Biochip and manufacturing method thereof

By designing multiple reaction zones and specific opening structures in the biochip, solutions overflow and cross-contamination problems are solved, and a high sensitivity detection of multiple biological materials is achieved.

CN120556151APending Publication Date: 2025-08-29EPISIL TECH INC
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Patent Information

Application Number
CN202410462621.5
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Priority Date
2024-02-29
Filing Date
2024-04-17
Publication Date
2025-08-29

AI Technical Summary

Technical Problem

Existing biochips are prone to overflow when they contain a large amount of solution, resulting in cross-contamination and insufficient detection sensitivity, and the inability to detect multiple biological materials at the same time.

Method used

A biochip structure is designed, including multiple reaction zones and specific opening structures, to improve sensitivity by accumulating reaction zone signals, and to increase solution capacity through the fourth opening setting to avoid overflow, and to avoid cross contamination by using self-localized structural design.

Benefits of technology

It improves the operating margin and convenience of biochips, can detect multiple biological materials at the same time without interfering with each other, and enhances detection sensitivity.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention provides a biochip and a manufacturing method thereof. The detection unit of the biochip comprises a substrate, a first insulating layer, a semiconductor layer, a second insulating layer, a first metal layer, a second metal layer and a protective layer. The semiconductor layer includes a reaction region. The second insulating layer is disposed on the semiconductor layer and includes a first portion, a second portion and a first opening exposing the reaction region. The first metal layer is arranged on the second part and comprises a source electrode, a drain electrode, a grid electrode and a first enclosing wall structure. The second metal layer comprises a second enclosing wall structure arranged on the first enclosing wall structure. The protective layer is disposed on the first metal layer and the second metal layer. The protective layer has a second opening, a third opening, and a fourth opening, and includes a flat portion surrounding and defining the second opening, a first protruding portion surrounding and defining the third opening, and a second protruding portion surrounding and defining the fourth opening. The first opening, the second opening, the third opening and the fourth opening are overlapped in the normal direction of the substrate.
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Description

Technical Field

[0001] The present invention relates to a semiconductor chip and a manufacturing method thereof, and in particular to a biochip and a manufacturing method thereof. Background Art

[0002] In a typical biochip, the space available for accommodating solutions is usually limited by the size of the reaction area. Therefore, if a large amount of solution is used or there is an error in adding the solution, overflow of the solution may easily occur. Summary of the Invention

[0003] The present invention is directed to a biochip and a method for manufacturing the same, which can avoid the problem of solution overflow and can handle a larger amount of solution, thereby improving detection sensitivity and being able to simultaneously detect multiple biological materials without mutual interference.

[0004] According to an embodiment of the present invention, a biochip is used to detect biological materials in a solution and includes at least one detection unit. The detection unit includes a substrate, a first insulating layer, a semiconductor layer, a second insulating layer, a first metal layer, a second metal layer, and a protective layer. The first insulating layer is disposed on the substrate. The semiconductor layer is disposed on the first insulating layer and includes multiple reaction zones. The second insulating layer is disposed on the semiconductor layer and includes a first portion, a second portion, and a first opening. The second portion surrounds the first portion. The first opening separates the first and second portions and exposes the multiple reaction zones. The first metal layer is disposed on the second portion and includes a source electrode, a drain electrode, a gate electrode, and a first enclosure structure. The second metal layer includes a second enclosure structure and a bioelectrode. The second enclosure structure is disposed on the first enclosure structure, and the bioelectrode is disposed on the first portion. The protective layer is disposed on the first and second metal layers. The protective layer has a second opening, a third opening, and a fourth opening, and includes a flat portion, a first protrusion, and a second protrusion. The flat portion covers the second portion exposed by the first metal layer and surrounds and defines the second opening. The first protrusion covers the source and drain electrodes and the gate electrode and surrounds and defines a third opening. The second protrusion covers the second wall structure and surrounds and defines a fourth opening. In the normal direction of the substrate, the first opening, the second opening, the third opening, and the fourth opening overlap.

[0005] In the biochip according to an embodiment of the present invention, the semiconductor layer also includes a source region and a drain region, the source surrounds the first opening and is electrically connected to the source region, the drain surrounds the source and is electrically connected to the drain region, the gate surrounds the drain and is electrically connected to the substrate, and the first wall structure surrounds the gate.

[0006] In the biochip according to an embodiment of the present invention, the source, drain, gate and first enclosing wall structure are in the same layer, and the first enclosing wall structure electrically insulates the source, drain and gate.

