Tuning impedance matching method, matcher, semiconductor device and storage medium
Through the dynamic tuning mode combined with fast tuning and slow tuning, the problem of reflected power fluctuations in the impedance matching device of RF power supply and load equipment during the tuning process is solved, and the stability in the process and the stable operation of the equipment is achieved.
Patent Information
- Application Number
- CN202510251546.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-03
- Publication Date
- 2025-07-11
AI Technical Summary
In the prior art, the impedance matching device of the RF power supply and the load device causes a large fluctuation in the reflected power during the tuning process, affecting process stability.
By dynamically determining the tuning mode, using the relationship between standing wave ratio and preset value, using a combination of fast tuning and slow tuning, the matching of the output impedance and load impedance of the RF power supply is quickly realized, including detecting the impedance of the RF power supply and load equipment, calculating the standing wave ratio, and dynamically adjusting the tuning mode of the matcher according to the magnitude relationship of the standing wave ratio.
Maintain the reflected power in the process to avoid large fluctuations, ensure the stable operation of load equipment, improve the stability of the process and the service life of the matcher.
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Figure CN120301384A_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the field of semiconductor technology, and particularly to a tuning impedance matching method, a matcher, a semiconductor device, and a storage medium. Background Art
[0002] In the related art, the output impedance of a radio frequency power supply is different from the load impedance of a load device (such as a plasma processing device). In order to achieve the matching between the output impedance of the radio frequency power supply and the load impedance of the load device, a matcher needs to be inserted between the radio frequency power supply and the load device, so as to ensure that the load device obtains the maximum power from the radio frequency power supply.
[0003] The matcher in the related art calculates the impedance amplitude error and the phase error based on the input impedance of the matcher detected by a sensor and compares it with the output impedance of the radio frequency power supply. These two error signals are used to control the tuning element. By continuously adjusting the tuning element, the error signal is reduced to zero or very small, and the system reaches the matching state. However, during the process, the large-scale tuning of the matcher will cause a large fluctuation in the reflected power, affecting the process stability. Summary of the Invention
[0004] The present application provides a tuning impedance matching method, a matcher, a semiconductor device, and a storage medium. By dynamically determining the tuning mode, it can quickly achieve the mutual matching between the power supply output impedance and the load impedance during the first tuning when the radio frequency is turned on, and can also perform smooth tuning during the process to ensure the stable operation of the load device.
[0005] In order to solve the above technical problems, on the one hand, the present application provides a tuning impedance matching method. The tuning impedance matching method is applied to a matcher. One end of the matcher is coupled to a radio frequency power supply, and the other end of the matcher is coupled to a load device. The tuning impedance matching method includes: detecting the output impedance and radio frequency power of the radio frequency power supply, and detecting the load impedance of the load device; in response to the radio frequency power not being the first preset value, entering the current tuning process.
[0006] Wherein, the tuning process includes: calculating the standing wave ratio based on the output impedance and the load impedance; determining the tuning mode of the matcher according to the magnitude relationship between the standing wave ratio and the preset value, and driving the matcher to perform tuning according to the tuning mode; wherein, the tuning mode includes fast tuning and slow tuning.
[0007] In some embodiments, determining the tuning mode of the matcher according to the magnitude relationship between the standing wave ratio and the preset value, and driving the matcher to perform tuning according to the tuning mode includes: in response to the standing wave ratio being greater than a second preset value, triggering the fast tuning mode and driving the matcher to perform fast tuning; in response to the standing wave ratio being less than or equal to the second preset value and greater than a third preset value, triggering the slow tuning mode and driving the matcher to perform slow tuning; wherein, the third preset value is less than the second preset value.
[0008] In some embodiments, in response to the standing wave ratio being greater than a second preset value, a fast tuning mode is triggered to drive the matcher to perform fast tuning, including: in response to the standing wave ratio being greater than the second preset value, performing a first mode adjustment on the parameters of the matcher and performing fast tuning on the matcher; wherein, the first mode adjustment is continuous multiple adjustments.
[0009] In some embodiments, in response to the standing wave ratio being less than or equal to the second preset value and greater than a third preset value, a slow tuning mode is triggered to drive the matcher to perform slow tuning, including: in response to the standing wave ratio being less than or equal to the second preset value and greater than the third preset value, performing a second mode adjustment on the parameters of the matcher and performing slow tuning on the matcher; wherein, the second mode adjustment is non - continuous multiple adjustments.
[0010] In some embodiments, the method further includes: after completing one fast tuning or one slow tuning, determining whether the standing wave ratio is greater than the third preset value; in response to the standing wave ratio being greater than the third preset value, performing the next tuning on the matcher after a delay time until the matcher completes the current tuning process; wherein, the next tuning is fast tuning or the slow tuning.
[0011] In some embodiments, the method further includes: when the matcher performs fast tuning, in response to the standing wave ratio being less than or equal to a fourth preset value, stopping the fast tuning of the matcher and completing the current tuning process; and when the matcher performs the slow tuning, in response to the standing wave ratio being less than or equal to the fourth preset value, stopping the slow tuning of the matcher and completing the current tuning process; wherein, the fourth preset value is less than the third preset value.
[0012] To solve the above - mentioned technical problems, on the other hand, the present application provides a matcher, which includes: a detection unit, coupled to a radio frequency power supply, the detection unit is used to detect the output impedance and radio frequency power of the radio frequency power supply; and the detection unit is used to detect the load impedance of a load device; an impedance matching unit, one end of the impedance matching unit is coupled to the detection unit, and the other end of the impedance matching unit is coupled to the load device, the impedance matching unit is used to enter the current tuning process in response to the radio frequency power not being a first preset value.
[0013] Wherein, the tuning process includes: calculating the standing wave ratio based on the output impedance and the load impedance; determining the tuning mode of the matcher according to the magnitude relationship between the standing wave ratio and the preset value, and driving the matcher to perform tuning according to the tuning mode; wherein, the tuning mode includes fast tuning and slow tuning.
[0014] In some embodiments, the impedance matching unit includes a control unit and an adjustment unit, one end of the control unit is coupled to the detection unit, the other end of the control unit is coupled to one end of the adjustment unit, and the other end of the adjustment unit is coupled to the load device.
[0015] The control unit is configured to calculate the standing wave ratio based on the output impedance and the load impedance in response to the radio frequency power not being the first preset value; and, the control unit is configured to determine the tuning mode of the adjustment unit based on the magnitude relationship between the standing wave ratio and the preset value, and drive the adjustment unit to perform tuning according to the tuning mode.
