OPC preprocessing method and system for beveled edge graph and OPC correction method

Abstract

The invention provides an OPC preprocessing method and system for a beveled edge graph and an OPC correction method, and the method comprises the steps: obtaining a to-be-processed graph which at least comprises a beveled edge and right-angle edges connected with the two ends of the beveled edge; positioning a first intersection point and a second intersection point of the bevel edge and the right-angle edge; synchronously moving the first intersection point and the second intersection point by a preset distance along the direction close to the to-be-processed graph based on the graph precision to respectively obtain a first auxiliary point and a second auxiliary point; forming an auxiliary pattern through the first intersection point, the second intersection point, the first auxiliary point and the second auxiliary point; and performing logical operation on the to-be-processed graph and the auxiliary graph to obtain a target graph. According to the configuration, the short limb is added between the bevel edge and the right-angle edge, so that the difference between the final simulation graph and the target graph is further reduced, the correction effect is remarkably improved, the number of iterations can be reduced, and the OPC correction efficiency is further improved.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor manufacturing, and in particular to an OPC preprocessing method and system for bevel edge graphics, and an OPC correction method. Background Art

[0002] With the continuous development of large-scale integrated circuit technology, model-based OPC (Optical Proximity Correction) has been widely used in the key layer mask manufacturing process. The model-based OPC correction method can well simulate the imaging on the silicon wafer after exposure based on the established model. By compensating the mask pattern, the pattern on the silicon wafer can be kept consistent with the design or target pattern, solving the pattern distortion caused by the optical proximity effect.

[0003] The model-based OPC correction method cuts the target graphics into segments according to rules to form a grid, sets measurement points on the gridded segments, and performs corrections while simulating, ultimately making the simulation results consistent with the target graphics at the measurement points.

[0004] However, during the design process or pre-processing of the design, some features that are not conducive to optical proximity correction may exist or be generated, such as 45° bevels. These do not violate the design rules, but they can lead to unreasonable optical proximity correction results, such as broken lines, bridging, and failure to correct to the target.

[0005] In the existing OPC processing flow, when a design graphic contains an oblique edge at a 45-degree angle to the coordinate axis and an adjacent right-angled edge perpendicular to the coordinate, the model-based optical proximity effect correction method will cut it normally according to the rules to form a grid segment. After the simulated correction movement, the angle will be closed and the actual grid length of the oblique edge will be merged with the right-angled grid, further reducing it. This results in the final correction result being unable to achieve the correction target during simulation.

[0006] Based on this, how to solve the problem that in the existing OPC processing, the 45° bevel will be further reduced due to the corrected grid length, resulting in the correction result failing to achieve the correction target during simulation. Summary of the Invention

[0007] The purpose of the present invention is to provide an OPC preprocessing method and system, and an OPC correction method for beveled edge graphics, so as to solve the problem in the prior art that the 45° beveled edge will be further reduced due to the corrected grid length, resulting in the correction result failing to achieve the correction target during simulation.

[0008] In order to achieve the above object, the present invention provides an OPC preprocessing method for bevel edge graphics, comprising:

[0009] Acquire a figure to be processed, wherein the figure to be processed includes at least a hypotenuse and right-angled sides respectively connected to two ends of the hypotenuse;

[0010] Locating a first intersection point and a second intersection point of the hypotenuse and the right-angled side;

[0011] Based on the accuracy of the graphic, the first intersection point and the second intersection point are synchronously moved by a preset distance in a direction close to the graphic to be processed to obtain a first auxiliary point and a second auxiliary point respectively;

[0012] forming an auxiliary figure through the first intersection point, the second intersection point, the first auxiliary point, and the second auxiliary point;

[0013] A logical operation is performed on the to-be-processed graphic and the auxiliary graphic to obtain a target graphic.

[0014] Optionally, the hypotenuse and the right-angled side are arranged at an angle.

[0015] Optionally, based on the graphic accuracy, synchronously moving the first intersection point and the second intersection point by a preset distance in a direction close to the graphic to be processed to obtain a first auxiliary point and a second auxiliary point, respectively, includes:

[0016] The first intersection point and the second intersection point are synchronously moved a preset distance toward the interior of the to-be-processed graphic in a direction perpendicular to a line connecting the first intersection point and the second intersection point to obtain the first auxiliary point and the second auxiliary point respectively.

