Method for manufacturing raised pattern and raised pattern manufactured by method
By etching the light extraction pattern in the transparent film and forming the raised pattern using ultraviolet radiation exposure and thermoforming, the problem of difficult to manufacture a transparent film that is both three-dimensional and illuminated in the prior art is solved, and a low-energy-consuming raised pattern with high contrast and brightness is achieved.
Patent Information
- Application Number
- CN202380090791.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Priority Date
- 2022-12-08
- Filing Date
- 2023-11-28
- Publication Date
- 2025-08-12
AI Technical Summary
In the field of light emitting and signal emitting, it is difficult for the existing transparent film to create a raised pattern that is both three-dimensional and illuminated while maintaining low energy consumption.
Three-dimensional molding of the light-guided transparent film is achieved by etching the light extraction pattern in the transparent film and exposing and polymerizing using ultraviolet radiation, forming a raised pattern in combination with thermoforming or extrusion.
An illuminated three-dimensional structure is obtained that also has high contrast and brightness during the day, while maintaining low energy consumption and flexibility.
Smart Images
Figure CN120476049A_ABST
Abstract
Description
Technical Field
[0001] The technical field of the invention is that of signaling and lighting.
[0002] The present invention relates to a method for producing a raised pattern in a transparent film suitable for guiding light. Another subject of the present invention is a raised pattern produced in a transparent film suitable for guiding light. The present invention also relates to a decorative structure comprising a raised pattern and a transparent film suitable for guiding light. Background Art
[0003] Transparent films suitable for guiding light are used in signaling and lighting applications.
[0004] [ Figure 1a ] shows an example of a transparent film used as a display screen according to the prior art. This device includes: a transparent film having a thickness of several tens of micrometers; a light source coupled to one of the lateral faces of the transparent film; and one or more microstructured patterns etched into the upper surface of the transparent film. Light emitted by the light source propagates inside the transparent film by total internal reflection. The microstructured pattern allows the light to be extracted, which makes it visible from the outside. [ Figure 1b ] demonstrates one of the advantages of these devices, specifically their flexibility and their small size.
[0005] Other known advantages of lighting and signaling devices based on transparent films are their brightness and their low energy consumption. These devices allow high contrast to be achieved even during the day.
[0006] It is desirable to create a raised pattern in a transparent film suitable for directing light. Summary of the Invention
[0007] The present invention provides a solution to the above-mentioned problems by describing a method for producing a raised pattern in a transparent film suitable for guiding light.
[0008] One aspect of the present invention relates to a method for producing a raised pattern using a transparent film suitable for guiding light, the transparent film comprising a first layer composed of a first transparent material, the method comprising the following steps:
[0009] - etching in the first layer consisting of transparent material a pattern suitable for extracting the light guided inside the transparent film,
[0010] - exposing and / or polymerizing the transparent film using UV radiation,
[0011] - forming a raised pattern in the area of the transparent film.
[0012] The invention makes it possible to combine an etched pattern (in particular a pattern illuminated by light guided in a transparent film) with a raised pattern. In other words, the invention makes it possible to obtain a raised and illuminated pattern.
[0013] The invention makes it possible to obtain signs or decorative structures or light features that are both three-dimensional (or raised) and illuminated.
[0014] A transparent film suitable for guiding light is understood to mean a film which is able to confine light by total internal reflection.
[0015] Etching a pattern suitable for extracting light guided inside the transparent film in the first layer of transparent material is understood to mean forming a structured pattern on the upper surface of the transparent film. Etching can be performed, for example, by optical lithography.
[0016] Exposing the transparent film with ultraviolet radiation is understood to mean irradiating the film so as to fix the pattern to be etched, thereby achieving pattern transfer.
[0017] Forming a relief pattern is understood to mean deforming a transparent film suitable for guiding light so as to obtain the desired relief pattern. This is due to the high flexibility of the transparent film for guiding light, which allows the film to be conformed to a mold during the formation of the relief pattern, for example by thermoforming.
