Flow stabilizing device for maintaining liquid level of reaction tank to be stable

Abstract

The invention discloses a flow stabilizer for maintaining the stability of the liquid level of a reaction tank, which comprises a reaction tank, a to-be-reacted workpiece and a conveying device for conveying the workpiece, and also comprises a flow stabilizer and support frames arranged on the two sides of the flow stabilizer, the flow stabilizer is arranged in the reaction tank, the support frames are arranged on the two sides outside the reaction tank, and the flow stabilizer is arranged in the reaction tank. A first guide part, a second guide part and a third guide part are arranged on the current stabilizer, the first guide part is used for guiding the liquid surface surge to the lower-layer liquid level, and the second guide part and the third guide part are both used for guiding the reaction liquid guided by the upper layer and the reaction liquid at the current liquid level to the lower-layer liquid level; a vertical lifting mechanism and a walking mechanism are arranged on the supporting frame, the vertical lifting mechanism is used for adjusting the relative position of the flow stabilizer in the Z-axis direction, the walking mechanism is used for adjusting the relative positions of the flow stabilizer in the X-axis direction and the Y-axis direction, and the reaction device has the advantages of controlling the motion state of reaction liquid and improving the reaction effect.

Description

Technical Field

[0001] The present invention relates to the technical field of anodic oxidation reaction, and in particular to a flow stabilizing device for maintaining a stable liquid level in a reaction pool. Background Art

[0002] In the existing anodic oxidation reaction, the phenomenon of liquid level surge often occurs, resulting in an imbalance in the reaction tank, which affects the stable progress of the anodic oxidation reaction, makes the quality of the output workpiece unstable, and has low utilization rate of the reaction liquid, high rework rate, and high production cost. Therefore, based on the above technical problems, the present application proposes a flow stabilizing device for controlling the motion state of the reaction liquid and maintaining a stable liquid level in the reaction pool to improve the reaction effect. Summary of the Invention

[0003] The purpose of the present invention is to overcome the deficiencies of the prior art and provide a flow stabilizing device for controlling the motion state of the reaction liquid and maintaining the liquid level of the reaction pool stable so as to improve the reaction effect.

[0004] In order to achieve the above-mentioned purpose, the present invention provides a flow stabilizing device for maintaining a stable liquid level in a reaction pool, comprising a reaction pool, a workpiece to be reacted, and a conveying device for transporting the workpiece, and also comprising a flow stabilizer and a support frame installed on both sides of the flow stabilizer. The flow stabilizer is arranged in the reaction pool, and the support frame is arranged on both sides outside the reaction pool. The flow stabilizer is provided with a first guide part, a second guide part and a third guide part. The first guide part is used to guide the liquid level surge to the lower liquid level, and the second guide part and the third guide part are both used to guide the reaction liquid of the upper layer and the reaction liquid of the current liquid level to the lower liquid level. The support frame is provided with a vertical lifting mechanism and a walking mechanism. The vertical lifting mechanism is used to adjust the relative position of the flow stabilizer in the Z-axis direction, and the walking mechanism is used to adjust the relative position of the flow stabilizer in the X-axis and Y-axis directions.

[0005] Furthermore, the external structure of the flow stabilizer is an inverted step-like shape.

[0006] Furthermore, the C surfaces in the first guide portion, the second guide portion and the third guide portion are inclined surfaces.

[0007] Furthermore, a plurality of diversion holes extending along the X-axis direction are formed on the A surface of the first guide part, and a plurality of liquid outlet holes extending along the Z-axis direction are formed on the B surfaces of the first guide part, the second guide part and the third guide part, wherein the diversion holes are connected to the liquid outlet holes.

[0008] Furthermore, it also includes at least one primary position sensor and at least two secondary position sensors, the primary position sensor is arranged at the bottom of the flow stabilizer, and the secondary position sensor is arranged on both sides of the flow stabilizer. The primary position sensor is used to detect the relative distance between the flow stabilizer and the workpiece, and the secondary position sensor is used to detect the relative distance between the flow stabilizer and the inner wall of the reaction tank.

[0009] Furthermore, the width of the flow stabilizer is less than or equal to the width between the inner side surfaces of the reaction tank.

[0010] Furthermore, the vertical lifting mechanism includes at least one connecting arm, at least one lifting arm and at least one lifting drive unit, the upper end of the lifting arm is connected to the support frame, and the lifting drive unit is movably installed on the outer peripheral surface of the lifting arm, wherein the bottom end of the lifting arm is formed with a limiting block; the two ends of the connecting arm are respectively connected to the side end of the flow stabilizer and the side end of the lifting drive unit, and the lifting drive unit is used to drive the flow stabilizer to move back and forth along the Z-axis direction.

