Cleaning device

Abstract

A cleaning device is applied to an auxiliary chamber of a single crystal furnace and comprises a supporting assembly, a cleaning structure, cleaning cloth and a first driving assembly, and the supporting assembly comprises a first supporting disc and a second supporting disc; the cleaning structure comprises a first cleaning assembly and a second cleaning assembly which are arranged on the front faces of the two supporting discs. Each assembly comprises a reel, a guide piece and a supporting part which is located on the disc body and close to the edge of the inner wall of the auxiliary chamber and faces the inner wall. One end of the cleaning cloth winds the first reel, the other end of the cleaning cloth winds the second reel, and the middle of the cleaning cloth sequentially passes through the first supporting part supporting surface, the first guide piece, the second guide piece and the second supporting part supporting surface and is tensioned between the two discs to form a cleaning path; the first driving assembly drives the two reels to rotate reversely, so that the cleaning cloth moves along the path to clean the inner wall. According to the invention, uneven manual force application can be avoided, the cleaning efficiency is improved, and the operation potential safety hazard is eliminated.

Description

Technical Field

[0001] The present application relates to the field of semiconductor technology, and more particularly to a cleaning device. Background Art

[0002] In single crystal growth equipment, the single crystal furnace sub-chamber is usually a small diameter (generally less than 0.5 meters) and large depth (greater than 2 meters) tubular structure set perpendicular to the ground, with a tungsten wire rope arranged at the center. After the single crystal rod is pulled, dust particles such as silicon oxide often adhere to the inner wall of the sub-chamber, and cleaning and wiping operations are required to ensure the cleanliness of the equipment. In related technologies, for the cleaning of such slender tubular sub-chambers, a tool with a dust-free cleaning cloth tied to one end of a long rod is generally used. The operator applies manpower to make the cleaning cloth move up and down along the axis of the sub-chamber to achieve wiping and cleaning of the inner wall surface.

[0003] However, the above solution has at least the following drawbacks: manual operation is time-consuming and labor-intensive and has poor cleaning effect. Summary of the Invention

[0004] According to one aspect of the present application, a cleaning device is provided for use in a sub-chamber of a single crystal furnace. The cleaning device comprises:

[0005] A support assembly comprising a first support plate and a second support plate;

[0006] Cleaning structures, including:

[0007] a first cleaning assembly provided on the front face of the first supporting plate and a second cleaning assembly provided on the front face of the second supporting plate; the first cleaning assembly comprising a first reel, a first guide and a first supporting portion, the first supporting portion being located at an edge of the first supporting plate close to the inner wall of the auxiliary chamber of the single crystal furnace and having a supporting surface facing the inner wall of the auxiliary chamber of the single crystal furnace; the second cleaning assembly comprising a second reel, a second guide and a second supporting portion, the second supporting portion being located at an edge of the second supporting plate close to the inner wall of the auxiliary chamber of the single crystal furnace and having a supporting surface facing the inner wall of the auxiliary chamber of the single crystal furnace;

[0008] a cleaning cloth, one end of which is wound around the first reel and the other end of which is wound around the second reel, and a middle portion of the cleaning cloth passes through the support surface of the first support portion, the first guide, the second guide, and the support surface of the second support portion in sequence, forming a cleaning path tensioned between the first support plate and the second support plate;

[0009] The first drive assembly is used to drive the first reel and the second reel to rotate in opposite directions so that the cleaning cloth is released from one of the reels and reeled up by the other reel. During this process, the cleaning cloth moves along the cleaning path and cleans the inner wall of the single crystal furnace sub-chamber by the area where the cleaning cloth passes through the support surface.

[0010] In some embodiments of the present application, the first support plate and the second support plate are connected by a connecting assembly, and the connecting assembly is configured to adjust the distance between the first support plate and the second support plate to adapt to single crystal furnace sub-chambers with different inner wall diameters.

[0011] In some embodiments of the present application, the engagement component includes:

[0012] A connecting groove is provided on the first supporting plate;

[0013] a connecting bar, one end of which is disposed on the second supporting plate and the other end of which is inserted into at least a portion of the connecting groove, the connecting bar being provided with a plurality of positioning holes spaced apart along its length;

[0014] The fixing member is configured to selectively penetrate the positioning holes at different positions to fix the connection strip to the connection groove, and the distance between the first support plate and the second support plate can be adjusted by adjusting the insertion depth of the connection strip in the connection groove.

[0015] In some embodiments of the present application, the first support portion and the second support portion both include:

[0016] The top support and the bottom support are both oriented to match the inner wall of the single crystal furnace auxiliary chamber;

[0017] A plurality of rotatable cylinders, both ends of which are rotatably connected to the top bracket and the bottom bracket, and the plurality of rotatable cylinders are spaced apart along the direction of the top bracket and the bottom bracket;

[0018] A mounting bracket connected to the top bracket and / or the bottom bracket, wherein a through hole is provided in the middle of the mounting bracket;

[0019] The first support plate and the second support plate are both provided with support columns, and the first support portion and the second support portion are sleeved on the corresponding support columns through the through holes.

[0020] In some embodiments of the present application, at least the rotatable cylinder in the first support portion and the second support portion is made of an elastic material, and the first support portion and the second support portion form interference contact with the inner wall of the single crystal furnace sub-chamber through elastic deformation of the elastic material.

[0021] In some embodiments of the present application, the plurality of rotatable cylinders form a rolling support array arranged along the edge of the support plate, the outer wall surface of the rolling support array constitutes the support surface of the support portion, and the support surface is an arc surface that matches the inner wall of the single crystal furnace sub-chamber.

[0022] In some embodiments of the present application, a rolling assembly is provided on the back surface of the first support plate and the back surface of the second support plate, and each rolling assembly includes at least one spiral roller group, and the spiral roller group can rotate along its own axis and form rolling contact with the inner wall of the single crystal furnace auxiliary chamber;

[0023] The cleaning device also includes a second drive assembly, which is configured to drive at least one of the spiral roller groups to rotate around the central axis of the support assembly, and to achieve the rise or fall of the support assembly along the axial direction of the single crystal furnace sub-chamber through the rolling cooperation between the spiral roller group and the inner wall of the single crystal furnace sub-chamber.

