Preparation method of anti-dazzle glass and anti-dazzle glass

Abstract

The invention discloses a preparation method of anti-dazzle glass and the anti-dazzle glass, and the preparation method of the anti-dazzle glass comprises the following steps: laser etching: etching a hole type array on an anti-dazzle surface of a glass substrate through laser, and forming a plurality of independent concave particles on the surface of the anti-dazzle surface; the hole pattern array is composed of a plurality of non-through holes, and any non-through holes in the hole pattern array are not overlapped; chemical polishing: carrying out chemical polishing on the anti-dazzle surface subjected to laser etching; the chemical polishing is that polishing is stopped when the adjacent concave particles are polished to intersect and share the same edge and the transmission haze of the surface of the polished anti-dazzle surface reaches 5%-85%.

Description

Technical Field

[0001] The present invention relates to the technical field of anti-glare glass, in particular to a preparation method of anti-glare glass and the anti-glare glass. Background Art

[0002] Anti-glare glass is a functional glass widely used in consumer electronics. Its anti-glare properties can reduce the reflection and scattering of ambient light on the display screen, thereby making the display clearer. Therefore, AG anti-glare glass is widely used in the displays of electronic devices such as automotive displays, laptops, tablets, smartphones, and TVs.

[0003] With the continuous development and popularization of the electronic product market, the demand for anti-glare glass is also increasing. Traditional anti-glare glass manufacturing technology usually involves chemical etching or physical sandblasting of the glass substrate surface followed by chemical polishing. However, traditional anti-glare glass manufacturing technology has many drawbacks, such as high production cost, poor environmental performance, and difficulty in balancing anti-glare effect and sparkle. In particular, when the anti-glare performance of the glass is very strong, the sparkle value of the glass surface is very high, which can easily cause visual fatigue to users. These factors have limited its widespread application.

[0004] The Chinese patent, published with publication number CN116675439B, employs a combination of masking and etching, which only addresses the trade-off between high anti-glare performance and a low flash point, but fails to fundamentally resolve the flash point issue. Furthermore, the process is complex, requiring the use of a hole array and exposure and development techniques to create micropores. This creates significant technical difficulty, requires significant equipment investment, and results in low production efficiency. Summary of the Invention

[0005] In order to solve the defects of the prior art, the purpose of this application is to provide a method for preparing anti-glare glass and anti-glare glass, which uses a laser etching process to replace the exposure, development and etching methods, while achieving excellent anti-glare effect and solving the flash point problem.

[0006] To achieve the above objectives, the present application provides a method for preparing anti-glare glass, comprising:

[0007] Laser etching: using laser to etch a hole array on the anti-glare surface of the glass substrate to form multiple independent concave particles on the surface of the anti-glare surface;

[0008] The hole array is composed of a plurality of non-through holes, and there is no overlapping area between any non-through holes on the hole array;

[0009] Chemical polishing: chemical polishing of the laser-etched anti-glare surface;

[0010] Chemical polishing is to stop polishing when adjacent concave particles are polished to intersect and share the same edge, and the transmission haze of the polished anti-glare surface reaches 5%-85%.

[0011] Furthermore, the hole array is composed of a plurality of parallel rows of non-through holes, or is formed by a plurality of irregularly arranged non-through holes.

[0012] Furthermore, when the hole array is composed of a plurality of parallel rows of non-through holes, each row of the hole array includes a plurality of non-through holes having different diameters and the same center distance between adjacent non-through holes;

[0013] Alternatively, each column of the hole array includes a plurality of non-through holes having the same diameter and the same center distance between any adjacent non-through holes.

[0014] Furthermore, when each column of the hole array includes a plurality of non-through holes having different diameters and the same center distance between adjacent non-through holes, the diameter of the non-through holes ranges from 5 to 50 μm, and the center distance between adjacent non-through holes in each column of the hole array ranges from 20 to 120 μm.

[0015] The spacing between adjacent columns of the hole array is not greater than cos30° times the center distance of the circle;

[0016] The difference between the maximum diameter and the minimum diameter of the non-through holes in the hole array is not less than 2 μm.

[0017] Furthermore, the difference between the maximum diameter and the minimum diameter of the non-through holes in the hole array is not less than 2 μm and not more than 10 μm.

[0018] Furthermore, the diameters of the non-through holes in the hole array are normally distributed or quasi-normally distributed with the average of the single largest diameter and the single smallest diameter as the center value;

[0019] Alternatively, the diameter size of the non-through holes on the hole array is divided into multiple equal parts with the maximum diameter size and the minimum diameter size as endpoint values, and the number of non-through holes in each equal part has the same proportion to the number of through holes on the hole array.

[0020] Furthermore, the laser etching process may involve etching particles on the surface of the glass substrate to a depth of 0.5-30 μm, and a maximum depth of 5-30 μm.

[0021] Furthermore, chemical polishing also includes polishing the glass substrate until the depth size of the particles is in the range of 0.3-25 μm, the difference between the maximum depth size and the minimum depth size of the particles is 0.5-15 μm, the diameter size of the particles is in the range of 20-150 μm, and the difference between the maximum diameter size and the minimum diameter size of the particles is 3-70 μm.

[0022] Furthermore, chemical polishing uses an acidic polishing solution or an alkaline polishing solution;

[0023] The acid polishing liquid includes, by weight, 8-12 parts of hydrofluoric acid, 8-12 parts of sulfuric acid, and 60-80 parts of deionized water;

[0024] The alkaline polishing liquid includes, by weight, 45-60 parts of sodium hydroxide and 40-55 parts of deionized water.

[0025] Furthermore, when each column of the hole array includes a plurality of non-through holes having the same diameter and the same center distance between any adjacent non-through holes, the diameter of the non-through holes ranges from 5 to 50 μm, and the center distance between adjacent non-through holes in each column of the hole array ranges from 50 to 120 μm.

[0026] The spacing between adjacent columns on the hole array is not greater than cos30° times the center distance of the circles.

[0027] Furthermore, the laser etching is performed, and the depth of the particles etched into the surface of the glass substrate is 5-30 μm.

[0028] Furthermore, chemical polishing also includes:

[0029] The glass substrate is polished to a particle size range of 0.3-25 μm in depth and 57.7-138.6 μm in diameter.

[0030] Furthermore, the chemical polishing uses an alkaline polishing liquid, and the components of the alkaline polishing liquid include, by weight, 45-60 parts of sodium hydroxide and 40-55 parts of deionized water.

[0031] Furthermore, when the hole array is formed by irregularly arranging a plurality of non-through holes, the hole array includes a plurality of non-through holes with different diameters, and the center distances between any adjacent non-through holes are not completely the same;

[0032] Alternatively, the diameters of any non-through holes in the hole array are the same, but the center distances between adjacent non-through holes are not completely the same;

[0033] Furthermore, when the hole array includes a plurality of non-through holes with different diameters, and the center distances between any adjacent non-through holes are different, the diameter range of the non-through holes is 5-50 μm;

[0034] The center distance between adjacent non-through holes is 15-120 μm;

[0035] The difference between the maximum diameter and the minimum diameter of a single non-through hole in the hole array is not less than 2μm;

[0036] The difference between the maximum center distance and the minimum center distance of adjacent non-through holes in the hole array is not less than 2 μm.

[0037] Furthermore, the difference between the maximum diameter and the minimum diameter of a single non-through hole in the hole array is not less than 2 μm and not more than 10 μm.

[0038] Furthermore, the difference between the maximum center distance and the minimum center distance of adjacent non-through holes in the hole array is not less than 2 μm and not more than 20 μm.

[0039] Furthermore, the diameters of the non-through holes in the hole array are normally distributed or quasi-normally distributed with the average of the single largest diameter and the single smallest diameter as the center value;

[0040] Alternatively, the diameter size of the non-through holes on the hole array is divided into multiple equal parts with the maximum diameter size and the minimum diameter size as endpoint values, and the number of non-through holes in each equal part accounts for the same proportion of the number of non-through holes on the hole array.

[0041] Furthermore, the hole array includes: adjacent non-through holes have the same diameter.

[0042] Furthermore, the hole array includes: the center distances between adjacent non-through holes are the same.

[0043] Furthermore, the center distances of adjacent non-through holes in the hole array are normally distributed or quasi-normally distributed with the average of the single maximum center distance and the single minimum center distance as the center value;

[0044] Alternatively, the center distances of adjacent non-through holes on the hole array are divided into multiple equal parts with the maximum center distance and the minimum center distance as endpoint values, and the number of center distances in each equal part has the same proportion to the number of center distances on the hole array.

[0045] Furthermore, laser etching is performed until the depth of the particles is 0.5-30 μm, and the maximum depth of the particles is 5-30 μm.

[0046] Furthermore, chemical polishing also includes polishing the glass substrate until the depth size of the particles is in the range of 0.3-25 μm, the difference between the maximum depth size and the minimum depth size of the particles is 1-15 μm, the diameter size of the particles is in the range of 15-150 μm, and the difference between the maximum diameter size and the minimum diameter size of the particles is 3-70 μm.

[0047] Furthermore, when the diameters of any non-through holes in the hole array are the same and the center distances between adjacent non-through holes are not completely the same, the diameter range of the through holes is 5-50 μm;

[0048] The center distance between adjacent non-through holes is 15-120 μm;

[0049] The difference between the maximum center distance and the minimum center distance of adjacent non-through holes in the hole array is not less than 2 μm.

[0050] Furthermore, the difference between the maximum center distance and the minimum center distance of adjacent non-through holes in the hole array is not less than 2 μm and not more than 20 μm.

[0051] Furthermore, the hole array further includes: the center distances between adjacent non-through holes are the same.

[0052] Furthermore, the center distances between adjacent non-through holes in the hole array are normally distributed or quasi-normally distributed with the average of the single maximum center distance and the single minimum center distance as the center value;

[0053] Alternatively, the center distance between adjacent non-through holes on the hole array is divided into multiple equal parts with the maximum center distance and the minimum center distance as endpoint values, and the number of center distances in each equal part has the same proportion to the number of center distances on the hole array.

[0054] Furthermore, the laser etching is performed, and the depth of the particles etched into the surface of the glass substrate is 5-30 μm.

[0055] Furthermore, the chemical polishing further includes polishing the glass substrate until the depth size of the particles is in the range of 0.3-25 μm, the diameter size of the particles is in the range of 15-150 μm, and the difference between the maximum diameter size and the minimum diameter size of the particles is in the range of 3-70 μm.

[0056] Furthermore, chemical polishing uses an acidic polishing solution;

[0057] The acidic polishing liquid includes, by weight, 8-12 parts of hydrofluoric acid, 8-12 parts of sulfuric acid, and 60-80 parts of deionized water.

[0058] Chemical polishing uses alkaline polishing liquid;

[0059] The alkaline polishing liquid includes, by weight, 45-60 parts of sodium hydroxide and 40-55 parts of deionized water.

[0060] Furthermore, to achieve the above-mentioned purpose, an embodiment of the present invention further provides an anti-glare glass, which is manufactured using the above-mentioned method for preparing the anti-glare glass.

[0061] The preparation method of the anti-glare glass and the anti-glare glass of the embodiment of the present invention greatly reduce the flash point of the anti-glare glass with the same anti-glare performance, solve the technical problem of the conflict between high anti-glare performance and low flash point, and have high surface roughness and anti-fingerprint performance; while having high anti-glare performance, it also eliminates flash points, moiré patterns and rainbow patterns, thereby improving the market competitiveness of the terminal; when the polishing liquid uses an alkaline solution, it is more environmentally friendly than the existing hydrofluoric acid acid solution, because hydrofluoric acid is volatile and can easily cause personal injury to operators, and fluoride ions are highly toxic, and the usual treatment method is also more complicated; when using an alkaline solution of sodium hydroxide, the sodium hydroxide is less volatile and the waste liquid treatment is also simpler. The waste liquid can be neutralized with acid, and the products are water and precipitate, which is very beneficial to the environment; using laser etching instead of chemical etching is more environmentally friendly and saves the cost of the hole array.

[0062] Other features and advantages of the present application will be set forth in the following description, and in part will be apparent from the description, or may be learned by practicing the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0063] The accompanying drawings are used to provide a further understanding of the present application and constitute a part of the specification. Together with the embodiments of the present application, they are used to explain the present application and do not constitute a limitation of the present application. In the accompanying drawings:

[0064] Figure 1 1 is a schematic flow chart of a method for preparing anti-glare glass according to an embodiment of the present application;

[0065] Figure 2 Each column of the hole array of the embodiment of the present application includes a laser etching pattern in which the diameters of the holes are not completely the same, and the center distances of adjacent non-through holes are the same;

[0066] Figure 3 This is an SEM image after chemical polishing of each column of the hole array of the embodiment of the present application, including a plurality of holes with different diameters and the same center distance between adjacent non-through holes;

[0067] Figure 4 Each column of the hole array of the embodiment of the present application includes a laser etching pattern with multiple holes having the same diameter and the same center distance between any adjacent non-through holes;

[0068] Figure 5 Each column of the hole array of the embodiment of the present application includes a SEM image after chemical polishing of a plurality of holes having the same diameter and the same center distance between any adjacent non-through holes;

[0069] Figure 6When the hole array of the embodiment of the present application is formed by a plurality of irregularly arranged non-through holes, the hole array includes a plurality of non-through holes with different diameters, and the center distances between any adjacent non-through holes are different;

[0070] Figure 7 When the hole array of the embodiment of the present application is formed by an irregular arrangement of multiple non-through holes, the hole array includes multiple non-through holes with different diameters, and the center distances between any adjacent non-through holes are different after chemical polishing;

[0071] Figure 8 This is a laser etching pattern when the hole array of the embodiment of the present application is formed by a plurality of irregularly arranged non-through holes, the diameters of any of the non-through holes on the hole array are the same, and the center distances between adjacent non-through holes are not completely the same;

[0072] Figure 9 This is an SEM image after chemical polishing of the hole array of the embodiment of the present application, which is composed of multiple irregularly arranged non-through holes, in which the diameters of any non-through holes on the hole array are the same, and the center distances between adjacent non-through holes are not exactly the same. DETAILED DESCRIPTION

[0073] The preferred embodiments of the present application are described below in conjunction with the accompanying drawings. It should be understood that the preferred embodiments described herein are only used to illustrate and explain the present application and are not used to limit the present application.

