Swallow-shaped eight-gluing beam splitter prism and preparation method and application thereof

By designing a swallow-shaped eight-cemented beam splitter prism and adopting specific materials and vacuum coating technology, the problem of accumulated optical path errors in the existing technology is solved, high-precision light transmission and spectral screening are achieved, and the requirements of the four-detector optical information field are met.

CN120669338APending Publication Date: 2025-09-19HENAN PINGYUAN OPTO ELECTRONICS CO LTD
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Patent Information

Application Number
CN202510930375.6
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-07-07
Publication Date
2025-09-19

AI Technical Summary

Technical Problem

Existing glued prisms make it difficult to achieve the selective separation of more light information in a beam of light, resulting in the accumulation of errors in the direction of light transmission in the optical path. Auxiliary adjustment mechanisms are required, which goes against the miniaturization and lightweight development of optoelectronic devices.

Method used

The swallow-shaped eight-cemented beamsplitter prism is designed, using three beamsplitter cemented prisms and two right-angle total reflection prisms. The vacuum-coated beamsplitter film ensures that the angle deviation between the four exiting light paths and the optical axis is less than 60", and achieves high transmittance in a specific wavelength range. H-K9L optical glass, tantalum pentoxide and silicon dioxide materials are used for bonding with UV photosensitive adhesive.

Benefits of technology

High-precision transmission of light in the four outgoing light paths is achieved without the need for auxiliary adjustment mechanisms. The spectral characteristics have a transmittance greater than 85% in the specified wavelength range, meeting the spectral screening requirements of the four-detector optical information field.

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Abstract

The invention belongs to the technical field of special optical part machining, and relates to a swallow-shaped eight-gluing beam splitter prism and a preparation method and application thereof.The swallow-shaped eight-gluing beam splitter prism comprises a first beam splitter gluing prism, a second beam splitter gluing prism, a third beam splitter gluing prism, a total reflection prism C and a total reflection prism D, the first light splitting glued prism, the second light splitting glued prism and the third light splitting glued prism are arranged in a structure shaped like a Chinese character'pin 'lying towards the left side, and two right-angle faces of the total reflection prism C are glued to the right side face of the first light splitting glued prism and the bottom side face of the second light splitting glued prism respectively. And two right-angle surfaces of the total reflection prism D are respectively glued with the bottom side surface of the light splitting glued prism I and the left side surface of the light splitting glued prism III. The swallow-shaped eight-gluing beam splitter prism is applied to spectrum screening of a four-detector optical information field, and the angle deviation between the four emergent light path directions of a light beam carrying optical information and the optical axis direction of the swallow-shaped eight-gluing prism is smaller than 60 ''after the light beam passes through the swallow-shaped eight-gluing prism.
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Description

Technical Field

[0001] The present invention belongs to the technical field of special optical parts processing, and in particular relates to a swallow-shaped eight-cemented beam splitter prism and a preparation method and application thereof. Background Art

[0002] A bonded prism is an optical component composed of two or more prisms bonded together with an optical adhesive (such as epoxy resin or UV-curable adhesive). By exploiting the refraction and reflection properties of light and designing the prism's shape, angle, and bonding method, light can be directed along specific paths within the prism. By exploiting the interference of light and designing the optical thin film structure of the prism's beam splitting surfaces, light of different spectral bands can be transmitted, reflected, or absorbed. Currently, the more mature two- or three-bonded beamsplitter prisms available in China and abroad can only split a single light beam into two or three propagation paths. This means that a single light beam can only carry two or three types of optical information, which can be transmitted to the detector through the bonded prism. It is difficult to selectively separate more optical information within a single beam.

[0003] With the continuous advancement of science and technology in the optoelectronics industry, optoelectronic devices are increasingly transitioning to more integrated, miniaturized, and lightweight designs. Cemented prisms, capable of selectively separating more optical information from a beam, are becoming a core component of these devices. To achieve this separation, more prisms must be bonded together to split and redirect the light for transmission to the detector. The addition of more prisms can lead to cumulative errors in the direction of light transmission, causing the light to stray from the detector and prevent it from detecting any optical information. This necessitates the addition of auxiliary adjustment mechanisms to compensate for these errors, which, in turn, is inconsistent with the trend toward miniaturization and lightweighting of optoelectronic devices. Therefore, the development of higher-precision bonded beamsplitter prisms while ensuring the accuracy of light transmission is a cutting-edge area of ​​specialty optical component processing both domestically and internationally.

[0004] Therefore, it is urgent to propose a swallow-shaped eight-cemented beam splitter prism and its preparation method and application. Summary of the Invention

[0005] The purpose of the present invention is to provide a higher-precision swallow-shaped eight-cemented beam splitter prism and a processing method thereof, which are applied to the spectral screening of the four-detector light information field. After a beam of light carrying light information passes through the swallow-shaped eight-cemented prism, the angle deviation between the four outgoing light paths and the optical axis direction of the swallow-shaped eight-cemented prism is less than 60", ensuring that the outgoing light is transmitted to the detector without the need for an additional detector auxiliary adjustment mechanism to compensate for the light transmission error. At the same time, the spectral characteristics of the four outgoing light paths are: in the wavelength ranges of 0.44μm~0.5μm, 0.56μm~0.61μm, 0.69μm~0.76μm, and 0.88μm~0.96μm, the transmittance is greater than 85%.

[0006] In order to achieve one of the above-mentioned objectives, the present invention proposes a swallow-shaped eight-cemented beam splitter prism, the technical solution of which is as follows: A swallow-shaped eight-cemented beam splitter prism, comprising three beam splitter cemented prisms and two right-angle total reflection prisms, wherein the three beam splitter cemented prisms are respectively a beam splitter cemented prism 1, a beam splitter cemented prism 2, and a beam splitter cemented prism 3, and the two right-angle total reflection prisms are respectively a total reflection prism C and a total reflection prism D, and the beam splitter cemented prism 1, the beam splitter cemented prism 2, and the beam splitter cemented prism 3 are respectively formed by gluing two right-angle prisms together, and the beam splitter cemented prism 1, the beam splitter cemented prism 2, and the beam splitter cemented prism 3 are respectively formed by gluing two right-angle prisms together. The second bonded prism and the third beam-splitting bonded prism are arranged in a "P"-shaped structure lying on the left side. The two right-angled surfaces of the total reflection prism C are respectively bonded to the right side surface of the first beam-splitting bonded prism and the bottom side surface of the second beam-splitting bonded prism. The two right-angled surfaces of the total reflection prism D are respectively bonded to the bottom side surface of the first beam-splitting bonded prism and the left side surface of the third beam-splitting bonded prism. A beam-splitting film is vacuum-coated between the bonded surfaces of the two right-angle prisms of each beam-splitting bonded prism. The film parameters of the beam splitter film in the beam splitter cemented prism 1 are as follows: in the wavelength range of 0.44μm to 0.61μm, the average reflection is greater than 85%; in the wavelength range of 0.69μm to 0.96μm, the average transmission is greater than 90%; The film parameters of the beam splitter film in the second beam splitter cemented prism are: in the wavelength range of 0.44μm to 0.5μm, the average reflection is greater than 85%; in the wavelength range of 0.56μm to 0.76μm, the average transmission is greater than 90%; The film parameters of the three beam splitting films in the beam splitting cemented prism are as follows: in the wavelength range of 0.69μm to 0.76μm, the average reflection is greater than 85%; in the wavelength range of 0.88μm to 0.96μm, the average transmission is greater than 90%.

