Device and method for preparing polyphenyl ether (PPE) with ultralow residual Cu ion content

Abstract

The invention discloses a device and a method for preparing polyphenyl ether PPE with ultralow residual Cu ion content, and relates to the technical field of polyphenyl ether PPE preparation. The device for preparing the PPE with the ultralow residual Cu ion content comprises a shell, a feeding hole which is communicated with the front surface of the shell and is used for conveying a to-be-purified material, a discharging hole which is communicated with the back surface of the shell and is used for conveying the purified material, and a ceramic filter plate which is fixed in the shell and is used for purifying, the shell is provided with a cleaning assembly used for keeping the cleanliness of the ceramic filter plate, and the cleaning assembly comprises a cleaning nozzle which is located above the shell, enters the shell during cleaning and conveys cleaning liquid into the ceramic filter plate; the cleaning ring is arranged outside the cleaning nozzle in a sliding and sleeving mode through the guide rod and assists in cleaning the filtering holes of the ceramic filtering plate, blockages and pollutants are more effectively removed, more concentrated cleaning force can be provided, the cleaning effect is improved, the using amount of a cleaning agent is more accurately controlled, and unnecessary waste is avoided.

Description

Technical Field

[0001] The present invention relates to the technical field of polyphenylene ether (PPE) preparation, in particular to a device and a method for preparing polyphenylene ether (PPE) with ultra-low residual Cu ion content. Background Art

[0002] Polyphenylene ether, also known as polydiphenol ether, is an engineering thermoplastic widely used in many industries. In industrial production, it usually needs to go through many processes such as mixing, heating, cooling, separation, purification, and drying. In order to manufacture high-performance connectors, sockets, relay housings, printed circuit board substrates and other electronic components, it is necessary to use materials with high purity and good electrical insulation properties. Polyphenylene ether (PPE) with ultra-low residual Cu ion content can help prevent the occurrence of electromigration and improve the reliability and service life of the equipment. In order to obtain polyphenylene ether with ultra-low residual copper ions, multiple purifications are required, including but not limited to multiple washing and filtration. During filtration, the cleanliness of the filter unit needs to be maintained, which requires frequent cleaning. Currently, it mainly relies on high-pressure backwashing after soaking, which is not only time-consuming, but also easily damages the filter unit, causing internal fragmentation and blockage, which makes it easier for metal ions or other impurities to remain.

[0003] For example, the quartz sand separation equipment disclosed in Publication No. CN221579925U, which is easy to clean, can only flush the surface of the filter unit, and relies on high-pressure backwashing to clean the internal filter holes, which is prone to partial breakage and clogging inside. The self-flushing filter water treatment device disclosed in Publication No. CN218962029U can also only remove impurities accumulated on the surface of the filter unit, and relies on high-pressure backwashing to clean the interior, which is also prone to partial breakage and clogging inside.

[0004] Therefore, a device and method for preparing polyphenylene ether (PPE) with ultra-low residual Cu ion content are proposed. Summary of the Invention

[0005] In view of the deficiencies of the prior art, the present invention provides an apparatus and method for preparing polyphenylene ether (PPE) with ultra-low residual Cu ion content, which solves the problems raised in the background technology.

[0006] To achieve the above objectives, the present invention is implemented through the following technical solutions: a device for preparing polyphenylene ether (PPE) with ultra-low residual Cu ion content, comprising a housing, a feed port connected to the front of the housing for conveying the material to be purified, a discharge port connected to the back of the housing for conveying the purified material, and a ceramic filter plate fixed in the housing for purification. The housing is provided with a cleaning component for maintaining the cleanliness of the ceramic filter plate itself, a reflux component for conveying the cleaning liquid after cleaning, and an auxiliary component for ensuring the cleanliness of the reflux component itself. The cleaning component includes:

[0007] The cleaning nozzle is located above the shell and enters the shell during cleaning to deliver the cleaning liquid to the ceramic filter plate;

[0008] The cleaning ring is slidably sleeved on the outside of the cleaning nozzle through the guide rod to assist in cleaning the filter holes of the ceramic filter plate.

[0009] Preferably, the cleaning component also includes: a connecting rod, one end of which is fixed to the cleaning ring; an impeller, the side wall of which is fixed to the other end of the connecting rod; and a flow hole opened on the cleaning nozzle to guide the cleaning liquid to impact the impeller and drive the connecting rod to rotate.

