Mask exposure platform capable of avoiding exposure offset

Abstract

The invention relates to the field of mask exposure, in particular to a mask exposure platform capable of avoiding exposure offset, which comprises an exposure platform main body frame and a driving assembly, and the exposure platform main body frame is located at the top of the driving assembly; the power output end of the exposure platform main body frame is rotationally connected with a power transmission shaft, the outer side of the power transmission shaft is sleeved with a mask plate bearing disc, two placement grooves are formed in the mask plate bearing disc, a plurality of adjusting assemblies are arranged in the placement grooves, and a plurality of limiting assemblies are arranged at the top end of the mask plate bearing disc. A horizontal laser detector is arranged on one side of the mask plate bearing disc; according to the invention, through the cooperation of pneumatic adjustment and mask plate positioning, the offset is corrected by utilizing the real-time monitoring of the horizontal laser detector, the bidirectional dynamic leveling driven by the air pump and the mechanical occlusion of the positioning convex block and the positioning groove, so that the problem of exposure pattern distortion caused by the horizontal offset of the mask plate in the traditional exposure process is solved; and the exposure precision and the product yield are effectively improved.

Description

Technical Field

[0001] The present invention relates to the field of mask exposure, and in particular to a mask exposure platform for avoiding exposure deviation. Background Art

[0002] In a method for maintaining a photomask and a photomask carrying platform, application number CN201711069037.X, the photomask can be placed on the photomask carrying platform in an exposure device. The photomask includes a substrate and a reflective structure. The substrate includes a main surface and at least one side wall, and the main surface and the side wall are connected. The main surface includes a pattern area and a peripheral area, and the peripheral area is arranged outside the pattern area. The reflective structure is arranged at least on the side wall surface or in the peripheral area of ​​the main surface. In the existing technologies including the above-mentioned patents, the horizontality and positioning accuracy of the mask plate are the key bottlenecks restricting the exposure quality. Existing equipment mostly relies on mechanical positioning or manual calibration, and it is difficult to dynamically compensate for the offset of the mask plate caused by ambient temperature changes, mechanical vibration or its own warping in real time. The mechanical positioning structure has transmission gaps and cumulative errors, which cause the mask plate to easily have position deviations when rotating to the exposure position, causing the exposure pattern to be misplaced or deformed; in addition, some equipment with automatic leveling function only uses one-way support adjustment, lacks limit constraints on the top of the mask plate, and is prone to shaking during the leveling process, and cannot effectively control the exposure offset error. These problems have caused the product yield of traditional exposure equipment to be generally low, making it difficult to meet the stringent requirements for high-precision exposure in fields such as semiconductor lithography and micro-nano manufacturing.

[0003] Therefore, it is necessary to invent a mask exposure platform that avoids exposure offset to solve the above problems. Summary of the Invention

[0004] The purpose of the present invention is to provide a mask exposure platform that avoids exposure offset. It is difficult to dynamically compensate for the offset of the mask plate caused by ambient temperature changes, mechanical vibration or self-warping through traditional methods of mechanical positioning or manual calibration, and there are gaps and cumulative errors in mechanical transmission. Some automatic leveling equipment lacks top limit constraints, which makes the exposure pattern easy to be misplaced and deformed, and the offset error is difficult to control. The product yield is generally low and cannot meet the high-precision requirements of fields such as semiconductor lithography. The present invention solves the problem of exposure pattern distortion caused by horizontal offset of the mask plate in the traditional exposure process through the coordination of pneumatic adjustment and mask plate positioning, using a horizontal laser detector for real-time monitoring, an air pump to drive two-way dynamic leveling, and mechanical engagement of the positioning bump and the positioning groove to correct the offset, thereby effectively improving exposure accuracy and product yield.

[0005] In order to achieve the above object, the present invention provides the following technical solutions: The cam is secured to the cam face and is adapted to engage the operator's movement to engage with the cam, thereby enabling the cam to move freely in the cam face, thereby enabling the cam to move freely in the cam face, thereby enabling the cam to move freely in the cam face.

