Cleaning equipment for semiconductor glass substrate

Abstract

The invention discloses cleaning equipment for a semiconductor glass substrate, and relates to the technical field of glass substrate cleaning. Two guide bearing seats are fixed to the inner side of a linkage part, V-shaped guide openings are formed in the guide bearing seats in an array mode, hollow negative pressure boxes are attached to the two sides of a glass substrate, an elastic positioning assembly is arranged on the linkage part in a sliding mode, guide wheel parts are tightly attached to the interiors of the V-shaped guide openings, and a vertical gathering plate is fixedly arranged between the hollow negative pressure boxes. When the cleaning cloth press-fit part abuts against the cleaning cloth to enable the cleaning cloth to be attached to the glass substrate, the cleaning cloth penetrating through the cleaning cloth press-fit part is tightly attached to the top of the vertical gathering plate, a negative pressure cleaning cavity is formed among the cleaning cloth press-fit part, the vertical gathering plate, the cleaning cloth and the glass substrate, and a negative pressure through-flow opening attached to the top face of the glass substrate is formed in one side of the hollow negative pressure box. Compared with the single cleaning mode of a traditional roller brush, the cleaning effect on the glass substrate can be greatly improved through the combined action of the cleaning cloth and negative pressure suction of the negative pressure cleaning cavity.

Description

Technical Field

[0001] The present invention belongs to the technical field of glass substrate cleaning, and in particular relates to a cleaning device for semiconductor glass substrates. Background Art

[0002] As a key material in the post-Moore era, semiconductor glass substrates are accelerating the reshaping of the integrated circuit packaging technology landscape with their physical properties and process advantages. Their surface roughness is as low as Ra0.1μm, supporting 2μm / line spacing wiring, and their interconnection density exceeds 150% of traditional organic substrates. They can carry 100 layers of redistribution layers (RDL), realizing the integration of more than one trillion transistors in a single package.

[0003] During the production and processing of semiconductor glass substrates, multiple processes are required, and cleaning of semiconductor glass substrates is a more critical step. The cleanliness of the surface of semiconductor glass substrates directly affects the quality of subsequent production.

[0004] Most existing cleaning methods use roller brushes, which are mounted on a sleeve. After prolonged use, these brushes can pick up impurities that are difficult to clean. If not cleaned promptly, this can negatively impact the cleaning performance of the glass substrate. Furthermore, replacement requires disassembly of the entire sleeve, significantly reducing the cleaning efficiency of semiconductor glass substrates. To address this issue, we provide a cleaning device for semiconductor glass substrates that addresses these issues. Summary of the Invention

[0005] The object of the present invention is to provide a cleaning device for semiconductor glass substrates. Through the specific structural design of the negative pressure cleaning mechanism, the cleaning cloth supply assembly, the cleaning cloth tensioning mechanism and the cleaning cloth winding drum, the problem that the existing roller brush cleaning method is inconvenient to replace the roller brush and requires the entire sleeve to be disassembled to achieve the replacement of the roller brush, thereby greatly reducing the cleaning efficiency of the semiconductor glass substrate.

[0006] In order to solve the above technical problems, the present invention is achieved through the following technical solutions: the present invention is a cleaning device for semiconductor glass substrates, including a negative pressure cleaning mechanism; wherein the negative pressure cleaning mechanism includes a guide bearing assembly, the guide bearing assembly includes a sliding linkage portion, two guide bearing seats are symmetrically fixed on the inner side of the linkage portion, and a plurality of V-shaped guide openings are arranged in an array on the guide bearing seat; a negative pressure cleaning assembly, the negative pressure cleaning assembly is sleeved and mounted on the linkage portion, the negative pressure cleaning assembly includes two symmetrically arranged hollow negative pressure boxes, and the hollow negative pressure boxes are fitted on opposite sides of the glass substrate; a spring The elastic positioning component is slidably arranged on the linkage part, and the elastic positioning component includes a guide wheel part and a cleaning cloth pressing part that move synchronously, and the guide wheel part is arranged just above the cleaning cloth pressing part and is tightly attached to the inside of the V-shaped guide port; a vertical collecting plate is fixedly arranged between the hollow negative pressure boxes, and when the cleaning cloth pressing part presses the cleaning cloth to make it adhere to the glass substrate, the cleaning cloth passing through the cleaning cloth pressing part is tightly attached to the top of the vertical collecting plate, and a negative pressure cleaning chamber is provided between the cleaning cloth pressing part, the vertical collecting plate, the cleaning cloth and the glass substrate, and a negative pressure flow port close to the top surface of the glass substrate is provided on one side of the hollow negative pressure box.

[0007] In some embodiments, the linkage part includes a horizontal supporting plate, a screw adapter is fixedly provided on one side of the horizontal supporting plate, a guide member is fixedly provided on the other side of the horizontal supporting plate, a first limiting groove is provided at the bottom of the guide supporting seat, a vertical guide rod is slidably connected inside the first limiting groove, the screw adapter and the guide member are respectively fixedly connected to the corresponding vertical guide rod, and a second limiting groove is provided on the side surface of the vertical guide rod.

