Air purification device for wafer prober

Abstract

The invention relates to the technical field of air purification equipment, and discloses an air purification device for a wafer prober, which comprises a filter bin, one side of the filter bin is open, a cylindrical filter screen device is movably arranged in the filter bin, a sealing plate strip is arranged in the filter screen device, a positioning plate strip is arranged in the filter bin, and the positioning plate strip is arranged in the filter bin. And a groove positioned on one side of the sealing plate strip is formed in the positioning plate strip. Through the structural design of a cylindrical filter screen device capable of rotating slowly, a sealing plate strip and a positioning plate strip are arranged on the inner side and the outer side of the filter screen device respectively and are fixedly arranged with a filter bin, and a groove is formed in the side, facing the sealing plate strip, of the positioning plate strip; impurities on the outer side of the filter screen cylinder rotating to the groove are adsorbed and discharged, the surface of the filter screen used for filtering air is always kept smooth, and continuous and efficient air filtering is facilitated.

Description

Technical Field

[0001] This application relates to the technical field of air purification equipment, and particularly to an air purification device for a wafer prober. Background Art

[0002] A wafer prober is a probe test device used for wafer testing to identify functional chips. The wafer prober has high requirements for the working environment and needs to work in a clean room environment. Since the wafer is mostly exposed to air during the testing process, particles in the air (such as dust, pollen, animal hair, etc.), harmful gases (such as formaldehyde, benzene, etc.), and static electricity can all cause destructive damage to the wafer. Therefore, it is necessary to purify the air, and filtering the particles in the air is an essential step in air purification.

[0003] The cleanliness level of a clean room is usually specified according to the number of particles with a diameter greater than a certain size per cubic meter of air. For wafer testing, the clean room environment level is generally Class 1000. However, for some high - requirement Sensor chips, it may be required to reach Class 100 or a higher level. Due to the requirement of the clean room environment for the particle diameter size in the air, the pore diameter of the filter screen is extremely small. During the air filtration of existing equipment, impurities after filtration are likely to accumulate at the filter screen holes, which will affect the filtration efficiency. Conventional filtration equipment uses methods such as cleaning or back - blowing the surface of the filter screen to avoid this problem. However, the fine particle impurities after cleaning are still near the filter screen and will quickly accumulate on the surface of the filter screen again during filtration. When continuously filtering air, it is still difficult to improve the filtration efficiency. Summary of the Invention

[0004] This application proposes an air purification device for a wafer prober, which has the advantages of continuous and efficient air filtration, and is used to solve the problem that when the existing air filtration equipment filters air for the dust - free environment of the wafer prober, it is easy to cause blockage of the filter screen surface quickly due to the accumulation of impurities after filtration on the periphery of the filter screen.

[0005] To achieve the above object, this application adopts the following technical solution: An air purification device for a wafer prober includes a filter chamber. One side of the filter chamber is designed with an opening, and a cylindrical filter screen device is movably arranged in the filter chamber. A first servo - motor for driving the filter screen device to rotate is installed at the bottom of the filter chamber.

[0006] The filter device includes a filter cylinder, a fixed frame is arranged on the outer side of the filter cylinder, a gas guide pipe is connected through a rotary joint at the top of the filter device, a sealing partition strip away from the opening side of the filter bin is arranged in the filter cylinder, the outer side of the sealing partition strip is movably attached to the inner side of the filter cylinder, and the sealing partition strip is fixedly arranged with the filter bin. A positioning plate strip is arranged in the filter bin, one side of the positioning plate strip is movably attached to the fixed frame on the outer side of the filter cylinder, a groove is formed in the positioning plate strip on one side of the sealing partition strip, an air vent communicating with the groove is further formed at the bottom of the positioning plate strip, an exhaust pipe communicating with the air vent is arranged at the bottom of the filter bin, one end of the exhaust pipe is connected to the air inlet of a negative pressure pump, the negative pressure pump is fixedly installed at the bottom of the filter bin, and impurities on the outer side of the filter cylinder rotated to the groove are adsorbed and discharged by starting the negative pressure pump.

