Process and equipment for dedusting and rectifying organic silicon monomer

Abstract

The invention provides an organic silicon monomer dust removal and rectification process and equipment. The organic silicon monomer mixture enters a rectifying tower, and the rectifying tower is divided into a stripping section and a rectifying section. The gas-solid mixture is subjected to mass and heat transfer in the rectifying tower, solid particles are washed and captured to a tower kettle, and organic silicon components with higher boiling points, silicon powder and catalyst solids are accumulated and intermittently discharged to a reboiler in the tower kettle. And the silicon slurry in the reboiler 3 is further heated, and effective components in the silicon slurry are recovered. Gas-phase materials containing organic silicon monomers and chloromethane at the top of the rectifying tower enter a condenser, condensate enters a reflux tank, and system rectification is carried out after non-condensed steam enters the reflux tank. One part of liquid in the reflux tank enters the rectifying tower to participate in reflux through the reflux pump, and the other part is extracted to be rectified by the system. According to the invention, a good separation effect is achieved while high-efficiency dust removal is realized, and the content of high boilers at the top of the tower and the amount of organic silicon monomers entrained by silicon slurry at the bottom of the tower are effectively reduced. And the adopted equipment structure is good in anti-blocking performance, high in heat exchange efficiency and convenient to maintain and overhaul.

Description

Technical Field

[0001] The present invention belongs to the technical field of organosilicon, and particularly relates to a process and equipment for dedusting and rectifying organosilicon monomers. Background Art

[0002] Organosilicon materials have excellent properties such as resistance to high and low temperatures and electrical insulation, and are widely used in industries such as aerospace, electronic and electrical, and medical and health. They are a type of new material that is irreplaceable in modern high-tech industries. More than 90% of organosilicon material products are derived from methylchlorosilane monomers. Methylchlorosilane monomers are obtained by catalytic reaction of silicon powder and methyl chloride in a fluidized bed reactor. The synthesis gas coming out of the reactor contains organosilicon monomers, unreacted methyl chloride, silicon powder, and catalyst particles. The main dedusting technologies applied in the production of organosilicon monomers are as follows: 1. Cyclone dust removal. Utilize the centrifugal force generated by the high-speed rotation of gas in a cyclone separator to separate dust particles from the gas and settle them to the bottom for discharge, which can remove most of the larger dust particles. Generally, a series of primary cyclone separators and secondary cyclone separators are used, and even three-stage or four-stage cyclone separators are connected in series to increase the separation recovery rate of solid materials.

[0003] 2. Bag dust removal. When the gas passes through the bag, the dust is intercepted by the bag, and the clean gas passes through the bag and is discharged. Its dust removal efficiency is high, it can handle smaller dust particles, and the emission concentration can reach a relatively low level. Common bag filters include mechanically vibrated bag filters, reverse air flow bag filters, pulse jet bag filters, etc. In the production of organosilicon monomers, it can be used to further remove the remaining fine dust after cyclone dust removal. Although bag dust removal can intercept small dust particles, the bags are severely worn and the maintenance rate is high. Generally, it is not used as the dust removal process for synthesis gas, and is mostly used to intercept dust at the vent outlets of silicon powder or catalyst storage tanks.

[0004] 3. Electrostatic dust removal. Make the dusty gas pass through a high-voltage electric field. The dust particles are charged under the action of the electric field and move towards the electrodes, and finally deposit on the electrodes, thus achieving separation from the gas. Its advantages are high dust removal efficiency, it can handle high-temperature and high-humidity gases, and the pressure loss is small. However, the equipment investment and operating costs are relatively high, and it is relatively less used in the production of organosilicon monomers, and is mostly used in organosilicon incineration devices.

[0005] 4. Washing dust removal. Let the organosilicon monomer synthesis gas fully contact with the washing liquid in the washing tower. Through mass transfer and heat transfer, the solid particles in the synthesis gas are removed under the rinsing of the washing liquid, achieving the effect of purification and dust removal. It can achieve a relatively high dust removal efficiency, and at the same time can also cool and preliminarily separate the synthesis gas, creating favorable conditions for subsequent processes such as condensation and rectification. Washing dust removal is generally used after cyclone dust removal and is used in combination with the cyclone dust removal system. It is a relatively common dust removal technology currently applied in the organosilicon monomer industry.

