Lifting structure of wafer soaking device

Abstract

The invention belongs to the technical field of wafer wet processing equipment in the semiconductor industry, and particularly relates to a lifting structure of a wafer soaking device, which comprises a lifting frame, a base plate, a vertical plate, a driving belt wheel, a driven belt wheel, a synchronous belt and a synchronous belt driving piece. The lifting frame is used for being connected with the upper end of a lifting connecting rod of the wafer soaking device. And the base plate is arranged on the top surface of a liquid storage tank of the wafer soaking device. The synchronous belt driving piece drives the driving belt wheel to rotate, so that the synchronous belt rotates, and then the lifting frame connected with the synchronous belt ascends and descends. Compared with an electric actuator adopted by an existing lifting structure, the lifting structure driven by the synchronous belt is simpler in structure, lower in manufacturing, dismounting and maintaining cost, lighter in overall weight and smaller in occupied space, can be installed on the base plate without occupying the space outside the liquid storage tank, and is stable and reliable to use.

Description

Technical Field

[0001] The invention belongs to the technical field of wafer wet processing equipment in the semiconductor industry, and in particular relates to a lifting structure of a wafer soaking device. Background Art

[0002] At present, the semiconductor industry's wet processing of wafers often requires the use of chemical liquids to immerse the wafers, using a special wafer immersion device. In existing wafer immersion devices, a lifting structure is generally used to drive the wafer box located in the liquid storage tank to perform lifting operations. Among them, the lifting structure generally uses a relatively integrated electric actuator as a power source to drive the lifting frame, and the lifting frame is then connected to the lifting connecting rod, and the lifting connecting rod is connected to the wafer box, thereby realizing the lifting and lowering of the wafer box. The lifting frame can also be provided with a tilting connecting rod drive mechanism for driving the wafer box to tilt. The electric actuator used in the above-mentioned existing lifting structure generally has a relatively complex internal structure, and the manufacturing, disassembly and maintenance costs are high. It generally needs to be placed outside the liquid storage tank and occupies a relatively large space. Summary of the Invention

[0003] In view of the above problems, an object of the present invention is to provide a lifting structure for a wafer immersion device.

[0004] The object of the present invention is achieved through the following technical solutions:

[0005] A lifting structure for a wafer soaking device includes a lifting frame connected to the upper end of a lifting connecting rod of the wafer soaking device, a base plate, a vertical plate, a driving pulley, a driven pulley, a synchronous belt, and a synchronous belt driving member;

[0006] The base plate is installed on the top surface of the liquid storage tank of the wafer immersion device, the vertical plate and the synchronous belt drive are respectively arranged on the base plate, the active pulley and the passive pulley are respectively rotatably arranged on the vertical plate, the active pulley is located directly below the passive pulley, the active pulley and the passive pulley are connected by a synchronous belt, the lifting frame is connected to the synchronous belt, and the driving end of the synchronous belt drive is connected to the axle of the active pulley.

[0007] The housing of the synchronous belt drive is set on the base plate through a drive member mounting seat. A driving pulley mounting seat is fixedly connected to a side surface of the vertical plate close to the lifting frame and on the left and right sides of the driving pulley. The driving pulley is rotatably set on the vertical plate through two driving pulley mounting seats.

[0008] Passive pulley mounting seats are respectively provided on one side surface of the vertical plate close to the lifting frame and on the left and right sides of the passive pulley. The passive pulley is rotatably arranged on the vertical plate through the two passive pulley mounting seats.

[0009] Long holes are respectively opened on the vertical plate at positions corresponding to the passive pulley mounting seats, and a number of fixing bolt assemblies are respectively passed through each of the long holes. A height adjustment frame is provided on the side of the vertical plate away from the lifting frame, and the height adjustment frame is respectively connected to the two passive pulley mounting seats through the fixing bolts. The height adjustment frame and the two passive pulley mounting seats are clamped and fixed to the vertical plate.

