Sputtering equipment and method for perovskite new energy battery production

Abstract

The invention provides sputtering equipment and method for perovskite new energy battery production, and relates to the technical field of battery production.The equipment comprises a base, a fixing plate and a target plate are integrated at the upper end of the base, a sputtering element and a motor are fixedly connected to one side of the target plate, and a limiting rod extends out of one side of the fixing plate; the limiting rod is slidably sleeved with a moving block and sleeved with a reset spring, the moving block is rotationally connected with a pinion through a connecting frame, and a gear transmission mechanism is arranged on one side of the pinion. The method comprises the following steps: constructing a vacuum environment and evaluating control air pressure; positioning the battery on the pinion; the air cylinder drives the gear transmission mechanism to enable the pinion to rotate at a constant speed; controlling the sputtering element to sputter atomic deposition and monitoring the thickness of the coating; and after finishing, automatically unloading and resetting the equipment. According to the sputtering method provided by the invention, by stabilizing the air pressure, resolving the speed of the air cylinder in real time and monitoring and adjusting the rotating speed, the coating quality and uniformity are ensured, the battery performance is improved, the equipment structure is simple, and the production efficiency and the equipment safety are improved.

Description

Technical Field

[0001] The present invention relates to the field of battery production technology, and in particular to a sputtering device and method for producing perovskite new energy batteries. Background Art

[0002] Perovskite new energy cells are a new type of solar cell that uses perovskite compounds as light-absorbing materials. They have the advantages of high photoelectric conversion efficiency, low cost, and simple preparation process. They have broad application prospects in the field of renewable energy.

[0003] In the production process of perovskite new energy batteries, in order to improve the performance of battery components, it is often necessary to coat the surface of the battery components with thin metals or functional films. Sputtering, as a physical vapor deposition technology, is widely used in battery production because it can stably adhere the coating to the battery surface. However, the traditional sputtering process usually uses a method in which the target rotates around the battery. In this method, the structure of the target and the sputtering equipment is relatively complex, and the target is not stable during movement, resulting in poor sputtering uniformity, which affects the performance and quality of the battery.

[0004] Furthermore, after the cell is sputtered, the traditional process requires the use of a clamping jaw to separate the cell from the sputtering equipment. Because the sputtering drive mechanism and the clamping jaw's moving mechanism operate differently, complex pre-production debugging is required. This is not only time-consuming and labor-intensive, but also carries the risk of collision damage due to delays, reducing production efficiency and equipment life.

[0005] Based on this, a sputtering device and method for the production of perovskite new energy batteries are proposed. Summary of the Invention

[0006] The purpose of the present invention is to solve the above problems and to propose a sputtering device and method for the production of perovskite new energy batteries.

[0007] In order to achieve the above object, the present invention adopts the following technical solutions:

[0008] A sputtering device for the production of perovskite new energy batteries, comprising a base, wherein a fixed plate and a target plate are integrated at the upper end of the base, a sputtering element and a motor are fixedly connected to one side of the target plate, a limit rod extends from one side of the fixed plate, a moving block is slidably sleeved on the limit rod and a reset spring is installed, the moving block is rotatably connected to a pinion through a connecting frame, and a gear transmission mechanism driven by the sleeve block is provided on one side of the pinion.

[0009] Preferably, the gear transmission mechanism includes a sleeve block slidably connected to the moving block, the sleeve block is linked to the fixed plate through a cylinder, the sleeve block drives the rotating shaft to rotate through the bracket one and bracket two connecting rod mechanism, and the rotating shaft is fixedly connected to the large gear meshing with the small gear.

[0010] Preferably, a pressing block is provided on the sleeve block, and a pushing frame cooperating with the pressing block is provided on the fixing plate.

[0011] Preferably, the rotating shaft is rotatably connected to the moving block, the large gear and the small gear are meshed with each other, and a circular hole groove is provided on the small gear.

[0012] Preferably, the pinion is provided with a mounting groove that matches the structure of the bottom end of the battery, or a clamp for clamping the bottom end of the battery is installed on its surface.