[0007] In order to achieve the second object of the present invention, the present invention provides a method for preparing a swallow-shaped eight-cemented beam splitter prism, which comprises the following steps: S1. Material selection Optical glass materials should be highly transparent and non-absorbent in the response spectrum band of optoelectronic device detectors, and should also have high chemical stability and strong environmental adaptability. H-K9L crown optical glass can be selected. Optical film materials should be highly transparent and non-absorbent in the optical glass spectral application band, and should also have high chemical stability and strong environmental adaptability. Examples include tantalum pentoxide (Ta2O5) and silicon dioxide (SiO2). Photosensitive adhesive materials should be highly transparent and non-absorbent in the optical glass spectral application band, and should have high bonding strength and low shrinkage. Examples include UV photosensitive adhesive. S2. Blank Manufacturing H-K9L crown optical glass is used to produce right-angle prisms and right-angle total reflection prisms with surface defects reaching B=Ⅲ level, surface shape reaching PV≤0.5λ, RMS≤0.15λ, where λ=632.8nm, parallel error reaching θⅠ=θⅡ=5″, and angular value accuracy of Δψ=5″; S3. Vacuum coating of the beam splitting films on each beam splitting cemented prism Vacuum-coating the beam splitting film of each beam splitting cemented prism according to the set film system structure; S4. Gluing According to the set glue layer thickness, the right-angle prisms and the right-angle total reflection prisms are glued in sequence to obtain the swallow-shaped eight-glue beam splitter prism.

[0008] Preferably, in step S1, the UV photosensitive adhesive is prepared from GBN-50AA optical photosensitive adhesive and GBN-50AB optical photosensitive adhesive in a mass ratio of 4:1.

[0009] Preferably, in step S3, the two right-angle prisms in the beam-splitting cemented prism are prism AA and prism AB respectively, and the film structure of the beam-splitting film in the beam-splitting cemented prism is set as follows: AA / 107.3 nm (SiO2) 56.9 nm (Ta2O5) 117.3 nm (SiO2) 70.6 nm (Ta2O5) 127.7 nm (SiO2) 66.4 nm (Ta2O5) 107.1 nm (SiO2) 54.82 nm (Ta2O5) 100.2 nm (SiO2) 61.1 nm (Ta2O5) 117.3 nm (SiO2) 67.4 nm (Ta2O5) 121.2 nm (SiO2) 65.1 nm (Ta2O5) 94.5 nm (SiO2) 44.3 nm (Ta2O5) 95.1 nm (SiO2) 63.68 nm (Ta2O5) 120.6 nm (SiO2) 68.4 nm(Ta2O5) 123.4 nm(SiO2) 65.4 nm (Ta2O5) 105.7 nm (SiO2) 54.7 nm (Ta2O5) 107.4 nm (SiO2) 64.5 nm (Ta2O5) 123.1 nm (SiO2) 69.4 nm (Ta2O5) 135.8 nm (SiO2) 75.1 nm (Ta2O5) 139.2 nm (SiO2) 68.9 nm (Ta2O5) 127.5 nm (SiO2) 68.1 nm (Ta2O5) 115.9 nm (SiO2) 54.9 nm (Ta2O5) 102.6 nm (SiO2) 65.2 nm (Ta2O5) 124.4 nm (SiO2) 67.9 nm (Ta2O5) 133.4 nm (SiO2) 75.2 nm(Ta2O5) 143.2 nm(SiO2) 74.1 nm(Ta2O5) 135.2 nm(SiO2) 71.80nm(Ta2O5) 134.84nm(SiO2) 97.7 nm(Ta2O5) 88.9 nm(SiO2) 99.4 nm(Ta2O5) 129.4 nm(SiO2) 72.3 nm(Ta2O5) 136.8 nm(SiO2) 75.7 nm (Ta2O5) 139.3nm (SiO2) 73.3 nm (Ta2O5) 132.9 nm (SiO2) 73.2 nm (Ta2O5) 135.4 nm (SiO2) 73.2 nm (Ta2O5) 115.6 nm (SiO2) 54.7 nm (Ta2O5) 73.7 nm (SiO2) / UV UV photosensitive adhesive (0.015±0.005mm) / AB.

[0010] Preferably, in step S3, the two right-angle prisms in the second beam-splitting cemented prism are prism BA and prism BB respectively, and the film structure of the beam-splitting film in the second beam-splitting cemented prism is set as follows: BA / 55.1 nm (Ta2O5) 73.56 nm (SiO2) 62.8 nm (Ta2O5) 111.4 nm (SiO2) 58.5 nm (Ta2O5) 103.5 nm (SiO2) 58.9 nm (Ta2O5) 109.8 nm (SiO2) 59.9 nm (Ta2O5) 108.8 nm (SiO2) 59.2 nm (Ta2O5) 107.9 nm (SiO2) 60.7 nm (Ta2O5) 108.7 nm (SiO2) 61.1 nm (Ta2O5) 105.9 nm (SiO2) 61.8 nm (Ta2O5) 105.1 nm (SiO2) 68.1 nm (Ta2O5) 86.2 nm (SiO2) 69.6 nm (Ta2O5) 111.1nm (SiO2) 78.3 nm (Ta2O5) 45.4 nm (SiO2) 83.7 nm (Ta2O5) 126.8 nm (SiO2) 86.3 nm (Ta2O5) 18.6 nm (SiO2) 89.7 nm (Ta2O5) 135.8 nm (SiO2) 97.1 nm (Ta2O5) 8.1 nm (SiO2) 111.6 nm (Ta2O5) 68.7 nm (SiO2) 88.3 nm (Ta2O5) 81.9 nm (SiO2) 89.2 nm (Ta2O5) 24.8 nm (SiO2) 94.6nm (Ta2O5) 136.1 nm (SiO2) 92.1 nm (Ta2O5) 13.4 nm(SiO2)84.9 nm(Ta2O5)133.4 nm(SiO2)95.2 nm(Ta2O5)10.8 nm(SiO2)118.1 nm(Ta2O5)42.3 nm(SiO2)108.6 nm(Ta2O5)57.3 nm(SiO2)95.6 nm(Ta2O5)29.3 nm(SiO2)79.9 nm(Ta2O5)61.9 nm(SiO2) / UV photosensitive adhesive (0.015±0.005mm) / BB.

[0011] Preferably, in step S3, the two right-angle prisms in the beam-splitting cemented prism three are prism CA and prism CB respectively, and the film system structure of the beam-splitting film in the beam-splitting cemented prism three is set as follows: CA / 140.4 nm (Ta2O5) 45.3 nm (SiO2) 132.4 nm (Ta2O5) 189.6 nm (SiO2) 123.5 nm (Ta2O5) 79.9 nm (SiO2) 122.2 nm (Ta2O5) 173.4 nm (SiO2) 107.5 nm (Ta2O5) 165.8 nm (SiO2) 109.1 nm (Ta2O5) 163.4 nm (SiO2) 111.7 nm (Ta2O5) 147.4 nm (SiO2) 113.8 nm (Ta2O5) 151.6nm (SiO2) 112.4 nm (Ta2O5) 157.9 nm (SiO2) 110.3 nm (Ta2O5) 158.3 nm (SiO2) 110.4 nm(Ta2O5)157.9 nm(SiO2)111.7 nm(Ta2O5)149.9 nm(SiO2)113.5 nm(Ta2O5)146.5 nm(SiO2)111.4 nm(Ta2O5)159.1 nm(SiO2)132.3 nm(Ta2O5)49.5 nm(SiO2)137.1 nm(Ta2O5)199.2 nm(SiO2) / UV photosensitive adhesive (0.015±0.005mm) / CB.

