High-precision photoetching device for electronic component production

Abstract

The invention provides a high-precision photoetching device for production of electronic components, and relates to the field of photoetching devices, the high-precision photoetching device comprises a photoetching machine main body, a clean room sealing door, a fixed connecting plate, a rubber connecting bag, a sliding connecting plate, a switch extrusion rod and a push type switch; the clean room sealing door is connected to the front side of the photoetching machine main body in a sliding manner; the fixed connecting plate is fixedly connected to the left side of the photoetching machine main body; the rubber connecting bag is adhered to the right end surface of the fixed connecting plate; the sliding connecting plate is connected to the left side of the photoetching machine main body in a sliding manner; the switch extrusion rod is fixedly connected to the inner side of the sliding connection plate; according to the invention, inconvenience caused by regular inspection of the sealing rubber pad is avoided, a lot of time is saved, the production efficiency of electronic components is improved, and the problems that frequent inspection of the rubber pad consumes a long time and the production efficiency of the electronic components is affected are solved.

Description

Technical Field

[0001] The present invention relates to the technical field of photolithography devices, and in particular to a high-precision photolithography device for producing electronic components. Background Art

[0002] When producing electronic components, the integrated circuit pattern needs to be engraved on the wafer through a photolithography machine. During the photolithography process, the staff needs to first place the wafer to be processed on the wafer table in the clean room, and then close the sealed door of the clean room to prevent dust from entering the clean room. At this time, the light source system emits light of a specific wavelength, which is shaped and focused by the optical system and then irradiated onto the mask on the mask table. The mask table and the wafer table are precisely aligned with the help of the alignment system. The control system then triggers the exposure system to project the pattern on the mask onto the photoresist layer on the wafer through light, completing one exposure. After that, the wafer table will move to the next exposure area and repeat the above process until the pattern on the entire wafer is completed by photolithography.

[0003] For example, CN111913369B discloses a step-type high-precision lithography machine, which includes a workbench, a laser, a beam straightener, an energy controller, an energy detector, a beam shape setting, etc.; the laser, beam straightener, energy controller, and control console are arranged outside the closed frame; a vibration damper is provided at the bottom of the closed frame; the energy detector, light shield, beam shape setting, energy controller, and beam straightener are located on the same horizontal line and are arranged in sequence from left to right, etc.; the present invention uses a temperature control device to timely adjust the temperature difference between the objective lens, the mask, and the mask table; the signal in the closed frame is frequency-converted by a tuner; the objective lens is locked or released by an adjuster so that the objective lens can be adjusted to prevent the objective lens from expanding or contracting under the irradiation of the laser beam, so that the etched pattern can be accurate, thus achieving the effect of rapid frequency conversion and accurate etching.

[0004] However, the sealed doors of clean rooms are mostly sealed by rubber gaskets, which are prone to sealing failure after long-term use and need to be replaced in time. Therefore, staff need to regularly check the use of rubber gaskets. However, frequent inspections of rubber gaskets take a long time, which not only leads to longer downtime of the lithography machine and affects the production efficiency of electronic components, but also leads to a heavy labor burden for staff. Summary of the Invention

[0005] In view of this, the present invention provides a high-precision lithography device for the production of electronic components, which facilitates workers to judge the sealing condition of the clean room, enables workers to replace failed sealing rubber gaskets in time, effectively avoids the situation where dust enters the clean room and affects the lithography effect when the seal fails, ensures image clarity, improves the production quality of electronic components, avoids the inconvenience of regular inspection of the sealing rubber gasket, saves a lot of time, and at the same time improves the inspection efficiency of the sealing rubber gasket, reduces the downtime of the lithography machine, improves the production efficiency of electronic components, and reduces the labor burden of workers. The first positioning magnet and the second positioning magnet can make the sealing rubber gasket on the left side of the clean room sealing door fit tightly with the lithography machine body, effectively avoiding the situation where the clean room sealing door is not closed due to operational errors. The positioning mask stage and the mask are cooled by the cooling liquid delivery pipe, effectively avoiding the situation where the mask is deformed by temperature, effectively reducing the distortion of the lithography image, ensuring the lithography accuracy, and further improving the lithography effect. By changing the height and angle of the mask, it is convenient to perform lithography on different wafers, and effectively ensuring the applicability of the lithography machine.