[0007] In the biochip according to an embodiment of the present invention, the solution is disposed at least in the first opening, the second opening, and the third opening, and contacts the bioelectrode and the plurality of reaction areas of the semiconductor layer.

[0008] In the biochip according to an embodiment of the present invention, the bioelectrode and the second enclosing wall structure are in the same layer, the bioelectrode and the second enclosing wall structure are separated from each other, and the second enclosing wall structure electrically insulates the bioelectrode.

[0009] In the biochip according to an embodiment of the present invention, the first protrusion completely surrounds the third opening, and the second protrusion completely surrounds the fourth opening.

[0010] In the biochip according to the embodiment of the present invention, in the normal direction, the upper surface of the second protrusion is higher than the upper surface of the first protrusion, and the upper surface of the first protrusion is higher than the upper surface of the flat portion.

[0011] In the biochip according to an embodiment of the present invention, the third opening is larger than the second opening, and the fourth opening is larger than the third opening.

[0012] In the biochip according to an embodiment of the present invention, the third opening includes an addition zone and a plurality of detection zones. The addition zone is arranged corresponding to the first portion. The plurality of detection zones are connected to the addition zone and are arranged corresponding to the plurality of reaction zones.

[0013] According to an embodiment of the present invention, a method for manufacturing a biochip includes the following steps: providing a substrate; forming a first insulating layer on the substrate; forming a semiconductor layer on the first insulating layer, wherein the semiconductor layer includes multiple reaction zones; forming a second insulating layer on the semiconductor layer, wherein the second insulating layer includes a first portion, a second portion, and a first opening, wherein the second portion surrounds the first portion, and the first opening separates the first portion from the second portion and exposes the multiple reaction zones; forming a first metal layer on the second portion, wherein the first metal layer includes a source electrode, a drain electrode, a gate electrode, and a first enclosure structure that are separated from each other; forming a second metal layer, wherein the second metal layer includes a second enclosure structure and a bioelectrode, wherein the second enclosure structure is disposed on the first enclosure structure, and the bioelectrode is disposed on the first portion; forming a protective layer on the first metal layer and the second metal layer, wherein the protective layer has a second opening, a third opening, and a fourth opening, and includes a flat portion, a first protrusion, and a second protrusion. The flat portion covers the second portion exposed by the first metal layer and surrounds and defines the second opening. The first protrusion covers the source electrode, the drain electrode, and the gate electrode and surrounds and defines the third opening. The second protrusion covers the second wall structure and surrounds and defines the fourth opening. In the normal direction of the substrate, the first opening, the second opening, the third opening and the fourth opening overlap.

[0014] Based on the above, in the biochip and its manufacturing method of the embodiment of the present invention, by setting up multiple reaction areas in one detection unit to detect the same type of biological material, the sensitivity of detection can be improved by accumulating the signals detected by multiple reaction areas. Compared with general biochips, the biochip of this embodiment can increase the volume of solution that the biochip can accommodate by setting up the fourth opening to cope with a larger amount of solution, and there is no need to worry about the problem of cross contamination caused by solution overflow, thereby improving the operational margin and convenience of the biochip. In addition, since the multiple detection units in the biochip of this embodiment can be used to detect different types of biological materials respectively, and there is no need to worry about the problem of cross contamination caused by solution overflow between different detection units, the biochip has the effect of being able to detect multiple biological materials at the same time without interfering with each other. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 FIG2 is a top view schematic diagram of a biochip according to an embodiment of the present disclosure;

[0016] Figures 2A to 2C Shown as Figure 1 A top schematic diagram of a method for manufacturing a detection unit in a biochip;

[0017] Figures 3A to 3E A schematic perspective view of a method for manufacturing region R in a biochip shown as 2C;

[0018] Figure 4 Shown as Figure 2C A schematic cross-sectional view of a biochip along section line II';

[0019] Figure 5 Shown as Figure 2C A schematic cross-sectional view of the biochip along section line II-II';

[0020] Figure 6 A top view schematically shows a detection unit in a biochip according to another embodiment of the present disclosure.

