Gas mixing system and method and semiconductor process equipment

Abstract

The invention relates to a gas mixing system and method and semiconductor process equipment. The gas mixing system comprises a first gas input unit, a second gas input unit, a first mixing unit, a second mixing unit, a first pressure relief unit, a second pressure relief unit, a mixing control unit and a first output unit. The gas mixing device has the advantages that gases with different pressures are respectively input into the first mixing unit and the second mixing unit through the first gas input unit and the second gas input unit, rapid mixing of the first gas and the second gas can be realized by utilizing the pressure difference between the two gases, and the concentration of the mixed gas is more stable; the first pressure relief unit and the second pressure relief unit are respectively communicated with the first mixing unit and the second mixing unit, so that the internal pressure of the first mixing unit and the second mixing unit can be ensured to be stable; in addition, by means of the gas mixing method, high-pressure gas mixing can be achieved, pressure limitation is avoided, and mixing can be conducted with the H2 gas pressure being 40 psi and the corresponding N2 gas pressure being 960 psi.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor process gas treatment, and particularly to a gas mixing system, a method, and a semiconductor process equipment. Background Art

[0002] In the field of semiconductor manufacturing, precise gas mixing is crucial for ensuring high-quality production of semiconductor devices. Semiconductor processes cover numerous complex steps, such as etching, deposition, doping, etc., and these process steps highly rely on gas mixtures with specific compositions and ratios.

[0003] Chinese invention patent CN109316987A discloses a gas mixing method and a gas mixing system. The system includes an air inlet device, a gas mixing device, and a gas conditioning box. The gas mixing device includes a gas mixing tank and a vacuum pump. The gas mixing tank is connected to one end of the gas transmission pipeline far from the gas supply cylinder. The inlet of the vacuum pump is respectively connected to the gas mixing tank and the gas conditioning box. The outlet of the gas mixing tank is connected to the inlet of the gas conditioning box. A pressure controller is provided on the gas mixing tank, and the pressure controller is used to detect the gas pressure in the gas mixing tank. The method converts the relatively difficult-to-measure volume variable into a relatively easy-to-measure pressure variable according to Dalton's law of partial pressures, and determines the volume ratio of each gas component in the obtained mixed gas according to the partial pressures of each gas in the gas mixing tank, thereby overcoming the errors brought by the traditional flowmeter or the double-linkage proportional regulating valve due to the influence of gas density, turbulence degree, etc., and improving the stability of the entire gas mixing system.

[0004] However, the prior art has the following defects: 1. The existing gas mixing methods are only limited to first distributing and then pumping into a container for mixing, and cannot reach the real-time gas mixing and using state; 2. The existing gas mixing equipment has no temperature control. Since the mole fraction of gas is different in different temperature environments, when affected by external interference, even if there is pressure, it is impossible to ensure that the gas mixing effect is consistent each time; 3. The existing gas mixing equipment only fills different gases into the same tank for further mixing of the mixed gas, and cannot achieve immediate supply. The gas needs to be mixed stably before use, which takes a long time.

[0005] Currently, for the problems in the related art such as the inability to achieve rapid mixing of the mixed gas, the inability to achieve real-time supply of the mixed gas, and the susceptibility of the mixed gas to external interference, no effective solutions have been proposed. Summary of the Invention

[0006] The object of the present invention is to provide a gas mixing system, a method and a semiconductor process equipment in view of the deficiencies in the prior art, so as to solve the problems in the related art such as the mixed gas cannot be quickly mixed, the mixed gas cannot be supplied in real time, and the mixed gas is easily interfered by the outside world.

[0007] To achieve the above object, the technical solution adopted by the present invention is: In a first aspect, the present invention provides a gas mixing system, including: A first gas input unit, which is connected to a first gas source and is used for transporting a first gas; A second gas input unit, which is connected to a second gas source and is used for transporting a second gas; A first mixing unit, which is connected to the first gas input unit and is used for storing the first gas and mixing the first gas with the second gas; A second mixing unit, which is connected to the second gas input unit and is used for storing the second gas and mixing the second gas with the first gas; A first pressure relief unit, which is connected to the first mixing unit and is used for controlling the pressure of the first mixing unit by pressure relief so that the pressure of the first gas meets the mixing requirements; A second pressure relief unit, which is connected to the second mixing unit and is used for controlling the pressure of the second mixing unit by pressure relief so that the pressure of the second gas meets the mixing requirements; A mixing control unit, which is respectively connected to the first mixing unit and the second mixing unit and is used for connecting the first mixing unit and the second mixing unit in the open state so that the first gas and the second gas are mixed; A first output unit, which is respectively connected to the first mixing unit and the second mixing unit and is used for outputting the mixed gas after the first gas and the second gas are mixed to the outside.

[0008] In some of the embodiments, it further includes: A temperature control unit, which is respectively connected to the first mixing unit and the second mixing unit and is used for controlling the temperature of the first mixing unit and the second mixing unit.

[0009] In some of the embodiments, it further includes: A buffer unit, which is connected to the first output unit and is used for buffering the mixed gas; A second output unit, which is respectively connected to the buffer unit, the first output unit and a process machine and is used for outputting the mixed gas.

[0010] In some of these embodiments, it further includes: A first analysis unit, which is respectively connected to the first mixing unit and the second mixing unit, and is used for analyzing the concentration of the mixed gas; A second analysis unit, which is connected to the second output unit and is used for analyzing the concentration of the mixed gas.

[0011] In a second aspect, the present invention further provides a semiconductor process equipment, including: The gas mixing system as described in the first aspect.

[0012] In a third aspect, the present invention further provides a gas mixing method, which is applied to the gas mixing system as described in the first aspect or the semiconductor process equipment as described in the second aspect, and includes: The first gas input unit acquires and transports the first gas to the first mixing unit; The second gas input unit acquires and transports the second gas to the second mixing unit; Judge whether the pressure of the first mixing unit reaches the first pressure preset threshold and whether the pressure of the second mixing unit reaches the second pressure preset threshold; In the case where the pressure of the first mixing unit does not reach the first pressure preset threshold and / or the pressure of the second mixing unit does not reach the second preset pressure threshold, the first pressure relief unit and / or the second pressure relief unit are opened to adjust the pressure of the first mixing unit and / or the pressure of the second mixing unit until the pressure of the first mixing unit reaches the first pressure preset threshold and / or the pressure of the second mixing unit reaches the second pressure preset threshold; In the case where the pressure of the first mixing unit reaches the first pressure preset threshold and the pressure of the second mixing unit reaches the second pressure preset threshold, the mixing control unit is opened to connect the first mixing unit and the second mixing unit and mix the first gas and the second gas to obtain a mixed gas; In the case of completing the mixing, the first output unit acquires and outputs the mixed gas outward.

[0013] In some of these embodiments, before judging whether the pressure of the first mixing unit reaches the first pressure preset threshold and whether the pressure of the second mixing unit reaches the second pressure preset threshold, it further includes: The temperature control unit is opened to adjust the temperature of the first mixing unit and the temperature of the second mixing unit until the temperature of the first mixing unit reaches the temperature threshold and the temperature of the second mixing unit reaches the temperature threshold.

[0014] In some of these embodiments, after the mixing control unit is opened, it further includes: Turn on the temperature control unit to perform heating control and / or cooling control on the first mixing unit and the second mixing unit, so as to achieve gas thermal convection.

[0015] In some of these embodiments, after the first output unit obtains and outputs the mixed gas outward, it further includes: The buffer unit obtains the mixed gas to reduce the pressure of the mixed gas and make the mixed gas fully mixed; The second output unit obtains the mixed gas and conveys the mixed gas to the process machine.

[0016] In some of these embodiments, it further includes: The first concentration analysis unit obtains the mixed gas conveyed by the first output unit and detects the concentration of the mixed gas.

[0017] In some of these embodiments, it further includes: The second concentration analysis unit obtains the mixed gas conveyed by the second output unit and detects the concentration of the mixed gas.

[0018] Adopting the above technical solutions, compared with the prior art, the present invention has the following technical effects: A gas mixing system, method and semiconductor process equipment of the present invention respectively input gases with different pressures into the first mixing unit and the second mixing unit through the first gas input unit and the second gas input unit. Utilizing the pressure difference between the two gases can achieve the rapid mixing of the first gas and the second gas, and make the mixing concentration more stable; by connecting the first pressure relief unit and the second pressure relief unit to the first mixing unit and the second mixing unit respectively, the pressure inside the first mixing unit and the second mixing unit can be guaranteed to be stable; in addition, the present application uses Dalton's law of partial pressures for gas mixing. Since the pressure release is instantaneous, a large amount of mixed gas can be prepared quickly, and it can still be used to support the supply of an ultra-large flow system, with high adaptability; furthermore, the gas mixing method of the present invention can achieve high-pressure gas mixing and is not limited by pressure. The pressure of H2 gas can be 40 psi, and the corresponding pressure of N2 gas can be 960 psi for mixing, further improving the applicability. Description of the Drawings

[0019] Figure 1 is a schematic diagram of the brief framework of the gas mixing system according to Embodiment 1 of the present invention; Figure 2 is a schematic diagram of the detailed framework of the gas mixing system according to Embodiment 1 of the present invention; Figure 3 is a schematic diagram of the brief framework of the gas mixing system according to Embodiment 2 of the present invention; Figure 4 is a schematic diagram of the detailed framework of the gas mixing system according to Embodiment 2 of the present invention; Figure 5 It is a schematic diagram of the brief framework of the gas mixing system according to Embodiment 3 of the present invention; Figure 6 It is a schematic diagram of the detailed framework of the gas mixing system according to Embodiment 3 of the present invention; Figure 7 It is a schematic diagram of the brief framework of the gas mixing system according to Embodiment 4 of the present invention; Figure 8 It is a schematic diagram of the detailed framework of the gas mixing system according to Embodiment 4 of the present invention; Figure 9 It is a schematic diagram of the brief framework of the gas mixing system according to Embodiment 5 of the present invention; Figure 10 It is a schematic diagram of the detailed framework of the gas mixing system according to Embodiment 5 of the present invention (I); Figure 11 It is a schematic diagram of the detailed framework of the gas mixing system according to Embodiment 5 of the present invention (II); Figure 12 It is a schematic diagram of the brief framework of the gas mixing system according to Embodiment 6 of the present invention; Figure 13 It is a schematic diagram of the detailed framework of the gas mixing system according to Embodiment 6 of the present invention; Figure 14 It is a schematic diagram of the brief framework of the gas mixing system according to Embodiment 7 of the present invention; Figure 15 It is a schematic diagram of the detailed framework of the gas mixing system according to Embodiment 7 of the present invention; Figure 16 It is a specific embodiment of the gas mixing system according to Embodiment 10 of the present invention.

[0020] The accompanying reference numerals are: 100, the first gas input unit; 101, the first control valve element; 102, the first pressure regulating element; 103, the first pressure monitoring element; 104, the second pressure monitoring element; 105, the twenty-third control valve element; 106, the tenth one-way valve element; 107, the twenty-fourth control valve element; 108, the twenty-fifth control valve element; 200, the second gas input unit; 201, the second control valve element; 202, the second pressure regulating element; 203, the third pressure monitoring element; 204, the fourth pressure monitoring element; 300, the first mixing unit; 301, the first mixing element; 302, the third control valve element; 303, the fifth pressure monitoring element; 304, the first temperature monitoring element; 400, the second mixing unit; 401, the second mixing element; 402, the fourth control valve element; 403, the sixth pressure monitoring element; 404, the second temperature monitoring element; 500, the first pressure relief unit; 501, the first one-way valve element; 600, the second pressure relief unit; 601, the second one-way valve element; 700, the mixing control unit; 701, the fifth control valve element; 800, the first output unit; 801, the first vacuum element; 802, the sixth control valve element; 803, the seventh control valve element; 900, the temperature control unit; 901, the eighth control valve element; 902, the ninth control valve element; 1000, the buffer unit; 1001, the buffer element; 1002, the tenth control valve element; 1100, the second output unit; 1101, the eleventh control valve element; 1102, the twelfth control valve element; 1103, the thirteenth control valve element; 1104, the third pressure regulating element; 1105, the seventh pressure monitoring element; 1200, the first analysis unit; 1201, the first analysis element; 1202, the fourteenth control valve element; 1203, the third one-way valve element; 1204, the fourth pressure regulating element; 1205, the eighth pressure monitoring element; 1300, the second analysis unit; 1301, the second analysis element; 1302, the fifteenth control valve element; 1303, the fourth one-way valve element; 1304, the fifth pressure regulating element; 1305, the ninth pressure monitoring element; 1400, the exhaust gas emission unit; 1401, the sixteenth control valve element; 1402, the fifth one-way valve element; 1403, the seventeenth control valve element; 1404, the eighteenth control valve element; 1405, the sixth one-way valve element; 1406, the seventh one-way valve element; 1407, the eighth one-way valve element; 1500, the purging unit; 1501, the second vacuum element; 1502, the nineteenth control valve element; 1503, the ninth one-way valve element; 1504, the twentieth control valve element; 1505, the twenty-first control valve element; 1506, the twenty-second control valve element; 1600, the third gas input unit; 1601, the twenty-sixth control valve element; 1700, the spare mixed gas supply unit; 1701, the twenty-seventh control valve element. Detailed implementation mode

[0021] In order to make the objectives, technical solutions and advantages of the present application clearer and more understandable, the present application will be described and explained below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and are not used to limit the present application. Based on the embodiments provided in the present application, all other embodiments obtained by those of ordinary skill in the art without creative efforts belong to the scope of protection of the present application.

