Regenerated wafer metal film corrosion equipment
By designing a rotary unloading structure, a pneumatic sealing structure and an auxiliary unloading structure, the automated sediment cleaning of the regenerated wafer metal film corrosion equipment is achieved, which solves the problem of manual sediment cleaning, reduces labor intensity and saves water resources.
Patent Information
- Application Number
- CN202510784056.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-06-12
- Publication Date
- 2025-09-19
AI Technical Summary
In the prior art, the metal film etching equipment for regenerating wafers requires manual cleaning of sediment at the bottom of the etching tank, which is labor-intensive.
A regenerated wafer metal film etching equipment is designed, which adopts a rotary unloading structure and a pneumatic sealing structure. The movable bottom plate is rotated to make the sediment fall into the receiving trough by itself. Combined with the auxiliary unloading structure, magnetic force is used to promote the sediment to fall, avoiding manual cleaning.
It reduces labor intensity, improves the automation level of the corrosion tank, reduces manual intervention, and saves water resources.
Smart Images
Figure CN120674346A_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the technical field of regenerated wafer processing, in particular to a regenerated wafer metal film etching device. Background Art
[0002] In semiconductor manufacturing, as integrated circuit feature sizes continue to shrink, requirements for wafer surface flatness and metal film removal accuracy are becoming increasingly stringent. Metal film etching is a key step in the regenerated wafer manufacturing process, and its process stability directly determines wafer reusability and device performance. Currently, alternating etching of the metal film on the regenerated wafer surface using two etching solutions of varying concentrations has become the industry's mainstream solution.
[0003] Specifically, wafers are typically etched in a high-concentration mixture of hydrofluoric acid, nitric acid, and acetic acid for a period of time. The process is then switched to a diluted solution of the same acid, etched for a period of time, and then etched in a high-concentration mixture again. This process is repeated, alternating between high- and low-concentration mixtures. This alternating etching process achieves synergistic optimization in efficiency, quality, cost, and environmental protection through the regulation of a "fast-slow" chemical reaction. This process has driven semiconductor manufacturing toward higher precision, lower cost, and greater sustainability, providing key technical support for the large-scale application of recycled wafers.
[0004] During actual operation, sediment will be generated at the bottom of the etching tank. After each etching is completed, personnel need to manually clean the sediment at the bottom of the etching tank, which is rather troublesome. Therefore, this application provides a regenerated wafer metal film etching equipment to meet the needs. Summary of the Invention
[0005] The purpose of the present application is to provide a regenerated wafer metal film etching device to solve the technical problem of manual cleaning of sediment at the bottom of the etching tank in the prior art.
[0006] To achieve the above-mentioned purpose, the present application provides the following technical solutions: a regenerated wafer metal film etching device, comprising two groups of etching troughs, the etching troughs comprising a circular plate and two groups of movable bottom plates, the outer walls of the two groups of movable bottom plates are provided with elastic sealing rings of a circular structure, the two groups of movable bottom plates are movably arranged in the circular cavity of the circular plate and form a seal on the bottom of the circular plate, the two groups of etching troughs are installed above the material receiving trough, and a rotating unloading structure is also provided for driving the two groups of circular plates to rotate, so that the sediment on the upper end of the circular plate falls into the material receiving trough by its own gravity.
[0007] As a preferred implementation in this embodiment, the rotary unloading structure includes a driving motor mounted on the outer wall of the corrosion tank, first pulleys mounted on corresponding rotating shafts, and a second pulley mounted on the output shaft of the driving motor; The two sets of movable bottom plates are rotatably connected to the corrosion groove via the corresponding rotating shafts, and the driving ends of the rotating shafts pass through the corrosion grooves; Two sets of the first pulleys and one set of the second pulleys are connected by belt assembly; The driving motor is mounted on the outer wall of the corrosion tank.