[0017] Optionally, the graphic precision is P, and the preset distance D satisfies: D=1 / P.

[0018] Optionally, the first intersection point, the second intersection point, the first auxiliary point and the second auxiliary point are connected in sequence to form the auxiliary graph.

[0019] Optionally, the auxiliary graphic is rectangular.

[0020] Optionally, a Boolean operation is performed on the graphic to be processed and the auxiliary graphic, and the auxiliary graphic is subtracted from the graphic to be processed to form the target graphic.

[0021] In order to achieve the above object, the present invention also provides an OPC correction method, comprising:

[0022] Using the OPC preprocessing method for the beveled edge pattern as described above, a target pattern is obtained;

[0023] Perform OPC correction on the target pattern.

[0024] Optionally, there is a short adjacent side between the right-angled side and the hypotenuse in the target figure; one end of the short adjacent side is connected to the hypotenuse, and the other end is connected to the right-angled side.

[0025] In order to achieve the above object, the present invention further provides an OPC preprocessing system for bevel edge graphics, comprising:

[0026] An acquisition module, configured to acquire a figure to be processed, wherein the figure to be processed includes at least a hypotenuse and right-angled sides respectively connected to both ends of the hypotenuse;

[0027] A positioning module, configured to locate a first intersection point and a second intersection point of the hypotenuse and the right-angled side;

[0028] a construction module, configured to synchronously move the first intersection point and the second intersection point by a preset distance in a direction close to the image to be processed according to the image accuracy, to obtain a first auxiliary point and a second auxiliary point, respectively; and to form an auxiliary image by using the first intersection point, the second intersection point, the first auxiliary point, and the second auxiliary point;

[0029] The operation module is used to perform a logical operation on the graphics to be processed and the auxiliary graphics to obtain a target graphics.

[0030] Compared with existing OPC preprocessing methods, the OPC preprocessing method and system, and OPC correction method for beveled edge graphics provided by this application have the following advantages:

[0031] The OPC preprocessing method for beveled edge graphics provided in this application forms an auxiliary graphic by moving the intersection of the beveled edge and the right-angled edge a preset distance in a direction closer to the image to be processed. A logical operation is then performed on the image to be processed and the auxiliary graphic to ultimately obtain the target graphic. This method forms an intermediate short adjacent edge between the beveled edge and the adjacent right-angled edge in the target graphic, making it impossible for the model-based OPC correction method to ignore this short adjacent edge. Correction is then performed in the direction of the beveled edge, resulting in a target graphic that is more conducive to optical proximity correction. Consequently, the difference between the final simulated image and the target image is further reduced, significantly improving the correction effect and reducing the number of iterations, thereby improving OPC correction efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] Figure 1 A schematic diagram of the difference between the target pattern and the OPC pattern in the prior art;

[0033] Figure 2 A schematic diagram of the difference between the target graphics in the prior art and the simulation results;

[0034] Figure 3 A flowchart of an OPC preprocessing method for beveled edge graphics provided by an embodiment of the present invention;

[0035] Figure 4 A schematic diagram of step S2 provided in an embodiment of the present invention;

[0036] Figure 5 A schematic diagram of step S3 provided in an embodiment of the present invention;

[0037] Figure 6 A schematic diagram of step S4 provided in an embodiment of the present invention;

[0038] Figure 7 A schematic diagram of step S5 provided in an embodiment of the present invention;

[0039] Figure 8 A schematic diagram showing the difference between the target graphic and the OPC graphic provided by an embodiment of the present invention;

[0040] Figure 9 A schematic diagram showing the difference between the target graph and the simulation result provided by an embodiment of the present invention;

[0041] Figure 10 A comparison chart showing the relationship between the number of iterations and EPE (Edge Placement Error) before and after using the above method provided in an embodiment of the present invention;

[0042] Figure 11 A flowchart of an OPC correction method provided by an embodiment of the present invention;

[0043] Figure 12 A schematic diagram of an OPC preprocessing system for bevel-edge graphics provided by an embodiment of the present invention.