[0008] In some embodiments, a connecting piece is fixedly provided on the side of the hollow negative pressure box away from the vertical gathering plate, and the connecting piece is slidably sleeved on the corresponding vertical guide rod. The sliding piece fixed on the inner wall of the connecting piece is engaged in the second limiting groove. A first elastic piece is fixedly provided on the top of the connecting piece, and the screw adapter and the guide piece are respectively connected to the corresponding first elastic piece. A limiting groove is provided on the top of the hollow negative pressure box, and one of the hollow negative pressure boxes is provided with an air inlet hole connected to its inner cavity, and the other hollow negative pressure box is provided with a negative pressure suction pipe.

[0009] In some embodiments, the elastic positioning assembly also includes two symmetrically arranged lifting rods, the top of the lifting rod slides through the horizontal supporting plate, and a connecting disk is fixedly provided on the peripheral side of the lifting rod, and the horizontal supporting plate and the connecting disk below it are connected by a second elastic member; the guide wheel part includes a guide wheel rod rotatably arranged between the two lifting rods, and both ends of the guide wheel rod are equipped with guide wheels tightly attached to the inner wall of the V-shaped guide opening; the cleaning cloth pressing part includes a support rod adapted to the limiting groove, the support rod is fixedly connected to the lifting rod above it, and a cleaning cloth pressing part is fixedly sleeved on the support rod.

[0010] In some embodiments, the present invention also includes a cleaning cloth supply assembly; wherein, the cleaning cloth supply assembly includes a U-shaped carrier, two horizontal support frames are symmetrically fixedly arranged on one side of the U-shaped carrier, an installation cavity is opened on the top of the horizontal support frame, the guide bearing seat is fixedly arranged inside the installation cavity, and the vertical guide rod is passed through and fitted in the guide channel inside the installation cavity, a first motor is installed on one of the horizontal support frames, and the output end of the first motor is connected to a reciprocating screw rod that is matched with the screw rod adapter for transmission, and a horizontal guide rod that is slidably sleeved with the guide member is installed on the other horizontal support frame.

[0011] In some embodiments, a mounting opening is provided on the horizontal support frame corresponding to the horizontal guide rod, and the output end of the second motor installed on one side of the U-shaped carrier is connected to a first limiting plate, and a first set shaft passing through the mounting opening is clamped on the first limiting plate, and a positioning plate is rotatably provided on the end of the first set shaft, and the positioning plate is connected to the corresponding horizontal support frame by fasteners, and a second limiting plate is fixedly provided on the side surface of the first set shaft, and the cleaning cloth cylinder installed on the first set shaft is limited by the first limiting plate and the second limiting plate.

[0012] In some embodiments, the present invention also includes a cleaning cloth tensioning mechanism; the cleaning cloth tensioning mechanism includes a tensioning assembly; the tensioning assembly includes a carrying frame, two L-shaped plates are symmetrically fixedly arranged at the bottom of the carrying frame, a cloth guide roller is installed between the L-shaped plates, two movable traction rods are slidably arranged on the carrying frame, a first mounting frame is installed between the movable traction rods, a second mounting frame is fixed on one side of the first mounting frame, a support plate fixed to the movable traction rod is provided on one side of the carrying frame, the support plate and the carrying frame are connected by a third elastic member, a limiting roller fixed to the movable traction rod is provided on the side of the first mounting frame away from the carrying frame, and a cleaning cloth pressing groove is provided on the peripheral side of the limiting roller.

[0013] In some embodiments, the cleaning cloth tensioning mechanism also includes a pressing power assembly; wherein, the pressing power assembly includes a pressing cylinder installed on the top of the second mounting bracket, the output end of the pressing cylinder is connected to a lifting bracket, a pressing rod adapted to the cleaning cloth pressing groove is installed on the inner side of the lifting bracket, the output end of the third motor installed on one side of the second mounting bracket is connected to the second sleeve shaft, the other side of the second mounting bracket is connected to a vertical mounting plate through a fastener, a third sleeve shaft that is rotatably provided on the vertical mounting plate and is engaged with the second sleeve shaft, and a cleaning cloth winding drum is sleeved and installed between the second sleeve shaft and the third sleeve shaft.

[0014] The present invention has the following beneficial effects: 1. During the cleaning process, the present invention extracts the air inside the corresponding hollow negative pressure box through the negative pressure suction pipe to generate negative pressure. Since the negative pressure cleaning chamber is arranged between the two hollow negative pressure boxes and the cleaning cloth has poor air permeability, the external air enters the corresponding hollow negative pressure box through the air inlet hole, and then enters the negative pressure cleaning chamber through the negative pressure flow port on the hollow negative pressure box, and then enters the negative pressure cleaning chamber through the negative pressure flow port on the other hollow negative pressure box and is discharged through the negative pressure suction pipe. In this way, the dust and other impurities accumulated inside the negative pressure cleaning chamber during the cleaning process are extracted under negative pressure, thereby realizing a dynamic cleaning process of the glass substrate and ensuring the cleaning effect of the glass substrate. Compared with the traditional single cleaning method of the roller brush, the combined effect of the cleaning cloth and the negative pressure suction of the negative pressure cleaning chamber can greatly improve the cleaning effect of the glass substrate.

