PECVD intelligent coating system and method

Abstract

The invention relates to the technical field of vacuum coating, in particular to a PECVD (Plasma Enhanced Chemical Vapor Deposition) intelligent coating system and method, and the system comprises a detection cabin which is used for identifying a to-be-treated product and is connected with a transfer cabin through a first vacuum transfer channel; a pretreatment compartment; the pretreatment device is provided with a pretreatment storage structure and a pretreatment device and is connected with the transfer cabin through a second vacuum transfer channel; the deposition cabin is provided with a deposition device and is connected with the transfer cabin through a third vacuum transfer channel; the post-treatment cabin is provided with a post-treatment storage structure and is communicated with the transfer cabin through a fourth vacuum transfer channel; and the transfer cabin is provided with a transfer device. The operation cabins are connected through the transfer cabin to form a vacuum environment, products can be quickly transferred from one operation cabin to another operation cabin through turnover of the transfer cabin, and treatment of the products is completed. The automation degree and the intelligence degree of product processing are improved, and the efficiency and the quality of product processing are also improved.

Description

Technical Field

[0001] The present invention relates to the field of vacuum coating technology, and in particular to a PECVD intelligent coating system and method. Background Art

[0002] PECVD (Plasma Enhanced Chemical Vapor Deposition) is the abbreviation of plasma-enhanced chemical vapor deposition technology. Its principle is to use low-temperature plasma as the energy source. The sample is placed on the cathode of a glow discharge under low pressure. The glow discharge (or a heating element) is used to heat the sample to a predetermined temperature. Then, an appropriate amount of reaction gas is introduced. The gas undergoes a series of chemical reactions and plasma reactions to form a solid film on the sample surface.

[0003] Based on the structure of the reaction chamber, PECVD coating equipment is currently categorized as either flat-plate or tubular. Flat-plate PECVD coating equipment features a flat reaction chamber, with the product being treated placed on a flat electrode. This allows for better control of plasma distribution, thereby improving film uniformity and quality. Tubular PECVD coating equipment features a tubular reaction chamber, typically constructed from materials such as quartz or ceramic. This structure offers advantages such as simplicity, low cost, and the ability to achieve continuous thin film deposition, making it suitable for large-scale production. However, tubular PECVD coating equipment exhibits relatively poor film uniformity.

[0004] However, the current PECVD coating equipment still has the following problems: 1) Low level of intelligence. Although most PECVD coating equipment can now achieve automated loading and unloading and deposition, the vast majority of PECVD coating equipment has a low level of intelligence and cannot intelligently match process parameters according to different product characteristics.

[0005] 2) Low process integration. Currently, PECVD coating equipment typically consists of a single deposition chamber, which performs only deposition. Pre- and post-processing steps are performed on separate equipment. Because the film quality of the PECVD process is closely related to the cleanliness of the atmospheric environment, it is impossible to ensure that the entire process is carried out in a high-vacuum, high-purity environment, resulting in poor equipment production quality.

[0006] 3) Inability to achieve multi-directional deposition. Currently, PECVD coating equipment cannot move or reverse the product after it is placed on the platform during deposition processing, resulting in significant differences in film quality between the front and back sides of the product. This is especially true when processing products with complex structures, resulting in poor deposition results.

[0007] With the increasing application of PECVD coating equipment, the types of products using PECVD processes are increasing, and their complexity is increasing. This requires the optimization of existing PECVD coating equipment to further improve its production efficiency, film quality, and ability to handle complex products. By improving the intelligence level of equipment, process integration, and the ability to deposit complex structures, an intelligent, efficient, and high-quality PECVD coating method can be obtained. Therefore, it is necessary to propose more reasonable technical solutions to solve the technical problems existing in the existing technology. Summary of the Invention

[0008] In order to overcome at least one of the defects mentioned above, the present invention proposes a PECVD intelligent coating system and method, aiming to improve and obtain a new PECVD coating system, realize integrated operation, complete the pre-treatment, deposition and post-treatment processes in the system, with a higher degree of automation and intelligence, and can ensure the vacuum degree of the entire process. Environmental factors can meet the requirements of stability and reliability, thereby improving the overall processing efficiency and improving the coating quality of the product.

[0009] In order to achieve the above objectives, the coating system disclosed in the present invention can adopt the following technical solutions: A PECVD intelligent coating system, comprising: The inspection chamber is used to identify and authenticate the product to be processed; the inspection chamber includes a cabinet and a testing table and a testing device arranged in the cabinet, and the cabinet is connected to the transfer chamber through a first vacuum transfer channel; Pre-processing chamber; including a pre-processing vacuum chamber, a pre-processing storage structure and a pre-processing device are provided in the pre-processing vacuum chamber, and the pre-processing vacuum chamber is connected to the transfer chamber through a second vacuum transfer channel; The deposition chamber comprises a deposition vacuum chamber, a deposition device is provided in the deposition vacuum chamber, and the deposition vacuum chamber is connected to the transfer chamber via a third vacuum transfer channel; A post-processing chamber, comprising a post-processing vacuum chamber, a post-processing storage structure provided in the post-processing vacuum chamber, and the post-processing vacuum chamber being connected to the transfer chamber via a fourth vacuum transfer channel; The transfer chamber includes a transfer vacuum chamber, which is provided with several connecting ports that are respectively connected to the transfer channels. The connecting ports are provided with vacuum control valves, and a transfer device is also provided in the transfer vacuum chamber; the detection chamber, pre-treatment chamber, deposition chamber and post-treatment chamber are respectively connected and arranged on the outside of the transfer chamber.