[0044] The description of each reference numeral is as follows:

[0045] 1-hypotenuse; 2-right-angle side; 3-short adjacent side; 4-auxiliary figure; 5-figure to be processed;

[0046] 10-acquisition module; 20-positioning module; 30-construction module; 40-operation module. DETAILED DESCRIPTION

[0047] To make the objects, advantages, and features of the present invention more clearly apparent, the present invention is further described below in conjunction with the accompanying drawings and specific embodiments. It should be noted that the drawings are all in a very simplified form and are not drawn to scale. They are only used to conveniently and clearly assist in illustrating the purposes of the embodiments of the present invention. In addition, the structures shown in the drawings are often part of the actual structure. In particular, different drawings may need to illustrate different focuses and sometimes use different scales.

[0048] As used in this specification, the singular forms "a", "an", and "the" include plural referents, the term "or" is generally used to include "and / or", the term "several" is generally used to include "at least one", and the term "at least two" is generally used to include "two or more". In addition, the terms "first", "second", and "third" are used for descriptive purposes only and are not to be understood as indicating or implying relative importance or implicitly indicating the number of the technical features indicated. Therefore, the features specified as "first", "second", and "third" may explicitly or implicitly include one or at least two of the features, "one end" and "the other end" and "proximal end" and "distal end" generally refer to two corresponding parts, which include not only endpoints, and the terms "mounted", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the internal communication between two elements or the interaction relationship between two elements. In addition, as used in this specification, an element disposed on another element generally only indicates that there is a connection, coupling, cooperation or transmission relationship between the two elements, and the connection, coupling, cooperation or transmission between the two elements may be direct or indirect through an intermediate element, and it cannot be understood as indicating or implying a spatial positional relationship between the two elements, that is, one element may be in any orientation such as inside, outside, above, below or to one side of another element, unless otherwise clearly indicated in the content. The terms "upper", "lower", "top" and "bottom" are generally relative positional relationships arranged in the direction of gravity; the terms "vertical" and "vertical direction" generally refer to the direction of gravity, which is generally perpendicular to the ground, and "horizontal" and "horizontal plane direction" generally refer to the direction parallel to the ground; for ordinary technicians in this field, the specific meanings of the above terms in this specification can be understood according to specific circumstances.

[0049] The purpose of the present invention is to provide an OPC preprocessing method and system, and an OPC correction method for beveled edge graphics, so as to solve the problem in the prior art that the 45° beveled edge will be further reduced due to the corrected grid length, resulting in the correction result failing to achieve the correction target during simulation.

[0050] Those skilled in the art will understand that, in the process of model-based OPC correction, when faced with the widespread 45° bevel, although it does not violate the design rules, it will be cut normally according to the rules to form grid segments during the correction process. After the simulation correction, the actual grid length of the bevel is merged with the grid of the right-angle side due to the closed angle, thereby further reducing it, resulting in the final correction result being unable to achieve the correction target during the simulation (e.g. Figure 1 and Figure 2Based on this, the present embodiment provides an OPC preprocessing method and system, and an OPC correction method for beveled edge graphics. By forming an intermediate short adjacent edge between the beveled edge and the adjacent right-angled edge, the model-based OPC correction cannot ignore the short adjacent edge and corrects in the direction of the beveled edge. As a result, the actual grid of the beveled edge and the grid of the right-angled edge are connected and closed by the short adjacent edge, thereby increasing the actual grid length of the beveled edge and significantly improving the correction effect.

[0051] Please refer to Figures 3 to 7 The present invention provides an OPC preprocessing method for bevel edge graphics, comprising:

[0052] Step S1: obtaining a figure 5 to be processed, wherein the figure 5 to be processed comprises at least a hypotenuse 1 and right-angled sides 2 respectively connected to both ends of the hypotenuse 1;

[0053] Step S2: Locate the first and second intersections of the hypotenuse 1 and the right-angled side 2 (e.g. Figure 4 shown);

[0054] Step S3: Based on the graphic accuracy, the first intersection point and the second intersection point are synchronously moved by a preset distance in the direction close to the graphic to be processed 5, and the first auxiliary point and the second auxiliary point are obtained respectively (such as Figure 5 shown);

[0055] Step S4: An auxiliary figure 4 (such as Figure 6 shown);

[0056] Step S5: Perform logic operation on the graphics to be processed 5 and the auxiliary graphics 4 to obtain the target graphics (such as Figure 7 shown).