[0011] Furthermore, the walking mechanism includes at least four walking wheels and at least four displacement drive units for driving the walking wheels to move.

[0012] The present invention adopts the above-mentioned solution, and its beneficial effects are: By setting a flow stabilizer in the reaction tank, the liquid surface surge phenomenon is improved and optimized, the movement state of the reaction liquid is controlled, the reaction effect and the utilization rate of the reaction liquid are improved, the quality of the output workpiece is guaranteed, and the rework rate and production cost are reduced; secondly, by adding a vertical lifting mechanism and a walking mechanism to the support frame, multi-directional movement is achieved, which makes it easier to adjust the relative position of the flow stabilizer, achieve an effective flow stabilization effect, and improve the user experience. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Figure 1 Schematic diagram of the overall flow stabilization device in the reaction tank in this embodiment.

[0014] Figure 2 Schematic top view of the flow stabilizing device in the reaction tank in this embodiment.

[0015] Figure 3 for Figure 1 An enlarged schematic diagram of the flow stabilization device in the segmented area.

[0016] Figure 4 Schematic diagram of the structure of the flow stabilizing device in this embodiment.

[0017] Among them, 1-reaction tank, 11-cathode, 12-supplementing tube, 13-liquid level surge, 2-workpiece, 3-conveyance device, 31-roller group, 4-current stabilizer, 41-first guide part, 411-diverter hole, 42-second guide part, 43-third guide part, 44-liquid outlet, 45-primary position sensor, 46-secondary position sensor, 47-A surface, 48-B surface, 49-C surface, 5-support frame, 6-vertical lifting mechanism, 61-connecting arm, 62-lifting arm, 621-limiting block, 63-lifting drive unit, 7-traveling mechanism, 71-traveling wheel, 72-displacement drive unit. DETAILED DESCRIPTION

[0018] To facilitate understanding of the present invention, the present invention is described more fully below with reference to the accompanying drawings. The accompanying drawings illustrate preferred embodiments of the present invention. However, the present invention may be implemented in many different forms and is not limited to the embodiments described herein. These embodiments are provided solely to provide a more thorough and comprehensive understanding of the present disclosure.

[0019] See attached Figure 1 、 2 As shown in Figures 3 and 4, in this embodiment, a flow stabilizing device for maintaining a stable liquid level in a reaction pool includes a reaction pool 1, a workpiece 2 to be reacted, and a conveying device 3 for transporting the workpiece 2. Specifically, the reaction pool 1 carries a reaction liquid (electrolyte) for participating in the anodic oxidation reaction of the workpiece 2. A plurality of cathode members 11 for performing an anodic oxidation reaction with the workpiece 2 are arranged on the bottom of the reaction pool 1. In addition, the length of the reaction pool 1 is relatively long due to the process requirements (it can extend to more than fifty or one hundred meters). Therefore, the reaction pool 1 is divided into several sections for management, and each section is provided with the flow stabilizing device of this embodiment and a replenishing pipe 12 for replenishing the reaction liquid to the reaction pool 1. This ensures the stability of the liquid level and avoids the concentration in some areas of the reaction tank 1 being too low, which would affect the normal progress of the anodic oxidation reaction; secondly, the conveying device 3 includes a number of roller groups 31 arranged relatively at the upper and lower ends of the workpiece 2 in the reaction tank 1 along the Z-axis direction, and the relative position of the roller group 31 can be adjusted according to the condition of the workpiece 2. The workpiece 2 is a steel coil stored in a roll form and conveyed to the reaction tank 1 through a preset unwinding mechanism. The surface of the workpiece 2 may be partially bent, bulged or concave. By adjusting the relative (vertical) position of the roller group 31, the above-mentioned phenomena can be adjusted so that the surface of the workpiece 2 is in the same flat state.