[0021] Description of Reference Numerals

[0022] 10.10a: Biochip

[0023] 100, 100a: Detection unit

[0024] 110: Substrate

[0025] 120, 120a: semiconductor layer

[0026] 121, 121a: reaction zone

[0027] 1211: Reaction Unit

[0028] 122, 122a: Source region

[0029] 123, 123a: drain region

[0030] 124: Center opening

[0031] 130: Second insulation layer

[0032] 131: Part 1

[0033] 132: Part 2

[0034] 133, 134, 135: openings

[0035] 140: First metal layer

[0036] 141: Source

[0037] 142: Drain

[0038] 143: Gate

[0039] 144: First wall structure

[0040] 150: Second metal layer

[0041] 151: Bioelectrodes

[0042] 152: Second wall structure

[0043] 160: Protective layer

[0044] 161: First protrusion

[0045] 161a, 162a, 163a: upper surface

[0046] 162: Second protrusion

[0047] 163: Flat part

[0048] 200: solution

[0049] 210: Biomaterials

[0050] IL1: First insulation layer

[0051] IL2: Insulation layer

[0052] O1: First opening

[0053] O2: Second opening

[0054] O3: The third opening

[0055] O31: Add Zone

[0056] O32: Detection area

[0057] O4: Fourth Opening

[0058] R: Region

[0059] Z: Normal direction DETAILED DESCRIPTION

[0060] Reference will now be made in detail to exemplary embodiments of the present invention, examples of which are illustrated in the accompanying drawings. Whenever possible, the same reference numerals are used in the drawings and the description to refer to the same or like parts.

[0061] Figure 1 FIG. 1 is a top view schematically showing a biochip according to an embodiment of the present disclosure. Figures 2A to 2C Shown as Figure 1 Schematic top view of a method for manufacturing a detection unit in a biochip. Figures 3A to 3E A schematic perspective view of a method for manufacturing region R in a biochip shown as 2C. Figure 4 Shown as Figure 2C Schematic cross-sectional view of the biochip along section line II'. Figure 5 Shown as Figure 2C Schematic diagram of the cross section of the biochip along the section line II-II'. For the sake of clarity and convenience of illustration, Figures 2A to 2C Illustration of the substrate 110 , the first insulating layer IL1 , the second insulating layer 130 , the insulating layer IL2 , and the protective layer 160 in the biochip 10 is omitted.

[0062] Please refer to Figure 1 、 Figure 2C 、 Figure 3E 、 Figure 4 as well as Figure 5 The biochip 10 of this embodiment may include at least one detection unit 100 ( Figure 1Three detection units 100 are schematically shown, but the present invention is not limited thereto. Detection unit 100 includes a substrate 110, a first insulating layer IL1, a semiconductor layer 120, a second insulating layer 130, a first metal layer 140, a second metal layer 150, and a protective layer 160. The first insulating layer IL1 is disposed on substrate 110. The semiconductor layer 120 is disposed on the first insulating layer IL1 and includes a plurality of reaction regions 121. The second insulating layer 130 is disposed on the semiconductor layer 120 and includes a first portion 131, a second portion 132, and a first opening O1. The second portion 132 surrounds the first portion 131. The first opening O1 separates the first portion 131 from the second portion 132, and the first opening O1 exposes the plurality of reaction regions 121. The first metal layer 140 is disposed on the second portion 132 and includes a source 141, a drain 142, a gate 143, and a first wall structure 144 that are separated from each other. The second metal layer 150 includes a second enclosure structure 152 and a bioelectrode 151. The second enclosure structure 152 is disposed on the first enclosure structure 144, and the bioelectrode 151 is disposed on the first portion 131. A protective layer 160 is disposed on the first metal layer 140 and the second metal layer 150. The protective layer 160 has a second opening O2, a third opening O3, and a fourth opening O4. The protective layer 160 includes a first protrusion 161, a second protrusion 162, and a flat portion 163. The flat portion 163 covers the second portion 132 exposed by the first metal layer 140 and surrounds and defines the second opening O2. The first protrusion 161 covers the source 141, the drain 142, and the gate 143 and surrounds and defines the third opening O3. The second protrusion 162 covers the second enclosure structure 152 and surrounds and defines the fourth opening O4. The first opening O1 , the second opening O2 , the third opening O3 and the fourth opening O4 overlap in the normal direction Z of the substrate 110 .