[0006] The present invention provides a high-precision lithography device for producing electronic components, specifically comprising: a lithography machine body, a clean room sealing door, a fixed connecting plate, a rubber connecting bag, a detection structure, an adjustment structure, a sliding connecting plate, a switch extrusion rod and a push-type switch; the clean room sealing door is connected to the front side of the lithography machine body in a left-right sliding manner; the fixed connecting plate is fixedly connected to the left side of the lithography machine body; the rubber connecting bag is adhered to the right end surface of the fixed connecting plate, and an air inlet is opened on the front side of the rubber connecting bag; the detection structure is arranged on the upper part of the lithography machine body; the sliding connecting plate is connected to the left side of the lithography machine body in a left-right sliding manner, and the sliding connecting plate is adhered to the right side of the rubber connecting bag; the switch extrusion rod is fixedly connected to the inner side of the sliding connecting plate; the push-type switch is arranged on the inner side of the fixed connecting plate, and an audible and visual alarm is arranged on the outer side of the lithography machine body, and the push-type switch is connected in series with the control circuit of the audible and visual alarm; the adjustment structure is arranged on the inner side of the lithography machine body.

[0007] Furthermore, the detection structure includes a first positioning magnet and a position limiting baffle; there are multiple first positioning magnets, and the multiple first positioning magnets are evenly distributed and fixedly connected to the front side of the photolithography machine body; there are two position limiting baffles, and both of the two position limiting baffles are fixedly connected to the front side of the photolithography machine body, and sealing strips are bonded to the inner sides of the two position limiting baffles.

[0008] Furthermore, the detection structure also includes a sealing rubber pad and a second positioning magnet; the sealing rubber pad is bonded to the left side of the clean room sealed door; a plurality of second positioning magnets are provided, and the plurality of second positioning magnets are evenly distributed and fixedly connected to the left side of the clean room sealed door.

[0009] Furthermore, the detection structure also includes an air circulation tube and a reset elastic member; the air circulation tube is fixedly connected to the rubber connecting bag after passing through the fixed connecting plate, and the air circulation tube is communicated with the rubber connecting bag; the sliding connecting plate is elastically connected to the photolithography machine body through the reset elastic member; two vacuum pumps are provided on the left side of the photolithography machine body, and the air inlet end of the front vacuum pump is fixedly connected to the air circulation tube.

[0010] Furthermore, the adjustment structure includes a height adjustment electric push rod and a sliding mounting seat; the height adjustment electric push rod is bolted to the rear side of the photolithography machine body; the sliding mounting seat is connected to the rear side of the photolithography machine body in an up and down sliding manner, and the sliding mounting seat is fixedly connected to the piston rod of the height adjustment electric push rod.

[0011] Furthermore, the adjustment structure also includes a positioning mask stage, a cooling liquid delivery pipe and an air circulation hole; the positioning mask stage is hinged to the upper part of the sliding mounting seat, and the positioning mask stage is composed of two assembly plates; the cooling liquid delivery pipe is fixedly connected to the inner side of the positioning mask stage, and a cooling liquid delivery pump is provided at the lower part of the photolithography machine body, and the output end of the cooling liquid delivery pump is fixedly connected to the cooling liquid delivery pipe; there are multiple air circulation holes, and the multiple air circulation holes are evenly distributed on the upper part of the assembly plate above the positioning mask stage, and the multiple air circulation holes are connected to the air inlet end of the rear vacuum pump through pipes.

[0012] Furthermore, the adjustment structure also includes a positioning mounting box and a reciprocating self-locking drive member; the positioning mounting box is fixedly connected to the lower part of the sliding mounting seat; and the reciprocating self-locking drive member is bolted to the inner side of the positioning mounting box.

[0013] Furthermore, the adjustment structure also includes an active transmission worm and a driven transmission turbine; the active transmission worm is rotatably connected to the inner side of the positioning mounting box, and the active transmission worm is coaxially fixedly connected to the output shaft of the reciprocating self-locking drive member; the driven transmission turbine is rotatably connected to the lower part of the positioning mounting box, and the driven transmission turbine and the active transmission worm are engaged with each other.

