OPC (Optical Proximity Correction) preprocessing method and system for short adjacent edges of bevel edges, and OPC correction method

Abstract

The invention provides an OPC preprocessing method and system for a short limb adjacent to a bevel edge and an OPC correction method, and the method comprises the steps: obtaining a to-be-processed graph, the to-be-processed graph at least comprises a bevel edge and a short limb connected with the bevel edge, and the size of the short limb is smaller than the size of a preset segment; based on the size of the short limb and the size of a preset segment, positioning an interception point on the non-inclined limb connected with the other end of the short limb; a line end connected with the extension line of the short limb is formed at the position, corresponding to the interception point, of the bevel edge; and based on the line end, performing logical operation on the to-be-processed graph to obtain a target graph. According to the configuration, the line end connected with the extension line of the short limb is formed on the bevel edge, so that the amendment space of the short limb can be prevented from being occupied, the difference between the final simulation graph and the target graph can be further reduced, and the OPC amendment effect is effectively improved.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor manufacturing, and in particular to an OPC preprocessing method and system for short edges adjacent to bevel edges, and an OPC correction method. Background Art

[0002] Model-based Optical Proximity Correction (OPC) methods are now widely used in photolithography processes, including critical layers and ion implantation. Model-based OPC methods simulate the exposure process (and sometimes etching) by building a model and combining it with regular pattern cutting. They can compensate for localized pattern distortion in a variety of complex patterns.

[0003] The principle of the model-based OPC method is to cut the original graphic into many small segments according to certain rules. Each segment has one or more target points. By simulating and correcting the graphic segments, the corrected graphic simulation results are consistent with the target points. These segments are moved along the direction perpendicular to the graphic edge or along the extension direction.

[0004] The original layout may contain some graphics that comply with design rules but are not conducive to model correction. These graphics themselves do not violate design rules, but their presence can lead to unreasonable OPC correction results. For example, a short edge adjacent to a bevel edge can produce poor correction results. One reason for this is that after the cut segment is moved during the correction process, the bevel edge, due to the extended closure process, encroaches on the short edge correction, resulting in insufficient short edge correction and the adjacent normal graphics also failing to achieve the target.

[0005] Based on this, how to process the short adjacent edge adjacent to the oblique edge to improve the correction effect of the short adjacent edge has become a technical problem that needs to be solved by those skilled in the art. Summary of the Invention

[0006] The purpose of the present invention is to provide an OPC preprocessing method and system, and an OPC correction method for short adjacent edges adjacent to bevel edges, so as to solve the problems in the prior art of poor correction results for short adjacent edges adjacent to bevel edges and insufficient correction amount for short adjacent edges.

[0007] In order to achieve the above object, the present invention provides an OPC preprocessing method for the short edge adjacent to the oblique edge, comprising:

[0008] Acquire a to-be-processed graphic, wherein the to-be-processed graphic includes at least a hypotenuse and a short adjacent side connected to the hypotenuse, wherein a size of the short adjacent side is smaller than a preset segment size;

[0009] Based on the size of the short adjacent side and the preset segment size, locating an interception point on the non-oblique adjacent side connected to the other end of the short adjacent side;

[0010] forming a line end connected to an extension line of the short adjacent side at a position on the hypotenuse corresponding to the interception point;

[0011] Based on the line ends, a logical operation is performed on the graphics to be processed to obtain a target graphics.

[0012] Optionally, a line parallel to the non-oblique adjacent side is drawn at a position on the oblique side corresponding to the interception point, and is connected to an extension line of the short adjacent side to form the line end.

[0013] Optionally, the short adjacent edge and the non-oblique adjacent edge are perpendicular to each other;

[0014] A rectangular area is formed by connecting the non-oblique adjacent side, the short adjacent side and its extension line, the parallel line of the non-oblique adjacent side, the interception point and the position on the oblique side corresponding to the interception point;

[0015] Based on the rectangular area, a logical operation is performed on the graphic to be processed to obtain the target graphic.

[0016] Optionally, a Boolean operation is performed on the rectangular area and the graphic to be processed to obtain the target graphic.

[0017] Optionally, at the interception point, a line parallel to the short adjacent side is drawn to form an intersection on the hypotenuse, and the intersection is a position on the hypotenuse corresponding to the interception point.

[0018] Optionally, the short adjacent side and the non-oblique adjacent side are perpendicular to each other, and the oblique side is arranged at an angle to the short adjacent side and the non-oblique adjacent side respectively.