[0063] The following describes a method for manufacturing the biochip 10 of this embodiment. The method for manufacturing the biochip 10 of this embodiment may include the following steps:

[0064] First, please refer to Figure 2A 、 Figure 3A 、 Figure 4 as well as Figure 5 A substrate 110 is provided, a first insulating layer IL1 is formed on the substrate 110, and a semiconductor layer 120 is formed on the first insulating layer IL1. In this embodiment, the substrate 110 may be a silicon substrate or a silicon wafer. For example, the substrate 110 may be a P-type silicon substrate, but is not limited thereto. In this embodiment, the first insulating layer IL1 may be a gate oxide layer, but is not limited thereto.

[0065] In this embodiment, the semiconductor layer 120 includes a plurality of reaction regions 121, a plurality of source regions 122, a plurality of drain regions 123, and a central opening 124. The source regions 122 and the drain regions 123 are separated from each other. The reaction region 121 is located between adjacent source regions 122 and drain regions 123, and the reaction region 121 can connect the source regions 122 and the drain regions 123. Each reaction region 121 may include at least one reaction unit 1211 ( Figure 2A Five reaction units 1211 are schematically shown, but the present invention is not limited thereto. The central opening 124 may be surrounded by multiple reaction regions 121, multiple source regions 122, and multiple drain regions 123. In this embodiment, the material of the semiconductor layer 120 may include polysilicon or other suitable semiconductor materials, but is not limited thereto. In some embodiments, the reaction units 1211 in the reaction region 121 can be considered as channels in a transistor structure. Therefore, when the threshold voltage of the channel (reaction unit 1211) is exceeded, the channel (reaction unit 1211) can be turned on, and current from the drain 142 can be transferred to the source 141 through the channel (reaction unit 1211).

[0066] In this embodiment, Figure 2A In the top view of FIG, the semiconductor layer 120 may schematically include eight reaction regions 121, four source regions 122, four drain regions 123, and one central opening 124. The eight reaction regions 121, four source regions 122, four drain regions 123, and one central opening 124 of the semiconductor layer 120 may be arranged in a hollow circular structure. Each pair of adjacent source regions 122 and drain regions 123 may occupy approximately 90 degrees of the entire 360-degree circular structure, and each source region 122 (or drain region 123) may occupy approximately 45 degrees of the entire 360-degree circular structure, but the present invention is not limited thereto. In other words, the present invention does not limit the number of reaction regions, source regions, drain regions, and central opening, nor does it limit the proportion of each pair of adjacent source and drain regions, or each source region (or drain region), that occupies the entire circular structure.

[0067] Furthermore, in this embodiment, a recognition unit (not shown) may be further provided on the reaction unit 1211 of the reaction region 121 of the semiconductor layer 120 to specifically recognize and bind to the biomaterial 210 in the solution 200. Specifically, one end of the recognition unit may be connected to and fixed to the reaction region 121, and the other end of the recognition unit may be used to recognize and bind to the biomaterial 210. The recognition unit may be a chemical molecule or a biological molecule. For example, the recognition unit may be an antibody, an antigen, a nucleic acid, a carbohydrate, or a combination thereof, but is not limited thereto, as long as the recognition unit can specifically recognize and bind to the biomaterial 210.

[0068] Then, please also refer to Figure 2A 、 Figure 3B 、 Figure 4 as well as Figure 5 A second insulating layer 130 is formed on the semiconductor layer 120. Specifically, the second insulating layer 130 may cover the semiconductor layer 120 and a portion of the first insulating layer IL1. The second insulating layer 130 includes a first portion 131, a second portion 132, a first opening O1, an opening 133, an opening 134, and an opening 135. The first portion 131 is disposed corresponding to the central opening 124. The second portion 132 is separated from the first portion 131 and surrounds the first portion 131. The first opening O1 separates the first portion 131 from the second portion 132. The first opening O1 may expose the plurality of reaction regions 121 and a portion of the first insulating layer IL1. The opening 133 may penetrate the second portion 132 to expose a portion of the source region 122. The opening 134 may penetrate the second portion 132 to expose a portion of the drain region 123. The opening 135 may penetrate the second portion 132 and the first insulating layer IL1 to expose a portion of the substrate 110.

[0069] Then, please also refer to Figure 2B 、 Figure 3C 、 Figure 4 as well as Figure 5, forming a first metal layer 140 on the second portion 132 of the second insulating layer 130. Specifically, the first metal layer 140 may expose the first portion 131 and a portion of the second portion 132. The first metal layer 140 includes a source electrode 141, a drain electrode 142, a gate electrode 143, and a first wall structure 144, which are separated from each other. In the normal direction Z of the substrate 110, the source electrode 141 may overlap and be disposed corresponding to the source region 122, and the drain electrode 142 may overlap and be disposed corresponding to the drain region 123. The source electrode 141 may be disposed on the second portion 132 and within the opening 133 to be electrically connected to the source region 122, the drain electrode 142 may be disposed on the second portion 132 and within the opening 134 to be electrically connected to the drain region 123, and the gate electrode 143 may be disposed on the second portion 132 and within the opening 135 to contact and be electrically connected to the conductive substrate 110.

