the main body portion 11, and the plurality of arcuate strips 123 are spaced apart along the circumferential direction of the main body portion 11.

[0072] The arcuate strip 123 can be an arcuate strip-shaped component. Both ends of the arcuate strip 123 along its own extending direction are connected to the outer peripheral surface of the main body portion 11, causing the arcuate strip 123 to arch radially outward of the main body portion 11, so that the arcuate strip 123 can deform radially inward of the main body portion 11 when subjected to an external force.

[0073] Exemplarily, the arcuate strip 123 can be made of a metal strip capable of elastic deformation, so that the arcuate strip 123 has sufficient elastic deformation ability. When the support portion 12 is externally extruded, the elastic structure 121 can elastically deform to deform the support portion 12 for inserting into the workpiece to be thrown. After the support portion 12 is inserted into the tube body of the workpiece to be thrown, under the action of the elastic restoring force of the arcuate strip 123, the arcuate strip 123 can abut against the inner wall of the tube body, so that the support portion 12 can be firmly inserted into the tube body, realizing the connection between the support portion 12 and the workpiece to be thrown.

[0074] In some embodiments, a plurality of arcuate strips 123 are provided, and the plurality of arcuate strips 123 are equidistantly arranged along the circumferential direction of the main body portion 11, so that the plurality of arcuate strips 123 can stably support the workpiece to be thrown.

[0075] In some embodiments, the elastic structure 121 may further include a mesh bracket, and the mesh bracket protrudes radially outward along the anode member 1. The mesh bracket can be made of a metal strip capable of elastic deformation, so that the mesh bracket has sufficient elastic deformation ability. When the elastic structure 121 is externally extruded, it can elastically deform in the radial direction of the anode member 1 for inserting into the workpiece to be thrown. After the elastic structure 121 is inserted into the tube body of the workpiece to be thrown, under the action of the elastic restoring force of the mesh bracket, the elastic structure 121 can abut against the inner wall of the tube body, so that the elastic structure 121 can be firmly inserted into the tube body, realizing the connection between the anode member 1 and the workpiece to be thrown.

[0076] In some embodiments, the elastic structure 121 may further include a plurality of claw-shaped structures (not shown in the figure), and the plurality of claw-shaped structures are equidistantly arranged around the axis of the anode member 1. The claw-shaped structure is made of a metal capable of elastic deformation, so that the elastic structure 121 has sufficient elastic deformation ability. When externally extruded, it can elastically deform in the radial direction of the anode member 1 for inserting into the workpiece to be thrown. After the elastic structure 121 is inserted into the tube body of the workpiece to be thrown, it abuts against the inner wall of the tube body under the action of the elastic restoring force, realizing the connection between the anode member 1 and the workpiece to be thrown.

[0077] In some embodiments, the electrochemical polishing device further includes a stirrer 5 and a driver (not shown in the figure). The stirrer 5 is rotatably connected to the side of the seat body 3 where the cathode member 2 is connected, and the driver can drive the stirrer 5 to rotate.

[0078] The stirrer 5 can be a device capable of stirring the electrolyte to make the substances in the electrolyte evenly distributed. The driver can be a device capable of driving the stirrer 5 to act so that the stirrer 5 can stir the electrolyte.

[0079] Exemplarily, by rotatably connecting the magnetic stir bar 5 to the side of the base body 3 where the cathode member 2 is connected, and enabling the driver to drive the magnetic stir bar 5 to rotate, the magnetic stir bar 5 can rotate driven by the driver, realizing the stirring of the electrolyte solution.

[0080] In some embodiments, a rotating shaft is provided on the base body 3, and the magnetic stir bar 5 is rotatably connected to the rotating shaft, enabling the magnetic stir bar 5 to rotate smoothly relative to the base body 3, which is beneficial to reducing the resistance suffered by the magnetic stir bar 5 during rotation.

[0081] In some embodiments, the magnetic stir bar 5 is a magnetic stir bar, and the driver can drive the magnetic stir bar 5 to rotate through a magnetic field.

[0082] The magnetic stir bar 5 is provided as a magnetic stir bar, and the driver is configured as a device capable of emitting a continuously changing magnetic field, enabling the driver to drive the magnetic stir bar 5 to rotate through the continuously changing magnetic field, so that the magnetic stir bar 5 can stir the electrolyte solution.

[0083] In some embodiments, the base body 3 forms a receiving cavity 400 communicating with the annular groove 300, and the magnetic stir bar 5 is located in the receiving cavity 400.

[0084] The receiving cavity 400 can be a cavity structure formed in the base body 3 for accommodating the magnetic stir bar 5. By connecting the receiving cavity 400 formed in the base body 3 with the annular groove 300, when the magnetic stir bar 5 rotates to stir the electrolyte solution, the substances in the electrolyte solution can diffuse in the entire electrolyte solution, making the concentration of substances in the entire electrolyte solution relatively uniform.

