Ultraviolet nano-imprinting process based on diamond template

Abstract

The invention provides an ultraviolet nano-imprinting process based on a diamond template, and aims to solve the problems of low imprinting efficiency, high cost and the like caused by easy damage of the template in the traditional nano-imprinting process. The process comprises the steps of template cleaning, soft mold material preparation, realization of manufacturing and molding of a soft mold based on a diamond template, coating of a nano-imprinting material and integration of a diamond substrate, solidification of the nano-imprinting material and demolding of a nano-imprinting pattern product. According to the process, the diamond with excellent mechanical performance is used as a template to realize batch preparation of high-resolution patterns. The process has the advantages that the unique advantages of high hardness, high heat conductivity, high ultraviolet transmittance and good chemical stability of a diamond material are combined with an ultraviolet nano-imprinting process, so that the durability, mechanical damage resistance and chemical corrosion resistance of the mold are ensured, the mold can be used in a high-temperature environment, the nano-imprinting process that a template can be repeatedly used for multiple times is realized, and the production cost is reduced. The method can be used for preparing high-precision nanoscale patterns. In addition, due to the extremely low thermal expansion coefficient of the diamond material, it can be guaranteed that the deformation quantity of the diamond template is extremely small under the high-temperature condition, and therefore the nanoimprint precision in the high-temperature environment can be guaranteed. Meanwhile, the diamond is used as the substrate, rapid heat dissipation is achieved through the high heat conductivity of the diamond, and the curing effect is prevented from being affected by heat accumulation caused by long-time ultraviolet lamp irradiation. The operation space is reserved for improving the curing speed of the ultraviolet imprinting glue by improving the power of the ultraviolet lamp, the production efficiency of the nano-imprinting product is improved, the processing time is shortened, and the substrate is prevented from deforming at high temperature.

Description

Technical Field

[0001] The present invention relates to the technical field of micro-nano processing, and specifically to an ultraviolet nanoimprinting process based on a diamond template. Background Art

[0002] The 10-nanometer nanoimprinting process is an advanced micro-nano manufacturing technology. It tightly combines a template with a fine pattern with the surface of a coated nanoimprinting resist, and uses means such as temperature, pressure, and ultraviolet light to cause the nanoimprinting resist to denature, thereby precisely replicating the microstructures on the template.

[0003] This process is essentially a process of filling, curing, and demolding a liquid polymer in the template structure.

[0004] The advantage of the nanoimprinting process is that its resolution depends on the dimensional accuracy of the template and is not limited by the light wavelength, objective numerical aperture, or focusing system in traditional lithography processes. Therefore, it can achieve a resolution limit that breaks through the traditional optical exposure process, bringing a revolutionary change to the field of precision manufacturing.

[0005] In addition, the nanoimprinting process also has advantages such as high aspect ratio, high efficiency, low cost, and high output. It shows broad application prospects in the fields of semiconductor manufacturing, biomedicine, and photonic devices.

[0006] However, there are still some problems in the traditional nanoimprinting process, such as: (1) In the traditional nanoimprinting process, silicon materials are usually used as the template for nanoimprinting. Due to the low hardness of silicon materials, mechanical damage to the silicon template is likely to occur during the imprinting process; (2) The silicon template is not suitable for imprinting resists with chemical corrosiveness, and there are certain limitations in the use of imprinting resists; (3) The silicon template has a large thermal expansion coefficient and will produce a large amount of deformation at high temperatures, thus affecting the processing accuracy of structural parameters and being unsuitable for processing in high-temperature environments; the above problems of the silicon template in the existing process lead to problems such as low imprinting efficiency and high cost in the nanoimprinting machine; (4) During the curing process of the ultraviolet resist in the ultraviolet nanoimprinting process, high temperatures are likely to be generated due to insufficient heat dissipation. Excessive temperatures may also cause premature decomposition of photoinitiators or radical quenching, reducing the curing speed. High temperatures may also cause the curing reaction to be too violent, generating excessive heat and stress, resulting in problems such as internal stress concentration, shrinkage deformation, and even cracking in the cured material. High temperatures may also damage the molecular structure of the cured product, reducing its key performance indicators such as mechanical strength, heat resistance, and chemical resistance.

