Sample introduction chamber structure of plasma chemical research system

Abstract

The invention belongs to the technical field of plasma chemical research, and particularly relates to a sample introduction chamber structure of a plasma chemical research system.The sample introduction chamber structure comprises a workbench, a sample introduction chamber is fixedly installed on the workbench, and a rapid switching device is installed on the sample chamber in a matched mode; the quick switch device comprises a rotating seat mounted above the sample chamber, a connecting electric rod is rotationally connected to the rotating seat, a connecting rod is rotationally connected to one end of the connecting electric rod, and a rotating rod is fixedly connected to one end of the connecting rod, so that a certain included angle is always kept between the rotating rod and the connecting rod; one end of the rotating rod is fixedly connected with a fastener, two rotating buttons are arranged on the fastener, and one rotating button is rotationally connected with the clamping block. Through efficient and convenient operation and cooperation of the quick switch and the gripper device, the sample treatment efficiency is improved, vacuum control is accurate, different experiment requirements are met, the structural design is reasonable, materials are excellent, the stability of the experiment environment is guaranteed, samples can be cleaned, and the accuracy of the experiment result is improved.

Description

Technical Field

[0001] The present invention relates to the technical field of plasma chemistry research, in particular to a sample injection chamber structure of a plasma chemistry research system. Background Art

[0002] In the field of plasma chemistry research, the injection chamber structure is a key component, and its performance directly affects the accuracy and reliability of the entire research system.

[0003] Traditional sample chamber structures often have limitations. For example, they lack efficient and convenient methods for sample insertion and removal. This not only increases experimental time costs but can also lead to sample contamination or damage due to operational complexity, compromising the accuracy of research results.

[0004] Furthermore, conventional structures may not meet the high-precision requirements for controlling the vacuum environment in the injection chamber. In plasma chemistry research, different experimental stages may require varying vacuum levels and gas flow rates. However, some existing injection chamber structures struggle to achieve precise control over a wide range of vacuum levels and pressures. This can lead to an unstable experimental environment and fail to provide ideal conditions for plasma chemical reactions.

[0005] Furthermore, traditional sample chamber structures may also have shortcomings when it comes to sample securing and gripping. If the sample isn't effectively secured, it can shift during the experiment, impacting experimental reproducibility and data reliability. Furthermore, the gripping mechanism may lack flexibility and precision, making it unable to accommodate samples of varying shapes and sizes.

[0006] Given these issues, developing a novel sample chamber structure for plasma chemistry research systems is of great practical significance. This novel structure must address the shortcomings of traditional structures, enabling efficient and convenient sample manipulation, high-precision vacuum environment control, and reliable sample fixation and gripping. This will provide more stable and accurate experimental conditions for plasma chemistry research and promote further development of research in this field. Summary of the Invention

[0007] (1) Technical problems solved

[0008] In view of the deficiencies in the prior art, the present invention provides a sample injection chamber structure for a plasma chemical research system, which solves the problems raised in the above-mentioned background technology.

[0009] (2) Technical solution

[0010] In order to achieve the above-mentioned purpose, the present invention specifically adopts the following technical solutions:

[0011] A sample chamber structure of a plasma chemical research system comprises a workbench, a sample chamber is fixedly mounted on the workbench, and a fast switch device is mounted on the sample chamber;

[0012] The quick switch device includes a rotating seat installed above the sample chamber, the rotating seat is rotatably connected to a connecting electric rod, one end of the connecting electric rod is rotatably connected to a connecting rod, one end of the connecting rod is fixedly connected to a rotating rod, so that the rotating rod and the connecting rod always maintain a certain angle, one end of the rotating rod is fixedly connected to a fastener, the fastener has two knobs, one knob is rotatably connected to a clamping block, the clamping block is rotatably connected to the mounting seat, and the other knob is rotatably connected to a cross rod, the cross rod is simultaneously rotatably connected to the mounting seat through the knob, the mounting seat is fixedly installed at a top of the sample chamber, a connecting rod is clamped and fixed on the cross rod, the connecting rod is fixedly installed on a door panel, and the door panel is rotatably sealed and hinged on one side of the sample chamber;

[0013] A propulsion electric rod is installed on the workbench, and the output end of the propulsion electric rod is fixedly connected to the gripping claw device;

[0014] The gripping device includes a housing fixed to one end of a propulsion electric rod, a propulsion cylinder is embedded in the housing, the propulsion rod of the propulsion cylinder is fixedly connected to a fixed block, the fixed block is rotatably connected to a connecting block, the connecting block is rotatably connected to a clamping jaw, the front end of the clamping jaw is embedded with a permanent magnet block, and the clamping jaw is rotatably connected to the housing, and is used to clamp the sample;

[0015] The sample chamber is provided with a plurality of flange connection plates.

