Device for efficiently removing sulfur element in yellow phosphorus tail gas through catalysis and manufacturing method of device
By integrating oil-water impurity removal and electrocatalytic degradation devices, nanoporous quartz glass substrates and indium tin oxide semiconductor oxide sheet substrates are used to solve the problem of toxic and harmful gases in phosphate chemical exhaust gases, and efficiently remove sulfur elements and solid particles, improving the effect and stability of exhaust gas treatment.
Patent Information
- Application Number
- CN202510531837.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-25
- Publication Date
- 2025-07-11
AI Technical Summary
In the prior art, the treatment method of phosphate chemical exhaust gas is extensive, resulting in the incomplete purification of toxic and harmful gases, making it difficult to remove non-combustible and flammable materials, and the removal effect of water-soluble, oil-soluble substances and solid particles is poor.
The composite device is adopted that integrates oil-water impurity removal structure, electrocatalytic degradation device and exhaust gas combustion and drainage device, and electrocatalytic degradation is used to perform electrocatalytic degradation using nanoporous quartz glass substrate and indium tin oxide semiconductor oxide nanocrystal doped sheet substrate, combined with the plasma technology of dielectric barrier discharge generation, to filter and catalyze oxidize toxic gases and solid particles.
It has achieved efficient catalytic removal of sulfur elements in yellow phosphorus exhaust gas, degraded toxic gases, adsorbed toxic emissions, and physically filtered toxic waste solid particles, significantly reduced the emission toxic waste rate and improved the stability and service life of the device.
Abstract
Description
Technical Field
[0001] The present invention relates to the field of environmental protection equipment related to phosphorus chemical industry, and particularly relates to a device for efficiently catalytically removing sulfur elements in yellow phosphorus tail gas and a manufacturing method thereof. Background Art
[0002] In the industrial production process of phosphorus chemical industry, toxic and harmful gases will be generated. If not properly disposed of, it will pollute the environment and affect people's physical health. In particular, harmful gases such as sulfides, nitrogen oxides, and ammonia that are harmful to the human body will be generated during the production process. The common feature of these harmful gases is that they have strong irritation to the human body. Inhaling a small amount will cause various discomfort reactions, such as running nose, coughing, etc.; while inhaling a large amount can cause poisoning, directly endangering people's lives. The pollution to the environment and the poisoning effect on the human body of some volatile organic compounds and other related toxic waste substances generated during some preparation processes cannot be ignored.
[0003] In the prior art, the method for treating the tail gas after phosphorus chemical industry preparation is still very rough tail gas combustion treatment. There are several problems with this method: 1. The purification, absorption, and degradation of the exhausted tail gas are incomplete, and a certain proportion of toxic waste tail gas is still discharged into the environment; 2. It is difficult to remove incombustibles and difficult-to-combustibles; 3. There is no targeted removal of water-soluble substances and oil-soluble substances; 4. The removal effect of solid particles is not good.
[0004] Therefore, there is an urgent need in the market for a device for efficiently catalytically removing sulfur elements in yellow phosphorus tail gas that can comprehensively degrade toxic gases, adsorb toxic emissions, and physically filter toxic waste solid particles, and a manufacturing method thereof. Summary of the Invention
[0005] The present invention aims to provide a device for efficiently catalytically removing sulfur elements in yellow phosphorus tail gas that can comprehensively degrade toxic gases, adsorb toxic emissions, and physically filter toxic waste solid particles, and a manufacturing method thereof.
