High-strength glass and preparation method thereof

Abstract

The invention discloses high-strength glass. The glass comprises a tempered glass substrate; a # imgabs0 # layer on the tempered glass substrate, where x = 1-3, y = 6-8, and x + y = 9; a # imgabs2 # layer on the # imgabs1 # layer, where w = 2-4, z = 5-7, and w + z = 9; a # imgabs4 # layer on the # imgabs3 # layer, where a = 1-3, b = 6-8, and a + b = 9; and a # imgabs6 # layer on the # imgabs5 # layer, where c = 2-4, d = 5-7, and c + d = 9. According to the high-strength glass disclosed by the invention, the amorphous alloy coating is used, so that the risk of grain boundary corrosion is greatly reduced, and the coating is a rare earth doped amorphous alloy coating, so that the mechanical property of the tempered glass can be remarkably improved.

Description

Technical Field

[0001] The present invention relates to the technical field of layered materials, and particularly to a high-strength glass and a preparation method thereof. Background Art

[0002] Tempered glass is glass with compressive stress on its surface. Tempered glass is divided into physical tempered glass and chemical tempered glass according to different tempering methods, and is divided into flat tempered glass and curved tempered glass according to the shape of the tempered glass. Since its inception, tempered glass has always been an important type of glass product. The prior art CN109574499A discloses a high-strength tempered glass. Although the tempered glass proposed by this prior art has relatively high mechanical properties, this tempered glass does not use a surface coating, which results in the inability to further improve the performance of this tempered glass. The prior art CN117865506A also proposes a high-strength tempered glass. Although this prior art recognizes that certain coatings can improve the performance of tempered glass, the coatings used in this prior art are not resistant to high temperatures (for example, this prior art only tested the heat resistance of the glass at 100°C and the low-temperature resistance at -35°C), which results in the tempered glass proposed by this prior art not being able to be used in high-temperature and low-temperature environments.

[0003] The information disclosed in this background art section is only intended to increase the understanding of the overall background of the present invention, and should not be regarded as an admission or any form of implication that this information constitutes the prior art already known to those of ordinary skill in the art. Summary of the Invention

[0004] The purpose of the present invention is to provide a high-strength glass and a preparation method thereof. The high-strength glass of the present invention uses a coating of amorphous alloy. The amorphous alloy coating can withstand high temperatures and low temperatures, and there are no grain boundaries in the amorphous alloy, which greatly reduces the risk of grain boundary corrosion. Moreover, the coatings of the present invention are all rare-earth-doped amorphous alloy coatings, and such coatings can significantly improve the mechanical properties of tempered glass.

[0005] The present invention provides a high-strength glass, which comprises:

[0006] A tempered glass substrate;

[0007] An Fe 90 Zr1Gd x Ce y layer, where x = 1 - 3, y = 6 - 8, and x + y = 9;

[0008] On the Fe 90 Zr1Gd x Ce y layer, an Fe 90 Zr1La w Cez layers, where w = 2 - 4, z = 5 - 7, and w + z = 9;

[0009] in Fe 90 Zr1La w Ce z layer of Fe 90 Zr1Gd a La b layers, where a = 1 - 3, b = 6 - 8, and a + b = 9; and

[0010] in Fe 90 Zr1Gd a La b layer of Fe 90 Zr1Dy c La d layers, where c = 2 - 4, d = 5 - 7, and c + d = 9.

[0011] In a preferred embodiment, the thickness of the Fe 90 Zr1Gd x Ce y layer is 300 - 500 nm.

[0012] In a preferred embodiment, the thickness of the Fe 90 Zr1La w Ce z layer is 200 - 290 nm.

[0013] In a preferred embodiment, the thickness of the Fe 90 Zr1Gd a La b layer is 300 - 500 nm.

[0014] In a preferred embodiment, the thickness of the Fe 90 Zr1Dy c La d layer is 150 - 180 nm.

[0015] In a preferred embodiment, the Fe 90 Zr1Gd x Ce y layer is formed by the following method: magnetron sputtering is used to form the Fe 90 Zr1Gd x Ce y layer, the sputtering power supply is a radio frequency power supply, the sputtering voltage is 100 - 150 V, the sputtering power is 140 - 200 W, the sputtering temperature is 100 - 150 °C, the sputtering atmosphere is an argon atmosphere, and the argon flow rate is 30 - 40 sccm.

