Photoresist production method and system for improving photoresist uniformity

Abstract

The present application proposes a photoresist production method and system for improving the uniformity of photoresist, wherein the method includes: obtaining the spin coating speed interval timing information and the temperature and humidity interval timing information of a preset glue liquid formula, combining the spin coating speed interval timing information and the temperature and humidity interval timing information to configure the photoresist production control boundary conditions; statistically calculating the thickness uniformity coefficient and the surface roughness uniformity coefficient; if the thickness uniformity coefficient meets the thickness uniformity threshold, and the surface roughness uniformity coefficient meets the roughness uniformity threshold, initializing the target photoresist production line through the spin coating speed interval timing information and the temperature and humidity interval timing information to perform photoresist preparation. The present application solves the technical problem in the existing photoresist production control that there are micro-disturbances in the equipment control of different photoresist production lines, resulting in deviations in the photoresist thickness uniformity and surface roughness uniformity, and achieves the technical effect of improving the photoresist thickness uniformity and surface roughness uniformity.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor technology, and in particular to a photoresist production method and system for improving photoresist uniformity. Background Art

[0002] In existing photoresist production, much attention is paid to determining photoresist control parameters, such as the spin coating speed, temperature, and humidity settings. However, in actual production environments, different photoresist production lines can experience slight fluctuations in equipment control due to factors such as equipment differences, age, and calibration accuracy. Even with the same control parameter settings, these can lead to deviations in thickness uniformity and surface roughness uniformity in the final photoresist product. Summary of the Invention

[0003] The present invention aims to solve the technical problem that in the existing photoresist production control, there are slight disturbances in the equipment control of different photoresist production lines, which leads to deviations in the uniformity of photoresist thickness and surface roughness. A photoresist production method and system for improving photoresist uniformity are provided to solve the problem.

[0004] The technical solution of the present invention to solve the above technical problems is as follows:

[0005] In a first aspect, the present invention provides a photoresist production method for improving the uniformity of photoresist, comprising: obtaining spin coating speed interval timing information and temperature and humidity interval timing information of a preset glue liquid formula; calling the preset time zone production log of the target photoresist production line, and counting the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold; configuring the photoresist production control boundary conditions according to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, combined with the spin coating speed interval timing information and the temperature and humidity interval timing information; counting the thickness uniformity coefficient and the surface roughness uniformity coefficient of the photoresist production history sample set that meets the photoresist production control boundary conditions and the preset glue liquid formula; if the thickness uniformity coefficient meets the thickness uniformity threshold, and the surface roughness uniformity coefficient meets the roughness uniformity threshold, initializing the target photoresist production line through the spin coating speed interval timing information and the temperature and humidity interval timing information to perform photoresist preparation.

[0006] In a second aspect, the present invention provides a photoresist production system for improving the uniformity of photoresist, comprising: an information acquisition module for obtaining spin coating speed interval timing information and temperature and humidity interval timing information of a preset glue liquid formula; a production log analysis module for retrieving the preset time zone production log of the target photoresist production line, and counting the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold; a boundary condition configuration module for configuring the photoresist production control boundary condition according to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, combined with the spin coating speed interval timing information and the temperature and humidity interval timing information; a sample set statistics module for counting the thickness uniformity coefficient and the surface roughness uniformity coefficient of the photoresist production history sample set that meets the photoresist production control boundary condition and the preset glue liquid formula; a production initialization module for initializing the target photoresist production line to perform photoresist preparation through the spin coating speed interval timing information and the temperature and humidity interval timing information if the thickness uniformity coefficient meets the thickness uniformity threshold and the surface roughness uniformity coefficient meets the roughness uniformity threshold.

[0007] The beneficial effects of the present invention are:

[0008] Obtain the spin coating speed interval timing information and temperature and humidity interval timing information of the preset glue liquid formula as the subsequent control strategy and provide basic parameters for subsequent analysis; call the preset time zone production log of the target photoresist production line, count the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, and reflect the actual fluctuation of equipment control; according to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, combined with the spin coating speed interval timing information and the temperature and humidity interval timing information, configure the photoresist production control boundary conditions to make the control more accurate; count the thickness uniformity of the photoresist production history sample set that meets the photoresist production control boundary conditions and the preset glue liquid formula The thickness uniformity coefficient and surface roughness uniformity coefficient of the photoresist samples produced under these conditions are evaluated to verify the effectiveness of the control strategy. If the thickness uniformity coefficient meets the thickness uniformity threshold and the surface roughness uniformity coefficient meets the roughness uniformity threshold, the target photoresist production line is initialized by the spin coating speed interval timing information and the temperature and humidity interval timing information to perform photoresist preparation. On the basis of verifying the effectiveness of the control strategy, the optimized control parameters are applied to actual production, and the production process is controlled according to the spin coating speed interval timing information and the temperature and humidity interval timing information to ensure the production of highly uniform photoresist.

[0009] Through the above technical solution, the present application can optimize and control parameters according to the actual disturbance characteristics of different production lines, effectively solving the problem of uniformity deviation caused by not considering the micro-disturbance of the equipment in the existing technology, and improving the thickness uniformity and surface roughness uniformity of the photoresist. BRIEF DESCRIPTION OF THE DRAWINGS

[0010] Figure 1 A schematic flow chart of a photoresist production method for improving photoresist uniformity provided by the present invention;

[0011] Figure 2 A structural schematic diagram of a photoresist production system for improving photoresist uniformity provided by the present invention.

[0012] In the accompanying drawings, the components represented by the reference numerals are as follows:

[0013] Information acquisition module 11, production log analysis module 12, boundary condition configuration module 13, sample set statistics module 14, production initialization module 15. DETAILED DESCRIPTION

[0014] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without making any creative efforts shall fall within the scope of protection of the present invention.

[0015] In the description of the present invention, the terms "first" and "second" are used for descriptive purposes only and should not be understood to indicate or imply relative importance or implicitly specify the number of the technical features indicated. Therefore, a feature specified as "first" or "second" may explicitly or implicitly include one or more of the specified features. In the description of the present invention, "plurality" means two or more, unless otherwise specifically defined.

[0016] In the description of the present invention, the term "for example" is used to mean "used as an example, illustration or illustration". Any embodiment of the present invention described as "for example" is not necessarily to be construed as being more preferred or advantageous than other embodiments. The following description is given to enable any person skilled in the art to implement and use the present invention. In the following description, details are listed for the purpose of explanation. It should be understood that a person of ordinary skill in the art can recognize that the present invention can be implemented without using these specific details. In other examples, well-known structures and processes are not elaborated in detail to avoid obscuring the description of the present invention with unnecessary details. Therefore, the present invention is not intended to be limited to the embodiments shown, but is consistent with the widest scope consistent with the principles and features disclosed herein.

[0017] Example 1, as Figure 1 As shown, an embodiment of the present invention provides a photoresist production method for improving photoresist uniformity, comprising:

[0018] S100: Obtaining the spin coating speed interval timing information and the temperature and humidity interval timing information of the preset glue formula.