[0010] The above-mentioned intelligent coating system uses a transfer chamber as a transit point, so that the product's pre-treatment, deposition treatment and post-treatment can be smoothly connected in a vacuum environment, avoiding conversion between different equipment, ensuring the consistency of the processing environment, ensuring the quality of product processing, and improving the degree of automation and intelligence of product processing, and can improve product processing efficiency.

[0011] The disclosed intelligent coating system automatically collects structural and material information about the product being treated and intelligently matches process parameters. It fully integrates the PECVD process steps, including pre-treatment, deposition, post-treatment, and transport, while maintaining a high-vacuum, high-purity environment throughout the entire process. It also enables the movement and flipping of treated products, ensuring high-quality thin film deposition on complex structures. This invention significantly improves the efficiency, quality, and application scope of existing PECVD coating equipment.

[0012] Furthermore, the detection device is used to perform preliminary identification and judgment on the product. Detection can be achieved through a variety of schemes, and its structure is not limited to a single one. Here, an optimization is made and one of the feasible options is proposed: the detection device includes a detection and identification head, which is driven by a displacement guide rail and moves within the cabinet. When the detection and identification head moves close to the detection table, it obtains the product to be processed on the detection table for identification and recognition. When the above scheme is adopted, the detection and identification head includes a camera, and the displacement guide rail includes multiple free guide rails. For example, a scheme combining an X-axis track, a Y-axis track, and a Z-axis track can be set to drive the detection and identification head to move freely and rise and fall in the space within multiple cabinets, and perform multi-directional detection and identification of the product.

[0013] Furthermore, the pre-treatment device is used to treat the product before deposition, bringing it to an optimal state and preparing it for deposition. While the structure of the pre-treatment device is not strictly limited, this article proposes an optimized and feasible option: the pre-treatment device includes a pre-treatment nozzle for purging and cleaning the product. Using this solution, the pre-treatment device can remove contaminants, rust, particles, and other impurities from the surface of the treated product, improving surface adhesion.

[0014] Furthermore, the pre-processing storage structure is used to place the product to be processed, stabilize it, and complete the pre-processing operation. Its structure is not limited to a single one. Here, we optimize and propose one feasible option: the pre-processing storage structure includes a pre-processing storage tank. When adopting this solution, the pre-processing storage tank can be placed on a platform higher than the bottom surface of the pre-processing vacuum chamber, so that the product to be processed is higher than the bottom surface of the pre-processing vacuum chamber, facilitating the pre-processing operation.

[0015] Furthermore, the deposition device is used to perform deposition on the pre-treated product. Deposition can be achieved through a variety of schemes, and its structure is not limited to a single one. Here, we optimize and propose one feasible option: the deposition device includes an upper electrode and a lower electrode, the upper electrode connected to an external power source; a multi-degree-of-freedom manipulator for moving the product is disposed between the upper and lower electrodes. When adopting this scheme, the upper electrode is connected to an external high-voltage power source, which enables deposition on the product. Using the pneumatic deposition device, plasma discharge and thin-film chemical vapor deposition processes can be achieved.

[0016] In some embodiments, the high-voltage power supply is a radio frequency power supply that can achieve secondary voltage transformation to provide the high voltage and large current required for plasma discharge.

[0017] Furthermore, during the deposition process, to better facilitate gas deposition with the product, an optimization and feasible option is proposed: an electrode lifting device is provided on the deposition vacuum chamber, which drives the upper electrode to rise and fall in the longitudinal direction. When this solution is adopted, the upper electrode includes an electrode portion located within the deposition vacuum chamber and a lifting portion extending from the deposition vacuum chamber. The electrode lifting device can use components such as a telescopic cylinder and a telescopic magnet to drive the lifting portion, thereby achieving the lifting of the upper electrode.

[0018] Furthermore, the post-processing storage structure is used to support the product, allowing it to be further processed after the deposition process. While its structure is not strictly limited, this article proposes an optimized and feasible option: the post-processing storage structure includes a post-processing tank connected to the liquid inlet channel and used to store the processing liquid; the post-processing storage structure also includes a lifting and retrieval device for driving the product into and out of the post-processing tank. When this solution is adopted, the post-processing storage structure assists in product processing, enabling the deposition reaction on the product surface, avoiding excessive reaction, and thus improving the film quality of the PECVD equipment.

[0019] Furthermore, the transfer device is used to transfer products between chambers, maintaining a stable vacuum environment during the process, thereby improving the efficiency and quality of product transfer processing. While its structure is not strictly limited, an optimization is proposed herein, with one feasible option being proposed: the transfer device includes a transfer robot disposed within the transfer vacuum chamber, which is used to move products through the vacuum transfer channel into the corresponding vacuum chamber. When this solution is adopted, the transfer robot can lift and grip the products, transporting them from the transfer chamber to other chambers and retrieving them from the chamber after completing the corresponding processing.

[0020] Furthermore, in order to maintain the vacuum conditions in each chamber, a vacuum assembly is required for regulation. The structure is not limited to a single one. Here, an optimization is made and one feasible option is proposed: the pre-processing vacuum chamber, deposition vacuum chamber, post-processing vacuum chamber, and transfer vacuum chamber are all provided with exhaust pipes, which are connected to vacuum pumps and used to extract the gas in the vacuum chamber to form a vacuum condition; the pre-processing vacuum chamber, deposition vacuum chamber, post-processing vacuum chamber, and transfer vacuum chamber are also connected to vacuum detection components and pressure detection components. When adopting the above solution, the vacuum pump includes a fixed-frequency vacuum pump and a variable-frequency vacuum pump, the vacuum detection component includes a vacuum gauge and a high-vacuum gauge, and the pressure detection component includes a pressure sensor.