[0019] Optionally, the size of the short adjacent side of the target graphic is larger than the size of the short adjacent side of the graphic to be processed.

[0020] In order to achieve the above object, the present invention also provides an OPC correction method, comprising:

[0021] Using the above-mentioned OPC preprocessing method for the short edge adjacent to the oblique edge, a target pattern is obtained;

[0022] The target graphic is subjected to model-based OPC processing.

[0023] Optionally, the short adjacent edges in the target pattern will not be shortened during the OPC process, and the oblique edges in the target pattern will not be extended and closed during the OPC process.

[0024] In order to achieve the above object, the present invention further provides an OPC preprocessing system for short adjacent edges adjacent to bevel edges, which applies the above-mentioned OPC preprocessing method for short adjacent edges adjacent to bevel edges, comprising:

[0025] An acquisition module is used to acquire a figure to be processed; the figure to be processed includes at least a hypotenuse and a short adjacent side connected to the hypotenuse;

[0026] a positioning module, configured to locate a cutting point on a non-oblique adjacent edge connected to the other end of the short adjacent edge according to the size of the short adjacent edge and a preset segment size;

[0027] a forming module, configured to form a line end connected to an extension line of the short adjacent side at a position on the hypotenuse corresponding to the interception point;

[0028] The pre-processing module is used to perform a logical operation on the graphics to be processed according to the line ends to obtain a target graphics.

[0029] Compared with the existing OPC correction method, the OPC preprocessing method and system for the short adjacent edges of the bevel provided in this application, and the OPC correction method have the following advantages:

[0030] The OPC preprocessing method for the short adjacent edges adjacent to the bevel provided in the present application forms a line end on the bevel connected to the extension line of the short adjacent edge, so that the model-based OPC correction cannot extend and close the bevel, thereby avoiding encroaching on the correction space of the short adjacent edge. The difference between the final simulation graphic and the target graphic can be further reduced, effectively improving the OPC correction effect.

[0031] The OPC correction method provided in the present application avoids the situation where the bevel encroaches on the correction space of the short edge due to the extended closing processing, causing the length of the short edge to be further reduced, by using the above-mentioned OPC preprocessing method for the short edge adjacent to the bevel, thereby reducing the difference between the simulation graphic and the target graphic, and effectively improving the OPC correction effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] Figure 1 A schematic diagram of a graphic to be processed in the prior art;

[0033] Figure 2 A schematic diagram of the correction result of the graphics to be processed in the prior art;

[0034] Figure 3 A schematic diagram of a simulation result of a correction result of a graphics to be processed in the prior art;

[0035] Figure 4 A flowchart of an OPC preprocessing method for short edges adjacent to a bevel provided in an embodiment of the present invention;

[0036] Figure 5 A schematic diagram of a pre-processed graphic provided by an embodiment of the present invention;

[0037] Figure 6 A schematic diagram of the correction result after preprocessing of the graphics to be processed provided by an embodiment of the present invention;

[0038] Figure 7 A schematic diagram of a simulation result of correction after pre-processing of a graphics to be processed provided by an embodiment of the present invention;

[0039] Figure 8 A comparison chart of the EPE (Edge Placement Error) corrected by the preprocessing method provided in an embodiment of the present invention and the EPE corrected by the prior art;

[0040] Figure 9 A flowchart of an OPC correction method provided by an embodiment of the present invention;

[0041] Figure 10 A schematic diagram of an OPC preprocessing system for short edges adjacent to oblique edges provided by an embodiment of the present invention.

[0042] The description of each reference numeral is as follows:

[0043] 1-hypotenuse; 2-short adjacent side; 3-non-hypotenuse adjacent side;

[0044] 10-acquisition module; 20-positioning module; 30-forming module; 40-preprocessing module. DETAILED DESCRIPTION

[0045] To make the objects, advantages, and features of the present invention more clearly apparent, the present invention is further described below in conjunction with the accompanying drawings and specific embodiments. It should be noted that the drawings are all in a very simplified form and are not drawn to scale. They are only used to conveniently and clearly assist in illustrating the purposes of the embodiments of the present invention. In addition, the structures shown in the drawings are often part of the actual structure. In particular, different drawings may need to illustrate different focuses and sometimes use different scales.

