Gas shunting device and method for cooling Dome

Abstract

The invention provides a gas flow dividing device and a Dome cooling method, the device comprises a cover connected with a gas pipeline and a flow divider located in the cover, the flow divider is in a hollow circular truncated cone shape and comprises a top and a bottom, the opening area of the top is smaller than the opening area of the bottom, the center line of the gas pipeline coincides with the center line of the flow divider, and the flow divider is located in the cover. The top of the flow divider faces the gas outlet of the gas pipeline, a gap is formed between the flow divider and the gas outlet, and a buffer is arranged in the flow divider and used for buffering gas introduced from the top of the flow divider and evenly diffusing the gas from the bottom of the flow divider. The gas in the gas pipeline is uniformly diffused from the bottom of the gas distribution device through the gas distribution device provided by the invention, the Dome is cooled by adopting the gas distribution device, and the gas is uniformly diffused to the Dome, so that the temperature of the Dome is uniformly controlled, the deposition of a polymer is more compact and firmer, the maintenance frequency of a machine is reduced, and the production efficiency is improved. And the operation time of the machine is prolonged.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor integrated circuits, and particularly relates to a gas shunt device and a method for cooling a Dome. Background Art

[0002] In semiconductor etching equipment, in addition to providing a sealed environment for the chamber, a ceramic cover (Dome) also needs to deposit residual polymers generated during the etching reaction process. In order to prevent the polymers deposited on the Dome from falling due to fluffy film quality and affecting the wafer, during the etching process, the Dome needs to be maintained at a stable temperature. Three groups of bulbs are used to heat up at the top, and a diverter diffuses and purges dry gas (CDA gas) from the top to cool down.

[0003] In existing etching equipment, the diverter fails to evenly blow the gas towards the outer wall of the Dome, resulting in uneven local temperature of the Dome. The polymers deposited inside the Dome will be part dense and part fluffy. In this way, defects may occur when the machine reaches a medium operating hour, and in severe cases, polymer peeling may occur, seriously reducing the machine running time and causing a large number of wafer scrapping incidents. Summary of the Invention

[0004] The purpose of the present invention is to provide a gas shunt device and a method for cooling a Dome, which can evenly diffuse the gas in the gas pipeline connected to the gas shunt device, so that the temperature of the Dome can be evenly controlled.

[0005] To solve the above technical problems, the present invention provides a gas shunt device, including: a cover connected to the gas pipeline, a diverter located inside the cover. The diverter is in the shape of a frustum with a hollow interior and the diverter includes a top and a bottom. The opening area of the top is smaller than the opening area of the bottom. The central axis of the gas pipeline coincides with the central axis of the diverter, and the top of the diverter faces the gas outlet side of the gas pipeline and has a preset spacing distance from the gas outlet of the gas pipeline. A buffer is arranged inside the diverter, and the buffer is used to buffer the gas introduced from the top of the diverter and make the gas evenly diffuse from the bottom of the diverter.

[0006] Optionally, the gas shunt device further includes: a fixing bracket, one end of the fixing bracket is fixed on the gas pipeline, and the other end is fixed on the bottom of the diverter.

[0007] Optionally, the fixing bracket includes two support rods, one end of each of the two support rods is fixed on the gas pipeline, and the other end of the two support rods is fixed on the opposite sides of the bottom of the diverter.

[0008] Optionally, the buffer is a fan.

[0009] Optionally, the fan includes fan blades, a fan blade bearing and a fan blade bracket; a plurality of the fan blades rotate around the fan blade bearing, and two ends of the fan blade bearing are respectively fixed on two layers of the fan blade brackets, and the fan blades are located between the two layers of the fan blade brackets.

[0010] Optionally, grooves are formed on side walls of the diverter, the grooves are located on opposite sides of the side walls, and two ends of the fan blade bracket are embedded in the grooves.

[0011] Optionally, the buffer is a disk provided with a plurality of openings.

[0012] Optionally, from the edge of the disk to the center of the disk, the opening sizes of the openings gradually decrease.

[0013] Optionally, the openings are circular holes; with the center of the disk as the center of the circle, the diameters of a plurality of the circular holes on the circumference of the same radius are the same and are evenly arranged.

