Stripping liquid regeneration additive and stripping liquid waste regeneration method

Abstract

The invention belongs to the technical field of stripping waste liquid recycling, and particularly discloses a stripping liquid regeneration additive, which is prepared from the following raw materials in percentage by mass: 3 to 10 percent of hexahydro-s-triazine derivative, 0.1 to 5 percent of phenylate diamine, 15 to 30 percent of micromolecule amine, 0.5 to 2 percent of nonionic surfactant and the balance of organic solvent, the regeneration method of the stripping waste liquid comprises the following steps: according to the formula of the stripping liquid regeneration additive, adding the hexahydro-s-triazine derivative, the phenylate diamine, the small molecule amine and the nonionic surfactant into the organic solvent, and uniformly mixing to obtain the stripping liquid regeneration additive; adsorbing the stripping waste liquid by silica gel to remove metal ions, filtering and distilling to obtain mother liquor; adding a stripping liquid regeneration additive into the mother liquid to obtain stripping regeneration liquid; the stripping regeneration liquid disclosed by the invention not only can effectively strip the photoresist, but also is high in processing compatibility and long in service life, and has a wide application prospect.

Description

Technical Field

[0001] The invention belongs to the technical field of stripping waste liquid recycling, and in particular relates to a stripping liquid regeneration additive and a stripping waste liquid regeneration method. Background Art

[0002] Photoresist stripping solution is a key chemical in semiconductor manufacturing and microelectronics processing, used to remove residual photoresist and other organic contaminants after the photolithography process. With the rapid development of integrated circuit technology, the demand for photoresist stripping solution has increased significantly. However, the waste liquid generated after its use contains a large amount of organic compounds. If directly discharged, it will cause serious pollution to the environment and also lead to waste of resources. Traditional methods for treating photoresist stripping solution waste liquid mainly include incineration, chemical neutralization or physical adsorption, but these methods have disadvantages such as high treatment costs, low resource utilization, and easy generation of secondary pollution. At present, the main research is on regeneration technology that combines waste liquid purification with additive compounding to achieve effective recovery and reuse of stripping solution. However, stripping solution waste liquid usually contains a variety of solvents, photoresist decomposition products and metal ion impurities. Direct regeneration will affect the stripping performance or damage the substrate. Moreover, distillation or filtration methods cannot completely separate the effective components from the contaminants, resulting in a decrease in the stripping rate and stability of the regenerated solution.

[0003] Chinese patent publication number CN118732424A discloses a regenerable photoresist stripping solution and a preparation method thereof. The photoresist stripping solution additive comprises the following raw materials in parts by weight: 35-45 parts of an alcohol ether compound; 35-45 parts of an organic amine compound; and 10-15 parts of an admixture. The admixture comprises a corrosion inhibitor, a surfactant, and a stripping rate accelerator. However, the additive has a single function and may affect the stability of the regeneration solution, resulting in a reduction in the service life of the regeneration solution. Moreover, the regeneration solution is only used for stripping an ITO glass substrate with photoresist attached thereto, and the ITO glass substrate must be inspected for damage, resulting in poor process compatibility of the regeneration solution and greatly increasing the complexity of the production line process. Summary of the Invention

[0004] The purpose of the present invention is to overcome the problems of short service life and poor process compatibility of existing stripping regeneration liquid, and to provide a stripping liquid regeneration additive and a stripping waste liquid regeneration method.

[0005] In order to achieve the above-mentioned purpose, the technical solution adopted by the present invention is: A stripping liquid regeneration additive, wherein the raw materials thereof include, by mass percentage, 3-10% of a hexahydro-s-triazine derivative, 0.1-5% of phenylene ether diamine, 15-30% of a small molecule amine, 0.5-2% of a nonionic surfactant, and the balance being an organic solvent; the structural formula of the hexahydro-s-triazine derivative is shown in the following formula (1): Formula (1); In formula (1), R1, R2, and R3 are each independently hydrogen, a C1-C6 alkyl group, a C1-C6 hydroxyalkyl group, or a C1-C6 alkoxy group; the alkyl group or alkoxy group is a straight chain or a branched chain.

[0006] Preferably, the hexahydro-s-triazine derivative is at least one of hydroxyethylhexahydro-1,3,5-triazine, 1,3,5-trimethylhexahydro-1,3,5-triazine, 1,3,5-triisopropylhexahydro-1,3,5-triazine, and 1,3,5-tris(3-methoxypropyl)hexahydro-1,3,5-triazine.