[0022] Obviously, the accompanying drawings in the following description are only some examples or embodiments of the present application. For those of ordinary skill in the art, without creative efforts, the present application can also be applied to other similar scenarios based on these drawings. In addition, it can also be understood that although the efforts made in such a development process may be complex and lengthy, for those of ordinary skill in the art related to the content disclosed in the present application, some design, manufacturing or production changes made based on the technical content disclosed in the present application are only conventional technical means and should not be understood as the content disclosed in the present application being insufficient.

[0023] Referring to "embodiment" in the present application means that the specific features, structures or characteristics described in connection with the embodiment may be included in at least one embodiment of the present application. The phrase appears in various positions in the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment mutually exclusive with other embodiments. Those of ordinary skill in the art explicitly and implicitly understand that the embodiments described in the present application can be combined with other embodiments without conflict.

[0024] Unless otherwise defined, technical terms or scientific terms involved in this application shall have the ordinary meanings understood by those with ordinary skills in the technical field to which this application belongs. The words such as "a", "an", "one", "the" and the like involved in this application do not indicate a limitation in quantity and may represent a singular or plural number. The terms "comprising", "including", "having" and any variations thereof involved in this application are intended to cover non-exclusive inclusion. For example, a process, method, system, product or device that includes a series of steps or modules (units) is not limited to the listed steps or units, but may further include unlisted steps or units, or may further include other steps or units inherent to these processes, methods, products or devices. The words such as "connected", "coupled" and the like involved in this application are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. The "plurality" involved in this application means two or more. "And / or" describes the association relationship of associated objects and indicates that three relationships may exist. For example, "A and / or B" may represent: A exists alone, A and B exist simultaneously, and B exists alone. The character " / " generally indicates that the associated objects before and after are in an "or" relationship. The terms "first", "second", "third" and the like involved in this application are only used to distinguish similar objects and do not represent a specific order for the objects.

[0025] Embodiment 1 A schematic embodiment of the present invention, such as Figure 1As shown in the figure, a gas mixing system includes a first gas input unit 100, a second gas input unit 200, a first mixing unit 300, a second mixing unit 400, a first pressure relief unit 500, a second pressure relief unit 600, a mixing control unit 700, and a first output unit 800. Among them, the first gas input unit 100 is connected to a first gas source and is used to transport the first gas; the second gas input unit 200 is connected to a second gas source and is used to transport the second gas; the first mixing unit 300 is connected to the first gas input unit 100 and is used to store the first gas and mix the first gas with the second gas; the second mixing unit 400 is connected to the second gas input unit 200 and is used to store the second gas and mix the second gas with the first gas; the first pressure relief unit 500 is connected to the first mixing unit 300 and is used to control the pressure of the first mixing unit 300 by pressure relief so that the pressure of the first gas meets the mixing requirements; the second pressure relief unit 600 is connected to the second mixing unit 400 and is used to control the pressure of the second mixing unit 400 by pressure relief so that the pressure of the second gas meets the mixing requirements; the mixing control unit 700 is respectively connected to the first mixing unit 300 and the second mixing unit 400 and is used to connect the first mixing unit 300 and the second mixing unit 400 to mix the first gas with the second gas in the open state; the first output unit 800 is respectively connected to the first mixing unit 300 and the second mixing unit 400 and is used to output the mixed gas after mixing the first gas and the second gas to the outside.

[0026] It should be noted that the first end and the second end in the present invention are respectively the two ends in its length direction.

[0027] It should be noted that the first gas source includes but is not limited to a nitrogen gas source; the second gas source includes but is not limited to a hydrogen gas source.

[0028] As Figure 2 As shown in the figure, the first gas input unit 100 includes a first gas input element, a first control valve element 101, a first pressure regulating element 102, a first pressure monitoring element 103, and a second pressure monitoring element 104. Among them, the first gas input element is respectively connected to the first gas source and the first mixing unit 300 and is used to transport the first gas; the first control valve element 101 is arranged on the first gas input element and is used to control the flow of the first gas input element; the first pressure regulating element 102 is arranged on the first gas input element and is used to regulate the pressure of the first gas input element; the first pressure monitoring element 103 is connected to the first gas input element and is used to monitor the upstream pressure and downstream pressure of the first pressure regulating element 102; the second pressure monitoring element 104 is connected to the first gas input element and is used to monitor the pressure of the first gas flowing into the first mixing unit 300.

[0029] Specifically, the first end of the first gas input element is in communication with the first gas source, and the second end of the first gas input element is in communication with the first mixing unit 300.

[0030] In some embodiments thereof, the first gas input element includes, but is not limited to, a stainless steel pipe.

[0031] Specifically, the first control valve element 101 includes a first manual diaphragm valve and a second manual diaphragm valve. Among them, the first manual diaphragm valve is disposed on the first gas input element for manually controlling the flow between the first gas input element and the first gas source; the second manual diaphragm valve is disposed on the first gas input element and is located downstream of the first manual diaphragm valve for manually controlling the flow between the first gas input element and the first mixing unit 300.

[0032] In some embodiments thereof, the first control valve element 101 includes, but is not limited to, a diaphragm valve.

[0033] Specifically, the first pressure regulating element 102 is located downstream of the first manual diaphragm valve and upstream of the second manual diaphragm valve.

[0034] In some embodiments thereof, the first pressure regulating element 102 includes, but is not limited to, a pressure regulating valve.

[0035] Specifically, the first pressure monitoring element 103 includes a first pressure gauge and a second pressure gauge. Among them, the first pressure gauge is in communication with the first gas input element, and the connection between the first pressure gauge and the first gas input element is located downstream of the first manual diaphragm valve and upstream of the first pressure regulating element 102; the second pressure gauge is in communication with the first gas input element, and the connection between the second pressure gauge and the first gas input element is located downstream of the first pressure regulating element 102 and upstream of the second manual diaphragm valve.

[0036] In some embodiments thereof, the first pressure monitoring element 103 includes, but is not limited to, a pressure gauge.

[0037] Specifically, the second pressure monitoring element 104 includes a first pressure sensor. Among them, the first pressure sensor is in communication with the first gas input element, and the connection between the first pressure sensor and the first gas input element is located downstream of the second manual diaphragm valve.

[0038] In some embodiments thereof, the second pressure monitoring element 104 includes, but is not limited to, a pressure sensor.

[0039] Such as Figure 2As shown, the second gas input unit 200 includes a second gas input element, a second control valve element 201, a second pressure regulating element 202, a third pressure monitoring element 203, and a fourth pressure monitoring element 204. Among them, the second gas input element is respectively connected to a second gas source and a second mixing unit 400 for transporting the second gas; the second control valve element 201 is arranged on the second gas input element for controlling the flow of the second gas input element; the second pressure regulating element 202 is arranged on the second gas input element for regulating the pressure of the second gas input element; the third pressure monitoring element 203 is connected to the second gas input element for monitoring the upstream pressure and downstream pressure of the second pressure regulating element 202; the fourth pressure monitoring element 204 is connected to the second gas input element for monitoring the pressure of the second gas flowing into the second mixing unit 400.

[0040] Specifically, the first end of the second gas input element is connected to the second gas source, and the second end of the second gas input element is connected to the second mixing unit 400.

[0041] In some of these embodiments, the second gas input element includes, but is not limited to, a stainless steel pipe.

[0042] Specifically, the second control valve element 201 includes a third manual diaphragm valve and a fourth manual diaphragm valve. Among them, the third manual diaphragm valve is arranged on the second gas input element for manually controlling the flow between the second gas input element and the second gas source; the fourth manual diaphragm valve is arranged on the second gas input element and is located downstream of the third manual diaphragm valve for manually controlling the flow between the second gas input element and the second mixing unit 400.

[0043] In some of these embodiments, the second control valve element 201 includes, but is not limited to, a diaphragm valve.

[0044] Specifically, the second pressure regulating element 202 is located downstream of the third manual diaphragm valve and upstream of the fourth manual diaphragm valve.

[0045] In some of these embodiments, the second pressure regulating element 202 includes, but is not limited to, a pressure regulating valve.

[0046] Specifically, the third pressure monitoring element 203 includes a third pressure gauge and a fourth pressure gauge. Among them, the third pressure gauge is connected to the second gas input element, and the connection between the third pressure gauge and the second gas input element is located downstream of the third manual diaphragm valve and upstream of the second pressure regulating element 202; the fourth pressure gauge is connected to the second gas input element, and the connection between the fourth pressure gauge and the second gas input element is located downstream of the second pressure regulating element 202 and upstream of the fourth manual diaphragm valve.

[0047] In some of these embodiments, the third pressure monitoring element 203 includes, but is not limited to, a pressure gauge.

[0048] Specifically, the fourth pressure monitoring element 204 includes a second pressure sensor. The second pressure sensor is in communication with the second gas input element, and the communication point between the second pressure sensor and the second gas input element is located downstream of the fourth manual diaphragm valve.

[0049] In some of these embodiments, the fourth pressure monitoring element 204 includes, but is not limited to, a pressure sensor.

[0050] As Figure 2 shown, the first mixing unit 300 includes a first mixing element 301, a third control valve element 302, and a fifth pressure monitoring element 303. The first mixing element 301 is in communication with the first gas input unit 100, the first pressure relief unit 500, the mixing control unit 700, and the first output unit 800 respectively, and is used for storing the first gas and mixing the first gas and the second gas; the third control valve element 302 is disposed at the inlet and outlet of the first mixing element 301 for controlling the flow of the first mixing element 301; the fifth pressure monitoring element 303 is in communication with the first mixing element 301 for monitoring the pressure inside the first mixing element 301.

[0051] Specifically, the first mixing element 301 includes a first gas storage cavity, a first inlet, a first outlet, a first pressure relief port, and a first gas mixing port. The first inlet is disposed at the top of the first gas storage cavity and is in communication with the second end of the first gas input element; the first outlet is disposed at the bottom of the first gas storage cavity and is in communication with the first output unit 800; the first pressure relief port is disposed at the side of the first gas storage cavity and is in communication with the first pressure relief unit 500, and the first gas mixing port is disposed at the side of the first gas storage cavity and is in communication with the mixing control unit 700.

[0052] In some of these embodiments, the first mixing element 301 includes, but is not limited to, a container tank.

[0053] It should be noted that the volume of the first mixing element 301 is 3L to 15L. Preferably, the volume of the first mixing element 301 is 5L.

[0054] Specifically, the third control valve element 302 includes a first pneumatic diaphragm valve, a second pneumatic diaphragm valve, and a third pneumatic diaphragm valve. The first pneumatic diaphragm valve is disposed at the first inlet for automatically controlling the flow between the first mixing element 301 and the first gas input element; the second pneumatic diaphragm valve is disposed at the first outlet for automatically controlling the flow between the first mixing element 301 and the first output unit 800; the third pneumatic diaphragm valve is disposed at the first pressure relief port for automatically controlling the flow between the first mixing element 301 and the first pressure relief unit 500.

[0055] In some of these embodiments, the third control valve element 302 includes, but is not limited to, a diaphragm valve.

[0056] Specifically, the fifth pressure monitoring element 303 includes a third pressure sensor. Among them, the third pressure sensor is communicated with the first gas storage cavity of the first mixing element 301.

[0057] In some of these embodiments, the fifth pressure monitoring element 303 includes, but is not limited to, a pressure sensor.

[0058] As Figure 2 shown, the second mixing unit 400 includes a second mixing element 401, a fourth control valve element 402, and a sixth pressure monitoring element 403. Among them, the second mixing element 401 is respectively communicated with the second gas input unit 200, the second pressure relief unit 600, the mixing control unit 700, and the first output unit 800, and is used for storing the second gas and mixing the second gas with the first gas; the fourth control valve element 402 is arranged at the air inlet and the air outlet of the second mixing element 401 and is used for controlling the flow of the second mixing element 401; the sixth pressure monitoring element 403 is communicated with the second mixing element 401 and is used for monitoring the pressure inside the second mixing element 401.

[0059] Specifically, the second mixing element 401 includes a second gas storage cavity, a second air inlet, a second air outlet, a second pressure relief port, and a second gas mixing port. Among them, the second air inlet is arranged at the top of the second gas storage cavity and is communicated with the second end of the second gas input element; the second air outlet is arranged at the bottom of the second gas storage cavity and is communicated with the first output unit 800; the second pressure relief port is arranged at the side of the second gas storage cavity and is communicated with the second pressure relief unit 600; the second gas mixing port is arranged at the side of the second gas storage cavity and is communicated with the mixing control unit 700.

[0060] In some of these embodiments, the second mixing element 401 includes, but is not limited to, a container tank.

[0061] It should be noted that the volume of the second mixing element 401 is 3L to 15L. Preferably, the volume of the second mixing element 401 is 5L.

[0062] Specifically, the fourth control valve element 402 includes a fourth pneumatic diaphragm valve, a fifth pneumatic diaphragm valve, and a sixth pneumatic diaphragm valve. Among them, the fourth pneumatic diaphragm valve is arranged at the second air inlet and is used for automatically controlling the flow between the second mixing element 401 and the second gas input element; the fifth pneumatic diaphragm valve is arranged at the second air outlet and is used for automatically controlling the flow between the second mixing element 401 and the first output unit 800; the sixth pneumatic diaphragm valve is arranged at the second pressure relief port and is used for automatically controlling the flow between the second pressure relief port and the second pressure relief unit 600.

[0063] In some of these embodiments, the fourth control valve element 402 includes, but is not limited to, a diaphragm valve.

[0064] Specifically, the sixth pressure monitoring element 403 includes a fourth pressure sensor. Among them, the fourth pressure sensor is communicated with the second gas storage cavity of the second mixing element 401.

