Method, system and equipment for calibrating measurement system of exposure equipment and storage medium

Abstract

The invention relates to the field of measurement, and discloses an exposure equipment measurement system calibration method, system and equipment and a storage medium. The calibration method for the measurement system of the exposure equipment comprises the following steps: acquiring reference data from an interferometer mirror group, a workpiece table, a mask table, a first plane mirror group and a second plane mirror group; establishing an error resolving model according to the reference data; moving the workpiece table and the mask table for multiple times, and obtaining corresponding redundant measurement data from the interferometer mirror group after each movement; substituting all redundant measured values into the error resolving model to obtain an overdetermined equation set; solving the overdetermined equation set to obtain an error calibration result; through a multi-position movement strategy and a nonlinear overdetermined equation set solution, organic combination of self-calibration and total error compensation of an interferometer group is realized, and a low-cost and high-precision calibration scheme of an exposure equipment measurement system is provided for precise equipment such as a panel exposure machine.

Description

Technical Field

[0001] The present invention relates to the field of measurement technology, and in particular, to a calibration method, system, device, and storage medium for an exposure equipment measurement system. Background Art

[0002] As a core device in semiconductor manufacturing, the positioning accuracy of the moving platform of a panel exposure machine directly affects the exposure quality of the panel. To achieve nanometer-level precision motion control, the prior art uses a laser interferometer as a measurement device, and a dual-stage measurement system is formed by a mirror group and an interferometer mirror group to feedback the displacement of the stage in real time. However, in the actual installation process, there are installation errors in the laser light source, the interferometer mirror group, and the mirror group, resulting in an angular deviation between the measurement beam of the interferometer and the actual motion direction of the stage, thereby introducing systematic measurement errors. Traditional calibration methods rely on a standard metrology instrument with a higher accuracy level as a reference. However, since the interferometer itself has reached nanometer-level measurement accuracy, there is currently a lack of a reference tool with higher accuracy than it, making calibration difficult to implement. Summary of the Invention

[0003] In order to overcome the deficiencies of the prior art, the purpose of the present invention is to provide a calibration method, system, device, and storage medium for an exposure equipment measurement system. Through a multi-position movement strategy and the solution of a non-linear overdetermined equation set, the present invention realizes the organic combination of self-calibration of the interferometer group and full error compensation, providing a low-cost and high-precision calibration solution for the exposure equipment measurement system of precision equipment such as panel exposure machines.

[0004] The first aspect of the present invention provides a calibration method for an exposure equipment measurement system, which is applied to the measurement system of the moving platform of a panel exposure machine. The measurement system of the moving platform of the panel exposure machine includes: a control device, a laser, an interferometer mirror group, a stage, and a mask stage that are electrically connected to the control device; a first plane mirror group is provided on the stage, and a second plane mirror group is provided on the mask stage; the laser is connected to the interferometer mirror group through an optical fiber, and the interferometer mirror group forms a dual-stage measurement system with the first plane mirror group and the second plane mirror group respectively; the calibration method for the exposure equipment measurement system includes the steps of: obtaining reference data from the interferometer mirror group, the stage, the mask stage, the first plane mirror group, and the second plane mirror group; establishing an error calculation model based on the reference data; obtaining redundant measurement data corresponding to multiple movements of the interferometer mirror group on the stage and the mask stage; substituting all redundant measurement values into the error calculation model to obtain an overdetermined equation set; and solving the overdetermined equation set to obtain an error calibration result.

[0005] Optionally, in the first implementation manner of the first aspect of the present invention, obtaining the reference data from the interferometer mirror group, the workpiece stage, the mask stage, the first planar mirror group, and the second planar mirror group includes: obtaining the initial measurement value of the interferometer mirror group; obtaining the initial position of the interferometer mirror group; obtaining the size information of the workpiece stage and the mask stage; obtaining the installation positions of the first planar mirror group and the second planar mirror group; and integrating the initial measurement value, the initial position, the size information, and the installation positions to obtain the reference data.

[0006] Optionally, in the second implementation manner of the first aspect of the present invention, establishing the error calculation model according to the reference data includes: constructing a basic equation according to the reference data; performing error analysis on the interferometer mirror group, the first planar mirror group, and the second mirror group to obtain error parameters; and introducing the error parameters into the basic equation to obtain the error calculation model.

[0007] Optionally, in the third implementation manner of the first aspect of the present invention, performing error analysis on the interferometer mirror group, the first planar mirror group, and the second planar mirror group to obtain error parameters includes: performing error analysis on the interferometer mirror group to obtain the horizontal deflection angle error of the measurement beam in the X direction, the vertical deflection angle error of the measurement beam in the X direction, the horizontal deflection angle error of the measurement beam in the Y direction, and the vertical deflection angle error of the measurement beam in the Y direction; performing error analysis on the first planar mirror group and the second planar mirror group to obtain the horizontal installation error of the planar mirror in the X direction, the vertical installation error of the planar mirror in the X direction, the horizontal installation error of the planar mirror in the Y direction, and the vertical installation error of the planar mirror in the Y direction; and integrating the horizontal deflection angle error of the measurement beam in the X direction, the vertical deflection angle error of the measurement beam in the X direction, the horizontal deflection angle error of the measurement beam in the Y direction, the vertical deflection angle error of the measurement beam in the Y direction, the horizontal installation error of the planar mirror in the X direction, the vertical installation error of the planar mirror in the X direction, the horizontal installation error of the planar mirror in the Y direction, and the vertical installation error of the planar mirror in the Y direction to obtain the error parameters.

[0008] The second aspect of the present invention provides a measurement system for a panel exposure machine moving platform. The measurement system for the panel exposure machine moving platform includes: a control device, a laser, an interferometer mirror group, a workpiece stage, and a mask stage that are electrically connected to the control device; a first planar mirror group is provided on the workpiece stage, and a second planar mirror group is provided on the mask stage; and the control device is configured to execute the calibration method for the exposure device measurement system as described above.