[0007] Preferably, the phenylene ether diamine is at least one of 4,4'-diaminodiphenyl ether, 2,2-bis[4-(4-aminophenoxy)phenyl]propane, 3,4'-diaminodiphenyl ether, and 3,3',4,4'-tetraaminodiphenyl ether.

[0008] Preferably, the small molecule amine is a polyamine having 2-6 carbon atoms, specifically at least one of ethylenediamine, propylenediamine, pentanediamine, hexamethylenediamine, diethylenetriamine, dipropylenetriamine, dihexylenetriamine, dibutylenetriamine, and triethylenetetramine.

[0009] Preferably, the nonionic surfactant is at least one of nonylphenol polyoxyethylene ether, fatty acid polyoxyethylene ester, fatty amine polyoxyethylene ether, and polyethylene glycol.

[0010] Preferably, the organic solvent is at least one of N-methylpyrrolidone, dimethyl sulfoxide, sulfolane, N,N-dimethylformamide, ethylene glycol, and N,N-dimethylacetamide.

[0011] A method for regenerating stripping waste liquid comprises the following steps: According to the above-mentioned formula of the stripping solution regeneration additive, hexahydro-s-triazine derivative, phenylene ether diamine, small molecule amine, and non-ionic surfactant are added to the organic solvent and mixed evenly to obtain the stripping solution regeneration additive; The stripping waste liquid is subjected to silica gel adsorption to remove metal ions, filtered, and distilled to obtain a mother liquor; A stripping liquid regeneration additive is added to the mother liquid to obtain a stripping regeneration liquid.

[0012] Preferably, the stripping waste liquid comprises 45-60 wt % of N-methylformamide, 35-50 wt % of diethylene glycol methyl ether, 100-3000 ppm of resist, and the balance is water.

[0013] Preferably, the mass of the stripping solution regeneration additive is 5-10% of the mass of the stripping solution waste liquid.

[0014] Compared with the prior art, the present invention has the following beneficial effects: (1) The stripping solution regeneration additive of the present invention includes a hexahydrotriazine derivative, which contains multiple nitrogen sites on the triazine ring and can undergo nucleophilic reaction with the phenolic resin in the PR photoresist, directly attacking the ether bond or methylene bridge on the molecular chain, and destroying the cross-linked structure of the polymer chain; the small molecule amine provides a strong alkaline environment, accelerates the hydrolysis reaction of the photosensitizer naphthoquinone diazide in the photoresist, significantly improves the stripping rate, and can penetrate into the interior of the photoresist, destroying the hydrogen bond and van der Waals force, and relaxing the photoresist network structure, and cooperates with the hexahydrotriazine derivative to successfully strip the photoresist without residual glue; the non-ionic surfactant can enhance the wettability of the stripping regeneration solution on the photoresist surface, reduce droplet retraction and edge residue, and prevent the stripped photoresist fragments from being re-adsorbed on the substrate, ensuring that there is no residue after the photoresist is stripped.

[0015] (2) The stripping solution regeneration additive of the present invention includes phenylene ether diamine, the amino group of which has a chelating effect and can form a dense protective film on the surface of metals (Al, Cu and ITO) to prevent the stripping regeneration solution from corroding the metal circuit; and it works together with other components to significantly improve the process compatibility of the stripping regeneration solution.

[0016] (3) The stripping solution regeneration additive of the present invention includes hexahydrotriazine derivatives, phenylene ether diamine, small molecule amine and non-ionic surfactant. The components interact with each other, thereby improving the stability of the stripping solution regeneration additive and effectively extending the service life of the stripping solution.

[0017] (4) The present invention effectively removes metal ion impurities, photoresist fragments and low-boiling-point pollutants in the stripping waste liquid through silica gel adsorption, filtration, distillation and other steps. The mother liquor can be reused as a solvent matrix, which complies with the "reduction and reuse" principle of green chemical industry and reduces the cost of waste liquid treatment and environmental pressure. After the stripping liquid regeneration additive is compounded with the mother liquor, the chemical activity of the stripping liquid can be restored, and the stripping liquid can be recycled multiple times to extend its service life. The stripping regeneration liquid can quickly remove the glue while ensuring that the metal is not damaged, and can meet the use requirements of various high-precision processes. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The drawings described herein are used to provide a further understanding of the present invention and constitute a part of the present invention. The exemplary embodiments and descriptions of the present invention are used to explain the present invention and do not constitute an improper limitation of the present invention. In the drawings: Figure 1 This is an OM image of a sample after being stripped using the stripping regeneration solution of Example 1 provided by the present invention; Figure 2 This is an OM image of the sample after stripping using the stripping regeneration solution of Comparative Example 1 provided by the present invention. DETAILED DESCRIPTION

[0019] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making any creative efforts shall fall within the scope of protection of the present invention.