[0007] Further, the filter bin includes a bottom plate, a surrounding plate is fixedly installed on the top of the bottom plate, one side of the surrounding plate is designed to be open, and a top plate is fixedly installed on the top of the surrounding plate.

[0008] Further, a lower partition board is fixedly connected to the bottom of the filter cylinder, a planar bearing is connected between the bottom of the lower partition board and the top of the bottom plate, an upper partition board is fixedly connected to the top of the filter cylinder, and a planar bearing is also connected between the top of the upper partition board and the bottom of the top plate.

[0009] Further, a lower shaft sleeve is connected to the middle of the bottom end of the lower partition board, the bottom end of the lower shaft sleeve extends below the bottom plate and is provided with a passive gear, the passive gear and the lower shaft sleeve are fixedly installed on the lower partition board through bolts, a fixed frame is fixedly installed at the bottom of the bottom plate, and the first servo motor is fixedly installed on the fixed frame.

[0010] Further, the fixed frame includes a plurality of positioning pin shafts connected to the bottom of the bottom plate, and a positioning plate is connected to the bottom end of the positioning pin shaft. A first servo motor is fixedly installed on one side of the bottom of the positioning plate, an output rotating shaft of the first servo motor extends above the positioning plate and is fixedly installed with a driving gear, and the external teeth of the driving gear are meshed with the external teeth of the passive gear.

[0011] Further, a positioning column is fixedly installed on the top of the positioning plate, the top end of the positioning column extends into the interior of the filter cylinder, and a positioning cross bar located inside the filter cylinder is fixedly installed on the outer side of the positioning column. The number of the positioning cross bars is not less than two, and the positioning cross bars are longitudinally arranged at equal intervals on the filter cylinder. One end of the positioning cross bar away from the positioning column is fixedly connected to one side of the sealing partition strip away from the groove.

[0012] Further, a lower ring sleeve is fixedly installed at the top of the lower partition plate. A bearing is provided between the lower ring sleeve and the positioning column. A sealing ring is provided at the top of the lower ring sleeve, and the inner side of the sealing ring is in sealed contact with the outer side of the positioning column.

[0013] Further, a limiting frame is fixedly installed at the bottom of the upper partition plate. The limiting frame includes a positioning ring plate fixedly installed at the bottom of the upper partition plate. A plurality of vertical plates are fixedly connected to the bottom of the positioning ring plate, and the plurality of vertical plates are circumferentially and arrayedly distributed on the positioning ring plate. A limiting plate is fixedly connected to the bottom of the vertical plate. An upper ring sleeve is fixedly installed at the bottom of the limiting plate. A bearing is provided between the upper ring sleeve and the top of the positioning column.

[0014] Further, the fixed frame includes a plurality of annular hoops and reinforcing ribs. The plurality of annular hoops are longitudinally and equidistantly arranged and distributed on the outer side of the filter screen cylinder. The plurality of reinforcing ribs are circumferentially and arrayedly distributed on the outer side of the filter screen cylinder, and both ends of the reinforcing ribs are fixedly connected to the annular hoops on the outer side of the filter screen cylinder.

[0015] Further, a pressure roller is provided inside the filter chamber and is located outside the filter screen device. The outer side of the pressure roller is in contact with the annular hoop on the outer side of the filter screen cylinder. A second servo motor for driving the pressure roller to rotate is fixedly installed at the top of the filter chamber.

[0016] The beneficial effects of the present invention are as follows:

[0017] 1. An air purification device for a wafer prober provided by the present application, through the structural design of a cylindrical filter screen device that can rotate at a slow speed, a sealing partition strip and a positioning partition strip are respectively arranged on the inner and outer sides of the filter screen device. The sealing partition strip and the positioning partition strip are fixedly arranged with the filter chamber, and a groove is formed on the side of the positioning partition strip facing the sealing partition strip. During the air filtration process, by using the negative pressure suction of the groove, the impurities on the outer side of the filter screen cylinder rotated to the groove are adsorbed and discharged, realizing that the surface of the filter screen device for filtering air always remains unobstructed, which is beneficial to the continuous and efficient filtration of air.