[0019] Specifically, the process parameter timing information corresponding to the specific photoresist formula is obtained, including the spin coating speed interval timing information and the temperature and humidity interval timing information.

[0020] The spin coating speed interval timing information refers to the range of values ​​of the spin coating speed parameter within different time periods of the photoresist production process. As a control parameter in the photoresist coating process, the spin coating speed affects the thickness distribution and uniformity of the photoresist film layer. By determining the speed interval within each time period, a basic control basis can be provided for subsequent production processes. The temperature and humidity interval timing information refers to the range of values ​​of the ambient temperature and humidity parameters within different time periods of the photoresist production process. The temperature and humidity conditions have an impact on the rheological properties and curing characteristics of the photoresist, which in turn affects the uniformity of the final photoresist film layer.

[0021] Although the uniformity of photoresist is also affected by the viscosity of the glue, since the viscosity of the glue is mainly determined by factors such as formula, rotation speed, temperature and humidity, under the premise that the preset glue formula has been determined, it is only necessary to obtain the spin coating speed interval timing information and the temperature and humidity interval timing information, without considering the glue viscosity parameters separately.

[0022] The acquired timing information of the spin coating speed interval and the temperature and humidity interval will serve as the basic data for the subsequent configuration of the photoresist production control boundary conditions, providing the necessary parameter basis for improving the uniformity of the photoresist.

[0023] S200: Retrieve the preset time zone production log of the target photoresist production line, and calculate the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold.

[0024] Specifically, first, the production log data of the target photoresist production line in the preset time zone is retrieved. Among them, the preset time zone can be a specific time period such as a day, a week or a month, which is determined according to the actual production situation. The production log contains records of the preset values ​​and actual monitoring values ​​of various parameters in the production process. These records reflect the parameter fluctuations in the actual operation of the production line. Subsequently, through statistical analysis of the production log, the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold are determined. These disturbance thresholds represent the degree of deviation of the control parameters of the target production line in actual operation, reflecting the accuracy and stability of the equipment control.

[0025] Traditional photoresist production methods ignore the differences in equipment control accuracy between different production lines and rely solely on standardized parameter settings for production, resulting in varying degrees of uniformity deviation on different production lines.

[0026] By calculating the control perturbation thresholds for each parameter, we can objectively reflect the actual control capabilities of the target production line, providing a basis for subsequent parameter optimization and improving the adaptability of photoresist uniformity to specific scenarios. The obtained spin coating speed control perturbation thresholds and temperature and humidity control perturbation thresholds will be used to adjust the control boundary conditions of photoresist production, making the control strategy more closely aligned with the characteristics of the actual production environment, and improving control accuracy and product uniformity.

[0027] S300: configuring photoresist production control boundary conditions according to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, in combination with the spin coating speed interval timing information and the temperature and humidity interval timing information.

[0028] Specifically, first, based on the obtained spin coating speed control disturbance threshold and temperature and humidity control disturbance threshold, the obtained spin coating speed interval timing information and temperature and humidity interval timing information are corrected and updated, so that the parameter interval under ideal conditions is adjusted according to the control accuracy of the actual equipment, forming an update interval that takes into account the actual disturbance. The updated interval timing information includes the spin coating speed update interval and the temperature and humidity update interval of multiple time zones. The time zone division reflects the differentiated requirements for parameter control at different stages in the photoresist production process. For example, the requirements for spin coating speed and temperature and humidity may be different in the early, middle and late stages of glue coating. Subsequently, based on the update intervals of each time zone, the complete photoresist production control boundary conditions are generated by boundary enumeration and combination. These boundary conditions comprehensively consider the control requirements of different time zones and different parameters, forming a multi-dimensional control boundary space.

[0029] By constructing control boundary conditions that account for both timing and perturbation characteristics, the photoresist production process can be more precisely guided, adapting to the equipment characteristics of different production lines and thereby improving photoresist uniformity. The generated photoresist production control boundary conditions will be used to screen historical production samples and evaluate uniformity indicators.

[0030] S400: Counting the thickness uniformity coefficient and the surface roughness uniformity coefficient of a photoresist production history sample set that meets the photoresist production control boundary conditions and the preset glue solution formula.

[0031] Specifically, first, a sample set that simultaneously meets the configured photoresist production control boundary conditions and the preset glue liquid formula is screened out from the historical production database to obtain a photoresist production history sample set, which represents the historical production records under similar production conditions. Subsequently, a statistical analysis is performed on the screened photoresist production history sample set to calculate its thickness uniformity coefficient and surface roughness uniformity coefficient. Among them, the thickness uniformity coefficient refers to the consistency index of the thickness distribution of the photoresist film layer on the wafer surface, which can be characterized by statistical quantities such as standard deviation and coefficient of variation; the surface roughness uniformity coefficient reflects the uniformity of the microscopic morphology of the surface of the photoresist film layer and can be characterized by the distribution characteristics of the surface roughness parameters.

[0032] Thickness uniformity and surface roughness uniformity are two key indicators for evaluating photoresist quality. Thickness uniformity directly impacts the resolution and overlay accuracy of subsequent photolithography processes, while surface roughness uniformity influences the photoresist's light scattering properties, which in turn affects pattern transfer accuracy. By statistically analyzing these two uniformity indicators, we can assess the quality of photoresists within a historical sample set of photoresist production.

[0033] By analyzing the uniformity indicators of historical samples, the effectiveness of control strategies can be evaluated before actual production, reducing trial and error costs and improving production efficiency. The obtained thickness uniformity coefficient and surface roughness uniformity coefficient are compared with preset thresholds to determine whether the control strategy meets uniformity requirements, providing a basis for subsequent production decisions.

[0034] S500: If the thickness uniformity coefficient meets the thickness uniformity threshold and the surface roughness uniformity coefficient meets the roughness uniformity threshold, the target photoresist production line is initialized to perform photoresist preparation according to the spin coating speed interval timing information and the temperature and humidity interval timing information.

[0035] Specifically, first, the statistically obtained thickness uniformity coefficient is compared with a preset thickness uniformity threshold, and the surface roughness uniformity coefficient is compared with a preset roughness uniformity threshold. These two thresholds represent the minimum requirements for photoresist uniformity and are the criteria for judging whether the control strategy is acceptable. Subsequent photoresist preparation operations will only be performed if and only if the thickness uniformity coefficient meets the thickness uniformity threshold and the surface roughness uniformity coefficient meets the roughness uniformity threshold. This conditional judgment mechanism effectively prevents control strategies that do not meet uniformity requirements from being applied to actual production, reducing production risks.

[0036] Once the conditions are met, the obtained timing information for the spin-coating speed intervals and the temperature and humidity intervals is used to initialize the target photoresist production line and execute the photoresist preparation process. This initialization process involves sending the parameter interval information for each time zone to the production line control system, setting the change pattern of the control parameters, and thus guiding the subsequent actual production process.

[0037] By statistically analyzing and considering the control perturbation thresholds of the target photoresist production line, this approach overcomes the problem of traditional methods focusing solely on parameter determination while ignoring minute disturbances in equipment control. By introducing a uniformity assessment mechanism based on historical data, this approach enables pre-verification of control strategies, improving the success rate and product quality of different photoresist production lines. This effectively overcomes the uniformity fluctuations caused by equipment control deviations across different production lines, providing a more reliable process guarantee for photoresist production.