[0007] In the traditional nanoimprinting process, problems such as low imprinting efficiency and high cost caused by easy damage to the template have not been solved, nor has the negative impact of high temperatures on the curing effect of ultraviolet imprinting resists caused by long-term or high-power ultraviolet lamp irradiation been solved. It is necessary to propose a new nanoimprinting process to solve the above process problems. Summary of the Invention

[0008] To solve the above problems, the present invention proposes an ultraviolet nanoimprinting process based on a diamond template.

[0009] An ultraviolet nanoimprinting process based on a diamond template includes the following steps. S1: Template cleaning Place the diamond template with the pattern engraved thereon into aqua regia and soak for a time t1, then place it into acetone, alcohol, and deionized water in sequence and clean it using ultrasonic waves. After completion, set it aside for later use. Here, a diamond template is adopted. First, it has high mechanical strength and good wear resistance. During repeated use, the wear is extremely low, the pattern stability is high, and thus the service life of the mold is long, which can reduce the mold cost of nanoimprinting and make the mass production of nanoimprinted products possible.

[0010] Second, the thermal expansion coefficient of diamond is extremely low, which can avoid deformation caused by thermal expansion during high-temperature treatment and under high-temperature working conditions, thus further ensuring the accuracy of nanoimprinting processing.

[0011] Third, diamond has good chemical stability and can resist chemical corrosion by most acids, alkalis, organic solvents, etc. The diamond template can be used with a chemically corrosive imprinting glue template, further broadening the application scope of the nanoimprinting process.

[0012] S2: Preparation of soft mold material Mix the prepolymer glue and the crosslinking agent glue in a ratio of 9.5 - 10.5:1 by weight and mix them evenly. After removing the internal bubbles, prepare polydimethylsiloxane. Removing the bubbles is to avoid the influence of bubbles on the formation of the soft mold. S3: Fabrication and formation of the soft mold based on the diamond template Coat the polydimethylsiloxane obtained in step S2 on the patterned surface of the diamond template completed in step S1, and let it stand for a time t2 to make the polydimethylsiloxane fully contact the pattern on the diamond template. After curing, a pattern complementary to the pattern on the diamond template is obtained on the formed polydimethylsiloxane soft mold. Then put it into a drying oven and heat for a time t3 to cure the polydimethylsiloxane, and demold the cured polydimethylsiloxane from the diamond template to obtain the polydimethylsiloxane soft mold. S4: Coating of nanoimprinting material and integration of diamond substrate Coat the surface of the soft mold with a pattern obtained in step S3 with a nanoimprint material, then cover a diamond substrate on the nanoimprint material, and let it stand for a time t4 to make the nanoimprint material fully contact with the pattern on the soft mold as much as possible, so that the pattern on the cured nanoimprint material is complementary to the pattern on the soft mold, ensuring the consistency between the pattern of the product obtained and the pattern of the diamond template. S5: Curing of the nanoimprint material S6: Demolding of the nanoimprinted graphic product After step S5 is completed, demold the cured nanoimprint material from the polydimethylsiloxane soft mold to obtain a product with a nanoimprinted pattern with a diamond substrate.

[0013] Preferably, the diamond template used in step S1 is fabricated by electron beam lithography and reactive ion etching in sequence.

[0014] Preferably, the aqua regia in step S1 is prepared with hydrochloric acid: nitric acid = 3:1, and t1 is 3 hours.

[0015] Preferably, the method for removing bubbles from polydimethylsiloxane in step S2 is: let it stand at room temperature for 0.5 - 1 hour, and through long-term standing, the bubbles gradually discharge from the liquid.

[0016] Preferably, the method for removing bubbles from polydimethylsiloxane in step S2 is: let it stand in a vacuum environment to remove bubbles. Through a negative pressure environment, the internal bubbles can be discharged as soon as possible, and the standing time can be reduced.