[0074] The following describes embodiments of the present application in more detail with reference to the accompanying drawings. Although certain embodiments of the present application are shown in the accompanying drawings, it should be understood that the present application can be implemented in various forms and should not be construed as limited to the embodiments described herein. Instead, these embodiments are provided to provide a more thorough and complete understanding of the present application. It should be understood that the drawings and embodiments of the present application are for illustrative purposes only and are not intended to limit the scope of protection of the present application.

[0075] As used herein, the term "including" and its variations are open-ended, i.e., "including but not limited to." The term "based on" means "based, at least in part, on." The term "one embodiment" means "at least one embodiment," the term "another embodiment" means "at least one additional embodiment," and the term "some embodiments" means "at least some embodiments." Other terms are defined in the following description.

[0076] It should be noted that the concepts of "first" and "second" may be mentioned in this application only to distinguish different devices, components or parts, and are not used to limit the order or interdependence of the functions performed by these devices, components or parts.

[0077] It should be noted that the modifications of "one" and "plurality" mentioned in this application are illustrative rather than restrictive. Those skilled in the art will understand that unless the context clearly indicates otherwise, they should be understood as "one or more." "Plurality" should be understood as two or more.

[0078] The method for preparing the anti-glare glass of the present application comprises:

[0079] Laser etching: using laser to etch a hole array on the anti-glare surface of the glass substrate to form multiple independent concave particles on the surface of the anti-glare surface;

[0080] The hole array is composed of a plurality of non-through holes, and there is no overlapping area between any non-through holes on the hole array;

[0081] Chemical polishing: chemical polishing of the laser-etched anti-glare surface;

[0082] Chemical polishing is to stop polishing when adjacent concave particles are polished to intersect and share the same edge, and the transmission haze of the polished anti-glare surface reaches 5%-85%.

[0083] In order to make the objectives, technical solutions and advantages of this application clearer, the implementation methods of this application will be further described in detail below with reference to the accompanying drawings.

[0084] Example 1 Figure 1 This is a flow chart of the method for preparing the anti-glare glass of an embodiment of the present application. The method for preparing the anti-glare glass of an embodiment of the present invention is used to perform surface treatment on the glass to provide anti-glare function, such as automotive anti-glare glass, anti-glare glass on the surface of mobile terminals, etc.

[0085] First, in step 101, laser etching is performed to etch a hole array on the anti-glare surface of the glass substrate by laser, thereby forming a plurality of independent concave particles on the surface of the anti-glare surface.

[0086] In an exemplary embodiment, as needed, before the laser etching process step, the anti-glare surface of the glass substrate is cleaned, and after cleaning, surface stains and water stains on the glass substrate are removed until the requirements for laser etching are met.

[0087] In an exemplary embodiment, of course, after the anti-glare surface of the glass substrate is cleaned, the glass substrate is further dried as needed.

[0088] In an exemplary embodiment, anti-glare glass generally only has technical requirements for the front and / or back surface, and the side surfaces of the glass substrate do not affect the optical parameters and performance. Therefore, the surface of the glass substrate referred to in the method for preparing anti-glare glass in the embodiments of the present application refers to the front and back surfaces.

[0089] In an exemplary embodiment, the anti-glare surface on the glass substrate can be one side or two opposite sides; for the convenience of explanation and illustration, this application takes one side of the anti-glare surface as an example for explanation, for example, only the front side of the glass substrate is set as the anti-glare surface.

[0090] In an exemplary embodiment, a hole array consisting of a plurality of non-through holes is arranged on the anti-glare surface of the glass substrate by a laser process. This can be understood as punching holes on the anti-glare surface of the glass substrate by a laser process, the holes are non-through holes, and the hole array consists of a plurality of non-through holes.

[0091] In an exemplary embodiment, as needed, the non-through holes on the hole array are perpendicular to the anti-glare surface, that is, the hole array is etched on the anti-glare surface by laser technology, but all holes on the hole array are not through holes.

[0092] In an exemplary embodiment, after laser etching, a plurality of independent concave particles are formed on the surface of the anti-glare surface; it can be understood that a plurality of pits appear on the surface of the anti-glare surface after etching, and the hole array is composed of these pits.

[0093] In an exemplary embodiment, there is no overlapping area between any non-through holes in the hole array, which can be understood as there being gaps between adjacent non-through holes, and there is no common area between them.

[0094] In an exemplary embodiment, as needed, these holes may be circular holes, or holes of any other shape. This application uses circular holes as an example for explanation.

[0095] In an exemplary embodiment, as needed, the hole array includes multiple columns of non-through holes arranged in parallel; it can be understood that the hole array is composed of multiple columns of non-through holes arranged in parallel.

[0096] In an exemplary embodiment, as needed, when the hole array is composed of multiple columns of non-through holes arranged in parallel, each column of the hole array includes multiple non-through holes with different diameters and the same center distance between adjacent non-through holes; it can be understood that the diameters of the non-through holes on the hole array are not completely the same, but the center distances between adjacent non-through holes are the same.

[0097] In an exemplary embodiment, as needed, when the hole array is composed of multiple columns of non-through holes arranged in parallel, each column of the hole array includes multiple non-through holes with the same diameter and the same center distance between any adjacent non-through holes; it can be understood that the diameters of the non-through holes on the hole array are exactly the same, and the center distances between adjacent non-through holes are the same.

[0098] In an exemplary embodiment, when each column of the hole array includes multiple non-through holes with different diameters and the same center distance between adjacent non-through holes, the diameter range of the non-through holes is 5-50 μm, and the center distance between adjacent non-through holes in each column of the hole array is 20-120 μm.

[0099] In an exemplary embodiment, when each column of the hole array includes multiple non-through holes with different diameters and the same center distance between adjacent non-through holes, the spacing between adjacent columns on the hole array is not greater than cos30° times the center distance.

[0100] In an exemplary embodiment, when each column of the hole array includes multiple non-through holes with different diameters and the same center distance between adjacent non-through holes, the difference between the maximum diameter and the minimum diameter of the non-through holes on the hole array is not less than 2 μm.

[0101] In an exemplary embodiment, the difference between the maximum diameter and the minimum diameter of the non-through holes in the hole array is not less than 2 μm and not more than 10 μm.

[0102] In an exemplary embodiment, the diameters of the non-through holes in the hole array are normally distributed or quasi-normally distributed with the average of a single maximum diameter and a single minimum diameter as the center value.

[0103] In an exemplary embodiment, the diameter size of the non-through holes on the hole array is divided into multiple equal parts with the maximum diameter size and the minimum diameter size as endpoint values, and the number of non-through holes in each equal part has the same proportion as the number of through holes on the hole array.

[0104] In an exemplary embodiment, the laser etching process may involve particles etched onto the surface of the glass substrate to a depth of 0.5-30 μm, and a maximum depth of 5-30 μm.

[0105] In an exemplary embodiment, when each column of the hole array includes multiple non-through holes with the same diameter and the same center distance between any adjacent non-through holes, the diameter range of the non-through holes is 5-50 μm, and the center distance between adjacent non-through holes in each column of the hole array is 50-120 μm.

[0106] In an exemplary embodiment, when each column of the hole array includes multiple non-through holes with the same diameter and the same center distance between any adjacent non-through holes, the spacing between adjacent columns on the hole array is not greater than cos30° times the center distance.

[0107] In an exemplary embodiment, when each column of the hole array includes multiple non-through holes with the same diameter and the same center distance between any adjacent non-through holes, the depth of the particles etched into the surface of the glass substrate by laser etching is 5-30 μm.

[0108] In an exemplary embodiment, as needed, the hole array may also include a plurality of irregularly arranged non-through holes; it can be understood that the hole array is composed of irregularly arranged non-through holes, that is, the arrangement of the non-through holes is not strictly limited to a fixed arrangement scheme of entire rows or entire columns.

[0109] In an exemplary embodiment, when the hole array is formed by irregularly arranging a plurality of non-through holes, the hole array includes a plurality of non-through holes with different diameters, and the center distances between any adjacent non-through holes are not completely the same.

[0110] In an exemplary embodiment, when the hole array is composed of a plurality of irregularly arranged non-through holes, the hole array includes a plurality of non-through holes with different diameter sizes, and the center distances between any adjacent non-through holes are not completely the same, the diameter size range of the non-through holes is 5-50 μm.

[0111] In an exemplary embodiment, when the hole array is formed by an irregular arrangement of multiple non-through holes, the hole array includes multiple non-through holes with different diameters, and the center distances between any adjacent non-through holes are not completely the same, the center distances between adjacent non-through holes are 15-120 μm.

[0112] In an exemplary embodiment, when the hole array is composed of a plurality of irregularly arranged non-through holes, the hole array includes a plurality of non-through holes with different diameter sizes, and the center distances between any adjacent non-through holes are not completely the same, the difference between the maximum diameter and the minimum diameter of a single non-through hole on the hole array is not less than 2 μm.

[0113] In an exemplary embodiment, when the hole array is composed of a plurality of irregularly arranged non-through holes, the hole array includes a plurality of non-through holes with different diameters, and the center distances between any adjacent non-through holes are not completely the same, the difference between the maximum center distance and the minimum center distance of adjacent non-through holes on the hole array is not less than 2 μm.

[0114] In an exemplary embodiment, when the hole array is composed of a plurality of irregularly arranged non-through holes, the hole array includes a plurality of non-through holes with different diameter sizes, and the center distances between any adjacent non-through holes are not completely the same, the difference between the maximum diameter and the minimum diameter of a single non-through hole on the hole array is not less than 2 μm and not greater than 10 μm.

[0115] In an exemplary embodiment, when the hole array is composed of a plurality of irregularly arranged non-through holes, the hole array includes a plurality of non-through holes with different diameters, and the center distances between any adjacent non-through holes are not completely the same, the difference between the maximum center distance and the minimum center distance between adjacent non-through holes on the hole array is not less than 2 μm and not greater than 20 μm.

[0116] In an exemplary embodiment, when the hole array is composed of a plurality of irregularly arranged non-through holes, the hole array includes a plurality of non-through holes with different diameter sizes, and the center distances between any adjacent non-through holes are not completely the same, the diameter sizes of the non-through holes on the hole array are normally distributed or similar to a normal distribution with the average of a single maximum diameter size and a single minimum diameter size as the center value.

[0117] In an exemplary embodiment, as needed, when the hole array is composed of a plurality of irregularly arranged non-through holes, the hole array includes a plurality of non-through holes with different diameter sizes, and the center distances between any adjacent non-through holes are not completely the same, the diameter sizes of the non-through holes on the hole array are divided into multiple equal parts with the maximum diameter size and the minimum diameter size as endpoint values, and the number of non-through holes in each equal part accounts for the same proportion of the number of non-through holes on the hole array.

[0118] In an exemplary embodiment, when the hole array is composed of a plurality of irregularly arranged non-through holes, the hole array includes a plurality of non-through holes with different diameter sizes, and the center distances between any adjacent non-through holes are not completely the same, the hole array includes: the diameter sizes between adjacent non-through holes are the same; it can be understood that the diameter sizes of some adjacent non-through holes on the hole array are the same.

[0119] In an exemplary embodiment, when the hole array is formed by a plurality of irregularly arranged non-through holes, the hole array includes a plurality of non-through holes with different diameter sizes, and the center distances between any adjacent non-through holes are not completely the same, the hole array includes: the center distances between adjacent non-through holes are the same; it can be understood that there will be a situation in which the center distances between adjacent non-through holes are the same in the hole array.

[0120] In an exemplary embodiment, when the hole array is composed of a plurality of irregularly arranged non-through holes, the hole array includes a plurality of non-through holes with different diameter sizes, and the center distances between any adjacent non-through holes are not completely the same, the center distances between adjacent non-through holes on the hole array are normally distributed or similar to a normal distribution with the average of a single maximum center distance size and a single minimum center distance size as the center value.

[0121] In an exemplary embodiment, as needed, when the hole array is composed of a plurality of irregularly arranged non-through holes, the hole array includes a plurality of non-through holes with different diameter sizes, and the center distances between any adjacent non-through holes are not completely the same, the center distances of adjacent non-through holes on the hole array are divided into multiple equal parts with the maximum center distance size and the minimum center distance size as endpoint values, and the number of center distances in each equal part accounts for the same proportion of the number of center distances on the hole array.

[0122] In an exemplary embodiment, when the hole array is composed of a plurality of irregularly arranged non-through holes, the hole array includes a plurality of non-through holes with different diameters, and the center distances between any adjacent non-through holes are not completely the same, laser etching is performed to a depth of 0.5-30 μm in the particles, and the maximum depth of the particles is 5-30 μm.

[0123] In an exemplary embodiment, as needed, when the hole array is formed by irregularly arranged multiple non-through holes, the diameters of any non-through holes on the hole array are the same, and the center distances between adjacent non-through holes are not exactly the same.

[0124] In an exemplary embodiment, when the hole array is composed of a plurality of irregularly arranged non-through holes, the diameters of any non-through holes on the hole array are the same, and the center distances between adjacent non-through holes are not exactly the same, the diameter range of the non-through holes is 5-50 μm.

[0125] In an exemplary embodiment, when the hole array is formed by irregularly arranged multiple non-through holes, the diameters of any non-through holes on the hole array are the same, and the center distances between adjacent non-through holes are not exactly the same, the center distances between adjacent non-through holes are 15-120 μm.

[0126] In an exemplary embodiment, when the hole array is composed of a plurality of irregularly arranged non-through holes, the diameters of any non-through holes on the hole array are the same, and the center distances between adjacent non-through holes are not exactly the same, the difference between the maximum center distance and the minimum center distance of adjacent non-through holes on the hole array is not less than 2 μm.

[0127] In an exemplary embodiment, when the hole array is composed of a plurality of irregularly arranged non-through holes, the diameters of any non-through holes on the hole array are the same, and the center distances between adjacent non-through holes are not exactly the same, the difference between the maximum center distance and the minimum center distance between adjacent non-through holes on the hole array is not less than 2 μm and not greater than 20 μm.

