Device for coating film on surface of magnetron sputtering particle as well as operation method and application of device

Abstract

The invention discloses a device for magnetron sputtering particle surface coating and an operation method and application thereof, and relates to the technical field of magnetron sputtering equipment. The invention aims to solve the problems of poor coating uniformity and low particle coating efficiency caused by low target utilization rate in the traditional magnetron sputtering coating technology. The target magnetic field lifting mechanism is used for changing the magnetic field intensity and the magnetic field distribution on the surface of the target material, so that the distribution of electron clouds on the surface of the target material is changed, and the dynamic change of target material etching grooves is realized; and a particle vibration mechanism is arranged, so that particles in the particle container are in a dispersed state. The inner magnet and the outer magnet generate a horizontal magnetic field acting on the surface of the target material, the horizontal magnetic field on the surface of the target material is changed, the target material etching area is enlarged, the lower particle coating area is enlarged, the particle coating probability is increased, and the coating uniformity and the target material utilization rate are improved. The device for magnetron sputtering particle surface coating and the operation method and application of the device can be obtained.

Description

Technical Field

[0001] The present invention relates to the technical field of magnetron sputtering equipment, and particularly relates to a device for coating the surface of magnetron sputtering particles, an operation method thereof, and an application. Background Art

[0002] As common industrial production materials, particles contain not only organic materials but also many inorganic materials, such as diamond, titanium oxide, etc., and play an important role in industrial production. The research on particulate materials is a comprehensive technical research that spans disciplines and specialties and is the crystallization of the combination of many basic sciences. Coating particles is a common method to change the properties of particles themselves. The changes of the particle film on the particles themselves, such as changing the surface composition, optimizing the functional groups and surface structure of the particles, changing the surface energy, as well as their electrochemical properties, optical properties, magnetic properties, chemical reaction characteristics, etc., can increase the functions of the materials, including hardness, conductivity, and toughness, etc., thereby improving the product value and industrial value. Currently, coated particles play a key role in different fields, including the chemical industry, the military industry, mechanical material structures, the medical and pharmaceutical fields, and the agricultural production field, etc.

[0003] The magnetron sputtering coating technology is a method that can efficiently improve the material properties. Coating on particles is a difficult test for current technologies. Generally, the diameter of particles is within 1 mm, which is very different from coating on ordinary solid plates. Since the surface area and surface energy between particles are relatively large, agglomerates are very easy to form between them, and the radius of curvature is small, and the coating uniformity often fails to meet the requirements. Essentially, compared with coating on general materials, the intermolecular force between particles is obvious, and the particles block each other, affecting the coating effect. Therefore, it is necessary to process the particle coating process to keep the internal particles in a dispersed state, which is very important for the coating uniformity. In addition, due to the small etching area of the magnetron sputtering target, the utilization rate of the target is low, and the coating area of the particles by the target atoms is relatively small, which also leads to a low coating efficiency of the particles. Summary of the Invention

[0004] The purpose of the present invention is to solve the problems of poor coating uniformity and low particle coating efficiency due to low target utilization rate in the traditional magnetron sputtering coating technology, and to provide a device for coating the surface of magnetron sputtering particles, an operation method thereof, and an application.

[0005] A device for coating the surface of magnetron sputtering particles includes a cavity 18, a target magnetic field lifting mechanism, and a particle vibration mechanism. The target magnetic field lifting mechanism is arranged in a vacuum box body at the top inside the cavity 18, and the particle vibration mechanism is arranged at the bottom inside the cavity 18;

[0006] The described target magnetic field lifting mechanism consists of an inner magnet 2, four outer magnets 3, a target base 4, two push rod shaft fork rods 20, two rotating shaft fork rods 21, a lead screw 29, a lead screw push rod 30, sliding bearings 31, a balance rod 32, two lifting bottom plates 22, and a target magnetic field lifting mechanism servo motor 23;

[0007] On both sides of the upper lifting bottom plate 22, bearing chutes are provided, and on both sides of one end of the lower lifting bottom plate 22, a pair of fixed bearing seats are symmetrically arranged; the push rod shaft fork rods 20 and the rotating shaft fork rods 21 are arranged crosswise, and the two sets of crosswise arranged push rod shaft fork rods 20 and rotating shaft fork rods 21 are symmetrically arranged on both sides of the lifting bottom plate 22. Through holes are provided in the middle sections of the push rod shaft fork rods 20 and the rotating shaft fork rods 21, and both ends of the balance rod 32 pass through the through holes and are connected to the cross positions of the push rod shaft fork rods 20 and the rotating shaft fork rods 21 on both sides;

