A multi-mode switching low-temperature plasma device

Abstract

This application relates to the fields of beauty and medical device technology, and discloses a multi-mode switching low-temperature plasma device, including a protective shield, a helium source module, an atomization module, a low-temperature plasma module, a path selection module, a first mixing module, and a control module. The high-voltage electrode of the low-temperature plasma module is located inside the protective shield. The helium source module is connected to the protective shield through a first path of the path selection module and to the first mixing module through a second path of the same module. The atomization module is connected to the protective shield through the first mixing module. The path selection module, the first solenoid valve in the helium source module, the second solenoid valve in the atomization module, and the high-voltage circuit unit in the low-temperature plasma module are all controlled by the control module. This solves the technical problem of single-function low-temperature plasma devices in related technologies and achieves a multi-functional technical effect.

Description

Technical Field

[0001] This application relates to the fields of beauty and medical device technology, and in particular to a low-temperature plasma device with multi-mode switching. Background Technology

[0002] For some common skin problems, when medication is ineffective, some people choose to treat them with cosmetic or medical devices, which can achieve some improvement. However, some common cosmetic devices, such as radiofrequency ablation, picosecond lasers, and lasers, while effective, cause deeper skin trauma, cover larger treatment areas, and have longer healing and recovery periods, which can cause inconvenience to patients' lives and work. In contrast, low-temperature plasma technology has the advantages of minimal trauma, low temperature, and high safety. It only treats the skin surface, and the treatment has minimal impact on normal life and work afterward. However, among related technologies, low-temperature plasma devices have relatively limited functionality and cannot meet the diverse needs of different skin conditions, thus hindering their widespread adoption and application in the cosmetic medical industry. Summary of the Invention

[0003] This application provides a multi-mode switching low-temperature plasma device, which solves the technical problem of single function in related low-temperature plasma devices, achieves multi-functional technical effects, and can meet the diverse needs of different skin conditions.

[0004] To achieve the above objectives, the main technical solutions adopted in this application include:

[0005] In a first aspect, embodiments of this application provide a multi-mode switching cryogenic plasma device. The device includes a protective shield, a helium source module, an atomization module, a cryogenic plasma module, a path selection module, a first mixing module, and a control module. The high-voltage electrode of the cryogenic plasma module is located inside the protective shield. The helium source module is connected to the protective shield via a first path of the path selection module and to the first mixing module via a second path of the path selection module. The atomization module is connected to the protective shield via the first mixing module. The path selection module, the first solenoid valve in the helium source module, the second solenoid valve in the atomization module, and the high-voltage circuit unit in the cryogenic plasma module are all controlled by the control module. The control module is used to control the on / off state of the first solenoid valve, the on / off state of the second solenoid valve, the on / off state of the first and second paths in the path selection module, and the on / off state of the high-voltage circuit unit in response to an input mode switching command. When the first solenoid valve is on, only one of the first and second paths is on; when the second solenoid valve is off, the second path is also off.

[0006] The low-temperature plasma device provided in this application includes a protective shield, a helium source module, an atomization module, a low-temperature plasma module, a path selection module, a first mixing module, and a control module. The high-voltage electrode of the low-temperature plasma module is located inside the protective shield. The helium source module is connected to the protective shield via a first path of the path selection module and to the first mixing module via a second path of the path selection module. The atomization module is connected to the protective shield via the first mixing module. The path selection module, the first solenoid valve in the helium source module, the second solenoid valve in the atomization module, and the high-voltage electrode in the low-temperature plasma module are all part of the protective shield. All circuit units are controlled by the control module; the control module is used to control the on / off state of the first solenoid valve, the on / off state of the second solenoid valve, the on / off state of the first and second paths in the path selection module, and the on / off state of the high-voltage circuit unit in response to the input mode switching command; wherein, when the first solenoid valve is on, only one of the first and second paths is on; when the second solenoid valve is off, the second path is also off, which solves the technical problem of the single function of low-temperature plasma equipment in related technologies, realizes the technical effect of multi-functionality, and can meet the diverse needs of different skin conditions.

[0007] Optionally, the helium source module includes a helium tank, a first solenoid valve, a pressure gauge, and a first regulating valve connected in sequence. The first regulating valve is connected to the path selection module and is used to output the helium supplied in the helium tank through the first path or the second path.

[0008] Optionally, the high-voltage circuit unit is controlled by a foot switch in the control module, the high-voltage circuit unit is connected to the high-voltage electrode, the high-voltage electrode has a through hole, and the helium source module is connected to the through hole through the first path of the path selection module.

[0009] Optionally, the atomizing module further includes an air pump branch, a solution branch, an atomizing head, and a second mixing module, wherein the air pump branch and the solution branch are connected through the second mixing module, and the second mixing module is connected to the atomizing head disposed inside the protective cover through the first mixing module.