[0128] In an exemplary embodiment, when the hole array is composed of a plurality of irregularly arranged non-through holes, the diameters of any non-through holes on the hole array are the same, and the center distances between adjacent non-through holes are not exactly the same, the hole array also includes: the center distances between adjacent non-through holes are the same; it can be understood that there is a situation in which the center distances between some adjacent non-through holes on the hole array are the same.

[0129] In an exemplary embodiment, when the hole array is composed of a plurality of irregularly arranged non-through holes, the hole array includes a plurality of non-through holes with different diameter sizes, and the center distances between any adjacent non-through holes are not completely the same, the center distances between adjacent non-through holes on the hole array are normally distributed or similar to a normal distribution with the average of a single maximum center distance size and a single minimum center distance size as the center value.

[0130] In an exemplary embodiment, when the hole array is composed of a plurality of irregularly arranged non-through holes, the hole array includes a plurality of non-through holes with different diameter sizes, and the center distances between any adjacent non-through holes are not completely the same, the center distances between adjacent non-through holes on the hole array are divided into multiple equal parts with the maximum center distance size and the minimum center distance size as endpoint values, and the number of center distances in each equal part accounts for the same proportion of the number of center distances on the hole array.

[0131] In an exemplary embodiment, when the hole array is formed by an irregular arrangement of multiple non-through holes, the hole array includes multiple non-through holes with different diameters, and the center distances between any adjacent non-through holes are not completely the same, the depth of the particles etched into the surface of the glass substrate by laser etching is 5-30 μm.

[0132] In step 102, chemical polishing is performed on the anti-glare surface that has been etched by laser.

[0133] In an exemplary embodiment, chemical polishing is performed on one side of the glass substrate after laser etching, that is, the entire surface is chemically polished. Since the polishing liquid corrodes the glass substrate, the diameter of the concave particles will gradually expand.

[0134] In an exemplary embodiment, during chemical polishing, the concave particles formed on the basis of chemical etching will be gradually polished to expand their range; taking the concave particles as circles as an example for explanation, each concave particle area will gradually expand its radius range until the adjacent circular particles are tangent, and then gradually intersect.

[0135] In an exemplary embodiment, since chemical polishing is performed on the entire surface of the glass substrate, the area originally without concave particles is also within the polishing range during chemical polishing. When the glass substrate on this surface is completely polished and etched, adjacent circular particles intersect with each other and there are no planar protrusions, that is, adjacent circular particles are expanded to share the same edge. After the chemical polishing polishes the adjacent concave particles until they intersect and share the same edge, the process further includes continuing to polish the surface of the glass substrate after the hole array is removed, and stopping the polishing when the transmission haze of the surface of the polished glass substrate after the hole array is removed reaches 5%-85%.

[0136] In an exemplary embodiment, when the hole array is composed of multiple columns of non-through holes arranged in parallel, each column of the hole array includes multiple non-through holes with different diameters and the same center distance between adjacent non-through holes, the chemical polishing includes polishing the glass substrate until the depth size of the particles is in the range of 0.3-25 μm, the difference between the maximum depth size and the minimum depth size of the particles is 0.5-15 μm, the diameter size of the particles is in the range of 20-150 μm, and the difference between the maximum diameter size and the minimum diameter size of the particles is 3-70 μm.

[0137] In an exemplary embodiment, the diameter of a particle can be understood as the diameter of the largest circumscribed circle of the particle, because the particle is a polygon, such as a quadrilateral, a pentagon, a hexagon, a heptagon, and the like.

[0138] In an exemplary embodiment, the chemical polishing is performed using an acidic polishing solution or an alkaline polishing solution.

[0139] In an exemplary embodiment, the acidic polishing solution is a mixed solution of hydrofluoric acid, sulfuric acid, and deionized water.

[0140] In an exemplary embodiment, the acidic polishing liquid includes, by weight, 8-12 parts of hydrofluoric acid, 8-12 parts of sulfuric acid, and 60-80 parts of deionized water.

[0141] In an exemplary embodiment, during chemical polishing, the temperature of the acidic polishing liquid is 30° C.-33° C.

[0142] In an exemplary embodiment, the alkaline polishing solution is a mixed solution of sodium hydroxide and deionized water.

[0143] In an exemplary embodiment, the alkaline polishing liquid includes, by weight, 45-60 parts of sodium hydroxide and 40-55 parts of deionized water.

[0144] In an exemplary embodiment, during chemical polishing, the temperature of the alkaline polishing solution is 115° C.-125° C.

[0145] In an exemplary embodiment, when the hole array is composed of multiple columns of non-through holes arranged in parallel, each column of the hole array includes multiple non-through holes with the same diameter and the same center distance between any adjacent non-through holes, the chemical polishing includes polishing the glass substrate until the depth size of the particles is in the range of 0.3-25 μm and the diameter size of the particles is in the range of 57.7-138.6 μm.

[0146] In an exemplary embodiment, chemical polishing uses an alkaline polishing solution, and the components of the alkaline polishing solution include, by weight, 45-60 parts of sodium hydroxide and 40-55 parts of deionized water.

[0147] In an exemplary embodiment, during chemical polishing, the temperature of the alkaline polishing solution is 115° C.-125° C.

[0148] In an exemplary embodiment, when the hole array is formed by an irregular arrangement of multiple non-through holes, the hole array includes multiple non-through holes with different diameter sizes, and the center distances between any adjacent non-through holes are not completely the same, the chemical polishing includes polishing the glass substrate until the depth size of the particles is in the range of 0.3-25 μm, the difference between the maximum depth size and the minimum depth size of the particles is 1-15 μm, the diameter size of the particles is in the range of 15-150 μm, and the difference between the maximum diameter size and the minimum diameter size of the particles is 3-70 μm.

[0149] In an exemplary embodiment, chemical polishing uses an acidic polishing solution, which includes, by weight, 8-12 parts of hydrofluoric acid, 8-12 parts of sulfuric acid, and 60-80 parts of deionized water.

[0150] In an exemplary embodiment, during chemical polishing, the temperature of the acidic polishing liquid is 30° C.-33° C.

[0151] In one exemplary embodiment, chemical polishing may also employ an alkaline polishing solution, as needed. The alkaline polishing solution comprises, by weight, 45-60 parts sodium hydroxide and 40-55 parts deionized water. In one exemplary embodiment, the temperature of the alkaline polishing solution during chemical polishing is 115° C. to 125° C.

[0152] In an exemplary embodiment, the chemical polishing time is 8 min-195 min.

[0153] In an exemplary embodiment, when the hole array is formed by an irregular arrangement of multiple non-through holes, the diameters of any non-through holes on the hole array are the same, and the center distances between adjacent non-through holes are not exactly the same, the chemical polishing is performed on the glass substrate until the depth size of the particles is in the range of 0.3-25 μm, the diameter size of the particles is in the range of 15-150 μm, and the difference between the maximum diameter size and the minimum diameter size of the particles is 3-70 μm.

[0154] In an exemplary embodiment, chemical polishing uses an acidic polishing solution, which includes, by weight, 8-12 parts of hydrofluoric acid, 8-12 parts of sulfuric acid, and 60-80 parts of deionized water.

[0155] In an exemplary embodiment, during chemical polishing, the temperature of the acidic polishing liquid is 30° C.-33° C.

[0156] In an exemplary embodiment, as needed, chemical polishing may also use an alkaline polishing solution, which includes, by weight, 45-60 parts of sodium hydroxide and 40-55 parts of deionized water.

[0157] In an exemplary embodiment, during chemical polishing, the temperature of the alkaline polishing solution is 115° C.-125° C.

[0158] Example 2 In an exemplary embodiment, Example 2 is a specific example of the method for preparing the anti-glare glass of the embodiment of the present application.

[0159] In an exemplary embodiment, in order to enable a horizontal comparison of various embodiments, all glass substrates are selected from Corning 2320. Corning 2320 in this application is only used for illustration and is not intended to be limiting.

[0160] In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array consisting of multiple columns of non-through holes arranged in parallel.

[0161] In an exemplary embodiment, the diameter of the non-through hole is 5-7 μm, that is, the difference between the maximum diameter and the minimum diameter of the non-through hole is 2 μm, and the number of non-through holes is evenly distributed among 5 μm, 5.5 μm, 6 μm, 6.5 μm and 7 μm, that is, the number of non-through holes is the same when the diameter is 5 μm, 5.5 μm, 6 μm, 6.5 μm and 7 μm.

[0162] In an exemplary embodiment, the center distance between adjacent non-through holes in each column of the hole array consisting of multiple columns of non-through holes is 20 μm.

[0163] In an exemplary embodiment, the vertical distance between adjacent columns on the hole array is 20 times cos30°, or 17.32 μm.

[0164] In an exemplary embodiment, after laser etching, the depth of the particles on the glass substrate is 0.5-5 μm.

[0165] In an exemplary embodiment, after laser etching, the maximum depth of the particles on the glass substrate is 5 μm, and the maximum difference in depth between the particles is 4.5 μm.

[0166] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 5%.

[0167] In an exemplary embodiment, the polishing liquid includes, by weight, 12 parts of hydrofluoric acid, 12 parts of sulfuric acid, and 60 parts of deionized water. The temperature of the polishing liquid is 30° C., and the polishing time is 35 minutes.

[0168] In an exemplary embodiment, the surface particle depth of the anti-glare glass obtained after polishing is 0.3-0.8 μm, the maximum difference in depth between particles is 0.5 μm, the particle diameter is 20-35.9 μm, and the maximum difference in diameter between particles is 15.9 μm.

[0169] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 70.1 GU, distinctness of image of 1.6%, haze of 5%, roughness of 0.167 μm, flash point of none, and moiré of none.

[0170] In an exemplary embodiment, as needed, the glass substrate is further cleaned and dried after the chemical polishing is completed.

[0171] Example 3 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array consisting of multiple columns of non-through holes arranged in parallel.

[0172] In an exemplary embodiment, the diameter of the non-through hole is 5-7 μm, and the gradient of the diameter of the non-through hole is 0.5 μm, that is, the diameter of the non-through hole is 5 μm, 5.5 μm, 6 μm, 6.5 μm, and 7 μm, and the diameter of the non-through hole is normally distributed or similar to a normal distribution with 6 μm as the center value, wherein the pore size of 6 μm accounts for approximately 50%, the pore size of 5 μm accounts for approximately 10%, the pore size of 5.5 μm accounts for approximately 15%, the pore size of 6.5 μm accounts for approximately 15%, and the pore size of 7 μm accounts for approximately 10%.

[0173] In an exemplary embodiment, the distance between the centers of adjacent holes in each column of the hole array is 20 μm.

[0174] In an exemplary embodiment, the vertical distance between adjacent columns on the hole array is 20 times cos30°, or 17.32 μm.

[0175] In an exemplary embodiment, after laser etching, the depth of the particles on the glass substrate is 5.9-8.2 μm, the maximum particle depth is 8.2 μm, and the maximum difference in depth size between particles is 2.3 μm.

[0176] In an exemplary embodiment, the laser-etched side of the glass substrate is chemically polished using an alkaline polishing solution until the transmission haze reaches 22.5%.

[0177] In an exemplary embodiment, the polishing liquid includes, by weight, 10 parts of hydrofluoric acid, 8 parts of sulfuric acid, and 73 parts of deionized water. The temperature of the polishing liquid is 33° C., and the polishing time is 21 minutes.

[0178] In an exemplary embodiment, the particle depth is 1.9-3.8 μm, and the maximum difference in depth between particles is 1.9 μm; the particle diameter is 20.1-29.5 μm, and the maximum difference in particle diameter is 9.4 μm.

[0179] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 26.5 GU, distinctness of image of 0.6%, haze of 22.5%, roughness of 0.259 μm, flash point of none, and moiré of none.

[0180] Example 4 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array consisting of multiple columns of non-through holes arranged in parallel.

[0181] In an exemplary embodiment, the diameter of the non-through hole is 5-7 μm, that is, the difference between the maximum diameter and the minimum diameter of the non-through hole is 2 μm, and the number of non-through holes is evenly distributed among 5 μm, 5.5 μm, 6 μm, 6.5 μm and 7 μm, that is, the number of non-through holes is the same when the diameter is 5 μm, 5.5 μm, 6 μm, 6.5 μm and 7 μm.

[0182] In an exemplary embodiment, the center distance between adjacent non-through holes in each column of the hole array consisting of multiple columns of non-through holes is 20 μm.

[0183] In an exemplary embodiment, the vertical distance between adjacent columns on the hole array is 20 times cos30°, or 17.32 μm.

[0184] In an exemplary embodiment, after laser etching, the depth of the particles on the glass substrate is 6.1-8.5 μm, the maximum particle depth is 8.5 μm, and the maximum difference in depth size between particles is 2.4 μm.

[0185] In an exemplary embodiment, the laser-etched side of the glass substrate is chemically polished using an alkaline polishing solution until the transmission haze reaches 41.2%.

[0186] In an exemplary embodiment, the polishing liquid includes, by weight, 8 parts of hydrofluoric acid, 8 parts of sulfuric acid, and 80 parts of deionized water. The temperature of the polishing liquid is 30° C., and the polishing time is 12 minutes.

[0187] In an exemplary embodiment, the particle depth is 2.6-4.9 μm, and the maximum difference in depth between particles is 2.3 μm; the particle diameter is 20-23 μm, and the maximum difference in diameter between particles is 3 μm.

[0188] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 18.1 GU, distinctness of image of 0.3%, haze of 41.2%, roughness of 0.362 μm, flash point of none, and moiré of none.

[0189] Example 5 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array consisting of multiple columns of non-through holes arranged in parallel.

[0190] In an exemplary embodiment, the diameter of the non-through hole is 5-7 μm, that is, the difference between the maximum diameter and the minimum diameter of the non-through hole is 2 μm, and the number of non-through holes is evenly distributed among 5 μm, 5.5 μm, 6 μm, 6.5 μm and 7 μm, that is, the number of non-through holes is the same when the diameter is 5 μm, 5.5 μm, 6 μm, 6.5 μm and 7 μm.

[0191] In an exemplary embodiment, the center distance between adjacent non-through holes in each column of the hole array consisting of multiple columns of non-through holes is 20 μm.