[0018] The invention makes it possible to obtain illuminated three-dimensional structures with high contrast and brightness even during daylight hours, while keeping energy consumption low.
[0019] The invention makes it possible to obtain a flexible and lightweight structure.
[0020] Advantageously, the step of forming the convex pattern is a step of three-dimensionally shaping the transparent film.
[0021] Advantageously, the step of forming the raised pattern is a step of thermoforming the transparent film; this thermoforming step enables the three-dimensional pattern to be produced in a simple and reproducible manner.
[0022] The step of forming the raised pattern is carried out by extruding the transparent film; advantageously, forming under pressure enables greater precision to be obtained in terms of moulding details.
[0023] Advantageously, the raised pattern is a logo or a light feature or a decorative pattern.
[0024] Advantageously, the step of exposing the transparent film with ultraviolet radiation comprises a step of polymerizing the transparent film; polymerizing the transparent film makes it possible to fix in place the pattern suitable for extracting light.
[0025] Advantageously, the method according to the invention also comprises a step of producing reference marks in the transparent film, suitable for positioning the pattern suitable for extracting light relative to the raised pattern; the reference marks enable the illuminated pattern to be positioned precisely relative to the three-dimensional pattern in order to obtain the desired effect.
[0026] Advantageously, the transparent film comprises a transparent material layer stacked with a first layer composed of a first transparent material, the number N of these transparent material layers being an integer greater than or equal to 1, and before the step of exposing the transparent film, the method further comprises the step of etching at least one pattern different from the first layer pattern into at least one of the N transparent material layers; this step makes it possible to obtain a plurality of patterns illuminated by light.
[0027] A second aspect of the invention relates to a relief pattern obtained according to the method, the relief pattern having at least one of the aforementioned characteristics.
[0028] A third aspect of the invention relates to a decorative structure that can be illuminated, the decorative structure comprising:
[0029] 1. A relief pattern obtained by this method, the relief pattern having at least one of the aforementioned characteristics,
[0030] 2. A light guide comprising a first layer of a transparent material,
[0031] 3. A light source, which is used to illuminate the light guide,
[0032] The light guide is positioned to guide light originating from the light source into the first layer of transparent material and illuminate the etched pattern.
[0033] According to one embodiment, the decorative structure further comprises:
[0034] 1.N additional light guides,
[0035] 2. N additional light sources for illuminating each of the N light guides, the N light sources emitting light in different spectral regions,
[0036] The N further light guides are positioned to guide light originating from one of the N further illumination light sources into a corresponding layer of the N layers of transparent material and illuminate at least one further pattern.
[0037] These features make it possible to obtain a plurality of patterns illuminated by light, each pattern having a different color.
[0038] The invention and its various applications will be better understood by reading the following description and examining the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS
[0039] These figures are presented by way of indication and in no way limit the invention.
[0040] 1. Figure 1a and Figure 1b An example of a display screen according to the prior art is shown;
[0041] 2.[ Figure 2 ] presents a method for producing a relief pattern according to the present invention;
[0042] 3.[ Figure 3 ] shows an example of a raised pattern according to the present invention;
[0043] 4.[ Figure 4 ] shows an example of a transparent film suitable for guiding light that includes multiple layers of transparent material. DETAILED DESCRIPTION
[0044] These figures are presented by way of indication and in no way limit the invention.
[0045] [ Figure 1a ]and[ Figure 1b ] shows a display screen including a transparent film suitable for guiding light according to the prior art. [ Figure 1a ]and[ Figure 1b ] has been described with respect to the prior art.
[0046] [ Figure 2 ] shows a method 200 for producing a raised pattern in a transparent film suitable for guiding light according to the present invention. The transparent film comprises a first layer composed of a transparent material.
[0047] The method 200 according to the present invention comprises a step 201 of etching a pattern suitable for extracting light guided within the transparent film into a first layer of transparent material. This step allows the shape of the pattern illuminated by the light propagating within the transparent film to be defined. According to one embodiment, the etching step 201 is a micro-etching step.