[0046] As used in this specification, the singular forms "a", "an", and "the" include plural referents, the term "or" is generally used to include "and / or", the term "several" is generally used to include "at least one", and the term "at least two" is generally used to include "two or more". In addition, the terms "first", "second", and "third" are used for descriptive purposes only and are not to be understood as indicating or implying relative importance or implicitly indicating the number of the technical features indicated. Therefore, the features specified as "first", "second", and "third" may explicitly or implicitly include one or at least two of the features, "one end" and "the other end" and "proximal end" and "distal end" generally refer to two corresponding parts, which include not only endpoints, and the terms "mounted", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the internal communication between two elements or the interaction relationship between two elements. In addition, as used in this specification, an element disposed on another element generally only indicates that there is a connection, coupling, cooperation or transmission relationship between the two elements, and the connection, coupling, cooperation or transmission between the two elements may be direct or indirect through an intermediate element, and it cannot be understood as indicating or implying a spatial positional relationship between the two elements, that is, one element may be in any orientation such as inside, outside, above, below or to one side of another element, unless otherwise clearly indicated in the content. The terms "upper", "lower", "top" and "bottom" are generally relative positional relationships arranged in the direction of gravity; the terms "vertical" and "vertical direction" generally refer to the direction of gravity, which is generally perpendicular to the ground, and "horizontal" and "horizontal plane direction" generally refer to the direction parallel to the ground; for ordinary technicians in this field, the specific meanings of the above terms in this specification can be understood according to specific circumstances.

[0047] The purpose of the present invention is to provide an OPC preprocessing method and system, and an OPC correction method for short adjacent edges adjacent to bevel edges, so as to solve the problems in the prior art of poor correction results for short adjacent edges adjacent to bevel edges and insufficient correction amount for short adjacent edges.

[0048] Please refer to Figures 1 to 3 , those skilled in the art can understand that the model-based OPC correction method is to calculate the offset of each pattern edge through iterative simulation, and then dynamically adjust the mask pattern. However, in the process of use, when there is a short edge 2 adjacent to the oblique edge 1 in the design pattern (such as Figure 1 As shown in Figure 2 ), after the cutting segment is moved, the model-based OPC correction method will cause the bevel edge 1 to occupy the correction space of the short edge 2 due to the extended closing process, and the size of the short edge 2 will be further reduced (as shown in Figure 2 ). Figure 2As shown in Figure 2, the correction amount for the short edge 2 is insufficient, making it difficult to achieve the goal. The maximum difference is 45 times the minimum resolution size of the graphic (as shown in Figure 2). Figure 3 This severely impacts the OPC correction effect. Based on this, this embodiment provides an OPC preprocessing method and system, as well as an OPC correction method, for short adjacent edges adjacent to bevels. By forming a line end on the short adjacent edge adjacent to the bevel, the model-based OPC correction method is unable to extend and close the bevel, thereby avoiding the situation where the correction space of the short adjacent edge is encroached upon, effectively improving the OPC correction effect.

[0049] Please refer to Figure 4 The present invention provides an OPC preprocessing method for short edges adjacent to oblique edges, comprising:

[0050] Step S1: obtaining a figure to be processed, the figure to be processed at least comprising a hypotenuse 1 and a short adjacent side 2 connected to the hypotenuse 1, wherein the size of the short adjacent side 2 is smaller than a preset segment size;

[0051] Step S2: Based on the size of the short adjacent side 2 and the preset segment size, a cutting point is located on the non-oblique adjacent side 3 connected to the other end of the short adjacent side 2;

[0052] Step S3: At the position corresponding to the interception point on the hypotenuse 1, a line end connected to the extension line of the short adjacent side 2 is formed (such as Figure 5 shown);

[0053] Step S4: Based on the line ends, perform logical operations on the graphics to be processed to obtain the target graphics (such as Figure 6 shown).