[0015] 2. In the present invention, when the cleaning time set by the control system is reached, the control system starts the first motor again, and controls the reciprocating screw to rotate through the first motor, so that the horizontal supporting plate moves horizontally to the right again until the guide wheel rolls to the bottom of the third V-shaped guide opening. At this time, the other part of the cleaning cloth is attached to the top surface of the glass substrate under the action of the cleaning cloth pressing member, thereby further achieving the cleaning operation of the top surface of the glass substrate. According to the same control method as above, the cleaning work of batch glass substrates can be achieved successively. Compared with the traditional cleaning method of replacing the roller brush, this cleaning control method greatly improves the cleaning efficiency.

[0016] 3. In the present invention, when the guide wheel rolls to the bottom of the last V-shaped guide opening, the reciprocating screw is controlled by the first motor to continue to rotate so that the guide wheel moves horizontally to the left along each V-shaped guide opening until the guide wheel returns to the bottom of the first V-shaped guide opening. Then, the second motor and the third motor are controlled to start at the same time, and the second motor controls the cleaning cloth drum to rotate to gradually release a certain length of cleaning cloth, while the third motor controls the cleaning cloth take-up drum to rotate to gradually reel in the cleaning cloth until the used dirty cleaning cloth is completely reeled on the cleaning cloth take-up drum, and the new cleaning cloth released by the cleaning cloth drum moves to between the two guide bearing seats. Then, the cleaning work of the glass substrate can be continued according to the above cleaning method. Compared with the traditional cleaning method of replacing the roller brush, this cleaning control method greatly improves the cleaning efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following briefly introduces the drawings required for describing the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0018] Figure 1 This is a working state diagram of the cleaning equipment for semiconductor glass substrates in the present invention.

[0019] Figure 2 for Figure 1 The structural front view.

[0020] Figure 3 It is a schematic structural diagram of the cleaning equipment for semiconductor glass substrates in the present invention.

[0021] Figure 4 It is a structural schematic diagram of the cleaning cloth tensioning mechanism in the present invention.

[0022] Figure 5 It is a structural schematic diagram of the tensioning assembly in the present invention.

[0023] Figure 6 It is a structural schematic diagram of the press-fit power assembly in the present invention.

[0024] Figure 7 Schematic diagram of the structure of the cleaning cloth supply assembly in the present invention.

[0025] Figure 8 for Figure 7 Schematic diagram of the structure from another angle.

[0026] Figure 9 It is a structural schematic diagram of the guide bearing assembly in the present invention.

[0027] Figure 10 It is a schematic structural diagram of the negative pressure cleaning component in the present invention.

[0028] Figure 11 for Figure 10 Schematic diagram of the structure from another angle.

[0029] Figure 12 It is a structural schematic diagram of the elastic positioning component in the present invention.

[0030] In the accompanying drawings, the components represented by the reference numerals are as follows: 1-negative pressure cleaning mechanism, 2-guide bearing assembly, 201-guide bearing seat, 202-V-shaped guide port, 203-horizontal bearing plate, 204-screw adapter, 205-guide, 206-vertical guide rod, 3-negative pressure cleaning assembly, 301-hollow negative pressure box, 302-vertical gathering plate, 303-negative pressure flow port, 304-connecting piece, 305-first elastic piece, 306-limiting groove, 307-air inlet, 308-negative pressure suction pipe, 4-elastic positioning assembly, 401-lifting rod, 402-connecting plate, 403-second elastic piece, 404-guide wheel rod, 405-guide wheel, 406-support rod, 407-cleaning cloth pressing piece, 5-cleaning cloth supply assembly, 501-U-shaped carrier, 502-horizontal support frame, 503-installation cavity, 504-guide channel, 505-first electric Machine, 506-reciprocating screw, 507-horizontal guide rod, 508-mounting port, 509-second motor, 510-first limit plate, 511-first set shaft, 512-positioning plate, 513-second limit plate, 6-cleaning cloth tensioning mechanism, 7-tensioning assembly, 701-carrying frame, 702-L-shaped plate, 703-cloth guide roller, 704-movable traction rod, 705-first mounting frame, 706-second mounting frame, 707-support plate, 708-third elastic member, 709-limiting roller, 710-cleaning cloth pressing groove, 711-third motor, 712-second set shaft, 713-vertical mounting plate, 714-third set shaft, 8-pressing power assembly, 801-pressing cylinder, 802-lifting frame, 803-pressing rod, 9-glass substrate, 10-cleaning cloth take-up drum, 11-transmission belt. DETAILED DESCRIPTION

[0031] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making any creative efforts shall fall within the scope of protection of the present invention.