[0013] The present invention also provides a sputtering method based on the above-mentioned device, comprising the following steps:

[0014] S1, build a vacuum environment and place the device in the vacuum environment;

[0015] S2, placing the battery to be sputtered in the mounting slot or holder on the pinion for positioning;

[0016] S3, controls the cylinder to move at a speed of v c Contraction, through the bracket 1 and bracket 2 drive the shaft to rotate, the large gear n t The gear rotates at a speed of n. g Uniform rotation;

[0017] S4, when the pinion rotates at a constant speed, controls the sputtering element to generate an ion beam with energy E, bombards the preset target material, and causes atoms to sputter at a rate v, depositing on the battery surface, and monitors the thickness of the battery coating in real time;

[0018] S5, when the battery sputtering is completed, the cylinder contracts until the pressing block contacts the moving block, driving the moving block to move synchronously, so that the pushing frame drives the battery to move, and uses the thrust to separate the battery from the mounting slot or clamp on the pinion;

[0019] S6, after the separation is completed, the cylinder extends and resets, and the spring pushes the moving block back to its original position.

[0020] Preferably, the specific steps of constructing a vacuum environment are:

[0021] Setting a vacuum chamber for battery sputtering; before the battery sputtering operation, monitoring the atmospheric pressure in the vacuum chamber in real time using a vacuum gauge; recording a time zone within a set time length before the current moment as a vacuum monitoring time zone; identifying the atmospheric pressure at any sampling moment within the vacuum monitoring time zone;

[0022] The permissible pressure range of the vacuum chamber is set according to the battery sputtering requirements. The pressure in the vacuum monitoring time zone is compared with the permissible pressure range. If the pressure is not within the permissible pressure range, the corresponding acquisition time of the pressure is recorded as the abnormal pressure moment. The time length between the abnormal pressure moment and the current moment is calculated and recorded as the abnormal gas duration. The number of abnormal pressure moments in the vacuum monitoring time zone is recorded as the abnormal gas amount. All the abnormal gas durations in the vacuum monitoring time zone are weighted and the abnormal gas value is obtained using the formula.

[0023] Then, the pressure trend value is calculated by using the standard deviation formula for the air pressure in the vacuum monitoring time zone;

[0024] Obtain a preset standard pressure value in the vacuum chamber, and subtract the current pressure from the standard pressure value to obtain a pressure standard deviation value;

[0025] The outlier value, pressure trend value and pressure standard deviation value are weighted and the sputtering pressure evaluation value is obtained using the formula;

[0026] If the sputtering pressure evaluation value is greater than its sputtering pressure standard threshold, it means that the air pressure in the vacuum chamber does not meet the requirements, and an atmospheric extraction operation is generated; the atmospheric extraction operation is used to control the molecular pump and mechanical pump combination used in conjunction with the vacuum chamber to evacuate the vacuum chamber until the air pressure in the vacuum chamber is within the allowable pressure range.

[0027] As a preference, based on step S3, the cylinder is controlled to move at a speed v c Contraction, through the bracket 1 and bracket 2 drive the shaft to rotate, the large gear n t The gear rotates at a speed of n. g Uniform rotation, where the cylinder speed v c The acquisition logic is:

[0028] The first and second brackets, the sleeve block and the rotating shaft form a crank slider mechanism;

[0029] According to the kinematic formula of the crank slider mechanism, the linear velocity v of the sleeve c Angular velocity w with respect to the axis of rotation (14) t satisfy: Where f represents the rotation radius of bracket 1, L2 represents the length of bracket 2, and θ represents the angle between bracket 1 and the vertical direction;

[0030] Combined gear ratio and uniform sputtering algorithm, where w g is the angular velocity of the pinion, uniform sputtering algorithm d is the diameter of the cell to be sputtered, N is the required coating thickness, and v is the target sputtering rate; real-time calculation of cylinder speed v c .

[0031] As a preference, based on the energy E=k·E generated by the sputtering element in step S4 t The ion beam is set to I, and I is in a reasonable beam density range; the sputtering rate v is monitored in real time by a quartz crystal microbalance, and the coating thickness is measured online using a spectroscopic ellipsometer and processed to obtain the circumferential deviation |ΔN|. When the circumferential deviation |ΔN| is greater than the circumferential deviation threshold aN, the speed of the large gear is automatically adjusted. The speed update formula is: n' t = Where k is the energy coefficient, and its value range is a real number interval greater than 1, E t is the target sputtering threshold, a is the circumferential deviation threshold coefficient, and its value range is a real number greater than 0.

