Apparatus and method for cleaning a device

Abstract

There is provided an apparatus for treating a cleaning member for cleaning a surface, the apparatus comprising: a first electrode at least partially disposed within the cleaning member; and a power source electrically connected to the first electrode for generating an electric field at the first electrode to generate a plasma at the cleaning member.

Description

Technical Field

[0001] The present invention relates to an apparatus and method for treating a part of a cleaning device, and in particular, although not exclusively, to an apparatus and method for treating a cleaning member of a cleaning device. Background Art

[0002] There are many different methods of cleaning a surface such as a floor surface, and these methods include using a surface cleaning device. The surface cleaning device may include a dry surface cleaner, such as a vacuum cleaner, a wet surface cleaner, such as a power mop, or a wet and dry surface cleaner that utilizes a combination of wet and dry surface cleaning elements.

[0003] Wet surface cleaners typically include a cleaning member that may include a body covered with a covering material for contacting the surface to be cleaned. As part of the cleaning process, water may be provided to the cleaning member in order to apply the water to the surface to be cleaned. The cleaning member may also absorb water from the surface, thereby removing contaminants from the surface to be cleaned. Dry cleaners may also include such a cleaning member, for example, a cleaning member in the form of a brush head.

[0004] Compared to dry surface cleaners, wet surface cleaners can provide a deeper and more effective surface cleaning. However, a disadvantage of typical wet cleaning devices is that, after use of the device, the cleaning member will typically provide a pathogen-supporting environment. For example, when a wet cleaning device has been used to clean a surface, the cleaning member will absorb a certain amount of sewage, which will remain in the cleaning member until the next use of the device. This can lead to the growth of pathogens and the generation of odors when the device is not in use, as well as the spread of pathogens during subsequent use of the device. The current solution to this problem is to remove and replace the cleaner head covering material, which causes unnecessary waste. This is even required if the wet cleaning device is not used frequently or even after each use of the device.

[0005] Attempts have been made to overcome this problem, such as using ultraviolet radiation or an anion generator to treat the cleaning member. However, the ultraviolet light and anions incident on the cleaning member typically only provide surface disinfection and cannot reach pathogens deeper within the cleaning member. In addition, due to the non-uniform porous structure of many traditional covering materials for cleaning members, the use of chemical disinfectants may also be insufficient, which may provide a safe space for pathogens to continue growing.

[0006] Therefore, a means for adequately treating a cleaning device, particularly the cleaning member of a cleaning device, is needed. In view of the above considerations, the present invention has been designed. Summary of the Invention

[0007] According to a first aspect, there is provided an apparatus for treating a cleaning member for cleaning a surface, the apparatus comprising: a first electrode disposed at least partially within the cleaning member; and a power supply electrically connected to the first electrode for generating an electric field at the first electrode to generate a plasma at the cleaning member.

[0008] The present invention provides a method for treating a cleaning member by generating a plasma at the cleaning member, which can be, for example, part of a cleaning device for cleaning a surface. The plasma is generated by the breakdown of an electric field generated at a first electrode disposed at least partially within the cleaning member. In this way, the plasma generated by the breakdown of the electric field at the first electrode can partially or completely penetrate the cleaning member, thereby disinfecting the cleaning member using the plasma.

[0009] In other words, there is provided a method for treating or disinfecting a cleaning member by causing a plasma to at least partially pass through the cleaning member, which is at least partially due to the electrical breakdown of a medium such as a gas and / or a liquid caused by an electric field generated at a first electrode at least partially located within the cleaning member.

[0010] In one embodiment, the term "treatment" can be considered to cause any change in the state or condition of the cleaning member. For example, treating the cleaning member can include one or more of the following: cleaning; disinfecting; washing, etc. The cleaning member can be any element suitable for cleaning a surface. For example, the cleaning member can be part of a larger cleaning device for cleaning a surface, where the cleaning member is part of a device that contacts the surface to affect the cleaning of the surface. The cleaning member can be a static element, or it can be a dynamic element. For example, the cleaning member can be adapted to roll on the surface to be cleaned to affect the cleaning. In such an example, the cleaning member can be a cylindrical roller having a roller body surrounded by a covering material. The covering material can include one or more of the following: a porous material, such as a sponge material, in which case the cleaning member can be a sponge roller; a microfiber material, in which case the cleaning member can be a microfiber roller; a plurality of bristles, in which case the cleaning member can be a brush roller, etc.

[0011] The plasma is generated by an electric field generated at the first electrode. Electrical breakdown occurs when an electrical insulator is subjected to a high enough voltage that it suddenly becomes an electrical conductor and current passes through it. This occurs when the applied voltage exceeds the dielectric strength of the insulator. In the example of the device described here, the electrical insulator in which electrical breakdown occurs is air, a liquid, or a mixture of air and liquid between the first electrode and an electrical breakdown target outside the cleaning member, which can be another electrode or electrical ground, as described further below. For example, electrical breakdown may occur in the air within and around the pores of the sponge material covering the cleaning member, the fibers of the microfiber material covering the cleaning member, and / or the bristles of the brush. In the case where the cleaning member is wet, electrical breakdown may occur on a series of bubbles or impurities suspended in the liquid held by the cleaning member. If the voltage applied at the first electrode is high enough, electrical breakdown may also occur on the liquid held by the cleaning member in addition to the air suspended in the liquid.