[0020] Example 1 A stripping liquid regeneration additive, wherein the raw materials thereof include, by weight percentage, 3% hexahydro-s-triazine derivative, 5% phenylene ether diamine, 30% small molecule amine, 0.5% nonionic surfactant, and the balance being an organic solvent; The hexahydro-s-triazine derivative is hydroxyethyl hexahydro-1,3,5-triazine; the phenylene ether diamine is 4,4'-diaminodiphenyl ether; the small molecule amine is ethylenediamine; the nonionic surfactant is nonylphenol polyoxyethylene ether; and the organic solvent is N-methylpyrrolidone. A method for regenerating stripping waste liquid comprises the following steps: According to the above formula, hexahydro-s-triazine derivatives, phenylene ether diamine, small molecule amine, and non-ionic surfactant are added to an organic solvent and mixed evenly to obtain a stripping liquid regeneration additive; The stripping waste liquid (45 wt % N-methylformamide, 50 wt % diethylene glycol methyl ether, 1000 ppm resist, and the balance water) was adsorbed on silica gel to remove metal ions, filtered, and distilled at 150° C. to obtain a mother liquor; The stripping liquid regeneration additive (5% by mass of the stripping liquid waste) was added to the mother liquid and mixed evenly to obtain a stripping regeneration liquid.

[0021] Example 2 A stripping liquid regeneration additive, wherein the raw materials thereof include, by weight percentage, 5% hexahydro-s-triazine derivative, 4% phenylene ether diamine, 25% small molecule amine, 1% nonionic surfactant, and the balance being an organic solvent; The hexahydro-s-triazine derivative is hydroxyethylhexahydro-1,3,5-triazine; the phenylene ether diamine is 3,4'-diaminodiphenyl ether; the small molecule amine is propylene diamine; the nonionic surfactant is fatty acid polyoxyethylene ester; and the organic solvent is obtained by mixing N-methylpyrrolidone and N,N-dimethylacetamide in a mass ratio of 3:1. A method for regenerating stripping waste liquid comprises the following steps: According to the above formula, hexahydro-s-triazine derivatives, phenylene ether diamine, small molecule amine, and non-ionic surfactant are added to an organic solvent and mixed evenly to obtain a stripping liquid regeneration additive; The stripping waste liquid (45 wt % N-methylformamide, 50 wt % diethylene glycol methyl ether, 1000 ppm resist, and the balance water) was adsorbed on silica gel to remove metal ions, filtered, and distilled at 150° C. to obtain a mother liquor; The stripping liquid regeneration additive (6% by mass of the stripping liquid waste) was added to the mother liquor and mixed evenly to obtain a stripping regeneration liquid.

[0022] Example 3 A stripping liquid regeneration additive, wherein the raw materials thereof include, by weight percentage, 6% hexahydro-s-triazine derivative, 2% phenylene ether diamine, 20% small molecule amine, 1.5% nonionic surfactant, and the balance being an organic solvent; The hexahydro-s-triazine derivative is 1,3,5-trimethylhexahydro-1,3,5-triazine; the phenylene ether diamine is 2,2-bis[4-(4-aminophenoxy)phenyl]propane; the small molecule amine is propylene diamine; the nonionic surfactant is fatty acid polyoxyethylene ester; and the organic solvent is obtained by mixing N-methylpyrrolidone and dimethyl sulfoxide in a mass ratio of 1:1. A method for regenerating stripping waste liquid comprises the following steps: According to the above formula, hexahydro-s-triazine derivatives, phenylene ether diamine, small molecule amine, and non-ionic surfactant are added to an organic solvent and mixed evenly to obtain a stripping liquid regeneration additive; The stripping waste liquid (45 wt % N-methylformamide, 50 wt % diethylene glycol methyl ether, 1000 ppm resist, and the balance water) was adsorbed on silica gel to remove metal ions, filtered, and distilled at 150° C. to obtain a mother liquor; The stripping liquid regeneration additive (8% by mass of the stripping liquid waste) was added to the mother liquid and mixed evenly to obtain a stripping regeneration liquid.