[0010] Preferably, the cleaning component also includes: a back plate, the side wall of which is connected to the cleaning nozzle to provide support for the cleaning nozzle; a sliding rod, the top of which is fixed to the bottom of the back plate and a sliding groove is provided at the bottom; a spring, one end of which is fixed to the side wall of the sliding rod to provide elastic force for the sliding rod to reset.

[0011] Preferably, the cleaning component also includes: a support plate, which is slidably sleeved outside the sliding rod to limit the moving direction of the sliding rod; a flexible skin, which is fixed on the support plate; a slider, whose bottom is fixed to the bottom of the inner wall of the shell, and slides and abuts against the sliding groove under the action of external force to drive the sliding rod to move; a support rod, whose bottom is fixed to the top of the support plate; and a power push rod, whose output end is fixed to the top of the support rod.

[0012] Preferably, the reflux assembly includes: a guide plate, the bottom of which is fixed on the cleaning nozzle; a limiting rod, one end of which slides out from the guide plate; a second spring, one end of which is fixed on the side wall of the guide plate; a sealed cover, the side wall of which is fixedly connected to the other end of the limiting rod, the other end of the second spring is fixed on the side wall of the sealed cover, and the sealed cover is slidably sleeved outside the cleaning nozzle.

[0013] Preferably, the reflux assembly also includes: a fixing rod, one end of which is fixed on the cleaning ring; a threaded ring, the inner ring side wall of which is fixedly connected to the other end of the fixing rod, and the outer ring side wall of the threaded ring is threadedly connected to the inner wall side wall of the sealing cover; a water inlet pipe, which is connected to the outer wall on one side of the back plate; and a water outlet pipe, which is connected to the outer wall on the other side of the back plate.

[0014] Preferably, the auxiliary component includes: an electric push rod, one end of which is fixed to the ground to provide power for the operation of the auxiliary component; a fixed plate, the bottom of which is fixed to the output end of the electric push rod; a positioning rod, the top of which is fixed to the bottom of the fixed plate; a reinforcement block, the top of which is fixed to the bottom of the positioning rod, and a mounting groove is provided on the side wall of the reinforcement block; an elastic sheet, fixedly installed in one of the mounting grooves on the side wall of the reinforcement block; and a scraper ring, fixedly installed in another mounting groove on the side wall of the reinforcement block.

[0015] Preferably, the auxiliary component also includes: an adjustment plate, one end of which slides against the side wall of the scraper ring; a guide block, the side wall of which is fixed on the side wall of the adjustment plate; a guide rail, the bottom of which is fixed inside the reinforcement block, and the side wall is slidably mounted outside the guide block; a magnet, which is fixed to the bottom of the adjustment plate; and an electromagnet, which is located directly below the magnet, the bottom of which is fixedly mounted on the reinforcement block, and is magnetically matched with the magnet.

[0016] The present invention also provides a maintenance method for an apparatus for preparing polyphenylene ether (PPE) with ultra-low residual Cu ion content, comprising the following steps:

[0017] S1. The raw material to be purified is transported into the shell through the feed port and filtered and purified using a ceramic filter plate;

[0018] S2. After working one or several shifts, the cleaning component is controlled to move into the housing and the ceramic filter plate is cleaned using the cleaning component;

[0019] S3, using the reflux component and the clean component to discharge the cleaning liquid after cleaning;

[0020] S4. Using auxiliary components to self-clean the reflux component;

[0021] S5. After cleaning is completed, the clean components are moved outside the shell to continue the filtration and purification operation.

[0022] Preferably, the speed at which the cleaning component moves downward is between 0.3 m / s and 0.5 m / s.

[0023] The present invention provides an apparatus and method for preparing polyphenylene ether (PPE) with ultra-low residual Cu ion content. Compared with the prior art, it has the following advantages:

[0024] (1) The device and method for preparing polyphenylene ether PPE with ultra-low residual Cu ion content can directly act on the filter holes at the key parts of the ceramic filter plate using the flushing liquid, thereby more effectively removing blockages and pollutants. Compared with the traditional overall immersion or external flushing method, this method can provide more concentrated cleaning power, improve the cleaning effect, more accurately control the amount of detergent, avoid unnecessary waste, and reduce the cost and complexity of subsequent wastewater treatment. It only enters the equipment to perform tasks when needed, does not occupy space when not working, does not affect other operating processes, increases the flexibility and adaptability of the system, and can also reduce the location of copper ion residues.