[0016] In a preferred embodiment, Fe 90 Zr1La w Ce z The layer is formed by the following method: The Fe 90 Zr1La w Ce z layer is formed by magnetron sputtering. The sputtering power supply is a radio frequency power supply, the sputtering voltage is 40 - 50 V, the sputtering power is 70 - 100 W, the sputtering temperature is 100 - 150 °C, the sputtering atmosphere is an argon atmosphere, and the argon flow rate is 30 - 40 sccm.

[0017] In a preferred embodiment, Fe 90 Zr1Gd a La b The layer is formed by the following method: The Fe 90 Zr1Gd a La b layer is formed by magnetron sputtering. The sputtering power supply is a radio frequency power supply, the sputtering voltage is 40 - 50 V, the sputtering power is 70 - 100 W, the sputtering temperature is 100 - 150 °C, the sputtering atmosphere is an argon atmosphere, and the argon flow rate is 30 - 40 sccm.

[0018] In a preferred embodiment, Fe 90 Zr1Dy c La d The layer is formed by the following method: The Fe 90 Zr1Dy c La I d layer is formed by magnetron sputtering. The sputtering power supply is a radio frequency power supply, the sputtering voltage is 100 - 150 V, the sputtering power is 100 - 150 W, the sputtering temperature is 100 - 150 °C, the sputtering atmosphere is an argon atmosphere, and the argon flow rate is 30 - 40 sccm.

[0019] The present invention provides a method for preparing high-strength glass, and the method includes:

[0020] Providing tempered glass;

[0021] Depositing an Fe 90 Zr1Gd x Ce y layer on the surface of the tempered glass, where x = 1 - 3, y = 6 - 8, and x + y = 9;

[0022] Depositing an Fe 90 Zr1Gd x Ce y layer on the surface of the Fe 90 Zr1La w Ce zlayers, where w = 2 - 4, z = 5 - 7, and w + z = 9;

[0023] On the surface of the Fe 90 Zr1La w Ce z deposit Fe on the layer surface 90 Zr1Gd a La b layer, where a = 1 - 3, b = 6 - 8, and a + b = 9; and

[0024] On the surface of the Fe 90 Zr1Gd a La b deposit Fe on the layer surface 90 Zr1Dy c La d layer, where c = 2 - 4, d = 5 - 7, and c + d = 9.

[0025] Compared with the prior art, the present invention has the following advantages. The high-strength glass of the present invention uses an amorphous alloy coating. The amorphous alloy coating can withstand high and low temperatures, and there are no grain boundaries in the amorphous alloy, which greatly reduces the risk of grain boundary corrosion. Moreover, the coatings of the present invention are all rare-earth doped amorphous alloy coatings, and such coatings can significantly improve the mechanical properties of tempered glass. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 is a schematic structural diagram of an embodiment of the present invention.

[0027] Figure 2 is a schematic structural diagram of another embodiment of the present invention.

[0028] Figure 3 is a flowchart of a method of an embodiment of the present invention.

[0029] Figure 4 is an XRD pattern of an embodiment of the present invention.

[0030] Figure 5 is an XRD pattern of another embodiment of the present invention. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0031] The following will describe in detail the specific embodiments of the present invention with reference to the accompanying drawings, but it should be understood that the protection scope of the present invention is not limited by the specific embodiments.

[0032] Figure 1 is a schematic structural diagram of an embodiment of the present invention. As shown in the figure, the high-strength glass of the present invention sequentially includes a tempered glass substrate, Fe 90 Zr1Gd x Cey layer, Fe 90 Zr1La w Ce z layer, Fe 90 Zr1Gd a La b layer and Fe 90 Zr1Dy c La d layer. It should be noted that Figure 1 the structure of the tempered glass shown is applicable to the tempered glass under unidirectional stress, such as glass containers, etc.

[0033] Figure 2 is a schematic structural diagram of another embodiment of the present invention. As shown in the figure, the difference between this embodiment and Figure 1 is that in this embodiment, both sides of the tempered glass substrate sequentially include Fe 90 Zr1Gd x Ce y layer, Fe 90 Zr1La w Ce z layer, Fe 90 Zr1Gd a La b layer and Fe 90 Zr1Dy c La d layer. It can be understood that for the tempered glass under bidirectional stress, the structure of this embodiment can be adopted.