[0016] Furthermore, the entire sample chamber is made of 316L stainless steel and has a cylindrical shape. The length error of each part is controlled within ±1 mm, and the angle error is controlled within ±1°.

[0017] Furthermore, the flange connection plate is connected to a pumping system, which includes a multi-stage Roots dry pump and a turbomolecular pump. A solenoid valve and a Pirani gauge are provided between the multi-stage Roots dry pump and the turbomolecular pump. A set of ultra-high vacuum electric plug-in valves are provided at the front end of the turbomolecular pump for controlling the gas flow rate under different vacuum environments.

[0018] Furthermore, the pumping system can make the ultimate vacuum of the sample chamber reach 5.0×10-5Pa after being fully baked, the working vacuum / pressure range is 10-5~105Pa, and the vacuum / pressure measurement range is 10-6~105Pa.

[0019] Furthermore, an argon ion sputtering gun is arranged in the sample chamber, and its ion kinetic energy is better than 0.12-3keV, and the ion beam current can reach 120μA / cm2, which can clean the sample.

[0020] Furthermore, the sample chamber is also equipped with a vacuum gauge and a thin film gauge. The vacuum gauge has a measurement range of 10-7 to 105 Pa and is used to accurately measure the vacuum degree in the sample chamber, providing accurate data support for the vacuum control of the system.

[0021] Furthermore, the sample in the sample chamber is placed horizontally.

[0022] A method for using a sample chamber structure of a plasma chemical research system, characterized by comprising:

[0023] Step 1: Sample placement

[0024] Start the quick opening and closing device: by controlling the movement of the connecting electric rod, the connecting rod, rotating rod and other components are driven to work together, so that the connecting rod on the crossbar drives the door panel to rotate and open;

[0025] Grab the sample: The electric propulsion rod on the workbench pushes the gripper device close to the sample; the propulsion cylinder in the gripper device drives the gripper to open and close through the fixed block and the connecting block, and the permanent magnet block at the front end of the gripper is used to grab the sample;

[0026] Place the sample: Push the electric rod to move the gripper and the sample to the appropriate position in the sample chamber to complete the sample placement;

[0027] Step 2: Maintain vacuum environment and sample cleanliness

[0028] The pumping system connected by the flange connection plate works in coordination, including a multi-stage Roots dry pump and a turbomolecular pump. Under the control of the solenoid valve and Pirani gauge, and the ultra-high vacuum electric gate valve at the front end of the turbomolecular pump, the ultimate vacuum of the sample chamber can reach 5.0×10-5Pa after sufficient baking. The working vacuum / pressure range is 10-5~105Pa, and the vacuum / pressure measurement range is 10-6~105Pa.

[0029] During the experiment, the vacuum gauge and thin film gauge measure the vacuum degree in real time and feed the data back to the control system so that the working state of the pumping system can be adjusted in time to ensure a stable vacuum environment;

[0030] Step 3: Sample removal

[0031] Grab the sample: push the electric rod to push the gripper device close to the sample, and the gripper device grabs the sample;

[0032] Close the sample chamber: The quick switch device closes the door panel to seal the sample chamber;

[0033] Remove the sample: Push the electric rod to move the gripper and the sample out of the sample chamber to complete the sample removal operation.

[0034] (3) Beneficial effects

[0035] Compared with the prior art, the present invention provides a sample chamber structure for a plasma chemistry research system, which has the following beneficial effects:

[0036] The present invention has efficient and convenient sampling operation, the rapid switching device can realize rapid opening and closing of the door panel, the gripping device can flexibly grab samples of different shapes and sizes, and the horizontal insertion method cooperates well with various components, thereby improving the efficiency and accuracy of sample insertion and removal, and reducing the risk of sample contamination or damage. Secondly, the vacuum environment is precisely controlled, and the pumping system and related components connected by the flange connection plate can enable the sample chamber to reach a high ultimate vacuum degree, and accurately control it within a wide working vacuum / pressure range, and cooperate with the vacuum gauge and thin film gauge for real-time measurement feedback, providing stable and ideal conditions for the experiment.

[0037] This injection chamber structure also offers other significant benefits. Firstly, the sample chamber is constructed of 316L stainless steel and is machined with high precision, ensuring structural strength and sealing. Its cylindrical shape facilitates internal space utilization and gas flow, ensuring a stable experimental environment. Secondly, the argon ion sputtering gun effectively cleans the sample surface. The appropriate ion kinetic energy and beam current remove impurities while avoiding sample damage, improving the accuracy of experimental results. These combined features enable this injection chamber structure to overcome the shortcomings of traditional structures, providing a more reliable platform for plasma chemistry research and promoting further development in this field. BRIEF DESCRIPTION OF THE DRAWINGS

[0038] Figure 1 This is a schematic diagram of the structure installation of the sample chamber of the plasma chemistry research system of the present invention;

[0039] Figure 2 This is a schematic structural diagram of the gripper device of the present invention;

[0040] Figure 3 This is a schematic diagram of the internal connection structure of the gripper device of the present invention;

[0041] Figure 4 This is a structural diagram of the fast switching device of the present invention.