[0012] The first electrode can be formed of any suitable conductive material or electrically insulating conductive material and is at least partially disposed within the cleaning member, for example, at least partially disposed within the covering material of the cleaning member. A non-conductive material can be used as the electrode, especially in the case of using a high-frequency high-voltage power supply. The conductive material can be coated with a thin layer of ceramic, such as anodized aluminum oxide, to increase corrosion resistance. The first electrode can be completely disposed within the cleaning member, for example, completely disposed within the covering material of the cleaning member. The term "within" is considered to refer to the interior of the outer circumference of the cleaning member. The power supply can be any power supply suitable for generating an electric field at the first electrode. The power supply can be one or more of the following: a DC power supply; a pulsed DC power supply, such as a nanosecond pulsed power supply; an AC power supply; a pulsed AC power supply; and a combination of AC and DC power supplies.

[0013] In an embodiment where the cleaning member is provided only with the first electrode at least partially disposed within the cleaning member, the plasma can be generated between the first electrode and the surface to be cleaned. In other words, in the absence of another electrode, electrical breakdown may occur between the first electrode and the surface to be cleaned, which can serve as an electrical ground. Thus, in order to treat the cleaning member, the plasma can be generated entirely within the cleaning member, partially within the cleaning member, partially adjacent to the cleaning member, or entirely adjacent to the cleaning member. The location where the plasma is generated relative to the cleaning member is determined by the position of the first electrode relative to the cleaning member.

[0014] According to an embodiment of the present invention, the first electrode may be of any shape suitable for use with a cleaning member. For example, in the case where the cleaning member includes a roller, the roller may take the form of a cylinder that rolls on the surface to be cleaned, and the first electrode may also take a cylindrical shape. Thus, the first electrode may be concentrically disposed around the body of the roller and within the outer circumference of the cleaning member, for example, within the covering material of the cleaning member. The first electrode may be disposed between the body of the roller and the covering material of the cleaning member. The first electrode may be electrically connected to a power source by any suitable means. For example, the first electrode may be electrically connected to the power source by a slip ring connector disposed on the shaft of the cylindrical cleaning member.

[0015] When electrical breakdown occurs, it will occur along the path of least resistance. In the case where the device includes only the first electrode as described above, the path of least resistance may be where the distance between the first electrode and the surface to be cleaned is the smallest. If the first electrode is cylindrical and concentrically disposed around the roller of the cleaning member, electrical breakdown will likely occur between the lowest points of the first electrode, which may correspond to the center of the portion of the roller in contact with the surface to be cleaned. As the roller rolls on the surface, this electrical breakdown point will change relative to the roller and will remain at or near the point of minimum separation between the first electrode and the surface. Thus, when the cleaning member passes over the surface, for example, when the roller rolls on the surface, plasma will be generated in different parts of the cleaning member, thereby increasing the proportion of the cleaning member that is treated by plasma.

[0016] In the case where the cleaning member includes a covering material and at least a portion of the first electrode is provided within the covering material, the covering material may further include a plurality of nanoparticles and / or microparticles adapted to interact electrically with the first electrode. The plurality of particles may include one or more of the following: ferroelectric particles; piezoelectric particles; metal particles; and dielectric particles. The plurality of nanoparticles and / or microparticles may be provided in a thin film on the covering material. By providing these nanoparticles and / or microparticles to the covering material, the average dielectric strength on the cleaning member can be reduced, which in turn promotes the occurrence of electrical breakdown and thus the generation of plasma for treating the cleaning member.

[0017] In addition to the first electrode, the device may further include a second electrode electrically connected to a power source. In this case, the power source may be adapted to generate an electric field between the first electrode and the second electrode. By using the second electrode, the position and shape of the plasma generated by the electrical breakdown between the first and second electrodes can be controlled more accurately and precisely, thereby improving the processing efficiency of the cleaning member. In the case where the cleaning member is a roller and the first electrode is concentrically arranged around the body of the roller, as described above, the first electrode may rotate when the roller rolls along the surface to be cleaned. In this case, the second electrode may remain stationary relative to the cleaning member and the first electrode, and similar to the above example, the electrical breakdown will occur at the point where the distance between the two electrodes between the first and second electrodes is minimized. When the first electrode moves with the cleaning member while the second electrode remains stationary relative to the cleaning member, the area of the cleaning member treated by the generated plasma changes as the cleaning member moves, thereby increasing the proportion of the cleaning member treated by the plasma.

[0018] The second electrode may be arranged relative to the first electrode and the cleaning member according to a variety of different arrangements based on the implementation of the device. For example, the first and second electrodes and the second electrode and the cleaning member may be separated by an air gap. In this case, the electrical breakdown between the first and second electrodes occurs at least partially through the cleaning member, such as through the covering material of the cleaning member, and through the air gap between the cleaning member and the second electrode. Alternatively, the second electrode may be arranged in contact with the cleaning member, such as in physical contact with the covering material of the cleaning member. In this case, the electrical breakdown between the first and second electrodes may occur only through the part of the cleaning member that separates the first and second electrodes.

[0019] In another example, the second electrode may be concentrically arranged within the cleaning member with the first electrode. In other words, both the first electrode and the second electrode may be arranged within the outer circumference of the cleaning member, such as within the covering material of the cleaning member. In this case, the cleaning member may include a cylindrical roller, and both the first and second electrodes may be cylindrical and concentrically arranged around the roller. The first electrode may be arranged within the circumference of the second electrode, and vice versa. The first and second electrodes may be separated by a part of the cleaning member, which may be the focus of the plasma treatment. The first electrode may include a plurality of first electrodes, where each of the plurality of first electrodes is concentrically arranged within the covering material. The plurality of first electrodes may be separated by one or more second electrodes.