[0054] It should be noted that in step S1, the OPC correction method used is a model-based OPC correction method. In the model-based OPC correction method, the determination of the segment size is the core issue of balancing imaging accuracy and computational efficiency, and its size selection needs to comprehensively consider factors such as physical effects, model accuracy, computing resources, and mask manufacturing constraints. When the preset segment size is smaller, local distortion can be accurately captured, but the amount of calculation increases exponentially; when the preset segment size is larger, the computational complexity can be reduced, but it may lead to error accumulation in key areas. Generally, the determination of the preset segment size needs to be dynamically adjusted in combination with the complexity of the graphics and the requirements of the process nodes. For example, a smaller preset segment size is used in high-curvature areas such as corners and contact holes to improve the correction effect; and a larger preset segment size is used in low-curvature areas such as long straight metal lines to improve computational efficiency. In this embodiment, the short adjacent edge 2 is an edge whose size is smaller than the preset segment size in the current area, and it cannot be cut into segments according to a regular pattern. Once one end of the above-mentioned short adjacent edge 2 is connected to the hypotenuse 1, in the current OPC correction process, it will be insufficiently corrected due to the extension and closure processing of the hypotenuse 1, thereby forming an error between the simulation figure and the target figure.

[0055] In step S2, please refer to Figure 5 In the figure to be processed, one end of the short adjacent side 2 is connected to the oblique side 1, and the other end is connected to the non-oblique adjacent side 3. The non-oblique adjacent side 3 and the short adjacent side 2 are perpendicular to each other. When locating the interception point A, the distance between the interception point A and the connection point between the non-oblique adjacent side 3 and the short adjacent side 2 is adjusted based on the difference between the preset segment size and the short adjacent side 2, combined with the angle between the oblique side 1 and the short adjacent side 2, and other relevant rule settings.

[0056] In step S3, please continue to refer to Figure 5 , the hypotenuse 1 is set at an angle to the short adjacent side 2 and the non-oblique adjacent side 3 respectively. At the interception point A, a parallel line of the short adjacent side 2 is made to form an intersection B on the hypotenuse 1, and the intersection B is the position on the hypotenuse 1 corresponding to the interception point A. At this time, a parallel line of the non-adjacent side is made at the intersection B and connected to the extension line of the short adjacent side 2 to form a line end. It can be understood by those skilled in the art that the line end refers to the end area of the straight line figure on the mask. Due to the diffraction effect and optical proximity effect of the lithography system, the actual imaging of the line end on the silicon wafer will deviate from the design figure, which is usually manifested as a shortening of the line end. Therefore, the line end needs to be corrected during the OPC correction process to avoid shortening of the line end and improve the imaging fidelity. Based on this, in this embodiment, by forming a line end on the hypotenuse 1 connected to the short adjacent side 2, when the OPC correction is performed later, the hypotenuse 1 will not be directly extended and closed, thereby avoiding the situation of encroaching on the correction space of the short adjacent side 2.

[0057] In step S4, please refer to Figures 5 and 6, it can be obtained from step S3 that a line end is formed on the oblique side 1 adjacent to the short adjacent side 2. At this time, the non-oblique adjacent side 3, the short adjacent side 2 and its extension line, the parallel line of the non-oblique adjacent side 3, the interception point, and the position on the oblique side 1 corresponding to the interception point form a rectangular area. By performing logical operations on the rectangular area and the image to be processed, the following is finally obtained: Figure 6 As shown in the target pattern. As an optional embodiment, a Boolean operation is performed on the rectangular area and the pattern to be processed to obtain the target pattern. Those skilled in the art will appreciate that Boolean operations can divide complex mask patterns into smaller regions through logical operations (such as union and difference), for example, independently correcting local areas susceptible to optical proximity effects, such as line ends and corners. Of course, in other embodiments, other logical operations can also be used for processing, and this embodiment is not limited to this.

[0058] As an optional embodiment, please refer to Figure 7 and Figure 8 , the target pattern is formed by using the OPC preprocessing method for the short adjacent edges of the oblique edges provided in this embodiment. In the subsequent correction process, the simulation pattern is more consistent with the target pattern (such as Figure 7 As shown in the figure, the difference between the final simulation graph and the target graph can be controlled within 4 times the minimum resolution size of the graph. Compared with the existing technology, which has a maximum difference of 45 times the minimum resolution size of the graph, the correction result is significantly improved. Figure 8 Compared with the existing OPC correction technology, the preprocessing method provided in this embodiment can achieve the OPC correction target more efficiently within a limited number of iterations, solving the technical pain point of the difficulty in OPC correction of the short adjacent edge 2 adjacent to the bevel 1. It can be understood by those skilled in the art that Figure 8 In the figure, the vertical axis represents the EPE (Edge Placement Error) result at the current position. EPE specifically refers to the deviation distance (in nm) between the corrected edge position of the pattern on the mask and the ideal target edge position actually imaged on the silicon wafer; the horizontal axis refers to the number of iterations at the current position.