[0021] The above content discloses an intelligent coating system, and the present invention also discloses an intelligent coating method.

[0022] A PECVD intelligent coating method, using the PECVD intelligent coating system described above, comprises: Testing of products to be processed: structural dimension testing and material identification of products to be processed, so as to determine the corresponding processing technology; Transfer the products to be processed after testing to the transfer chamber, and adjust the transfer chamber and pre-treatment chamber to a vacuum environment according to the determined treatment process; Transfer the product to be processed to the pre-treatment chamber for pre-treatment, and return it to the transfer chamber after pre-treatment; Adjust the deposition chamber to a vacuum environment, transfer the pre-treated products into the deposition chamber for deposition, and return them to the transfer chamber after the deposition process is completed; Adjust the post-processing chamber to a vacuum environment, transfer the product that has completed the deposition process to the post-processing chamber for post-processing, adjust the air pressure in the post-processing chamber to atmospheric pressure after the post-processing is completed, and open the post-processing chamber to take out the product.

[0023] Compared with the prior art, some of the beneficial effects of the technical solution disclosed in the present invention include: The intelligent coating system adopted by the present invention connects various operating cabins through a transfer cabin and forms a vacuum environment for turnover. Through the turnover of the transfer cabin, products can be quickly transferred from one operating cabin to another to complete product processing; the degree of automation and intelligence of product processing is improved, and the efficiency and quality of product processing are also improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following briefly introduces the drawings required for use in the embodiments. It should be understood that the following drawings only represent some embodiments of the present invention and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other relevant drawings can be obtained based on these drawings without paying any creative work.

[0025] Figure 1 Schematic diagram of the composition of the detection cabin.

[0026] Figure 2 Schematic diagram of the transfer cabin.

[0027] Figure 3 This is a cross-sectional diagram of the transfer cabin.

[0028] Figure 4 Schematic diagram of the composition of the pre-treatment chamber.

[0029] Figure 5 This is a cross-sectional diagram of the pre-treatment chamber.

[0030] Figure 6 Schematic diagram of the composition of the deposition chamber.

[0031] Figure 7 A schematic cross-sectional view of the deposition chamber.

[0032] Figure 8 Schematic diagram of the composition of the post-processing chamber.

[0033] Figure 9 A cross-sectional diagram of the post-processing chamber.

[0034] Figure 10 Schematic diagram of the overall component modules of the coating system.

[0035] In the above drawings, the meanings of the symbols are: 1. Inspection chamber; 101. Cabinet; 102. Inspection table; 103. Inspection device; 104. X-axis track; 105. Y-axis track; 106. Z-axis track.

[0036] 2. Transfer chamber; 201. Transfer vacuum chamber; 202. First vacuum transfer channel; 203. Third vacuum transfer channel; 204. Fourth vacuum transfer channel; 205. First high vacuum plug-in valve; 206. Second high vacuum plug-in valve; 207. Third high vacuum plug-in valve; 208. Fourth high vacuum plug-in valve; 209. Second vacuum transfer channel; 210. Transfer robot.

[0037] 3. Pretreatment chamber; 301. Pretreatment vacuum chamber; 302. Pretreatment storage structure; 303. Pretreatment device; 304. Cleaning agent adding pipeline; 305. Pretreatment vacuum pipeline.

[0038] 4. Deposition chamber; 401. Deposition vacuum chamber; 402. Upper electrode; 403. Lower electrode; 404. Multi-degree-of-freedom manipulator; 405. Lifting unit; 406. Electrode lifting device; 407. Gas delivery passage; 408. Deposition vacuum pipeline.

[0039] 5. Post-processing chamber; 501. Post-processing vacuum chamber; 502. Product lifting device; 503. Post-processing tank; 504. Liquid inlet channel; 505. Post-processing vacuum pipeline.

[0040] G. Observation window. DETAILED DESCRIPTION

[0041] This embodiment will be further explained below with reference to the accompanying drawings and specific examples.

[0042] In view of the many deficiencies in the coating system in the prior art, the following embodiments are optimized and overcome the defects in the prior art.

[0043] Example 1 like Figures 1 to 10 As shown, this embodiment provides a PECVD intelligent coating system to improve the automation and intelligence of the PECVD coating system, thereby improving the efficiency of the coating process and thus improving the quality of the coating.

[0044] Specifically, such as Figure 1 As shown, the PECVD intelligent coating system disclosed in this embodiment has one structure including: The detection chamber 1 is used to identify and authenticate the product to be processed; the detection chamber 1 includes a cabinet 101 and a detection table 102 and a detection device 103 arranged in the cabinet 101. The cabinet 101 is connected to the transfer chamber 2 through a first vacuum transfer channel 202.

[0045] The detection device 103 is used to perform preliminary identification and judgment on the product. Detection can be achieved through a variety of schemes, and its structure is not limited to a single one. This embodiment optimizes and proposes one feasible option: the detection device 103 includes a detection and identification head, which is driven by a displacement guide rail and moves within the cabinet 101. When the detection and identification head moves close to the detection table 102, it obtains the product to be processed on the detection table 102 for identification and recognition. When the above scheme is adopted, the detection and identification head includes a camera, and the displacement guide rail includes multiple free guide rails. For example, a scheme combining an X-axis track 104, a Y-axis track 105, and a Z-axis track 106 can be set to drive the detection and identification head to move freely and rise and fall in the space within multiple cabinets 101, and perform multi-directional detection and identification of the product.