[0042] In the figure: 1. workbench; 2. sample chamber; 3. swivel seat; 4. connecting electric rod; 5. connecting rod; 6. rotating rod; 7. fastener; 8. snap block; 9. mounting seat; 10. cross bar; 11. connecting rod; 12. door panel; 13. propulsion electric rod; 14. gripping device; 141. housing; 142. propulsion cylinder; 143. fixing block; 144. connecting block; 145. clamping claw; 146. permanent magnet block; 15. flange connection plate. DETAILED DESCRIPTION

[0043] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0044] Example

[0045] like Figure 1-4 As shown, an embodiment of the present invention provides a sample chamber structure of a plasma chemical research system, comprising a workbench 1, on which a sample chamber 2 is fixedly mounted, and on which a fast switching device is mounted;

[0046] The quick switch device includes a rotatable base 3 installed above the sample chamber 2, and a connecting electric rod 4 is rotatably connected to the rotatable base 3, one end of the connecting electric rod 4 is rotatably connected to a connecting rod 5, and one end of the connecting rod 5 is fixedly connected to a rotating rod 6, so that the rotating rod 6 and the connecting rod 5 always maintain a certain angle, and one end of the rotating rod 6 is fixedly connected to a fastener 7, and the fastener 7 has two knobs, one knob is rotatably connected to a clamping block 8, and the clamping block 8 is rotatably connected to a mounting seat 9, and the other knob is rotatably connected to a cross rod 10, and the cross rod 10 is simultaneously rotatably connected to the mounting seat 9 through the knob, and the mounting seat 9 is fixedly installed at a top of the sample chamber 2, and a connecting rod 11 is clamped and fixed on the cross rod 10, and the connecting rod 11 is fixedly installed on a door panel 12, and the door panel 12 is rotatably and sealedly hinged on one side of the sample chamber 2;

[0047] A propulsion electric rod 13 is installed on the workbench 1, and the output end of the propulsion electric rod 13 is fixedly connected to a gripping device 14;

[0048] The gripping device 14 includes a housing 141 fixed to one end of the propulsion electric rod 13, a propulsion cylinder 142 is embedded in the housing 141, and the propulsion rod of the propulsion cylinder 142 is fixedly connected to a fixing block 143, and the fixing block 143 is rotatably connected to a connecting block 144, and the connecting block 144 is rotatably connected to a clamping jaw 145, and a permanent magnet block 146 is embedded in the front end of the clamping jaw 145. At the same time, the clamping jaw 145 is rotatably connected to the housing 141 and is used to clamp the sample;

[0049] The sample chamber 2 is provided with a plurality of flange connection plates 15;

[0050] (1) Overall structure

[0051] The sample chamber structure mainly consists of a workbench 1, a sample chamber 2, a fast switch device, a gripper device 14 and a flange connection plate 15.

[0052] 2. Structural characteristics and functions of each part

[0053] (1) Workbench 1

[0054] Structural features: As the basic supporting part of the entire structure, it provides a stable installation platform for other components.

[0055] Function: Ensure the stability of the entire injection chamber structure during operation and prevent external interference from affecting experimental operations and results.

[0056] (2) Sample Room 2

[0057] Structural characteristics

[0058] The whole is made of 316L stainless steel and has a cylindrical shape. The length error of each part is controlled within ±1mm and the angle error is controlled within ±1° (such as Figure 1 shown).

[0059] A number of flange connection plates 15 are provided.

[0060] It is equipped with an argon ion sputtering gun, a vacuum gauge and a thin film gauge.

[0061] effect

[0062] 316L stainless steel material and precise processing dimensions ensure the structural strength and sealing of the sample chamber, providing a stable placement environment for the sample and also helping to maintain the internal vacuum environment.

[0063] The flange connection plate 15 is used to connect to a pumping system to control the vacuum environment of the sample chamber.

[0064] The argon ion sputtering gun cleans the sample, removing surface impurities and improving the accuracy of experimental results. The vacuum gauge and thin film gauge are used to accurately measure the vacuum level in the sample chamber, providing accurate data support for the system's vacuum control.