[0032] For specific embodiment 1, please refer to Figure 1-12The present invention is a cleaning device for semiconductor glass substrates, comprising a negative pressure cleaning mechanism 1; wherein the negative pressure cleaning mechanism 1 comprises a guide bearing assembly 2, a negative pressure cleaning assembly 3 and an elastic positioning assembly 4; the guide bearing assembly 2 comprises a sliding linkage portion, two guide bearing seats 201 are symmetrically fixed on the inner side of the linkage portion, and a plurality of V-shaped guide openings 202 are arranged in an array on the guide bearing seats 201; the negative pressure cleaning assembly 3 is sleeved and mounted on the linkage portion, and the negative pressure cleaning assembly 3 comprises two symmetrically arranged hollow negative pressure boxes 301, and the hollow negative pressure boxes 301 are fitted on opposite sides of the glass substrate 9; the elastic positioning assembly 4 slides The movable part is arranged on the linkage part, and the elastic positioning component 4 includes a guide wheel part and a cleaning cloth pressing part that move synchronously. The guide wheel part is arranged just above the cleaning cloth pressing part and is tightly attached to the inside of the V-shaped guide port 202; a vertical collecting plate 302 is fixedly arranged between the hollow negative pressure box 301, and when the cleaning cloth pressing part presses the cleaning cloth to make it adhere to the glass substrate 9, the cleaning cloth passing through the cleaning cloth pressing part is tightly attached to the top of the vertical collecting plate 302, and a negative pressure cleaning chamber is provided between the cleaning cloth pressing part, the vertical collecting plate 302, the cleaning cloth and the glass substrate 9, and a negative pressure flow port 303 close to the top surface of the glass substrate 9 is provided on one side of the hollow negative pressure box 301.

[0033] In some embodiments, as Figure 3 、 Figure 9 and Figure 10 As shown, the linkage part includes a horizontal bearing plate 203, a screw adapter 204 is fixedly provided on one side of the horizontal bearing plate 203, a guide member 205 is fixedly provided on the other side of the horizontal bearing plate 203, a first limiting groove is provided at the bottom of the guide bearing seat 201, a vertical guide rod 206 is slidably connected inside the first limiting groove, the screw adapter 204 (that is, the component used in conjunction with the reciprocating screw in the prior art, which will not be described in detail) and the guide member 205 are respectively fixedly connected to the corresponding vertical guide rod 206, and a second limiting groove is provided on the side surface of the vertical guide rod 206.

[0034] Furthermore, a connecting piece 304 is fixedly provided on one side of the hollow negative pressure box 301 away from the vertical gathering plate 302, and the connecting piece 304 is slidably sleeved on the corresponding vertical guide rod 206. The sliding piece fixed on the inner wall of the connecting piece 304 is fitted inside the second limit groove, so as to ensure that the entire negative pressure cleaning component 3 can only slide up and down along the two vertical guide rods 206 without deflection. A first elastic piece 305 is fixedly provided on the top of the connecting piece 304, and the screw adapter 204 and the guide piece 205 are respectively connected to The corresponding first elastic member 305 is connected, and a limiting groove 306 is provided on the top of the hollow negative pressure box 301. The downward movement of the entire negative pressure cleaning component 3 is achieved by the force inside the limiting groove 306. One of the hollow negative pressure boxes 301 is provided with an air inlet hole 307 connected to its inner cavity, and the other hollow negative pressure box 301 is connected with a negative pressure suction pipe 308. The cleaning cloth is made of a flexible non-air-permeable or poorly air-permeable material. A suction device is provided on one side of the negative pressure suction pipe 308, and the suction device and The negative pressure suction pipes 308 are connected by an exhaust hose (a hollow dust filter box is provided on the hose at the same time). During the cleaning process, the air inside the corresponding hollow negative pressure box 301 is extracted through the negative pressure suction pipe 308 to generate negative pressure. Since the negative pressure cleaning chamber is arranged between the two hollow negative pressure boxes 301 and the air permeability of the cleaning cloth is poor, the external air enters the corresponding hollow negative pressure box 301 through the air inlet hole 307, and then enters the negative pressure cleaning chamber through the negative pressure flow port 303 on the hollow negative pressure box 301, and then After entering through the negative pressure flow port 303 on another hollow negative pressure box 301, it is discharged through the negative pressure suction pipe 308. In this way, the dust and other impurities accumulated inside the negative pressure cleaning chamber during the cleaning process are extracted by negative pressure, thereby realizing a dynamic cleaning process of the glass substrate 9 and ensuring the cleaning effect of the glass substrate 9. Compared with the traditional single cleaning method of the roller brush, the combined effect of the above-mentioned cleaning cloth and the negative pressure suction of the negative pressure cleaning chamber in this embodiment can greatly improve the cleaning effect of the glass substrate 9.

[0035] In some embodiments, as Figure 3 and Figure 12 As shown, the elastic positioning assembly 4 also includes two symmetrically arranged lifting rods 401. The top of the lifting rod 401 slides through the horizontal supporting plate 203. A connecting plate 402 is fixedly provided on the side surface of the lifting rod 401. The horizontal supporting plate 203 and the connecting plate 402 below it are connected by a second elastic member 403. The elastic positioning assembly 4 is supported by each second elastic member 403, and the elastic positioning assembly 4 is further supported by the guide supporting seats 201 on both sides.