[0016] In some embodiments, the control unit is configured to: in response to the standing wave ratio being greater than a second preset value, trigger a fast tuning mode and drive the adjustment unit to perform fast tuning; and
[0017] in response to the standing wave ratio being less than or equal to the second preset value and greater than a third preset value, trigger a slow tuning mode and drive the adjustment unit to perform slow tuning; wherein, the third preset value is less than the second preset value.
[0018] In some embodiments, the adjustment unit includes a first adjustment unit, a second adjustment unit, and a third adjustment unit. The first end of the first adjustment unit is coupled to the first end of the third adjustment unit, the second end of the first adjustment unit is coupled to the load device, the first end of the second adjustment unit is coupled to the first end of the third adjustment unit, the second end of the second adjustment unit is grounded, and the second end of the third adjustment unit is coupled to the control unit.
[0019] Wherein, the control unit is configured to adjust the parameters of the first adjustment unit, the second adjustment unit, and the third adjustment unit based on the standing wave ratio.
[0020] In some embodiments, the first adjustment unit includes a first adjustable capacitor and a first inductor. The first end of the first adjustable capacitor is coupled to the first end of the third adjustment unit, the second end of the first adjustable capacitor is coupled to the first end of the first inductor, and the second end of the first inductor is coupled to the load device.
[0021] The second adjustment unit includes a second adjustable capacitor and a second inductor. The first end of the second adjustable capacitor is coupled to the first end of the third adjustment unit, the second end of the second adjustable capacitor is coupled to the first end of the second inductor, and the second end of the second inductor is grounded.
[0022] Wherein, the control unit is configured to adjust the capacitance values of the first adjustable capacitor and / or the second adjustable capacitor through the third adjustment unit.
[0023] In some embodiments, the third adjustment unit includes a first driving motor and a second driving motor. The first end of the first driving motor is coupled to the control unit, the second end of the first driving motor is coupled to the first end of the first adjustable capacitor, the first end of the second driving motor is coupled to the control unit, and the second end of the second driving unit is coupled to the first end of the second adjustable capacitor.
[0024] Wherein, the third adjustment unit is configured to perform a first mode adjustment on the parameters under the control of the control unit when the standing wave ratio is greater than the second preset value to perform fast tuning; wherein, the first mode adjustment is to perform continuous multiple adjustments; and
[0025] The third adjustment unit is configured to perform a second-mode adjustment on the parameters under the control of the control unit and perform slow tuning when the standing wave ratio is less than or equal to a second preset value and greater than a third preset value; wherein, the second-mode adjustment is a discontinuous multiple adjustment.
[0026] In some embodiments, the first-mode adjustment indicates that the number of steps of the first drive motor and / or the second drive motor is continuous.
[0027] The second-mode adjustment indicates that the number of steps of the first drive motor and / or the second drive motor is discontinuous.
[0028] In some embodiments, the control unit is further configured to: after completing a fast tuning or a slow tuning, determine whether the standing wave ratio is greater than a third preset value; in response to the standing wave ratio being greater than the third preset value, perform the next tuning on the adjustment unit after a delay time until the matcher completes the current tuning process; wherein, the next tuning is a fast tuning or a slow tuning.
[0029] To solve the above technical problems, on the other hand, the present application provides a semiconductor device, which includes a memory, a processor, and a matcher. The matcher is respectively coupled to the memory and the processor. The memory is used to store a computer program, and the processor is used to drive the matcher to execute the tuning impedance matching method.
[0030] To solve the above technical problems, on the other hand, the present application provides a computer-readable storage medium, which stores a computer program. When the computer program is executed by a processor, it is used to implement the tuning impedance matching method.
[0031] The tuning impedance matching method provided in some embodiments of the present application is applied to a matcher. Two ends of a sensor are respectively coupled to a radio frequency power supply and a load device. The tuning impedance matching method includes detecting the output impedance and radio frequency power of the radio frequency power supply, and detecting the load impedance of the load device; in response to the radio frequency power not being a first preset value, entering the current tuning process. Wherein, the tuning process includes: calculating the standing wave ratio based on the output impedance and the load impedance; determining the tuning mode of the matcher according to the magnitude relationship between the standing wave ratio and the preset value, and driving the matcher to perform tuning according to the tuning mode; wherein, the tuning mode includes fast tuning and slow tuning. By the above method, when the radio frequency power meets the conditions, the tuning mode of the matcher can be dynamically determined according to the standing wave ratio, and the matcher can be tuned based on the determined tuning mode, so as to quickly achieve the mutual matching of the output impedance and the load impedance and ensure the stable operation of the load device. BRIEF DESCRIPTION OF THE DRAWINGS
[0032] To more clearly illustrate the technical solutions in the embodiments of the present application, the following will briefly introduce the drawings required for the description of the embodiments. Obviously, the drawings in the following description are only some embodiments of the present application. For those of ordinary skill in the art, without creative efforts, other drawings can be obtained based on these drawings. Among them:
[0033] Figure 1 is a schematic flowchart of a tuning impedance matching method in some embodiments of the present application;
[0034] Figure 2 is a schematic flowchart of a tuning impedance matching method in some embodiments of the present application;
[0035] Figure 3 is a schematic structural diagram of a matcher in some embodiments of the present application;
[0036] Figure 4 is a schematic structural diagram of a plasma processing device in some embodiments of the present application;
[0037] Figure 5 is a schematic structural diagram of an impedance matching unit in some embodiments of the present application;
[0038] Figure 6 is a schematic structural diagram of an adjustment unit in some embodiments of the present application;
[0039] Figure 7 is a schematic structural diagram of an adjustment unit in some embodiments of the present application;
[0040] Figure 8 is a schematic diagram of the tuning process of a matcher in some embodiments of the present application;
[0041] Figure 9 is a schematic diagram of the working process of a stepper motor when the matcher is tuned in some embodiments of the present application;
[0042] Figure 10 is a schematic structural diagram of a semiconductor device in some embodiments of the present application;
[0043] Figure 11 is a schematic structural diagram of a computer-readable storage medium in some embodiments of the present application. Specific Embodiments
[0044] The following will clearly and completely describe the technical solutions in the embodiments of the present application in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only some embodiments of the present application, rather than all embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative efforts belong to the scope of protection of the present application.
