Silicon wafer projection stepping curved mirror projection photoetching light path structure

Abstract

The invention relates to the technical field of photoetching equipment, and discloses a silicon wafer projection stepping type curved mirror projection photoetching light path structure which comprises a UV-LED multi-lamp light source module, a compound eye front collimating lens group, a light equalizing module and a reflecting mirror assembly which are correspondingly arranged in sequence, and a curved mirror is arranged in the reflecting light direction of the reflecting mirror assembly. A mask, a magnification lens assembly and a photoetching workbench are sequentially arranged in the light reflecting direction of the curved mirror, and a silicon wafer fixing structure for fixing a silicon wafer is arranged on the photoetching workbench. The device is simple in structure, high in precision, strong in applicability and low in cost, and can effectively meet the use requirements of small enterprises or research and development institutions.

Description

Technical Field

[0001] The present invention relates to the technical field of lithography equipment, and particularly relates to a projection optical path structure of a silicon wafer projection step mirror for a curved surface in a lithography machine. Background Art

[0002] When performing circuit lithography on the surface of a silicon wafer, the light sources of general different devices are mercury lamps, and the service life is short; the lithography equipment is large in size, complex in structure, and high in cost, and is generally purchased by relatively large new companies. When small enterprises or research institutions purchase equipment, it requires a large amount of funds and a large area of high - requirement sites, resulting in relatively high cost pressure and low usage frequency. Therefore, the existing lithography equipment is not very suitable for small enterprises or research institutions. Summary of the Invention

[0003] The present invention provides a projection optical path structure of a silicon wafer projection step mirror for a curved surface in a lithography machine, which solves the technical problems of large size, complex structure, and high cost of existing lithography equipment.

[0004] The technical solution adopted by the present invention to solve its technical problems is: a projection optical path structure of a silicon wafer projection step mirror for a curved surface in a lithography machine, including a UV - LED multi - light source module, a front - compound collimating lens group, a light - homogenizing module, and a mirror assembly arranged in corresponding order. A curved mirror is arranged in the direction of the reflected light of the mirror assembly. A mask, a magnification lens assembly, and a lithography workbench are arranged in sequence in the direction of the reflected light of the curved mirror. A silicon wafer fixing structure for fixing a silicon wafer is arranged on the lithography workbench. The structure is simple, with high precision, strong applicability, and low cost, and can effectively meet the use requirements of small enterprises or research institutions.

[0005] Further: The front - compound collimating lens group includes at least two front - compound collimating lenses arranged coaxially and in the same direction. It can effectively focus the light emitted by the UV - LED multi - light source module into parallel light and propagate it to the light - homogenizing module, with high precision.

[0006] Further: The light - homogenizing module includes a micro - cylindrical lens array and a condenser lens arranged coaxially, and the micro - cylindrical lens array is located on the side close to the front - compound collimating lens group. After passing through the light - homogenizing module, the light becomes a uniform light spot with a divergence angle, forming the required uniform light field distribution.

[0007] Further: The lithography workbench is a displaceable transparent lithography workbench. The structure can be adjusted according to actual situations, with stronger applicability.

[0008] Further: The magnification lens assembly is a microscope group. It can greatly reduce the cost.

[0009] Furthermore, a switching drive mechanism is provided on the UV-LED multi-light source module, a plurality of light source fixing structures driven by the switching drive mechanism are located on the switching drive mechanism, and a plurality of UV-LED light sources are respectively provided on the plurality of light source fixing structures. The fixing positions of the plurality of UV-LED light sources can be interchanged, and the applicability is better.

[0010] Furthermore, a manual adjustment mechanism for driving the silicon wafer fixing structure to move in the direction towards the magnification lens assembly and to move in a direction perpendicular to the axis of the magnification lens assembly is provided on the lithography workbench. An automatic adjustment drive mechanism for driving the silicon wafer fixing structure to move in the direction towards the magnification lens assembly and to move in a direction perpendicular to the axis of the magnification lens assembly is provided on the manual adjustment mechanism. The automatic adjustment drive mechanism is connected to a workbench control module and is controlled by the workbench control module to move. The manual adjustment mechanism and the automatic adjustment drive mechanism can be used in combination or separately, with high precision and strong applicability.