[0034] Figure 3 is a flowchart of the method of an embodiment of the present invention. As shown in the figure, the method of the present invention includes the following steps:

[0035] Step 1: Provide tempered glass;

[0036] Step 2: Deposit Fe 90 Zr1Gd x Ce y layer on the surface of the tempered glass;

[0037] Step 3: Deposit Fe 90 Zr1Gd x Ce y layer on the surface of the Fe 90 Zr1La w Ce z layer;

[0038] Step 4: Deposit Fe 90 Zr1La w Ce z layer on the surface of the Fe 90 Zr1Gd aLa b layer; and

[0039] Step 5: Deposit Fe 90 Zr1Gd a La[[ID=IO]] b layer on the surface of the Fe 90 Zr1Dy c La d layer.

[0040] Example 1

[0041] The high-strength glass includes: a tempered glass substrate; an Fe 90 Zr1Gd x Ce y layer, where x = 1, y = 8; an Fe 90 Zr1Gd x Ce y layer on the Fe 90 Zr1La w Ce z layer, where w = 2, z = 7,; an Fe 90 Zr1La w Ce z layer on the Fe 90 Zr1Gd a La b layer, where a = 1, b = 8; and an Fe 90 Zr1Gd a La b layer on the Fe 90 Zr1Dy c La d layer, where c = 2, d = 7. For the purpose of convenient comparison, unless otherwise instructed, the tempered glass used in each example or comparative example of the present invention is the glass of Example 3 in the prior art CN109574499A, and this glass can be directly purchased from the patent holder.

[0042] Fe 90 Zr1Gd x Ce y layer has a thickness of 300 nm. The Fe 90 Zr1La w Ce z layer has a thickness of 200 nm. The Fe 90 Zr1Gd a La b layer has a thickness of 300 nm. The Fe 90 Zr1Dy c La d layer has a thickness of 150 nm.

[0043] Fe 90 Zr1Gd x Ce y The layer is formed by the following method: magnetron sputtering is used to form Fe 90 Zr1Gd x Ce y layer, the sputtering power supply is a radio frequency power supply, the sputtering voltage is 100V, the sputtering power is 140W, the sputtering temperature is 100°C, the sputtering atmosphere is an argon atmosphere, and the argon flow rate is 30 sccm. It can be understood that the target used in this step is Fe 90 Zr1Gd1Ce8 target, and this target can be formed by powder metallurgy process. The process steps are briefly introduced as follows: First, raw materials are prepared according to the chemical ratio, and then each raw material is melted into an alloy ingot by the melting method. Subsequently, the alloy ingot is mechanically crushed, and then the alloy fragments are ball milled to obtain alloy powder. Then, the alloy powder is cold pressed and hot pressed to form the Fe 90 Zr1Gd1Ce8 target. The process parameters of each step of powder metallurgy are common knowledge and will not be elaborated in this invention. In addition, the alloy target of this invention is processed by a local non-ferrous metal processing factory. It should be understood that the preparation method of the target used to form other layers in Example 1 is similar to that of the Fe 90 Zr1Gd1Ce8 target, and the target used to form other layers in this invention in Example 1 is also processed by a local non-ferrous metal processing factory. For other embodiments and comparative examples of this invention, the manufacturing method and source of the target are the same as those in Example 1 and will not be elaborated later.

[0044] Fe 90 Zr1La w Ce z The layer is formed by the following method: magnetron sputtering is used to form Fe 90 Zr1La w Ce z layer, the sputtering power supply is a radio frequency power supply, the sputtering voltage is 40V, the sputtering power is 70W, the sputtering temperature is 100°C, the sputtering atmosphere is an argon atmosphere, and the argon flow rate is 30 sccm.

[0045] Fe 90 Zr1Gd a La b The layer is formed by the following method: magnetron sputtering is used to form Fe 90 Zr1Gd a La b layer, the sputtering power supply is a radio frequency power supply, the sputtering voltage is 40V, the sputtering power is 70W, the sputtering temperature is 100°C, the sputtering atmosphere is an argon atmosphere, and the argon flow rate is 30 sccm.