[0046] like Figure 4 、 Figure 5 As shown, the PECVD intelligent coating system disclosed in this embodiment includes the following structure: The pre-processing chamber 3 comprises a pre-processing vacuum chamber 301 , in which a pre-processing storage structure 302 and a pre-processing device 303 are provided. The pre-processing vacuum chamber 301 is connected to the transfer chamber 2 via a second vacuum transfer channel 209 .

[0047] Pre-treatment device 303 is used to treat the product before deposition, bringing it to an optimal state and preparing it for deposition. While the structure of pre-treatment device 303 is not strictly limited, this embodiment optimizes and utilizes one feasible option: pre-treatment device 303 includes a pre-treatment nozzle for purging and cleaning the product. Using this solution, pre-treatment device 303 can remove contaminants, rust, particles, and other impurities from the surface of the product being treated, improving surface adhesion.

[0048] The pre-processing storage structure is used to place the product to be processed, stabilize it, and complete the pre-processing operation. Its structure is not limited to a single one. This embodiment optimizes and adopts one feasible option: the pre-processing storage structure 302 includes a pre-processing storage tank. When adopting this solution, the pre-processing storage tank can be located on a platform higher than the inner bottom surface of the pre-processing vacuum chamber 301, so that the product to be processed is higher than the inner bottom surface of the pre-processing vacuum chamber 301, facilitating the pre-processing operation.

[0049] like Figure 6 、 Figure 7 As shown, the PECVD intelligent coating system disclosed in this embodiment includes the following structure: The deposition chamber 4 includes a deposition vacuum chamber 401 . A deposition device is provided in the deposition vacuum chamber 401 . The deposition vacuum chamber 401 is connected to the transfer chamber 2 via a third vacuum transfer channel 203 .

[0050] The deposition device is used to perform deposition on pre-treated products. Deposition can be achieved through a variety of methods, and its structure is not limited to a single method. This embodiment is optimized and employs one feasible option: the deposition device includes an upper electrode 402 and a lower electrode 403, wherein the upper electrode 402 is connected to an external power source; a multi-degree-of-freedom manipulator 404 for moving the product is disposed between the upper electrode 402 and the lower electrode 403. When this method is employed, the upper electrode 402 is connected to an external high-voltage power source, which enables deposition on the product. Using the pneumatic deposition device, plasma discharge and thin-film chemical vapor deposition processes can be implemented.

[0051] In some embodiments, the high-voltage power supply is a radio frequency power supply that can achieve secondary voltage transformation to provide the high voltage and large current required for plasma discharge.

[0052] During the deposition process, to better facilitate gas deposition with the product, this embodiment optimizes and employs one feasible option: an electrode lifting device 406 is provided on the deposition vacuum chamber 401. The electrode lifting device 406 drives the upper electrode 402 to rise and fall in the longitudinal direction. When this solution is employed, the upper electrode 402 includes an electrode portion located within the deposition vacuum chamber 401 and a lifting portion 405 extending from the deposition vacuum chamber 401. The electrode lifting device 406 may utilize components such as a telescopic cylinder and a telescopic magnet to drive the lifting portion 405, thereby achieving the raising and lowering of the upper electrode 402.

[0053] like Figure 8 、 Figure 9 As shown, the PECVD intelligent coating system disclosed in this embodiment includes the following structure: The post-processing chamber 5 includes a post-processing vacuum chamber 501 , in which a post-processing storage structure is provided. The post-processing vacuum chamber 501 is connected to the transfer chamber 2 via the fourth vacuum transfer channel 204 .

[0054] The post-processing storage structure supports the product, allowing it to be further processed after deposition. While its structure is not strictly limited, this embodiment optimizes and employs one feasible option: the post-processing storage structure includes a post-processing tank 503, which communicates with a liquid inlet channel 504 and is used to store the processing liquid. The post-processing storage structure also includes a lifting and retrieval device for transporting the product into and out of the post-processing tank 503. When this solution is employed, the post-processing storage structure assists in product processing, enabling deposition reactions on the product surface and preventing overreaction, thereby improving the film quality of the PECVD equipment.

[0055] like Figure 2 、 Figure 3As shown, the PECVD intelligent coating system disclosed in this embodiment includes the following structure: The transfer chamber 2 includes a transfer vacuum chamber 201. The transfer vacuum chamber 201 is provided with several connecting ports which are respectively connected to the transfer channels. The connecting ports are provided with vacuum control valves. A transfer device is also provided in the transfer vacuum chamber 201. The detection chamber 1, pre-processing chamber 3, deposition chamber 4 and post-processing chamber 5 are respectively connected and arranged on the outside of the transfer chamber 2.

[0056] Preferably, the vacuum control valve comprises a vacuum plug-in valve.

[0057] The transfer device is used to transfer products between chambers, maintaining a stable vacuum environment during the process, thereby improving the efficiency and quality of product transfer processing. While its structure is not strictly limited, this embodiment optimizes and adopts one feasible option: the transfer device includes a transfer robot 210 disposed within the transfer vacuum chamber 201. The transfer robot 210 is used to move products through the vacuum transfer channel into the corresponding vacuum chamber. When adopting this solution, the transfer robot 210 can lift and clamp the products, transporting them from the transfer chamber 2 to other chambers and retrieving them from the chamber after completing the corresponding processing.

[0058] The intelligent coating system disclosed in this embodiment uses the transfer chamber 2 as a transit point, so that the pre-treatment, deposition treatment and post-treatment of the product can be smoothly connected in a vacuum environment, avoiding conversion between different equipment, ensuring the consistency of the processing environment, ensuring the quality of product processing, and improving the degree of automation and intelligence of product processing, and can improve product processing efficiency.