[0008] As a preferred implementation in this embodiment, a pneumatic sealing structure is further provided, the pneumatic sealing structure comprising a cylinder and a piston barrel mounted on the outer wall of the corrosion groove; A sealing piston is installed at the lower end of the cylinder, and the lower end of the sealing piston is slidably arranged in the inner cavity of the piston cylinder. Air pipes communicating with the inner cavity of the piston cylinder are arranged on both outer walls of the piston cylinder, and the air inlet ends of the two groups of air pipes are sealed and rotatably connected to the ends of the corresponding rotating shafts; An air inlet is provided on the rotating shaft, and the air inlet is communicated with the inflation cavity of the inner cavity of the elastic sealing ring through a connecting hose. The inner cavity of the rotating shaft is provided with a gas flow channel communicated with the air inlet and the inner cavity of the trachea.
[0009] As a preferred implementation in this embodiment, an auxiliary unloading structure is further provided to assist in unloading the sediment on the movable bottom plate.
[0010] As a preferred implementation manner in this embodiment, the auxiliary blanking structure includes a magnetic isolation ring coaxially arranged with the rotating shaft, and a plurality of grooves are circumferentially arranged on the end surface of the magnetic isolation ring facing the corrosion groove, and a first permanent magnet and a second permanent magnet are respectively arranged in adjacent grooves at intervals; A groove is provided on the end of the movable bottom plate close to the magnetic isolation ring, and a third permanent magnet is provided in the groove, and a through hole is provided on the portion of the elastic sealing ring corresponding to the third permanent magnet; The third permanent magnet has opposite magnetic poles to the first permanent magnet, and the third permanent magnet has the same magnetic poles to the second permanent magnet; A limit strip is fixed to the upper end of the rotating shaft, and the limit strip is movably arranged in an inner cavity corresponding to the movable bottom plate. The movable bottom plate is movably connected to the rotating shaft and is provided with a movable cavity adapted to the rotating shaft and the limit strip.
[0011] As a preferred implementation in this embodiment, the first permanent magnet and the second permanent magnet are not provided along the axis of the magnetic isolation ring in the direction of the X-axis.
[0012] As a preferred implementation in this embodiment, the two groups of corrosion grooves are arranged one high and one low, and a drainage pipe that can discharge liquid to the corrosion groove at the lower position is provided on the outer wall of the corrosion groove at the higher position, and a valve is installed on the drainage pipe.
[0013] As a preferred implementation in this embodiment, ultrasonic generators and electric heating tubes are provided on the inner walls of the two groups of circular plates.
[0014] In summary, the technical effects and advantages of the present invention are: The present invention has a reasonable structure. The corrosion tank is provided with a rotary discharge structure. The rotary discharge structure can control the two sets of movable bottom plates to rotate, thereby releasing the seal on the bottom of the circular plate, so that the mixed liquid of the circular plate falls into the receiving tank by its own gravity, and the sediment falls into the receiving tank by its own gravity and the flushing of the water flow, thereby avoiding manual cleaning and reducing labor intensity. In the present invention, a pneumatic sealing structure and an auxiliary unloading structure are provided, which cooperate with each other to avoid friction loss caused by the elastic sealing ring and improve the sealing effect. At the same time, the movable bottom plate can be moved back and forth on the rotating shaft and collide with the inner wall of the corrosion groove, thereby promoting the falling of sediment on the movable bottom plate. BRIEF DESCRIPTION OF THE DRAWINGS
[0015] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments of the present application. For those skilled in the art, other drawings can be obtained based on these drawings without paying any creative work.
[0016] Figure 1 It is a schematic diagram of the overall structure of the present invention; Figure 2 for Figure 1 Schematic diagram of the mid-rotation blanking structure; Figure 3 for Figure 2 Schematic diagram of the middle movable bottom plate structure; Figure 4 for Figure 3 Schematic diagram of the local split structure; Figure 5 for Figure 4 Schematic diagram of the transfer shaft structure; Figure 6 for Figure 4 Schematic diagram of the structure of the intermediate magnetic ring; Figure 7 for Figure 4 Schematic diagram of the cross-sectional structure of the middle movable bottom plate.