[0046] Fe 90Zr1Dy c La d The layer is formed by the following method: Fe is formed by magnetron sputtering 90 Zr1Dy c La d layer, the sputtering power supply is a radio frequency power supply, the sputtering voltage is 100V, the sputtering power is 100W, the sputtering temperature is 100°C, the sputtering atmosphere is an argon atmosphere, and the argon flow rate is 30 sccm.

[0047] In traditional amorphous alloys, it is very difficult to form amorphous alloys with pure rare earth-doped FeZr alloys. Generally, there will be sporadic nanocrystals in such alloys. In the XRD pattern, such alloys will show very obvious diffraction peaks. In order to form amorphous alloys, it is generally necessary to add B to the FeZr alloy (because B can promote the formation of amorphous), which is also the reason why FeZrB-based amorphous alloys are a kind of mainstream amorphous alloys. Similarly, FeCoSiB is also a kind of mainstream amorphous alloy. However, B is a non-metal. Adding this element to the alloy will cause non-metal compound phases to appear in the finally formed amorphous alloy. This phase is completely different from the basic properties such as the properties and thermodynamic characteristics of other phases, which leads to the phase boundary often becoming a weak point in terms of mechanics and corrosion. Using extremely costly extreme processes can produce rare earth-doped FeZr-based alloys without doping B, but this method is only applicable to small-scale preparation and research in the laboratory and is not applicable to industrial production. The composite film layer structure of the present invention can enable the present invention to eliminate nanocrystal particles in each film layer on the premise of only using non-extreme processes, thereby forming an amorphous coating. Since the amorphous coating has no grain boundaries, the risk of grain boundary corrosion is reduced, and the product life is increased. The XRD diffraction pattern of Example 1 can be seen in Figure 4 。The principle of the composite film layer of the present invention to promote the formation of amorphous may be as follows: Introducing a combination of multiple rare earth elements in each layer significantly increases the configurational mixing entropy of the system. According to the Boltzmann entropy formula, the increase in the number of components in the four-layer structure makes the mixing entropy increase to a large extent compared with the single-layer system. The chemical similarity between rare earth elements avoids phase separation, and the high-entropy state effectively suppresses the phase transformation driving force from the amorphous state to the crystalline state. Each layer of rare earth elements has a significant difference in atomic radius, and the atomic size mismatch degree between adjacent layers reaches 4.3%-16.1%. This size gradient forms a strain barrier at the interlayer interface. When the mismatch degree increases, the energy barrier that atoms need to overcome for diffusion also increases, effectively blocking the grain boundary migration channel and kinetically inhibiting the crystallization process. All atom pairs (Fe-Gd, Fe-Ce, Gd-La, etc.) show negative mixing enthalpy characteristics. The multi-layer stacking makes strong metal bond hybridization form in the interface region, enhancing the thermal stability of the amorphous state.