[0059] In order to maintain the vacuum conditions in each chamber, a vacuum component needs to be set up for regulation. Its structure is not limited to a single one. This embodiment is optimized and adopts one of the feasible options: the pre-processing vacuum chamber 301, the deposition vacuum chamber 401, the post-processing vacuum chamber 501 and the transfer vacuum chamber 201 are all provided with an exhaust pipe, which is connected to a vacuum pump and is used to extract the gas in the vacuum chamber to form a vacuum condition; the pre-processing vacuum chamber 301, the deposition vacuum chamber 401, the post-processing vacuum chamber 501 and the transfer vacuum chamber 201 are also connected to a vacuum detection component and a pressure detection component. When adopting the above scheme, the vacuum pump includes a fixed frequency vacuum pump and a variable frequency vacuum pump, the vacuum detection component includes a vacuum gauge and a high vacuum gauge, and the pressure detection component includes a pressure sensor.

[0060] Preferably, in this embodiment, observation windows G are provided on the pre-processing vacuum chamber 301 , the deposition vacuum chamber 401 and the post-processing vacuum chamber 501 .

[0061] The disclosed intelligent coating system automatically collects structural and material information about the product being treated and intelligently matches process parameters. It fully integrates the PECVD process steps, including pre-treatment, deposition, post-treatment, and transport, while maintaining a high-vacuum, high-purity environment throughout the entire process. It also enables the movement and flipping of treated products, ensuring high-quality thin film deposition on complex structures. This invention significantly improves the efficiency, quality, and application scope of existing PECVD coating equipment.

[0062] According to the system disclosed in this embodiment, the solution is refined. Here, a specific configuration solution is listed to illustrate the system structure and vacuum system components.

[0063] With the transfer chamber 2 as the center, it is connected to the pre-processing chamber 3, the detection chamber 1, the post-processing chamber 5 and the deposition chamber 4 on the top, bottom, left and right sides respectively, and all pass through the second vacuum transfer channel 209, the first vacuum transfer channel 202, the fourth vacuum transfer channel 204 and the third vacuum transfer channel 203 respectively.

[0064] The first vacuum transfer channel 202 is provided with a first high vacuum gate valve 205, the second vacuum transfer channel 209 is provided with a second high vacuum gate valve 206, the third vacuum transfer channel 203 is provided with a third high vacuum gate valve 207, the fourth vacuum transfer channel 204 is provided with a fourth high vacuum gate valve 208, and the outside of the deposition chamber 4 is also connected to a fifth high vacuum gate valve.

[0065] At the same time, the first vacuum transfer channel 202 connected to the detection chamber 1 is also connected to a bypass, and is connected to a first vacuum gauge and a first fixed-frequency vacuum pump. A second high vacuum baffle valve is also provided upstream of the first fixed-frequency vacuum pump.

[0066] The pretreatment chamber 3 is connected to a cleaning agent addition pipeline 304, and the addition of cleaning agent is controlled by a second flow mass valve and a second switch valve. The pretreatment chamber 3 is also provided with a third pressure sensor and a fourth air-breaking valve for detecting parameters in the pretreatment vacuum chamber 301. The pretreatment chamber 3 is also connected to a pretreatment vacuum pipeline 305, and the start and stop are controlled by a third high vacuum baffle valve and a second fixed-frequency vacuum pump.

[0067] The deposition chamber 4 is connected to a gas delivery passage 407, and the gas input is controlled by a first flow mass valve and a first switch valve. The deposition chamber 4 is also provided with a fourth pressure sensor and a third air-breaking valve for detecting parameters in the deposition vacuum chamber 401. The deposition chamber 4 is also connected to a deposition vacuum pipeline 408, and the start and stop are controlled by a variable frequency vacuum pump and a fifth high vacuum plug-in valve. A third vacuum gauge and a high vacuum gauge are also provided on the deposition vacuum pipeline 408.

[0068] The post-processing chamber 5 is connected to a post-processing liquid adding pipeline, and the addition of the post-processing liquid is controlled by a third mass flow valve and a third switch valve. The post-processing vacuum chamber 501 is also provided with a first pressure sensor and a first air-breaking valve to detect the residual parameters in the post-processing vacuum chamber 501. The post-processing chamber 5 is also connected to a post-processing vacuum pipeline 505, and the start and stop are controlled by a third fixed-frequency vacuum pump and a first high-pressure baffle valve. A second vacuum gauge is also provided on the post-processing vacuum pipeline 505.

[0069] The transfer chamber 2 is also connected to a second pressure sensor and a second air-breaking valve for detecting parameters in the transfer vacuum chamber 201 .

[0070] The above content describes the hardware structure of the intelligent coating system. The hardware components are started and stopped under the corresponding control system to achieve intelligent coating control.

[0071] The control system consists of an intelligent process parameter matching algorithm, a process parameter database, and a control program. The hardware control system comprises a programmable controller, circuitry, an electrical control cabinet, and various electrical components. It enables control of the operating status of all components in the PECVD intelligent coating system, allows for parameter setting of each component, enables intelligent parameter matching, and enables equipment automation.

[0072] Here is a real case to illustrate the system composition: like Figure 1 As shown, the inspection chamber 1 is a non-airtight chamber. A rotatable inspection platform 102 is installed at the bottom of the cabinet 101. Three guide rails (X, Y, and Z) are mounted on the top of the cabinet 101, with the inspection device 103 mounted on the Z guide rail. These three guide rails work in conjunction with the inspection platform 102 to precisely measure product dimensions and materials. A first vacuum transfer channel 202 connects the inspection chamber 1 to the transfer chamber 2.