[0010] A screw mounting seat is installed on the side surface of the vertical plate away from the lifting frame, and an adjusting screw is rotatably provided on the screw mounting seat. The outer peripheral surface of the lower part of the adjusting screw is provided with an external thread, and the height adjustment frame is provided with an adjusting nut used in conjunction with the external thread of the adjusting screw.

[0011] The vertical plate is provided with synchronous belt passing holes at positions corresponding to the driving pulley and the driven pulley; the synchronous belt passes through the two synchronous belt passing holes respectively, so that the synchronous belt is divided into two parts, a part located on the side of the vertical plate close to the lifting frame and a part located on the side of the vertical plate away from the lifting frame.

[0012] A guide rail is installed on one side of the vertical plate close to the lifting frame, the length direction of the guide rail is parallel to the vertical direction and the length direction of the synchronous belt, and a slider is slidably connected to the guide rail, and the slider is connected to the lifting frame.

[0013] The left and right side surfaces of the vertical plate are respectively fixed with supporting ribs, and the lower ends of the supporting ribs are respectively fixed with the base plate.

[0014] A lifting origin detection sensor is installed at the lower part of one of the supporting ribs, and a lifting origin detection sensor trigger used in conjunction with the lifting origin detection sensor is installed on the lifting frame.

[0015] A slot re-inspection sensor trigger is installed on the upper part of one of the supporting ribs, and a plurality of trigger teeth are protruded from top to bottom on the slot re-inspection sensor trigger. A slot re-inspection sensor used in conjunction with the slot re-inspection sensor trigger is installed on the lifting frame.

[0016] The advantages and positive effects of the present invention are:

[0017] The lifting structure of the present invention, which is driven by a synchronous belt, has a simpler structure than the electric actuator used in the existing lifting structure, has lower manufacturing and disassembly and maintenance costs, is lighter overall, occupies less space, can be installed on the base plate without occupying the space outside the liquid storage tank, and is stable and reliable to use. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a schematic diagram of the three-dimensional structure of the main body of the present invention;

[0019] Figure 2 It is a schematic cross-sectional structural diagram of the main body of the present invention;

[0020] Figure 3 It is a rear structural schematic diagram of the main body of the present invention;

[0021] Figure 4 for Figure 3 A magnified view of point A;

[0022] Figure 5 This is one of the schematic diagrams of the structure of the wafer soaking device of the present invention;

[0023] Figure 6 This is the second schematic diagram of the structure of the wafer soaking device of the present invention;

[0024] Figure 7 for Figure 6 Enlarged view of point B.

[0025] In the figure: 1 is a base plate, 2 is a vertical plate, 201 is a long hole, 3 is a driving pulley, 4 is a passive pulley, 5 is a synchronous belt, 6 is a synchronous belt driver, 7 is a driver mounting seat, 8 is a driving pulley mounting seat, 9 is a passive pulley mounting seat, 10 is a fixing bolt assembly, 11 is a height adjustment frame, 12 is a screw mounting seat, 13 is an adjusting screw, 14 is an adjusting nut, 15 is a guide rail, 16 is a slider, 17 is a supporting rib, 18 is a lifting origin detection sensor, 19 is a lifting origin detection sensor trigger, 20 is a slot re-inspection sensor trigger, 2001 is a trigger tooth, and 21 is a slot re-inspection sensor;

[0026] 001 is the liquid storage tank, 002 is the lifting frame, 003 is the lifting connecting rod, 004 is the tilt connecting rod driving mechanism, and 005 is the tilt connecting rod. DETAILED DESCRIPTION

[0027] The following is combined with Figure 1-7 The present invention is described in further detail.

[0028] A lifting structure of a wafer soaking device, such as Figure 1-7 As shown, this embodiment includes a lifting frame 002, which is used to connect to the upper end of the lifting connecting rod 003 of the wafer immersion device, and also includes a base plate 1, a vertical plate 2, a driving pulley 3, a passive pulley 4, a synchronous belt 5, and a synchronous belt drive 6.