[0025] (2) The device and method for preparing polyphenylene ether PPE with ultra-low residual Cu ion content can effectively prevent the cleaning liquid from diffusing to other parts of the equipment and causing secondary pollution. The cleaning liquid is directly pumped away after the flushing is completed, avoiding the cleaning liquid from remaining or leaking inside the equipment, thereby reducing the risk of contamination in the subsequent production process. The cleaning range is accurately controlled to ensure that the cleaning of each filter hole is carried out in a relatively independent space, avoiding the cleaning liquid from contacting other uncleaned areas, reducing the possibility of cross-contamination, and increasing the pressure of the cleaning liquid in the filter hole, so that the cleaning liquid can penetrate and remove blockages and metal ions more effectively, and facilitate the centralized treatment of the pumped cleaning liquid. After removing the metal ions, the cleaning liquid can be reused, which is more energy-saving and environmentally friendly.

[0026] (3) The device and method for preparing polyphenylene ether PPE with ultra-low residual Cu ion content can effectively avoid the problem of pipeline blockage caused by impurity accumulation by cleaning the flow channel, ensuring that the cleaning liquid can flow smoothly, and reducing the deposition of impurities in the pipeline helps to reduce the risk of internal wear and corrosion of the pipeline, thereby extending the service life of the entire reflux system. The function of automatically adjusting the scraping force according to the amount of impurities makes the self-cleaning process neither excessive nor insufficient, which not only can more effectively remove impurities, but also can protect the pipeline from unnecessary mechanical damage. The effective self-cleaning mechanism reduces the risk of secondary pollution that may be caused by residual impurities in the pipeline, and helps to maintain product purity, which is also very important for the preparation of PPE with ultra-low residual Cu ion content.

[0027] Other features and advantages of the present invention will be described in the following detailed description, and part of them will become obvious from the description or be understood by practicing the present invention. The purpose and other advantages of the present invention can be realized and obtained by the structures particularly pointed out in the written description and the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 It is a schematic diagram of the overall structure of the present invention;

[0029] Figure 2 Another perspective view of the overall structure of the present invention;

[0030] Figure 3 It is a side sectional structural diagram of the housing of the present invention;

[0031] Figure 4 This is a position structure diagram of the slider of the present invention;

[0032] Figure 5 This is a structural diagram of the position of the support plate of the present invention;

[0033] Figure 6 Schematic diagram of the decomposition state of the flexible leather of the present invention;

[0034] Figure 7 This is a position structure diagram of the limit rod of the present invention;

[0035] Figure 8 This is a structural diagram of the position of the impeller of the present invention;

[0036] Figure 9 This is a cross-sectional structural diagram of the cleaning nozzle of the present invention;

[0037] Figure 10 FIG. 1 is an exploded view of the sealing cover of the present invention;

[0038] Figure 11 This is the overall structural diagram of the reinforcement block of the present invention;

[0039] Figure 12 This is a cross-sectional structural diagram of the reinforcement block of the present invention;

[0040] Figure 13 For the present invention Figure 12 Enlarged view of point A in the middle;

[0041] Figure 14 Schematic diagram of the disassembled state of the guide rail of the present invention.

[0042] In the figure: 1. Shell; 11. Discharge port; 12. Feed port; 13. Ceramic filter plate; 2. Power push rod; 21. Support rod; 22. Support plate; 23. Slider; 24. Flexible skin; 25. Sliding rod; 26. Spring 1; 27. Back plate; 28. Cleaning nozzle; 29. Cleaning ring; 210. Guide rod; 211. Connecting rod; 212. Impeller; 213. Flow hole; 3. Guide plate; 31. Limit rod; 32. Spring 2; 33. Sealing cover; 34. Fixed rod; 35. Threaded ring; 36. Water inlet pipe; 37. Water outlet pipe; 4. Electric push rod; 41. Fixed plate; 42. Positioning rod; 43. Reinforcement block; 44. Elastic sheet; 45. Scraper ring; 46. Adjustment plate; 47. Guide block; 48. Guide rail; 49. Magnet; 410. Electromagnet. DETAILED DESCRIPTION

[0043] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0044] See also Figures 1 to 14 , the present invention provides the following technical solutions:

[0045] Example 1: An apparatus for preparing polyphenylene ether (PPE) with ultra-low residual Cu ion content, comprising a housing 1, a feed port 12 connected to the front of the housing 1 for conveying the material to be purified, a discharge port 11 connected to the back of the housing 1 for conveying the purified material, and a ceramic filter plate 13 fixed in the housing 1 for purification. The housing 1 is provided with a clean component for maintaining the cleanliness of the ceramic filter plate 13 itself, and the clean component includes: a power push rod 2, a support rod 21, a support plate 22, a slider 23, a flexible skin 24, a sliding rod 25, a spring 26, a back plate 27, a cleaning nozzle 28, a cleaning ring 29, a guide rod 210, a connecting rod 211, an impeller 212, and a flow hole 213;

[0046] The output end of the power push rod 2 is fixedly mounted on the top of the support rod 21, the bottom of the support rod 21 is fixedly mounted on the top of the support plate 22, the support plate 22 is slidably sleeved outside the sliding rod 25, and the support plate 22 is used to limit the moving direction of the sliding rod 25. The bottom of the slider 23 is fixedly mounted on the bottom of the inner wall of the shell 1. The inclined surface of the top of the slider 23 slides and abuts against the sliding groove under the action of external force to drive the sliding rod 25 to move. The flexible skin 24 is fixedly mounted on the support plate 22;

[0047] The top of the sliding rod 25 is fixedly mounted on the bottom of the back plate 27, and a sliding groove is provided at the bottom of the sliding rod 25;

[0048] One end of the spring 1 26 is fixedly mounted on the side wall of the sliding rod 25, and the other end of the spring 1 26 is fixedly mounted on the inner wall of the support plate 22. The spring 1 26 is used to provide elastic force for returning the sliding rod 25.

[0049] The side wall of the back plate 27 is connected to the cleaning nozzle 28, and the back plate 27 is used to provide support for the cleaning nozzle 28;

[0050] The cleaning nozzle 28 is located above the housing 1. During cleaning, the cleaning nozzle 28 enters the interior of the housing 1 and delivers the cleaning liquid to the ceramic filter plate 13.

[0051] The side wall of the cleaning ring 29 is fixedly connected to one end of the guide rod 210. One end of the guide rod 210 is slidably mounted on the side wall of the cleaning nozzle 28. The cleaning ring 29 is slidably mounted on the outside of the cleaning nozzle 28 through the guide rod 210. The cleaning ring 29 is used to assist in cleaning the filter holes of the ceramic filter plate 13.

[0052] One end of the connecting rod 211 is fixedly mounted on the cleaning ring 29;

[0053] The side wall of the impeller 212 is fixedly mounted on the other end of the connecting rod 211;

[0054] The flow hole 213 is formed on the cleaning nozzle 28 , and is used to guide the cleaning liquid to impact the impeller 212 and drive the connecting rod 211 to rotate.

[0055] During use, the raw material to be purified is transported into the housing 1 through the feed port 12, and the copper ions in the raw material are filtered by the ceramic filter plate 13. After filtration, the raw material is discharged from the discharge port 11. After multiple filtrations, a purer PPE product with lower copper ion residue is obtained.

[0056] After a period of use, in order to ensure the filtering effect of the ceramic filter plate 13, the cleaning component is started through the control center, and the power push rod 2 drives the support rod 21 to move, and the support rod 21 drives the support plate 22 to move, and the support plate 22 drives the sliding rod 25 to move downward synchronously, and the sliding rod 25 drives the back plate 27 to move downward synchronously. As the support plate 22 moves downward, the slider 23 contacts the flexible skin 24 and squeezes the flexible skin 24 to deform the flexible skin 24, and the slider 23 will extend into the interior of the support plate 22, and slide between the slider 23 and the sliding groove opened at the bottom of the sliding rod 25, so that the slider 23 squeezes the sliding rod 25 to move to the side where the spring 26 is located, and the back plate 27 is synchronously driven to move by the sliding rod 25, so that the back plate 27 can drive the cleaning nozzle 28 to move closer to the side where the ceramic filter plate 13 is located;

[0057] In the process of the cleaning nozzle 28 approaching the side where the ceramic filter plate 13 is located, the driving element is used to supply cleaning liquid into the back plate 27, so that the cleaning liquid is sprayed from the cleaning nozzle 28. As the cleaning nozzle 28 approaches, the sprayed cleaning liquid is sprayed from most of the surface of the ceramic filter plate 13 to completely converge from the filter holes on the ceramic filter plate 13 and flow to the other side, and the cleaning liquid is used to flush the filter holes, thereby flushing out the copper ions or other impurities remaining in the ceramic filter plate 13. During the flushing process, part of the cleaning liquid will be sprayed out through the circulation holes, and the sprayed cleaning liquid will impact the impeller 212, causing the impeller 212 to rotate, and the impeller 212 drives the connecting rod 211 to rotate, and the connecting rod 211 drives the cleaning ring 29 to rotate, and the cleaning ring 29 drives the guide rod 210 to rotate. Through the sliding cooperation between the guide rod 210 and the cleaning nozzle 28, the guide rod 210 can guide and limit the cleaning ring 29, so that the cleaning ring 29 can Figure 8 At the position shown, the cleaning nozzle 28 is rotated as the axis, and the edges of the filter holes on the ceramic filter plate 13 are cleaned by the rotating cleaning ring 29 to avoid impurities remaining;