[0014] Optionally, grooves are provided on side walls of the diverter, the grooves are annular, and the edge of the disk is embedded in the grooves.

[0015] Correspondingly, the present invention further provides a method for cooling a Dome, including: cooling the Dome by using the gas diverter device as described above.

[0016] In summary, in the gas diverter device provided by the present invention, it includes a cover connected to a gas pipeline, a diverter located inside the cover, the diverter is in a frustum shape with a hollow interior and the diverter includes a top and a bottom, the opening area of the top is smaller than the opening area of the bottom, the center line of the gas pipeline coincides with the center line of the diverter, and the top of the diverter faces the gas outlet side of the gas pipeline and has a preset interval distance from the gas outlet of the gas pipeline. A buffer is arranged inside the diverter, and the buffer is used for buffering the gas introduced from the top of the diverter and making the gas evenly diffuse from the bottom of the diverter. A part of the gas in the gas pipeline passes through the middle area, that is, passes through the diverter and the buffer inside the diverter, and evenly diffuses from the bottom of the diverter, while another part of the gas passes through the edge area, that is, passes through the area between the cover and the diverter, and finally diffuses evenly from the bottom of the cover together with the gas in the middle area, so that the air volumes in the middle area and the edge area reach a relatively uniform diffusion state.

[0017] Using the gas shunt device described in the present invention to cool the Dome, the gas diffuses evenly to the top and around of the Dome, enabling uniform temperature control in the areas of the top and around of the Dome, thus making the deposition of the polymer denser and firmer, avoiding the scrapping of wafers due to the fluffy peeling of the film quality, reducing the frequency of machine maintenance, and increasing the running time of the machine.

[0018] Furthermore, a fixed bracket is used to fix the shunt on the gas pipeline, which can ensure that the center of the shunt coincides with the center of the gas pipeline. Compared with fixing the shunt on the cover, after machine maintenance, it is not necessary to adjust the position of the shunt and the gas pipeline, saving the time for machine recovery after maintenance, and ensuring uniform distribution and diffusion of the air volume in the edge area between the shunt and the cover. Description of the Drawings

[0019] Figure 1 is a schematic structural diagram of the gas shunt device provided by an embodiment.

[0020] Figure 2 is a schematic structural diagram of the gas shunt device provided by another embodiment.

[0021] Figure 3 is a schematic structural diagram of the gas shunt device provided by an embodiment of the present invention.

[0022] Figure 4 is a partial schematic structural diagram of the fan and the shunt provided by an embodiment of the present invention.

[0023] Figure 5 is a partial schematic structural diagram of the side wall of the shunt provided by an embodiment of the present invention.

[0024] Figure 6 is a schematic structural diagram of the disc provided by an embodiment of the present invention.

[0025] Description of the Reference Numerals:

[0026] 1 - Gas pipeline; 2 - Cover; 3 - Shunt; 31 - Groove; 4 - Fixed bracket; 5 - Buffer; 51 - Fan blade; 52 - Fan blade bearing; 53 - Fan blade support; 54 - Opening. Detailed Embodiment

[0027] Figure 1 is a schematic structural diagram of the gas shunt device provided by an embodiment. Please refer to Figure 1As shown in the figure, the gas shunt device includes a cover 2 connected to the gas pipeline 1 and a diverter 3 located inside the cover 2. The diverter 3 is composed of a hollow cone and is fixed to the cover 2 through a fixing bracket 4. The gas in the gas pipeline 1 above the diverter 3 blows directly onto the top of the diverter 3 and diffuses evenly in all directions. Among them, Figure 1 The lines with arrows represent the approximate direction of gas movement.

[0028] However, due to the blockage of the diverter 3, the airflow in the middle part of the gas shunt device is relatively smaller than that in the edge part. When using this gas flow device to cool the Dome, the temperature in the middle of the Dome is higher than that around it, resulting in relatively fluffy deposition of the polymer in the middle.