[0006] However, in the organic silicon monomer washing and dust removal process, generally the washing tower adopts bottom feeding, without a stripping section. Only about a dozen trays are set in the rectifying section, resulting in low dust removal efficiency and inability to achieve the effect of component separation. A large amount of high-boiling substances are entrained in the top product, leading to high energy consumption in the monomer separation process. A large amount of dimethyl monomer at the bottom enters the silicon slurry, wasting the effective components and being very uneconomical. In addition, the reboiler used in the washing process is a stirred kettle reboiler, with limited heat transfer area and low efficiency, which is not conducive to adjusting the process load of the washing system. Summary of the Invention

[0007] The present invention develops a process and equipment for dust removal and rectification of organic silicon monomers in view of the technical problems existing in the current organic silicon monomer washing and dust removal process.

[0008] An equipment for dust removal and rectification of organic silicon monomers includes a rectifying tower, a heater, a reboiler, an intermediate pump, a condenser, a reflux drum, and a reflux pump.

[0009] The rectifying tower includes a rectifying section and a stripping section. The bottom of the rectifying section is welded to the stripping section, and the upper part of the stripping section is connected to the lower part of the rectifying section through a pipeline by an intermediate pump. The gas inlet of the rectifying tower is connected to a cyclone system, and the slurry outlet at the bottom of the rectifying tower is connected to the inlet of the reboiler. The gas outlet of the reboiler is connected to the gas return port of the rectifying tower. A heater is arranged at the bottom of the rectifying tower.

[0010] The tower diameter of the stripping section is smaller than that of the rectifying section, and they are connected through a reduced-diameter section. The diameter ratio of the rectifying section to the stripping section is 2.5 - 1.5:1.

[0011] The rectifying section of the rectifying tower adopts a single-pass or multi-pass fixed valve tray, with a tray spacing of 400 - 600 mm and 20 - 40 trays.

[0012] The fixed valve tray is an internal component form of the rectifying tower, which plays a role in improving the gas-liquid mass transfer and heat transfer efficiency. Its structure is simple, without moving parts, less mechanical failures, avoiding mechanical failures such as valve disc wear and adhesion, improving the operation reliability, and having strong anti-blocking performance, suitable for the material conditions of this working condition. The single-pass fixed valve tray is applied in the case of large production load in this process. For example, when the calculated tower diameter is less than 2 meters under large device load, single-pass is adopted; when the tower diameter is greater than 2 meters, multi-pass is adopted. The function is to reduce the liquid level gradient on the tray, facilitate the uniform contact between the liquid and the gas phase, and improve the mass transfer and heat transfer efficiency. The gas passes through the valve holes and contacts the liquid layer on the tray and rises. The liquid on the tray passes through the overflow weir and overflow pipe to the next tray. It is more appropriate to set the tray spacing at 400 - 600 mm. On the one hand, it considers the investment and equipment height, and on the other hand, it considers the liquid flooding and gas-liquid entrainment problems of the material. The actual number of trays set at 20 - 40 is to achieve the separation accuracy and meet the requirements of the theoretical trays.

[0013] The stripping section adopts a sieve tray with through-flow or a valve tray or sieve tray with single overflow of fixed valves, and the number of trays is 10 - 30.

[0014] The sieve tray with through-flow has no additional structural parts, only circular holes with a diameter of φ15 - 25% are opened on the tray, and the hole opening rate is 10 - 16%. Both gas and liquid flow through the holes for contact, with strong anti-blocking performance, and is especially suitable for the separation of gas-solid-liquid materials in this process system. The single-overflow anti-blocking fixed valve is also a good choice, with fewer overflow structural parts and less prone to blockage. In addition, the gas phase load in the stripping section of the distillation column under this process flow and equipment is small, and only single overflow is required. The number of trays in the stripping section is 10 - 30, which is considered for the effective separation of light and heavy components in the stripping section.

[0015] A liquid collecting tray is arranged on the first tray of the stripping section of the distillation column, and a whirling plate is arranged at the lowermost end of the rectifying section; the outlet of the liquid collecting tray is connected to the inlet of the intermediate pump, and the liquid is continuously pumped into the upper part of the whirling plate through the pump outlet.

[0016] The whirling plate is arranged above the gas-solid feed inlet of the distillation column, and the liquid phase with a large flow rate from the liquid collecting tray in the stripping section is pumped into the whirling plate by a pump. Its function is to quickly and efficiently wash the solid particles in the feed and prevent them from entering the rectifying section with the gas phase. The structure of the whirling plate can efficiently remove dust.

