Nickel plating device and method for multi-arc ion plating

Abstract

The invention belongs to the technical field of PVD (Physical Vapor Deposition) arc ion plating surface treatment, and particularly relates to a nickel plating device and method for multi-arc ion plating, which comprises a vacuum chamber, a flange structure, a nickel target, a magnetic field shielding cover, a magnetic field adjusting mechanism and an arc striking needle, the flange structure comprises a fixed flange and a detachable flange, the fixed flange is fixedly installed on the side face of the vacuum chamber, and the detachable flange is connected with the fixed flange through a bolt; the magnetic field adjusting mechanism comprises a neodymium-iron-boron permanent magnet located on the left side of the nickel target and a bolt, the neodymium-iron-boron permanent magnet is fixed to the end of the bolt, and the bolt is in threaded connection with the left end of the detachable flange; the distance to the nickel target is adjusted by rotating the bolt; the arc striking needle is arranged on the right side of the nickel target and used for triggering arc discharge. The adjustable neodymium iron boron permanent magnet and magnet column structure is arranged on the flange, so that the magnetic field distribution on the surface of the nickel target can be conveniently adjusted, an ideal magnetic field distribution state is formed, and the problem of non-uniform magnetic field distribution caused by high magnetic permeability of the nickel target is effectively solved.

Description

Technical Field

[0001] The invention belongs to the technical field of PVD arc ion plating surface treatment, and in particular relates to a nickel plating device and method for multi-arc ion plating. Background Art

[0002] Physical vapor deposition (PVD) arc ion plating is a key technology in the modern field of physical vapor deposition. Its high ionization rate, fast deposition rate, and environmental friendliness make it irreplaceable in today's machining industry. Its principle is to induce an arc discharge between a cathode and an anode formed by a vacuum chamber in a vacuum environment. The arc motion evaporates the target material and deposits it onto the substrate surface to form a coating.

[0003] In modern industrial production, PVD arc ion plating technology has been widely used on the outer surfaces of workpieces in various fields. Nickel, as a high magnetic permeability material, has an uneven internal magnetic field distribution, which causes the ion nickel plating process to be extremely unstable. In the traditional arc ion plating process, the magnetic field distribution on the surface of the nickel target is disordered, which causes the movement of arc spots on the target surface to lose regularity, resulting in abnormal phenomena such as arc spot aggregation or arc running, which in turn leads to uneven coating deposition and unstable quality, seriously restricting the large-scale application of arc ion nickel plating technology in industrial production. Arc ion nickel plating has been in the scientific research and exploration stage for a long time. No research reports on the influence of magnetic fields on the arc ion nickel plating process and performance have been found in scientific literature at home and abroad.

[0004] Therefore, how to stabilize the arc ion nickel plating process by optimizing the magnetic field distribution has become a key technical problem that needs to be solved urgently in this field. Summary of the Invention

[0005] The purpose of the present invention is to provide a method for assisting arc ion nickel plating. The method can change the magnetic field environment around the nickel target to maintain the magnetic field distribution on the surface of the nickel target to be conducive to the arc ion nickel plating, so as to obtain the best magnetic field configuration for assisting arc ion nickel plating, thereby optimizing the arc ion nickel plating process and ultimately achieving the purpose of application in industrial production.

[0006] To achieve the above object, the present invention adopts the following specific technical solutions: a nickel plating device for multi-arc ion plating, comprising a vacuum chamber providing a vacuum deposition environment, a flange structure, a nickel target, a magnetic field shield, a magnetic field adjustment mechanism and an arc starting needle;

[0007] The flange structure includes a fixed flange and a detachable flange, the fixed flange is fixedly mounted on the side of the vacuum chamber, and the detachable flange is connected to the fixed flange by bolts; the magnetic field shield is arranged on the right side of the detachable flange, and the nickel target is arranged in the magnetic field shield;

[0008] The magnetic field adjustment mechanism includes a NdFeB permanent magnet and a bolt located on the left side of the nickel target. The NdFeB permanent magnet is fixed to the end of the bolt, and the bolt is threadedly connected to the left end of the detachable flange. The distance from the nickel target is adjusted by rotating the bolt.