[0045] In the related art, a matcher monitors the input impedance of the matcher through a sensor, calculates the Voltage Standing Wave Ratio (VSWR) using the real-time input impedance, and then calculates the matching based on the real-time VSWR. Therefore, a VSWR limit value (VSWR Start) for triggering tuning and a VSWR limit value (VSWR Stop) for stopping tuning when the matching state is reached are usually set in the matcher. Moreover, to ensure that the matcher does not remain in the tuning state all the time, VSWR Start and VSWR Stop cannot be the same value and must maintain a certain interval.
[0046] In some process, taking the load device connected to the output end of the matcher as a plasma processing device as an example, as the impedance of the inner cavity of the plasma processing device changes, the VSWR and the reflected power will gradually increase. When the VSWR reaches VSWRStart, the matcher will be triggered to perform secondary tuning to lower the reflected power again. Secondary tuning is usually triggered multiple times during a single process.
[0047] The secondary tuning of the matcher will cause an instantaneous drop in the reflected power, with large fluctuations, which will directly affect the stability of the plasma in the chamber and thus affect the stability of the process. The present application proposes a tuning impedance matching method applied to the matcher, which can maintain the stability of the reflected power during secondary tuning in the process, thereby ensuring the stability of the process.
[0048] See Figure 1 , Figure 1 which is a schematic flow chart of the tuning impedance matching method in some embodiments of the present application. The tuning impedance matching method is applied to a matcher, one end of the matcher is coupled to a radio frequency power supply, and the other end of the matcher is coupled to a load device. Among them, the load device can be a plasma processing device or others, which is not limited here.
[0049] The tuning impedance matching method includes:
[0050] Step 11: Detect the output impedance and radio frequency power of the radio frequency power supply, and detect the load impedance of the load device.
[0051] In some embodiments, the matcher includes a sensor component or a detection device. The output impedance and radio frequency power of the radio frequency power supply can be detected by using the sensor component or the detection device, and the load impedance of the load device can be detected by using the sensor or the detection device. Among them, the sensor component includes at least one sensor. When the number of sensors is 1, the sensor is a combined sensor, which can measure multiple parameters. When the number of sensors is multiple, it can be at least two types of sensors such as an impedance sensor, a current sensor, and a power sensor. One sensor is used to measure one parameter.
[0052] In some embodiments, the radio frequency output terminal of the matcher is coupled to a sensor or a detection device, and the sensor assembly or the detection device can be used to measure in real time parameters such as the impedance, voltage, current, power, and phase of the radio frequency power supply and the load device, providing real-time data with timeliness to ensure the timeliness and accuracy of subsequent operations.
[0053] Step 12: In response to the radio frequency power not being the first preset value, enter the current tuning process; wherein, the tuning process includes: calculating the standing wave ratio based on the output impedance and the load impedance; determining the tuning mode of the matcher according to the magnitude relationship between the standing wave ratio and the preset value, and driving the matcher to perform tuning according to the tuning mode; wherein, the tuning mode includes fast tuning and slow tuning.
[0054] It can be understood that before step 12, it is also necessary to determine whether the radio frequency power is the first preset value, and step 12 is executed when it is determined that the radio frequency power is not the first preset value.
[0055] When the current radio frequency power is the first preset value, if the matcher is in the current tuning process, at this time the matcher will jump out of the tuning process, and judge the magnitude relationship between the next radio frequency power and the first preset value to determine whether to enter the next tuning process. Among them, the next radio frequency power is the same as or different from the current radio frequency power.
[0056] When the current radio frequency power is the first preset value, if the matcher is not in the tuning process, at this time the matcher will not enter the tuning process.
[0057] In some embodiments, the first preset value is 0. It can be understood that when the radio frequency power is 0, at this time the radio frequency power supply is in a power-off state or a standby state, and the radio frequency power supply cannot provide an output impedance to the matcher. Based on this, the first preset value can be used to identify whether to perform tuning, that is, whether to enter the tuning process.
[0058] In other embodiments, the first preset value can be other values, which are specifically determined according to the actual situation and are not limited here.
[0059] The tuning impedance matching method provided in some embodiments of the present application determines whether to enter the tuning process according to the radio frequency power, and dynamically adjusts the tuning mode of the matcher according to the standing wave ratio, which can achieve the mutual matching of the output impedance and the load impedance and ensure the stable operation of the load device.
[0060] In some embodiments of the present application, for example, the calculation formula of the standing wave ratio involved in "calculating the standing wave ratio based on the output impedance and the load impedance" in step 12 includes:
[0061] Γ = (ZL - Z0) / (ZL + Z0) (Formula 1);
[0062] VSWR = (1 + |Γ|) / (1 - |Γ|) (Equation 2);
[0063] Wherein, Z0 is the impedance of the RF power supply, ZL is the load impedance, Γ is the reflection coefficient, |Γ| represents the absolute value of the reflection coefficient, and VSWR is the voltage standing wave ratio.
[0064] In some embodiments, the impedance of the RF power supply (i.e., the output impedance) can be the input impedance of the matcher. In other words, the input impedance of the matcher is used to replace the impedance of the RF power supply of the RF power supply. The load impedance can be the output impedance of the matcher. In other words, the output impedance of the matcher is used to replace the input impedance of the load device.
[0065] In some embodiments, the input impedance of the matcher is the conjugate matching impedance of the output impedance of the RF power supply, and the output impedance of the matcher is the conjugate matching impedance of the input impedance of the load device.
[0066] In some embodiments of the present application, "determine the tuning mode of the matcher according to the magnitude relationship between the voltage standing wave ratio and the preset value, and drive the matcher to tune according to the tuning mode" in step 12 may include the following process (not shown in the figure):
[0067] Step S21: In response to the voltage standing wave ratio being greater than the second preset value, trigger the fast tuning mode and drive the matcher to perform fast tuning.
[0068] It can be understood that it is also necessary to determine whether the voltage standing wave ratio is greater than the second preset value before step S21, and step S21 is executed when it is determined that the voltage standing wave ratio is greater than the second preset value.
[0069] If the voltage standing wave ratio is less than or equal to the second preset value, it is still necessary to continue to determine whether the voltage standing wave ratio is greater than the third preset value, and step S22 is executed when it is determined that the voltage standing wave ratio is greater than the third preset value.
[0070] If the voltage standing wave ratio is less than or equal to the second preset value and the voltage standing wave ratio is less than or equal to the third preset value, the matcher will not perform tuning at this time.