[0058] In another embodiment different from the aforementioned embodiment, the cleaning ring 29 is set to a flexible material so that the cleaning ring 29 can be deformed, so that after being squeezed between the cleaning ring 29 and the ceramic filter plate 13, a step shape can be formed, thereby fully cleaning the edge position of the filter hole. Furthermore, a cleaning brush can be added to the outside of the cleaning ring 29, so that when the cleaning ring 29 rotates, the cleaning brush can also be used to clean the surface of the ceramic filter plate 13.

[0059] The technical solution of this embodiment is different from the previous embodiment in that: a reflux assembly for conveying cleaning liquid after cleaning is provided on the housing 1, and the reflux assembly includes: a guide plate 3, a limit rod 31, a second spring 32, a sealing cover 33, a fixing rod 34, a threaded ring 35, a water inlet pipe 36, and a water outlet pipe 37;

[0060] The bottom of the guide plate 3 is fixedly mounted on the cleaning nozzle 28, one end of the limit rod 31 slides out of the guide plate 3, one end of the second spring 32 is fixedly mounted on the side wall of the guide plate 3, the side wall of the sealing cover 33 is fixedly connected to the other end of the limit rod 31, the other end of the second spring 32 is fixedly mounted on the side wall of the sealing cover 33, and the sealing cover 33 is slidably sleeved outside the cleaning nozzle 28;

[0061] One end of the fixing rod 34 is fixedly mounted on the cleaning ring 29, the inner ring sidewall of the threaded ring 35 is fixedly connected to the other end of the fixing rod 34, and the outer ring sidewall of the threaded ring 35 is threadedly connected to the inner wall sidewall of the sealing cover 33;

[0062] One end of the water inlet pipe 36 is connected to one outer wall of the back plate 27 , and one end of the water outlet pipe 37 is connected to the other outer wall of the back plate 27 .

[0063] During use, when the ceramic filter plate 13 is rinsed and cleaned, the cleaning component is started to accurately rinse the ceramic filter plate 13, and the driving element is used to transport the cleaning liquid through the water inlet pipe 36 to the back plate 27, and flow into the filter holes through the cleaning nozzle 28. During this process, the water outlet pipe 37 is in a closed state. After rinsing for a period of time, another driving element is used to pump the cleaning liquid out of the housing 1 through the cleaning nozzle 28, the back plate 27, and the water outlet pipe 37. During this process, the water inlet pipe 36 is in a closed state, and the cleaning liquid is refluxed to rinse the filter holes again.

[0064] In another embodiment different from the aforementioned embodiment, a fixing rod 34 is fixedly installed outside the cleaning ring 29, and a threaded ring 35 is fixedly connected by the fixing rod 34. At the same time, a sealing cover 33 is threadedly connected to the threaded ring 35. When the cleaning ring 29 rotates under the flushing of the cleaning liquid, the cleaning ring 29 synchronously drives the fixing rod 34 to rotate, and the fixing rod 34 drives the threaded ring 35 to rotate. The threaded ring 35 and the sealing cover 33 are threadedly engaged. At the same time, the limiting rod 31 provides support force for the sealing cover 33. The limiting rod 31 and the guide plate 3 are slidably engaged, so that the limiting rod 31 can limit the sealing cover 33 while guiding it, so that the sealing cover 33 can move from the cleaning nozzle 28 to the side close to the ceramic filter plate 13, thereby pressing against the ceramic filter plate 13.

[0065] Furthermore, a set of cleaning components and reflux components are also provided on the other side of the ceramic filter plate 13, so that the sealed covers 33 on the cleaning nozzles 28 on both sides of the ceramic filter plate 13 are simultaneously covered on the surface of the ceramic filter plate 13, thereby forming a separate cavity. When the reflux component on one side supplies water to the back plate 27 on that side, the reflux component on the other side pumps water outward. Similarly, when the reflux component on one side pumps water from the back plate 27 on that side, the reflux component on the other side supplies water inward, so that the cleaning liquid containing copper ions is directly discharged after flushing the filter holes, avoiding a small amount of copper ions remaining in the filter holes during pumping, and using multiple flushing to achieve a better flushing effect. This embodiment is mainly used when only metal ions remain.