[0036] The guide wheel portion includes a guide wheel rod 404 rotatably arranged between the two lifting rods 401, and both ends of the guide wheel rod 404 are equipped with guide wheels 405 that are tightly attached to the inner wall of the V-shaped guide opening 202 (that is, the elastic force of the second elastic member 403 is used to make the guide wheel 405 tightly rest against the inner wall of the V-shaped guide opening 202); the cleaning cloth pressing portion includes a support rod 406 that is adapted to the limiting groove 306, and the support rod 406 is fixedly connected to the lifting rod 401 above it, and a cleaning cloth pressing part 407 is fixedly sleeved on the support rod 406. The guide wheel 405 rolls along the oblique inner wall of the V-shaped guide opening 202, driving the guide wheel rod 404 and the lifting rod 401 thereon to move up and down, and driving the support rod 406 and the cleaning cloth pressing part 407 to move synchronously during the up and down movement of the lifting rod 401.

[0037] When a glass substrate 9 on the conveyor belt 11 (which is a component of a commonly used belt conveyor system, so other commonly used structures of the belt conveyor system are not described in detail) is transported to a set position (set by the control system), the set position specifically refers to the position where the front end of the glass substrate 9 just fits into the position between the two hollow negative pressure boxes 301, and the two hollow negative pressure boxes 301 are attached to both sides of the glass substrate 9, which can realize the guide and limit of the moving glass substrate 9 during the cleaning process. The conveyor belt 11 is paused to keep the glass substrate 9 in the set position, and then the linkage part is controlled to move horizontally so that the vertical guide rod 206 slides along the bottom of the guide bearing seat 201, and the entire elastic positioning assembly 4 is driven to move horizontally synchronously under the action of the horizontal bearing plate 203. In this process, the guide wheel 405 slides along the inner wall of the V-shaped guide opening 202 until the guide wheel 405 fits into the inner bottom of the V-shaped guide opening 202 at the desired position (through the elastic force of the second elastic member 403). The cleaning cloth pressing piece 407 moves downward to fit the cleaning cloth below and presses the cleaning cloth to gradually approach the glass substrate 9 until the cleaning cloth is in contact with the top surface of the glass substrate 9. At this time, a negative pressure cleaning chamber is formed between the cleaning cloth pressing piece 407, the vertical collecting plate 302, the cleaning cloth (specifically, a section of the cleaning cloth between the cleaning cloth pressing piece 407 and the vertical collecting plate 302) and the glass substrate 9. Subsequently, the glass substrate 9 is gradually transported to the rear end by the conveyor belt 11. The top surface of the glass substrate 9 is cleaned by the cleaning cloth in contact with the top surface of the glass substrate 9. During the cleaning process, the dust and other impurities accumulated in the negative pressure cleaning chamber are extracted and collected by the negative pressure suction pipe 308, thereby greatly improving the cleaning effect of the glass substrate 9.

[0038] Specific embodiment 2, based on specific embodiment 1, as Figure 3 、 Figure 7 and Figure 8 As shown, the present invention also includes a cleaning cloth supply assembly 5; wherein the cleaning cloth supply assembly 5 includes a U-shaped carrier 501 (installed on an external frame), two horizontal support frames 502 are symmetrically fixedly provided on one side of the U-shaped carrier 501, a mounting cavity 503 is provided on the top of the horizontal support frame 502, a guide bearing seat 201 is fixedly provided inside the mounting cavity 503, a vertical guide rod 206 is passed through and fitted in a guide channel 504 inside the mounting cavity 503 (the horizontal movement of the vertical guide rod 206 is ensured by the setting of the guide channel 504), a first motor 505 is installed on one of the horizontal support frames 502, and the first The output end of the motor 505 is connected to a reciprocating screw 506 that is in transmission cooperation with the screw adapter 204, and a horizontal guide rod 507 that is slidably sleeved with the guide member 205 is installed on the other horizontal support frame 502, so as to ensure the smooth movement of the entire negative pressure cleaning mechanism 1 between the two horizontal support frames 502. That is to say, when the reciprocating screw 506 is controlled to rotate by the first motor 505, the horizontal reciprocating motion of the horizontal supporting plate 203 can be driven under the action of the reciprocating screw 506 and the screw adapter 204, thereby realizing the synchronous horizontal reciprocating motion of the negative pressure cleaning component 3 and the elastic positioning component 4.