[0009] Optionally, in the first implementation mode of the second aspect of the present invention, the first plane mirror group includes a first X-direction mirror and a first Y-direction mirror; the first X-direction mirror is fixed in the X-axis movement direction of the workpiece table, and the first Y-direction mirror is fixed in the Y-axis movement direction of the workpiece table; the second plane mirror group includes a second X-direction mirror and a second Y-direction mirror; the second X-direction mirror is fixed in the X-axis movement direction of the mask table, and the second Y-direction mirror is fixed in the Y-axis movement direction of the mask table; the interferometer mirror group respectively forms a dual-workpiece-table measurement system with the first X-direction mirror, the first Y-direction mirror, the second X-direction mirror, and the second Y-direction mirror.

[0010] Optionally, in the second implementation mode of the second aspect of the present invention, the interferometer mirror group includes a first beam splitter, a second beam splitter, a third beam splitter, a fourth beam splitter, a fifth beam splitter, a sixth beam splitter, a seventh beam splitter, an eighth beam splitter, a ninth beam splitter, a tenth beam splitter, an eleventh beam splitter, a twelfth beam splitter, a thirteenth beam splitter, a fourteenth beam splitter, a fifteenth beam splitter, a first interferometer, a second interferometer, a third interferometer, a fourth interferometer, a fifth interferometer, a sixth interferometer, a seventh interferometer, an eighth interferometer, a ninth interferometer, a tenth interferometer, an eleventh interferometer, a twelfth interferometer, a thirteenth interferometer, a fourteenth interferometer, a fifteenth interferometer, a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, and a sixth mirror; The incident end of the first beam splitter is connected to the laser. A first mirror is provided on the first splitting path of the first beam splitter, and a second beam splitter is provided on the second splitting path of the first beam splitter; a third beam splitter is provided on the first splitting path of the second beam splitter, and a first interferometer is provided on the second splitting path of the second beam splitter; a fourth beam splitter is provided on the first splitting path of the third beam splitter, and a fifth beam splitter is provided on the second splitting path of the third beam splitter; a second interferometer is provided on the splitting path of the fourth beam splitter; a third interferometer is provided on the first splitting path of the fifth beam splitter; a second mirror is provided on the second splitting path of the fifth beam splitter, and a fourth interferometer is provided on the splitting path of the second mirror; A sixth beam splitter is provided on the first beam splitting path of the first mirror, and a fourth mirror is provided on the second beam splitting path of the first mirror; a seventh beam splitter is provided on the first beam splitting path of the sixth beam splitter, and a fifth interferometer is provided on the second beam splitting path of the sixth beam splitter; an eighth beam splitter is provided on the first beam splitting path of the seventh beam splitter, and a ninth beam splitter is provided on the second beam splitting path of the seventh beam splitter; a sixth interferometer is provided on the beam splitting path of the eighth beam splitter; a seventh interferometer is provided on the first beam splitting path of the ninth beam splitter; a third mirror is provided on the second beam splitting path of the ninth beam splitter, and an eighth interferometer is provided on the beam splitting path of the third mirror; A tenth beam splitter is provided on the beam splitting path of the fourth mirror; an eleventh beam splitter is provided on the first beam splitting path of the tenth beam splitter, and a thirteenth beam splitter is provided on the second beam splitting path of the tenth beam splitter; a ninth interferometer is provided on the first beam splitting path of the eleventh beam splitter; a fifth mirror is provided on the second beam splitting path of the eleventh beam splitter, and a tenth interferometer is provided on the beam splitting path of the fifth mirror; a twelfth beam splitter is provided on the third beam splitting path of the eleventh beam splitter, and an eleventh interferometer is provided on the beam splitting path of the twelfth beam splitter; A fourteenth beam splitter is provided on the first beam splitting path of the thirteenth beam splitter, and a twelfth interferometer is provided on the second beam splitting path of the thirteenth beam splitter; a thirteenth interferometer is provided on the first beam splitting path of the fourteenth beam splitter; a fifteenth beam splitter is provided on the second beam splitting path of the fourteenth beam splitter, and a fourteenth interferometer is provided on the beam splitting path of the fifteenth beam splitter; a sixth mirror is provided on the third beam splitting path of the fourteenth beam splitter, and a fifteenth interferometer is provided on the beam splitting path of the sixth mirror; The first interferometer, the second interferometer, the third interferometer and the fourth interferometer respectively form interference optical paths with the first X-direction mirror; the fifth interferometer, the sixth interferometer, the seventh interferometer and the eighth interferometer respectively form interference optical paths with the first Y-direction mirror; the ninth interferometer, the tenth interferometer and the eleventh interferometer respectively form interference optical paths with the second X-direction mirror; the twelfth interferometer, the thirteenth interferometer, the fourteenth interferometer and the fifteenth interferometer respectively form interference optical paths with the second Y-direction mirror.

[0011] Optionally, in the third implementation manner of the second aspect of the present invention, the interferometer mirror group further includes a sixteenth beam splitter, a seventh mirror and a wavelength compensator; the sixteenth beam splitter is provided between the first beam splitter and the second beam splitter, a seventh mirror is provided on the beam splitting path of the sixteenth beam splitter, and the wavelength compensator is provided on the beam splitting path of the seventh mirror.

[0012] In a third aspect of the present invention, there is provided a calibration device for an exposure equipment measurement system, the calibration device for the exposure equipment measurement system comprising: a memory and at least one processor, instructions being stored in the memory; at least one of the processors invoking the instructions in the memory to cause the calibration device for the exposure equipment measurement system to execute the respective steps of the calibration method for the exposure equipment measurement system described in any one of the above.

[0013] In a fourth aspect of the present invention, there is provided a computer-readable storage medium, instructions being stored on the computer-readable storage medium, and when the instructions are executed by a processor, the respective steps of the calibration method for the exposure equipment measurement system described in any one of the above are implemented.

