Contour error compensation method, system and equipment for laser galvanometer flight processing system and medium

Abstract

The invention provides a contour error compensation method, system and device for a laser galvanometer flight processing system and a medium, and belongs to the technical field of laser galvanometer flight processing. Analyzing the contour error, and judging whether the contour error is within the maximum compensation range of the micro-platform; if the contour error is not within the range, performing iterative compensation by adjusting the control input of the macro platform, and adjusting the contour error until the contour error is reduced to be within the maximum compensation range of the micro platform; when the contour error meets the maximum compensation range condition of the micro-platform, introducing the error amount generated by the macro-platform into a motion instruction of the micro-platform, and completing off-line compensation by the micro-platform; and verifying whether the compensated actual position meets the preset position requirement or not, if not, repeatedly executing the compensation process until the compensation precision meets the requirement, and meeting the requirement of machining on the precision.

Description

Technical Field

[0001] The present invention belongs to the technical field of laser galvanometer flying processing, and particularly relates to a method, a system, a device and a medium for compensating contour error of a laser galvanometer flying processing system. Background Art

[0002] A laser galvanometer flying processing system is composed of a numerical control machine tool (macro platform) and a laser galvanometer (micro platform). Through the macro-micro collaborative motion, the advantages of the numerical control machine tool's flexibility, large working space and the laser galvanometer's high speed and high response can be fully utilized to achieve high-speed, high-acceleration and high-precision laser processing of complex contours.

[0003] However, in the related art, the laser galvanometer flying processing system often adopts a simple point-to-point error calculation method, ignoring the influence of motion geometric characteristics on the contour error, and unable to accurately reflect the error situation of curves and complex contours in actual processing. For example, when processing a curve trajectory such as an arc, only calculating the straight-line distance error from point to point will miss key error factors such as curve curvature deviation, resulting in a lack of accurate quantitative basis for subsequent compensation and poor compensation effect.

[0004] During the processing, the equipment may generate unforeseen error disturbances due to sudden factors such as mechanical vibration and component loosening. However, the existing technology often lacks the ability of real-time monitoring and correction. There is also a lack of an effective feedback optimization mechanism, unable to adjust the compensation specifically, resulting in difficulty in improving the processing accuracy. Summary of the Invention

[0005] The present invention provides a method for compensating contour error of a laser galvanometer flying processing system, which improves the accuracy, efficiency, reliability and adaptability of the processing system and can meet the requirements of complex precision processing in the manufacturing field.

[0006] The method includes: S101: Determine the target trajectory of the macro platform according to the processing task, and predict the actual output trajectory of the macro platform under the target trajectory based on the system dynamics model; S102: Analyze the contour error between the actual output trajectory and the target trajectory of the macro platform, and judge whether the contour error is within the maximum compensation range of the micro platform; S103: If it is not within the range, perform iterative compensation by adjusting the control input of the macro platform to adjust the contour error until the contour error is reduced to within the maximum compensation range of the micro platform; S104: When the contour error meets the condition of the maximum compensation range of the micro platform, introduce the error amount generated by the macro platform into the motion command of the micro platform, and the micro platform completes the offline compensation; S105: Verify whether the actual position after compensation reaches the preset position requirement. If not, repeat steps S102 to S104 until the compensation accuracy meets the requirement.

[0007] Furthermore, it should be noted that step S101 specifically includes: Step S1011: According to the laser galvanometer flying processing task information, analyze the contour shape, dimensional accuracy, and processing speed of the processing task, and determine the target trajectory direction and range of the macro platform; Step S1012: Based on the system dynamics model, input the initial trajectory, simulate the motion state of the macro platform under the initial trajectory, and predict the actual output trajectory of the macro platform; Step S1013: Compare and analyze the predicted actual output trajectory with the target trajectory, evaluate the magnitude and distribution of the contour error, and adjust the target trajectory of the macro platform based on this; Step S1104: Combine the adjusted target trajectory of the macro platform, and use the system dynamics model again for verification prediction to ensure that the matching degree between the predicted actual output trajectory and the target trajectory is within the preset range.

[0008] Furthermore, it should be noted that step S102 specifically includes: Based on the spatial position relationship between the actual output trajectory and the target trajectory of the macro platform, the contour error formula obtained is:

[0009] Wherein, r is the radius of the inscribed circle C, is the linear motion contour error, is the curve motion contour error.

[0010] Furthermore, it should be noted that step S103 specifically includes: S1031: When it is determined that the contour error exceeds the maximum compensation range of the micro platform, extract the current control input parameters of the macro platform; S1032: Determine the adjustment direction of the control input parameters according to the characteristics of the contour error; S1033: According to the determined adjustment direction, preliminarily adjust the control input of the macro platform to generate a new control input combination; S1034: Apply the new control input combination to the macro platform, and predict the actual output trajectory of the macro platform again based on the system dynamics model, and enter the next round of contour error judgment until the contour error drops within the maximum compensation range of the micro platform.

[0011] Furthermore, it should be noted that step S104 specifically includes: Step S1041: Based on the spatial distribution characteristics of the macro platform error, decompose the error into linear segment offset and curve segment curvature deviation, and respectively set the corresponding compensation priorities of the micro platform; Step S1042: Adjust the compensation step size and direction of the micro-platform according to the current error type and the real-time load status of the micro-platform; Step S1043: Collect the position deviation and vibration response during the compensation process of the micro-platform in real time, and correct the compensation instruction to cancel the unforeseen error disturbance; Step S1044: After the compensation is completed, record the compensation trajectory and compensation effect data of the micro-platform, and feedback them to the macro-platform control strategy optimization module to form a closed-loop compensation.