[0012] Preferably, in step S3, the vacuum coating step includes: S31, when the vacuum degree of APS ion beam assisted coating machine is higher than 6×10 -2 When Pa, the rectangular prism blank is baked at 180°C, kept at constant temperature for 30min to 60min, and vacuum is continued; S32, when the vacuum degree of APS ion beam assisted coating machine is higher than 3×10 -3 When Pa, the APS ion source is turned on to clean the substrate for 10 minutes, and then tantalum pentoxide (Ta2O5) and silicon dioxide (SiO2) film layers are cyclically deposited according to the designed film structure until the coating is completed.

[0013] Preferably, in step S4, before the last gluing of the product, each time the gluing between parts is completed, a 220V, 50Hz, 160W ultraviolet high-pressure mercury lamp is used to irradiate the parts for 20min to 30min, with the lamp distance of 20cm to 30cm, so that the photosensitive adhesive layer is initially cured. After the last gluing, the product is placed in an oven, and the baking temperature is controlled at 50℃ to 60℃, and the constant temperature is maintained for 6 hours to completely cure the photosensitive adhesive layer, so that the swallow-shaped eight-glued beam splitter prism can be obtained.

[0014] In order to achieve the third purpose of the above invention, the present invention proposes the application of the above-mentioned swallow-shaped eight-glued beam splitter prism in the spectral screening of the four-detector optical information field, so as to achieve that after a beam of light carrying optical information passes through the swallow-shaped eight-glued beam splitter prism, the angular deviation between the four outgoing light path directions of the light and the optical axis direction of the swallow-shaped eight-glued beam splitter prism is less than 60", and at the same time, the spectral characteristics of the four outgoing light path directions are: in the wavelength ranges of 0.44μm~0.5μm, 0.56μm~0.61μm, 0.69μm~0.76μm, and 0.88μm~0.96μm, the transmittance is greater than 85%.

[0015] The present invention also includes other devices or steps that can enable the swallow-shaped eight-cemented beam splitter prism and its preparation method and application to be used or performed normally, all of which are conventional technical means in the field. In addition, the devices or steps not limited in the present invention all adopt conventional means in the existing technology.

[0016] The beneficial effects of the present invention are as follows: the swallow-shaped eight-glued beam splitter prism proposed in the present invention is applied to the spectral screening of the four-detector optical information field, and can achieve that after a beam of light carrying optical information passes through the swallow-shaped eight-glued prism, the four outgoing light path directions of the light have an angular deviation of less than 60" from the optical axis direction of the swallow-shaped eight-glued prism, thereby ensuring that the outgoing light is transmitted to the detector, without the need for an additional detector auxiliary adjustment mechanism to compensate for the light transmission error. At the same time, the spectral characteristics of the four outgoing light path directions are: in the wavelength ranges of 0.44μm~0.5μm, 0.56μm~0.61μm, 0.69μm~0.76μm, and 0.88μm~0.96μm, the transmittance is greater than 85%. At the same time, the processing method of the present invention has stable process and reliable quality, and can enable the product to achieve higher precision, thereby meeting the spectral screening needs of the four-detector optical information field. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] The present invention will be further described below with reference to the accompanying drawings and examples.

[0018] Figure 1 Schematic diagram of the overall structure of the swallow-shaped eight-cemented beam splitter prism of the present invention in Example 1.

[0019] Figure 2 This is a schematic diagram of the main structure of the prism blank prepared in Example 2.

[0020] Figure 3 for Figure 2 Schematic diagram of the left view structure.

[0021] Figure 4 for Figure 2 Schematic diagram of the top view structure.

[0022] Figure 5 2 is a process flow chart of the present invention in Example 2.

[0023] Figure 6 This is a spectrum curve diagram of prism AA after vacuum coating in Example 2.

[0024] Figure 7 This is a spectrum curve diagram of prism BA after vacuum coating in Example 2.

[0025] Figure 8 This is a spectrum curve diagram of prism CA after vacuum coating in Example 2.

[0026] Figure 9 Schematic diagram of the film structure of each beam splitting cemented prism in Example 2.

[0027] Figure 10 Schematic diagram of the overall structure of each beam splitting cemented prism in Example 2.

[0028] Figure 11 Schematic diagram of the placement of the F2000 collimator, adjustable rotating stage, and F1000 front mirror in Example 2.

[0029] Figure 12 Schematic diagram of the placement of the standard right-angle prism, F400 front mirror, F2000 collimator, adjustable rotating stage and F1000 front mirror in Example 2.

[0030] Figure 13 Schematic diagram of the placement of the F400 front mirror, F600 front mirror, F2000 collimator, adjustable rotating stage and F1000 front mirror in Example 2.

[0031] Figure 14 Schematic diagram of the bonding state of the bonded prism (AA / AB) in Example 2.

[0032] Figure 15 Schematic diagram of the bonding state of the bonded prisms (AA / AB / C) in Example 2.

[0033] Figure 16 Schematic diagram of the bonding state of the bonded prisms (AA / AB / C / BA) in Example 2.

[0034] Figure 17 Schematic diagram of the bonding state of the bonded prisms (AA / AB / C / BA / BB) in Example 2.

[0035] Figure 18 Schematic diagram of the bonding state of the bonded prisms (AA / AB / C / BA / BB / D) in Example 2.

[0036] Figure 19Schematic diagram of the bonding state of the bonded prisms (AA / AB / C / BA / BB / D / CA) in Example 2.

[0037] Figure 20 Schematic diagram of the bonding state of the bonded prisms (AA / AB / C / BA / BB / D / CA / CB) in Example 2.

[0038] Figure 21 Schematic diagram of the direction of the light beam when performing optical path detection on the product in Example 2.

[0039] Figure 22 Schematic diagram of the corresponding positions of the swallow-shaped eight-cemented beam splitter prism and the four detectors when applied to the spectrum screening of the four-detector light information field in Example 3. DETAILED DESCRIPTION

[0040] The present invention is described below in conjunction with the accompanying drawings and specific embodiments of the present invention. The description herein is only used to explain the present invention and is not intended to limit the present invention. Based on the embodiments of the present invention, any modifications, equivalent substitutions, improvements, etc. made by those skilled in the art without creative work based on all other embodiments obtained in the present invention should be included in the scope of protection of the present invention.

[0041] Example 1 like Figure 1 As shown, the present invention provides a swallow-shaped eight-glued beam splitter prism, comprising three beam splitting glued prisms and two right-angle total reflection prisms, and the three beam splitting glued prisms are respectively beam splitting glued prism 1 1, beam splitting glued prism 2, and beam splitting glued prism 3, and the two right-angle total reflection prisms are respectively total reflection prism C4 and total reflection prism D5, and the beam splitting glued prism 1 1, the beam splitting glued prism 2, and the beam splitting glued prism 3 are respectively formed by gluing two right-angle prisms, and the beam splitting glued prism The beam splitting cemented prism 1, the beam splitting cemented prism 2, and the beam splitting cemented prism 3 are arranged in a "P"-shaped structure lying on the left side. The two right-angled surfaces of the total reflection prism C4 are respectively glued to the right side surface of the beam splitting cemented prism 1 and the bottom side surface of the beam splitting cemented prism 2. The two right-angled surfaces of the total reflection prism D5 are respectively glued to the bottom side surface of the beam splitting cemented prism 1 and the left side surface of the beam splitting cemented prism 3. A beam splitting film is vacuum-coated between the glued surfaces of the two right-angle prisms of each beam splitting cemented prism. The film parameters of the beam splitter film in the beam splitter cemented prism 1 are as follows: in the wavelength range of 0.44μm to 0.61μm, the average reflection is greater than 85%; in the wavelength range of 0.69μm to 0.96μm, the average transmission is greater than 90%; The film parameters of the beam splitting film in the beam splitting cemented prism 2 are as follows: in the wavelength range of 0.44μm to 0.5μm, the average reflection is greater than 85%; in the wavelength range of 0.56μm to 0.76μm, the average transmission is greater than 90%; The film parameters of the beam splitting film in the beam splitting cemented prism 3 are as follows: in the wavelength range of 0.69μm to 0.76μm, the average reflection is greater than 85%; in the wavelength range of 0.88μm to 0.96μm, the average transmission is greater than 90%.