[0014] Furthermore, the adjustment structure also includes a first limit link and a second limit link; the first limit link is hinged at the lower part of the sliding mounting seat, and the first limit link is fixedly connected to the driven transmission turbine; the second limit link is hinged at the lower part of the positioning mask table, and the second limit link is hinged to the first limit link. Beneficial effects

[0015] The present invention causes the switch extrusion rod to squeeze the push-type switch to turn off the sound and light alarm through the contraction of the rubber connecting bag, thereby facilitating the staff to judge the sealing condition of the clean room and enabling the staff to replace the failed sealing rubber gasket in time, effectively preventing dust from entering the clean room and affecting the photolithography effect when the seal fails, ensuring image clarity, improving the production quality of electronic components, avoiding the inconvenience of regular inspection of the sealing rubber gasket, saving a lot of time, and simultaneously improving the inspection efficiency of the sealing rubber gasket, reducing the downtime of the photolithography machine, improving the production efficiency of electronic components, and reducing the labor burden of the staff. The first positioning magnet and the second positioning magnet can make the sealing rubber gasket on the left side of the clean room sealing door fit tightly with the photolithography machine body, effectively preventing the clean room sealing door from being not closed due to operational errors. The positioning mask stage and the mask are cooled by the cooling liquid delivery pipe, effectively preventing the mask from being deformed due to temperature, effectively reducing the distortion of the photolithography image, ensuring the photolithography accuracy, and further improving the photolithography effect. By changing the height and angle of the mask, different wafers can be easily photolithographically processed, effectively ensuring the applicability of the photolithography machine. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings of the embodiments are briefly introduced below.

[0017] The drawings described below only relate to some embodiments of the present invention, but are not intended to limit the present invention.

[0018] In the attached figure: Figure 1 It is a schematic diagram of the overall structure of the present invention.

[0019] Figure 2 It is a schematic diagram of the disassembled structure of the photolithography machine main body and the clean room sealing door of the present invention.

[0020] Figure 3 It is a schematic diagram of the positions of the sealing rubber pad and the second positioning magnet of the present invention.

[0021] Figure 4 It is a schematic diagram of the positions of the fixed connecting plate, the rubber connecting bag and the sliding connecting plate of the present invention.

[0022] Figure 5It is a schematic diagram of the positions of the switch extrusion rod and the push-type switch of the present invention.

[0023] Figure 6 It is a schematic diagram of the positional relationship among the height-adjusting electric push rod, the sliding mounting seat and the positioning mask stage of the present invention.

[0024] Figure 7 It is a schematic diagram of the split structure of the positioning mask stage of the present invention.

[0025] Figure 8 It is a schematic diagram of the positions of the first limiting link and the second limiting link of the present invention.

[0026] Reference Signs List 1. Photolithography machine body; 101. First positioning magnet; 102. Position limiting baffle; 103. Height adjustment electric push rod; 104. Sliding mounting seat; 105. Positioning mask stage; 106. Cooling liquid delivery pipe; 107. Positioning mounting box; 108. Reciprocating self-locking drive member; 109. Active transmission worm; 110. Driven transmission turbine; 111. First limiting link; 112. Second limiting link; 113. Air circulation hole; 2. Clean room sealing door; 201. Sealing rubber pad; 202. Second positioning magnet; 3. Fixed connecting plate; 301. Air circulation pipe; 4. Rubber connecting bag; 5. Sliding connecting plate; 501. Resetting elastic member; 6. Switch extrusion rod; 7. Push-type switch. DETAILED DESCRIPTION Example 1

[0027] Please refer to Figures 1 to 5 As shown: The present invention provides a high-precision photolithography device for producing electronic components, comprising a photolithography machine body 1, a clean room sealing door 2, a fixed connecting plate 3, a rubber connecting bag 4, a detection structure, a sliding connecting plate 5, a switch extrusion rod 6 and a push-type switch 7; the clean room sealing door 2 is slidably connected to the front side of the photolithography machine body 1 left and right; the fixed connecting plate 3 is fixedly connected to the left side of the photolithography machine body 1; the rubber connecting bag 4 is adhered to the right end surface of the fixed connecting plate 3, and an air inlet is opened on the front side of the rubber connecting bag 4; the detection structure is arranged on the upper part of the photolithography machine body 1; the sliding connecting plate 5 is slidably connected to the left side of the photolithography machine body 1 left and right, and the sliding connecting plate 5 is adhered to the right side of the rubber connecting bag 4; the switch extrusion rod 6 is fixedly connected to the inner side of the sliding connecting plate 5; the push-type switch 7 is arranged on the inner side of the fixed connecting plate 3, an audible and visual alarm is arranged on the outer side of the photolithography machine body 1, and the push-type switch 7 is connected in series with a control circuit of the audible and visual alarm.