[0065] In some of these embodiments, the sixth pressure monitoring element 403 includes, but is not limited to, a pressure sensor.

[0066] As Figure 2 shown, the first pressure relief unit 500 includes a first pressure relief pipeline element and a first one-way valve element 501. Among them, the first pressure relief pipeline element is communicated with the first mixing unit 300 and the waste gas treatment equipment respectively, and is used for transporting the first gas; the first one-way valve element 501 is arranged on the first pressure relief pipeline element and is used for making the gas flow unidirectionally.

[0067] Specifically, the first end of the first pressure relief pipeline element is communicated with the first pressure relief port of the first mixing element 301, and the second end of the first pressure relief pipeline element is communicated with the waste gas treatment equipment.

[0068] In some of these embodiments, the first pressure relief pipeline element includes, but is not limited to, a stainless steel pipe.

[0069] In some of these embodiments, the first one-way valve element 501 includes, but is not limited to, a one-way valve.

[0070] As Figure 2 shown, the second pressure relief unit 600 includes a second pressure relief pipeline element and a second one-way valve element 601. Among them, the second pressure relief pipeline element is communicated with the second mixing unit 400 and the waste gas treatment equipment respectively, and is used for transporting the second gas; the second one-way valve element 601 is arranged on the second pressure relief pipeline element and is used for making the gas flow unidirectionally.

[0071] Specifically, the first end of the second pressure relief pipeline element is communicated with the second pressure relief port of the second mixing element 401, and the second end of the second pressure relief pipeline element is communicated with the waste gas treatment equipment.

[0072] In some of these embodiments, the second pressure relief pipeline element includes, but is not limited to, a stainless steel pipe.

[0073] In some of these embodiments, the second one-way valve element 601 includes, but is not limited to, a one-way valve.

[0074] As Figure 2As shown, the hybrid control unit 700 includes a connecting pipeline element and a fifth control valve element 701. Among them, the connecting pipeline element is respectively connected to the first mixing unit 300 and the second mixing unit 400, and is used to mix the first gas and the second gas; the fifth control valve element 701 is arranged on the connecting pipeline element and is used to control the flow of the connecting pipeline element.

[0075] Specifically, the first end of the connecting pipeline element is connected to the first gas mixing port of the first mixing element 301, and the second end of the connecting pipeline element is connected to the second gas mixing port of the second mixing element 401.

[0076] In some of these embodiments, the connecting pipeline element includes, but is not limited to, a stainless steel pipe.

[0077] Specifically, the fifth control valve element 701 includes a seventh pneumatic diaphragm valve. Among them, the seventh pneumatic diaphragm valve is arranged on the connecting pipeline element and is used to automatically control the flow between the first mixing element 301 and the second mixing element 401.

[0078] In some of these embodiments, the fifth control valve element 701 includes, but is not limited to, a diaphragm valve.

[0079] As Figure 2 shown, the first output unit 800 includes a first output element, a second output element, a third output element, a first vacuum element 801, a sixth control valve element 802, a bypass pipeline element, and a seventh control valve element 803. Among them, the first output element is connected to the first mixing unit 300 and is used to transport the mixed gas; the second output element is connected to the second mixing unit 400 and is used to transport the mixed gas; the third output element is respectively connected to the first output element and the second output element and is used to transport the mixed gas; the first vacuum element 801 is arranged on the third output element and is used to perform vacuum processing on the first mixing unit 300 and the second mixing unit 400; the sixth control valve element 802 is arranged on the third output element and is located downstream of the first vacuum element 801 and is used to control the flow of the third output element; the bypass pipeline element is connected to the third output element, and the two ends of the bypass pipeline element are respectively located upstream and downstream of the first vacuum element 801 at the connection with the third output element and are used for the external transportation of the mixed gas; the seventh control valve element 803 is arranged on the bypass pipeline element and is used to control the flow of the bypass pipeline element.

[0080] Specifically, the first end of the first output element is connected to the first gas outlet of the first mixing element 301, and the second end of the first output element is connected to the first end of the third output element.

[0081] In some of these embodiments, the first output element includes, but is not limited to, a stainless steel pipe.

[0082] Specifically, the first end of the second output element is communicated with the second air outlet of the second mixing element 401, and the second end of the second output element is communicated with the first end of the third output element.

[0083] In some of these embodiments, the first output element includes, but is not limited to, a stainless steel pipe.

[0084] Specifically, the second end of the third output element is communicated with a subsequent gas treatment device or a processing machine platform.

[0085] In some of these embodiments, the third output element includes, but is not limited to, a stainless steel pipe.

[0086] Specifically, the first vacuum element 801 is disposed on the third output element and can perform vacuum treatment on the first mixing element 301 and the second mixing element 401.

[0087] In some of these embodiments, the first vacuum element 801 includes, but is not limited to, a vacuum pump.

[0088] Specifically, the sixth control valve element 802 includes a fifth manual diaphragm valve. Among them, the fifth manual diaphragm valve is disposed on the third output element and is located downstream of the first vacuum element 801 for manually controlling the flow between the third output element and the subsequent gas treatment device or the processing machine platform.

[0089] In some of these embodiments, the sixth control valve element 802 includes, but is not limited to, a diaphragm valve.

[0090] Specifically, the connection of the first end of the bypass pipeline element to the third output element is located upstream of the first vacuum element 801, and the connection of the second end of the bypass pipeline element to the third output element is located between the first vacuum element 801 and the sixth control valve element 802.

[0091] In some of these embodiments, the bypass pipeline element includes, but is not limited to, a stainless steel pipe.

[0092] Specifically, the seventh control valve element 803 includes a sixth manual diaphragm valve. Among them, the sixth manual diaphragm valve is disposed on the bypass pipeline element for manually controlling the flow of the bypass pipeline element.

[0093] The usage method of this embodiment (taking the example of mixing 4% H2 / N2) is as follows: Manually open the first manual diaphragm valve and the third manual diaphragm valve so that the first gas input element is communicated with the first gas source and the second gas input element is communicated with the second gas source; The system activates the first pressure regulating element 102 and the second pressure regulating element 202. The first pressure regulating element 102 regulates the pressure of the first gas in the first gas input element to 96.2 psi, and the second pressure regulating element 202 regulates the pressure of the second gas in the second gas input element to 4.2 psi; By observing the second pressure gauge and the fourth pressure gauge, when the air pressures in the first gas input element and the second gas input element meet the standards, manually activate the second manual diaphragm valve and the fourth manual diaphragm valve, and the system automatically activates the first pneumatic diaphragm valve and the second pneumatic diaphragm valve, so that N2 and H2 enter the first mixing element 301 and the second mixing element 401 respectively; After the transportation of N2 and H2 is completed, the system closes the first pneumatic diaphragm valve and the second pneumatic diaphragm valve, and observes the pressures inside the first mixing element 301 and the second mixing element 401 in real time through the third pressure sensor and the fourth pressure sensor. When the pressures inside the first mixing element 301 and the second mixing element 401 do not meet the standards, the system activates the fifth pneumatic diaphragm valve and the sixth pneumatic diaphragm valve, so that the air pressure inside the first mixing element 301 is maintained at 96 psi, and the air pressure inside the second mixing element 401 is maintained at 4 psi; When the adjustment is completed, the system closes the fifth pneumatic diaphragm valve and the sixth pneumatic diaphragm valve and activates the seventh pneumatic diaphragm valve to realize the mixing of the first gas and the second gas by using Dalton's law of partial pressures; After the gases in the first mixing element 301 and the second mixing element 401 are fully mixed, the system activates the third pneumatic diaphragm valve and the fourth pneumatic diaphragm valve and activates the first vacuum element 801 to form a vacuum negative pressure at the first end of the third output element, so as to discharge the mixed gas in the first mixing element 301 and the second mixing element 401 through the first output element and the second output element, so that the mixed gas can be transported to subsequent gas treatment equipment or process machines.

[0094] The advantages of this embodiment are as follows: different-pressure gases are respectively input into the first mixing unit and the second mixing unit through the first gas input unit and the second gas input unit, and the rapid mixing of the first gas and the second gas can be realized by using the pressure difference between the two gases, and the mixing gas concentration is made more stable; by connecting the first pressure relief unit and the second pressure relief unit to the first mixing unit and the second mixing unit respectively, the pressures inside the first mixing unit and the second mixing unit can be ensured to be stable; in addition, this application uses Dalton's law of partial pressures for gas mixing. Since the pressure release is instantaneous, a large amount of mixed gas can be prepared quickly, and it can still be used to support the supply of an ultra-large flow system, with high adaptability; furthermore, the gas mixing method of the present invention can realize high-pressure gas mixing and is not limited by pressure. The pressure of H2 gas can be 40 psi, and the corresponding pressure of N2 gas can be 960 psi for mixing, further improving the applicability.

[0095] Example 2 This example is a variant of Example 1.

[0096] As Figure 3 shown, the gas mixing system further includes a temperature control unit 900. Among them, the temperature control unit 900 is respectively connected to the first mixing unit 300 and the second mixing unit 400, and is used to control the temperature of the first mixing unit 300 and the second mixing unit 400.

[0097] It should be noted that the first mixing element 301 further includes a first heat exchange cavity, a first liquid inlet, and a first liquid outlet. Among them, the first heat exchange cavity is formed on the outside of the first gas storage cavity and is arranged around the circumference of the first gas storage cavity; the first liquid inlet is formed at the bottom of the first heat exchange cavity and is connected to the temperature control unit 900; the first liquid outlet is formed at the top of the first heat exchange cavity and is connected to the temperature control unit 900.

[0098] It should be noted that the second mixing element 401 further includes a second heat exchange cavity, a second liquid inlet, and a second liquid outlet. Among them, the second heat exchange cavity is formed on the outside of the second gas storage cavity and is arranged around the circumference of the second gas storage cavity; the second liquid inlet is formed at the bottom of the second heat exchange cavity for connecting to the temperature control unit 900; the second liquid outlet is formed at the top of the second heat exchange cavity for connecting to the temperature control unit 900.

[0099] As Figure 4 shown, the temperature control unit 900 includes a first temperature control pipeline element, a second temperature control pipeline element, an eighth control valve element 901, and a ninth control valve element 902. Among them, the first temperature control pipeline element is respectively connected to the first mixing unit 300, the second mixing unit 400, and the heat exchange device, and is used to transport the liquid with the first temperature from the heat exchange device to the first mixing unit 300 and the second mixing unit 400; the second temperature control pipeline element is respectively connected to the first mixing unit 300, the second mixing unit 400, and the heat exchange device, and is used to transport the liquid with the second temperature from the first mixing unit 300 and the second mixing unit 400 to the heat exchange device; the eighth control valve element 901 is arranged in the first mixing unit 300 and is used to control the flow of the first temperature control pipeline element, the second temperature control pipeline element, and the first mixing unit 300; the ninth control valve element 902 is arranged in the second mixing unit 400 and is used to control the flow of the first temperature control pipeline element, the second temperature control pipeline element, and the second mixing unit 400.

[0100] Specifically, the first end of the first temperature control pipeline element is connected to the heat exchange device, and the second end of the first temperature control pipeline element is respectively connected to the first liquid inlet of the first mixing element 301 and the second liquid inlet of the second mixing element 401.

[0101] In some of these embodiments, the first temperature control pipeline element includes, but is not limited to, a stainless steel pipe.

[0102] Specifically, the first end of the second temperature control pipeline element is respectively communicated with the first liquid outlet of the first mixing element 301 and the second liquid outlet of the second mixing element 401, and the second end of the second temperature control pipeline element is communicated with the heat exchange device.

[0103] In some of these embodiments, the second temperature control pipeline element includes, but is not limited to, a stainless steel pipe.

[0104] Specifically, the eighth control valve element 901 includes an eighth pneumatic diaphragm valve and a ninth pneumatic diaphragm valve. Among them, the eighth pneumatic diaphragm valve is arranged at the first liquid inlet of the first mixing element 301 for automatically controlling the flow between the first temperature control pipeline element and the first mixing element 301; the ninth pneumatic diaphragm valve is arranged at the first liquid outlet of the first mixing element 301 for automatically controlling the flow between the second temperature control pipeline element and the first mixing element 301.

[0105] In some of these embodiments, the eighth control valve element 901 includes, but is not limited to, a diaphragm valve.

[0106] Specifically, the ninth control valve element 902 includes a tenth pneumatic diaphragm valve and an eleventh pneumatic diaphragm valve. Among them, the tenth pneumatic diaphragm valve is arranged at the second liquid inlet of the second mixing element 401 for automatically controlling the flow between the first temperature control pipeline element and the second mixing element 401; the eleventh pneumatic diaphragm valve is arranged at the second liquid outlet of the second mixing element 401 for automatically controlling the flow between the second temperature control pipeline element and the second mixing element 401.

[0107] In some of these embodiments, the ninth control valve element 902 includes, but is not limited to, a diaphragm valve.

[0108] Furthermore, the first mixing unit 300 further includes a first temperature monitoring element 304. Among them, the first temperature monitoring element 304 is communicated with the first mixing unit 300 for monitoring the temperature of the first mixing unit 300.

[0109] Specifically, the first temperature monitoring element 304 is communicated with the first air storage cavity of the first mixing element 301 for real-time monitoring of the temperature of the first mixing element 301.

[0110] In some of these embodiments, the first temperature monitoring element 304 includes, but is not limited to, a temperature sensor.

[0111] Furthermore, the second mixing unit 400 further includes a second temperature monitoring element 404. Among them, the second temperature monitoring element 404 is communicated with the second mixing unit 400 for monitoring the temperature of the second mixing unit 400.