[0042] In this embodiment, the two right-angle prisms of the beam splitting and cementing prism 1 are prism AA101 and prism AB102, the two right-angle prisms of the beam splitting and cementing prism 2 are prism BA201 and prism BB202, and the two right-angle prisms of the beam splitting and cementing prism 3 are prism CA301 and prism CB302.

[0043] Example 2 like Figure 5 As shown, this embodiment provides a method for preparing a swallow-shaped eight-cemented beam splitter prism, which is used to prepare the swallow-shaped eight-cemented beam splitter prism described in Example 1, comprising the following steps: S1. Material selection The optical glass material used for processing single-piece prisms is H-K9L crown optical glass produced by Chengdu Guangming Optoelectronics Co., Ltd. in China. Tantalum pentoxide (Ta2O5) and silicon dioxide (SiO2) are selected as optical film materials. UV photosensitive adhesive is an organic material. The UV photosensitive adhesive model GBN-50AA component and GBN-50AB component produced by the 53rd Institute of China North Industries Group Corporation are selected. The adhesive solution is mixed evenly at a mass ratio of component A:component B = 4:1.

[0044] S2. Blank Manufacturing The manufacturing of a single prism blank is polished by the classical optical photoresist processing method. The surface shape and surface finish of the part are tested in the upper plate state. After the part is qualified, it is unloaded, cleaned, and tested for parallelism and angle accuracy. The processed prism blank is as follows Figures 2-4 shown.

[0045] The specific process route for prism blank processing is as follows: Fine grinding of 1 surface → Rough polishing of 1 surface → Fine polishing of 1 surface → Apply protective glue, remove plate, clean → Polishing glue → Fine grinding of 3 surfaces, control 90°±5″ → Rough polishing of 3 surfaces, control 90°±5″ → Fine polishing of 3 surfaces, control 90°±5″ → Apply protective glue, remove plate, clean → Polishing glue → Fine grinding of 2 surfaces, control the first parallel difference θⅠ=5″ and the second parallel difference θⅡ=5″ of the prism → Rough polishing of 2 surfaces, control the first parallel difference θⅠ=5″ and the second parallel difference θⅡ=5″ of the prism → Fine polishing of 2 surfaces, control the first parallel difference θⅠ=5″ and the second parallel difference θⅡ=5″ of the prism → Apply protective glue, remove plate, clean → Polishing glue → Fine grinding of 4 surfaces, control 90°±5″ (control the verticality of the prism side) → Apply protective glue, remove plate, clean → Polishing glue → Fine grinding of 5 surfaces, control 90°±5″ (control the verticality of the prism side) → Apply protective glue, remove plate, clean → Inspect all technical requirements of parts → Go to next process.

[0046] The key process parameters of each stage are as follows:

[0047] By controlling the process parameters, H-K9L crown optical glass is manufactured into right-angle prisms and right-angle total reflection prisms with surface defects reaching B=Ⅲ level, surface shapes reaching PV≤0.5λ, RMS≤0.15λ, where λ=632.8nm, parallelism error reaching θⅠ=θⅡ=5″, and angular value accuracy of Δψ=5″. S3. Vacuum coating of the beam splitting films on each beam splitting cemented prism like Figures 6-8 As shown, the corresponding beam splitting film layers of each beam splitting cemented prism are vacuum-coated on the chordal surfaces of prism AA, prism BA, and prism CA according to the set film system structure; The film structure (including the adhesive layer) of the beam splitting film in the beam splitting cemented prism 1 is set as follows: AA / 107.3 nm (SiO2) 56.9 nm (Ta2O5) 117.3 nm (SiO2) 70.6 nm (Ta2O5) 127.7 nm (SiO2) 66.4 nm (Ta2O5) 107.1 nm (SiO2) 54.82 nm (Ta2O5) 100.2 nm (SiO2) 61.1 nm (Ta2O5) 117.3 nm (SiO2) 67.4 nm (Ta2O5) 121.2 nm (SiO2) 65.1 nm (Ta2O5) 94.5 nm (SiO2) 44.3 nm (Ta2O5) 95.1 nm (SiO2) 63.68 nm (Ta2O5) 120.6 nm (SiO2) 68.4 nm(Ta2O5) 123.4 nm(SiO2) 65.4 nm (Ta2O5) 105.7 nm (SiO2) 54.7 nm (Ta2O5) 107.4 nm (SiO2) 64.5 nm (Ta2O5) 123.1 nm (SiO2) 69.4 nm (Ta2O5) 135.8 nm (SiO2) 75.1 nm (Ta2O5) 139.2 nm (SiO2) 68.9 nm (Ta2O5) 127.5 nm (SiO2) 68.1 nm (Ta2O5) 115.9 nm (SiO2) 54.9 nm (Ta2O5) 102.6 nm (SiO2) 65.2 nm (Ta2O5) 124.4 nm (SiO2) 67.9 nm (Ta2O5) 133.4 nm (SiO2) 75.2 nm(Ta2O5) 143.2 nm(SiO2) 74.1 nm(Ta2O5) 135.2 nm(SiO2) 71.80nm(Ta2O5) 134.84nm(SiO2) 97.7 nm(Ta2O5) 88.9 nm(SiO2) 99.4 nm(Ta2O5) 129.4 nm(SiO2) 72.3 nm(Ta2O5) 136.8 nm(SiO2) 75.7 nm (Ta2O5) 139.3 nm (SiO2) 73.3 nm (Ta2O5) 132.9 nm (SiO2) 73.2 nm (Ta2O5) 135.4 nm (SiO2) 73.2 nm (Ta2O5) 115.6 nm (SiO2) 54.7 nm (Ta2O5) 73.7 nm (SiO2) / UV UV photosensitive adhesive (0.015±0.005mm) / AB.

[0048] Figure 6 FIG. 2 shows the spectrum curve of prism AA after vacuum coating.