[0065] (3) Fast switching device

[0066] Structural characteristics

[0067] The rotating base 3 is mounted above the sample chamber 2. The rotating base 3 is rotatably connected to a connecting rod 4. One end of the connecting rod 4 is rotatably connected to a connecting rod 5. One end of the connecting rod 5 is fixedly connected to a rotating rod 6. The rotating rod 6 always maintains a certain angle with the connecting rod 5. One end of the rotating rod 6 is fixedly connected to a fastener 7. The fastener 7 has two knobs. One knob is rotatably connected to a clamping block 8. The clamping block 8 is rotatably connected to a mounting base 9. The other knob is rotatably connected to a crossbar 10. The crossbar 10 is simultaneously rotatably connected to the mounting base 9 through the knobs. A connecting rod 11 is fixedly engaged with the crossbar 10. The connecting rod 11 is fixedly mounted on a door panel 12. The door panel 12 is rotatably and sealably hinged on one side of the sample chamber 2 (e.g., Figure 4 shown).

[0068] Function: By connecting the movement of the electric rod 4 to drive the linkage of a series of components, the door panel 12 can be opened and closed quickly, which facilitates the placement and removal of samples and improves operational efficiency.

[0069] (IV) Claw device 14

[0070] Structural characteristics

[0071] The housing 141 is fixed to one end of the electric propulsion rod 13, a propulsion cylinder 142 is embedded in the housing 141, a propulsion rod of the propulsion cylinder 142 is fixedly connected to a fixed block 143, the fixed block 143 is rotatably connected to a connecting block 144, the connecting block 144 is rotatably connected to a clamping claw 145, a permanent magnet block 146 is embedded in the front end of the clamping claw 145, and the clamping claw 145 is rotatably connected to the housing 141 (as shown in FIG. Figure 2 、 Figure 3 shown).

[0072] Function: The electric rod 13 pushes the gripper device 14 close to the sample, and the cylinder 142 controls the opening and closing of the clamping jaws 145 to achieve flexible grasping of samples of different shapes and sizes. The permanent magnet block 146 can enhance the grasping ability of magnetic samples.

[0073] The following is a detailed working principle of the plasma chemistry research system's sample chamber structure:

[0074] When inserting a sample, the electric push rod 13 on the workbench 1 pushes the gripper 14 toward the sample. The push cylinder 142 in the gripper 14 opens and closes the clamping jaws 145 via the fixed block 143 and the connecting block 144. The permanent magnet 146 at the front of the clamping jaws 145 grasps the sample (this is more effective for magnetic samples). Simultaneously, the rapid opening and closing mechanism in the sample chamber 2, connected to the electric push rod 4, drives the connecting rod 5, the rotating rod 6, and other components. This causes the connecting rod 11 on the crossbar 10 to rotate and open the door panel 12. The electric push rod 13 then moves the gripper 14 and the sample together to the appropriate position within the sample chamber 2, completing the sample insertion.

[0075] The pumping system connected to flange connection plate 15 plays a key role in maintaining the vacuum environment in sample chamber 2. This system comprises a multi-stage Roots dry pump and a turbomolecular pump, with solenoid valves and Pirani gauges installed between the two pumps. The turbomolecular pump is equipped with an ultra-high vacuum electric gate valve at the front end. When sample chamber 2 is fully baked before the experiment, the pumping system works in tandem to achieve an ultimate vacuum of 5.0 × 10⁻⁵ Pa (5.0 × 10⁻⁵ Pa), an operating vacuum / pressure range of 10⁻⁵ Pa to 10⁻⁵ Pa, and a vacuum / pressure measurement range of 10⁻⁶ Pa to 10⁻⁵ Pa (10⁻⁶ Pa to 10⁻⁵ Pa). Simultaneously, a vacuum gauge and a thin film gauge within sample chamber 2 measure the vacuum level in real time and feed this data back to the control system, enabling timely adjustments to the pumping system's operating status to ensure a stable vacuum environment.

[0076] If the sample needs to be cleaned during the experiment, the argon ion sputtering gun configured in the sample chamber 2 can be started. Its ion kinetic energy is better than 0.12~3keV, and the ion beam current can reach 120μA / cm2, which can effectively remove impurities on the sample surface and improve the accuracy of the experimental results.

[0077] When the experiment is complete and the sample needs to be removed, the process is the reverse of the insertion process. The electric rod 13 is pushed forward, pushing the gripper 14 toward the sample. The gripper 14 grabs the sample, and the rapid opening and closing mechanism closes the door panel 12, sealing the sample chamber 2. Finally, the electric rod 13 is pushed forward, moving the gripper 14 and the sample out of the sample chamber 2, completing the sample removal operation.

[0078] like Figure 1 As shown, in some embodiments, the entire sample chamber 2 is made of 316L stainless steel and has a cylindrical shape. The length error of each part is controlled within ±1 mm, and the angle error is controlled within ±1°.

[0079] 316L stainless steel has excellent corrosion resistance. In plasma chemistry research, which may be exposed to various chemicals and gases, stainless steel can prevent the sample chamber 2 from corrosion, thereby ensuring its structural integrity and service life, and ensuring the stability of the experimental environment.