[0112] Specifically, the second temperature monitoring element 404 communicates with the second gas storage cavity of the second mixing element 401 for real-time monitoring of the temperature of the second mixing element 401.

[0113] In some of these embodiments, the second temperature monitoring element 404 includes, but is not limited to, a temperature sensor.

[0114] The usage method of this embodiment is as follows: Before the connecting pipeline element is opened, the system starts the heat exchange device and opens the eighth pneumatic diaphragm valve, the ninth pneumatic diaphragm valve, or the tenth pneumatic diaphragm valve, the eleventh pneumatic diaphragm valve, so that the liquid in the heat exchange device flows into the first heat exchange cavity of the first mixing element 301 or the second heat exchange cavity of the second mixing element 401 through the first temperature control pipeline element, thereby heating the first mixing element 301 or the first mixing element 301; When the heating of the first mixing element 301 or the second mixing element 401 is completed, the system opens the seventh pneumatic diaphragm valve, so that the connecting pipeline element is opened, thereby realizing the primary heat convection of the first gas and the second gas; When the primary heat convection is completed, the seventh pneumatic diaphragm valve is closed and the eighth pneumatic diaphragm valve, the ninth pneumatic diaphragm valve, or the tenth pneumatic diaphragm valve, the eleventh pneumatic diaphragm valve is opened, so that the liquid in the heat exchange device flows into the first heat exchange cavity of the first mixing element 301 or the second heat exchange cavity of the second mixing element 401 through the first temperature control pipeline element, thereby cooling the first mixing element 301 or the second mixing element 401; When the cooling of the first mixing element 301 or the second mixing element 401 is completed, the system opens the seventh pneumatic diaphragm valve, so that the connecting pipeline element is opened, thereby realizing the secondary heat convection of the first gas and the second gas; Repeat the above operation steps cyclically until the first gas and the second gas are fully mixed.

[0115] The advantage of this embodiment is that the first mixing unit or the second mixing unit can be heated or cooled by the temperature control unit, thereby realizing the heat convection of the first gas and the second gas, and further improving the mixing efficiency of the first gas and the second gas.

[0116] Embodiment 3 This embodiment is a modified embodiment of Embodiments 1 to 2.

[0117] Such as Figure 5As shown, the gas mixing system further includes a buffer unit 1000 and a second output unit 1100. Among them, the buffer unit 1000 is communicated with the first output unit 800 and is used for buffering the mixed gas; the second output unit 1100 is respectively communicated with the buffer unit 1000, the first output unit 800 and the process machine platform and is used for outputting the mixed gas.

[0118] As Figure 6 shown, the buffer unit 1000 includes a buffer element 1001 and a tenth control valve element 1002. Among them, the buffer element 1001 is respectively communicated with the first output unit 800 and the second output unit 1100 and is used for buffering the mixed gas; the tenth control valve element 1002 is arranged on the buffer element 1001 and is used for controlling the flow of the buffer element 1001.

[0119] Specifically, the buffer element 1001 includes a buffer tank, a buffer air inlet and a buffer air outlet. Among them, the buffer air inlet is arranged at the bottom of the buffer tank and is communicated with the second end of the third output element; the buffer air outlet is arranged at the bottom of the buffer tank and is communicated with the second output unit 1100.

[0120] In some of the embodiments, the buffer element 1001 includes, but is not limited to, a container tank.

[0121] It should be noted that the volume of the buffer element 1001 is 10L to 100L. Preferably, the volume of the buffer element 1001 is 30L.

[0122] Specifically, the tenth control valve element 1002 includes a seventh manual diaphragm valve and an eighth manual diaphragm valve. Among them, the seventh manual diaphragm valve is arranged at the buffer air inlet of the buffer element 1001 and is used for manually controlling the flow between the third output element and the buffer element 1001; the eighth manual diaphragm valve is arranged at the buffer air outlet of the buffer element 1001 and is used for manually controlling the flow between the buffer element 1001 and the second output unit 1100.

[0123] In some of the embodiments, the tenth control valve element 1002 includes, but is not limited to, a diaphragm valve.

[0124] As Figure 6As shown, the second output unit 1100 includes a fourth output element, an eleventh control valve element 1101, a fifth output element, a twelfth control valve element 1102, at least one sixth output element, at least one thirteenth control valve element 1103, a third pressure regulating element 1104 and a seventh pressure monitoring element 1105. Among them, the fourth output element is connected to the first output unit 800 for conveying mixed gas; the eleventh control valve element 1101 is arranged on the fourth output element for controlling the circulation of the fourth output element; the fifth output element is respectively connected to the fourth output element and the buffer unit 1000 for conveying mixed gas; the twelfth control valve element 1102 is arranged on the fifth output element for controlling the circulation of the fifth output element; the sixth output element is respectively connected to the fifth output element and the process machine for conveying mixed gas; the thirteenth control valve element 1103 is respectively arranged on the corresponding sixth output element for controlling the circulation of the sixth output element; the third pressure regulating element 1104 is arranged on the fifth output element for adjusting the pressure of the fifth output element; the seventh pressure monitoring element 1105 and the fifth output element are used to monitor the upstream pressure and downstream pressure of the third pressure regulating element 1104.

[0125] Specifically, the first end of the fourth output element is in communication with the second end of the third output element, and the second end of the fourth output element is in communication with the fifth output element.

[0126] In some of the embodiments, the fourth output element includes but is not limited to a stainless steel tube.

[0127] Specifically, the eleventh control valve element 1101 includes a ninth manual diaphragm valve, wherein the ninth manual diaphragm valve is disposed at the fourth output element and is used to manually control the flow of the fourth output element.

[0128] In some of the embodiments, the eleventh control valve element 1101 includes, but is not limited to, a diaphragm valve.

[0129] Specifically, the first end of the fifth output element is communicated with the second end of the fourth output element and the buffer air outlet of the buffer element 1001 respectively, and the second end of the fifth output element is communicated with the sixth output element.

[0130] In some of the embodiments, the fifth output element includes but is not limited to a stainless steel tube.

[0131] Specifically, the twelfth control valve element 1102 includes a tenth manual diaphragm valve and a twelfth pneumatic diaphragm valve. The tenth manual diaphragm valve is arranged at the fifth output element for manually controlling the flow of the fifth output element; the twelfth pneumatic diaphragm valve is arranged at the fifth output element and is located downstream of the tenth manual diaphragm valve for automatically controlling the flow of the fifth output element.

[0132] In some of these embodiments, the twelfth control valve element 1102 includes, but is not limited to, a diaphragm valve.

[0133] Specifically, the number of the sixth output elements is several. The first ends of the several sixth output elements are connected in parallel with the second end of the fifth output element, and the second ends of the several sixth output elements are respectively communicated with corresponding process machines.

[0134] In some of these embodiments, the sixth output element includes, but is not limited to, a stainless steel pipe.

[0135] It should be noted that the number of the sixth output elements is adapted to the number of the process machines or the number of the air inlets of the process machines. It should be understood that the number of the sixth output elements is the same as the number of the process equipment or the number of the air inlets of the process equipment.

[0136] Specifically, the thirteenth control valve element 1103 includes an eleventh manual diaphragm valve. Among them, the eleventh manual diaphragm valve is arranged on the sixth output element and is used to manually control the flow of the sixth output element.

[0137] In some of these embodiments, the thirteenth control valve element 1103 includes, but is not limited to, a diaphragm valve.

[0138] It should be noted that the number of the thirteenth control valve elements 1103 is adapted to the number of the sixth delivery elements. It should be understood that the number of the thirteenth control valve elements 1103 is the same as the number of the sixth gas delivery elements, that is, the thirteenth control valve elements 1103 and the sixth gas delivery elements are in one-to-one correspondence.

[0139] Specifically, the third pressure regulating element 1104 is located downstream of the tenth manual diaphragm valve and upstream of the twelfth pneumatic diaphragm valve on the fifth output element.

[0140] In some of these embodiments, the third pressure regulating element 1104 includes, but is not limited to, a pressure regulating valve.

[0141] Specifically, the seventh pressure monitoring element 1105 includes a fifth pressure sensor and a sixth pressure sensor. Among them, the fifth pressure sensor is communicated with the fifth output element and is located upstream of the third pressure regulating element 1104 for real-time monitoring of the upstream pressure of the third pressure regulating element 1104; the sixth pressure sensor is communicated with the fifth output element and is located downstream of the third pressure regulating element 1104 for real-time monitoring of the downstream pressure of the third pressure regulating element 1104.

[0142] In some of these embodiments, the seventh pressure monitoring element 1105 includes, but is not limited to, a pressure sensor.

[0143] The usage method of this embodiment is as follows: When the first gas and the second gas are completely mixed by the first mixing element 301 and the second mixing element 401, manually open the fifth manual diaphragm valve and the seventh manual diaphragm valve to make the third output element communicate with the buffer element 1001, so that the mixed gas enters the buffer element 1001 for buffering, converting the high-pressure mixed gas into a low-pressure mixed gas; in addition, the mixed gas inside the buffer element 1001 can be further mixed evenly; Manually open the eighth manual diaphragm valve and the tenth manual diaphragm valve to allow the mixed gas in the buffer element 1001 to enter the fifth output element; The system turns on the third pressure regulating element 1104 to adjust the gas pressure inside the fifth output element so that the pressure of the mixed gas can meet the requirements of the subsequent process machine; When the air pressure detected by the sixth pressure sensor meets the requirements, the system opens the twelfth pneumatic diaphragm valve to connect the fifth output element and the sixth output element; Manually open the eleventh manual diaphragm valve, so that the sixth gas output element communicates with the process machine, and then the mixed gas can enter the process machine.

[0144] The advantages of this embodiment are that by setting a buffer unit to buffer the mixed gas, converting the high-pressure mixed gas into a low-pressure mixed gas, and further mixing the mixed gas evenly to improve the mixing efficiency; by setting a second output unit, the output air pressure of the mixed gas can be adjusted to adapt to the subsequent process equipment and improve the applicability.

[0145] Embodiment 4 This embodiment is a variant embodiment of Embodiments 1 to 3.

[0146] As Figure 7 shown, the gas mixing unit further includes a first analysis unit 1200 and a second analysis unit 1300. Among them, the first analysis unit 1200 is respectively connected to the first mixing unit 300 and the second mixing unit 400 for analyzing the concentration of the mixed gas; the second analysis unit 1300 is connected to the second output unit 1100 for analyzing the concentration of the mixed gas.

[0147] As Figure 8As shown in the figure, the first analysis unit 1200 includes a first analysis pipeline element, a first analysis element 1201, a fourteenth control valve element 1202, a third one-way valve element 1203, a fourth pressure regulating element 1204, and an eighth pressure monitoring element 1205. Among them, the first analysis pipeline element is connected to the first output unit 800 and is used to transport the mixed gas; the first analysis element 1201 is connected to the first analysis pipeline element and is used to monitor the concentration of the mixed gas; the fourteenth control valve element 1202 is arranged on the first analysis pipeline element and is used to control the flow of the first analysis pipeline element; the third one-way valve element 1203 is arranged on the first analysis pipeline element and is located downstream of the fourteenth control valve element 1202 and is used to make the gas flow unidirectionally; the fourth pressure regulating element 1204 is arranged on the first analysis pipeline element and is used to regulate the pressure of the first analysis pipeline element; the eighth pressure monitoring element 1205 is connected to the first analysis pipeline element and is used to detect the pressure of the first analysis pipeline element.

[0148] Specifically, the first end of the first analysis pipeline element is connected to the third output element, and the connection between the first end of the first analysis pipeline element and the third output element is located downstream of the fifth manual diaphragm valve. The second end of the first analysis pipeline element is connected to the first analysis element 1201.

[0149] In some embodiments, the first analysis pipeline element includes, but is not limited to, a stainless steel pipe.

[0150] Specifically, the first analysis element 1201 includes a first transport pipeline, a first flowmeter, a first analyzer, a second transport pipeline, a second flowmeter, and a third transport pipeline. Among them, the first end of the first transport pipeline is connected to the second end of the first analysis pipeline element; the first flowmeter is arranged on the first transport pipeline and is used to regulate the flow rate of the mixed gas to adapt to the first analyzer; the first analyzer is connected to the second end of the first transport pipeline; the first end of the second transport pipeline is connected to the second end of the first analysis pipeline element, and the second end of the second transport pipeline is connected to the waste gas treatment equipment; the second flowmeter is arranged on the second transport pipeline and is used to directly discharge the excess mixed gas to the waste gas treatment equipment; the first end of the third transport pipeline is connected to the first analyzer, and the second end of the third transport pipeline is connected to the second transport pipeline, and the connection between the third transport pipeline and the second transport pipeline is located downstream of the second flowmeter.

[0151] In some embodiments, the first transport pipeline includes, but is not limited to, a stainless steel pipe.

[0152] In some embodiments, the first flowmeter includes, but is not limited to, a rotameter.

[0153] In some embodiments, the first analyzer includes, but is not limited to, a concentration analyzer.

[0154] In some of these embodiments, the second delivery pipeline includes, but is not limited to, a stainless steel pipe.

[0155] In some of these embodiments, the second flowmeter includes, but is not limited to, a float flowmeter.

[0156] In some of these embodiments, the third delivery pipeline includes, but is not limited to, a stainless steel pipe.

[0157] Specifically, the fourteenth control valve element 1202 includes a thirteenth pneumatic diaphragm valve. Among them, the thirteenth pneumatic diaphragm valve is arranged in the first analysis pipeline element for automatically controlling the flow of the first analysis pipeline element.

[0158] In some of these embodiments, the fourteenth control valve element 1202 includes, but is not limited to, a diaphragm valve.