[0014] In the technical solution of the present invention, by synchronously collecting multi-dimensional data such as the original signal of the interferometer mirror group, the position of the stage encoder, and the installation angle of the mirror, an error calculation model including the installation error of the interferometer, the installation error of the mirror, and the six-degree-of-freedom error of the stage is established; then, by controlling the stage and the mask stage to move to multiple discrete positions, a plurality of redundant measurement data are obtained, and the redundant measurement data are substituted into the error calculation model to establish an overdetermined system of equations, and finally the overdetermined system of equations is solved to complete error calibration; through the redundant measurement of the internal optical path of the interferometer group and the multi-position movement strategy, the present invention realizes the organic combination of the self-calibration of the interferometer group and the full error compensation, and provides a low-cost and high-precision calibration solution for the exposure equipment measurement system of precision equipment such as panel exposure machines. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] The above and / or additional aspects and advantages of the present invention will become apparent and be readily understood from the following description of the embodiments in conjunction with the accompanying drawings, in which: Figure 1 is the first flowchart of the calibration method for the exposure equipment measurement system provided by the embodiment of the present invention; Figure 2 is the second flowchart of the calibration method for the exposure equipment measurement system provided by the embodiment of the present invention; Figure 3 is the third flowchart of the calibration method for the exposure equipment measurement system provided by the embodiment of the present invention; Figure 4 is the fourth flowchart of the calibration method for the exposure equipment measurement system provided by the embodiment of the present invention; Figure 5 is a schematic structural diagram of a system provided by the embodiment of the present invention; Figure 6 is another schematic structural diagram of a system provided by the embodiment of the present invention; Figure 7 is a schematic structural diagram of a device provided by the embodiment of the present invention.

[0016] In the drawings: 500 - Control device; 501 - Laser; 502 - Interferometer mirror group; 503 - Workpiece stage; 504 - Mask stage; 505 - First planar mirror group; 506 - Second planar mirror group; 1 - First beam splitter; 2 - Second beam splitter; 3 - Third beam splitter; 4 - Fourth beam splitter; 5 - Fifth beam splitter; 6 - Sixth beam splitter; 7 - Seventh beam splitter; 8 - Eighth beam splitter; 9 - Ninth beam splitter; 10 - Tenth beam splitter; 11 - Eleventh beam splitter; 12 - Twelfth beam splitter; 13 - Thirteenth beam splitter; 14 - Fourteenth beam splitter; 15 - Fifteenth beam splitter; 16 - Sixteenth beam splitter; G1 - First interferometer; G2 - Second interferometer; G3 - Third interferometer; G4 - Fourth interferometer; G5 - Fifth interferometer; G6 - Sixth interferometer; G7 - Seventh interferometer; G8 - Eighth interferometer; G9 - Ninth interferometer; G10 - Tenth interferometer; G11 - Eleventh interferometer; G12 - Twelfth interferometer; G13 - Thirteenth interferometer; G14 - Fourteenth interferometer; G15 - Fifteenth interferometer; F1 - First reflector; F2 - Second reflector; F3 - Third reflector; F4 - Fourth reflector; F5 - Fifth reflector; F6 - Sixth reflector; F7 - Seventh reflector; P1 - First X - direction reflector; P2 - First Y - direction reflector; P3 - Second X - direction reflector; P4 - Second Y - direction reflector. Detailed implementation manner

[0017] The present invention provides a calibration method, system, device and storage medium for an exposure equipment measurement system. By synchronously collecting multi - dimensional data such as the original signal of the interferometer mirror group, the position of the workpiece stage encoder, and the installation angle of the reflector, an error calculation model including the installation error of the interferometer, the installation error of the reflector, and the six - degree - of - freedom error of the workpiece stage is established; then, by controlling the workpiece stage and the mask stage to move to multiple discrete positions, a plurality of redundant measurement data are obtained, and the redundant measurement data are substituted into the error calculation model to establish an over - determined system of equations. Finally, the over - determined system of equations is solved to complete the error calibration. The present invention realizes the organic combination of self - calibration of the interferometer group and full - error compensation through the redundant measurement of the internal optical path of the interferometer group and the multi - position movement strategy, and provides a low - cost and high - precision calibration scheme for the exposure equipment measurement system of precision equipment such as panel exposure machines.

[0018] In the description of the present invention, the claims and the above drawings, the terms "first", "second", "third", "fourth", etc. are used to distinguish similar objects and do not necessarily describe a specific order or sequence. It should be understood that the data used in this way can be interchanged under appropriate circumstances so that the embodiments described herein can be implemented in an order other than that illustrated or described herein. In addition, the term "comprising" or "having" and any variations thereof are intended to cover non-exclusive inclusion. For example, a process, method, system, product or device comprising a series of steps or units does not necessarily have to be limited to those steps or units clearly listed, but may include other steps or units not clearly listed or inherent to these processes, methods, products or devices.

[0019] For ease of understanding, the specific processes of the embodiments of the present invention will be described below. Please refer to Figure 1 An embodiment of the calibration method for the measurement system of the exposure device in the embodiment of the present invention includes: The measurement system of the panel exposure machine moving platform includes: a control device, a laser, an interferometer mirror group, a workpiece table and a mask table that are electrically connected to the control device; a first plane mirror group is provided on the workpiece table, and a second plane mirror group is provided on the mask table; the laser is connected to the interferometer mirror group through an optical fiber, and the interferometer mirror group respectively forms a dual-workpiece table measurement system with the first plane mirror group and the second plane mirror group; In one embodiment, the core objective of the measurement system of the panel exposure machine moving platform is to accurately measure the positions of the workpiece table and the mask table, and provide accurate feedback information for the high-precision motion control of the panel exposure machine; in practical applications, due to the installation errors of the interferometer mirror group and the mirror group and the influence of environmental factors, there may be certain measurement errors in the measurement system, and these errors will affect the positioning accuracy of the workpiece table and the mask table, thereby reducing the exposure quality of the panel exposure machine. Therefore, it is necessary to calibrate the measurement system to eliminate these errors and improve the measurement accuracy; The present invention uses the redundant information of the measurement system itself to determine the error parameters. By moving the workpiece table and the mask table multiple times and performing measurements at different positions, multiple different measurement results can be obtained; then, an error calculation model and an overdetermined system of equations are established using these measurement results, and the error information is extracted, thereby realizing the self-calibration of the measurement system; The laser, as the light source of the system, generates a stable laser beam. The laser has characteristics such as high monochromaticity, high directivity, and high coherence, and is suitable for high-precision measurement; the laser transmits the laser to the interferometer mirror group through an optical fiber, providing a stable light source for interference measurement; The interferometer mirror group receives the laser beam from the laser and divides it into 15 optical paths, which are respectively injected into the first plane mirror group and the second plane mirror group installed on the workpiece stage and the mask stage. The first plane mirror group and the second plane mirror group reflect the laser beam emitted by the interferometer mirror group to form a dual-workpiece stage measurement system. The interferometer mirror group measures the optical path difference by detecting the change of interference fringes, and then obtains the displacement information of the workpiece stage and the mask stage. The principle of interference measurement is based on the wave nature of light. When two coherent light beams meet, an interference phenomenon will occur, and the change of interference fringes is proportional to the optical path difference. The workpiece stage and the mask stage are key components of the panel exposure machine, and they need to perform precise movement and positioning during the exposure process. The workpiece stage is used to carry the panel, and the mask stage is used to carry the mask. By precisely controlling the relative position and movement trajectory of the workpiece stage and the mask stage, high-precision exposure of the panel can be achieved.