[0071] In some embodiments, in response to the voltage standing wave ratio being greater than the second preset value, the parameters of the matcher are adjusted in the first mode, and the matcher is quickly tuned. Among them, the first mode adjustment is continuous multiple adjustments.
[0072] Taking the matcher including a stepper motor and adjusting the number of steps (i.e., parameters) of the stepper motor in the matcher as an example, the number of steps of the stepper motor can be controlled according to the real-time voltage standing wave ratio to achieve stepper control.
[0073] Specifically, when the voltage standing wave ratio is greater than the second preset value, the stepper motor is controlled to continuously step n (n≥1) steps until the fast tuning of the matcher is completed.
[0074] Exemplarily, a fast tuning is completed in one step, or a fast tuning is completed in two steps, or a fast tuning is completed in three steps. Among them, during the process of completing a fast tuning in two steps, three steps or other numbers of steps greater than three steps, the time interval between two adjacent steps is equal to 0.
[0075] Step S22: In response to the standing wave ratio being less than or equal to a second preset value and greater than a third preset value, trigger the slow tuning mode and drive the matcher to perform slow tuning.
[0076] Among them, the third preset value is less than the second preset value. The magnitude of the second preset value can be determined according to the actual situation. For example, the second preset value is 1.1, 1.2, 1.3 or others, which are not limited here. The magnitude of the third preset value can be determined according to the magnitude of the second preset value, which is not limited here.
[0077] It can be understood that the second preset value and the third preset value can be used to identify the tuning mode of the matcher, that is, to identify whether the tuning performed by the matcher is fast tuning or slow tuning.
[0078] In some embodiments, in response to the standing wave ratio being less than or equal to the second preset value and greater than the third preset value, the parameters of the matcher are adjusted in a second mode, and the matcher is subjected to a slow tuning once. Among them, the second mode adjustment is non - continuous multiple adjustments.
[0079] Taking the adjustment of the number of steps of the stepper motor in the matcher as an example, the number of steps of the stepper motor can be controlled according to the real - time standing wave ratio to achieve stepper control.
[0080] Specifically, when the standing wave ratio is less than or equal to the second preset value and greater than the third preset value, the stepper motor is controlled to take non - continuous steps of n (n≥1) until the slow tuning of the matcher is completed.
[0081] Exemplarily, a slow tuning is completed in one step, or a slow tuning is completed in two steps, or a slow tuning is completed in three steps. Among them, during the process of completing a slow tuning in two steps, three steps or other numbers of steps greater than three steps, the time interval between two adjacent steps is greater than 0.
[0082] It should be noted that during the tuning process, the number of times of fast tuning of the matcher is greater than or equal to 1 time. Any two fast tunings are adjacent in time or separated by a preset number of slow tunings. When two fast tunings are adjacent in time, the time interval between the two fast tunings is greater than or equal to 0, that is, after a fast tuning, the next fast tuning can be carried out immediately, or after a fast tuning, the next fast tuning can be carried out after a delay time. Among them, the delay time is determined according to the actual situation and is not limited here.
[0083] Similarly, during the tuning process, the matcher performs slow tuning at least once. Any two slow tunings are adjacent in time or separated by a preset number of fast tunings. When two slow tunings are adjacent in time, the time interval between the two slow tunings is greater than or equal to 0, that is, after one slow tuning, the next slow tuning can be performed immediately, or after a delay time after one slow tuning, the next slow tuning can be performed. The delay time is determined according to the actual situation and is not limited here.
[0084] In some embodiments, when the matcher performs fast tuning, it is also necessary to continuously determine whether the standing wave ratio is less than or equal to a fourth preset value. In response to the standing wave ratio being less than or equal to the fourth preset value, stop the fast tuning of the matcher and jump out of the current tuning process. Then, wait for the RF power input and then determine again whether the RF power is the first preset value. When the RF power is not the first preset value, enter the next tuning process.
[0085] In some embodiments, when the matcher performs slow tuning, it is also necessary to continuously determine whether the standing wave ratio is less than or equal to a fourth preset value. In response to the standing wave ratio being less than or equal to the fourth preset value, stop the slow tuning of the matcher and jump out of the current tuning process. Then, wait for the RF power input and then determine again whether the RF power is the first preset value. When the RF power is not the first preset value, enter the next tuning process.
[0086] Among them, the process of the next tuning process is the same as that of the current tuning process. It is also necessary to calculate the real-time standing wave ratio and determine whether to perform fast tuning or slow tuning based on the magnitude relationship between the standing wave ratio and the second preset value and the third preset value.
[0087] Among them, the fourth preset value is less than the third preset value, and the value range of the fourth preset value can be determined according to the value range of the third preset value. The fourth preset value can indicate the stop of tuning.
[0088] See Figure 2 , Figure 2 is a schematic flow chart of a tuning impedance matching method in some embodiments of the present application. The tuning impedance matching method includes:
[0089] Step 31: Detect the output impedance and RF power of the RF power supply and the load impedance of the load device.
[0090] Step 32: In response to the RF power not being the first preset value, calculate the standing wave ratio based on the output impedance and the load impedance.
[0091] Step 33: Determine whether the standing wave ratio is greater than the second preset value.
[0092] If yes, execute Step 34; otherwise, execute Step 35.
[0093] Step 34: Trigger the fast tuning mode and drive the matcher to perform fast tuning.
[0094] Step 35: Determine whether the standing wave ratio is greater than a third preset value.
[0095] If so, execute Step 36. Otherwise, it means that the matcher does not need to be tuned.
[0096] Step 36: Trigger the slow tuning mode and drive the matcher to perform slow tuning.
[0097] Step 37: Determine whether the RF power of the matcher is a first preset value.
[0098] If so, execute Step 38. Otherwise, return to Step 32.
[0099] Step 38: Stop the tuning process of the matcher.
[0100] It can be understood that if fast tuning is executed, fast tuning is stopped; if slow tuning is executed, slow tuning is stopped.
[0101] In some embodiments of the present application, the tuning impedance matching method applied to the matcher can determine whether to enter the tuning process according to the RF power, and dynamically adjust the tuning mode of the matcher according to the standing wave ratio, so as to achieve the mutual matching of the output impedance and the load impedance and ensure the stable operation of the load device.
[0102] See Figure 3 , Figure 3 is a schematic structural diagram of a matcher in some embodiments of the present application. One end of the matcher 10 is coupled to the RF power supply 1001, and the other end of the matcher 10 is coupled to the load device 1002.
[0103] As Figure 3 shown, the matcher 10 includes a detection unit 101 and an impedance matching unit 102.