[0049] The film structure (including the adhesive layer) of the beam splitting film in the beam splitting cemented prism 2 is set as follows: BA / 55.1 nm (Ta2O5) 73.56 nm (SiO2) 62.8 nm (Ta2O5) 111.4 nm (SiO2) 58.5 nm (Ta2O5) 103.5 nm (SiO2) 58.9 nm (Ta2O5) 109.8 nm (SiO2) 59.9 nm (Ta2O5) 108.8 nm (SiO2) 59.2 nm (Ta2O5) 107.9 nm (SiO2) 60.7 nm (Ta2O5) 108.7 nm (SiO2) 61.1 nm (Ta2O5) 105.9 nm (SiO2) 61.8 nm (Ta2O5) 105.1 nm (SiO2) 68.1 nm (Ta2O5) 86.2 nm (SiO2) 69.6 nm (Ta2O5) 111.1nm (SiO2) 78.3 nm (Ta2O5) 45.4 nm (SiO2) 83.7 nm (Ta2O5) 126.8 nm (SiO2) 86.3 nm (Ta2O5) 18.6 nm (SiO2) 89.7 nm (Ta2O5) 135.8 nm (SiO2) 97.1 nm (Ta2O5) 8.1 nm (SiO2) 111.6 nm (Ta2O5) 68.7 nm (SiO2) 88.3 nm (Ta2O5) 81.9 nm (SiO2) 89.2 nm (Ta2O5) 24.8 nm (SiO2) 94.6nm (Ta2O5) 136.1 nm (SiO2) 92.1 nm (Ta2O5) 13.4 nm(SiO2)84.9 nm(Ta2O5)133.4 nm(SiO2)95.2 nm(Ta2O5)10.8 nm(SiO2)118.1 nm(Ta2O5)42.3 nm(SiO2)108.6 nm(Ta2O5)57.3 nm(SiO2)95.6 nm(Ta2O5)29.3 nm(SiO2)79.9 nm(Ta2O5)61.9 nm(SiO2) / UV photosensitive adhesive (0.015±0.005mm) / BB.

[0050] Figure 7 FIG. 3 shows the spectrum curve of prism BA after vacuum coating.

[0051] The film structure (including the adhesive layer) of the beam splitting film in the beam splitting cemented prism 3 is set as follows: CA / 140.4 nm (Ta2O5) 45.3 nm (SiO2) 132.4 nm (Ta2O5) 189.6 nm (SiO2) 123.5 nm (Ta2O5) 79.9 nm (SiO2) 122.2 nm (Ta2O5) 173.4 nm (SiO2) 107.5 nm (Ta2O5) 165.8 nm (SiO2) 109.1 nm (Ta2O5) 163.4 nm (SiO2) 111.7 nm (Ta2O5) 147.4 nm (SiO2) 113.8 nm (Ta2O5) 151.6nm (SiO2) 112.4 nm (Ta2O5) 157.9 nm (SiO2) 110.3 nm (Ta2O5) 158.3 nm (SiO2) 110.4 nm(Ta2O5)157.9 nm(SiO2)111.7 nm(Ta2O5)149.9 nm(SiO2)113.5 nm(Ta2O5)146.5 nm(SiO2)111.4 nm(Ta2O5)159.1 nm(SiO2)132.3 nm(Ta2O5)49.5 nm(SiO2)137.1 nm(Ta2O5)199.2 nm(SiO2) / UV photosensitive adhesive (0.015±0.005mm) / CB.

[0052] Figure 8 The spectral curve of the prism CA after vacuum coating is shown in the figure. Figure 9 To show the film structure of each beam splitting cemented prism, Figure 10 The overall structure of each beam splitting cemented prism is shown.

[0053] Vacuum coating equipment includes thermal evaporation, ion-assisted evaporation, and ion beam sputtering. Ion beam-assisted coating methods produce dense and flat films with minimal absorption and scattering coefficients, strong mechanical strength, and excellent environmental adaptability. Therefore, an APS ion beam-assisted coating machine was selected for film preparation in this example. The APS ion source has high ion beam energy (50eV-180eV) and a uniform energy flux within the ion beam divergence angle (maximum 0.25mA / cm² on a substrate approximately 1m²).

[0054] The key process parameters of vacuum coating are as follows:

[0055] The vacuum coating process is as follows: when the vacuum degree of the APS ion beam assisted coating machine is higher than 6×10 -2 Pa, bake the blank at 180℃, keep the temperature constant for 30min~60min, and continue to evacuate. When the vacuum degree is higher than 3×10 -3At Pa, the APS ion source was activated to clean the substrate for 10 minutes according to the process parameters listed in Table 1. Tantalum pentoxide (Ta2O5) and silicon dioxide (SiO2) were then cyclically plated according to the process parameters and film thicknesses listed in Table 1 until the film system was complete. During the process, baking and maintaining a constant temperature on the photocatalytic substrate enhances the surface activity of the crystal and improves film strength. Ion beam cleaning of the photocatalytic substrate removes dust and other contaminants from the crystal surface, reducing the occurrence of film defects.

[0056] Table 1 APS ion beam assisted coating film process parameters

[0057] S4. Gluing According to the set glue layer thickness, the right-angle prisms and the right-angle total reflection prisms are glued in sequence to obtain the swallow-shaped eight-glue beam splitter prism.

[0058] The key process parameters for gluing are as follows:

[0059] The gluing process and steps are as follows: (1) If Figure 11 As shown, the position of the F1000 front mirror 7 is adjusted so that the output image of the F2000 collimator 8 coincides with the center of the graticule of the F1000 front mirror 7. The F1000 front mirror 7 and the F2000 collimator 8 are correspondingly arranged on both sides of the adjustable turntable 9.

[0060] (2) If Figure 12 As shown, adjust the adjustable turntable 9 so that the output image of the F1000 pre-mirror 7 is reflected by the surface of the standard right-angle prism 10, and the auto-collimation image A is located at the center of the graticule of the F1000 pre-mirror 7. Adjust the position of the F400 pre-mirror 11 so that the output image B of the F1000 pre-mirror 7 is reflected by the standard right-angle prism 10 and is located at the center of the graticule of the F400 pre-mirror 11.

[0061] (3) If Figure 13 As shown, the position of the F600 front mirror 12 is adjusted so that the output image of the F400 front mirror 11 coincides with the center of the graticule of the F600 front mirror 12.

[0062] (4) Place the chord surface of prism AA101 horizontally on a Class 100 clean bench. Drop UV photosensitive glue on the chord surface of prism AA101 on the Class 100 clean bench. Press the chord surface of prism AB102 horizontally on it. Gently squeeze to remove the glue. Ensure that there are no bubbles, dust, impurities, etc. on the glue surface and glue layer. During the glue removal process, measure the thickness of the parts with a micrometer and control the glue layer thickness to 0.015±0.005mm. Place the glued prism (AA / AB) on the adjustable turntable 9. Figure 14As shown, adjust the adjustable turntable 9 so that the output image from the F1000 front mirror 7, after being reflected by the surface of prism AA101, forms an autocollimated image A at the center of the reticle of the F1000 front mirror 7. Also, the output image B from the F2000 collimator 8, after passing through the bonded prism (AA / AB), forms the center of the reticle of the F1000 front mirror 7. Then, irradiate the part with a 220V, 50Hz, 160W high-pressure UV mercury lamp for 20 to 30 minutes, at a distance of 20 to 30 cm, to initially cure the photosensitive adhesive layer.

[0063] (5) Place the surface of the bonded prism (AA / AB) to be bonded horizontally on a Class 100 clean bench. Drop UV photosensitive glue on the surface of the bonded prism (AA / AB) to be bonded on the Class 100 clean bench. Press a right-angled surface of the total reflection prism C4 horizontally on it and gently squeeze to remove the glue. Ensure that there are no bubbles, dust, impurities, etc. on the glue surface and glue layer. During the glue removal process, measure the thickness of the part with a micrometer and control the glue layer thickness to 0.015±0.005mm. Place the bonded prism (AA / AB / C) on the adjustable turntable 9, as shown in the figure. Figure 15 As shown, the adjustable turntable 9 is adjusted so that the output image of the F1000 front mirror 7 is reflected by the surface of the prism AA101, and the autocollimation image A is located at the center of the reticle of the F1000 front mirror 7. The output image of the F1000 front mirror 7 is reflected by the prism AA101, and the image B is located at the center of the reticle of the F600 front mirror 12. The output image of the F1000 front mirror 7 is reflected by the glued prism (AA / AB / C), and the image C is located at the center of the reticle of the F400 front mirror 11. Then, a 220V, 50Hz, 160W ultraviolet high-pressure mercury lamp is used to irradiate the part for 20 to 30 minutes, at a lamp distance of 20 to 30 cm, to initially cure the photosensitive adhesive layer.