[0009] The arc starting needle is arranged on the right side of the nickel target and is used to trigger arc discharge.

[0010] Furthermore, the magnetic field adjustment mechanism also includes ferrosilicon columns fixed to the outer circumference of the fixed flange, and the upper end surface of each ferrosilicon column magnetically attracts a plurality of magnets.

[0011] Furthermore, the ferrosilicon column is cylindrical, and six ferrosilicon columns are evenly arranged on the outer circumference of the fixed flange; the magnetic N pole of the magnet faces the direction of the ferrosilicon column.

[0012] Furthermore, a plurality of circular spacers are provided between the ferrosilicon column and the magnet; the circular spacers are made of A3 steel, and the position of the magnet relative to the nickel target is adjusted by adjusting the number of circular spacers. Furthermore, the magnetic field shield is welded using Permalloy.

[0013] A nickel plating method using multi-arc ion plating comprises the following steps:

[0014] S1. Pre-treat the parts to be plated: polish and clean the parts to be plated;

[0015] S2, adjusting the magnetic field around the nickel target;

[0016] S3. Preparation of nickel film layer: Place the ultrasonically cleaned part to be plated into a vacuum chamber and perform glow cleaning; then turn on the power to perform deposition;

[0017] S4. After the deposition is completed, wait for the furnace temperature to cool down before taking out the workpiece.

[0018] Furthermore, in step S2, adjusting the ambient magnetic field around the nickel target specifically includes adjusting the magnetic field strength of the ambient magnetic field around the nickel target by adjusting the distance between the NdFeB permanent magnet on the left side of the nickel target and the nickel target, and the number of magnets on the ferrosilicon column.

[0019] Furthermore, in step S3, the nickel film layer is prepared by placing the ultrasonically cleaned workpiece into a vacuum chamber, applying -800V bias glow cleaning for 15 minutes, turning on the arc ion plating power supply, and starting nickel target deposition for 30 minutes.

[0020] The present invention can achieve the following technical effects:

[0021] The present invention arranges an adjustable NdFeB permanent magnet and a magnet column structure on the flange, which can conveniently adjust the magnetic field distribution on the surface of the nickel target to form an ideal magnetic field distribution state, and effectively solves the problem of uneven magnetic field distribution caused by the high magnetic permeability of the nickel target.

[0022] Under the action of the optimized magnetic field distribution, the arc spot can perform relatively stable scaling motion on the nickel target surface, thereby avoiding arc spot aggregation or arc running and ensuring the stability of the coating deposition process.

[0023] The device of the present invention can conveniently adjust the magnetic field. The magnetic field strength and distribution can be adjusted by adjusting bolts and adding or removing gaskets. No complicated control system is required, which is convenient for promotion and application in industrial production. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 It is a structural schematic diagram of the nickel plating device disclosed in the present invention;

[0025] Figure 2 This is a schematic diagram of the exploded structure of the nickel plating device disclosed in the present invention;

[0026] Figure 3 for Figure 2 sectional view of

[0027] Figure 4 The present invention is a flow chart of the nickel plating method disclosed in the present invention.

[0028] In the figure: 1. Bolt; 2. NdFeB permanent magnet; 3. Flange structure; 301. Fixed flange; 302. Removable flange; 4. Ferrosilicon column; 5. Magnet; 6. Arc starting needle; 7. Magnetic field shield; 8. Nickel target; 9. Vacuum chamber. DETAILED DESCRIPTION

[0029] In order to make the purpose, technical solutions and advantages of the present invention more clearly understood, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and do not constitute a limitation of the present invention.

[0030] refer to Figure 1-4 A nickel plating device for multi-arc ion plating includes a vacuum chamber 9, a flange structure 3, a nickel target 8, a magnetic field shield 7, a magnetic field adjustment mechanism and an arc starting needle 6; the vacuum chamber 9 provides a vacuum deposition environment and has an opening for placing a test piece.