[0032] Preferably, the logic for obtaining the circumferential deviation is:

[0033] During the battery rotation sputtering process, the spectroscopic ellipsometer obtains m different circumferential positions for measurement, and obtains the coating thickness values N1, N2...N at different circumferential positions. m ;

[0034] Calculate the average circumferential thickness of the coating based on the measured coating thickness values at m circumferential positions. The calculation formula is as follows: Among them, N j represents the coating thickness at the jth measurement point, and m is the number of different circumferential positions;

[0035] Then calculate the deviation ΔN between the coating thickness at each circumferential position and the circumferential average thickness j , the formula is: Where ΔN j Used to reflect the degree of deviation of the coating thickness corresponding to the j-th circumferential position from the average thickness;

[0036] Take the maximum value of the absolute value of the deviation of all measurement points, that is, |ΔN|=max{|ΔN1|, |ΔN2|, ..., |ΔN m |}; This maximum value can intuitively reflect the maximum unevenness of the coating thickness in the circumferential direction.

[0037] In summary, due to the adoption of the above technical solution, the beneficial effects of the present invention are:

[0038] 1. The present invention adopts a pinion structure to place the battery to be sputtered. During the sputtering process, the sputtering element does not need to move. Instead, the sleeve slowly moves to drive the pinion to rotate. This method allows the target atoms to be evenly sputtered on the battery surface, and the distance between the battery and the target remains unchanged during the entire process, effectively avoiding the problem of uneven sputtering caused by unstable structural movement, significantly improving the uniformity of sputtering, and thus improving the performance and quality of perovskite new energy batteries.

[0039] 2. The present invention adopts a pressing block structure, which uses the pressing block to push the moving block and the sleeve block to move synchronously, so that the battery moves toward the pushing frame, and the pushing frame automatically separates the electroplated battery from the small gear. As the cylinder extends, the various structures in the sputtering equipment can automatically complete the reset. By adopting this design, there is no need for complicated debugging operations, which avoids collision damage between structures, not only improving production efficiency, but also extending the service life of the equipment and reducing production costs.

[0040] 3. The sputtering method proposed in the present invention ensures that the sputtering process is carried out under stable air pressure conditions by evaluating and controlling the vacuum environment, which is beneficial to improving the quality of the coating. At the same time, the cylinder speed is calculated in real time according to the kinematic formula of the crank slider mechanism and the uniform sputtering algorithm, and the sputtering rate and coating thickness are monitored in real time and the large gear speed is automatically adjusted to ensure that the uniformity and thickness of the coating meet the requirements, thereby further improving the performance of the battery. BRIEF DESCRIPTION OF THE DRAWINGS

[0041] Figure 1 The figure shows the overall structure of the sputtering equipment provided by the present invention;

[0042] Figure 2 It shows a structural schematic diagram of the connection portion of the connecting frame provided by the present invention;

[0043] Figure 3 A schematic diagram of the exploded structure of the shaft connection provided by the present invention is shown;

[0044] Figure 4 Shown is a flow chart of the sputtering method provided by the present invention.

[0045] Legend:

[0046] 1. Base; 2. Sputtering element; 3. Motor; 4. Bushing block; 5. Moving block; 6. Pressing block; 7. Cylinder; 8. Fixed plate; 9. Bracket 1; 10. Bracket 2; 11. Pushing frame; 12. Baffle; 13. Target plate; 14. Rotating shaft; 15. Large gear; 16. Small gear; 17. Connecting frame; 18. Limiting rod; 19. Spring. DETAILED DESCRIPTION

[0047] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making any creative efforts shall fall within the scope of protection of the present invention.