[0080] It has high strength and hardness. This allows the sample chamber 2 to withstand certain pressures and external forces. Under the vacuum environment created by the pumping system and other possible external forces, it can still maintain a stable shape and structure without deformation or damage, providing a reliable space for sample placement.

[0081] The cylindrical shape facilitates the rational use of the internal space, allowing for convenient installation of various internal components such as an argon ion sputtering gun, vacuum gauge, and thin film gauge, and allows for a more regular placement of samples within the container, facilitating accurate placement and gripping of samples by the gripper device 14.

[0082] From the perspective of fluid mechanics, the columnar shape allows for relatively smoother gas flow when vacuuming to form a vacuum environment, which helps the pumping system work more efficiently, quickly reach the required vacuum level, and make the vacuum environment more evenly distributed in the sample chamber.

[0083] A length tolerance of ±1mm ensures the connection accuracy between the various components of sample chamber 2. For example, the connection between flange plate 15 and the pumping system, and the sealed connection between door panel 12 and sample chamber 2, all require precise dimensional matching to ensure the sealing and stability of the connection, prevent gas leakage, and better maintain the vacuum environment.

[0084] Controlling the angle error to ±1° ensures the symmetry and stability of the overall structure of Sample Chamber 2. This is also crucial for the installation and operation of internal components. For example, the mounting angle of the argon ion sputtering gun, and the measurement accuracy of vacuum and thin film gauges, can all be affected by the angle error of Sample Chamber 2. Precise angle control enables these internal components to function better, improving experimental accuracy and reliability.

[0085] like Figure 1 As shown, in some embodiments, the flange connection plate 15 is connected to a pumping system, which includes a multi-stage Roots dry pump and a turbomolecular pump, with a solenoid valve and a Pirani gauge between the multi-stage Roots dry pump and the turbomolecular pump, and a set of ultra-high vacuum electric plug-in valves at the front end of the turbomolecular pump for controlling the gas flow rate under different vacuum environments;

[0086] Function of flange connection plate 15

[0087] The flange connection plate 15 serves as the connection interface between the sample chamber 2 and the pumping system, providing a stable and reliable connection method. It ensures the sealing between the sample chamber 2 and the pumping system to prevent gas leakage, which is crucial for maintaining the vacuum environment in the sample chamber 2.

[0088] The functions of the pumping system components

[0089] Multi-stage Roots dry pump

[0090] The multi-stage Roots dry pump performs the initial extraction function in the pumping system. It can quickly extract large amounts of gas from sample chamber 2, reducing the pressure within the chamber and creating conditions for the subsequent turbomolecular pump to operate. Its operating principle is that two "8"-shaped rotors rotate within the pump body, pushing gas from the inlet to the exhaust port to achieve gas extraction.

[0091] turbomolecular pumps

[0092] The turbomolecular pump is used to further enhance the vacuum level within sample chamber 2, building upon the initial pumping performed by the multi-stage Roots dry pump. Its high-speed rotating turbine blades expel gas molecules in a targeted manner, drawing them from sample chamber 2 to the exhaust port, achieving a higher vacuum level. Turbomolecular pumps are characterized by their fast pumping speed and high ultimate vacuum, making them suitable for plasma chemistry research requiring a high vacuum environment.

[0093] solenoid valve

[0094] The solenoid valve controls the flow of gas between a multi-stage Roots dry pump and a turbomolecular pump. By opening and closing the solenoid valve, the valve adjusts the flow path between the two pumps, ensuring the proper functioning and efficient operation of the pumping system.

[0095] Pirani Rule

[0096] The Pirani gauge is used to measure the vacuum level within sample chamber 2. Its operating principle is based on the thermal conductivity of gas. When the vacuum level within sample chamber 2 changes, the thermal conductivity of the gas also changes. The Pirani gauge measures the vacuum level by detecting this change and feeds the measurement results back to the control system to adjust the pumping system.

[0097] Ultra-high vacuum electric gate valve

[0098] An ultra-high vacuum electric gate valve, installed at the front end of the turbomolecular pump, controls the flow of gas entering the turbomolecular pump. It precisely adjusts the gas flow rate under varying vacuum conditions, ensuring the turbomolecular pump operates under optimal conditions while also helping to maintain a stable vacuum environment within sample chamber 2. Rapid changes in the vacuum level within sample chamber 2 can be achieved by electrically controlling the opening and closing of the gate valve.