[0073] like Figure 2 、 Figure 3 As shown, the transfer chamber 2 is an airtight chamber with a vacuum transfer manipulator 210 installed at the bottom of the vacuum chamber. The chamber is equipped with four vacuum transfer channels, connected to the detection chamber 1, pre-processing chamber 3, deposition chamber 4, and post-processing chamber 5, respectively. A vacuum gate valve is installed in the middle of each channel to separate independent vacuum areas. The bottom pipeline of the transfer chamber 2 is connected to the fixed-frequency vacuum pump in the vacuum system to achieve a high vacuum and high cleanliness environment inside the chamber. A vacuum gauge is connected to monitor the vacuum level of the chamber 1 in real time.

[0074] Preferably, the transfer robot 210 here includes a telescopic part on the horizontal plane, and a clamping part that can rotate 360° is provided on the telescopic part. After clamping and obtaining the product, the clamping part can move along the horizontal plane to enter and exit the pre-processing chamber 3, the deposition chamber 4 and the post-processing chamber 5, thereby realizing the pre-processing, deposition processing and post-processing of the product.

[0075] like Figure 4 、 Figure 5 As shown, the pre-treatment chamber 3 is an airtight chamber with a solvent cleaning tank installed at the bottom of the vacuum chamber and a cleaning agent nozzle at the top. Pre-treatment methods can also be selected, such as dry ice cleaning and plasma cleaning. The pre-treatment chamber 3 is equipped with a product vacuum transfer channel connected to the transfer chamber 2. The bottom of the vacuum chamber is connected to the fixed-frequency vacuum pump in the vacuum system to achieve a high vacuum and high cleanliness environment inside the chamber. A vacuum gauge is connected to monitor the vacuum level of the chamber 1 in real time.

[0076] like Figure 6 、 Figure 7 As shown, the deposition chamber 4 is an airtight chamber. A temperature control platform is installed at the bottom of the chamber to control the ambient temperature inside the chamber, and the platform is also used as the lower electrode 403. The multi-degree-of-freedom manipulator 404 is installed on the platform to grab the product to be processed and adjust the translation or rotation of the product. An upper electrode 402 is installed on the top of the chamber, and also serves as an air inlet nozzle for the reaction gas. The electrode is connected to the electrode lifting device 406 at the top of the chamber to adjust the discharge distance between the upper and lower electrodes 403. The high-voltage power supply is connected to the upper electrode 402 to adjust the discharge voltage and current. The deposition chamber 4 is provided with a product vacuum transfer channel connected to the transfer chamber 2. The chamber is connected to the variable frequency vacuum pump in the vacuum system through a pipeline to adjust the vacuum degree inside the chamber, and a vacuum gauge is connected to detect the vacuum degree of the chamber 1 in real time.

[0077] Preferably, the structure of the multi-degree-of-freedom manipulator 404 is not limited to a single one, and a commonly used manipulator can be used, which will not be described in detail here.

[0078] like Figure 8 、 Figure 9 As shown, the post-processing chamber 5 has a post-processing tank 503 installed at the bottom of the vacuum chamber. A product lifting device 502 is installed within the tank. A loading platform is mounted on the product lifting device 502, allowing the product to be raised or immersed in the post-processing reaction solution. A liquid storage tank is installed outside the chamber to store the post-processing reaction solution. The liquid storage tank is connected to the tank within the chamber via a pipeline.

[0079] like Figure 10As shown, the cabins of this PECVD intelligent coating system adopt a star-shaped layout, with transfer cabin 2 at the center and pre-treatment cabin 3, deposition cabin 4, inspection cabin 1, and post-treatment cabin 5 arranged clockwise. The vacuum system is located in pre-treatment cabin 3, deposition cabin 4, transfer cabin 2, and post-treatment cabin 5, and includes key components such as vacuum pumps, vacuum valves, vacuum gauges, flow valves, and sensors. This system enables quantitative control of the vacuum level in the four independent cabins, as well as control of air intake, liquid intake, and air bleed control. In the figure, P1-P3 are fixed-frequency vacuum pumps, P4 is a variable-frequency vacuum pump, V1-V5 are high-vacuum gate valves, W1-W3 are high-vacuum baffle valves, Z1-Z4 are air bleed valves, G1-G4 are vacuum gauges, H1 is a high-vacuum gauge, Y1-Y4 are pressure sensors, C1-C3 are on-off valves, and L1-L3 are flow mass valves.

[0080] Example 2 The content of the above embodiment 1 discloses an intelligent coating system, and this embodiment discloses an intelligent coating method.

[0081] A PECVD intelligent coating method, using the PECVD intelligent coating system described in Example 1, comprising: Testing of products to be processed: structural dimension testing and material identification of products to be processed, so as to determine the corresponding processing technology; The products to be processed after the inspection are transferred to the transfer chamber 2, and according to the determined treatment process, the transfer chamber 2 and the pre-treatment chamber 3 are adjusted to a vacuum environment; The product to be processed is transferred to the pre-processing chamber 3 for pre-processing, and then returned to the transfer chamber 2 after the pre-processing is completed; Adjust the deposition chamber 4 to a vacuum environment, transfer the pre-treated product into the deposition chamber 4 for deposition, and return it to the transfer chamber 2 after the deposition is completed; Adjust the post-processing chamber 5 to a vacuum environment, transfer the product that has completed the deposition process to the post-processing chamber 5 for post-processing, and after the post-processing is completed, adjust the air pressure in the post-processing chamber 5 to atmospheric pressure, and open the post-processing chamber 5 to take out the product.