[0012] It should be further noted that Step S1043 specifically includes: S10431: During the compensation process of the micro-platform, collect the position deviation and vibration response data of the micro-platform in the X, Y, and Z axis directions and the rotational degrees of freedom through the acceleration sensor and displacement sensor set on the micro-platform; S10432: Compare the collected real-time data with the pre-set standard compensation data to identify the unforeseen error disturbances caused by equipment mechanical deformation and environmental vibration; S10433: Display the identified error disturbance information and obtain the adjustment of the compensation instruction input to the micro-platform, including modifying the inflection point position of the compensation path and adjusting the compensation speed curve; S10434: Send the adjusted compensation instruction to the micro-platform drive device, and continuously monitor the compensation effect. If there is still an error, repeat Steps S10431 - S10433 until the error disturbance is cancelled.

[0013] It should be further noted that Step S105 specifically includes: S1051: Real-time obtain the actual position signal of the coordinated movement of the macro and micro platforms after compensation through the position detection device of the laser galvanometer flying machining system, and record the X / Y axis coordinate values and trajectory tracking curves at each time point; S1052: Retrieve the pre-set verification information from the machining process file; S1053: Compare the collected actual position data with each index in the pre-set verification information; S1054: If all the pre-set indicators are met, it is determined that the compensation is qualified and the compensation process ends; If any one of the indicators is not met, record the specific deviation value of the unqualified item, trigger the repeated compensation mechanism, and re-execute Steps S102 to S104 until all indicators are met or the maximum number of repetitions is reached.

[0014] This application also provides a contour error compensation system for a laser galvanometer flying machining system. The system includes: A trajectory planning and prediction module, which is used to determine the target trajectory of the macro platform according to the machining task, and predict the actual output trajectory of the macro platform under the target trajectory based on the system dynamics model; A trajectory planning and prediction module, which is used to analyze the contour error between the actual output trajectory and the target trajectory of the macro platform, and judge whether the contour error is within the maximum compensation range of the micro platform; A macro platform iterative compensation module, which is used to perform iterative compensation by adjusting the control input of the macro platform to adjust the contour error until the contour error is reduced to within the maximum compensation range of the micro platform; A micro platform offline compensation module, which is used to introduce the error amount generated by the macro platform into the motion instruction of the micro platform after the contour error meets the condition of the maximum compensation range of the micro platform, and the micro platform completes the offline compensation; A compensation effect verification and feedback module, which is used to verify whether the actual position after compensation reaches the preset position requirement. If not, the compensation process is repeated until the compensation accuracy meets the requirement.

[0015] According to another embodiment of the present application, an electronic device is provided, including a memory, a processor, and a computer program stored on the memory and executable on the processor. When the processor executes the program, the steps of the contour error compensation method for the laser galvanometer flying machining system are implemented.

[0016] According to still another embodiment of the present application, a storage medium is further provided, on which a computer program is stored. When the computer program is executed by a processor, the steps of the contour error compensation method for the laser galvanometer flying machining system are implemented.

[0017] It can be seen from the above technical solutions that the present invention has the following advantages: The contour error compensation method for the laser galvanometer flying machining system provided by the present invention controls the contour error of the laser galvanometer flying machining system within an extremely small range by calculating the contour error based on geometric relationships, collaborative compensation of the macro and micro platforms, and multi-dimensional verification, meeting the accuracy requirements of machining. The macro platform iterative compensation adjusts the control input according to the contour error characteristics, and the micro platform compensation adjusts the compensation strategy in combination with the real-time load state and error disturbance, enabling the system to adapt to complex working conditions such as different machining tasks, equipment aging, and environmental changes.

[0018] The macro platform gives priority to handling large errors, quickly reduces the contour error to the compensable range of the micro platform, and reduces the compensation pressure of the micro platform; the micro platform makes high-precision corrections for the residual errors, and the closed-loop verification monitors the compensation effect in real time, discovers problems in time and starts repeated compensation, avoiding rework caused by errors found only after machining is completed, and improving machining efficiency. Description of the Drawings

[0019] To more clearly illustrate the technical solution of the present invention, the accompanying drawings required in the description will be briefly introduced below. Obviously, the accompanying drawings in the following description are only some embodiments of the present invention. For those of ordinary skill in the art, other accompanying drawings can be obtained based on these drawings without creative efforts.

[0020] Figure 1 It is a flowchart of the contour error compensation method for the laser galvanometer flying machining system; Figure 2 It is a schematic diagram of the straight-line motion contour error calculation; Figure 3 It is a schematic diagram of the curve motion contour error calculation; Figure 4 It is a flowchart of the macro platform iterative compensation method; Figure 5 It is a schematic diagram of an electronic device. Detailed implementation manners

[0021] The contour error compensation method for the laser galvanometer flying machining system provided by this application solves the problem that the existing single macro platform error compensation method can reduce the contour error in the actual machining process to a certain extent, but has a slow convergence speed and limited compensation effect for rapidly changing errors.

[0022] In view of the above problems, considering the macro-micro coupling characteristics of the laser galvanometer flying machining system, a contour error compensation method based on macro-micro coupling characteristics is proposed, using the characteristics of high precision and fast response of the micro platform to make up for the deficiencies of the single macro platform iterative compensation method.

[0023] The contour error compensation method for the laser galvanometer flying machining system involved in this application will be described in detail below. For the purpose of illustration rather than limitation, specific details such as specific system structures and technologies are proposed to thoroughly understand the embodiments of this application. However, those skilled in the art should clearly understand that this application can also be implemented in other embodiments without these specific details.