[0048] The impact strength test and bending strength test were carried out on Example 1. Among them, the impact strength test followed the relevant content of GB15763.2-2005 "Safety Glass for Building - Part 2: Tempered Glass", and the bending strength test was the same as the prior art CN117865506A. The impact strength was 152 MPa and the bending strength was 120 MPa. It can be seen that compared with the uncoated tempered glass in CN109574499A, the strength of the high-strength glass of the present invention has been greatly improved. The improvement of this mechanical property can be roughly explained by the following theory: the cross-scale coupling effect of the electronic state reconstruction, lattice dynamics modulation and defect response of rare earth elements in the coating improves the mechanical property of the tempered glass. In terms of interface bonding strengthening, the unsaturated 4f orbitals of light rare earth elements (such as Ce³⁺) hybridize with the 2p orbitals of oxygen atoms in the glass matrix to form a highly directional metal-oxygen-silicon covalent bond network. This hybridization reconstructs the interfacial electron cloud distribution, shifts the bonding electron density to the high potential energy region, and significantly enhances the interatomic binding force; at the same time, the half-filled 4f electron shell of heavy rare earth components (such as Gd³⁺, Dy³⁺) generates a local strong magnetic moment, constructing a spin-polarized gradient field in the coating. When an external load causes the propagation of microcracks, the unpaired electrons at the crack tip are affected by the spin-orbit coupling effect, and their angular momentum and spin magnetic moment are locked in a specific quantum state, hindering the tunneling process of electrons participating in bond-breaking recombination, thereby inhibiting the migration of atoms at the crack tip. In the dimension of energy dissipation, rare earths with large atomic radii (such as La³⁺) induce anharmonic vibrations of the lattice, and their low-frequency phonon modes (<20 THz) resonate and couple with the high-frequency stretching modes (>30 THz) of the silicon-oxygen tetrahedra in the glass network. This coupling leads to a collective attenuation of the phonon group velocity, converting the impact kinetic energy into lattice heat energy through non-radiative transitions, and effectively dispersing the coherence of the stress wave propagation. At the same time, variable valence elements (such as Ce³⁺ / Ce 4 ⁺) form dynamic charge compensation traps at the coating interface, capture the oxygen vacancy defect electrons generated by environmental erosion through valence fluctuations, and block the extension of the defect states in the energy band gap. This process continuously repairs the integrity of the interfacial electronic structure and inhibits the nucleation of corrosion-induced microcracks. The cascade design of the four-layer coating further amplifies the quantum synergistic effect: the first layer (Gd / Ce) lays a strong bonding foundation through high hybridization; the second layer (La / Ce) enhances phonon scattering using mass contrast; the third layer (Gd / La) constrains the crack propagation path with a magnetic moment gradient field; the final layer (Dy / La) seals the energy transfer channel with a strong spin-orbit coupling barrier.

[0049] Finally, the glass made from Example 1 was placed in a heat treatment furnace at 400 °C for 100 days (referred to as the high-temperature sample) and in an environment at -70 °C for 100 days (referred to as the low-temperature sample) respectively, and then the impact strength retention rates of the two were tested. The retention rate of the high-temperature sample was 98%, and the retention rate of the low-temperature sample was 98%.

[0050] Example 2

[0051] The high-strength glass includes: a tempered glass substrate; an Fe 90 Zr1Gd x Ce y layer, where x = 3 and y = 6; an Fe 90 Zr1Gd x Ce y layer; an Fe 90 Zr1La w Ce z layer, where w = 4 and z = 5; an Fe 90 Zr1La w Ce z layer; an Fe 90 Zr1Gd a La b layer, where a = 3 and b = 6; and an Fe 90 Zr1Gd a La b layer; an Fe 90 Zr1Dy c La d layer, where c = 4 and d = 5.

[0052] Fe 90 Zr1Gd x Ce y layer has a thickness of 500 nm. The Fe 90 Zr1La w Ce z layer has a thickness of 290 nm. The Fe 90 Zr1Gd a La b layer has a thickness of 500 nm. The Fe 90 Zr1Dy c La d layer has a thickness of 180 nm.

[0053] Fe 90 Zr1Gd x Ce y layer is formed by the following method: magnetron sputtering is used to form the Fe 90 Zr1Gd x Ce y layer. The sputtering power supply is a radio frequency power supply, the sputtering voltage is 150 V, the sputtering power is 200 W, the sputtering temperature is 150 °C, the sputtering atmosphere is an argon atmosphere, and the argon flow rate is 30 sccm.

[0054] Fe 90 Zr1La w Cez The layer is formed by the following method: magnetron sputtering is used to form Fe 90 Zr1La w Ce z layer, the sputtering power supply is a radio frequency power supply, the sputtering voltage is 50V, the sputtering power is 100W, the sputtering temperature is 150°C, the sputtering atmosphere is an argon atmosphere, and the argon flow rate is 30 sccm.

[0055] Fe 90 Zr1Gd a La b The layer is formed by the following method: magnetron sputtering is used to form Fe 90 Zr1Gd a La b layer, the sputtering power supply is a radio frequency power supply, the sputtering voltage is 50V, the sputtering power is 100W, the sputtering temperature is 150°C, the sputtering atmosphere is an argon atmosphere, and the argon flow rate is 30 sccm.

[0056] Fe 90 Zr1Dy c La d The layer is formed by the following method: magnetron sputtering is used to form Fe 90 Zr1Dy c La d layer, the sputtering power supply is a radio frequency power supply, the sputtering voltage is 150V, the sputtering power is 150W, the sputtering temperature is 150°C, the sputtering atmosphere is an argon atmosphere, and the argon flow rate is 30 sccm.