[0017] In the figure: 1, receiving trough; 2, etching trough; 3, rotary feeding structure; 4, pneumatic sealing structure; 5, magnetic isolation ring; 6, first permanent magnet; 7, third permanent magnet; 8, air inlet; 9, drain pipe; 10, second permanent magnet; 11, inflation cavity; 12, limit strip; 21. Circular plate; 22. Movable bottom plate; Drive motor; 32, first pulley; 33, second pulley; 34, belt; 35, elastic sealing ring; 36, rotating shaft; 41. Cylinder; 42. Piston tube; 43. Trachea. DETAILED DESCRIPTION
[0018] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.
[0019] Example: Reference Figure 1-3 The shown device is a regenerated wafer metal film etching device, comprising two groups of etching troughs 2, the etching troughs 2 comprising a circular plate 21 and two groups of movable bottom plates 22, the outer walls of the two groups of movable bottom plates 22 being provided with elastic sealing rings 35 of a circular structure, the two groups of movable bottom plates 22 being movably arranged in the circular cavity of the circular plate 21 and forming a seal on the bottom of the circular plate 21, the two groups of etching troughs 2 being installed above the material receiving trough 1, and a rotating unloading structure 3 being further provided, for driving the two groups of circular plates 21 to rotate, so that the sediment on the upper end of the circular plate 21 falls into the material receiving trough 1 by its own gravity.
[0020] During use, the rotary unloading structure 3 is controlled by a PLC controller, and the two sets of movable bottom plates 22 can be controlled to rotate by the rotary unloading structure 3, thereby releasing the seal on the bottom of the circular plate 21, so that the mixed liquid of the circular plate 21 falls into the receiving trough 1 by its own gravity, and the sediment falls into the receiving trough by its own gravity and the flushing of the water flow, avoiding manual cleaning and reducing labor intensity.
[0021] It should be noted that: first, the movable bottom plate 22 is controlled to rotate 180° and finally the lower end surface of the movable bottom plate 22 is facing upward to form a seal on the bottom of the corrosion tank 2; second, two sets of movable bottom plates 22 are provided. The two sets of movable bottom plates 22 rotate simultaneously, which can open multiple leaking points at the same time, which is conducive to quickly discharging the corrosive liquid in the corrosion tank 2 while retaining sufficient water flow to flush the movable bottom plate 22.
[0022] As a preferred implementation in this embodiment, Figure 1-3As shown, the rotary blanking structure 3 includes a driving motor 31 mounted on the outer wall of the corrosion tank 2, first pulleys 32 respectively mounted on corresponding rotating shafts 36, and a second pulley 33 mounted on the output shaft of the driving motor 31; The two sets of movable bottom plates 22 are rotatably connected to the corrosion tank 2 via corresponding rotating shafts 36, and the driving ends of the rotating shafts 36 pass through the corrosion tank 2; The two sets of first pulleys 32 and the set of second pulleys 33 are assembled and connected by belts 34; The driving motor 31 is mounted on the outer wall of the corrosion tank 2 .
[0023] During operation, the second pulley 38 can be driven to rotate by the driving motor 31, and the two sets of rotating shafts 36 can be rotated through the belt 34 and the two sets of first pulleys 32, and the two sets of movable bottom plates 22 can be driven to rotate. After rotating 180°, they return to their original positions. During this process, the mixed liquid of the circular plate 21 falls into the receiving trough 1 by its own gravity, and the sediment falls into the receiving trough by its own gravity and the flushing of the water flow, avoiding manual cleaning and reducing labor intensity. When the movable bottom plate 22 tilts during rotation, it is more conducive to the unloading of the sediment on the movable bottom plate 22.
[0024] It should be noted that, initially, the outer walls of the two sets of elastic sealing rings 35 (except for the opposite ends, which are in contact with each other) are in contact with the inner wall of the corrosion groove 2 to form a seal.