[0031] The flange structure 3 includes a fixed flange 301 and a removable flange 302. The fixed flange 301 is fixedly mounted on the side of the vacuum chamber 9. The removable flange 302 is connected to the fixed flange 301 by bolts 1. Both the fixed flange 301 and the removable flange 302 are circular plate-shaped structures.

[0032] A magnetic field shield 7 is positioned to the right of the removable flange 302. A nickel target 8 is positioned within the shield, with a gap between the shield and the target to ensure proper arc discharge. The nickel target 8 is 99 mm in diameter, 20 mm thick, and 99.98% pure. The target material is evaporated and ionized into a metal plasma by the arc discharge, which is then deposited on the substrate to form a nickel coating.

[0033] The magnetic field adjustment mechanism includes a NdFeB permanent magnet 2 and a bolt 1 located on the left side of the nickel target 8. The NdFeB permanent magnet 2 is fixed to the end of the bolt 1, and the bolt 1 is threadedly connected to the left end of the detachable flange 302; the bolt 1 is rotated to make the NdFeB permanent magnet 2 approach or move away from the nickel target 8, thereby adjusting the magnetic field strength; the NdFeB permanent magnet 2 is 30 mm long and 25 mm in diameter, and the maximum magnetic field strength is 3000 Gs. The distance from the end face of the NdFeB permanent magnet 2 to the target surface is adjustable by the bolt 1, and the magnetic pole of the front end face of the NdFeB permanent magnet 2 is the S pole.

[0034] The arc-starting needle 6 is fixedly installed in the vacuum chamber 9 and is aligned with the right surface of the nickel target 8. The arc-starting needle 6 triggers arc discharge on the cathode target surface to form a cathode arc spot. The local temperature instantly reaches 8000-15000K, causing the target to evaporate and ionize into metal plasma.

[0035] Furthermore, the magnetic field adjustment mechanism further includes ferrosilicon columns 4 fixed to the outer circumference of the fixed flange 301 , and each ferrosilicon column 4 magnetically attracts a plurality of magnets 5 on its upper end surface.

[0036] Furthermore, the ferrosilicon pillars 4 are cylindrical, 20 mm in diameter, and 5 mm in height. Six are evenly spaced around the outer circumference of the fixed flange 301. The magnets 5 are 20 mm in diameter and 10 mm in height, with a single magnetic field strength of approximately 2000 GS. The north pole of each magnet 5 faces the direction of the ferrosilicon pillars 4. The magnets 5 are magnetically attached to the upper end surfaces of the ferrosilicon pillars 4. Adjacent magnets 5 attract each other to form a magnetic column. The magnetic field strength can be adjusted by increasing or decreasing the number of magnets 5.

[0037] Furthermore, several circular gaskets are arranged between the ferrosilicon column 4 and the magnet 5; the circular gaskets are made of A3 steel, with a diameter of 20 mm and a thickness of 0.5 mm. By adjusting the number of circular gaskets, the position of the magnet 5 relative to the nickel target 8 can be finely adjusted to adjust the local magnetic field strength on the target surface.

[0038] Furthermore, the magnetic field shield 7 is welded from Permalloy and has a thickness of 2 mm, an inner diameter of 100 mm, an outer diameter of 104 mm, and a height of 50 mm. The target magnetic field shield 7 is a sleeve structure that fits over the exterior of the nickel target 8 and is positioned on the right side of the removable flange 302.

[0039] A nickel plating method using multi-arc ion plating comprises the following steps:

[0040] S1. Pre-treat the workpiece to be plated: The workpiece to be processed has a size of 20mm×20mm×2mm and is made of A3 steel. Polish the workpiece to be plated and then clean it. Polish the workpiece with sandpaper, and then perform ultrasonic cleaning with ethanol. Specifically: Use sandpaper with a roughness of 240-2000# to polish it. Rinse the polished sample with deionized water and then place it in an ethanol solution for ultrasonic cleaning. The ultrasonic cleaning temperature is 20℃-25℃ and the cleaning time is 15 minutes. Dry the cleaned sample with a hair dryer at a temperature of 20℃-25℃. Finally, hang the specimen directly opposite the target position, 15-20cm away from the target surface, and evacuate it.