[0017] The gas phase outlet at the top of the distillation column is connected to the inlet of the condenser; The liquid phase outlet of the condenser is connected to the inlet of the reflux drum, the gas phase outlet of the condenser is connected to the subsequent process system, the outlet of the reflux drum is connected to the inlet of the reflux pump, the outlet of the reflux pump is connected to the reflux inlet of the distillation column, and the heating tubes of the heater are directly inserted into the bottom of the distillation column to play a heating role.

[0018] The dust removal and rectification process of organosilicon monomers includes the following steps: The gas-solid mixture coming out of the fluidized bed reactor is recovered for large particle solids through a cyclone separation system, and then enters the distillation column, which is divided into a stripping section and a rectifying section; The gas-solid mixture conducts mass transfer and heat transfer in the distillation column, and the solid particles are washed and captured into the bottom of the column. The organosilicon components with higher boiling points, silicon powder and catalyst solids accumulate in the bottom of the column and are intermittently discharged to the reboiler; The silicon slurry in the reboiler is further heated to recover the effective components therein. The gas phase material at the top of the distillation column contains organosilicon monomers and methyl chloride and goes to the condenser. The condensate enters the reflux tank, and the non-condensable gas goes to the subsequent system for rectification. Part of the liquid in the reflux tank enters the distillation column through the reflux pump to participate in reflux, and part is taken out for rectification in the subsequent system.

[0019] The gas-solid mixture coming out of the self-fluidizing bed reactor includes organosilicon monomers, organosilicon high boilers, silicon powder, copper powder, unreacted methyl chloride, and alkane by-products. After cyclone separation, the temperature of the mixture is 260 - 330°C, the solid mass fraction is 0.5 - 1.5%, and the particle size is less than 10 μm.

[0020] The gas-solid mixture coming out of the self-fluidizing bed reactor includes organosilicon monomers, organosilicon high boilers, silicon powder, copper powder, and unreacted methyl chloride. After cyclone separation, the temperature of the mixture is 260 - 330°C, the solid mass fraction is 0.5 - 1.5%, and the particle size is less than 10 μm.

[0021] The temperature at the top of the distillation column is 65 - 90°C, the temperature at the bottom of the column is 180 - 230°C, and the top pressure is 1.0 - 1.8 Mpa(G); the heater uses heat transfer oil as the heat source, the inlet temperature of the heat transfer oil is 260 - 280°C, and the outlet temperature is 220 - 250°C.

[0022] The so-called top of the column refers to the top of the rectifying section, and the bottom of the column refers to the bottom of the stripping section.

[0023] The so-called heater provides heat for the distillation column, directly heats the bottom of the stripping section, and controls the temperature of the bottom of the stripping section.

[0024] The above distillation column structure is a structure specifically developed for materials with complex syngas components (there are dozens of them), large differences in normal boiling points of components (from minus 30 degrees to more than 200 degrees), and high solid content, which can not only effectively separate light components and heavy components (high boilers) but also remove dust; the selection of pressure conditions takes into account the reaction activity of the previous reaction system and the economic applicability of the subsequent distillation system and compressor system. The temperature selection takes into account the separation accuracy of light and heavy components. Under the combination of this process condition and equipment, relatively excellent separation efficiency and lower device operation costs can be achieved.

[0025] The reboiler uses heat transfer oil as the heat source, is provided with inserted heating tubes and outer half tubes, and controls the heating temperature at 180 - 250°C.

[0026] The gas phase at the top of the distillation column enters the condenser. The condenser uses a shell-and-tube condenser, and 20 - 40°C circulating water is used as the refrigerant. A composite air cooler can also be used to control the condensate temperature at 30 - 45°C; From the reflux pump of the distillation column to the rectifying section, there is top reflux and middle reflux, and the flow ratio of top reflux to middle reflux is 2 - 4:1.

[0027] The ratio of top reflux to middle reflux can adjust the distribution of components in the column and adjust the quality index of the upper extracted material.

[0028] The content of substances with an atmospheric boiling point greater than 80 °C in the gas phase drawn from the top of the rectification column is less than 0.2%, and the content of substances with a boiling point less than 80 °C in the silicon slurry discharged from the reboiler 3 is less than 0.5%.