[0011] Furthermore, the magnification lens assembly includes a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens, and a seventh lens that are sequentially arranged on the same axis. The third lens, the fourth lens, and the fifth lens are all double-sided convex lenses. The first lens and the second lens are both single-sided convex lenses and the corresponding sides of the first lens and the second lens protrude. The sixth lens and the seventh lens are both single-sided convex lenses and the corresponding sides of the first lens and the second lens protrude. The structure is simple, achieving a magnification reduction effect, and having a lower cost while ensuring precision. Description of the Drawings

[0012] Figure 1 It is a schematic structural diagram of the present invention.

[0013] The markings in the figure are: UV-LED multi-light source module 100, compound eye front collimating lens group 200, light homogenizing module 300, mirror assembly 400, curved mirror 500, mask 600, magnification lens assembly 700, lithography workbench 800. Detailed Embodiments

[0014] The present invention will be further described below in conjunction with the drawings and specific embodiments.

[0015] As Figure 1A projection lithography optical path structure of a silicon wafer with a curved mirror for a projection stepper, comprising a UV-LED multi-light source module 100, a pre-collimating lens group 200 in front of the compound eye, a light homogenizing module 300, and a mirror assembly 400 arranged in sequence. A curved mirror 500 is arranged in the direction of the reflected light of the mirror assembly 400. A mask 600, a magnification lens assembly 700, and a lithography workbench 800 are arranged in sequence in the direction of the reflected light of the curved mirror 500. A silicon wafer fixing structure for fixing the silicon wafer is arranged on the lithography workbench 800. In specific implementation, the UV-LED multi-light source module 100 emits ultraviolet light, and the ultraviolet light is focused into parallel light after passing through the pre-collimating lens group 200 in front of the compound eye and propagates to the light homogenizing module 300. The parallel light becomes uniform light with a divergence angle after passing through the light homogenizing module 300 to form the required uniform light field distribution, and then the mirror assembly 400 reflects the light to the curved mirror 500. The light is reflected to the mask 600 after passing through the curved mirror 500, and the light becomes a light spot with the pattern of the mask 600 after passing through the mask 600 and enters the magnification lens assembly 700. The light spot with the pattern of the mask 600 is reduced after entering the magnification lens assembly 700 and is projected onto the silicon wafer fixed on the lithography workbench 800 for lithography. The structure is simple, with high precision, strong applicability, and low cost, and can effectively meet the use requirements of small enterprises or research institutions.

[0016] On the basis of the above, as Figure 1 shown, the pre-collimating lens group 200 in front of the compound eye includes at least two pre-collimating lenses in front of the compound eye arranged coaxially and in the same direction. It can effectively focus the light emitted by the UV-LED multi-light source module 100 into parallel light and propagate it to the light homogenizing module 300, with high precision.

[0017] On the basis of the above, as Figure 1 shown, the light homogenizing module 300 includes a micro-cylindrical mirror array and a condenser lens arranged coaxially. The micro-cylindrical mirror array is located on the side close to the pre-collimating lens group 200 in front of the compound eye. The light becomes a uniform light spot with a divergence angle after passing through the light homogenizing module 300, forming the required uniform light field distribution.

[0018] On the basis of the above, as Figure 1 shown, the lithography workbench 800 is a displaceable transparent lithography workbench. The silicon wafer fixing structure can be arranged on one side of the two sides of the lithography workbench 800, or can be arranged on both sides. The structure can be adjusted according to the actual situation, with stronger applicability.

[0019] On the basis of the above, as Figure 1 shown, the magnification lens assembly 700 is a microscope group. It can greatly reduce the cost.

[0020] On the basis of the above, as Figure 1As shown, a switching drive mechanism is provided on the UV-LED multi-light source module 100, a plurality of light source fixing structures driven by the switching drive mechanism are located on the switching drive mechanism, and a plurality of UV-LED light sources are respectively provided on the plurality of light source fixing structures. The fixing positions of the plurality of UV-LED light sources can be interchanged, and the applicability is better.