[0041] S2. Adjust the environmental magnetic field around the nickel target 8; adjust the environmental magnetic field around the nickel target 8, change the magnitude and direction of the magnetic field, so that the magnetic field in the middle of the nickel target 8 to the surrounding magnetic field shows a downward trend, so that the arc spot performs a relatively stable scaling motion on the surface of the nickel target 8, does not run the arc, and does not gather at the center of the target surface;

[0042] S3, prepare nickel film layer: put the ultrasonically cleaned parts to be plated into the vacuum chamber 9, evacuate to 5×10 -3 When the pressure in the furnace reaches about 1 Pa, the protective gas argon is introduced until the pressure in the furnace reaches about 1 Pa. The pulse bias power supply is turned on and the bias voltage is adjusted to -800 V. Glow cleaning is performed for 15 minutes. Then the arc ion plating power supply is turned on and the nickel target 8 is started. The deposition time is 30 minutes.

[0043] S4. After the deposition is completed, continue to steadily flow argon into the vacuum furnace for 5-60 minutes, and remove the plated parts when the temperature drops to room temperature;

[0044] Furthermore, regulating the ambient magnetic field around the nickel target 8 includes adjusting the magnetic field strength of the ambient magnetic field around the nickel target 8 by adjusting the distance between the NdFeB permanent magnet 2 on the left side of the nickel target 8 and the nickel target 8, as well as the number of magnets 5 on the ferrosilicon pillars 4. Specifically, the horizontal position of the NdFeB permanent magnet 5 on the left side of the nickel target 8 is adjusted to a magnetic field strength of 3000 Gs using a screw, thereby adjusting the magnetic field distribution on the target surface, with the S pole of the NdFeB permanent magnet 5 facing the nickel target 8. Six ferrosilicon pillars 4 with a diameter of 20 mm and a height of 5 mm are distributed around the outer circumference of the fixed flange 301. The ferrosilicon pillars 4 are welded to the outer surface of the fixed flange 301. The magnetic field distribution on the target surface is regulated by placing several cylindrical NdFeB permanent magnets 2 with a magnetic field strength of approximately 2000 Gs on the upper end surface of each ferrosilicon pillar 4. The magnets 5 each have a magnetic field strength of approximately 2000 Gs, and adjacent magnets 5 attract each other to form a magnet column. The magnetic north pole of the magnet column is placed directly opposite the surface of the ferrosilicon column 4 on the flange. The NdFeB permanent magnet 5 on the left side of the nickel target 8 and the six groups of magnet columns on the fixed flange 301 form a magnetic field, resulting in an optimal magnetic field configuration of 40-50 GS at the center of the nickel target 8 and 20-30 GS at the edge of the target surface (approximately 2-3 mm from the side of the target).

[0045] Furthermore, in step S3, the nickel film layer is prepared by placing the ultrasonically cleaned workpiece into the vacuum chamber 9, and the vacuum pump of the vacuum chamber 9 starts to work. -3 At 1 pa, protective argon gas is introduced into the vacuum chamber 9 at a flow rate of 200 ml / min. The pressure in the vacuum chamber 9 is adjusted to stabilize at 1 pa. The pulse bias power supply is turned on, a negative bias is applied to the workpiece to be plated, the bias voltage is modulated to -800 V, and the glow power supply is turned on for 15 minutes. The glow power supply is then turned off and the bias voltage is adjusted to -150 V. The pulse arc ion plating power supply is turned on, and the deposition time is 30 minutes with an arc current of 70-80 A.