[0066] The technical solution of this embodiment is different from the previous embodiment in that: the housing 1 is provided with an auxiliary component for ensuring the cleanliness of the reflux component itself, and the auxiliary component includes: an electric push rod 4, a fixing plate 41, a positioning rod 42, a reinforcement block 43, an elastic sheet 44, a scraper ring 45, an adjustment plate 46, a guide block 47, a guide rail 48, a magnet 49, and an electromagnet 410;

[0067] One end of the electric push rod 4 is fixedly mounted on the ground. The electric push rod 4 is used to provide power for the operation of the auxiliary components. The bottom of the fixing plate 41 is fixedly mounted on the output end of the electric push rod 4. The top of the positioning rod 42 is fixedly mounted on the bottom of the fixing plate 41. The top of the reinforcement block 43 is fixedly mounted on the bottom of the positioning rod 42. Two mounting grooves are provided on the side wall of the reinforcement block 43.

[0068] There are two sets of elastic sheets 44. One end of each set of elastic sheets 44 is fixedly mounted in two mounting grooves on the side wall of the reinforcement block 43. One end of the scraper ring 45 is fixedly mounted in one of the mounting grooves on the side wall of the reinforcement block 43. One end of the adjustment plate 46 slides against the side wall of the scraper ring 45. The side wall of the guide block 47 is fixedly mounted on the side wall of the adjustment plate 46.

[0069] The bottom of the guide rail 48 is fixedly installed in the reinforcement block 43, the side wall of the guide rail 48 is slidably mounted outside the guide block 47, the top of the magnet 49 is fixedly installed on the bottom of the adjustment plate 46, the electromagnet 410 is located directly below the magnet 49, the bottom of the electromagnet 410 is fixedly installed on the reinforcement block 43, and the electromagnet 410 and the magnet 49 are magnetically matched.

[0070] When in use, when the cleaning component is running, the electric push rod 4 moves synchronously with the power push rod 2 and the moving distance is the same. After the flushing of the ceramic filter plate 13 is completed, the cleaning liquid is also exhausted, the current position is maintained and the auxiliary component is started to operate, the electric push rod 4 is used to drive the fixed plate 41 to move, the fixed plate 41 drives the positioning rod 42 to move, the positioning rod 42 drives the reinforcing block 43 to move, and the reinforcing block 43 is used to scrape the inner wall of the flow channel in the back plate 27 to avoid impurities remaining. At the same time, when the reinforcing block 43 moves, it drives the two sets of elastic sheets 44 to move. When the elastic sheets 44 and the inner wall of the flow channel are scraped, they will jump up and down under the action of their own elastic force and resistance, so as to more easily avoid impurities remaining on the inner wall of the flow channel. The double-layer elastic sheets 44 are used to scrape the inner walls of the flow channel to avoid gaps in the single-layer elastic sheets 44 during the jumping process. At the same time, the reinforcing block 43 drives the scraping ring 45 to move, so that the scraping ring 45 finally scrapes the inner wall of the flow channel to avoid residues to the greatest extent.

[0071] Furthermore, the scraper ring 45 also has a certain elasticity, and the contact tightness between the scraper ring 45 and the inner wall of the circulation channel can be adjusted according to the amount of internal impurities during the current cleaning. When there are more impurities and the scraping force needs to be increased, the magnetism of the electromagnet 410 after being energized is controlled to attract the magnet 49, so that the magnet 49 drives the adjustment plate 46 to move downward under the action of the magnetic attraction force, and the adjustment plate 46 drives the guide block 47 to move synchronously. At the same time, the guide block 47 slides with the guide rail 48, so that the adjustment plate 46 can only move vertically up and down along the guide rail 48 when moving. The adjustment plate 46 moves linearly downward to squeeze the scraper ring 45, causing the scraper ring 45 to diffuse outward. When there are fewer impurities and such a close fit is not required, the magnetism of the electromagnet 410 after being energized is weakened or the electromagnet 410 is directly de-energized, so that the scraper ring 45 can be reset under the action of its own elasticity and the squeezing force of the inner wall of the circulation channel. This embodiment can be used for the removal of metal ions, as well as other residual impurities, such as unreacted raw materials and by-products, particulate matter and suspended solids, and colloidal substances.