[0008] One end of each of the two rotating shaft fork rods 21 is fixedly connected to both sides of the lower surface of the upper lifting bottom plate 22, and the other end is fixedly connected to both sides of the rotating shaft 36. Fixed bearings 37 are provided on both sides of the rotating shaft, and the fixed bearings 37 are arranged in the fixed bearing seats of the lower lifting bottom plate 22; one end of each of the two push rod shaft fork rods 20 is fixedly connected to both sides of the lead screw push rod 30. Sliding bearings 31 are provided at both ends of the lead screw push rod 30, and the sliding bearings 31 are arranged in the bearing chutes on both sides of the upper lifting bottom plate 22; the other end of each of the two push rod shaft fork rods 20 is fixedly connected to both sides of the upper surface of the lower lifting bottom plate 22; Concentric threaded holes are provided in the middle of the upper lifting bottom plate 22 and the lead screw push rod 30. The target magnetic field lifting mechanism servo motor 23 is connected to the top inside the cavity 18. The target magnetic field lifting mechanism servo motor 23 is connected to one end of the lead screw 29 through a transmission shaft, and the other end of the lead screw 29 is threadedly connected to the threaded holes in the middle of the upper lifting bottom plate 22 and the lead screw push rod 30;

[0009] The lower surface of the lower lifting bottom plate 22 is respectively connected to the inner magnet 2 and the four outer magnets 3 through connecting parts. The inner magnet 2 is arranged at the center of the lower lifting bottom plate 22, and the four outer magnets 3 are symmetrically arranged around the inner magnet 2; a target base 4 is provided at the bottom inside the vacuum chamber, a target is provided on the target base 4, and the target is arranged in a non-contact manner with the inner magnet 2 and the outer magnets 3;

[0010] The described particle vibration mechanism is arranged directly below the target magnetic field lifting mechanism and consists of a conveyor belt 13, a particle container 15, a particle isolation net 16, an isolation net mechanism servo motor 28, a support frame 35, a balance spring 6, a rotating pin shaft 7, a rotating bracket 8, a rotating main shaft 9, a universal wheel 10, and a vibration disc 11;

[0011] The vibration disc 11 is arranged at the bottom of the cavity 18, one end of the rotating main shaft 9 is rotatably connected with the motor through a transmission shaft, a rotating pin 7 is radially arranged on the rotating bracket 8, and the other end of the rotating main shaft 9 is positioned and connected with the rotating pin 7; one side of the lower surface of the rotating bracket 8 is connected with the universal wheel 10 through a connecting rod, and the universal wheel 10 is arranged on the vibration disc 11; a spring plate is vertically arranged on the rotating main shaft 9, a spring hook is arranged above the spring plate, one end of the balance spring 6 is connected with the other side of the lower surface of the rotating bracket 8, and the other end is connected with the spring hook; a particle container 15 is arranged on the upper surface of the rotating bracket 8, and a support frame 35 is arranged around the particle container 15, and a group of bearing seats are arranged at both ends and the lower part of one side of the upper surface of the support frame 35, and a rotating shaft is arranged in each group of bearing seats, and the rotating shaft at the lower part of one side of the support frame 35 is rotatably connected with the servo motor 28 of the isolation net mechanism; conveyor belts 13 are installed at both ends of the rotating shaft, and the three rotating shafts are connected through the conveyor belt 13 for transmission, and a particle isolation net 16 is arranged between the two conveyor belts 13.

[0012] A method for operating a device for magnetron sputtering particle surface coating is carried out according to the following steps:

[0013] Step 1: firstly put the particles into the particle container 15, then the particle isolation net 16 is transferred to the top of the particle container 15 by the particle vibration mechanism, and then the four outer magnets 3 and the inner magnet 2 are lowered to a certain distance from the target material by the target magnetic field lifting mechanism, and then the cavity window 5 is closed;

[0014] Step 2: Evacuate the cavity 18 until the pressure reaches 5×10 -5 Pa, discharge gas is introduced into the cavity 18 at the same time, and when the gas pressure inside the cavity 18 reaches 1-5 Pa, the surface of the particles is coated by magnetron sputtering technology.

[0015] An application of a device for magnetron sputtering particle surface coating, wherein the device for magnetron sputtering particle surface coating vibrates and disperses particles in a particle container 15 through a particle vibration mechanism, and changes the magnetic field strength and magnetic field distribution on the target surface by lifting and lowering a target magnetic field lifting mechanism.

[0016] Beneficial effects of the present invention:

[0017] The present invention relates to a device for coating the surface of particles by magnetron sputtering. By providing a target magnetic field lifting mechanism, it is mainly used to change the magnetic field strength and magnetic field distribution on the surface of the target, thereby changing the distribution of the electron cloud on the surface of the target and realizing the dynamic change of the etched grooves on the target. At the same time, a particle vibration mechanism is provided to keep the particles in the particle container in a dispersed state. The inner and outer magnets cooperate with each other during the lifting process of the target magnetic field lifting mechanism to generate a horizontal magnetic field acting on the surface of the target. As the lifting mechanism changes, the horizontal magnetic field on the surface of the target also changes, thereby expanding the etched area of the target and the particle coating area below, increasing the probability of particle coating, improving the coating uniformity, and improving the target utilization rate.