[0070] In this embodiment, the source 141, the drain 142, the gate 143 and the first wall structure 144 may be in the same layer. Figure 2B As shown, the source 141 can be a substantially annular structure surrounding the first opening O1, the drain 142 can be a substantially annular structure surrounding the source 141 and the first opening O1, the gate 143 can be a substantially annular structure surrounding the drain 142, the source 141, and the first opening O1, and the first enclosure structure 144 can be a substantially annular structure surrounding the gate 143, the drain 142, the source 141, and the first opening O1. The first enclosure structure 144 can electrically insulate the source 141, the drain 142, and the gate 143.

[0071] Then, please also refer to Figure 2C 、 Figure 3D 、 Figure 4 as well as Figure 5 , forming an insulating layer IL2 on the first portion 131 and the first wall structure 144, and forming a second metal layer 150 on the first portion 131, the first wall structure 144, and the insulating layer IL2. Specifically, the second metal layer 150 includes a bioelectrode 151 and a second wall structure 152. The bioelectrode 151 is disposed on the first portion 131. The second wall structure 152 is disposed on the first wall structure 144. The bioelectrode 151 and the second wall structure 152 can be in the same layer, and the bioelectrode 151 and the second wall structure 152 are separated from each other. Figure 2C As shown, the second wall structure 152 can be a substantially ring-shaped structure surrounding the gate 143 , the drain 142 , the source 141 and the first opening O1 . The second wall structure 152 electrically insulates the bio-electrode 151 .

[0072] Then, please also refer to Figure 2C 、 Figure 3E 、 Figure 4 as well as Figure 5 , forming a protective layer 160 on the first metal layer 140 and the second metal layer 150. Specifically, the protective layer 160 has a second opening O2, a third opening O3, and a fourth opening O4, and the protective layer 160 includes a flat portion 163, a first protrusion 161, and a second protrusion 162. Among them, the flat portion 163 can cover the second portion 132 exposed by the first metal layer 140, and the flat portion 163 can surround and define the second opening O2. The first protrusion 161 can cover the source 141, the drain 142, and the gate 143, and the first protrusion 161 can surround and define the third opening O3. The second protrusion 162 can cover the second wall structure 152, and the second protrusion 162 can surround and define the fourth opening O4.

[0073] In this embodiment, the flat portion 163 has an upper surface 163a away from the second insulating layer 130, the first protrusion 161 has an upper surface 161a away from the second insulating layer 130, and the second protrusion 162 has an upper surface 162a away from the second insulating layer 130. In the normal direction Z of the substrate 110, the upper surface 161a of the first protrusion 161 is higher than the upper surface 163a of the flat portion 163, and the upper surface 162a of the second protrusion 162 is higher than the upper surface 161a of the first protrusion 161.

[0074] In this embodiment, by setting the first metal layer 140 and the second metal layer 150, the first protrusion 161 and the second protrusion 162 can be formed simultaneously in the step of forming the protective layer 160. Therefore, there is no need for additional process steps (such as increasing the number of masks or increasing the stacking, etc.) to manufacture the first protrusion 161 that can be used to form the third opening O3 and the second protrusion 162 that can be used to form the fourth opening O4, which has the effect of simplifying the process.

[0075] In this embodiment, the first opening O1, the second opening O2, the third opening O3, and the fourth opening O4 may overlap in the normal direction Z of the substrate 110. The second opening O2 may connect the first opening O1 and the third opening O3, and the third opening O3 may connect the second opening O2 and the fourth opening O4. The size of the second opening O2 may be substantially similar to that of the first opening O1. The size of the third opening O3 may be larger than that of the second opening O2. The size of the fourth opening O4 may be larger than that of the third opening O3.