[0024] It should be understood that when used in the specification of this application, the term "comprising" indicates the presence of the described features, wholes, steps, operations, elements and / or components, but does not exclude the presence or addition of one or more other features, wholes, steps, operations, elements, components and / or their combinations. The terms "comprising", "including", "having" and their variants all mean "including but not limited to", unless otherwise specifically emphasized in other ways.

[0025] Statements such as "an embodiment" or "some embodiments" described in this application mean that the specific features, structures, or characteristics described in the embodiment are included in one or more embodiments of this application. Thus, statements such as "in one embodiment", "in some embodiments", "in other some embodiments", "in still other embodiments", etc., which appear in different places in this application, do not necessarily refer to the same embodiment, but mean "one or more but not all embodiments", unless otherwise specifically emphasized in other ways.

[0026] In an embodiment of the present invention, computer program code for performing the operations of the present disclosure can be written in one or more programming languages or combinations thereof. The above-mentioned programming languages include, but are not limited to, object-oriented programming languages - such as Java, Smalltalk, C++; and also include conventional procedural programming languages - such as the "C" language or similar programming languages. The program code can be executed entirely on the user's computer, partially on the user's computer, executed as an independent software package, partially on the user's computer and partially on a remote computer, or entirely on a remote computer. In the case of a remote computer, the remote computer can be connected to the user's computer through any type of network - including a local area network (LAN) or a wide area network (WAN) - or, alternatively, can be connected to an external computer (exemplarily, by using an Internet service provider to connect through the Internet).

[0027] The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all of the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present invention without creative efforts shall fall within the protection scope of the present invention.

[0028] Please refer to Figure 1 The following is a flowchart of a contour error compensation method for a laser galvanometer flying machining system in a specific embodiment. The method includes: Step S101: Determine the target trajectory of the macro platform according to the machining task, and predict the actual output trajectory of the macro platform under the target trajectory based on the system dynamics model.

[0029] In some embodiments, after receiving the machining task, the system first reads various parameters in the task, including information such as the shape, size, and speed requirements of the machining. The system here can be the operating system in a numerically controlled machine tool, or a control system responsible for executing the machining task, etc.

[0030] In this embodiment, according to the received information and combined with the motion characteristics of the macro platform, the target trajectory of the macro platform is determined. Then, the parameters related to the target trajectory are input into the system dynamics model, which takes into account factors such as the mechanical structure of the macro platform, the inertia of the moving parts, and the friction force. By simulating the motion process of the macro platform under the target trajectory, the actual output trajectory of the macro platform is predicted.

[0031] In some specific embodiments, step S101 specifically includes: Step S1011: According to the laser galvanometer flying machining task information, analyze the contour shape, dimensional accuracy, and machining speed of the machining task to determine the target trajectory direction and range of the macro platform.

[0032] Step S1012: Based on the system dynamics model, input the initial trajectory, simulate the motion state of the macro platform under the initial trajectory, and predict the actual output trajectory of the macro platform.

[0033] Step S1013: Compare and analyze the predicted actual output trajectory with the target trajectory, evaluate the magnitude and distribution of the contour error, and adjust the target trajectory of the macro platform based on this.

[0034] Step S1104: Combine the adjusted target trajectory of the macro platform and use the system dynamics model again for verification prediction to ensure that the matching degree between the predicted actual output trajectory and the target trajectory is within the preset range.

[0035] In this embodiment, by comparing and analyzing the predicted actual output trajectory with the target trajectory and evaluating the magnitude and distribution of the contour error, the difference between the motion trajectory of the macro platform and the ideal state can be intuitively understood. Based on this, the target trajectory is adjusted, realizing the optimization of trajectory planning.

[0036] For example, if it is found that the error is large at a certain curved trajectory segment, the parameters such as the curvature and speed of this segment of the trajectory can be adjusted specifically to make the target trajectory of the macro platform more in line with the actual machining requirements. Also, combined with the adjusted target trajectory, the system dynamics model is used again for verification prediction, which can test the effect of the target trajectory adjustment and ensure that the matching degree between the finally predicted actual output trajectory and the target trajectory is within a reasonable range. This avoids machining errors caused by the adjusted target trajectory still having unreasonable parts.

[0037] Exemplarily, for a complex surface machining task, the system will plan the motion path of the macro platform according to the curvature change of the surface and the machining speed requirements, and predict the possible position deviation of the macro platform during actual motion. Based on the demand parameters of the machining task and combined with the motion performance of the macro platform, this embodiment formulates a reasonable target trajectory. The system dynamics model is used to simulate the motion of the macro platform. By considering various physical factors during the motion of the macro platform, such as the limitations of the mechanical structure and the inertia of the moving parts, the actual output situation of the macro platform when executing the target trajectory is predicted. This process is similar to performing virtual simulation before actual machining to know in advance the motion performance of the macro platform, improving the machining accuracy and efficiency.

[0038] Step S102: Analyze the contour error between the actual output trajectory and the target trajectory of the macro platform, and determine whether the contour error is within the maximum compensation range of the micro platform.

[0039] In some embodiments, the actual output trajectory of the macro platform obtained in step S101 is compared with the target trajectory point by point. By calculating the distance between the actual trajectory point and the target trajectory point, the contour error between the actual output trajectory and the target trajectory of the macro platform is analyzed. The contour error may be manifested as the offset of a straight line segment, the shape deviation of a curve segment, etc. After calculating the contour error, it is compared with the pre-set maximum compensation range of the micro platform to determine whether the contour error is within the range that the micro platform can effectively compensate.

