Cover plate and electronic equipment

Abstract

The invention provides a cover plate and electronic equipment, relates to the technical field of electronic products, and aims at improving the scratch resistance of the cover plate, ensuring the appearance yield of the cover plate and giving consideration to the scratch resistance and the appearance yield of the cover plate. Wherein the cover plate comprises a substrate and an anti-scratch film layer which are arranged in a laminated manner, the anti-scratch film layer comprises a silicon element and a doping element, the valence state of the doping element is + 3 or + 5, and the doping element does not comprise a nitrogen element.

Description

Technical Field

[0001] The present application relates to the technical field of electronic products, and in particular to a cover plate and an electronic device. Background Art

[0002] When mobile phones, tablets and other electronic devices are used without protective films, visible scratches will generally appear on the transparent cover, back cover and other cover plates after about a month of use. Moreover, as the electronic device is used for a longer time, the scratches on the cover plate will increase. The existence of these scratches will destroy the stress balance of the cover plate, resulting in a decrease in the impact resistance of the cover plate. At the same time, these scratches, even those that are not so obvious, will be unsightly and reduce the reputation of the electronic device.

[0003] In the related art, the cover plate is usually provided with an anti-scratch film layer to improve the anti-scratch performance of the cover plate, so as to reduce scratches on the cover plate. However, the cover plate in the related art cannot take into account both the anti-scratch performance and the appearance yield of the cover plate. Summary of the invention

[0004] The present application provides a cover plate and an electronic device, which can improve the scratch resistance of the cover plate while ensuring the appearance yield of the cover plate, and can take into account both the scratch resistance and appearance yield of the cover plate.

[0005] To achieve the above objectives, the embodiments of the present application adopt the following technical solutions:

[0006] In a first aspect, the present application provides a cover plate, which includes a stacked substrate and an anti-scratch film layer, the anti-scratch film layer includes silicon and doping elements, wherein the valence state of the doping element is +3 or +5, and the doping element does not include nitrogen.

[0007] The cover plate in the present application, by providing an anti-scratch film layer including doped elements, can effectively avoid the accumulation of charges on the surface of the silicon target material during the sputtering of the anti-scratch film layer, which is beneficial to reducing the probability of arc discharge during the sputtering process, thereby avoiding the generation of large-particle sputtering during the sputtering process, and can effectively reduce the probability of forming "white spots" on the surface of the substrate, thereby improving the appearance yield of the cover plate.

[0008] In a possible implementation of the first aspect, the doping element includes at least one of boron, phosphorus, and aluminum. These elements can form a covalent bond with silicon, and can effectively reduce the probability of forming "white spots" on the surface of the substrate during sputtering of the scratch-resistant film layer. Moreover, these elements are low in cost and easy to obtain.

[0009] In a possible implementation of the first aspect, the mass fraction of the doping element in the anti-scratch film layer is greater than or equal to 0.2%, thereby effectively improving the conductivity of the silicon target material.

[0010] In a possible implementation of the first aspect, the mass fraction of the doping element in the scratch-resistant film layer is less than or equal to 3%. In this way, the influence of the doping element on the optical performance of the cover plate can be avoided.

[0011] In a possible implementation of the first aspect, the Vickers hardness of the scratch-resistant film layer is greater than or equal to 1100 HV. In this way, the wear resistance, corrosion resistance, drop resistance, scratch resistance, etc. of the cover plate can be improved, which is beneficial to reducing the scratches on the cover plate, improving the appearance beauty of the cover plate and the electronic device including the cover plate, and extending the service life of the cover plate and the electronic device.

[0012] In a possible implementation of the first aspect, the scratch-resistant film layer includes a first material and a second material. The refractive index of the first material is greater than or equal to the refractive index of the substrate, and the refractive index of the second material is less than or equal to the refractive index of the substrate. In this way, after the first material and the second material are mixed, the refractive index of the scratch-resistant film layer can be adjusted, the difference between the refractive index of the scratch-resistant film layer and the refractive index of the substrate can be reduced, so as to reduce the difficulty of adjusting the optical performance and appearance color of the cover plate, which is beneficial to thinning the thickness of the optical adjustment film layer, and further reducing the difference in the optical thickness of the optical adjustment film layer at different incident angles, effectively improving the angle color change problem and the rainbow edge problem. Therefore, this optical adjustment film layer is applicable not only to 2D cover plates, but also to 3D cover plates or 2.5D cover plates.

[0013] In a possible implementation of the first aspect, the substrate is a glass substrate, and the refractive index of the scratch-resistant film layer is greater than or equal to 1.46 and less than or equal to 1.85. The refractive index n of the glass substrate g is about 1.52. By setting the refractive index n of the scratch-resistant film layer k to be greater than or equal to 1.46 and less than or equal to 1.85, the difference between the refractive index of the scratch-resistant film layer and the refractive index of the substrate can be reduced, making the material of the scratch-resistant film layer close to the same quality as the substrate material, so as to reduce the difficulty of adjusting the optical performance and appearance color of the cover plate, which is beneficial to thinning the thickness of the optical adjustment film layer, and effectively improving both the angle color change problem and the rainbow edge problem.

[0014] In a possible implementation of the first aspect, the refractive index of the scratch-resistant film layer is greater than or equal to 1.65 and less than or equal to 1.85. In this way, while improving the angle color change problem and the rainbow edge problem, it can ensure that the scratch-resistant film layer has a large Vickers hardness.

[0015] In a possible implementation of the first aspect, the first material includes at least one of silicon nitride, aluminum nitride, niobium oxide, titanium oxide, and tantalum oxide. These materials have excellent optical properties, can meet the refractive index requirements for the first material, and have a large Vickers hardness, which can increase the hardness of the optical adjustment film layer, and further improve the scratch resistance of the cover plate.

[0016] In a possible implementation of the first aspect, the second material includes at least one of silicon oxide, magnesium fluoride, and calcium fluoride. These materials have excellent optical properties and can meet the refractive index requirements for the second material.

[0017] In a possible implementation of the first aspect, the first material includes at least one of silicon nitride, aluminum nitride, niobium oxide, titanium oxide, and tantalum oxide, and the second material includes at least one of silicon oxide, magnesium fluoride, and calcium fluoride.

[0018] In a possible implementation of the first aspect, the first material is silicon nitride, the second material is silicon oxide, and the mass fraction of the first material is greater than or equal to 10% and less than or equal to 80%. In this way, the refractive index of the scratch-resistant film layer can be controlled between 1.49 and 1.85, the difference between the refractive index of the scratch-resistant film layer and the refractive index of the substrate can be reduced, and the angular color change problem and rainbow edge problem of the cover plate can be effectively improved.

[0019] In a possible implementation of the first aspect, the first material is silicon nitride, the second material is silicon oxide, and the mass fraction of the first material is greater than or equal to 10% and less than or equal to 50%. In this way, the refractive index of the scratch-resistant film layer can be controlled between 1.49 and 1.66, and the difference between the refractive index of the scratch-resistant film layer and the refractive index of the substrate can be further reduced.

[0020] In a possible implementation of the first aspect, the first material is aluminum oxide, the second material is silicon oxide, and the mass fraction of the first material is greater than or equal to 10% and less than 100%. In this way, the refractive index of the scratch-resistant film layer can be controlled between 1.47 and 1.7, the difference between the refractive index of the scratch-resistant film layer and the refractive index of the substrate can be reduced, and the angular color change problem and rainbow edge problem of the cover plate can be effectively improved.

[0021] In a possible implementation of the first aspect, the first material is aluminum oxide, the second material is silicon oxide, and the mass fraction of the first material is greater than or equal to 20% and less than 80%. In this way, the refractive index of the scratch-resistant film layer can be controlled between 1.49 and 1.62, and the difference between the refractive index of the scratch-resistant film layer and the refractive index of the substrate can be further reduced.

[0022] In a possible implementation of the first aspect, the thickness of the scratch-resistant film layer is greater than or equal to 500 nm. In this way, the scratch-resistant function of the scratch-resistant film layer can be ensured.

[0023] In a possible implementation of the first aspect, the thickness of the scratch-resistant film layer is less than or equal to 3000 nm. In this way, the scratch-resistant function of the scratch-resistant film layer can be ensured, the scratch-resistant performance of the cover plate can be improved, and the overall thickness of the cover plate can be reduced.

[0024] In a possible implementation of the first aspect, the cover plate includes an upper optical adjustment film layer, the upper optical adjustment film layer is disposed on a side of the scratch-resistant film layer facing away from the substrate, the upper optical adjustment film layer is a single layer, and the refractive index of the upper optical adjustment film layer is less than the refractive index of the scratch-resistant film layer. In this way, by designing the upper optical adjustment film layer as a single-layer film system, on the one hand, the structure of the upper optical adjustment film layer can be simplified, the total thickness of the optical adjustment film layer can be reduced, and further, the difference in the optical thickness of the optical adjustment film layer at different incident angles can be reduced, thereby improving the angle color change problem and the rainbow edge problem; moreover, the scratch-resistant film layer and the upper optical adjustment film layer can form a composite film layer in which a high refractive index film layer and a low refractive index film layer are stacked, and the light reflected and refracted by the scratch-resistant film layer and the upper optical adjustment film layer interfere with each other, so that the reflectivity of light in a specific wavelength band in the outgoing light can be enhanced, and the light transmittance of the cover plate can be further improved, achieving the purpose of optimizing the optical performance of the cover plate and adjusting the appearance color of the cover plate.

[0025] In a possible implementation of the first aspect, the upper optical adjustment film layer includes at least one high refractive index material and at least one low refractive index material, and the refractive index of the high refractive index material is greater than the refractive index of the low refractive index material. In this way, by adjusting the mass ratio of the high refractive index material and the low refractive index material, the upper optical adjustment film layer can have a corresponding refractive index, and the processing difficulty of the upper optical adjustment film layer can be reduced.

[0026] In a possible implementation of the first aspect, the cover plate includes an upper optical adjustment film layer, the upper optical adjustment film layer is disposed on a side of the scratch-resistant film layer facing away from the substrate, and the upper optical adjustment film layer includes at least one first high refractive index film layer and at least one first low refractive index film layer that are sequentially stacked and alternately arranged, and the refractive index of the first high refractive index film layer is greater than the refractive index of the first low refractive index film layer. Another structure of the upper optical adjustment film layer is provided.

[0027] In a possible implementation of the first aspect, the physical thickness of the upper optical adjustment film layer is less than or equal to 300 nm. In this way, the difference in the optical thickness of the upper optical adjustment film layer at different incident angles can be reduced, and further, the angle color change problem and the rainbow edge problem of the cover plate can be improved.

[0028] In a possible implementation manner of the first aspect, a ratio of a physical thickness of the anti-scratch film layer to a physical thickness of the upper optical adjustment film layer is greater than or equal to 10. In this way, the thickness difference between the anti-scratch film layer and the upper optical adjustment film layer is large, so that the anti-scratch film layer and the upper optical adjustment film layer as a whole can be regarded as a single-layer film system, thereby further improving the angle discoloration problem and the rainbow edge problem of the cover plate.

[0029] In a possible implementation of the first aspect, the refractive index of the upper optical adjustment film layer is greater than or equal to 1.55 and less than or equal to 1.65. This is conducive to reducing the difference in optical thickness of the upper optical adjustment film layer at different incident angles, thereby improving the angle discoloration problem and rainbow edge problem of the cover plate.

[0030] In a possible implementation of the first aspect, the cover plate includes a lower optical adjustment film layer, and the lower optical adjustment film layer is disposed on a side of the anti-scratch film layer facing the substrate. Exemplarily, the lower optical adjustment film layer can be disposed on a surface of the anti-scratch film layer facing the substrate. In this way, the optical performance of the cover plate can be further improved.

[0031] In a possible implementation of the first aspect, the lower optical adjustment film layer is a single-layer film layer, and the refractive index of the lower optical adjustment film layer is less than the refractive index of the anti-scratch upper film layer. A specific structure of the lower optical adjustment film layer is provided.

[0032] In a possible implementation of the first aspect, the refractive index of the lower optical adjustment film layer is greater than or equal to 1.55 and less than or equal to 1.65. This is conducive to reducing the difference in optical thickness of the lower optical adjustment film layer at different incident angles, improving the angle discoloration problem and rainbow edge problem of the cover plate. In addition, these materials are easy to obtain, which can reduce the difficulty of processing the cover plate.

[0033] In a possible implementation of the first aspect, the cover plate includes a hard smooth layer, and the hard smooth layer is disposed on the side of the anti-scratch film layer facing away from the substrate. The hard smooth layer can be used to reduce the dynamic friction coefficient of the cover plate surface and reduce the shear force on the cover plate surface when rubbing the cover plate surface. In this way, it can avoid damage to the film layers of the cover plate when the user touches the cover plate, and at the same time, the user can have a smooth touch when touching the cover plate, which is conducive to improving the user experience.

[0034] In a possible implementation of the first aspect, the hard lubricating layer includes one or more carbon materials containing SP2 bonds. These materials have high hardness and can meet the requirements of the hard lubricating layer for the dynamic friction coefficient, and can further improve the wear resistance and scratch resistance of the cover plate while reducing the friction force on the surface of the cover plate.