[0025] As a preferred implementation in this embodiment, Figure 1-5 As shown, a pneumatic sealing structure 4 is also provided, and the pneumatic sealing structure 4 includes a cylinder 41 and a piston cylinder 42 mounted on the outer wall of the corrosion groove 2; A sealing piston is mounted at the lower end of the cylinder 41, and the lower end of the sealing piston is slidably disposed within the inner cavity of the piston cylinder 42. Air pipes 43 communicating with the inner cavity of the piston cylinder 42 are disposed on both outer walls of the piston cylinder 42, and the air inlet ends of the two sets of air pipes 43 are sealed and rotatably connected to the ends of the corresponding rotating shafts 36. An air inlet 8 is provided on the rotating shaft 36 , and the air inlet 8 is connected to the inflation cavity 11 of the elastic sealing ring 35 through a connecting hose. The inner cavity of the rotating shaft 36 is provided with a gas flow channel connected to the air inlet 8 and the inner cavity of the air pipe 43 .
[0026] Before controlling the drive motor 31 to work, first control the cylinder 41 to drive the piston to move upward, so that the air pressure inside the inflation chamber 11 is reduced, the elastic sealing ring 35 shrinks and contacts and separates from the inner wall of the corrosion groove 2, and also contacts and separates from the opposite end of the corresponding movable bottom plate 22. At this time, the drive motor 31 can be controlled to work to drive the movable bottom plate 22 to rotate. After the movable bottom plate 22 rotates 180°, the cylinder 41 is controlled to move downward and return to its original position. At this time, the gas in the piston tube 42 is pressed into the inflation chamber 11 by the action of the piston, and the inflation chamber 11 expands, so that the outer wall of the elastic sealing ring 35 respectively contacts the outer wall of the corrosion groove 2 and the corresponding opposite end of the elastic sealing ring 35. This can prevent the elastic sealing ring 35 from rubbing against the corrosion groove 2 during the rotation of the movable bottom plate 2, thereby causing wear. The sealing effect of the worn elastic sealing ring 35 will be greatly reduced.
[0027] As a preferred implementation in this embodiment, an auxiliary unloading structure is further provided to assist in unloading the sediment on the movable bottom plate 22 .
[0028] The provision of the auxiliary unloading structure is more conducive to the complete removal of sediments on the upper end of the movable bottom plate 22.
[0029] As a preferred implementation in this embodiment, Figure 4-7 As shown, the auxiliary blanking structure includes a magnetic isolation ring 5 coaxially arranged with the rotating shaft 36, and a plurality of grooves are circumferentially arranged on the end surface of the magnetic isolation ring 5 facing the corrosion groove 2, and the first permanent magnet 6 and the second permanent magnet 10 are respectively arranged in adjacent grooves at intervals; A groove is provided on the end of the movable bottom plate 22 close to the magnetic isolation ring 5, and a third permanent magnet 7 is provided in the groove. A through hole is provided on the portion of the elastic sealing ring 35 corresponding to the third permanent magnet 7. The third permanent magnet 7 has an opposite magnetic pole to the first permanent magnet 6 , and the third permanent magnet 7 has an identical magnetic pole to the second permanent magnet 10 . A limit strip 12 is fixed to the upper end of the rotating shaft 36 , and the limit strip 12 is movably arranged in the inner cavity corresponding to the movable bottom plate 22 . The movable bottom plate 22 is movably connected to the rotating shaft 36 and is provided with a movable cavity adapted to the rotating shaft 36 and the limit strip 12 .