[0076] In this embodiment, the third opening O3 may include an addition area O31 and a plurality of detection areas O32. The addition area O31 may be an area where the solution 200 is added to the biochip 10, and the detection area O32 may be an area used to guide and store the solution 200 to prevent the solution 200 from overflowing. Specifically, the addition area O31 may be provided corresponding to the central opening 124, the first portion 131, and the bioelectrode 151. The plurality of detection areas O32 may be provided corresponding to the plurality of reaction areas 121. The plurality of detection areas O32 may be connected to the addition area O31, and the plurality of detection areas O32 may be arranged radially around the addition area O31, thereby shortening the time for the solution 200 to flow into the detection area O32 and making the distribution of the solution 200 more uniform.

[0077] In this embodiment, since the solution 200 can be first dripped into the addition area O31 in the form of a liquid droplet and then flowed from the addition area O31 into the plurality of radially arranged detection areas O32, overflow of the solution 200 due to offset (or misalignment) of the addition position can be prevented by making the diameter (or width) of the addition area O31 larger than the diameter of the liquid droplet. Furthermore, by designing the contour of the addition area O31 to be circular to conform to the shape of the liquid droplet, overflow of the solution 200 can be prevented by utilizing the surface tension of the liquid when the amount of liquid 200 is excessive and close to overflowing. In other words, this embodiment utilizes the "self-limiting structure" formed by the biochip's own wiring to increase the alignment tolerance and accommodate a larger amount of solution 200. In this embodiment, the diameter (or width) of the addition area O31 is, for example, approximately 10 micrometers (μm) to 100 μm, and the width of the detection area O32 is, for example, approximately 3 μm, but is not limited thereto. In some embodiments, the diameter (or width) of the addition area O31 may be adjusted according to the diameter of the liquid droplets, and the length of the detection area O32 may be adjusted according to the number of reaction units 1211 .

[0078] Then, please also refer to Figure 4 and Figure 5 In this embodiment, the solution 200 may be disposed within at least the first opening O1, the second opening O2, and the third opening O3, and may cover at least the upper surface 163a of the flat portion 163, so that the solution 200 can simultaneously contact the bioelectrode 151 and the reaction units 1211 in the plurality of reaction zones 121. In some embodiments, when the amount of solution 200 is relatively large, the solution 200 may be disposed within the first opening O1, the second opening O2, the third opening O3, and the fourth opening O4, so that the solution 200 covers the upper surface 163a of the flat portion 163 and the upper surface 161a of the first protrusion 161.

[0079] Compared to conventional biochips that use external probe electrodes (e.g., silver / silver chloride electrodes) to detect biological materials, this embodiment significantly reduces the overall volume of the biochip 10 by integrating the bioelectrode 151 into the biochip 10, and reduces the complexity and cost of post-processing (e.g., no external probe electrodes need to be fabricated).

[0080] In this embodiment, the solution 200 may include, for example, body fluids such as serum, and the biological material 210 may include, for example, microorganisms or biomolecules, but is not limited thereto. For example, the microorganisms may include bacteria, viruses, or a combination thereof, and the biomolecules may include, for example, nucleic acids (including deoxyribonucleic acid, RNA, or a combination thereof), nucleotides, proteins, carbohydrates, lipids, or a combination thereof, but is not limited thereto.

[0081] In this embodiment, the operating principle of the biochip 10 may include testing before the solution 200 is added and detection after the solution 200 is added. Specifically, the test before the solution 200 is added is as follows: first, the gate 143 is turned on, so that the voltage provided by the gate 143 can control (turn on or off) the reaction unit 1211 in the reaction area 121 through the conductive substrate 110 and the first insulating layer IL1. Then, the current of the drain 142 (i.e., the first current) is measured to test whether the reaction unit 1211 is properly conductive and allows the current from the source 141 to pass through. Detection after the addition of the solution 200 is performed as follows: when the solution 200 is in contact with the bioelectrode 151 and the reaction units 1211 in the plurality of reaction zones 121 simultaneously, the bioelectrode 151 is first turned on, so that the voltage provided by the bioelectrode 151 can control (turn on or off) the reaction units 1211 in the reaction zones 121 through the solution 200. Next, the current at the drain electrode 142 (i.e., the second current) is measured and compared with the first current to detect the biomaterial 210 in the solution 200. Furthermore, in this embodiment, during detection after the addition of the solution 200, the gate 143 can be either turned on or off. When the gate 143 is turned on, the voltage provided by the gate 143 can, for example, be used to enhance the reaction between the biomaterial 210 and the reaction units 1211.

[0082] In this embodiment, multiple reaction areas 121 in one detection unit 100 of the biochip 10 can be used to detect the same biological material 210 , thereby increasing the detection sensitivity by accumulating the signals detected by the multiple reaction areas 121 .