[0192] In an exemplary embodiment, the vertical distance between adjacent columns on the hole array is 20 times cos30°, or 17.32 μm.

[0193] In an exemplary embodiment, after laser etching, the depth of the particles on the glass substrate is 0.5-5 μm, the maximum particle depth is 5 μm, and the maximum difference in depth size between particles is 4.5 μm.

[0194] In an exemplary embodiment, the laser-etched side of the glass substrate is chemically polished using an alkaline polishing solution, and the polishing is stopped when the transmission haze reaches 5.1%.

[0195] In an exemplary embodiment, the polishing liquid includes, by weight, 45 parts of sodium hydroxide, 55 parts of deionized water, a temperature of 125° C., and a polishing time of 36 minutes.

[0196] In an exemplary embodiment, the particle depth is 0.4-1.6 μm, and the maximum difference in depth between particles is 1.2 μm; the particle diameter is 20-34.5 μm, and the maximum difference in particle diameter is 14.5 μm.

[0197] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 70.3 GU, distinctness of image of 1.5%, haze of 5.1%, roughness of 0.122 μm, flash point of none, and moiré of none.

[0198] Example 6 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array consisting of multiple columns of non-through holes arranged in parallel.

[0199] In an exemplary embodiment, the diameter of the non-through hole is 5-7 μm, that is, the difference between the maximum diameter and the minimum diameter of the non-through hole is 2 μm, and the number of non-through holes is evenly distributed among 5 μm, 5.5 μm, 6 μm, 6.5 μm and 7 μm, that is, the number of non-through holes is the same when the diameter is 5 μm, 5.5 μm, 6 μm, 6.5 μm and 7 μm.

[0200] In an exemplary embodiment, the center distance between adjacent non-through holes in each column of the hole array consisting of multiple columns of non-through holes is 20 μm.

[0201] In an exemplary embodiment, the vertical distance between adjacent columns on the hole array is 20 times cos30°, or 17.32 μm.

[0202] In an exemplary embodiment, after laser etching, the depth of the particles on the glass substrate is 6-8.5 μm, the maximum depth of the particles on the glass substrate is 8.5 μm, and the maximum difference in depth between particles is 2.5 μm.

[0203] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 40.9%.

[0204] In an exemplary embodiment, the polishing liquid includes, by weight, 60 parts of sodium hydroxide and 40 parts of deionized water. The temperature of the polishing liquid is 115° C., and the polishing time is 13 minutes.

[0205] In an exemplary embodiment, the surface particle depth of the anti-glare glass obtained after polishing is 2.4-5.1 μm, the maximum difference in depth between particles is 2.7 μm, the particle diameter is 20-23.3 μm, and the maximum difference in diameter between particles is 3.3 μm.

[0206] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 18.3 GU, distinctness of image of 0.5%, haze of 40.9%, roughness of 0.373 μm, flash point of none, and moiré of none.

[0207] Example 7 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array consisting of multiple columns of non-through holes arranged in parallel.

[0208] In an exemplary embodiment, the diameter of the non-through hole is 7-13 μm, that is, the difference between the maximum diameter and the minimum diameter of the non-through hole is 6 μm, and the number of non-through holes is evenly distributed among 7 μm, 8 μm, 9 μm, 10 μm, 11 μm, 12 μm and 13 μm, that is, the number of non-through holes is the same when the diameter is 7 μm, 8 μm, 9 μm, 10 μm, 11 μm, 12 μm and 13 μm.

[0209] In an exemplary embodiment, the center distance between adjacent non-through holes in each column of the hole array consisting of multiple columns of non-through holes is 40 μm.

[0210] In an exemplary embodiment, the vertical distance between adjacent columns on the hole array is 40 times cos30°, or 34.64 μm.

[0211] In an exemplary embodiment, after laser etching, the depth of the particles on the glass substrate is 10.3-14.5 μm, the maximum depth of the particles on the glass substrate is 14.5 μm, and the maximum difference in depth between particles is 4.2 μm.

[0212] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 53.1%.

[0213] In an exemplary embodiment, the polishing liquid includes, by weight, 55 parts of sodium hydroxide and 45 parts of deionized water. The temperature of the polishing liquid is 120° C., and the polishing time is 22 minutes.

[0214] In an exemplary embodiment, the surface grain depth of the anti-glare glass obtained after polishing is 2.8-6.7 μm, the maximum difference in depth between grains is 3.9 μm, the grain diameter is 37.4-55.8 μm, and the maximum difference in diameter between grains is 18.4 μm.

[0215] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 15.1 GU, distinctness of image of 0.4%, haze of 53.1%, roughness of 0.865 μm, flash point of none, and moiré of none.

[0216] Example 8 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array consisting of multiple columns of non-through holes arranged in parallel.

[0217] In an exemplary embodiment, the diameter of the non-through hole is 13-19 μm, that is, the difference between the maximum diameter and the minimum diameter of the non-through hole is 6 μm, and the diameter gradient of the non-through hole is 1 μm, that is, the diameter of the non-through hole is 13 μm, 14 μm, 15 μm, 16 μm, 17 μm, 18 μm and 19 μm, and the diameter of the non-through hole is normally distributed or similar to a normal distribution with 16 μm as the center value, wherein the pore diameter of 15-17 μm accounts for approximately 50%, the pore diameter of 13-14 μm accounts for approximately 25%, and the pore diameter of 18-19 μm accounts for approximately 25%.

[0218] In an exemplary embodiment, the center distance between adjacent non-through holes in each column of the hole array consisting of multiple columns of non-through holes is 90 μm.

[0219] In an exemplary embodiment, the vertical distance between adjacent columns on the hole array is 90 times cos30°, or 77.94 μm.

[0220] In an exemplary embodiment, after laser etching, the depth of the particles on the glass substrate is 12.8-17.5 μm, the maximum depth of the particles on the glass substrate is 17.5 μm, and the maximum difference in depth between particles is 4.7 μm.

[0221] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 35.3%.

[0222] In an exemplary embodiment, the polishing liquid includes, by weight, 52 parts of sodium hydroxide and 45 parts of deionized water. The temperature of the polishing liquid is 124° C., and the polishing time is 70 minutes.

[0223] In an exemplary embodiment, the surface particle depth of the anti-glare glass obtained after polishing is 3.4-5.3 μm, the maximum difference in depth between particles is 1.9 μm, the particle diameter is 90.1-120.6 μm, and the maximum difference in diameter between particles is 30.5 μm.

[0224] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 18.9 GU, distinctness of image of 0.5%, haze of 35.3%, roughness of 1.219 μm, flash point of none, and moiré of none.

[0225] Example 9 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array consisting of multiple columns of non-through holes arranged in parallel.

[0226] In an exemplary embodiment, the diameter of the non-through hole is 16-22 μm, that is, the difference between the maximum diameter and the minimum diameter of the non-through hole is 6 μm, and the diameter gradient of the non-through hole is 1 μm, that is, the diameter of the non-through hole is 16 μm, 17 μm, 18 μm, 19 μm, 20 μm, 21 μm and 22 μm, and the diameter of the non-through hole is normally distributed or similar to a normal distribution with 19 μm as the center value, wherein the pore diameter of 18-20 μm accounts for approximately 50%, the pore diameter of 16-17 μm accounts for approximately 25%, and the pore diameter of 21-22 μm accounts for approximately 25%.

[0227] In an exemplary embodiment, the center distance between adjacent non-through holes in each column of the hole array consisting of multiple columns of non-through holes is 90 μm.

[0228] In an exemplary embodiment, the vertical distance between adjacent columns on the hole array is 90 times cos30°, or 77.94 μm.

[0229] In an exemplary embodiment, after laser etching, the depth of the particles on the glass substrate is 14.3-19.8 μm, the maximum depth of the particles on the glass substrate is 19.8 μm, and the maximum difference in depth between particles is 5.5 μm.

[0230] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 6.7%.

[0231] In an exemplary embodiment, the polishing liquid includes, by weight, 55 parts of sodium hydroxide and 43 parts of deionized water. The temperature of the polishing liquid is 118° C., and the polishing time is 160 minutes.

[0232] In an exemplary embodiment, the surface particle depth of the anti-glare glass obtained after polishing is 0.3-3.2 μm, the maximum difference in depth between particles is 2.9 μm, the particle diameter is 106.7-142.9 μm, and the maximum difference in diameter between particles is 36.2 μm.

[0233] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 65.1 GU, distinctness of image of 0.9%, haze of 6.7%, roughness of 0.621 μm, flash point of none, and moiré of none.

[0234] Example 10 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array consisting of multiple columns of non-through holes arranged in parallel.

[0235] In an exemplary embodiment, the diameter of the non-through hole is 26-34 μm, that is, the difference between the maximum diameter and the minimum diameter of the non-through hole is 8 μm, and the number of non-through holes is evenly distributed among 26 μm, 27 μm, 28 μm, 29 μm, 30 μm, 31 μm, 32 μm, 33 μm and 34 μm, that is, the number of non-through holes when the diameter is 26 μm, 27 μm, 28 μm, 29 μm, 30 μm, 31 μm, 32 μm, 33 μm and 34 μm is the same, that is, each accounts for one-ninth of the total number of non-through holes.

[0236] In an exemplary embodiment, the center distance between adjacent non-through holes in each column of the hole array consisting of multiple columns of non-through holes is 100 μm.

[0237] In an exemplary embodiment, the vertical distance between adjacent columns on the hole array is 100 times cos30°, or 86.60 μm.

[0238] In an exemplary embodiment, after laser etching, the depth of the particles on the glass substrate is 10.3-19.6 μm, the maximum depth of the particles on the glass substrate is 19.6 μm, and the maximum difference in depth between particles is 9.3 μm.

[0239] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 49.2%.

[0240] In an exemplary embodiment, the polishing liquid includes, by weight, 58 parts of sodium hydroxide and 43 parts of deionized water. The temperature of the polishing liquid is 119° C., and the polishing time is 135 minutes.

[0241] In an exemplary embodiment, the surface particle depth of the anti-glare glass obtained after polishing is 5.9-11.2 μm, the maximum difference in depth between particles is 5.3 μm, the particle diameter is 102.7-127.6 μm, and the maximum difference in diameter between particles is 24.9 μm.

[0242] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 16GU, distinctness of image of 0.2%, haze of 49.2%, roughness of 1.937 μm, flash point of none, and moiré of none.

[0243] Example 11 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array consisting of multiple columns of non-through holes arranged in parallel.

[0244] In an exemplary embodiment, as desired, the central axis of the non-through hole is perpendicular to the surface of the to-be-etched surface.

[0245] In an exemplary embodiment, the diameter of the non-through hole is 40-50 μm, that is, the difference between the maximum diameter and the minimum diameter of the non-through hole is 10 μm, and the number of non-through holes is evenly distributed among 40 μm, 41 μm, 42 μm, 43 μm, 44 μm, 45 μm, 46 μm, 47 μm, 48 μm, 49 μm, and 50 μm, that is, the number of non-through holes when the diameter is 40 μm, 41 μm, 42 μm, 43 μm, 44 μm, 45 μm, 46 μm, 47 μm, 48 μm, 49 μm, and 50 μm is the same, that is, each accounts for one eleventh of the total number of non-through holes.

[0246] In an exemplary embodiment, the center distance between adjacent non-through holes in each column of the hole array consisting of multiple columns of non-through holes is 120 μm.

[0247] In an exemplary embodiment, the vertical distance between adjacent columns on the hole array is 120 times cos30°, or 103.92 μm.

[0248] In an exemplary embodiment, after laser etching, the depth of the particles on the glass substrate is 15-30 μm, the maximum depth of the particles on the glass substrate is 30 μm, and the maximum difference in depth between particles is 15 μm.

[0249] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 22.1%.

[0250] In an exemplary embodiment, the polishing liquid includes, by weight, 60 parts of sodium hydroxide and 40 parts of deionized water. The temperature of the polishing liquid is 125° C., and the polishing time is 45 minutes.

[0251] In an exemplary embodiment, the surface particle depth of the anti-glare glass obtained after polishing is 10-25 μm, the maximum difference in depth between particles is 15 μm, the particle diameter is 120.7-133.1 μm, and the maximum difference in diameter between particles is 12.4 μm.

[0252] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 13.7 GU, distinctness of image of 0.1%, haze of 85%, roughness of 4.571 μm, flash point of none, and moiré of none.

[0253] Example 12 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array consisting of multiple columns of non-through holes arranged in parallel.

[0254] In an exemplary embodiment, as desired, the central axis of the non-through hole is perpendicular to the surface of the to-be-etched surface.

[0255] In an exemplary embodiment, the diameter of the non-through hole is 5 μm, that is, the non-through hole is a circular hole with a diameter of 5 μm, and the distance between the centers of adjacent non-through holes is 50 μm.

[0256] In an exemplary embodiment, there is no overlapping area between any non-through holes in the hole array.

[0257] In an exemplary embodiment, the spacing between adjacent columns is cos30° times the distance between the centers of the circles. For example, three adjacent non-through holes form a triangle structure in the shape of a triangle.

[0258] In an exemplary embodiment, the spacing between adjacent columns can be understood as the centers of the non-through holes on each column are located on the same straight line, and the spacing between adjacent columns is the spacing between the straight lines formed by two adjacent centers, and the straight lines formed by these adjacent centers are parallel.

[0259] In an exemplary embodiment, the laser etching is performed to a particle depth of 5 μm.

[0260] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 5%.

[0261] In an exemplary embodiment, the polishing liquid includes, by weight, 45 parts of sodium hydroxide, 55 parts of deionized water, a temperature of 125° C., and a polishing time of 75 minutes.

[0262] In an exemplary embodiment, the polishing is performed to a particle depth of 0.3 μm and a particle diameter of 57.7 μm.

[0263] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror gloss of 71.3 GU, distinctness of image of 15.9%, haze of 5%, roughness of 0.327 μm, and flash point of none.

[0264] Example 13 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array consisting of multiple columns of non-through holes arranged in parallel.

[0265] In an exemplary embodiment, the diameter of the non-through hole is 15 μm, that is, the non-through hole is a circular hole with a diameter of 15 μm, and the distance between the centers of adjacent non-through holes is 70 μm.