[0006] As a preferred solution of the present invention, a mounting plate is provided at the tail end of the power transmission shaft, one end of the mounting plate is installed on the power output shaft of the main frame of the exposure platform, a transmission positioning head is provided at the head end of the power transmission shaft, and a plurality of first tooth grooves arranged in a ring shape are provided on the outer side wall of the power transmission shaft; a load-bearing support ring is provided on the outer side wall of the power transmission shaft, and a plurality of springs arranged in a ring array are provided on the top of the load-bearing support ring.

[0007] As a preferred solution of the present invention, an inner ring is provided at the center of the mask plate carrier plate, and the inner ring is sleeved on the outside of the power transmission shaft. The inner side wall of the inner ring is provided with a second tooth groove engaged with the first tooth groove, and the bottom end of the inner ring is connected to one end of a plurality of the springs; a plurality of positioning protrusions are provided at the bottom of the mask plate carrier plate, and the positioning protrusions are arranged in a rectangular array on the top of the exposure port, and a plurality of positioning grooves are provided at the bottom of the mask plate carrier plate, and the inner side wall of the positioning groove and the top of the positioning protrusion are both arranged with inclined surfaces.

[0008] As a preferred solution of the present invention, multiple adjustment components are arranged in a rectangular array with the center of the placement groove as the central axis, and the adjustment component includes a support column body, the inner cavity of the support column body is provided with a support column inner rod, the head end of the support column inner rod is provided with a contact with the mask plate, and the tail end of the support column inner rod is provided with a sliding piston, and the sliding piston is densely slidably connected to the inner cavity of the support column inner rod.

[0009] As a preferred solution of the present invention, a plurality of gas transmission channels are provided on the mask plate carrier, one end of the gas transmission channel is connected to the tail end of the support column body, and the other end of the gas transmission channel is connected to the adjacent hose.

[0010] As a preferred solution of the present invention, the limit assembly includes a limiter body, which is arranged at the top of the mask plate carrier plate, one end of the limiter body is telescopically connected to a pressure block, the bottom end of the pressure block is arranged in an arc shape, and the other end of the limiter body is provided with a gas connecting tube, which is connected and inserted into the inner cavity of an adjacent gas transmission channel.

[0011] As a preferred solution of the present invention, the laser level detection end of the horizontal laser detector faces one side of the placement slot.

[0012] In the above technical solution, compared with the prior art, the technical effects and advantages provided by the present invention are as follows: 1. The mask exposure platform solves the problem of exposure pattern distortion caused by horizontal offset of the mask during traditional exposure by coordinating pneumatic adjustment with mask positioning. The horizontal laser detector monitors the status of the mask in real time. Once tilt is detected, the air pump device immediately delivers gas to the corresponding adjustment component through a hose, pushing the inner rod of the support column to drive the contact head to precisely lift. At the same time, the pressure block of the limit assembly is synchronously pressed down and fixed under the action of air pressure, achieving two-way dynamic leveling of the mask. By utilizing the cooperation between the positioning protrusion and the inclined surface of the positioning groove, after the mask is rotated to the exposure position, the pneumatic system drives the inner ring to move downward. The mechanical engagement automatically corrects the slight offset to ensure positioning accuracy. This technology eliminates the need for manual repeated calibration during the exposure process, effectively avoiding problems such as pattern misalignment and deformation caused by mask tilt or positioning deviation, controlling the exposure offset error within a reasonable range, and improving the consistency and accuracy of the exposure pattern. Compared with traditional equipment, the product yield is improved, providing reliable guarantee for high-precision lithography processing. 2. The mask exposure platform adopts a gas-linked bidirectional adjustment mechanism. During the horizontal calibration of the mask plate, the gas pushes the inner rod of the support column to lift the bottom of the mask plate to adjust the tilt angle, and the gas pressure drives the pressure block to press down and fix the top of the mask plate to prevent shaking. When the gas delivered by the air pump device enters the column body of the support column and pushes the inner rod of the support column to lift the mask plate, the gas flows into the inner cavity of the limiter body through the connecting structure, prompting the pressure block to press down and fit the top of the mask plate. This not only avoids the shaking or offset of the mask plate that may occur during leveling of the traditional single support structure, but also ensures uniform force on the surface of the mask plate through pressure balance, reduces flatness error, and improves the stability and accuracy of mask leveling. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments. Obviously, the drawings described below are only some embodiments described in the present invention. For ordinary technicians in this field, other drawings can also be obtained based on these drawings.