[0064] (6) Place the surface of the bonded prism (AA / AB / C) to be bonded horizontally on a Class 100 clean bench. Drop UV photosensitive glue on the surface of the bonded prism (AA / AB / C) to be bonded on the Class 100 clean bench. Press a right-angled surface of the prism BA201 horizontally on it and gently squeeze to remove the glue. Ensure that there are no bubbles, dust, impurities, etc. on the glue surface and glue layer. During the glue removal process, measure the thickness of the part with a micrometer and control the glue layer thickness to 0.015±0.005mm to obtain the bonded prism (AA / AB / C / BA). Place the bonded prism (AA / AB / C / BA) on the adjustable turntable 9, as shown in the figure. Figure 16As shown, adjust the adjustable turntable 9 so that the output image of the F1000 front mirror 7 is reflected by the surface of the prism AA101, and the autocollimation image A is located at the center of the graticule of the F1000 front mirror 7. The output image of the F1000 front mirror 7 is reflected by the prism AA101, and the image B is located at the center of the graticule of the F600 front mirror 12. The output image C of the F2000 collimator 8 is reflected by the glued prism (AA / AB / C / BA) and is located at the center of the graticule of the F1000 front mirror 7 (or the angle reading with the center of the graticule is less than 60") Then, use a 220V, 50Hz, 160W ultraviolet high-pressure mercury lamp to irradiate the part for 20min to 30min, with the lamp distance of 20cm to 30cm, so that the photosensitive adhesive layer is initially cured.

[0065] (7) Place the surface of the bonded prism (AA / AB / C / BA) to be bonded horizontally on a Class 100 clean bench. Drop UV photosensitive glue on the surface of the bonded prism (AA / AB / C / BA) to be bonded on the Class 100 clean bench. Press the chord surface of the prism BB202 horizontally on it and gently squeeze to remove the glue. Ensure that there are no bubbles, dust, impurities, etc. on the glue surface and glue layer. During the glue removal process, measure the thickness of the part with a micrometer and control the thickness of the glue layer to 0.015±0.005mm. Obtain the bonded prism (AA / AB / C / BA / BB). Place the bonded prism (AA / AB / C / BA / BB) on the adjustable turntable 9. Figure 17 As shown, adjust the adjustable turntable 9 so that the output image of the F1000 front mirror 7 is reflected by the surface of the prism AA101, and the autocollimation image A is located at the center of the reticle of the F1000 front mirror 7. The output image of the F1000 front mirror 7 is reflected by the prism AA101, and the reflection image B is located at the center of the reticle of the F600 front mirror 12. The output image C of the F400 front mirror 11 is reflected by the glued prism (AA / AB / C / BA / BB) and is located at the center of the reticle of the F1000 front mirror 7 (or the angle reading with the center of the reticle is less than 60"), then irradiate the part with a 220V, 50Hz, 160W ultraviolet high-pressure mercury lamp for 20 minutes to 30 minutes, at a lamp distance of 20 cm to 30 cm, to allow the photosensitive adhesive layer to initially cure.

[0066] (8) Place the surface of the bonded prism (AA / AB / C / BA / BB) to be bonded horizontally on a Class 100 clean bench. Drop UV photosensitive glue on the surface of the bonded prism (AA / AB / C / BA / BB) to be bonded on the Class 100 clean bench. Press a right-angled surface of the total reflection prism D5 horizontally on it and gently squeeze to remove the glue. Ensure that there are no bubbles, dust, impurities, etc. on the glue surface and glue layer. During the glue removal process, measure the thickness of the part with a micrometer and control the thickness of the glue layer to 0.015±0.005mm. Obtain the bonded prism (AA / AB / C / BA / BB / D). Place the bonded prism (AA / AB / C / BA / BB / D) on the adjustable turntable 9. Figure 18As shown, adjust the adjustable turntable 9 so that the output image of the F1000 front mirror 7 is reflected by the surface of the prism AA101, and the autocollimation image A is located at the center of the reticle of the F1000 front mirror 7. The output image B of the F400 front mirror 11 is reflected by the cemented prism (AA / AB / C / BA / BB / D) and is located at the center of the reticle of the F1000 front mirror 7 (or the angle reading with the center of the reticle is less than 60"), and the output image C of the F2000 collimator 8 is reflected by the cemented prism (AA / AB / C / BA / BB / D) and is located at the center of the reticle of the F1000 front mirror 7. Then, use a 220V, 50Hz, 160W ultraviolet high-pressure mercury lamp to irradiate the part for 20 minutes to 30 minutes, with the lamp distance of 20 cm to 30 cm, to achieve initial curing of the photosensitive adhesive layer.

[0067] (9) Place the surface of the bonded prism (AA / AB / C / BA / BB / D) to be bonded horizontally on a Class 100 clean bench. Drop UV photosensitive glue on the surface of the bonded prism (AA / AB / C / BA / BB / D) on the Class 100 clean bench. Press a right-angled surface of the prism CA301 horizontally on it and gently squeeze to remove the glue. Ensure that there are no bubbles, dust, impurities, etc. on the glue surface and glue layer. During the glue removal process, measure the thickness of the part with a micrometer and control the thickness of the glue layer to 0.015±0.005mm. Obtain the bonded prism (AA / AB / C / BA / BB / D / CA). Place the bonded prism (AA / AB / C / BA / BB / D / CA) on the adjustable turntable 9. Figure 19 As shown, adjust the adjustable turntable 9 so that the output image of the F1000 front mirror 7 is reflected by the surface of the prism AA101, and the autocollimation image A is located at the center of the graticule of the F1000 front mirror 7. The output image B of the F400 front mirror 11 is reflected by the glued prism (AA / AB / C / BA / BB / D / CA) and is located at the center of the graticule of the F1000 front mirror 7 (or the angular value reading with the center of the graticule is less than 60"), and the output image C of the F1000 front mirror 7 is reflected by the glued prism (AA / AB / C / BA / BB / D / CA) and is located at the center of the graticule of the F600 front mirror 12 (or the angular value reading with the center of the graticule is less than 60"), then irradiate the part with a 220V, 50Hz, 160W ultraviolet high-pressure mercury lamp for 20min to 30min, with the lamp distance of 20cm to 30cm, so that the photosensitive adhesive layer is initially cured.