[0057] The XRD diffraction pattern of Example 2 can be seen in Figure 5 . As shown in the figure, the alloy coating of Example 2 is also amorphous. The impact resistance strength of Example 2 is 154 MPa, and the bending strength is 123 MPa. The glass made in Example 2 is respectively placed in a heat treatment furnace at 400°C for 100 days (referred to as the high-temperature sample), and in an environment of -70°C for 100 days (referred to as the low-temperature sample), and then the impact resistance strength retention rates of the two are tested. The retention rate of the high-temperature sample is 98%, and the retention rate of the low-temperature sample is 98%.

[0058] Example 3

[0059] The high-strength glass includes: a tempered glass substrate; Fe on the tempered glass substrate 90 Zr1Gd x Ce y layer, where x = 2 and y = 7; on Fe 90 Zr1Gd x Ce y layer, Fe 90 Zr1La w Ce zlayer, where w=3, z=6; in Fe 90 ZlUT w Ce z Fe on the layer 90 Zr1Gd a La b layer, where a=2, b=7; and in Fe 90 Zr1Gd a La b Fe on the layer 90 ZlUT c La d layer, where c=3 and d=6.

[0060] Fe 90 Zr1Gd x Ce y The thickness of the layer is 400 nm. 90 ZlUT w Ce z The thickness of the layer is 250 nm. 90 Zr1Gd a La b The thickness of the layer is 400 nm. 90 ZlUT c La d The thickness of the layer was 160 nm.

[0061] Fe 90 Zr1Gd x Ce y The layer is formed by the following method: Fe 90 Zr1Gd x Ce y layer, the sputtering power supply is a radio frequency power supply, the sputtering voltage is 120 V, the sputtering power is 160 W, the sputtering temperature is 120 ° C, the sputtering atmosphere is an argon atmosphere, and the argon flow rate is 30 sccm.

[0062] Fe 90 ZlUT w Ce z The layer is formed by the following method: Fe 90 ZlUT w Ce z layer, the sputtering power supply is a radio frequency power supply, the sputtering voltage is 45 V, the sputtering power is 80 W, the sputtering temperature is 120 ° C, the sputtering atmosphere is an argon atmosphere, and the argon flow rate is 30 sccm.

[0063] Fe 90 Zr1Gd a La bThe layer is formed by the following method: magnetron sputtering is used to form Fe 90 Zr1Gd a La b layer. The sputtering power supply is a radio frequency power supply, the sputtering voltage is 45V, the sputtering power is 80W, the sputtering temperature is 120°C, the sputtering atmosphere is an argon atmosphere, and the argon flow rate is 30 sccm.

[0064] Fe 90 Zr1Dy c La d The layer is formed by the following method: magnetron sputtering is used to form Fe 90 Zr1Dy c La d layer. The sputtering power supply is a radio frequency power supply, the sputtering voltage is 120V, the sputtering power is 120W, the sputtering temperature is 120°C, the sputtering atmosphere is an argon atmosphere, and the argon flow rate is 30 sccm. The impact resistance of Example 3 is 149 MPa and the flexural strength is 118 MPa. The glass made in Example 3 is respectively placed in a heat treatment furnace at 400°C for 100 days (referred to as the high-temperature sample) and in an environment at -70°C for 100 days (referred to as the low-temperature sample), and then the impact resistance retention rates of the two are tested. The retention rate of the high-temperature sample is 99%, and the retention rate of the low-temperature sample is 98%.

[0065] Comparative Example 1

[0066] The high-strength glass includes: a tempered glass substrate; an Fe 90 Zr1Gd x Ce y layer, where x = 1 and y = 8; an Fe 90 Zr1Gd x Ce y layer on the Fe 90 Zr1La w Ce z layer, where w = 2 and z = 7; an Fe 90 Zr1La w Ce z layer on the Fe 90 Zr1Dy c La d layer, where c = 2 and d = 7. Other process parameters are the same as those in Example 1. The impact resistance of Comparative Example 1 is 138 MPa and the flexural strength is 109 MPa. The reason for the decrease in mechanical properties of this comparative example compared to the example may be that: reducing the heavy rare earth component (Gd³⁺) leads to a weakened ability to inhibit atomic migration at the crack tip. Reducing rare earths with a large atomic radius (such as La³⁺) induces a weakened ability to reduce the coherence of the propagation of the scattered stress wave by the anharmonic vibration of the lattice. In addition, the lack of a film layer structure results in the disappearance of the coupling effect between the film layers.

