Ion detection device with accurate and controllable position

Through the collaborative design of the high-precision drive assembly and the ultra-high vacuum cavity, the micron-level positioning of the ion beam detection assembly is achieved, solving the problem of inaccurate ion beam position adjustment in the prior art, and improving the flexibility and accuracy of detection.

CN120600619APending Publication Date: 2025-09-05SHANGHAI INST OF ORGANIC CHEM CHINESE ACAD OF SCI
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Patent Information

Application Number
CN202510771216.6
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-06-10
Publication Date
2025-09-05

AI Technical Summary

Technical Problem

The existing electron beam detectors are inaccurately adjusting the ion beam position under ultra-high vacuum conditions, resulting in measurement deviations, and traditional adjustment methods introduce additional interference to reduce signal fidelity.

Method used

The high-precision drive assembly is designed in coordination with the ultra-high vacuum cavity. Through the mechanical cooperation of telescopic bellows and scale, the micron-level positioning of the ion beam detection assembly is achieved, ensuring vacuum sealing and precise position adjustment.

Benefits of technology

It realizes accurate detection of ion beams under ultra-high vacuum conditions, improves detection flexibility and accuracy, and reduces measurement errors caused by position deviation.

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Abstract

The invention relates to an ion detection device with accurate and controllable position, which comprises an ultrahigh vacuum cavity and a high-precision driving assembly connected with the ultrahigh vacuum cavity, one interface of the ultrahigh vacuum cavity is in butt joint with a flange of the high-precision driving assembly through an interface adapter flange, an electron beam detector is carried on the high-precision driving assembly, and the electron beam detector is connected with the ultrahigh vacuum cavity. And the position of the electron beam detector in the ultrahigh vacuum cavity is adjusted by adjusting the high-precision driving assembly. Through collaborative design of the telescopic corrugated pipe and the ultrahigh vacuum cavity, it is guaranteed that the vacuum sealing performance is not damaged in the mechanical displacement process, and maintenance of the internal vacuum environment is guaranteed on the basis of high-precision adjustment; and the high-precision threaded driving rod is mechanically matched with the graduated scale, so that micron-sized positioning in the adjusting process is realized. The core problem that a traditional fixed detector cannot dynamically track the position of the ion beam is solved, and the detection flexibility and accuracy are remarkably improved.
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Description

Technical Field

[0001] The present invention relates to the technical field of electronic detectors, and in particular to an ion detection device with precisely controllable position. Background Art

[0002] An electron beam detector is a precision detection device that generates signals from the interaction of an electron beam with matter. By collecting and analyzing these signals, it can detect the sample's surface morphology, composition, or defects. Its core components include an electron source, a signal detector, and a supporting vacuum system. The vacuum system maintains an ultra-high vacuum environment to prevent interference from collisions between the electron beam and gas molecules.

[0003] Most current electron beam detectors in ultra-high vacuum systems typically use fixed mounting arrangements, which suffer from insufficient spatial coverage and reliance on indirect adjustment. During experiments, the ion beam can shift position due to factors such as electromagnetic field fluctuations and beam propagation path drift. Fixed detectors can only capture signals from a localized area, leading to measurement errors. Existing technologies often indirectly adjust the ion beam path by adjusting ion source parameters or external magnetic or electric fields, but these methods introduce additional interference and reduce signal fidelity.

[0004] For ultra-high vacuum systems, in order to achieve accurate detection of ions under ultra-high vacuum conditions, it is necessary to clearly define the position of the ion beam and precisely adjust the position of the ion detector to ensure that the ion beam can achieve high-fidelity detection at different positions. Existing technologies such as CN101581788A gas scintillation proportional counter, CN107917924B low-energy backscattered electron detector, and CN113758990A a reflective TOF device for integrated cluster beam deposition all consider how to better accumulate charges on the detector surface, but lack a design for how to ensure precise position drive during ion beam detection. Summary of the Invention

[0005] In order to solve the above-mentioned technical problems, an ion detection device with precise and controllable position is provided.

[0006] The technical means adopted in the present invention are as follows:

[0007] A precisely positionable ion detection device comprises an ultra-high vacuum chamber and a high-precision drive assembly connected thereto. One of the interfaces of the ultra-high vacuum chamber is docked with the flange of the high-precision drive assembly via an interface adapter flange. The ion beam detection assembly is mounted on the high-precision drive assembly. The position of the ion beam detection assembly in the ultra-high vacuum chamber is adjusted by adjusting the high-precision drive assembly to achieve ion intensity detection at different positions.