[0024] In some embodiments of the present application, the total length of the spiral grooves on the spiral roller assembly is not less than the circumference of the inner wall of the single crystal furnace sub-chamber.

[0025] In some embodiments of the present application, the rolling assembly further includes:

[0026] A mounting block, wherein a mounting groove extending radially along the support plate is provided on the back side of the support plate, the mounting block is slidably connected to the mounting groove, and the spiral roller assembly is rotatably arranged on the mounting block via a rotating shaft;

[0027] An elastic member is arranged in the mounting groove and abuts against the mounting block, and is configured to apply an elastic force radially outward along the mounting groove to the mounting block, so that the spiral roller group forms an elastic interference contact with the inner wall of the single crystal furnace auxiliary chamber under the action of the elastic force.

[0028] In some embodiments of the present application, the edges of the first support plate and the second support plate away from the inner wall of the single crystal furnace sub-chamber are respectively provided with a first half groove and a second half groove. When the first support plate and the second support plate are close to each other, the first half groove and the second half groove are spliced ​​together to form a through groove for the seed crystal rope to pass through; the through groove extends from the center of the support component to the edge and has an opening to allow the seed crystal rope to enter and exit the through groove through the opening.

[0029] In some embodiments of the present application, when the seed rope is in the through groove, the cleaning cloth between the first guide member and the second guide member is tangent to the seed rope.

[0030] The cleaning device of the present application solves the defects of manual cleaning operations through the cooperation of a support component, a cleaning structure, a cleaning cloth and a first drive component: on the one hand, the first drive component is used to drive the first reel and the second reel to rotate in opposite directions, so that the cleaning cloth moves evenly along the tensioned cleaning path, and the cleaning cloth passes through the area of ​​the support surface to clean the inner wall of the single crystal furnace sub-chamber, avoiding the problem of inconsistent cleaning force caused by uneven manual force, improving operation efficiency, reducing labor intensity and ensuring cleaning effect; on the other hand, the device can automatically complete the cleaning operation, and the operator does not need to be in the high-risk area below the sub-chamber, eliminating the safety hazard of accidental falling of heavy objects and solving the problem of production safety hazards. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] The above and other purposes, features, and advantages of the present application will become more apparent through a more detailed description of the embodiments of the present application in conjunction with the accompanying drawings. The accompanying drawings are intended to provide a further understanding of the embodiments of the present application and constitute a part of the specification. Together with the embodiments of the present application, they are used to explain the present application and do not constitute a limitation of the present application. In the drawings, the same reference numerals generally represent the same components or steps.

[0032] Figure 1 A three-dimensional schematic diagram of a cleaning device according to an embodiment of the present application is shown.

[0033] Figure 2 A partial exploded schematic diagram of a cleaning device according to one embodiment of the present application is shown.

[0034] Figure 3 An exploded schematic diagram of a cleaning device according to an embodiment of the present application is shown.

[0035] Figure 4 A schematic structural diagram of a support portion according to an embodiment of the present application is shown.

[0036] Figure 5 A schematic diagram showing a cleaning operation performed by a cleaning device according to an embodiment of the present application is shown.

[0037] Figure 6 A schematic diagram showing the cleaning cloth and the seed rope being tangent between the first guide and the second guide is shown. DETAILED DESCRIPTION

[0038] In the following description, a large number of specific details are provided to provide a more thorough understanding of the present application. However, it will be apparent to those skilled in the art that the present application can be implemented without one or more of these details. In other examples, some technical features well known in the art are not described in order to avoid confusion with the present application.

[0039] It should be understood that the present application can be implemented in various forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided to make the disclosure thorough and complete and to fully convey the scope of the present application to those skilled in the art. In the drawings, the dimensions and relative sizes of layers and regions may be exaggerated for clarity. Like reference numerals throughout represent like elements.

[0040] The auxiliary chamber of a single crystal furnace is a small-diameter, deep component. In related technologies, a tool commonly used is one with a dust-free cleaning cloth attached to one end of a long rod. The operator applies manual force to reciprocate the cleaning cloth up and down along the axis of the auxiliary chamber, wiping and cleaning the inner wall.

[0041] Manual cleaning operations have at least the following defects: on the one hand, since manual force is difficult to control evenly, the cleaning force on the inner wall of the furnace is inconsistent, which not only leads to low operation efficiency and high labor intensity, but also makes it difficult to ensure the cleaning effect; on the other hand, operators need to be in the high-risk area below the auxiliary chamber and face the safety risk of accidental falling of heavy objects, which poses a major production safety hazard.

[0042] In order to solve one or more of the above problems, the present application provides a cleaning device for use in a single crystal furnace sub-chamber, the cleaning device comprising:

[0043] A support assembly comprising a first support plate and a second support plate;

[0044] Cleaning structures, including:

[0045] a first cleaning assembly provided on the front face of the first supporting plate and a second cleaning assembly provided on the front face of the second supporting plate; the first cleaning assembly comprising a first reel, a first guide and a first supporting portion, the first supporting portion being located at an edge of the first supporting plate close to the inner wall of the auxiliary chamber of the single crystal furnace and having a supporting surface facing the inner wall of the auxiliary chamber of the single crystal furnace; the second cleaning assembly comprising a second reel, a second guide and a second supporting portion, the second supporting portion being located at an edge of the second supporting plate close to the inner wall of the auxiliary chamber of the single crystal furnace and having a supporting surface facing the inner wall of the auxiliary chamber of the single crystal furnace;

[0046] a cleaning cloth, one end of which is wound around the first reel and the other end of which is wound around the second reel, and a middle portion of the cleaning cloth passes through the support surface of the first support portion, the first guide, the second guide, and the support surface of the second support portion in sequence, forming a cleaning path tensioned between the first support plate and the second support plate;

[0047] The first drive assembly is used to drive the first reel and the second reel to rotate in opposite directions so that the cleaning cloth is released from one of the reels and reeled up by the other reel. During this process, the cleaning cloth moves along the cleaning path and cleans the inner wall of the single crystal furnace sub-chamber by the area where the cleaning cloth passes through the support surface.