[0028] Among them, the detection structure includes a first positioning magnet 101 and a position limiting baffle 102; there are multiple first positioning magnets 101, and the multiple first positioning magnets 101 are evenly distributed and fixedly connected to the front side of the lithography machine body 1; there are two position limiting baffles 102, and the two position limiting baffles 102 are both fixedly connected to the front side of the lithography machine body 1, and the inner sides of the two position limiting baffles 102 are bonded with sealing strips.

[0029] Among them, the detection structure also includes a sealing rubber pad 201 and a second positioning magnet 202; the sealing rubber pad 201 is bonded to the left side of the clean room sealing door 2; there are multiple second positioning magnets 202, and the multiple second positioning magnets 202 are evenly distributed and fixedly connected to the left side of the clean room sealing door 2.

[0030] Among them, the detection structure also includes an air circulation tube 301 and a reset elastic member 501; the air circulation tube 301 passes through the fixed connecting plate 3 and is fixedly connected to the rubber connecting bag 4, and the air circulation tube 301 is communicated with the rubber connecting bag 4; the sliding connecting plate 5 is elastically connected to the lithography machine body 1 through the reset elastic member 501; two vacuum pumps are arranged on the left side of the lithography machine body 1, and the air inlet end of the front vacuum pump is fixedly connected to the air circulation tube 301.

[0031] The specific usage and function of this embodiment: When performing photolithography processing on electronic components, the staff first places the wafer to be processed on the wafer table of the clean room, and closes the clean room sealing door 2 after placing the wafer. At this time, the first positioning magnet 101 and the second positioning magnet 202 attract each other, so that the sealing rubber gasket 201 on the left side of the clean room sealing door 2 fits tightly with the photolithography machine body 1, so that the clean room is kept in a sealed state, the position limiting baffle 102 can limit the sliding of the clean room sealing door 2, and the sealing strip inside the position limiting baffle 102 can ensure the seal between the position limiting baffle 102 and the clean room sealing door 2. After closing the clean room sealing door 2, the vacuum pump in front passes through the air circulation pipe 3 01 Extract the air inside the rubber connecting bag 4, so that the rubber connecting bag 4 shrinks and drives the sliding connecting plate 5 to slide to the left close to the fixed connecting plate 3. When the sliding connecting plate 5 slides, it will drive the switch squeezing rod 6 to move to the left to squeeze the push-type switch 7. After the push-type switch 7 is squeezed, the sound and light alarm will be turned off to remind the staff that the clean room is in a sealed state at this time. If the sealing rubber pad 201 fails to seal, air will continue to enter the rubber connecting bag 4 from the air inlet of the rubber connecting bag 4, making the rubber connecting bag 4 unable to shrink. At this time, the sound and light alarm cannot be turned off, and the staff can replace the sealing rubber pad 201 in time. After opening the clean room sealing door 2, the reset elastic member 501 will push the sliding connecting plate 5 to reset. Example 2

[0032] like Figures 4 to 8 As shown: On the basis of the first embodiment, an adjustment structure is further included; the adjustment structure is arranged on the inner side of the lithography machine body 1 .

[0033] Among them, the adjustment structure includes a height adjustment electric push rod 103 and a sliding mounting seat 104; the height adjustment electric push rod 103 is bolted to the rear side of the lithography machine body 1; the sliding mounting seat 104 is connected to the rear side of the lithography machine body 1 for sliding up and down, and the sliding mounting seat 104 is fixedly connected to the piston rod of the height adjustment electric push rod 103.

[0034] Among them, the adjustment structure also includes a positioning mask stage 105, a cooling liquid delivery pipe 106 and an air circulation hole 113; the positioning mask stage 105 is hinged on the upper part of the sliding mounting seat 104, and the positioning mask stage 105 consists of two assembly plates; the cooling liquid delivery pipe 106 is fixedly connected to the inner side of the positioning mask stage 105, and a cooling liquid delivery pump is provided at the lower part of the lithography machine body 1, and the output end of the cooling liquid delivery pump is fixedly connected to the cooling liquid delivery pipe 106; there are multiple air circulation holes 113, and the multiple air circulation holes 113 are evenly distributed on the upper part of the assembly plate above the positioning mask stage 105, and the multiple air circulation holes 113 are all connected to the air inlet end of the rear vacuum pump through pipes.