[0035] In a possible implementation of the first aspect, the dynamic friction coefficient of the hard and smooth layer is less than or equal to 0.05. In this way, it can avoid damaging the film layers of the cover plate when the user touches the cover plate. At the same time, it can make the user have a smooth touch feeling when touching the cover plate, which is beneficial to improving the user experience.

[0036] In a possible implementation of the first aspect, the dynamic friction coefficient of the hard and smooth layer can be greater than or equal to 0.01. In this way, the material of the hard and smooth layer can be easily obtained, and the processing difficulty of the hard and smooth layer can be reduced.

[0037] In a possible implementation of the first aspect, the physical thickness of the hard and smooth layer is less than or equal to 50 nm. In this way, it can reduce the friction force on the surface of the cover plate while ensuring the optical performance of the cover plate.

[0038] In a possible implementation of the first aspect, the cover plate further includes an anti-fingerprint layer, and the anti-fingerprint layer is disposed on the side of the scratch-resistant film layer facing away from the substrate. In this way, the appearance surface of the cover plate can have anti-fingerprint performance.

[0039] In a possible implementation of the first aspect, the material of the anti-fingerprint layer includes at least one of polytetrafluoroethylene and chlorfluazuron. These materials have hydrophobic and oleophobic properties, making the surface of the cover plate easy to clean and having excellent fingerprint resistance performance.

[0040] In a possible implementation of the first aspect, the cover plate includes a primer layer, and the primer layer is stacked on the surface of the substrate facing the scratch-resistant film layer; the material of the primer layer includes at least one of aluminum, chromium, titanium, silicon, and silicon oxide. The primer layer is used to increase the adhesion between the film layer closest to the substrate on the first surface and the substrate, and can effectively prevent the film layer on the substrate from peeling off. At the same time, the primer layer can also provide a cut-off interface for stripping the defective film layer, preventing the stripping solution from damaging the substrate.

[0041] In a possible implementation of the first aspect, according to the International Commission on Illumination, under the incident condition that the incident angle is equal to 60 degrees, the a value and b value of the reflected color of the cover plate in the Lab color space satisfy: the a value is greater than or equal to -2 and less than or equal to 2, and the b value is greater than or equal to -2 and less than or equal to 2. In this way, the appearance color of the cover plate is good, and it can be coated on the 2.5D cover plate 50 and the 3D cover plate. And even if the arc surface of the edge part of the cover plate reaches 90°, there will be no angle color change problem and rainbow edge problem.

[0042] In a possible implementation of the first aspect, the Mohs hardness of the cover plate under 500 g force is greater than 7. In this way, the cover plate has high hardness, good wear resistance and scratch resistance, which is beneficial to reducing scratches on the cover plate and extending the service life of the cover plate.

[0043] In a possible implementation manner of the first aspect, the substrate is a 2.5D substrate or a 3D substrate.

[0044] In a second aspect, the present application provides an electronic device comprising a frame, a screen and a back cover, the screen comprising a stacked light-transmitting cover plate and a display screen, the light-transmitting cover plate being fixedly connected to the frame; the back cover is arranged on a side of the frame away from the light-transmitting cover plate; at least one of the back cover and the light-transmitting cover plate is a cover plate in any of the above-mentioned technical solutions.

[0045] Among them, the technical effects brought about by any design method in the second aspect can refer to the technical effects brought about by different design methods in the first aspect, and will not be repeated here. BRIEF DESCRIPTION OF THE DRAWINGS

[0046] Figure 1 A schematic diagram of the structure of an electronic device provided in some embodiments of the present application;

[0047] Figure 2 for Figure 1 A cross-sectional view of the electronic device shown at line AA;

[0048] Figure 3 It is a side view of cover plates of different shapes;

[0049] Figure 4 It is a schematic diagram of the cross-sectional structure of a cover plate in the related art;

[0050] Figure 5 for Figure 4 The schematic diagram of the change of the spectrum of the cover plate at different incident angles is shown;

[0051] Figure 6 It is a schematic diagram of the cross-sectional structure of another cover plate in the related art;

[0052] Figure 7 A partial cross-sectional view of a cover plate provided for some embodiments of the present application;

[0053] Figure 8 A partial cross-sectional view of a cover plate provided in some other embodiments of the present application;

[0054] Figure 9 A partial cross-sectional view of a cover plate provided in some other embodiments of the present application;

[0055] Figure 10 A partial cross-sectional view of a cover plate provided for some other embodiments of the present application;

[0056] Figure 11 A partial cross-sectional view of a cover plate provided for some other embodiments of the present application;

[0057] Figure 12Flowchart of the processing method of the cover plate provided by some embodiments of the present application;

[0058] Figure 13 Flowchart of the processing method of the cover plate provided by other embodiments of the present application;

[0059] Figure 14 Flowchart of the processing method of the cover plate provided by yet other embodiments of the present application;

[0060] Figure 15 For Figure 10 Flowchart of the processing method of the cover plate shown;

[0061] Figure 16 For Figure 11 Flowchart of the processing method of the cover plate shown.

[0062] Reference numerals:

[0063] 100, electronic device; 10, screen 10; 11, light-transmitting cover plate; 12, display screen; 20, housing; 21, back cover; 22, frame; 23, middle plate; 30, circuit board; 31, main circuit board; 32, secondary circuit board; 40, battery; 50, cover plate; 501, middle part; 502, edge part; 50a, pit; 51, substrate; 511, first surface; 512, second surface; 52, coating layer; 521, optical adjustment film layer; 5211, upper optical adjustment film layer; 5211a, first high refractive index film layer; 5211b, second low refractive index film layer; 5212, lower optical adjustment film layer; 5212a, second high refractive index film layer; 5212b, second low refractive index film layer; 522, scratch-resistant film layer; 523, primer layer; 524, fingerprint-proof layer; 525, transition layer; 526, hard and smooth layer; 53, diamond-like carbon film layer. Detailed implementation manners

[0064] Next, the technical solutions in the embodiments of the present application will be described with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments.

[0065] In the embodiments of the present application, the terms "exemplary" or "for example" are used to represent examples, illustrations or explanations. Any embodiment or design solution described as "exemplary" or "for example" in the embodiments of the present application should not be construed as being more preferred or having more advantages than other embodiments or design solutions. Rather, the use of the terms "exemplary" or "for example" is intended to present the relevant concepts in a specific manner.

[0066] In the embodiments of the present application, the terms "first" and "second" are used only for descriptive purposes and cannot be construed as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, features defined with "first" and "second" may explicitly or implicitly include one or more of such features.

[0067] In the description of the embodiments of the present application, "and / or" is merely a description of the association relationship of associated objects, indicating that three relationships may exist. For example, A and / or B may represent three situations: A exists alone, A and B exist simultaneously, and B exists alone. Additionally, the character " / " in the present application generally represents an "or" relationship between the associated objects before and after.

[0068] In the embodiments of the present application, orientation terms such as "inside", "outside", "above", "below", etc. may include but are not limited to being defined relative to the schematic placement of components in the drawings. It should be understood that these directional terms may be relative concepts, and they are used for relative description and clarification, and they may change accordingly with the change of the orientation of the components placed in the drawings.

[0069] In the description of the embodiments of the present application, it should be noted that unless otherwise clearly specified and limited, the terms "installed", "connected", and "coupled" should be understood in a broad sense. For example, "connected" may be a detachable connection or a non-detachable connection; it may be a direct connection or an indirect connection through an intermediate medium. Among them, "fixed connection" means that they are connected to each other and the relative positional relationship after connection remains unchanged.

[0070] In the description of the embodiments of the present application, the terms "in the same direction", "perpendicular", "parallel", and "equal" include the described situations and situations similar to the described situations, and the range of the similar situations is within an acceptable deviation range, where the acceptable deviation range is determined by those of ordinary skill in the art considering the measurements being discussed and the errors associated with the measurements of specific quantities (i.e., the limitations of the measurement system). For example, "parallel" includes absolute parallel and approximate parallel, and the acceptable deviation range for approximate parallel may be within 5°, 8°, or 10° deviation; "perpendicular" includes absolute perpendicular and approximate perpendicular, and the acceptable deviation range for approximate perpendicular may also be within 5°, 8°, or 10° deviation. "Equal" includes absolute equality and approximate equality, and the acceptable deviation range for approximate equality may be that the difference between the two equal ones is less than or equal to 5%, 8%, or 10% of either of them.

[0071] For ease of understanding, before introducing the cover plate and the electronic device in the embodiments of the present application in detail, the relevant terms involved in the embodiments of the present application are first described.

[0072] Physical thickness of the film layer: It is the actual thickness of the film layer, which can also be called the "geometric thickness".

[0073] Optical thickness of the film layer: It refers to the product of the refractive index of the film layer and the physical thickness of the film layer.

[0074] Physical vapor deposition (PVD): Physical vapor deposition refers to a technique in which, under vacuum conditions, a physical method is used to vaporize the material source (solid or liquid) on the surface into gaseous atoms or molecules, or partially ionize them into ions, and through a gas-phase process, deposit a thin film with a certain special function on the substrate surface. Physical vapor deposition techniques include vacuum evaporation techniques and magnetron sputtering techniques.

[0075] Sputtering: It is a type of PVD thin film preparation technique, mainly divided into four categories: DC sputtering, AC sputtering, reactive sputtering, and magnetron sputtering. The principle of sputtering is as follows: When charged particles bombard the target material, when the accelerated ions bombard the solid surface, surface atom collisions occur and energy and momentum transfer occur, causing the target material atoms to escape from the surface and deposit on the substrate material.

[0076] (L*, a*, b*) chromaticity system: It can also be called the Lab color space (also known as the CIELab color space), which is one of the methods for representing colors. The Lab color space is a color model determined by the International Commission on Illumination (also known as the CIE organization), which theoretically includes all colors visible to the human eye. The (L*, a*, b*) chromaticity system includes three elements: L value, a value, and b value. The L value represents brightness, and its value range is [0, 100], indicating from pure black to pure white; the a value represents the range from red to green, and its value range is [127, -128]; the b value represents the range from yellow to blue, and its value range is [127, -128]. All colors are composed of the interaction and change of these three values.

[0077] The L value, a value, and b value in the (L*, a*, b*) chromaticity system can be measured by a color difference meter. For example, they can be measured by a CM3600 color difference meter.

[0078] Covalent bond: A strong interaction formed by several adjacent atoms through sharing electrons and between the shared electrons is called a covalent bond. Its essence is the electrical interaction between the electrons that appear with a high probability between the two atomic nuclei after the overlap of atomic orbitals and the two atomic nuclei.

[0079] An embodiment of the present application provides an electronic device, which includes a cover plate, and the cover plate can be used as a light-transmitting cover plate, a back cover, etc. of the electronic device. In the electronic device according to the embodiment of the present application, by providing an anti-scratch film layer on the substrate of the cover plate and providing a doping element capable of forming a covalent bond with silicon element in the anti-scratch film layer, the appearance defect rate generated during the coating process can be reduced, so that while improving the anti-scratch performance of the cover plate, the appearance aesthetics of the electronic device can be improved.

[0080] An embodiment of the present application provides an electronic device, which includes but is not limited to mobile phones, tablet computers, notebook computers, laptop computers, personal digital assistants (PDAs), personal computers, vehicle-mounted devices, wearable devices, walkmans, radios, televisions, speakers, etc. Among them, wearable devices include but are not limited to bracelets, watches, smart head-mounted displays, smart clothes, smart glasses, and smart headphones, etc.

[0081] Please refer to Figure 1 and Figure 2 , Figure 1 which is a schematic structural diagram of an electronic device 100 provided by some embodiments of the present application. Figure 2 is Figure 1 a cross-sectional view of the electronic device 100 shown at line A-A. In this embodiment, the electronic device 100 is a straight-bar mobile phone. Specifically, the electronic device 100 includes a screen 10, a housing 20, a circuit board 30, and a battery 40. Since the circuit board 30 and the battery 40 are located inside the electronic device 100 and are not visible, the Figure 1 circuit board 30 and the battery 40 in

[0082] are represented by dashed lines. Figure 1 and Figure 2 and the related drawings below only schematically show some components included in the electronic device 100, and the actual shapes, actual sizes, actual positions, and actual structures of these components are not limited by Figure 1 and Figure 2 and the respective drawings below. In some other embodiments, the electronic device 100 may also not include the screen 10.

[0083] In Figure 1In the illustrated embodiment, the electronic device 100 is in the shape of a rectangular flat plate. To facilitate the description of the following embodiments, an XYZ coordinate system is established. Specifically, the width direction of the electronic device 100 is defined as the X-axis direction, the length direction of the electronic device 100 is defined as the Y-axis direction, and the thickness direction of the electronic device 100 is defined as the Z-axis direction. It can be understood that the coordinate system setting of the electronic device 100 can be flexibly set according to actual needs and is not specifically limited herein. In some other embodiments, the shape of the electronic device 100 can also be a square flat plate, a circular flat plate, an oval flat plate, and so on.

[0084] The screen 10 is used to display images, videos, etc. Please refer to Figure 2 , the screen 10 may include a light-transmitting cover plate 11 and a display screen 12. The display screen 12 can be a flexible display screen or a rigid display screen. The light-transmitting cover plate 11 and the display screen 12 are stacked and fixedly connected. Specifically, the light-transmitting cover plate 11 and the display screen 12 are stacked in the Z-axis direction. The light-transmitting cover plate 11 is mainly used to protect the display screen 12 and prevent dust. The light-transmitting cover plate 11 can be a 2D cover plate, a 2.5D cover plate, or a 3D cover plate.