[0040] Exemplarily, if the maximum compensation range of the micro platform is ±0.05 mm and the maximum value of the calculated contour error is 0.1 mm, it is determined that the contour error exceeds the compensation range of the micro platform. In this way, using the pre-set maximum compensation range of the micro platform as the judgment criterion, it is evaluated whether the current contour error is within the processing capacity of the micro platform, improving the pertinence and effectiveness of error compensation.

[0041] Step S103: If it is not within the range, iterative compensation is performed by adjusting the control input of the macro platform to adjust the contour error until the contour error is reduced to within the maximum compensation range of the micro platform; if the contour error is within the maximum compensation range of the micro platform, the micro platform performs offline compensation.

[0042] In some embodiments, if step S102 determines that the contour error is not within the maximum compensation range of the micro platform, that is, the contour error exceeds the processing capacity of the micro platform, the macro platform iterative compensation process is entered. During the iterative compensation process, the system will adjust the control input parameters of the macro platform according to the current contour error situation. Here, the input parameters may involve speed, acceleration, position control parameters, etc.

[0043] In this embodiment, after each adjustment, the actual output trajectory of the macro platform is re-predicted based on the system dynamics model, the contour error is recalculated, and the new contour error is compared with the maximum compensation range of the micro platform.

[0044] This process of adjustment, prediction, calculation, and judgment is repeated until the contour error is reduced to within the micro-platform's maximum compensation range. If step S102 determines that the contour error is within the micro-platform's maximum compensation range, the micro-platform directly performs offline compensation. Based on the size and direction of the contour error, the micro-platform generates corresponding compensating motion instructions to correct the error generated by the macro-platform. This allows the macro-platform and micro-platform to work together based on the contour error, achieving effective error compensation.

[0045] For larger contour errors, iterative compensation using the macro platform can fully utilize the macro platform's large travel and strong load capacity to quickly reduce the error to a range that the micro platform can handle, improving the efficiency of error compensation. For smaller contour errors, direct compensation is performed by the micro platform, leveraging its high precision to ensure ultimate machining accuracy.

[0046] As an implementation method of this application: Step S103 specifically includes: S1031: When it is determined that the contour error exceeds the maximum compensation range of the micro-platform, extract the current control input parameters of the macro-platform; S1032: Determine the adjustment direction of the control input parameters according to the characteristics of the contour error; S1033: Perform preliminary adjustments to the macro platform control input according to the determined adjustment direction to generate a new control input combination; S1034: Apply the new control input combination to the macro platform, and predict the actual output trajectory of the macro platform based on the system dynamics model again, and enter the next round of contour error judgment until the contour error falls within the maximum compensation range of the micro platform.

[0047] This embodiment determines the direction of control input adjustment based on the trajectory lag, lead, and offset of the contour error. For example, if the error manifests as trajectory offset in a straight segment, position control parameters are prioritized for adjustment; if the error manifests as curvature deviation in a curved segment, velocity planning parameters are prioritized for adjustment. This reduces machining risks caused by improper parameter adjustment and improves the effectiveness of the compensation strategy.

[0048] This embodiment reconstructs the macro-platform motion by generating new control input combinations, thereby systematically correcting contour errors, minimizing disruptive modifications to the original control logic, and ensuring a smooth transition of the macro-platform motion.

[0049] During the iterative process of control input adjustment, trajectory prediction, and error judgment in this embodiment, the contour error can be gradually converged within the micro-platform compensation range. Each iteration predicts the trajectory based on the dynamic model, avoiding the trial-and-error cost in actual machining. Here, for larger errors beyond the micro-platform compensation range, the error can be reduced to the target range through 3-5 iterations.

[0050] Step S104: When the contour error meets the micro-platform maximum compensation range condition, introduce the error amount generated by the macro-platform into the motion command of the micro-platform, and the micro-platform completes the offline compensation.

[0051] In some embodiments, when the contour error meets the micro-platform maximum compensation range condition, the system extracts the error amount information generated by the macro-platform, including the magnitude, direction, and spatial distribution of the error, etc. According to the motion control command format of the micro-platform, convert the error amount into the motion command parameters that the micro-platform can recognize and execute. Then embed these parameters into the motion command of the micro-platform. After receiving the command, the micro-platform executes the offline compensation action according to the command requirements, and corrects the remaining error of the macro-platform during the machining process.

[0052] Optionally, if the macro-platform generates an offset error of 0.03 mm at a certain position, the system converts this error into a displacement command of the micro-platform, and controls the micro-platform to move 0.03 mm in the opposite direction to offset this error.

[0053] Here, utilize the high-precision motion control ability of the micro-platform to convert the error amount generated by the macro-platform into the motion command of the micro-platform, and compensate for the remaining error of the macro-platform through the additional motion of the micro-platform. Without affecting the overall machining process, the micro-platform independently executes the compensation action to achieve precise correction of the error.

[0054] Step S105: Verify whether the actual position after compensation reaches the preset position requirement. If not, repeat steps S102 to S104 until the compensation accuracy meets the requirement.

[0055] In some embodiments, after the micro-platform completes the offline compensation, the system measures the actual position of the machined workpiece through a laser interferometer, grating ruler, etc. Compare the measured actual position data with the preset position requirement, and calculate the deviation between the actual position and the preset position.