[0010] Optionally, the air pump branch includes an air pump, a second solenoid valve, and a second regulating valve connected in sequence; the solution branch includes a solution bottle and a third regulating valve; wherein the air pump is controlled by a handle switch in the control module.

[0011] Optionally, when the low-temperature plasma device is operating in the first mode, the high-voltage circuit unit is in the conducting state, and the first solenoid valve, the second solenoid valve, the first passage, and the second passage are all in the disconnected state.

[0012] Optionally, when the low-temperature plasma device is operating in the second mode, the second solenoid valve is in the on state, and the high-voltage circuit unit, the first solenoid valve, the first passage, and the second passage are all in the off state.

[0013] Optionally, when the low-temperature plasma device is operating in the third mode, the high-voltage circuit unit, the first solenoid valve, and the first passage are in a conducting state, while the second solenoid valve and the second passage are in a disconnected state.

[0014] Optionally, when the low-temperature plasma device is operating in the fourth mode, the first solenoid valve, the first passage, the high-voltage circuit unit, and the second solenoid valve are all in the on state, and the second passage is in the off state.

[0015] Optionally, when the low-temperature plasma device is operating in the fifth mode, the first solenoid valve, the second passage, the high-voltage circuit unit, and the second solenoid valve are all in the conducting state, and the first passage is in the disconnected state.

[0016] Optionally, when the low-temperature plasma device operates in the sixth mode, the sixth mode is composed of an alternating cycle of a first sub-mode and a second sub-mode. In the first sub-mode, the second solenoid valve is in the on state, and the first solenoid valve, the high-voltage circuit unit, the first passage, and the second passage are all in the off state. In the second sub-mode, the first solenoid valve, the first passage, and the high-voltage circuit unit are in the on state, and the second solenoid valve and the second passage are both in the off state. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the specific embodiments of this application or the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this application. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0018] Figure 1 This is a schematic diagram of a low-temperature plasma device provided in an embodiment of this application;

[0019] Figure 2This is a schematic diagram of the structure of the low-temperature plasma device provided in the embodiments of this application.

[0020] Figure reference numerals: 100-Helium source module; 200-Atomization module; 300-Control module; 400-Low-temperature plasma module. Detailed Implementation

[0021] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0022] For some common skin problems, when medication is ineffective, some people choose to treat them with cosmetic or medical devices, which can achieve some improvement. However, some common cosmetic devices, such as radiofrequency ablation, picosecond lasers, and lasers, while effective, cause deeper skin trauma, cover larger treatment areas, and have longer healing and recovery periods, which can cause inconvenience to patients' lives and work. In contrast, low-temperature plasma technology has the advantages of minimal trauma, low temperature, and high safety. It only treats the skin surface, and the treatment has minimal impact on normal life and work afterward. However, among related technologies, low-temperature plasma devices have relatively limited functionality and cannot meet the diverse needs of different skin conditions, thus hindering their widespread adoption and application in the cosmetic medical industry.

[0023] Please refer to Figure 1 , Figure 1 This is a schematic diagram of a low-temperature plasma device provided in an embodiment of this application. Figure 1As shown in the figure, this application provides a multi-mode switching low-temperature plasma device, including: a protective cover, a helium source module 100, an atomization module 200, a low-temperature plasma module 400, a path selection module, a first mixing module, and a control module 300. The high-voltage electrode of the low-temperature plasma module 400 is located inside the protective cover. The helium source module 100 is connected to the protective cover through a first path of the path selection module and to the first mixing module through a second path of the path selection module. The atomization module 200 is connected to the protective cover through the first mixing module. The path selection module and the helium source module... The first solenoid valve in module 100, the second solenoid valve in atomization module 200, and the high-voltage circuit unit in low-temperature plasma module 400 are all controlled by control module 300. Control module 300 is used to control the on / off state of the first solenoid valve, the on / off state of the second solenoid valve, the on / off state of the first and second paths in the path selection module, and the on / off state of the high-voltage circuit unit in response to input mode switching commands. When the first solenoid valve is on, only one of the first and second paths is on; when the second solenoid valve is off, the second path is also off.

[0024] The first solenoid valve controls the helium output from the helium tank. The control module 300 controls the power supply to the first solenoid valve, thereby controlling the helium output from the helium source module 100 to achieve continuous or intermittent supply. The flow selection module can be a three-way solenoid valve with one inlet and two outlets, used to control the flow of helium into the first mixing module or the protective shield. In some cases, by controlling the flow direction of helium through the flow selection module, the helium generated by the helium source module 100 flows into the protective shield through the first flow path, allowing it to participate in the low-temperature plasma reaction. In other cases, by controlling the flow direction of helium through the flow selection module, the helium generated by the helium source module 100 flows into the first mixing module through the second flow path.