[0085] Please refer to Figure 3 , Figure 3 is a side view of cover plates 50 of different shapes. Among them, Figure 3 in (a) is a side view of a 2D cover plate, Figure 3 in (b) is a side view of a 2.5D cover plate, Figure 3 in (c) is a side view of a 3D cover plate. Specifically, as shown in Figure 3 (a), the 2D cover plate is an ordinary flat plate without any arc design. As shown in Figure 3 (b), the middle part of the 2.5D cover plate is a flat plate, but the edge has a certain arc design. Compared with the 2D cover plate, the 2.5D cover plate has a radian treatment on the edge based on the flat cover plate. As shown in Figure 3 (c), the 3D cover plate adopts arc designs both in the middle part and the edge part of the cover plate. The curved surface design in the 3D cover plate can increase the visible area, better conform to the radian of the human eye retina, and bring a better visual experience.

[0086] The housing 20 is used to protect the internal electronic components of the electronic device 100. Please refer to Figure 2 , the housing 20 includes a back cover 21 and a frame 22. The frame 22 is located between the back cover 21 and the light-transmitting cover plate 11, and both the back cover 21 and the light-transmitting cover plate 11 are fixed to the frame 22. The light-transmitting cover plate 11, the back cover 21, and the frame 22 enclose the internal accommodation space of the electronic device 100. The back cover 21 can be a 2D cover plate, a 2.5D cover plate, or a 3D cover plate.

[0087] In some embodiments, please refer toFigure 2 The housing 20 further includes a middle plate 23. The middle plate 23 is fixed to the inner surface of the frame 22. The middle plate 23 is used as a structural "support frame" of the electronic device 100, and components such as the circuit board 30 and the battery 40 can be fixed on the middle plate 23.

[0088] See also Figure 1 The circuit board 30 may include a main circuit board 31 and a sub-circuit board 32. The main circuit board 31 may be used to integrate a control chip. The control chip may be, for example, an application processor (AP), a double data rate synchronous dynamic random access memory (DDR), and a universal flash storage (UFS). In some embodiments, the main circuit board 31 is electrically connected to the screen 10.

[0089] The auxiliary circuit board 32 can be used to integrate electronic components such as the RF front end of an antenna (such as a 5G antenna), a universal serial bus (USB) device, and a vibrator. The auxiliary circuit board 32 is electrically connected to the main circuit board 31. It is understood that in other embodiments, the circuit board 30 may also include only the main circuit board 31.

[0090] The battery 40 is used to provide power to electronic devices such as the display screen 12 and the circuit board 30 in the electronic device 100. In some embodiments, the battery 40 may be disposed between the main circuit board 31 and the auxiliary circuit board 32.

[0091] When the electronic device 100 is used without a protective film, visible scratches will generally appear on the cover plates such as the light-transmitting cover plate 11 and the back cover 21 after about a month of use. Moreover, as the use time of the electronic device 100 increases, there will be more and more scratches on the cover plates. The presence of these scratches will destroy the stress balance of the cover plate, resulting in a decrease in the impact resistance of the cover plate. At the same time, these scratches, even those that are not so obvious, will be unsightly and reduce the reputation of the electronic device 100. In addition, since scratches will enhance the scattering of light, when scratches appear on the light-transmitting cover plate 11, the brightness, clarity and contrast of the image displayed on the screen 10 will also be significantly reduced, affecting the display effect of the screen 10.

[0092] To improve the scratch resistance of the cover, refer to Figure 4 , Figure 4Schematic cross-sectional structure diagram of a cover plate 50 in the related art. The cover plate 50 includes a substrate 51 and a coating layer 52. Specifically, the substrate 51 includes a middle portion 501 and an edge portion 502. The edge portion 502 is arc-shaped. That is to say, the cover plate 50 is a 3D cover plate or a 2.5D cover plate. The coating layer 52 is disposed on the outer surface of the substrate 51. Among them, the "outer surface of the substrate 51" refers to the surface of the substrate 51 facing the outside of the electronic device 100.

[0093] The coating layer 52 includes an anti-scratch film layer 522 and an optical adjustment film layer 521. The optical adjustment film layer 521 includes an upper optical adjustment film layer 5211 and a lower optical adjustment film layer 5212. The lower optical adjustment film layer 5212 is disposed on the surface of the anti-scratch film layer 522 close to the substrate 51, and the upper optical adjustment film layer 5211 is disposed on the surface of the anti-scratch film layer 522 facing away from the substrate 51. Among them, both the upper optical adjustment film layer 5211 and the lower optical adjustment film layer 5212 include at least one high refractive index film layer and at least one low refractive index film layer that are sequentially stacked and alternately arranged, and the refractive index of the high refractive index film layer is greater than that of the low refractive index film layer. In this way, for light of a specific wavelength band, after being reflected and refracted by the respective film layers of the upper optical adjustment film layer 5211 and the lower optical adjustment film layer 5212, it is enhanced or weakened under the interference of light, so that the reflectivity of the cover plate 50 to visible light can be reduced, achieving the purpose of adjusting the optical performance of the cover plate 50.

[0094] The anti-scratch film layer 522 is composed of a high-hardness high refractive index material and is the main film layer for improving the anti-scratch performance of the cover plate 50. In order to ensure the anti-scratch performance of the cover plate 50, the thickness of the anti-scratch film layer 522 is usually greater than or equal to 500 nm.

[0095] The coating layer 52 has strong anti-scratch ability and can significantly improve the anti-scratch ability of the cover plate 50. Therefore, the cover plate 50 (such as a glass cover plate) including the coating layer 52 can meet the requirements of the external cover plate 50. At the same time, the coating layer 52 can reduce the reflectivity of the substrate 51, improve the light transmittance of the cover plate 50, and improve the optical performance of the cover plate 50. For example, when the substrate 51 is glass, the reflectivity of the glass is about 8.4%, and the light transmittance is about 92%. After the above coating layer 52 is disposed on one side of the substrate 51 (that is, single-sided coating), the reflectivity of the cover plate 50 can reach less than or equal to 5.2%, and the light transmittance can reach greater than or equal to 95%. After the above coating layer 52 is disposed on both sides of the substrate 51 (that is, double-sided coating), the reflectivity of the cover plate 50 can reach less than or equal to 1%, and the light transmittance can reach greater than or equal to 98%.

[0096] However, since the scratch-resistant film layer 522 is usually processed by sputtering. Sputtering is a process in which charged particles bombard the target material, causing the target atoms to escape from the surface and deposit on the substrate material. However, the target material has poor electrical conductivity, which can cause charge accumulation on the surface of the target. When the charge accumulates to a certain amount, it will be released at the lowest point of the surface resistance of the target, causing an arc discharge phenomenon (which can also be called "target flashing"). At the same time, large particle sputtering products will be generated and sputtered onto the surface of the substrate 51. The large particle sputtering products are likely to fall off during subsequent cleaning processes, and then pits 50a (commonly known as white spots) are formed on the surface of the cover plate 50, resulting in appearance defects.

[0097] Specifically, when the scratch-resistant film layer 522 is deposited to a certain thickness, the charge accumulated on the surface of the target may be released, resulting in "target flashing" and causing appearance defects on the cover plate 50. Moreover, the probability of generating appearance defects during the coating process will increase linearly with the increase of the film layer thickness, resulting in an increase in the appearance defect rate of the cover plate 50 and a decrease in the product yield. That is to say, the greater the thickness of the scratch-resistant film layer 522, the greater the probability of appearance defects on the cover plate 50 caused by "target flashing". For example, when the cover plate 50 does not include the scratch-resistant film layer 522, the appearance yield of the cover plate 50 can reach more than 95%. When the cover plate 50 includes the scratch-resistant film layer 522 and the thickness of the scratch-resistant film layer 522 reaches more than 500 nm, the appearance yield of the cover plate 50 will drop below 60%.

[0098] In addition, since the materials that can play a scratch-resistant role in the scratch-resistant film layer 522 are usually high-hardness materials, and the refractive indices of high-hardness materials are relatively high, up to more than 1.9. On this basis, in order to adjust the appearance color of the cover plate 50 to the target color, the optical adjustment film layer 521 needs to reach a certain thickness. For example, the target color can be colorless, and the corresponding a value is 0 and the b value is 0 in the (L*, a*, b*) chromaticity system.

[0099] In this way, at different viewing angles, the optical thickness of the optical adjustment film layer 521 that the light passes through is different, that is, the optical path of the light is different. Then, the absorption of light by the optical adjustment film layer 521 is different, and the wavelength of the reflected light is also different. Therefore, at different viewing angles, the cover plate 50 will present different colors, resulting in the problem of angular color change. The essence of the angular color change problem is that the change of the incident angle (which can also be called the viewing angle) affects the optical thickness of the film layer, and the influence on the optical thickness of the film layer leads to the drift of the wavelength. This influence is particularly prominent when the film layer is relatively thick. Especially when the cover plate 50 is used as the light-transmitting cover plate 11, the light of the display screen 12 needs to pass through the light-transmitting cover plate 11 and shoot outwards, and the angular color change problem will also affect the display effect of the screen 10. Among them, the incident angle is the angle between the incident light and the normal of the cover plate 50.

[0100] Please refer to Figure 5 , Figure 5 which is Figure 4 a schematic diagram showing the spectral changes of the cover plate 50 at different incident angles. Figure 5 In , the abscissa is the wavelength of the light, with the unit of nm. The ordinate is the reflectivity, with the unit of %. Figure 5 In , the curve L1 is the spectrum of the cover plate 50 at an incident angle of 0 degrees, the curve L2 is the spectrum of the cover plate 50 at an incident angle of 35 degrees, and the curve L3 is the spectrum of the cover plate 50 at an incident angle of 70 degrees.

[0101] It can be seen from that Figure 5 the larger the incident angle of the cover plate 50, the greater the reflectivity of the cover plate 50 to light, and the more obvious the angle color change problem.

[0102] In addition, the optical adjustment film layer 521 is usually formed by processes such as physical vapor deposition, chemical vapor deposition, and atomic deposition. When the cover plate 50 is a 3D cover plate or a 2.5D cover plate, please refer to Figure 4 , the thickness d2 of the coating layer 52 at the edge portion 502 of the substrate 51 is less than the thickness d1 of the coating layer 52 at the middle portion 501 of the substrate 51. Therefore, it is easy to generate rainbow edges at the junction of the middle portion 501 and the edge portion 502 of the cover plate 50 after coating, which affects the appearance of the cover plate 50 and the display effect of the screen 10.

[0103] Please refer to Figure 6 , Figure 6 which is a schematic cross-sectional structure diagram of another cover plate 50 in the related art. The cover plate 50 includes a substrate 51 and a diamond-like carbon (DLC) film layer 53. The diamond-like carbon film layer 53 is disposed on the surface of the substrate 51.

[0104] The diamond-like carbon film layer 53 has a high hardness, and the Mohs hardness can reach 10, which can improve the overall hardness of the cover plate 50. Moreover, the diamond-like carbon film layer 53 has a low dynamic friction coefficient, generally less than 0.05, which can make the user have a smooth touch when touching the cover plate 50, and is beneficial to improving the user experience. In addition, the physical thickness of the diamond-like carbon film layer 53 is relatively thin, and there will be no appearance defects during the processing, and there will be no angle color change problem and rainbow edge problem when coating on 2.5D cover plates and 3D cover plates.

[0105] However, since the diamond-like carbon film layer 53 contains black graphite molecules and has strong light absorption, the thickness of the film layer cannot be set too large, otherwise it will affect the optical performance of the cover plate 50. Specifically, after the diamond-like carbon film layer 53 with a thickness of less than 15 nm is provided on the glass substrate, the light transmittance of the cover plate 50 will drop to 90%. And since the diamond-like carbon film layer 53 is relatively thin at this time, the film layer is easily pierced, and the improvement of the scratch resistance of the cover plate 50 is not obvious.

[0106] Therefore, the cover plate 50 in the related art cannot balance the scratch resistance and the appearance yield. On this basis, in order to improve the scratch resistance of the cover plate 50 and at the same time improve the appearance yield of the cover plate 50, please refer to Figure 7 , Figure 7 which is a partial cross-sectional view of the cover plate 50 provided in some embodiments of the present application. The cover plate 50 in this embodiment can be used as the light-transmitting cover plate 11 of the electronic device 100, or can be used as the back cover 21 of the electronic device 100. In the following embodiments, the case where the cover plate 50 is used as the light-transmitting cover plate 11 of the electronic device 100 will be taken as an example for description.

[0107] Please refer to Figure 7 , the cover plate 50 includes a substrate 51, an optical adjustment film layer 521, and a scratch-resistant film layer 522. The substrate 51 includes a first surface 511 and a second surface 512 that face away from each other in its thickness direction (i.e., the Z-axis direction shown in Figure 7 ). The first surface 511 can be the outer surface of the substrate 51, and the second surface 512 can be the inner surface of the substrate 51. That is, the first surface 511 can face the outside of the electronic device 100, and the second surface 512 can face the inside of the electronic device 100.