[0059] With this configuration, by forming a line end on the bevel 1 that is connected to the extension line of the short adjacent edge 2, the model-based OPC correction cannot extend and close the bevel 1, thereby avoiding encroaching on the correction space of the short adjacent edge 2. The difference between the final simulation graphic and the target graphic can be further reduced, effectively improving the OPC correction effect.

[0060] In an optional embodiment, the size of the short adjacent side 2 in the target graphic is larger than the size of the short adjacent side 2 in the graphic to be processed. It should be noted that in this embodiment, the size of the short adjacent side 2 in the target graphic formed after preprocessing will be larger than the size of the short adjacent side 2 at the same position in the graphic to be processed, and the size of the short adjacent side 2 in the target graphic can be larger than the preset segment size, or smaller than or equal to the preset segment size. It will be understood by those skilled in the art that the purpose of forming a line end between the hypotenuse 1 and the short adjacent side 2 adjacent to the hypotenuse 1 is to increase the size of the short adjacent side 2, so as to avoid the hypotenuse 1 occupying the correction space of the short adjacent side 2 due to the extended closing process, resulting in insufficient correction of the short adjacent side 2; rather than to enable the preprocessed short adjacent side 2 to be cut into fragments.

[0061] Please refer to Figure 7 and Figure 9 The present invention also provides an OPC correction method, comprising:

[0062] Step S10: using the above-mentioned OPC preprocessing method for the short adjacent edges of the oblique edge to obtain the target pattern;

[0063] Step S20: performing model-based OPC processing on the target graphic.

[0064] With this configuration, after preprocessing the graphics to be processed using the above-mentioned OPC preprocessing method for the short edges adjacent to the oblique edges, the following is obtained: Figure 6 The target graphic shown in the figure. In this case, the short adjacent edge 2 in the target graphic will not be shortened during OPC processing, and the bevel edge 1 in the target graphic will not be extended or closed due to the presence of the line end during OPC processing. This can avoid encroaching on the correction space of the short adjacent edge 2 and effectively improve the OPC correction effect.

[0065] Please refer to Figure 10 The present invention also provides an OPC preprocessing system for short adjacent edges adjacent to bevels, which applies the OPC preprocessing method for short adjacent edges adjacent to bevels as described above, including: an acquisition module 10, used to acquire a to-be-processed graphic; the to-be-processed graphic at least includes a bevel 1 and a short adjacent edge 2 connected to the bevel 1; a positioning module 20, used to locate an interception point on a non-bevel adjacent edge 3 connected to the other end of the short adjacent edge 2 according to the size of the short adjacent edge 2 and a preset segment size; a forming module 30, used to form a line end connected to the extension line of the short adjacent edge 2 at a position on the bevel 1 corresponding to the interception point; and a preprocessing module 40, used to perform a logical operation on the to-be-processed graphic according to the line end to obtain a target graphic.

[0066] It should be noted that the acquisition module 10, the positioning module 20, the formation module 30 and the pre-processing module 40 can be connected to each other in communication. Among them, the acquisition module 10 can filter out the graphics to be processed that meet the conditions from a large number of pre-processing graphics based on the characteristics of the graphics to be processed (for example, the size of the short adjacent side 2 is smaller than the preset segment size, and one end of the short adjacent side 2 is connected to the hypotenuse 1). The positioning module 20 can locate the position of the interception point A on the non-bevel adjacent side 3 based on the difference between the preset segment size and the size of the short adjacent side 2, and then let the operator make corresponding adjustments to the position of the interception point A according to the actual situation. The formation module 30 draws a parallel line of the short adjacent side 2 at the position of the interception point A, forms an intersection B on the hypotenuse 1, and then draws a parallel line of the non-bevel adjacent side 3 at the intersection B, connected to the extension line of the short adjacent side 2, to form a line end. The pre-processing module 40 directly performs Boolean operations on the rectangular area formed by the line end and the graphics to be processed to jointly form the target graphics.

[0067] In summary, in an OPC preprocessing method and system and an OPC correction method for short adjacent edges adjacent to a hypotenuse provided in an embodiment of the present invention, the OPC preprocessing method for short adjacent edges adjacent to a hypotenuse includes: obtaining a graphic to be processed, the graphic to be processed at least including a hypotenuse and a short adjacent edge connected to the hypotenuse, wherein the size of the short adjacent edge is smaller than a preset segment size; based on the size of the short adjacent edge and the preset segment size, locating an interception point on a non-oblique adjacent edge connected to the other end of the short adjacent edge; forming a line end connected to the extension line of the short adjacent edge at a position on the hypotenuse corresponding to the interception point; based on the line end, performing a logical operation on the graphic to be processed to obtain a target graphic.