[0029] The wafer soaking device applicable to the present invention can be found in Figure 5 and Figure 6Except for the lifting structure proposed in the present invention, all other parts adopt existing technology. The lower end of the lifting link 003 passes through the base plate 1 and penetrates into the liquid reservoir 001, where it is fixedly connected to the film cassette. The lifting frame 002 is also equipped with a tilting link drive mechanism 004. The tilting link drive mechanism 004 can adopt a combination of a motor, a screw, and a guide rail, or a cylinder, and is controlled by the overall control system of the wafer immersion device. The tilting link drive mechanism 004 is connected to the upper end of the tilting link 005. The lower end of the tilting link 005 also penetrates the liquid reservoir 001 and is hinged to the film cassette. The tilting link drive mechanism 004 drives the tilting link 005 up and down, thereby achieving the function of causing the film cassette to flip in the liquid reservoir 001. Figure 5 and Figure 6 The middle tilt link 005 is coaxial with the lifting link 003 and is arranged inside the lifting link 003, which can further save occupied space.

[0030] The base plate 1 is mounted on the top surface of the liquid reservoir 001 of the wafer immersion device. The vertical plate 2 and the synchronous belt drive 6 are respectively mounted on the base plate 1. The driving pulley 3 and the passive pulley 4 are rotatably mounted on the vertical plate 2. The driving pulley 3 is located directly below the passive pulley 4. The driving pulley 3 and the passive pulley 4 are connected by a synchronous belt 5. The lifting frame 002 is connected to the synchronous belt 5, and the driving end of the synchronous belt drive 6 is connected to the axle of the driving pulley 3. The connection structure between the lifting frame 002 and the synchronous belt 5 adopts existing technology. The synchronous belt drive 6 drives the driving pulley 3 to rotate, which in turn rotates the synchronous belt 5, thereby raising and lowering the lifting frame 002 connected to the synchronous belt 5. This structure is simpler than the electric actuator used in existing lifting structures, has lower manufacturing, assembly, and maintenance costs, is lighter overall, and occupies less space. It can be installed on the base plate 1 without occupying space outside the liquid reservoir.

[0031] Specifically, in this embodiment, the synchronous belt drive 6 adopts existing technology, such as a commercially available motor reducer assembly, and is controlled by the overall control system of the wafer soaking device. The housing of the synchronous belt drive 6 is mounted on the base plate 1 via a drive mounting seat 7.

[0032] like Figure 1-4As shown, a driving pulley mounting seat 8 is fixedly connected to one side surface of the vertical plate 2 close to the lifting frame 002 and on the left and right sides of the driving pulley 3, and the driving pulley 3 is rotatably set on the vertical plate 2 through the two driving pulley mounting seats 8; a passive pulley mounting seat 9 is provided on one side surface of the vertical plate 2 close to the lifting frame 002 and on the left and right sides of the passive pulley 4, and the passive pulley 4 is rotatably set on the vertical plate 2 through the two passive pulley mounting seats 9, and long holes 201 are respectively opened at positions corresponding to each passive pulley mounting seat 9 on the vertical plate 2, and each long hole 201 is respectively penetrated by two fixing bolt assemblies 10, and the fixing bolt assemblies Component 10 is a commercially available bolt and nut assembly. A height adjustment bracket 11 is provided on the side of the vertical plate 2 facing away from the lifting frame 002. This bracket 11 is connected to the two driven pulley mounting blocks 9 via respective fixing bolts 10. The bracket 11 and the two driven pulley mounting blocks 9 are clamped and fixed to the vertical plate 2. A screw mounting block 12 is mounted on the side of the vertical plate 2 facing away from the lifting frame 002. An adjustment screw 13 is rotatably mounted on the screw mounting block 12. The outer peripheral surface of the lower portion of the adjustment screw 13 is externally threaded. An adjustment nut 14 is provided on the height adjustment bracket 11 for use with the external threads of the adjustment screw 13. The height position of the driving pulley mounting block 8 is relatively fixed. The height position of the passive pulley mounting seat 9 can be adjusted by slightly loosening the fixing bolt assemblies 10 and rotating the adjusting screw 13, thereby driving the height adjustment frame 11 to rise and fall. After the height adjustment frame 11 reaches a suitable height and is able to tighten the synchronous belt 5, the fixing bolt assembly 10 is re-tightened to keep the passive pulley mounting seat 9 and the height adjustment frame 11 clamped and fixed on the vertical plate 2, which is convenient for adjustment and maintenance.