[0108] In some embodiments, the substrate 51 is a glass substrate. Exemplarily, the substrate 51 can be an inorganic glass system substrate such as a microcrystalline glass substrate, a soda-lime glass substrate, or an aluminosilicate glass substrate. In other embodiments, the substrate 51 can also be an organic substrate such as a polymethyl methacrylate (PMMA) substrate or a polycarbonate (PC) substrate. In still other embodiments, the substrate 51 can also be a ceramic substrate.

[0109] The scratch-resistant film layer 522 and the substrate 51 are stacked. For example, the scratch-resistant film layer 522 can be disposed on the first surface 511 of the substrate 51. Specifically, the scratch-resistant film layer 522 can be directly formed on the first surface 511 of the substrate 51, or can be formed on the surface of other film layers located on the first surface 511 of the substrate 51. The scratch-resistant film layer 522 includes silicon element (Si) and doping elements. The doping elements can form covalent bonds with the silicon element, and the doping elements do not include nitrogen element (N). It can be understood that the scratch-resistant film layer 522 may or may not include nitrogen element. When the scratch-resistant film layer 522 includes nitrogen element, the nitrogen element is not regarded as a doping element.

[0110] The doping elements include at least one +3 valence element, and / or at least one +5 valence element, and the doping elements do not include nitrogen element. Specifically, the doping elements can include at least one element in Group 13 of the periodic table and / or at least one element in Group 15 of the periodic table, and the doping elements do not include nitrogen element. Exemplarily, the doping elements can include at least one element among boron element (B), aluminum element (Al), gallium element (Ga), indium element (In), thallium element (Tl), phosphorus element (P), arsenic element (As), antimony element (Sb), tellurium element (Te). The doping elements can include one element or multiple elements.

[0111] The doping elements are used to form covalent bonds with the silicon element. Since the outer layer of the silicon element includes four electrons and the outer layer of the +3 valence element includes three electrons, when the +3 valence element forms a covalent bond with the silicon element, a hole can be generated. The outer layer of the +5 valence element includes five electrons, and when the +5 valence element forms a covalent bond with the silicon element, a free electron can be generated. Both the hole and the free electron can improve the electrical conductivity of the substance.

[0112] In this way, when processing the scratch-resistant film layer 522, the above-mentioned doping elements can be added to the silicon target to improve the electrical conductivity of the silicon target. Thus, during the sputtering process of the scratch-resistant film layer 522, the accumulation of charges on the surface of the silicon target can be effectively avoided, which is beneficial to reducing the probability of arc discharge phenomenon during the sputtering process. Furthermore, the generation of large particle sputtering substances during the sputtering process can be avoided, the probability of forming "white spots" on the surface of the cover plate 50 can be effectively reduced, and the appearance yield of the cover plate 50 can be improved. Therefore, the cover plate 50 in the embodiment of the present application can effectively avoid forming "white spots" on the surface of the cover plate 50 by providing the scratch-resistant film layer 522 including silicon element and doping elements, thereby improving the appearance yield of the cover plate 50.

[0113] In some embodiments, the mass fraction w1 of the doping element in the scratch-resistant film layer 522 is greater than or equal to 0.2%. Wherein, the mass fraction w1 of the doping element refers to the ratio of the mass m1 of the doping element to the total mass m of the scratch-resistant film layer 522. Wherein, the mass fraction of the doping element can be measured by an energy dispersive spectrometer (EDS).

[0114] Exemplarily, the mass fraction w1 of the doping element can be 0.2%, 0.25%, 0.3%, 0.35%, 0.4%, 0.45%, 0.5%, 0.6%, 0.7%, 0.8%, 0.9%, 1.0%, 1.2%, 1.5%, 1.8%, 2.0%, 2.1%, 2.2%, 2.3%, 2.5%, 2.8%, 3.0%, 3.5%, 4%, etc. In this way, the electrical conductivity of the silicon target can be effectively improved.

[0115] On this basis, in order to avoid the influence of the doping element on the optical performance of the cover plate 50, the mass fraction w1 of the doping element in the scratch-resistant film layer 522 is less than or equal to 3%.

[0116] In some embodiments, the physical thickness t1 of the scratch-resistant film layer 522 is greater than or equal to 500 nm and less than or equal to 3000 nm. Exemplarily, the physical thickness t1 of the scratch-resistant film layer 522 can be 500 nm, 600 nm, 700 nm, 800 nm, 900 nm, 1000 nm, 1100 nm, 1200 nm, 1300 nm, 1400 nm, 1500 nm, 1600 nm, 1700 nm, 1750 nm, 1800 nm, 1850 nm, 1900 nm, 1950 nm, 2000 nm, 2100 nm, 2200 nm, 2300 nm, 2400 nm, 2500 nm, 2600 nm, 2700 nm, 2800 nm, 2900 nm, 3000 nm, etc. In this way, the scratch-resistant function of the scratch-resistant film layer 522 can be ensured, and the overall thickness of the cover plate 50 can be reduced.

[0117] It should be noted that the "physical thickness of the film layer" described in the embodiments of the present application refers to the distance between the surface of one side of the film layer facing away from the substrate 51 and the surface of the other side of the film layer facing the substrate 51.

[0118] In some embodiments, the Vickers hardness (designated as HV) of the scratch-resistant film layer 522 is greater than or equal to 1100 HV. Specifically, when performing a hardness test on the cover plate 50 including the scratch-resistant film layer 522 using a Vickers indentation instrument, when the surface indentation depth of the cover plate 50 is approximately 100 nanometers (nm), the measured Vickers hardness is greater than or equal to 1100 HV. Exemplarily, the Vickers hardness of the scratch-resistant film layer 522 can be 1100 HV, 1200 HV, 1300 HV, 1400 HV, 1500 HV, 1600 HV, 1700 HV, 1800 HV, 1900 HV, 2000 HV, 2200 HV, 2500 HV, 3000 HV, etc. In this way, the wear resistance, corrosion resistance, drop resistance, scratch resistance, etc. of the cover plate 50 can be improved, which is beneficial to reducing scratches on the cover plate 50, enhancing the aesthetic appearance of the cover plate 50 and the electronic device 100 including the cover plate 50, and extending the service life of the cover plate 50 and the electronic device 100.

[0119] Based on any of the above embodiments, to solve the problems of angular color change and rainbow edge of the cover plate 50, in some embodiments, the scratch-resistant film layer 522 includes a first material and a second material. That is to say, the scratch-resistant film layer 522 is a mixture of multiple materials. Among them, the first material and the second material can be atomically mixed. The refractive index of the first material is greater than or equal to the refractive index of the substrate 51, and the refractive index of the second material is less than or equal to the refractive index of the substrate 51. In this way, after the first material and the second material are mixed, the refractive index of the scratch-resistant film layer 522 can be adjusted, reducing the difference between the refractive index of the scratch-resistant film layer 522 and the refractive index of the substrate 51, thereby reducing the difficulty of adjusting the optical properties and appearance color of the cover plate 50, being beneficial to thinning the thickness of the optical adjustment film layer 521, and further reducing the difference in the optical thickness of the optical adjustment film layer 521 at different incident angles, effectively improving the problems of angular color change and rainbow edge, making the optical adjustment film layer 521 applicable not only to 2D cover plates but also to 3D cover plates or 2.5D cover plates.

[0120] Specifically, the Vickers hardness of the first material can be greater than or equal to 1100 HV. Exemplarily, the Vickers hardness of the first material can be 1100 HV, 1200 HV, 1300 HV, 1400 HV, 1500 HV, 1600 HV, 1700 HV, 1800 HV, 1900 HV, 2000 HV, 2200 HV, 2500 HV, 3000 HV, etc. In this way, the Vickers hardness of the scratch-resistant film layer 522 can be increased, thereby improving the wear resistance, corrosion resistance, drop resistance, scratch resistance, etc. of the cover plate 50.

[0121] In some embodiments, the substrate 51 is a glass substrate, and the refractive index n of the scratch-resistant film layer 522 kGreater than or equal to 1.46 and less than or equal to 1.85. Exemplarily, the refractive index n of the scratch-resistant film layer 522 k can be 1.46, 1.5, 1.52, 1.58, 1.6, 1.62, 1.65, 1.7, 1.72, 1.75, 1.78, 1.8, 1.85. The refractive index n of the glass substrate g is approximately 1.52. By setting the refractive index n of the scratch-resistant film layer 522 k to be greater than or equal to 1.46 and less than or equal to 1.85, the difference between the refractive index n of the scratch-resistant film layer 522 k and the refractive index n of the substrate 51 g can be reduced, making the material of the scratch-resistant film layer 522 and the material of the substrate 51 close to being homogeneous. Thus, the difficulty of adjusting the optical properties and the appearance color of the cover plate 50 can be reduced, which is beneficial to thinning the thickness of the optical adjustment film layer 521, and effectively improving both the angular discoloration problem and the rainbow edge problem.

[0122] Furthermore, the refractive index n of the scratch-resistant film layer 522 k is greater than or equal to 1.65 and less than or equal to 1.85. In this way, while improving the angular discoloration problem and the rainbow edge problem, a relatively large Vickers hardness of the scratch-resistant film layer 522 can be ensured.

[0123] In some embodiments, the first material may include at least one of silicon nitride (Si3N4), aluminum nitride (AlN), niobium oxide (Nb2O5), titanium oxide (TiO2), tantalum oxide (Ta2O5), and aluminum oxide (Al2O3). The second material may include at least one of silicon oxide (SiO2), magnesium fluoride (MgF2), and calcium fluoride (CaF2). These materials have excellent optical properties, can meet the refractive index requirements for the first material and the second material, and have relatively large Vickers hardness, which can increase the hardness of the optical adjustment film layer 521, and further improve the scratch resistance of the cover plate 50.

[0124] According to the Lorentz-Lorenz dispersion theory formula for the refractive index and composition ratio of thin film multi-materials, the refractive index n of the scratch-resistant film layer 522 after mixing multiple materials k satisfies the following formula (1):

[0125]

[0126] where N is the number of types of materials in the scratch-resistant film layer 522. Specifically, N is the sum of the number of types of materials in the first material and the number of types of materials in the second material; a i =(n i 2 +2) -1 , ρ iis the density of the i-th material, C i is the mass fraction of the i-th material, n i is the refractive index of the i-th material. According to the mass proportion of different materials in the mixture, the refractive index n of the scratch-resistant film layer 522 can be calculated k .

[0127] Exemplarily, when the first material includes one material and the second material includes one material, the mass fraction of the first material is c H , the density of the first material is ρ H , the refractive index of the first material is n H ; the mass fraction of the second material is c L , the density of the second material is ρ L , the refractive index of the second material is n L . The sum of the mass fraction c H of the first material and the mass fraction c L of the second material is 1. Therefore, c L = 1 - c H . Substituting c L = 1 - c H into the above formula (1), formula (1) can be simplified to the following formula (2):

[0128]

[0129] For example, in some embodiments, the first material is silicon nitride (Si3N4) and the second material is silicon dioxide (SiO2). The substance formed after atomic-level mixing of the first material and the second material can be called silicon oxynitride (SiO x N y ), and the refractive index n of the scratch-resistant film layer 522 can be adjusted by adjusting the mass ratio of silicon nitride and silicon dioxide k . Wherein, both x and y are positive numbers. Another example, in some other embodiments, the first material is aluminum oxide (Al2O3) and the second material is silicon dioxide (SiO2). The substance formed after atomic-level mixing of the first material and the second material can be called aluminum oxynitride (AlO m N n ), and the refractive index n of the scratch-resistant film layer 522 can be adjusted by adjusting the mass ratio of aluminum oxide and silicon dioxide k . Wherein, both m and n are positive numbers.

[0130] Specifically, when the first material is silicon nitride (Si3N4) and the second material is silicon dioxide (SiO2), the refractive index n of the scratch-resistant film layer 522 corresponding to different mass fractions of silicon nitride kWhen the first material is alumina (Al2O3) and the second material is silica (SiO2), the refractive index n of the scratch-resistant film layer 522 corresponding to different mass fractions of alumina k As shown in Table 1.

[0131] Table 1

[0132]

[0133] It can be seen from Table 1 that when the first material is silicon nitride (Si3N4), the second material is silica (SiO2), and the mass fraction of silicon nitride is greater than or equal to 10% and less than or equal to 80%, the refractive index n of the scratch-resistant film layer 522 k can be controlled within 1.49 - 1.85, which can reduce the difference between the refractive index of the scratch-resistant film layer 522 and the refractive index of the substrate 51, making the scratch-resistant film layer 522 and the substrate 51 closer to being of the same quality, facilitating the thinning of the thickness of the optical adjustment film layer 521, and effectively improving the angular color change problem and the rainbow edge problem of the cover plate 50.

[0134] Furthermore, when the first material is silicon nitride (Si3N4), the second material is silica (SiO2), and the mass fraction of silicon nitride is greater than or equal to 10% and less than or equal to 50%, the refractive index n of the scratch-resistant film layer 522 k can be controlled within 1.49 - 1.66, which can further reduce the difference between the refractive index of the scratch-resistant film layer 522 and the refractive index of the substrate 51, making the scratch-resistant film layer 522 and the substrate 51 even closer to being of the same quality, and then facilitating the further thinning of the thickness of the optical adjustment film layer 521, and further improving the angular color change problem and the rainbow edge problem of the cover plate 50.