[0099] In some embodiments, the pumping system can make the ultimate vacuum of the sample chamber 2 reach 5.0×10-5Pa after being fully baked, the working vacuum / pressure range is 10-5~105Pa, and the vacuum / pressure measurement range is 10-6~105Pa;

[0100] The significance and function of the ultimate vacuum degree reaching 5.0×10-5Pa

[0101] In plasma chemistry research, many experiments require high vacuum environments. Achieving an ultimate vacuum of 5.0×10-5 Pa means that impurities such as air are virtually absent from sample chamber 2, providing an extremely pure environment for plasma chemical reactions. This helps reduce the interference of impurity gases on the plasma, improving the accuracy and reliability of experimental results. For example, in plasma chemical synthesis experiments with very strict requirements on gas composition and content, this high vacuum environment ensures that the reaction proceeds as expected and avoids the production of byproducts due to the participation of impurity gases in the reaction.

[0102] Working vacuum / pressure range is 10-5~105Pa

[0103] This wide operating vacuum / pressure range enables the sample chamber structure to adapt to a variety of different types of plasma chemistry experiments. Different experiments may require different vacuum and pressure conditions. For example, in some plasma etching experiments, a lower vacuum level (such as around 10-5Pa) may be required to control the etching rate and accuracy; while in some plasma deposition experiments, a relatively high pressure (such as around 105Pa) may be required to promote uniform distribution of the deposited material. The pumping system can be flexibly adjusted within this range to provide a suitable vacuum and pressure environment for various experiments to meet the needs of different experiments.

[0104] The vacuum / pressure measurement range is 10-6~105Pa

[0105] The vacuum / pressure measurement range covers 10-6 Pa to 105 Pa, matching the operating vacuum / pressure range of sample chamber 2. Accurate measurement is the foundation of control. Using a vacuum gauge and a thin film gauge to measure vacuum and pressure within this range provides real-time insights into the environmental parameters within sample chamber 2. This measurement data is fed back to the control system, which adjusts the pumping system based on experimental requirements, ensuring that the vacuum and pressure within sample chamber 2 remain within the appropriate range, providing stable environmental conditions for experiments.

[0106] In some embodiments, the sample chamber 2 is equipped with an argon ion sputtering gun, whose ion kinetic energy is better than 0.12-3 keV and the ion beam current can reach 120 μA / cm2, which can clean the sample, but is not shown in the figure;

[0107] The purpose of argon ion sputtering gun configuration

[0108] In plasma chemistry research, sample surface cleanliness has a significant impact on experimental results. The primary purpose of the argon ion sputtering gun installed in Sample Chamber 2 is to clean the sample surface and remove any impurities, such as oxides and oil, to ensure sample purity during experiments and improve the accuracy and reliability of experimental results.

[0109] The role of ion kinetic energy and ion beam parameters

[0110] Ion kinetic energy

[0111] The ion kinetic energy of an argon ion sputtering gun is preferably between 0.12 and 3 keV. Appropriate ion kinetic energy is a key factor in effectively cleaning sample surfaces. When the ion kinetic energy is within this range, the argon ions impact the sample surface with sufficient energy to overcome the surface binding energy and sputter impurity atoms or molecules. If the ion kinetic energy is too low, impurities may not be effectively removed; if the ion kinetic energy is too high, excessive damage to the sample surface may occur, affecting the sample's original structure and properties.

[0112] ion beam

[0113] The ion beam current can reach 120μA / cm 2 The ion beam current determines the number of argon ions that strike the sample surface per unit time. A sufficient ion beam current ensures thorough cleaning of the sample surface within a reasonable timeframe. If the ion beam current is too low, the cleaning process may be too slow, affecting experimental efficiency. However, if the ion beam current is too high, it may cause localized overheating, which can also negatively impact the sample surface.

[0114] In some embodiments, the sample chamber 2 is further equipped with a vacuum gauge and a thin film gauge. The vacuum gauge has a measurement range of 10-7 to 105 Pa and is used to accurately measure the vacuum degree in the sample chamber and provide accurate data support for the vacuum control of the system. The configuration purpose of the vacuum gauge and the thin film gauge is to

[0115] In the sample chamber structure used in plasma chemistry research, precise control and understanding of the vacuum level within sample chamber 2 is crucial. The vacuum gauge and thin film gauge are configured to accurately measure the vacuum level within sample chamber 2 in real time, providing accurate data for controlling the pumping system and maintaining a stable vacuum environment within sample chamber 2 that meets experimental requirements.

[0116] The role of measuring range

[0117] The measuring range of the vacuum gauge is 10-7 to 105 Pa. This wide measuring range is compatible with the working vacuum / pressure range (10-5 to 105 Pa) and the ultimate vacuum degree (5.0×10-5 Pa) of the sample chamber 2.

[0118] The lower limit of 10-7 Pa can meet the measurement requirements of high vacuum environments. In some experimental stages with extremely high vacuum requirements, such as the fine adjustment process before reaching the ultimate vacuum, the extremely low vacuum level can be accurately measured to ensure that the system can be precisely adjusted towards the ultimate vacuum target.