[0039] In some embodiments, as Figure 7 and Figure 8 As shown, a mounting opening 508 is provided on the horizontal support frame 502 corresponding to the horizontal guide rod 507, and an output end of a second motor 509 installed on one side of the U-shaped carrier 501 is connected to a first limiting plate 510, and a first set shaft 511 penetrating the mounting opening 508 is clamped on the first limiting plate 510 (the first set shaft 511 can be rotated synchronously with the first limiting plate 510 by clamping, and can be removed from the first limiting plate 510 by clamping). The specific clamping structure belongs to the prior art, such as the first set shaft 511 A clamping block is provided at the end, which cooperates with the clamping groove on the first limiting plate 510). A positioning plate 512 is rotatably provided at the end of the first set shaft 511. The positioning plate 512 is connected to the corresponding horizontal support frame 502 by fasteners, so as to ensure the stability of the clamping relationship between the first set shaft 511 and the first limiting plate 510. A second limiting plate 513 is fixedly provided on the side surface of the first set shaft 511. The cleaning cloth roll installed on the first set shaft 511 is limited by the first limiting plate 510 and the second limiting plate 513. A cleaning cloth of a certain length is wound around the cleaning cloth roll.

[0040] In some embodiments, as Figure 4 、 Figure 5 and Figure 6As shown, the present invention also includes a cleaning cloth tensioning mechanism 6; the cleaning cloth tensioning mechanism 6 includes a tensioning assembly 7; the tensioning assembly 7 includes a carrying frame 701 (installed on an external frame), two L-shaped plates 702 are symmetrically fixedly provided at the bottom of the carrying frame 701, a cloth guide roller 703 is installed between the L-shaped plates 702, two movable traction rods 704 are slidably provided on the carrying frame 701, a first mounting frame 705 is installed between the movable traction rods 704, a second mounting frame 706 is fixed to one side of the first mounting frame 705, a support plate 707 fixed to the movable traction rod 704 is provided on one side of the carrying frame 701, the support plate 707 and the carrying frame 701 are connected by a third elastic member 708, a limiting roller 709 fixed to the movable traction rod 704 is provided on the side of the first mounting frame 705 away from the carrying frame 701, and a cleaning cloth pressing groove 710 is opened on the side surface of the limiting roller 709.

[0041] Furthermore, the cleaning cloth tensioning mechanism 6 also includes a pressing power assembly 8; wherein the pressing power assembly 8 includes a pressing cylinder 801 installed on the top of the second mounting frame 706, the output end of the pressing cylinder 801 is connected to the lifting frame 802, and the inner side of the lifting frame 802 is installed with a pressing rod 803 adapted to the cleaning cloth pressing groove 710, the output end of the third motor 711 installed on one side of the second mounting frame 706 is connected to the second set shaft 712, and the other side of the second mounting frame 706 is connected to a vertical mounting plate 713 through a fastener, and a third set shaft 714 is rotatably provided on the vertical mounting plate 713 to engage with the second set shaft 712, and a cleaning cloth winding drum 10 is installed between the second set shaft 712 and the third set shaft 714.

[0042] After the cleaning cloth drum is controlled to rotate by the second motor 509 to release a certain length of cleaning cloth, the movable end of the cleaning cloth is pulled through the top of the vertical gathering plate 302, and then through the bottom of the cleaning cloth pressing piece 407, and then through the top of the guide roller 703 and adhered to the top of the limiting roller 709, and then the pressing cylinder 801 controls the pressing rod 803 to move downward to the inside of the cleaning cloth pressing groove 710. At this time, the cleaning cloth is confined in the cleaning cloth pressing groove 710 under the action of the pressing rod 803, and then continues to pull the movable end of the cleaning cloth to pass between the lifting frame 802 and the pressing rod 803, and finally wraps the movable end of the cleaning cloth around The cleaning cloth winding drum 10 is fixed on the cleaning cloth winding drum 10, and the cleaning cloth winding drum 10 on the second set shaft 712 and the third set shaft 714 is controlled by the third motor 711 to rotate, so that the cleaning cloth is gradually wound on the cleaning cloth winding drum 10 to adjust the tension of the cleaning cloth until the cleaning cloth is adjusted to a just tightened state. In the process of the guide wheel 405 gradually sliding down along the inclined inner wall of the V-shaped guide opening 202, the strong elastic force of the second elastic member 403 pushes the entire negative pressure cleaning assembly 3 and the cleaning cloth downward. The strong elastic force of the second elastic member 403 is sufficient to ensure that the cleaning cloth can be forced to fit onto the top surface of the glass substrate 9.

[0043] The guide wheel 405 in the initial state is at the bottom of the first V-shaped guide opening 202 (i.e. Figure 3 The leftmost V-shaped guide opening 202 is located in the middle of the second V-shaped guide opening 202. After the cleaning cloth is installed, the reciprocating screw 506 is controlled by the first motor 505 to rotate. Under the action of the reciprocating screw 506 and the screw adapter 204, the horizontal carrier plate 203 is driven to move horizontally to the right until the guide wheel 405 rolls to the bottom of the second V-shaped guide opening 202. At this time, a part of the cleaning cloth is attached to the top surface of the glass substrate 9 under the action of the cleaning cloth pressing member 407. In this way, the cleaning operation of the top surface of the glass substrate 9 can be started. When the cleaning time set by the control system is reached, the control system starts the first motor again. The machine 505 controls the reciprocating screw 506 to rotate through the first motor 505 so that the horizontal carrying plate 203 moves horizontally to the right again until the guide wheel 405 rolls to the bottom of the third V-shaped guide opening 202. At this time, the other part of the cleaning cloth is attached to the top surface of the glass substrate 9 under the action of the cleaning cloth pressing member 407, so that the top surface of the glass substrate 9 can be further cleaned. According to the same control method as above, the cleaning work of batches of glass substrates 9 can be successively achieved. Compared with the traditional cleaning method of replacing the roller brush, this cleaning control method greatly improves the cleaning efficiency.