[0018] The present invention can obtain a device for coating the surface of particles by magnetron sputtering, its operation method and application. Brief Description of the Drawings

[0019] Figure 1 It is a schematic structural diagram of a device for coating the surface of particles by magnetron sputtering according to the present invention. 1 represents the outer magnet support column, 2 represents the inner magnet, 3 represents the outer magnet, 4 represents the target base, 5 represents the cavity window, 6 represents the balance spring, 7 represents the rotating pin shaft, 8 represents the rotating bracket, 9 represents the rotating main shaft, 10 represents the universal wheel, 11 represents the vibrating disc, 12 represents the bearing seat, 13 represents the conveyor belt, 14 represents the resistance heating cover, 15 represents the particle container, 16 represents the particle isolation net, 17 represents the corner bearing seat, 18 represents the cavity, 19 represents the inner magnet support column, 20 represents the push rod fork rod, 21 represents the rotating shaft fork rod, 22 represents the lifting bottom plate, 23 represents the servo motor of the target magnetic field lifting mechanism, and 35 represents the support frame;

[0020] Figure 2 is Figure 1 the right view of the particle vibration mechanism in, 24 represents the table pulley rotating shaft, 25 represents the corner bearing seat screw, 26 represents the leg pulley rotating shaft, 27 represents the bearing seat screw, and 28 represents the servo motor of the isolation net mechanism;

[0021] Figure 3 is Figure 1 the right view of the target magnetic field lifting mechanism in, 1 represents the outer magnet support column, 2 represents the inner magnet, 3 represents the outer magnet, 19 represents the inner magnet support column, 29 represents the lead screw, 30 represents the lead screw push rod, 31 represents the sliding bearing, 32 represents the balance rod, 33 represents the balance rod screw, 34 represents the connecting plate, 36 represents the rotating shaft, and 37 represents the fixed bearing. Detailed Description of the Preferred Embodiments

[0022] Embodiment 1: A device for coating the surface of particles by magnetron sputtering includes a cavity 18, a target magnetic field lifting mechanism, and a particle vibration mechanism. The target magnetic field lifting mechanism is arranged in a vacuum chamber at the inner top of the cavity 18, and the particle vibration mechanism is arranged at the bottom in the cavity 18.

[0023] The target magnetic field lifting mechanism consists of an inner magnet 2, four outer magnets 3, a target base 4, two push rod shaft fork rods 20, two rotating shaft fork rods 21, a lead screw 29, a lead screw push rod 30, a sliding bearing 31, a balance rod 32, two lifting bottom plates 22, and a servo motor 23 for the target magnetic field lifting mechanism.

[0024] Bearing chutes are arranged on both sides of the upper lifting bottom plate 22, and a pair of fixed bearing seats are symmetrically arranged on both sides at one end of the lower lifting bottom plate 22. The push rod shaft fork rods 20 and the rotating shaft fork rods 21 are cross - arranged, and the two groups of cross - arranged push rod shaft fork rods 20 and rotating shaft fork rods 21 are symmetrically arranged on both sides of the lifting bottom plate 22. Through - holes are arranged in the middle sections of the push rod shaft fork rods 20 and the rotating shaft fork rods 21, and both ends of the balance rod 32 pass through the through - holes and are connected to the cross - positions of the push rod shaft fork rods 20 and the rotating shaft fork rods 21 on both sides.

[0025] One end of each of the two rotating shaft fork rods 21 is fixedly connected to both sides of the lower surface of the upper lifting bottom plate 22, and the other end is fixedly connected to both sides of a rotating shaft 36. Fixed bearings 37 are arranged on both sides of the rotating shaft, and the fixed bearings 37 are arranged in the fixed bearing seats of the lower lifting bottom plate 22. One end of each of the two push rod shaft fork rods 20 is fixedly connected to both sides of the lead screw push rod 30. Sliding bearings 31 are arranged at both ends of the lead screw push rod 30, and the sliding bearings 31 are arranged in the bearing chutes on both sides of the upper lifting bottom plate 22. The other ends of the two push rod shaft fork rods 20 are respectively fixedly connected to both sides of the upper surface of the lower lifting bottom plate 22. Concentric threaded holes are arranged in the middle of the upper lifting bottom plate 22 and the lead screw push rod 30. The servo motor 23 for the target magnetic field lifting mechanism is connected to the inner top of the cavity 18. The servo motor 23 for the target magnetic field lifting mechanism is connected to one end of the lead screw 29 through a transmission shaft, and the other end of the lead screw 29 is threadedly connected to the threaded holes in the middle of the upper lifting bottom plate 22 and the lead screw push rod 30.

[0026] The lower surface of the lower lifting bottom plate 22 is respectively connected to the inner magnet 2 and the four outer magnets 3 through connectors. The inner magnet 2 is arranged at the center of the lower lifting bottom plate 22, and the four outer magnets 3 are symmetrically arranged around the inner magnet 2. A target base 4 is arranged at the bottom in the vacuum chamber, and a target is arranged on the target base 4, and the target is arranged non - contact with the inner magnet 2 and the outer magnets 3.