[0057] It should be noted that in step S1, the hypotenuse 1 and the right-angled side 2 are set at an angle, wherein the right-angled side 2 is Figures 4 to 6 The sides of the image are parallel to the X-axis or Y-axis, and the hypotenuse 1 is the side at an angle to the X-axis or Y-axis. In this embodiment, the angle between the hypotenuse 1 and the right-angled side 2 is preferably 45°. In this case, the difference between the final simulated pattern and the target pattern can be controlled within 2 times the minimum resolution size of the pattern.

[0058] In step S2, please refer to Figure 4 Based on the size of the figure and the angle of hypotenuse 1, select the first intersection A and the second intersection B of hypotenuse 1 and right-angled side 2.

[0059] In step S3, please refer to Figure 5Based on the graphic accuracy, the first intersection point A and the second intersection point B are synchronously moved a predetermined distance in a direction approaching the graphic to be processed 5, thereby obtaining a first auxiliary point C and a second auxiliary point D, respectively. In this embodiment, movement in a direction approaching the graphic to be processed 5 refers to movement inward of the graphic to be processed 5 in a direction perpendicular to the line connecting the first intersection point A and the second intersection point B. In other embodiments, the first intersection point A and the second intersection point B may also be moved in other directions, which are not limited in this embodiment.

[0060] As an optional embodiment, the graphic accuracy is P, and the preset distance D satisfies: D = 1 / P. It should be noted that the graphic accuracy, as an attribute value of the layout, remains fixed after the layout design is completed. The attributes of the layout generally include geometric shapes, layers, design rules, and possible metadata. These attributes will affect the graphic accuracy during layout design; at the same time, the graphic accuracy under different process steps is also different. In this embodiment, the preset distance D between the first intersection A and the second intersection B is 1 / P. In other embodiments, the preset distance between the first intersection A and the second intersection B can also be other reasonable values. Those skilled in the art can configure the preset distance according to actual conditions, and this embodiment does not limit this.

[0061] In step S4, please refer to Figure 6 , sequentially connecting the first intersection A, the second intersection B, the first auxiliary point C, and the second auxiliary point D to form an auxiliary figure 4. It should be noted that in this embodiment, since the first auxiliary point C and the second auxiliary point D are formed by moving the first intersection A and the second intersection B in a direction perpendicular to the line connecting the first intersection A and the second intersection B, the auxiliary figure 4 formed by connecting the first intersection A, the second intersection B, the first auxiliary point C, and the second auxiliary point D is rectangular. In other embodiments, the auxiliary figure 4 may also be a parallelogram, trapezoid, or other shape.

[0062] In step S5, please refer to Figure 7 , a Boolean operation is performed on the processed pattern 5 and the auxiliary pattern 4, and the auxiliary pattern 4 is subtracted from the processed pattern 5 to form the target pattern. In this embodiment, a logical NOT operation is performed on the processed pattern 5 and the auxiliary pattern 4, that is, the auxiliary pattern 4 is cut out from the processed pattern 5, thereby forming a short adjacent edge 3 between the hypotenuse 1 and the right-angled edge 2. This ensures that the model-based OPC correction process cannot ignore this short adjacent edge 3 and correct in the direction of the hypotenuse 1. The actual grid of the hypotenuse 1 and the grid of the right-angled edge 2 are connected and closed by this short adjacent edge 3, thereby increasing the actual grid length of the hypotenuse 1 and significantly improving the correction effect. The difference between the final simulation pattern and the target pattern can be controlled within twice the minimum resolution size of the pattern.

[0063] With this configuration, the intersection of the hypotenuse 1 and the right-angled edge 2 is moved a predetermined distance toward the target pattern 5 to form an auxiliary pattern 4. A logical operation is then performed on the target pattern 5 and the auxiliary pattern 4, ultimately yielding the target pattern. A short intermediate edge 3 is formed between the hypotenuse 1 and the adjacent right-angled edge 2 in the target pattern. This prevents the model-based OPC correction method from ignoring this short adjacent edge 3, allowing corrections to be made toward the hypotenuse 1. This results in a target pattern that is more conducive to optical proximity correction. Consequently, the difference between the final simulated pattern and the target pattern is further reduced, significantly improving the correction effect and reducing the number of iterations, thereby increasing OPC correction efficiency.