[0067] Comparative Example 2

[0068] The high-strength glass includes: a tempered glass substrate; an Fe 90 Zr1Gd x Ce y layer, where x = 1 and y = 8; on the Fe 90 Zr1Gd x Ce y layer, an Fe 90 Zr1La w Ce z layer. Other process parameters are the same as those in Example 1. The impact resistance of Comparative Example 2 is 132 MPa, and the flexural strength is 105 MPa.

[0069] Comparative Example 3

[0070] The high-strength glass includes: a tempered glass substrate; an Fe 90 Zr1Gd x Ce y layer, where x = 5 and y = 4; on the Fe 90 Zr1Gd x Ce y layer, an Fe 90 Zr1La w Ce z layer, where w = 5 and z = 4; on the Fe 90 Zr1La w Ce z layer, an Fe 90 Zr1Gd a La b layer, where a = 5 and b = 4; and on the Fe 90 Zr1Gd a La b layer, an Fe 90 Zr1Dy c La d layer, where c = 5 and d = 4. Other process parameters are the same as those in Example 1. The impact resistance of Comparative Example 3 is 130 MPa, and the flexural strength is 100 MPa. The change in atomic weight may cause some intermediate phases to appear in the alloy, and these intermediate phases will instead cause a significant decrease in the mechanical properties of the film layer. At this time, the film layer cannot achieve any strengthening effect on the tempered glass.

[0071] Comparative Example 4

[0072] Fe 90 Zr1Gd x Ce y layer has a thickness of 600 nm. Fe 90 Zr1Law Ce z The thickness of the layer is 600 nm. Fe 90 Zr1Gd a La b The thickness of the layer is 600 nm. Fe 90 Zr1Dy c La d The thickness of the layer is 600 nm. Other process parameters are the same as those in Example 1. Macroscopic cracks appeared in the film layer of Comparative Example 4.

[0073] Comparative Example 5

[0074] Fe 90 Zr1Gd x Ce y The layer was formed by the following method: Fe 90 Zr1Gd x Ce y layer was formed by magnetron sputtering. The sputtering power supply was a radio frequency power supply, the sputtering voltage was 300 V, the sputtering power was 400 W, the sputtering temperature was 150 °C, the sputtering atmosphere was an argon atmosphere, and the argon flow rate was 30 sccm. Other process parameters are the same as those in Example 1. The impact resistance of Comparative Example 5 was 131 MPa, and the flexural strength was 101 MPa. This may be because cracks have appeared inside the film layer, resulting in the film layer being unable to enhance the tempered glass.

[0075] Comparative Example 6

[0076] Fe 90 Zr1La w Ce z The layer was formed by the following method: Fe 90 Zr1La w Ce z layer was formed by magnetron sputtering. The sputtering power supply was a radio frequency power supply, the sputtering voltage was 150 V, the sputtering power was 300 W, the sputtering temperature was 150 °C, the sputtering atmosphere was an argon atmosphere, and the argon flow rate was 30 sccm. Other process parameters are the same as those in Example 1. The impact resistance of Comparative Example 6 was 130 MPa, and the flexural strength was 101 MPa. This may be because cracks have appeared inside the film layer, resulting in the film layer being unable to enhance the tempered glass.

[0077] Comparative Example 7

[0078] The glasses of Example 3 of the prior art CN109574499A were respectively placed in a heat treatment furnace at 400 °C for 100 days (abbreviated as high-temperature sample), and in an environment of -70 °C for 10 days (abbreviated as low-temperature sample), and then the impact resistance retention rates of the two were tested. The retention rate of the high-temperature sample was 75%, and the retention rate of the low-temperature sample was 83%.

[0079] The foregoing description of the specific exemplary embodiments of the present invention is for purposes of illustration and exemplification. These descriptions are not intended to limit the invention to the precise forms disclosed, and it is apparent that many changes and variations are possible in light of the above teaching. The purpose of selecting and describing the exemplary embodiments is to explain the specific principles of the invention and its practical applications, so that those skilled in the art can implement and utilize the various different exemplary embodiments of the invention, as well as various different selections and changes. The scope of the present invention is intended to be defined by the claims and their equivalents.