[0048] According to the cleaning device of the present application, the defects of manual cleaning operations are solved through the cooperation of the support component, the cleaning structure, the cleaning cloth and the first drive component: on the one hand, the first drive component is used to drive the first reel and the second reel to rotate in opposite directions, so that the cleaning cloth moves evenly along the tensioned cleaning path, and the cleaning cloth passes through the area of ​​the support surface to clean the inner wall of the single crystal furnace sub-chamber, avoiding the problem of inconsistent cleaning force caused by uneven manual force, improving work efficiency, reducing labor intensity and ensuring cleaning effect; on the other hand, the device can automatically complete the cleaning operation, and the operator does not need to be in the high-risk area below the sub-chamber, eliminating the safety hazard of accidental falling of heavy objects and solving the problem of production safety hazards.

[0049] In order to thoroughly understand the present application, detailed steps and structures will be provided in the following description to illustrate the technical solution proposed by the present application. The preferred embodiments of the present application are described in detail below. However, in addition to these detailed descriptions, the present application may also have other implementation methods.

[0050] Reference below Figures 1 to 6 The cleaning device according to one embodiment of the present application is described. The cleaning device is applied to the auxiliary chamber 200 of the single crystal furnace. Figures 1 to 4 As shown, the cleaning device includes:

[0051] A support assembly comprising a first support plate 111 and a second support plate 112;

[0052] Cleaning structures, including:

[0053] A first cleaning assembly is provided on the first supporting plate 111, and a second cleaning assembly is provided on the second supporting plate 112; the first cleaning assembly includes a first reel 1211, a first guide 1212, and a first support portion 1213, the first support portion 1213 is located at the edge of the first supporting plate 111 close to the inner wall of the auxiliary chamber of the single crystal furnace and has a support surface facing the inner wall of the auxiliary chamber of the single crystal furnace; the second cleaning assembly includes a second reel 1221, a second guide 1222, and a second support portion 1223, the second support portion 1223 is located at the edge of the second supporting plate 112 close to the inner wall of the auxiliary chamber of the single crystal furnace and has a support surface facing the inner wall of the auxiliary chamber of the single crystal furnace;

[0054] A cleaning cloth 130 is wound around the first reel 1211 at one end and around the second reel 1221 at the other end. The middle portion of the cleaning cloth 130 passes through the support surface of the first support portion 1213, the first guide 1212, the second guide 1222, and the support surface of the second support portion 1223 in sequence, forming a cleaning path that is tensioned between the first support plate 111 and the second support plate 112.

[0055] The first driving assembly is used to drive the first reel 1211 and the second reel 1221 to rotate in opposite directions so that the cleaning cloth 130 is released from one of the reels and reeled up by the other reel. During the process, the cleaning cloth 130 moves along the cleaning path and cleans the inner wall of the single crystal furnace sub-chamber through the area where the cleaning cloth 130 passes through the support surface.

[0056] When the cleaning device of this embodiment is in use, the cleaning device is first installed in place in the single crystal furnace sub-chamber 200, and the cleaning cloth 130 is made to form a fitting contact with the inner wall of the single crystal furnace sub-chamber through the supporting surfaces of the first supporting part 1213 and the second supporting part 1223 respectively through the supporting parts of the first supporting plate 111 and the second supporting plate 112; then the first driving component controls the first reel 1211 and the second reel 1221 to rotate in opposite directions, and the cleaning cloth 130 is released from one of the reels and wound up by the other reel in a cyclic motion, thereby realizing automatic wiping and cleaning of the inner wall of the single crystal furnace sub-chamber. This process does not require manual force, which significantly reduces the labor intensity of the operator.

[0057] Furthermore, the cleaning cloth 130 forms a cleaning path stretched between the two support plates via the first support portion 1213, the first guide 1212, the second guide 1222, and the second support portion 1223. This structural design precisely guides the movement of the cleaning cloth 130 through the guides, thereby preventing the cloth 130 from shifting or loosening due to uneven force during manual operation. This ensures that the cleaning cloth 130 adheres to the inner wall of the single crystal furnace sub-chamber with relatively constant contact pressure, effectively improving the efficiency and uniformity of the cleaning operation.

[0058] Moreover, the first drive component drives the cleaning cloth 130 to reel up, thereby realizing fully automated cleaning of the inner wall of the single crystal furnace sub-chamber. The operator does not need to stand in the high-risk area below the sub-chamber, thereby fundamentally avoiding the safety risks caused by the falling of the tungsten wire rope or equipment components.

[0059] It is worth noting that in the cleaning path arrangement of the support assembly, the support surface of the first support portion 1213 is configured so that the front of the cleaning cloth 130 faces the inner wall of the single crystal furnace auxiliary chamber, while the support surface of the second support portion 1223 is configured so that the back of the cleaning cloth 130 faces the inner wall. The two are formed by the cleaning cloth 130 crossing and circling between the first guide component and the second guide component, forming a spatial curved surface structure similar to a Möbius strip. This arrangement ensures that as the cleaning cloth 130 circulates along the cleaning path, its front and back sides sequentially contact the inner wall of the auxiliary chamber, achieving a double-sided alternating cleaning function, fully utilizing the effective wiping area of ​​the cleaning cloth 130, and significantly improving material utilization compared to the traditional single-sided cleaning mode.

[0060] According to actual cleaning needs, the directions of the cleaning cloth 130 of the first support part 1213 and the second support part 1223 can also be set to opposite directions, that is, the support surface of the first support part 1213 uses the back of the cleaning cloth 130 to contact the inner wall surface, and the support surface of the second support part 1223 uses the front surface to contact. Both arrangements can achieve double-sided cleaning effects through the circular movement of the cleaning cloth 130. Therefore, this solution does not make specific restrictions on the direction combination of the support surface and the cleaning cloth 130. It is only necessary to satisfy that when the cleaning cloth 130 is tensioned along the cleaning path, a wiping structure that can be used alternately on the front and back sides is formed.