[0135] When the first material is alumina (Al2O3), the second material is silica (SiO2), and the mass fraction of alumina is greater than or equal to 10% and less than 100%, the refractive index n of the scratch-resistant film layer 522 k can be controlled within 1.47 - 1.7, which can reduce the difference between the refractive index of the scratch-resistant film layer 522 and the refractive index of the substrate 51, making the scratch-resistant film layer 522 and the substrate 51 closer to being of the same quality, facilitating the thinning of the thickness of the optical adjustment film layer 521, and effectively improving the angular color change problem and the rainbow edge problem of the cover plate 50.

[0136] Further, when the first material is aluminum oxide (Al2O3), the second material is silicon dioxide (SiO2), and the mass fraction of aluminum oxide is greater than or equal to 20% and less than 80%, the refractive index of the anti-scratch film layer can be controlled within 1.49 to 1.62, which can further reduce the difference in refractive index between the anti-scratch film layer 522 and the substrate 51, making the anti-scratch film layer 522 and the substrate 51 closer to being homogeneous. Furthermore, it is beneficial to further reduce the thickness of the optical adjustment film layer 521, and can further improve the angular color change problem and rainbow edge problem of the cover plate 50.

[0137] In some embodiments, referring to Figure 7 , the optical adjustment film layer 521 includes an upper optical adjustment film layer 5211 and a lower optical adjustment film layer 5212. The upper optical adjustment film layer 5211 is disposed on the surface of the anti-scratch film layer 522 facing away from the substrate 51. The lower optical adjustment film layer 5212 is disposed on the surface of the anti-scratch film layer 522 close to the substrate 51. The material of the optical adjustment film layer 521 can be a dielectric material. Optionally, both the upper optical adjustment film layer 5211 and the lower optical adjustment film layer 5212 are colorless and transparent film layers.

[0138] Optical technicians can design the film system of the optical adjustment film layer 521 on optical thin film software (such as TFCale software, Macleod software, etc.). It can be understood that in other embodiments, the optical adjustment film layer 521 may also only include the upper optical adjustment film layer 5211 without including the lower optical adjustment film layer 5212, or the optical adjustment film layer 521 may also only include the lower optical adjustment film layer 5212 without including the upper optical adjustment film layer 5211.

[0139] Specifically, in some embodiments, the upper optical adjustment film layer 5211 is a single-layer film layer, and the refractive index of the upper optical adjustment film layer 5211 is less than that of the anti-scratch film layer 522. In this way, by designing the upper optical adjustment film layer 5211 as a single-layer film system, on the one hand, the structure of the upper optical adjustment film layer 5211 can be simplified, the total thickness of the optical adjustment film layer 521 can be reduced, and thus the difference in optical thickness of the optical adjustment film layer 521 at different incident angles can be reduced, improving the angular color change problem and rainbow edge problem; moreover, the anti-scratch film layer 522 and the upper optical adjustment film layer 5211 can form a composite film layer with a high refractive index film layer and a low refractive index film layer stacked. The light reflected and refracted by the anti-scratch film layer 522 and the upper optical adjustment film layer 5211 interfere with each other, which can enhance the reflectivity of light in a specific wavelength band in the outgoing light, and can further improve the light transmittance of the cover plate 50, achieving the purpose of optimizing the optical performance of the cover plate 50 and adjusting the appearance color of the cover plate 50.

[0140] In some embodiments, the refractive index of the upper optical adjustment film layer 5211 is greater than or equal to 1.55 and less than or equal to 1.65. Exemplarily, the refractive index of the upper optical adjustment film layer 5211 can be 1.55, 1.56, 1.57, 1.58, 1.59, 1.6, 1.61, 1.62, 1.63, 1.64, 1.65, etc. In this way, it is beneficial to reduce the difference in the optical thickness of the upper optical adjustment film layer 5211 at different incident angles, and thus can improve the angle discoloration problem and the rainbow edge problem of the cover plate 50.

[0141] In some embodiments, the material of the upper optical adjustment film layer 5211 can include one or more. When the upper optical adjustment film layer 5211 includes multiple materials, the upper optical adjustment film layer 5211 includes at least one high refractive index material and at least one low refractive index material. The refractive index of the high refractive index material is greater than that of the low refractive index material. In this way, by adjusting the mass ratio of the high refractive index material and the low refractive index material, the upper optical adjustment film layer 5211 can have a corresponding refractive index, and the processing difficulty of the upper optical adjustment film layer 5211 can be reduced.

[0142] In some embodiments, the refractive index of the high refractive index material is greater than or equal to 1.6, and the refractive index of the low refractive index material is greater than or equal to 1.4 and less than 1.6. In this way, both the high refractive index material and the low refractive index material are easy to obtain, and it is convenient to meet the refractive index requirements of the upper optical adjustment film layer 5211.

[0143] Exemplarily, the high refractive index material can be silicon nitride (Si3N4), aluminum nitride (AlN), niobium oxide (Nb2O5), titanium oxide (TiO2), tantalum oxide (Ta2O5), zirconium nitride (ZrN), silicon oxynitride (SiO x N y )、aluminum oxynitride (AlO m N n ), etc. The low refractive index material can be silicon dioxide (SiO2), magnesium fluoride (MgF2), etc. These materials have excellent optical properties and can meet the refractive index requirements. In addition, these materials are easy to obtain, and the processing difficulty of the upper optical adjustment film layer 5211 can be reduced.

[0144] In some embodiments, please refer to Figure 7, the physical thickness t2 of the upper optical adjustment film layer 5211 is less than or equal to 300 nm. Further, the physical thickness t2 of the upper optical adjustment film layer 5211 is greater than or equal to 30 nm. Exemplarily, the physical thickness t2 of the upper optical adjustment film layer 5211 can be 300 nm, 280 nm, 260 nm, 250 nm, 240 nm, 220 nm, 200 nm, 180 nm, 160 nm, 150 nm, 130 nm, 120 nm, 100 nm, 90 nm, 80 nm, 70 nm, 60 nm, 50 nm, 30 nm, etc. In this way, the difference in the optical thickness of the upper optical adjustment film layer 5211 at different incident angles can be reduced, and further, the angle color change problem and the rainbow edge problem of the cover plate 50 can be improved.

[0145] Based on any of the above embodiments, the ratio B1 of the physical thickness t1 of the scratch-resistant film layer 522 to the physical thickness t2 of the upper optical adjustment film layer 5211 is greater than or equal to 10. Further, B1 is greater than or equal to 10. Exemplarily, B1 can be 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 25, 26, 30, 35, 40, 50, 60, 70, etc. In this way, the thickness difference between the scratch-resistant film layer 522 and the upper optical adjustment film layer 5211 is large, so that the scratch-resistant film layer 522 and the upper optical adjustment film layer 5211 as a whole can be regarded as a single-layer film system, thereby further improving the angle color change problem and the rainbow edge problem of the cover plate 50.

[0146] In some embodiments, the lower optical adjustment film layer 5212 is a single-layer film layer, and the refractive index of the lower optical adjustment film layer 5212 is less than that of the scratch-resistant upper film layer. In this way, by designing the lower optical adjustment film layer 5212 as a single-layer film system, on the one hand, the structure of the lower optical adjustment film layer 5212 can be simplified, the total thickness of the optical adjustment film layer 521 can be reduced, and further, the difference in the optical thickness of the optical adjustment film layer 521 at different incident angles can be reduced, improving the angle color change problem and the rainbow edge problem of the cover plate 50. On the other hand, the scratch-resistant film layer 522 and the lower optical adjustment film layer 5212 can form a composite film layer with a high refractive index film layer and a low refractive index film layer stacked. The light reflected and refracted by the scratch-resistant film layer 522 and the lower optical adjustment film layer 5212 interferes with each other, which can enhance the reflectivity of light with a specific wavelength in the outgoing light, and further improve the light transmittance of the cover plate 50, achieving the purpose of optimizing the optical performance of the cover plate 50 and adjusting the appearance color of the cover plate 50.

[0147] In some embodiments, the refractive index of the lower optical adjustment film layer 5212 is greater than or equal to 1.55 and less than or equal to 1.65. Exemplarily, the refractive index of the lower optical adjustment film layer 5212 can be 1.55, 1.56, 1.57, 1.58, 1.59, 1.6, 1.61, 1.62, 1.63, 1.64, 1.65, etc. In this way, it is beneficial to reduce the difference in the optical thickness of the lower optical adjustment film layer 5212 at different incident angles, and improve the angular color change problem and the rainbow edge problem of the cover plate 50. And these materials are easy to obtain, which can reduce the processing difficulty of the cover plate 50.

[0148] The material of the lower optical adjustment film layer 5212 can include one or more. When the lower optical adjustment film layer 5212 includes multiple materials, the lower optical adjustment film layer 5212 includes at least one high refractive index material and at least one low refractive index material. The refractive index of the high refractive index material is greater than that of the low refractive index material. The material of the lower optical adjustment film layer 5212 can be designed with reference to the material of the upper optical adjustment film layer 5211, which will not be described in detail here. Additionally, it can be understood that the material of the lower optical adjustment film layer 5212 can be the same as or different from the material of the upper optical adjustment film layer 5211.

[0149] In some embodiments, referring to Figure 7 , the physical thickness t3 of the lower optical adjustment film layer 5212 is less than or equal to 300 nm. Further, the physical thickness t3 of the upper optical adjustment film layer 5211 is greater than or equal to 30 nm. Exemplarily, the physical thickness t3 of the lower optical adjustment film layer 5212 can be 300 nm, 280 nm, 260 nm, 250 nm, 240 nm, 220 nm, 200 nm, 180 nm, 160 nm, 150 nm, 130 nm, 120 nm, 100 nm, 90 nm, 80 nm, 70 nm, 60 nm, 50 nm, 30 nm, etc. In this way, it can reduce the difference in the optical thickness of the lower optical adjustment film layer 5212 at different incident angles, and improve the angular color change problem and the rainbow edge problem of the cover plate 50.

[0150] The ratio B2 of the physical thickness t1 of the scratch-resistant film layer 522 to the physical thickness t3 of the lower optical adjustment film layer 5212 is greater than or equal to 10. Exemplarily, B2 can be 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 25, 26, 30, 35, 40, 50, 60, 70, etc. In this way, the thickness difference between the scratch-resistant film layer 522 and the lower optical adjustment film layer 5212 is large, so that the scratch-resistant film layer 522 and the lower optical adjustment film layer 5212 as a whole can be regarded as a single-layer film system, thereby further improving the angular color change problem and the rainbow edge problem of the cover plate 50.

[0151] In some other embodiments, refer to Figure 8 , Figure 8 which is a partial cross-sectional view of the cover plate 50 provided in some other embodiments of the present application. The difference between the cover plate 50 in this embodiment and the cover plate 50 in the embodiment shown in Figure 7 is that in this embodiment, the upper optical adjustment film layer 5211 of the cover plate 50 includes at least one first high refractive index film layer 5211a and at least one first low refractive index film layer 5211b that are sequentially stacked and alternately arranged, and the refractive index of the first high refractive index film layer 5211a is greater than that of the first low refractive index film layer 5211b.

[0152] Specifically, the first high refractive index film layer 5211a can be one or more. When there are multiple first high refractive index film layers 5211a, the refractive indices of the multiple first high refractive index film layers 5211a can be the same or different. Similarly, the first low refractive index film layer 5211b can be one or more. When there are multiple first low refractive index film layers 5211b, the refractive indices of the multiple first low refractive index film layers 5211b can be the same or different.

[0153] In practical applications, by designing the thickness and refractive index of each film layer in the upper optical adjustment film layer 5211, different outgoing light rays can interfere with each other, thereby achieving the purpose of adjusting the optical performance and appearance color of the cover plate 50. The specific structural design of the upper optical adjustment film layer 5211 can be carried out on optical software (such as TFCale software, Macleod software, etc.).

[0154] Further, refer to Figure 8 , the film layer closest to the scratch-resistant film layer 522 in the upper optical adjustment film layer 5211 is the first low refractive index film layer 5211b, and the refractive index of the first low refractive index film layer 5211b closest to the scratch-resistant film layer 522 in the upper optical adjustment film layer 5211 is less than the refractive index of the scratch-resistant film layer 522. In this way, the scratch-resistant film layer 522 and the upper optical adjustment film layer 5211 can form alternately arranged high refractive index film layers and low refractive index film layers. The light rays reflected and refracted by the scratch-resistant film layer 522 and the upper optical adjustment film layer 5211 interfere with each other, which can enhance the reflectivity of light with a specific wavelength in the outgoing light rays, further improve the light transmittance of the cover plate 50, and achieve the purpose of optimizing the optical performance of the cover plate 50 and adjusting the appearance color of the cover plate 50.

[0155] In some embodiments, continue to refer to Figure 8 , the lower optical adjustment film layer 5212 includes at least one second high refractive index film layer 5212a and at least one second low refractive index film layer 5212b that are sequentially stacked and alternately arranged, and the refractive index of the second high refractive index film layer 5212a is greater than that of the second low refractive index film layer 5212b.