Claims

1. A high-strength glass, characterized in that, The glass includes: A tempered glass substrate; Fe on the tempered glass substrate 90 Zr1Gd x Ce y layer, where x = 1 - 3, y = 6 - 8, and x + y = 9; On the Fe 90 Zr1Gd x Ce y layer of Fe 90 Zr1La w Ce z layer, where w = 2 - 4, z = 5 - 7, and w + z = 9; On the Fe 90 Zr1La w Ce z layer, the Fe 90 Zr1Gd a La b layer, where a = 1 - 3, b = 6 - 8, and a + b = 9; and On the Fe 90 Zr1Gd a La b layer of Fe 90 Zr1Dy c La d layer, where c = 2 - 4, d = 5 - 7, and c + d = 9.

2. The glass according to claim 1, wherein The Fe 90 Zr1Gd x Ce y layer has a thickness of 300 - 500 nm.

3. The glass according to claim 1, wherein, The Fe 90 Zr1La w Ce z layer has a thickness of 200 - 290 nm.

4. The glass according to claim 1, wherein, The described Fe 90 Zr1Gd a La b The thickness of the layer is 300 - 500 nm.

5. The glass according to claim 1, wherein The Fe 90 Zr1Dy c La d layer has a thickness of 150 - 180 nm.

6. The glass according to claim 1, wherein, The Fe 90 Zr1Gd x Ce y layer is formed by the following method: the Fe 90 Zr1Gd x Ce y layer is formed by magnetron sputtering. The sputtering power supply is a radio frequency power supply, the sputtering voltage is 100 - 150 V, the sputtering power is 140 - 200 W, the sputtering temperature is 100 - 150 °C, the sputtering atmosphere is an argon atmosphere, and the argon flow rate is 30 - 40 sccm.

7. The glass according to claim 1, wherein, The Fe 90 Zr1La w Ce z layer is formed by the following method: the Fe 90 Zr1La w Ce z layer is formed by magnetron sputtering. The sputtering power supply is a radio frequency power supply, the sputtering voltage is 40 - 50 V, the sputtering power is 70 - 100 W, the sputtering temperature is 100 - 150 °C, the sputtering atmosphere is an argon atmosphere, and the argon flow rate is 30 - 40 sccm.

8. The glass according to claim 1, wherein The Fe 90 Zr1Gd a La b layer is formed by the following method: the Fe 90 Zr1Gd a La b layer is formed by magnetron sputtering. The sputtering power supply is a radio frequency power supply, the sputtering voltage is 40 - 50 V, the sputtering power is 70 - 100 W, the sputtering temperature is 100 - 150 °C, the sputtering atmosphere is an argon atmosphere, and the argon flow rate is 30 - 40 sccm.

9. The glass according to claim 1, wherein, The Fe 90 Zr1Dy c La d layer is formed by the following method: the Fe 90 Zr1Dy c La d layer is formed by magnetron sputtering. The sputtering power supply is a radio frequency power supply, the sputtering voltage is 100 - 150 V, the sputtering power is 100 - 150 W, the sputtering temperature is 100 - 150 °C, the sputtering atmosphere is an argon atmosphere, and the argon flow rate is 30 - 40 sccm.

10. A method for preparing high-strength glass, characterized in that, The method includes: Providing tempered glass; Deposit Fe 90 Zr1Gd x Ce y layer on the surface of the tempered glass, where x = 1 - 3, y = 6 - 8, and x + y = 9; On the surface of the Fe 90 Zr1Gd x Ce y layer, deposit Fe 90 Zr1La w Ce z layer, where w = 2 - 4, z = 5 - 7, and w + z = 9; On the surface of the Fe 90 Zr1La w Ce z deposit an Fe 90 Zr1Gd a La b layer, where a = 1 - 3, b = 6 - 8, and a + b = 9; and On the surface of the Fe 90 Zr1Gd a La b layer, deposit an Fe 90 Zr1Dy c La d layer, where c = 2 - 4, d = 5 - 7, and c + d = 9.

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