[0023] Example 4 A stripping liquid regeneration additive, wherein the raw materials thereof include, by weight percentage, 8% hexahydro-s-triazine derivative, 1% phenylene ether diamine, 18% small molecule amine, 1.8% nonionic surfactant, and the balance being an organic solvent; The hexahydro-s-triazine derivative is 1,3,5-trimethylhexahydro-1,3,5-triazine; the phenylene ether diamine is 4,4'-diaminodiphenyl ether; the small molecule amine is hexamethylenediamine; the nonionic surfactant is polyethylene glycol; and the organic solvent is obtained by mixing N-methylpyrrolidone and ethylene glycol in a mass ratio of 1:1. A method for regenerating stripping waste liquid comprises the following steps: According to the above formula, hexahydro-s-triazine derivatives, phenylene ether diamine, small molecule amine, and non-ionic surfactant are added to an organic solvent and mixed evenly to obtain a stripping liquid regeneration additive; The stripping waste liquid (45 wt % N-methylformamide, 50 wt % diethylene glycol methyl ether, 1000 ppm resist, and the balance water) was adsorbed on silica gel to remove metal ions, filtered, and distilled at 150° C. to obtain a mother liquor; The stripping liquid regeneration additive (9% by mass of the stripping liquid waste) was added to the mother liquid and mixed evenly to obtain a stripping regeneration liquid.

[0024] Example 5 A stripping liquid regeneration additive, wherein the raw materials thereof include, by weight percentage, 10% hexahydro-s-triazine derivative, 0.1% phenylene ether diamine, 15% small molecule amine, 2% nonionic surfactant, and the balance being an organic solvent; The hexahydro-s-triazine derivative is 1,3,5-tris(3-methoxypropyl)hexahydro-1,3,5-triazine; the phenylene ether diamine is 3,3',4,4'-tetraaminodiphenyl ether; the small molecule amine is dipropylene triamine; the nonionic surfactant is polyethylene glycol; and the organic solvent is a mixture of N-methylpyrrolidone, sulfolane, and ethylene glycol in a mass ratio of 3:1:1. A method for regenerating stripping waste liquid comprises the following steps: According to the above formula, hexahydro-s-triazine derivatives, phenylene ether diamine, small molecule amine, and non-ionic surfactant are added to an organic solvent and mixed evenly to obtain a stripping liquid regeneration additive; The stripping waste liquid (45 wt % N-methylformamide, 50 wt % diethylene glycol methyl ether, 1000 ppm resist, and the balance water) was adsorbed on silica gel to remove metal ions, filtered, and distilled at 150° C. to obtain a mother liquor; The stripping solution regeneration additive (10% by mass of the stripping solution waste liquid) was added to the mother liquor and mixed evenly to obtain a stripping regeneration solution.

[0025] Comparative Example 1 The only difference between Comparative Example 1 and Example 1 is that the hexahydro-s-triazine derivative (hydroxyethyl hexahydro-1,3,5-triazine) is replaced by a small molecule amine of equal mass, as follows: A stripping liquid regeneration additive, wherein the raw materials thereof include, by weight percentage, 5% phenylene ether diamine, 33% small molecule amine, 0.5% nonionic surfactant, and the balance being an organic solvent; Among them, the phenylene ether diamine is 4,4'-diaminodiphenyl ether; the small molecule amine is ethylenediamine; the nonionic surfactant is nonylphenol polyoxyethylene ether; and the organic solvent is N-methylpyrrolidone; A method for regenerating stripping waste liquid comprises the following steps: According to the above formula, phenylene ether diamine, small molecule amine, and non-ionic surfactant are added to the organic solvent and mixed evenly to obtain a stripping liquid regeneration additive; The stripping waste liquid (45 wt % N-methylformamide, 50 wt % diethylene glycol methyl ether, 1000 ppm resist, and the balance water) was adsorbed on silica gel to remove metal ions, filtered, and distilled at 150° C. to obtain a mother liquor; The stripping liquid regeneration additive (5% by mass of the stripping liquid waste) was added to the mother liquid and mixed evenly to obtain a stripping regeneration liquid.