[0033] Specifically, if Figure 1-4 As shown, in this embodiment, synchronous belt holes are respectively formed at the positions of the vertical plate 2 corresponding to the driving pulley 3 and the driven pulley 4. The synchronous belt 5 passes through the two synchronous belt holes, dividing the synchronous belt 5 into two parts: a portion located on the side of the vertical plate 2 close to the lifting frame 002 and a portion located on the side of the vertical plate 2 away from the lifting frame 002. This makes the overall structure more compact and reduces space usage. A guide rail 15 is mounted on the side of the vertical plate 2 close to the lifting frame 002. The length of the guide rail 15 is parallel to the vertical direction and the length of the synchronous belt 5. A slider 16 is slidably connected to the guide rail 15. The slider 16 is connected to the lifting frame 002, which makes the lifting of the lifting frame 002 more stable.

[0034] Specifically, in this embodiment, Figure 6 As shown, the left and right sides of the vertical plate 2 are respectively fixed with support ribs 17, and the lower ends of the support ribs 17 are respectively fixed to the base plate 1, which plays a role in strengthening the overall structural strength. Figure 6 and Figure 7As shown, a lift origin detection sensor 18 is mounted on the lower portion of one of the support ribs 17, and a lift origin detection sensor trigger 19 is mounted on the lift frame 002 for use with the lift origin detection sensor 18. A slot re-inspection sensor trigger 20 is mounted on the upper portion of one of the support ribs 17. Several trigger teeth 2001 are protruding from top to bottom on the slot re-inspection sensor trigger 20, and a slot re-inspection sensor 21 is mounted on the lift frame 002 for use with the slot re-inspection sensor trigger 20. In this embodiment, both the lift origin detection sensor 18 and the slot re-inspection sensor 21 are commercially available photoelectric detection sensors, and are each connected to and communicates with the overall control system of the wafer immersion apparatus. When the lifting origin detection sensor trigger 19 triggers the lifting origin detection sensor 18, the overall control system of the wafer immersion device can determine that the lifting frame 002 is at the lifting origin at this time, and when the trigger teeth 2001 of the slot re-inspection sensor trigger 20 respectively trigger the slot re-inspection sensor 21, the overall control system of the wafer immersion device can determine that the lifting frame 002 is at each predetermined height position at this time, and further determine that the wafer box is lifted to the specified height position to facilitate the removal and placement of wafers at specific positions in the wafer box, thereby effectively determining the accuracy of the lifting position.

Claims

1. A lifting structure for a wafer soaking device, comprising a lifting frame (002), wherein the lifting frame (002) is used to connect to the upper end of a lifting connecting rod (003) of the wafer soaking device, and is characterized in that: It also includes a base plate (1), a vertical plate (2), a driving pulley (3), a driven pulley (4), a synchronous belt (5), and a synchronous belt driving member (6); The base plate (1) is installed on the top surface of the liquid storage tank (001) of the wafer immersion device, the vertical plate (2) and the synchronous belt drive (6) are respectively arranged on the base plate (1), the active pulley (3) and the passive pulley (4) are respectively rotatably arranged on the vertical plate (2), the active pulley (3) is located directly below the passive pulley (4), the active pulley (3) and the passive pulley (4) are connected by a synchronous belt (5), the lifting frame (002) is connected to the synchronous belt (5), and the driving end of the synchronous belt drive (6) is connected to the wheel shaft of the active pulley (3).