[0020] In yet another example, the device may include a plurality of first electrodes, where each of the plurality of first electrodes may be provided as fins that extend radially through the covering material. In this case, the device may further include a plurality of second electrodes, which are provided as fins that extend radially through the covering material and are interspersed with the first electrodes. In this case, rather than the first and second electrodes being separated by a layer of the cleaning member through which plasma is generated by electrical breakdown, the first and second electrodes may be separated by an arc or a portion of the cleaning member. Thus, electrical breakdown may occur on the arc or portion of the cleaning member.

[0021] In one embodiment, the device may include a reservoir for dispensing a liquid. The liquid may be any liquid suitable for cleaning a surface. For example, the liquid may include water or a solution of water and a cleaning agent. The device may be configured such that an electric field acts on the dispensed liquid to generate plasma. Specifically, electrical breakdown may occur on the liquid supplied or dispensed from the reservoir to the cleaning member or on the air bubbles suspended in the liquid. In this case, the second electrode may be disposed within the reservoir. Thus, the plasma may pass through the cleaning member and into the reservoir. Local heating caused by the high voltage may generate minute liquid vapor bubbles near the electrodes, which may facilitate the occurrence of electrical breakdown as substances in gaseous form are more easily ionized.

[0022] According to a second aspect of the present invention, there is provided a cleaning device for cleaning a surface, the cleaning device including a cleaning member and the device as described above. The cleaning device may be any device suitable for cleaning a surface. The cleaning device may be a dry cleaning device, such as a vacuum cleaner, or a wet cleaning device, such as a power mop. The cleaning device may be a manual device that is at least partially driven or controlled by a user, or a robotic device. All or part of the above-described device may be disposed within the cleaning device. For example, if the cleaning device is an electric device, the power source of the device may also be the power source of the cleaning device. The cleaning member and the device or at least a portion of the device may be substantially disposed within the cleaning head of the cleaning device.

[0023] The cleaning device may further include a second cleaning member. In this case, the device for treating the cleaning member may further include a third electrode, which is at least partially disposed within the second cleaning member and electrically connected to a power source. Then, the power source may be adapted to generate an electric field between the first electrode and the third electrode. In this case, the electric field will be generated on a portion of the two cleaning members. Thus, electrical breakdown and plasma generation will occur through at least a portion of the two cleaning members. Thus, the two cleaning members may be treated simultaneously by the same electrical breakdown between the first and third electrodes.

[0024] In a particular example, the cleaning member and the second cleaning member may be cylindrical cleaning members, and the first and third electrodes may be disposed concentrically within the cleaning member and the second cleaning member, respectively. For example, the first electrode may be separated from the third electrode by a portion of a covering material disposed around the cleaning member and a portion of a second covering material disposed around the second cleaning member. The cleaning member may be in contact with the second cleaning member, or the cleaning member may be separated from the second cleaning member by an air gap, in which case the first electrode may be separated from the third electrode by a portion of the covering material, the air gap, and a portion of the second covering material.

[0025] As described above, electrical breakdown will occur along the path of least resistance. In the case where the cleaning device includes a second cleaning member as described above, the second cleaning member will be located at or near the minimum separation region between the first and third electrodes. In an example where the first and third electrodes are cylindrical and disposed concentrically within the cleaning member, the minimum separation region between the first and third electrodes will be between the points on the cylindrical first and third electrodes that are closest to each other. If the cylindrical cleaning member rotates during operation of the cleaning device, as the cleaning member rotates, the minimum separation region between the first and third electrodes will vary with respect to the cleaning member, which means that electrical breakdown will occur at different locations on the cleaning member in use. Thus, when using the cleaning device, the treatment of the cleaning member by the generated plasma can be distributed over the entire cleaning member, thereby providing a more complete treatment of the cleaning member.

[0026] In one embodiment, the cleaning device may further include an air filtration system adapted to filter the air around the cleaning head. Generating plasma by discharging can result in the production of many by-product gases, such as ozone and nitrogen oxides. Thus, by providing the air around the cleaning member of the cleaning device to the air filtration system (which may contain some of these by-product gases when the system is in use), any by-product gases generated by the system can be removed. The air filtration system may include an air pump adapted to pump air around the cleaning head and a filter material in fluid communication with the air pump and adapted to filter the pumped air. The filter material may include one or more of the following: a liquid retained in a reservoir of a wet cleaning device such that the by-product gases are absorbed into the liquid; and an adsorption filter material that can adsorb nitrogen oxide and ozone gases, such as activated carbon or titanium dioxide. The filtered air may be provided back to the area around the cleaning member, or may be discharged from the cleaning device.

[0027] The cleaning device may further include a sensor in fluid communication with the cleaning member, the sensor being adapted to sense gaseous by-products of the plasma. The cleaning device may further include a controller adapted to control the operation of the cleaning device based on the output of the sensor. For example, if the sensor detects a high proportion of gaseous by-products being generated at the cleaning member, which may be compared with, for example, a threshold value, the controller may be adapted to perform one or more of the following: initiate an air filtration system; warn the user; and prevent further operation of the device.