[0026] Comparative Example 2 Comparative Example 2 is different from Example 1 only in that no phenylene ether diamine is added, specifically as follows: A stripping liquid regeneration additive, wherein the raw materials thereof include, by weight percentage, 3% hexahydro-s-triazine derivative, 30% small molecule amine, 0.5% nonionic surfactant, and the balance being an organic solvent; The hexahydro-s-triazine derivative is hydroxyethyl hexahydro-1,3,5-triazine; the small molecule amine is ethylenediamine; the nonionic surfactant is nonylphenol polyoxyethylene ether; and the organic solvent is N-methylpyrrolidone. A method for regenerating stripping waste liquid comprises the following steps: According to the above formula, hexahydro-s-triazine derivatives, small molecule amines, and non-ionic surfactants are added to an organic solvent and mixed evenly to obtain a stripping solution regeneration additive; The stripping waste liquid (45 wt % N-methylformamide, 50 wt % diethylene glycol methyl ether, 1000 ppm resist, and the balance water) was adsorbed on silica gel to remove metal ions, filtered, and distilled at 150° C. to obtain a mother liquor; The stripping liquid regeneration additive (5% by mass of the stripping liquid waste) was added to the mother liquid and mixed evenly to obtain a stripping regeneration liquid.

[0027] Comparative Example 3 A stripping liquid regeneration additive, wherein the raw materials thereof include, by weight percentage, 45% N-hydroxyethylpiperazine, 4% methylbenzotriamine azole, 4% 2,4-dihydroxypyrimidine, 2% ethylthiourea, and 45% diethylene glycol butyl ether; A method for regenerating stripping waste liquid comprises the following steps: According to the above formula, N-hydroxyethylpiperazine, methylbenzotriazole, 2,4-dihydroxypyrimidine, and ethylthiourea are added to diethylene glycol butyl ether and mixed evenly to obtain a stripping solution regeneration additive; The stripping waste liquid (45 wt % N-methylformamide, 50 wt % diethylene glycol methyl ether, 1000 ppm resist, and the balance water) was adsorbed on silica gel to remove metal ions, filtered, and distilled at 150° C. to obtain a mother liquor; The stripping liquid regeneration additive (5% by mass of the stripping liquid waste) was added to the mother liquid and mixed evenly to obtain a stripping regeneration liquid.

[0028] Performance Testing (1) The stripping regeneration liquid prepared in Examples 1-5 and Comparative Examples 1-3 was used to treat the substrates of the Cu process, Al process, and ITO process in the panel production line, where the PR glue was to be stripped. The substrates were placed in the stripping regeneration liquid at 60°C for 120s, then rinsed with ultrapure water for 1min, and finally dried with high-purity nitrogen to prepare samples after stripping with the stripping regeneration liquid. The surface of the substrate sample was observed under an optical microscope to check whether there was any photoresist residue. The amount of copper ions, aluminum ions, indium and tin ions dissolved in the stripping regeneration liquid was measured by ICP-OES. The amount of metal ions dissolved = the metal ion content in the stripping regeneration liquid after stripping - the metal ion content in the stripping regeneration liquid before stripping, and the corrosion of the metal layer was evaluated. The relevant experimental results are shown in Table 1.

[0029] Table 1

[0030] (2) Take 100 g of the stripping regeneration solution prepared in Examples 1-5 and Comparative Examples 1-3, and continuously add PR glue in a gradient of 2 g. Observe the time required for complete dissolution, as shown in Table 2.

[0031] Table 2

[0032] The OM image of the sample after stripping with the regeneration liquid was collected, and the results were as follows: Figure 1 、 2 As shown, Figure 1 OM image of the sample after stripping using the stripping regeneration solution of Example 1; Figure 2 This is the OM image of the sample after stripping using the stripping regeneration liquid of Comparative Example 1.

[0033] comprehensive Figure 1 、 2 According to the data in Tables 1 and 2, the performance of the stripping regeneration liquid of Examples 1-5 is significantly better than that of Comparative Examples 1-3.

[0034] Comparison of Example 1 with Comparative Example 1 shows that the addition of hexahydro-s-triazine derivatives to the stripping solution regeneration additive of the present invention cooperates with small molecule amines to improve the efficiency of the stripping regeneration solution in stripping photoresist without residual adhesive.

