Cleaning agent formula
By using a cleaning agent formula composed of potassium hydroxide, dodecamine and emulsifier, combined with ultrasonic cleaning and deionized water rinsing, the problem of opening and blocking of Invar mask plates is solved, and efficient cleaning of OLED production is achieved, reducing the defective yield and cost.
Patent Information
- Application Number
- CN202510572051.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-05-06
- Publication Date
- 2025-08-08
AI Technical Summary
The existing cleaning agents cause the openings of the Invar mask plate to be blocked during the OLED production process, resulting in poor product, increasing cost and reducing efficiency.
A cleaning agent formula is adopted, which consists of 4-7% potassium hydroxide, 2-6% dodecamine, 20-25% emulsifier and deionized water. The Invar mask plate is cleaned by ultrasonic wave, with a cleaning temperature of 60°C and a time of 5 minutes, and then rinsed with deionized water for 2 minutes.
Effectively avoid the opening of the Invar mask plate being blocked, reduce bad products, reduce costs and improve production efficiency.
Smart Images

Figure CN120442326A_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the technical field of cleaning products, and specifically discloses a cleaning agent formula. Background Art
[0002] As a new generation of display devices, organic light-emitting displays, namely OLED (Organic Light-Emitting Diode) devices, have incomparable advantages over traditional displays, such as self-luminescence, no need for backlight, ultra-thin and flexible displays, low driving voltage, power saving, fast response speed, etc., and are widely used.
[0003] The OLED production process uses an Invar mask plate with openings (Invar alloy, an iron alloy containing 35.4% nickel, with a thermal expansion coefficient between -20°C and 20°C at room temperature, and an average thermal expansion coefficient of approximately 1.6×10-6 / °C). When using existing cleaning agents to clean it, the openings may become blocked, resulting in defective products.
[0004] In order to solve the above problems, the present application discloses a cleaning agent formula. Summary of the Invention
[0005] In order to overcome the deficiencies of the prior art, the present application discloses a cleaning agent formula.
[0006] In order to achieve the above-mentioned purpose, the technical solution adopted in this application is: a cleaning agent formula, which is composed of the following components in parts by weight: 4-7% potassium hydroxide, 2-6% dodecylamine, 20-25% emulsifier, and the balance is water.
[0007] As a preferred embodiment of the present invention, the potassium hydroxide uses potassium hydroxide with a content of 90%.
[0008] As a preferred embodiment of the present invention, the dodecylamine content is 99.5%.
[0009] As a preferred embodiment of the present invention, the emulsifier has an emulsifier content of 99.5%.
[0010] As a preferred embodiment of the present invention, the water is deionized water.
[0011] As a preferred embodiment of the present invention, the formula is composed of the following components in parts by weight: 5% potassium hydroxide, 3% dodecylamine, 21% emulsifier, and the balance is water.
[0012] As a preferred embodiment of the present invention, the formula is composed of the following components in parts by weight: 6% potassium hydroxide, 4% dodecylamine, 22% emulsifier, and the balance water.
[0013] This application achieves the following beneficial effects:
[0014] Using the cleaning agent of the present application to clean the Invar mask plate in the OLED production process can prevent the openings of the Invar mask plate from being blocked, thereby reducing defective products, lowering costs and improving efficiency.
[0015] Other features and advantages of the present application will be described in the following description, and in part will become apparent from the description, or will be understood by practicing the present application. The purpose and other advantages of the present application can be realized and obtained through the structures indicated in the description and the drawings. BRIEF DESCRIPTION OF THE DRAWINGS
[0016] The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the disclosure of the present application and, together with the description, serve to explain the principles of the disclosure.
[0017] Figure 1 This is a preliminary image of the Invar mask cleaning process disclosed in this application;
[0018] Figure 2 This is a photo taken after cleaning the Invar mask disclosed in this application;
[0019] Figure 3 This is an electron microscope image of the Invar mask disclosed in this application after cleaning;
[0020] Figure 4 For this application Figure 3 Spectrum 11 in the photo;
[0021] Figure 5 For this application Figure 3 Spectrum 12 photos in. DETAILED DESCRIPTION
[0022] The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments.
[0023] In the description of the present application, it should be understood that the terms "opening", "upper", "lower", "thickness", "top", "middle", "length", "inside", "all around" and the like indicating orientation or positional relationship are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the components or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as limiting the present application.
[0024] The present application discloses a cleaning agent formula, which is composed of the following components in parts by weight: 4-7% potassium hydroxide, 2-6% dodecylamine, 20-25% emulsifier, and the balance water, wherein the potassium hydroxide content is 90%, the dodecylamine content is 99.5%, the emulsifier content is 99.5%, and the water is deionized water.
[0025] Example 1
[0026] The formula is calculated by weight and consists of the following components: 5% potassium hydroxide, 3% dodecylamine, 21% emulsifier, and the balance is water.
[0027] Pour the above materials into a beaker in turn and stir to form a cleaning solution, then place the beaker into an ultrasonic tank, place the Invar mask in the beaker, measure the water temperature of the ultrasonic device by a thermometer to be 60°C, and the water washing temperature to be 25°C. Clean for 5 minutes at an ultrasonic amplitude of 25HZ-40HZ, and finally remove the Invar mask and rinse with deionized water for 2 minutes.
[0028] refer to Figure 1 、 Figure 2 、 Figure 3 As shown in FIG, the Invar mask plate before cleaning is compared with the Invar mask plate after cleaning. It can be clearly seen that the Invar mask plate is cleaned relatively cleanly.
[0029] Furthermore, based on Example 1 and Example 2, EDS analysis was performed on the cleaning solution used to clean the Invar mask. The detailed data is shown in the following table:
[0030]
[0031]
[0032] Throughout this specification, references to terms such as "one embodiment," "example," or "specific example" indicate that the specific features, structures, materials, or characteristics described in conjunction with that embodiment or example are included in at least one embodiment or example of the present application. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
[0033] The above embodiments are intended only to illustrate the technical concepts and features of this application. Their purpose is to enable those skilled in the art to understand the content of this application and implement it accordingly. They are not intended to limit the scope of protection of this application. Any equivalent changes or modifications made in accordance with the spirit of this application shall be included in the scope of protection of this application.
Claims
1. A cleaning agent formula, characterized in that: The formula is composed of the following components in parts by weight: 4-7% potassium hydroxide, 2-6% dodecylamine, 20-25% emulsifier, and the balance is water.
2. A cleaning agent formulation according to claim 1, characterized in that: The potassium hydroxide used has a content of 90%.
3. A cleaning agent formulation according to claim 1, characterized in that: The dodecylamine used has a content of 99.5%.
4. A cleaning agent formulation according to claim 1, characterized in that: The emulsifier has a content of 99.5%.
5. A cleaning agent formulation according to claim 1, characterized in that: The water is deionized water.
6. A cleaning agent formulation according to claim 1, characterized in that: The formula is composed of the following components in parts by weight: 5% potassium hydroxide, 3% dodecylamine, 21% emulsifier, and the balance water.
7. A cleaning agent formulation according to claim 1, characterized in that: The formula is composed of the following components in parts by weight: 6% potassium hydroxide, 4% dodecylamine, 22% emulsifier, and the balance water.