[0082] The implementation of the above-disclosed solution can effectively ensure the effect of smart coating, including: The PECVD process includes four steps: detection, pre-treatment, deposition treatment, and post-treatment.

[0083] The inspection process is completed in the inspection chamber 1. The inspection device 103 intelligently identifies the structural dimensions, materials, and other relevant data of the product to be processed, enters the data into the control system, and then uses the intelligent process parameter matching algorithm to calculate the optimal process parameters. Finally, the optimal process parameters are distributed as instructions to the high-voltage power supply, temperature control device, flow meter, vacuum pump, and other actuators.

[0084] The pre-treatment process is completed in the pre-treatment chamber 3. It uses cleaning agents, dry ice, plasma and other methods to clean the surface of the product to be treated, remove surface contaminants of the product to be treated, and increase surface activity, thereby improving the adhesion of subsequent thin film deposition.

[0085] The deposition process is completed in the deposition chamber 4 under a high vacuum and medium temperature environment. The plasma is generated between the flat electrodes. The activation effect of the plasma excites the reactive monomers, causing the gaseous reactants to undergo a chemical reaction on the solid surface, ultimately forming a solid deposited film.

[0086] The post-treatment process is completed in the post-treatment chamber 5. It uses a polymerization terminator solution to soak the deposited product, thereby terminating the chain reaction of thin film deposition, capturing residual free radicals, and improving the density and uniformity of the film.

[0087] Here is a specific case to illustrate: In the first step, the product to be processed is placed on the loading platform of the inspection chamber 1. The inspection device 103 is activated to perform structural dimensional inspection and material identification on the product. The inspection data is entered into the control system and used as input parameters for the intelligent process parameter matching algorithm. The optimal process parameters are then intelligently inferred from the process parameter database. The software control system distributes the selected process parameters as instructions to the actuators, such as the high-voltage power supply, temperature control device, flow meter, and vacuum pump.

[0088] In the second step, after the detection process is completed, the vacuum valve between the intelligent detection cabin 1 and the transfer cabin 2 is opened, the vacuum transfer manipulator 210 is started, and the product to be processed is grabbed and transported to the transfer cabin 2. The vacuum valve between the intelligent detection cabin 1 and the transfer cabin 2 is closed, and the two fixed-frequency vacuum pumps connected to the transfer cabin 2 and the pre-treatment cabin 3 in the vacuum system are started. When the vacuum degree of the two cabins reaches the set value issued by the software control system, the vacuum valve between the transfer cabin 2 and the pre-treatment cabin 3 is opened, the vacuum transfer manipulator 210 is started to transport the product to be processed to the pre-treatment tank of the pre-treatment cabin 3, the vacuum transfer manipulator 210 is retracted, and the vacuum valve between the transfer cabin 2 and the pre-treatment cabin 3 is closed. The pre-treatment nozzle is started to spray the detergent, and the product to be processed is pre-treated and cleaned according to the process parameters issued by the software control system.

[0089] In the third step, after pretreatment is complete, the vacuum gate valve between transfer chamber 2 and pretreatment chamber 3 is opened, the vacuum transfer manipulator 210 is activated, the product to be processed is moved to transfer chamber 2, and the gate valve is closed. The variable frequency vacuum pump connected to deposition chamber 4 is activated. When the vacuum level in deposition chamber 4 reaches the value specified by the software control system, the vacuum gate valve between deposition chamber 4 and transfer chamber 2 is opened, the vacuum transfer manipulator 210 is activated to move the product to deposition chamber 4, and the multi-degree-of-freedom manipulator 404 is activated to move the product to be processed. The vacuum transfer manipulator 210 is retracted, and the vacuum gate valve is closed. Based on the process parameters inferred by the intelligent process parameter matching algorithm in the software control system, the chamber temperature was adjusted to 90°C ± 3°C via the temperature control device, the voltage was adjusted to 10,000V ± 10V, and the current was adjusted to 4A ± 0.1A via the high-voltage power supply, the discharge gap was adjusted to 100mm ± 1mm ​​via the electrode lifting device 406, the feed gas intake volume was controlled to 50sccm ± 0.1sccm and the intake time was controlled to 20 minutes via the flow meter, the vacuum level was adjusted to 10Pa ± 0.1Pa via the variable frequency vacuum pump, and the product position was adjusted via the multi-degree-of-freedom manipulator 404. When the deposition time reached the 20 minutes specified by the software control system, the temperature control device, high-voltage power supply, flow meter, and variable frequency vacuum pump were turned off, the upper electrode 402 was raised, and the multi-degree-of-freedom manipulator 404 was restored to its initial position, completing the deposition process.

[0090] Fourth, after the deposition process is completed, the vacuum gate valve between the deposition chamber 4 and the transfer chamber 2 is opened, the vacuum transfer manipulator 210 is activated to transport the product to the transfer chamber 2, and the gate valve is closed. The fixed-frequency vacuum pump connected to the post-processing chamber 5 in the vacuum system is activated. When the vacuum level in both chambers reaches the value specified by the software control system, the vacuum gate valve between the transfer chamber 2 and the post-processing chamber 5 is opened, the vacuum transfer manipulator 210 is activated, and the product to be processed is transported to the product lifting device 502 in the post-processing chamber 5. The vacuum transfer manipulator 210 is retracted, and the vacuum gate valve between the transfer chamber 2 and the post-processing chamber 5 is closed. The product lifting device 502 is activated, the product is immersed in the post-processing tank 503, and the post-processing solution is added. The product to be processed is then post-processed according to the time specified by the software control system. After post-processing is completed, all vacuum pumps in the vacuum system are turned off. Once the post-processing chamber 5 is vented and the pressure is equal to the external atmospheric pressure, the door of the post-processing chamber 5 is opened, and the processed product is removed.