[0028] According to a third aspect of the present invention, there is provided a cleaning system comprising: a cleaning device as described above; and a docking station adapted to receive the cleaning device, wherein a power supply is provided within the docking station, and wherein when the cleaning device is received within the docking station, a first electrode is electrically connectable to the power supply, the docking station comprising: a fourth electrode electrically connectable to the power supply, wherein the power supply is adapted to generate an electric field between the first electrode and the fourth electrode. Thus, the above-described apparatus for treating the cleaning member may be distributed between the cleaning device and the docking station. In particular, the power supply for generating the electric field at the first electrode may be located within the docking station rather than within the cleaning device itself. Thus, the treatment of the cleaning member may be carried out only when the cleaning device is received within the docking station and not during use of the device.

[0029] In the case where the cleaning member is cylindrical and the first electrode is concentrically disposed within the cleaning member, the docking station may include means for rotating the cleaning member when the cleaning device is received within the docking station, such as a motor connected to the cleaning member. The motor may be provided within the docking station or within the cleaning device and is activated when the cleaning device is received by the docking station. Additionally, the fourth electrode may remain stationary relative to the rotating cleaning member, which means that when the cleaning member rotates, the point of minimum separation between the first and fourth electrodes will change relative to the cleaning member. Thus, when electrical breakdown occurs and plasma is generated, the portion of the cleaning member exposed to the generated plasma will change as the cleaning member rotates.

[0030] The docking station may further include a water bath such that when the cleaning device is received within the docking station, the cleaning member is at least partially immersed in water. In this case, the fourth electrode may be disposed within the water bath. Bubbles and impurities suspended within the water bath may act as a mechanism to facilitate electrical breakdown between the first and fourth electrodes.

[0031] According to a fourth aspect of the present invention, there is provided a method for treating a cleaning member of a cleaning device, the method comprising: generating an electric field at a first electrode disposed at least partially within the cleaning member, thereby generating plasma at the cleaning member by means of a discharge. The method for treating the cleaning member may utilize any combination of the above-described features in the treatment of the cleaning member.

[0032] The present invention includes combinations of the described aspects and preferred features, unless such combinations are clearly impermissible or expressly avoided. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] Embodiments and experiments illustrating the principles of the present invention will now be discussed with reference to the accompanying drawings, in which:

[0034] Figure 1 A schematic view of an apparatus for processing a cleaning member is shown, in which a first electrode is entirely disposed within a covering material.

[0035] Figure 2 A schematic view of an apparatus for processing a cleaning member is shown, in which a first electrode is partially disposed within a covering material.

[0036] Figure 3 A schematic view of a cleaning device according to one aspect of the present invention is shown, in which the apparatus includes a second electrode in contact with the cleaning member.

[0037] Figure 4 A schematic view of a cleaning device according to another aspect of the present invention is shown, in which the second electrode is separated from the cleaning member by an air gap.

[0038] Figure 5 A schematic view of an apparatus for processing a cleaning member is shown, in which the first and second electrodes are concentrically disposed within a covering material.

[0039] Figure 6 A schematic view of an apparatus for processing a cleaning member having a reservoir is shown.

[0040] Figure 7 A schematic view of an apparatus for processing a cleaning member is shown, in which the first and second electrodes are provided as ribs radially extending through a covering material.

[0041] Figure 8 A schematic view of an apparatus for processing a cleaning member is shown, in which the covering material is provided with microparticles and / or nanoparticles.

[0042] Figure 9 A schematic view of an apparatus for processing a cleaning member and a second cleaning member is shown.

[0043] Figure 10 A schematic view of a cleaning system including a cleaning device and a docking station is shown.

[0044] Figure 11 A schematic view of a cleaning system including a cleaning device and a docking station having a water bath is shown.

[0045] Figure 12 A schematic view of a robotic cleaning device according to one aspect of the present invention is shown. DETAILED DESCRIPTION

[0046] Aspects and embodiments of the present invention will now be discussed with reference to the accompanying drawings. For those skilled in the art, other aspects and embodiments will be apparent. All documents mentioned herein are incorporated herein by reference.

[0047] According to one aspect of the present invention, there is provided an apparatus for treating a cleaning member to clean a surface, the apparatus comprising: a first electrode disposed at least partially within the cleaning member; and a power source electrically connected to the first electrode for generating an electric field at the first electrode to generate a plasma at the cleaning member.

[0048] Figure 1 A schematic view of an apparatus 100 for treating a cleaning member for cleaning a surface 110 is shown. In Figure 1 the example shown, the cleaning member is a cylindrical cleaning member comprising a roller body 120 and a covering material 130 disposed around the roller body. Further, the apparatus comprises a first electrode 140 connected to a power source 150. In Figure 1 the example shown, the first electrode is disposed entirely within the covering material. The first electrode is also cylindrical and is disposed concentrically around the roller body. The power source is a high voltage, high frequency AC power source. The frequency of the AC power source can be in the range of 0.1 to 100 kHz, for example between 1 and 10 kHz.

[0049] The plasma 160 is generated by the electric field generated at the first electrode 140. Electrical breakdown occurs when an electrical insulator is subjected to a high enough voltage that it suddenly becomes an electrical conductor and current passes through. This occurs when the applied voltage exceeds its breakdown voltage, which is a function of the dielectric strength, size and shape of the insulator and the position of the electrodes. In Figure 1 the example shown, the electrical insulator in which electrical breakdown occurs is the air and / or liquid between the first electrode and the surface 110 to be cleaned, which surface serves as an electrical ground. In particular, the plasma 160 will be generated along an air and / or liquid path through the covering material 130 separating the first electrode from the surface. The air and / or liquid path can be defined according to the nature of the covering material. For a sponge covering material, the air path is defined by the porous structure of the sponge covering material.