[0030] As the driving motor 31 drives the two movable bottom plates 22 to rotate (at this time, the outer wall of the elastic sealing ring 35 does not conflict with the outer wall of the corrosion groove 2 and the elastic sealing ring 35 at the opposite end, and a gap is generated between the outer wall of the elastic sealing ring 35 and the inner wall of the corrosion groove 2), during this process, the third permanent magnet 7 on the movable bottom plate 22 will move to a position opposite to the first permanent magnet 6 (at this time, the corrosion liquid in the corrosion groove 2 has been discharged, and there is a small amount of difficult-to-remove sediment remaining on the upper end of the movable bottom plate 22). At this time, the opposite magnetic poles generate suction, causing the movable bottom plate 22 to rotate on the rotating shaft. The movable bottom plate 22 slides on the rotating shaft 36 and collides with the inside of the corrosion groove 2, and then collides and shakes off the sediment on the movable bottom plate 22. When the third permanent magnet 7 moves to the relative position of the adjacent second permanent magnet 10, a repulsive force is generated by the same magnetic poles, so that the movable bottom plate 22 moves away from the second permanent magnet 10 on the rotating shaft 36 and finally collides with the inside of the corrosion groove 2, thereby promoting the falling of the sediment thereon. This is repeated, and the movable bottom plate 22 moves back and forth on the rotating shaft 36 to form a collision, which can completely remove the sediment on the movable bottom plate 22 without the need for water washing, thus saving water resources.
[0031] It should be noted that the etching groove 2 is made of non-magnetic insulating material.
[0032] As a preferred implementation in this embodiment, Figure 6 As shown, the first permanent magnet 6 and the second permanent magnet 10 are not arranged along the axis of the magnetic isolation ring 5 in the direction of the X axis.
[0033] The purpose is that when the two sets of movable bottom plates 22 are horizontally arranged in the inner cavity of the circular plate 21 and form a seal for the circular plate 21, the third permanent magnet 7 is not opposite to the first permanent magnet 6 and the second permanent magnet 10, and thus cannot generate suction or repulsion, thereby avoiding excessive extrusion of one end of the elastic sealing ring 35 due to magnetic effect, resulting in a reduction in the extrusion strength between the corresponding side and the inside of the corrosion groove 2, which is not conducive to a good seal between the elastic sealing ring 35 and the corrosion groove 2.
[0034] As a preferred implementation in this embodiment, Figure 1 As shown, the two groups of corrosion grooves 2 are arranged one high and one low. A drainage pipe 9 is provided on the outer wall of the corrosion groove 2 at the higher position to drain liquid to the corrosion groove 2 at the lower position, and a valve is installed on the drainage pipe 9.
[0035] In actual use, after the etching of the high-concentration etching liquid is completed, the etching liquid concentration inside it meets the demand for low-concentration etching liquid. In order to avoid waste of resources, the etching tank 2 located at a higher position is filled with high-concentration etching liquid, and the etching tank 2 located at a lower position is filled with low-concentration etching liquid. After the etching of the wafer is completed, the etching liquid in the lower etching tank 2 is directly discharged into the receiving tank 1, and the etching liquid in the high etching tank 2 is discharged into the lower etching tank 2 for reuse.
[0036] It should be noted that the drain pipe 9 is arranged above the sediment.
[0037] As a preferred implementation in this embodiment, which is not shown in the figure, ultrasonic generators and electric heating tubes are provided on the inner walls of the two groups of circular plates 21.
[0038] When the etching liquid in the etching tank 2 is used to etch the wafer, the assistance of the ultrasonic generator and the electric heating tube (temperature control) is more conducive to achieving rapid and comprehensive etching of the wafer.
[0039] Finally, it should be noted that the above is only a preferred embodiment of the present invention and is not intended to limit the present invention. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art can still modify the technical solutions described in the aforementioned embodiments or make equivalent substitutions for some of the technical features therein. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.
Claims
1. A regenerated wafer metal film etching device, comprising two sets of etching tanks (2), characterized in that: The corrosion trough (2) includes a circular plate (21) and two groups of movable bottom plates (22). The outer walls of the two groups of movable bottom plates (22) are provided with elastic sealing rings (35) of a circular structure. The two groups of movable bottom plates (22) are movably arranged in the circular cavity of the circular plate (21) and form a seal on the bottom of the circular plate (21). The two groups of corrosion troughs (2) are installed above the material receiving trough (1) and are further provided with a rotating unloading structure (3) for driving the two groups of circular plates (21) to rotate so that the sediment on the upper end of the circular plate (21) falls into the material receiving trough (1) by its own gravity.
