Radio frequency power supply device and radio frequency power supply system

Abstract

The invention provides a radio frequency power supply device and a radio frequency power supply system. The radio frequency power supply device comprises a radio frequency source, a waveform shaping unit, a first matching unit and a second matching unit. The radio frequency source is used for outputting initial radio frequency electric energy. And the waveform shaping unit is used for alternately conducting and disconnecting at a preset period so as to shape the waveform of the initial radio frequency electric energy to obtain pulse radio frequency electric energy, and outputting the pulse radio frequency electric energy to a load. The first matching unit is selectively connected or disconnected with the first connection point, the first connection point is a connection point between the radio frequency source and the waveform shaping unit, and the first matching unit is used for being connected with the first connection point when the waveform shaping unit is disconnected. The second matching unit is selectively connected or disconnected with the second connecting point, the second connecting point is a connecting point between the waveform shaping unit and the load, and the second matching unit is used for being connected with the second connecting point when the waveform shaping unit is disconnected. Impedance matching can be realized when pulse radio frequency electric energy is output.

Description

Technical Field

[0001] This application relates to the field of radio frequency technology, and in particular, to a radio frequency power supply device and a radio frequency power supply system. Background Art

[0002] Currently, with the development of radio frequency power supply technology, a pulsed radio frequency power supply has been proposed and widely used in various semiconductor devices. However, there are still many problems to be solved during the output process of pulsed radio frequency electrical energy. In particular, it is difficult to perform impedance matching during the output process of pulsed radio frequency electrical energy, which greatly affects the output effect. Therefore, during the output process of pulsed radio frequency electrical energy, how to achieve impedance matching, thereby improving the output effect and avoiding damage to the radio frequency source, has become an issue that needs to be considered. Summary of the Invention

[0003] This application provides a radio frequency power supply device and a radio frequency power supply system, which can effectively improve the communication performance requirements in the landscape game scenario.

[0004] In a first aspect, a radio frequency power supply device is provided. The radio frequency power supply device is configured to output pulsed radio frequency electrical energy to a load. Wherein, the radio frequency power supply device includes a radio frequency source, a waveform shaping unit, a first matching unit, and a second matching unit. The radio frequency source is configured to output initial radio frequency electrical energy. The waveform shaping unit is connected between the radio frequency source and the load. The waveform shaping unit is configured to alternately conduct and disconnect at a preset period to shape the waveform of the initial radio frequency electrical energy to obtain pulsed radio frequency electrical energy, and output the pulsed radio frequency electrical energy to the load, wherein the preset period is greater than the period of the initial radio frequency electrical energy. The first matching unit selectively connects or disconnects from a first connection point, and the first connection point is the connection point between the radio frequency source and the waveform shaping unit. The first matching unit is configured to connect to the first connection point when the waveform shaping unit is disconnected. The second matching unit selectively connects or disconnects from a second connection point, and the second connection point is the connection point between the waveform shaping unit and the load. The second matching unit is configured to connect to the second connection point when the waveform shaping unit is disconnected.

[0005] In a possible implementation manner, the first matching unit has a first impedance value, and the first impedance value is at least related to the impedance value of the load. The second matching unit has a second impedance value, and the second impedance value is related to the impedance value of the radio frequency source.

[0006] In a possible implementation, the radio frequency power supply device further includes an impedance matching unit. The impedance matching unit is connected between the waveform shaping unit and the load and is connected to the second matching unit. The impedance matching unit is used to perform impedance matching between the radio frequency source and the load. Among them, the first impedance value of the first matching unit is related to the impedance value of the impedance matching unit and the impedance value of the load.

[0007] In a possible implementation, the first impedance value of the first matching unit is equal to the overall impedance value of the impedance matching unit and the load.

[0008] In a possible implementation, the impedance value of the radio frequency source includes a resistance value and a reactance value, and the reactance value of the radio frequency source is not equal to zero. The second impedance value of the second matching unit is equal to the impedance value of the radio frequency source.

[0009] In a possible implementation, the impedance value of the radio frequency source includes a resistance value and a reactance value, and the reactance value of the radio frequency source is equal to zero. The second impedance value of the second matching unit is equal to zero, and the first impedance value of the first matching unit is equal to the overall resistance value of the impedance matching unit and the load.

[0010] In a possible implementation, the first matching unit includes a first switch and a first resistor. One end of the first resistor is selectively connected to or disconnected from the first connection point through the first switch, and the other end of the first resistor is grounded. The first switch is turned on or off to cause the first resistor to be correspondingly connected to or disconnected from the first connection point. Among them, the resistance value of the first resistor is the first impedance value of the first matching unit.