[0025] In the cryogenic plasma module 400, the gas participating in the plasma reaction can be either air or helium. If the cryogenic plasma module 400 operates independently, the gas participating in the reaction is air. Cryogenic plasma with added helium has a lower temperature and a better user experience. The high-voltage circuit unit provides a high-voltage arc, causing the gas to ionize under the influence of the high-voltage arc, forming cryogenic plasma. The control module 300 controls the parameters of the high-voltage circuit unit, such as voltage magnitude, frequency, and pulse width, to regulate the generation and characteristics of the cryogenic plasma.

[0026] In the atomization module 200, the second solenoid valve is used to control the start and stop of atomization. By controlling the opening and closing of the second solenoid valve through the control module 300, the atomization process can be precisely adjusted.

[0027] In the control module 300, by controlling the on / off states of the first solenoid valve, the second solenoid valve, the first and second pathways in the pathway selection module, and the high-voltage circuit unit, multiple functions of the device can be realized to meet the diverse needs of different skin conditions. For example, when the helium source module 100 and the low-temperature plasma module 400 work together, the helium supplied by the helium source module 100 flows into the protective cover through the first pathway of the pathway selection module. The low-temperature plasma module 400 generates a high-voltage arc at the high-voltage electrode, using helium as a carrier gas to generate low-temperature plasma, resulting in lower temperatures and a better user experience. As another example, when the atomization module 200 and the helium source module 100 work together, the atomized water molecules with added helium have a better skincare effect. The helium helps open pores, protects the solution components from damage, and makes the solution more easily absorbed by the skin. In some cases, the low-temperature plasma module 400 can also be used alone for surface treatment, etc.

[0028] The cryogenic plasma device provided in this embodiment includes a protective shield, a helium source module 100, an atomization module 200, a cryogenic plasma module 400, a path selection module, a first mixing module, and a control module 300. The high-voltage electrode of the cryogenic plasma module 400 is located inside the protective shield. The helium source module 100 is connected to the protective shield via a first path of the path selection module and to the first mixing module via a second path of the path selection module. The atomization module 200 is connected to the protective shield via the first mixing module. The path selection module, the first solenoid valve in the helium source module 100, the second solenoid valve in the atomization module 200, and the cryogenic plasma module are all integrated into the protective shield. The high-voltage circuit units in module 400 are all controlled by control module 300. Control module 300 is used to control the on / off state of the first solenoid valve, the on / off state of the second solenoid valve, the on / off state of the first and second paths in the path selection module, and the on / off state of the high-voltage circuit units in response to input mode switching commands. When the first solenoid valve is on, only one of the first and second paths is on; when the second solenoid valve is off, the second path is also off. This solves the technical problem of the single function of low-temperature plasma equipment in related technologies, realizes the technical effect of multi-functionality, and can meet the diverse needs of different skin conditions.

[0029] Please refer to Figure 2 , Figure 2 This is a schematic diagram of the structure of the low-temperature plasma device provided in the embodiments of this application.

[0030] In some embodiments, such as Figure 2As shown, the helium source module 100 includes a helium tank, a first solenoid valve, a pressure gauge, and a first regulating valve connected in sequence. The first regulating valve is connected to a path selection module and is used to output the helium supplied from the helium tank through a first path or a second path.

[0031] The helium cylinder serves as the helium source and is typically used with a pressure gauge. The pressure gauge can be positioned between the first solenoid valve and the first regulating valve. The first solenoid valve is connected to the outlet of the helium cylinder and controls the flow of helium. The opening and closing of the first solenoid valve is controlled by the control module 300, thus enabling a continuous or intermittent supply of helium. The first regulating valve is connected to the output of the first solenoid valve and is used to precisely regulate the flow rate or pressure of the helium. The path selection module is a three-way solenoid valve, including one input port and two output ports. The input port of the path selection module is connected to the output of the first regulating valve. One output port of the path selection module is connected to a protective cover via a first path, and the other output port is connected to the first mixing module via a second path. By controlling the power supply to the path selection module, the on / off control of the first and second paths is achieved.

[0032] Specifically, the helium source module 100 includes a helium tank containing pure helium or mixed helium and other inert gases. The outlet of the helium tank is connected to a first solenoid valve. The power supply of the first solenoid valve is controlled by the control module 300 to open or close it, enabling either a continuously open or intermittent gas supply mode. The output of the first solenoid valve is connected to a pressure gauge, which is in turn connected to an interface on one side of a first regulating valve. The first regulating valve can control the flow rate or pressure of the helium output. The path selection module is a three-way solenoid valve with one inlet and two outlets. The output of the first regulating valve is connected to the first interface of the path selection module. Under normal conditions (i.e., when the power is off), the first and third interfaces of the path selection module are conductive, meaning the first path is conductive. When the path selection module is powered on, the first and second interfaces of the path selection module are conductive, meaning the second path is conductive, while the first and third interfaces are closed, meaning the first path is closed.