[0061] In some embodiments, the first drive assembly includes multiple independently controlled sub-drive assemblies (e.g., motors or other power devices, the specific type of which is not limited), each of which establishes a transmission connection with the first reel 1211 and the second reel 1221. The sub-drive assemblies can be installed in two ways: one is a built-in structure, in which a hollow shaft motor is integrated into the reel to directly drive the reel rotation; the other is an external structure, connected to the reel via a coupling, synchronous pulley, or other transmission components. By controlling the steering signal of the sub-drive assembly, the first reel 1211 and the second reel 1221 can achieve synchronous rotation in opposite directions.

[0062] Alternatively, the first and second reels 1211 and 1221 can be driven by the same power source. In this case, the first drive assembly is configured as a compound drive device with a differential gear set (e.g., a motor with an integrated gearbox). By leveraging the speed resolution characteristics of the gear train, the forward rotation of a single motor is converted into reverse rotational outputs for the two reels. This solution achieves synchronous control of reverse rotation through a mechanical transmission mechanism, eliminating the need for independent control signals.

[0063] It should be noted that when the cleaning cloth 130 is released from one of the reels and reeled up by the other reel, the thickness of the cleaning cloth 130 wound on the first reel 1211 and the second reel 1221 changes in real time, causing the winding radius of the two reels to change dynamically. In order to ensure that the linear speed of the cleaning cloth 130 between the two reels is constant to maintain its tension stability, whether a plurality of independently controlled sub-drive components are used to drive the first reel 1211 and the second reel 1221 to rotate synchronously in opposite directions, or the two reels are driven synchronously in opposite directions by the same power source, the rotation speed of the two reels must be dynamically adjusted according to the change in the winding radius (that is, the rotation speed of the two reels is usually different). Specifically, when the winding radius of the reel increases due to the increase in the winding thickness of the cleaning cloth 130, the rotation speed of the reel decreases accordingly; conversely, when the winding radius of the reel decreases due to the release of the cleaning cloth 130, its rotation speed increases accordingly. Based on the kinematic formula v=ω·r (where v is the linear velocity, ω is the rotational speed, and r is the winding radius of the reel), by matching the rotational speed and radius of the two reels in real time, the linear velocity of the cleaning cloth 130 on the two reels can be ensured to remain consistent.

[0064] Both drive architectures described above utilize a rational power transmission design to ensure that the cleaning cloth 130 maintains stable tension during the winding and unwinding process. The specific drive component type (e.g., motor type), mounting method (internal or external), and transmission mechanism design (gears, belts, etc.) can be adaptively adjusted based on the spatial dimensions of the single crystal furnace sub-chamber 200, the load characteristics of the cleaning cloth 130, and the required control accuracy, and are all considered to fall within the scope of protection of this application.

[0065] In some embodiments, the first support plate 111 and the second support plate 112 are connected by a connecting assembly, and the connecting assembly is configured to adjust the distance between the first support plate 111 and the second support plate 112 to adapt to the single crystal furnace auxiliary chamber 200 with different inner wall diameters. Figure 2 and Figure 3 As shown, the connecting component includes a connecting groove 141, which is arranged on the first support plate 111; a connecting bar 142, one end of which is arranged on the second support plate 112 and the other end is inserted into at least a portion of the connecting groove 141, and the connecting bar 142 is provided with a plurality of positioning holes 1421 at intervals along its length direction; a fixing member is configured to selectively penetrate the positioning holes 1421 at different positions to fix the connecting bar 142 to the connecting groove 141. By adjusting the insertion depth of the connecting bar 142 in the connecting groove 141, the distance between the first support plate 111 and the second support plate 112 can be adjusted.

[0066] During the actual assembly process, the two support plates are first moved relative to each other along the length direction of the connecting bar 142 by adjusting the insertion depth of the connecting bar 142 in the connecting groove 141 according to the diameter of the inner wall of the single crystal furnace sub-chamber 200, until the support surfaces of the first support portion 1213 and the second support portion 1223 both abut against the inner wall of the single crystal furnace sub-chamber. The fixing parts are then inserted into the corresponding positioning holes 1421 to lock the spacing, so that the connecting bar 142 is fixedly connected to the connecting groove 141, completing the locking of the spacing between the two support plates. This adjustment process achieves adaptive adjustment of the cleaning device through the coordination of the insertion depth of the connecting bar 142 in the connecting groove 141, combined with the selective locking of the positioning holes 1421 by the fixing parts, so that the cleaning device can accurately match single crystal furnace sub-chambers 200 of different diameters, effectively solving the adaptability problem of traditional cleaning tools caused by the size differences of single crystal furnace sub-chambers 200, and significantly broadening the engineering application range of the cleaning device.

[0067] It is worth noting that the first connecting groove 141 can be provided only on the first support plate 111, with one end of the connecting bar 142 fixedly provided on the second support plate 112 and the other end inserted into at least a portion of the first connecting groove 141. The distance between the first support plate 111 and the second support plate 112 can be adjusted by changing the insertion depth of the connecting bar 142 in the first connecting groove 141. Alternatively, while the first connecting groove 141 can be provided on the first support plate 111, the second connecting groove 141 can also be provided on the second support plate 112. The connecting bar 142 can have one end inserted into at least a portion of the first connecting groove 141 and the other end inserted into at least a portion of the second connecting groove 141. The distance between the first support plate 111 and the second support plate 112 can be adjusted by changing the insertion depth of the connecting bar 142 in the first connecting groove 141 or the insertion depth of the connecting bar 142 in the second connecting groove 141.

[0068] In addition, the connecting assembly may also adopt other adjustable structures, and its specific structure is not limited. For example, a threaded telescopic rod structure may be adopted, with the ends of the telescopic rod respectively connected to the first and second support plates 112. By rotating the telescopic rod, its effective length can be changed to adapt to single crystal furnace auxiliary chambers 200 with different inner wall diameters.