[0006] To achieve the above object, the present invention adopts the following technical solutions: A device for efficiently catalytically removing sulfur elements from yellow phosphorus tail gas, which is arranged after the discharge end of the preparation equipment and before the tail gas exhaust port. Inside this device, according to the tail gas flow sequence, an oil-water impurity removal structure, an electrocatalytic degradation device, and a tail gas combustion and exhaust device are integrated; among them, the electrocatalytic degradation device specifically consists of an AC pulse power supply with a voltage of 5 kV to 8 kV, wires, a honeycomb ceramic shell, and sheet substrates fixed in the honeycomb ceramic shell and distributed in a louver blade shape; the thickness of the sheet substrate is 1 mm to 1.5 mm, which is a cuboid with a fixed inclination angle. The plane where the sheet substrate is located forms an angle of 30° to 60° with the plane where the ceramic frame is located. The vertical projection of the sheet substrate on the plane where the frame is located completely covers the plane where the frame is located; the sheet substrates are parallelly distributed under the ceramic frame, and both ends of the sheet substrates are connected to both ends of the power supply through wires, and the sheet substrates are in a parallel relationship in the circuit; the sheet substrate includes a silica matrix with loose pores and hexagonal pores densely arranged in a honeycomb shape, and a functional material fixed to the matrix; for the densely arranged hexagonal pores, the grid gap is 0.3 mm to 0.5 mm, and the grid pore diameter is 0.8 mm to 1.2 mm; The method for manufacturing the above device includes the following stages: S1: Raw material preparation ① Raw material preparation: Prepare sufficient amounts of tap water, mineral oil, silica, boric acid, sodium carbonate, tetrabutyl titanate, glacial acetic acid, xylene, guanidine hydrochloride, γ-β-(aminoethyl)-γ-aminopropyltrimethoxysilane, triblock copolymer polyethylene glycol-polypropylene glycol-polyethylene glycol, graphite powder, ethanol, hydrochloric acid aqueous solution with a solute mass fraction of 10%, sodium hydroxide aqueous solution with a solute mass fraction of 10%, saturated hydrochloric acid, a quartz container with an inlet at the bottom and an outlet at the top, alumina powder with a particle size of 0.05 mm to 0.1 mm, alumina powder with a particle size of 1 μm to 2 μm, aluminum fluoride powder, aluminum hydroxide, clay, coconut shell charcoal, polyvinyl alcohol, and tetraethyl orthosilicate; S2: Preparation of honeycomb ceramic shell ① By weight, mix alumina, alumina powder, aluminum fluoride powder, aluminum hydroxide, clay, coconut shell charcoal, and polyvinyl alcohol prepared in step ① of stage S1 in a mass ratio of (50 - 55):(15 - 20):(11 - 12):(16 - 17):(0.8 - 1.2):(13 - 15):(8 - 10) evenly; ② After mixing the raw materials prepared in step ① evenly, fill them into the corresponding mold of the support shell with a hollow cavity designed, sinter and degum, and the process parameters are: sintering temperature 1480 °C to 1500 °C, heat preservation time 130 min to 150 min, to make a honeycomb ceramic shell; S3: Substrate preparation ① Mix the silica, boric acid, and sodium carbonate prepared in step ① of stage S1 evenly according to the mass ratio of 85:(7 - 8):(7 - 8). Then, under nitrogen protection, heat it up to melt at a high temperature of 1500 °C, and then pour it into a mold with closely packed hexagonal holes according to the design requirements. After cooling and forming, anneal it to obtain the glass to be treated; ② Trim and cut the glass to be treated obtained in step ① into the size and shape required by the design to obtain a glass substrate; ③ After mechanically polishing the surface of the prepared glass substrate, place the polished glass substrate in a nitrogen protection environment, then heat it to 660 °C - 680 °C, keep it warm for 35 h - 38 h, then take it out and cool it naturally to room temperature. Subsequently, soak and corrode the treated glass substrate with deionized water, hydrochloric acid aqueous solution, and sodium hydroxide aqueous solution heated