[0017] Preferably, in step S3, 20 minutes ≤ t2 ≤ 50 minutes; the coated polydimethylsiloxane is a flowable liquid, and through standing for a period of time, it is fully filled in the grooves of the pattern on the diamond template, and a pattern complementary to the pattern on the diamond template is obtained on the cured polydimethylsiloxane soft mold. The temperature in the drying oven is 60°C - 80°C, and 2 hours ≤ t3 ≤ 4 hours to make it react and cure into a mold as soon as possible.

[0018] Preferably, the nanoimprint material in step S4 is an ultraviolet imprinting adhesive, 20 minutes ≤ t4 ≤ 50 minutes, and step S4 is operated in a yellow light room to avoid premature curing of the ultraviolet imprinting adhesive, which affects the standing effect and the accuracy of the imprinted pattern.

[0019] Preferably, after step S4 is completed, one side of the diamond substrate is irradiated with ultraviolet light. The wavelength of the ultraviolet light used is 365 nm, and the irradiation time is t5, so that the ultraviolet light penetrates the diamond substrate and acts on the ultraviolet imprinting glue to cure it. In this process, on the one hand, the light transmittance of the diamond substrate is utilized, and on the other hand, the heat generated during the curing process can be dissipated in a timely manner by using the high thermal conductivity of the diamond substrate, avoiding the adverse effects of heat accumulation on the curing glue; at the same time, due to the extremely low coefficient of thermal expansion of diamond, the heat during the irradiation curing process will not cause it to deform, and thus will not cause strain in the imprinted pattern, ensuring the consistency between the imprinted pattern and the template pattern and guaranteeing the quality of imprinting.

[0020] Since diamond is used as the substrate, it has high ultraviolet transmittance, high thermal conductivity, and high heat dissipation efficiency. This reserves an operating space for increasing the power of the ultraviolet lamp to improve the curing speed of the ultraviolet imprinting glue, thereby shortening the irradiation time t5 of the ultraviolet light as much as possible, improving the production efficiency of the nanoimprinted product, and shortening the processing time. Of course, the irradiation time t5 of the ultraviolet light is not only related to the power of the ultraviolet lamp, but also related to the morphological state of the imprinted pattern being irradiated. Compared with other substrates in the existing process, the diamond substrate with the same morphological state has the advantage of shortening the irradiation time t5 of the ultraviolet light. The larger the size of the nanoimprinted product, the more obvious this advantage is.

[0021] The beneficial effects of the present invention: The ultraviolet nanoimprinting process based on a diamond template of the present invention includes template cleaning → preparation of soft mold material → fabrication and shaping of the soft mold based on the diamond template → coating of nanoimprinting material and integration of the diamond substrate → curing of the nanoimprinting material → demolding of the nanoimprinted graphic product. Among them, diamond is used as the template and the substrate of the nanoimprinted product. In the template stage, the wear resistance, hardness of diamond, and extremely low deformation under high temperature are utilized to ensure that the template can be used multiple times without reducing accuracy and can basically be used permanently, providing conditions for the low-cost and large-scale production of nanoimprinted products.

[0022] In the ultraviolet light curing stage, diamond is used as the substrate. The high light transmittance of diamond is utilized to make the ultraviolet light act more on the ultraviolet imprinting glue to improve the curing efficiency. At the same time, the high thermal conductivity of diamond is used to quickly dissipate the heat generated during the curing process, avoiding heat concentration on the ultraviolet imprinting glue and avoiding the adverse effects of the heat generated during the light irradiation process on the ultraviolet imprinting glue under the substrate during its curing process, ensuring the curing quality of the curing glue, and thus ensuring the quality of the obtained nanoimprinted product. Since the diamond substrate has high heat dissipation efficiency, this reserves an operating space for increasing the power of the ultraviolet lamp to improve the curing speed of the ultraviolet imprinting glue, thereby shortening the irradiation time t5 of the ultraviolet light as much as possible, improving the production efficiency of the nanoimprinted product, and shortening the process cycle.

[0023] In terms of the reusable diamond template and the diamond substrate that can improve the curing efficiency, this process solution allows for the repeated and rapid production of nanoimprint products, providing an efficient, low-cost, and rapid method for the preparation of micro-nano devices such as diffractive optics and metasurface optical elements.