[0266] In an exemplary embodiment, there is no overlapping area between any non-through holes in the hole array.

[0267] In an exemplary embodiment, the spacing between adjacent columns is cos30° times the distance between the centers of the circles. For example, three adjacent non-through holes form a triangle structure in the shape of a triangle.

[0268] In an exemplary embodiment, the spacing between adjacent columns can be understood as the centers of the non-through holes on each column are located on the same straight line, and the spacing between adjacent columns is the spacing between the straight lines formed by two adjacent centers, and the straight lines formed by these adjacent centers are parallel.

[0269] In one exemplary embodiment, the laser etching is performed to a particle depth of 16.5 μm.

[0270] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished using an alkaline polishing solution, and the polishing is stopped when the transmission haze reaches 22.6%.

[0271] In an exemplary embodiment, the polishing liquid includes, by weight, 55 parts of sodium hydroxide, 50 parts of deionized water, a temperature of 115° C., and a polishing time of 95 minutes.

[0272] In an exemplary embodiment, the particle depth is 3.2 μm and the particle diameter is 80.8 μm.

[0273] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror gloss of 26.3 GU, a distinctness of image of 1.3%, a haze of 22.6%, a roughness of 0.976 μm, and a flash point of none.

[0274] Example 14 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array consisting of multiple columns of non-through holes arranged in parallel.

[0275] In an exemplary embodiment, the diameter of the non-through hole is 25 μm, that is, the non-through hole is a circular hole with a diameter of 25 μm, and the distance between the centers of adjacent non-through holes is 95 μm.

[0276] In an exemplary embodiment, there is no overlapping area between any non-through holes in the hole array.

[0277] In an exemplary embodiment, the spacing between adjacent columns is cos30° times the distance between the centers of the circles. For example, three adjacent non-through holes form a triangle structure in the shape of a triangle.

[0278] In an exemplary embodiment, the spacing between adjacent columns can be understood as the centers of the non-through holes on each column are located on the same straight line, and the spacing between adjacent columns is the spacing between the straight lines formed by two adjacent centers, and the straight lines formed by these adjacent centers are parallel.

[0279] In one exemplary embodiment, the laser etching is performed to a particle depth of 16.4 μm.

[0280] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished using an alkaline polishing solution, and the polishing is stopped when the transmission haze reaches 27.4%.

[0281] In an exemplary embodiment, the polishing liquid includes, by weight, 50 parts of sodium hydroxide, 50 parts of deionized water, a temperature of 115° C., and a polishing time of 87 minutes.

[0282] In an exemplary embodiment, the particle depth is 3.9 μm and the particle diameter is 109.7 μm.

[0283] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror gloss of 22.3 GU, distinctness of image of 0.7%, haze of 27.4%, roughness of 1.964 μm, and flash point of none.

[0284] Example 15 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array consisting of multiple columns of non-through holes arranged in parallel.

[0285] In an exemplary embodiment, the diameter of the non-through hole is 35 μm, that is, the non-through hole is a circular hole with a diameter of 35 μm, and the distance between the centers of adjacent non-through holes is 100 μm.

[0286] In an exemplary embodiment, there is no overlapping area between any non-through holes in the hole array.

[0287] In an exemplary embodiment, the spacing between adjacent columns is cos30° times the distance between the centers of the circles. For example, three adjacent non-through holes form a triangle structure in the shape of a triangle.

[0288] In an exemplary embodiment, the spacing between adjacent columns can be understood as the centers of the non-through holes on each column are located on the same straight line, and the spacing between adjacent columns is the spacing between the straight lines formed by two adjacent centers, and the straight lines formed by these adjacent centers are parallel.

[0289] In one exemplary embodiment, the laser etching is performed to a particle depth of 18.8 μm.

[0290] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished using an alkaline polishing solution, and the polishing is stopped when the transmission haze reaches 30.4%.

[0291] In an exemplary embodiment, the polishing liquid includes, by weight, 60 parts of sodium hydroxide, 45 parts of deionized water, a temperature of 117° C., and a polishing time of 92 minutes.

[0292] In an exemplary embodiment, the particle depth is 11.3 μm and the particle diameter is 115.5 μm.

[0293] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror gloss of 19.9 GU, distinctness of image of 0.7%, haze of 30.4%, roughness of 5.261 μm, and flash point of none.

[0294] Example 16 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array consisting of multiple columns of non-through holes arranged in parallel.

[0295] In an exemplary embodiment, the diameter of the non-through hole is 50 μm, that is, the non-through hole is a circular hole with a diameter of 50 μm, and the distance between the centers of adjacent non-through holes is 110 μm.

[0296] In an exemplary embodiment, there is no overlapping area between any non-through holes in the hole array.

[0297] In an exemplary embodiment, the spacing between adjacent columns is cos30° times the distance between the centers of the circles. For example, three adjacent non-through holes form a triangle structure in the shape of a triangle.

[0298] In an exemplary embodiment, the spacing between adjacent columns can be understood as the centers of the non-through holes on each column are located on the same straight line, and the spacing between adjacent columns is the spacing between the straight lines formed by two adjacent centers, and the straight lines formed by these adjacent centers are parallel.

[0299] In one exemplary embodiment, the laser etching is performed to a particle depth of 19.2 μm.

[0300] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished using an alkaline polishing solution, and the polishing is stopped when the transmission haze reaches 52.7%.

[0301] In an exemplary embodiment, the polishing liquid includes, by weight, 55 parts of sodium hydroxide, 45 parts of deionized water, a temperature of 115° C., and a polishing time of 73 minutes.

[0302] In an exemplary embodiment, the particle depth is 15.2 μm and the particle diameter is 127.1 μm.

[0303] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror gloss of 17.2 GU, distinctness of image of 0.3%, haze of 52.7%, roughness of 6.967 μm, and flash point of none.

[0304] Example 17 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array consisting of multiple columns of non-through holes arranged in parallel.

[0305] In an exemplary embodiment, the diameter of the non-through hole is 50 μm, that is, the non-through hole is a circular hole with a diameter of 50 μm, and the distance between the centers of adjacent non-through holes is 120 μm.

[0306] In an exemplary embodiment, there is no overlapping area between any non-through holes in the hole array.

[0307] In an exemplary embodiment, the spacing between adjacent columns is cos30° times the distance between the centers of the circles. For example, three adjacent non-through holes form a triangle structure in the shape of a triangle.

[0308] In an exemplary embodiment, the spacing between adjacent columns can be understood as the centers of the non-through holes on each column are located on the same straight line, and the spacing between adjacent columns is the spacing between the straight lines formed by two adjacent centers, and the straight lines formed by these adjacent centers are parallel.

[0309] In an exemplary embodiment, the laser etching is performed to a particle depth of 30 μm.

[0310] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished using an alkaline polishing solution, and the polishing is stopped when the transmission haze reaches 85%.

[0311] In an exemplary embodiment, the polishing liquid includes, by weight, 55 parts of sodium hydroxide, 45 parts of deionized water, a temperature of 120° C., and a polishing time of 37 minutes.

[0312] In an exemplary embodiment, the particle depth is 25 μm and the particle diameter is 138.6 μm.

[0313] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror gloss of 13.2 GU, distinctness of image of 0.2%, haze of 85%, roughness of 9.752 μm, and flash point of none.

[0314] Example 18 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array formed by irregular arrangement of multiple non-through holes.

[0315] In an exemplary embodiment, as required, the through holes are perpendicular to the anti-glare surface to be etched.

[0316] In an exemplary embodiment, the diameter of the non-through holes in the hole array is 5-7 μm, that is, the difference between the maximum diameter and the minimum diameter of the non-through holes is 2 μm. The maximum diameter of the non-through holes on the hole array is 7 μm, and the minimum diameter is 5 μm. The non-through holes are divided into 5 equal parts of 5 μm, 5.5 μm, 6 μm, 6.5 μm and 7 μm according to 5-7 μm. The number of non-through holes in each equal part has the same proportion to the number on the hole array. It can be understood that the number of non-through holes of 5 μm and the number of non-through holes of 5.5 μm, 6 μm, 6.5 μm and 7 μm are the same, and each accounts for one-fifth of the total number of non-through holes on the hole array.

[0317] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 15-20 μm, that is, the difference between the maximum and minimum sizes of the center distances between adjacent non-through holes is 5 μm.

[0318] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 15-20 μm, that is, the maximum center distance is 20 μm, and the minimum center distance is 15 μm, that is, the center distance is divided into 15 μm, 16 μm, 17 μm, 18 μm, 19 μm and 20 μm, a total of six equal parts, and the number in each equal part accounts for the same proportion, that is, one-sixth each.

[0319] In an exemplary embodiment, the center distances between adjacent non-through holes in the hole array are counted once for every center distance between two adjacent non-through holes.

[0320] In an exemplary embodiment, after chemical etching, the depth of the particles on the glass substrate is 0.5-5 μm, the maximum particle depth is 5 μm, and the maximum difference in depth size between particles is 4.5 μm.

[0321] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 5%.

[0322] In an exemplary embodiment, the polishing liquid includes, by weight, 12 parts of hydrofluoric acid, 12 parts of sulfuric acid, and 60 parts of deionized water. The temperature of the polishing liquid is 30° C., and the polishing time is 35 minutes.

[0323] In an exemplary embodiment, the surface particle depth of the anti-glare glass obtained after polishing is 0.3-1.3 μm, the maximum difference in depth between particles is 1 μm, the particle diameter is 15-30.9 μm, and the maximum difference in diameter between particles is 15.9 μm.

[0324] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 70.1 GU, distinctness of image of 1.6%, haze of 5%, roughness of 0.107 μm, flash point of none, moiré of none, and rainbow pattern of none.

[0325] Example 19 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array formed by irregular arrangement of multiple non-through holes.

[0326] In an exemplary embodiment, the diameter of the non-through holes in the hole array is 5-7 μm, that is, the difference between the maximum diameter and the minimum diameter of the non-through holes is 2 μm. The maximum diameter of the non-through holes on the hole array is 7 μm, and the minimum diameter is 5 μm. The non-through holes are divided into 5 equal parts of 5 μm, 5.5 μm, 6 μm, 6.5 μm and 7 μm according to 5-7 μm. The number of non-through holes in each equal part has the same proportion to the number on the hole array. It can be understood that the number of non-through holes of 5 μm and the number of non-through holes of 5.5 μm, 6 μm, 6.5 μm and 7 μm are the same, and each accounts for one-fifth of the total number of non-through holes on the hole array.

[0327] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 15-20 μm, that is, the difference between the maximum and minimum sizes of the center distances between adjacent non-through holes is 5 μm.

[0328] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 15-20 μm, that is, the maximum center distance is 20 μm, and the minimum center distance is 15 μm, that is, the center distance is divided into 15 μm, 16 μm, 17 μm, 18 μm, 19 μm and 20 μm, a total of six equal parts, and the number in each equal part accounts for the same proportion, that is, one-sixth each.

[0329] In an exemplary embodiment, the center distances between adjacent non-through holes in the hole array are counted once for every center distance between two adjacent non-through holes.

[0330] In an exemplary embodiment, the laser-etched particles on the glass substrate have a depth of 0.5-5 μm, a maximum particle depth of 5 μm, and a maximum difference in depth between particles of 4.5 μm.

[0331] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 5%.

[0332] In an exemplary embodiment, the polishing liquid includes, by weight, 12 parts of hydrofluoric acid, 12 parts of sulfuric acid, and 60 parts of deionized water. The temperature of the polishing liquid is 30° C., and the polishing time is 35 minutes.

[0333] In an exemplary embodiment, the surface particle depth of the anti-glare glass obtained after polishing is 0.3-1.3 μm, the maximum difference in depth between particles is 1 μm, the particle diameter is 15-30.9 μm, and the maximum difference in diameter between particles is 15.9 μm.

[0334] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 70.1 GU, distinctness of image of 1.6%, haze of 5%, roughness of 0.107 μm, flash point of none, moiré of none, and rainbow pattern of none.

[0335] Example 20 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array formed by irregular arrangement of multiple non-through holes.

[0336] In an exemplary embodiment, the diameter of the non-through holes in the hole array is 5-7 μm, that is, the difference between the maximum diameter and the minimum diameter of the non-through holes is 2 μm. The maximum diameter of the non-through holes on the hole array is 7 μm, and the minimum diameter is 5 μm. The non-through holes are divided into 5 equal parts of 5 μm, 5.5 μm, 6 μm, 6.5 μm and 7 μm according to 5-7 μm. The number of non-through holes in each equal part has the same proportion to the number on the hole array. It can be understood that the number of non-through holes of 5 μm and the number of non-through holes of 5.5 μm, 6 μm, 6.5 μm and 7 μm are the same, and each accounts for one-fifth of the total number of non-through holes on the hole array.

[0337] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 25-30 μm, that is, the difference between the maximum and minimum sizes of the center distances between adjacent non-through holes is 5 μm.

[0338] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 25-30 μm, that is, the maximum center distance is 30 μm, and the minimum center distance is 25 μm, that is, the center distance is divided into 25 μm, 26 μm, 27 μm, 28 μm, 29 μm and 30 μm, a total of six equal parts, and the number in each equal part accounts for the same proportion, that is, each accounts for one sixth.

[0339] In an exemplary embodiment, the depth of the particles etched by laser on the glass substrate is 0.6-5.1 μm, the maximum particle depth is 5.1 μm, and the maximum difference in depth between particles is 4.5 μm.

[0340] In an exemplary embodiment, the laser-etched side of the glass substrate is chemically polished using an alkaline polishing solution, and the polishing is stopped when the transmission haze reaches 5.3%.

[0341] In an exemplary embodiment, the polishing liquid includes, by weight, 45 parts of sodium hydroxide and 55 parts of deionized water, at a temperature of 125° C., and a polishing time of 36 minutes.

[0342] In an exemplary embodiment, the particle depth is 0.4-1.6 μm, and the maximum difference in depth between particles is 1.2 μm; the particle diameter is 24.3-35.4 μm, and the maximum difference in particle diameter is 11.1 μm.

[0343] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 68.9 GU, distinctness of image of 1.5%, haze of 5.3%, roughness of 0.148 μm, flash point of none, moiré of none, and rainbow pattern of none.