[0050] In Figure 1 the example shown, the ideal shape of the electric field generated by the first conductor 140 will be similar to the ideal electric field of an infinitely conducting cylinder and can be studied using Gauss's law, which is well understood. For illustrative purposes, adopting the ideal shape of the electric field, the shape of the electric field generated by the first conductor will be approximately cylindrical and will extend radially from the first conductor. The electric field is stronger closer to the first conductor and weaker further away from the conductor.

[0051] SeeFigure 1 The distance between the first conductor 140 and the surface 110 is minimized at the contact point of the cleaning member and thus the covering material 130 with the surface. Thus, the plasma 160 will be generated at the minimum separation point between the first conductor and the surface 110, since this is where the electric field between the first conductor and the surface is strongest between the two points.

[0052] In Figure 1 the example shown, the cleaning member is a roller and, when used to clean the surface, is adapted to roll on the surface 110. Since the first electrode 140 is concentrically arranged around the roller body 120, the first electrode will also rotate when the cleaning member rolls on the surface. Thus, the minimum separation point between the first conductor and the surface will effectively pass through the covering material 130 of the cleaning member, which means that plasma will be generated throughout the cleaning member when the cleaning member rotates. In other words, when the cleaning member rotates in use, different parts of the covering material will pass through the minimum separation point between the first conductor and the surface. After a full rotation, all of the covering material may have been treated by the generated plasma.

[0053] Figure 2 A schematic view of an apparatus 170 for treating a cleaning member for cleaning a surface 110 according to another aspect of the present invention is shown. In Figure 2 the example shown, the cleaning member is a cylindrical cleaning member comprising a roller body 120 and a covering material 130 arranged around the roller body. Further, the apparatus includes a first electrode 140 connected to a power supply 150. In Figure 2 the example shown, the first electrode is disposed within the covering material but is separated from the roller body by a portion of the covering material. The first electrode is also cylindrical and is arranged concentrically around the roller body. The power supply is a high voltage AC power supply.

[0054] As described above, Figure 2 the apparatus 170 will operate in substantially the same manner as Figure 1 the apparatus 100. However, the generated plasma 160 will not be generated throughout the entire thickness of the covering material 130, but rather on the portion of the covering material that separates the first electrode 140 and the surface.

[0055] Figure 3 A schematic view of a cleaning apparatus 200 according to one aspect of the present invention is shown. Specifically, Figure 3 the example shown depicts a portion of the cleaning head of the cleaning apparatus, more specifically, a wet cleaning apparatus. Figure 3 The cleaning head shown can be part of a robotic or user-operated cleaning apparatus.

[0056] The cleaning device 200 includes a cleaning member having a roller body 120 and a covering material 130 disposed around the roller body. In addition, the cleaning device includes the above-described equipment which includes a first electrode 140 and a power supply 150. The first electrode and the power supply are arranged around the cleaning member and operate in a manner similar to Figure 1 the equipment shown.

[0057] In addition to the first electrode 140, the equipment further includes a second electrode 210 electrically connected to the power supply 150. Thus, the electric field generated by the power supply is located between the first electrode and the second electrode, which means that the position and shape of the plasma 160 generated by the electrical breakdown between the first electrode and the second electrode can be controlled more accurately and precisely.

[0058] Similar to Figure 1 and Figure 2 the example shown, the cleaning member is a roller and is adapted to roll on a surface during use. Since the first electrode 140 is disposed concentrically around the roller body 120, when the cleaning member rolls on the surface, the first electrode will also rotate. Thus, the minimum separation point between the first electrode, which remains stationary relative to the cleaning member, and the second electrode 210 will effectively pass through the covering material 130 of the cleaning member as the cleaning member rotates. Therefore, plasma will be generated throughout the cleaning member when the cleaning member rotates. In other words, different portions of the covering material will pass through the minimum separation point between the first and second electrodes as the cleaning member rotates. After a full rotation, all of the covering material may have been treated by the generated plasma.

[0059] Figure 3 The second electrode 210 shown is incorporated into a calender in contact with the covering material 130. In this case, the electrical breakdown between the first and second electrodes may occur only through the portion of the cleaning member that separates the first and second electrodes (i.e., the covering material 130). The calender applies pressure to the covering material 130 and can be used to remove excess liquid from the covering material as the cleaning member rotates.

[0060] Figure 4 A schematic view of a cleaning device 230 according to another aspect of the present invention is shown. Figure 4 The structure of the cleaning device shown is similar to Figure 3 the structure shown; however, in Figure 4 the example shown, the second electrode 210 is separated from the first electrode 140 and the covering material 130 by an air gap. In this case, the electrical breakdown between the first and second electrodes generates a plasma 160 that passes through the covering material and through the air gap between the cleaning member and the second electrode.

[0061] Figure 5FIG. shows a schematic view of an apparatus 250 for processing a cleaning member according to another aspect of the present invention. In Figure 5 In the example shown, the cleaning member is a cylindrical cleaning member including a roller body 120 and a covering material 130 disposed around the roller body. Further, the apparatus includes a plurality of first electrodes 140a and 140b and a second electrode 210 connected to a power supply 150.