[0035] The adjustment structure further includes a positioning mounting box 107 and a reciprocating self-locking drive member 108 ; the positioning mounting box 107 is fixedly connected to the lower portion of the sliding mounting seat 104 ; and the reciprocating self-locking drive member 108 is bolted to the inner side of the positioning mounting box 107 .

[0036] Among them, the adjustment structure also includes an active transmission worm 109 and a driven transmission turbine 110; the active transmission worm 109 is rotatably connected to the inner side of the positioning mounting box 107, and the active transmission worm 109 is coaxially fixedly connected to the output shaft of the reciprocating self-locking drive member 108; the driven transmission turbine 110 is rotatably connected to the lower part of the positioning mounting box 107, and the driven transmission turbine 110 and the active transmission worm 109 are engaged with each other.

[0037] Among them, the adjustment structure also includes a first limiting link 111 and a second limiting link 112; the first limiting link 111 is hinged at the lower part of the sliding mounting seat 104, and the first limiting link 111 is fixedly connected to the driven transmission turbine 110; the second limiting link 112 is hinged at the lower part of the positioning mask table 105, and the second limiting link 112 is hinged to the first limiting link 111.

[0038] The specific usage and function of this embodiment are as follows: After the reticle is placed on the positioning mask stage 105, the vacuum pump at the rear adsorbs the reticle on the positioning mask stage 105 through the air circulation holes 113, ensuring the stability of the reticle position. When the height of the reticle needs to be adjusted, the height adjustment electric push rod 103 pushes the sliding mounting seat 104 to slide up and down to change the height of the reticle. When the angle of the reticle needs to be adjusted, the reciprocating self-locking drive member 108 inside the positioning mounting box 107 drives the active transmission worm 109 to rotate. When the active transmission worm 109 rotates, it drives the driven transmission turbine 110 and the first limiting link 111 to rotate. When the first limiting link 111 rotates, it drives the second limiting link 112 and the positioning mask stage 105 to swing and change the angle of the reticle. When the temperature of the reticle rises due to light, the coolant delivery pump delivers coolant to the coolant delivery pipe 106, keeping the temperature of the positioning mask stage 105 low and removing excess heat from the reticle.

[0039] In this article, there are several points to note: 1. The drawings of this embodiment only involve the structures related to this embodiment. Other structures can refer to the general design.

[0040] 2. In the absence of conflict, the features of this embodiment and the embodiments can be combined with each other to obtain new embodiments.

[0041] The above are merely specific embodiments of the present invention, but the scope of protection of the present invention is not limited thereto. Any modifications or substitutions that can be easily conceived by a person skilled in the art within the technical scope disclosed in the present invention should be included in the scope of protection of the present invention. Therefore, the scope of protection of the present invention should be based on the scope of protection of the claims.

Claims

1. A high-precision photolithography device for producing electronic components, comprising a photolithography machine body (1), a clean room sealing door (2), a fixed connecting plate (3), a rubber connecting bag (4), a detection structure, an adjustment structure, a sliding connecting plate (5), a switch extrusion rod (6) and a push-type switch (7); the clean room sealing door (2) is connected to the front side of the photolithography machine body (1) in a left-right sliding manner; and characterized in that: The fixed connection plate (3) is fixedly connected to the left side of the photolithography machine body (1); the rubber connection bag (4) is bonded to the right end surface of the fixed connection plate (3), and an air inlet is opened on the front side of the rubber connection bag (4); the detection structure is arranged on the upper part of the photolithography machine body (1); the sliding connection plate (5) is connected to the left side of the photolithography machine body (1) in a sliding manner, and the sliding connection plate (5) is bonded to the right side of the rubber connection bag (4); the switch extrusion rod (6) is fixedly connected to the inner side of the sliding connection plate (5); the push-type switch (7) is arranged on the inner side of the fixed connection plate (3), and an audible and visual alarm is arranged on the outer side of the photolithography machine body (1), and the push-type switch (7) is connected in series with a control circuit of the audible and visual alarm; the adjustment structure is arranged on the inner side of the photolithography machine body (1).