[0038] Furthermore, the preset time zone production log of the target photoresist production line is retrieved, and the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold are counted, including:

[0039] S210: The preset time zone production log includes a number of one-to-one corresponding spin coating speed preset values ​​and spin coating speed monitoring values, a number of one-to-one corresponding temperature preset values ​​and temperature monitoring values, and a number of one-to-one corresponding humidity preset values ​​and humidity monitoring values;

[0040] S220: Counting a concentrated value of the spin coating speed deviation between the preset spin coating speed value and the spin coating speed monitoring value, and setting the value as the spin coating speed control disturbance threshold;

[0041] S230: Counting a concentrated value of temperature deviations between the preset temperature value and the temperature monitoring value, and setting the value as a temperature control disturbance threshold;

[0042] S240: Counting a humidity deviation concentration value between the preset humidity value and the humidity monitoring value, and setting it as a humidity control disturbance threshold;

[0043] S250: Add the temperature control disturbance threshold and the humidity control disturbance threshold into the temperature and humidity control disturbance threshold.

[0044] In one feasible implementation, the data structure of a preset time zone production log is first clarified. This preset time zone production log records the correspondence between preset values ​​and actual monitored values ​​of parameters during the photoresist production process. Specifically, it includes a one-to-one correspondence data set between the preset spin speed value and the monitored spin speed value, a one-to-one correspondence data set between the preset temperature value and the monitored temperature value, and a one-to-one correspondence data set between the preset humidity value and the monitored humidity value. These data reflect the actual deviation of the control parameters during the production process.

[0045] Subsequently, deviation analysis was performed on the three types of parameters respectively. By comparing the difference between the preset value of the spin coating speed and the monitored value of the spin coating speed, the concentrated value of the spin coating speed deviation was statistically obtained and set as the spin coating speed control disturbance threshold. Among them, the concentrated value of the spin coating speed deviation can adopt statistics such as the median, mode or specific percentile to eliminate the influence of outliers and reflect the typical level of spin coating speed deviation. Similarly, the concentrated values ​​of the deviations of the temperature parameter and the humidity parameter were statistically calculated respectively, and set as the corresponding control disturbance thresholds to obtain the temperature control disturbance threshold and the humidity control disturbance threshold. Afterwards, the obtained temperature control disturbance threshold and humidity control disturbance threshold were integrated into the temperature and humidity control disturbance threshold, providing a comprehensive disturbance characteristic description for the subsequent configuration of the control boundary conditions.

[0046] Through quantitative analysis of actual production data, the disturbance characteristics of the target photoresist production line in parameter control were accurately characterized, laying a data foundation for the subsequent optimization of photoresist production control strategies.

[0047] Furthermore, according to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, combined with the spin coating speed interval timing information and the temperature and humidity interval timing information, the photoresist production control boundary conditions are configured, including:

[0048] S310: updating the interval boundaries of the spin coating speed interval timing information and the temperature and humidity interval timing information according to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, to obtain spin coating speed update interval timing information and temperature and humidity update interval timing information;

[0049] S320: The spin coating speed update interval timing information includes the first time zone spin coating speed update interval to the Nth time zone spin coating speed update interval;

[0050] S330: The temperature and humidity update interval timing information includes the first time zone temperature update interval to the Mth time zone temperature update interval, and the first time zone humidity update interval to the Qth time zone humidity update interval;

[0051] S340: Based on the first time zone spin coating speed update interval up to the Nth time zone spin coating speed update interval, and the first time zone temperature update interval up to the Mth time zone temperature update interval, and the first time zone humidity update interval up to the Qth time zone humidity update interval, boundary enumeration combination is performed with time zones as constituent units to generate the photoresist production control boundary conditions.

[0052] In a feasible implementation, first, based on the obtained spin coating speed control disturbance threshold and temperature and humidity control disturbance threshold, the interval boundaries of the initially acquired spin coating speed interval timing information and temperature and humidity interval timing information are updated. This update process is a parameter boundary correction mechanism. By taking the control disturbance threshold into account in the setting of the parameter interval, the parameter interval is made more consistent with the control characteristics of the actual production environment. For example, if the control disturbance threshold of a certain parameter is X, the theoretical control interval [A, B] of the parameter can be updated to [A+X, BX] to ensure that in the actual control process, even if there is a disturbance, the final parameter value can still be maintained within the ideal range. Through this update mechanism, the spin coating speed update interval timing information and the temperature and humidity update interval timing information are obtained.

[0053] The spin coating speed update interval timing information includes the spin coating speed update interval from the first time zone to the Nth time zone, reflecting the differentiated requirements for spin coating speed parameters in different time zones. For example, a higher speed may be required in the early stages of photoresist spin coating to ensure glue spreading, while a lower speed may be required in the later stages to control thickness. This time zone division reflects the dynamic characteristics of the photoresist production process. Similarly, the temperature and humidity update interval timing information includes the temperature update interval from the first time zone to the Mth time zone, and the humidity update interval from the first time zone to the Qth time zone. It is important to note that the time zone divisions for temperature and humidity parameters (M and Q) may differ from the time zone division for spin coating speed (N) to accommodate the control characteristics of different parameters.

[0054] Afterwards, based on the update interval information of each time zone, boundary enumeration combination is performed with time zone as the component unit to generate a complete photoresist production control boundary condition. Boundary enumeration combination means that in each time zone, the upper and lower boundary values ​​are selected from the update intervals of spin coating speed, temperature and humidity, and the boundary values ​​of each time zone are connected in the order of time zones to form a series of possible boundary condition combinations. For example, for the i-th time zone, if the spin coating speed update interval is , the temperature update interval is , the humidity update interval is , then the boundary combination for this time zone includes all possible combinations of the upper and lower bounds of each parameter. By performing similar boundary combinations for all time zones and connecting the combined results, a complete set of control boundary conditions for photoresist production is ultimately generated. By enumerating these combinations, a set of boundary conditions covering all possible control strategies can be obtained, providing a comprehensive control basis for subsequent photoresist production.

[0055] Furthermore, the thickness uniformity coefficient and the surface roughness uniformity coefficient of the photoresist production history sample set that meet the photoresist production control boundary conditions and the preset glue solution formula are statistically calculated, including:

[0056] S410: extracting a first photoresist production control boundary condition of the photoresist production control boundary condition, wherein the first photoresist production control boundary condition includes spin coating speed boundary value timing information, temperature boundary value timing information, and humidity boundary value timing information;

[0057] S420: Performing weight distribution of the influence of the photoresist thickness uniformity on the spin coating speed, temperature, and humidity to obtain a first spin coating speed weight, a first temperature weight, and a first humidity weight; and constructing a first index constraint by combining the spin coating speed boundary value timing information, the temperature boundary value timing information, and the humidity boundary value timing information;

[0058] S430: Performing weight distribution of the influence of photoresist surface roughness uniformity on the spin coating speed, temperature, and humidity to obtain a second spin coating speed weight, a second temperature weight, and a second humidity weight; and constructing a second index constraint by combining the spin coating speed boundary value timing information, the temperature boundary value timing information, and the humidity boundary value timing information;

[0059] S440: Retrieving a first thickness uniformity coefficient of a first photoresist production history sample set that satisfies the first index constraint and the preset glue solution formula;

[0060] S450: Retrieving a first surface roughness uniformity coefficient of a second photoresist production history sample set that satisfies the second index constraint and the preset glue solution formula;

[0061] S460: Adding the first thickness uniformity coefficient and the first surface roughness uniformity coefficient to the thickness uniformity coefficient and the surface roughness uniformity coefficient.