[0018] 2. An air purification device for a wafer prober provided by the present application, through a pressure roller provided inside the filter chamber and located outside the filter screen device, the outer side of the pressure roller is in contact with the annular hoop on the outer side of the filter screen cylinder, and the pressure roller rotates synchronously with the filter screen device. The impurities protruding from the outer surface of the filter screen cylinder to the outside of the annular hoop and the reinforcing ribs are compacted by the pressure roller, preventing the impurities protruding from the outer surface of the filter screen cylinder to the outside of the annular hoop from being scraped off by the positioning partition strip and accumulating inside the filter chamber, affecting the subsequent filtration efficiency. Furthermore, it ensures that the impurities adsorbed on the surface of the filter screen cylinder or blocked at the filter opening of the filter screen cylinder can be discharged from the filter chamber without affecting the air filtration efficiency inside the filter chamber. Description of the Drawings

[0019] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings required for the description of the embodiments or the prior art. Obviously, the drawings in the following description are only the embodiments of the present invention. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained according to the provided drawings:

[0020] Figure 1 Structural schematic diagram of the present invention;

[0021] Figure 2 For Figure 1 Left view of;

[0022] Figure 3 For Figure 1 Cross-sectional structural schematic diagram at a-a of the filter bin in;

[0023] Figure 4 For Figure 4 Local enlarged structural schematic diagram at A of;

[0024] Figure 5 For Figure 1 Front view of;

[0025] Figure 6 For Figure 5 Cross-sectional structural schematic diagram at b-b of;

[0026] Figure 7 For Figure 1 Structural schematic diagram after removing the surrounding plate in;

[0027] Figure 8 For Figure 3 Local enlarged structural schematic diagram at B of;

[0028] Figure 9 For Figure 8 Complete structural schematic diagram of the limit frame in;

[0029] Figure 10 For Figure 1 Right view of.

[0030] In the figure: 1, bottom plate; 2, enclosing plate; 3, top plate; 4, filter screen cylinder; 5, annular hoop; 6, reinforcing rib; 7, lower partition plate; 8, upper partition plate; 9, lower shaft sleeve; 10, passive gear; 11, positioning pin shaft; 12, positioning plate; 13, first servo motor; 14, driving gear; 15, upper shaft sleeve; 16, rotary joint; 17, air duct; 18, positioning column; 19, positioning cross bar; 20, sealing partition strip; 21, positioning strip; 211, groove; 212, ventilation hole; 213, water through hole; 22, exhaust pipe; 23, negative pressure pump; 24, lower annular sleeve; 25, sealing ring; 26, positioning ring plate; 27, vertical plate; 28, limiting plate; 29, upper annular sleeve; 30, pressing roller; 31, second servo motor; 32, water duct; 33, water inlet pipe; 34, drain pipe. Detailed implementation mode

[0031] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present invention without creative efforts shall fall within the protection scope of the present invention.

[0032] Example, as Figure 1 - Figure 2 , an air purification device for a wafer prober, includes a filter chamber. The filter chamber includes a bottom plate 1. A enclosing plate 2 is fixedly installed on the top of the bottom plate 1. One side of the enclosing plate 2 is designed as an opening. A top plate 3 is fixedly installed on the top of the enclosing plate 2. A filter screen device is installed inside the enclosing plate 2. Please refer to Figure 2 - Figure 3 , the filter screen device includes a filter screen cylinder 4. A plurality of annular hoops 5 are fixedly installed on the outer side of the filter screen cylinder 4. The number of the annular hoops 5 is not less than two, and a plurality of annular hoops 5 are longitudinally arranged at equal intervals on the outer side of the filter screen cylinder 4. A plurality of reinforcing ribs 6 are also fixedly installed on the outer side of the filter screen cylinder 4, and the number of the reinforcing ribs 6 is not less than two. A plurality of reinforcing ribs 6 are circumferentially arrayed on the outer side of the filter screen cylinder 4, and both ends of the reinforcing ribs 6 are respectively fixedly connected with the annular hoops 5 on the outer side of the filter screen cylinder 4. The air is filtered by the surface of the filter screen cylinder 4 to achieve the purification effect. The fixing frame composed of the annular hoops 5 and the reinforcing ribs 6 is used to reinforce the filter screen cylinder 4, so that the filter screen cylinder 4 can always maintain a stable cylindrical state during the air filtration. The bottom of the filter screen cylinder 4 is fixedly connected with a lower partition plate 7. A plane bearing is connected between the bottom of the lower partition plate 7 and the top of the bottom plate 1. The top of the filter screen cylinder 4 is fixedly connected with an upper partition plate 8, and a plane bearing is also connected between the top of the upper partition plate 8 and the bottom of the top plate 3, so that the cylindrical filter screen device can rotate in the filter chamber.