[0014] Figure 1 It is a schematic diagram of the overall three-dimensional structure of the present invention; Figure 2 Schematic diagram of the power transmission shaft and the mask plate supporting disk structure of the present invention; Figure 3 Schematic diagram of the gas transmission channel structure of the present invention; Figure 4 It is a schematic cross-sectional view of the structure of the mask carrier of the present invention; Figure 5 for Figure 4 A in the middle is an enlarged structural diagram; Figure 6 It is a schematic diagram of the structure of the regulating component of the present invention.

[0015] Description of reference numerals: 1. Exposure platform main frame; 11. Power transmission shaft; 111. Transmission positioning head; 112. Load-bearing support ring; 12. Mask plate carrier; 121. Inner ring; 122. Positioning protrusion; 13. Adjustment assembly; 130. Support column body; 131. Support column inner rod; 132. Contact head; 133. Sliding piston; 14. Limiting assembly; 141. Limiter body; 142. Pressure block; 143. Gas connecting pipe; 15. Gas transmission channel; 16. Horizontal laser detector; 2. Driving assembly; 21. Air pump device; 22. Air pipe shaft; 23. Contact head. DETAILED DESCRIPTION

[0016] In order to enable those skilled in the art to better understand the technical solution of the present invention, the present invention will be further described in detail below with reference to the accompanying drawings.

[0017] The present invention provides Figures 1-6 A mask exposure platform for avoiding exposure offset is shown, comprising an exposure platform main frame 1 and a drive assembly 2, wherein the exposure platform main frame 1 is located at the top of the drive assembly 2; the power output end of the exposure platform main frame 1 is rotatably connected to a power transmission shaft 11, and a mask plate carrier 12 is sleeved on the outer side of the power transmission shaft 11, and two placement slots are provided on the mask plate carrier 12, and a plurality of adjustment components 13 are provided in the placement slots, and a plurality of limit components 14 are provided at the top of the mask plate carrier 12, and a horizontal laser detector 16 is provided on one side of the mask plate carrier 12; an air pump device 21 is provided on one side of the drive assembly 2, and the power output end of the air pump device 21 is rotatably connected to an air pipe shaft 22, and the bottom end of the air pipe shaft 22 is retractably provided with a contact head 23, and the tail end of the air pipe shaft 22 is connected to a plurality of hoses, and the other ends of the plurality of hoses are commonly connected and arranged on the mask plate carrier 12, and the air pipe shaft 22 is connected to the adjacent inner cavity of the adjustment component 13 through the hose, and the other side of the drive assembly 2 is installed on the inner wall of the exposure platform.

[0018] Furthermore, a mounting plate is provided at the tail end of the power transmission shaft 11, one end of the mounting plate is installed on the power output shaft of the exposure platform main frame 1, a transmission positioning head 111 is provided at the head end of the power transmission shaft 11, and a plurality of first tooth grooves arranged in a ring shape are provided on the outer wall of the power transmission shaft 11; a load-bearing support ring 112 is provided on the outer wall of the power transmission shaft 11, and a plurality of springs arranged in a ring array are provided on the top of the load-bearing support ring 112.

[0019] Furthermore, an inner ring 121 is provided at the center of the mask plate carrier 12, and the inner ring 121 is sleeved on the outer side of the power transmission shaft 11. The inner wall of the inner ring 121 is provided with a second tooth groove that engages with the first tooth groove, and the bottom end of the inner ring 121 is connected to one end of a plurality of springs; a plurality of positioning protrusions 122 are provided at the bottom of the mask plate carrier 12, and the positioning protrusions 122 are arranged in a rectangular array at the top of the exposure port, and a plurality of positioning grooves are provided at the bottom of the mask plate carrier 12 for cooperating with the positioning protrusions 122, and the inner side walls of the positioning grooves and the top ends of the positioning protrusions 122 are both arranged with inclined surfaces.