[0119] The upper limit of 105 Pa covers possible higher pressure situations. For example, during certain experimental operations, it may be necessary to briefly adjust to a relatively high pressure environment, or in the initial state before the experiment begins, a certain atmospheric pressure environment may exist. The measurement range can cover these situations, allowing the system to fully understand the vacuum / pressure state within the sample chamber 2, providing complete data support for vacuum control throughout the entire experimental process.

[0120] like Figure 1 As shown, in some embodiments, the sample in the sample chamber 2 is placed horizontally;

[0121] Interoperability with Internal Components: The horizontal placement method is compatible with the movement and operation of the gripper mechanism 14. When gripping and moving a sample into the sample chamber 2, the horizontal placement design allows the gripper mechanism 14 to more conveniently and accurately position the sample. For example, the gripper mechanism 14 can directly deliver the sample horizontally into the sample chamber 2, eliminating complex angle adjustments and operational difficulties, and improving the efficiency and accuracy of sample placement.

[0122] A method for use in a sample injection chamber of a plasma chemical research system;

[0123] Step 1: Sample placement

[0124] Start the quick switch device: by controlling the movement of the connecting electric rod 4, the connecting rod 5, the rotating rod 6 and other components are driven to work together, so that the connecting rod 11 on the cross bar 10 drives the door panel 12 to rotate and open.

[0125] Grabbing the sample: The electric propulsion rod 13 on the workbench 1 pushes the gripper 14 toward the sample. The propulsion cylinder 142 in the gripper 14 drives the clamping jaw 145 to open and close through the fixed block 143 and the connecting block 144, and the permanent magnet block 146 at the front end of the clamping jaw 145 grabs the sample.

[0126] Place the sample: Push the electric rod 13 to move the gripper device 14 and the sample to a suitable position in the sample chamber 2 to complete the sample placement.

[0127] Step 2: Maintain vacuum environment and sample cleanliness

[0128] Baking and vacuum control

[0129] Before the experiment, sample chamber 2 was fully baked. At this point, the pumping system connected to flange connection plate 15 worked in conjunction, including a multi-stage Roots dry pump and a turbomolecular pump. Under the coordination of the solenoid valve and Pirani gauge, and controlled by the ultra-high vacuum electric gate valve at the front end of the turbomolecular pump, the ultimate vacuum of sample chamber 2 after being fully baked could reach 5.0×10-5Pa, the operating vacuum / pressure range was 10-5 to 105Pa, and the vacuum / pressure measurement range was 10-6 to 105Pa.

[0130] During the experiment, the vacuum gauge and thin film gauge measure the vacuum degree in real time and feed the data back to the control system so that the working status of the pumping system can be adjusted in time to ensure a stable vacuum environment.

[0131] Sample cleaning

[0132] If the sample needs to be cleaned during the experiment, the argon ion sputtering gun configured in the sample chamber 2 is started. Its ion kinetic energy is better than 0.12~3keV, and the ion beam current can reach 120μA / cm2, which can clean the sample.

[0133] Step 3: Sample removal

[0134] Grabbing the sample: pushing the electric rod 13 pushes the gripper device 14 close to the sample, and the gripper device 14 grabs the sample.

[0135] Close the sample chamber: the rapid opening and closing device closes the door panel 12 to seal the sample chamber 2 .

[0136] Remove the sample: push the electric rod 13 to move the gripper device 14 and the sample out of the sample chamber 2 to complete the sample removal operation.

[0137] Finally, it should be noted that the above descriptions are merely preferred embodiments of the present invention and are not intended to limit the present invention. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art will be able to modify the technical solutions described in the aforementioned embodiments or substitute equivalents for some of the technical features. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention shall be included within the scope of protection of the present invention.

Claims

1. A sample chamber structure of a plasma chemical research system, comprising a workbench (1), characterized in that: A sample chamber (2) is fixedly mounted on the workbench (1), and a quick switch device is mounted and provided on the sample chamber (2); The rapid switch device comprises a rotating seat (3) mounted above the sample chamber (2), a connecting electric rod (4) being rotatably connected to the rotating seat (3), one end of the connecting electric rod (4) being rotatably connected to a connecting rod (5), one end of the connecting rod (5) being fixedly connected to a rotating rod (6), so that the rotating rod (6) and the connecting rod (5) always maintain a certain angle, one end of the rotating rod (6) being fixedly connected to a fastener (7), the fastener (7) having two rotating knobs, one rotating knob rotating the other rotating knob. A movable connection snap-fit block (8) is provided, wherein the snap-fit block (8) is rotatably connected to a mounting seat (9), and another rotary knob is rotatably connected to a crossbar (10), wherein the crossbar (10) is simultaneously rotatably connected to the mounting seat (9) through the rotary knob, and wherein the mounting seat (9) is fixedly mounted at a top portion of the sample chamber (2), and a connecting rod (11) is fixedly engaged with the crossbar (10), and the connecting rod (11) is fixedly mounted on a door panel (12), and the door panel (12) is rotatably sealed and hinged on one side of the sample chamber (2); A propulsion electric rod (13) is installed on the workbench (1), and the output end of the propulsion electric rod (13) is fixedly connected to a gripping claw device (14); The gripping device (14) includes a housing (141) fixed to one end of the propulsion electric rod (13), a propulsion cylinder (142) is embedded in the housing (141), the propulsion rod of the propulsion cylinder (142) is fixedly connected to a fixed block (143), the fixed block (143) is rotatably connected to a connecting block (144), the connecting block (144) is rotatably connected to a clamping jaw (145), the front end of the clamping jaw (145) is embedded with a permanent magnet block (146), and at the same time, the clamping jaw (145) is rotatably connected to the housing (141), and the clamping jaw (145) is used to clamp the sample; A plurality of flange connection plates (15) are provided on the sample chamber (2).