[0159] In some of these embodiments, the third one-way valve element 1203 includes, but is not limited to, a one-way valve.

[0160] Specifically, the fourth pressure regulating element 1204 is located downstream of the third one-way valve element 1203.

[0161] In some of these embodiments, the fourth pressure regulating element 1204 includes, but is not limited to, a pressure regulating valve.

[0162] Specifically, the eighth pressure monitoring element 1205 includes a third pressure gauge. Among them, the third pressure gauge is communicated with the first analysis pipeline element, and the communication point between the third pressure gauge and the first analysis pipeline element is located downstream of the fourth pressure regulating element 1204.

[0163] In some of these embodiments, the eighth pressure monitoring element 1205 includes, but is not limited to, a pressure gauge.

[0164] As Figure 8 shown, the second analysis unit 1300 includes a second analysis pipeline element, a second analysis element 1301, a fifteenth control valve element 1302, a fourth one-way valve element 1303, a fifth pressure regulating element 1304, and a ninth pressure monitoring element 1305. Among them, the second analysis pipeline element is communicated with the second output unit 1100 for delivering the mixed gas; the second analysis element 1301 is communicated with the second analysis pipeline element for monitoring the concentration of the mixed gas; the fifteenth control valve element 1302 is arranged in the second analysis pipeline element for controlling the flow of the second analysis pipeline element; the fourth one-way valve element 1303 is arranged in the second analysis pipeline element and is located downstream of the fifteenth control valve element 1302 for enabling the gas to flow unidirectionally; the fifth pressure regulating element 1304 is arranged in the second analysis pipeline element for regulating the pressure of the second analysis pipeline element; the ninth pressure monitoring element 1305 is communicated with the second analysis pipeline element for detecting the pressure of the second analysis pipeline element.

[0165] Specifically, the first end of the second analysis pipeline element is in communication with the fifth output element, and the connection between the first end of the second analysis pipeline element and the fifth output element is located downstream of the sixth pressure sensor. The second end of the second analysis pipeline element is in communication with the second analysis element 1301.

[0166] In some embodiments thereof, the second analysis pipeline element includes, but is not limited to, a stainless steel pipe.

[0167] Specifically, the second analysis element 1301 includes a fourth delivery pipeline, a third flowmeter, a second analyzer, a fifth delivery pipeline, a fourth flowmeter, and a sixth delivery pipeline. Among them, the first end of the fourth delivery pipeline is in communication with the second end of the second analysis pipeline element; the third flowmeter is disposed in the fourth delivery pipeline for adjusting the flow rate of the mixed gas to match the second analyzer; the second analyzer is in communication with the second end of the fourth delivery pipeline; the first end of the fifth delivery pipeline is in communication with the second end of the second analysis pipeline element, and the second end of the fifth delivery pipeline is in communication with the waste gas treatment device; the fourth flowmeter is disposed in the fifth delivery pipeline for directly discharging the excess mixed gas to the waste gas treatment device; the first end of the sixth delivery pipeline is in communication with the second analyzer, and the second end of the sixth delivery pipeline is in communication with the fifth delivery pipeline, and the connection between the sixth delivery pipeline and the fifth delivery pipeline is located downstream of the fourth flowmeter.

[0168] In some embodiments thereof, the fourth delivery pipeline includes, but is not limited to, a stainless steel pipe.

[0169] In some embodiments thereof, the third flowmeter includes, but is not limited to, a rotameter.

[0170] In some embodiments thereof, the second analyzer includes, but is not limited to, a concentration analyzer.

[0171] In some embodiments thereof, the fifth delivery pipeline includes, but is not limited to, a stainless steel pipe.

[0172] In some embodiments thereof, the fourth flowmeter includes, but is not limited to, a rotameter.

[0173] In some embodiments thereof, the sixth delivery pipeline includes, but is not limited to, a stainless steel pipe.

[0174] Specifically, the fifteenth control valve element 1302 includes a fourteenth pneumatic diaphragm valve. Among them, the fourteenth pneumatic diaphragm valve is disposed in the second analysis pipeline element for automatically controlling the flow of the second analysis pipeline element.

[0175] In some embodiments thereof, the fifteenth control valve element 1302 includes, but is not limited to, a diaphragm valve.

[0176] In some of these embodiments, the fourth one-way valve element 1303 includes, but is not limited to, a one-way valve.

[0177] Specifically, the fifth pressure regulating element 1304 is located downstream of the fourth one-way valve element 1303.

[0178] In some of these embodiments, the fifth pressure regulating element 1304 includes, but is not limited to, a pressure regulating valve.

[0179] Specifically, the ninth pressure monitoring element 1305 includes a fourth pressure gauge. Among them, the fourth pressure gauge is connected to the second analysis pipeline element, and the connection between the fourth pressure gauge and the second analysis pipeline element is located downstream of the fifth pressure regulating element 1304.

[0180] In some of these embodiments, the ninth pressure monitoring element 1305 includes, but is not limited to, a pressure gauge.

[0181] The usage method of this embodiment is as follows: After the first gas and the second gas are mixed through the first mixing unit 300 and the second mixing unit 400 to obtain a mixed gas, the system opens the thirteenth pneumatic diaphragm valve, so that the mixed gas enters the first analysis pipeline element; The system opens the fourth pressure regulating element 1204, so that the pressure of the mixed gas transported to the first flowmeter meets the standard. The mixed gas after pressure regulation can be adjusted by the first flowmeter so that the flow rate of the mixed gas transported to the first analyzer meets the standard, so that the first analyzer can detect the mixed gas until the concentration of the mixed gas meets the standard; When the concentration of the mixed gas reaches the preset standard, the system closes the thirteenth pneumatic diaphragm valve and opens the seventh manual diaphragm valve, so that the mixed gas enters the buffer element 1001 for buffering and secondary mixing; Open the eighth manual diaphragm valve and the tenth manual diaphragm valve, so that the mixed gas flows into the fifth output element. The system opens the third pressure regulating element 1104, so that the air pressure in the fifth input element can meet the requirements of subsequent process machines; The system opens the fourteenth pneumatic diaphragm valve, so that the mixed gas enters the second analysis pipeline element; The system opens the fifth pressure regulating element 1304, so that the pressure of the mixed gas transported to the third flowmeter meets the standard. The mixed gas after pressure regulation can be adjusted by the third flowmeter so that the flow rate of the mixed gas transported to the second analyzer meets the standard, so that the second analyzer can detect the mixed gas until the concentration of the mixed gas meets the standard.

[0182] The advantage of this embodiment is that by setting the first analysis unit and the second analysis unit, the concentration of the mixed gas in the third output element and the fifth output element can be detected, so that the mixing accuracy can be effectively controlled during the whole gas mixing process.

[0183] Example 5 This example is a variant example of Examples 1 to 4.

[0184] As Figure 9 shown, the gas mixing unit further includes an exhaust gas discharging unit 1400 and a purging unit 1500. Among them, the exhaust gas discharging unit 1400 is respectively communicated with the first pressure relief unit 500, the second pressure relief unit 600, the first output unit 800, the second output unit 1100, the buffer unit 1000, the first analysis unit 1200 and the second analysis unit 1300 for discharging exhaust gas; the purging unit 1500 is respectively communicated with the second gas input unit 200 and the exhaust gas discharging unit 1400 for purging the whole pipeline.

[0185] As Figure 10 shown, the exhaust gas discharging unit 1400 includes a first discharge pipeline element, a second discharge pipeline element, a third discharge pipeline element, a fourth discharge pipeline element, a fifth discharge pipeline element and a sixth discharge pipeline element. Among them, the first discharge pipeline element is respectively communicated with the first pressure relief unit 500, the second pressure relief unit 600 and the first output unit 800 for transporting gas; the second discharge pipeline element is communicated with the second output unit 1100 for transporting gas; the first end of the third discharge pipeline element is respectively communicated with the second end of the first discharge pipeline element and the second end of the second discharge pipeline element, and the second end of the third discharge pipeline element is communicated with the exhaust gas treatment equipment for transporting gas; the first end of the fourth discharge pipeline element is communicated with the buffer unit 1000, and the second end of the fourth discharge pipeline element is communicated with the first discharge pipeline element for transporting gas; the first end of the fifth discharge pipeline element is communicated with the first analysis unit 1200, and the second end of the fifth discharge pipeline element is communicated with the first discharge pipeline element for transporting gas; the first end of the sixth discharge pipeline element is communicated with the second analysis unit 1300, and the second end of the sixth discharge pipeline element is communicated with the second discharge pipeline element for transporting gas.

[0186] Specifically, the first end of the first discharge pipeline element is communicated with the third gas output element, and the connection between the first end of the first discharge pipeline element and the third gas output element is located downstream of the fifth manual diaphragm valve and upstream of the first analysis pipeline element.

[0187] In some of these embodiments, the first discharge pipeline element includes but is not limited to a stainless steel pipe.

[0188] It should be noted that the second ends of the first pressure relief pipeline element and the second pressure relief pipeline element are communicated with the first discharge pipeline element, so that the gas for internal pressure relief of the first mixing element 301 and the second mixing element 401 can be discharged through the first discharge pipeline element.

[0189] Specifically, the first end of the second discharge pipeline element communicates with the fifth output element, and the connection between the first end of the second discharge pipeline element and the fifth output element is located downstream of the sixth pressure sensor and upstream of the twelfth pneumatic diaphragm valve.

[0190] In some embodiments thereof, the second discharge pipeline element includes, but is not limited to, a stainless steel pipe.

[0191] In some embodiments thereof, the third discharge pipeline element includes, but is not limited to, a stainless steel pipe.

[0192] In some embodiments thereof, the fourth discharge pipeline element includes, but is not limited to, a stainless steel pipe.

[0193] In some embodiments thereof, the fifth discharge pipeline element includes, but is not limited to, a stainless steel pipe.

[0194] In some embodiments thereof, the sixth discharge pipeline element includes, but is not limited to, a stainless steel pipe.

[0195] Further, the exhaust gas discharge unit 1400 further includes a sixteenth control valve element 1401, a fifth check valve element 1402, a seventeenth control valve element 1403, an eighteenth control valve element 1404, a sixth check valve element 1405, a seventh check valve element 1406, and an eighth check valve element 1407. Among them, the sixteenth control valve element 1401 is disposed on the first discharge pipeline element for controlling the flow of the first discharge pipeline element; the fifth check valve element 1402 is disposed on the first discharge pipeline element and is located downstream of the sixteenth control valve element 1401 for enabling the gas inside the first discharge pipeline element to flow unidirectionally; the seventeenth control valve element 1403 is disposed on the second discharge pipeline element for controlling the flow of the second discharge pipeline element; the eighteenth control valve element 1404 is disposed on the third discharge pipeline element for controlling the flow of the third discharge pipeline element; the sixth check valve element 1405 is disposed on the fourth discharge pipeline element for enabling the gas inside the fourth discharge pipeline element to flow unidirectionally; the seventh check valve element 1406 is disposed on the fifth discharge pipeline element for enabling the gas inside the fifth discharge pipeline element to flow unidirectionally; the eighth check valve element 1407 is disposed on the sixth discharge pipeline element for enabling the gas inside the sixth discharge pipeline element to flow unidirectionally.

[0196] Specifically, the sixteenth control valve element 1401 includes a fifteenth pneumatic diaphragm valve. Among them, the fifteenth pneumatic diaphragm valve is disposed on the first discharge pipeline element for automatically controlling the flow of the first discharge pipeline element.

[0197] In some embodiments thereof, the sixteenth control valve element 1401 includes, but is not limited to, a diaphragm valve.

[0198] In some of these embodiments, the fifth one-way valve element 1402 includes, but is not limited to, a one-way valve.

[0199] Specifically, the seventeenth control valve element 1403 includes a twelfth manual diaphragm valve. The twelfth manual diaphragm valve is disposed in the second discharge pipeline element for manually controlling the flow of the second discharge pipeline element.

[0200] In some of these embodiments, the seventeenth control valve element 1403 includes, but is not limited to, a diaphragm valve.

[0201] Specifically, the eighteenth control valve element 1404 includes a thirteenth manual diaphragm valve. The thirteenth manual diaphragm valve is disposed in the third discharge pipeline element for manually controlling the flow of the third discharge pipeline element.

[0202] In some of these embodiments, the eighteenth control valve element 1404 includes, but is not limited to, a diaphragm valve.

[0203] In some of these embodiments, the sixth one-way valve element 1405 includes, but is not limited to, a one-way valve.

[0204] In some of these embodiments, the seventh one-way valve element 1406 includes, but is not limited to, a one-way valve.

[0205] In some of these embodiments, the eighth one-way valve element 1407 includes, but is not limited to, a one-way valve.

[0206] As Figure 11 shown, the purging unit 1500 includes a purging input element, a first purging output element, a second vacuum element 1501, a second purging output element, and a motive gas supply element. The first end of the purging input element is in communication with a purging gas source, and the second end of the purging input element is in communication with the second gas input unit 200 for transporting purging gas; the first end of the first purging output element is in communication with the exhaust gas discharging unit 1400 for transporting exhaust gas; the second vacuum element 1501 is in communication with the second end of the first purging output element for forming a vacuum negative pressure at the end of the first purging output element; the first end of the second purging output element is in communication with the second vacuum element 1501, and the second end of the second purging output element is in communication with an exhaust gas treatment device for transporting exhaust gas; the first end of the motive gas supply element is in communication with a motive gas source, and the second end of the motive gas supply element is in communication with the second vacuum element 1501 for supplying motive gas to the second vacuum element 1501.