[0085] In some embodiments, the base body 3 includes a bottom plate 31 and a protruding component 32. The protruding component 32 is connected to the surface of the bottom plate 31. The bottom plate 31 and the protruding component 32 enclose the receiving cavity 400. The annular groove 300 is provided on the protruding component 32, and the anode member 1 is connected to the protruding component 32.

[0086] The bottom plate 31 can be a plate-like component in the base body 3 for carrying other components in the base body 3. The protruding component 32 can be a component mechanism protruding from the side of the bottom plate 31 facing the cathode member 2. The protruding component 32 is connected to the surface of the bottom plate 31 facing the cathode member 2, and the bottom plate 31 and the protruding component 32 enclose the receiving cavity 400 for accommodating the magnetic stir bar 5.

[0087] By forming the annular groove 300 on the protruding component 32, the notch of the annular groove 300 can be arranged facing the side where the cathode member 2 is located. By connecting the anode member 1 to the protruding component 32, both the cathode member 2 and the anode member 1 inserted into the annular groove 300 are located on the same side of the bottom plate 31.

[0088] In some embodiments, the protruding component 32 includes a connecting member 321 and a baffle 322. The baffle 322 is connected to the bottom plate 31 through the connecting member 321, the anode member 1 is connected to the baffle 322, and the baffle 322 and the bottom plate 31 are spaced apart to form a receiving cavity 400.

[0089] The connecting member 321 can be a component in the protruding component 32 for connecting the baffle 322 and the bottom plate 31. It is connected to the side of the bottom plate 31 facing the cathode member 2 and protrudes along the axial direction of the cathode member 2. The baffle 322 can be a plate-like member spaced apart from the bottom plate 31 relatively. It is connected to the connecting member 321, and a receiving cavity 400 is formed among the baffle 322, the connecting member 321, and the bottom plate 31.

[0090] In some embodiments, the protruding component 32 further includes at least two annular bodies 323. The annular bodies 323 are connected to the side of the baffle 322 away from the bottom plate 31, and the at least two annular bodies 323 are coaxially spaced apart to form an annular groove 300. The baffle 322 is provided with a notch 3221 communicating the annular groove 300 and the receiving cavity 400.

[0091] The annular body 323 can be a circular ring structure. The at least two annular bodies 323 are coaxially spaced apart so that an annular groove 300 can be formed between adjacent two annular bodies 323. By connecting the annular body 323 to the side of the baffle 322 away from the bottom plate 31, the annular body 323 and the baffle 322 can enclose an annular groove 300 with the notch facing the cathode member 2. Among them, the baffle 322 forms the bottom wall of the annular groove 300, so that when the cathode member 2 is inserted into the annular groove 300 from the notch, it can be blocked by the baffle 322 and will not extend into the receiving cavity 400.

[0092] The notch 3221 can be a structure formed by removing materials on the baffle 322. By providing the notch 3221 on the baffle 322 enclosing the annular groove 300 and the receiving cavity 400, the notch 3221 can communicate the annular groove 300 and the receiving cavity 400.

[0093] In some embodiments, the connecting member 321 is arranged around the annular body 323, and the connecting member 321 is provided with an annular groove 300.

[0094] By making the connecting member 321 surround the outside of the at least two annular bodies 323, the baffle 322 connected to the connecting member 321 can serve as the bottom wall of the annular groove 300 formed by all the annular bodies 323 to block the cathode member 2 inserted into the annular groove 300.

[0095] By providing the annular groove 300 on the connecting member 321, the annular groove 300 provided on the connecting member 321 can be wound around the outside of the at least two annular bodies 323, so that the annular groove 300 on the connecting member 321 can be connected to a cathode member 2 with a larger diameter, which is beneficial to improving the adaptability of the electrochemical polishing device.

[0096] In some embodiments, such as Figure 6 shown, the electrochemical polishing device further includes a container 4, which forms a cavity for accommodating the electrolyte, the workpiece to be polished, the anode member 1, the cathode member 2, and the base body 3.

[0097] The container 4 can be a device that provides a space for the electrochemical reaction carried out in the electrochemical polishing device. A cavity is formed in the container 4, and the cavity can serve as a space for accommodating the workpiece to be polished, the anode member 1, the cathode member 2, the base body 3, and the electrolyte.

[0098] After the workpiece to be polished, the anode member 1, the cathode member 2, and the base body 3 are placed in the cavity, they can be immersed in the electrolyte injected into the cavity, and the electrolyte can serve as a conductive medium between the workpiece to be polished and the anode member 1 and the cathode member 2.

[0099] Exemplarily, the container 4 can be a beaker, a flask, or other containers 4 that are not easily reactive with the electrolyte. Those skilled in the art can select the type of the container 4 according to the actual situation.

[0100] In some embodiments, the electrochemical polishing device further includes a constant temperature mechanism 6 for maintaining the temperature of the electrolyte within a preset range.