[0027] The described particle vibration mechanism is arranged directly below the target magnetic field lifting mechanism and is composed of a conveyor belt 13, a particle container 15, a particle isolation net 16, an isolation net mechanism servo motor 28, a support frame 35, a balance spring 6, a rotating pin shaft 7, a rotating bracket 8, a rotating main shaft 9, a universal wheel 10, and a vibration disc 11;

[0028] The described vibration disc 11 is arranged at the bottom inside the cavity 18. One end of the rotating main shaft 9 is rotationally connected to a motor through a transmission shaft. The rotating bracket 8 is radially provided with a rotating pin shaft 7, and the other end of the rotating main shaft 9 is positioned and connected to the rotating pin shaft 7; One side of the lower surface of the rotating bracket 8 is connected to the universal wheel 10 through a connecting rod, and the universal wheel 10 is arranged on the vibration disc 11; A spring plate is vertically arranged on the rotating main shaft 9, and a spring hook is arranged above the spring plate. One end of the balance spring 6 is connected to the other side of the lower surface of the rotating bracket 8, and the other end is connected to the spring hook; A particle container 15 is arranged on the upper surface of the rotating bracket 8. Support frames 35 are arranged around the particle container 15. A set of bearing seats are arranged at both ends and the lower part of one side of the upper surface of the support frame 35. A rotating shaft is arranged in each set of bearing seats. The rotating shaft at the lower part of one side of the support frame 35 is rotationally connected to the isolation net mechanism servo motor 28; Transmission belts 13 are installed at both ends of the rotating shaft, and the three rotating shafts are driven by the transmission belts 13, and a particle isolation net 16 is arranged between the two transmission belts 13.

[0029] The vacuum box body at the top inside the cavity 18 where the target magnetic field lifting mechanism is located has an upper half that is a hollow cavity structure in the shape of a cuboid. A support plate is fixed in the middle of the cuboid, and the lower part is a hollow cavity structure in the shape of a cylinder. The outermost side of the cylindrical cavity area is a target fixing seat for fixing a circular target.

[0030] Specific Embodiment 2: The difference between this embodiment and Specific Embodiment 1 is that the connecting members between the lower lifting bottom plate 22, the inner magnet 2, and the four outer magnets 3 are four outer magnet support columns 1, one inner magnet support column 19, and a connecting plate 34. One end of each of the outer magnet support columns 1 and the inner magnet support column 19 is fixedly connected to the lower surface of the lower lifting bottom plate 22, and the other end of the four outer magnet support columns 1 and the inner magnet support column 19 is fixedly connected to the upper surface of the connecting plate 34; The inner magnet 2 is arranged at the center of the lower surface of the connecting plate 34, and the four outer magnets 3 are all fixedly connected to the lower surface of the connecting plate 34 and are symmetrically arranged around the inner magnet 2.

[0031] Other steps are the same as those in Specific Embodiment 1.

[0032] Specific Embodiment 3: The difference between this embodiment and Specific Embodiment 1 or 2 is that the four outer magnet support columns 1 are symmetrically arranged around the inner magnet support column 19.

[0033] Other steps are the same as those in Specific Embodiment 1 or 2.

[0034] Specific embodiment 4: The difference between this embodiment and specific embodiments 1 to 3 is that a cavity window 5 is provided on one side of the cavity 18 .

[0035] The other steps are the same as those in Specific Embodiments 1 to 3.

[0036] Specific embodiment 5: The difference between this embodiment and specific embodiments 1 to 4 is that the outer wall of the particle container 15 is provided with a resistance heating cover 14.

[0037] The other steps are the same as those in Specific Embodiments 1 to 4.

[0038] Specific embodiment 6: The difference between this embodiment and specific embodiments 1 to 5 is that balance bar screws 33 are provided at both ends of the balance bar 32.

[0039] The other steps are the same as those in Specific Embodiments 1 to 5.

[0040] Specific embodiment seven: The difference between this embodiment and specific embodiments one to six is ​​that: a group of corner bearing seats 17 are provided at both ends of the upper surface of the support frame 35, and a group of bearing seats 12 are provided at the lower part of one side of the support frame 35; a desktop pulley rotating shaft 24 is provided between the two groups of corner bearing seats 17, and a leg pulley rotating shaft 26 is provided between a group of bearing seats 12, and the two desktop pulley rotating shafts 24 and the leg pulley rotating shafts 26 are connected by a transmission belt 13.

[0041] The pulley of the leg pulley rotating shaft 26 is a driving wheel, and the positive rotation of the driving wheel controls the blocking and opening of the particle isolation net 16. The pulley of the desktop pulley rotating shaft 24 is a driven wheel, which is connected by a belt, and a particle isolation net 16 is arranged above the belt. The particle isolation net 16 is made of high temperature resistant flexible material rubber EP250, and its main function is to prevent particles from flying out of the container during the vacuum process.

[0042] The other steps are the same as those in Specific Embodiments 1 to 6.

[0043] Specific embodiment eight: The difference between this embodiment and any one of specific embodiments one to seven is that: the two groups of corner bearing seats 17 are fixed to the upper surface of the support frame 35 by corner bearing seat screws 25; the one group of bearing seats 12 is fixed to the lower part of one side of the support frame 35 by bearing seat screws 27.