[0072] The embodiment of the present invention further provides a maintenance method for an apparatus for preparing polyphenylene ether (PPE) with ultra-low residual Cu ion content, comprising the following steps:

[0073] S1, the raw material to be purified is delivered into the housing 1 through the feed port 12, and filtered and purified using the ceramic filter plate 13;

[0074] S2. After working one or several shifts, the cleaning component is controlled to move into the housing 1 and the ceramic filter plate 13 is cleaned by the cleaning component;

[0075] S3, using the reflux component and the clean component to discharge the cleaning liquid after cleaning;

[0076] S4. Using auxiliary components to self-clean the reflux component;

[0077] S5. After cleaning is completed, the clean component is moved outside the housing 1 to continue the filtration and purification operation.

[0078] The speed at which the clean components move downward is between 0.3m / s and 0.5m / s.

[0079] In summary, the technical solutions disclosed in the above embodiments of the present invention have at least the following advantages:

[0080] The flushing liquid can directly act on the key filter holes of the ceramic filter plate, thereby more effectively removing blockages and pollutants.

[0081] It can provide more concentrated cleaning power, improve cleaning results, more accurately control the amount of detergent used, avoid unnecessary waste, and reduce the cost and complexity of subsequent wastewater treatment.

[0082] It enters the equipment to perform tasks only when needed, does not take up space when not working, and does not affect other operating processes, which increases the flexibility and adaptability of the system and reduces the space for copper ion residues.

[0083] The effective self-cleaning mechanism reduces the risk of secondary contamination caused by impurities remaining in the pipeline, helping to maintain product purity.

[0084] At the same time, the contents not described in detail in this specification belong to the existing technology well known to those skilled in the art.

[0085] It should be noted that, in this document, relational terms such as first and second, etc., are used only to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the terms "comprises," "comprising," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that includes a list of elements includes not only those elements but also other elements not explicitly listed, or elements inherent to such process, method, article, or apparatus.

[0086] Parallel: The parallel defined in this application is not limited to absolute parallelism. This definition of parallelism can be understood as basic parallelism, allowing for situations where the two sides are not absolutely parallel due to factors such as assembly tolerance, design tolerance, and the influence of structural flatness. Small angle errors are allowed. For example, within an assembly error range of 10 degrees, it can be understood as a parallel relationship.

[0087] Vertical: The vertical defined in this application is not limited to an absolute vertical intersection relationship (angle of 90 degrees). It allows for non-absolute vertical intersection relationships caused by factors such as assembly tolerance, design tolerance, and structural flatness. It allows for errors in a small angle range. For example, the assembly error range of 80 to 100 degrees can be understood as a vertical relationship.

[0088] While embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions, and variations may be made to these embodiments without departing from the principles and spirit of the invention, and that the scope of the invention is defined by the appended claims and their equivalents.

Claims

1. A device for preparing polyphenylene ether (PPE) with ultra-low residual Cu ion content, comprising a housing (1), a feed port (12) connected to the front of the housing (1) for conveying a material to be purified, a discharge port (11) connected to the back of the housing (1) for conveying a purified material, and a ceramic filter plate (13) fixed in the housing (1) for purification, characterized in that: The housing (1) is provided with a cleaning component for maintaining the cleanliness of the ceramic filter plate (13), a reflux component for conveying cleaning liquid after cleaning, and an auxiliary component for ensuring the cleanliness of the reflux component itself, wherein the cleaning component includes: A cleaning nozzle (28) is located above the housing (1) and enters the interior of the housing (1) during cleaning to deliver cleaning fluid to the ceramic filter plate (13); The cleaning ring (29) is slidably sleeved on the outside of the cleaning nozzle (28) through the guide rod (210) to assist in cleaning the filter holes of the ceramic filter plate (13).

2. The device for preparing polyphenylene ether (PPE) with ultra-low residual Cu ion content according to claim 1, characterized in that: The cleaning component also includes: A connecting rod (211), one end of which is fixed on the cleaning ring (29); An impeller (212) has a side wall fixed to the other end of the connecting rod (211); The circulation hole (213) is provided on the cleaning nozzle (28) to guide the cleaning liquid to impact the impeller (212) and drive the connecting rod (211) to rotate.