to 90 °C - 95 °C in turn. Among them, both the deionized water and the hydrochloric acid aqueous solution are washed until the weight of the glass substrate no longer changes, and the sodium hydroxide aqueous solution is washed for 80 min - 90 min; after corrosion, wash the glass substrate with deionized water again, and then dry it naturally to obtain the required silica matrix with loose pores and hexagonal holes closely packed in a honeycomb shape; S4: Preparation of functional particles ① Mix 8 g - 10 g of tetrabutyl titanate, 24 g - 30 g of glacial acetic acid, and 200 ml - 210 ml of ethanol prepared in step ① of stage S1 evenly, and then gradually drop 43 ml - 46 ml of deionized water into the mixture until the dropping is completed to form a sol; ② Let the sol obtained in step ① stand at room temperature for 15 h - 16 h to obtain a pre-gel; ③ Heat the pre-gel obtained in step ② to 65 °C - 70 °C and keep it warm until it is dried to obtain a dry gel, and then grind the dry gel into powder to obtain a pre-powder; ④ Mix and stir evenly the pre-powder obtained in step ③ with the guanidine hydrochloride prepared in step ① of stage S1, and then ball-mill the mixture into a mixed fine powder with a particle size range of 0.1 μm - 0.12 μm. Place the mixed fine powder in a quartz crucible, and then place it in a microwave oven and process it at a microwave power of 60 W - 80 W for 2.5 min - 3 min to obtain a microwave mixture; ⑤ Use xylene as the solvent and γ-β-(aminoethyl)-γ-aminopropyltrimethoxysilane as the modifier to modify the microwave mixture obtained in step ④ at 125 °C - 130 °C for 5 h - 6 h. Take out the mixed particles to obtain modified mixed particles; S5: Integration of functional components ① Put the modified mixed particles obtained in step ⑤ of stage S4 into deionized water 11 times - 13 times the weight of the modified mixed particles, stir evenly to form a turbid liquid, and obtain an infiltration liquid A; ②Completely immerse the silica matrix obtained in step ③ of stage S3 in immersion liquid A, soak for 1 to 2 days, and perform ultrasonic treatment while protecting; after soaking, place it in a sealed space protected by nitrogen and naturally dry until completely dry; then heat the dried silica matrix in an air resistance furnace at a heating temperature of 970°C to 990°C for a heating time of 6 to 7 hours to obtain a conductive matrix; ③Mix the triblock copolymer polyethylene glycol - polyglycerol - polyethylene glycol and graphite powder evenly according to a mass ratio of 5:(2 - 3) to obtain mixture A. After mixing mixture A evenly with an aqueous hydrochloric acid solution 23 to 25 times its mass, maintain stirring and raise the temperature to 45°C to 50°C. Then, slowly add tetraethyl orthosilicate 1.5 to 1.7 times the mass of mixture A to the aqueous hydrochloric acid solution while maintaining stirring and heating for 20 to 21 hours to obtain mixture B; ④Completely immerse the conductive matrix obtained in step ② in the mixture B obtained in step ③, maintain stirring and heating. After an immersion time of 15 to 20 minutes, transfer the soaked conductive matrix to a resistance furnace at 105°C to 110°C protected by nitrogen, keep warm for 1 to 1.5 days, and then cool to room temperature under nitrogen protection and then clean the surface with deionized water; then place the conductive matrix in an air resistance furnace, raise the temperature to 550°C to 560°C, and keep warm for 4 to 5 hours to obtain a flaky substrate; S6: Assembly ①Assemble and fix the flaky substrate obtained in step ④ of stage S5 and the honeycomb ceramic shell obtained in step ② of stage S2, so that the flaky substrate is fixed in the honeycomb ceramic shell in a distribution like louver blades. The plane where the flaky substrate is located forms an angle of 30° to 60° with the plane where the honeycomb ceramic shell is located; both ends of the flaky substrate are connected to both ends of the power supply through wires, and the flaky substrates are in a parallel relationship in the circuit to obtain an electrocatalytic degradation device, that is, to obtain the device required for highly efficiently catalytically removing sulfur elements in yellow phosphorus tail gas.