[0056] If the deviation is within the allowable error range, it is considered that the compensation accuracy meets the requirement and the machining task is completed. If the deviation exceeds the allowable error range, repeat steps S102 to S104 to perform error analysis, judgment, and compensation again until the actual position after compensation reaches the preset position requirement.

[0057] It can be seen that the actual position information after processing is obtained by a high-precision position detection device, compared with the preset position requirements, and the effect of error compensation is evaluated. If the compensation effect is not ideal, the error compensation process is restarted to form a closed-loop control process, continuously adjusting and optimizing the error compensation strategy until the machining accuracy requirements are met.

[0058] In an embodiment of the present invention, based on step S104, a possible embodiment will be given below to non-restrictively elaborate on its specific implementation scheme.

[0059] Step S104 specifically includes: Step S1041: Based on the spatial distribution characteristics of the macro-platform error, the error is decomposed into a straight-line segment offset and a curve segment curvature deviation, and the corresponding compensation priorities for the micro-platform are set respectively.

[0060] Step S1042: According to the current error type and the real-time load status of the micro-platform, adjust the compensation step size and direction of the micro-platform.

[0061] Step S1043: Real-time collect the position deviation and vibration response during the compensation process of the micro-platform, and correct the compensation instruction to cancel the unforeseen error disturbance.

[0062] Step S1043 specifically includes: S10431: During the compensation process of the micro-platform, collect the position deviation and vibration response data of the micro-platform in the X, Y, Z axis directions and the rotational degrees of freedom through the acceleration sensor and displacement sensor set on the micro-platform.

[0063] S10432: Compare the collected real-time data with the pre-set standard compensation data to identify the unforeseen error disturbance caused by equipment mechanical deformation and environmental vibration.

[0064] S10433: Display the identified error disturbance information and obtain the adjustment of the compensation instruction input to the micro-platform, including modifying the inflection point position of the compensation path and adjusting the compensation speed curve.

[0065] S10434: Send the adjusted compensation instruction to the micro-platform driving device, and continuously monitor the compensation effect. If there is still an error, repeat steps S10431 - S10433 until the error disturbance is canceled.

[0066] Step S1044: After the compensation is completed, record the compensation trajectory and compensation effect data of the micro-platform, and feedback them to the macro-platform control strategy optimization module to form a closed-loop compensation.

[0067] It can be seen that in this embodiment, according to the spatial distribution differences of the macro-platform errors in the straight line segment and the curve segment, the errors are decomposed into linear offsets and curvature deviations, and the micro-platform is set to preferentially correct the errors in the key areas affecting the machining accuracy, ensuring the reasonable allocation of compensation resources. Combining the current error type and the real-time load status of the micro-platform, small-step fine compensation is used to adjust small errors, and large-step fast correction and direction are used for larger errors, avoiding response lag or overshoot caused by fixed compensation strategies. Based on the disturbance characteristics, adjustments are made, such as modifying the inflection points of the compensation path to avoid vibration-sensitive areas and adjusting the speed curve to reduce mechanical shock, to achieve adaptive correction of the compensation trajectory. After the compensation is completed, the movement paths, correction amounts, and error residue values of each axis of the micro-platform are recorded and fed back to the macro-platform control strategy optimization module, which is used to update the dynamic model parameters or adjust the macro-platform iterative compensation, forming a closed-loop compensation method. This avoids mechanical overload or motion conflicts that may be caused by traditional fixed compensation modes. The closed-loop mechanism ensures that each compensation is verified for its effectiveness, improving the machining success rate and product consistency.

[0068] In an embodiment of the present invention, based on step S105, a possible embodiment will be given below to non-restrictively elaborate on its specific implementation scheme.

[0069] Step S105 specifically includes: S1051: The actual position signals of the coordinated movement of the macro and micro platforms after compensation are obtained in real time through the position detection device of the laser galvanometer flying machining system, and the X / Y axis coordinate values and trajectory tracking curves at each time point are recorded.

[0070] S1052: The preset verification information is retrieved from the machining process file.

[0071] The preset verification information includes absolute position tolerance, relative position error, and trajectory constraints, forming a multi-dimensional verification index set.

[0072] S1053: The collected actual position data is compared with each index in the preset verification information.

[0073] Here, it can be detected whether the absolute position falls within the tolerance band of the target position; whether the position deviation between adjacent machining points exceeds the relative error limit, etc.

[0074] S1054: If all the preset indicators are met, it is determined that the compensation is qualified, and the compensation process ends.

[0075] If any one of the indicators is not met, the specific deviation value of the unqualified item is recorded, triggering the repeated compensation mechanism, and steps S102 to S104 are executed again until all indicators are met or the maximum number of repetitions is reached.

[0076] This embodiment captures the actual position information after the collaborative movement of the macro-micro platform in real time, records the X / Y-axis coordinates and trajectory curves at each moment, and provides the original data for the evaluation of the compensation effect. Extract multi-dimensional verification criteria such as absolute position tolerance, relative position error, and trajectory constraint from the processing technology file to form a complete index system covering machining accuracy, position continuity, and motion stability. Compare the collected actual position data with the preset verification indicators item by item, and conduct a comprehensive inspection from three key dimensions: absolute position deviation, relative error between adjacent points, and trajectory speed stability, to identify the error problems that still exist after compensation. If the actual data meets all the preset indicators, it is determined that the compensation is qualified; if there are unqualified items, record the specific deviation value and trigger the repeated compensation mechanism, and re-execute the error analysis and macro-micro compensation process. Through multiple iterations, optimize the compensation method until the machining accuracy requirements are met or the upper limit of the set number of repetitions is reached. The unqualified errors can be corrected specifically, and the gap between the actual position and the target position can be gradually reduced through multiple iterations, ultimately improving the machining accuracy.