2. The sample chamber structure of the plasma chemistry research system according to claim 1, characterized in that: The entire sample chamber (2) is made of 316L stainless steel and has a columnar shape. The length error of each part is controlled within ±1 mm, and the angle error is controlled within ±1°.

3. The sample chamber structure of the plasma chemistry research system according to claim 1, characterized in that: The flange connection plate (15) is connected to a pumping system, which includes a multi-stage Roots dry pump and a turbomolecular pump. A solenoid valve and a Pirani gauge are provided between the multi-stage Roots dry pump and the turbomolecular pump. A set of ultra-high vacuum electric plug-in valves are provided at the front end of the turbomolecular pump for controlling the gas flow rate under different vacuum environments.

4. The sample chamber structure of the plasma chemistry research system according to claim 3, characterized in that: The pumping system can make the ultimate vacuum of the sample chamber (2) reach 5.0×10-5Pa after being fully baked, the working vacuum / pressure range is 10-5~105Pa, and the vacuum / pressure measurement range is 10-6~105Pa.

5. The sample injection chamber structure of the plasma chemical research system according to claim 1, characterized in that: The sample chamber (2) is equipped with an argon ion sputtering gun, the ion kinetic energy of which is better than 0.12-3keV, and the ion beam current can reach 120μA / cm2, which can clean the sample.

6. The sample chamber structure of the plasma chemistry research system according to claim 1, characterized in that: The sample chamber (2) is also equipped with a vacuum gauge and a thin film gauge. The vacuum gauge has a measurement range of 10-7 to 105 Pa and is used to accurately measure the vacuum degree in the sample chamber, providing accurate data support for the vacuum control of the system.

7. The sample chamber structure of the plasma chemistry research system according to claim 1, characterized in that: The sample in the sample chamber (2) is placed horizontally.

8. The method for using the sample injection chamber structure of a plasma chemistry research system according to claims 1-7, characterized in that: include, Step 1: Sample placement Start the quick switch device: by controlling the movement of the connecting electric rod (4), the connecting rod (5), the rotating rod (6) and other components are driven to move in conjunction, so that the connecting rod (11) on the crossbar (10) drives the door panel (12) to rotate and open; Grabbing the sample: the propulsion electric rod (13) on the workbench (1) pushes the gripping device (14) close to the sample; the propulsion cylinder (142) in the gripping device (14) drives the clamping claw (145) to open and close through the fixed block (143) and the connecting block (144), and the permanent magnet block (146) at the front end of the clamping claw (145) is used to grab the sample; Place the sample: push the electric rod (13) to move the gripper device (14) and the sample to a suitable position in the sample chamber (2) to complete the sample placement; Step 2: Maintain vacuum environment and sample cleanliness The pumping system connected to the flange connection plate (15) works in coordination, including a multi-stage Roots dry pump and a turbomolecular pump. Under the cooperation of the solenoid valve and the Pirani gauge, and under the control of the ultra-high vacuum electric plug-in valve at the front end of the turbomolecular pump, the ultimate vacuum of the sample chamber (2) can reach 5.0×10-5Pa after being fully baked, the working vacuum / pressure range is 10-5~105Pa, and the vacuum / pressure measurement range is 10-6~105Pa; During the experiment, the vacuum gauge and thin film gauge measure the vacuum degree in real time and feed the data back to the control system so that the working state of the pumping system can be adjusted in time to ensure a stable vacuum environment; Step 3: Sample removal Grabbing the sample: advancing the electric rod (13) to push the gripping device (14) close to the sample, and the gripping device (14) grabs the sample; Closing the sample chamber: the rapid opening and closing device closes the door panel (12) to seal the sample chamber (2); Remove the sample: push the electric rod (13) to move the gripper device (14) and the sample out of the sample chamber (2) to complete the sample removal operation.

Images