[0020] See attached Figure 4As shown, an XYZ-axis rectangular space coordinate system is established. In this embodiment, it also includes a flow stabilizer 4 and a support frame 5 installed on both sides of the flow stabilizer 4. The flow stabilizer 4 is arranged in the reaction tank 1, wherein the width dimension of the flow stabilizer 4 is less than or equal to the width dimension between the inner side surfaces of the reaction tank 1, so that the width dimension of the flow stabilizer 4 basically covers the width dimension of the liquid surface, achieving a better flow stabilization effect on the liquid surface, and, according to actual production conditions (specific reaction liquid flow rate, liquid surface surge 13), flow stabilizers 4 of different widths can be selected, and the connection position of the flow stabilizer 4 and the support frame 5 needs to be adjusted accordingly for adaptation; the support frame 5 is arranged on both sides outside the reaction tank 1, and the flow stabilizer 4 is provided with a first guide portion 41, a second guide portion 42 and a third guide portion 43, the first guide portion 41, the second guide portion 42 and the third guide portion 43, The guide portion 41 is used to guide the liquid level surge 13 to the lower liquid level. The second guide portion 42 and the third guide portion 43 are both used to guide the reaction liquid diverted from the upper layer and the reaction liquid at the current liquid level to the lower liquid level. The C surface 49 in the first guide portion 41, the second guide portion 42 and the third guide portion 43 is set as an inclined surface, so as to facilitate guiding the reaction liquid input from the upper layer to the lower layer, reduce the resistance area, and improve high-steady flow. It should be noted that the smoother the liquid level surge 13 of the reaction liquid, the more balanced the concentration of the reaction liquid in the reaction tank 1, and the better the effect of achieving the anodic oxidation reaction. By guiding the liquid level surge 13 through the first guide portion 41, the second guide portion 42 and the third guide portion 43 in turn, the phenomenon of the reaction liquid level surge 13 is reduced. For specific flow direction, please refer to the attached figure. Figure 3 As shown by the solid arrow.

[0021] See attached Figure 3 、 4 As shown, in this embodiment, a plurality of diverter holes 411 extending along the X-axis direction are formed on the A surface 47 of the first guide portion 41, and a plurality of liquid outlet holes 44 extending along the Z-axis direction are formed on the B surface 48 of the first guide portion 41, the second guide portion 42 and the third guide portion 43, wherein the diverter holes 411 are connected with the liquid outlet holes 44. Specifically, the A surface 47, the B surface 48 and the C surface 49 together constitute the above-mentioned guide portion; the setting and coordination of the diverter holes 411 and the liquid outlet holes 44 reduce the phenomenon of reaction liquid level surge 13 and make the concentration of the reaction liquid more balanced, thereby ensuring the stable and efficient progress of the anodizing reaction.

[0022] See attached Figure 4 As shown, further, the outer structure of the flow stabilizer 4 is an inverted step-like shape.

[0023] See attached Figure 4As shown, in this embodiment, a vertical lifting mechanism 6 and a walking mechanism 7 are provided on the support frame 5. The vertical lifting mechanism 6 is used to adjust the relative position of the flow stabilizer 4 in the Z-axis direction. The vertical lifting mechanism 6 includes at least one, preferably two, connecting arms 61, at least one, preferably two lifting arms 62 and at least one, preferably two lifting drive units 63. The upper end of the lifting arm 62 is connected to the support frame 5, and the lifting drive unit 63 is movably installed on the outer peripheral surface of the lifting arm 62, wherein a limiting block 621 is formed at the bottom end of the lifting arm 62 to prevent the lifting drive unit 63 from excessive movement and detaching from the lifting arm 62; the two ends of the connecting arm 61 are respectively connected to the side ends of the flow stabilizer 4 and the side ends of the lifting drive unit 63, and the lifting drive unit 63 is used to drive the flow stabilizer 4 to move back and forth along the Z-axis direction, thereby realizing the relative distance adjustment between the flow stabilizer 4 and the workpiece 2 on the Z-axis, and ensuring that the above-mentioned diversion hole 411 can be located at the same Z-axis height as the liquid level.

[0024] See attached Figure 4 As shown, further, the walking mechanism 7 is used to adjust the relative position of the flow stabilizer 4 in the X-axis and Y-axis directions. The walking mechanism 7 includes at least four walking wheels 71 and at least four displacement driving units 72 for driving the walking wheels 71 to move (the specific number can be set according to actual production and load conditions), so that it is more convenient to move the flow stabilizing device in this embodiment to the corresponding area position in the reaction tank 1 to achieve multi-directional movement. In addition, the above-mentioned walking wheel 71 can preferably be a universal wheel structure, so that it is more convenient for the flow stabilizing device in this embodiment to achieve relative displacement in the X-axis and Y-axis directions.

[0025] See attached Figure 3 、 4 As shown, in this embodiment, it also includes at least one, preferably two, primary position sensors 45 and at least two, preferably four, secondary position sensors 46. The primary position sensor 45 is arranged at the bottom of the flow stabilizer 4, and the secondary position sensor 46 is arranged on both sides of the flow stabilizer 4. The primary position sensor 45 is used to detect the relative distance between the flow stabilizer 4 and the workpiece 2, and can cooperate with the vertical lifting mechanism 6 to accurately adjust the relative distance between the flow stabilizer 4 and the workpiece 2, so as to avoid the flow stabilizer 4 and the workpiece 2 from colliding and affecting the output quality of the workpiece 2; the secondary position sensor 46 is used to detect the relative distance between the flow stabilizer 4 and the inner wall surface of the reaction tank 1, and can cooperate with the walking mechanism 7 to accurately adjust the relative distance between the flow stabilizer 4 and the inner wall surface of the reaction tank 1, so as to achieve a better flow stabilization effect; in addition, the corresponding setting of the number of the above sensors can be set according to the actual size of the reaction tank 1 and the flow stabilizer 4, so as to obtain more comprehensive and accurate data and improve user experience.