[0007] Compared with the prior art, due to the adoption of the above technical solutions, the present invention has: (1) In the electrocatalytic degradation device of the present invention, the flaky substrate uses nanoporous quartz glass as the matrix, and indium tin oxide semiconductor oxide nanocrystals are doped into the glass by the solution doping method, enabling the flaky substrate to have the possibility of existing as a conductive medium. This possibility gives the present invention a large space for technological expansion and is also the basis (structural basis and material basis) for the implementation of the present invention. The ceramic shell of the present invention is actually a porous structure that basically does not impede gas, and its purpose is to provide structural support for the particle filtration structure and filling materials inside. Through multiple tests by the applicant and integration with the functional materials and quartz layer structure of the present invention, it is the material with the best impurity removal effect found by the applicant under the premise suitable for industrial production.
[0008] (2) The material of the sheet substrate and the porous and loose structure in the present invention determine that the present invention can generate plasma through dielectric barrier discharge, enabling the present invention to obtain the function of purifying toxic waste gas based on the plasma technology of dielectric barrier discharge. At the same time, the present invention does not use precious metals, only uses insignificant titanium dioxide for photocatalyst and quartz glass with a value comparable to that of the existing ceramic carrier of the three-way catalytic converter. The cost is controllable, the source is wide, the economy is good, and it is suitable for popularization.
[0009] (3) Some of the materials cured in the sheet substrate of the present invention have strong electrocatalytic characteristics. After some functional materials are electro-stimulated, they have strong catalytic oxidation effects on sulfur oxides, cyanide radicals, carbon monoxide, and organic substances, enabling most of the oxidizable substances to be disposed of in this step.
[0010] (4) Some of the materials cured in the sheet substrate of the present invention have strong electrocatalytic characteristics of sulfur-based, nitrogen-based, and nitro groups, as well as the function of solidifying and degrading solid particles, enabling most of the sulfur-based, nitrogen-based, and nitro toxic waste gases and solid particles not blocked in the previous step to be disposed of in this step.
[0011] (5) Through a simple oil-water double-layer self-stratifying absorption and filtration device, the present invention first absorbs and removes most of the water-soluble, oil-soluble substances and some solid particles in the tail gas in the pre-stage, reducing the burden on the subsequent fine detoxification waste device, greatly extending the service life of the subsequent device, and improving the stability.
[0012] Therefore, the present invention has the characteristics of composite degradation of toxic gases, adsorption of toxic emissions, and physical filtration of toxic waste solid particles. Specific Embodiments Examples
[0013] An apparatus for efficiently catalytically removing sulfur elements from yellow phosphorus tail gas, which is arranged after the emission end of the preparation equipment and before the tail gas discharge port. Inside this apparatus, according to the tail gas flow sequence, an oil-water impurity removal structure, an electrocatalytic degradation device, and a tail gas combustion and discharge device are integrated; among them, the electrocatalytic degradation device specifically consists of an AC pulse power supply with a voltage of 5 kV - 8 kV, wires, a honeycomb ceramic shell, and sheet substrates fixed in the honeycomb ceramic shell and distributed in a louver blade shape; the thickness of the sheet substrate is 1 mm - 1.5 mm, it is a cuboid with a fixed inclination angle, the plane where the sheet substrate is located forms an angle of 30° - 60° with the plane where the ceramic frame is