[0024] In addition, diamond has extremely high chemical corrosion resistance and can be used in combination with chemically corrosive imprinting adhesives, greatly expanding the selection range of imprinting adhesives. Description of the Drawings

[0025] Figure 1 is the process flow chart of the ultraviolet nanoimprint process based on a diamond template; Figure 2 is the optical microscopic image of a diamond template with a zone plate pattern; Figure 3 is the optical microscopic image of a soft mold with a zone plate pattern; Figure 4 is the optical microscopic image of an ultraviolet imprinting adhesive imprinted product with a zone plate pattern; Figure 5 is the scanning electron microscope image of a diamond template with a zone plate pattern; Figure 6 is the scanning electron microscope image of a soft mold with a zone plate pattern; Figure 7 is the scanning electron microscope image of an ultraviolet imprinting adhesive imprinted product with a zone plate pattern; Figure 8 is the optical microscopic image of a diamond template with an art pattern; Figure 9 is the optical microscopic image of a soft mold with an art pattern; Figure 10 is the optical microscopic image of an ultraviolet imprinting adhesive imprinted product with an art pattern; Figure 11 is the optical microscopic image of a diamond template with a metalens pattern; Figure 12 is the optical microscopic image of a soft mold with a metalens pattern; Figure 13 is the optical microscopic image of an ultraviolet imprinting adhesive imprinted product with a metalens pattern; Figure 14 is the scanning electron microscope image of an ultraviolet imprinting adhesive imprinted product with a metalens pattern. Detailed Embodiments

[0026] In order to make the technical problems, technical solutions and beneficial effects solved by the present invention clearer and more understandable, the following specific embodiments are used to further elaborate on the present invention in detail. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not used to limit the present invention.

[0027] Example 1: Refer to Figure 1 , Figures 2 - 7 , a UV nanoimprinting process based on a diamond template, comprising the following steps: S1: Template cleaning Place the diamond template that has completed the fabrication of the zone plate pattern (refer to Figure 2 ) into aqua regia and soak for a time t1 of 3 hours to remove the surface metal.

[0028] Subsequently, place the diamond template into acetone, alcohol, and deionized water solution in sequence and perform ultrasonic treatment using an ultrasonic machine. The ultrasonic time for each time is 10 minutes to remove the residual organic matter on the template.

[0029] S2 Preparation of soft mold material Prepare polydimethylsiloxane by mixing prepolymer glue and crosslinking agent glue in a ratio of 10:1, and let it stand for 1 hour to remove air bubbles.

[0030] S3. Fabrication and forming of the soft mold based on the diamond template Uniformly coat the degassed polydimethylsiloxane on the diamond template with the zone plate pattern. Let it stand for a time t2 of 30 minutes to allow the polydimethylsiloxane to fully fill the concave part of the template.

[0031] Place the diamond template in a drying oven at 70°C and heat for a time t3 of 3 hours to promote the curing of the polydimethylsiloxane coated on the diamond template. After the cured polydimethylsiloxane cools to room temperature, slowly demold the polydimethylsiloxane from the diamond template to obtain a polydimethylsiloxane soft mold. During the demolding process, neither the diamond template nor the polydimethylsiloxane soft mold is damaged. The residual amount of polydimethylsiloxane on the diamond surface is extremely small and will not affect the subsequent use of the diamond template. In this specific embodiment, it can be observed through a 50-fold optical microscope that the polydimethylsiloxane successfully replicates a zone plate pattern structure complementary to the shape of the diamond template, as Figure 3 shown.

[0032] S4. Coating of nanoimprinting material and integration of diamond substrate On the side of the polydimethylsiloxane soft mold with the zone plate graphic structure, uniformly coat the ultraviolet imprinting glue. Cover the diamond substrate on the ultraviolet imprinting glue, and let it stand for 30 minutes (t4). The ultraviolet imprinting glue can fully fill the gaps between the concave and convex nanostructures of the polydimethylsiloxane soft mold graphic layer. The above operations need to be carried out in a yellow light room to avoid premature curing of the ultraviolet glue, which affects the processing accuracy.