[0035] Comparison of Example 1 and Comparative Example 2 shows that the addition of phenylene ether diamine to the stripping solution regeneration additive of the present invention helps the stripping solution to fully protect the metal from corrosion or oxidation, thereby achieving compatibility among various processes.

[0036] By comparing Example 1 and Comparative Example 3, it can be seen that the stripping solution regeneration additive of the present invention includes hexahydrotriazine derivatives, phenylene ether diamine, small molecule amines, and non-ionic surfactants. Compared with the existing stripping solution regeneration additives including N-hydroxyethylpiperazine, methylbenzotriamine azole, 2,4-dihydroxypyrimidine, and ethylthiourea, it fully demonstrates that the various components in the stripping solution of the present invention work together to significantly improve the sol rate of the stripping solution, increase the sol amount, and effectively extend the service life.

[0037] It should be noted that the above disclosed embodiments only reflect the technical solutions of the present invention and are not intended to limit the scope of protection of the present invention. Although the present invention is described in detail with reference to the preferred embodiments, anyone familiar with the technical field should understand that modifications or various changes, equivalent substitutions, without departing from the scope of the technical solution of the present invention, should all fall within the scope of protection of the present invention.

Claims

1. A stripping fluid regeneration additive, characterized in that: The raw materials include, by mass percentage, 3-10% of a hexahydro-s-triazine derivative, 0.1-5% of phenylene ether diamine, 15-30% of a small molecule amine, 0.5-2% of a nonionic surfactant, and the balance being an organic solvent. The structural formula of the hexahydro-s-triazine derivative is shown in the following formula (1): Formula (1); In formula (1), R1, R2, and R3 are each independently hydrogen, a C1-C6 alkyl group, a C1-C6 hydroxyalkyl group, or a C1-C6 alkoxy group; the alkyl group or alkoxy group is a straight chain or a branched chain.

2. The stripping solution regeneration additive according to claim 1, characterized in that The hexahydro-s-triazine derivative is at least one of hydroxyethylhexahydro-1,3,5-triazine, 1,3,5-trimethylhexahydro-1,3,5-triazine, 1,3,5-triisopropylhexahydro-1,3,5-triazine, and 1,3,5-tris(3-methoxypropyl)hexahydro-1,3,5-triazine.

3. The stripping solution regeneration additive according to claim 1, characterized in that The phenylene ether diamine is at least one of 4,4'-diaminodiphenyl ether, 2,2-bis[4-(4-aminophenoxy)phenyl]propane, 3,4'-diaminodiphenyl ether, and 3,3',4,4'-tetraaminodiphenyl ether.

4. The stripping solution regeneration additive according to claim 1, characterized in that The small molecule amine is a polyamine having 2 to 6 carbon atoms, specifically at least one of ethylenediamine, propylenediamine, pentanediamine, hexamethylenediamine, diethylenetriamine, dipropylenetriamine, dihexylenetriamine, dibutylenetriamine, and triethylenetetramine.

5. The stripping solution regeneration additive according to claim 1, characterized in that The nonionic surfactant is at least one of nonylphenol polyoxyethylene ether, fatty acid polyoxyethylene ester, fatty amine polyoxyethylene ether, and polyethylene glycol.

6. The stripping solution regeneration additive according to claim 1, characterized in that The organic solvent is at least one of N-methylpyrrolidone, dimethyl sulfoxide, sulfolane, N,N-dimethylformamide, ethylene glycol, and N,N-dimethylacetamide.

7. A method for regenerating stripping waste liquid, characterized in that: The following steps are involved: According to the formula of the stripping solution regeneration additive according to any one of claims 1 to 6, a hexahydro-s-triazine derivative, phenylene ether diamine, a small molecule amine, and a non-ionic surfactant are added to an organic solvent and mixed uniformly to obtain a stripping solution regeneration additive; The stripping waste liquid is subjected to silica gel adsorption to remove metal ions, filtered, and distilled to obtain a mother liquor; A stripping liquid regeneration additive is added to the mother liquid to obtain a stripping regeneration liquid.

8. The method for regenerating stripping waste liquid according to claim 7, characterized in that: The stripping waste liquid comprises 45-60 wt % of N-methylformamide, 35-50 wt % of diethylene glycol methyl ether, 100-3000 ppm of an anti-corrosion agent, and the balance is water.

9. The method for regenerating stripping waste liquid according to claim 7, characterized in that: The mass of the stripping solution regeneration additive is 5-10% of the mass of the stripping solution waste liquid.

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