[0020] Furthermore, multiple adjustment components 13 are arranged in a rectangular array with the center of the placement slot as the central axis. The adjustment component 13 includes a support column body 130. The inner cavity of the support column body 130 is provided with a support column inner rod 131. The head end of the support column inner rod 131 is provided with 132 that contacts the mask plate. The tail end of the support column inner rod 131 is provided with a sliding piston 133. The sliding piston 133 is densely slidably connected to the inner cavity of the support column inner rod 131.

[0021] Furthermore, a plurality of gas transmission channels 15 are provided on the mask carrier plate 12 , one end of the gas transmission channel 15 is connected to the tail end of the support column body 130 , and the other end of the gas transmission channel 15 is connected to an adjacent hose.

[0022] Furthermore, the limit assembly 14 includes a limiter body 141, which is arranged at the top of the mask plate carrier plate 12. One end of the limiter body 141 is telescopically connected to a pressure block 142, and the bottom end of the pressure block 142 is arranged in an arc shape. The other end of the limiter body 141 is provided with a gas connecting tube 143, and the gas connecting tube 143 is connected and inserted into the inner cavity of the adjacent gas transmission channel 15.

[0023] Furthermore, the laser level detection end of the horizontal laser detector 16 faces one side of the placement slot.

[0024] Working principle: The mask is placed in the placement groove on one side of the mask carrier 12, so that the bottom of the mask just contacts the multiple 132, which are arranged in a rectangular array to support the mask; the exposure platform main frame 1 is started, and the power transmission shaft 11 is driven to rotate. Through the relationship between the teeth and grooves, the power transmission shaft 11 drives the mask carrier 12 to rotate 180 degrees, and the mask is rotated to the top of the exposure port; The driving electric telescopic rod at the bottom of the air pump device 21 is started to push the contact head 23 to contact the top of the inner ring 121, and push the inner ring 121 to move toward the bottom and compress the spring, so that the mask carrier 12 moves toward the bottom, ensuring that the mask on the placement slot can approach the exposure port. At the same time, the positioning groove at the bottom of the mask carrier 12 contacts the positioning protrusion 122, and the inclined setting of the top of the positioning protrusion 122 fits the inclined surface of the positioning groove, which can correct the position of the mask carrier 12 after rotation by slight deviation, ensuring that the position of the mask carrier 12 after rotation can be accurately controlled; At this time, the horizontal laser detector 16 is started, and the horizontal level of the mask plate is detected by the laser output end of the horizontal laser detector 16. When it is found that one side of the mask plate is tilted, the air pump device 21 is started, and the built-in air pump is driven by the air pump device 21 to transport gas to the hose at the corresponding position. The hose transports the gas to the adjacent gas transmission channel 15 cavity. After the gas passes through the gas transmission channel 15 cavity and then enters the support column body 130 cavity, the air pressure in the support column body 130 cavity increases, pushing the sliding piston 133 and the support column inner rods 131 and 132 at the adjacent position to lift toward the top, thereby realizing the height adjustment and lifting of the mask plate at that position; At the same time, it should be noted that when the air pressure enters the inner cavity of the support column body 130, since the gas connecting tube 143 is connected and plugged into the inner cavity of the corresponding gas transmission channel 15, when the gas enters the inner cavity of the gas transmission channel 15, the gas will simultaneously enter the inner cavity of the limiter body 141. After the air pressure in the inner cavity of the limiter body 141 increases, it will push the pressure block 142 to move to one side of the mask plate and realize the function of limiting the top of the mask plate, and cooperate with the inner rod 131 of the support column to push 132 and the mask plate to move toward the top, so as to realize the leveling and positioning of the mask plate.

[0025] The above description is merely illustrative of certain exemplary embodiments of the present invention. It goes without saying that those skilled in the art will be able to modify the described embodiments in various ways without departing from the spirit and scope of the present invention. Therefore, the above drawings and description are illustrative in nature and should not be construed as limiting the scope of protection of the claims.