[0068] (10) Place the surface of the bonded prism (AA / AB / C / BA / BB / D / CA) to be bonded horizontally on a Class 100 clean bench. Drop UV photosensitive glue on the surface of the bonded prism (AA / AB / C / BA / BB / D / CA) to be bonded on the Class 100 clean bench. Press the chord surface of the prism CB302 horizontally on it and gently squeeze to remove the glue. Ensure that there are no bubbles, dust, impurities, etc. on the glue surface and glue layer. During the glue removal process, measure the thickness of the part with a micrometer and control the thickness of the glue layer to 0.015±0.005mm. Obtain the bonded prism (AA / AB / C / BA / BB / D / CA / CB). Place the bonded prism (AA / AB / C / BA / BB / D / CA / CB) on the adjustable turntable 9. Figure 20 As shown, adjust the adjustable turntable 9 so that the output image of the F1000 front mirror 7 is reflected by the surface of the prism AA101, and the autocollimation image A is located at the center of the reticle of the F1000 front mirror 7. The output image B of the F400 front mirror 11 is reflected by the glued prism (AA / AB / C / BA / BB / D / CA / CB) and is located at the center of the reticle of the F1000 front mirror 7 (or the angular value reading with the center of the reticle is less than 60"), and the output image C of the F2000 collimator 8 is reflected by the glued prism (AA / AB / C / BA / BB / D / CA / CB) and is located at the center of the reticle of the F1000 front mirror 7 (or the angular value reading with the center of the reticle is less than 60"), then irradiate the part with a 220V, 50Hz, 160W ultraviolet high-pressure mercury lamp for 20min to 30min, with the lamp distance of 20cm to 30cm, so that the photosensitive adhesive layer is initially cured.

[0069] (11) After the initial curing of the bonded prism (AA / AB / C / BA / BB / D / CA / CB), check the optical path. Figure 21As shown, the adjustable turntable 9 is adjusted so that the output image of the F1000 front mirror 7 is reflected by the surface of the prism AA101, and the autocollimation image A is located at the center of the reticle of the F1000 front mirror 7. The output images B and C of the F2000 collimator 8 are reflected by the cemented prisms (AA / AB / C / BA / BB / D / CA / CB) and are located at the center of the reticle of the F1000 front mirror 7 (or the angular value reading with respect to the reticle center is less than 60"); the output image D of the F400 front mirror 11 is reflected by the cemented prisms (AA / AB / C / BA / BB / D / CA / CB) and is located at the center of the reticle of the F1000 front mirror 7 (or the angular value reading with respect to the reticle center is less than 60") The output image E of the F600 front mirror 12 is reflected by the cemented prism (AA / AB / C / BA / BB / D / CA / CB) and is located at the center of the reticle of the F1000 front mirror 7 (or the angle reading with the center of the reticle is less than 60″). The cemented prism (AA / AB / C / BA / BB / D / CA / CB) is placed in an oven and the baking temperature is controlled at 50℃~60℃ for 6 hours to completely cure the photosensitive adhesive layer to obtain the swallow-shaped eight-cemented beam splitter prism.

[0070] Example 3 like Figure 22 As shown, the swallow-shaped eight-cemented beam splitter prism proposed in Example 1 or 2 is applied to the spectral screening of the four-detector light information field, so that after a beam of light carrying light information passes through the swallow-shaped eight-cemented prism, the angle deviation between the four outgoing light paths and the optical axis direction of the swallow-shaped eight-cemented prism is less than 60", ensuring that the outgoing light is transmitted to the detector 6, without the need for an additional detector auxiliary adjustment mechanism to compensate for the light transmission error. At the same time, the spectral characteristics of the four outgoing light paths are: in the wavelength ranges of 0.44μm~0.5μm, 0.56μm~0.61μm, 0.69μm~0.76μm, and 0.88μm~0.96μm, the transmittance is greater than 85%.

[0071] While the embodiments of the present invention have been described above, the above description is intended to be exemplary, not exhaustive, and not limited to the disclosed embodiments. Many modifications and variations will be apparent to those skilled in the art without departing from the scope and spirit of the described embodiments.

Claims

1. A swallow-shaped eight-cemented beam splitter prism, characterized in that: The invention comprises three beam-splitting glued prisms and two right-angle total reflection prisms, and the three beam-splitting glued prisms are respectively a beam-splitting glued prism 1, a beam-splitting glued prism 2, and a beam-splitting glued prism 3, and the two right-angle total reflection prisms are respectively a total reflection prism C and a total reflection prism D, and the beam-splitting glued prism 1, the beam-splitting glued prism 2, and the beam-splitting glued prism 3 are respectively formed by gluing two right-angle prisms, and the beam-splitting glued prism 1, the beam-splitting glued prism 2, and the beam-splitting glued prism 3 are arranged in a herringbone-shaped structure lying toward the left side, the two right-angled surfaces of the total reflection prism C are respectively glued to the right side surface of the beam-splitting glued prism 1 and the bottom side surface of the beam-splitting glued prism 2, and the two right-angled surfaces of the total reflection prism D are respectively glued to the bottom side surface of the beam-splitting glued prism 1 and the left side surface of the beam-splitting glued prism 3, and a beam-splitting film is vacuum-plated between the glued surfaces of the two right-angle prisms of each beam-splitting glued prism; The film parameters of the beam splitter film in the beam splitter cemented prism 1 are as follows: in the wavelength range of 0.44μm to 0.61μm, the average reflection is greater than 85%; in the wavelength range of 0.69μm to 0.96μm, the average transmission is greater than 90%; The film parameters of the beam splitter film in the second beam splitter cemented prism are: in the wavelength range of 0.44μm to 0.5μm, the average reflection is greater than 85%; in the wavelength range of 0.56μm to 0.76μm, the average transmission is greater than 90%; The film parameters of the three beam splitting films in the beam splitting cemented prism are as follows: in the wavelength range of 0.69μm to 0.76μm, the average reflection is greater than 85%; in the wavelength range of 0.88μm to 0.96μm, the average transmission is greater than 90%.

2. A method for preparing a swallow-shaped eight-cemented beam splitter prism according to claim 1, characterized in that: The steps include: S1. Material selection The optical glass material is H-K9L crown optical glass, the optical film material is tantalum pentoxide and silicon dioxide, and the photosensitive adhesive layer material is UV photosensitive adhesive; S2. Blank Manufacturing H-K9L crown optical glass is used to produce right-angle prisms and right-angle total reflection prisms with surface defects reaching B=Ⅲ level, surface shape reaching PV≤0.5λ, RMS≤0.15λ, where λ=632.8nm, parallel error reaching θⅠ=θⅡ=5″, and angular value accuracy of Δψ=5″; S3. Vacuum coating of the beam splitting films on each beam splitting cemented prism Vacuum-coating the beam splitting film of each beam splitting cemented prism according to the set film structure; S4. Gluing According to the set glue layer thickness, the right-angle prisms and the right-angle total reflection prisms are glued in sequence to obtain the swallow-shaped eight-glue beam splitter prism.

3. The method for preparing a swallow-shaped eight-cemented beam splitter prism according to claim 2, characterized in that: In step S1, the UV photosensitive adhesive is prepared from GBN-50AA optical photosensitive adhesive and GBN-50AB optical photosensitive adhesive in a mass ratio of 4:

1.