[0048] See also Figures 1-4 The present invention provides a sputtering device for the production of perovskite new energy batteries, including a base 1, an integrated fixed plate 8 and a target plate 13 at the upper end of the base 1, a target for sputtering is provided on the target plate 13, a sputtering element 2 and a motor 3 are fixedly connected to one side of the target plate 13, a limiting rod 18 extends from one side of the fixed plate 8, and the limiting rod 18 can limit the structure of the moving block 5 to prevent the sleeve block 4 structure from driving the moving block 5 structure to move when the cylinder 7 contracts in the front half, the limiting rod 18 is slidably sleeved on the moving block 5 and is sleeved with a reset spring 19, the spring 19 structure can stabilize the position of the moving block 5 and complete the reset of the structure when no force is applied, a connecting frame 17 is connected to the moving block 5, and a pinion 16 is connected by rotating the connecting frame 17, and a gear transmission mechanism driven by the sleeve block 4 is provided on one side of the pinion 16.

[0049] Specifically, such as Figure 1 As shown, a baffle 12 is connected to one side of the moving block 5. The baffle 12 can prevent target atoms from sputtering onto the equipment, and subsequent cleaning or replacement of the baffle 12 is also convenient.

[0050] Specifically, such as Figure 1 The gear transmission mechanism shown includes a sleeve block 4 that is slidably connected to the moving block 5. The sleeve block 4 is linked to the fixed plate 8 through the cylinder 7. The cylinder 7 can complete the sputtering operation of a single battery by extending and retracting one movement. The telescopic end of the cylinder 7 is connected to the fixed plate 8. The sleeve block 4 drives the rotating shaft 14 to rotate through the connecting rod mechanism of bracket 1 9 and bracket 2 10. The rotating shaft 14 is fixedly connected to the large gear 15 that meshes with the small gear 16, and the moving block 5 is sleeved on the rotating shaft 14.

[0051] Specifically, such as Figure 1 and Figure 2 As shown, a pressing block 6 is provided on the sleeve block 4, and a pushing frame 11 cooperating with the pressing block 6 is provided on the fixed plate 8. The pressing block 6 and the pushing frame 11 cooperate to push the battery and the pinion 16 to separate, forming an automatic battery unloading structure, wherein the pressing block 6 is arranged opposite to one end of the moving block 5. When the sleeve block 4 moves to the point where the pressing block 6 contacts the moving block 5, it can synchronously drive the moving block 5 to move.

[0052] Specifically, such as Figure 3As shown, the rotating shaft 14 is rotatably connected to the moving block 5 , the large gear 15 and the small gear 16 are meshed with each other, a circular hole groove is opened on the small gear 16 , and the large gear 15 and the small gear 16 are rotatably connected to the connecting frame 17 .

[0053] It should be noted that the pinion 16 is provided with a mounting groove that matches the structure of the bottom end of the battery, or a clamp for clamping the bottom end of the battery is installed on its surface to improve the stability of the battery placement. This is an existing conventional mature technology and is not drawn in the drawings in this application.

[0054] Specifically, such as Figure 4 As shown, the present invention also provides a sputtering method using the above-mentioned device, comprising the following steps:

[0055] S1, build a vacuum environment and place the device in the vacuum environment;

[0056] S2, placing the battery to be sputtered in the mounting groove or holder on the pinion 16 for positioning;

[0057] S3, control the cylinder 7 to retract at a speed, drive the shaft 14 to rotate through the bracket 1 9 and the bracket 2 10, the large gear 15 rotates at a speed, and the small gear 16 rotates at a uniform speed through the transmission ratio i;

[0058] S4, when the pinion 16 rotates at a constant speed, the sputtering element 2 is controlled to generate an ion beam with energy E, bombarding the preset target material so that atoms are sputtered at a rate v and deposited on the battery surface, and the thickness of the battery coating is monitored in real time;

[0059] S5, when the battery sputtering is completed, the cylinder 7 contracts until the pressing block 6 contacts the moving block 5, driving the moving block 5 to move synchronously, so that the pushing frame 11 drives the battery to move, and uses the thrust to separate the battery from the mounting slot or clamp on the pinion 16;

[0060] S6, after the separation is completed, the cylinder 7 extends and resets, and the spring 19 pushes the moving block 5 back to its original position.