[0033] In some embodiments, such as Figure 2 As shown, the high-voltage circuit unit is controlled by the foot switch of the control module 300. The high-voltage circuit unit is connected to the high-voltage electrode, which has a through hole. The helium source module 100 is connected to the through hole through the first path of the path selection module.

[0034] Specifically, symmetrical high-voltage electrodes are located near the center inside the protective shield. Each high-voltage electrode has a through-hole, through which helium generated by the helium source module 100 enters the protective shield. When the low-temperature plasma module 400 is operating, the helium participates in the plasma reaction to generate low-temperature plasma. The high-voltage electrodes are connected to the output terminal of the high-voltage circuit unit, and the high-voltage output can be controlled by a foot switch in the control module 300. The input terminal of the high-voltage circuit unit is individually connected to the corresponding power output terminal of the control board in the control module 300.

[0035] In some embodiments, such as Figure 2 As shown, the atomizing module 200 also includes an air pump branch, a solution branch, an atomizing head, and a second mixing module. The air pump branch and the solution branch are connected through the second mixing module, and the second mixing module is connected to the atomizing head inside the protective cover through the first mixing module.

[0036] In some embodiments, the air pump branch includes an air pump, a second solenoid valve, and a second regulating valve connected in sequence; the solution branch includes a solution bottle and a third regulating valve; wherein the air pump is controlled by a handle switch in the control module 300.

[0037] In the air pump branch, the airflow output of the air pump is controlled by the second regulating valve. Simultaneously, the power input terminal of the air pump is separately connected to the corresponding power output terminal of the control board of the control module 300. Furthermore, the handle switch in the control module 300 can control the start and stop of the air pump. The first mixing module can be an ejector, and the second mixing module can also be an ejector. The outlet of the second regulating valve is connected to the first interface of the second mixing module. The second interface of the second mixing module is connected to the third regulating valve. The other end of the third regulating valve is connected to the bottle holder interface of the solution bottle, which contains an open solution bottle. The third regulating valve is used to adjust the solution output from the solution bottle. The third interface of the second mixing module is connected to the first interface of the first mixing module. The second interface of the first mixing module is connected to the second channel of the channel selection module, while the third interface of the first mixing module is directly connected to the atomizing head located in the protective cover. The airflow generated by the air pump passes sequentially through the second solenoid valve, the second regulating valve, and the second mixing module. At the second mixing module, due to the Venturi effect generated by the ejector structure, the solution in the solution bottle is drawn into the second mixing module, where it merges with the airflow to form a first gas-liquid mixture, which then enters the first mixing module. When the second passage is open, helium is drawn into the first mixing module from the second passage. Due to the Venturi effect generated by the ejector structure, it merges with the first gas-liquid mixture to form a second gas-liquid mixture. The first gas-liquid mixture is a mixture of air and the solution in the solution bottle. The second gas-liquid mixture includes helium, air, and the solution in the solution bottle.

[0038] In some embodiments, such as Figure 2 As shown, the control module 300 includes a power supply, a control board, a display screen, a foot switch, and a handle switch. The power supply input is connected to the mains power supply via a power cord, and its output powers the control board. The control board controls the power supply modes of the helium source module 100, the cryogenic plasma module 400, and the atomization module 200. The control board has three sets of solenoid valve power outputs connected to the power inputs of the first solenoid valve, the second solenoid valve, and the path selection module (three-way solenoid valve), respectively. The power supply and signal inputs of the display screen are connected to the power supply and signal outputs of the control board, respectively. The display screen has a touch function; mode switching commands can be used to select various operating modes, corresponding durations, and intensities, enabling the helium source module 100, the cryogenic plasma module 400, and the atomization module 200 to operate individually or in conjunction.

[0039] The low-temperature plasma device provided in this application embodiment has at least the following six working modes, which can meet the diverse needs of different skin conditions. The following will be described in conjunction with specific embodiments.

[0040] Example 1

[0041] When the low-temperature plasma equipment is operating in the first mode, the high-voltage circuit unit is in the conducting state, and the first solenoid valve, the second solenoid valve, the first passage, and the second passage are all in the disconnected state.

[0042] The first mode refers to the mode in which the low-temperature plasma module 400 operates independently. Specifically, by selecting the function on the display screen and adjusting the high voltage and pulse width to change the intensity, the low-temperature plasma module 400 can operate independently. The high voltage output from the high-voltage circuit unit conducts two symmetrical high-voltage electrodes, generating a high-voltage arc at the end of the high-voltage electrodes. Under the action of the high-voltage arc, air generates low-temperature plasma, which is used for the adjunctive treatment of skin problems.