[0104] Among them, the detection unit 101 is coupled to the RF power supply 1001. One end of the impedance matching unit 102 is coupled to the detection unit 101, and the other end of the impedance matching unit 102 is coupled to the load device 1002.
[0105] The detection unit 101 is used to detect the output impedance and RF power of the RF power supply 1001; and, the detection unit 101 is used to detect the load impedance of the load device 1002. The impedance matching unit 102 is used to enter the current tuning process in response to the RF power not being the first preset value.
[0106] Among them, the current tuning process has the same flow as the next tuning process or other tuning processes. The tuning process includes: calculating the standing wave ratio based on the output impedance and the load impedance; determining the tuning mode of the matcher 10 according to the magnitude relationship between the standing wave ratio and a preset value, and driving the matcher 10 to perform tuning according to the tuning mode; wherein, the tuning mode includes fast tuning and slow tuning.
[0107] In some embodiments provided by the present application, the matcher 10 can determine whether tuning is required according to the radio frequency power. When tuning is required, the tuning mode of the matcher 10 is dynamically adjusted and determined according to the standing wave ratio, so as to achieve the mutual matching of the output impedance and the load impedance, and ensure the stable operation of the load device 1002.
[0108] In some embodiments, the load device 1002 is a plasma processing device, and the plasma processing device includes a radio frequency driving electrode and a grounding electrode. The matcher 10 is coupled to the radio frequency driving electrode through a cable.
[0109] When the load device 1002 is a plasma processing device, the matcher 10 can perform impedance matching of the radio frequency circuit during processes such as etching of the plasma processing device, so as to realize the feeding of radio frequency energy into the chamber in the plasma processing device, reduce the influence on the stability of the plasma in the chamber, and further ensure the stability of the process.
[0110] In some embodiments, as Figure 4 shown, the plasma processing device is a basic structure of a PECVD (Plasma Enhanced Chemical Vapor Deposition) process chamber with upper electrode radio frequency feeding, which includes an upper electrode (i.e., a radio frequency driving electrode) and a lower electrode (i.e., a grounding electrode). The matcher 10 is respectively connected to the radio frequency power supply 1001 and the plasma processing device, and the impedance matching of the radio frequency circuit can be completed by the matcher 10 to realize the feeding of radio frequency energy in the process chamber.
[0111] In other embodiments, the plasma processing device is a basic structure of a PECVD process chamber with lower electrode radio frequency feeding, and the structure is the same as or similar to that of the conventional technology, which will not be elaborated here.
[0112] In some embodiments, the detection unit 101 includes a sensor assembly or a detection device, and the sensor assembly or the detection device is used to detect the output impedance and the radio frequency power of the radio frequency power supply 1001; and, the sensor assembly or the detection device is used to detect the load impedance of the load device 1002.
[0113] In some embodiments, as Figure 5As shown, the impedance matching unit 102 includes a control unit 201 and an adjustment unit 202. One end of the control unit 201 is coupled to the detection unit 101, the other end of the control unit 201 is coupled to one end of the adjustment unit 202, and the other end of the adjustment unit 202 is coupled to the load device 1002.
[0114] In some embodiments, the control unit 201 is configured to calculate the standing wave ratio based on the output impedance and the load impedance in response to the radio frequency power not being the first preset value.
[0115] In some embodiments, the control unit 201 is configured to determine the tuning mode of the adjustment unit 202 based on the magnitude relationship between the standing wave ratio and a preset value, and drive the adjustment unit 202 to perform tuning according to the tuning mode.
[0116] Specifically, the control unit 201 is configured to: trigger the fast tuning mode and drive the adjustment unit 202 to perform fast tuning in response to the standing wave ratio being greater than a second preset value. Trigger the slow tuning mode and drive the adjustment unit 202 to perform slow tuning in response to the standing wave ratio being less than or equal to the second preset value and greater than a third preset value.
[0117] In some embodiments, the control unit 201 is further configured to: after completing one fast tuning or one slow tuning, determine whether the standing wave ratio is greater than a third preset value; in response to the standing wave ratio being greater than the third preset value, perform the next tuning on the adjustment unit 202 after a delay time until the matcher 10 completes the current tuning process; wherein, the next tuning is fast tuning or slow tuning. The value range of the delay time is determined according to the actual situation and is not limited here.
[0118] In some embodiments, the control unit 201 is further configured to: after completing one fast tuning or one slow tuning, determine whether the standing wave ratio is greater than a third preset value; in response to the standing wave ratio being greater than the third preset value, immediately perform the next tuning on the adjustment unit 202 until the matcher 10 completes the current tuning process; wherein, the next tuning is fast tuning or slow tuning.
[0119] The matcher 10 provided in some embodiments of the present application determines whether to perform tuning according to the radio frequency power, and dynamically adjusts the tuning mode of the adjustment unit 202 in the matcher 10 according to the magnitude relationship between the standing wave ratio and the second preset value and the third preset value when it is determined that tuning is required, so as to achieve the mutual matching of the output impedance and the load impedance and ensure the stable operation of the load device 1002.
[0120] In some embodiments, as Figure 6 shown, the adjustment unit 202 includes a first adjustment unit 2021, a second adjustment unit 2022, and a third adjustment unit 2023.
[0121] Among them, the first end of the first adjustment unit 2021 is coupled to the first end of the third adjustment unit 2023, the second end of the first adjustment unit 2021 is coupled to the load device 1002, the first end of the second adjustment unit 2022 is coupled to the first end of the third adjustment unit 2023, the second end of the second adjustment unit 2022 is grounded, and the second end of the third adjustment unit 2023 is coupled to the control unit 201.
[0122] Among them, the control unit 201 is configured to adjust the parameters of the first adjustment unit 2021, the second adjustment unit 2022, and the third adjustment unit 2023 according to the standing wave ratio.
[0123] In some embodiments, as Figure 7 shown, the first adjustment unit 2021 includes a first adjustable capacitor 301 and a first inductor 302. The second end of the first adjustable capacitor 301 is coupled to the first end of the first inductor 302, and the second end of the first inductor 302 is coupled to the load device 1002.
[0124] In some embodiments, as Figure 7 shown, the second adjustment unit 2022 includes a second adjustable capacitor 303 and a second inductor 304. The second end of the second adjustable capacitor 303 is coupled to the first end of the second inductor 304, and the second end of the second inductor 304 is grounded.