located, and the vertical projection of the sheet substrate on the plane where the frame is located completely covers the plane where the frame is located; the sheet substrates are parallelly distributed under the ceramic frame, and both ends of the sheet substrates are connected to both ends of the power supply through wires, and the sheet substrates are in a parallel relationship in the circuit; the sheet substrate includes a silica matrix with loose pores and hexagonal holes densely arranged in a honeycomb shape, and a functional material fixed to the matrix; for the densely arranged hexagonal holes, the grid gap is 0.3 mm - 0.5 mm, and the grid pore diameter is 0.8 mm - 1.2 mm; A method for manufacturing the above-mentioned apparatus, including the following stages: S1: Raw material preparation ① Raw material preparation: Prepare sufficient amounts of tap water, mineral oil, silica, boric acid, sodium carbonate, tetrabutyl titanate, glacial acetic acid, xylene, guanidine hydrochloride, γ-β-(aminoethyl)-γ-aminopropyltrimethoxysilane, triblock copolymer polyethylene glycol - polyglycerol - polyethylene glycol, graphite powder, ethanol, hydrochloric acid aqueous solution with a solute mass fraction of 10%, sodium hydroxide aqueous solution with a solute mass fraction of 10%, saturated hydrochloric acid, a quartz container with an inlet at the bottom and an outlet at the top, alumina powder with a particle size of 0.05 mm - 0.1 mm, alumina powder with a particle size of 1 μm - 2 μm, aluminum fluoride powder, aluminum hydroxide, clay, coconut shell charcoal, polyvinyl alcohol, and tetraethyl orthosilicate; S2: Preparation of honeycomb ceramic shell ① By weight, mix alumina, alumina powder, aluminum fluoride powder, aluminum hydroxide, clay, coconut shell charcoal, and polyvinyl alcohol prepared in step ① of stage S1 in a mass ratio of (50 - 55):(15 - 20):(11 - 12):(16 - 17):(0.8 - 1.2):(13 - 15):(8 - 10) evenly; ② After mixing the raw materials prepared in step ① evenly, fill them into the corresponding mold of the support shell with a hollow cavity designed as required, sinter and degum, and the process parameters are: sintering temperature 1480 °C - 1500 °C, heat preservation time 130 min - 150 min, to make a honeycomb ceramic shell; S3: Substrate preparation ① Mix the silicon dioxide, boric acid, and sodium carbonate prepared in step ① of stage S1 evenly according to the mass ratio of 85:(7-8):(7-8). Then, under nitrogen protection, heat it up to melt at a high temperature of 1500 °C, and then pour it into a mold with a close-packed hexagonal hole according to the design requirements. After cooling and forming, anneal it to obtain the glass to be treated; ② Trim and cut the glass to be treated obtained in step ① into the size and shape required by the design to obtain a glass substrate; ③ After mechanically polishing the surface of the prepared glass substrate, place the polished glass substrate in a nitrogen protection environment, then heat it to 660 °C - 680 °C, keep it warm for 35 h - 38 h, then take it out and cool it naturally to room temperature. Subsequently, soak and corrode the treated glass substrate with deionized water, hydrochloric acid aqueous solution, and sodium hydroxide aqueous solution heated to 90 °C - 95 °C in sequence. Among them, both the deionized water and the hydrochloric acid aqueous solution are washed until the weight of the glass substrate no longer changes, and the sodium hydroxide aqueous solution is washed for 80 min - 90 min; after corrosion, wash the glass substrate with deionized water again, and then dry it naturally to obtain the required silicon dioxide matrix with loose pores and hexagonal holes arranged in a honeycomb-like close-packed distribution; S4: Preparation of functional particles ① Mix 8 g - 10 g of tetrabutyl titanate, 24 g - 30 g of glacial acetic acid, and 200 ml - 210 ml of ethanol prepared in step ① of stage S1 evenly, and then gradually drop 43 ml - 46 ml of deionized water into the mixture until the dropping is complete to form a sol; ② Let the sol obtained in step ① stand at room temperature for 15 h - 16 h to obtain a pre-gel; ③ Heat the pre-gel obtained in step ② to 65 °C - 