[0043] Example 2

[0044] When the low-temperature plasma equipment is operating in the second mode, the second solenoid valve is in the conducting state, and the high-voltage circuit unit, the first solenoid valve, the first passage, and the second passage are all in the disconnected state.

[0045] The second mode refers to the mode in which the atomizing module 200 operates independently. Specifically, via the function selection on the display screen, a solution bottle containing the solution is placed on the cap, the handle switch is pressed, and the air pump is activated. The air pump outputs gas towards the first interface of the second mixing module, and the solution from the solution bottle is drawn in through the second interface of the second mixing module. The solution and gas mix to form a first gas-liquid mixture. The first gas-liquid mixture is then blown from the third interface of the first mixing module back towards the first interface of the first mixing module. The second passage between the second interface of the first mixing module and the passage selection module is normally closed. The first gas-liquid mixture is then directly blown from the third interface of the second mixing module towards the atomizing head, where it is atomized and sprayed out as atomized water molecules, providing a separate supply of nutrient solution to the skin.

[0046] Example 3

[0047] When the cryogenic plasma device is operating in the third mode, the high-voltage circuit unit, the first solenoid valve, and the first passage are in the conducting state, while the second solenoid valve and the second passage are in the disconnected state.

[0048] The third mode refers to the collaborative operation of the helium source module 100 and the low-temperature plasma module 400. Specifically, through the function selection on the display screen, the dual-combination operation of the low-temperature plasma module 400 and the helium source module 100 is simultaneously activated. The helium output from the helium tank flows into the pressure gauge through the first solenoid valve, and then flows to the first regulating valve. By adjusting the first regulating valve, a suitable pressure is output to the path selection module. The pressure then flows through the first path of the path selection module to the high-voltage electrode, entering through the through-hole of the symmetrical high-voltage electrode. The high voltage output from the high-voltage circuit unit is controlled by a foot switch to flow to the symmetrical high-voltage electrode inside the protective cover. Under high pressure, the helium reacts with the high-voltage arc to generate low-temperature plasma. The low-temperature plasma with added helium has better cooling effect, lower temperature, and antibacterial, anti-inflammatory, and anti-allergic effects, resulting in a better user experience.

[0049] Example 4

[0050] When the low-temperature plasma equipment is operating in the fourth mode, the first solenoid valve, the first passage, the high-voltage circuit unit, and the second solenoid valve are all in the conducting state, and the second passage is in the disconnected state.

[0051] The fourth mode refers to the coordinated operation of the helium source module 100, the low-temperature plasma module 400, and the atomization module 200. Specifically, through the function selection on the display screen, the three combined operating states of the low-temperature plasma module 400, the helium source module 100, and the atomization module 200 are activated simultaneously. The solution is atomized from the atomization head, and helium is output to the through-hole of the high-voltage electrode. The two form a gas-liquid mixture within the protective cover, which reacts with the high-voltage arc to form low-temperature plasma. When low-temperature plasma is used alone as an adjunct treatment for skin problems, it can easily cause epidermal moisture evaporation, leading to dry skin. Combining it with atomization can effectively solve this problem. At the same time, most of the atomized solution sprayed onto the skin is well absorbed, replenishing skin moisture.

[0052] Example 5

[0053] When the cryogenic plasma device is operating in the fifth mode, the first solenoid valve, the second passage, the high-voltage circuit unit, and the second solenoid valve are all in the conducting state, while the first passage is in the disconnected state.

[0054] The fifth mode refers to the coordinated operation of the helium source module 100, the low-temperature plasma module 400, and the atomization module 200. Specifically, the operating state of the three modules—low-temperature plasma module 400, helium source module 100, and atomization module 200—can be selected via the display screen. Helium output from the helium source module 100 flows into the first mixing module through the second channel of the channel selection module, bypassing the symmetrical high-voltage electrodes. The helium and the first gas-liquid mixture generate a Venturi effect in the first mixing module, drawing helium into the first mixing module through the second channel and then ejecting it through the atomization head. By adding helium to the atomization, the solution can be absorbed by the skin more quickly. Simultaneously, utilizing the property that helium is almost insoluble in other substances, a protective layer is formed on the skin surface and inside the protective shield, which can reduce pain and help other active ingredients penetrate deeper into the skin, improving the absorption rate of skincare products.

[0055] Example 6

[0056] When the low-temperature plasma equipment is operating in the sixth mode, the sixth mode is composed of the first sub-mode and the second sub-mode alternating in a cycle. In the first sub-mode, the second solenoid valve is in the conducting state, and the first solenoid valve, the high-voltage circuit unit, the first passage and the second passage are all in the disconnected state. In the second sub-mode, the first solenoid valve, the first passage and the high-voltage circuit unit are in the conducting state, and the second solenoid valve and the second passage are both in the disconnected state.