[0125] In some embodiments, the control unit 201 is configured to adjust the capacitance values of the first adjustable capacitor 301 and / or the second adjustable capacitor 303 through the third adjustment unit 2023. By adjusting the capacitance values of the first adjustable capacitor 301 and the second adjustable capacitor 303, impedance matching between the RF power supply 1001 and the load device 1002 can be achieved.
[0126] In some embodiments of the present application, the adjustment unit 202 includes a series-connected capacitive element and inductive element. The series-connected capacitive element and inductive element can not only achieve a filtering function, but also achieve a resonance function and an impedance matching function, enabling the input impedance and the output impedance to match each other. In addition, the inductive element has a self-inductance property and can hinder the transmission of high-frequency signals, and the capacitive element has a capacitive reactance property and can hinder the transmission of low-frequency signals.
[0127] In some embodiments, the third adjustment unit 2023 is configured to perform a first-mode adjustment on the parameters under the control of the control unit 201 and perform fast tuning when the standing wave ratio is greater than a second preset value; wherein, the first-mode adjustment is continuous multiple adjustments.
[0128] In some embodiments, the third adjustment unit 2023 is configured to perform a second-mode adjustment on the parameters under the control of the control unit 201 and perform slow tuning when the standing wave ratio is less than or equal to the second preset value and greater than a third preset value; wherein, the second-mode adjustment is non-continuous multiple adjustments.
[0129] It can be understood that the capacitance values of the first adjustable capacitor 301 and the second adjustable capacitor 303 are adjusted by the third adjustment unit 2023.
[0130] In some embodiments, as Figure 7 shown, the third adjustment unit 2023 includes a first driving motor 305 and a second driving motor 306. Among them, the first end of the first driving motor 305 is coupled to the control unit 201, and the second end of the first driving motor 305 is coupled to the first end of the first adjustable capacitor 301. The first end of the second driving motor 306 is coupled to the control unit 201, and the second end of the second driving motor 306 is coupled to the first end of the second adjustable capacitor 303.
[0131] The first adjustable capacitor 301 and the second adjustable capacitor 303 are controlled by the first driving motor 305 and / or the second driving motor 306, and the first driving motor 305 and the second driving motor 306 are controlled by the control unit 201. Specifically, the control unit 201 controls the first driving motor 305 and the second driving motor 306 according to the real-time standing wave ratio to dynamically adjust the parameters of the first driving motor 305 and / or the second driving motor 306, and then uses the first driving motor 305 and the second driving motor 306 to adjust the capacitance positions of the corresponding first adjustable capacitor 301 and / or the second adjustable capacitor 303 to complete the matching adjustment.
[0132] In some embodiments, when the third adjustment unit 2023 includes the first driving motor 305 and the second driving motor 306, the first mode adjusts to identify that the steps of the first driving motor 305 and / or the second driving motor 306 are continuous, and the second mode adjusts to identify that the steps of the first driving motor 305 and / or the second driving motor 306 are discontinuous.
[0133] In some embodiments, the first driving motor 305 and the second driving motor 306 include, but are not limited to, stepper motors.
[0134] It can be understood that since the parameter adjustment of the third adjustment unit 2023 will simultaneously change the capacitance position of the adjustable capacitor. Therefore, completing one adjustment of the parameters of the third adjustment unit 2023 means completing one tuning of the matcher 10. Based on this, it is possible to determine whether it is necessary to continue the next tuning of the matcher 10 by determining whether the radio frequency power is a first preset value.
[0135] In an application scenario, a schematic diagram of the tuning process of the matcher 10 is as Figure 8 shown, Figure 8 where start1 represents a third preset value, start2 represents a second preset value, and stop represents a fourth preset value.
[0136] After the RF power is input, the detection unit 101 (such as a sensor) in the matcher 10 detects the load impedance of the load device 1002 in real time. The control unit 201 calculates the current standing wave ratio and then compares the size of the standing wave ratio with a second preset value.
[0137] If the standing wave ratio is greater than the second preset value, the control unit 201 drives the first drive motor 305 and the second drive motor 306 for fast tuning.
[0138] If the standing wave ratio is less than or equal to the second preset value and greater than the third preset value, the control unit 201 drives the first drive motor 305 and the second drive motor 306 for smooth slow tuning.
[0139] After the matcher 10 completes a fast tuning or slow tuning, it is necessary to detect the current power value. If the current power value is the first preset value, the tuning loop is exited, the current tuning process is ended, and the relationship between the RF power and the first preset value is judged again after the RF power is input again, so as to determine whether to enter the tuning loop again based on the size relationship, that is, whether to start the next tuning process. If the current power value is not the first preset value, the tuning loop continues, that is, the current tuning process continues, and the relationship between the standing wave ratio and the second preset value and the third preset value is judged again to perform the next tuning based on the size relationship. The next tuning is fast tuning or slow tuning.
[0140] In an application scenario, when the RF power supply 1001 is turned on, the RF power is input to the input end of the matcher 10. At this time, the standing wave ratio calculated by the control unit 201 in the matcher 10 is much greater than the second preset value, and the matcher 10 triggers fast tuning. During fast tuning, the first drive motor 305 and the second drive motor 306 are adjusted continuously for multiple times until the standing wave ratio drops to the fourth preset value and then the tuning stops. During fast tuning, the matcher 10 can quickly complete a tuning to quickly match the RF circuit (such as the load device 1002) when the RF power supply 1001 is turned on. During the process of the load device 1002, such as a plasma processing device, performing a process operation, the chamber state inside the plasma processing device will change, causing the standing wave ratio and the reflected power to gradually increase. When the standing wave ratio is greater than the third preset value, the matcher 10 will trigger secondary tuning. Since the standing wave ratio is less than or equal to the second preset value at this time, the secondary tuning triggered by the matcher 10 is slow tuning.
[0141] During slow tuning, each time tuning is performed, the first drive motor 305 and the second drive motor 306 only advance a limited number of steps. If after completing a slow tuning, the standing wave ratio is still greater than the third preset value at this time, the control unit 201 continues to drive the first drive motor 305 and the second drive motor 306 to advance a limited number of steps for tuning to ensure that the standing wave ratio is maintained near the third preset value during the process operation.
[0142] It should be noted that the tuning amplitude of the matcher 10 each time is small, and there is usually a certain time interval between two tunings (which can be slow tuning and slow tuning, fast tuning and fast tuning, or fast tuning and slow tuning). The fluctuation of the standing wave ratio will be relatively gentle and there will be no large drop, enabling the load device 1002 to perform a smooth and slow tuning during the process operation, avoiding affecting the tuning speed during the initial tuning (such as fast tuning), so that the matching state can still be quickly achieved during the initial tuning.