[0069] The connecting groove 141 can be implemented as a “T”-shaped groove or any other suitable shape, which is not limited.

[0070] The fixing member can be implemented as a fixing screw, etc., which is not limited.

[0071] It should be noted that the adjusted distance between the first support plate 111 and the second support plate 112 is slightly smaller than the inner wall diameter of the single crystal furnace auxiliary chamber 200 to be cleaned. For example, the difference between the two is within 5 mm.

[0072] In some embodiments, as Figure 4 As shown, the first support portion 1213 and the second support portion 1223 each include:

[0073] The top support 1202 and the bottom support 1203 are both oriented to match the inner wall of the single crystal furnace sub-chamber;

[0074] Multiple rotatable cylinders 1204, whose ends are rotatably connected to the top bracket 1202 and the bottom bracket 1203 respectively, and the multiple rotatable cylinders 1204 are spaced apart along the direction of the top bracket 1202 and the bottom bracket 1203;

[0075] A mounting bracket 1205 is connected to the top bracket 1202 and / or the bottom bracket 1203, and a through hole is provided in the middle of the mounting bracket 1205;

[0076] Support columns 1201 are provided on the first support plate 111 and the second support plate 112 , and the first support portion 1213 and the second support portion 1223 are sleeved on the corresponding support columns 1201 through through holes.

[0077] Specifically, the support column 1201 is vertically arranged on the front of the support plate. The top bracket 1202 and the bottom bracket 1203 are both designed as arc-shaped structures that match the curvature of the inner wall of the single crystal furnace sub-chamber, and are arranged in parallel and symmetrical manner from top to bottom. A plurality of rotatable cylinders 1204 are connected to the top bracket 1202 and the bottom bracket 1203 by rotation, and are evenly spaced along the circumference of the arc-shaped bracket to form a rolling support array arranged along the edge of the support plate. The outer wall surface of the array constitutes the support surface of the support part, and its contour surface is adapted to the curvature of the inner wall of the single crystal furnace sub-chamber. The mounting bracket 1205 can be designed with a butterfly structure. The ends of the two butterfly-shaped wing plates are fixedly connected to the top bracket 1202 and the bottom bracket 1203. A positioning through-hole adapted to the outer diameter of the support column 1201 is opened in the middle of the butterfly abdomen. The entire support part is fitted onto the support column 1201 through the through-hole, realizing limited rotational freedom of the support part around the axis of the column.

[0078] During the cleaning process, cleaning cloth 130 is tensioned along the cleaning path, maintaining constant tension. Its outer surface forms a sliding, wiping engagement with the inner wall of the single crystal furnace's auxiliary chamber, while its inner surface engages in rolling contact with the outer circumference of rotatable cylinder 1204. As cleaning cloth 130 moves along the cleaning path, rotatable cylinder 1204, driven by friction, rotates synchronously around its own axis, converting traditional sliding friction into rolling friction. This effectively reduces the sliding friction between the support and cleaning cloth 130 and provides a guiding constraint on the movement trajectory of cleaning cloth 130. The curved surface adaptability of the rolling support array and the rolling friction characteristics of rotatable cylinder 1204 ensure the precise fit of cleaning cloth 130 against the curved surface of the single crystal furnace's auxiliary chamber wall while significantly reducing the movement resistance of cleaning cloth 130. This ensures that the trajectory of cleaning cloth 130 remains stable during its reciprocating motion, effectively improving the uniformity and reliability of the cleaning operation.

[0079] In addition, the support part is mounted on the support column 1201 through the through hole in the middle of the mounting bracket 1205, so that the support part can be quickly matched and replaced.

[0080] In some embodiments, at least the rotatable cylinder 1204 in the first support portion 1213 and the second support portion 1223 is made of elastic material, and the first support portion 1213 and the second support portion 1223 form interference contact with the inner wall of the single crystal furnace auxiliary chamber through elastic deformation of the elastic material.

[0081] Exemplarily, the first support portion 1213 and the second support portion 1223 are both made of elastic material, and the elastic modulus of the elastic material is configured so that the outer diameter of the support portion in a natural state is larger than the inner diameter of the single crystal furnace sub-chamber 200. When the support assembly is installed in the single crystal furnace sub-chamber 200, the first support portion 1213 and the second support portion 1223 form interference contact with the inner wall of the sub-chamber through elastic deformation to ensure that a relatively constant contact pressure is maintained between the cleaning cloth 130 and the inner wall of the single crystal furnace sub-chamber.

[0082] The elastic material may be elastic metal, elastic plastic, etc., which is not limited.

[0083] In some embodiments, as Figures 1 to 3 As shown, the first support plate 111 and the second support plate 112 are respectively provided with a first half groove 151 and a second half groove 152 at the edge away from the inner wall of the single crystal furnace sub-chamber. When the first support plate 111 and the second support plate 112 are close to each other, the first half groove 151 and the second half groove 152 are spliced ​​together to form a through groove 150; the through groove 150 extends from the center of the support component to the edge and has an opening to allow the seed rope 300 to enter and exit the through groove 150 through the opening.

[0084] When the cleaning device is in use, even if the two support plates are tightly connected due to the smaller diameter of the inner wall of the single crystal furnace sub-chamber 200, the open slot 150 still maintains an independent passage path for the seed rope 300. The seed rope 300 can be inserted into the slot 150 along the opening without removing or separating the support plates. This allows the seed rope 300 to pass through the support assembly without interfering with the cleaning process of the single crystal furnace sub-chamber inner wall. When the cleaning process is complete and the cleaning device needs to be removed, there is no need to adjust the spacing between the support plates; the seed rope 300 can simply exit the slot 150 along the opening, ensuring quick separation of the cleaning device and the seed rope 300. This design ensures that the cleaning cloth 130 can continuously wipe the single crystal furnace sub-chamber inner wall while maintaining tension, while allowing the seed rope 300 to pass through the support assembly unimpeded during installation and removal. This avoids the interference caused by traditional cleaning tools during seed rope 300 installation, ensures compatibility between the cleaning device and the existing single crystal furnace seeding system, and significantly improves the consistency and ease of operation of the equipment.