[0101] The constant temperature mechanism 6 can be a mechanism for keeping the temperature of the electrolyte within a preset range. It can keep the electrolyte at a suitable temperature all the time, which is beneficial to the efficient progress of the electrochemical reaction and improves the polishing efficiency of the workpiece to be polished.

[0102] The constant temperature mechanism 6 can include a controller 61 and a temperature control tank 62. The container 4 containing the workpiece to be polished, the anode member 1, the cathode member 2, the base body 3, and the electrolyte is placed in the temperature control tank 62. A heat exchange medium and a heat exchanger (not shown in the figure) are provided in the temperature control tank 62. The heat exchanger is electrically connected to the controller 61. The heat exchanger can heat or cool the heat exchange medium under the control of the controller 61 to make the temperature of the heat exchange medium within a preset range, and further make the temperature of the electrolyte within a preset range. Exemplarily, the heat exchange medium can be water, and the heat exchanger can be an electric heating wire, which can heat the temperature of the water to within a preset range so that the water can keep the temperature of the electrolyte within a preset range.

[0103] Exemplarily, the controller 61 can be a centralized or distributed controller 61. For example, the controller 61 can be a single microcontroller, or can be composed of multiple distributed microcontrollers. A control program can run in the microcontroller to control the heat exchanger to realize its function.

[0104] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present application, rather than to limit them; although the present application has been described in detail with reference to the foregoing embodiments, those of ordinary skill in the art should understand that they can still modify the technical solutions described in the foregoing embodiments, or perform equivalent replacements on some or all of the technical features; and these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the various embodiments of the present application, and they should all be covered within the scope of the claims and the description of the present application. In particular, as long as there is no structural conflict, the technical features mentioned in each embodiment can be combined in any way. The present application is not limited to the specific embodiments disclosed in the text, but includes all technical solutions falling within the scope of the claims.

Claims

1. An electrochemical polishing device, characterized in that, Comprising: An anode member, electrically connected to the positive electrode of a power supply. The anode member has an axis. Along the axis, the anode member includes at least two tangential circle structures of different sizes. At least two of the tangential circle structures are coaxially arranged with the anode member. The tangential circle structures are used to insert into the workpiece to be polished, and at least one of the tangential circle structures is connected to the workpiece to be polished during polishing. A cathode member, electrically connected to the negative electrode of the power supply. The cathode member has an axis. The cathode member is disposed around the outer periphery of the workpiece to be polished. A base body, the anode member and the cathode member are coaxially arranged and connected to the same side of the base body.

2. The electrochemical polishing device according to claim 1, wherein, The base body is provided with an annular groove. The notch of the annular groove faces the side where the anode member is located relative to the base body. At least a part of the cathode member is inserted into the annular groove.

3. The electrochemical polishing device according to claim 2, wherein, There are a plurality of the annular grooves. The plurality of annular grooves are coaxially arranged with the anode member and are spaced apart.

4. The electrochemical polishing device according to claim 1, characterized in that The anode member includes an elastic structure. The elastic structure can elastically deform to form at least two tangential circle structures of different sizes. The elastic structure is connected to the workpiece to be polished under the action of elastic force.

5. The electrochemical polishing device according to claim 4, characterized in that, The elastic structure is coaxially arranged with the cathode member. The elastic structure is configured to be able to deform along the radial direction of the anode member.

6. The electrochemical polishing device according to claim 4, characterized in that, The elastic deformation amount of the elastic structure in the radial direction of the anode member is A, where 30% ≤ A ≤ 80%.

7. The electrochemical polishing device according to claim 4, wherein, The elastic structure includes a plurality of bow-shaped strips. The bow-shaped strips are bowed along the radial direction of the anode member. The plurality of bow-shaped strips are spaced apart along the circumferential direction of the elastic structure.

8. The electrochemical polishing device according to claim 1, characterized in that The electrochemical polishing device further includes a stirrer and a driver. The stirrer is rotatably connected to the side of the base body where the cathode member is connected. The driver can drive the stirrer to rotate.

9. The electrochemical polishing device according to claim 8, characterized in that, The stirrer is a magnetic stirrer. The driver can drive the stirrer to rotate through a magnetic field.

10. The electrochemical polishing device according to claim 8, characterized in that, The base body is provided with a communicating annular groove and a receiving cavity. The notch of the annular groove faces the side where the anode member is located relative to the base body. The stirrer is located in the receiving cavity.

11. The electrochemical polishing device according to any one of claims 1 to 10, characterized in that, The electrochemical polishing device further includes a container. The container forms a cavity for accommodating the electrolyte, the workpiece to be polished, the anode member, the cathode member, and the base body.

12. The electrochemical polishing device according to claim 11, wherein, The electrochemical polishing device further includes a temperature control mechanism for maintaining the temperature of the electrolyte within a preset range.

13. The electrochemical polishing device according to any one of claims 1 to 10, characterized in that, The cathode member is configured to be spiral or annular.

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