[0077] Further, as an extension of the specific implementation manner of the contour error compensation method of the above laser galvanometer flying machining system, in order to effectively compensate the contour error, the contour error of the system is calculated. This embodiment is based on an approximate estimation method of geometric relationships to establish a mathematical expression of the contour error, providing a quantitative basis for error compensation. According to the motion geometric characteristics, the contour error is divided into the linear motion contour error and the curvilinear motion contour error , and the calculation schematic diagrams are as shown in Appendices Figure 2 and Figure 3 . According to the geometric relationships, the contour error can be derived as:

[0078] where r is the radius of the inscribed circle of the area enclosed by the actual trajectory and the desired trajectory, In the contour error analysis of the laser galvanometer flying machining system, the actual output trajectory and the desired trajectory will form a deviation area. r is the radius of the largest inscribed circle within this deviation area, which is used to quantify the local maximum range of the deviation of the actual trajectory from the target trajectory, and assist in deriving the geometric relationships between the contour error and the position deviations and , the trajectory direction angles and .

[0079] and respectively represent the position deviations of the actual trajectory points and the desired trajectory points in the X-axis and Y-axis directions.

[0080] Based on Figure 2 in is the horizontal distance between the actual point P1 and the corresponding point on the desired trajectory along the X-axis direction, and is the vertical distance along the Y-axis direction. The two together describe the position offset of the actual trajectory relative to the desired trajectory.

[0081] is related to the straight-line motion contour error, is the angle between the desired contour curve L1 and the positive X-axis direction, which is used to determine the projection relationship of the error in the contour direction during straight-line motion. In the calculation of the straight-line motion contour error, it helps to convert the deviations in the X and Y-axis directions to the calculation dimension of the contour error.

[0082] is related to the curve motion contour error, is an angular parameter related to the local geometric characteristics of the curve in the curve motion scenario. It is used in the calculation of the curve motion contour error to associate with the inscribed circle radius r and correct the deviations in the X and Y-axis directions to accurately calculate the contour error on the curve trajectory.

[0083] The error compensation method based on the macro-micro coupling characteristics in this embodiment considers the macro-platform iterative compensation. The macro-iteration compensation method here adjusts the control input of the macro-platform according to the dynamic model, introduces the iterative compensation amount to ensure that the output trajectory of the macro-platform is as close as possible to the target trajectory after each iteration, thereby gradually reducing the contour error and making the contour error reach the compensation range of the micro-platform, laying a foundation for collaborative compensation.

[0084] Specifically as follows: Predict the actual response of the system through the forward simulation of the accurate dynamic model, calculate the contour error relative to the target command trajectory according to the actual response, and then feedback the error to the target trajectory for correction. Input the corrected new command trajectory into the dynamic model again to check the compensation effect. Repeat the above process to check whether the output actual position meets the accuracy requirements. If it meets, the compensation is completed; if it does not meet, continue to repeat the above steps until the required accuracy is achieved, as shown in the appendix Figure 4 as shown.

[0085] In this embodiment, for a given target trajectory, the motion trajectories of the macro and micro platforms are planned through the trajectory planning method. Through the dynamic model of the laser galvanometer flying machining system, the target trajectory of the macro platform is predicted to be , and the actual output trajectory of the macro platform is predicted through the dynamic model to be , where t is the time variable. The contour error can be expressed as: .

[0086] During the compensation process, the magnitude of the contour error directly determines the choice of compensation strategy. The micro-platform has a high compensation accuracy, but its compensation range is relatively limited. Let the maximum compensation range of the micro-platform be When the calculated contour error satisfies it is possible to directly use the micro-platform for compensation. At this time, the compensation amount of the micro-platform is the negative value of the contour error:

[0087] For the collaborative compensation method of the macro-platform and the micro-platform, in certain machining tasks, if the contour error of the macro-platform exceeds the compensation capacity of the micro-platform. At this time, it is necessary to first reduce the error to the range that the micro-platform can compensate through the iterative compensation method of the macro-platform, that is and then the micro-platform performs offline compensation, that is, introducing the error generated by the macro-platform into the command of the micro-platform to achieve the final effective compensation.

[0088] The entire compensation process can be summarized as follows: (a) Determine the target trajectory of the macro-platform according to the machining task requirements .

[0089] (b) Use the established dynamic model to predict the actual output of the macro-platform under this target trajectory to obtain .

[0090] (c) Calculate the contour error and determine whether it is within the compensation range of the micro-platform, that is .

[0091] (d) If the condition is met, directly perform offline compensation by the micro-platform, and the compensation amount is

[0092] (e) If the condition is not met, start the iterative compensation process of the macro-platform, gradually reduce the contour error by adjusting the control input of the macro-platform, and then perform compensation by the micro-platform after the micro-platform compensation condition is met.

[0093] It should be understood that the magnitudes of the sequence numbers of the steps in the above embodiments do not mean the order of execution. The execution order of each process should be determined by its function and internal logic, and should not constitute any limitation to the implementation process of the embodiments of the present invention.

[0094] The following are embodiments of the contour error compensation system for a laser galvanometer flying machining system provided by the embodiments of the present disclosure. This system and the contour error compensation method for the laser galvanometer flying machining system in the above embodiments belong to the same inventive concept. For the details not described in detail in the embodiments of the contour error compensation system for the laser galvanometer flying machining system, reference can be made to the embodiments of the above-mentioned contour error compensation method for the laser galvanometer flying machining system.