[0046] Example 1

[0047] Select an A3 steel specimen of size 20mm×20mm×2mm, grind, polish, ultrasonically clean with ethanol, and weigh the mass. Adjust the distance between the NdFeB permanent magnet 5 on the left side of the nickel target 8 and the target surface of the nickel target 8 to 6cm. Set two magnets 5 on the silicon iron column 4. Place an A3 steel circular gasket with a diameter of 20mm and a thickness of 0.5mm between the magnet 5 and the silicon iron column 4 to make the magnetic field distribution at the symmetrical position of the target surface roughly uniform. The magnetic field formed acts on the target surface. The magnetic field strength at the center of the target surface is measured with a Gaussmeter to be 42±2Gs, and the magnetic field strength at the edge of the target surface is 28±2GS. Place the specimen in the vacuum chamber 9. Hang it at a distance of 18cm from the target surface so that the specimen faces the target surface. Start evacuating the vacuum chamber until the background vacuum reaches 5×10 -3At pa, introduce shielding gas argon. Turn on the pulsed bias power supply, adjust the bias voltage to -800V, turn on the glow power supply, and clean for 15 minutes. Then turn off the glow power supply and adjust the bias voltage to -150V. Turn on the open arc power supply and deposit for 30 minutes. The arc current is 80A.

[0048] Results: During the deposition process, it was observed that the arc spots were small and moved slightly slowly.

[0049] Example 2

[0050] Select an A3 steel specimen of size 20mm×20mm×2mm, grind, polish, ultrasonically clean with ethanol, and weigh the mass. Adjust the distance between the NdFeB permanent magnet 5 on the left side of the nickel target 8 and the target surface to 5cm. Set three magnets 55 on each ferrosilicon column 4. Place two gaskets with a diameter of 20mm between the magnet 5 and the ferrosilicon column 4 to make the magnetic field distribution at the symmetrical position of the target surface roughly uniform. The magnetic field formed acts on the target surface. The magnetic field strength at the center of the target surface is measured by a Gaussmeter to be 44±2Gs, and the magnetic field strength at the edge of the target surface is 25±2GS. Place the specimen in the vacuum chamber 9. Hang it at a distance of 18cm from the target surface so that the specimen is facing the target surface. Start evacuating the vacuum chamber until the background vacuum reaches 5×10 -3 At pa, introduce shielding gas argon. Turn on the pulse bias power supply, adjust the bias voltage to -800V, turn on the glow power supply, and clean for 15 minutes. Then turn off the glow power supply and adjust the bias voltage to -150V. Turn on the arc power supply and deposit for 30 minutes. The arc current is 75A.

[0051] Results: During the deposition process, the arc spot movement range became significantly larger, the movement speed increased, and the arc spot showed a trend of contraction.

[0052] Example 3

[0053] Select an A3 steel specimen of size 20mm×20mm×2mm, grind, polish, ultrasonically clean with ethanol, and weigh the mass. Adjust the distance between the NdFeB permanent magnet 5 on the left side of the nickel target 8 and the target surface to 4cm, and set four magnets 5 on each ferrosilicon column 4. No circular gasket is set between the magnet 5 and the ferrosilicon column 4; the conjugate magnetic field formed by it acts on the target surface, and the magnetic field strength of the target surface is measured by a Gaussmeter to be 48Gs±2Gs, and the magnetic field strength at the edge of the target surface is 22±2GS. Place the specimen in the vacuum chamber 9. Hang it at a distance of 18cm from the target surface so that the specimen is facing the target surface. Start evacuating the vacuum chamber until the background vacuum reaches 5×10 -3 At pa, introduce shielding gas argon. Turn on the pulse bias power supply, adjust the bias voltage to -800V, turn on the glow power supply, and clean for 15 minutes. Then turn off the glow power supply and adjust the bias voltage to -150V. Turn on the arc power supply and deposit for 30 minutes. The arc current is 70A.

[0054] Results: The arc spot becomes smaller, the arc spot's movement speed increases, and the arc spot rotates rapidly at the edge of the target.

[0055] Experiments show that the ideal magnetic field intensity distribution for arc ion nickel plating is achieved when the target center magnetic field is 40-50 GS and the target surface edge magnetic field strength is 20-30 GS. The arc ion plating current is 70-80A, the ambient gas is argon, and the pressure is 1 Pa. The present invention optimizes the magnetic field distribution, allowing the arc spot to perform relatively stable scaling motion on the surface of the nickel target 8, avoiding arc spot aggregation or arc running, and ensuring the stability of the coating deposition process.