[0057] The sixth mode is an alternating operation mode. Specifically, through the display screen selection, the atomizing module 200 operates alone as the first sub-mode, while the low-temperature plasma module 400 and the helium source module 100 work together as the second sub-mode. The first sub-mode operates for 1-3 seconds, spraying the solution inside the protective shield and onto the skin. Then, while the first sub-mode stops for 1-3 seconds, the second sub-mode starts operating for 1-3 seconds, simultaneously outputting helium and high pressure. When the second sub-mode stops for 1-3 seconds, it switches back to the first sub-mode for 1-3 seconds, forming an alternating, continuously cycling operation. While using low-temperature plasma to ablate obvious scabs and scars on the skin, the solution is sprayed onto the skin surface through atomization. This solution is absorbed by the skin, accelerating the healing process of skin damage. This combined treatment method not only removes scabs and scars from the skin surface but also promotes rapid skin repair and regeneration, achieving better therapeutic results.

[0058] In some embodiments, the device further includes: an image acquisition module, configured to acquire images of the target object's skin to be processed by changing different light source illumination conditions within a specified time period, and generate an image sequence based on each of the images to be processed; an image processing module, configured to extract discrete image features and temporal difference features from the image sequence, and to stitch the extracted discrete image features and temporal difference features together to obtain corresponding skin features, wherein the discrete image features include foreground features and background features, the foreground features are used to characterize local skin conditions, the background features are used to characterize overall skin conditions, and the temporal difference features are used to characterize the dryness / oiliness of the skin; and an instruction generation module, configured to match the corresponding skin feature clusters in a skin condition feature library based on the skin features, generate corresponding mode switching instructions based on the skin feature clusters, and send them to the control module.

[0059] In a specific application example, the duration of different working modes during facial skin care typically varies. Related technologies determine the duration of different working modes in two ways: one is through manual control, and the other is by pre-setting a fixed duration. However, manual control relies heavily on the experience of the cosmetic physician, while pre-setting a fixed duration cannot be adjusted to the user's actual skin condition. Therefore, in this application example, the appropriate duration for the user's current skin condition can be determined by analyzing the user's skin condition.

[0060] In this application example, a skin condition feature library can be built based on the user's skin condition. Specifically, during skin care, a large number of users can be sampled, and for each user, a preset method can be used to construct their skin features. In practical applications, for any user, different light sources can be used to illuminate the user's skin, and under each light source, the camera can capture its own image to be processed. Thus, the images to be processed under different light source conditions can form an image sequence. When processing the image sequence, discrete image features and temporal difference features can be extracted.

[0061] When extracting features from discrete images, each image in the image sequence can be traversed. For any given image, foreground and background features can be extracted. Foreground features can effectively characterize local skin conditions such as acne and acne scars, while background features can better characterize overall skin conditions such as dryness, wrinkle distribution, and muscle laxity. In practical applications, deep learning and image segmentation techniques can be combined to extract both foreground and background features.

[0062] In some embodiments, the image processing module includes: a first segmentation unit, configured to perform pixel-level foreground prediction on the image to be processed to generate a first segmentation map; a second segmentation unit, configured to perform boundary optimization on the first segmentation map using a graph model to obtain a second segmentation map; and an extraction unit, configured to divide the image into a foreground region and a background region based on the second segmentation map, and extract foreground features in the foreground region and background features in the background region, respectively.

[0063] Specifically, the foreground regions in the image are labeled in the initial stage (e.g., using bounding boxes or masks), and deep learning techniques are used to train the model on the labeled images, thereby obtaining a model that can accurately identify the foreground regions. This model uses a lightweight backbone network and can be deployed offline in the image recognition unit.

[0064] For the image to be processed, a pre-deployed model can accurately identify the foreground region. This identified foreground region is usually only a rough approximation; subsequent image segmentation is needed based on this approximate region to accurately separate the foreground and background regions within the image. Specifically, a graph model can be constructed where nodes represent pixels and edges represent the similarity between pixels. Then, by iteratively optimizing the energy function, the segmentation of the foreground and background can be progressively refined. After completing the foreground and background segmentation, the features of each region can be extracted separately, resulting in foreground and background features.

[0065] In one implementation, when constructing the graph model, a classification probability value can be set for each pixel in the image to be processed based on the approximate area of ​​the foreground region. This classification probability value represents the probability that a pixel belongs to the foreground region. Specifically, the closer a pixel is to the center of the foreground region, the higher its classification probability value; the closer it is to the edge of the foreground region, the lower its classification probability value. Furthermore, the classification consistency between any two adjacent pixels can be calculated, represented by 0 or 1. If two pixels belong to the same class (foreground or background), the classification consistency is 1; otherwise, it is 0. Then, based on the classification probability value and classification consistency, an energy function corresponding to all pixels in the image to be processed can be constructed.