[0061] Specifically, the specific steps for building a vacuum environment are:

[0062] Set up the vacuum chamber for battery sputtering;

[0063] Before the battery sputtering operation, the atmospheric pressure in the vacuum chamber is monitored in real time by a vacuum gauge; the time zone within a set time length before the current moment is recorded as the vacuum monitoring time zone; and the atmospheric pressure at any sampling moment within the vacuum monitoring time zone is identified;

[0064] The allowable pressure range of the vacuum chamber is set according to the battery sputtering requirements. The pressure in the vacuum monitoring time zone is compared with the allowable pressure range. If the pressure is not in the allowable pressure range, the corresponding acquisition time of the pressure is recorded as the abnormal pressure time. The time length between the abnormal pressure time and the current time is calculated and recorded as the abnormal gas duration HYg, where g represents the number of the abnormal pressure time. The number of abnormal pressure moments in the vacuum monitoring time zone is recorded as the abnormal gas volume H. All the abnormal gas durations in the vacuum monitoring time zone are weighted and the formula is used to calculate the abnormal gas duration. Get the abnormal air value HR, where gr represents the weight of the abnormal air duration corresponding to the g-th abnormal air pressure moment. This abnormal air value directly reflects the duration and frequency of the abnormal air pressure.

[0065] Then, the standard deviation formula is used to calculate the air pressure in the vacuum monitoring time zone to obtain the air pressure trend value HE, where the air pressure trend value is used to monitor the air pressure fluctuation amplitude in the vacuum monitoring time zone and determine whether the air pressure is in a stable range;

[0066] Obtain the preset standard pressure value in the vacuum chamber, subtract the current pressure from the standard pressure value to obtain the pressure standard deviation value HW. The pressure standard deviation value is used to quantify the degree of deviation between the current pressure and the preset standard value, ensuring that the real-time pressure is close to the ideal sputtering condition;

[0067] The foreign gas value, pressure trend value, and pressure standard deviation are weighted and the sputtering pressure evaluation value ZH is obtained using the formula ZH = HR × h1 + HE × h2 + HW × h3, where h1, h2, and h3 respectively represent the weights of the foreign gas value, pressure trend value, and pressure standard deviation for whether the pressure in the vacuum chamber meets the sputtering standard.

[0068] If the sputtering pressure assessment value is greater than the sputtering pressure standard threshold, it means that the air pressure in the vacuum chamber does not meet the requirements, and an atmospheric extraction operation is generated. The atmospheric extraction operation is used to control the combination of molecular pumps and mechanical pumps used in conjunction with the vacuum chamber to evacuate the vacuum chamber until the air pressure in the vacuum chamber is within the allowable pressure range, thereby ensuring that the vacuum chamber air pressure accurately meets the sputtering process requirements and avoiding fluctuations in coating quality caused by unstable air pressure.

[0069] Specifically, based on step S3, the cylinder 7 is controlled to move at a speed v c Contraction, through the bracket 1 9, the bracket 2 10 drives the shaft 14 to rotate, the large gear 15 is n t The gear 16 rotates at a speed n through the transmission ratio i. g Uniform rotation, where cylinder 7 speed v c The acquisition logic is:

[0070] Bracket 1 9, bracket 2 10, sleeve block 4, and rotating shaft 14 constitute a crank slider mechanism;

[0071] According to the kinematic formula of the crank slider mechanism, the linear velocity v of the sleeve 4 is c Angular velocity w with respect to the shaft 14 t satisfy: Wherein f represents the rotation radius of the bracket 1 9, L2 represents the length of the bracket 2 10, and θ represents the angle between the bracket 1 9 and the vertical direction;

[0072] Combined gear ratio and uniform sputtering algorithm, where w g is the angular velocity of the pinion 16, uniform sputtering algorithm d is the diameter of the cell to be sputtered, N is the required coating thickness, and v is the target sputtering rate; real-time solution of cylinder 7 speed v c ;

[0073] It should be noted that when the crank angle θ changes (such as from 0° to 180°), the speed v of the block 4 c In order to eliminate the influence of angle on speed uniformity, the driving force of cylinder 7 is adjusted by real-time monitoring θ to make v c Keep constant and ensure that the speed of the large gear 15 t Stability, thereby ensuring the uniform rotation of the pinion 16, and ultimately achieving axial uniformity of the coating thickness;

[0074] By combining the real-time sputtering rate v with the preset coating thickness N, the speed matching of the large and small gears 16 is adjusted by the transmission ratio step, forming a "monitoring-calculation-adjustment" closed loop, avoiding the coating thickness deviation caused by parameter fluctuations in traditional open-loop control.