[0011] In a possible implementation, the second matching unit includes a second switch. The second switch is connected between the second connection point and the ground. The second switch is turned on or off to cause the second matching unit to be correspondingly connected to or disconnected from the second connection point.

[0012] In a possible implementation, the waveform shaping unit includes a third switch. The third switch alternately turns on and off at the preset period, correspondingly allowing and prohibiting the initial radio frequency electrical energy to pass through the third switch to obtain the pulsed radio frequency electrical energy.

[0013] In a second aspect, a radio frequency power supply system is further provided. The radio frequency power supply system includes a radio frequency power supply device. The radio frequency power supply device is configured to output pulsed radio frequency electrical energy to a load. Among them, the radio frequency power supply device includes a radio frequency source, a waveform shaping unit, a first matching unit, and a second matching unit. The radio frequency source is configured to output initial radio frequency electrical energy. The waveform shaping unit is connected between the radio frequency source and the load. The waveform shaping unit is configured to alternately conduct and disconnect at a preset period to shape the waveform of the initial radio frequency electrical energy to obtain pulsed radio frequency electrical energy, and output the pulsed radio frequency electrical energy to the load. Among them, the preset period is greater than the period of the initial radio frequency electrical energy. The first matching unit selectively connects or disconnects from a first connection point, where the first connection point is the connection point between the radio frequency source and the waveform shaping unit. The first matching unit is configured to connect to the first connection point when the waveform shaping unit is disconnected. The second matching unit selectively connects or disconnects from a second connection point, where the second connection point is the connection point between the waveform shaping unit and the load. The second matching unit is configured to connect to the second connection point when the waveform shaping unit is disconnected.

[0014] For the radio frequency power supply device and the radio frequency power supply system of the present application, by configuring the first matching unit and the second matching unit that are selectively connected to different connection points, they can alternately conduct corresponding to the conduction or disconnection of the waveform shaping unit, so that impedance matching can be achieved in each high-level stage and each low-level stage of the pulsed radio frequency electrical energy obtained by the waveform shaping unit, thereby improving the output effect and avoiding damage to the radio frequency power supply device. Description of the Drawings

[0015] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the background art, the following will describe the drawings required to be used in the embodiments of the present application or the background art.

[0016] Figure 1 It is a block diagram of a radio frequency power supply device in an embodiment of the present application.

[0017] Figure 2 It is another block diagram of the radio frequency power supply device in an embodiment of the present application.

[0018] Figure 3 It is a circuit diagram of a radio frequency power supply device in an embodiment of the present application.

[0019] Figure 4 It is a block diagram of a radio frequency power supply system in an embodiment of the present application.

[0020] Description of the reference numerals in the drawings: 1. Radio frequency power supply system, 10. Radio frequency power supply device, RF. Radio frequency source, XO. Initial radio frequency electrical energy, 100. Waveform shaping unit, S3. Third switch, RFS. Pulsed radio frequency electrical energy, A. First connection point, B. Second connection point, 200. First mating unit, S1. First switch, R1. First resistor, 300. Second mating unit, S2. Second switch, 400. Shaping unit, 500. Control unit, RL. Load, GND. Ground. Detailed implementation manners

[0021] Next, the technical solutions in the embodiments of the present application will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present application.

[0022] In the description of the embodiments of the present application, it should be noted that unless otherwise clearly defined and limited, the terms "connected" and "connection" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium. For those of ordinary skill in the art, the specific meanings of the above terms in the present application can be understood according to specific situations.

[0023] Hereinafter, the terms "first", "second", and "third" are only used for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, the features defined with "first", "second", and "third" may explicitly or implicitly include one or more of such features. In the description of the embodiments of the present application, unless otherwise stated, the meaning of "a plurality" is two or more.

[0024] In addition, the terms "include" and "have" and any variations thereof are intended to cover non-exclusive inclusion. For example, a process, method, system, product, or server that includes a series of steps or units does not necessarily have to be limited to those steps or units clearly listed, but may include other steps or units not clearly listed or inherent to these processes, methods, products, or devices.