[0026] The embodiments described above are merely preferred embodiments of the present invention and are not intended to limit the present invention in any form. Any person skilled in the art who, without departing from the scope of the technical solution of the present invention, utilizes the technical content disclosed above to make more possible changes and modifications to the technical solution of the present invention, or modifications are all equivalent embodiments of the present invention. Therefore, any equivalent and equivalent changes made in accordance with the ideas of the present invention without departing from the content of the technical solution of the present invention should be included in the scope of protection of the present invention.

Claims

1. A flow stabilizing device for maintaining a stable liquid level in a reaction pool, comprising a reaction pool (1), a workpiece to be reacted (2), and a conveying device (3) for conveying the workpiece (2), characterized in that: The invention also includes a flow stabilizer (4) and a support frame (5) installed on both sides of the flow stabilizer (4), wherein the flow stabilizer (4) is arranged in the reaction pool (1), and the support frame (5) is arranged on both sides outside the reaction pool (1). The flow stabilizer (4) is provided with a first guide portion (41), a second guide portion (42) and a third guide portion (43), wherein the first guide portion (41) is used to guide the liquid level surge (13) to the lower liquid level, and the second guide portion (42) and the third guide portion (43) are both used to guide the reaction liquid of the upper layer and the reaction liquid at the current liquid level to the lower liquid level. The support frame (5) is provided with a vertical lifting mechanism (6) and a walking mechanism (7), wherein the vertical lifting mechanism (6) is used to adjust the relative position of the flow stabilizer (4) in the Z-axis direction, and the walking mechanism (7) is used to adjust the relative position of the flow stabilizer (4) in the X-axis and Y-axis directions.

2. A flow stabilizing device for maintaining a stable liquid level in a reaction tank according to claim 1, characterized in that: The external structure of the flow stabilizer (4) is in the shape of an inverted step.

3. A flow stabilizing device for maintaining a stable liquid level in a reaction tank according to claim 2, characterized in that: The C-surfaces (49) in the first guide portion (41), the second guide portion (42), and the third guide portion (43) are arranged as inclined surfaces.

4. A flow stabilizing device for maintaining a stable liquid level in a reaction tank according to claim 1, characterized in that: A plurality of diversion holes (411) extending along the X-axis direction are formed on the A surface (47) of the first guide portion (41), and a plurality of liquid outlet holes (44) extending along the Z-axis direction are formed on the B surfaces (48) of the first guide portion (41), the second guide portion (42), and the third guide portion (43), wherein the diversion holes (411) are connected to the liquid outlet holes (44).

5. A flow stabilizing device for maintaining a stable liquid level in a reaction tank according to claim 1, characterized in that: The invention also includes at least one primary position sensor (45) and at least two secondary position sensors (46), wherein the primary position sensor (45) is arranged at the bottom of the flow stabilizer (4), and the secondary position sensors (46) are arranged on both sides of the flow stabilizer (4). The primary position sensor (45) is used to detect the relative distance between the flow stabilizer (4) and the workpiece (2), and the secondary position sensor (46) is used to detect the relative distance between the flow stabilizer (4) and the inner wall of the reaction tank (1).

6. A flow stabilizing device for maintaining a stable liquid level in a reaction tank according to claim 1, characterized in that: The width of the flow stabilizer (4) is less than or equal to the width between the inner side surfaces of the reaction tank (1).

7. A flow stabilizing device for maintaining a stable liquid level in a reaction tank according to claim 1, characterized in that: The vertical lifting mechanism (6) includes at least one connecting arm (61), at least one lifting arm (62) and at least one lifting drive unit (63), wherein the upper end of the lifting arm (62) is connected to the support frame (5), and the lifting drive unit (63) is movably mounted on the outer peripheral surface of the lifting arm (62), wherein the bottom end of the lifting arm (62) is formed with a limiting block (621); the two ends of the connecting arm (61) are respectively connected to the side end of the flow stabilizer (4) and the side end of the lifting drive unit (63), and the lifting drive unit (63) is used to drive the flow stabilizer (4) to move back and forth along the Z-axis direction.

8. A flow stabilizing device for maintaining a stable liquid level in a reaction tank according to claim 1, characterized in that: The walking mechanism (7) comprises at least four walking wheels (71) and at least four displacement drive units (72) for driving the walking wheels (71) to move.

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