[0062] In a preferred embodiment, first, any one of the generated photoresist production control boundary conditions is extracted as a first photoresist production control boundary condition. The first photoresist production control boundary condition is composed of three parts: spin coating speed boundary value timing information, temperature boundary value timing information, and humidity boundary value timing information, and fully describes the parameter control status during the photoresist production process.

[0063] Then, for the index of photoresist thickness uniformity, the three key parameters of spin coating speed, temperature and humidity were subjected to influence weight analysis, and the first spin coating speed weight, the first temperature weight and the first humidity weight were obtained respectively. These weights reflect the relative influence of each parameter on the photoresist thickness uniformity. Subsequently, these weights were combined with the spin coating speed boundary value timing information, the temperature boundary value timing information and the humidity boundary value timing information to construct a first index constraint. This first index constraint, as a condition for historical sample screening, is used to identify samples with a high degree of correlation with the target control strategy. Similarly, for the index of photoresist surface roughness uniformity, the second spin coating speed weight, the second temperature weight and the second humidity weight were obtained respectively. These weights may be different from the first spin coating speed weight, the first temperature weight and the first humidity weight obtained, reflecting the difference in the influence of different parameters on different uniformity indices. Subsequently, a second index constraint was constructed based on these weights for sample screening related to surface roughness uniformity.

[0064] Next, based on the first index constraint and the preset glue formula, a sample set that meets the first index constraint and the preset glue formula is retrieved from the historical database, which is the first photoresist production history sample set. Then, the average value of the photoresist thickness uniformity of all samples in the first photoresist production history sample set is calculated as the first thickness uniformity coefficient of the first photoresist production history sample set. The first thickness uniformity coefficient reflects the performance of historical samples that meet specific control conditions in terms of thickness uniformity. Similarly, based on the second index constraint and the preset glue formula condition, the second photoresist production history sample set is retrieved, and its first surface roughness uniformity coefficient is calculated. Afterwards, the first thickness uniformity coefficient and the first surface roughness uniformity coefficient are added to the overall thickness uniformity coefficient and surface roughness uniformity coefficient. These coefficients will be compared with the preset threshold value in the future to evaluate the effectiveness of the control strategy.

[0065] Furthermore, the weight distribution of the influence of the photoresist thickness uniformity is performed on the spin coating speed, temperature and humidity to obtain a first spin coating speed weight, a first temperature weight and a first humidity weight, including:

[0066] S421: collecting a plurality of clusters of quality inspection record data that use the spin coating speed, the temperature, and the humidity as variables and satisfy the preset glue solution formula, wherein any quality inspection record data of any cluster of the plurality of clusters of quality inspection record data includes a production control parameter monitoring data set and photoresist thickness uniformity detection data;

[0067] S422: traversing the plurality of clusters of quality inspection record data, performing pairwise comparisons on the production control parameter monitoring data sets to obtain deviations of the plurality of clusters of production control parameter monitoring data, and performing pairwise comparisons on the photoresist thickness uniformity inspection data to obtain deviations of the plurality of clusters of photoresist thickness uniformity;

[0068] S423: performing grey correlation analysis on the one-to-one corresponding deviations of the plurality of clusters of production control parameter monitoring data and the plurality of clusters of photoresist thickness uniformity deviations to obtain a plurality of spin coating speed correlations, a plurality of temperature correlations, and a plurality of humidity correlations;

[0069] S424: performing correlation ratio statistics based on the plurality of spin coating speed correlations, the plurality of temperature correlations, and the plurality of humidity correlations to obtain the first spin coating speed weight, the first temperature weight, and the first humidity weight.

[0070] In a preferred embodiment, first, several clusters of quality inspection record data are collected, with spin coating speed, temperature, and humidity as variables and meeting a preset glue solution formula. Each cluster of quality inspection record data contains multiple quality inspection record data. Each quality inspection record data consists of two parts: a production control parameter monitoring data set (recording the actual values ​​of the spin coating speed, temperature, and humidity) and photoresist thickness uniformity detection data (recording the thickness uniformity of the photoresist produced under the corresponding conditions). Then, a systematic comparative analysis of the several clusters of quality inspection record data is performed. Specifically, within each cluster, the production control parameter monitoring data sets are compared pairwise, and the differences in each parameter between different records are calculated to obtain the deviations of the production control parameter monitoring data for several clusters. Simultaneously, the photoresist thickness uniformity detection data are compared pairwise, and the differences in thickness uniformity between different records are calculated to obtain the deviations of the photoresist thickness uniformity for several clusters. This pairwise comparison method can effectively capture the relationship between parameter changes and uniformity changes.

[0071] Next, a gray correlation analysis is performed on the corresponding deviations of several clusters of production control parameter monitoring data and several clusters of photoresist thickness uniformity deviations. Gray correlation analysis is a method that can assess the degree of correlation between variables when data is incomplete. Through this analysis, the correlations between the three parameters of spin coating speed, temperature, and humidity and photoresist thickness uniformity are calculated, resulting in several spin coating speed correlations, several temperature correlations, and several humidity correlations. These correlation values ​​reflect the degree of influence of changes in each parameter on thickness uniformity. Next, correlation ratio statistics are performed based on the obtained correlation data, calculating the proportion of each parameter's correlation to the total correlation, thereby obtaining the first spin coating speed weight, the first temperature weight, and the first humidity weight. Specifically, the correlation ratio statistical method is to calculate the sum of all correlations for a specific parameter (such as spin coating speed) and divide it by the sum of all correlations for all parameters (spin coating speed, temperature, and humidity) to obtain the weight of that parameter. This weighting method objectively reflects the relative influence of each parameter on thickness uniformity.

[0072] Through the above steps, the impact of each control parameter is evaluated, providing data support for building a more accurate control strategy.