[0344] Example 21 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array formed by irregular arrangement of multiple non-through holes.

[0345] In an exemplary embodiment, the diameter of the non-through holes in the hole array is 5-7 μm, that is, the difference between the maximum diameter and the minimum diameter of the non-through holes is 2 μm. The maximum diameter of the non-through holes on the hole array is 7 μm, and the minimum diameter is 5 μm. The non-through holes are divided into 5 equal parts of 5 μm, 5.5 μm, 6 μm, 6.5 μm and 7 μm according to 5-7 μm. The number of non-through holes in each equal part has the same proportion to the number on the hole array. It can be understood that the number of non-through holes of 5 μm and the number of non-through holes of 5.5 μm, 6 μm, 6.5 μm and 7 μm are the same, and each accounts for one-fifth of the total number of non-through holes on the hole array.

[0346] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 25-30 μm, that is, the difference between the maximum and minimum sizes of the center distances between adjacent non-through holes is 5 μm.

[0347] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 25-30 μm, that is, the maximum center distance is 30 μm, and the minimum center distance is 25 μm, that is, the center distance is divided into 25 μm, 26 μm, 27 μm, 28 μm, 29 μm and 30 μm, a total of six equal parts, and the number in each equal part accounts for the same proportion, that is, one-sixth each.

[0348] In an exemplary embodiment, the depth of the particles etched by laser on the glass substrate is 0.6-5.1 μm, the maximum particle depth is 5.1 μm, and the maximum difference in depth between particles is 4.5 μm.

[0349] In an exemplary embodiment, the laser-etched side of the glass substrate is chemically polished using an alkaline polishing solution, and the polishing is stopped when the transmission haze reaches 5.3%.

[0350] In an exemplary embodiment, the polishing liquid includes, by weight, 45 parts of sodium hydroxide and 55 parts of deionized water, at a temperature of 125° C., and a polishing time of 36 minutes.

[0351] In an exemplary embodiment, the particle depth is 0.4-1.6 μm, and the maximum difference in depth between particles is 1.2 μm; the particle diameter is 24.3-35.4 μm, and the maximum difference in particle diameter is 11.1 μm.

[0352] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 68.9 GU, distinctness of image of 1.5%, haze of 5.3%, roughness of 0.148 μm, flash point of none, moiré of none, and rainbow pattern of none.

[0353] Example 22 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array formed by irregular arrangement of multiple non-through holes.

[0354] In an exemplary embodiment, the diameter of the non-through holes in the hole array is 7-13 μm, that is, the difference between the maximum diameter and the minimum diameter of the non-through holes is 6 μm, the maximum diameter of the non-through holes on the hole array is 13 μm, and the minimum diameter is 7 μm. The non-through holes are divided into 7 equal parts of 7 μm, 8 μm, 9 μm, 10 μm, 11 μm, 12 μm and 13 μm according to 7-13 μm. The number of non-through holes in each equal part has the same proportion to the number on the hole array. It can be understood that the number of non-through holes of 7 μm and the number of non-through holes of 8 μm, 9 μm, 10 μm, 11 μm, 12 μm and 13 μm are the same, and each accounts for one-seventh of the total number of through holes on the hole array.

[0355] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 37-43 μm, that is, the difference between the maximum and minimum sizes of the center distances between adjacent non-through holes is 6 μm.

[0356] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 37-43 μm, that is, the maximum center distance size is 43 μm, the minimum center distance size is 37 μm, and the center distances are divided into 37 μm, 38 μm, 39 μm, 40 μm, 41 μm, 42 μm and 43 μm. It can be understood that the center distance value gradient is 1 μm, and is normally distributed or similar to a normal distribution with 39-41 μm as the center value, among which 37-38 μm accounts for 25%, 39-41 μm accounts for 50%, and 42-43 μm accounts for 25%.

[0357] In an exemplary embodiment, the depth of the particles etched by laser on the glass substrate is 8.9-12.8 μm, the maximum particle depth is 12.8 μm, and the maximum difference in depth between particles is 3.9 μm.

[0358] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 22.3%.

[0359] In an exemplary embodiment, the polishing liquid includes, by weight, 10 parts of hydrofluoric acid, 10 parts of sulfuric acid, and 68 parts of deionized water. The temperature of the polishing liquid is 30° C., and the polishing time is 52 minutes.

[0360] In an exemplary embodiment, the surface particle depth of the anti-glare glass obtained after polishing is 1.6-5.3 μm, the maximum difference in depth between particles is 3.7 μm, the particle diameter is 32.9-72.2 μm, and the maximum difference in diameter between particles is 39.3 μm.

[0361] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 27.2GU; distinctness of image: 0.3%; haze: 22.3%; roughness: 0.688μm; flash point: none; moiré: none; and rainbow pattern: none.

[0362] Example 23 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array formed by irregular arrangement of multiple non-through holes.

[0363] In an exemplary embodiment, the diameter of the non-through holes in the hole array is 7-13 μm, and the difference in diameter between adjacent non-through holes is controlled between 0.5-1. For example, the difference in diameter between adjacent non-through holes is 1 μm. It can be understood that the diameter variation range between adjacent non-through holes on the hole array is controlled within 1 μm, that is, the through hole diameters are divided into 7 μm, 8 μm, 9 μm, 10 μm, 11 μm, 12 μm and 13 μm, and are normally distributed or similar to a normal distribution with 10 μm as the center value, wherein the pore size of 7-8 μm accounts for approximately 25%, the pore size of 9-11 μm accounts for approximately 50%, and the pore size of 12-13 μm accounts for approximately 25%.

[0364] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 70-80 μm.

[0365] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 70-80 μm, that is, the maximum center distance is 80 μm, and the minimum center distance is 70 μm, that is, the center distance is divided into 70 μm, 72 μm, 74 μm, 76 μm, 78 μm and 80 μm, a total of six equal parts, and the number in each equal part accounts for the same proportion, that is, one-sixth each.

[0366] In an exemplary embodiment, the depth of the particles etched by laser on the glass substrate is 9.2-14.7 μm, the maximum particle depth is 14.7 μm, and the maximum difference in depth between particles is 5.5 μm.

[0367] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 67.1%.

[0368] In an exemplary embodiment, the polishing liquid includes, by weight, 10 parts of hydrofluoric acid, 10 parts of sulfuric acid, and 68 parts of deionized water. The temperature of the polishing liquid is 32° C., and the polishing time is 37 minutes.

[0369] In an exemplary embodiment, the surface particle depth of the anti-glare glass obtained after polishing is 2.8-7.2 μm, the maximum difference in depth between particles is 4.4 μm, the particle diameter is 72.72-96.76 μm, and the maximum difference in diameter between particles is 24.04 μm.

[0370] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 15.5 GU, distinctness of image of 0.7%, haze of 67.1%, roughness of 1.231 μm, flash point of none, moiré of none, and rainbow pattern of none.

[0371] Example 24 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array formed by irregular arrangement of multiple non-through holes.

[0372] In an exemplary embodiment, the diameter of the non-through holes in the hole array is 13-19 μm, and the difference in diameter between the non-through holes is controlled between 0.5-1 μm. For example, the difference in diameter between adjacent non-through holes is 1 μm. It can be understood that the diameter variation range between adjacent non-through holes on the hole array is controlled within 1 μm, that is, the through hole diameters are divided into 13 μm, 14 μm, 15 μm, 16 μm, 17 μm, 18 μm and 19 μm, and are normally distributed or similar to a normal distribution with 16 μm as the center value, of which 13-14 μm accounts for approximately 25%, 15-17 μm accounts for approximately 50%, and 18-19 μm accounts for approximately 25%.

[0373] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 90-110 μm, that is, the difference between the maximum and minimum center distances of adjacent non-through holes is 20 μm.

[0374] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 90-110 μm, that is, the maximum center distance size is 110 μm, and the minimum center distance size is 90 μm. The center distances are divided into 90 μm, 92.5 μm, 95 μm, 97.5 μm, 100 μm, 102.5 μm, 105 μm, 107.5 μm and 110 μm. It can be understood that the center distance value gradient is 2.5 μm, and is normally distributed or similar to a normal distribution with 100 μm as the center value, among which 90-95 μm accounts for 25%, 97.5-102.5 μm accounts for 50%, and 105-110 μm accounts for 25%.

[0375] In an exemplary embodiment, the depth of the particles etched by laser on the glass substrate is 11.9-17.7 μm, the maximum particle depth is 17.7 μm, and the maximum difference in depth between particles is 5.8 μm.

[0376] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 36.3%.

[0377] In an exemplary embodiment, the polishing liquid includes, by weight, 52 parts of sodium hydroxide and 45 parts of deionized water. The temperature of the polishing liquid is 124° C., and the polishing time is 70 minutes.

[0378] In an exemplary embodiment, the surface particle depth of the anti-glare glass obtained after polishing is 3.4-6.3 μm, the maximum difference in depth between particles is 2.9 μm, the particle diameter is 86.7-120.1 μm, and the maximum difference in diameter between particles is 33.4 μm.

[0379] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 18.2 GU, distinctness of image of 0.5%, haze of 36.3%, roughness of 1.349 μm, flash point of none, moiré of none, and rainbow pattern of none.

[0380] Example 25 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array formed by irregular arrangement of multiple non-through holes.

[0381] In an exemplary embodiment, the diameter of the non-through holes in the hole array is 26-34 μm, and the difference in diameter between the non-through holes is controlled between 0.5-1 μm. For example, the difference in diameter between adjacent non-through holes is 1 μm. It can be understood that the diameter variation range between adjacent non-through holes on the hole array is controlled within 1 μm, that is, the diameters of the non-through holes are divided into 26 μm, 27 μm, 28 μm, 29 μm, 30 μm, 31 μm, 32 μm, 33 μm and 34 μm, and are normally distributed or similar to a normal distribution with 30 μm as the center value, among which 26-28 μm accounts for approximately 33%, 29-31 μm accounts for approximately 34%, and 32-34 μm accounts for approximately 33%.

[0382] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 105-120 μm, that is, the difference between the maximum and minimum center distances of adjacent non-through holes is 15 μm.

[0383] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 105-120 μm, that is, the maximum center distance size is 120 μm, and the minimum center distance size is 105 μm. The center distances are divided into 105 μm, 106 μm, 107 μm, 108 μm, 109 μm, 110 μm, 111 μm, 112 μm, 113 μm, 114 μm and 115 μm. It can be understood that the center distance value gradient is 1 μm, and is normally distributed or similar to a normal distribution with 110 μm as the center value, among which 105-107 μm accounts for 25%, 108-112 μm accounts for 50%, and 113-115 μm accounts for 25%.

[0384] In an exemplary embodiment, the depth of the particles etched by laser on the glass substrate is 11.3-19.9 μm, the maximum particle depth is 19.9 μm, and the maximum difference in depth between particles is 8.6 μm.

[0385] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 22.3%.

[0386] In an exemplary embodiment, the polishing liquid includes, by weight, 12 parts of hydrofluoric acid, 12 parts of sulfuric acid, and 65 parts of deionized water. The temperature of the polishing liquid is 31° C., and the polishing time is 173 minutes.

[0387] In an exemplary embodiment, the surface particle depth of the anti-glare glass obtained after polishing is 3.2-9.7 μm, the maximum difference in depth between particles is 6.5 μm, the particle diameter is 102.7-136.7 μm, and the maximum difference in diameter between particles is 35 μm.

[0388] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 26.2 GU, distinctness of image of 0.6%, haze of 22.3%, roughness of 1.637 μm, flash point of none, moiré of none, and rainbow pattern of none.

[0389] Example 26 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array formed by irregular arrangement of multiple non-through holes.

[0390] In an exemplary embodiment, the diameter of the non-through holes in the hole array is 40-50 μm, and the difference in diameter between the non-through holes is controlled between 0.5-1 μm. For example, the difference in diameter between adjacent non-through holes is 1 μm. It can be understood that the diameter variation range between adjacent non-through holes on the hole array is controlled within 1 μm, that is, the non-through hole diameter sizes are divided into 40 μm, 41 μm, 42 μm, 43 μm, 44 μm, 45 μm, 46 μm, 47 μm, 48 μm, 49 μm and 50 μm, and are normally distributed or similar to a normal distribution with 45 μm as the center value, among which 40-42 μm accounts for about 30%, 43-47 μm accounts for about 40%, and 48-50 μm accounts for about 30%.

[0391] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 100-120 μm, that is, the difference between the maximum and minimum center distances of adjacent non-through holes is 20 μm.

[0392] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 100-120 μm, that is, the maximum center distance size is 120 μm, and the minimum center distance size is 100 μm, that is, the center distance is divided into 100 μm, 104 μm, 108 μm, 112 μm, 116 μm and 120 μm, a total of six equal parts, and the number in each equal part accounts for the same proportion, that is, each accounts for one-sixth.

[0393] In an exemplary embodiment, the depth of the particles etched by laser on the glass substrate is 15.6-25.3 μm, the maximum particle depth is 25.3 μm, and the maximum difference in depth between particles is 9.7 μm.

[0394] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 75.3%.

[0395] In an exemplary embodiment, the polishing liquid includes, by weight, 12 parts of hydrofluoric acid, 12 parts of sulfuric acid, and 60 parts of deionized water. The temperature of the polishing liquid is 33° C., and the polishing time is 59 minutes.

[0396] In an exemplary embodiment, the surface particle depth of the anti-glare glass obtained after polishing is 5.3-15 μm, the maximum difference in depth between particles is 9.7 μm, the particle diameter is 95.7-138.4 μm, and the maximum difference in diameter between particles is 42.7 μm.

[0397] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 15.9 GU, distinctness of image of 0.1%, haze of 75.3%, roughness of 2.634 μm, flash point of none, moiré of none, and rainbow pattern of none.

[0398] Example 27 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array formed by irregular arrangement of multiple non-through holes.