[0033] Please refer to Figure 2 - Figure 4, a lower shaft sleeve 9 is connected to the middle of the bottom end of the lower partition plate 7. The bottom end of the lower shaft sleeve 9 extends below the bottom plate 1 and is equipped with a driven gear 10. The driven gear 10 and the lower shaft sleeve 9 are fixedly installed on the lower partition plate 7 through bolts. A fixing frame is fixedly installed at the bottom of the bottom plate 1. The fixing frame includes a plurality of positioning pin shafts 11 connected to the bottom of the bottom plate 1. The number of the positioning pin shafts 11 is not less than four, and the bottom end of the positioning pin shaft 11 is connected with a positioning plate 12. The positioning plate 12 is fixed to the bottom plate 1 through nuts at both ends of the positioning pin shaft 11. A first servo motor 13 is fixedly installed on one side of the bottom of the positioning plate 12. The output rotating shaft of the first servo motor 13 extends above the positioning plate 12 and is fixedly installed with a driving gear 14. The external teeth of the driving gear 14 mesh with the external teeth of the driven gear 10. By driving the piston shaft by the first servo motor 13 to drive the driving gear 14 to rotate, the driven gear 10 is driven to rotate, so as to drive the lower shaft sleeve 9 and the lower partition plate 7 to rotate together, and then the filter device can be driven to rotate.

[0034] Please continue to refer to Figure 1 - Figure 3 , an upper shaft sleeve 15 is installed in the middle of the top end of the upper partition plate 8. A rotary joint 16 is installed at the top of the upper shaft sleeve 15. One end of the rotary joint 16 away from the upper shaft sleeve 15 is connected with an air guide pipe 17. External air enters through an opening on one side of the filter chamber, and then enters the inside of the filter device through the filtration of the filter cartridge 4. The air purified by filtration flows from the upper shaft sleeve 15, the rotary joint 16 and the air guide pipe 17 into the dust-free room where the wafer prober works. And the setting of the rotary joint 16 does not affect the rotation of the filter device while filtering the air.

[0035] Please continue to refer to Figure 3 - Figure 7 , a positioning column 18 is fixedly installed at the top of the positioning plate 12. The top end of the positioning column 18 extends into the inside of the filter cartridge 4. And a positioning cross bar 19 located inside the filter cartridge 4 is fixedly installed on the outer side of the positioning column 18. The number of the positioning cross bars 19 is not less than two, and the positioning cross bars 19 are longitudinally arranged at equal intervals on the filter cartridge 4. One end of the positioning cross bar 19 away from the positioning column 18 is fixedly connected with a sealing partition strip 20. One side of the sealing partition strip 20 away from the positioning cross bar 19 is movably attached to the inner wall of the filter cartridge 4. A positioning plate strip 21 located on one side of the filter device is fixedly installed inside the filter chamber. One side of the positioning plate strip 21 facing the filter device is movably attached to the outer side of the annular hoop 5. And a groove 211 is opened on one side of the positioning plate strip 21 facing the filter device and located on one side of the sealing partition strip 20. An air vent hole 212 communicating with the groove 211 is opened at the bottom of the positioning plate strip 21. An exhaust pipe 22 communicating with the air vent hole 212 is fixedly installed at the bottom of the positioning plate strip 21. One end of the exhaust pipe 22 is connected to the air inlet of a negative pressure pump 23. The negative pressure pump 23 is fixedly installed at the bottom of the bottom plate 1.