[0025] Please refer to Figure 1 , Figure 1 which is a block diagram of the radio frequency power supply device 10 in an embodiment of the present application. As Figure 1As shown in the figure, the present application provides a radio frequency power supply device 10, which is used to output pulsed radio frequency electrical energy RFS to a load RL. Among them, the radio frequency power supply device 10 includes a radio frequency source RF, a waveform shaping unit 100, a first matching unit 200, and a second matching unit 300. The radio frequency source RF is used to output initial radio frequency electrical energy XO. The waveform shaping unit 100 is connected between the radio frequency source RF and the load RL. The waveform shaping unit 100 is used to conduct and disconnect alternately at a preset period to shape the waveform of the initial radio frequency electrical energy XO to obtain pulsed radio frequency electrical energy RFS, and output the pulsed radio frequency electrical energy RFS to the load RL, where the preset period is greater than the period of the initial radio frequency electrical energy XO. The first matching unit 200 is selectively connected to or disconnected from the first connection point A. The first connection point A is the connection point between the radio frequency source RF and the waveform shaping unit 100. The first matching unit 200 is used to connect to the first connection point A when the waveform shaping unit 100 is disconnected. The second matching unit 300 is selectively connected to or disconnected from the second connection point B. The second connection point B is the connection point between the waveform shaping unit 100 and the load RL. The second matching unit 300 is used to connect to the second connection point B when the waveform shaping unit 100 is disconnected.

[0026] Therefore, in the above radio frequency power supply device 10 of the present application, by configuring the first matching unit 200 and the second matching unit 300 that are selectively connected to different connection points, it is possible to conduct alternately corresponding to the conduction or disconnection of the waveform shaping unit 100, so that impedance matching can be achieved in each high-level stage and each low-level stage of the pulsed radio frequency electrical energy RFS obtained by the waveform shaping unit 100, so as to improve the output effect and avoid damage to the radio frequency power supply device 10.

[0027] Specifically, when the waveform shaping unit 100 is conducting, the initial radio frequency electrical energy XO is transmitted to the load RL through the conducting waveform shaping unit 100. When the waveform shaping unit 100 is disconnected, the initial radio frequency electrical energy XO stops being transmitted to the load RL. Therefore, the waveform of the pulsed radio frequency electrical energy RFS in each high-level stage of the preset period is a bipolar sine wave, and the frequency of the sine wave is the same as the frequency of the initial radio frequency electrical energy XO, both of which are radio frequencies, and the waveform in each low-level stage of the preset period is a straight line wave with zero voltage.

[0028] Among them, the first matching unit 200 is used to disconnect from the first connection point A when the waveform shaping unit 100 is connected, and the second matching unit 300 is used to disconnect from the second connection point B when the waveform shaping unit 100 is connected.

[0029] Among them, the first matching unit 200 has a first impedance value, and the first impedance value is at least related to the impedance value of the load RL. The second matching unit 300 has a second impedance value, and the second impedance value is related to the impedance value of the radio frequency source RF.

[0030] Thus, in the above-mentioned radio frequency power supply device 10 of the present application, when the waveform shaping unit 100 is turned on, the pulsed radio frequency electric energy RFS is in the high level stage, the first matching unit 200 is disconnected from the first connection point A, and the second matching unit 300 is disconnected from the second connection point B, so that the pulsed radio frequency electric energy RFS is transmitted to the load RL, and the radio frequency source RF and the load RL maintain the corresponding impedance matching state. When the waveform shaping unit 100 is turned off, the pulsed radio frequency electric energy RFS is in the low level stage, and the radio frequency source RF is isolated from the load RL and cannot maintain the corresponding impedance matching state. Thus, the first matching unit 200 with the first impedance value is connected to the first connection point A, and the second matching unit 300 with the second impedance value is connected to the second connection point B, so that the first matching unit 200 with the first impedance value performs the corresponding impedance matching with the radio frequency source RF, and the second matching unit 300 with the second impedance value performs the corresponding impedance matching with the load RL, reducing the disturbance caused by the high and low level switching of the pulsed radio frequency electric energy RFS, improving the output effect, and avoiding the damage of the radio frequency power supply device 10.

[0031] Please refer to Figure 2 , Figure 2 which is another block diagram of the radio frequency power supply device 10 in an embodiment of the present application. As Figure 2 shown, the radio frequency power supply device 10 further includes an impedance matching unit 400. The impedance matching unit 400 is connected between the waveform shaping unit 100 and the load RL and is connected to the second matching unit 300. The impedance matching unit 400 is used to perform impedance matching between the radio frequency source RF and the load RL. Among them, the first impedance value of the first matching unit 200 is related to the impedance value of the impedance matching unit 400 and the impedance value of the load RL.