[0020] The calibration method of the exposure equipment measurement system includes the steps: 101. Obtain reference data from the interferometer mirror group, the workpiece stage, the mask stage, the first plane mirror group and the second plane mirror group; In this embodiment, after building the measurement system of the panel exposure machine movement platform, first obtain the original measurement value from the interferometer mirror group, obtain the initial position and size information from the workpiece stage and the mask stage, and obtain the initial installation position information from the first plane mirror group and the second plane mirror group; summarize the above information as reference data.

[0021] 102. Establish an error calculation model according to the reference data; In this embodiment, according to the reference data, establish a relationship between the interferometer measurement value and the displacement of the workpiece stage, and then add the installation error of the interferometer, the installation angle error of the first plane mirror group and the second plane mirror, and the movement error of the workpiece stage and the mask stage as error terms to the relationship between the interferometer measurement value and the displacement of the workpiece stage / mask stage, so as to build an error calculation model.

[0022] Specifically, the error calculation model, that is, the relationship between the interferometer measurement value and the position of the workpiece stage / mask stage can be expressed as:

[0023] Among them, 、 、 、 、 It is expressed as:

[0024]

[0025] , , , , are respectively the conversion coefficients between the interferometer measurement values and the stage displacement; is used to represent the alignment error between the interferometer measurement beam and the motion direction, which includes the angular error of the interferometer itself, the mounting error of the measurement flat mirror, and the attitude error of the stage; is used to reflect the cross influence between the interferometer angular error and the mirror mounting error, which includes the quadratic error terms , and ; and are used to reflect the coupling terms between the attitude error and the mounting error; is the geometric position compensation term between the interferometer coordinate system and the stage coordinate system; Where: , are the horizontal and vertical mounting errors of the X-direction measurement flat mirror; x, are the horizontal and vertical mounting errors of the Y-direction measurement flat mirror; RXyi, RXzi are the horizontal and vertical deflection angles of the X-direction measurement beam of the laser interferometer; RYxi, RYzi are the horizontal and vertical deflection angles of the Y-direction measurement beam of the laser interferometer; , , X, Y, Z are different displacement amounts of the stage (or mask stage); , and are the coordinates of the laser interferometer in the measurement coordinate system; the measurement coordinate system is the reference coordinate system defined for positioning the stage (or mask stage); i represents the number of interferometers; m, n respectively represent the distances between the measurement flat mirror and the X-edge and Y-edge of the stage (or mask stage), and are used to represent the mounting position of the measurement flat mirror on the stage (or mask stage); l, k represent the length and width of the stage / mask stage; In the above formulas, the interferometer measurement values and , the interferometer coordinates , and is a known quantity (the interferometric measurement value can be obtained by reading from the interferometer, and the interferometer coordinate value can be directly measured), , , x, , RXyi, RXzi, RYxi, RYzi are 8 unknown error quantities (a total of 4 installation errors in the X and Y directions of the laser interferometer, and a total of 4 installation errors in the X and Y directions of the measuring horizontal mirror, summing up to 8 installation errors), , , , X, Y, Z are six unknown quantities (during actual work, the workpiece stage or mask stage will move multiple times, and the six unknown quantities correspond to the coordinate and angular deviations of the workpiece stage or mask stage after each movement); therefore, the formula has 8 equations and 14 unknown quantities.

[0026] 103. Obtain redundant measurement data corresponding to the multiple movements of the interferometer mirror group on the workpiece stage and the mask stage.

[0027] 104. Substitute all redundant measurement values into the error calculation model to obtain an overdetermined system of equations; In this embodiment, since the error calculation model has only 8 equations but 14 unknown quantities, the system of equations has no solution; For this reason, it is necessary to control the workpiece stage (or mask stage) to move to at least 4 characteristic positions. Since the installation error between the interferometer and the flat mirror is independent of the movement of the workpiece stage, 8 equations and 6 unknown quantities are generated each time it moves. After moving 4 times, 32 equations and 24 unknown quantities are obtained. Adding the initial 8 unknown installation error quantities, there are 32 equations and 32 unknown quantities, and the system of equations has a solution; At this time, the system of equations can be expressed as:

[0028] Among them, , , , , are expressed as:

[0029]

[0030] Among them, j represents the number of movements.

[0031] 105. Solve the overdetermined system of equations to obtain the error calibration result; In this embodiment, the least squares method is used to solve the overdetermined equations, and finally the error calibration result and the workpiece stage displacement are obtained, completing the error calibration of the measurement system; and because the workpiece stage and the mask stage are in the same measurement system, the error calibration methods of the workpiece stage and the mask stage are the same by analogy.

[0032] In the embodiment of the present invention, by synchronously collecting multi-dimensional data such as the original signal of the interferometer mirror group, the position of the workpiece stage encoder, and the installation angle of the mirror, an error calculation model including the installation error of the interferometer, the installation error of the mirror, and the six-degree-of-freedom error of the workpiece stage is established; then by controlling the workpiece stage and the mask stage to move to multiple discrete positions, a plurality of redundant measurement data are obtained, and the redundant measurement data are substituted into the error calculation model to establish an overdetermined equation set, and finally the overdetermined equation set is solved to complete the error calibration; the present invention realizes the organic combination of the self-calibration of the interferometer group and the full error compensation through the redundant measurement of the internal optical path of the interferometer group and the multi-position movement strategy, providing a low-cost and high-precision calibration scheme for the measurement system of exposure equipment such as panel exposure machines.