[0029] Secondly, it is also necessary to ensure that the center line of the diverter 3 is consistent with the center line of the intake pipeline 1. If there is a deviation, the distributed gas flow will be higher on one side and lower on the other side. Therefore, it is necessary to measure the air volume around every time after equipment maintenance to determine whether the diverter 3 and the intake pipeline 1 are centered, which prolongs the time for equipment maintenance and restart.

[0030] Figure 2 is a schematic structural diagram of a gas shunt device provided by another embodiment. In this embodiment, on the basis of the previous embodiment, a small hole is opened at the top of the cone. Please refer to Figure 2 As shown in the figure, the gas shunt device includes a cover 2 connected to the gas pipeline 1 and a diverter 3 located inside the cover 2. The diverter 3 is composed of a hollow cone and is fixed to the cover 2 through a fixing bracket 4, and a small hole is formed at the top of the cone. The diameter of the small hole is between 0.5 cm and 1.5 cm, for example, 1 cm. The diameter of the bottom of the cone, that is, the bottom of the diverter 3, is between 9 cm and 11 cm, for example, 10 cm. The gas in the gas pipeline 1 above the diverter 3 blows directly onto the top of the diverter 3 and diffuses evenly in all directions. Among them, Figure 2 The lines with arrows represent the approximate direction of gas movement.

[0031] On the basis of the previous embodiment, the gas in the gas pipeline 1 can blow through the small hole to the top of the Dome. However, the opening is limited and the gas blows directly, so it is impossible to fully ensure uniform airflow distribution at the top of the Dome. The effect formed is only that a region of the top of the Dome relative to the aperture of the small hole is cooled, and the temperature of the remaining region at the top is still relatively high compared to the surrounding region, resulting in relatively fluffy deposition of the polymer in this region.

[0032] In view of the above problems, the present invention provides a gas shunt device. The shunt is set as a hollow frustum shape, and a buffer is arranged inside the shunt, so that a part of the gas in the gas pipeline passes through the middle area, that is, through the shunt and the buffer inside the shunt, and uniformly diffuses from the bottom of the shunt. Another part of the gas passes through the edge area, that is, through the area between the cover and the shunt, and finally uniformly diffuses from the bottom of the cover together with the gas in the middle area, so that the air volume in the middle area and the edge area reaches a relatively uniform diffusion state.

[0033] Meanwhile, the present invention also provides a method for cooling the Dome. The gas shunt device of the present invention is used to cool the Dome. The gas uniformly diffuses to the top and around of the Dome, so that the temperature of the area at the top and around of the Dome is uniformly controlled, so that the deposition of the polymer is more dense and firm, thereby avoiding the scrapping of the wafer caused by the fluffy peeling of the film quality of the polymer, reducing the frequency of machine maintenance, and increasing the running time of the machine.

[0034] To make the objectives, advantages and features of the present invention clearer, the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. It should be noted that the accompanying drawings are all in very simplified forms and are not drawn to scale, and are only used to conveniently and clearly assist in explaining the objectives of the embodiments of the present invention. In addition, the structures shown in the accompanying drawings are often part of the actual structures. In particular, the emphasis to be shown in each of the accompanying drawings is different, and sometimes different scales are used.

[0035] As used in the present invention, the singular forms "a", "an" and "the" include plural objects unless the context clearly dictates otherwise. As used in the present invention, the term "or" is generally used in the sense of including "and / or" unless the context clearly dictates otherwise. As used in the present invention, the term "several" is generally used in the sense of including "at least one" unless the context clearly dictates otherwise. As used in the present invention, the term "at least two" is generally used in the sense of including "two or more" unless the context clearly dictates otherwise. In addition, the terms "first", "second", and "third" are only used for descriptive purposes and cannot be construed as indicating or implying relative importance or implicitly indicating the quantity of the indicated technical features. Thus, features defined with "first", "second", and "third" may explicitly or implicitly include one or at least two of such features.