[0029] The temperature of the mixture entering the rectification column from the cyclone is 260 - 330 °C, which is the temperature of the material from the fluidized bed reaction and is in a superheated state. It contains components with atmospheric boiling points ranging from minus 20 - 30 degrees to over 200 degrees. The components with an atmospheric boiling point greater than 80 degrees described herein belong to high-boiling organosilicon compounds, which are mixtures. Their material composition includes 2,3-dimethylpentane, ethyldimethylchlorosilane, 10-heptene, methylethyldichlorosilane, trimethylpentane, disilanes (including disilanes with different chlorine substitutions), and methylene silanes (including methylene silanes with different chlorine substitutions).

[0030] Technical advantages of the present invention: The present invention provides a process and equipment for dust removal and rectification of organosilicon monomers. The rectification column is set with a stripping section and a rectifying section with different column diameters. Compared with traditional separation equipment with only gas-phase washing trays, it can not only efficiently remove dust, but also the stripping section can achieve the removal of light components from heavy components, and the rectifying section can achieve the removal of heavy components from light components, enabling the effective separation of high-boiling organosilicon compounds and organosilicon monomers. The rectifying section is set with anti-blocking valve trays, which can not only effectively filter out solid particles, with an equivalent plate efficiency greater than 70% and an operating flexibility of 50% - 150%. The stripping section is set with sieve trays or valve trays with better anti-blocking performance to effectively resist silicon powder blockage. The cyclone plate and intermediate reflux are set to effectively prevent solid particles from entering the upper part of the rectifying section, effectively improving the quality of organosilicon monomers and reducing the post-system treatment cost. The bottom of the rectification column uses an internal heater, effectively improving the heating efficiency and facilitating the adjustment of the process load of the washing system. This method and system have a simple structure, convenient operation, low cost, and are easy to maintain. Description of the drawings

[0031] Figure 1 It is the process flow diagram of the present invention, where: 1. Rectification column, 1-1 Rectifying section, 1-2 Stripping section; 2. Heater; 3. Reboiler; 4. Intermediate pump; 5. Reflux pump; 6. Condenser; 7. Reflux drum.

[0032] Figure 2 It is the process flow diagram of the prior art, where: washing tower 1', reboiler 2', reflux pump 3', first cooler 4', second cooler 5', reflux tank 6'. Detailed implementation manners

[0033] Example 1 An equipment for dust removal and rectification of organosilicon monomers consists of a rectification column 1, a heater 2, a reboiler 3, an intermediate pump 4, a condenser 6, a reflux drum 7, and a reflux pump 4. The gas inlet of the rectification column 1 is connected to a cyclone system, the gas outlet at the top is connected to the inlet of the condenser 6, and the slurry outlet at the bottom is connected to the inlet of the reboiler 3; the gas outlet of the reboiler 3 is connected to the gas return port of the rectification column 1. The heater is directly connected to the bottom of the rectification column 1. The inlet of the intermediate pump 4 is connected to the stripping section of the rectification column, and the outlet is connected to the rectifying section of the rectification column. The liquid outlet of the condenser 6 is connected to the inlet of the reflux drum, and the gas outlet is connected to the subsequent process system. The outlet of the reflux drum 7 is connected to the inlet of the reflux pump 4, and the outlet of the reflux pump is connected to the reflux port of the rectification column. The diameter ratio of the rectifying section 1-1 to the stripping section is 2:1. The rectifying section uses a fixed valve tray with double overflow and strong anti-blocking performance, the plate spacing is 500 mm, and the number of trays is 40. The stripping section uses a single overflow fixed valve tray with strong anti-blocking performance, and the number of trays is 25. A liquid collecting tray is arranged on the first plate of the stripping section 1-2, and a hydrocyclone plate is arranged at the lowest end of the rectifying section. The outlet of the liquid collecting tray is connected to the inlet of the intermediate pump, and the liquid is continuously pumped into the upper part of the hydrocyclone plate through the pump outlet. The heater 2's tube bundle is directly inserted into the column kettle of the rectification column, playing a major heating role, and the reboiler 3 plays an auxiliary heating role and recovers part of the organosilicon monomers.

[0034] The stripping section 1-2 uses a double overflow Sulzer SVG fixed valve tray.

[0035] Similarly, the stripping section uses a single overflow Sulzer UFMAF TM Fixed valve tray with strong anti-blocking performance.