70 °C and keep it warm until it is dried to obtain a dry gel, and then grind the dry gel into powder to obtain a prefabricated powder; ④ Mix and stir evenly the prefabricated powder obtained in step ③ with the guanidine hydrochloride prepared in step ① of stage S1, and then ball-mill the mixture into a mixed fine powder with a particle size range of 0.1 μm - 0.12 μm. Place the mixed fine powder in a quartz crucible, and then place it in a microwave oven and process it at a microwave power of 60 W - 80 W for 2.5 min - 3 min to obtain a microwave mixture; ⑤ Use xylene as the solvent and γ-β-(aminoethyl)-γ-aminopropyltrimethoxysilane as the modifier to modify the microwave mixture obtained in step ④ at 125 °C - 130 °C for 5 h - 6 h, take out the mixed particles to obtain modified mixed particles; S5: Integration of functional components ① Put the modified mixed particles obtained in step ⑤ of stage S4 into deionized water 11 times - 13 times the weight of the modified mixed particles, stir evenly to form a turbid liquid, and obtain an infiltration liquid A; ②Completely immerse the silica matrix obtained in step ③ of stage S3 in the infiltration liquid A, soak for 1 to 2 days, and protect it with ultrasonic treatment; after soaking, place it in a sealed space under nitrogen protection and dry naturally until completely dry; then heat the dried silica matrix in an air resistance furnace at a heating temperature of 970°C to 990°C for 6 to 7 hours to obtain a conductive matrix; ③Mix the triblock copolymer polyethylene glycol - polyglycerol - polyethylene glycol and graphite powder evenly according to a mass ratio of 5:(2 - 3) to obtain mixture A. After mixing mixture A evenly with a hydrochloric acid aqueous solution 23 to 25 times its mass, maintain stirring and heat up to 45°C to 50°C. Then slowly drop tetraethyl orthosilicate 1.5 to 1.7 times the mass of mixture A into the hydrochloric acid aqueous solution and maintain stirring and heating for 20 to 21 hours to obtain mixture B; ④Completely immerse the conductive matrix obtained in step ② in the mixture B obtained in step ③, maintain stirring and heating. After soaking for 15 to 20 minutes, transfer the soaked conductive matrix into a resistance furnace at 105°C to 110°C under nitrogen protection and keep it warm for 1 to 1.5 days. Then cool it to room temperature under nitrogen protection and then clean the surface with deionized water; then place the conductive matrix in an air resistance furnace, heat up to 550°C to 560°C, and keep it warm for 4 to 5 hours to obtain a flaky substrate; S6: Assembly ①Assemble and fix the flaky substrate obtained in step ④ of stage S5 and the honeycomb ceramic shell obtained in step ② of stage S2, so that the flaky substrate is fixed in the honeycomb ceramic shell in a distribution like louver blades. The plane where the flaky substrate is located forms an angle of 30° to 60° with the plane where the honeycomb ceramic shell is located; both ends of the flaky substrate are connected to both ends of the power supply through wires, and the flaky substrates are in a parallel relationship in the circuit to obtain an electrocatalytic degradation device, that is, obtain the device required for highly efficient catalytic removal of sulfur elements in yellow phosphorus tail gas.
[0014] The tail gas recovery device manufactured according to the method of this embodiment has a low emission rate of toxic waste (in the exhausted gas, the mass fraction of toxic waste substances does not exceed 0.01%, and sulfur compounds cannot be detected), a high disposal rate, and good stability, which is superior to the prior art. The above description of the disclosed embodiments is only to enable those skilled in the art to implement or use the present invention. Various modifications to these embodiments will be obvious to those skilled in the art. The general principles defined herein can be implemented in other embodiments without departing from the spirit or scope of the present invention. Therefore, the present invention will not be limited to these embodiments shown herein, but rather to the widest scope consistent with the principles and novel features disclosed herein.