[0399] In an exemplary embodiment, the diameter of the non-through holes in the hole array is 40-50 μm, that is, the difference between the maximum diameter and the minimum diameter of the non-through holes is 10 μm, the maximum diameter of the non-through holes on the hole array is 50 μm, and the minimum diameter is 40 μm. The non-through holes are divided into 11 equal parts of 40 μm, 41 μm, 42 μm, 43 μm, 44 μm, 45 μm, 46 μm, 47 μm, 48 μm, 49 μm and 50 μm according to the size of 40-50 μm. The number of non-through holes in each equal part has the same proportion as the number on the hole array. It can be understood that the number of through holes of 40 μm and the number of through holes of 41 μm, 42 μm, 43 μm, 44 μm, 45 μm, 46 μm, 47 μm, 48 μm, 49 μm and 50 μm are the same, and each accounts for one eleventh of the total number of through holes on the hole array.

[0400] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 100-120 μm, that is, the difference between the maximum and minimum center distances of adjacent non-through holes is 20 μm.

[0401] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 100-120 μm, that is, the maximum center distance is 120 μm, and the minimum center distance is 100 μm, that is, the center distance is divided into 100 μm, 105 μm, 110 μm, 115 μm and 120 μm, a total of five equal parts, and the number in each equal part accounts for the same proportion, that is, one fifth each.

[0402] In an exemplary embodiment, the laser-etched particles on the glass substrate have a depth of 15-30 μm, a maximum particle depth of 30 μm, and a maximum difference in depth between particles of 15 μm.

[0403] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 85%.

[0404] In an exemplary embodiment, the polishing liquid includes, by weight, 60 parts of sodium hydroxide and 40 parts of deionized water. The temperature of the polishing liquid is 125° C., and the polishing time is 45 minutes.

[0405] In an exemplary embodiment, the surface particle depth of the anti-glare glass obtained after polishing is 10-25 μm, the maximum difference in depth between particles is 15 μm, the particle diameter is 99.2-143.1 μm, and the maximum difference in diameter between particles is 43.9 μm.

[0406] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 13.2 GU; distinctness of image: 0.1%; haze: 84.7%; roughness: 4.551 μm; flash point: none; moiré: none; and rainbow pattern: none.

[0407] Example 28 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array formed by irregular arrangement of multiple non-through holes.

[0408] In an exemplary embodiment, the diameter of the non-through holes in the hole array is 5 μm.

[0409] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 15-20 μm, that is, the difference between the maximum and minimum sizes of the center distances between adjacent non-through holes is 5 μm.

[0410] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 15-20 μm, that is, the maximum center distance is 20 μm, and the minimum center distance is 15 μm, that is, the center distance is divided into 15 μm, 16 μm, 17 μm, 18 μm, 19 μm and 20 μm, a total of six equal parts, and the number in each equal part accounts for the same proportion, that is, one-sixth each.

[0411] In an exemplary embodiment, the center distances between adjacent non-through holes in the hole array are counted once for every center distance between two adjacent non-through holes.

[0412] In an exemplary embodiment, the laser etching is performed to a particle depth of 5 μm on the glass substrate.

[0413] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 5%.

[0414] In an exemplary embodiment, the polishing liquid includes, by weight, 12 parts of hydrofluoric acid, 12 parts of sulfuric acid, and 60 parts of deionized water. The temperature of the polishing liquid is 30° C., and the polishing time is 35 minutes.

[0415] In an exemplary embodiment, the surface particles of the anti-glare glass obtained after polishing have a depth of 0.3 μm, a particle diameter of 15-29.4 μm, and a maximum difference in diameter between particles of 14.4 μm.

[0416] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 70.6 GU, distinctness of image of 5.7%, haze of 5%, roughness of 0.098 μm, flash point of none, moiré of none, and rainbow pattern of none.

[0417] Example 29 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array formed by irregular arrangement of multiple non-through holes.

[0418] In an exemplary embodiment, the diameter of the non-through holes in the hole array is 8 μm.

[0419] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 18-20 μm, that is, the difference between the maximum and minimum sizes of the center distances between adjacent non-through holes is 2 μm.

[0420] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 18-20 μm, that is, the maximum center distance is 20 μm, the minimum center distance is 18 μm, and the center distance value gradient is 0.5 μm, that is, the center distance is divided into 18 μm, 18.5 μm, 19 μm, 19.5 μm and 20 μm, a total of five equal parts, and the number in each equal part accounts for the same proportion, that is, one fifth each.

[0421] In an exemplary embodiment, the center distances between adjacent non-through holes in the hole array are counted once for every center distance between two adjacent non-through holes.

[0422] In an exemplary embodiment, the laser etching is performed to a particle depth of 8.1 μm on the glass substrate.

[0423] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 22.8%.

[0424] In an exemplary embodiment, the polishing liquid includes, by weight, 10 parts of hydrofluoric acid, 8 parts of sulfuric acid, and 73 parts of deionized water. The temperature of the polishing liquid is 33° C., and the polishing time is 22 minutes.

[0425] In an exemplary embodiment, the surface particles of the anti-glare glass obtained after polishing have a depth of 2.3 μm, a particle diameter of 18-21 μm, and a maximum difference in diameter between particles of 3 μm.

[0426] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 26.2 GU, distinctness of image of 2.4%, haze of 22.8%, roughness of 0.194 μm, flash point of none, moiré of none, and rainbow pattern of none.

[0427] Example 30 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array formed by irregular arrangement of multiple non-through holes.

[0428] In an exemplary embodiment, the diameter of the non-through holes in the hole array is 8 μm.

[0429] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 18-23 μm, that is, the difference between the maximum and minimum sizes of the center distances between adjacent non-through holes is 5 μm.

[0430] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 18-23 μm, and the gradient of the center distance between adjacent non-through holes is 1 μm, that is, the center distance between adjacent non-through holes is divided into 18 μm, 19 μm, 20 μm, 21 μm, 22 μm and 23 μm, totaling six equal parts, and the number in each equal part accounts for the same proportion, that is, one-sixth each.

[0431] In an exemplary embodiment, the center distances between adjacent non-through holes in the hole array are counted once for every center distance between two adjacent non-through holes.

[0432] In an exemplary embodiment, the laser etching is performed to a particle depth of 6.4 μm on the glass substrate.

[0433] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 41.3%.

[0434] In an exemplary embodiment, the polishing liquid includes, by weight, 60 parts of sodium hydroxide and 40 parts of deionized water. The temperature of the polishing liquid is 14° C., and the polishing time is 115 minutes.

[0435] In an exemplary embodiment, the surface particles of the anti-glare glass obtained after polishing have a depth of 4.7 μm, a particle diameter of 17.5-26.2 μm, and a maximum difference in diameter between particles of 8.7 μm.

[0436] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 18.2 GU, distinctness of image of 0.4%, haze of 41.3%, roughness of 0.436 μm, flash point of none, moiré of none, and rainbow pattern of none.

[0437] Example 31 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array formed by irregular arrangement of multiple non-through holes.

[0438] In an exemplary embodiment, the diameter of the non-through holes in the hole array is 9 μm.

[0439] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 20-23 μm, that is, the difference between the maximum and minimum center distances of adjacent non-through holes is 3 μm.

[0440] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 20-23 μm, and the gradient of the center distance between adjacent non-through holes is 0.5 μm, that is, the center distance between adjacent non-through holes is 20 μm, 20.5 μm, 21 μm, 21.5 μm, 22 μm, 22.5 μm and 23 μm, and the center distance between adjacent non-through holes is normally distributed or similar to a normal distribution with 21.5 μm as the center value, wherein the center distance size of 20-20.5 μm accounts for approximately 25%, the center distance size of 21-22 μm accounts for approximately 50%, and the center distance size of 22.5-23 μm accounts for approximately 25%.

[0441] In an exemplary embodiment, the center distances between adjacent non-through holes in the hole array are counted once for every center distance between two adjacent non-through holes.

[0442] In an exemplary embodiment, the laser etching is performed to a particle depth of 7.5 μm on the glass substrate.

[0443] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 11.2%.

[0444] In an exemplary embodiment, the polishing liquid includes, by weight, 50 parts of sodium hydroxide and 50 parts of deionized water. The temperature of the polishing liquid is 31° C., and the polishing time is 120 minutes.

[0445] In an exemplary embodiment, the surface particles of the anti-glare glass obtained after polishing have a depth of 1.8 μm, a particle diameter of 16.7-32.3 μm, and a maximum difference in diameter between particles of 15.6 μm.

[0446] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 44.3GU, distinctness of image of 3.7%, haze of 11.2%, roughness of 0.173 μm, flash point of none, moiré of none, and rainbow pattern of none.

[0447] Example 32 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array formed by irregular arrangement of multiple non-through holes.

[0448] In an exemplary embodiment, the diameter of the non-through holes in the hole array is 25 μm.

[0449] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 60-70 μm, that is, the difference between the maximum and minimum center distances of adjacent non-through holes is 10 μm.

[0450] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 60-70 μm, and the gradient of the center distance between adjacent non-through holes is 1 μm, that is, the center distance between adjacent non-through holes is divided into 60 μm, 61 μm, 62 μm, 63 μm, 64 μm, 65 μm, 66 μm, 67 μm, 68 μm, 69 μm and 70 μm, totaling 11 equal parts, and the number in each equal part accounts for the same proportion, that is, one eleventh each.

[0451] In an exemplary embodiment, the center distances between adjacent non-through holes in the hole array are counted once for every center distance between two adjacent non-through holes.

[0452] In an exemplary embodiment, the laser etching depth of the particles on the glass substrate is 16.3 μm.

[0453] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 30.3%.

[0454] In an exemplary embodiment, the polishing liquid includes, by weight, 53 parts of sodium hydroxide and 48 parts of deionized water. The temperature of the polishing liquid is 125° C., and the polishing time is 67 minutes.

[0455] In an exemplary embodiment, the surface particle depth of the anti-glare glass obtained after polishing is 6.7 μm, the particle diameter is 54.6-81.3 μm, and the maximum difference in diameter between particles is 26.7 μm.

[0456] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 23.1 GU; distinctness of image: 1.1%; haze: 30.3%; roughness: 1.136 μm; flash point: none; moiré: none; and rainbow pattern: none.

[0457] Example 33 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array formed by irregular arrangement of multiple non-through holes.

[0458] In an exemplary embodiment, the diameter of the non-through holes in the hole array is 30 μm.

[0459] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 105-120 μm, that is, the difference between the maximum and minimum center distances of adjacent non-through holes is 15 μm.

[0460] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 105-120 μm, that is, the maximum center distance is 120 μm, and the minimum center distance is 105 μm, that is, the center distance is divided into 105 μm, 108 μm, 111 μm, 114 μm, 117 μm and 120 μm, a total of six equal parts, and the number in each equal part accounts for the same proportion, that is, each accounts for one-sixth.

[0461] In an exemplary embodiment, the center distances between adjacent non-through holes in the hole array are counted once for every center distance between two adjacent non-through holes.

[0462] In an exemplary embodiment, the laser etching depth of the particles on the glass substrate is 22.4 μm.

[0463] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 49.7%.

[0464] In an exemplary embodiment, the polishing liquid includes, by weight, 58 parts of sodium hydroxide and 43 parts of deionized water. The temperature of the polishing liquid is 119° C., and the polishing time is 132 minutes.

[0465] In an exemplary embodiment, the surface particle depth of the anti-glare glass obtained after polishing is 12.1 μm, the particle diameter is 100.3-127.6 μm, and the maximum difference in diameter between particles is 27.3 μm.

[0466] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 16.2 GU, distinctness of image of 0.5%, haze of 49.7%, roughness of 3.581 μm, flash point of none, moiré of none, and rainbow pattern of none.

[0467] Example 34 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array formed by irregular arrangement of multiple non-through holes.

[0468] In an exemplary embodiment, the diameter of the non-through holes in the hole array is 40 μm.

[0469] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 110-120 μm, that is, the difference between the maximum and minimum center distances of adjacent non-through holes is 10 μm.

[0470] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 110-120 μm, that is, the maximum center distance is 120 μm, and the minimum center distance is 110 μm, that is, the center distance is divided into 110 μm, 111 μm, 112 μm, 113 μm, 114 μm, 115 μm, 116 μm, 117 μm, 118 μm, 119 μm and 120 μm, a total of eleven equal parts, and the number in each equal part accounts for the same proportion, that is, one eleventh each.

[0471] In an exemplary embodiment, the center distances between adjacent non-through holes in the hole array are counted once for every center distance between two adjacent non-through holes.

[0472] In an exemplary embodiment, the laser etching depth of the particles on the glass substrate is 24.1 μm.

[0473] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 5.5%.

[0474] In an exemplary embodiment, the polishing liquid includes, by weight, 12 parts of hydrofluoric acid, 10 parts of sulfuric acid, and 68 parts of deionized water. The temperature of the polishing liquid is 31° C., and the polishing time is 200 min.

[0475] In an exemplary embodiment, the surface particles of the anti-glare glass obtained after polishing have a depth of 5.4 μm, a particle diameter of 80-150 μm, and a maximum difference in diameter between particles of 70 μm.

[0476] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 69.2 GU, distinctness of image of 3.1%, haze of 5.5%, roughness of 1.419 μm, flash point of none, moiré of none, and rainbow pattern of none.

[0477] Example 35 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array formed by irregular arrangement of multiple non-through holes.

[0478] In an exemplary embodiment, the diameter of the non-through holes in the hole array is 45 μm.

[0479] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 110-120 μm, that is, the difference between the maximum and minimum center distances of adjacent non-through holes is 10 μm.

[0480] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 110-120 μm, and the gradient of the center distance of the non-through holes is 1 μm, that is, the center distance of adjacent non-through holes is 110 μm, 111 μm, 112 μm, 113 μm, 114 μm, 115 μm, 116 μm, 117 μm, 118 μm, 119 μm and 120 μm, and the center distance of the non-through holes is normally distributed or similar to a normal distribution with 115 μm as the center value, wherein the center distance size of 110-112 μm accounts for about 25%, the center distance size of 13-117 μm accounts for about 50%, and the center distance size of 118-120 μm accounts for about 25%.

[0481] In an exemplary embodiment, the center distances between adjacent non-through holes in the hole array are counted once for every center distance between two adjacent non-through holes.

[0482] In an exemplary embodiment, the laser etching depth of the particles on the glass substrate is 25.4 μm.

[0483] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 21.7%.