[0036] When the filter cartridge 4 in the filter device is used to filter air, impurities in the air are blocked by the filter cartridge 4 and adsorbed on the filter cartridge 4. The filter device is driven by the first servo motor 13 to rotate slowly as a whole. At the same time, the negative pressure pump 23 is started to pump negative pressure in the chamber of the groove 211. When the filter cartridge 4 rotates to the area of the ventilation hole 212, the ventilation hole 212 and the inner cavity of the filter cartridge 4 are isolated by the sealing partition strip 20. Using the negative pressure suction in the ventilation hole 212, the impurities adsorbed on the filter cartridge 4 are sucked back and discharged from the exhaust port of the negative pressure pump 23, thus avoiding the problem that the impurities adsorbed on the filter cartridge 4 affect the subsequent work efficiency. And compared with the existing air purification filter equipment that uses the method of cleaning the impurities on the filter surface, it avoids the problem that the impurities outside the filter increase after long-term work, affecting the air filtration efficiency. And by adsorbing the impurities on the filter with negative pressure suction, the problem that the impurities are blocked in the filter holes of the filter can be avoided, further improving the air filtration efficiency.

[0037] A lower ring sleeve 24 is fixedly installed at the top of the lower partition plate 7. A bearing is arranged between the lower ring sleeve 24 and the positioning column 18. A sealing ring 25 is arranged at the top of the lower ring sleeve 24. The inner side of the sealing ring 25 is in sealing fit with the outer side of the positioning column 18. Using the sealing effect of the sealing ring 25, it is ensured that the lower partition plate 7 can rotate relative to the positioning column 18, so that the sealing partition strip 20 is always located on one side of the groove 211 in the filter cartridge 4, realizing the isolation of the inner cavities of the filter cartridge 4 and the groove 211, ensuring that the negative pressure suction in the inner cavity of the groove 211 will not affect the filtered air in the filter cartridge 4 flowing from the top to the dust-free room where the wafer prober works, and at the same time ensuring that the air in the filter cartridge 4 will not escape from the gap between the lower partition plate 7 and the positioning column 18, avoiding the problem of reduced filtration efficiency.

[0038] Please refer to Figure 3 , Figure 8 - Figure 9 , a limiting frame is fixedly installed at the bottom of the upper partition plate 8. The limiting frame includes a positioning ring plate 26 fixedly installed at the bottom of the upper partition plate 8. A plurality of vertical plates 27 are fixedly connected to the bottom of the positioning ring plate 26. The number of the vertical plates 27 is not less than two, and the plurality of vertical plates 27 are circumferentially arrayed on the positioning ring plate 26. A limiting plate 28 is fixedly connected to the bottom of the vertical plate 27. An upper ring sleeve 29 is fixedly installed at the bottom of the limiting plate 28. A bearing is arranged between the upper ring sleeve 29 and the top of the positioning column 18. Through the setting of the limiting frame, while not affecting the air in the filter cartridge 4 flowing upward through the gap between the two vertical plates 27, the positioning column 18 is also limited at the top end of the positioning column 18, so that during the rotation of the filter device as a whole, the positioning column 18 can further maintain a stable vertical state, thereby ensuring the stable state of the sealing partition strip 20.

[0039] Please refer to Figure 6 - Figure 7, a pressure roller 30 is provided inside the filtering bin and is located outside the filter device. The outer side of the pressure roller 30 is in contact with the annular hoop 5 on the outer side of the filter cylinder 4. A second servo motor 31 for driving the pressure roller 30 to rotate is fixedly installed on the top of the bottom plate 1. The pressure roller 30 is driven by the second servo motor 31 to rotate synchronously with the filter device, and the impurities protruding from the outer surface of the filter cylinder 4 to the outside of the annular hoop 5 and the reinforcing ribs 6 are compacted by the pressure roller 30, preventing the impurities protruding from the outer surface of the filter cylinder 4 to the outside of the annular hoop 5 from being scraped off by the positioning strip 21 and accumulating inside the filtering bin, which affects the subsequent filtering efficiency.