[0156] Please refer to Figure 8 , in the lower optical adjustment film layer 5212, the film layer closest to the scratch-resistant film layer 522 is the second low-refractive-index film layer 5212b, and the refractive index of the second low-refractive-index film layer 5212b closest to the scratch-resistant film layer 522 in the lower optical adjustment film layer 5212 is less than the refractive index of the scratch-resistant film layer 522. In this way, the scratch-resistant film layer 522 and the lower optical adjustment film layer 5212 can form alternately arranged high-refractive-index film layers and low-refractive-index film layers. The light reflected and refracted by the scratch-resistant film layer 522 and the upper optical adjustment film layer 5211 interferes with each other, which can enhance the reflectivity of light with a specific wavelength in the outgoing light, further improve the light transmittance of the cover plate 50, and achieve the purpose of optimizing the optical performance of the cover plate 50 and adjusting the appearance color of the cover plate 50.

[0157] It can be understood that the upper optical adjustment film layer 5211 in this embodiment can be applied to the cover plate 50 in any embodiment of the present application. Similarly, the lower optical adjustment film layer 5212 in this embodiment can be applied to the cover plate 50 in any embodiment of the present application.

[0158] Please refer to Figure 9 , Figure 9 which is a partial cross-sectional view of the cover plate 50 provided by some other embodiments of the present application. In this embodiment, in addition to including the substrate 51, the scratch-resistant film layer 522, and the optical adjustment film layer 521, the cover plate 50 further includes an underlayer 523. The underlayer 523 can be stacked on the surface of the substrate 51 facing the scratch-resistant film layer 522. For example, the underlayer 523 can be disposed between the first surface 511 of the substrate 51 and the lower optical adjustment film layer 5212.

[0159] The material of the underlayer 523 includes at least one of aluminum, chromium, titanium, silicon, and silicon oxide. The underlayer 523 is used to increase the adhesion between the film layer closest to the first surface 511 of the substrate 51 and the substrate 51, and can effectively prevent the film layer on the substrate 51 from peeling off. At the same time, the underlayer 523 can also provide a cut-off interface for stripping the defective film layer, preventing the stripping solution from damaging the substrate 51. The underlayer 523 in this embodiment can be applied to the cover plate 50 in any embodiment of the present application.

[0160] Among them, the number of layers of the underlayer 523 can be one or more. In practical applications, the specific material and number of layers of the underlayer 523 can be selected according to the material of the substrate 51. For example, when the material of the substrate 51 is glass or ceramic, the underlayer 523 can be set to one layer, and the material of the underlayer 523 includes silicon dioxide (SiO2). When the material of the substrate 51 is plastic, the underlayer 523 can be set to one layer, and the underlayer 523 includes elemental silicon (Si). When the material of the substrate 51 is stainless steel, the underlayer 523 can be set to one layer, and the material of the underlayer 523 includes chromium silicon. When the material of the substrate 51 is aluminum alloy, the underlayer 523 can be set to two layers. In this case, the underlayer 523 includes a first underlayer and a second underlayer. The first underlayer is disposed on the first surface 511 of the substrate 51, and the second underlayer is disposed on the surface of the first underlayer facing away from the substrate 51. The material of the first underlayer includes metallic aluminum, and the material of the second underlayer includes metallic chromium (Gr). When the material of the substrate 51 is titanium alloy, the underlayer 523 can be set to one layer, and the material of the underlayer 523 includes metallic titanium.

[0161] In some embodiments, please refer to Figure 9 , the physical thickness t4 of the underlayer 523 is greater than or equal to 10 nm and less than or equal to 50 nm. Specifically, the physical thickness t4 of the underlayer 523 can be 10 nm, 15 nm, 20 nm, 25 nm, 30 nm, 35 nm, 40 nm, 45 nm, 50 nm. In this way, the physical thickness t4 of the underlayer 523 is appropriate, which can increase the adhesion between the lower optical adjustment film layer 5212 and the substrate 51, and at the same time is beneficial to reducing the overall thickness of the cover plate 50.

[0162] On the basis of any of the above embodiments, in order to make the appearance surface of the cover plate 50 have anti-fingerprint performance, in some embodiments, please refer to Figure 10 , Figure 10 is a partial cross-sectional view of the cover plate 50 provided in some other embodiments of the present application. In this embodiment, in addition to including the substrate 51, the scratch-resistant film layer 522, the optical adjustment film layer 521, and the underlayer 523, the cover plate 50 further includes an anti-fingerprint (AF) layer 524. The anti-fingerprint layer 524 in this embodiment can be applied to the cover plate 50 in any embodiment of the present application.

[0163] Please refer to Figure 10, the fingerprint-proof layer 524 is disposed on the side of the scratch-resistant film layer 522 away from the substrate 51. Specifically, the fingerprint-proof layer 524 may be disposed on the surface of the upper optical adjustment film layer 5211 away from the substrate 51. The fingerprint-proof layer 524 includes an organic or inorganic material with a low surface energy, having hydrophobic and oleophobic properties, making the surface of the cover plate 50 easy to clean and having a relatively good fingerprint resistance performance. Specifically, the material of the fingerprint-proof layer 524 includes, but is not limited to, fluorine-containing compounds. For example, the material of the fingerprint-proof layer 524 may be polytetrafluoroethylene (PTFE), cloflucarban, etc. Fluorine-containing compounds have a relatively low surface energy and can achieve the purpose of hydrophobic, oleophobic and anti-fingerprint residue.

[0164] Please refer to Figure 10 , the physical thickness t5 of the fingerprint-proof layer 524 is greater than 0 nm and less than or equal to 50 nm. Exemplarily, the physical thickness t5 of the fingerprint-proof layer 524 may be 2 nm, 3 nm, 5 nm, 8 nm, 10 nm, 12 nm, 15 nm, 16 nm, 18 nm, 20 nm, 22 nm, 25 nm, 28 nm, 29 nm, 30 nm, 32 nm, 35 nm, 38 nm, 40 nm, 42 nm, 45 nm, 48 nm, 50 nm, etc. In this way, while ensuring the protective effect of the fingerprint-proof layer 524, the overall thickness of the cover plate 50 can be reduced.

[0165] On this basis, in order to improve the adhesion between the fingerprint-proof layer 524 and the upper optical adjustment film layer 5211, please continue to refer to Figure 10 , a transition layer 525 is provided between the upper optical adjustment film layer 5211 and the fingerprint-proof layer 524. The material of the transition layer 525 may include silicon oxide (SiO2).

[0166] Please refer to Figure 10 , the physical thickness t6 of the transition layer 525 is greater than 0 nm and less than or equal to 50 nm. Exemplarily, the physical thickness t6 of the transition layer 525 may be 2 nm, 3 nm, 5 nm, 8 nm, 10 nm, 12 nm, 15 nm, 16 nm, 18 nm, 20 nm, 22 nm, 25 nm, 28 nm, 29 nm, 30 nm, 32 nm, 35 nm, 38 nm, 40 nm, 42 nm, 45 nm, 48 nm, 50 nm, etc. In this way, while improving the adhesion between the fingerprint-proof layer 524 and the lower optical adjustment film layer 5212, the overall thickness of the cover plate 50 can be reduced.

[0167] Of course, it can be understood that in other embodiments, the cover plate 50 may not include the above-mentioned transition layer 525.

[0168] In still other embodiments, please refer to Figure 11, Figure 11 This is a partial cross-sectional view of the cover plate 50 provided by some other embodiments of the present application. In this embodiment, in addition to including the substrate 51, the scratch-resistant film layer 522, the optical adjustment film layer 521, the primer layer 523, and the fingerprint-proof layer 524, the cover plate 50 further includes a hard and smooth layer 526. The hard and smooth layer 526 in this embodiment can be applied to the cover plate 50 in any embodiment of the present application.

[0169] The hard and smooth layer 526 is used to reduce the kinetic friction coefficient of the surface of the cover plate 50 and reduce the shear force on the surface of the cover plate 50 when the surface of the cover plate 50 is rubbed. The hard and smooth layer 526 is disposed on the side of the scratch-resistant film layer 522 facing away from the substrate 51. Specifically, the hard and smooth layer 526 can be disposed on the surface of the upper optical adjustment film layer 5211 facing away from the substrate 51. It can be understood that in other embodiments, the hard and smooth layer 526 can also be directly disposed on the surface of the scratch-resistant film layer 522 facing away from the substrate 51.

[0170] In some embodiments, the kinetic friction coefficient of the hard and smooth layer 526 is less than or equal to 0.05. Exemplarily, the kinetic friction coefficient of the hard and smooth layer 526 can be 0.05, 0.04, 0.03, 0.02, 0.01, etc. Since a frictional force will be generated between the finger and the cover plate 50 when the user touches the cover plate 50, and this frictional force will damage each film layer of the cover plate 50. According to the friction formula: f = μ×Fn, where f is the frictional force, Fn is the normal pressure, and μ is the friction coefficient. Therefore, by setting the kinetic friction coefficient of the hard and smooth layer 526 to be less than or equal to 0.05, the frictional force on the surface of the cover plate 50 can be reduced, the damage to each film layer of the cover plate 50 caused by the user touching the cover plate 50 can be avoided, and at the same time, when the user touches the cover plate 50, a smooth touch feeling can be obtained, which is beneficial to improving the user experience.

[0171] Furthermore, the kinetic friction coefficient of the hard and smooth layer 526 can be greater than or equal to 0.01. In this way, the material of the hard and smooth layer 526 can be easily obtained, and the processing difficulty of the hard and smooth layer 526 can be reduced.

[0172] In some embodiments, the hard and smooth layer 526 includes one or more carbon materials containing SP2 bonds. Exemplarily, the material of the hard and smooth layer 526 includes one or more of diamond-like carbon (DLC), graphite, and carbon nitride (CN). These materials have high hardness and can meet the requirements of the hard and smooth layer 526 for the kinetic friction coefficient. While reducing the frictional force on the surface of the cover plate 50, the wear resistance and scratch resistance of the cover plate 50 can be further improved.

[0173] In some embodiments, please refer to Figure 11, the physical thickness t7 of the hard and smooth layer 526 is less than or equal to 200 nm. Further, the physical thickness t7 of the hard and smooth layer 526 is less than or equal to 50 nm. Exemplarily, the physical thickness t7 of the hard and smooth layer 526 can be 200 nm, 180 nm, 150 nm, 120 nm, 100 nm, 80 nm, 60 nm, 50 nm, 40 nm, 30 nm, 20 nm, 10 nm, 9 nm, 8 nm, 7 nm, 6 nm, 5 nm, etc. In this way, while reducing the friction on the surface of the cover plate 50, the optical performance of the cover plate 50 can be ensured.

[0174] The cover plate 50 in the embodiment of the present application has the following advantages:

[0175] (1) The appearance defect rate caused by "flashing target" can be reduced by 80%, which can greatly improve the production yield of the hard coating section.

[0176] (2) Through a spectrophotometer, the transmittance of the cover plate 50 in the wavelength range of 380 nm to 780 nm is greater than or equal to 85%, and the reflectance is less than or equal to 15%, having excellent optical performance.

[0177] (3) Using a Vickers indenter to test the hardness of the cover plate 50, when the surface indentation depth of the cover plate 50 is about 100 nanometers, the measured Vickers hardness is greater than or equal to 1100 HV. Using a Mohs hardness pen to test the hardness of the cover plate 50, under the condition of 500 g force, the Mohs hardness is greater than 7. The cover plate 50 has high hardness, strong scratch resistance and puncture resistance.

[0178] (4) According to the International Commission on Illumination, under the condition of normal incidence, in the (L*, a*, b*) color system, using a color difference meter to test the cover plate 50, its reflected color value a is greater than or equal to -2 and less than or equal to 2, and b is greater than or equal to -2 and less than or equal to 2; the transmitted color value a is greater than or equal to -2 and less than or equal to 2, and b is greater than or equal to -2 and less than or equal to 2. Under the condition that the incident angle is 60 degrees, in the (L*, a*, b*) color system, using a color difference meter to test the cover plate 50, its reflected color value a is greater than or equal to -2 and less than or equal to 2, and b is greater than or equal to -2 and less than or equal to 2. The cover plate 50 has good appearance color, and can be coated on the 2.5D cover plate 50 and 3D cover plate 50. Moreover, even when the arc surface of the edge part of the cover plate 50 reaches 90°, there will be no angle color change problem and rainbow edge problem.

[0179] (5) The dynamic friction coefficient of the surface of the cover plate 50 is less than or equal to 0.05. Using a minorle eraser, with a force of 1000 g and a speed of 40 cycles / min, the test stroke is 4200 cycles. After the cyclic test, the water contact angle > 100°. This can prevent damage to each film layer of the cover plate 50 when the user touches it. At the same time, it can give the user a smooth touch feeling when touching the cover plate 50, which is beneficial to improving the user experience.

[0180] The embodiment of the present application also provides a processing method for the cover plate 50. Please refer to Figure 12 , Figure 12 which is a flowchart of the processing method for the cover plate 50 provided by some embodiments of the present application. Among them, the cover plate 50 can be the cover plate 50 in any of the above embodiments. The processing method of the cover plate 50 includes:

[0181] Step S100: Provide a substrate 51, and the substrate 51 includes a first surface 511;

[0182] Among them, the material of the substrate 51 can be glass, ceramic, plastic or metal.