[0484] In an exemplary embodiment, the polishing liquid includes, by weight, 60 parts of sodium hydroxide and 40 parts of deionized water. The temperature of the polishing liquid is 122° C., and the polishing time is 164 minutes.

[0485] In an exemplary embodiment, the surface particle depth of the anti-glare glass obtained after polishing is 14.3 μm, the particle diameter is 97.8-134.2 μm, and the maximum difference in diameter between particles is 36.4 μm.

[0486] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 27.2 GU; distinctness of image: 0.7%; haze: 21.7%; roughness: 4.172 μm; flash point: none; moiré: none; and rainbow pattern: none.

[0487] Example 36 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array formed by irregular arrangement of multiple non-through holes.

[0488] In an exemplary embodiment, the diameter of the non-through holes in the hole array is 50 μm.

[0489] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 100-120 μm, that is, the difference between the maximum and minimum center distances of adjacent non-through holes is 20 μm.

[0490] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 100-120 μm, that is, the maximum center distance is 120 μm, and the minimum center distance is 100 μm, that is, the center distance is divided into 100 μm, 104 μm, 108 μm, 112 μm, 116 μm and 120 μm, a total of six equal parts, and the number in each equal part accounts for the same proportion, that is, each accounts for one-sixth.

[0491] In an exemplary embodiment, the center distances between adjacent non-through holes in the hole array are counted once for every center distance between two adjacent non-through holes.

[0492] In an exemplary embodiment, the laser etching depth of the particles on the glass substrate is 27.3 μm.

[0493] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 73.4%.

[0494] In an exemplary embodiment, the polishing liquid includes, by weight, 12 parts of hydrofluoric acid, 12 parts of sulfuric acid, and 60 parts of deionized water. The temperature of the polishing liquid is 33° C., and the polishing time is 57 minutes.

[0495] In an exemplary embodiment, the surface particle depth of the anti-glare glass obtained after polishing is 19.3 μm, the particle diameter is 98.3-127.4 μm, and the maximum difference in diameter between particles is 29.1 μm.

[0496] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 14.6 GU, distinctness of image of 0.3%, haze of 73.4%, roughness of 7.871 μm, flash point of none, moiré of none, and rainbow pattern of none.

[0497] Example 37 In an exemplary embodiment, first, a hole array is etched on the anti-glare surface of the glass substrate by laser, and the hole array distribution rule is as follows: a hole array formed by irregular arrangement of multiple non-through holes.

[0498] In an exemplary embodiment, the diameter of the non-through holes in the hole array is 50 μm.

[0499] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 100-120 μm, that is, the difference between the maximum and minimum center distances between adjacent non-through holes is 20 μm.

[0500] In an exemplary embodiment, the center distance between adjacent non-through holes in the hole array is 100-120 μm, that is, the maximum center distance is 120 μm, and the minimum center distance is 100 μm, that is, the center distance is divided into 100 μm, 105 μm, 110 μm, 115 μm and 120 μm, a total of five equal parts, and the number in each equal part accounts for the same proportion, that is, one fifth each.

[0501] In an exemplary embodiment, the center distances between adjacent non-through holes in the hole array are counted once for every center distance between two adjacent non-through holes.

[0502] In an exemplary embodiment, the laser etching is performed to a particle depth of 30 μm on the glass substrate.

[0503] In an exemplary embodiment, the glass substrate on the laser-etched side is chemically polished until the transmission haze reaches 85%.

[0504] In an exemplary embodiment, the polishing liquid includes, by weight, 60 parts of sodium hydroxide and 40 parts of deionized water. The temperature of the polishing liquid is 125° C., and the polishing time is 42 minutes.

[0505] In an exemplary embodiment, the surface particles of the anti-glare glass obtained after polishing have a depth of 25 μm, a particle diameter of 99.1-125.9 μm, and a maximum difference in diameter between particles of 26.8 μm.

[0506] In an exemplary embodiment, the anti-glare glass of the embodiment of the present application has a 60-degree mirror glossiness of 12.9 GU, distinctness of image of 0.1%, haze of 85%, roughness of 9.476 μm, flash point of none, moiré of none, and rainbow pattern of none.

[0507] Example 38 Example 38 of the present application is an anti-glare glass, which is manufactured using the preparation method of the anti-glare glass of the above-mentioned embodiment.

[0508] Those skilled in the art will understand that the above are merely preferred embodiments of the present application and are not intended to limit the present application. Although the present application has been described in detail with reference to the aforementioned embodiments, those skilled in the art can still modify the technical solutions described in the aforementioned embodiments or replace some of the technical features therein with equivalents. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present application shall be included within the scope of protection of the present application.

Claims

1. A method for preparing anti-glare glass, characterized in that: include: Laser etching, etching a hole array on the anti-glare surface of the glass substrate by laser, forming a plurality of independent concave particles on the surface of the anti-glare surface; The hole array is composed of a plurality of non-through holes, and there is no overlapping area between any of the non-through holes in the hole array; Chemical polishing: chemically polishing the anti-glare surface that has been etched by the laser; The chemical polishing is stopped when the adjacent concave particles are polished to intersect and share the same edge, and the transmission haze of the polished anti-glare surface reaches 5%-85%.

2. The method for preparing anti-glare glass according to claim 1, characterized in that: The hole array is composed of a plurality of parallel rows of non-through holes, or a plurality of irregularly arranged non-through holes.

3. The method for preparing anti-glare glass according to claim 2, characterized in that: When the hole array is composed of a plurality of parallel rows of non-through holes, each row of the hole array includes a plurality of non-through holes having different diameters and the same center distance between adjacent non-through holes; Alternatively, each column of the hole array includes a plurality of non-through holes having the same diameter and the same center distance between any adjacent non-through holes.

4. The method for preparing anti-glare glass according to claim 3, characterized in that: When each column of the hole array includes a plurality of non-through holes having different diameters and the same center distance between adjacent non-through holes, the diameter of the non-through holes ranges from 5 to 50 μm, and the center distance between adjacent non-through holes in each column of the hole array ranges from 20 to 120 μm; The spacing between adjacent columns on the hole array is not greater than cos30° times the center distance of the circle; The difference between the maximum diameter and the minimum diameter of the non-through holes in the hole array is not less than 2 μm.

5. The method for preparing anti-glare glass according to claim 4, characterized in that: The difference between the maximum diameter and the minimum diameter of the non-through holes in the hole array is not less than 2 μm and not more than 10 μm.

6. The method for preparing anti-glare glass according to claim 4, characterized in that: The diameters of the non-through holes on the hole array are normally distributed or quasi-normally distributed with the average of a single maximum diameter and a single minimum diameter as the center value; Alternatively, the diameter size of the non-through holes on the hole array is divided into multiple equal parts with the maximum diameter size and the minimum diameter size as endpoint values, and the number of the non-through holes in each of the equal parts has the same proportion as the number of through holes on the hole array.

7. The method for preparing anti-glare glass according to claim 4, characterized in that: The laser etching is performed to etch the particles on the surface of the glass substrate to a depth of 0.5-30 μm, and the maximum depth of the particles is 5-30 μm.

8. The method for preparing anti-glare glass according to claim 7, characterized in that: The chemical polishing further includes polishing the glass substrate until the depth size of the particles is in the range of 0.3-25 μm, the difference between the maximum depth size and the minimum depth size of the particles is 0.5-15 μm, the diameter size of the particles is in the range of 20-150 μm, and the difference between the maximum diameter size and the minimum diameter size of the particles is 3-70 μm.

9. The method for preparing anti-glare glass according to claim 1, characterized in that: The chemical polishing adopts an acidic polishing liquid or an alkaline polishing liquid; The acidic polishing liquid comprises, by weight, 8-12 parts of hydrofluoric acid, 8-12 parts of sulfuric acid, and 60-80 parts of deionized water; The alkaline polishing liquid comprises, by weight, 45-60 parts of sodium hydroxide and 40-55 parts of deionized water.

10. The method for preparing anti-glare glass according to claim 3, characterized in that: When each column of the hole array includes a plurality of non-through holes having the same diameter and the same center distance between any adjacent non-through holes, the diameter of the non-through holes ranges from 5 to 50 μm, and the center distance between adjacent non-through holes in each column of the hole array ranges from 50 to 120 μm; The spacing between adjacent columns on the hole array is no greater than cos30° times the center distance of the circles.

11. The method for preparing anti-glare glass according to claim 10, characterized in that: The laser etching is performed to etch the particles on the surface of the glass substrate to a depth of 5-30 μm.

12. The method for preparing anti-glare glass according to claim 11, characterized in that: The chemical polishing further comprises: The glass substrate is polished until the depth size of the particles is in the range of 0.3-25 μm and the diameter size of the particles is in the range of 57.7-138.6 μm.

13. The method for preparing anti-glare glass according to claim 10, characterized in that: The chemical polishing adopts an alkaline polishing liquid, and the components of the alkaline polishing liquid include, by weight, 45 parts to 60 parts of sodium hydroxide and 40 parts to 55 parts of deionized water.

14. The method for preparing anti-glare glass according to claim 2, characterized in that: When the hole array is formed by irregularly arranging a plurality of non-through holes, the hole array includes a plurality of non-through holes with different diameters, and the center distances between any adjacent non-through holes are different; Alternatively, the diameters of any of the non-through holes in the hole array are the same, and the center distances between adjacent non-through holes are not completely the same.

15. The method for preparing anti-glare glass according to claim 14, characterized in that: When the hole array includes a plurality of non-through holes with different diameters, and the center distances between any adjacent non-through holes are different, the diameter of the non-through holes ranges from 5 to 50 μm; The center distance between adjacent non-through holes is 15-120 μm; The difference between the maximum diameter and the minimum diameter of a single non-through hole in the hole array is not less than 2 μm; The difference between the maximum center distance and the minimum center distance of adjacent non-through holes in the hole array is not less than 2 μm.

16. The method for preparing anti-glare glass according to claim 15, characterized in that: The difference between the maximum diameter and the minimum diameter of a single non-through hole in the hole array is not less than 2 μm and not more than 10 μm.

17. The method for preparing anti-glare glass according to claim 15, characterized in that: The difference between the maximum center distance and the minimum center distance of adjacent non-through holes in the hole array is not less than 2 μm and not more than 20 μm.

18. The method for preparing anti-glare glass according to claim 15, characterized in that: The diameters of the non-through holes on the hole array are normally distributed or quasi-normally distributed with the average of a single maximum diameter and a single minimum diameter as the center value; Alternatively, the diameter size of the non-through holes on the hole array is divided into multiple equal parts with the maximum diameter size and the minimum diameter size as endpoint values, and the number of the non-through holes in each of the equal parts has the same proportion as the number of the non-through holes on the hole array.

19. The method for preparing anti-glare glass according to claim 15, characterized in that: The hole array includes: adjacent non-through holes have the same diameter.

20. The method for preparing anti-glare glass according to claim 15, characterized in that: The hole array includes: the center distances between adjacent non-through holes are the same.

21. The method for preparing anti-glare glass according to claim 15, characterized in that: The center distances of adjacent non-through holes in the hole array are normally distributed or quasi-normally distributed with the average of the single maximum center distance and the single minimum center distance as the center value; Alternatively, the center distances of adjacent non-through holes on the hole array are divided into multiple equal parts with the maximum center distance and the minimum center distance as endpoint values, and the number of center distances in each equal part has the same proportion as the number of center distances on the hole array.

22. The method for preparing anti-glare glass according to claim 15, characterized in that: The laser etching etches to a depth of 0.5-30 μm for the particles, and a maximum depth of 5-30 μm for the particles.

23. The method for preparing anti-glare glass according to claim 22, characterized in that: The chemical polishing further includes polishing the glass substrate until the depth size of the particles is in the range of 0.3-25 μm, the difference between the maximum depth size and the minimum depth size of the particles is 1-15 μm, the diameter size of the particles is in the range of 15-150 μm, and the difference between the maximum diameter size and the minimum diameter size of the particles is 3-70 μm.

24. The method for preparing anti-glare glass according to claim 14, characterized in that: When the diameters of any of the non-through holes in the hole array are the same, and the center distances between adjacent non-through holes are not completely the same, the diameter range of the through holes is 5-50 μm; The center distance between adjacent non-through holes is 15-120 μm; The difference between the maximum center distance and the minimum center distance between adjacent non-through holes in the hole array is not less than 2 μm.

25. The method for preparing anti-glare glass according to claim 24, characterized in that: The difference between the maximum center distance and the minimum center distance between adjacent non-through holes in the hole array is not less than 2 μm and not more than 20 μm.

26. The method for preparing anti-glare glass according to claim 24, characterized in that: The hole array further includes: the center distances between adjacent non-through holes are the same.

27. The method for preparing anti-glare glass according to claim 24, characterized in that: The center distances between adjacent non-through holes in the hole array are normally distributed or quasi-normally distributed with the average of the single maximum center distance and the single minimum center distance as the center value; Alternatively, the center distance between adjacent non-through holes on the hole array is divided into multiple equal parts with the maximum center distance and the minimum center distance as endpoint values, and the number of center distances in each equal part has the same proportion as the number of center distances on the hole array.

28. The method for preparing anti-glare glass according to claim 24, characterized in that: The laser etching is performed to etch the particles on the surface of the glass substrate to a depth of 5-30 μm.

29. The method for preparing anti-glare glass according to claim 28, characterized in that: The chemical polishing further includes polishing the glass substrate until the depth size of the particles is in the range of 0.3-25 μm, the diameter size of the particles is in the range of 15-150 μm, and the difference between the maximum diameter and the minimum diameter of the particles is in the range of 3-70 μm.

30. The method for preparing anti-glare glass according to any one of claims 14 to 29, characterized in that: The chemical polishing adopts an acidic polishing liquid; The acidic polishing liquid comprises, by weight, 8-12 parts of hydrofluoric acid, 8-12 parts of sulfuric acid, and 60-80 parts of deionized water.

31. The method for preparing anti-glare glass according to any one of claims 14 to 29, characterized in that: The chemical polishing adopts alkaline polishing liquid; The alkaline polishing liquid comprises, by weight, 45-60 parts of sodium hydroxide and 40-55 parts of deionized water. 32.An anti-glare glass, characterized in that: The anti-glare glass is manufactured by the preparation method of any one of claims 1 to 31.

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