[0085] In addition, in the prior art, the manual tool with a dust-free cleaning cloth bound to the end of a long rod can only achieve contact cleaning of the inner wall of the auxiliary chamber, but cannot effectively clean the surface of the seed rope 300, which has the technical defect of a single cleaning object.

[0086] The cleaning device proposed in this application breaks through the above technical bottleneck through the innovative guide structure design: when the seed rope 300 is in the through groove 150, the cleaning cloth 130 between the first guide 1212 and the second guide 1222 is tangent to the seed rope 300. For example, Figure 6 As shown, after the seed rope 300 enters the through slot 150, the guide assembly, consisting of the first guide member 1212 and the second guide member 1222, constrains the middle section of the cleaning cloth 130 to a geometric shape tangent to the outer contour of the seed rope 300. Guided by the two guide members, as the cleaning cloth 130 moves along the cleaning path, its tangential contact area with the seed rope 300 forms a dynamic friction interface, thereby continuously wiping away any deposits on the surface of the seed rope 300.

[0087] In one specific embodiment, the diameter of the seed rope 300 is 5mm to 6mm, and the cleaning cloth 130, located in the middle section between the two guides, is 2mm to 3mm away from the central axis of the cleaning device. These parameters ensure that the surface of the cleaning cloth 130 is tangent to the outer circumference of the seed rope 300, forming a stable tangential contact cleaning area. This allows the seed rope 300 to be cleaned simultaneously with the inner wall of the single crystal furnace sub-chamber.

[0088] In some embodiments, as Figure 2 and Figure 3As shown, the back side of the first support plate 111 and the back side of the second support plate 112 are both provided with rolling assemblies, and each rolling assembly includes at least one spiral roller group 161, which can rotate along its own axis and form a rolling contact with the inner wall of the single crystal furnace sub-chamber; the cleaning device also includes a second drive assembly, which is configured to drive at least one spiral roller group 161 to rotate around the central axis of the support assembly, and realize the rise or fall of the support assembly along the axial direction of the single crystal furnace sub-chamber 200 through the rolling cooperation between the spiral roller group 161 and the inner wall of the single crystal furnace sub-chamber.

[0089] The second drive assembly may include one or more independently controlled sub-drive assemblies (e.g., motors or other power devices, the specific type of which is not limited), each of which establishes a transmission connection with a spiral roller assembly 161. The sub-drive assemblies can be installed in two ways: one is a built-in structure, that is, a hollow shaft motor integrated into the spiral roller assembly 161 directly drives the scroll to rotate; the other is an external structure, connected to the spiral roller assembly 161 through transmission components such as couplings and synchronous pulleys.

[0090] As an alternative, when the second drive component drives multiple spiral roller groups 161 to move, the first drive component can also be configured as a compound drive device including a differential gear group (such as a motor with an integrated gearbox). This solution achieves synchronous control of multiple spiral roller groups 161 through a mechanical transmission mechanism without the need for independent control signals.

[0091] Both of these drive architectures utilize a rational power transmission design to ensure that the spiral roller assembly 161 rolls along the interior of the single crystal furnace auxiliary chamber 200 and ascends or descends axially. The specific drive component type (e.g., motor type), mounting method (internal or external), and transmission mechanism design (gears, belts, etc.) can be adaptively adjusted based on the spatial dimensions of the single crystal furnace auxiliary chamber 200, the size of the cleaning cloth 130, and the required control accuracy, and are all considered to fall within the scope of protection of this application.

[0092] When the cleaning device is operating, the second drive assembly activates, driving the spiral roller assembly 161 in circular motion around the central axis of the support assembly. Because the spiral grooves on the outer circumference of the spiral roller assembly 161 are in rolling contact with the inner wall of the single crystal furnace auxiliary chamber, this circular motion is broken down into tangential and axial forces at the contact point. The tangential force drives the cleaning device to rotate along its own axis, while the axial force propels the cleaning device as a whole upward or downward along the axis of the single crystal furnace auxiliary chamber 200. The specific direction of motion depends on the actual situation.

[0093] By precisely controlling the speed of the drive motor, the axial movement speed of the support assembly can be matched to the retraction and extension speed of the cleaning cloth 130, ensuring that the cleaning cloth 130 maintains a relatively constant tension during the wiping process. Furthermore, the rolling contact mechanism of the spiral roller assembly 161 significantly reduces motion resistance, minimizing wear on the inner wall of the single crystal furnace auxiliary chamber 200 and ensuring smooth and efficient movement of the cleaning device within the auxiliary chamber.

[0094] In some embodiments, the spiral groove of the spiral roller group 161 is configured as follows: the total length of the spiral groove is not less than the circumference of the inner wall of the single crystal furnace sub-chamber, so that when the support assembly rotates one circle around the central axis, the axial displacement achieved by the rolling cooperation between the spiral roller group 161 and the inner wall of the single crystal furnace sub-chamber does not exceed the axial height of the spiral roller group 161, so as to ensure that the cleaning cloth 130 forms a continuous covering cleaning path for the inner wall of the single crystal furnace sub-chamber during a single circular motion.

[0095] As a preferred option, the height of the spiral roller assembly 161 is greater than or equal to the height of the cleaning cloth 130 .

[0096] In some embodiments, as Figure 2 and Figure 3 As shown, the scrolling component also includes:

[0097] The mounting block 162 has a mounting groove 163 extending radially along the back of the support plate. The mounting block 162 is slidably connected to the mounting groove 163. The spiral roller assembly 161 is rotatably mounted on the mounting block 162 via a rotating shaft.

[0098] The elastic member is arranged in the mounting groove 163 and abuts against the mounting block 162, and is configured to apply an elastic force radially outward along the mounting groove 163 to the mounting block 162, so that the spiral roller assembly 161 forms an elastic interference contact with the inner wall of the single crystal furnace sub-chamber under the action of the elastic force.