[0075] Specifically, based on the energy E=k·E generated by the sputtering element 2 in step S4 t The ion beam is used to ensure effective sputtering of target atoms; the beam current density is set to I, which is within a reasonable beam current density range to avoid damage to the battery substrate caused by excessive energy or deposition efficiency affected by excessive energy; the sputtering rate v is monitored in real time by a quartz crystal microbalance, and the coating thickness is measured online using a spectroscopic ellipsometer and processed to obtain the circumferential deviation |ΔN|. When the circumferential deviation |ΔN| is greater than the circumferential deviation threshold aN, the speed of the large gear 15 is automatically adjusted. The speed update formula is: Adjust the rotation speed of the large gear 15 to change the rotation speed of the small gear 16, compensate for the circumferential deposition difference, and ensure that the coating uniformity error is within a controllable range; where k is the energy coefficient, and the value range is a real number interval greater than 1, E t is the target sputtering threshold, a is the circumferential deviation threshold coefficient, and its value range is a real number greater than 0.

[0076] Specifically, the logic for obtaining circumferential deviation is:

[0077] During the battery rotation sputtering process, the spectroscopic ellipsometer obtains m different circumferential positions for measurement, and obtains the coating thickness values N1, N2...N at different circumferential positions. m ;

[0078] Calculate the average circumferential thickness of the coating based on the measured coating thickness values at m circumferential positions. The calculation formula is as follows: Among them, N j represents the coating thickness at the jth measurement point, and m is the number of different circumferential positions. The circumferential average thickness serves as a benchmark for measuring the deviation of each point. This benchmark comprehensively reflects the overall deposition efficiency of the current sputtering process and provides a unified reference standard for deviation analysis.

[0079] Then calculate the deviation ΔN between the coating thickness at each circumferential position and the circumferential average thickness j , the formula is: Where ΔN j It is used to reflect the degree of deviation of the coating thickness corresponding to the jth circumferential position from the average thickness. A positive value indicates that the coating at that point is thicker, and a negative value indicates that it is thinner. The absolute value of the deviation |ΔN j |It reflects the degree of sedimentation difference at different circumferential positions, avoiding misjudgment of uniformity caused by the mutual cancellation of positive and negative deviations;

[0080] Take the maximum value of the absolute value of the deviation of all measurement points, that is, |ΔN|=max{|ΔN1|, |ΔN2|, ..., |ΔN m |}; This maximum value can intuitively reflect the maximum unevenness of the coating thickness in the circumferential direction and can locate local defects caused by fluctuations in target material distribution, ion beam angle, or rotation speed during the sputtering process.

[0081] The sputtering equipment and method provided by the present invention achieve automation and precision in the sputtering process of perovskite new energy batteries through innovative mechanical structure and coordinated control of process parameters. Its working principle is as follows:

[0082] Device initialization and battery positioning:

[0083] The equipment is placed in a vacuum chamber, and the chamber pressure is monitored in real time using a vacuum gauge. Based on the preset allowable pressure range, the sputtering pressure assessment value is calculated by weighting the outlier value, pressure trend value, and pressure standard deviation value. If the sputtering pressure assessment value is greater than its preset threshold, the molecular pump and mechanical pump combination are automatically started to pump air until the pressure stabilizes within the process requirement range.

[0084] Battery positioning: Place the battery to be sputtered in the mounting slot or holder of the pinion 16. Fix the bottom end of the battery by a matching geometric structure or clamping device to ensure stable position during rotation. The pinion 16 is rotatably connected to the moving block 5 through the connecting frame 17. The moving block is mounted on the limit rod 18 and the reset spring 19 provides reset force.