[0033] S5. Curing of the nanoimprinting material Use an ultraviolet lamp with a wavelength of 365 nm and a power of 10 W to irradiate the ultraviolet imprinting glue through the diamond substrate, so that the ultraviolet light penetrates the diamond substrate and acts on the ultraviolet imprinting glue. The irradiation time t5 is 15 minutes to cure the ultraviolet imprinting glue.

[0034] S6. Demolding of the nanoimprinted graphic product The cured ultraviolet imprinting glue adheres to the diamond substrate and has no adhesion to the polydimethylsiloxane soft mold, and can be slowly demolded from the polydimethylsiloxane soft mold. The ultraviolet imprinting glue forms a complementary pattern to the polydimethylsiloxane soft mold, thus completing the replication of the diamond template. In this specific embodiment, it can be observed under an optical microscope that a zone plate pattern identical to the diamond template is formed on the surface of the cured ultraviolet imprinting glue. As Figure 4 shown.

[0035] The zone plate graphic structure obtained in the above steps is observed and photographed with a scanning electron microscope, as Figures 5 - 7 shown.

[0036] Example 2: Refer to Figures 8 - 10 , an ultraviolet nanoimprinting process based on a diamond template, includes the following steps, S1: Template cleaning Place the diamond template (see Figure 8 ) on which the artistic graphic (school emblem) has been engraved into aqua regia and soak for 3 hours (t1) to remove the surface metal.

[0037] Subsequently, place the diamond template into acetone, alcohol, and deionized water solution in turn and use an ultrasonic machine for ultrasonic treatment. Each ultrasonic time is 10 minutes to remove the residual organic matter on the template.

[0038] S2 Soft mold material preparation Prepare polydimethylsiloxane by mixing the prepolymer glue and the crosslinking agent glue in a ratio of 10:1, and let it stand for 1 hour to remove air bubbles.

[0039] S3. Fabrication and forming of the soft mold based on the diamond template The polydimethylsiloxane after removing air bubbles is evenly coated on a diamond template with an artistic pattern (school emblem). The standing time t2 is 20 minutes to allow the polydimethylsiloxane to fully fill the recessed part of the template.

[0040] The diamond template is placed in a drying oven at 60 °C for a heating time t3 of 4 hours to promote the curing of the polydimethylsiloxane coated on the diamond template. After the cured polydimethylsiloxane is cooled to room temperature, the polydimethylsiloxane is slowly demolded from the diamond template to obtain a polydimethylsiloxane soft mold. During the demolding process, neither the diamond template nor the polydimethylsiloxane soft mold is damaged. The residual amount of polydimethylsiloxane on the diamond surface is extremely small and will not affect the subsequent use of the diamond template. In this specific embodiment, it can be observed through a 50-fold optical microscope that the polydimethylsiloxane successfully replicates the artistic pattern (school emblem) structure complementary to the shape of the diamond template, as Figure 9 shown.

[0041] S4. Coating the nanoimprint material and integrating the diamond substrate On the side of the polydimethylsiloxane soft mold with the artistic pattern (school emblem) structure, an ultraviolet imprinting adhesive is evenly coated, and the diamond substrate is covered on the ultraviolet imprinting adhesive. The standing time t4 is 20 minutes, and the ultraviolet imprinting adhesive can fully fill the gaps between the concave and convex nano-structures of the graphic layer of the polydimethylsiloxane soft mold. The above operations need to be carried out in a yellow light room to avoid premature curing of the ultraviolet adhesive and affecting the processing accuracy.

[0042] S5. Curing of the nanoimprint material An ultraviolet lamp with a wavelength of 365 nm and a power of 10 W is used to irradiate the ultraviolet imprinting adhesive through the diamond substrate, so that ultraviolet light penetrates the diamond substrate and acts on the ultraviolet imprinting adhesive. The irradiation time t5 is 10 minutes to cure the ultraviolet imprinting adhesive.