[0044] When the guide wheel 405 rolls to the bottom of the last V-shaped guide opening 202 (there is no glass substrate 9 at this position), the reciprocating screw 506 is controlled by the first motor 505 to continue to rotate so that the guide wheel 405 moves horizontally to the left along each V-shaped guide opening 202 until the guide wheel 405 returns to the bottom of the first V-shaped guide opening 202. Then, the second motor 509 and the third motor 711 are controlled to start at the same time. The second motor 509 controls the cleaning cloth drum to rotate and gradually release a certain length of cleaning cloth, while the third motor 711 controls the cleaning cloth take-up drum 10 to rotate and gradually reel in the cleaning cloth until the used dirty cleaning cloth is completely reeled on the cleaning cloth take-up drum 10. The new cleaning cloth released by the cleaning cloth drum moves to between the two guide bearing seats 201. Then, the cleaning work of the glass substrate 9 can be continued according to the above cleaning method. Compared with the traditional cleaning method of replacing the roller brush, this cleaning control method greatly improves the cleaning efficiency.

[0045] Throughout this specification, references to terms such as "one embodiment," "example," or "specific example" indicate that the specific features, structures, materials, or characteristics described in conjunction with that embodiment or example are included in at least one embodiment or example of the present invention. In this specification, schematic representations of these terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

[0046] The preferred embodiments of the present invention disclosed above are intended only to help illustrate the present invention. These preferred embodiments do not exhaustively describe all details, nor do they limit the present invention to the specific embodiments described. Obviously, many modifications and variations are possible based on the content of this specification. These embodiments are selected and described in detail in this specification to better explain the principles and practical applications of the present invention, thereby enabling those skilled in the art to better understand and utilize the present invention. The present invention is limited only by the claims and their full scope and equivalents.

Claims

1. A cleaning device for semiconductor glass substrates, characterized in that: It comprises a negative pressure cleaning mechanism (1); wherein the negative pressure cleaning mechanism (1) comprises: A guide bearing assembly (2), the guide bearing assembly (2) comprising a sliding linkage portion, two guide bearing seats (201) being symmetrically fixed on the inner side of the linkage portion, and a plurality of V-shaped guide openings (202) being arranged in an array on the guide bearing seats (201); A negative pressure cleaning assembly (3), the negative pressure cleaning assembly (3) being sleeved and mounted on the linkage portion, the negative pressure cleaning assembly (3) comprising two symmetrically arranged hollow negative pressure boxes (301), the hollow negative pressure boxes (301) being fitted on opposite sides of the glass substrate (9); An elastic positioning assembly (4), the elastic positioning assembly (4) being slidably arranged on the linkage portion, the elastic positioning assembly (4) comprising a guide wheel portion and a cleaning cloth pressing portion that move synchronously, the guide wheel portion being arranged directly above the cleaning cloth pressing portion and closely attached to the interior of the V-shaped guide opening (202); A vertical collecting plate (302) is fixedly arranged between the hollow negative pressure boxes (301); when the cleaning cloth pressing portion presses the cleaning cloth to make it adhere to the glass substrate (9), the cleaning cloth passing through the cleaning cloth pressing portion is tightly attached to the top of the vertical collecting plate (302); a negative pressure cleaning chamber is provided between the cleaning cloth pressing portion, the vertical collecting plate (302), the cleaning cloth and the glass substrate (9); and a negative pressure flow port (303) close to the top surface of the glass substrate (9) is provided on one side of the hollow negative pressure box (301).

2. A cleaning device for semiconductor glass substrates according to claim 1, characterized in that: The linkage part comprises a horizontal bearing plate (203), a screw rod adapter (204) is fixedly provided on one side of the horizontal bearing plate (203), a guide member (205) is fixedly provided on the other side of the horizontal bearing plate (203), a first limiting groove is provided at the bottom of the guide bearing seat (201), a vertical guide rod (206) is slidably connected inside the first limiting groove, the screw rod adapter (204) and the guide member (205) are respectively fixedly connected to the corresponding vertical guide rod (206), and a second limiting groove is provided on the side surface of the vertical guide rod (206).