[0073] Furthermore, combining the spin coating speed boundary value timing information, the temperature boundary value timing information, and the humidity boundary value timing information, a first index constraint is constructed, including:

[0074] S425: Configuring the spin coating speed deviation threshold, temperature deviation threshold, and humidity deviation threshold through the user terminal;

[0075] S426: Constructing a first calculation rule, wherein the first calculation rule is used to calculate a first product factor of a first time domain step size deviation and a first time period ratio of a first time point that is less than or equal to the first time domain step size deviation in the spinning speed deviation timing information between the sample spinning speed timing information and the spinning speed boundary value timing information;

[0076] S427: Construct a second calculation rule, wherein the second calculation rule is used to calculate a second product factor of a ratio of a second moment in the sample temperature boundary value time series information and the temperature deviation time series information of the temperature boundary value time series information that is less than or equal to the temperature deviation threshold and a second time domain step deviation;

[0077] S428: Construct a third calculation rule, wherein the third calculation rule is used to calculate a third product factor of a third time domain step deviation and a third time period ratio of the sample humidity boundary value time series information and the humidity deviation time series information of the humidity boundary value time series information that is less than or equal to the humidity deviation threshold;

[0078] S429: The first index constraint is considered to be satisfied if and only if the first multiplication factor, the second multiplication factor, and the third multiplication factor are all less than or equal to a multiplication factor threshold.

[0079] In a preferred embodiment, the user configures three parameter deviation thresholds: spin-coating speed deviation threshold, temperature deviation threshold, and humidity deviation threshold. Users can adjust the deviation thresholds for each parameter based on actual production needs and quality requirements to control the stringency of historical sample screening.

[0080] Then, a first calculation rule for the spin coating speed parameter is constructed. The rule first calculates the deviation timing information between the spin coating speed timing information of the historical sample and the spin coating speed boundary value timing information, and then counts the number of moments less than or equal to the spin coating speed deviation threshold in the deviation timing information to the total number of moments, which is defined as the first moment proportion. In addition, the difference between the spin coating speed timing information of the historical sample and the spin coating speed boundary value timing information at the time point distribution is calculated, for example, it can be characterized by statistics such as the standard deviation or coefficient of variation of the time interval between the two, and the first time domain step deviation is obtained. Afterwards, the first moment proportion is multiplied by the first time domain step deviation to obtain a first product factor, which comprehensively reflects the matching degree between the historical sample and the control boundary on the spin coating speed parameter.

[0081] Similarly, a second calculation rule is constructed for the temperature parameter. This rule calculates the time series information of the sample's temperature boundary value and the temperature deviation time series information of the temperature boundary value time series information. The rule then calculates the percentage of moments less than or equal to the temperature deviation threshold in the total number of moments, defining this as the second moment percentage. Simultaneously, the difference in the temperature parameter time domain step size between the historical sample and the boundary value is calculated, defining this as the second time domain step size deviation, reflecting the degree of consistency between the two in the temporal dimension. The second moment percentage is then multiplied by the second time domain step size deviation to obtain a second multiplication factor, which characterizes the degree of match between the sample and the boundary value in terms of the temperature parameter. Similarly, a third calculation rule is constructed for the humidity parameter. This rule calculates the time series information of the sample's humidity boundary value and the humidity deviation time series information of the humidity boundary value time series information, and then calculates the percentage of third moments less than or equal to the humidity deviation threshold. Combined with the third time domain step size deviation, the third multiplication factor is calculated to comprehensively assess the sample's match with the boundary value in terms of the humidity parameter.

[0082] Then, a first index constraint is set: a historical sample is considered to meet the first index constraint if and only if the first, second, and third multiplication factors are all less than or equal to a preset multiplication factor threshold. This logical judgment condition ensures that the selected historical samples have a high degree of similarity with the spin-coating speed boundary value timing information, temperature boundary value timing information, and humidity boundary value timing information in terms of the three key parameters of spin-coating speed, temperature, and humidity, thereby improving the reliability and reference value of the historical data analysis results.

[0083] Furthermore, the embodiment of the present application also includes:

[0084] S600: If the thickness uniformity coefficient does not meet the thickness uniformity threshold, or the surface roughness uniformity coefficient does not meet the roughness uniformity threshold, the target photoresist production line is marked as abnormal and the feedback is fed back to the user end.

[0085] In a preferred embodiment, an abnormality monitoring and feedback mechanism is designed to provide timely intervention for situations where uniformity requirements are not met.

[0086] When the thickness uniformity coefficient does not meet the preset thickness uniformity threshold, or the surface roughness uniformity coefficient does not meet the preset roughness uniformity threshold, it automatically identifies that the current control strategy (i.e., the spin coating speed interval timing information and the temperature and humidity interval timing information of the preset glue formula) is insufficient to ensure the uniformity requirements of the photoresist, and then marks the target photoresist production line as abnormal, and feeds back the abnormal situation to the user end.

[0087] When historical data analysis predicts that the current control strategy may result in substandard uniformity, production will not proceed blindly. Instead, an exception flagging mechanism will alert users to potential issues and address them. This flagging typically indicates that equipment control disturbances on the production line have exceeded controllable limits, necessitating maintenance, calibration, or adjustments. Through this user-side feedback mechanism, relevant technicians can promptly monitor production line status and implement necessary equipment maintenance or parameter adjustments, avoiding waste of raw materials and production resources and ensuring quality control and equipment safety during photoresist production.

[0088] Further, the target photoresist production line is initialized to perform photoresist preparation according to the spin coating speed interval timing information and the temperature and humidity interval timing information, including:

[0089] S510: uniformly distributing the spin coating speed interval timing information and the temperature and humidity interval timing information to obtain a plurality of spin coating speed assignment timing information and a plurality of temperature and humidity assignment timing information, and constructing an initial population;

[0090] S520: Counting a number of initial solution thickness uniformity coefficients and a number of initial solution roughness uniformity coefficients that satisfy the number of spin coating speed assignment timing information, the number of temperature and humidity assignment timing information, and the preset glue solution formula;

[0091] S530: configuring a first weight for the thickness uniformity coefficient and a second weight for the roughness uniformity coefficient, and obtaining an initial population fitness set for the plurality of initial solution thickness uniformity coefficients and the plurality of initial solution roughness uniformity coefficients, wherein the first weight is ≥ 2*the second weight;

[0092] S540: performing a preset number of iterative optimizations based on the initial population fitness set and the initial population, obtaining target spin-coating speed time zone information and target temperature and humidity timing information, and initializing the target photoresist production line to perform photoresist preparation.

[0093] In a preferred embodiment, after confirming that the control boundary conditions meet the uniformity requirements, an iterative optimization method is used to further determine the precise production parameters to achieve optimized control of the photoresist production process.

[0094] First, uniformly distributed sampling is performed based on the timing information of the spin-coating speed interval and the temperature and humidity interval. Several different parameter timing combinations, namely, several spin-coating speed assignment timing information and several temperature and humidity assignment timing information, are generated to construct an initial population. This uniform sampling ensures that the initial population fully covers the entire parameter space, providing a diverse set of candidate solutions for subsequent optimization. The initial population refers to a set of solutions consisting of multiple different parameter combinations, with each parameter combination being considered an "individual." Each "individual" (i.e., each parameter combination) in the constructed initial population is then evaluated. Specifically, the thickness uniformity coefficient and surface roughness uniformity coefficient of historical samples that meet the requirements of the spin-coating speed assignment timing information, the temperature and humidity assignment timing information, and the preset adhesive solution formula are statistically analyzed. These coefficients are recorded as the initial solution thickness uniformity coefficients and the initial solution roughness uniformity coefficients, respectively. These coefficients reflect the photoresist uniformity level corresponding to different parameter combinations.