[0036] Figure 3 is a schematic structural diagram of the gas shunt device provided by an embodiment of the present invention. Please refer to Figure 3As shown in the figure, the gas shunt device provided in this embodiment includes: a cover 2 connected to the gas pipeline 1, and a diverter 3 located inside the cover 2. The diverter 3 is in the shape of a frustum with a hollow interior, and the diverter 3 includes a top and a bottom. The opening area of the top is smaller than the opening area of the bottom. The center line of the gas pipeline 1 coincides with the center line of the diverter 3, and the top of the diverter 3 faces the outlet side of the gas pipeline 1 and has a preset interval distance from the outlet of the gas pipeline 1. A buffer 5 is arranged inside the diverter 3, and the buffer 5 is used to buffer the gas introduced from the top of the diverter 3 and make the gas evenly diffuse from the bottom of the diverter 3.

[0037] In this embodiment, a part of the gas in the gas passage 1 passes through the diverter 3, and a part passes through the area between the diverter 3 and the cover 2. Since the center line of the diverter 3 coincides with the center line of the gas passage 1, that is, the diverter 3 is located in the middle of the cover 2, the area where the diverter 3 is located is called the middle area, and the area between the diverter 3 and the cover 2 is called the edge area.

[0038] In the implementation of this application, a part of the gas in the gas pipeline 1 passes through the middle area, that is, through the diverter 3 and the buffer 5 inside the diverter 3. After being buffered by the buffer 5, it evenly diffuses from the bottom of the diverter 3. Another part of the gas passes through the edge area, that is, through the area between the cover 2 and the diverter 3, and finally evenly diffuses from the bottom of the cover 2 together with the gas in the middle area, so that the air volume in the middle area and the edge area reaches a relatively uniform diffusion state. Among them, Figure 3 The line with an arrow in the figure represents the approximate direction of gas movement.

[0039] Please continue to refer to Figure 3

[0040] As shown in the figure, the gas shunt device further includes: a fixing bracket 4. One end of the fixing bracket 4 is fixed on the gas pipeline 1, and the other end is fixed on the bottom of the diverter 3. The diverter 3 is fixed on the gas pipeline 1 through the fixing bracket 4, which can ensure that the center of the diverter 3 coincides with the center of the gas pipeline 1. Compared with fixing the diverter 3 on the cover 2, after the machine is maintained, it is not necessary to adjust the positions of the diverter 3 and the gas pipeline 1, that is, it is not necessary to measure the air volume around to determine whether the diverter 3 is centered with the intake pipeline 1, saving maintenance time and ensuring uniform distribution and diffusion of the air volume in the edge area between the diverter 3 and the cover 2.Exemplarily, the fixing bracket 4 includes two support rods. One end of each of the two support rods is fixed to opposite sides of the side wall of the gas pipeline 1, and the other end is fixed to opposite sides of the bottom of the diverter 3, but is not limited thereto. The top of the diverter 3 (i.e., the side with the smaller frustum) is close to the gas pipeline 1, and the bottom of the diverter 3 (i.e., the side with the larger frustum) is away from the gas pipeline 1. One end of the fixing bracket 4 is fixed to the bracket of the gas pipeline 1, then crosses over the top of the diverter 3, and the other end is fixed to the bottom of the diverter 3.

[0041] In this embodiment, there is a preset interval distance between the top of the diverter 3 and the air outlet of the gas pipeline 1. The interval distance can be between 5 cm and 10 cm, but is not limited thereto, and can be determined according to the size of the top of the diverter 3 or / and the size of the air outlet of the gas pipeline 1.

[0042] Exemplarily, the diameter of the top of the diverter 3 is between 2 cm and 4 cm, and the diameter of the bottom of the diverter 3 is between 9 cm and 11 cm. Preferably, the diameter of the top of the diverter 3 is 3 cm, and the diameter of the bottom of the diverter 3 is 10 cm. Compared with Figure 2 the shown gas diversion device, the diameter of the top of the diverter 3 is increased from 1 cm to 3 cm. While increasing the air volume at the bottom of the diverter 3, it can ensure uniform air outlet at the bottom and avoid the problem of uneven air outlet caused by too large an opening at the top of the diverter 3.