[0099] Illustratively, each spiral roller assembly 161 is radially floatingly mounted via a separate mounting block 162. Mounting block 162 forms a sliding guide with a radial mounting slot 163 defined on the back of the support plate. Spiral roller assembly 161 is rotatably mounted on mounting block 162 via a rotating shaft. An elastic member is positioned within mounting slot 163 and abuts against mounting block 162, forming a preload mechanism.

[0100] In the initial compression state of the elastic member, the elastic preload forces the mounting block 162 radially outward along the mounting groove 163, causing the outer surface of the spiral roller assembly 161 to form an elastic interference contact with the inner wall of the single crystal furnace auxiliary chamber. This interference contact adapts to the diameter tolerance and local deformation of the auxiliary chamber wall, ensuring the stability of the rolling contact. By adjusting the compression of the elastic member or selecting an elastic member with different elastic coefficients, the normal contact force between the spiral roller assembly 161 and the inner wall can be precisely controlled, thereby adjusting the friction between the contact surfaces.

[0101] Among them, the mounting block 162 can be an I-shaped mounting block 162, and correspondingly, the back of the support plate is provided with an I-shaped mounting groove 163 extending along its own radial direction, or the mounting block 162 and the mounting groove 163 can also be other structural shapes, which is not limited to this.

[0102] The elastic member may be a compression spring or an elastic rubber body, etc., which is not limited.

[0103] In some embodiments, the cleaning device is further integrated with a power supply 170, and the cleaning device is powered by the power supply 170, and / or the cleaning device obtains power from an external power supply 170 via a plug. Figure 3 As shown, a power supply 170 is integrated on the back of the second support plate 112 .

[0104] In some embodiments, the cleaning device may further include an integrated remote control unit 180. The remote control unit 180 establishes a data connection with the first drive assembly and the second drive assembly via industrial Ethernet or a wireless communication protocol, enabling an operator to remotely configure and monitor the operating parameters of the cleaning device (such as the reel speed and the speed of the spiral roller assembly 161) in real time from a control room or a safe area.

[0105] This remote control architecture eliminates the need for operators to remain in the high-risk operating area below the auxiliary chamber. Instead, they can issue cleaning instructions and receive feedback on the device's status through a human-machine interface, achieving fully automated control of the cleaning process. This design fundamentally eliminates the safety risks associated with traditional manual operations, such as the accidental drop of heavy objects, and further improves the safety and reliability of cleaning operations within the single crystal furnace's auxiliary chamber 200.

[0106] Combine Figures 1 to 5Taking the cleaning device for a single crystal furnace auxiliary chamber 200 with an inner diameter of 500mm as an example, the total height of the cleaning device is designed to be 215mm. The height of the spiral roller assembly 161 and the cleaning cloth 130 are both 100mm, and the thickness of the first and second support plates 111 and 112 are both 15mm. The diameter of the spiral roller assembly 161 is 50mm, and the pitch of the spiral groove on its surface is 10mm. When the spiral roller assembly 161 rotates around the inner wall of the auxiliary chamber, the device rises or falls synchronously by approximately 100mm. The radius of the support plate is 240mm, and the seed crystal rope channel 150 formed by the two plates is 5mm wide, meeting the equipment's threading requirements.

[0107] During installation, the initial spacing between the first and second support plates 111, 112 is adjusted to 15mm using the connecting assembly, and a fixed connection is achieved by penetrating positioning holes 1421 with fixings. The outer side of the spiral roller assembly 161 extends 4mm beyond the support plates. A compression spring embedded in the I-shaped mounting groove 163 produces approximately 3mm of elastic deformation after the cleaning cloth 130 is installed, creating a preload. According to mechanical calculations, the preload provided by the compression spring ensures that the friction between the spiral roller assembly 161 and the inner wall of the auxiliary chamber reaches at least 1.5 times the weight of the device, ensuring that the device's displacement within the auxiliary chamber drum is entirely driven by the spiral rollers, eliminating the risk of gravity slippage.

[0108] The clockwise or counterclockwise rotation of the roller group corresponds to the device rising or falling mode. Figure 1 Rotate in the direction of the arrow to ensure the consistency of the cleaning track and the uniformity of the cleaning effect.

[0109] As an example, the cleaning device rotates once every 5 seconds and advances 100 mm per rotation. Assuming the height of the sub-chamber is 3000 mm, it takes about 5 minutes to clean the sub-chamber 200 of the single crystal furnace by ascending and descending twice.

[0110] Based on the above description, the cleaning device according to the embodiment of the present application solves the defects of manual cleaning operations through the cooperation of the support component, the cleaning structure, the cleaning cloth and the first drive component: on the one hand, the first drive component is used to drive the first reel and the second reel to rotate in opposite directions, so that the cleaning cloth moves evenly along the tensioned cleaning path, and the cleaning cloth passes through the area of ​​the support surface to clean the inner wall of the single crystal furnace sub-chamber, avoiding the problem of inconsistent cleaning force caused by uneven manual force, improving work efficiency, reducing labor intensity and ensuring cleaning effect; on the other hand, the device can automatically complete the cleaning operation, and the operator does not need to be in the high-risk area below the sub-chamber, eliminating the safety hazard of accidental falling of heavy objects, and solving the problem of production safety hazards.

[0111] Although example embodiments have been described herein with reference to the accompanying drawings, it should be understood that the above example embodiments are merely illustrative and are not intended to limit the scope of the present application. Various changes and modifications may be made therein by those skilled in the art without departing from the scope and spirit of the present application. All such changes and modifications are intended to be included within the scope of the present application as required by the appended claims.

[0112] Similarly, it should be understood that in order to streamline the present application and aid in understanding one or more of the various application aspects, in the description of the exemplary embodiments of the present application, the various features of the present application are sometimes grouped together into a single embodiment, figure, or description thereof. However, this approach of the present application should not be interpreted as reflecting the intention that the claimed application requires more features than those explicitly recited in each claim. More precisely, as reflected in the corresponding claims, the point of the application is that the corresponding technical problem can be solved with fewer features than all the features of a single disclosed embodiment. Therefore, the claims following the detailed description are hereby expressly incorporated into the detailed description, with each claim itself serving as a separate embodiment of the present application.