[0044] The other steps are the same as those in Specific Embodiments 1 to 7.

[0045] Specific embodiment 9: This embodiment is an operating method of a device for magnetron sputtering particle surface coating, which is carried out according to the following steps:

[0046] Step 1: First, put the particles into the particle container 15, then use the particle vibration mechanism to transfer the particle isolation net 16 above the particle container 15, and then use the target magnetic field lifting mechanism to lower the four outer magnets 3 and the inner magnet 2 to a certain distance from the target, and then close the cavity window 5;

[0047] The specific steps to transfer the particle isolation net 16 above the particle container 15 by the particle vibration mechanism are as follows: Start the isolation net mechanism servo motor 28, the isolation net mechanism servo motor 28 drives the leg pulley rotating shaft 26 to rotate, under the drive of the conveyor belt 13, the two groups of desktop pulley rotating shafts 24 and the leg pulley rotating shaft 26 rotate simultaneously, realizing the transfer of the particle isolation net 16 above the particle container 15;

[0048] The specific steps to lower the four outer magnets 3 and the inner magnet 2 to a certain distance from the target by the target magnetic field lifting mechanism are as follows: Start the target magnetic field lifting mechanism servo motor 23 and control the reverse rotation, drive the lead screw 29 to rotate to drive the lead screw push rod 30 to move towards the direction of the target magnetic field lifting mechanism servo motor 23, and then drive the push rod shaft fork rod 20 to move towards the direction of the target magnetic field lifting mechanism servo motor 23 at the same time. Under the scissor action of the push rod shaft fork rod 20 and the rotating shaft fork rod 21, the descent of the four outer magnets 3 and the inner magnet 2 is realized.

[0049] The descent process of the target magnetic field lifting mechanism is realized by the reverse rotation of the target magnetic field lifting mechanism servo motor 23. The speed change range of the lifting and lowering process of the target magnetic field lifting mechanism is small and easy to control, and the overall movement is relatively stable. Secondly, since the movement is controlled by the lead screw 29, the operation process can be accurately locked to a specific position through self-locking. Therefore, controlling the rotation speed and rotation time of the motor can adjust the height of the target magnetic field lifting mechanism to an accurate position.

[0050] Step 2: Evacuate the cavity 18 to a pressure of 5×10 -5 Pa, and at the same time introduce a discharge gas into the cavity 18 until the internal pressure of the cavity 18 reaches 1 - 5 Pa, that is, use the magnetron sputtering technology to coat the surface of the particles.

[0051] During the operation of the device, through the vibration of the vibration disk 11, the particles in the particle container 15 are always in a moving state during the coating process, keeping the particles from agglomerating, and enabling all isolated planes to complete the coating. At the same time, the balance spring 6 balances between the rotating bracket 8 and the rotating main shaft 9 to ensure the balance of the particle container 15 under normal circumstances.

[0052] Embodiment 10: Application of a device for coating the surface of particles by magnetron sputtering. While vibrating and dispersing the particles in the particle container 15 through the particle vibration mechanism, the magnetic field strength and magnetic field distribution on the surface of the target are changed by lifting the target magnetic field lifting mechanism.

[0053] The following embodiments are used to verify the beneficial effects of the present invention:

[0054] Embodiment 1: A device for coating the surface of particles by magnetron sputtering, including a cavity 18, a target magnetic field lifting mechanism and a particle vibration mechanism. The target magnetic field lifting mechanism is arranged in a vacuum box at the top inside the cavity 18, and the particle vibration mechanism is arranged at the bottom inside the cavity 18;

[0055] The target magnetic field lifting mechanism is composed of an inner magnet 2, four outer magnets 3, a target base 4, two push rod shaft fork rods 20, two rotating shaft fork rods 21, a lead screw 29, a lead screw push rod 30, a sliding bearing 31, a balance rod 32, two lifting bottom plates 22 and a target magnetic field lifting mechanism servo motor 23;

[0056] Bearing chutes are arranged on both sides of the upper lifting bottom plate 22, and a pair of fixed bearing seats are symmetrically arranged on both sides at one end of the lower lifting bottom plate 22; The push rod shaft fork rods 20 and the rotating shaft fork rods 21 are cross - arranged, and the two groups of cross - arranged push rod shaft fork rods 20 and rotating shaft fork rods 21 are symmetrically arranged on both sides of the lifting bottom plate 22. Through holes are arranged in the middle sections of the push rod shaft fork rods 20 and the rotating shaft fork rods 21, and both ends of the balance rod 32 pass through the through holes and are connected to the cross - positions of the push rod shaft fork rods 20 and the rotating shaft fork rods 21 on both sides;