[0143] In other application scenarios, when the RF power supply 1001 is turned on, the RF power is input to the input end of the matcher 10. At this time, the standing wave ratio calculated by the control unit 201 in the matcher 10 is less than or equal to the second preset value, and the matcher 10 triggers slow tuning.
[0144] In some embodiments, when the RF power is input to the matcher 10 to trigger the first tuning of the matcher 10, the first driving motor 305 and the second driving motor 306 will maintain n (≥1) steps until the standing wave ratio reaches the fourth preset value and then stop.
[0145] During the process of the load device 1002 performing the process, slow tuning of the matcher 10 is triggered. During slow tuning, the first driving motor 305 and the second driving motor 306 only step a limited number of steps during the entire slow tuning process, and there is a delay time ti (i = 1, 2... m) after each tuning is completed. Whether the next tuning is required is detected only after the delay time ti ends.
[0146] It can be understood that the existence of the delay time ti between two adjacent tunings can prevent the matcher 10 from being in the tuning state all the time, and prevent the service life of the matcher 10 from being affected due to the continuous operation of the first driving motor 305 and / or the second driving motor 306. Among them, the value range of the delay time ti can be determined according to the actual situation and is not limited here.
[0147] In an application scenario, taking the first driving motor 305 and the second driving motor 306 both being stepping motors as an example, the working process of the stepping motors when the matcher 10 performs tuning is as Figure 9 shown.
[0148] Figure 9 In Figure (a) below, it shows that the number of steps of the stepping motor during the tuning process is 1 step (corresponding to a high level), and t1 represents the time interval between one step and another step. Specifically, one tuning is completed within one step, and within t1, it can be judged whether the RF power is the first preset value, and the next tuning is performed within the next step after t1 when the RF power is not the first preset value.
[0149] Figure 9In the middle figure (b), it shows that the number of steps of the stepper motor during the tuning process is 2 steps (corresponding to two high levels), and t2 represents the time interval between these two steps and the adjacent other two steps. Specifically, one tuning is completed within two steps. During t2, it can be determined whether the RF power is the first preset value. When the RF power is not the first preset value, the next tuning is performed within the two steps after t2. Among them, there can also be a time interval between one step and the other in the two steps, that is, there can be a time interval between two high levels (corresponding to the duration of the low level).
[0150] Figure 9 In the middle figure (c), it shows that the number of steps of the stepper motor during the tuning process is 3 steps (corresponding to three high levels), and t3 represents the time interval between these three steps and the adjacent other three steps. Specifically, one tuning is completed within three steps. During t3, it can be determined whether the RF power is the first preset value. When the RF power is not the first preset value, the next tuning is performed within the three steps after t3. Among them, there can also be a time interval between any two steps in the three steps, that is, there can be a time interval between any two high levels (corresponding to the duration of the low level).
[0151] See Figure 10 , Figure 10 is a schematic structural diagram of a semiconductor device in some embodiments of the present application. The semiconductor device 20 includes a memory 2001, a processor 2002, and the matcher 10 described in any of the above embodiments, which will not be elaborated here.
[0152] Among them, the matcher 10 is respectively coupled to the memory 2001 and the processor 2002. The memory 2001 is used to store computer programs, and the processor 2002 is used to drive the matcher 10 to execute the tuning impedance matching method described in any of the above embodiments, which will not be elaborated here.
[0153] See Figure 11 , Figure 11 is a schematic structural diagram of a computer-readable storage medium in some embodiments of the present application. A computer program 3001 is stored in the computer-readable storage medium 30. When the computer program 3001 is executed by the processor 2002, it is used to implement the tuning impedance matching method described in any of the above embodiments, which will not be elaborated here.
[0154] In summary, in the related art, the tuning amplitude of the matcher during operation is relatively large. During the process, the reflected power gradually increases and then triggers tuning, which in turn causes the reflected power to rapidly decrease and produce sawtooth fluctuations. This will lead to the instability of the plasma in the process chamber and further lead to the instability of the process results.
[0155] The tuning impedance matching method provided by the present application can keep the reflected power from having a large instantaneous fluctuation while maintaining a low reflected power during the process, improving the stability of the machine table plasma and the process.
[0156] The matcher 10 and the semiconductor device 20 provided by the present application can perform relatively stable slow tuning during the process, without affecting the speed of the initial tuning when the radio frequency power is just applied, and the initial tuning can still quickly enter the matching state. Moreover, during the slow tuning in the process, there is a time interval between two tunings, so that the matcher 10 will not always be in the tuning state, which can prevent the motor from continuously operating and ensure the service life of the matcher 10.
[0157] The above are only the embodiments of the present application, and do not limit the patent scope of the present application. Any equivalent structure or equivalent process transformation made by using the content of the specification and drawings of the present application, or directly or indirectly applied in other related technical fields, shall be equally included in the patent protection scope of the present application.
Claims
1. A tuning impedance matching method, characterized in that, Applied to a matcher, one end of the matcher is coupled to a radio frequency power supply, and the other end of the matcher is coupled to a load device. The method includes: Detecting the output impedance and radio frequency power of the radio frequency power supply, and detecting the load impedance of the load device; In response to the radio frequency power not being a first preset value, entering the current tuning process; wherein, the tuning process includes: calculating a standing wave ratio based on the output impedance and the load impedance; determining a tuning mode of the matcher according to a magnitude relationship between the standing wave ratio and a preset value, and driving the matcher to perform tuning according to the tuning mode; wherein, the tuning mode includes fast tuning and slow tuning.
2. The tuning impedance matching method according to claim 1, wherein The determining the tuning mode of the matcher according to the magnitude relationship between the standing wave ratio and the preset value, and driving the matcher to perform tuning according to the tuning mode includes: In response to the standing wave ratio being greater than a second preset value, triggering a fast tuning mode and driving the matcher to perform the fast tuning; In response to the standing wave ratio being less than or equal to the second preset value and the standing wave ratio being greater than a third preset value, triggering a slow tuning mode and driving the matcher to perform the slow tuning; wherein, the third preset value is less than the second preset value.