2. The lifting structure of the wafer soaking device according to claim 1, characterized in that: The housing of the synchronous belt driving member (6) is arranged on the base plate (1) through a driving member mounting seat (7); a driving pulley mounting seat (8) is fixedly connected to a side surface of the vertical plate (2) close to the lifting frame (002) and on the left and right sides of the driving pulley (3); the driving pulley (3) is rotatably arranged on the vertical plate (2) through the two driving pulley mounting seats (8).

3. The lifting structure of the wafer soaking device according to claim 1, characterized in that: Passive pulley mounting seats (9) are respectively provided on one side surface of the vertical plate (2) close to the lifting frame (002) and on the left and right sides of the passive pulley (4). The passive pulley (4) is rotatably mounted on the vertical plate (2) via the two passive pulley mounting seats (9).

4. The lifting structure of the wafer soaking device according to claim 3, characterized in that: Long holes (201) are respectively opened on the vertical plate (2) at positions corresponding to the respective passive pulley mounting seats (9), and a plurality of fixing bolt assemblies (10) are respectively passed through each of the long holes (201). A height adjustment frame (11) is provided on the side of the vertical plate (2) away from the lifting frame (002), and the height adjustment frame (11) is respectively connected to the two passive pulley mounting seats (9) through the respective fixing bolts (10). The height adjustment frame (11) and the two passive pulley mounting seats (9) are clamped and fixed on the vertical plate (2).

5. The lifting structure of the wafer soaking device according to claim 4, characterized in that: A screw mounting seat (12) is installed on the side surface of the vertical plate (2) away from the lifting frame (002), and an adjusting screw (13) is rotatably provided on the screw mounting seat (12). The outer peripheral surface of the lower part of the adjusting screw (13) is provided with an external thread, and the height adjustment frame (11) is provided with an adjusting nut (14) used in conjunction with the external thread of the adjusting screw (13).

6. The lifting structure of the wafer soaking device according to claim 1, characterized in that: The vertical plate (2) is provided with synchronous belt passing holes at positions corresponding to the driving pulley (3) and the driven pulley (4); the synchronous belt (5) passes through the two synchronous belt passing holes, so that the synchronous belt (5) is divided into two parts: a part located on the side of the vertical plate (2) close to the lifting frame (002) and a part located on the side of the vertical plate (2) away from the lifting frame (002).

7. The lifting structure of the wafer soaking device according to claim 6, characterized in that: A guide rail (15) is installed on one side of the vertical plate (2) close to the lifting frame (002), and the length direction of the guide rail (15) is parallel to the vertical direction and the length direction of the synchronous belt (5). A slider (16) is slidably connected to the guide rail (15), and the slider (16) is connected to the lifting frame (002).

8. The lifting structure of the wafer soaking device according to claim 1, characterized in that: The left and right side surfaces of the vertical plate (2) are respectively fixedly connected with supporting ribs (17), and the lower ends of the supporting ribs (17) are respectively fixedly connected to the base plate (1).

9. The lifting structure of the wafer soaking device according to claim 8, characterized in that: A lifting origin detection sensor (18) is installed at the lower portion of one of the supporting ribs (17), and a lifting origin detection sensor trigger (19) used in conjunction with the lifting origin detection sensor (18) is installed on the lifting frame (002).

10. The lifting structure of the wafer soaking device according to claim 8, characterized in that: A slot re-inspection sensor trigger (20) is installed on the upper part of one of the supporting ribs (17), and a plurality of trigger teeth (2001) are protruded from top to bottom on the slot re-inspection sensor trigger (20), and a slot re-inspection sensor (21) used in conjunction with the slot re-inspection sensor trigger (20) is installed on the lifting frame (002).

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