[0095] The system includes: a trajectory planning and prediction module, configured to determine the target trajectory of the macro platform according to the machining task, and predict the actual output trajectory of the macro platform under the target trajectory based on the system dynamics model.

[0096] A trajectory planning and prediction module, configured to analyze the contour error between the actual output trajectory and the target trajectory of the macro platform, and determine whether the contour error is within the maximum compensation range of the micro platform.

[0097] A macro platform iterative compensation module, configured to perform iterative compensation by adjusting the control input of the macro platform to adjust the contour error until the contour error is reduced to within the maximum compensation range of the micro platform.

[0098] A micro platform offline compensation module, configured to introduce the error amount generated by the macro platform into the motion instruction of the micro platform after the contour error meets the condition of the maximum compensation range of the micro platform, and the micro platform completes the offline compensation.

[0099] A compensation effect verification and feedback module, configured to verify whether the actual position after compensation reaches the preset position requirement. If not, the compensation process is repeated until the compensation accuracy meets the requirement.

[0100] As Figure 5 shown, the present application also provides an electronic device, including a display module 103, a memory 102, a processor 101, and a computer program stored on the memory and executable on the processor 101. When the processor 101 executes the program, the steps of the contour error compensation method for the laser galvanometer flying machining system are implemented.

[0101] In the embodiments of the present invention, the electronic device includes, but is not limited to, a laptop computer, a desktop computer, a workbench, a personal digital assistant, a server, a blade server, a mainframe computer, and other suitable computers. The electronic device may also represent various forms of mobile devices, such as, a personal digital processing device, a cellular phone, a smart phone, a wearable device, and other similar computing devices. The components shown herein, their connections and relationships, and their functions are merely illustrative and are not intended to limit the implementation of the embodiments of the present application described herein and / or claimed.

[0102] In the embodiments of the present application, the processor 101 may be implemented by using at least one of an application specific integrated circuit, a programmable logic device, a field programmable gate array, a processor, a controller, a microcontroller, a microprocessor, and an electronic unit designed to execute the functions described herein. In some cases, such an implementation may be implemented in a controller. For a software implementation, an implementation of a process or function may be implemented with a separate software module that permits execution of at least one function or operation. The software code may be implemented by a software application (or program) written in any appropriate programming language. The software code may be stored in a memory and executed by the controller.

[0103] The display module 103 is configured to display information input by a user or information provided to the user. The display module 103 may include a display panel, and the display panel may be configured in the form of a liquid crystal display, an organic light emitting diode, or the like.

[0104] The memory 102 may be used to store software programs and various data. The memory 102 may include a high-speed random access memory, and may further include a non-volatile memory, such as at least one magnetic disk storage device, a flash memory device, or other volatile solid state storage devices.

[0105] The present application also provides a storage medium, on which a computer program is stored. When the computer program is executed by a processor, the steps of the contour error compensation method for the laser galvanometer flying machining system are implemented.

[0106] The storage medium may be any combination of one or more readable media. The readable media may be a readable signal medium or a readable storage medium. The readable storage medium may be, for example, but not limited to, an electrical, magnetic, optical, electromagnetic, infrared, or semiconductor system, apparatus, or device, or any combination of the above. More specific examples (a non-exhaustive list) of the readable storage medium include: an electrical connection having one or more wires, a portable disk, a hard disk, a random access memory (RAM), a read only memory (ROM), an erasable programmable read only memory (EPROM or flash memory), an optical fiber, a portable compact disk read only memory (CD-ROM), an optical storage device, a magnetic storage device, or any suitable combination of the above.

[0107] In the storage medium, the readable signal medium may include a data signal propagated in a baseband or as a part of a carrier wave, in which the readable program code is carried. Such a propagated data signal may take various forms, including but not limited to an electromagnetic signal, an optical signal, or any suitable combination of the above. The readable signal medium may also be any readable medium other than the readable storage medium, and the readable medium may send, propagate, or transmit a program used by or in combination with an instruction execution system, apparatus, or device.

[0108] The foregoing description of the disclosed embodiments enables those skilled in the art to implement or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A method for compensating contour error of a laser galvanometer flying machining system, characterized in that The method includes: S101: Determine the target trajectory of the macro platform according to the processing task, and predict the actual output trajectory of the macro platform under the target trajectory based on the system dynamics model; S102: Analyze the contour error between the actual output trajectory and the target trajectory of the macro platform, and determine whether the contour error is within the maximum compensation range of the micro platform; S103: If it is not within the range, perform iterative compensation by adjusting the control input of the macro platform to adjust the contour error until the contour error is reduced to within the maximum compensation range of the micro platform; S104: When the contour error meets the conditions of the maximum compensation range of the micro platform, introduce the error amount generated by the macro platform into the motion instruction of the micro platform, and the micro platform completes the offline compensation; S105: Verify whether the actual position after compensation reaches the preset position requirement. If not, repeat steps S102 to S104 until the compensation accuracy meets the requirement.

2. The contour error compensation method of the laser galvanometer flying machining system according to claim 1, characterized in that Step S101 specifically includes: S1011: According to the laser galvanometer flying processing task information, analyze the contour shape, dimensional accuracy and processing speed of the processing task, and determine the target trajectory direction and range of the macro platform; S1012: Based on the system dynamics model, input the initial trajectory, simulate the motion state of the macro platform under the initial trajectory, and predict the actual output trajectory of the macro platform; S1013: Compare and analyze the predicted actual output trajectory with the target trajectory, evaluate the magnitude and distribution of the contour error, and adjust the target trajectory of the macro platform based on this; S1104: Combine the adjusted target trajectory of the macro platform, and use the system dynamics model for verification prediction again to ensure that the matching degree between the predicted actual output trajectory and the target trajectory is within the preset range.