[0083] In this embodiment, the first protrusion 161 can completely surround the third opening O3, and the second protrusion 162 can completely surround the fourth opening O4. Specifically, because the source 141, the drain 142, and the gate 143 are substantially annular structures and can surround the first opening O1, the first protrusion 161 disposed above the source 141, the drain 142, and the gate 143 can be a closed pattern that completely surrounds the first opening O1, the second opening O2, and the third opening O3, thereby confining the solution 200 within the third opening O3 and preventing the solution 200 from overflowing outside the third opening O3. Furthermore, since the second wall structure 152 is disposed on the first wall structure 144 and is substantially annular and can surround the first opening O1, the second protrusion 162 disposed above the second wall structure 152 can be a closed pattern that completely surrounds the first opening O1, the second opening O2, the third opening O3, and the fourth opening O4, thereby confining the solution 200 within the fourth opening O4 and preventing the solution 200 from overflowing outside the fourth opening O4. Figure 4 and Figure 5 shown.

[0084] For example, when the solution 200 added to the third opening O3 overflows, the second protrusion 162 can confine the solution 200 within the fourth opening O4 and prevent the solution 200 from overflowing. This prevents the solution from overflowing into another adjacent detection unit 100 and interfering with the detection results of another biological material. Therefore, compared to conventional biochips, the biochip 10 of this embodiment can increase the volume of solution 200 that can be accommodated by the fourth opening O4, thereby accommodating larger amounts of solution 200 and improving the operational margin and convenience of the biochip 10. Consequently, the multiple detection units 100 in the biochip 10 of this embodiment can be used to simultaneously detect different types of biological materials without worrying about cross-contamination between different detection units 100 due to solution overflow, thereby enabling the biochip 10 to simultaneously detect multiple biological materials.

[0085] The following examples are provided for illustration purposes only. It should be noted that the following examples share the same component numbers and some of the details as the previous examples, with the same numbers used to represent the same or similar components, and descriptions of the same technical details omitted. For the omitted details, please refer to the previous examples, and the following examples will not be repeated.

[0086] Figure 6 This is a top view of a detection unit in a biochip according to another embodiment of the present disclosure. Figure 6 and Figure 2C The biochip 10a of this embodiment is Figure 2CThe biochip 10 in the embodiment is similar to the biochip 10 in the embodiment, but the main difference between the two is that in the detection unit 100a of the biochip 10a of this embodiment, the semiconductor layer 120a includes more reaction areas 121a, source areas 122a and drain areas 123a.

[0087] Specifically, please refer to Figure 6 The semiconductor layer 120a may include 12 reaction regions 121a, 6 source regions 122a, 6 drain regions 123a, and 1 central opening 124. Each pair of adjacent source regions 122a and drain regions 123a may occupy approximately 60 degrees of the entire 360-degree circular structure, and each source region 122a (or drain region 123a) may occupy approximately 30 degrees of the entire 360-degree circular structure. This allows the detection unit 100a to further improve detection sensitivity by accumulating signals detected by more reaction regions 121a (or reaction units 1211).

[0088] In some embodiments, more reaction units can be added by adjusting the length of the reaction zone in the detection unit (the length of the detection zone), thereby allowing the detection unit to further improve the detection sensitivity by accumulating signals detected by more reaction units.

[0089] In summary, in a biochip and its manufacturing method according to one embodiment of the present invention, by making the diameter (or width) of the addition zone larger than the diameter of the liquid droplet, solution overflow due to misalignment (or misalignment) during addition can be prevented. Furthermore, by designing the addition zone's contour into a circular shape to match the shape of the liquid droplet, the surface tension of the liquid can be used to prevent overflow when the solution is too large and nearing overflow. In other words, the "self-limiting structure" formed by the biochip's own wiring in this embodiment increases alignment tolerance and can accommodate a larger amount of solution. By providing multiple reaction zones within a single detection unit to detect the same biomaterial, detection sensitivity can be improved by accumulating the signals detected by multiple reaction zones. Compared to conventional biochips, the biochip of this embodiment increases the volume of solution that can be accommodated by the fourth opening, allowing it to accommodate larger amounts of solution without worrying about overflow and cross-contamination, thereby improving the biochip's operational margin and convenience. Furthermore, because the multiple detection units in the biochip of this embodiment can be used to detect different types of biological materials, there is no need to worry about cross-contamination between different detection units due to solution overflow, thereby enabling the biochip to simultaneously detect multiple biological materials without mutual interference. Furthermore, in some embodiments, increasing the number of reaction zones in a detection unit or adjusting the length of the reaction zone (the length of the detection zone) in the detection unit to increase the number of reaction units can further improve the detection sensitivity by accumulating the signals detected by more reaction units.