[0066]

[0067] in, Represents the energy function. Represents the classification probability value. Indicates consistency in classification. Represents pixel p. Represents pixel q.

[0068] By optimizing the energy function to its minimum, accurate edges between the foreground and background regions can be obtained, thus accurately dividing the foreground and background regions in the image to be processed. Subsequently, by weighted summation of the foreground and background features, discrete image features of the image to be processed can be obtained.

[0069] In some embodiments, the image processing module further includes: a similarity calculation unit, configured to acquire background features of each of the images to be processed; to restore the background features to the corresponding background region images; and to calculate the structural similarity index between adjacent background region images; and an averaging calculation unit, configured to calculate the average value of each of the structural similarity indices and use the obtained calculation result as the temporal difference feature.

[0070] In one implementation, background features of each image to be processed in an image sequence can be acquired, and then the structural similarity index between each background feature can be calculated. By averaging the calculated structural similarity indices, the result can be used as the temporal difference feature of the image sequence. Specifically, when calculating the structural similarity index between two adjacent background features, the background features can be reconstructed into corresponding background region images. Then, the luminance similarity, contrast similarity, and structure similarity between the two background region images are calculated separately. Finally, the luminance, contrast, and structure similarity are combined using the SSIM formula to obtain the corresponding structural similarity index. A higher structural similarity index indicates a lower probability of oily skin. This is because oily skin exhibits significant differences under different light source conditions. Therefore, by processing image sequences under different light source conditions, the likelihood of a target user having oily skin can be accurately indicated.

[0071] Ultimately, by combining discrete image features and temporal difference features from the image sequence, the current user's skin characteristics can be accurately represented. For example, discrete image features can represent local skin conditions such as acne, pimples, and scars, as well as overall skin conditions such as dryness, wrinkle distribution, and muscle laxity. Temporal difference features, on the other hand, can represent skin dryness, oiliness, combination skin, and other skin types. Thus, for each user, unique discrete image features and temporal difference features can be generated. By concatenating these two features, the user's skin characteristics can be obtained.

[0072] After obtaining each user's skin features, skin feature clusters can be generated based on the similarity between these features through clustering. Skin features belonging to the same skin feature cluster are considered to have similar skin conditions. This allows for the setting of skin care modes and corresponding durations for different skin feature clusters, thus enabling the construction of a skin condition feature database.

[0073] Subsequently, when dealing with actual users, it is only necessary to collect the image sequence of the actual user in the same way, analyze and calculate the aforementioned discrete image features and temporal difference features, and then stitch them together to obtain the skin features of the actual user. Then, the skin features are matched in a skin condition feature database to determine the skin feature cluster to which they belong. The pattern and duration associated with the skin feature cluster can then be used as the pattern and duration adapted to the actual user.

[0074] In this way, it is possible to work without relying on the professional experience of cosmetic physicians, and to automatically generate suitable work modes and durations for different users.

[0075] In this embodiment, the low-temperature plasma device is presented in the form of a functional unit. Here, a unit refers to an ASIC (Application Specific Integrated Circuit) circuit, a processor and memory that execute one or more software or fixed programs, and / or other devices that can provide the above functions.

[0076] Although embodiments of this application have been described in conjunction with the accompanying drawings, those skilled in the art can make various modifications and variations without departing from the spirit and scope of this application, and all such modifications and variations fall within the scope defined by the appended claims.

[0077] For ease of description, the above devices are described separately by function as various units. Of course, in implementing this application, the functions of each unit can be implemented in one or more software and / or hardware.

[0078] It should also be noted that the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0079] The various embodiments in this specification are described in a progressive manner. Similar or identical parts between embodiments can be referred to mutually. Each embodiment focuses on its differences from other embodiments. In particular, the device embodiments are basically similar to the method embodiments, so the description is relatively simple; relevant parts can be referred to the descriptions of the method embodiments.

[0080] The above description is merely an embodiment of this application and is not intended to limit the scope of this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the scope of the claims of this application.

[0081] Although embodiments of this application have been described in conjunction with the accompanying drawings, those skilled in the art can make various modifications and variations without departing from the spirit and scope of this application, and such modifications and variations all fall within the scope defined by the appended claims.