[0064] In an alternative embodiment, please refer to Figures 8 to 10 , the above OPC correction method for beveled edge graphics can complete OPC correction more efficiently when facing 45° beveled edge graphics compared to existing methods, and the simulated graphics are more consistent with the target graphics than the existing technology (such as Figures 8 and 9 As shown). In actual calculations, the EPE (EdgePlacement Error) of adjacent edge grid points are all related, and the movement of grid points will also cause changes in the EPE of adjacent grid points. Since the adjacent segments of hypotenuse 1 and right-angle side 2 are moved without merging after processing in this embodiment, the evaluation function finally obtains the minimum value. Under the same number of OPC iterations, the preprocessing method provided by this embodiment can make the correction value reach the target, while the existing OPC correction method cannot reach the target at the hypotenuse 1 position, and reaches an oscillating equilibrium state after the completion of the 6th iteration (as shown in FIG. Figure 10 This means that the existing OPC correction method still cannot achieve the goal even if the number of iterative calculations is increased.

[0065] In another embodiment, please refer to Figure 11 The present invention also provides an OPC correction method, comprising:

[0066] Step S10: using the OPC preprocessing method for the beveled edge pattern as described above to obtain the target pattern;

[0067] Step S20: Perform OPC correction on the target pattern.

[0068] It should be noted that after using the aforementioned OPC preprocessing method for beveled edge graphics, a short adjacent edge 3 exists between the right-angled edge 2 and the beveled edge 1 in the target graphics. One end of the short adjacent edge 3 is connected to the beveled edge 1, and the other end is connected to the right-angled edge 2. Therefore, when performing model-based OPC correction, this short adjacent edge 3 cannot be ignored and corrections made in the direction of the beveled edge 1 are made. The actual grid of the beveled edge 1 and the grid of the right-angled edge 2 are connected and closed by the short adjacent edge 3, increasing the actual grid of the beveled edge 1 and significantly improving the OPC correction effect.

[0069] In another embodiment, please refer to Figure 12 The present invention also provides an OPC preprocessing system for beveled edge graphics, including: an acquisition module 10, used to acquire a graphics to be processed 5, where the graphics to be processed 5 includes at least a beveled edge 1 and a right-angled edge 2 connected to both ends of the beveled edge 1; a positioning module 20, used to locate the first intersection point and the second intersection point of the beveled edge 1 and the right-angled edge 2; a construction module 30, used to synchronously move the first intersection point and the second intersection point by a preset distance in a direction close to the graphics to be processed 5 according to the graphics accuracy, to obtain a first auxiliary point and a second auxiliary point respectively; and to form an auxiliary graphics 4 through the first intersection point, the second intersection point, the first auxiliary point and the second auxiliary point; and an operation module 40, used to perform logical operations on the graphics to be processed 5 and the auxiliary graphics 4 to obtain a target graphics.

[0070] It should be noted that the acquisition module 10, positioning module 20, construction module 30, and calculation module 40 can be interconnected. The acquisition module 10 can obtain a figure to be processed 5 having a hypotenuse 1, particularly a figure to be processed 5 having a hypotenuse 1 at a 45° angle, from the initial figure formed after preprocessing. The positioning module 20 can select the first intersection A and the second intersection B of the hypotenuse 1 and the right-angled side 2 based on the figure's size and the angle of the hypotenuse 1. The construction module 30 can move the first intersection A and the second intersection B by a predetermined distance toward the interior of the figure to be processed 5, perpendicular to the line connecting the first intersection A and the second intersection B, to form a first auxiliary point C and a second auxiliary point D, based on the accuracy of the figure. The construction module 30 can then sequentially connect the first intersection A, the second intersection B, the first auxiliary point C, and the second auxiliary point D to form an auxiliary figure 4. The calculation module 40 can perform a logical negation operation on the figure to be processed 5 and the auxiliary figure 4, removing the auxiliary figure 4 from the figure to be processed 5, ultimately forming the target figure.

[0071] In summary, in the OPC preprocessing method and system and OPC correction method for beveled edge graphics provided in the embodiments of the present invention, the OPC preprocessing method for beveled edge graphics includes: obtaining a graphic to be processed, the graphic to be processed at least including a beveled edge and right-angled edges connected to both ends of the beveled edge; locating the first intersection and the second intersection of the beveled edge and the right-angled edge; based on the graphic accuracy, synchronously moving the first intersection and the second intersection by a preset distance in a direction close to the graphic to be processed, to obtain a first auxiliary point and a second auxiliary point, respectively; forming an auxiliary graphic through the first intersection, the second intersection, the first auxiliary point and the second auxiliary point; performing logical operations on the graphic to be processed and the auxiliary graphic to obtain a target graphic.