[0091] The above are the implementation methods listed in this embodiment, but this embodiment is not limited to the above optional implementation methods. Those skilled in the art can arbitrarily combine the above methods to obtain other various implementation methods. Anyone can derive other various implementation methods based on the inspiration of this embodiment. The above specific implementation methods should not be understood as limiting the scope of protection of this embodiment. The scope of protection of this embodiment should be based on the definition in the claims.

Claims

1. A PECVD intelligent coating system, characterized in that: include: An inspection chamber (1) is used to identify and authenticate products to be processed; the inspection chamber (1) includes a cabinet (101), a detection table (102) and a detection device (103) disposed within the cabinet (101), and the cabinet (101) is connected to the transfer chamber (2) via a first vacuum transfer channel (202); A pre-processing chamber (3); comprising a pre-processing vacuum chamber (301), wherein a pre-processing storage structure (302) and a pre-processing device (303) are provided in the pre-processing vacuum chamber (301), and the pre-processing vacuum chamber (301) is connected to the transfer chamber (2) via a second vacuum transfer channel (209); A deposition chamber (4) includes a deposition vacuum chamber (401), wherein a deposition device is provided in the deposition vacuum chamber (401), and the deposition vacuum chamber (401) is connected to the transfer chamber (2) via a third vacuum transfer channel (203); A post-processing chamber (5) includes a post-processing vacuum chamber (501), a post-processing storage structure is provided in the post-processing vacuum chamber (501), and the post-processing vacuum chamber (501) is connected to the transfer chamber (2) via a fourth vacuum transfer channel (204); The transfer chamber (2) comprises a transfer vacuum chamber (201), wherein the transfer vacuum chamber (201) is provided with a plurality of connection ports which are respectively connected to the transfer channels, and a vacuum control valve is provided at the connection ports. A transfer device is also provided in the transfer vacuum chamber (201); the detection chamber (1), the pre-processing chamber (3), the deposition chamber (4) and the post-processing chamber (5) are respectively connected and arranged outside the transfer chamber (2).

2. The PECVD intelligent coating system according to claim 1, characterized in that: The detection device (103) includes a detection and identification head, which is driven by a displacement guide rail and moves within the cabinet (101). When the detection and identification head moves close to the detection table (102), it obtains the product to be processed on the detection table (102) for identification.

3. The PECVD intelligent coating system according to claim 1, characterized in that: The pre-treatment device (303) includes a pre-treatment nozzle for blowing and cleaning the product.

4. The PECVD intelligent coating system according to claim 1 or 3, characterized in that: The pre-processing storage structure (302) includes a pre-processing storage tank.

5. The PECVD intelligent coating system according to claim 1, characterized in that: The deposition device comprises an upper electrode (402) and a lower electrode (403), wherein the upper electrode (402) is connected to an external power supply; and a multi-degree-of-freedom manipulator (404) for moving a product is provided between the upper electrode (402) and the lower electrode (403).

6. The PECVD intelligent coating system according to claim 5, characterized in that: The deposition vacuum chamber (401) is provided with an electrode lifting device (406), and the electrode lifting device (406) drives the upper electrode (402) to rise and fall in the longitudinal direction.

7. The PECVD intelligent coating system according to claim 1, characterized in that: The post-processing storage structure comprises a post-processing tank (503), which is connected to the liquid inlet channel (504) and is used to accumulate the processing liquid; the post-processing storage structure also comprises a lifting and taking device for driving the product into and out of the post-processing tank (503).

8. The PECVD intelligent coating system according to claim 1, characterized in that: The transfer device comprises a transfer manipulator (210) arranged in the transfer vacuum chamber (201), and the transfer manipulator (210) is used to move the product through the vacuum transfer channel into the corresponding vacuum chamber.

9. The PECVD intelligent coating system according to claim 1, characterized in that: The pre-processing vacuum chamber (301), deposition vacuum chamber (401), post-processing vacuum chamber (501) and transfer vacuum chamber (201) are all provided with exhaust pipes, which are connected to vacuum pumps and used to extract the gas in the vacuum chamber to form vacuum conditions; the pre-processing vacuum chamber (301), deposition vacuum chamber (401), post-processing vacuum chamber (501) and transfer vacuum chamber (201) are also connected to vacuum detection components and pressure detection components.

10. A PECVD intelligent coating method, using the PECVD intelligent coating system according to any one of claims 1 to 9, characterized in that: include: Testing of products to be processed: structural dimension testing and material identification of products to be processed, so as to determine the corresponding processing technology; The product to be processed after the inspection is transferred to the transfer chamber (2), and the environment in the transfer chamber (2) and the pre-treatment chamber (3) is adjusted to a set vacuum degree according to the determined treatment process; The product to be processed is transferred to the pre-processing chamber (3) for pre-processing, and then returned to the transfer chamber (2) after the pre-processing is completed; Adjust the environment in the deposition chamber (4) to a set vacuum degree, transfer the pre-treated product into the deposition chamber (4) for deposition, and return it to the transfer chamber (2) after the deposition is completed; The environment in the post-processing chamber (5) is adjusted to a set vacuum degree, and the product that has completed the deposition process is transferred to the post-processing chamber (5) for post-processing. After the post-processing is completed, the air pressure in the post-processing chamber (5) is adjusted to atmospheric pressure, and the post-processing chamber (5) is opened to take out the product.

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