[0062] In Figure 5 In the example shown, the second electrode 210 is concentrically disposed between the two first electrodes 140a and 140b such that a plasma 160 will be generated between each of the two first electrodes 140a and 140b and the second electrode. In the case of a sponge covering material, the electrodes may be provided as a metal or metal oxide thin film coating on the cylindrical surface layer of the sponge. In this case, both the first and second electrodes are disposed within the cleaning member, which means that the portion of the cleaning member separating the first and second electrodes will be subjected to plasma treatment.

[0063] Figure 6 FIG. shows a schematic view of an apparatus 260 for processing a cleaning member according to another aspect of the present invention. In Figure 6 In the example shown, the apparatus further includes a reservoir 265 for dispensing liquid onto the cleaning member. For example, the covering material 130 may be a porous sponge covering material adapted to absorb the liquid dispensed from the reservoir and deposit the liquid onto the surface 110 to be cleaned. The liquid may include water or a solution of water and a cleaning agent.

[0064] The apparatus 260 is configured such that an electric field acts on the dispensed liquid to generate a plasma 160. In particular, electrical breakdown may occur on the bubbles or impurities suspended in the liquid dispensed from the reservoir and / or in the liquid droplets themselves. In Figure 6 In the example shown, the second electrode may be disposed within the reservoir. In this case, the liquid droplets act as the second electrode 210. To deliver power to the liquid droplets, the reservoir may include a conducting wire or mesh, or a ceramic coating / anodized conductive material to increase corrosion resistance.

[0065] Figure 7 FIG. shows a schematic view of an apparatus 270 for processing a cleaning member according to another aspect of the present invention. In Figure 7 In the example shown, the apparatus includes a plurality of first electrodes 140 and a plurality of second electrodes 210 provided as ribs radially extending through the covering material 130.

[0066] The second electrode 210 is arranged in an interleaved manner with the first electrode 140 such that the electric field penetrates the covering material 130 provided between each electrode. In this case, instead of the first and second electrodes being separated by a layer of the cleaning member through which plasma is generated by electrical breakdown, the first and second electrodes can be separated by an arc or a portion of the cleaning member. Thus, the plasma 1660 can be generated on the arc or portion of the covering material.

[0067] Figure 8 A schematic view of an apparatus 280 for treating a cleaning member according to another aspect of the present invention is shown. In Figure 8 the example shown, the cleaning member is a cylindrical cleaning member including a roller body 120 and a covering material 130 provided around the roller body. In addition, the apparatus includes a first electrode 140 that is connected to a power source 150 and is concentrically arranged around the roller body.

[0068] In Figure 8 the example shown, the covering material 130 is provided with a plurality of particles 290, which can be micron particles and / or nano particles 290 adapted to electrically interact with the first electrode. The plurality of particles can include one or more of the following: ferroelectric particles; piezoelectric particles; metal particles; and dielectric particles. The plurality of particles can be provided in a thin film on or within the covering material. By providing these particles to the covering material, the average dielectric strength on the cleaning member can be reduced, which in turn promotes electrical breakdown and thus promotes the generation of plasma for treating the cleaning member. Similar to Figure 1 the embodiment shown, in Figure 8 the example, the plasma 160 will be generated at the point of minimum separation between the first electrode and the surface because no second electrode is provided in this case. The distance between the first conductor 140 and the surface 110 is minimized at the point of contact of the cleaning member and thus the covering material 130 with the surface. Thus, the plasma 160 will be generated at the point of minimum separation between the first conductor and the surface 110 because this is where the electric field between the first conductor and the surface is the strongest.

[0069] Figure 9 A schematic view of an apparatus 300 for treating a cleaning member 310 and a second cleaning member 320 is shown. In Figure 9 the example shown, the cleaning member 310 is a cylindrical cleaning member including a roller body 312 and a covering material 314 provided around the roller body. In addition, the apparatus includes a first electrode 316 that is connected to a power source 150 and is concentrically arranged around the roller body. The second cleaning member 320 is also a cylindrical cleaning member including a second roller body 322 and a second covering material 324 provided around the second roller body. In addition, the apparatus includes a third electrode 316 that is connected to a power source 150 and is concentrically arranged around the second roller body.

[0070] In this case, the power supply 150 is adapted to generate an electric field between the first electrode 316 and the third electrode 326, which means that the electric field will be generated over a portion of the two cleaning members through the covering material 314 and the second covering material 324. Accordingly, the plasma 160 will be generated through at least a portion of the two cleaning members. Thus, the two cleaning members can be treated simultaneously by the same electrical breakdown between the first and third electrodes. In Figure 9 the example shown, the cleaning member 310 and the second cleaning member 320 are separated by an air gap. However, they can also be arranged to be in contact with each other when the cleaning members rotate in opposite directions.

[0071] As described above, the electrical breakdown will occur along the path of least resistance. In Figure 9 the example shown, this will be in the region of the minimum separation between the first electrode 316 and the third electrode 326. When the cylindrical cleaning members 310 and 320 rotate during operation of the cleaning device, the region of minimum separation between the first and third electrodes will change as the cleaning members rotate, which means that the electrical breakdown will occur at different positions on the cleaning members in use. Thus, when using the cleaning device, the treatment of the cleaning members by the generated plasma 160 can be distributed over the entire cleaning members, thereby providing a more complete treatment of the cleaning members.