[0032] Thus, in the above-mentioned radio frequency power supply device 10 of the present application, by setting the impedance matching unit 400, the impedance matching between the radio frequency source RF and the load RL is performed according to the conjugate matching method, and the impedance matching unit 400 has the corresponding impedance value. To avoid the disturbance caused by the high and low level switching of the pulsed radio frequency electric energy RFS, the first impedance value of the first matching unit 200 is configured to be related to the impedance value of the impedance matching unit 400 and the impedance value of the load RL, further improving the output effect.

[0033] In some embodiments, the second connection point B may be the connection point between the waveform shaping unit 100 and the impedance matching unit 400, so as to avoid the reflected power generated by impedance mismatch from impacting the impedance matching unit 400 and causing damage to the impedance matching unit 400.

[0034] Among them, the first impedance value of the first matching unit 200 is equal to the overall impedance value of the impedance matching unit 400 and the load RL.

[0035] Thus, for the above-mentioned radio frequency power supply device 10 in the present application, specifically, to maintain the impedance matching state of the radio frequency power supply device 10 during each low-level stage of the pulsed radio frequency electrical energy RFS, the first impedance value is configured to be equal to the overall impedance value of the impedance matching unit 400 and the load RL. When the waveform shaping unit 100 is disconnected, the first matching unit 200 is used to replace the impedance matching unit 400 and the load RL, so that the radio frequency source RF and the first matching unit 200 are still impedance-matched.

[0036] Among them, the impedance value of the radio frequency source RF includes a resistance value and a reactance value, and the reactance value of the radio frequency source RF is not equal to zero. The second impedance value of the second matching unit 300 is equal to the impedance value of the radio frequency source RF.

[0037] Thus, for the above-mentioned radio frequency power supply device 10 in the present application, when the reactance value of the radio frequency source RF is not equal to zero, to maintain the impedance matching state of the radio frequency power supply device 10 during each low-level stage of the pulsed radio frequency electrical energy RFS, the second impedance value is configured to be equal to the impedance value of the radio frequency source RF. When the waveform shaping unit 100 is disconnected, the second matching unit 300 is used to replace the radio frequency source RF, so that the impedance matching unit 400, the load RL, and the second matching unit 300 are still impedance-matched.

[0038] Among them, the impedance value of the radio frequency source RF includes a resistance value and a reactance value, and the reactance value of the radio frequency source RF is equal to zero. The second impedance value of the second matching unit 300 is equal to zero, and the first impedance value of the first matching unit 200 is equal to the overall resistance value of the impedance matching unit 400 and the load RL.

[0039] Thus, for the above-mentioned radio frequency power supply device 10 in the present application, generally speaking, the impedance value of the radio frequency source RF is a preset characteristic impedance value. For example, the impedance value of the radio frequency source RF is equal to 50Ω, 75Ω, 100Ω, etc., and the reactance value of the radio frequency source RF is equal to zero. When the reactance value of the radio frequency source RF is equal to zero, the impedance value of the impedance matching unit 400 is conjugate to the impedance value of the load RL, and the overall impedance value is also a preset characteristic impedance value to achieve impedance matching. Therefore, the second impedance value of the second matching unit 300 is correspondingly configured to be zero, so that the first impedance value is equal to the overall resistance value of the impedance matching unit 400 and the load RL. When the impedance value of the radio frequency source RF is equal to 50Ω, the overall resistance value of the impedance matching unit 400 and the load RL is equal to 50Ω, and the first impedance value is also set to 50Ω.

[0040] Among them, the impedance matching unit 400 may include electronic components such as inductors and capacitors, and the type of the impedance matching unit 400 may be any one of T-type, π-type, L-type, τ-type, or may be a combination of multiple types of T-type, π-type, L-type, τ-type.

[0041] Such asFigure 2 As shown, the radio frequency power supply device 10 may further include a control unit 500. The control unit 500 is used to be connected to both the first matching unit 200 and the second matching unit 300. The control unit 500 is used to control the first matching unit 200 to be connected to or disconnected from the first connection point A, and to control the second matching unit 300 to be connected to or disconnected from the second connection point B.

[0042] In some embodiments, the control unit 500 may further be connected to a waveform shaping unit 100. The control unit 500 is further used to control the waveform shaping unit 100 to conduct or disconnect alternately at a preset period.

[0043] Among them, the control unit 500 may include a general-purpose processor such as a central processing unit (CPU), or may also be a digital signal processor (DSP), an application specific integrated circuit (ASIC), a field-programmable gate array (FPGA), or other programmable logic devices, discrete gate logic devices, transistor logic devices and other logic control devices. It may also be a microprocessor such as a micro control unit 500 (MCU).