[0207] It should be noted that the purging gas source includes, but is not limited to, an LPN2 gas source.

[0208] It should be noted that the motive gas source includes, but is not limited to, a GN2 gas source.

[0209] Specifically, the second end of the purging input element is in communication with the second gas input element, and the connection between the second end of the purging input element and the second gas input element is located between the second pressure regulating element 202 and the fourth manual diaphragm valve.

[0210] Specifically, the first end of the first purging output element is in communication with the first end of the third discharge pipeline element.

[0211] In some embodiments thereof, the purging input element includes, but is not limited to, a stainless steel pipe.

[0212] In some embodiments thereof, the first purging output element includes, but is not limited to, a stainless steel pipe.

[0213] In some embodiments thereof, the second vacuum element 1501 includes, but is not limited to, a Venturi vacuum pump.

[0214] In some embodiments thereof, the second purging output element includes, but is not limited to, a stainless steel pipe.

[0215] In some embodiments thereof, the motive gas supply element includes, but is not limited to, a stainless steel pipe.

[0216] Furthermore, the purging unit 1500 further includes a nineteenth control valve element 1502, a ninth one-way valve element 1503, a twentieth control valve element 1504, a twenty-first control valve element 1505, and a twenty-second control valve element 1506. Among them, the nineteenth control valve element 1502 is disposed on the purging input element for controlling the flow through the purging input element; the ninth one-way valve element 1503 is disposed on the purging input element for enabling the gas in the purging input element to flow unidirectionally; the twentieth control valve element 1504 is disposed on the first purging output element for controlling the flow through the first purging output element; the twenty-first control valve element 1505 is disposed on the second purging output element for controlling the flow through the second purging output element; the twenty-second control valve element 1506 is disposed on the motive gas supply element for controlling the flow through the motive gas supply element.

[0217] Specifically, the nineteenth control valve element 1502 includes a fourteenth manual diaphragm valve and a sixteenth pneumatic diaphragm valve. Among them, the fourteenth manual diaphragm valve is disposed on the purging input element for manually controlling the flow through the purging input element; the sixteenth pneumatic diaphragm valve is disposed on the purging input element and is located downstream of the fourteenth manual diaphragm valve for automatically controlling the flow through the purging input element.

[0218] In some embodiments thereof, the nineteenth control valve element 1502 includes, but is not limited to, a diaphragm valve.

[0219] Specifically, the ninth check valve element 1503 is located downstream of the fourteenth manual diaphragm valve and upstream of the sixteenth pneumatic diaphragm valve on the purging input element.

[0220] In some of these embodiments, the ninth check valve element 1503 includes, but is not limited to, a check valve.

[0221] Specifically, the twentieth control valve element 1504 includes the fifteenth manual diaphragm valve. Among them, the fifteenth manual diaphragm valve is arranged on the first purging output element for manually controlling the flow of the first purging output element.

[0222] In some of these embodiments, the twentieth control valve element 1504 includes, but is not limited to, a diaphragm valve.

[0223] Specifically, the twenty - first control valve element 1505 includes the sixteenth manual diaphragm valve. Among them, the sixteenth manual diaphragm valve is arranged on the second purging output element for manually controlling the flow of the second purging output element.

[0224] In some of these embodiments, the twenty - first control valve element 1505 includes, but is not limited to, a diaphragm valve.

[0225] Specifically, the twenty - second control valve element 1506 includes the seventeenth manual diaphragm valve. Among them, the seventeenth manual diaphragm valve is arranged on the power gas supply element for manually controlling the flow of the power gas supply element.

[0226] In some of these embodiments, the twenty - second control valve element 1506 includes, but is not limited to, a diaphragm valve.

[0227] The usage method of this embodiment is as follows: When the entire system is in the mixed operation state, the thirteenth manual diaphragm valve is in the normally open state. Thus, when adjusting the pressure of the first mixing element 301 and the second mixing element 401, the first pressure relief pipeline element and the second pressure relief pipeline element can discharge the excess gas through the first discharge pipeline element and the third discharge pipeline element in sequence; when it is necessary to empty the buffer element 1001, the mixed gas in the buffer element 1001 can flow through the fourth discharge pipeline element, the first discharge pipeline element, and the third discharge pipeline element to the waste gas treatment equipment in sequence; the excess mixed gas in the first analysis element 1201 can flow through the fifth discharge pipeline element, the first exhaust pipeline element, and the third discharge pipeline element to the waste gas treatment equipment in sequence; the excess mixed gas in the second analysis element 1301 can flow through the sixth discharge pipeline element, the second exhaust pipeline element, and the third discharge pipeline element to the waste gas treatment equipment in sequence. In order to ensure the accuracy of the gas mixing concentration of the gas mixing system, it is necessary to purge the overall pipeline of the system before gas mixing in the gas mixing system; Manually open the fourteenth manual diaphragm valve, the fourth manual diaphragm valve, the sixth manual diaphragm valve, the fifth manual diaphragm valve, the ninth manual diaphragm valve, the tenth manual diaphragm valve, and the twelfth manual diaphragm valve, and the system opens the sixteenth pneumatic diaphragm valve, the fourth pneumatic diaphragm valve, the seventh pneumatic diaphragm valve, the second pneumatic diaphragm valve, and the fifth pneumatic diaphragm valve, so that the purge gas passes through the purge input element and the second gas input element to fill the first mixing element 301, the second mixing element 401, the first output element, the second output element, the third output element, the fourth output element, the fifth output element, and the second discharge pipeline element, and maintains the pressure for a period of time; Manually open the seventeenth manual diaphragm valve, so that the power gas can enter the second vacuum element 1501 through the power gas supply element, thereby providing power for the second vacuum element 1501; The system opens the second vacuum element 1501, and manually opens the fifteenth manual diaphragm valve and the sixteenth manual diaphragm valve. The second vacuum element 1501 forms a vacuum negative pressure at the end of the first purge output element, so that the purge gas in the entire pipeline can be discharged through the second purge output element.

[0228] The advantage of this embodiment is that by connecting the purge unit with the second gas input unit and the second output unit, the entire pipeline of the system can be purged before the gas mixing system performs gas mixing, thereby ensuring the accuracy of the gas mixing concentration of the gas mixing system.

[0229] Example 6 This embodiment is a variation of Embodiments 1 to 5.

[0230] like Figure 12 As shown, the gas mixing system further includes a third gas input unit 1600. The first end of the third gas input unit 1600 is connected to the third gas source, and the second end of the third gas input unit 1600 is respectively connected to the first analysis unit 1200 and the second analysis unit 1300 for delivering the third gas.

[0231] Among them, the first analysis unit 1200 is connected to the first gas input unit 100 and the third gas input unit 1600 respectively, and is used to perform zero gas calibration operations and standard gas calibration operations; the second analysis unit 1300 is connected to the first gas input unit 100 and the third gas input unit 1600 respectively, and is used to perform zero gas calibration operations and standard gas calibration operations.

[0232] like Figure 13As shown, the first gas input unit 100 further includes a third gas input element, a fourth gas input element, and a fifth gas input element. Among them, the third gas input element is in communication with the first gas input element for transporting the first gas; the fourth gas input element is respectively in communication with the third gas input element and the first analysis unit 1200 for transporting the first gas to the first analysis unit 1200 so that the first analysis unit 1200 can perform zero gas calibration operations; the fifth gas input element is respectively in communication with the third gas input element and the second analysis unit 1300 for transporting the first gas to the second analysis unit 1300 so that the second analysis unit 1300 can perform zero gas calibration operations.

[0233] Specifically, the connection point of the first end of the third gas input element and the first gas input element is located downstream of the first pressure sensor.

[0234] In some embodiments thereof, the third gas input element includes, but is not limited to, a stainless steel pipe.

[0235] Specifically, the first end of the fourth gas input element is in communication with the second end of the third gas input element, and the second end of the fourth gas input element is in communication with the first analysis pipeline element.

[0236] In some embodiments thereof, the fourth gas input element includes, but is not limited to, a stainless steel pipe.

[0237] Specifically, the first end of the fifth gas input element is in communication with the second end of the third gas input element, and the second end of the fifth gas input element is in communication with the second analysis pipeline element.

[0238] In some embodiments thereof, the fifth gas input element includes, but is not limited to, a stainless steel pipe.

[0239] Furthermore, the first gas input unit 100 further includes a twenty-third control valve element 105, a tenth one-way valve element 106, a twenty-fourth control valve element 107, and a twenty-fifth control valve element 108. Among them, the twenty-third control valve element 105 is disposed on the third gas input element for controlling the flow of the third gas input element; the tenth one-way valve element 106 is disposed on the third gas input element and is located downstream of the twenty-third control valve element 105 for enabling the gas to flow unidirectionally; the twenty-fourth control valve element 107 is disposed on the fourth gas input element for controlling the flow of the fourth gas input element; the twenty-fifth control valve element 108 is disposed on the fifth gas input element for controlling the flow of the fifth gas input element.

[0240] Specifically, the twenty-third control valve element 105 includes an eighteenth manual diaphragm valve. Among them, the eighteenth manual diaphragm valve is disposed on the third gas input element for manually controlling the flow of the third gas input element.

[0241] In some of these embodiments, the twenty-third control valve element 105 includes, but is not limited to, a diaphragm valve.

[0242] In some of these embodiments, the tenth one-way valve element 106 includes, but is not limited to, a one-way valve.

[0243] Specifically, the twenty-fourth control valve element 107 includes a nineteenth manual diaphragm valve. Among them, the nineteenth manual diaphragm valve is arranged on the fourth gas input element for manually controlling the flow of the fourth gas input element.

[0244] In some of these embodiments, the twenty-fourth control valve element 107 includes, but is not limited to, a diaphragm valve.

[0245] Specifically, the twenty-fifth control valve element 108 includes a twentieth manual diaphragm valve. Among them, the twentieth manual diaphragm valve is arranged on the fifth gas input element for manually controlling the flow of the fifth gas input element.

[0246] In some of these embodiments, the twenty-fifth control valve element 108 includes, but is not limited to, a diaphragm valve.

[0247] As Figure 13 shown, the third gas input unit 1600 includes a sixth gas input element. Among them, the sixth gas input element is respectively communicated with the standard gas source and the third gas input element, and is used to transport the standard gas to the first analysis unit 1200 and the second analysis unit 1300 so that the first analysis unit 1200 and the second analysis unit 1300 perform standard gas calibration.

[0248] Specifically, the first end of the sixth gas input element is communicated with the standard gas source, the second end of the sixth gas input element is communicated with the third gas input element, and the connection between the second end of the sixth gas input element and the third gas input element is located downstream of the tenth one-way valve.

[0249] In some of these embodiments, the sixth gas input element includes, but is not limited to, a stainless steel pipe.

[0250] Furthermore, the third gas input unit 1600 further includes a twenty-sixth control valve element 1601. Among them, the twenty-sixth control valve element 1601 is arranged on the sixth gas input element for controlling the flow of the sixth gas input element.

[0251] Specifically, the twenty-sixth control valve element 1601 includes a twenty-first manual diaphragm valve. Among them, the twenty-first manual diaphragm valve is arranged on the sixth gas input element for manually controlling the flow of the sixth gas input element.

[0252] The usage method of this embodiment is as follows: Before the system operates with the mixed gas, zero gas calibration and calibration gas calibration operations need to be performed on the first analysis unit 1200 and the second analysis unit 1300 to ensure detection accuracy and improve the instrument precision. (I) Zero gas calibration operation Manually open the eighteenth manual diaphragm valve, the nineteenth manual diaphragm valve, and the twentieth manual diaphragm valve, so that the first gas can enter the first analysis pipeline element and the second analysis pipeline element through the third gas input element, the fourth gas input element, and the fifth gas input element. The system turns on the fourth pressure regulating element 1204 and the fifth pressure regulating element 1304 to make the gas inside the first analysis pipeline element and the second analysis pipeline element meet the standards. The pressure-regulated gas can be adjusted by the first flow meter and the third flow meter respectively to make the flow rates delivered to the first analyzer and the second analyzer meet the standards, thereby achieving zero gas calibration for the first analyzer and the second analyzer. (II) Calibration gas calibration operation Manually open the twenty-first manual diaphragm valve, the nineteenth manual diaphragm valve, and the twentieth manual diaphragm valve, so that the calibration gas can enter the first analysis pipeline element and the second analysis pipeline element through the sixth gas input element, the third gas input element, the fourth gas input element, and the fifth gas input element. The system turns on the fourth pressure regulating element 1204 and the fifth pressure regulating element 1304 to make the gas inside the first analysis pipeline element and the second analysis pipeline element meet the standards. The pressure-regulated gas can be adjusted by the first flow meter and the third flow meter respectively to make the flow rates delivered to the first analyzer and the second analyzer meet the standards, thereby achieving zero gas calibration for the first analyzer and the second analyzer.

[0253] The advantage of this embodiment is that by connecting the first gas input unit and the third gas input unit to the first analysis unit and the second analysis unit, zero gas calibration and calibration gas calibration operations can be performed on the first analysis unit and the second analysis unit to ensure detection accuracy and improve the instrument precision.

[0254] Embodiment 7 This embodiment is a variant embodiment of Embodiments 1 to 6.

[0255] As Figure 14 shown, the gas mixing system further includes a standby mixed gas supply unit 1700. Among them, the standby mixed gas supply unit 1700 is connected to the second output unit 1100 and is used to deliver the mixed gas to the process machine.

[0256] As Figure 15As shown, the standby mixed gas supply unit 1700 includes standby gas supply pipeline components. Among them, the standby gas supply pipeline components are respectively connected to the standby gas source and the second output unit 1100, and are used to transport the mixed gas to the process equipment.