[0090] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the above embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the above embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A biochip for detecting biological materials in a solution, characterized in that: Comprising at least one detection unit, wherein the at least one detection unit comprises: substrate; A first insulating layer is provided on the substrate; a semiconductor layer disposed on the first insulating layer and comprising a plurality of reaction regions; A second insulating layer is disposed on the semiconductor layer and comprises: Part I; a second portion surrounding the first portion; and a first opening separating the first portion and the second portion and exposing the plurality of reaction areas; a first metal layer disposed on the second portion and comprising a source electrode, a drain electrode, a gate electrode, and a first wall structure that are separated from each other; The second metal layer includes: a second wall structure, disposed on the first wall structure; and a bioelectrode disposed on the first portion; and The protective layer is disposed on the first metal layer and the second metal layer, has a second opening, a third opening, and a fourth opening, and includes: a flat portion covering the second portion exposed by the first metal layer and surrounding and defining the second opening; a first protrusion covering the source, the drain, and the gate, and surrounding and defining the third opening; and The second protrusion covers the second wall structure and surrounds and defines the fourth opening; wherein, in the normal direction of the substrate, the first opening, the second opening, the third opening and the fourth opening overlap.

2. The biochip according to claim 1, characterized in that The semiconductor layer also includes a source region and a drain region, the source surrounds the first opening and is electrically connected to the source region, the drain surrounds the source and is electrically connected to the drain region, the gate surrounds the drain and is electrically connected to the substrate, and the first wall structure surrounds the gate.

3. The biochip according to claim 2, characterized in that The source, the drain, the gate, and the first wall structure are in the same layer, and the first wall structure electrically insulates the source, the drain, and the gate.

4. The biochip according to claim 1, characterized in that The solution is at least disposed in the first opening, the second opening, and the third opening, and the solution contacts the bioelectrode and the plurality of reaction areas of the semiconductor layer.

5. The biochip according to claim 4, characterized in that The bio-electrode and the second enclosing wall structure are in the same layer, the bio-electrode and the second enclosing wall structure are separated from each other, and the second enclosing wall structure electrically insulates the bio-electrode.

6. The biochip according to claim 1, characterized in that The first protrusion completely surrounds the third opening, and the second protrusion completely surrounds the fourth opening.

7. The biochip according to claim 1, characterized in that In the normal direction, an upper surface of the second protrusion is higher than an upper surface of the first protrusion, and the upper surface of the first protrusion is higher than an upper surface of the flat portion.

8. The biochip according to claim 1, characterized in that The third opening is larger than the second opening, and the fourth opening is larger than the third opening.

9. The biochip according to claim 1, characterized in that The third opening comprises: an additional area, provided corresponding to the first portion; and A plurality of detection zones are connected to the addition zone and are arranged corresponding to the plurality of reaction zones.

10. A method for manufacturing a biochip, characterized in that: include: providing a substrate; forming a first insulating layer on the substrate; forming a semiconductor layer on the first insulating layer, wherein the semiconductor layer includes a plurality of reaction regions; forming a second insulating layer on the semiconductor layer, wherein the second insulating layer comprises: Part I; a second portion surrounding the first portion; and a first opening separating the first portion and the second portion and exposing the plurality of reaction areas; forming a first metal layer on the second portion, wherein the first metal layer includes a source electrode, a drain electrode, a gate electrode, and a first wall structure that are separated from each other; forming a second metal layer, wherein the second metal layer comprises: a second wall structure, disposed on the first wall structure; and a bioelectrode disposed on the first portion; and A protective layer is formed on the first metal layer and the second metal layer, wherein the protective layer has a second opening, a third opening, and a fourth opening, and includes: a flat portion covering the second portion exposed by the first metal layer and surrounding and defining the second opening; a first protrusion covering the source, the drain, and the gate, and surrounding and defining the third opening; and The second protrusion covers the second wall structure and surrounds and defines the fourth opening; wherein, in the normal direction of the substrate, the first opening, the second opening, the third opening and the fourth opening overlap.