Claims

1. A multi-mode switched cryogenic plasma apparatus, comprising: The device comprises a protective cover, a helium source module, an atomization module, a low-temperature plasma module, a path selection module, a first mixing module and a control module, wherein the high-voltage electrode of the low-temperature plasma module is located in the protective cover, the helium source module is connected to the protective cover through a first path of the path selection module and connected to the first mixing module through a second path of the path selection module, the atomization module is connected to the protective cover through the first mixing module, the path selection module, a first electromagnetic valve in the helium source module, a second electromagnetic valve in the atomization module and a high-voltage circuit unit in the low-temperature plasma module are all controlled by the control module; The control module is used to control the on-off state of the first electromagnetic valve, the on-off state of the second electromagnetic valve, the on-off state of the first path and the second path in the path selection module and the on-off state of the high-voltage circuit unit in response to the input mode switching instruction; wherein in the case that the first electromagnetic valve is turned on, only one of the first path and the second path is turned on; in the case that the second electromagnetic valve is turned off, the second path is also in the off state; The device further comprises an image acquisition module, which is used to acquire a to-be-processed image of a target object skin by changing different light source irradiation conditions within a specified time, and generate an image sequence based on each to-be-processed image; an image processing module, which is used to extract discrete image features and time sequence difference features in the image sequence, and splice the extracted discrete image features and time sequence difference features to obtain corresponding skin features, wherein the discrete image features include foreground features and background features, the foreground features are used to represent local skin conditions, the background features are used to represent overall skin conditions, and the time sequence difference features are used to represent skin dry and oily conditions; and an instruction generation module, which is used to match a corresponding skin feature cluster in a skin condition feature library based on the skin features, generate a corresponding mode switching instruction based on the skin feature cluster and send the mode switching instruction to the control module; The image processing module comprises a first segmentation unit, which is used to perform pixel-level foreground prediction on the to-be-processed image to generate a first segmentation map; a second segmentation unit, which is used to perform boundary optimization on the first segmentation map by using a graph model to obtain a second segmentation map; and an extraction unit, which is used to divide foreground regions and background regions based on the second segmentation map, and extract foreground features in the foreground regions and background features in the background regions, respectively. The image processing module further comprises a similarity calculation unit, which is used to obtain background features of each to-be-processed image, restore the background features into corresponding background region images, and calculate structural similarity indexes between adjacent background region images; and an average calculation unit, which is used to calculate average values of each structural similarity index, and take the obtained calculation result as the time sequence difference feature.

2. The apparatus of claim 1, wherein, The helium source module comprises a helium tank, the first electromagnetic valve, a gas pressure gauge and a first regulating valve connected in sequence, wherein the first regulating valve is connected to the passage selection module for outputting the helium supplied in the helium tank through the first passage or the second passage.

3. The apparatus of claim 1, wherein, The high-voltage circuit unit is controlled by a foot switch in the control module, the high-voltage circuit unit is connected with the high-voltage electrode, the high-voltage electrode is provided with a through hole, and the helium source module is connected to the through hole through the first passage of the passage selection module.

4. The apparatus of claim 1, wherein, The atomization module further comprises a gas pump branch, a solution branch, an atomization head and a second mixing module, wherein the gas pump branch and the solution branch are connected through the second mixing module, and the second mixing module is connected to the atomization head in the protective cover through the first mixing module.

5. The apparatus of claim 4, wherein, The gas pump branch comprises a gas pump, the second electromagnetic valve and a second regulating valve connected in sequence; the solution branch comprises a solution bottle and a third regulating valve; wherein the gas pump is controlled by a handle switch in the control module.

6. The apparatus of claim 1, wherein, In the case that the low-temperature plasma equipment works in the first mode, the high-voltage circuit unit is in a conducting state, and the first electromagnetic valve, the second electromagnetic valve, the first passage and the second passage are all in a disconnected state.

7. The apparatus of claim 1, wherein, In the case that the low-temperature plasma equipment works in the second mode, the second electromagnetic valve is in a conducting state, and the high-voltage circuit unit, the first electromagnetic valve, the first passage and the second passage are all in a disconnected state.

8. The apparatus of claim 1, wherein, In the case that the low-temperature plasma equipment works in the third mode, the high-voltage circuit unit, the first electromagnetic valve and the first passage are in a conducting state, and the second electromagnetic valve and the second passage are in a disconnected state.

9. The apparatus of claim 1, wherein, In the case that the low-temperature plasma equipment works in the fourth mode, the first electromagnetic valve, the first passage, the high-voltage circuit unit and the second electromagnetic valve are all in a conducting state, and the second passage is in a disconnected state.

10. The apparatus of claim 1, wherein, In the case that the low-temperature plasma equipment works in the fifth mode, the first electromagnetic valve, the second passage, the high-voltage circuit unit and the second electromagnetic valve are all in a conducting state, and the first passage is in a disconnected state.

11. The apparatus of claim 1, wherein, In the case that the low-temperature plasma equipment works in the sixth mode, the sixth mode is composed of a first sub-mode and a second sub-mode alternately circulating, in the case of the first sub-mode, the second electromagnetic valve is in a conducting state, and the first electromagnetic valve, the high-voltage circuit unit, the first passage and the second passage are all in a disconnected state; in the case of the second sub-mode, the first electromagnetic valve, the first passage and the high-voltage circuit unit are in a conducting state, and the second electromagnetic valve and the second passage are in a disconnected state.

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