[0048] The method 200 according to the present invention further comprises a step 202 of exposing the polymerized transparent film using ultraviolet radiation. This step allows the pattern etched in step 201 to be fixed in place. According to one embodiment, the exposing step 201 further comprises a step of polymerizing the transparent film.
[0049] According to one embodiment, the method 200 according to the present invention further comprises a step 203 of producing a reference mark in the transparent film, the reference mark being configured to position the pattern suitable for extracting light relative to the raised pattern. This step allows for precise alignment of the raised pattern and the illuminated pattern in order to achieve the desired effect.
[0050] The method 200 according to the present invention further comprises a step 204 of forming a raised pattern in the region of the transparent film.
[0051] According to one embodiment, the step of forming the raised pattern 204 is a step of thermoforming the transparent film. Due to its flexibility, the transparent film can conform to the mold during the thermoforming step.
[0052] According to another embodiment, the step 204 of forming the raised pattern is performed by extruding a transparent film.
[0053] According to one embodiment of the method 200 of the present invention, the transparent film includes a transparent material layer stacked with a first layer composed of a first transparent material, and the number N of the transparent material layers is an integer greater than or equal to 1. In this case, before the step of exposing the transparent film, the method 200 further includes the step of etching 201N at least one additional pattern into at least one transparent material layer among the N transparent material layers.
[0054] According to this embodiment, a relief pattern comprising a plurality of independent illuminated patterns can be obtained.
[0055] [ Figure 3 ] shows an example of a decorative structure 300 comprising a raised pattern 301. The decorative structure 300 also comprises a transparent film or light guide 302.
[0056] The device 300 according to the invention further comprises a light source 303 adapted to inject light into the waveguide 302 .
[0057] The light guide 302 comprises a first layer of transparent material into which are etched one or more patterns 304. The patterns 304 are adapted to extract light propagating inside the light guide 302. For this reason, when the device 300 is illuminated, the patterns 304 appear to glow.
[0058] exist[ Figure 3 ]In the example shown, the raised pattern 301 is surrounded by the etched pattern 304.
[0059] According to another embodiment of the decorative structure 300, the decorative structure further comprises N further light guides and N further light sources. Figure 4 ] shows the case where N=3.
[0060] Therefore, reference [ Figure 4 ], which shows another exemplary embodiment of a decorative structure 300, which in this case includes a first light source S1, a second light source S2, and a third light source S3. The structure 300 also includes a first light guide G1, a second light guide G2, and a third light guide G3. For example, the first light guide G1, the second light guide G2, and the third light guide G3 have a parallelepiped shape.
[0061] The transparent film 302 is a multilayer structure having a front and a back, and includes a first layer C1, a second layer C2, and a third layer C3. The first layer C1, the second layer C2, and the third layer C3 are stacked. The front and the back are substantially parallel. The transparent film 302 is flexible. Typically, the thickness of the first layer C1, the second layer C2, and the third layer C3 is about 50 microns.
[0062] The first layer C1 includes a first microetching to form a first pattern M1. The second layer C2 includes a second microetching to form a second pattern different from the first pattern M1. The third layer C3 includes a third microetching to form a third pattern different from the first pattern M1 and the second pattern M2. Figure 4 ] The second pattern and the third pattern are not shown.
[0063] Typically, the first microetching, the second microetching, and the third microetching are etched into the first layer C1, the second layer C2, and the third layer C3, respectively, using ultraviolet radiation printing.
[0064] According to one embodiment, each of the N light guides has a different etching pattern. Thus, each etching pattern can be independently illuminated at a different wavelength.
[0065] Each light source is adapted to inject light into one of the light guides.According to one embodiment, the N light sources may emit light in different spectral regions.
[0066] When light enters the first layer C1, only the portion of the first layer C1 including the first microetching diffuses the light, or in other words, is illuminated. When light enters the second layer C2, only the portion of the second layer C2 including the second microetching diffuses the light, or in other words, is illuminated. When light enters the third layer C3, only the portion of the third layer C3 including the third microetching diffuses the light, or in other words, is illuminated.