[0085] Sputtering process driving principle:

[0086] Gear transmission and rotation control: Start the cylinder 7 to retract, driving the sleeve 4 to move along the limit rod straight line 18; the sleeve 4 converts the linear motion into the rotational motion of the shaft 14 through the crank slider mechanism composed of bracket 1 9 and bracket 2 10; the speed v of the sleeve 4 c ,satisfy

[0087] The rotating shaft 14 drives the large gear 15 to rotate, and the transmission ratio Drive pinion 16 to rotate at a constant speed; transmission ratio combined with uniform sputtering algorithm Real-time calculation ensures that the rotation speed of the pinion 16 matches the atomic deposition rate to achieve uniform sputtering;

[0088] Ion beam sputtering and coating deposition: Sputtering element 2 generates an ion beam with energy E, which bombards the target material on the target plate 13 with a reasonable beam current density I, causing atoms to sputter at a rate v and deposit on the rotating battery surface. A quartz crystal microbalance monitors the sputtering rate v in real time, and a spectroscopic ellipsometer measures the circumferential thickness of the coating online to calculate the average thickness. and maximum deviation ΔN max , the maximum deviation is the maximum value of the absolute value of the deviations of all measurement points. When the formula Adjust the speed of the large gear 15 to compensate for the circumferential deposition difference.

[0089] The above description of the embodiments is intended to enable one skilled in the art to implement or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present invention. Therefore, the present invention is not limited to the embodiments shown herein but is intended to conform to the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A sputtering device for the production of perovskite new energy batteries, comprising a base (1), characterized in that: The upper end of the base (1) is integrated with a fixed plate (8) and a target plate (13); one side of the target plate (13) is fixedly connected to a sputtering element (2) and a motor (3); a limiting rod (18) extends from one side of the fixed plate (8); a moving block (5) is slidably sleeved on the limiting rod (18) and a reset spring (19) is sleeved thereon; the moving block (5) is rotatably connected to a pinion (16) via a connecting frame (17); and a gear transmission mechanism driven by the sleeve block (4) is provided on one side of the pinion (16).

2. The sputtering equipment for the production of perovskite new energy batteries according to claim 1, characterized in that: The gear transmission mechanism comprises a sleeve block (4) slidably connected to a moving block (5); the sleeve block (4) is linked to a fixed plate (8) via a cylinder (7); the sleeve block (4) drives a rotating shaft (14) to rotate via a connecting rod mechanism of a bracket 1 (9) and a bracket 2 (10); the rotating shaft (14) is fixedly connected to a large gear (15) meshing with a small gear (16).

3. The sputtering equipment for the production of perovskite new energy batteries according to claim 2, characterized in that: A pressing block (6) is provided on the sleeve block (4), and a pushing frame (11) matched with the pressing block (6) is provided on the fixing plate (8).

4. The sputtering equipment according to claim 3, wherein: The rotating shaft (14) is rotatably connected to the moving block (5), the large gear (15) and the small gear (16) are meshed with each other, and a circular hole groove is provided on the small gear (16).

5. The sputtering equipment according to claim 1, wherein The pinion (16) is provided with a mounting groove that matches the structure of the battery bottom end, or a clamp for clamping the battery bottom end is installed on its surface.

6. A sputtering method based on the apparatus according to any one of claims 1 to 5, characterized in that: The steps include: S1, build a vacuum environment and place the device in the vacuum environment; S2, placing the battery to be sputtered in the mounting groove or holder on the pinion (16) for positioning; S3, control cylinder (7) at speed v c Contraction, through the bracket 1 (9), the bracket 2 (10) drives the shaft (14) to rotate, the large gear (15) with n t The gear (16) rotates at a speed n through the transmission ratio i. g Uniform rotation; S4, when the pinion (16) rotates at a constant speed, the sputtering element (2) is controlled to generate an ion beam with energy E, bombarding a preset target material so that atoms are sputtered at a rate v and deposited on the battery surface, and the coating thickness of the battery is monitored in real time; S5, when the battery sputtering is completed, the cylinder (7) contracts until the pressing block (6) contacts the moving block (5), driving the moving block (5) to move synchronously, so that the pushing frame (11) drives the battery to move, and uses the thrust to separate the battery from the mounting slot or clamp on the pinion (16); S6, after the separation is completed, the cylinder (7) extends and resets, and the spring (19) pushes the moving block (5) back to its original position.