Claims
1. An apparatus for efficiently catalytically removing sulfur elements from yellow phosphorus tail gas, which is arranged after the discharge end of the preparation equipment and before the tail gas exhaust port, and is characterized in that: Inside the device, an oil-water impurity removal structure, an electrocatalytic degradation device, and an exhaust gas combustion and evacuation device are integrated according to the exhaust gas flow sequence; among them, the electrocatalytic degradation device specifically consists of an AC pulse power supply with a voltage of 5 kV to 8 kV, wires, a honeycomb ceramic housing, and sheet substrates fixed in the honeycomb ceramic housing and distributed in a louver blade shape; the thickness of the sheet substrate is 1 mm to 1.5 mm, it is a cuboid, the inclination angle is fixed, the plane where the sheet substrate is located forms an angle of 30° to 60° with the plane where the ceramic frame is located, and the vertical projection of the sheet substrate on the plane where the frame is located completely covers the plane where the frame is located; the sheet substrates are parallelly distributed under the ceramic frame, and both ends of the sheet substrates are connected to both ends of the power supply through wires, and the sheet substrates are in a parallel relationship in the circuit; the sheet substrate includes a silica matrix with loose pores and hexagonal holes densely arranged in a honeycomb shape, and a functional material fixed to the matrix; for the densely arranged hexagonal holes, the grid gap is 0.3 mm to 0.5 mm, and the grid pore diameter is 0.8 mm to 1.2 mm; The method for manufacturing the above device includes the following stages: S1: Raw material preparation ① Raw material preparation: Prepare sufficient tap water, mineral oil, silica, boric acid, sodium carbonate, tetrabutyl titanate, glacial acetic acid, guanidine hydrochloride, xylene, γ-β-(aminoethyl)-γ-aminopropyltrimethoxysilane, triblock copolymer polyethylene glycol-polypropylene glycol-polyethylene glycol, graphite powder, ethanol, hydrochloric acid aqueous solution with a solute mass fraction of 10%, sodium hydroxide aqueous solution with a solute mass fraction of 10%, saturated hydrochloric acid, a quartz container with an inlet at the bottom and an outlet at the top, alumina powder with a particle size of 0.05 mm to 0.1 mm, alumina powder with a particle size of 1 μm to 2 μm, aluminum fluoride powder, aluminum hydroxide, clay, coconut shell charcoal, polyvinyl alcohol, and tetraethyl orthosilicate; S2: Preparation of honeycomb ceramic housing ① By weight, mix alumina, alumina powder, aluminum fluoride powder, aluminum hydroxide, clay, coconut shell charcoal, and polyvinyl alcohol prepared in step ① of stage S1 in a mass ratio of (50 - 55):(15 - 20):(11 - 12):(16 - 17):(0.8 - 1.2):(13 - 15):(8 - 10) evenly; ② After mixing the raw materials prepared in step ① evenly, fill them into the corresponding mold of the support housing with a hollow cavity designed, sinter and degum, and the process parameters are: sintering temperature 1480°C to 1500°C, heat preservation time 130 min to 150 min, to make a honeycomb ceramic housing; S3: Substrate preparation ① Mix silica, boric acid, and sodium carbonate prepared in step ① of stage S1 in a mass ratio of 85:(7 - 8):(7 - 8) evenly, then under nitrogen protection, heat up to melt at a high temperature of 1500°C, and then pour it into a mold with densely arranged hexagonal holes designed, cool and form, and then anneal to obtain the glass to be processed; ② Trim and cut the glass to be processed obtained in step ① into the size and shape designed to obtain a glass substrate; ③ After the surface of the prepared glass substrate is mechanically polished, the polished glass substrate is placed in a nitrogen protection environment, then heated to 660 °C to 680 °C, and the heat preservation time is 35 h to 38 h. Then it is taken out and naturally cooled to room temperature. Subsequently, the treated glass substrate is soaked and etched successively with deionized water, hydrochloric acid aqueous solution, and sodium hydroxide aqueous solution heated to 90 °C to 95 °C. Among them, the deionized water and hydrochloric acid aqueous