[0033] Please refer to Figure 2 , two embodiments of the calibration method for the exposure equipment measurement system in the embodiment of the present invention include: 201. Obtain the initial measurement value of the interferometer mirror group; In this embodiment, the initial measurement value of the interferometer mirror group is the measurement value of the interferometer when the workpiece stage and the mask stage are in the initial position.

[0034] 202. Obtain the initial position of the interferometer mirror group; In this embodiment, the initial position of the interferometer mirror group is the coordinate of the interferometer mirror group in the measurement system of the motion platform of the panel exposure machine.

[0035] 203. Obtain the size information of the workpiece stage and the mask stage; In this embodiment, the size information of the workpiece stage and the mask stage is the length and width of the workpiece stage and the mask stage.

[0036] 204. Obtain the installation position information of the first plane mirror group and the second plane mirror group; In this embodiment, the installation positions of the first plane mirror group and the second plane mirror group are the positions where the first plane mirror group and the second plane mirror group are installed on the workpiece stage and the mask stage.

[0037] 205. Integrate the initial measurement value, the initial position, the size information, and the installation position to obtain reference data.

[0038] Please refer to Figure 3 , three embodiments of the calibration method for the exposure equipment measurement system in the embodiment of the present invention include: 301. Construct basic equations based on benchmark data; In this embodiment, based on the principle of laser interferometry measurement, there is a mathematical relationship between the displacement measured by the interferometer lens group and the actual displacement of the workpiece stage and the mask stage. Therefore, through the benchmark data, an equation for the relationship between the interferometer lens group measurement and the displacement of the workpiece stage and the mask stage under ideal conditions, that is, the basic equation, can be constructed.

[0039] 302. Perform error analysis on the interferometer mirror group, the first plane reflector group, and the second plane reflector group to obtain error parameters; In this embodiment, in actual measurement, there are angular installation errors in the interferometer mirror group, the first plane reflector group and the second plane reflector group. These errors will cause the interferometer measurement light to be inconsistent with the movement direction of the workpiece stage, thereby causing measurement errors; in addition, due to the manufacturing errors of the guide rails, the workpiece stage and the mask stage also have six-degree-of-freedom errors during the movement process; these errors will affect the accuracy of the basic equation, and therefore need to be introduced into the basic equation as error terms.

[0040] 303. Introduce the error parameter into the basic equation to obtain the error solution model.

[0041] See also Figure 4 , four embodiments of the method for calibrating the exposure device measurement system in the embodiment of the present invention include: 401. Perform error analysis on the interferometer mirror assembly to obtain a horizontal deflection error of the measuring beam in the X direction, a vertical deflection error of the measuring beam in the X direction, a horizontal deflection error of the measuring beam in the Y direction, and a vertical deflection error of the measuring beam in the Y direction; In this embodiment, during the actual installation process, the interferometer has installation errors at three angles. However, the angular error along the optical axis will not affect the measurement result, because the angle change along the optical axis will not change the projection of the measurement beam on the plane perpendicular to the optical axis, and will not affect the physical quantities such as displacement measured by the interferometer. Therefore, the other two angles that actually affect the measurement accuracy of the interferometer correspond to the horizontal and vertical deflection errors of the measurement beam in the X and Y directions, respectively.

[0042] 402. Perform error analysis on the first plane reflector group and the second plane reflector group to obtain a plane mirror X-direction horizontal installation error, a plane mirror X-direction vertical installation error, a plane mirror Y-direction horizontal installation error, and a plane mirror Y-direction vertical installation error; In this embodiment, in the panel exposure machine motion platform measurement system, the first plane reflector group and the second plane reflector group play an important role in changing the propagation direction of the measurement light beam. If there is an installation error in the plane mirror, the direction of the reflected light beam will change, thereby affecting the formation of interference fringes and the accuracy of the measurement results, so the installation error of the plane mirror needs to be considered.

[0043] 403. Integrate the data of the horizontal angular error of the measurement beam in the X direction, the vertical angular error of the measurement beam in the X direction, the horizontal angular error of the measurement beam in the Y direction, the vertical angular error of the measurement beam in the Y direction, the horizontal installation error of the plane mirror in the X direction, the vertical installation error of the plane mirror in the X direction, the horizontal installation error of the plane mirror in the Y direction, and the vertical installation error of the plane mirror in the Y direction to obtain the error parameters.