[0113] Furthermore, those skilled in the art will appreciate that although some embodiments described herein include certain features included in other embodiments but not other features, combinations of features from different embodiments are intended to be within the scope of this application and to form different embodiments. For example, in the claims, any of the claimed embodiments may be used in any combination.

[0114] It should be noted that the above embodiments are illustrative rather than limiting of the present application, and that those skilled in the art may devise alternative embodiments without departing from the scope of the appended claims. In the claims, any reference signs placed between parentheses should not be construed as limiting the claims. The use of the words first, second, and third, etc., does not denote any order. These words may be interpreted as designations.

Claims

1. A cleaning device, applied to the auxiliary chamber of a single crystal furnace, characterized in that: The cleaning device comprises: A support assembly comprising a first support plate and a second support plate; Cleaning structures, including: a first cleaning assembly provided on the front face of the first supporting plate and a second cleaning assembly provided on the front face of the second supporting plate; the first cleaning assembly comprising a first reel, a first guide and a first supporting portion, the first supporting portion being located at an edge of the first supporting plate close to the inner wall of the auxiliary chamber of the single crystal furnace and having a supporting surface facing the inner wall of the auxiliary chamber of the single crystal furnace; the second cleaning assembly comprising a second reel, a second guide and a second supporting portion, the second supporting portion being located at an edge of the second supporting plate close to the inner wall of the auxiliary chamber of the single crystal furnace and having a supporting surface facing the inner wall of the auxiliary chamber of the single crystal furnace; a cleaning cloth, one end of which is wound around the first reel and the other end of which is wound around the second reel, and a middle portion of the cleaning cloth passes through the support surface of the first support portion, the first guide, the second guide, and the support surface of the second support portion in sequence, forming a cleaning path tensioned between the first support plate and the second support plate; The first drive assembly is used to drive the first reel and the second reel to rotate in opposite directions so that the cleaning cloth is released from one of the reels and reeled up by the other reel. During this process, the cleaning cloth moves along the cleaning path and cleans the inner wall of the single crystal furnace sub-chamber by the area where the cleaning cloth passes through the support surface.

2. The cleaning device according to claim 1, wherein The first support plate and the second support plate are connected via a connecting assembly, and the connecting assembly is configured to adjust the distance between the first support plate and the second support plate to adapt to single crystal furnace sub-chambers with different inner wall diameters.

3. The cleaning device according to claim 2, wherein: The connection components include: A connecting groove is provided on the first supporting plate; a connecting bar, one end of which is disposed on the second supporting plate and the other end of which is inserted into at least a portion of the connecting groove, the connecting bar being provided with a plurality of positioning holes spaced apart along its length; The fixing member is configured to selectively penetrate the positioning holes at different positions to fix the connection strip to the connection groove, and the distance between the first support plate and the second support plate can be adjusted by adjusting the insertion depth of the connection strip in the connection groove.

4. The cleaning device according to claim 1, wherein The first supporting portion and the second supporting portion both include: The top support and the bottom support are both oriented to match the inner wall of the single crystal furnace auxiliary chamber; A plurality of rotatable cylinders, both ends of which are rotatably connected to the top bracket and the bottom bracket, and the plurality of rotatable cylinders are spaced apart along the direction of the top bracket and the bottom bracket; A mounting bracket connected to the top bracket and / or the bottom bracket, wherein a through hole is provided in the middle of the mounting bracket; The first support plate and the second support plate are both provided with support columns, and the first support portion and the second support portion are sleeved on the corresponding support columns through the through holes.

5. The cleaning device according to claim 4, wherein At least the rotatable cylinder in the first supporting portion and the second supporting portion is made of elastic material, and the first supporting portion and the second supporting portion form interference contact with the inner wall of the single crystal furnace auxiliary chamber through elastic deformation of the elastic material.

6. The cleaning device according to claim 4, wherein: The plurality of rotatable cylinders form a rolling support array arranged along the edge of the support plate. The outer wall surface of the rolling support array constitutes the support surface of the support portion, and the support surface is an arc surface matching the inner wall of the single crystal furnace auxiliary chamber.

7. The cleaning device according to claim 1, wherein The back of the first support plate and the back of the second support plate are both provided with rolling assemblies, each of the rolling assemblies includes at least one spiral roller group, and the spiral roller group can rotate along its own axis and form rolling contact with the inner wall of the single crystal furnace auxiliary chamber; The cleaning device also includes a second drive assembly, which is configured to drive at least one of the spiral roller groups to rotate around the central axis of the support assembly, and to achieve the rise or fall of the support assembly along the axial direction of the single crystal furnace sub-chamber through the rolling cooperation between the spiral roller group and the inner wall of the single crystal furnace sub-chamber.

8. The cleaning device according to claim 7, wherein The total length of the spiral grooves on the spiral roller assembly is not less than the circumference of the inner wall of the single crystal furnace auxiliary chamber.

9. The cleaning device according to claim 7, wherein: The rolling assembly further comprises: A mounting block, wherein a mounting groove extending radially along the support plate is provided on the back side of the support plate, the mounting block is slidably connected to the mounting groove, and the spiral roller assembly is rotatably arranged on the mounting block via a rotating shaft; An elastic member is arranged in the mounting groove and abuts against the mounting block, and is configured to apply an elastic force radially outward along the mounting groove to the mounting block, so that the spiral roller group forms an elastic interference contact with the inner wall of the single crystal furnace auxiliary chamber under the action of the elastic force.

10. The cleaning device according to claim 1, wherein The edges of the first support plate and the second support plate away from the inner wall of the single crystal furnace sub-chamber are respectively provided with a first half groove and a second half groove. When the first support plate and the second support plate are close to each other, the first half groove and the second half groove are spliced ​​together to form a through groove for the seed crystal rope to pass through; the through groove extends from the center of the support component to the edge and has an opening to allow the seed crystal rope to enter and exit the through groove through the opening.

11. The cleaning device according to claim 10, wherein When the seed rope is in the through groove, the cleaning cloth between the first guide member and the second guide member is tangent to the seed rope.

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