[0057] One end of each of the two rotating shaft fork rods 21 is fixedly connected to both sides of the lower surface of the upper lifting bottom plate 22, and the other end is fixedly connected to both sides of the rotating shaft 36. Fixed bearings 37 are arranged on both sides of the rotating shaft, and the fixed bearings 37 are arranged in the fixed bearing seats of the lower lifting bottom plate 22; One end of each of the two push rod shaft fork rods 20 is fixedly connected to both sides of the lead screw push rod 30. Sliding bearings 31 are arranged at both ends of the lead screw push rod 30, and the sliding bearings 31 are arranged in the bearing chutes on both sides of the upper lifting bottom plate 22; The other end of each of the two push rod shaft fork rods 20 is fixedly connected to both sides of the upper surface of the lower lifting bottom plate 22; Concentric threaded holes are arranged in the middle of the upper lifting bottom plate 22 and the lead screw push rod 30. The target magnetic field lifting mechanism servo motor 23 is connected to the top inside the cavity 18. The target magnetic field lifting mechanism servo motor 23 is connected to one end of the lead screw 29 through a transmission shaft, and the other end of the lead screw 29 is threadedly connected to the threaded holes in the middle of the upper lifting bottom plate 22 and the lead screw push rod 30;

[0058] One end of the outer magnet support column 1 and the inner magnet support column 19 are fixedly connected to the lower surface of the lower lifting bottom plate 22, and the other ends of the four outer magnet support columns 1 and the inner magnet support column 19 are fixedly connected to the upper surface of the connecting plate 34, and the four outer magnet support columns 1 are symmetrically arranged around the inner magnet support column 19; the inner magnet 2 is arranged at the center of the lower surface of the connecting plate 34, and the four outer magnets 3 are fixedly connected to the lower surface of the connecting plate 34, and are symmetrically arranged around the inner magnet 2; a target base 4 is arranged at the bottom of the vacuum box, a target material is arranged on the target base 4, and the target material is arranged in a non-contact manner with the inner magnet 2 and the outer magnet 3;

[0059] The particle vibration mechanism is arranged directly below the target magnetic field lifting mechanism, and is composed of a conveyor belt 13, a particle container 15, a particle isolation net 16, an isolation net mechanism servo motor 28, a support frame 35, a balance spring 6, a rotating pin 7, a rotating bracket 8, a rotating spindle 9, a universal wheel 10 and a vibration disc 11;

[0060] The vibration disc 11 is arranged at the bottom of the cavity 18, one end of the rotating main shaft 9 is rotatably connected to the motor through a transmission shaft, a rotating pin 7 is radially arranged on the rotating bracket 8, and the other end of the rotating main shaft 9 is positioned and connected to the rotating pin 7; one side of the lower surface of the rotating bracket 8 is connected to the universal wheel 10 through a connecting rod, and the universal wheel 10 is arranged on the vibration disc 11; a spring plate is vertically arranged on the rotating main shaft 9, and a spring hook is arranged above the spring plate, one end of the balance spring 6 is connected to the other side of the lower surface of the rotating bracket 8, and the other end is connected to the spring hook. Connect; a particle container 15 is provided on the upper surface of the rotating bracket 8, and a support frame 35 is provided around the particle container 15. A group of corner bearing seats 17 are provided at both ends of the upper surface of the support frame 35, and a group of bearing seats 12 are provided at the lower part of one side of the support frame 35; a desktop pulley rotating shaft 24 is provided between the two groups of corner bearing seats 17, a leg pulley rotating shaft 26 is provided between a group of bearing seats 12, the two desktop pulley rotating shafts 24 and the leg pulley rotating shafts 26 are connected by a conveyor belt 13, and a particle isolation net 16 is provided between the two conveyor belts 13.

[0061] A cavity window 5 is provided on one side of the cavity 18 .

[0062] The outer wall of the particle container 15 is provided with a resistance heating cover 14 .

[0063] Both ends of the balance bar 32 are provided with balance bar screws 33 .

[0064] The two groups of corner bearing seats 17 are fixed to the upper surface of the support frame 35 by means of corner bearing seat screws 25 ; the group of bearing seats 12 is fixed to the lower part of one side of the support frame 35 by means of bearing seat screws 27 .

[0065] Embodiment 2: A method for operating a device for coating the surface of particles by magnetron sputtering is carried out according to the following steps:

[0066] Step 1: First, place the particles into the particle container 15, then transfer the particle isolation net 16 to the upper part of the particle container 15 through the particle vibration mechanism, and then lower the four outer magnets 3 and the inner magnet 2 to a certain distance from the target through the target magnetic field lifting mechanism, and then close the cavity window 5;

[0067] Step 2: Evacuate the cavity 18 to a pressure of 5×10 -5 Pa, and at the same time introduce a discharge gas into the cavity 18. When the internal pressure of the cavity 18 reaches 1 - 5 Pa, the surface of the particles is coated using magnetron sputtering technology.

[0068] The specific steps for transferring the particle isolation net 16 to the upper part of the particle container 15 through the particle vibration mechanism are as follows: Start the isolation net mechanism servo motor 28. The isolation net mechanism servo motor 28 drives the leg pulley rotating shaft 26 to rotate. Under the drive of the conveyor belt 13, the two sets of table pulley rotating shafts 24 and the leg pulley rotating shaft 26 rotate simultaneously, realizing the transfer of the particle isolation net 16 to the upper part of the particle container 15.