[0044] The calibration method of the exposure equipment measurement system in the embodiment of the present invention has been described above. Next, the calibration system of the exposure equipment measurement system in the embodiment of the present invention will be described. Please refer to Figure 5 , an embodiment of the calibration system of the exposure equipment measurement system in the embodiment of the present invention includes: A control device 500 and a laser 501, an interferometer mirror group 502, a workpiece stage 503, and a mask stage 504 that are electrically connected to the control device 500; a first plane mirror group 505 is provided on the workpiece stage 503, and a second plane mirror group 506 is provided on the mask stage 504; Refer to Figure 6 , in one embodiment, the first plane mirror group 505 includes a first X-direction mirror P1 and a first Y-direction mirror P2; the first X-direction mirror P1 is fixed in the X-axis movement direction of the workpiece stage 503, and the first Y-direction mirror P2 is fixed in the Y-axis movement direction of the workpiece stage 503; The second plane mirror group 506 includes a second X-direction mirror P3 and a second Y-direction mirror P4; the second X-direction mirror P3 is fixed in the X-axis movement direction of the mask stage 504, and the second Y-direction mirror P4 is fixed in the Y-axis movement direction of the mask stage 504; The interferometer mirror group 502 includes a first beam splitter 1, a second beam splitter 2, a third beam splitter 3, a fourth beam splitter 4, a fifth beam splitter 5, a sixth beam splitter 6, a seventh beam splitter 7, an eighth beam splitter 8, a ninth beam splitter 9, a tenth beam splitter 10, an eleventh beam splitter 11, a twelfth beam splitter 12, a thirteenth beam splitter 13, a fourteenth beam splitter 14, a fifteenth beam splitter 15, a first interferometer G1, a second interferometer G2, a third interferometer G3, a fourth interferometer G4, a fifth interferometer G5, a sixth interferometer G6, a seventh interferometer G7, an eighth interferometer G8, a ninth interferometer G9, a tenth interferometer G10, an eleventh interferometer G11, a twelfth interferometer G12, a thirteenth interferometer G13, a fourteenth interferometer G14, a fifteenth interferometer G15, a first mirror F1, a second mirror F2, a third mirror F3, a fourth mirror F4, a fifth mirror F5, and a sixth mirror F6; The incident end of the first beam splitter 1 is connected to the laser 501. A first mirror F1 is provided on the first splitting path of the first beam splitter 1, and a second beam splitter 2 is provided on the second splitting path of the first beam splitter 1; a third beam splitter 3 is provided on the first splitting path of the second beam splitter 2, and a first interferometer G1 is provided on the second splitting path of the second beam splitter 2; a fourth beam splitter 4 is provided on the first splitting path of the third beam splitter 3, and a fifth beam splitter 5 is provided on the second splitting path of the third beam splitter 3; a second interferometer G2 is provided on the splitting path of the fourth beam splitter 4; a third interferometer G3 is provided on the first splitting path of the fifth beam splitter 5; a second mirror F2 is provided on the second splitting path of the fifth beam splitter 5, and a fourth interferometer G4 is provided on the splitting path of the second mirror F2; A sixth beam splitter 6 is provided on the first splitting path of the first mirror F1, and a fourth mirror F4 is provided on the second splitting path of the first mirror F1; a seventh beam splitter 7 is provided on the first splitting path of the sixth beam splitter 6, and a fifth interferometer G5 is provided on the second splitting path of the sixth beam splitter 6; an eighth beam splitter 8 is provided on the first splitting path of the seventh beam splitter 7, and a ninth beam splitter 9 is provided on the second splitting path of the seventh beam splitter 7; a sixth interferometer G6 is provided on the splitting path of the eighth beam splitter 8; a seventh interferometer G7 is provided on the first splitting path of the ninth beam splitter 9; a third mirror F3 is provided on the second splitting path of the ninth beam splitter 9, and an eighth interferometer G8 is provided on the splitting path of the third mirror F3; A tenth beam splitter 10 is provided on the splitting path of the fourth mirror F4; an eleventh beam splitter 11 is provided on the first splitting path of the tenth beam splitter 10, and a thirteenth beam splitter 13 is provided on the second splitting path of the tenth beam splitter 10; a ninth interferometer G9 is provided on the first splitting path of the eleventh beam splitter 11; a fifth mirror F5 is provided on the second splitting path of the eleventh beam splitter 11, and a tenth interferometer G10 is provided on the splitting path of the fifth mirror F5; a twelfth beam splitter 12 is provided on the third splitting path of the eleventh beam splitter 11, and an eleventh interferometer G11 is provided on the splitting path of the twelfth beam splitter 12; A fourteenth beam splitter 14 is provided on the first splitting path of the thirteenth beam splitter 13, and a twelfth interferometer G12 is provided on the second splitting path of the thirteenth beam splitter 13; a thirteenth interferometer G13 is provided on the first splitting path of the fourteenth beam splitter 14; a fifteenth beam splitter 15 is provided on the second splitting path of the fourteenth beam splitter 14, and a fourteenth interferometer G14 is provided on the splitting path of the fifteenth beam splitter 15; a sixth mirror F6 is provided on the third splitting path of the fourteenth beam splitter 14, and a fifteenth interferometer G15 is provided on the splitting path of the sixth mirror F6; The first interferometer G1, the second interferometer G2, the third interferometer G3, and the fourth interferometer G4 respectively form interference optical paths with the first X-direction mirror P1; the fifth interferometer G5, the sixth interferometer G6, the seventh interferometer G7, and the eighth interferometer G8 respectively form interference optical paths with the first Y-direction mirror P2; the ninth interferometer G9, the tenth interferometer G10, and the eleventh interferometer G11 respectively form interference optical paths with the second X-direction mirror P3; the twelfth interferometer G12, the thirteenth interferometer G13, the fourteenth interferometer G14, and the fifteenth interferometer G15 respectively form interference optical paths with the second Y-direction mirror P4; In this embodiment, the workpiece stage 503 and the mask stage 504 of the moving platform of the panel exposure machine need to be accurately positioned and moved in the X and Y directions during the working process; in order to realize the full-dimensional motion monitoring of the moving platform of the panel exposure machine in the XY plane, it is necessary to obtain the displacement information in the X and Y directions simultaneously. Therefore, it is necessary to set up an interferometer mirror group 502 to form an interference loop with the mirrors in the X and Y directions respectively; for example, the first beam splitter 1, the second beam splitter 2, the first interferometer G1, and the first X-direction mirror P1 form a complete optical path, and an interference optical path is formed between the first interferometer G1 and the first X-direction mirror P1; When the workpiece stage 503 or the mask stage 504 undergoes displacement, the first plane mirror group 505 and the second plane mirror group 506 mounted on it will also move accordingly, thereby changing the optical path of the laser in the interference loop; the interferometer mirror group 502 measures the optical path difference by detecting the change of the interference fringes, and then obtains the displacement information of the workpiece stage 503 and the mask stage 504 in the X and Y directions; However, the installation errors of the interferometer mirror group 502 and the first plane mirror group 505 and the second plane mirror group 506 will affect the measurement results in the X / Y directions simultaneously; therefore, the interferometer mirror group 502 needs to construct multiple interference loops to measure the displacements in the X and Y directions simultaneously, comprehensively considering the installation errors of the interferometer mirror group 502, the first plane mirror group 505, and the second plane mirror group 506, as well as the cross-coupling errors between them.

[0045] The interferometer mirror group 502 further includes a sixteenth beam splitter 16, a seventh mirror F7, and a wavelength compensator 507; the sixteenth beam splitter 16 is arranged between the first beam splitter 1 and the second beam splitter 2, a seventh mirror F7 is arranged on the splitting optical path of the sixteenth beam splitter 16, and the wavelength compensator 507 is arranged on the splitting optical path of the seventh mirror F7; In this embodiment, since the laser wavelength is highly sensitive to environmental factors such as temperature and air pressure, which causes wavelength changes, the uncompensated wavelength drift will be directly superimposed on the measurement value of the interferometer, forming a composite error with the installation error and the motion error, which affects the measurement accuracy. By setting the wavelength compensator 507, the wavelength change caused by the environment can be detected and compensated into the interferometer mirror group 502, thereby improving the measurement accuracy of the interferometer mirror group 502.