[0072] Each of the devices described above can be incorporated into a cleaning device for cleaning a surface, such as the cleaning device described above with respect to Figure 3 and 4 . Such a cleaning device can also include an air filtration system adapted to filter the air around the cleaning head. Generating plasma by discharging can result in the production of many by-product gases, such as ozone and nitrogen oxides. Thus, by supplying the air around the cleaning members of the cleaning device to the air filtration system (which may contain some of these by-product gases when the system is in use), any by-product gases generated by the system can be removed. The air filtration system can include an air pump adapted to pump air around the cleaning head and a filter material in fluid communication with the air pump and adapted to filter the pumped air. In the case where the cleaning device is a vacuum cleaning device, the air pump for the air filtration system can also be the air pump for generating the vacuum. The filter material can include one or more of the following: a liquid, held in a reservoir of a wet cleaning device such that the by-product gases are absorbed into the liquid; and an activated carbon filter. The filtered air can be supplied back to the area around the cleaning members or can be discharged from the cleaning device.

[0073] The cleaning device may further include a sensor in fluid communication with the cleaning member, the sensor being adapted to sense gaseous by-products of the plasma. The cleaning device may further include a controller adapted to control the operation of the cleaning device based on the output of the sensor. For example, if the sensor detects a high proportion of gaseous by-products being generated at the cleaning member, which may be compared to a threshold for example, the controller may be adapted to perform one or more of the following: initiate an air filtration system; warn the user; and prevent further operation of the device.

[0074] Figure 10 A schematic view of a cleaning system 350 is shown, the cleaning system 350 including a cleaning device which, in this particular illustration, is the cleaning device described above with reference to Figure 3 and a docking station 360. The docking station 360 is adapted to receive the cleaning device.

[0075] In Figure 10 the example shown, a power supply 150 is provided as part of the docking station 360. Thus, the equipment for cleaning the cleaning member of the cleaning device is distributed across the cleaning device and the docking station. The cleaning member is a cylindrical cleaning member including a roller body 120 and a covering material 130 disposed around the roller body. Additionally, the equipment includes a first electrode 140 which is connected to the power supply 150 and is concentrically disposed around the roller body. When the cleaning device is received in the docking station 360, the first electrode 140 can be electrically connected to the power supply 150. The docking station includes a fourth electrode 370 which can be electrically connected to the power supply 150. In this case, the power supply is adapted to generate an electric field between the first electrode and the fourth electrode. Thus, the treatment of the cleaning member can be carried out when the cleaning device is received in the docking station rather than when the device is in use. It should be noted that, as described above, the cleaning device may also include its own power supply and a second electrode in order to treat the cleaning member when the cleaning device is in use.

[0076] In Figure 10 the example shown, the cleaning member is cylindrical and the first electrode 140 is concentrically disposed within the cleaning member. Thus, the docking station may include means for rotating the cleaning member when the cleaning device is received in the docking station. For example, a docking station such as a motor connected to the cleaning member. Alternatively, the motor may be provided in the cleaning device and be activated when the cleaning device is received by the docking station. Since the fourth electrode 370 remains stationary relative to the rotating cleaning member, when the cleaning member rotates, the point of minimum separation between the first electrode 140 and the fourth electrode 370 will change relative to the cleaning member. Thus, when electrical breakdown occurs and plasma is generated, the portion of the cleaning member exposed to the generated plasma will change as the cleaning member rotates.

[0077] Figure 11FIG. 380 shows a schematic diagram of a cleaning system 380 according to another aspect of the present invention, the cleaning system 380 including a cleaning device and a docking station 360. In Figure 11 the illustrated example, the docking station further includes a water bath 390 such that when the cleaning device is received in the docking station, the cleaning member is at least partially submerged in water. In such a case, a fourth electrode 370 may be disposed within the water bath. Bubbles and impurities suspended in the water bath may serve as a mechanism to facilitate electrical breakdown between the first and fourth electrodes.

[0078] Figure 12 FIG. 400 shows a schematic diagram of a robotic cleaning device 410 according to one aspect of the present invention. Figure 12 FIG. 420 shows a cross-sectional view of the cleaning member of the robotic cleaning device.

[0079] The examples given above have been described in the context of a user-operated cleaning device. However, the above systems are applicable to a variety of types of cleaning appliances, such as Figure 12 the robotic cleaning device 410 shown. In particular, the robotic cleaning device may include a cleaning member having a roller body 120 and a covering material 130 as described above. In Figure 12 the illustrated example, a first electrode 140 is disposed within the covering material of the cleaning member and a second electrode 210 is disposed outside the cleaning member, thereby generating a plasma between the first and second electrodes and passing through the covering material of the cleaning member, as described above. The robotic cleaning device may include any of the above electrode arrangements and may work with the docking station described above with reference to Figure 10 and / or 11.

[0080] The features disclosed in the foregoing description, or in the following claims, or in the drawings, expressed in their specific forms or in terms of means for performing the disclosed functions, or methods or processes for obtaining the disclosed results, may, where appropriate, be used individually or in any combination of these features to implement the present invention in its different forms.

[0081] Although the present invention has been described in conjunction with the above exemplary embodiments, many equivalent modifications and variations will be apparent to those skilled in the art when the present disclosure is given. Accordingly, the above exemplary embodiments of the present invention are considered illustrative rather than restrictive. Various changes may be made to the described embodiments without departing from the spirit and scope of the present invention.