[0069] The specific steps for lowering the four outer magnets 3 and the inner magnet 2 to a certain distance from the target through the target magnetic field lifting mechanism are as follows: Start the target magnetic field lifting mechanism servo motor 23 and control it to rotate reversely, drive the lead screw 29 to rotate to drive the lead screw push rod 30 to move towards the direction of the target magnetic field lifting mechanism servo motor 23, and then drive the push rod shaft fork rod 20 to move towards the direction of the target magnetic field lifting mechanism servo motor 23 at the same time. Under the scissor action of the push rod shaft fork rod 20 and the rotating shaft fork rod 21, the lowering of the four outer magnets 3 and the inner magnet 2 is realized.

Claims

1. A device for coating the surface of particles by magnetron sputtering, characterized in that The device for coating the surface of particles by magnetron sputtering includes a cavity (18), a target magnetic field lifting mechanism and a particle vibration mechanism. The target magnetic field lifting mechanism is arranged in a vacuum chamber at the top inside the cavity (18), and the particle vibration mechanism is arranged at the bottom inside the cavity (18). The target magnetic field lifting mechanism consists of an inner magnet (2), four outer magnets (3), a target base (4), two push rod shaft fork rods (20), two rotating shaft fork rods (21), a lead screw (29), a lead screw push rod (30), sliding bearings (31), a balance rod (32), two lifting bottom plates (22) and a servo motor (23) for the target magnetic field lifting mechanism. Bearing chutes are arranged on both sides of the upper lifting bottom plate (22), and a pair of fixed bearing seats are symmetrically arranged on both sides at one end of the lower lifting bottom plate (22). The push rod shaft fork rods (20) and the rotating shaft fork rods (21) are arranged in a cross manner, and the two groups of cross - arranged push rod shaft fork rods (20) and rotating shaft fork rods (21) are symmetrically arranged on both sides of the lifting bottom plate (22). Through holes are arranged in the middle sections of the push rod shaft fork rods (20) and the rotating shaft fork rods (21). Both ends of the balance rod (32) pass through the through holes and are connected to the cross positions of the push rod shaft fork rods (20) and the rotating shaft fork rods (21) on both sides. One end of each of the two rotating shaft fork rods (21) is fixedly connected to both sides of the lower surface of the upper lifting bottom plate (22), and the other end is fixedly connected to both sides of the rotating shaft (36). Fixed bearings (37) are arranged on both sides of the rotating shaft, and the fixed bearings (37) are arranged in the fixed bearing seats of the lower lifting bottom plate (22). One end of each of the two push rod shaft fork rods (20) is fixedly connected to both sides of the lead screw push rod (30). Sliding bearings (31) are arranged at both ends of the lead screw push rod (30), and the sliding bearings (31) are arranged in the bearing chutes on both sides of the upper lifting bottom plate (22). The other ends of the two push rod shaft fork rods (20) are respectively fixedly connected to both sides of the upper surface of the lower lifting bottom plate (22). Concentric threaded holes are arranged in the middle of the upper lifting bottom plate (22) and the lead screw push rod (30). The servo motor (23) for the target magnetic field lifting mechanism is connected to the top inside the cavity (18). The servo motor (23) for the target magnetic field lifting mechanism is connected to one end of the lead screw (29) through a transmission shaft, and the other end of the lead screw (29) is threadedly connected to the threaded holes in the middle of the upper lifting bottom plate (22) and the lead screw push rod (30). The lower surface of the lower lifting bottom plate (22) is respectively connected to the inner magnet (2) and the four outer magnets (3) through connectors. The inner magnet (2) is arranged at the center of the lower lifting bottom plate (22), and the four outer magnets (3) are symmetrically arranged around the inner magnet (2). A target base (4) is arranged at the bottom inside the vacuum chamber. A target is arranged on the target base (4), and the target is arranged in a non - contact manner with the inner magnet (2) and the outer magnets (3). The particle vibration mechanism is arranged directly below the target magnetic field lifting mechanism, and is composed of a conveyor belt (13), a particle container (15), a particle isolation net (16), an isolation net mechanism servo motor (28), a support frame (35), a balance spring (6), a rotating pin (7), a rotating bracket (8), a rotating main shaft (9), a universal wheel (10) and a vibration disc (11); The vibration disk (11) is arranged at the bottom of the cavity (18); one end of the rotating main shaft (9) is rotatably connected to the motor through a transmission shaft; a rotating pin (7) is radially arranged on the rotating bracket (8); the other end of the rotating main shaft (9) is positioned and connected to the rotating pin (7); one side of the lower surface of the rotating bracket (8) is connected to the universal wheel (10) through a connecting rod; the universal wheel (10) is arranged on the vibration disk (11); a spring plate is vertically arranged on the rotating main shaft (9); a spring hook is arranged above the spring plate; one end of the balance spring (6) is connected to the lower surface of the rotating bracket (8); The other end is connected to the other side, and the other end is connected to the spring hook; a particle container (15) is arranged on the upper surface of the rotating bracket (8), and a support frame (35) is arranged around the particle container (15); a group of bearing seats are arranged at both ends of the upper surface of the support frame (35) and at the lower part of one side, and a rotating shaft is arranged in each group of bearing seats, and the rotating shaft at the lower part of one side of the support frame (35) is rotatably connected to the servo motor (28) of the isolation net mechanism; conveyor belts (13) are installed at both ends of the rotating shaft, and the three rotating shafts are connected by transmission through the conveyor belt (13), and a particle isolation net (16) is arranged between the two conveyor belts (13).