2. A high-precision photolithography apparatus for producing electronic components according to claim 1, characterized in that: The detection structure comprises a first positioning magnet (101) and a position limiting baffle (102); a plurality of the first positioning magnets (101) are provided, and the plurality of the first positioning magnets (101) are evenly distributed and fixedly connected to the front side of the photolithography machine body (1); two position limiting baffles (102) are provided, and both of the two position limiting baffles (102) are fixedly connected to the front side of the photolithography machine body (1), and sealing strips are bonded to the inner sides of the two position limiting baffles (102).

3. A high-precision photolithography apparatus for producing electronic components according to claim 2, characterized in that: The detection structure further comprises a sealing rubber pad (201) and a second positioning magnet (202); the sealing rubber pad (201) is bonded to the left side of the clean room sealing door (2); a plurality of second positioning magnets (202) are provided, and the plurality of second positioning magnets (202) are evenly distributed and fixedly connected to the left side of the clean room sealing door (2).

4. A high-precision photolithography apparatus for producing electronic components as claimed in claim 3, characterized in that: The detection structure further comprises an air circulation tube (301) and a reset elastic member (501); the air circulation tube (301) passes through the fixed connection plate (3) and is fixedly connected to the rubber connection bag (4), and the air circulation tube (301) is communicated with the rubber connection bag (4); the sliding connection plate (5) is elastically connected to the photolithography machine body (1) through the reset elastic member (501); two vacuum pumps are provided on the left side of the photolithography machine body (1), and the air inlet end of the front vacuum pump is fixedly connected to the air circulation tube (301).

5. The high-precision photolithography apparatus for producing electronic components according to claim 1, characterized in that: The adjustment structure comprises a height adjustment electric push rod (103) and a sliding mounting seat (104); the height adjustment electric push rod (103) is bolted to the rear side of the photolithography machine body (1); the sliding mounting seat (104) is connected to the rear side of the photolithography machine body (1) in an up-and-down sliding manner, and the sliding mounting seat (104) is fixedly connected to the piston rod of the height adjustment electric push rod (103).

6. A high-precision photolithography apparatus for producing electronic components according to claim 5, characterized in that: The adjustment structure further comprises a positioning mask stage (105), a cooling liquid delivery pipe (106) and an air circulation hole (113); the positioning mask stage (105) is hinged on the upper part of the sliding mounting seat (104), and the positioning mask stage (105) is composed of two assembly plates; the cooling liquid delivery pipe (106) is fixedly connected to the inner side of the positioning mask stage (105), and a cooling liquid delivery pump is provided at the lower part of the photolithography machine body (1), and the output end of the cooling liquid delivery pump is fixedly connected to the cooling liquid delivery pipe (106); a plurality of the air circulation holes (113) are provided, and the plurality of the air circulation holes (113) are evenly distributed and opened on the upper part of the assembly plate above the positioning mask stage (105), and the plurality of the air circulation holes (113) are all connected to the air inlet end of the rear vacuum pump through a pipeline.

7. A high-precision photolithography apparatus for producing electronic components according to claim 6, characterized in that: The adjustment structure further comprises a positioning mounting box (107) and a reciprocating self-locking driving member (108); the positioning mounting box (107) is fixedly connected to the lower portion of the sliding mounting seat (104); and the reciprocating self-locking driving member (108) is bolted to the inner side of the positioning mounting box (107).

8. A high-precision photolithography apparatus for producing electronic components according to claim 7, characterized in that: The adjustment structure further includes an active transmission worm (109) and a driven transmission turbine (110); the active transmission worm (109) is rotatably connected to the inner side of the positioning installation box (107), and the active transmission worm (109) is coaxially fixedly connected to the output shaft of the reciprocating self-locking drive member (108); the driven transmission turbine (110) is rotatably connected to the lower part of the positioning installation box (107), and the driven transmission turbine (110) and the active transmission worm (109) are meshed with each other.

9. A high-precision photolithography apparatus for producing electronic components according to claim 8, characterized in that: The adjustment structure further includes a first limiting link (111) and a second limiting link (112); the first limiting link (111) is hinged to the lower part of the sliding mounting seat (104), and the first limiting link (111) is fixedly connected to the driven transmission turbine (110); the second limiting link (112) is hinged to the lower part of the positioning mask platform (105), and the second limiting link (112) is hinged to the first limiting link (111).

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