[0043] The gas diversion device provided by the present invention, compared with Figure 2 the shown gas diversion device, the enlarged hole at the top of the cylinder body allows more gas to diffuse into the middle area. Then, through the buffer 5 arranged in the diverter 3, the gas in the middle area uniformly diffuses from the bottom of the diverter 3, and then uniformly diffuses from the bottom of the cover 2 together with the gas in the surrounding area, so as to uniformly blow to the top and around of the Dome, so that the temperature of the area at the top and around of the Dome is uniformly controlled.

[0044] In an embodiment of the present invention, please refer to Figure 3 shown. The buffer 5 is a fan. The fan helps to buffer the airflow directly hitting the upper part of the diverter 3, and the rotation of the fan blades uniformly diffuses the airflow to the bottom of the diverter 3. Figure 4 It is a partial structural schematic diagram of the fan and the diverter provided by an embodiment of the present invention. Please refer to Figure 3 Compared with Figure 4As shown, the fan includes fan blades 51, a fan blade bearing 52, and a fan blade bracket 53; a plurality of the fan blades 51 rotate around the fan blade bearing 52, the rotation plane of the fan blades 51 is perpendicular to the extension direction of the fan blade bearing 52, both ends of the fan blade bearing 52 are respectively fixed on two layers of the fan blade brackets 53, and the fan blades 51 are located between the two layers of the fan blade brackets 53. Of course, the fan blades 51 can also be fixedly connected to the fan blade bearing 52, and the rotation of the fan blade bearing 52 drives the fan blades 51 to rotate. The present invention does not limit the specific structure and rotation mode of the fan.

[0045] Figure 5 It is a partial structural schematic diagram of the side wall of the diverter provided by an embodiment of the present invention. Please refer to Figure 5 As shown, a groove 31 is formed on the side wall of the diverter 3. In this embodiment, the groove 31 is located on opposite sides of the side wall of the diverter 3, and both ends of the fan blade bracket 53 are embedded in the groove 31. Exemplarily, one end of the two layers of the fan blade brackets 53 is embedded in one of the grooves 31.

[0046] In another embodiment of the present invention, please refer to Figure 6 As shown, the buffer is a disc provided with a plurality of openings 54. In this embodiment, from the edge of the disc to the center of the disc, the opening size of the openings 54 gradually decreases, but is not limited thereto. Exemplarily, the openings 54 are circular holes. With the center of the disc as the center of the circle, the diameters of the plurality of circular holes located on the circumference of the same radius are the same and are evenly arranged, that is, with the center of the disc as the center of the circle, a circle is formed with a size smaller than the radius of the disc, and the diameters of the plurality of circular holes located on the circumference of this circle are the same, and the plurality of circular holes are evenly arranged on the circumference. As the radius of the circle gradually decreases, the diameters of the circular holes located on the circumference of this circle also gradually decrease.

[0047] The disc embedded inside the diverter 3 helps to buffer the airflow directly hitting from the upper part of the diverter 3, and the arrangement of the openings 54 enables the airflow to be evenly diffused to the bottom of the diverter 3.

[0048] A groove is provided on the side wall of the diverter 3. In this embodiment, the groove is annular and surrounds the side wall for one week, and the edge of the disc is embedded in the groove.

[0049] Correspondingly, the present invention also provides a method for cooling the Dome, including: using the gas diversion device as described above to cool the Dome.

[0050] The gas shunt device described in the present invention is used to cool the Dome. The gas shunt device is located at the top of the Dome, and the gas diffuses evenly to the top and the surrounding areas of the Dome, so that the temperature of the areas at the top and the surrounding of the Dome can be evenly controlled, making the deposition of the polymer denser and firmer, thus avoiding the scrapping of wafers caused by the fluffy peeling of the film quality, reducing the frequency of machine maintenance, and increasing the running time of the machine.

[0051] It should be noted that the gas shunt device provided by the present invention is not limited to cooling the Dome, and can be applied to any device or place that requires uniform cooling.