[0008] Furthermore, a port for ion injection is provided on the side of the ultra-high vacuum chamber opposite to the side where the high-precision drive component is located. The port is provided with a vacuum flange. The ions to be detected are transmitted through the ultra-high vacuum chamber to the detection port of the ion beam detection component. The ions are in an ultra-high vacuum environment during the transmission process.

[0009] Furthermore, the ion beam detection assembly includes an electron beam detector, an electron beam detector connector, an electron beam detector connecting rod and an electrical signal terminal connecting flange. The electron beam detector is arranged on a supporting pallet, and the supporting pallet is fixedly connected to the electron beam detector connector. The electron beam detector connector and the electrical signal terminal connecting flange are connected through the electron beam detector connecting rod. The electrical signal terminal connecting flange is provided with a power supply connecting terminal and a signal output terminal, each terminal is connected to the electron beam detector, and the connecting circuit is arranged in the electron beam detector connecting rod.

[0010] Furthermore, the power supply connection terminal includes a 6-10 kV power supply connection terminal and a 3-5 kV power supply connection terminal.

[0011] Furthermore, a high-voltage protection cover is sleeved on the outside of the ion beam detection component.

[0012] Furthermore, the high-precision drive assembly includes a fixed flange connection plate, a linear drive module, a linear movable position flange and a telescopic bellows. The fixed flange connection plate is used to be fixedly connected to the interface adapter flange. One end of the telescopic bellows is connected to the fixed flange connection plate, and the other end is connected to the linear movable position flange. The linear movable position flange is connected to the drive device.

[0013] Furthermore, the linear drive module includes a linear drive bracket, the linear drive bracket is provided with a position marking scale, and the end surface of the linear movable position flange is provided with a position sliding pointer.

[0014] Furthermore, a side port of the ultra-high vacuum chamber is connected to a window flange.

[0015] Compared with existing technologies, this invention offers the following advantages: The coordinated design of the telescopic bellows and the ultra-high vacuum chamber ensures that the vacuum seal is not compromised during mechanical displacement, maintaining the internal vacuum environment while ensuring high-precision adjustment. The mechanical coordination of the high-precision threaded drive rod and the graduated scale enables micron-level positioning during adjustment. This solves the core issue of traditional fixed detectors, which cannot dynamically track the position of the ion beam, significantly improving detection flexibility and accuracy. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative labor.

[0017] Figure 1 It is a structural schematic diagram of the present invention.

[0018] Figure 2 It is the rear view of the structure of the present invention.

[0019] Figure 3 It is an oblique side view of the present invention.

[0020] Figure 4 Assembly diagram of the electron multiplier and its connecting support rods.

[0021] Figure 5 This is an isometric view of the exploded and disassembled embodiment of the present invention.

[0022] Figure 6 This is the exploded front view of the present invention.

[0023] Figure 7 This is an isometric view of the ion beam detection assembly of the present invention.

[0024] Figure 8 This is an exploded view of the ion beam detection assembly of the present invention.

[0025] Figure 9 This is a schematic diagram of the specific structure of the high-precision drive slide assembly of the present invention.

[0026] Figure 10 Schematic diagram for adjusting the ion beam detection component to a position closer to the ion beam outlet.

[0027] Figure 11 In order to adjust the ion beam detection component to a position closer to the ion beam outlet, observe the schematic diagram through the window.

[0028] Figure 12 Schematic diagram for adjusting the ion beam detection component to a position farther away from the ion beam outlet.

[0029] Figure 13 The schematic diagram is observed through the window in order to adjust the ion beam detection component to a position farther away from the ion beam outlet.

[0030] In the figure: 001: ultra-high vacuum chamber; 002: high-precision drive assembly; 003: anti-high-voltage protective cover; 004: ion beam detection assembly; 005: interface adapter flange; 006: ion transmission outlet assembly; 101: 6kV-10kV power supply connection terminal; 102: 3kV-5kV power supply connection terminal; 103: signal output terminal; 104: electrical signal terminal connection flange; 105: connecting rod fastener; 106: electron beam detector connecting rod; 107: electron beam detector connector; 108: electron beam detector; 201: linear movable position flange; 202: telescopic bellows; 203: fixed flange port connection plate; 204: linear drive bracket; 205: position markable scale; 206: manual rotation handle; 207: position sliding pointer; 208: ball screw. DETAILED DESCRIPTION

[0031] It should be noted that, in the absence of conflict, the embodiments and features of the embodiments of the present invention can be combined with each other. The present invention will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.