[0095] Next, a multi-objective optimization evaluation system is constructed. First, a first weight is assigned to the thickness uniformity coefficient and a second weight is assigned to the roughness uniformity coefficient. Based on these weights, a weighted calculation is performed on several initial solutions for thickness uniformity coefficients and roughness uniformity coefficients to obtain an initial population fitness set. Notably, the first weight is no less than twice the second weight. This setting reflects the dominant role of thickness uniformity in photoresist quality evaluation and ensures that the optimization process prioritizes improving thickness uniformity. Next, a preset number of iterative optimization calculations are performed based on the initial population fitness set and the initial population. In each iteration, a specific optimization algorithm (such as a genetic algorithm or particle swarm algorithm) is used to generate a new parameter combination based on the fitness evaluation results. The new parameter combination is then re-evaluated to gradually approach the optimal solution. After a preset number of iterations, the target spin-coating speed time zone information and target temperature and humidity timing information are obtained—i.e., the optimal parameter timing combination. These optimized parameters are then used to initialize the target photoresist production line and execute photoresist production.

[0096] Through the above steps, not only the uniformity requirements of the photoresist production process are guaranteed, but the uniformity level is further improved through iterative optimization, realizing the refined control of photoresist production.

[0097] Example 2, as Figure 2 As shown, based on the same inventive concept as the method for producing photoresist with improved photoresist uniformity provided in the first embodiment, the embodiment of the present invention further provides a photoresist production system for improving photoresist uniformity, comprising:

[0098] An information acquisition module 11 is used to obtain the timing information of the spin coating speed interval and the timing information of the temperature and humidity interval of the preset glue formula;

[0099] The production log analysis module 12 is used to retrieve the preset time zone production log of the target photoresist production line and calculate the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold;

[0100] A boundary condition configuration module 13 is configured to configure a photoresist production control boundary condition according to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, in combination with the spin coating speed interval timing information and the temperature and humidity interval timing information;

[0101] A sample set statistics module 14 is used to count the thickness uniformity coefficient and surface roughness uniformity coefficient of the photoresist production history sample set that meets the photoresist production control boundary conditions and the preset glue solution formula;

[0102] The production initialization module 15 is used to initialize the target photoresist production line to perform photoresist preparation through the spin coating speed interval timing information and the temperature and humidity interval timing information if the thickness uniformity coefficient meets the thickness uniformity threshold and the surface roughness uniformity coefficient meets the roughness uniformity threshold.

[0103] Furthermore, the production log analysis module 12 includes the following execution steps:

[0104] The preset time zone production log includes a number of one-to-one corresponding spin coating speed preset values ​​and spin coating speed monitoring values, a number of one-to-one corresponding temperature preset values ​​and temperature monitoring values, and a number of one-to-one corresponding humidity preset values ​​and humidity monitoring values;

[0105] Counting a concentrated value of a spin coating speed deviation between the preset spin coating speed value and the spin coating speed monitoring value, and setting the value as the spin coating speed control disturbance threshold;

[0106] Counting the concentrated value of the temperature deviation between the preset temperature value and the temperature monitoring value, and setting it as the temperature control disturbance threshold;

[0107] Counting the humidity deviation concentration value between the humidity preset value and the humidity monitoring value, and setting it as the humidity control disturbance threshold;

[0108] The temperature control disturbance threshold and the humidity control disturbance threshold are added to the temperature and humidity control disturbance threshold.

[0109] Furthermore, the boundary condition configuration module 13 includes the following execution steps:

[0110] According to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, updating the interval boundaries of the spin coating speed interval timing information and the temperature and humidity interval timing information to obtain the spin coating speed update interval timing information and the temperature and humidity update interval timing information;

[0111] The spin coating speed update interval timing information includes the first time zone spin coating speed update interval to the Nth time zone spin coating speed update interval;

[0112] The temperature and humidity update interval timing information includes the first time zone temperature update interval to the Mth time zone temperature update interval, and the first time zone humidity update interval to the Qth time zone humidity update interval;

[0113] Based on the first time zone spin coating speed update interval to the Nth time zone spin coating speed update interval, the first time zone temperature update interval to the Mth time zone temperature update interval, and the first time zone humidity update interval to the Qth time zone humidity update interval, boundary enumeration combination is performed with time zones as constituent units to generate the photoresist production control boundary conditions.

[0114] Furthermore, the sample set statistics module 14 includes the following execution steps:

[0115] Extracting a first photoresist production control boundary condition of the photoresist production control boundary condition, wherein the first photoresist production control boundary condition includes spin coating speed boundary value timing information, temperature boundary value timing information, and humidity boundary value timing information;

[0116] Performing a weight distribution of the influence of photoresist thickness uniformity on the spin coating speed, temperature, and humidity to obtain a first spin coating speed weight, a first temperature weight, and a first humidity weight; and constructing a first index constraint by combining the spin coating speed boundary value timing information, the temperature boundary value timing information, and the humidity boundary value timing information;

[0117] Performing weight distribution of the influence of photoresist surface roughness uniformity on the spin coating speed, temperature, and humidity to obtain a second spin coating speed weight, a second temperature weight, and a second humidity weight; and constructing a second index constraint by combining the spin coating speed boundary value timing information, the temperature boundary value timing information, and the humidity boundary value timing information;

[0118] Retrieving a first thickness uniformity coefficient of a first photoresist production history sample set that satisfies the first index constraint and the preset glue solution formula;

[0119] Retrieving a first surface roughness uniformity coefficient of a second photoresist production history sample set that satisfies the second index constraint and the preset glue solution formula;

[0120] The first thickness uniformity coefficient and the first surface roughness uniformity coefficient are added to the thickness uniformity coefficient and the surface roughness uniformity coefficient.

[0121] Furthermore, the sample set statistics module 14 further includes the following execution steps:

[0122] Collecting a plurality of clusters of quality inspection record data that take the spin coating speed, the temperature, and the humidity as variables and satisfy the preset glue solution formula, wherein any one of the plurality of clusters of quality inspection record data includes a production control parameter monitoring data set and photoresist thickness uniformity detection data;

[0123] Traversing the plurality of clusters of quality inspection record data, performing pairwise comparisons on the production control parameter monitoring data sets to obtain deviations of the plurality of clusters of production control parameter monitoring data, and performing pairwise comparisons on the photoresist thickness uniformity inspection data to obtain deviations of the plurality of clusters of photoresist thickness uniformity;

[0124] performing grey correlation analysis on the one-to-one corresponding deviations of the plurality of clusters of production control parameter monitoring data and the plurality of clusters of photoresist thickness uniformity deviations to obtain a plurality of spin coating speed correlations, a plurality of temperature correlations, and a plurality of humidity correlations;

[0125] Correlation ratio statistics are performed based on the plurality of spin coating speed correlations, the plurality of temperature correlations, and the plurality of humidity correlations to obtain the first spin coating speed weight, the first temperature weight, and the first humidity weight.