[0052] In summary, in the gas shunt device provided by the present invention, it includes a cover connected to the gas pipeline, and a diverter located inside the cover. The diverter is in the shape of a frustum with a hollow interior, and the diverter includes a top and a bottom. The opening area of the top is smaller than the opening area of the bottom. The center line of the gas pipeline coincides with the center line of the diverter, and the top of the diverter faces the outlet side of the gas pipeline and has a set spacing distance from the outlet of the gas pipeline. A buffer is provided inside the diverter, and the buffer is used to buffer the gas introduced from the top of the diverter and make the gas evenly diffuse from the bottom of the diverter. Part of the gas in the gas pipeline passes through the middle area, that is, through the diverter and the buffer inside the diverter, and evenly diffuses from the bottom of the diverter, while the other part of the gas passes through the edge area, that is, through the area between the cover and the diverter, and finally diffuses evenly from the bottom of the cover together with the gas in the middle area, so that the air volume in the middle area and the edge area reaches a relatively uniform diffusion state.

[0053] Using the gas shunt device described in the present invention to cool the Dome, the gas diffuses evenly to the top and the surrounding areas of the Dome, so that the temperature of the areas at the top and the surrounding of the Dome can be evenly controlled, making the deposition of the polymer denser and firmer, thus avoiding the scrapping of wafers caused by the fluffy peeling of the film quality, reducing the frequency of machine maintenance, and increasing the running time of the machine.

[0054] Furthermore, a fixed bracket is used to fix the diverter on the gas pipeline, which can ensure that the center of the diverter coincides with the center of the gas pipeline. Compared with fixing the diverter on the cover, after the machine is maintained, there is no need to adjust the position of the diverter and the gas pipeline, saving the time for machine restoration after maintenance, and ensuring the uniform distribution and diffusion of the air volume in the edge area between the diverter and the cover.

[0055] The above description is only a description of the preferred embodiments of the present invention and does not limit the scope of the present invention in any way. Any changes and modifications made by those of ordinary skill in the art of the present invention based on the above disclosure fall within the scope of protection of the claims.

Claims

1. A gas shunt device, characterized in that, Comprising: A cover connected to a gas pipeline, a diverter located within the cover. The diverter is in the shape of a frustum with a hollow interior and includes a top and a bottom. The opening area of the top is smaller than that of the bottom. The central axis of the gas pipeline coincides with the central axis of the diverter, and the top of the diverter faces the outlet side of the gas pipeline and has a preset spacing distance from the outlet of the gas pipeline. A buffer is provided within the diverter, and the buffer is used to buffer the gas introduced from the top of the diverter and cause the gas to uniformly diffuse from the bottom of the diverter.

2. The gas flow splitting device according to claim 1, wherein The gas diverter device further includes: a fixing bracket, one end of the fixing bracket is fixed to the gas pipeline, and the other end is fixed to the bottom of the diverter.

3. The gas flow splitting device according to claim 2, wherein, The fixing bracket includes two support rods. One ends of the two support rods are fixed to the gas pipeline, and the other ends of the two support rods are fixed to opposite sides of the bottom of the diverter.

4. The gas shunt device according to claim 1 or 2 or 3, characterized in that, The buffer is a fan.

5. The gas splitting device according to claim 4, wherein The fan includes fan blades, a fan blade bearing, and a fan blade bracket; a plurality of the fan blades rotate around the fan blade bearing, and both ends of the fan blade bearing are respectively fixed to two layers of the fan blade brackets, and the fan blades are located between the two layers of the fan blade brackets.

6. The gas flow splitting device according to claim 5, characterized in that Grooves are formed on the side wall of the diverter, and the grooves are located on opposite sides of the side wall. Both ends of the fan blade bracket are embedded in the grooves.

7. The gas shunt device according to claim 1 or 2 or 3, characterized in that, The buffer is a disc provided with a plurality of openings.

8. The gas shunt device according to claim 7, characterized in that, From the edge of the disc to the center of the disc, the opening size of the openings gradually decreases.

9. The gas splitting device according to claim 8, wherein, The openings are round holes; with the center of the disc as the center of the circle, the diameters of a plurality of the round holes on the same radius circumference are the same and are evenly arranged.

10. The gas flow splitting device according to claim 7, wherein, A groove is provided on the side wall of the diverter, and the groove is annular. The edge of the disc is embedded in the groove.

11. A method for cooling a Dome, characterized in that, Comprising: Using the gas diverter device according to any one of claims 1 to 10 to cool the Dome.

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