[0067] Each of the first layer C1, the second layer C2, and the third layer C3 may be made of polycarbonate, PMMA, PET (polyethylene terephthalate), or TPU (thermoplastic polyurethane). For example, the first layer C1, the second layer C2, and the third layer C3 may be made of Azumo TM These components have a transparency of over 97%, a light extraction efficiency between 25% and 80% when illuminated, and a luminance range of 100 cd / m² when illuminated by a luminous flux source. 2 Up to 1000cd / m 2 .
[0068] The transparent film 302 includes a light incident surface 305. The light incident surface 305 is substantially perpendicular to the front and rear surfaces. For example, the light incident surface 305 is formed by one of the two lateral edges of the transparent film 302.
[0069] refer to[ Figure 4 ], the first light guide G1, the second light guide G2, and the third light guide G3 are stacked. The first light guide G1, the second light guide G2, and the third light guide G3 are also adjacent to the light incident surface 6 to ensure optical coupling with the light incident surface 6. The first light guide G1 is juxtaposed with the first layer C1. The second light guide G2 is juxtaposed with the second layer C2. The third light guide G3 is juxtaposed with the third layer C3.
[0070] The first light source S1 is configured to emit a first light beam and is positioned such that the first light beam illuminates the first light guide G1 . For example, the first light source S1 is positioned facing one end of the first light guide G1 .
[0071] The second light source S2 is configured to emit a second light beam and is positioned such that the second light beam illuminates the second light guide G2. For example, the second light source S2 is positioned facing one end of the second light guide G2.
[0072] The third light source S3 is configured to emit a third light beam and is positioned such that the third light beam illuminates the third light guide G3. For example, the third light source S3 is positioned facing one end of the third light guide G3.
Claims
1. A method (200) for producing a raised pattern using a transparent film suitable for guiding light, the transparent film comprising a first layer composed of a first transparent material, the method (200) comprising the following steps: - etching (201) in said first layer of transparent material a pattern suitable for extracting the light guided inside said transparent film, - forming (204) the raised pattern in the area of the transparent film.
2. The method (200) according to the preceding claim, characterized in that The raised pattern is a logo.
3. The method (200) according to any one of the preceding claims, characterized in that The step (204) of forming the convex pattern is a step of three-dimensionally shaping the transparent film.
4. The method (200) according to the preceding claim, characterized in that The step of three-dimensionally shaping the transparent film is a thermoforming step.
5. The method (200) of claim 1, wherein: The step (204) of forming the raised pattern is performed by extruding the transparent film.
6. The method (200) according to any one of the preceding claims, characterized in that The method further comprises the step of producing a reference mark in the transparent film (203), the reference mark being configured to position the pattern suitable for extracting the light relative to the raised pattern.
7. The method (200) according to any one of the preceding claims, characterized in that The transparent film includes a transparent material layer stacked with the first layer composed of the first transparent material, the number N of transparent material layers is an integer greater than or equal to 1, and the method includes the step of etching at least one additional pattern into at least one transparent material layer of the N transparent material layers, and also the step of exposing and / or polymerizing the film.
8. A raised pattern produced by the method of any preceding claim.
9. A decorative structure (300) that can be illuminated, the decorative structure comprising: - a raised pattern (301) as claimed in claim 8; - a light guide (302) comprising a first layer of a transparent material; - a light source (303) for illuminating the light guide; - the light guide is positioned to guide light originating from the light source into the first layer of transparent material and illuminate the etched pattern (304).
10. The decorative structure of claim 9, wherein: The raised pattern is produced by the method of claim 7, the decorative structure further comprising: - N additional light guides, -N additional light sources for illuminating each of the N light guides, the N light sources emitting light in different spectral regions, the N additional light guides being positioned to guide light originating from one of the N additional light sources into a corresponding layer of the N transparent material layers and to illuminate at least one additional pattern.