3. A cleaning device for semiconductor glass substrates according to claim 2, characterized in that: A connecting piece (304) is fixedly provided on one side of the hollow negative pressure box (301) away from the vertical gathering plate (302), and the connecting piece (304) is slidably sleeved on the corresponding vertical guide rod (206). A sliding piece fixed on the inner wall of the connecting piece (304) is engaged in the second limiting groove. A first elastic piece (305) is fixedly provided on the top of the connecting piece (304), and the screw adapter (204) and the guide piece (205) are respectively connected to the corresponding first elastic piece (305). A limiting groove (306) is provided on the top of the hollow negative pressure box (301), and one of the hollow negative pressure boxes (301) is provided with an air inlet hole (307) connected to its inner cavity, and the other hollow negative pressure box (301) is provided with a negative pressure suction pipe (308) connected thereto.

4. A cleaning device for semiconductor glass substrates according to claim 3, characterized in that: The elastic positioning assembly (4) further comprises two symmetrically arranged lifting rods (401), the tops of the lifting rods (401) slidingly passing through the horizontal bearing plate (203), the side surfaces of the lifting rods (401) being fixedly provided with connecting plates (402), and the horizontal bearing plate (203) and the connecting plates (402) below the horizontal bearing plate (203) being connected via a second elastic member (403); The guide wheel portion includes a guide wheel rod (404) rotatably arranged between two lifting rods (401), and both ends of the guide wheel rod (404) are equipped with guide wheels (405) tightly attached to the inner wall of the V-shaped guide opening (202); the cleaning cloth pressing portion includes a support rod (406) adapted to the limiting groove (306), the support rod (406) is fixedly connected to the lifting rod (401) above it, and a cleaning cloth pressing piece (407) is fixedly sleeved on the support rod (406).

5. The cleaning device for semiconductor glass substrate according to claim 4, characterized in that: The cleaning cloth supply assembly (5) is also included; wherein, the cleaning cloth supply assembly (5) includes a U-shaped carrier (501), two horizontal support frames (502) are symmetrically fixedly arranged on one side of the U-shaped carrier (501), a mounting cavity (503) is opened on the top of the horizontal support frame (502), the guide bearing seat (201) is fixedly arranged inside the mounting cavity (503), the vertical guide rod (206) is passed through and matched in the guide channel (504) inside the mounting cavity (503), a first motor (505) is installed on one of the horizontal support frames (502), the output end of the first motor (505) is connected to a reciprocating screw rod (506) that is transmission-matched with the screw rod adapter (204), and a horizontal guide rod (507) that is slidably sleeved with the guide member (205) is installed on the other horizontal support frame (502).

6. The cleaning device for semiconductor glass substrate according to claim 5, characterized in that: A mounting opening (508) is provided on the horizontal support frame (502) corresponding to the horizontal guide rod (507), and an output end of a second motor (509) installed on one side of the U-shaped carrier (501) is connected to a first limiting plate (510), and a first sleeve shaft (511) passing through the mounting opening (508) is clamped on the first limiting plate (510), and a positioning plate (512) is rotatably provided at the end of the first sleeve shaft (511), and the positioning plate (512) is connected to the corresponding horizontal support frame (502) by fasteners, and a second limiting plate (513) is fixedly provided on the side surface of the first sleeve shaft (511), and the cleaning cloth cylinder installed on the first sleeve shaft (511) is limited by the first limiting plate (510) and the second limiting plate (513).

7. The cleaning device for semiconductor glass substrate according to claim 6, characterized in that: It also includes a cleaning cloth tensioning mechanism (6); the cleaning cloth tensioning mechanism (6) includes a tensioning assembly (7); The tensioning assembly (7) includes a supporting frame (701), two L-shaped plates (702) are symmetrically fixedly arranged at the bottom of the supporting frame (701), a cloth guide roller (703) is installed between the L-shaped plates (702), two movable traction rods (704) are slidably arranged on the supporting frame (701), a first mounting frame (705) is installed between the movable traction rods (704), a second mounting frame (706) is fixed to one side of the first mounting frame (705), a support plate (707) fixed to the movable traction rod (704) is provided on one side of the supporting frame (701), the support plate (707) and the supporting frame (701) are connected via a third elastic member (708), a limiting roller (709) fixed to the movable traction rod (704) is provided on the side of the first mounting frame (705) away from the supporting frame (701), and a cleaning cloth pressing groove (710) is provided on the side surface of the limiting roller (709).

8. The cleaning device for semiconductor glass substrate according to claim 7, characterized in that: The cleaning cloth tensioning mechanism (6) further includes a pressing power assembly (8); wherein the pressing power assembly (8) includes a pressing cylinder (801) mounted on the top of a second mounting frame (706); an output end of the pressing cylinder (801) is connected to a lifting frame (802); a pressing rod (803) adapted to the cleaning cloth pressing groove (710) is mounted on the inner side of the lifting frame (802); an output end of a third motor (711) mounted on one side of the second mounting frame (706) is connected to a second sleeve shaft (712); a vertical mounting plate (713) is connected to the other side of the second mounting frame (706) via a fastener; a third sleeve shaft (714) is rotatably provided on the vertical mounting plate (713) and is engaged with the second sleeve shaft (712); a cleaning cloth reel (10) is sleeved and mounted between the second sleeve shaft (712) and the third sleeve shaft (714).

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