[0032] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. The following description of at least one exemplary embodiment is actually only illustrative and is in no way intended to limit the present invention and its application or use. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the present invention.

[0033] It should be noted that the terms used herein are only for describing specific embodiments and are not intended to limit the exemplary embodiments according to the present invention. As used herein, unless the context clearly indicates otherwise, the singular form is intended to include the plural form. In addition, it should be understood that when the terms "comprise" and / or "include" are used in this specification, they indicate the presence of features, steps, operations, devices, components and / or combinations thereof.

[0034] Unless otherwise specified, the relative arrangement of the parts and steps, numerical expressions and numerical values ​​set forth in these embodiments do not limit the scope of the present invention. At the same time, it should be clear that, for ease of description, the sizes of the various parts shown in the accompanying drawings are not drawn according to actual proportional relationships. The technology, methods and equipment known to those of ordinary skill in the relevant art may not be discussed in detail, but in appropriate cases, the technology, methods and equipment should be considered as a part of the specification. In all examples shown and discussed here, any specific value should be interpreted as being merely exemplary, rather than as a limitation. Therefore, other examples of the exemplary embodiments can have different values. It should be noted that similar numbers and letters represent similar items in the following drawings, and therefore, once an item is defined in an accompanying drawing, it does not need to be further discussed in subsequent drawings.

[0035] In the description of the present invention, it should be understood that the directions or positional relationships indicated by directional words such as "front, back, up, down, left, right", "horizontal, vertical, vertical, horizontal" and "top, bottom" are usually based on the directions or positional relationships shown in the accompanying drawings. They are only for the convenience of describing the present invention and simplifying the description. Unless otherwise specified, these directional words do not indicate or imply that the device or element referred to must have a specific direction or be constructed and operated in a specific direction. Therefore, they cannot be understood as limiting the scope of protection of the present invention: the directional words "inside and outside" refer to the inside and outside relative to the outline of each component itself.

[0036] For ease of description, spatially relative terms such as "above", "above", "on the upper surface of", "above", etc. may be used herein to describe the spatial positional relationship of a device or feature to other devices or features as shown in the figures. It should be understood that spatially relative terms are intended to include different orientations of the device in use or operation in addition to the orientation described in the figures. For example, if the device in the drawings is inverted, the device described as "above other devices or structures" or "above other devices or structures" will be positioned as "below other devices or structures" or "below their position devices or structures". Thus, the exemplary term "above" can include both "above" and "below". The device can also be positioned in other different ways (rotated 90 degrees or in other orientations), and the spatially relative descriptions used here are interpreted accordingly.

[0037] In addition, it should be noted that the use of terms such as "first" and "second" to limit components is only for the convenience of distinguishing the corresponding components. Unless otherwise stated, the above terms have no special meaning and therefore cannot be understood as limiting the scope of protection of the present invention.

[0038] like Figures 1 to 13As shown, an embodiment of the present invention discloses an ion detection device with precise and controllable position, including an ultra-high vacuum chamber 001 and a high-precision drive component 002 connected thereto, one of the interfaces of the ultra-high vacuum chamber is docked with the flange of the high-precision drive component through an interface adapter flange 005, and the ion beam detection component 004 is mounted on the high-precision drive component. The position of the ion beam detection component in the ultra-high vacuum chamber is adjusted by adjusting the high-precision drive component to achieve intensity detection of ions at different positions. During the experiment, after the ion transmission outlet component 006 is docked with the ultra-high vacuum chamber, the release of the ions to be detected is controlled while ensuring the vacuum. During the transmission process at the front end, the front end of the ion transmission outlet component 006 is connected to a multi-stage differential device to ensure that the ions are in an ultra-high vacuum state at the detector position. The operation process of the ion transmission outlet component 006 can be achieved using existing technology.

[0039] The present invention can accurately adjust the position of the ion beam detection component under vacuum conditions and can be used for detecting high beam intensity of ions. The present invention can ensure that during the movement of the ion beam detection component, the interconnected detection chambers always maintain high vacuum, and the vacuum degree remains unchanged during the movement of the ion beam detection component. The present invention can reasonably move the ion detection device according to the position of the ion beam flow to achieve accurate detection of the ion beam. Specifically, the vacuum pump is turned on to evacuate the vacuum, and when the vacuum degree reaches 10 -8 When the pressure reaches the mbar level, subsequent operations can be performed.