[0040] Please refer to Figure 5 , Figure 6 - Figure 10 , water passing holes 213 are provided on the positioning strip 21 on both sides of the groove 211. A water guide pipe 32 connecting the two water passing holes 213 is fixedly installed on the top of the positioning strip 21. A water inlet pipe 33 connecting one of the water passing holes 213 is fixedly installed on the bottom of the positioning strip 21, and a drain pipe 34 connecting the other water passing hole 213 is fixedly installed on the bottom of the positioning strip 21. Cooling water is conveyed into the positioning strip 21 through the water inlet pipe 33 and discharged through the drain pipe 34, thereby cooling the entire positioning strip 21 and avoiding the problem that the temperature of the positioning strip 21 rises due to long-term contact friction with the annular hoop 5 and the reinforcing ribs 6 in the filter device. As for the heat generated by the fitting of the sealing partition strip 20 and the filter cylinder 4, due to the requirements of the wafer prober for the air temperature, a temperature control device is generally set, and the filtered air is used for heat dissipation. The filtered air will be temperature-controlled by the temperature control device and then flow to the clean room where the wafer prober works.

[0041] During use, external air enters from one side of the filtering bin and flows into the interior of the filter cylinder 4. The impurities in the air are filtered out by the filter cylinder 4, and a large amount of impurities will be adsorbed on the surface of the filter cylinder 4. The filtered air flows through the gaps of each vertical plate 27 and the upper shaft sleeve 15 to the rotary joint 16 at the top of the filtering bin, and then flows to the clean room where the wafer detector works through the air guide pipe 17. At the same time, the first servo motor 13 is started to drive the piston shaft to drive the driving gear 14 to rotate. By the meshing action of the driving gear 14 and the driven gear 10, the driven gear 10, the lower shaft sleeve 9 and the filter device are driven to rotate slowly. The second servo motor 31 is started to drive the pressure roller 30 to rotate, and the impurities protruding from the outer surface of the filter cylinder 4 to the outside of the annular hoop 5 are compacted. At the same time, the negative pressure pump 23 is started to pump negative pressure in the inner cavity of the groove 211. When the part of the filter cylinder 4 in the filter device rotates to the groove 211, due to the structural setting of the sealing partition strip 20 that isolates the groove 211 and the inner cavity of the filter cylinder 4, under the action of the negative pressure suction in the groove 211, the impurities on the outer surface and in the filter holes of the filter cylinder 4 are adsorbed and discharged, so that the surface of the filter cylinder 4 for filtering air is always kept unobstructed, which is conducive to the continuous and efficient filtration of air.

[0042] The foregoing description of the disclosed embodiments enables those skilled in the art to implement or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. An air purification device for a wafer prober, characterized in that It includes a filtering bin. One side of the filtering bin is designed with an opening, and a cylindrical filter device is movably arranged in the filtering bin. A first servo motor (13) for driving the filter device to rotate is installed at the bottom of the filtering bin. The filter device includes a filter cylinder (4). A fixed frame is arranged on the outer side of the filter cylinder (4). A gas guide pipe (17) is connected through a rotary joint (16) at the top of the filter device. A sealing partition strip (20) far away from the opening side of the filtering bin is arranged in the filter cylinder (4). The outer side of the sealing partition strip (20) is movably attached to the inner side of the filter cylinder (4), and the sealing partition strip (20) is fixedly arranged with the filtering bin. A positioning strip (21) is arranged in the filtering bin. One side of the positioning strip (21) is movably attached to the fixed frame on the outer side of the filter cylinder (4). A groove (211) located on one side of the sealing partition strip (20) is formed in the positioning strip (21). An air vent hole (212) communicating with the groove (211) is also formed at the bottom of the positioning strip (21). An exhaust pipe (22) communicating with the air vent hole (212) is arranged at the bottom of the filtering bin. One end of the exhaust pipe (22) is connected to the air inlet of a negative pressure pump (23). The negative pressure pump (23) is fixedly installed at the bottom of the filtering bin. By starting the negative pressure pump (23), impurities on the outer side of the filter cylinder (4) rotated to the groove (211) are adsorbed and discharged.

2. The air purification device for a wafer prober according to claim 1, wherein The filtering bin includes a bottom plate (1). A surrounding plate (2) is fixedly installed at the top of the bottom plate (1). One side of the surrounding plate (2) is designed with an opening. A top plate (3) is fixedly installed at the top of the surrounding plate (2).