[0126] Furthermore, the sample set statistics module 14 further includes the following execution steps:

[0127] Configure the spin coating speed deviation threshold, temperature deviation threshold, and humidity deviation threshold through the user end;

[0128] Constructing a first calculation rule, wherein the first calculation rule is used to count the first time ratio of the sample spinning speed timing information and the spinning speed deviation timing information of the spinning speed boundary value timing information that is less than or equal to the spinning speed deviation threshold, and a first multiplication factor of the first time domain step deviation;

[0129] Constructing a second calculation rule, wherein the second calculation rule is used to count the proportion of the second moment in the sample temperature boundary value time series information and the temperature deviation time series information of the temperature boundary value time series information that is less than or equal to the temperature deviation threshold, and a second multiplication factor of the second time domain step deviation;

[0130] Constructing a third calculation rule, wherein the third calculation rule is used to calculate a third product factor of a third time domain step deviation and a third time period ratio of the sample humidity boundary value time series information and the humidity deviation time series information of the humidity boundary value time series information that is less than or equal to the humidity deviation threshold;

[0131] The first index constraint is considered to be satisfied if and only if the first multiplication factor, the second multiplication factor, and the third multiplication factor are all less than or equal to a multiplication factor threshold.

[0132] Furthermore, the embodiment of the present application further includes an abnormality identification module, which is configured to:

[0133] If the thickness uniformity coefficient does not meet the thickness uniformity threshold, or the surface roughness uniformity coefficient does not meet the roughness uniformity threshold, the target photoresist production line is marked as abnormal and the feedback is fed back to the user end.

[0134] Furthermore, the production initialization module 15 includes the following execution steps:

[0135] Uniformly distributing the spin coating speed interval timing information and the temperature and humidity interval timing information, obtaining a plurality of spin coating speed assignment timing information and a plurality of temperature and humidity assignment timing information, and constructing an initial population;

[0136] Counting a number of initial solution thickness uniformity coefficients and a number of initial solution roughness uniformity coefficients that satisfy the number of spin coating speed assignment timing information, the number of temperature and humidity assignment timing information, and the preset glue solution formula;

[0137] Configuring a first weight for the thickness uniformity coefficient and a second weight for the roughness uniformity coefficient, and obtaining an initial population fitness set for the plurality of initial solution thickness uniformity coefficients and the plurality of initial solution roughness uniformity coefficients, wherein the first weight is ≥ 2*the second weight;

[0138] According to the initial population fitness set and the initial population, a preset number of iterative optimizations are performed to obtain target spin coating speed time zone information and target temperature and humidity timing information, and the target photoresist production line is initialized to perform photoresist preparation.

[0139] It should be noted that, in the above embodiments, the description of each embodiment has its own focus. For parts that are not described in detail in a certain embodiment, reference can be made to the relevant description of other embodiments.

[0140] Those skilled in the art will appreciate that embodiments of the present invention may be provided as methods, systems, or computer program products. Thus, the present invention may take the form of an entirely hardware embodiment, an entirely software embodiment, or an embodiment combining software and hardware aspects. Furthermore, the present invention may take the form of a computer program product implemented on one or more computer-usable storage media (including but not limited to magnetic disk storage, CD-ROM, optical storage, etc.) containing computer-usable program code.

[0141] The present invention is described with reference to flowcharts and / or block diagrams of methods, devices (systems), and computer program products according to embodiments of the present invention. It should be understood that each process and / or block in the flowcharts and / or block diagrams, as well as combinations of processes and / or blocks in the flowcharts and / or block diagrams, can be implemented by computer program instructions. These computer program instructions can be provided to a processor of a general-purpose computer, a special-purpose computer, an embedded computer, or other programmable data processing device to produce a machine, so that the instructions executed by the processor of the computer or other programmable data processing device generate instructions for implementing the processes in the flowcharts and / or block diagrams. Figure 1 a process or multiple processes and / or boxes Figure 1 A device that provides the functions specified in a block or multiple blocks.

[0142] These computer program instructions may also be stored in a computer readable memory that can direct a computer or other programmable data processing device to work in a specific manner, so that the instructions stored in the computer readable memory produce an article of manufacture comprising an instruction device, which implements the process Figure 1 a process or multiple processes and / or boxes Figure 1 The function specified in one or more boxes.

[0143] These computer program instructions can also be loaded onto a computer or other programmable data processing device so that a series of operational steps are executed on the computer or other programmable device to produce a computer-implemented process, thereby providing the instructions executed on the computer or other programmable device for implementing the process. Figure 1 a process or multiple processes and / or boxes Figure 1 A step that specifies a function in one or more boxes.

[0144] Although preferred embodiments of the present invention have been described, additional changes and modifications to these embodiments may occur to those skilled in the art once the basic inventive concepts become known.

[0145] Obviously, those skilled in the art can make various changes and modifications to the present invention without departing from the spirit and scope of the present invention. Thus, if these modifications and variations of the present invention fall within the scope of the present invention and its equivalents, the present invention is also intended to include these modifications and variations.

Claims

1. A method for producing photoresist for improving the uniformity of photoresist, characterized in that: include: Obtaining the spin coating speed interval timing information and the temperature and humidity interval timing information of the preset glue formula; Retrieve the preset time zone production log of the target photoresist production line and calculate the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold; According to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, combined with the spin coating speed interval timing information and the temperature and humidity interval timing information, the photoresist production control boundary condition is configured; Statistically calculating the thickness uniformity coefficient and the surface roughness uniformity coefficient of a photoresist production history sample set that meets the photoresist production control boundary conditions and the preset glue solution formula, including: Extracting a first photoresist production control boundary condition of the photoresist production control boundary condition, wherein the first photoresist production control boundary condition includes spin coating speed boundary value timing information, temperature boundary value timing information, and humidity boundary value timing information; Performing a weight analysis on the influence of the spin coating speed, temperature, and humidity on the uniformity of the photoresist thickness to obtain a first spin coating speed weight, a first temperature weight, and a first humidity weight; and constructing a first index constraint by combining the spin coating speed boundary value timing information, the temperature boundary value timing information, and the humidity boundary value timing information; Performing a weight analysis on the influence of the photoresist surface roughness uniformity on the spin coating speed, temperature, and humidity to obtain a second spin coating speed weight, a second temperature weight, and a second humidity weight; and constructing a second index constraint by combining the spin coating speed boundary value timing information, the temperature boundary value timing information, and the humidity boundary value timing information; Retrieving a first photoresist production history sample set that meets the first index constraint and the preset glue solution formula, and calculating an average value of photoresist thickness uniformity of all samples in the first photoresist production history sample set to obtain a first thickness uniformity coefficient; Retrieving a second photoresist production history sample set that meets the second index constraint and the preset glue solution formula, and calculating an average value of surface roughness uniformity of all samples in the second photoresist production history sample set to obtain a first surface roughness uniformity coefficient; adding the first thickness uniformity coefficient and the first surface roughness uniformity coefficient to the thickness uniformity coefficient and the surface roughness uniformity coefficient; If the thickness uniformity coefficient meets the thickness uniformity threshold and the surface roughness uniformity coefficient meets the roughness uniformity threshold, the target photoresist production line is initialized to perform photoresist preparation according to the spin coating speed interval timing information and the temperature and humidity interval timing information.