solution are both washed until the weight of the glass substrate no longer changes, and the sodium hydroxide aqueous solution is washed for 80 min to 90 min; after etching, the glass substrate is washed clean with deionized water, and then naturally dried to obtain the required silica matrix with loose pores and hexagonal pores densely arranged in a honeycomb shape; S4: Preparation of functional particles ① Mix 8 g to 10 g of tetrabutyl titanate, 24 g to 30 g of glacial acetic acid, and 200 ml to 210 ml of ethanol prepared in step ① of stage S1 evenly, and then gradually drop 43 ml to 46 ml of deionized water into the mixed solution until the dropping is completed to form a sol; ② Let the sol obtained in step ① stand at room temperature for 15 h to 16 h to obtain a pre-gel; ③ Heat the pre-gel obtained in step ② to 65 °C to 70 °C, keep it warm until it is dried to obtain a dry gel, and then grind the dry gel into powder to obtain a prefabricated powder; ④ Mix and stir evenly the prefabricated powder obtained in step ③ with guanidine hydrochloride prepared in step ① of stage S1, and then ball-mill the mixture into a mixed fine powder with a particle size range of 0.1 μm to 0.12 μm. Place the mixed fine powder in a quartz crucible, and then place it in a microwave oven and process it at a microwave power of 60 W to 80 W for 2.5 min to 3 min to obtain a microwave mixture; ⑤ Using xylene as a solvent and γ-β-(aminoethyl)-γ-aminopropyltrimethoxysilane as a modifier, modify the microwave mixture obtained in step ④ at 125 °C to 130 °C for 5 h to 6 h, take out the mixed particles to obtain modified mixed particles; S5: Integration of functional components ① Put the modified mixed particles obtained in step ⑤ of stage S4 into deionized water 11 times to 13 times the weight of the modified mixed particles, stir evenly to form a turbid liquid to obtain an infiltration liquid A; ② Immerse the silica matrix obtained in step ③ of stage S3 completely in the infiltration liquid A, soak for 1 day to 2 days, and protect it with ultrasonic treatment; after soaking, place it in a sealed space protected by nitrogen and naturally dry it until it is completely dry; then heat the dried silica matrix in an air resistance furnace, the heating temperature is 970 °C to 990 °C, and the heating time is 6 h to 7 h to obtain a conductive matrix; ③ Mix the triblock copolymer polyethylene glycol - polyglycerol - polyethylene glycol and graphite powder evenly according to the mass ratio of 5:(2 - 3) to obtain a mixture A. Mix the mixture A evenly with a hydrochloric acid aqueous solution 23 times to 25 times its mass, maintain stirring and heat up to 45 °C to 50 °C, and then slowly drop tetraethyl orthosilicate 1.5 to 1.7 times the mass of the mixture A into the hydrochloric acid aqueous solution and maintain stirring and heating for 20 h to 21 h to obtain a mixed liquid B; ④Completely immerse the conductive substrate obtained in step ② into the mixed solution B obtained in step ③, maintain stirring and heating. After the immersion time of 15 min to 20 min, transfer the immersed conductive substrate into a resistance furnace under nitrogen protection at 105 °C to 110 °C, keep warm for 1 day to 1.5 days, and then cool it to room temperature under nitrogen protection and then clean the surface with deionized water; Subsequently, place the conductive substrate in an air resistance furnace, heat it up to 550 °C to 560 °C, and keep warm for 4 h to 5 h to obtain a flaky substrate; S6: Assembly ①Assemble and fix the flaky substrate obtained in step ④ of stage S5 and the honeycomb ceramic shell obtained in step ② of stage S2, so that the flaky substrate is fixed in the honeycomb ceramic shell in a distribution similar to that of louver blades, and the plane where the flaky substrate is located forms an angle of 30° to 60° with the plane where the honeycomb ceramic shell is located; Both ends of the flaky substrate are respectively connected to both ends of the power supply through wires, and the flaky substrates are in a parallel relationship in the circuit, obtaining an electrocatalytic degradation device, that is, obtaining the device required for highly efficiently catalytically removing sulfur elements in yellow phosphorus tail gas.