3. The device for preparing polyphenylene ether (PPE) with ultra-low residual Cu ion content according to claim 1, characterized in that: The cleaning component also includes: The back plate (27) and the side wall are connected to the cleaning nozzle (28) to provide support for the cleaning nozzle (28); A sliding rod (25) is fixed at its top to the bottom of the back plate (27) and has a sliding groove at its bottom; One end of a spring (26) is fixed on the side wall of the sliding rod (25) to provide elastic force for returning the sliding rod (25).

4. The device for preparing polyphenylene ether (PPE) with ultra-low residual Cu ion content according to claim 3, characterized in that: The cleaning component also includes: A support plate (22) is slidably sleeved outside the sliding rod (25) to limit the moving direction of the sliding rod (25); A flexible skin (24) fixed to the support plate (22); The bottom of the slider (23) is fixed to the bottom of the inner wall of the housing (1), and slides and abuts against the sliding groove under the action of external force to drive the sliding rod (25) to move; A support rod (21), the bottom of which is fixed to the top of the support plate (22); The power push rod (2) has an output end fixed on the top of the support rod (21).

5. The device for preparing polyphenylene ether (PPE) with ultra-low residual Cu ion content according to claim 3, characterized in that: The reflux assembly includes: A guide plate (3), the bottom of which is fixed on the cleaning nozzle (28); A limiting rod (31), one end of which slides out from the guide plate (3); A second spring (32), one end of which is fixed to the side wall of the guide plate (3); The side wall of the closed cover (33) is fixedly connected to the other end of the limiting rod (31), the other end of the second spring (32) is fixed on the side wall of the closed cover (33), and the closed cover (33) is slidably sleeved outside the cleaning nozzle (28).

6. The device for preparing polyphenylene ether (PPE) with ultra-low residual Cu ion content according to claim 5, characterized in that: The reflux component also includes: A fixing rod (34), one end of which is fixed on the cleaning ring (29); A threaded ring (35), the inner side wall of which is fixedly connected to the other end of the fixing rod (34), and the outer side wall of the threaded ring (35) is threadedly connected to the inner side wall of the sealing cover (33); A water inlet pipe (36) is connected to an outer wall of one side of the back plate (27); The water outlet pipe (37) is connected to the outer wall of the other side of the back plate (27).

7. The device for preparing polyphenylene ether (PPE) with ultra-low residual Cu ion content according to claim 1, characterized in that: The auxiliary components include: An electric push rod (4), one end of which is fixed to the ground, and provides power for the auxiliary components to operate; A fixed plate (41), the bottom of which is fixed on the output end of the electric push rod (4); A positioning rod (42), the top of which is fixed to the bottom of the fixing plate (41); A reinforcing block (43) is fixed at its top to the bottom of the positioning rod (42), and a mounting groove is provided on the side wall of the reinforcing block (43); An elastic sheet (44) is fixedly mounted in one of the mounting grooves on the side wall of the reinforcement block (43); The scraper ring (45) is fixedly mounted in another mounting groove on the side wall of the reinforcement block (43).

8. The device for preparing polyphenylene ether (PPE) with ultra-low residual Cu ion content according to claim 7, characterized in that: The auxiliary components also include: An adjusting plate (46) has one end slidingly abutting against a side wall of the scraper ring (45); A guide block (47) having a side wall fixed to the side wall of the adjustment plate (46); The guide rail (48) has its bottom fixed in the reinforcing block (43) and its side wall slidingly sleeved outside the guide block (47); a magnet (49) fixed to the bottom of the adjustment plate (46); The electromagnet (410) is located directly below the magnet (49), and its bottom is fixedly mounted on the reinforcing block (43), and is magnetically matched with the magnet (49).

9. A maintenance method for a device for preparing polyphenylene ether (PPE) with ultra-low residual Cu ion content according to any one of claims 1 to 8, characterized in that: The following steps are involved: S1, the raw material to be purified is transported into the housing (1) through the feed port (12), and filtered and purified using a ceramic filter plate (13); S2. After working one or several shifts, the cleaning component is controlled to move into the housing (1) and the ceramic filter plate (13) is cleaned using the cleaning component; S3, using the reflux component and the clean component to discharge the cleaning liquid after cleaning; S4. Using auxiliary components to self-clean the reflux component; S5. After cleaning is completed, the clean component is moved outside the housing (1) to continue the filtration and purification operation.

10. The maintenance method for the device for preparing polyphenylene ether (PPE) with ultra-low residual Cu ion content according to claim 9, characterized in that: The speed at which the clean components move downward is between 0.3m / s and 0.5m / s.

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