[0044] Please refer to Figure 3 , Figure 3 , which is a circuit schematic diagram of the radio frequency power supply device 10 in an embodiment of the present application. As Figure 3 shown, the first matching unit 200 includes a first switch S1 and a first resistor R1. One end of the first resistor R1 is selectively connected to or disconnected from the first connection point A through the first switch S1. The other end of the first resistor R1 is grounded to GND. The first switch S1 conducts or disconnects to make the first resistor R1 correspondingly connected to or disconnected from the first connection point A. Among them, the resistance value of the first resistor R1 is the first impedance value of the first matching unit 200.

[0045] Thus, in the above radio frequency power supply device 10 of the present application, by configuring the first switch S1, the selective connection with the first connection point A is realized, and by configuring the resistance value of the first resistor R1 as the first impedance value of the first matching unit 200, the impedance matching is performed instead of the load RL or the load RL and the impedance matching unit 400 as a whole.

[0046] As Figure 3As shown, the second matching unit 300 includes a second switch S2. The second switch S2 is connected between the second connection point B and the ground GND. The second switch S2 is turned on or off to enable the second matching unit 300 to be connected or disconnected from the second connection point B correspondingly.

[0047] Thus, in the above-mentioned radio frequency power supply device 10 of the present application, by configuring the second switch S2, the selective connection with the second connection point B is achieved. When the reactance value of the radio frequency source RF is zero, the impedance matching unit 400 is impedance-matched with the load RL, and the overall impedance value is the preset characteristic impedance value. Therefore, when the waveform shaping unit 100 is turned off, there is no need to additionally set a resistor for impedance matching, and the impedance matching unit 400 can still be impedance-matched with the load RL.

[0048] As Figure 3 shown, the waveform shaping unit 100 includes a third switch S3. The third switch S3 is alternately turned on and off at a preset period, correspondingly allowing and prohibiting the initial radio frequency electrical energy XO to pass through the third switch S3 to obtain pulsed radio frequency electrical energy RFS.

[0049] Thus, in the above-mentioned radio frequency power supply device 10 of the present application, by configuring the third switch S3 to be alternately turned on and off at a preset period, the modulation of the initial radio frequency electrical energy XO is achieved to obtain the pulsed radio frequency electrical energy RFS required by the load RL.

[0050] With the above structure, the radio frequency power supply device 10 of the present application can be alternately turned on corresponding to the turn-on or turn-off of the waveform shaping unit 100 by configuring the first matching unit 200 and the second matching unit 300 that are selectively connected to different connection points. Thus, impedance matching can be achieved in each high-level stage and each low-level stage of the pulsed radio frequency electrical energy RFS obtained by the waveform shaping unit 100, so as to improve the output effect and avoid damage to the radio frequency power supply device 10.

[0051] Please refer to Figure 4 , Figure 4 which is a block schematic diagram of the radio frequency power supply system 1 in an embodiment of the present application. As Figure 4 shown, the present application further provides a radio frequency power supply system 1. The radio frequency power supply system 1 includes the radio frequency power supply device 10 in any of the foregoing embodiments.

[0052] Please refer to Figure 1 again. As Figure 1As shown, the radio frequency power supply device 10 is used to output pulsed radio frequency electrical energy RFS to the load RL. Among them, the radio frequency power supply device 10 includes a radio frequency source RF, a waveform shaping unit 100, a first matching unit 200, and a second matching unit 300. The radio frequency source RF is used to output initial radio frequency electrical energy XO. The waveform shaping unit 100 is connected between the radio frequency source RF and the load RL. The waveform shaping unit 100 is used to conduct and disconnect alternately at a preset period to shape the waveform of the initial radio frequency electrical energy XO to obtain pulsed radio frequency electrical energy RFS, and output the pulsed radio frequency electrical energy RFS to the load RL, where the preset period is greater than the period of the initial radio frequency electrical energy XO. The first matching unit 200 is selectively connected or disconnected from the first connection point A. The first connection point A is the connection point between the radio frequency source RF and the waveform shaping unit 100. The first matching unit 200 is used to connect to the first connection point A when the waveform shaping unit 100 is disconnected. The second matching unit 300 is selectively connected or disconnected from the second connection point B. The second connection point B is the connection point between the waveform shaping unit 100 and the load RL. The second matching unit 300 is used to connect to the second connection point B when the waveform shaping unit 100 is disconnected.