[0257] Specifically, the first end of the standby gas supply pipeline component is connected to the standby gas source, and the second end of the standby gas supply pipeline component is connected to the fifth output component.

[0258] In some of these embodiments, the standby gas supply pipeline component includes, but is not limited to, a stainless steel pipe.

[0259] Furthermore, the standby mixed gas supply unit 1700 further includes a twenty-seventh control valve component 1701. Among them, the twenty-seventh control valve component 1701 is arranged on the standby gas supply pipeline component and is used to control the flow of the standby gas supply pipeline component.

[0260] Specifically, the twenty-seventh control valve component 1701 includes a twenty-second manual diaphragm valve and a seventeenth pneumatic diaphragm valve. Among them, the twenty-second manual diaphragm valve is arranged on the standby gas supply pipeline component and is used to manually control the flow of the standby gas supply pipeline component; the seventeenth pneumatic diaphragm valve is arranged on the standby gas supply pipeline component and is located downstream of the twenty-second manual diaphragm valve, and is used to automatically control the flow of the standby gas supply pipeline component.

[0261] In some of these embodiments, the twenty-seventh control valve component 1701 includes, but is not limited to, a diaphragm valve.

[0262] The usage method of this embodiment is as follows: In the case of the interruption of the mixed gas supply due to a system failure, the twenty-second manual diaphragm valve is in the normally open state, and the system opens the seventeenth pneumatic diaphragm valve. The gas in the standby gas tank can flow to the standby gas supply pipeline component, so as to ensure that the subsequent process equipment can work normally in the case of the interruption of the mixed gas supply due to a system failure.

[0263] The advantage of this embodiment is that by connecting the standby mixed gas supply unit to the second output unit, the subsequent process machines can be ensured to work normally in the case of the interruption of the mixed gas supply due to a system failure.

[0264] Embodiment 8 This embodiment relates to the process equipment in the present invention.

[0265] A semiconductor process equipment includes a gas mixing system as described in Embodiments 1 to 7.

[0266] In addition, a semiconductor process equipment further includes a first gas supply device, a second gas supply device, a purge gas supply device, a calibration gas supply device, an exhaust gas treatment device, a motive gas supply device, and a standby gas supply device. Among them, the first gas supply device is communicated with the first gas input unit 100; the second gas supply device is communicated with the second gas input unit 200; the purge gas supply device is communicated with the purge unit 1500; the calibration gas supply device is communicated with the third gas input unit 1600; the exhaust gas treatment device is communicated with the exhaust gas discharge unit 1400; the motive gas supply device is communicated with the second vacuum element 1501 of the purge unit 1500; the standby gas supply device is communicated with the standby mixed gas supply unit 1700.

[0267] The usage method of this embodiment is basically the same as that of Embodiments 1 to 7, and will not be elaborated here.

[0268] The technical effects of this embodiment are basically the same as those of Embodiments 1 to 7, and will not be elaborated here.

[0269] Embodiment 9 This embodiment relates to the gas mixing method in the present invention.

[0270] A gas mixing method, applied to the gas mixing system as described in Embodiments 1 to 6 or the semiconductor process equipment as described in Embodiment 7, includes: The first gas input unit 100 acquires and conveys the first gas and supplies it to the first mixing unit 300; The second gas input unit 200 acquires and conveys the second gas and supplies it to the first mixing unit 300; Judge whether the pressure of the first mixing unit 300 reaches the first pressure preset threshold value and whether the pressure of the second mixing unit 400 reaches the second pressure preset threshold value; When the pressure of the first mixing unit 300 does not reach the first pressure preset threshold value and / or the pressure of the second mixing unit 400 does not reach the second preset pressure threshold value, the first pressure relief unit 500 and / or the second pressure relief unit 600 are opened to adjust the pressure of the first mixing unit 300 and / or the pressure of the second mixing unit 400 until the pressure of the first mixing unit 300 reaches the first pressure preset threshold value and / or the pressure of the second mixing unit 400 reaches the second pressure preset threshold value; When the pressure of the first mixing unit 300 reaches the first pressure preset threshold value and the pressure of the second mixing unit 400 reaches the second pressure preset threshold value, the mixing control unit 700 is opened to connect the first mixing unit 300 and the second mixing unit 400 and mix the first gas and the second gas to obtain a mixed gas; When the mixing is completed, the first output unit 800 acquires and outputs the mixed gas outward.

[0271] Specifically, the above gas mixing method can refer to the usage method of Embodiment 1.

[0272] Further, before determining whether the pressure of the first mixing unit 300 reaches the first pressure preset threshold and whether the pressure of the second mixing unit 400 reaches the second pressure preset threshold, it further includes: Turn on the temperature control unit 900, and adjust the temperature of the first mixing unit 300 and the temperature of the second mixing unit 400 until the temperature of the first mixing unit 300 reaches the temperature threshold and the temperature of the second mixing unit 400 reaches the temperature threshold.

[0273] After turning on the mixing control unit 700, it further includes: Turn on the temperature control unit 900, perform heating control and / or cooling control on the first mixing unit 300 and the second mixing unit 400 to achieve gas thermal convection.

[0274] Specifically, the above gas mixing method can refer to the usage method of Embodiment 2.

[0275] Further, after the first output unit 800 obtains and outputs the mixed gas, it further includes: The buffer unit 1000 obtains the mixed gas to reduce the pressure of the mixed gas and make the mixed gas fully mixed; The second output unit 1100 obtains the mixed gas and transports the mixed gas to the process machine.

[0276] Specifically, the above gas mixing method can refer to the usage method of Embodiment 3.

[0277] Further, the gas mixing method further includes: The first concentration analysis unit obtains the mixed gas transported by the first output unit 800 and detects the concentration of the mixed gas; The second concentration analysis unit obtains the mixed gas transported by the second output unit 1100 and detects the concentration of the mixed gas.

[0278] Specifically, the above gas mixing method can refer to the usage method of Embodiment 4.

[0279] Further, the gas mixing method further includes: The purging unit 1500 obtains the purging gas and transports the purging gas to the overall pipeline and equipment to purge the overall pipeline and equipment.

[0280] Specifically, the above gas mixing method can refer to the usage method of Embodiment 5.

[0281] Further, the gas mixing method further includes: The first gas input unit 100 transports the first gas to the first analysis unit 1200 and the second analysis unit 1300, realizing the zero gas calibration operation for the first analysis unit 1200 and the second analysis unit 1300; The third gas input unit 1600 transports the calibration gas to the first analysis unit 1200 and the second analysis unit 1300, realizing the calibration gas calibration operation for the first analysis unit 1200 and the second analysis unit 1300.

[0282] Specifically, the above gas mixing method can refer to the usage method in Embodiment 6.

[0283] Furthermore, the gas mixing method further includes: When the second output unit 1100 cuts off the supply of the mixed gas, the standby mixed gas supply unit 1700 can transport the second mixed gas to the process equipment.

[0284] Specifically, the above gas mixing method can refer to the usage method in Embodiment 7.

[0285] The technical effects of this embodiment are basically the same as those of Embodiments 1 to 7, and will not be elaborated here.

[0286] Embodiment 10 This embodiment relates to a specific implementation manner of the gas mixing system and method of the present invention.

[0287] As Figure 16 shown, the first gas input unit 100 includes manual diaphragm valves (MV1, MV2, MV18, MV19, MV20), a pressure regulating valve (PRV1), a check valve (RV10), pressure gauges (PG1, PG2), and a pressure sensor (PT1).

[0288] The second gas input unit 200 includes manual diaphragm valves (MV3, MV4), a pressure regulating valve (PRV2), pressure gauges (PG3, PG4), and a pressure sensor (PT2).

[0289] The first mixing unit 300 includes a container tank (GT1), pneumatic diaphragm valves (AV1, AV2, AV3), a pressure sensor (PT3), and a temperature sensor (W1).

[0290] The second mixing unit 400 includes a container tank (GT2), pneumatic diaphragm valves (AV4, AV5, AV6), a pressure sensor (PT4), and a temperature sensor (W2).

[0291] The first pressure relief unit 500 includes a pneumatic diaphragm valve (AV3) and a check valve (RV1).

[0292] The second pressure relief unit 600 includes a pneumatic diaphragm valve (AV6) and a check valve (RV2).

[0293] The mixing control unit 700 includes a pneumatic diaphragm valve (AV10).

[0294] The first output unit 800 includes manual diaphragm valves (MV5, MV6) and a vacuum pump (VG1).

[0295] The temperature control unit 900 includes pneumatic diaphragm valves (AV8, AV9, AV10, AV11) and temperature sensors (W1, W2).

[0296] The buffer unit 1000 includes a buffer tank and manual diaphragm valves (MV7, MV8).

[0297] The second output unit 1100 includes manual diaphragm valves (MV9, MV10), a pressure regulating valve (PRV3), and a manual diaphragm valve (AV12).

[0298] The first analysis unit 1200 includes a pneumatic diaphragm valve (AV13), a check valve (RV3), a pressure regulating valve (PRV4), a pressure gauge (PG3), and an analyzer (LP1).

[0299] The second analysis unit 1300 includes a pneumatic diaphragm valve (AV14), a check valve (RV4), a pressure regulating valve (PRV5), a pressure gauge (PG4), and an analyzer (LP2).

[0300] The exhaust gas emission unit 1400 includes a pneumatic diaphragm valve (AV15), manual diaphragm valves (MV12, MV13), and check valves (RV5, RV6, RV7, RV8).

[0301] The purging unit 1500 includes manual diaphragm valves (MV14, MV15, MV16, MV17), a pneumatic diaphragm valve (AV16), a check valve (RV9), and a Venturi vacuum pump (VG2).

[0302] The third gas input unit 1600 includes a cylinder and a manual diaphragm valve (MV21).

[0303] The standby mixed gas supply unit 1700 includes a manual diaphragm valve (MV22) and a pneumatic diaphragm valve (AV17).

[0304] Specifically, the large-flow gas mixing method of this embodiment is as follows: (1) Purging operation before gas mixing Manually open MV14, MV4, MV5, MV6, MV9, MV10, MV12. The system opens AV16, AV4, AV7, AV2, AV5, enabling the purge gas to fill GT1, GT2, the first output element, the second output element, the third output element, the fourth output element, the fifth output element, and the second discharge pipeline element through the purge input element and the second gas input element, and maintaining the pressure for a period of time. Manually open MV17, enabling the motive gas to enter VG2 through the motive gas supply element, thereby providing power for VG2. The system opens VG2 and manually opens MV15, MV16. VG2 forms a vacuum negative pressure at the end of the first purge output element, thereby enabling the purge gas in the overall pipeline to be discharged through the second purge output element.

[0305] (2) Mixed gas calibration operation Before the system performs the mixed gas operation, it is necessary to perform zero gas calibration and calibration gas calibration operations on LP1 and LP2 to ensure detection accuracy and improve instrument precision. Manually open MV18, MV19, MV20, enabling the first gas to enter the first analysis pipeline element and the second analysis pipeline element through the third gas input element, the fourth gas input element, and the fifth gas input element. The system opens PRV4 and PRV5, making the gas inside the first analysis pipeline element and the second analysis pipeline element meet the standards. The gas after pressure regulation can be adjusted by the first flowmeter and the third flowmeter respectively to make the flow rates delivered to LP1 and LP2 meet the standards, thereby achieving zero gas calibration for LP1 and LP2. Manually open MV21, MV19, MV20, enabling the calibration gas to enter the first analysis pipeline element and the second analysis pipeline element through the sixth gas input element, the third gas input element, the fourth gas input element, and the fifth gas input element. The system opens PRV4 and PRV5, making the gas inside the first analysis pipeline element and the second analysis pipeline element meet the standards. The gas after pressure regulation can be adjusted by the first flowmeter and the third flowmeter respectively to make the flow rates delivered to LP1 and LP2 meet the standards, thereby achieving zero gas calibration for LP1 and LP2.

[0306] (3) Mixed gas operation Manually open MV1 and MV3, enabling the first gas input element to be connected to the first gas source and the second gas input element to be connected to the second gas source. The system opens PRV1 and PRV2, PRV1 adjusts the pressure of the first gas in the first gas input element to 96.2 psi, and PRV2 adjusts the pressure of the second gas in the second gas input element to 4.2 psi; By observing PG2 and PG4, when the gas pressure in the first gas input element and the second gas input element meets the standard, MV2 and MV4 are manually opened and the system automatically opens AV1 and AV2, so that N2 and H2 enter the first mixing element 301 and the second mixing element 401 respectively; After the delivery of N2 and H2 is completed, the system closes AV1 and AV2, and observes the pressure inside the first mixing element 301 and the second mixing element 401 in real time through PT3 and PT4. When the pressure inside the first mixing element 301 and the second mixing element 401 does not meet the standard, the system opens AV5 and AV6, so that the gas pressure inside the first mixing element 301 is maintained at 96psi, and the gas pressure inside the second mixing element 401 is maintained at 4psi; When the adjustment is completed, the system closes AV5 and AV6 and opens AV7, using Dalton's law of partial pressure to achieve mixing of the first gas and the second gas; When the connecting pipeline element is turned on, the system starts the heat exchange device and turns on AV8, AV10 or AV9, AV11, so that the liquid in the heat exchange device flows into the first heat exchange cavity of GT1 or the second heat exchange cavity of GT2 through the first temperature control pipeline element, thereby heating GT1 or GT2 and realizing the initial heat convection between the first gas and the second gas; When the initial heat convection is completed, AV8, AV10 or AV9, AV11 are opened, so that the liquid in the heat exchange device flows into the first heat exchange cavity of GT1 or the second heat exchange cavity of GT2 through the first temperature control pipeline element, thereby cooling GT1 or GT2 and realizing the second heat convection between the first gas and the second gas; Repeat the above steps cyclically until the first gas and the second gas are fully mixed; After the gases in GT1 and GT2 are fully mixed, the system opens AV3, AV4 and VG1, forming a vacuum negative pressure at the first end of the third output element, thereby discharging the mixed gas in GT1 and GT2 through the first output element and the second output element; When GT1 and GT2 have finished mixing the first gas and the second gas, MV5 and MV7 are manually opened to allow the third output element to flow with the Buffer Vessel, so that the mixed gas enters the Buffer Vessel for buffering, and the high-pressure mixed gas is converted into a low-pressure mixed gas; in addition, the mixed gas inside the Buffer Vessel can be further mixed evenly; Manually open MV8 and MV10 so that the mixed gas in the Buffer Vessel can enter the fifth output element; The system opens PRV3 to adjust the gas pressure inside the fifth output element so that the pressure of the mixed gas can meet the requirements of subsequent process machines; When the air pressure detected by PT6 meets the requirements, the system opens AV12 to connect the fifth output element and the sixth output element; Manually open MV11, so that the sixth gas output element is connected to the process machine, and then the mixed gas can enter the process machine.