[0040] Furthermore, a port for ion injection is provided on the side of the ultra-high vacuum chamber opposite to the side where the high-precision drive component is located. The port is provided with a vacuum flange. The ions to be detected are transmitted through the ultra-high vacuum chamber to the detection port of the ion beam detection component. The ions are in an ultra-high vacuum environment during the transmission process.

[0041] Furthermore, the ion beam detection assembly includes an electron beam detector 108, an electron beam detector connector 107, an electron beam detector connecting rod 106 and an electrical signal terminal connecting flange 104. The electron beam detector is arranged on a supporting plate, and the supporting plate is fixedly connected to the electron beam detector connector. The electron beam detector connector and the electrical signal terminal connecting flange are connected through the electron beam detector connecting rod. The electrical signal terminal connecting flange is provided with a power supply connecting terminal and a signal output terminal 103. Each terminal is connected to the electron beam detector, and the connection circuit is provided in the electron beam detector connecting rod. Among them, a connecting rod fastener 105 is provided at the connection between the electron beam detector connecting rod 106 and the electrical signal terminal connecting flange 104. The connecting rod fastener 105 is made of insulating material. The electron beam detector connecting rod can be made of alumina ceramic material to ensure high voltage insulation while reducing the influence of thermal expansion on positioning accuracy.

[0042] Furthermore, the power supply terminals include a 6-10kV power supply terminal 101 and a 3-5kV power supply terminal 102. Specifically, the rated voltage ranges of the power supply terminals are 6-10kV and 3-5kV, respectively. These terminals are used to power and operate the electron beam detector 108 under different voltage conditions. The signal output terminal 103 is used to output the signal obtained by the electron beam detector and transmit it to a host computer for display.

[0043] Furthermore, in order to prevent the user from accidentally getting an electric shock during use and to provide effective safety protection for the user, a high-voltage protection cover 003 is provided on the outside of the ion beam detection component.

[0044] Furthermore, the high-precision drive assembly includes a fixed flange connection plate 203, a linear drive module, a linearly movable position flange 201, and a telescopic bellows 202. The fixed flange connection plate is fixedly connected to the interface adapter flange. One end of the telescopic bellows is connected to the fixed flange connection plate, and the other end is connected to the linearly movable position flange, which is connected to the drive device. The electrical signal terminal connection flange 104 is connected to the linearly movable position flange 201. The telescopic bellows can be made of stainless steel bellows, which combines elastic deformation capability with ultra-high vacuum sealing.

[0045] In this embodiment, the driving device includes a manual rotating handle and a ball screw 208. The nut end of the ball screw is connected to the linear movable position flange. By rotating the manual rotating handle, the position of the linear movable position flange is adjusted, and then the position of the electrical signal terminal connecting flange 104 is adjusted, and then the position of the electron beam detector 108 is adjusted.

[0046] In this embodiment, the adjustment step of the high-precision drive assembly is controllable. Specifically, the adjustment accuracy of 5 μm is achieved by adjusting the pitch of the thread of the ball screw in combination with a scale.

[0047] Furthermore, the linear drive module includes a linear drive bracket 204 , a position marking scale 205 is provided on the linear drive bracket, and a position sliding pointer 207 is provided on the end surface of the linear movable position flange.

[0048] During specific use, when the manual rotating handle is rotated, the ball screw 208 drives the linear movable position flange to slide back and forth, and the position is fine-tuned by aligning the sliding pointer with the scale.

[0049] As another alternative embodiment, any device capable of rotating the handle to drive the linearly movable flange can be used. That is, the aforementioned drive device can be adjusted according to the specific application scenario. For example, the handwheel can transmit rotation to the linearly movable flange via a bevel gear set, with the driving bevel gear coaxial with the handwheel and the driven bevel gear connected to the linearly movable flange arranged orthogonally to the axis. The transmission ratio is determined by the gear ratio.

[0050] Of course, as an expandable implementation method, the manual rotary handle can be equipped with a stepper motor to achieve automated fine operation. This effectively shortens the adjustment time from manual operation by staff, making it suitable for scenarios where rapid scanning of ion beam distribution is required.

[0051] Furthermore, a window flange is connected to the side port of the ultra-high vacuum chamber. This allows for observation of the chamber's internal state while achieving ultra-high vacuum, facilitating experiments with different ion beam detection assembly 004 distances.

[0052] As an expandable implementation method, the ultra-high vacuum chamber of the present invention is also shown in the figure. It has multiple interfaces. According to different experiments, multiple interface adapter flanges can be added to the side wall of the chamber, and 2-3 ion beam detection components can be installed at the same time. Through time-sharing multiplexing or synchronous acquisition mode, a larger detection area can be covered to carry out expanded ion beam detection experiments, which is suitable for large-area samples or scenarios with large ion beam divergence angles.