[0056] In the description of this specification, the reference terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" mean that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art can combine and combine different embodiments or examples described in this specification and features of different embodiments or examples without contradiction.

[0057] Although the embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention. Those skilled in the art may make changes, modifications, substitutions, and variations to the above embodiments within the scope of the present invention.

[0058] The above specific embodiments of the present invention do not constitute a limitation on the scope of protection of the present invention. Any other corresponding changes and modifications made based on the technical concept of the present invention should be included in the scope of protection of the claims of the present invention.

Claims

1. A nickel plating device for multi-arc ion plating, characterized in that: It comprises a vacuum chamber (9), a flange structure (3), a nickel target (8), a magnetic field shield (7), a magnetic field adjustment mechanism and an arc-starting needle (6); The flange structure (3) comprises a fixed flange (301) and a detachable flange (302), wherein the fixed flange (301) is fixedly mounted on a side of the vacuum chamber (9), and the detachable flange (302) is connected to the fixed flange (301) via bolts (1); the magnetic field shield (7) is arranged on the right side of the detachable flange (302), and the nickel target (8) is arranged inside the magnetic field shield (7); The magnetic field adjustment mechanism comprises a NdFeB permanent magnet (2) and a bolt (1) located on the left side of the nickel target (8); the NdFeB permanent magnet (2) is fixed to the end of the bolt (1); the bolt (1) is threadedly connected to the left end of the detachable flange (302); and the distance from the nickel target (8) is adjusted by rotating the bolt (1); The arc starting needle (6) is arranged on the right side of the nickel target (8) and is used to trigger arc discharge.

2. The nickel plating device of multi-arc ion plating according to claim 1, characterized in that: The magnetic field adjustment mechanism further comprises ferrosilicon columns (4) fixed on the outer circumference of the fixed flange (301), and the upper end surface of each ferrosilicon column (4) magnetically attracts a plurality of magnets (5).

3. The nickel plating device of multi-arc ion plating according to claim 2, characterized in that: The ferrosilicon columns (4) are cylindrical, and six ferrosilicon columns (4) are evenly arranged on the outer circumference of the fixed flange (301); the magnetic N pole of the magnet (5) faces the direction of the ferrosilicon columns (4).

4. The nickel plating device of multi-arc ion plating according to claim 3, characterized in that: A plurality of circular gaskets are provided between the ferrosilicon column (4) and the magnet (5); the circular gaskets are made of A3 steel, and the position of the magnet (5) relative to the nickel target (8) is adjusted by adjusting the number of the circular gaskets.

5. The nickel plating device of multi-arc ion plating according to claim 1, characterized in that: The magnetic field shield (7) is formed by welding Permalloy.

6. A nickel plating method using multi-arc ion plating, characterized in that: The following steps are involved: S1. Pre-treatment of the parts to be plated: S2, adjusting the ambient magnetic field around the nickel target (8); S3, preparing a nickel film layer: placing the ultrasonically cleaned part to be plated into a vacuum chamber (9) and performing glow cleaning; then turning on the power supply to perform deposition; S4. After the deposition is completed, wait for the furnace temperature to cool down before taking out the workpiece.

7. The nickel plating method of multi-arc ion plating according to claim 6, characterized in that: In step S2, adjusting the environmental magnetic field around the nickel target (8) specifically includes: adjusting the distance between the neodymium iron boron permanent magnet (2) on the left side of the nickel target (8) and the nickel target (8), and adjusting the number of magnets (5) on the silicon iron column (4) to adjust the magnetic field strength of the environmental magnetic field around the nickel target (8).

8. The nickel plating method of multi-arc ion plating according to claim 7, characterized in that: The nickel film layer is prepared in step S3 by placing the ultrasonically cleaned part to be plated into a vacuum chamber (9), applying a -800V bias glow cleaning for 15 minutes, turning on the arc ion plating power supply, and starting the nickel target (8) to deposit for 30 minutes.

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