Claims

1. A mask exposure platform for avoiding exposure offset, characterized in that: It comprises an exposure platform main frame (1) and a drive assembly (2), wherein the exposure platform main frame (1) is located on top of the drive assembly (2); The power output end of the exposure platform main frame (1) is rotatably connected to a power transmission shaft (11), the outer side of the power transmission shaft (11) is provided with a mask plate carrier (12), two placement slots are provided on the mask plate carrier (12), a plurality of adjustment components (13) are provided in the placement slots, a plurality of limit components (14) are provided at the top of the mask plate carrier (12), and a horizontal laser detector (16) is provided on one side of the mask plate carrier (12); An air pump device (21) is provided on one side of the driving component (2), and a power output end of the air pump device (21) is rotatably connected to an air pipe shaft (22), and a contact head (23) is retractably provided at the bottom end of the air pipe shaft (22), and a plurality of hoses are connected to the tail end of the air pipe shaft (22), and the other ends of the plurality of hoses are connected to and provided on the mask plate carrier (12), and the air pipe shaft (22) is connected to the inner cavity of the adjacent adjustment component (13) through the hose, and the other side of the driving component (2) is installed on the inner wall of the exposure platform.

2. The mask exposure platform for avoiding exposure offset according to claim 1, characterized in that: The tail end of the power transmission shaft (11) is provided with a mounting plate, one end of the mounting plate is mounted on the power output shaft of the exposure platform main frame (1), the head end of the power transmission shaft (11) is provided with a transmission positioning head (111), and the outer side wall of the power transmission shaft (11) is provided with a plurality of first tooth grooves arranged in a ring shape; A load-bearing support ring (112) is provided on the outer side wall of the power transmission shaft (11), and a plurality of springs arranged in a ring array are provided on the top of the load-bearing support ring (112).

3. The mask exposure platform for avoiding exposure offset according to claim 1, wherein: An inner ring (121) is provided at the center of the mask plate carrier disk (12), the inner ring (121) is sleeved on the outside of the power transmission shaft (11), a second tooth groove is provided on the inner side wall of the inner ring (121) and meshes with the first tooth groove, and the bottom end of the inner ring (121) is connected to one end of a plurality of springs; The bottom of the mask plate carrier (12) is provided with a plurality of positioning protrusions (122), and the positioning protrusions (122) are arranged in a rectangular array on the top of the exposure port. The bottom of the mask plate carrier (12) is provided with a plurality of positioning grooves at positions matching the positioning protrusions (122), and the inner side walls of the positioning grooves and the top ends of the positioning protrusions (122) are both arranged in an inclined surface.

4. The mask exposure platform for avoiding exposure offset according to claim 1, wherein: The plurality of adjustment components (13) are arranged in a rectangular array with the center of the placement slot as the central axis. The adjustment component (13) comprises a support column body (130), an inner cavity of the support column body (130) is provided with an inner rod (131), a head end of the inner rod (131) is provided with a member (132) that contacts the mask plate, and a tail end of the inner rod (131) is provided with a sliding piston (133), and the sliding piston (133) is densely slidably connected to the inner cavity of the inner rod (131).

5. The mask exposure platform for avoiding exposure offset according to claim 4, characterized in that: A plurality of gas transmission channels (15) are provided on the mask plate carrier plate (12), one end of the gas transmission channel (15) is connected to the tail end of the support column body (130), and the other end of the gas transmission channel (15) is connected to an adjacent hose.

6. The mask exposure platform for avoiding exposure offset according to claim 5, characterized in that: The limiter assembly (14) includes a limiter body (141), the limiter body (141) is arranged at the top end of the mask plate carrier (12), one end of the limiter body (141) is telescopically connected to a pressure block (142), the bottom end of the pressure block (142) is arranged in an arc shape, and the other end of the limiter body (141) is provided with a gas connecting tube (143), and the gas connecting tube (143) is connected and inserted into the inner cavity of the adjacent gas transmission channel (15).

7. The mask exposure platform for avoiding exposure offset according to claim 1, characterized in that: The laser level detection end of the horizontal laser detector (16) faces one side of the placement slot.

Images