[0036] Example 2 The gas-solid mixture coming out of the fluidized bed reactor contains an organosilicon monomer mixture. After passing through the cyclone separation system to recover large solid particles at a temperature of 290 - 310 °C, it enters the equipment system of Example 1. The gas-solid mixture undergoes mass transfer and heat transfer in the rectification column, and the solid particles are washed and captured into the column kettle. The organosilicon components with higher boiling points, silicon powder, and catalyst solids accumulate in the column kettle and are intermittently discharged to the reboiler. The pressure at the top of the rectification column is controlled at 1.2 - 1.5 MPa (G), and the temperature is controlled at 70 - 78 °C. The gas phase at the top of the column is sent to the condenser for heat exchange with circulating water. The condensate at about 38 - 42 °C contains crude monomers and methyl chloride and enters the reflux tank, and is refluxed through the reflux pump. The ratio of the upper reflux to the middle reflux flow rate is 4:1. The uncondensed gas, which is methyl chloride, goes to the subsequent system for rectification.

[0037] The column kettle of the rectification column uses heat transfer oil at 270 °C for heat exchange, and the temperature of the column kettle is 180 - 230 °C. When the temperature of the column kettle is too high, the silicon slurry is intermittently discharged to the reboiler. The reboiler uses heat transfer oil as the heat source, is provided with inserted heating tube bundles and external half tubes, and has an internal stirrer. The heating temperature is controlled at 180 - 250 °C, and the organosilicon monomers are evaporated and the gas phase is sent to the rectification column for recovery.

[0038] The content of substances with normal pressure boiling point greater than 80° C. in the gas phase extracted from the top of the distillation tower is 0.15%, and the content of substances with boiling point less than 80° C. in the silicon slurry discharged from the reboiler 3 is 0.1%.

[0039] In the silicone monomer mixture, the industry generally recognizes that substances with a temperature greater than or equal to 80°C are high-boiling substances. High-boiling substances have low utilization value and have a great impact on subsequent separation costs and product quality, so they need to be separated in this process.

[0040] Example 3 In contrast to the present invention, the conventional organosilicon monomer dust removal and separation device comprises a washing tower 1', a reboiler 2', a reflux pump 3', a primary cooler 4', a secondary cooler 5', and a reflux tank 6'. The washing tower 1' is a plate tower, with 5-7 blocks in the lower part using flow-through sieve plates, and 5-10 blocks in the upper part using sieve plates. The gas-solid mixture coming out of the fluidized bed reactor enters the bottom of the washing tower 1' after the large solid particles are recovered by the cyclone separation system, and the gas-solid mixture passes through the tower plate from bottom to top and is washed by the reflux liquid of the reflux pump 3', and mass transfer and heat exchange are performed. The organosilicon components with higher boiling points in the tower bottom, as well as silicon powder and catalyst solids, accumulate to a certain material level in the tower bottom and overflow into the reboiler 2'. The material in the cone of the washing tower is intermittently discharged to the reboiler 2' to avoid clogging the cone. The pressure at the top of the washing tower is controlled at 1.2-2MPa (G), and the temperature is controlled at 70-85°C. The gas phase at the top of the tower is taken out of the first condenser and heat exchanged with circulating water. The condensate at about 38-42°C containing crude monomers and methyl chloride enters the reflux tank 6'. After passing through the first cooler, the uncondensed gas goes to the second cooler and heat exchanged with frozen brine to -5~10°C. The condensate enters the reflux tank 6' and refluxes through the reflux pump. The reflux is set up with three reflux routes: upper reflux, middle reflux and bottom reflux. The non-condensable gas is methyl chloride and goes to the compressor.

[0041] The outer half of the reboiler is heated by 280℃ heat transfer oil, with built-in stirring. The heating temperature is 180-190℃, and the organic silicon monomer is evaporated and then sent to the scrubbing tower for recovery.

[0042] The content of substances with a normal pressure boiling point greater than 80°C in the gas phase extracted from the top of the scrubbing tower is greater than 2%, and the content of substances with a boiling point less than 80°C in the silicon slurry discharged from the reboiler 2 is greater than 5%.

Claims

1. An apparatus for dust removal and rectification of organosilicon monomers, characterized in that, It includes a rectifying column (1), a heater (2), a reboiler (3), an intermediate pump (4), a condenser (6), a reflux drum (7), and a reflux pump (5); The rectifying column (1) includes a rectifying section (1-1) and a stripping section (1-2). The bottom of the rectifying section (1-1) is welded to the stripping section (1-2), and the upper part of the stripping section (1-2) is connected to the lower part of the rectifying section (1-1) through a pipeline by means of the intermediate pump (4); The gas inlet of the rectifying column (1) is connected to a cyclone system, and the slurry outlet at the bottom of the rectifying column (1) is connected to the inlet of the reboiler (3); The gas outlet of the reboiler (3) is connected to the gas return port of the rectifying column (1); a heater (2) is arranged at the bottom of the rectifying column (1).