[0046] Figure 7 FIG. 4 is a schematic structural diagram of a calibration device for an exposure apparatus measurement system provided by an embodiment of the present invention. The calibration device 900 for the exposure apparatus measurement system may vary greatly due to different configurations or performances, and may include one or more processors 910 and a memory 920, and a storage medium 930 for storing one or more application programs 933 or data 932. Among them, the memory 920 and the storage medium 930 may be transient storage or persistent storage. The program stored in the storage medium 930 may include one or more modules, and each module may include a series of instruction operations on the calibration device 900 for the exposure apparatus measurement system. Further, the processor 910 may be configured to communicate with the storage medium 930 and execute a series of instruction operations in the storage medium 930 on the calibration device 900 for the exposure apparatus measurement system to implement the steps of the calibration method for the exposure apparatus measurement system provided by the above method embodiments.

[0047] The calibration device 900 for the exposure apparatus measurement system may further include one or more power supplies 940, one or more wired or wireless network interfaces 950, one or more input / output interfaces 960, and / or one or more operating systems 931, such as Windows Serve, Mac OS X, Unix, Linux, FreeBSD, and the like. Those skilled in the art can understand that Figure 7 the shown structural diagram of the calibration device for the exposure apparatus measurement system does not limit the calibration device for the exposure apparatus measurement system, and may include more or fewer components than shown, or combine certain components, or have different component arrangements.

[0048] The present invention also provides a computer-readable storage medium. The computer-readable storage medium may be a non-volatile computer-readable storage medium, or may also be a volatile computer-readable storage medium. Instructions are stored in the computer-readable storage medium. When the instructions are run on a computer, the computer is caused to execute the steps of the calibration method for the exposure apparatus measurement system.

[0049] Those skilled in the art can clearly understand that for the convenience and brevity of description, the specific working processes of the above-described system, device, or unit can refer to the corresponding processes in the foregoing method embodiments, and will not be described herein again.

[0050] When the integrated unit is implemented in the form of a software functional unit and sold or used as an independent product, it can be stored in a computer-readable storage medium. Based on this understanding, the technical solution of the present invention, in essence, or the part that contributes to the prior art, or all or part of the technical solution, can be embodied in the form of a software product. The computer software product is stored in a storage medium and includes several instructions for causing a computer device to execute all or part of the steps of the methods described in the various embodiments of the present invention. The foregoing storage medium includes: various media such as USB flash drives, mobile hard disks, read-only memories, random access memories, magnetic disks, or optical discs that can store program codes.

[0051] Finally, it should be noted that the above are only preferred examples of the present invention and are not used to limit the present invention. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or perform equivalent replacements for some of the technical features. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.

Claims

1. A calibration method for an exposure apparatus measurement system, characterized in that Applied to the motion platform measurement system of a panel exposure machine, the panel exposure machine motion platform measurement system includes: a control device, a laser, an interferometer mirror group, a workpiece table, and a mask table that are electrically connected to the control device; a first plane mirror group is provided on the workpiece table, and a second plane mirror group is provided on the mask table; the laser is connected to the interferometer mirror group through an optical fiber, and the interferometer mirror group respectively forms a double-workpiece table measurement system with the first plane mirror group and the second plane mirror group; the calibration method of the exposure equipment measurement system includes the steps: Obtain reference data from the interferometer mirror group, workpiece table, mask table, first plane mirror group, and second plane mirror group; Establish an error calculation model based on the reference data; Obtain redundant measurement data corresponding to multiple movements of the interferometer mirror group on the workpiece table and the mask table; Substitute all redundant measurement values into the error calculation model to obtain an overdetermined system of equations; Solve the overdetermined system of equations to obtain the error calibration result.

2. The calibration method for the exposure equipment measurement system according to claim 1, characterized in that, The obtaining of reference data from the interferometer mirror group, workpiece table, mask table, first plane mirror group, and second plane mirror group includes: Obtain the initial measurement value of the interferometer mirror group; Obtain the initial position of the interferometer mirror group; Obtain the dimensional information of the workpiece table and the mask table; Obtain the installation positions of the first plane mirror group and the second plane mirror group; Integrate the initial measurement value, initial position, dimensional information, and installation position to obtain reference data.

3. The calibration method of the exposure equipment measurement system according to claim 1, wherein The establishing of the error calculation model based on the reference data includes: Construct a basic equation according to the reference data; Conduct error analysis on the interferometer mirror group, first plane mirror group, and second plane mirror group to obtain error parameters; Introduce the error parameters into the basic equation to obtain the error calculation model.

4. The calibration method for an exposure apparatus measurement system according to claim 3, characterized in that, The conducting of error analysis on the interferometer mirror group, first plane mirror group, and second plane mirror group to obtain error parameters includes: Conduct error analysis on the interferometer mirror group to obtain the horizontal deflection angle error of the measurement beam in the X direction, the vertical deflection angle error of the measurement beam in the X direction, the horizontal deflection angle error of the measurement beam in the Y direction, and the vertical deflection angle error of the measurement beam in the Y direction; Conduct error analysis on the first plane mirror group and the second plane mirror group to obtain the horizontal installation error of the plane mirror in the X direction, the vertical installation error of the plane mirror in the X direction, the horizontal installation error of the plane mirror in the Y direction, and the vertical installation error of the plane mirror in the Y direction; Integrate the horizontal deflection angle error of the measurement beam in the X direction, the vertical deflection angle error of the measurement beam in the X direction, the horizontal deflection angle error of the measurement beam in the Y direction, the vertical deflection angle error of the measurement beam in the Y direction, the horizontal installation error of the plane mirror in the X direction, the vertical installation error of the plane mirror in the X direction, the horizontal installation error of the plane mirror in the Y direction, and the vertical installation error of the plane mirror in the Y direction to obtain error parameters.