3. The contour error compensation method for the laser galvanometer flying machining system according to claim 1, characterized in that Step S102 specifically includes: Based on the spatial position relationship between the actual output trajectory and the target trajectory of the macro platform, the obtained contour error formula is: Among them, r is the radius of the inscribed circle of the area enclosed by the actual trajectory and the desired trajectory, is the contour error of linear motion, is the contour error of curvilinear motion, and respectively represent the position deviations of the actual trajectory point and the desired trajectory point in the X-axis and Y-axis directions, is the angle between the desired contour curve and the positive direction of the X-axis; is an angular parameter related to the local geometric characteristics of the curve in the curvilinear motion scenario.

4. The contour error compensation method for a laser galvanometer flying machining system according to claim 1, characterized in that Step S103 specifically includes: S1031: When it is determined that the contour error exceeds the maximum compensation range of the micro platform, extract the current control input parameters of the macro platform; S1032: Determine the adjustment direction of the control input parameters according to the characteristics of the contour error; S1033: According to the determined adjustment direction, make a preliminary adjustment to the control input of the macro platform to generate a new control input combination; S1034: Apply the new control input combination to the macro platform, and predict the actual output trajectory of the macro platform again based on the system dynamics model, and enter the next round of contour error judgment until the contour error is reduced to within the maximum compensation range of the micro platform.

5. The contour error compensation method of the laser galvanometer flying machining system according to claim 1, characterized in that Step S104 specifically includes: S1041: Based on the spatial distribution characteristics of the macro platform error, decompose the error into straight-line segment offset and curve segment curvature deviation, and respectively set the corresponding compensation priorities for the micro platform; S1042: Adjust the compensation step size and direction of the micro platform according to the current error type and the real-time load state of the micro platform; S1043: Real-time collect the position deviation and vibration response during the compensation process of the micro platform, and correct the compensation instruction to cancel the unforeseen error disturbance; S1044: After the compensation is completed, record the compensation trajectory and compensation effect data of the micro platform, and feedback them to the macro platform control strategy optimization module to form a closed-loop compensation.

6. The contour error compensation method of the laser galvanometer flying machining system according to claim 1, characterized in that Step S1043 specifically includes: S10431: During the micro-platform compensation process, collect the position deviation and vibration response data of the micro-platform in the X, Y, Z axis directions and rotational degrees of freedom through the acceleration sensor and displacement sensor set on the micro-platform; S10432: Compare the collected real-time data with the pre-set standard compensation data to identify the unforeseen error disturbances caused by equipment mechanical deformation and environmental vibration; S10433: Display the identified error disturbance information and obtain and adjust the compensation instruction input to the micro-platform, including modifying the inflection point position of the compensation path and adjusting the compensation speed curve; S10434: Send the adjusted compensation instruction to the micro-platform drive device, and continuously monitor the compensation effect. If there is still an error, repeat steps S10431 - S10433 until the error disturbance is cancelled.

7. The contour error compensation method of the laser galvanometer flying machining system according to claim 1, characterized in that, Step S105 specifically includes: S1051: Real-time obtain the actual position signal of the coordinated movement of the macro and micro platforms after compensation through the position detection device of the laser galvanometer flying machining system, and record the X / Y axis coordinate values and trajectory tracking curves at each time point; S1052: Retrieve the pre-set verification information from the machining process file; S1053: Compare the collected actual position data with each index in the pre-set verification information; S1054: If all pre-set indicators are met, determine that the compensation is qualified and end the compensation process; If any one of the indicators is not met, record the specific deviation value of the unqualified item, trigger the repeated compensation mechanism, and re-execute steps S102 to S104 until all indicators are met or the maximum number of repetitions is reached.

8. A contour error compensation system for a laser galvanometer flying machining system, characterized in that, The system is used to implement the laser galvanometer flying machining system contour error compensation method as described in any one of claims 1 to 7; The system includes: A trajectory planning and prediction module, used to determine the target trajectory of the macro-platform according to the machining task, and predict the actual output trajectory of the macro-platform under the target trajectory based on the system dynamics model; A trajectory planning and prediction module, used to analyze the contour error between the actual output trajectory and the target trajectory of the macro-platform, and judge whether the contour error is within the maximum compensation range of the micro-platform; A macro-platform iterative compensation module, used to perform iterative compensation by adjusting the control input of the macro-platform to adjust the contour error until the contour error is reduced to within the maximum compensation range of the micro-platform; A micro-platform offline compensation module, used to introduce the error amount generated by the macro-platform into the motion instruction of the micro-platform after the contour error meets the condition of the maximum compensation range of the micro-platform, and complete the offline compensation by the micro-platform; A compensation effect verification and feedback module, used to verify whether the actual position after compensation meets the pre-set position requirements. If not, repeat the compensation process until the compensation accuracy meets the requirements.

9. An electronic device, comprising a memory, a processor, and a computer program stored on the memory and executable on the processor, characterized in that, When the processor executes the program, it realizes the steps of the laser galvanometer flying machining system contour error compensation method as described in any one of claims 1 to 7.

10. A storage medium having a computer program stored thereon, characterized in that, When the computer program is executed by the processor, it realizes the steps of the laser galvanometer flying machining system contour error compensation method as described in any one of claims 1 to 7.

Images