[0082] For the avoidance of any doubt, any theoretical explanations provided herein are for the purpose of enhancing the reader's understanding. The inventors do not wish to be bound by any of these theoretical explanations.

[0083] Any chapter headings used in this document are for organizing purposes only and should not be construed as limiting the subject matter described.

[0084] Throughout the specification, including the claims that follow, unless the context requires otherwise, the words "comprise" and "include" and variations thereof will be understood to imply the inclusion of the stated integer or step or group of integers or steps but not the exclusion of any other integer or step or group of integers or steps.

[0085] It must be noted that, as used in the specification and the appended claims, the singular forms "a," "an," and "the" include plural referents unless the context clearly dictates otherwise. Ranges may be expressed herein as from "about" a particular value, and / or to "about" another particular value. When such a range is expressed, another embodiment includes from the one particular value and / or to the other particular value. Similarly, when values are expressed as approximations by use of the antecedent "about," it will be understood that the particular value forms another embodiment. The term "about" associated with a numerical value is optional and means, for example, + / - 10%.

Claims

1. An apparatus for treating a cleaning member for cleaning a surface, the apparatus comprising: a first electrode disposed at least partially within the cleaning member; and a power supply electrically connected to the first electrode for generating an electric field at the first electrode to generate plasma at the cleaning member.

2. The device according to claim 1, wherein The cleaning member includes a body and a covering material surrounding the body, and the first electrode is disposed at least partially within the covering material.

3. The device according to claim 1 or 2, wherein The apparatus further includes a second electrode electrically connected to the power supply, and wherein the power supply is adapted to generate an electric field between the first electrode and the second electrode.

4. The device according to claim 3, wherein, The first electrode and the second electrode are separated by an air gap.

5. The device according to claim 3, wherein The second electrode is in contact with the cleaning member.

6. The device according to claim 5, wherein, The second electrode is disposed concentrically with the first electrode within the cleaning member.

7. The device according to claim 6, wherein, The first electrode includes a plurality of first electrodes, wherein each of the plurality of first electrodes is disposed concentrically within the covering material.

8. The apparatus according to any one of claims 3 to 5, wherein, The apparatus further includes a reservoir for dispensing a liquid, and the apparatus is configured such that the electric field acts on the dispensed liquid to generate the plasma, and wherein the second electrode is disposed within the reservoir.

9. The device according to claim 3, wherein, The apparatus includes a plurality of first electrodes, wherein each of the plurality of first electrodes is provided as a fin radially extending through the covering material.

10. The device according to claim 9, wherein, The apparatus includes a plurality of second electrodes, the second electrodes being provided as fins radially extending through the covering material and interleaved with the first electrodes.

11. A cleaning device for cleaning a surface, the cleaning device comprising a cleaning member and the apparatus according to any one of claims 1 to 10.

12. The cleaning device according to claim 11, wherein, The cleaning member includes a covering material, and the covering material includes one or more of the following: sponge material; and microfiber material.

13. The cleaning device according to claim 12, wherein, The covering material includes a plurality of nanoparticles and / or microparticles adapted to interact electrically with the first electrode, the plurality of particles including one or more of the following: ferroelectric particles; piezoelectric particles; metal particles; and dielectric particles.

14. The cleaning device according to claim 13, wherein, The plurality of nanoparticles and / or microparticles are provided as a thin film on the covering material.

15. The cleaning device according to any one of claims 11 to 14, wherein, The cleaning device includes a second cleaning member, wherein the apparatus further includes a third electrode disposed at least partially within the second cleaning member and electrically connected to the power supply, wherein the power supply is adapted to generate an electric field between the first electrode and the third electrode.

16. The cleaning device according to any one of claims 11 to 15, wherein, The cleaning device further includes an air filtration system adapted to filter air around the cleaning head, the air filtration system including: an air pump adapted to pump air from around the cleaning head; and a filter material in fluid communication with the air pump and adapted to filter the pumped air.

17. The cleaning device according to claim 16, wherein, The filter material includes one or more of the following: a liquid held in a reservoir of the cleaning device; and an adsorption filter material.

18. The cleaning device according to any one of claims 11 to 17, wherein The cleaning device further includes a sensor in fluid communication with the cleaning member, the sensor adapted to sense gaseous by-products of the plasma.

19. The cleaning device according to claim 18, wherein, The cleaning device further includes a controller adapted to control the operation of the cleaning device based on the output of the sensor.

20. The cleaning device according to any one of claims 11 to 19, wherein, The cleaning device is a manual cleaning device.

21. The cleaning device according to any one of claims 11 to 19, wherein, The cleaning device is a robotic cleaning device.

22. A cleaning system, the system comprising: the cleaning device according to any one of claims 11 to 21; and A docking station adapted to receive a cleaning device, wherein a power supply is provided within the docking station, and wherein a first electrode is electrically connectable to the power supply when the cleaning device is received in the docking station, the docking station comprising: A fourth electrode electrically connectable to the power supply, wherein the power supply is adapted to generate an electric field between the first electrode and the fourth electrode.

23. The cleaning system according to claim 22, wherein, The docking station further includes a water bath such that when the cleaning device is received in the docking station, the cleaning member is at least partially submerged, and wherein the fourth electrode is disposed within the water bath.

24. A method for treating a cleaning member of a cleaning device, the method comprising: Generating an electric field at a first electrode disposed at least partially within the cleaning member, thereby generating a plasma at the cleaning member by discharging.

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