4. The method for preparing a swallow-shaped eight-cemented beam splitter prism according to claim 2, characterized in that: In step S3, the two right-angle prisms in the beam-splitting cemented prism are prism AA and prism AB respectively, and the film structure of the beam-splitting film in the beam-splitting cemented prism is set as follows: AA / 107.3 nm (SiO2) 56.9 nm (Ta2O5) 117.3 nm (SiO2) 70.6 nm (Ta2O5) 127.7 nm (SiO2) 66.4 nm (Ta2O5) 107.1 nm (SiO2) 54.82 nm (Ta2O5) 100.2 nm (SiO2) 61.1 nm (Ta2O5) 117.3 nm (SiO2) 67.4 nm (Ta2O5) 121.2 nm (SiO2) 65.1 nm (Ta2O5) 94.5 nm (SiO2) 44.3 nm (Ta2O5) 95.1nm (SiO2) 63.68 nm (Ta2O5) 120.6 nm (SiO2) 68.4 nm(Ta2O5) 123.4 nm(SiO2) 65.4 nm (Ta2O5) 105.7 nm (SiO2) 54.7 nm (Ta2O5) 107.4 nm (SiO2) 64.5 nm (Ta2O5) 123.1 nm (SiO2) 69.4 nm (Ta2O5) 135.8 nm (SiO2) 75.1 nm (Ta2O5) 139.2 nm (SiO2) 68.9 nm (Ta2O5) 127.5 nm (SiO2) 68.1 nm (Ta2O5) 115.9 nm (SiO2) 54.9 nm (Ta2O5) 102.6 nm (SiO2) 65.2 nm (Ta2O5) 124.4 nm (SiO2) 67.9 nm (Ta2O5) 133.4 nm (SiO2) 75.2 nm(Ta2O5) 143.2 nm(SiO2) 74.1 nm(Ta2O5) 135.2 nm(SiO2) 71.80nm(Ta2O5) 134.84nm(SiO2) 97.7 nm(Ta2O5) 88.9 nm(SiO2) 99.4 nm(Ta2O5) 129.4 nm(SiO2) 72.3 nm(Ta2O5) 136.8 nm(SiO2) 75.7 nm (Ta2O5) 139.3 nm (SiO2) 73.3 nm (Ta2O5) 132.9 nm (SiO2) 73.2 nm (Ta2O5) 135.4 nm (SiO2) 73.2 nm (Ta2O5) 115.6 nm (SiO2) 54.7 nm (Ta2O5) 73.7 nm (SiO2) / UV UV photosensitive adhesive (0.015±0.005mm) / AB.

5. The method for preparing a swallow-shaped eight-cemented beam splitter prism according to claim 2, characterized in that: In step S3, the two right-angle prisms in the second beam-splitting cemented prism are prism BA and prism BB respectively, and the film structure of the beam-splitting film in the second beam-splitting cemented prism is set as follows: BA / 55.1 nm (Ta2O5) 73.56 nm (SiO2) 62.8 nm (Ta2O5) 111.4 nm (SiO2) 58.5 nm (Ta2O5) 103.5 nm (SiO2) 58.9 nm (Ta2O5) 109.8 nm (SiO2) 59.9 nm (Ta2O5) 108.8 nm (SiO2) 59.2 nm (Ta2O5) 107.9 nm (SiO2) 60.7 nm (Ta2O5) 108.7 nm (SiO2) 61.1 nm (Ta2O5) 105.9 nm (SiO2) 61.8 nm (Ta2O5) 105.1 nm (SiO2) 68.1 nm (Ta2O5) 86.2 nm (SiO2) 69.6 nm(Ta2O5)111.1 nm (SiO2) 78.3 nm (Ta2O5) 45.4 nm (SiO2) 83.7 nm (Ta2O5) 126.8 nm (SiO2) 86.3 nm (Ta2O5) 18.6nm (SiO2) 89.7 nm (Ta2O5) 135.8 nm (SiO2) 97.1 nm (Ta2O5) 8.1 nm (SiO2) 111.6 nm (Ta2O5) 68.7 nm (SiO2) 88.3 nm (Ta2O5) 81.9 nm (SiO2) 89.2 nm (Ta2O5) 24.8 nm (SiO2) 94.6 nm (Ta2O5) 136.1 nm (SiO2) 92.1 nm (Ta2O5) 13.4 nm (SiO2) 84.9 nm(Ta2O5) 133.4 nm(SiO2)95.2nm(Ta2O5)10.8 nm(SiO2)118.1 nm(Ta2O5)42.3 nm(SiO2)108.6 nm(Ta2O5)57.3 nm(SiO2)95.6 nm(Ta2O5)29.3 nm(SiO2)79.9 nm(Ta2O5)61.9 nm(SiO2) / UV ultraviolet photosensitive adhesive (0.015±0.005mm) / BB.

6. The method for preparing a swallow-shaped eight-cemented beam splitter prism according to claim 2, characterized in that: In step S3, the two right-angle prisms in the beam-splitting cemented prism 3 are prism CA and prism CB respectively, and the film structure of the beam-splitting film in the beam-splitting cemented prism 3 is set as follows: CA / 140.4 nm (Ta2O5) 45.3 nm (SiO2) 132.4 nm (Ta2O5) 189.6 nm (SiO2) 123.5 nm (Ta2O5) 79.9 nm (SiO2) 122.2 nm (Ta2O5) 173.4 nm (SiO2) 107.5 nm (Ta2O5) 165.8 nm (SiO2) 109.1 nm (Ta2O5) 163.4 nm (SiO2) 111.7 nm (Ta2O5) 147.4 nm (SiO2) 113.8 nm (Ta2O5) 151.6 nm (SiO2) 112.4 nm (Ta2O5) 157.9 nm (SiO2) 110.3 nm (Ta2O5) 158.3 nm (SiO2) 110.4 nm(Ta2O5)157.9nm(SiO2)111.7 nm(Ta2O5)149.9 nm(SiO2)113.5 nm(Ta2O5)146.5 nm(SiO2)111.4 nm(Ta2O5)159.1 nm(SiO2)132.3 nm(Ta2O5)49.5 nm(SiO2)137.1 nm(Ta2O5)199.2 nm(SiO2) / UV photosensitive adhesive (0.015±0.005mm) / CB.

7. The method for preparing a swallow-shaped eight-cemented beam splitter prism according to claim 2, characterized in that: In step S3, the vacuum coating step includes: S31, when the vacuum degree of APS ion beam assisted coating machine is higher than 6×10 -2 When Pa, the rectangular prism blank is baked at 180°C, kept at constant temperature for 30min to 60min, and vacuum is continued; S32, when the vacuum degree of APS ion beam assisted coating machine is higher than 3×10 -3 When Pa, the APS ion source is turned on to clean the substrate for 10 minutes, and then tantalum pentoxide and silicon dioxide film layers are cyclically plated according to the designed film structure until the coating is completed.

8. The method for preparing a swallow-shaped eight-cemented beam splitter prism according to claim 2, characterized in that: In step S4, before the last gluing of the product, each time the gluing between parts is completed, a 220V, 50Hz, 160W ultraviolet high-pressure mercury lamp is used to irradiate the parts for 20 minutes to 30 minutes, with the lamp distance of 20cm to 30cm, so that the photosensitive adhesive layer is initially cured. After the last gluing, the product is placed in an oven, and the baking temperature is controlled at 50℃ to 60℃. The constant temperature is maintained for 6 hours to completely cure the photosensitive adhesive layer, and the swallow-shaped eight-glued beam splitter prism can be obtained.

9. Application of the swallow-shaped eight-cemented beam splitter according to claim 1 or the swallow-shaped eight-cemented beam splitter prepared according to the preparation method according to any one of claims 2 to 8 in spectral screening of a four-detector optical information field, so as to achieve an angular deviation of less than 60° between the four exiting light paths of a beam of light carrying optical information and the optical axis of the swallow-shaped eight-cemented beam splitter after the beam passes through the swallow-shaped eight-cemented beam splitter, and the spectral characteristics of the four exiting light paths are: transmittance greater than 85% in the wavelength ranges of 0.44 μm to 0.5 μm, 0.56 μm to 0.61 μm, 0.69 μm to 0.76 μm, and 0.88 μm to 0.96 μm.