2. The device for dedusting and rectifying silicone monomers according to claim 1, characterized in that, The column diameter of the stripping section (1-2) is smaller than that of the rectifying section (1-1), and they are connected through a reducer section; the diameter ratio of the rectifying section (1-1) to the stripping section (1-2) is 2.5-1.5:

1.

3. The device for dust removal and rectification of silicone monomers according to claim 1, characterized in that The rectifying section (1-1) of the rectifying column adopts a single-downcomer or multi-downcomer valve tray, the tray spacing is 400-600 mm, and the number of trays is 20-40. The stripping section (1-2) adopts a perforated sieve tray or a single-downcomer valve tray or a sieve tray, and the number of trays is 10-30.

4. The device for dust removal and rectification of silicone monomers according to claim 1, wherein A liquid collecting tray is arranged on the first tray of the stripping section (1-2) of the rectifying column, and a hydrocyclone plate is arranged at the lowermost end of the rectifying section (1-1); the outlet of the liquid collecting tray is connected to the inlet of the intermediate pump (4), and the liquid is continuously pumped into the upper part of the hydrocyclone plate through the pump outlet.

5. The device for dust removal and rectification of organosilicon monomers according to claim 1, characterized in that, The gas outlet at the top of the rectifying column (1) is connected to the inlet of the condenser (6); The liquid outlet of the condenser (6) is connected to the inlet of the reflux drum (7), the gas outlet of the condenser (6) is connected to the subsequent process system, the outlet of the reflux drum (7) is connected to the inlet of the reflux pump (5), the outlet of the reflux pump (5) is connected to the reflux port of the rectifying column (1), and the tubes of the heater (2) are directly inserted into the bottom of the lower part of the rectifying column (1) to play a heating role.

6. The dust removal and rectification process of silicone monomers, characterized in that, It includes the following steps: The gas-solid mixture coming out of the fluidized bed reactor is separated by a cyclone separation system to recover large solid particles, and then enters the rectifying column, which is divided into a stripping section and a rectifying section; The gas-solid mixture undergoes mass transfer and heat transfer in the rectifying column, and the solid particles are washed and captured into the bottom of the column. The organosilicon components with higher boiling points, silicon powder, and catalyst solids accumulate in the bottom of the column and are intermittently discharged to the reboiler; The silicon slurry in the reboiler is further heated to recover the effective components therein. The gas-phase material at the top of the rectifying column contains organosilicon monomers and methyl chloride and goes to the condenser. The condensate enters the reflux tank, and the non-condensable gas goes to the subsequent system for rectification. Part of the liquid in the reflux tank enters the rectifying column through the reflux pump to participate in reflux, and part is taken out for rectification in the subsequent system.

7. The dust removal and rectification process of organosilicon monomer according to claim 6, characterized in that, The gas-solid mixture coming out of the fluidized bed reactor includes organosilicon monomers, organosilicon high boilers, silicon powder, copper powder, and unreacted methyl chloride. After cyclone separation, the temperature of the mixture is 260-330 °C, the mass fraction of the solid therein is 0.5-1.5%, and the particle size is less than 10 μm.

8. The dust removal and rectification process of silicone monomers according to claim 6, characterized in that, The temperature at the top of the rectifying column is 65-90 °C, the temperature at the bottom of the column is 180-230 °C, and the pressure at the top of the column is 1.0-1.8 Mpa(G); the heater uses thermal oil as the heat source, the inlet temperature of the thermal oil is 260-280 °C, and the outlet temperature is 220-250 °C.

9. The organosilicon monomer dust removal and rectification process according to claim 6, characterized in that, The reboiler uses heat-conducting oil as the heat source, and is equipped with inserted heating tubes and external half-tubes, controlling the heating temperature at 180 - 250 °C.

10. The process for dust removal and rectification of silicone monomers according to claim 6, characterized in that, The gas phase at the top of the distillation column enters the condenser. The condenser adopts a shell-and-tube condenser, with circulating water at 20 - 40 °C as the refrigerant, or a composite air cooler can also be used, controlling the condensate temperature at 30 - 45 °C; From the reflux pump of the distillation column to the rectifying section, top reflux and middle reflux are provided, and the flow rate ratio of top reflux to middle reflux is 2 - 4:1.

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