3. The tuning impedance matching method according to claim 2, characterized in that, The in response to the standing wave ratio being greater than the second preset value, triggering a fast tuning mode and driving the matcher to perform the fast tuning includes: In response to the standing wave ratio being greater than the second preset value, performing a first mode adjustment on parameters of the matcher and performing the fast tuning on the matcher; wherein, the first mode adjustment is continuous multiple adjustments. The in response to the standing wave ratio being less than or equal to the second preset value and the standing wave ratio being greater than the third preset value, triggering a slow tuning mode and driving the matcher to perform the slow tuning includes: In response to the standing wave ratio being less than or equal to the second preset value and the standing wave ratio being greater than the third preset value, performing a second mode adjustment on parameters of the matcher and performing the slow tuning on the matcher; wherein, the second mode adjustment is non - continuous multiple adjustments.
4. The tuning impedance matching method according to claim 2, wherein The method further includes: After completing one fast tuning or one slow tuning, determining whether the standing wave ratio is greater than the third preset value; In response to the standing wave ratio being greater than the third preset value, performing the next tuning on the matcher after a delay time until the matcher completes the current tuning process; wherein, the next tuning is the fast tuning or the slow tuning.
5. The tuning impedance matching method according to any one of claims 2-4, characterized in that, The method further includes: When the matcher performs the fast tuning, in response to the standing wave ratio being less than or equal to a fourth preset value, stopping the fast tuning of the matcher and completing the current tuning process; and When the matcher performs the slow tuning, in response to the standing wave ratio being less than or equal to the fourth preset value, stopping the slow tuning of the matcher and completing the current tuning process; wherein, the fourth preset value is less than the third preset value.
6. A matcher, characterized in that, The matcher includes: A detection unit, coupled to the radio frequency power supply, the detection unit is used to detect the output impedance and radio frequency power of the radio frequency power supply; and, the detection unit is used to detect the load impedance of the load device; An impedance matching unit, one end of the impedance matching unit is coupled to the detection unit, and the other end of the impedance matching unit is coupled to the load device. The impedance matching unit is configured to enter the current tuning process in response to the RF power not being the first preset value; Wherein, the tuning process includes: calculating the standing wave ratio based on the output impedance and the load impedance; determining the tuning mode of the matcher according to the magnitude relationship between the standing wave ratio and the preset value, and driving the matcher to perform tuning according to the tuning mode; wherein, the tuning mode includes fast tuning and slow tuning.
7. The matcher according to claim 6, wherein The impedance matching unit includes a control unit and an adjustment unit. One end of the control unit is coupled to the detection unit, the other end of the control unit is coupled to one end of the adjustment unit, and the other end of the adjustment unit is coupled to the load device; The control unit is configured to calculate the standing wave ratio based on the output impedance and the load impedance in response to the RF power not being the first preset value; And, The control unit is configured to determine the tuning mode of the adjustment unit based on the magnitude relationship between the standing wave ratio and the preset value, and drive the adjustment unit to perform tuning according to the tuning mode.
8. The matcher according to claim 7, wherein The control unit is configured to: In response to the standing wave ratio being greater than the second preset value, trigger the fast tuning mode and drive the adjustment unit to perform the fast tuning; And In response to the standing wave ratio being less than or equal to the second preset value and greater than the third preset value, trigger the slow tuning mode and drive the adjustment unit to perform the slow tuning; wherein, the third preset value is less than the second preset value.
9. The matcher according to claim 7, wherein The adjustment unit includes a first adjustment unit, a second adjustment unit and a third adjustment unit; The first end of the first adjustment unit is coupled to the first end of the third adjustment unit, the second end of the first adjustment unit is coupled to the load device, the first end of the second adjustment unit is coupled to the first end of the third adjustment unit, the second end of the second adjustment unit is grounded, and the second end of the third adjustment unit is coupled to the control unit; Wherein, the control unit is configured to adjust the parameters of the first adjustment unit, the second adjustment unit and the third adjustment unit based on the standing wave ratio.
10. The matcher according to claim 9, wherein The first adjustment unit includes a first adjustable capacitor and a first inductor. The first end of the first adjustable capacitor is coupled to the first end of the third adjustment unit, the second end of the first adjustable capacitor is coupled to the first end of the first inductor, and the second end of the first inductor is coupled to the load device; The second adjustment unit includes a second adjustable capacitor and a second inductor. The first end of the second adjustable capacitor is coupled to the first end of the third adjustment unit, the second end of the second adjustable capacitor is coupled to the first end of the second inductor, and the second end of the second inductor is grounded; Wherein, the control unit is configured to adjust the capacitance value of the first adjustable capacitor and / or the second adjustable capacitor through the third adjustment unit.
11. The matcher according to claim 10, wherein The third adjustment unit includes a first driving motor and a second driving motor. A first end of the first driving motor is coupled to the control unit, a second end of the first driving motor is coupled to a first end of the first adjustable capacitor, a first end of the second driving motor is coupled to the control unit, and a second end of the second driving motor is coupled to a first end of the second adjustable capacitor; Wherein, the third adjustment unit is configured to perform a first-mode adjustment on parameters and perform the fast tuning under the control of the control unit when the standing wave ratio is greater than the second preset value; wherein, the first-mode adjustment is multiple consecutive adjustments; and The third adjustment unit is configured to perform a second-mode adjustment on parameters and perform the slow tuning under the control of the control unit when the standing wave ratio is less than or equal to the second preset value and greater than the third preset value; wherein, the second-mode adjustment is multiple non-consecutive adjustments.
12. The matcher according to claim 11, wherein, The first-mode adjustment indicates that the number of steps of the first driving motor and / or the second driving motor is consecutive; The second-mode adjustment indicates that the number of steps of the first driving motor and / or the second driving motor is non-consecutive.
13. The matcher according to any one of claims 7 - 12, characterized in that, The control unit is further configured to: After completing one fast tuning or one slow tuning, determine whether the standing wave ratio is greater than the third preset value; In response to the standing wave ratio being greater than the third preset value, perform the next tuning on the adjustment unit after a delay time until the matcher completes the current tuning process; wherein, the next tuning is the fast tuning or the slow tuning.
14. A semiconductor device, characterized in that, The semiconductor device includes a memory, a processor, and a matcher. The matcher is respectively coupled to the memory and the processor. The memory is configured to store a computer program, and the processor is configured to drive the matcher to execute the tuning impedance matching method according to any one of claims 1-6.
15. A computer-readable storage medium, characterized in that, The computer-readable storage medium stores a computer program, which is used to implement the tuning impedance matching method according to any one of claims 1-6 when executed by a processor.