5. A motion platform measurement system for a panel exposure machine, characterized in that, The panel exposure machine motion platform measurement system includes: a control device, a laser, an interferometer mirror group, a workpiece table, and a mask table that are electrically connected to the control device; a first plane mirror group is provided on the workpiece table, and a second plane mirror group is provided on the mask table; the control device is used to execute the calibration method of the exposure equipment measurement system according to any one of claims 1-4.

6. The motion platform measurement system of the panel exposure machine according to claim 5, characterized in that: The first plane mirror group includes a first X-direction mirror and a first Y-direction mirror; the first X-direction mirror is fixed in the X-axis movement direction of the workpiece table, and the first Y-direction mirror is fixed in the Y-axis movement direction of the workpiece table; The second plane mirror group includes a second X-direction mirror and a second Y-direction mirror; the second X-direction mirror is fixed in the X-axis movement direction of the mask table, and the second Y-direction mirror is fixed in the Y-axis movement direction of the mask table; The interferometer mirror group respectively forms a dual workpiece table measurement system with the first X-direction mirror, the first Y-direction mirror, the second X-direction mirror, and the second Y-direction mirror.

7. The panel exposure machine motion platform measurement system according to claim 6, characterized in that: The interferometer mirror group includes a first beam splitter, a second beam splitter, a third beam splitter, a fourth beam splitter, a fifth beam splitter, a sixth beam splitter, a seventh beam splitter, an eighth beam splitter, a ninth beam splitter, a tenth beam splitter, an eleventh beam splitter, a twelfth beam splitter, a thirteenth beam splitter, a fourteenth beam splitter, a fifteenth beam splitter, a first interferometer, a second interferometer, a third interferometer, a fourth interferometer, a fifth interferometer, a sixth interferometer, a seventh interferometer, an eighth interferometer, a ninth interferometer, a tenth interferometer, an eleventh interferometer, a twelfth interferometer, a thirteenth interferometer, a fourteenth interferometer, a fifteenth interferometer, a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, and a sixth mirror; The incident end of the first beam splitter is connected to the laser, a first mirror is provided on the first splitting path of the first beam splitter, and a second beam splitter is provided on the second splitting path of the first beam splitter; a third beam splitter is provided on the first splitting path of the second beam splitter, and a first interferometer is provided on the second splitting path of the second beam splitter; a fourth beam splitter is provided on the first splitting path of the third beam splitter, and a fifth beam splitter is provided on the second splitting path of the third beam splitter; a second interferometer is provided on the splitting path of the fourth beam splitter; a third interferometer is provided on the first splitting path of the fifth beam splitter; a second mirror is provided on the second splitting path of the fifth beam splitter, and a fourth interferometer is provided on the splitting path of the second mirror; A sixth beam splitter is provided on the first splitting path of the first mirror, and a fourth mirror is provided on the second splitting path of the first mirror; a seventh beam splitter is provided on the first splitting path of the sixth beam splitter, and a fifth interferometer is provided on the second splitting path of the sixth beam splitter; an eighth beam splitter is provided on the first splitting path of the seventh beam splitter, and a ninth beam splitter is provided on the second splitting path of the seventh beam splitter; a sixth interferometer is provided on the splitting path of the eighth beam splitter; a seventh interferometer is provided on the first splitting path of the ninth beam splitter; a third mirror is provided on the second splitting path of the ninth beam splitter, and an eighth interferometer is provided on the splitting path of the third mirror; A tenth beam splitter is provided on the beam splitting path of the fourth mirror; an eleventh beam splitter is provided on the first beam splitting path of the tenth beam splitter, and a thirteenth beam splitter is provided on the second beam splitting path of the tenth beam splitter; a ninth interferometer is provided on the first beam splitting path of the eleventh beam splitter; a fifth mirror is provided on the second beam splitting path of the eleventh beam splitter, and a tenth interferometer is provided on the beam splitting path of the fifth mirror; a twelfth beam splitter is provided on the third beam splitting path of the eleventh beam splitter, and an eleventh interferometer is provided on the beam splitting path of the twelfth beam splitter; a fourteenth beam splitter is provided on the first beam splitting path of the thirteenth beam splitter, and a twelfth interferometer is provided on the second beam splitting path of the thirteenth beam splitter; a thirteenth interferometer is provided on the first beam splitting path of the fourteenth beam splitter; a fifteenth beam splitter is provided on the second beam splitting path of the fourteenth beam splitter, and a fourteenth interferometer is provided on the beam splitting path of the fifteenth beam splitter; a sixth mirror is provided on the third beam splitting path of the fourteenth beam splitter, and a fifteenth interferometer is provided on the beam splitting path of the sixth mirror; The first interferometer, the second interferometer, the third interferometer and the fourth interferometer respectively form interference optical paths with the first X-direction mirror; the fifth interferometer, the sixth interferometer, the seventh interferometer and the eighth interferometer respectively form interference optical paths with the first Y-direction mirror; the ninth interferometer, the tenth interferometer and the eleventh interferometer respectively form interference optical paths with the second X-direction mirror; the twelfth interferometer, the thirteenth interferometer, the fourteenth interferometer and the fifteenth interferometer respectively form interference optical paths with the second Y-direction mirror.

8. The panel exposure machine motion platform measurement system according to claim 7, characterized in that: The interferometer mirror group further includes a sixteenth beam splitter, a seventh mirror and a wavelength compensator; the sixteenth beam splitter is arranged between the first beam splitter and the second beam splitter, a seventh mirror is provided on the beam splitting path of the sixteenth beam splitter, and the wavelength compensator is provided on the beam splitting path of the seventh mirror.

9. A calibration device for an exposure equipment measurement system, characterized in that The calibration device of the exposure equipment measurement system includes: a memory and at least one processor, and instructions are stored in the memory; At least one of the processors calls the instructions in the memory so that the calibration device of the exposure equipment measurement system executes each step of the calibration method of the exposure equipment measurement system as described in any one of claims 1-4.

10. A computer-readable storage medium having instructions stored thereon, characterized in that, When the instructions are executed by the processor, each step of the calibration method of the exposure equipment measurement system as described in any one of claims 1-5 is realized.

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