7. The sputtering method according to claim 6, wherein: The specific steps to build a vacuum environment are: Setting a vacuum chamber for battery sputtering; before the battery sputtering operation, monitoring the atmospheric pressure in the vacuum chamber in real time using a vacuum gauge; recording a time zone within a set time length before the current moment as a vacuum monitoring time zone; identifying the atmospheric pressure at any sampling moment within the vacuum monitoring time zone; The allowable pressure range of the vacuum chamber is set according to the battery sputtering requirements. The pressure in the vacuum monitoring time zone is compared with the allowable pressure range. If the pressure is not within the allowable pressure range, the corresponding acquisition time of the pressure is recorded as the abnormal pressure time. The time length between the abnormal pressure time and the current time is calculated and recorded as the abnormal pressure duration. The number of abnormal air pressure moments in the vacuum monitoring time zone is recorded as the abnormal gas volume; all the abnormal gas durations in the vacuum monitoring time zone are weighted and the abnormal gas value is obtained using the formula; Then, the pressure trend value is calculated by using the standard deviation formula for the air pressure in the vacuum monitoring time zone; Obtain a preset standard pressure value in the vacuum chamber, and subtract the current pressure from the standard pressure value to obtain a pressure standard deviation value; The outlier value, pressure trend value and pressure standard deviation value are weighted and the sputtering pressure evaluation value is obtained using the formula; If the sputtering pressure evaluation value is greater than its sputtering pressure standard threshold, it means that the air pressure in the vacuum chamber does not meet the requirements, and an atmospheric extraction operation is generated; the atmospheric extraction operation is used to control the molecular pump and mechanical pump combination used in conjunction with the vacuum chamber to evacuate the vacuum chamber until the air pressure in the vacuum chamber is within the allowable pressure range.

8. The sputtering method according to claim 6, wherein: Based on step S3, the cylinder (7) is controlled to move at a speed v c Contraction, through the bracket 1 (9), the bracket 2 (10) drives the shaft (14) to rotate, the large gear (15) with n t The gear (16) rotates at a speed n through the transmission ratio i. g Uniform rotation, where the cylinder (7) speed v c The acquisition logic is: The bracket 1 (9), the bracket 2 (10), the sleeve block (4) and the rotating shaft (14) form a crank slider mechanism; According to the kinematic formula of the crank slider mechanism, the linear velocity v of the sleeve (4) is c Angular velocity w with respect to the axis of rotation (14) t satisfy: Where f represents the rotation radius of bracket one (9), L2 represents the length of bracket two (10), and θ represents the angle between bracket one (9) and the vertical direction; Combined gear ratio and uniform sputtering algorithm, where w g is the angular velocity of the pinion (16), uniform sputtering algorithm d is the diameter of the cell to be sputtered, N is the required coating thickness, and v is the target sputtering rate; real-time solution of cylinder (7) speed v c .

9. The sputtering method according to claim 6, wherein: Based on the energy E=k·E generated by the sputtering element (2) in step S4 t The ion beam is set to have a beam current density of I, which is within a reasonable beam current density range; the sputtering rate v is monitored in real time by a quartz crystal microbalance, and the coating thickness is measured online by a spectroscopic ellipsometer and the circumferential deviation |ΔN| is obtained by processing. When the circumferential deviation |ΔN| is greater than the circumferential deviation threshold aN, the speed of the large gear (15) is automatically adjusted, and the speed update formula is: Where k is the energy coefficient, and its value range is a real number interval greater than 1, E t is the target sputtering threshold, a is the circumferential deviation threshold coefficient, and its value range is a real number greater than 0.

10. The sputtering method according to claim 9, wherein The logic for obtaining the circumferential deviation is: During the battery rotation sputtering process, the spectroscopic ellipsometer obtains m different circumferential positions for measurement, and obtains the coating thickness values N1, N2...N at different circumferential positions. m ; Calculate the average circumferential thickness of the coating based on the measured coating thickness values at m circumferential positions. The calculation formula is as follows: Among them, N j represents the coating thickness at the jth measurement point, and m is the number of different circumferential positions; Then calculate the deviation ΔN between the coating thickness at each circumferential position and the circumferential average thickness j , the formula is: Where ΔN j Used to reflect the degree of deviation of the coating thickness corresponding to the j-th circumferential position from the average thickness; Take the maximum value of the absolute value of the deviation of all measurement points, that is, |ΔN|=max{|ΔN1|, |ΔN2|, ..., |ΔN m |}; This maximum value can intuitively reflect the maximum unevenness of the coating thickness in the circumferential direction.

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