[0183] Step S101: Perform a cleaning process on the substrate 51 to remove contaminants and adsorbed gases on the surface of the substrate 51;

[0184] It can be understood that in other embodiments, the processing method of the cover plate 50 may not include step S101. In this case, the substrate 51 provided in step S100 can be a cleaned substrate 51.

[0185] Step S300: Form an anti-scratch film layer 522 on the side facing the first surface 511 of the substrate 51. The anti-scratch film layer 522 includes silicon elements and doping elements, and the doping elements can form covalent bonds with the silicon elements; the valence state of the doping elements is +3 or +5, and the doping elements do not include nitrogen elements;

[0186] Parameters such as the material, refractive index, and physical thickness of the anti-scratch film layer 522 can be designed with reference to the anti-scratch film layer 522 in any of the above embodiments, and will not be described in detail here.

[0187] In some embodiments, the anti-scratch film layer 522 can be formed by a sputtering process. Exemplarily, the anti-scratch film layer 522 can be formed by a magnetron sputtering process. Specifically, forming the anti-scratch film layer 522 by a sputtering process includes: providing a target, and the target is a silicon target. The target includes doping elements that can form covalent bonds with silicon elements. The valence state of the doping elements is +3 or +5, and the doping elements do not include nitrogen elements.

[0188] In this way, by adding the above doping elements to the silicon target, the conductivity of the silicon target can be improved, so that during the sputtering of the scratch-resistant film layer 522, the accumulation of charges on the surface of the silicon target can be effectively avoided, which is beneficial to reducing the probability of arc discharge during sputtering. Furthermore, the generation of large particle spatter during sputtering can be avoided, the probability of forming "white spots" on the surface of the substrate 51 can be effectively reduced, and the appearance yield of the cover plate 50 can be improved.

[0189] Please refer to Figure 13 , Figure 13 which is a flowchart of the processing method of the cover plate 50 provided in some other embodiments of the present application. The difference between the processing method of the cover plate 50 in this embodiment and the processing method of the cover plate 50 in the embodiment shown in Figure 12 is that in the processing method of the cover plate 50 in this embodiment, before forming the scratch-resistant film layer 522 on the side facing the first surface 511 of the substrate 51, it further includes:

[0190] Step S200: Form a lower optical adjustment film layer 5212 on the side facing the first surface 511 of the substrate 51;

[0191] In this case, the scratch-resistant film layer 522 can be formed on the surface of the lower optical adjustment film layer 5212 facing away from the substrate 51.

[0192] Further, please continue to refer to Figure 13 , after forming the scratch-resistant film layer 522 on the side facing the first surface 511 of the substrate 51, that is, after step S300, the processing method of the cover plate 50 further includes:

[0193] Step S400: Form an upper optical adjustment film layer 5211 on the surface of the scratch-resistant film layer 522 facing away from the substrate 51;

[0194] Specifically, both the upper optical adjustment film layer 5211 and the lower optical adjustment film layer 5212 can be formed by PVD process (such as magnetron sputtering process). In this way, the obtained lower optical adjustment film layer 5212 has high hardness, excellent corrosion resistance, anti-drop and scratch resistance properties.

[0195] Among them, the parameters such as the number of layers, material, refractive index, physical thickness, Vickers hardness, etc. of the upper optical adjustment film layer 5211 in this embodiment can be designed with reference to the upper optical adjustment film layer 5211 in any embodiment of the present application, and the parameters such as the number of layers, material, refractive index, physical thickness, Vickers hardness, etc. of the lower optical adjustment film layer 5212 in this embodiment can be designed with reference to the lower optical adjustment film layer 5212 in any embodiment of the present application, which will not be elaborated here.

[0196] On this basis, in order to improve the adhesion between the lower optical adjustment film layer 5212 and the substrate 51, please refer to Figure 13 , before forming the lower optical adjustment film layer 5212 on the side facing the first surface 511 of the substrate 51, it further includes:

[0197] Step S102: Form a primer layer 523 on the first surface 511 of the cover plate 50;

[0198] Specifically, the primer layer 523 can be formed on the first surface 511 of the substrate 51 by using a PVD process (such as a magnetron sputtering process, a vacuum evaporation process, etc.). Among them, the specific material of the primer layer 523 can be selected according to the material of the substrate 51. The parameters such as the number of layers, material, and physical thickness of the primer layer 523 in this embodiment can be designed with reference to the primer layer 523 in any embodiment of the present application, and will not be elaborated here.

[0199] It can be understood that in some other embodiments, the processing method of the cover plate 50 may not include step S102. Or, in other embodiments, the processing method of the cover plate 50 may only include one of step S200 and step 400.

[0200] Please continue to refer to Figure 13 , after forming the scratch-resistant film layer 522 on the side facing the first surface 511 of the substrate 51, that is, after step S300, the processing method of the cover plate 50 further includes:

[0201] Step S500: Form an anti-fingerprint layer 524 on the side of the scratch-resistant film layer 522 facing away from the substrate 51;

[0202] Specifically, in this embodiment, the anti-fingerprint layer 524 is formed on the surface of the upper optical adjustment film layer 5211 facing away from the substrate 51. It can be understood that in other embodiments, the anti-fingerprint layer 524 can also be disposed on the surface of other film layers on the side of the scratch-resistant film layer 522 facing away from the substrate 51.

[0203] In some embodiments, the anti-fingerprint layer 524 can be formed by a PVD process (such as a vacuum evaporation process). The anti-fingerprint layer 524 formed by the vacuum evaporation process has a relatively high hardness and excellent scratch resistance.

[0204] The parameters such as the material, physical thickness, and Vickers hardness of the anti-fingerprint layer 524 in this embodiment can be designed with reference to the anti-fingerprint layer 524 in any embodiment of the present application, and will not be elaborated here.

[0205] Please refer to Figure 13, before forming the fingerprint-proof layer 524 on the side of the scratch-resistant film layer 522 facing away from the substrate 51, that is, before step S500, the processing method may further include: Step S401: Form a transition layer 525 on the side of the scratch-resistant film layer 522 facing away from the substrate 51.

[0206] Specifically, the transition layer 525 can be formed by a PVD process (such as a magnetron sputtering process, a vacuum evaporation process, etc.). In this embodiment, the scratch-resistant film layer 522 can be formed on the surface of the upper optical adjustment film layer 5211 facing away from the substrate 51. This can improve the adhesion between the fingerprint-proof layer 524 and the upper optical adjustment film layer 5211.

[0207] It can be understood that step S500 and step S401 in the embodiments of the present application can be applied to the processing method in any embodiment of the present application. In addition, the processing method in the embodiments of the present application may not include step S500, or may not include step S500 and step S401.

[0208] Please refer to Figure 14 , Figure 14 is a flowchart of the processing method of the cover plate 50 provided by some other embodiments of the present application. The difference between the processing method of the cover plate 50 in this embodiment and the processing method of the cover plate 50 in the embodiment shown in Figure 13 is that in the processing method of the cover plate 50 in this embodiment, after forming the scratch-resistant film layer 522 on the side facing the first surface 511 of the substrate 51, it further includes: Step S402: Form a hard and smooth layer 526 on the side of the scratch-resistant film layer 522 facing away from the substrate 51. It can be understood that step S402 in the embodiments of the present application can be applied to the processing method of the cover plate 50 in any embodiment of the present application.

[0209] The hard and smooth layer 526 can be formed by a PVD process (such as a magnetron sputtering process). The hard and smooth layer 526 formed by the PVD process has a relatively high hardness and excellent scratch resistance.

[0210] In some embodiments, the hard and smooth layer 526 can be formed on the surface of the upper optical adjustment film layer 5211 facing away from the substrate 51. The parameters such as the material, dynamic friction coefficient, and physical thickness of the hard and smooth layer 526 can be designed with reference to the hard and smooth layer 526 in any of the above embodiments, and will not be described in detail here.

[0211] The following describes two specific embodiments of the cover plate 50 and its processing method in the present application.

[0212] Embodiment 1

[0213] Please refer to Figure 15 , Figure 15 isFigure 10 Flow chart of the processing method of the cover plate 50 in the illustrated embodiment. Specifically, the processing method of the cover plate 50 includes:

[0214] Step S100a: Provide a substrate 51, the substrate 51 includes a first surface 511; the material of the substrate 51 is glass;

[0215] Step S101a: Clean the substrate 51 to remove contaminants and adsorbed gases on the surface of the substrate 51;

[0216] Specifically, step S101a includes: putting the substrate 51 into a PVD furnace for argon ion cleaning. The specific cleaning process can be: the background vacuum degree in the PVD furnace is about 4*10 -4 Pa, first introduce Ar gas into the PVD furnace to reach 0.3 Pa - 0.8 Pa (for example, 0.5 Pa), and use a capacitive coupling or hot wire plasma source to generate Ar + plasma to clean the surface of the specimen for 8 min - 15 min (for example, 10 min) to remove contaminants and adsorbed gases on the surface of the substrate 51.

[0217] Step S102a: Form a primer layer 523 on the first surface 511 of the substrate 51 by magnetron sputtering. The material of the primer layer 523 is silicon oxide (SiO2), that is, the primer layer 523 is a silicon oxide layer.

[0218] Specifically, the process parameters of step S102a can be: the background vacuum is about 5*10 -4 Pa, the temperature is set to 80 degrees Celsius (°C), and the process parameters of the coating machine are set as follows: the power of the inductively coupled plasma generator is 3500 W; the flow rate of argon (Ar) is 200 sccm (volume flow unit), the flow rate of oxygen (O2) is 120 sccm, and the coating time is 2 min to obtain a silicon oxide primer layer with a thickness of 10 nm - 50 nm.

[0219] Step S200a: Form a lower optical adjustment film layer 5212 on the surface of the primer layer 523 facing away from the substrate 51 by magnetron sputtering.

[0220] In this embodiment, the lower optical adjustment film layer 5212 is a single layer, and the material of the lower optical adjustment film layer 5212 includes a mixture of silicon nitride (Si3N4) and silicon oxide (SiO2) at the atomic level, silicon oxynitride (SiO x N y ). Calculate the mass fractions of silicon nitride (Si3N4) and silicon oxide (SiO2) according to Table 1, and control the refractive index of the lower optical adjustment film layer 5212 to 1.55 - 1.65.

[0221] Specifically, the process parameters of step S200a can be: the base vacuum is about 5×10 -4 Pa, the temperature is set to 80 degrees Celsius (°C), and the process parameters of the coating machine are set as follows: the power of the inductively coupled plasma generator is 3500W, the flow rate of argon (Ar) is 200 sccm (volume flow unit), the flow rate of oxygen (O2) is 120 sccm, and the flow rate of nitrogen (N2) is 50 - 200 sccm; the nitrogen (N2) bias voltage is 0.05 - 0.1 Pa, and the coating time is 3 - 10 min, to obtain a silicon oxynitride (SiO x N y ) layer with a thickness of 100 nm - 300 nm.

[0222] Step S300a: Form an anti - scratch film layer 522 on the surface of the lower optical adjustment film layer 5212 facing away from the substrate 51 by using a magnetron sputtering process.

[0223] In this embodiment, the thickness of the anti - scratch film layer 522 is 500 nm - 3000 nm. The material of the anti - scratch film layer 522 includes a mixture of silicon nitride (Si3N4) and silicon dioxide (SiO2) at the atomic level, silicon oxynitride (SiO x N y ), and the anti - scratch film layer 522 includes a doping element boron (B). The mass fraction of boron is 0.4%. Calculate the mass fractions of silicon nitride (Si3N4) and silicon dioxide (SiO2) according to Table 1, and control the refractive index of the anti - scratch film layer 522 to be 1.65 - 1.80.

[0224] The process parameters of step S300a can be: the base vacuum is about 5×10 -4 Pa; the target is a silicon target, the doping element in the target is boron, and the mass fraction of boron is 0.4%; the sputtering power of the target is 8500W; the flow rate of argon is 120 sccm; the flow rate of nitrogen is 80 sccm; the flow rate of oxygen is 30 sccm; the power of the inductively coupled plasma generator is 4500W.

[0225] Step S400a: Form an upper optical adjustment film layer 5211 on the surface of the anti - scratch film layer 522 facing away from the substrate 51 by using a magnetron sputtering process.

[0226] In this embodiment, the upper optical adjustment film layer 5211 is a single layer, and the thickness of the upper optical adjustment film layer 5211 is 60 nm - 120 nm. The material of the upper optical adjustment film layer 5211 includes a mixture of silicon nitride (Si3N4) and silicon dioxide (SiO2) at the atomic level, silicon oxynitride (SiO x N y) Calculate the mass fractions of silicon nitride (Si3N4) and silicon dioxide (SiO2) according to Table 1, and control the refractive index of the upper optical adjustment film layer 5211 to be 1.55 - 1.65.

[0227] Specifically, the process parameters of step S400a can be: the base vacuum is about 5 * 10 -4 Pa, the temperature is set to 80 degrees Celsius (°C), and the process parameters of the coating machine are set as follows: the power of the inductively coupled plasma generator is 3500W; the flow rate of argon (Ar) is 200 sccm (volume flow unit), the flow rate of oxygen (O2) is 120 sccm, and the flow rate of nitrogen (N2) is 50 - 200 sccm; the nitrogen (N2) bias voltage is 0.05 - 0.1 Pa, and the coating time is 0.5 - 2 min, obtaining a silicon oxynitride (SiO x N y ) layer with a thickness of 60 nm - 120 nm.