2. The device for coating the surface of particles by magnetron sputtering according to claim 1, characterized in that The connecting parts between the lower lifting base plate (22) and the inner magnet (2) and the four outer magnets (3) are four outer magnet support columns (1), one inner magnet support column (19) and a connecting plate (34); one end of the outer magnet support column (1) and the inner magnet support column (19) are fixedly connected to the lower surface of the lower lifting base plate (22); the other ends of the four outer magnet support columns (1) and the inner magnet support column (19) are fixedly connected to the upper surface of the connecting plate (34); the inner magnet (2) is arranged at the center of the lower surface of the connecting plate (34); the four outer magnets (3) are fixedly connected to the lower surface of the connecting plate (34) and are symmetrically arranged around the inner magnet (2).

3. The device for coating the surface of particles by magnetron sputtering according to claim 2, characterized in that Four outer magnet support columns (1) are symmetrically arranged around the inner magnet support column (19).

4. A device for coating the surface of particles by magnetron sputtering according to claim 1, characterized in that A cavity window (5) is provided on one side of the cavity (18).

5. A device for coating the surface of particles by magnetron sputtering according to claim 1, characterized in that The outer wall of the particle container (15) is provided with a resistance heating cover (14).

6. The device for coating the surface of particles by magnetron sputtering according to claim 1, characterized in that Both ends of the balance bar (32) are provided with balance bar screws (33).

7. The device for coating the surface of particles by magnetron sputtering according to claim 1, characterized in that At both ends of the upper surface of the support frame (35), a set of corner bearing seats (17) are provided, and a set of bearing seats (12) are provided at the lower part on one side of the support frame (35); between the two sets of corner bearing seats (17), a table pulley rotating shaft (24) is provided, and between a set of bearing seats (12), a leg pulley rotating shaft (26) is provided. The two table pulley rotating shafts (24) and the leg pulley rotating shaft (26) are connected by a conveyor belt (13) for transmission connection.

8. A device for coating the surface of particles by magnetron sputtering according to claim 7, characterized in that The two sets of corner bearing seats (17) are fixed on the upper surface of the support frame (35) through corner bearing seat screws (25); the set of bearing seats (12) are fixed at the lower part on one side of the support frame (35) through bearing seat screws (27).

9. The operating method of a device for coating the surface of particles by magnetron sputtering according to any one of claims 1-8, characterized in that The operation method is carried out according to the following steps: Step 1: First, put the particles into the particle container (15), then use the particle vibration mechanism to transfer the particle isolation net (16) above the particle container (15), and then use the target magnetic field lifting mechanism to lower the four outer magnets (3) and the inner magnet (2) to a certain distance from the target, and then close the cavity window (5); The specific steps of using the particle vibration mechanism to transfer the particle isolation net (16) above the particle container (15) are as follows: Start the isolation net mechanism servo motor (28), the isolation net mechanism servo motor (28) drives the leg pulley rotating shaft (26) to rotate. Under the transmission of the conveyor belt (13), the two table pulley rotating shafts (24) and the leg pulley rotating shaft (26) rotate simultaneously, realizing the transfer of the particle isolation net (16) above the particle container (15); The specific steps of using the target magnetic field lifting mechanism to lower the four outer magnets (3) and the inner magnet (2) to a certain distance from the target are as follows: Start the target magnetic field lifting mechanism servo motor (23) and control it to rotate reversely, drive the lead screw (29) to rotate to drive the lead screw push rod (30) to move towards the direction of the target magnetic field lifting mechanism servo motor (23), and then drive the push rod shaft fork rod (20) to move towards the direction of the target magnetic field lifting mechanism servo motor (23) at the same time. Under the scissor action of the push rod shaft fork rod (20) and the rotating shaft fork rod (21), the lowering of the four outer magnets (3) and the inner magnet (2) is realized; Step 2: Evacuate the cavity (18) to a pressure of 5×10 -5 Pa. At the same time, introduce a discharge gas into the cavity (18). When the internal pressure of the cavity (18) reaches 1 - 5 Pa, coat the particle surface using magnetron sputtering technology.

10. The application of a device for coating the surface of particles by magnetron sputtering according to any one of claims 1-8, characterized in that The device for magnetron sputtering particle surface coating changes the magnetic field strength and magnetic field distribution on the surface of the target through the lifting of the target magnetic field lifting mechanism while vibrating and dispersing the particles in the particle container (15) through the particle vibration mechanism.

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