2. The regenerated wafer metal film etching device according to claim 1, characterized in that: The rotary blanking structure (3) comprises a driving motor (31) mounted on the outer wall of the corrosion tank (2), first pulleys (32) respectively mounted on corresponding rotating shafts (36), and a second pulley (33) mounted on the output shaft of the driving motor (31); The two sets of movable bottom plates (22) are both rotatably connected to the corrosion tank (2) via the corresponding rotating shafts (36), and the driving ends of the rotating shafts (36) pass through the corrosion tank (2); Two groups of the first pulleys (32) and one group of the second pulleys (33) are assembled and connected via a belt (34); The driving motor (31) is mounted on the outer wall of the corrosion tank (2).
3. The regenerated wafer metal film etching device according to claim 2, characterized in that: A pneumatic sealing structure (4) is also provided, the pneumatic sealing structure (4) comprising a cylinder (41) and a piston cylinder (42) mounted on the outer wall of the corrosion groove (2); A sealing piston is installed at the lower end of the cylinder (41), and the lower end of the sealing piston is slidably arranged in the inner cavity of the piston cylinder (42). Air pipes (43) communicating with the inner cavity of the piston cylinder (42) are arranged on both outer walls of the piston cylinder (42), and the air inlet ends of the two groups of air pipes (43) are sealed and rotatably connected to the ends of the corresponding rotating shafts (36); An air inlet (8) is provided on the rotating shaft (36), and the air inlet (8) is communicated with the inflation cavity (11) of the inner cavity of the elastic sealing ring (35) through a connecting hose. The inner cavity of the rotating shaft (36) is provided with a gas flow channel that is communicated with the air inlet (8) and the inner cavity of the air pipe (43).
4. The regenerated wafer metal film etching device according to claim 3, characterized in that: An auxiliary unloading structure is also provided for assisting in unloading sediment from the movable bottom plate (22).
5. The regenerated wafer metal film etching device according to claim 4, characterized in that: The auxiliary blanking structure comprises a magnetic isolation ring (5) coaxially arranged with the rotating shaft (36), a plurality of grooves being circumferentially arranged on the end surface of the magnetic isolation ring (5) facing the corrosion groove (2), and a first permanent magnet (6) and a second permanent magnet (10) being spaced apart in adjacent grooves. A groove is provided on the end of the movable bottom plate (22) close to the magnetic isolation ring (5), and a third permanent magnet (7) is provided in the groove, and a through hole is provided on the portion of the elastic sealing ring (35) corresponding to the third permanent magnet (7); The third permanent magnet (7) has opposite magnetic poles to the first permanent magnet (6), and the third permanent magnet (7) has the same magnetic poles to the second permanent magnet (10); A limit strip (12) is fixed to the upper end of the rotating shaft (36), and the limit strip (12) is movably arranged in an inner cavity corresponding to the movable bottom plate (22). The movable bottom plate (22) is movably connected to the rotating shaft (36) and is provided with a movable cavity adapted to the rotating shaft (36) and the limit strip (12).
6. The regenerated wafer metal film etching device according to claim 5, characterized in that: The first permanent magnet (6) and the second permanent magnet (10) are not arranged on the axis of the magnetic isolation ring (5) in the direction of the X-axis.
7. The regenerated wafer metal film etching device according to claim 2, characterized in that: The two groups of corrosion grooves (2) are arranged in a high and low configuration. A drainage pipe (9) is provided on the outer wall of the corrosion groove (2) located at the high position and can drain liquid to the corrosion groove (2) located at the low position. A valve is installed on the drainage pipe (9).
8. The regenerated wafer metal film etching device according to claim 2, characterized in that: Ultrasonic generators and electric heating tubes are provided on the inner walls of the two groups of circular plates (21).