[0068] With this configuration, by forming a line end on the bevel that is connected to the extension line of the short adjacent edge, the model-based OPC correction cannot extend and close the bevel, thereby avoiding encroaching on the correction space of the short adjacent edge. The difference between the final simulation graphic and the target graphic can be further reduced, effectively improving the OPC correction effect.

[0069] The above description is only a description of the preferred embodiments of the present invention and does not limit the scope of the present invention. Any changes and modifications made by ordinary technicians in the field of the present invention based on the above disclosure shall fall within the scope of protection of the claims.

Claims

1. An OPC preprocessing method for the short edge adjacent to the oblique edge, characterized in that: include: Acquire a to-be-processed graphic, wherein the to-be-processed graphic includes at least a hypotenuse and a short adjacent side connected to the hypotenuse, wherein a size of the short adjacent side is smaller than a preset segment size; Based on the size of the short adjacent side and the preset segment size, locating an interception point on the non-oblique adjacent side connected to the other end of the short adjacent side; forming a line end connected to an extension line of the short adjacent side at a position on the hypotenuse corresponding to the interception point; Based on the line ends, a logical operation is performed on the graphics to be processed to obtain a target graphics.

2. The OPC preprocessing method for the short edge adjacent to the oblique edge according to claim 1, characterized in that: A line parallel to the non-oblique adjacent side is drawn at a position on the oblique side corresponding to the interception point, and is connected to an extension line of the short adjacent side to form the line end.

3. The OPC preprocessing method for the short edge adjacent to the oblique edge according to claim 2, characterized in that: The short adjacent side and the non-oblique adjacent side are perpendicular to each other; A rectangular area is formed by connecting the non-oblique adjacent side, the short adjacent side and its extension line, the parallel line of the non-oblique adjacent side, the interception point and the position on the oblique side corresponding to the interception point; Based on the rectangular area, a logical operation is performed on the graphic to be processed to obtain the target graphic.

4. The OPC preprocessing method for the short edge adjacent to the oblique edge according to claim 3, characterized in that: A Boolean operation is performed on the rectangular area and the graphics to be processed to obtain the target graphics.

5. The OPC preprocessing method for the short edge adjacent to the oblique edge according to claim 1, characterized in that: At the interception point, a line parallel to the short adjacent side is drawn to form an intersection on the hypotenuse, and the intersection is a position on the hypotenuse corresponding to the interception point.

6. The OPC preprocessing method for the short edge adjacent to the oblique edge according to claim 1, characterized in that: The short adjacent side and the non-oblique adjacent side are perpendicular to each other, and the oblique side is arranged at an angle to the short adjacent side and the non-oblique adjacent side respectively.

7. The OPC preprocessing method for the short edge adjacent to the oblique edge according to claim 1, characterized in that: The size of the short adjacent side of the target graphic is larger than the size of the short adjacent side of the graphic to be processed.

8. An OPC correction method, characterized in that: include: Using the OPC preprocessing method for short edges adjacent to oblique edges according to any one of claims 1 to 7, obtaining a target pattern; The target graphic is subjected to model-based OPC processing.

9. The OPC correction method according to claim 8, wherein: The short adjacent edges in the target pattern will not be shortened during the OPC process, and the oblique edges in the target pattern will not be extended or closed during the OPC process.

10. An OPC pre-processing system for short edges adjacent to bevel edges, characterized in that: Applying the OPC preprocessing method for the short edge adjacent to the oblique edge according to any one of claims 1 to 7, comprising: An acquisition module is used to acquire a figure to be processed; the figure to be processed includes at least a hypotenuse and a short adjacent side connected to the hypotenuse; a positioning module, configured to locate a cutting point on a non-oblique adjacent edge connected to the other end of the short adjacent edge according to the size of the short adjacent edge and a preset segment size; a forming module, configured to form a line end connected to an extension line of the short adjacent side at a position on the hypotenuse corresponding to the interception point; The pre-processing module is used to perform a logical operation on the graphics to be processed according to the line ends to obtain a target graphics.

Images