[0053] By adjusting the high-precision drive assembly, the ion beam detector can be moved to a controllable distance from the ion transmission outlet, thereby detecting the ion beam intensity at a closer distance.

[0054] exist Figure 10 and Figure 11 In the application scenario shown, the ion beam detection component 004 is moved to a relatively close distance from the ion transmission outlet component 006 to achieve ion detection in one of the application scenarios. Specifically, detection close to the ion beam outlet area can effectively reduce energy loss and scattering effects during ion transmission, thereby improving signal capture efficiency and sensitivity. This feature is similar to the electric field screening principle of a quadrupole mass analyzer, which achieves selective focusing and separation of ions by optimizing the electric field parameters. Similar to the RF / DC composite field mode of the quadrupole, the present invention can adjust the electromagnetic field parameters in the ion beam outlet area to make ions of different m / z differ in their motion trajectories, and then achieve precise distinction through spatial or temporal resolution detection, thereby achieving highly sensitive detection of ions.

[0055] exist Figure 12 and Figure 13In the illustrated application scenario, ion beam detection assembly 004 is moved relatively far from ion transmission outlet assembly 006 to enable ion detection in other application scenarios. Specifically, a sample deposition target for capturing and immobilizing ions, or a Faraday disk with integrated charge measurement capabilities for real-time monitoring of the deposited ion flux, can be placed within the chamber to enable ion deposition in addition to ion detection.

[0056] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the above embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the above embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A position-accurate and controllable ion detection device, characterized in that: It includes an ultra-high vacuum chamber and a high-precision drive component connected to it. One of the interfaces of the ultra-high vacuum chamber is connected to the flange of the high-precision drive component through an interface adapter flange. The ion beam detection component is mounted on the high-precision drive component. The position of the ion beam detection component in the ultra-high vacuum chamber is adjusted by adjusting the high-precision drive component to realize ion intensity detection at different positions.

2. The position-accurate and controllable ion detection device according to claim 1, characterized in that: A port for ion injection is provided on the side of the ultra-high vacuum chamber opposite to the side where the high-precision drive component is located. The port is provided with a vacuum flange. The ions to be detected are transmitted to the detection port of the ion beam detection component through the ultra-high vacuum chamber. The ions are in an ultra-high vacuum environment during the transmission process.

3. The position-accurate and controllable ion detection device according to claim 1, characterized in that: The ion beam detection assembly includes an electron beam detector, an electron beam detector connector, an electron beam detector connecting rod and an electrical signal terminal connecting flange. The electron beam detector is arranged on a supporting pallet, and the supporting pallet is fixedly connected to the electron beam detector connector. The electron beam detector connector and the electrical signal terminal connecting flange are connected through the electron beam detector connecting rod. The electrical signal terminal connecting flange is provided with a power supply connecting terminal and a signal output terminal, each terminal is connected to the electron beam detector, and a connecting circuit is arranged in the electron beam detector connecting rod.

4. The position-accurate and controllable ion detection device according to claim 3, characterized in that: The power supply connection terminals include a 6-10 kV power supply connection terminal and a 3-5 kV power supply connection terminal.

5. The position-accurate and controllable ion detection device according to claim 1, characterized in that: The exterior of the ion beam detection assembly is covered with a high-voltage protection cover.

6. The position-accurate and controllable ion detection device according to claim 1, characterized in that: The high-precision drive assembly includes a fixed flange connection plate, a linear drive module, a linear movable position flange and a telescopic bellows. The fixed flange connection plate is used to be fixedly connected to the interface adapter flange. One end of the telescopic bellows is connected to the fixed flange connection plate, and the other end is connected to the linear movable position flange. The linear movable position flange is connected to the drive device.

7. The position-accurate and controllable ion detection device according to claim 1, characterized in that: The linear drive module includes a linear drive bracket, a position marking scale is provided on the linear drive bracket, and a position sliding pointer is provided on the end surface of the linear movable position flange.

8. The position-accurate and controllable ion detection device according to claim 1, characterized in that: The side port of the ultra-high vacuum chamber is connected with a window flange.

Citation Information

Patent Citations

  • Gas scintillation proportional counter

    CN101581788A

  • Low-energy backscattered electron detector

    CN107917924B

  • Reflective TOF device for cluster beam comprehensive deposition

    CN113758990A