[0307] (4) Backup gas supply In the case of interrupted supply of the mixed gas due to system failure, the MV22 valve is in the normally open state. The system opens AV17, and the gas in the backup gas tank can flow to the backup gas supply pipeline element, so as to ensure that the subsequent process equipment can work normally in the case of interrupted supply of the mixed gas due to system failure.

[0308] The technical features of the above embodiments can be combined arbitrarily. For the sake of brevity of description, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, it should be considered as the scope described in this specification.

[0309] The above embodiments only represent several implementation manners of the present application, and their descriptions are relatively specific and detailed, but they should not be construed as limiting the scope of the invention patent. It should be noted that for those of ordinary skill in the art, without departing from the concept of the present application, several deformations and improvements can still be made, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent of the present application shall be subject to the appended claims.

Claims

1. A gas mixing system, characterized in that, Comprising: A first gas input unit, which is in communication with a first gas source and is used for transporting a first gas; A second gas input unit, which is in communication with a second gas source and is used for transporting a second gas; A first mixing unit, which is in communication with the first gas input unit and is used for storing the first gas and mixing the first gas with the second gas; A second mixing unit, which is in communication with the second gas input unit and is used for storing the second gas and mixing the second gas with the first gas; A first pressure relief unit, which is in communication with the first mixing unit and is used for controlling the pressure of the first mixing unit by pressure relief so that the pressure of the first gas meets the mixing requirements; A second pressure relief unit, which is in communication with the second mixing unit and is used for controlling the pressure of the second mixing unit by pressure relief so that the pressure of the second gas meets the mixing requirements; A mixing control unit, which is respectively in communication with the first mixing unit and the second mixing unit and is used for enabling the first mixing unit to be in communication with the second mixing unit to mix the first gas with the second gas in an open state; A first output unit, which is respectively in communication with the first mixing unit and the second mixing unit and is used for outputting the mixed gas after the first gas and the second gas are mixed to the outside.

2. The gas mixing system according to claim 1, wherein The first gas input unit includes: A first gas input element, which is respectively in communication with the first gas source and the first mixing unit and is used for transporting the first gas; A first control valve element, which is arranged on the first gas input element and is used for controlling the flow of the first gas input element; A first pressure regulating element, which is arranged on the first gas input element and is used for regulating the pressure of the first gas input element; A first pressure monitoring element, which is in communication with the first gas input element and is used for monitoring the upstream pressure and downstream pressure of the first pressure regulating element; A second pressure monitoring element, which is in communication with the first gas input element and is used for monitoring the pressure of the first gas flowing into the first mixing unit; and / or The second gas input unit includes: A second gas input element, which is respectively in communication with the second gas source and the second mixing unit and is used for transporting the second gas; A second control valve element, which is arranged on the second gas input element and is used for controlling the flow of the second gas input element; A second pressure regulating element, which is arranged on the second gas input element and is used for regulating the pressure of the second gas input element; A third pressure monitoring element, which is in communication with the second gas input element and is used for monitoring the upstream pressure and downstream pressure of the second pressure regulating element; A fourth pressure monitoring element, which is in communication with the second gas input element and is used for monitoring the pressure of the second gas flowing into the second mixing unit; and / or The first mixing unit includes: A first mixing element that is respectively connected to the first gas input unit, the first pressure relief unit, the mixing control unit, and the first output unit, and is used for storing the first gas and mixing the first gas with the second gas; A third control valve element that is arranged on the first mixing element and is used for controlling the flow of the first mixing element; A fifth pressure monitoring element that is connected to the first mixing element and is used for monitoring the pressure of the first mixing element; and / or The second mixing unit includes: A second mixing element that is respectively connected to the second gas input unit, the second pressure relief unit, the mixing control unit, and the first output unit, and is used for storing the second gas and mixing the second gas with the first gas; A fourth control valve element that is arranged on the second mixing element and is used for controlling the flow of the second mixing element; A sixth pressure monitoring element that is connected to the second mixing element and is used for monitoring the pressure of the second mixing element; and / or The first pressure relief unit includes: A first pressure relief pipeline element that is respectively connected to the first mixing unit and the waste gas treatment equipment and is used for transporting the first gas; A first check valve element that is arranged on the first pressure relief pipeline element and is used for enabling the gas to flow unidirectionally; and / or The second pressure relief unit includes: A second pressure relief pipeline element that is respectively connected to the second mixing unit and the waste gas treatment equipment and is used for transporting the second gas; A second check valve element that is arranged on the second pressure relief pipeline element and is used for enabling the gas to flow unidirectionally; and / or The mixing control unit includes: A connecting pipeline element that is respectively connected to the first mixing unit and the second mixing unit and is used for mixing the first gas with the second gas; A fifth control valve element that is arranged on the connecting pipeline element and is used for controlling the flow of the connecting pipeline element; and / or The first output unit includes: A first output element that is connected to the first mixing unit and is used for transporting the mixed gas; A second output element that is connected to the second mixing unit and is used for transporting the mixed gas; A third output element that is respectively connected to the first output element and the second output element and is used for transporting the mixed gas; A first vacuum element that is arranged on the third output element and is used for performing vacuum treatment on the first mixing unit and the second mixing unit; A sixth control valve element that is arranged on the third output element and is located downstream of the first vacuum element and is used for controlling the flow of the third output element; A bypass pipeline element, which is in communication with the third output element, and the two ends of the bypass pipeline element are respectively located upstream and downstream of the first vacuum element at the communication points with the third output element, for conveying the mixed gas outwards; A seventh control valve element, which is arranged on the bypass pipeline element for controlling the flow of the bypass pipeline element.

3. The gas mixing system according to any one of claims 1 to 2, characterized in that, It further includes: A temperature control unit, which is respectively in communication with the first mixing unit and the second mixing unit for controlling the temperature of the first mixing unit and the second mixing unit; and / or A buffer unit, which is in communication with the first output unit for buffering the mixed gas; A second output unit, which is respectively in communication with the buffer unit, the first output unit and a process machine for outputting the mixed gas.

4. The gas mixing system according to claim 3, wherein The temperature control unit includes: A first temperature control pipeline element, which is respectively in communication with the first mixing unit, the second mixing unit and a heat exchange device for conveying a liquid with a first temperature from the heat exchange device to the first mixing unit and the second mixing unit; A second temperature control pipeline element, which is respectively in communication with the first mixing unit, the second mixing unit and a heat exchange device for conveying a liquid with a second temperature from the first mixing unit and the second mixing unit to the heat exchange device; An eighth control valve element, which is arranged on the first mixing unit for controlling the flow of the first temperature control pipeline element, the second temperature control pipeline element and the first mixing unit; A ninth control valve element, which is arranged on the second mixing unit for controlling the flow of the first temperature control pipeline element, the second temperature control pipeline element and the second mixing unit; The first mixing unit further includes: A first temperature monitoring element, which is in communication with the first mixing unit for monitoring the temperature of the first mixing unit; The second mixing unit further includes: A second temperature monitoring element, which is in communication with the second mixing unit for monitoring the temperature of the second mixing unit; and / or The buffer unit includes: A buffer element, which is respectively in communication with the first output unit and the second output unit for buffering the mixed gas; A tenth control valve element, which is arranged on the buffer element for controlling the flow of the buffer element; and / or The second output unit includes: A fourth output element, which is in communication with the first output unit for conveying the mixed gas; An eleventh control valve element, which is arranged on the fourth output element for controlling the flow of the fourth output element; A fifth output element, which is respectively in communication with the fourth output element and the buffer unit for conveying the mixed gas; A twelfth control valve element, which is arranged on the fifth output element for controlling the flow of the fifth output element; At least one sixth output element, which is respectively connected to the fifth output element and the processing machine tool and is used for transporting the mixed gas; At least one thirteenth control valve element, which is respectively arranged on the corresponding sixth output element and is used for controlling the flow of the sixth output element; A third pressure regulating element, which is arranged on the fifth output element and is used for regulating the pressure of the fifth output element; A seventh pressure monitoring element, which is connected to the fifth output element and is used for monitoring the upstream pressure and downstream pressure of the third pressure regulating element.

5. The gas mixing system according to claim 3, wherein It further includes: A first analysis unit, which is respectively connected to the first mixing unit and the second mixing unit and is used for analyzing the concentration of the mixed gas; A second analysis unit, which is connected to the second output unit and is used for analyzing the concentration of the mixed gas.

6. The gas mixing system according to claim 5, characterized in that, The first analysis unit includes: A first analysis pipeline element, which is connected to the first output unit and is used for transporting the mixed gas; A first analysis element, which is connected to the first analysis pipeline element and is used for monitoring the concentration of the mixed gas; A fourteenth control valve element, which is arranged on the first analysis pipeline element and is used for controlling the flow of the first analysis pipeline element; A third one-way valve element, which is arranged on the first analysis pipeline element and is located downstream of the fourteenth control valve element and is used for making the gas flow unidirectionally; A fourth pressure regulating element, which is arranged on the first analysis pipeline element and is used for regulating the pressure of the first analysis pipeline element; An eighth pressure monitoring element, which is connected to the first analysis pipeline element and is used for detecting the pressure of the first analysis pipeline element; and / or The second analysis unit includes: A second analysis pipeline element, which is connected to the second output unit and is used for transporting the mixed gas; A second analysis element, which is connected to the second analysis pipeline element and is used for monitoring the concentration of the mixed gas; A fifteenth control valve element, which is arranged on the second analysis pipeline element and is used for controlling the flow of the second analysis pipeline element; A fourth one-way valve element, which is arranged on the second analysis pipeline element and is located downstream of the fifteenth control valve element and is used for making the gas flow unidirectionally; A fifth pressure regulating element, which is arranged on the second analysis pipeline element and is used for regulating the pressure of the second analysis pipeline element; A ninth pressure monitoring element, which is connected to the second analysis pipeline element and is used for detecting the pressure of the second analysis pipeline element.

7. A semiconductor process equipment, characterized in that, It includes: The gas mixing system according to any one of claims 1 to 6.

8. A gas mixing method, characterized in that, Applied to the gas mixing system according to any one of claims 1 to 6 or the semiconductor process equipment according to claim 7, it includes: The first gas input unit acquires and transports the first gas to the first mixing unit; The second gas input unit obtains and delivers the second gas to the second mixing unit; Determine whether the pressure of the first mixing unit reaches a first preset pressure threshold, and whether the pressure of the second mixing unit reaches a second preset pressure threshold; When the pressure of the first mixing unit does not reach the first preset pressure threshold and / or the pressure of the second mixing unit does not reach the second preset pressure threshold, the first pressure relief unit and / or the second pressure relief unit are opened to adjust the pressure of the first mixing unit and / or the pressure of the second mixing unit until the pressure of the first mixing unit reaches the first preset pressure threshold and / or the pressure of the second mixing unit reaches the second preset pressure threshold; When the pressure of the first mixing unit reaches a first preset pressure threshold and the pressure of the second mixing unit reaches a second preset pressure threshold, the mixing control unit is turned on to connect the first mixing unit with the second mixing unit and mix the first gas with the second gas to obtain a mixed gas; When the mixing is completed, the first output unit obtains and outputs the mixed gas to the outside.

9. The gas mixing method according to claim 8, wherein Before determining whether the pressure of the first mixing unit reaches the first preset pressure threshold and whether the pressure of the second mixing unit reaches the second preset pressure threshold, the method further includes: Turning on the temperature control unit to adjust the temperature of the first mixing unit and the temperature of the second mixing unit until the temperature of the first mixing unit reaches a temperature threshold and the temperature of the second mixing unit reaches a temperature threshold; and / or After turning on the hybrid control unit, it also includes: Turning on the temperature control unit to perform temperature increase and / or temperature decrease control on the first mixing unit and the second mixing unit to achieve gas heat convection; and / or After the first output unit acquires and outputs the mixed gas to the outside, the method further includes: The buffer unit obtains the mixed gas to reduce the pressure of the mixed gas and make the mixed gas fully mixed; The second output unit obtains the mixed gas and delivers the mixed gas to the process machine.

10. The gas mixing method according to claim 8 or 9, characterized in that, Also includes: The first concentration analysis unit obtains the mixed gas delivered by the first output unit and detects the concentration of the mixed gas; and / or The second concentration analysis unit obtains the mixed gas delivered by the second output unit and detects the concentration of the mixed gas.

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