2. The method according to claim 1, wherein Retrieve the preset time zone production log of the target photoresist production line and calculate the spin coating speed control disturbance threshold and temperature and humidity control disturbance threshold, including: The preset time zone production log includes a number of one-to-one corresponding spin coating speed preset values ​​and spin coating speed monitoring values, a number of one-to-one corresponding temperature preset values ​​and temperature monitoring values, and a number of one-to-one corresponding humidity preset values ​​and humidity monitoring values; Counting a concentrated value of a spin coating speed deviation between the preset spin coating speed value and the spin coating speed monitoring value, and setting the value as the spin coating speed control disturbance threshold; Counting the concentrated value of the temperature deviation between the preset temperature value and the temperature monitoring value, and setting it as the temperature control disturbance threshold; Counting the humidity deviation concentration value between the humidity preset value and the humidity monitoring value, and setting it as the humidity control disturbance threshold; The temperature control disturbance threshold and the humidity control disturbance threshold are added to the temperature and humidity control disturbance threshold.

3. The method according to claim 1, wherein According to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, in combination with the spin coating speed interval timing information and the temperature and humidity interval timing information, configuring the photoresist production control boundary conditions, including: According to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, updating the interval boundaries of the spin coating speed interval timing information and the temperature and humidity interval timing information to obtain the spin coating speed update interval timing information and the temperature and humidity update interval timing information; The spin coating speed update interval timing information includes the first time zone spin coating speed update interval to the Nth time zone spin coating speed update interval; The temperature and humidity update interval timing information includes the first time zone temperature update interval to the Mth time zone temperature update interval, and the first time zone humidity update interval to the Qth time zone humidity update interval; Based on the first time zone spin coating speed update interval to the Nth time zone spin coating speed update interval, the first time zone temperature update interval to the Mth time zone temperature update interval, and the first time zone humidity update interval to the Qth time zone humidity update interval, boundary enumeration combination is performed with time zones as constituent units to generate the photoresist production control boundary conditions.

4. The method according to claim 1, wherein Perform a weight analysis on the influence of spin coating speed, temperature and humidity on photoresist thickness uniformity to obtain a first spin coating speed weight, a first temperature weight and a first humidity weight, including: Collecting a plurality of clusters of quality inspection record data that take the spin coating speed, the temperature, and the humidity as variables and satisfy the preset glue solution formula, wherein any one of the plurality of clusters of quality inspection record data includes a production control parameter monitoring data set and photoresist thickness uniformity detection data; Traversing the plurality of clusters of quality inspection record data, performing pairwise comparisons on the production control parameter monitoring data sets to obtain deviations of the plurality of clusters of production control parameter monitoring data, and performing pairwise comparisons on the photoresist thickness uniformity inspection data to obtain deviations of the plurality of clusters of photoresist thickness uniformity; performing grey correlation analysis on the one-to-one corresponding deviations of the plurality of clusters of production control parameter monitoring data and the plurality of clusters of photoresist thickness uniformity deviations to obtain a plurality of spin coating speed correlations, a plurality of temperature correlations, and a plurality of humidity correlations; Correlation ratio statistics are performed based on the plurality of spin coating speed correlations, the plurality of temperature correlations, and the plurality of humidity correlations to obtain the first spin coating speed weight, the first temperature weight, and the first humidity weight.

5. The method according to claim 1, wherein Combining the spin coating speed boundary value timing information, the temperature boundary value timing information, and the humidity boundary value timing information to construct a first index constraint, including: Configure the spin coating speed deviation threshold, temperature deviation threshold, and humidity deviation threshold through the user end; Constructing a first calculation rule, wherein the first calculation rule is used to count the first time ratio of the sample spinning speed timing information and the spinning speed deviation timing information of the spinning speed boundary value timing information that is less than or equal to the spinning speed deviation threshold, and a first multiplication factor of the first time domain step deviation; Constructing a second calculation rule, wherein the second calculation rule is used to count the proportion of the second moment in the sample temperature boundary value time series information and the temperature deviation time series information of the temperature boundary value time series information that is less than or equal to the temperature deviation threshold, and a second multiplication factor of the second time domain step deviation; Constructing a third calculation rule, wherein the third calculation rule is used to calculate a third product factor of a third time domain step deviation and a third time ratio of the sample humidity boundary value time series information and the humidity deviation time series information of the humidity boundary value time series information that is less than or equal to the humidity deviation threshold; The first index constraint is considered to be satisfied if and only if the first multiplication factor, the second multiplication factor, and the third multiplication factor are all less than or equal to a multiplication factor threshold.

6. The method according to claim 1, wherein Also includes: If the thickness uniformity coefficient does not meet the thickness uniformity threshold, or the surface roughness uniformity coefficient does not meet the roughness uniformity threshold, the target photoresist production line is marked as abnormal and the feedback is fed back to the user end.

7. The method according to claim 1, wherein Initializing the target photoresist production line to perform photoresist preparation according to the spin coating speed interval timing information and the temperature and humidity interval timing information, including: Uniformly distributing the spin coating speed interval timing information and the temperature and humidity interval timing information, obtaining a plurality of spin coating speed assignment timing information and a plurality of temperature and humidity assignment timing information, and constructing an initial population; Counting a number of initial solution thickness uniformity coefficients and a number of initial solution roughness uniformity coefficients that satisfy the number of spin coating speed assignment timing information, the number of temperature and humidity assignment timing information, and the preset glue solution formula; Configuring a first weight for the thickness uniformity coefficient and a second weight for the roughness uniformity coefficient, and obtaining an initial population fitness set for the plurality of initial solution thickness uniformity coefficients and the plurality of initial solution roughness uniformity coefficients, wherein the first weight is ≥ 2*the second weight; According to the initial population fitness set and the initial population, a preset number of iterative optimizations are performed to obtain target spin coating speed time zone information and target temperature and humidity timing information, and the target photoresist production line is initialized to perform photoresist preparation.

8. A photoresist production system for improving photoresist uniformity, characterized in that: For implementing the method according to any one of claims 1 to 7, the system comprises: An information acquisition module is used to obtain the timing information of the spin coating speed interval and the timing information of the temperature and humidity interval of the preset glue formula; The production log analysis module is used to retrieve the preset time zone production log of the target photoresist production line and calculate the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold; a boundary condition configuration module, configured to configure a photoresist production control boundary condition according to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, in combination with the spin coating speed interval timing information and the temperature and humidity interval timing information; A sample set statistics module, used to count the thickness uniformity coefficient and surface roughness uniformity coefficient of the photoresist production history sample set that meets the photoresist production control boundary conditions and the preset glue solution formula; A production initialization module is used to initialize the target photoresist production line to perform photoresist preparation through the spin coating speed interval timing information and the temperature and humidity interval timing information if the thickness uniformity coefficient meets the thickness uniformity threshold and the surface roughness uniformity coefficient meets the roughness uniformity threshold.

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