[0043] S6. Demolding of the nanoimprinted graphic product The cured ultraviolet imprinting adhesive adheres to the diamond substrate and has no adhesion to the polydimethylsiloxane soft mold, and can be demolded from the polydimethylsiloxane soft mold. The ultraviolet imprinting adhesive forms a complementary pattern to the polydimethylsiloxane soft mold, thus completing the replication of the diamond template. In this specific embodiment, it can be observed under an optical microscope that the cured ultraviolet imprinting adhesive surface forms the same artistic pattern (school emblem) as the diamond template. As Figure 10 shown.

[0044] Example 3: Refer to Figures 11 - 14 , an ultraviolet nanoimprinting process based on a diamond template, includes the following steps, S1: Template cleaning The diamond template on which the superlens pattern has been engraved (refer toFigure 11 Soak it in aqua regia for 3 hours (t1) to remove the surface metal.

[0045] Subsequently, place the diamond template into acetone, alcohol, and deionized water solution in sequence, and perform ultrasonic treatment using an ultrasonic machine. The ultrasonic time is 10 minutes each time to remove the residual organic matter on the template.

[0046] S2 Preparation of soft mold material Prepare polydimethylsiloxane by mixing prepolymer glue and crosslinking agent glue in a ratio of 10:1, and let it stand for 1 hour to remove air bubbles.

[0047] S3. Fabrication and shaping of the soft mold based on the diamond template Uniformly coat the degassed polydimethylsiloxane on the diamond template with a superlens pattern. Let it stand for 50 minutes (t2) to allow the polydimethylsiloxane to fully fill the recessed part of the template.

[0048] Place the diamond template in an 80°C drying oven and heat for 3 hours (t3) to cure the polydimethylsiloxane coated on the diamond template. After the cured polydimethylsiloxane cools to room temperature, slowly demold the polydimethylsiloxane from the diamond template to obtain a polydimethylsiloxane soft mold. During the demolding process, neither the diamond template nor the polydimethylsiloxane soft mold is damaged. The residual amount of polydimethylsiloxane on the diamond surface is extremely small and will not affect the subsequent use of the diamond template. In this specific embodiment, it can be observed through a 50 - fold optical microscope that the polydimethylsiloxane successfully replicates a superlens pattern structure complementary to the shape of the diamond template, as Figure 12 shown.

[0049] S4. Coating of nano - imprint material and integration of diamond substrate Uniformly coat ultraviolet imprinting glue on the side of the polydimethylsiloxane soft mold with a superlens pattern structure, cover the diamond substrate on the ultraviolet imprinting glue, and let it stand for 50 minutes (t4). The ultraviolet imprinting glue can fully fill the gaps between the concave - convex nano - structures of the polydimethylsiloxane soft mold pattern layer. The above operations need to be carried out in a yellow - light room to avoid premature curing of the ultraviolet glue, which affects the processing accuracy.

[0050] S5. Curing of nano - imprint material Use an ultraviolet lamp with a wavelength of 365 nm and a power of 40 W to irradiate the ultraviolet imprinting glue through the diamond substrate, so that the ultraviolet light penetrates the diamond substrate and acts on the ultraviolet imprinting glue. The irradiation time is 40 minutes (t5) to cure the ultraviolet imprinting glue.

[0051] S6. Demolding of nano - imprinted graphic products The cured ultraviolet nanoimprint adhesive adheres to the diamond substrate and has no adhesion to the polydimethylsiloxane soft mold, and can be demolded from the polydimethylsiloxane soft mold. The ultraviolet nanoimprint adhesive forms a complementary pattern with the polydimethylsiloxane soft mold, thereby completing the replication of the diamond template. In this specific embodiment, under an optical microscope, it can be observed that a superlens pattern identical to the diamond template is formed on the surface of the cured ultraviolet nanoimprint adhesive. As Figure 13 shown. Further, through a scanning electron microscope, clear nanostructures can be observed on the ultraviolet nanoimprint adhesive superlens sample. As Figure 14 shown.

[0052] In the above Examples 1, 2, and 3, aqua regia is prepared by mixing hydrochloric acid and nitric acid at a ratio of 3:1.

[0053] The above embodiments are merely one of the implementation manners capable of implementing the technical solution of the present invention, and the scope of protection required by the present invention is not limited only by this embodiment.