[0228] Step S401a: Form a transition layer 525 on the surface of the upper optical adjustment film layer 5211 facing away from the substrate 51 by using a magnetron sputtering process.

[0229] In this embodiment, the material of the transition layer 525 is silicon dioxide (SiO2), that is, the transition layer 525 is a silicon dioxide (SiO2) film layer.

[0230] The process parameters of step S401a can be: the sputtering power of the silicon target is 8KW, the flow rate of Ar is 250 sccm, the flow rate of O2 is 120 sccm, and the coating time is 0.5 min - 4 min, obtaining a silicon dioxide film layer with a thickness of 8 nm - 13 nm.

[0231] In order to improve the adhesion between the transition layer 525 and the upper optical adjustment film layer 5211, the surface of the upper optical adjustment film layer 5211 is subjected to anodic plasma treatment before forming the transition layer 525. The specific parameters are: the power is 1KW - 5KW; the flow rate of Ar is 200 sccm; the flow rate of O2 is 80 sccm, and the treatment time is 240 s.

[0232] Step S500a: Form an anti - fingerprint layer 524 on the surface of the transition layer 525 facing away from the substrate 51 by using a magnetron sputtering process, obtaining the cover plate 50.

[0233] In order to obtain an anti - fingerprint layer 524 with anti - pollution properties, using perfluoropolyether siloxane as the raw material, the set coating parameters are: the coating current is 260A, the flow rate of argon (Ar) is 220 sccm (volume flow unit), the flow rate of oxygen (O2) is 220 sccm, and the coating time is 3 min, obtaining an anti - fingerprint layer 524 with a thickness of 10 nm - 30 nm.

[0234] When preparing the cover plate 50 by using the processing method in this embodiment, the appearance defect rate caused by "flash target" can be reduced by 80%, and the cover plate 50 has excellent optical properties, high hardness and strong scratch resistance.

[0235] Specifically, by using a spectrophotometer to test the optical properties of the cover plate 50, the transmittance of the cover plate 50 in this embodiment in the wavelength range of 380 nm to 780 nm is 91.7%, and the reflectance is 7.8%, with excellent optical properties.

[0236] The appearance color of the cover plate 50 is tested by a color difference meter. According to the International Commission on Illumination, under the condition of normal incidence, in the (L*, a*, b*) chromaticity system, its reflected color value a is -0.01 and b is 0.23. The transmitted color value a is 0.03 and b is 0.65; under the condition of an incident angle of 30 degrees, its reflected color value a is 0.967 and b is -0.45; under the condition of an incident angle of 60 degrees, its reflected color value a is 0.449 and b is 0.907. The cover plate 50 has a good appearance color, and the problems of angular color change and rainbow edge are effectively improved.

[0237] The hardness of the cover plate 50 is tested by a Vickers indentation tester. When the surface indentation depth of the cover plate 50 is about 100 nanometers, the measured Vickers hardness is 1200 - 1340. The hardness of the cover plate 50 is tested by a Mohs hardness pen. Under the condition of a 500 g force, the Mohs hardness is greater than 7. The cover plate 50 has high hardness, good wear resistance and scratch resistance, which is beneficial to reducing the scratches on the cover plate 50 and extending the service life of the cover plate 50.

[0238] The cover plate 50 is tested by rubber friction: using a minorle eraser, with a force of 1000 g and a speed of 40 cycle / min, the test stroke is 4200 cycle. After cyclic testing, the water contact angle > 100°. And the dynamic friction coefficient of the cover plate 50 is less than or equal to 0.05.

[0239] It can be understood that when Figure 10 the cover plate 50 in the illustrated embodiment is obtained by other processing methods, it can also have the above excellent properties.

[0240] Embodiment 2

[0241] Please refer to Figure 16 , Figure 16 which is Figure 11 the flowchart of the processing method of the cover plate 50 shown. Specifically, the processing method of the cover plate 50 in this embodiment is the same as Figure 16The difference in the processing method of the cover plate 50 in the illustrated embodiment is that, in addition to the above steps S100a to S500a, the processing method of the cover plate 50 in this embodiment further includes, before step S500a:

[0242] Step S402a: Form a hard and smooth layer 526 on the surface of the upper optical adjustment film layer 5211 facing away from the substrate 51.

[0243] The material of the hard and smooth layer 526 is diamond-like carbon. The physical thickness of the hard and smooth layer 526 is less than or equal to 15 nm. The coating parameters are: DC power is 200 W, sputtering gas pressure is 0.4 Pa, sputtering time is 20 min to 40 min, and the flow rate of argon gas is 20 sccm.

[0244] Other steps of the processing method of the cover plate 50 in this embodiment can be the same as Figure 16 the processing method of the cover plate 50 in the illustrated embodiment, and will not be described in detail here.

[0245] When preparing the cover plate 50 by using the processing method in this embodiment, the appearance defect rate caused by "target flashing" can also be reduced by 80%, and the cover plate 50 has better optical properties, high hardness, and strong scratch resistance.

[0246] Specifically, by using a spectrophotometer to test the optical properties of the cover plate 50, the transmittance of the cover plate 50 in this embodiment in the wavelength range of 380 nm to 780 nm is 91.1%, and the reflectance is 8.4%, with better optical properties.

[0247] Using a color difference meter to test the appearance color of the cover plate 50, according to the International Commission on Illumination, under the condition of normal incidence, in the (L*, a*, b*) chromaticity system, its reflected color value a is -0.34 and b is 0.1. The transmitted color value a is 0.23 and b is 0.73; under the condition of an incident angle of 30 degrees, its reflected color value a is 0.88 and b is 0.34; under the condition of an incident angle of 60 degrees, its reflected color value a is 0.35 and b is 1.1. The appearance color of the cover plate 50 is good, and the problems of angle color change and rainbow edge are effectively improved.

[0248] Using a Vickers indentation instrument to test the hardness of the cover plate 50, when the surface indentation depth of the cover plate 50 is about 100 nanometers, the measured Vickers hardness is 1100 - 1280. Using a Mohs hardness pen to test the hardness of the cover plate 50, under the condition of a 500 g force, the Mohs hardness is greater than 7. The cover plate 50 has high hardness, good wear resistance and scratch resistance, which is beneficial to reducing scratches on the cover plate 50 and extending the service life of the cover plate 50.

[0249] Perform a rubber friction test on the cover plate 50: Use a minorle eraser, apply a force of 1000 g, at a speed of 40 cycles / min, with a test stroke of 4200 cycles. After the cyclic test, the water contact angle > 100°. And the dynamic friction coefficient of the cover plate 50 is less than or equal to 0.05.

[0250] It can be understood that when Figure 11 the cover plate 50 in the illustrated embodiment is made by other processing methods, it can also have the above excellent properties.

[0251] According to the descriptions of the above embodiments, when the cover plate 50 is applied to the electronic device 100 and used as the light-transmitting cover plate 11 or the back cover 21 of the electronic device 100, it can improve the appearance yield of the electronic device 100, and can improve the scratch resistance of the cover plate 50, and can effectively reduce the scratches on the light-transmitting cover plate 11 or the back cover 21. In addition, it can also optimize the optical properties of the cover plate 50, adjust the appearance color of the cover plate 50, improve the angle discoloration problem and the rainbow edge problem of the cover plate 50, and can improve the effect of the electronic device 100.

[0252] In the description of this specification, specific features, structures, materials, or characteristics may be combined in a suitable manner in any one or more embodiments or examples.

[0253] Finally, it should be noted that: the above embodiments are only used to illustrate the technical solutions of the present application, rather than to limit it; although the present application has been described in detail with reference to the foregoing embodiments, those of ordinary skill in the art should understand that: they can still modify the technical solutions recorded in the foregoing embodiments, or perform equivalent replacements on some of the technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the spirit and scope of the technical solutions of the embodiments of the present application.

Claims

1. A cover plate, characterized in that, include: The substrate and the anti-scratch film layer are stacked. The anti-scratch film layer includes silicon and doping elements, the valence state of the doping elements is +3 or +5, and the doping elements do not include nitrogen.

2. The cover plate according to claim 1, wherein The doping element includes at least one of boron, phosphorus and aluminum.

3. The cover plate according to claim 1 or 2, characterized in that, The mass fraction of the doping element in the anti-scratch film layer is greater than or equal to 0.2%.

4. The cover plate according to any one of claims 1 to 3, characterized in that The mass fraction of the doping element in the anti-scratch film layer is less than or equal to 3%.

5. The cover plate according to any one of claims 1-4, characterized in that The Vickers hardness of the anti-scratch film layer is greater than or equal to 1100 HV.

6. The cover plate according to any one of claims 1-5, characterized in that, The anti-scratch film layer includes a first material and a second material, wherein the refractive index of the first material is greater than or equal to the refractive index of the substrate, and the refractive index of the second material is less than or equal to the refractive index of the substrate.

7. The cover plate according to claim 6, wherein The substrate is a glass substrate, and the refractive index of the anti-scratch film layer is greater than or equal to 1.46 and less than or equal to 1.

85.

8. The cover plate according to claim 6 or 7, characterized in that, The first material includes at least one of silicon nitride, aluminum nitride, niobium oxide, titanium oxide, and tantalum oxide; and / or The second material includes at least one of silicon oxide, magnesium fluoride, and calcium fluoride.

9. The cover plate according to any one of claims 6-8, characterized in that, The first material is silicon nitride, the second material is silicon oxide, and the mass fraction of the first material is greater than or equal to 10% and or equal to 80%; or The first material is aluminum oxide, the second material is silicon oxide, and the mass fraction of the first material is greater than or equal to 10% and less than 100%.

10. The cover plate according to any one of claims 1-9, characterized in that, The thickness of the anti-scratch film layer is greater than or equal to 500 nm and less than or equal to 3000 nm.

11. The cover plate according to any one of claims 1-10, characterized in that, It comprises an upper optical adjustment film layer, which is arranged on the side of the anti-scratch film layer away from the substrate, is a single layer, and has a refractive index lower than that of the anti-scratch film layer.

12. The cover plate according to claim 11, characterized in that, The upper optical adjustment film layer includes at least one high refractive index material and at least one low refractive index material, and the refractive index of the high refractive index material is greater than the refractive index of the low refractive index material.

13. The cover plate according to any one of claims 1-12, characterized in that, It includes an upper optical adjustment film layer, which is arranged on the side of the anti-scratch film layer away from the substrate, and the upper optical adjustment film layer includes at least one first high refractive index film layer and at least one first low refractive index film layer stacked in sequence and alternately arranged, and the refractive index of the first high refractive index film layer is greater than the refractive index of the first low refractive index film layer.

14. The cover plate according to any one of claims 11-13, characterized in that, The physical thickness of the upper optical adjustment film layer is less than or equal to 300 nm.

15. The cover plate according to any one of claims 11-14, characterized in that, The ratio of the physical thickness of the anti-scratch film layer to the physical thickness of the upper optical adjustment film layer is greater than or equal to 10.

16. The cover plate according to any one of claims 1 to 15, characterized in that, It comprises a lower optical adjustment film layer, and the lower optical adjustment film layer is arranged on a side of the anti-scratch film layer facing the substrate.

17. The cover plate according to any one of claims 1-16, characterized in that, It comprises a hard and smooth layer, and the hard and smooth layer is arranged on the side of the anti-scratch film layer away from the substrate.

18. The cover plate according to claim 17, characterized in that, The hard and slippery layer includes one or more carbon materials containing SP2 bonds.

19. The cover plate according to claim 17 or 18, characterized in that, The dynamic friction coefficient of the hard and smooth layer is less than or equal to 0.

05.

20. The cover plate according to any one of claims 17-19, characterized in that, The physical thickness of the hard and smooth layer is less than or equal to 50 nm.

21. The cover plate according to any one of claims 1-20, characterized in that, Also includes: The anti-fingerprint layer is arranged on a side of the anti-scratch film layer away from the substrate.

22. The cover plate according to claim 21, characterized in that, The material of the anti-fingerprint layer includes at least one of polytetrafluoroethylene and chlorofluanilide.

23. The cover plate according to any one of claims 1-22, characterized in that, include: A base layer, the base layer being stacked on a surface of the substrate facing the anti-scratch film layer; The material of the base layer includes at least one of aluminum, chromium, titanium, silicon, and silicon oxide.

24. The cover plate according to any one of claims 1-23, characterized in that, According to the International Commission on Illumination, under the condition of an incident angle of 60 degrees, the a value and b value of the reflected color of the cover plate in the Lab color space satisfy: the a value is greater than or equal to -2 and less than or equal to 2, and the b value is greater than or equal to -2 and less than or equal to 2.

25. The cover plate according to any one of claims 1-24, characterized in that, The cover plate has a Mohs hardness greater than 7 under a force of 500 g.

26. The cover plate according to any one of claims 1-25, characterized in that, The substrate is a 2.5D substrate or a 3D substrate.

27. An electronic device, characterized in that, include: frame; A screen, the screen comprising a light-transmitting cover plate and a display screen which are stacked, the light-transmitting cover plate being fixedly connected to the frame; A back cover, the back cover being arranged on a side of the frame away from the light-transmitting cover plate; At least one of the back cover and the light-transmitting cover plate is the cover plate according to any one of claims 1-26.

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