3. An air purification device for a wafer prober according to claim 2, characterized in that, The bottom of the filter cylinder (4) is fixedly connected with a lower partition plate (7). A planar bearing is connected between the bottom of the lower partition plate (7) and the top of the bottom plate (1). The top of the filter cylinder (4) is fixedly connected with an upper partition plate (8). A planar bearing is also connected between the top of the upper partition plate (8) and the bottom of the top plate (3).

4. An air purification device for a wafer prober according to claim 3, characterized in that, The middle of the bottom end of the lower partition plate (7) is connected with a lower shaft sleeve (9). The bottom end of the lower shaft sleeve (9) extends below the bottom plate (1) and is installed with a passive gear (10). The passive gear (10) and the lower shaft sleeve (9) are fixedly installed on the lower partition plate (7) through bolts. A fixed frame is fixedly installed at the bottom of the bottom plate (1). The first servo motor (13) is fixedly installed on the fixed frame.

5. An air purification device for a wafer prober according to claim 4, wherein The fixed frame includes a plurality of positioning pin shafts (11) connected to the bottom of the bottom plate (1). The bottom ends of the positioning pin shafts (11) are connected with a positioning plate (12). A first servo motor (13) is fixedly installed on one side of the bottom of the positioning plate (12). The output rotating shaft of the first servo motor (13) extends above the positioning plate (12) and is fixedly installed with a driving gear (14). The external teeth of the driving gear (14) are meshed with the external teeth of the passive gear (10).

6. The air purification device for a wafer prober according to claim 5, wherein, A positioning column (18) is fixedly installed at the top of the positioning plate (12). The top end of the positioning column (18) extends into the inside of the filter screen cylinder (4). A positioning cross bar (19) located inside the filter screen cylinder (4) is fixedly installed on the outer side of the positioning column (18). The number of the positioning cross bars (19) is not less than two, and the positioning cross bars (19) are longitudinally arranged at equal intervals on the filter screen cylinder (4). One end of the positioning cross bar (19) away from the positioning column (18) is fixedly connected to one side of the sealing partition strip (20) away from the groove (211).

7. The air purification device for a wafer prober according to claim 6, wherein, A lower ring sleeve (24) is fixedly installed at the top of the lower partition board (7). A bearing is arranged between the lower ring sleeve (24) and the positioning column (18). A sealing ring (25) is arranged at the top of the lower ring sleeve (24). The inner side of the sealing ring (25) is hermetically attached to the outer side of the positioning column (18).

8. The air purification device for a wafer prober according to claim 3, wherein, A limiting frame is fixedly installed at the bottom of the upper partition board (8). The limiting frame includes a positioning ring plate (26) fixedly installed at the bottom of the upper partition board (8). A plurality of vertical plates (27) are fixedly connected to the bottom of the positioning ring plate (26), and the plurality of vertical plates (27) are circumferentially and arrayedly distributed on the positioning ring plate (26). A limiting plate (28) is fixedly connected to the bottom of the vertical plate (27). An upper ring sleeve (29) is fixedly installed at the bottom of the limiting plate (28). A bearing is arranged between the upper ring sleeve (29) and the top of the positioning column (18).

9. The air purification device for a wafer prober according to claim 1, characterized in that, The fixed frame includes a plurality of annular hoops (5) and reinforcing ribs (6). The plurality of annular hoops (5) are longitudinally arranged at equal intervals on the outer side of the filter screen cylinder (4). The plurality of reinforcing ribs (6) are circumferentially and arrayedly distributed on the outer side of the filter screen cylinder (4), and both ends of the reinforcing rib (6) are fixedly connected to the annular hoop (5) on the outer side of the filter screen cylinder (4).

10. An air purification device for a wafer prober according to claim 9, characterized in that, A pressure roller (30) located outside the filter screen device is arranged in the filter bin, and the outer side of the pressure roller (30) is attached to the annular hoop (5) on the outer side of the filter screen cylinder (4). A second servo motor (31) for driving the pressure roller (30) to rotate is fixedly installed at the top of the filter bin.

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