[0072] With this configuration, an auxiliary pattern is formed by moving the intersection of the hypotenuse and the right-angled edge a predetermined distance toward the target pattern. A logical operation is then performed on the target pattern and the auxiliary pattern to ultimately obtain the target pattern. This creates a short intermediate edge between the hypotenuse and the adjacent right-angled edge in the target pattern, preventing the model-based OPC correction method from ignoring this short adjacent edge. Correction is then performed in the direction of the hypotenuse, resulting in a target pattern that is more conducive to optical proximity correction. Consequently, the difference between the final simulated pattern and the target pattern is further reduced, significantly improving the correction effect and reducing the number of iterations, thereby increasing OPC correction efficiency.

[0073] The above description is only a description of the preferred embodiments of the present invention and does not limit the scope of the present invention. Any changes and modifications made by ordinary technicians in the field of the present invention based on the above disclosure shall fall within the scope of protection of the claims.

Claims

1. An OPC preprocessing method for bevel edge graphics, characterized in that: include: Acquire a figure to be processed, wherein the figure to be processed includes at least a hypotenuse and right-angled sides respectively connected to two ends of the hypotenuse; Locating a first intersection point and a second intersection point of the hypotenuse and the right-angled side; Based on the accuracy of the graphic, the first intersection point and the second intersection point are synchronously moved by a preset distance in a direction close to the graphic to be processed to obtain a first auxiliary point and a second auxiliary point respectively; forming an auxiliary figure through the first intersection point, the second intersection point, the first auxiliary point, and the second auxiliary point; A logical operation is performed on the to-be-processed graphic and the auxiliary graphic to obtain a target graphic.

2. The OPC preprocessing method for bevel edge graphics according to claim 1, wherein: The hypotenuse and the right-angled side are arranged at an angle.

3. The OPC preprocessing method for bevel edge graphics according to claim 1, wherein: The method of synchronously moving the first intersection point and the second intersection point by a preset distance in a direction close to the to-be-processed graphic based on the graphic accuracy to obtain a first auxiliary point and a second auxiliary point respectively includes: The first intersection point and the second intersection point are synchronously moved a preset distance toward the interior of the to-be-processed graphic in a direction perpendicular to a line connecting the first intersection point and the second intersection point to obtain the first auxiliary point and the second auxiliary point respectively.

4. The OPC preprocessing method for bevel edge graphics according to claim 3, wherein: The graphic precision is P, and the preset distance D satisfies: D=1 / P.

5. The OPC preprocessing method for bevel edge graphics according to claim 1, wherein: The first intersection point, the second intersection point, the first auxiliary point and the second auxiliary point are sequentially connected to form the auxiliary graph.

6. The OPC preprocessing method for bevel edge graphics according to claim 5, wherein: The auxiliary graphic is rectangular.

7. The OPC pre-processing method for bevel edge graphics according to claim 1, wherein: A Boolean operation is performed on the to-be-processed graphic and the auxiliary graphic, and the auxiliary graphic is subtracted from the to-be-processed graphic to form the target graphic.

8. An OPC correction method, characterized in that: include: Using the OPC preprocessing method for beveled edge graphics according to any one of claims 1 to 7, obtaining a target graphic; Perform OPC correction on the target pattern.

9. The OPC correction method according to claim 8, wherein: There is a short adjacent side between the right-angled side and the hypotenuse in the target figure; one end of the short adjacent side is connected to the hypotenuse, and the other end is connected to the right-angled side.

10. An OPC preprocessing system for bevel edge graphics, characterized in that: include: An acquisition module, configured to acquire a figure to be processed, wherein the figure to be processed includes at least a hypotenuse and right-angled sides respectively connected to both ends of the hypotenuse; A positioning module, configured to locate a first intersection point and a second intersection point of the hypotenuse and the right-angled side; a construction module, configured to synchronously move the first intersection point and the second intersection point by a preset distance in a direction close to the image to be processed according to the image accuracy, to obtain a first auxiliary point and a second auxiliary point, respectively; and to form an auxiliary image by using the first intersection point, the second intersection point, the first auxiliary point, and the second auxiliary point; The operation module is used to perform a logical operation on the graphics to be processed and the auxiliary graphics to obtain a target graphics.

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