[0053] Among them, for the more specific structure of the radio frequency power supply device 10, reference can be made to the relevant content of the radio frequency power supply device 10 in any of the foregoing embodiments, which will not be elaborated here.

[0054] Among them, the radio frequency power supply system 1 can be connected to the load RL to output pulsed radio frequency electrical energy RFS to the load RL.

[0055] For the radio frequency power supply device 10 and the radio frequency power supply system 1 of the present application, through the above structure, by configuring the first matching unit 200 and the second matching unit 300 that are selectively connected to different connection points, it is possible to conduct alternately corresponding to the conduction or disconnection of the waveform shaping unit 100, so that impedance matching can be achieved in each high-level stage and each low-level stage of the pulsed radio frequency electrical energy RFS obtained by the waveform shaping unit 100, so as to improve the output effect and avoid damage to the radio frequency power supply device 10.

[0056] The above description is only the specific implementation manner of the present application, but the protection scope of the present application is not limited thereto. Any person skilled in the art within the technical scope disclosed by the present application can easily think of changes or substitutions, which should all be covered within the protection scope of the present application; without conflict, the embodiments of the present application and the features in the embodiments can be combined with each other. Therefore, the protection scope of the present application should be subject to the protection scope of the claims.

Claims

1. A radio frequency power supply device, characterized in that, For outputting pulsed RF electrical energy to a load, wherein the RF power supply device comprises: an RF source for outputting initial RF electrical energy; a waveform shaping unit connected between the RF source and the load, the waveform shaping unit being configured to alternately conduct and disconnect at a preset period to shape the waveform of the initial RF electrical energy to obtain pulsed RF electrical energy and output the pulsed RF electrical energy to the load, wherein the preset period is greater than the period of the initial RF electrical energy; a first matching unit selectively connectable or disconnectable from a first connection point, the first connection point being the connection point between the RF source and the waveform shaping unit, the first matching unit being configured to connect to the first connection point when the waveform shaping unit is disconnected; a second matching unit selectively connectable or disconnectable from a second connection point, the second connection point being the connection point between the waveform shaping unit and the load, the second matching unit being configured to connect to the second connection point when the waveform shaping unit is disconnected.

2. The radio frequency power supply device according to claim 1, characterized in that, The first matching unit has a first impedance value, the first impedance value being at least related to the impedance value of the load; The second matching unit has a second impedance value, the second impedance value being related to the impedance value of the RF source.

3. The radio frequency power supply device according to claim 2, characterized in that The RF power supply device further comprises an impedance matching unit connected between the waveform shaping unit and the load and connected to the second matching unit, the impedance matching unit being configured to perform impedance matching between the RF source and the load; wherein the first impedance value of the first matching unit is related to the impedance value of the impedance matching unit and the impedance value of the load.

4. The radio frequency power supply device according to claim 3, wherein, The first impedance value of the first matching unit is equal to the overall impedance value of the impedance matching unit and the load.

5. The radio frequency power supply device according to claim 2, characterized in that The impedance value of the RF source includes a resistance value and a reactance value, and the reactance value of the RF source is not equal to zero, and the second impedance value of the second matching unit is equal to the impedance value of the RF source.

6. The radio frequency power supply device according to claim 2, wherein The impedance value of the RF source includes a resistance value and a reactance value, and the reactance value of the RF source is equal to zero, the second impedance value of the second matching unit is equal to zero, and the first impedance value of the first matching unit is equal to the overall resistance value of the impedance matching unit and the load.

7. The radio frequency power supply device according to claim 6, wherein The first matching unit includes a first switch and a first resistor, one end of the first resistor is selectively connectable or disconnectable from the first connection point through the first switch, and the other end of the first resistor is grounded, and the first switch is turned on or off to cause the first resistor to be correspondingly connected or disconnected from the first connection point; wherein the resistance value of the first resistor is the first impedance value of the first matching unit.

8. The radio frequency power supply device according to claim 6, characterized in that, The second matching unit includes a second switch connected between the second connection point and the ground, and the second switch is turned on or off to cause the second matching unit to be correspondingly connected or disconnected from the second connection point.

9. The radio frequency power supply device according to claim 1, characterized in that, The waveform shaping unit includes a third switch, and the third switch is alternately turned on and off at the preset period, correspondingly allowing and prohibiting the initial RF electrical energy to pass through the third switch to obtain the pulsed RF electrical energy.

10. A radio frequency power supply system, characterized in that, It includes the RF power supply device according to any one of claims 1-9.

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