[0021] On the basis of the above, as Figure 1 shown, a manual adjustment mechanism for driving the movement of the silicon wafer fixing structure in the direction towards the magnification lens assembly 700 and the movement in the direction perpendicular to the axis of the magnification lens assembly 700 is provided on the lithography workbench 800. An automatic adjustment drive mechanism for driving the movement of the silicon wafer fixing structure in the direction towards the magnification lens assembly 700 and the movement in the direction perpendicular to the axis of the magnification lens assembly 700 is provided on the manual adjustment mechanism. The automatic adjustment drive mechanism is connected to a workbench control module and is controlled by the workbench control module to move. In a specific implementation, the manual adjustment mechanism is a high-precision displacement adjustment mechanism, and the high-precision movement is adjusted by rotating a column, which is the same as the adjustment method of a micrometer and can achieve the accuracy of a micrometer; the automatic adjustment drive mechanism is a combined mechanism of a plurality of high-precision linear motors, and the movement accuracy is not less than 10um. The manual adjustment mechanism and the automatic adjustment drive mechanism can be used in cooperation or separately, with high precision and strong applicability.

[0022] On the basis of the above, as Figure 1 shown, the magnification lens assembly 700 includes a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens, and a seventh lens that are sequentially arranged on the same axis. The third lens, the fourth lens, and the fifth lens are all double-sided convex lenses. The first lens and the second lens are both single-sided convex lenses and the corresponding sides of the first lens and the second lens are convex. The sixth lens and the seventh lens are both single-sided convex lenses and the corresponding sides of the first lens and the second lens are convex. The structure is simple, achieving a magnification reduction effect, and the cost is relatively low while ensuring the accuracy.

[0023] In the above specific embodiments, the purpose, technical solutions, and beneficial effects of the present invention have been further described in detail. It should be understood that the above are only specific embodiments of the present invention and are not used to limit the present invention. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.

Claims

1. A projection lithography optical path structure of a silicon wafer projection step mirror, characterized in that: The invention comprises a UV-LED multi-lamp light source module (100), a compound eye front collimating lens group (200), a light averaging module (300) and a reflector assembly (400) which are arranged in sequence and in correspondence with each other; the reflector assembly (400) is provided with a curved mirror (500) in the direction of light reflection; the curved mirror (500) is provided with a mask (600), a magnification mirror assembly (700) and a photolithography workbench (800) in the direction of light reflection; and the photolithography workbench (800) is provided with a silicon wafer fixing structure for fixing a silicon wafer.

2. The optical path structure of a silicon wafer projection step mirror projection lithography according to claim 1, wherein: The compound eye front collimating lens group (200) comprises at least two compound eye front collimating lenses arranged coaxially and in the same direction.

3. A projection lithography optical path structure of a silicon wafer projection step surface mirror according to claim 1, characterized in that: The light-homogenizing module (300) comprises a coaxially arranged micro-cylindrical mirror array and a condenser, wherein the micro-cylindrical mirror array is located on a side close to the collimating lens group (200) in front of the compound eye.

4. A projection lithography optical path structure of a silicon wafer projection step mirror according to claim 1, characterized in that: The photolithography workbench (800) is a displaceable transparent photolithography workbench.

5. A projection lithography optical path structure of a silicon wafer projection step mirror according to claim 1, characterized in that: The magnifying lens assembly (700) is a microscope assembly.

6. A projection lithography optical path structure of a silicon wafer projection step mirror according to claim 1, characterized in that: The UV-LED multi-lamp light source module (100) is provided with a switching drive mechanism, a plurality of light source fixing structures located on the switching drive mechanism and driven thereby, and a plurality of UV-LED light sources respectively arranged on the plurality of light source fixing structures.

7. A silicon wafer projection step mirror projection lithography optical path structure according to claim 1, characterized in that: The photolithography workbench (800) is provided with a manual adjustment mechanism for driving the silicon wafer fixed structure to move towards the magnification mirror assembly (700) and to move in a direction perpendicular to the axis of the magnification mirror assembly (700); the manual adjustment mechanism is provided with an automatic adjustment drive mechanism for driving the silicon wafer fixed structure to move towards the magnification mirror assembly (700) and to move in a direction perpendicular to the axis of the magnification mirror assembly (700); the automatic adjustment drive mechanism is connected to a workbench control module and its movement is controlled by the workbench control module.

8. A projection lithography optical path structure of a silicon wafer projection step curved mirror according to claim 5, characterized in that: The magnification mirror assembly (700) comprises a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens and a seventh lens which are arranged in sequence on the same axis, wherein the third lens, the fourth lens and the fifth lens are double-sided convex lenses, the first lens and the second lens are single-sided convex lenses and the corresponding side of the first lens and the second lens is convex, and the sixth lens and the seventh lens are single-sided convex lenses and the corresponding side of the first lens and the second lens is convex.

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