[0054] The ultraviolet nanoimprint method based on the diamond template in the above Examples 1 to 3 provides a template with anti-wear property, long lifespan, and reusability. The provided substrate can avoid the negative impact of heat on the curing effect of the ultraviolet nanoimprint adhesive. The manufacturing process is simple, fast, and convenient, providing a low-cost, high-efficiency, and high-precision nanoimprint process, which has broad application prospects in the manufacturing of diffractive optical elements, metasurface optical elements, and other micro-nano structures.

[0055] The nanoimprint materials in Examples 1 to 3 all use ultraviolet nanoimprint adhesives. Due to the strong corrosion resistance of diamond, other imprint adhesives can also be used, and this patent will not list them one by one.

[0056]

Claims

1. An ultraviolet nanoimprinting process based on a diamond template, characterized in that The process uses diamond with excellent mechanical properties as a template, integrates a diamond substrate, and realizes the batch preparation of diffractive optical elements, metasurface optical elements, and other micro-nano structures.

2. The diamond template according to claim 1, characterized in that: In the step S1, the diamond template used is fabricated by electron beam lithography and reactive ion etching in sequence.

3. The diamond template according to claim 1, characterized in that: The patterns on the diamond template are micro-nano optical elements and other micro-nano structures.

4. A UV nanoimprinting process based on a diamond template, comprising the following steps: S1: Template cleaning Immerse the diamond template that has completed pattern etching in aqua regia for a time t1, then sequentially immerse it in acetone, alcohol, and deionized water and clean it using ultrasound, and set it aside after completion; S2: Preparation of soft mold material Mix prepolymer glue and crosslinking agent glue in a ratio of 9.5 - 10.5:1 by weight, and after removing internal bubbles, prepare polydimethylsiloxane; S3: Fabrication and shaping of the soft mold based on the diamond template Coat the polydimethylsiloxane obtained in step S2 on the patterned surface of the diamond template completed in step S1, let it stand for a time t2, then put it into an oven and heat for a time t3 to cure the polydimethylsiloxane, and then peel the cured polydimethylsiloxane from the diamond template to obtain a polydimethylsiloxane soft mold; S4: Coating of nanoimprinting material and integration of diamond substrate Coat the nanoimprinting material on the patterned surface of the soft mold prepared in step S3, and then integrate the diamond substrate on the nanoimprinting material, and let it stand for a time t4; S5: Curing of the nanoimprinting material S6: Demolding of the nanoimprinted graphic product After step S5 is completed, demold the cured nanoimprinting material from the polydimethylsiloxane soft mold to obtain a product with a nanoimprinted pattern with a diamond substrate.

5. The ultraviolet nanoimprinting process based on a diamond template according to claim 4, characterized in that: In the step S1, the aqua regia is prepared by mixing hydrochloric acid and nitric acid at a ratio of 3:1, and t1 is 3 hours.

6. The ultraviolet nanoimprinting process based on a diamond template according to claim 4, characterized in that: In the step S2, the method for removing bubbles from polydimethylsiloxane is to let it stand at room temperature for 0.5 - 1 hour.

7. The ultraviolet nanoimprinting process based on a diamond template according to claim 4, characterized in that: In the step S2, the method for removing bubbles from polydimethylsiloxane is to let it stand in a vacuum environment to remove bubbles.

8. The ultraviolet nanoimprinting process based on a diamond template according to claim 4, characterized in that: In the step S3, 20 minutes ≤ t2 ≤ 50 minutes; the temperature in the oven is 60°C - 80°C, and 2 hours ≤ t3 ≤ 4 hours.

9. The ultraviolet nanoimprinting process based on a diamond template according to claim 4, characterized in that: The nanoimprinting material in the step S4 is UV imprinting glue, 20 minutes ≤ t4 ≤ 50 minutes, and step S4 is operated in a yellow light room.

10. According to the UV nanoimprinting process based on a diamond template described in claim 4, the step S5 is specifically: irradiate one side of the diamond substrate completed in step S4 with ultraviolet light, the wavelength of the ultraviolet light used is 365 nm, and the irradiation time is t5, so that the ultraviolet light penetrates the diamond substrate and acts on the UV imprinting glue to cure it.

Images