piezoelectric element polarization equipment

Abstract

This invention discloses a piezoelectric element polarization device, relating to the field of piezoelectric element polarization technology. The device includes a turntable and a loading mechanism. The turntable has loading / unloading stations, a preheating station, and a polarization station sequentially distributed along a first direction on its circumference. The loading mechanism is fixed to the periphery of the turntable and is configured to load piezoelectric elements. The turntable is configured to drive the loading mechanism to rotate along the first direction, allowing the piezoelectric element to traverse all the stations distributed along the turntable's circumference. The technical solution provided by this invention aims to achieve a compact layout for the piezoelectric element polarization device, thereby reducing its requirements for installation space.

Description

Technical Field

[0001] This invention relates to the field of piezoelectric element polarization technology, and particularly to a piezoelectric element polarization device. Background Technology

[0002] In the manufacturing process of piezoelectric elements, the polarization process is a key step that determines their piezoelectric properties. It typically involves heating the element to near its Curie temperature, applying a DC high-voltage electric field, and then slowly cooling it. Existing automated polarization equipment mostly uses a chain-driven feeding method, which has drawbacks such as a large footprint and high requirements for the installation site. Summary of the Invention

[0003] The main objective of this invention is to provide a piezoelectric element polarization device that achieves a compact layout, thereby reducing its requirements for installation site.

[0004] To achieve the above objectives, the piezoelectric element polarization device proposed in this invention includes:

[0005] A turntable, wherein loading / unloading stations, a preheating station, and a polarization station are sequentially distributed along a first direction on its circumference; and

[0006] A loading mechanism is fixed to the periphery of the turntable. The loading mechanism is configured to load piezoelectric elements. The turntable is configured to drive the loading mechanism to rotate along the first direction, so that the piezoelectric elements can traverse each station distributed around the circumference of the turntable.

[0007] In one embodiment, the preheating station is equipped with a preheating box, which has two openings that are relatively distributed in the first direction and a clearance opening that connects the two openings at both ends. The openings and the clearance opening are used to avoid the loading mechanism. The preheating box is provided with a sealing brush to cover the clearance opening and the opening.

[0008] In one embodiment, the preheating box is disposed above and spaced apart from the turntable, the clearance opening is disposed on the lower side of the preheating box, and the loading mechanism includes a mounting bracket protruding above the turntable, the clearance opening being used to avoid the mounting bracket.

[0009] In one embodiment, the preheating box is in the shape of an arc extending along the first direction.

[0010] In one embodiment, the preheating box is connected to a heating gas source.

[0011] In one embodiment, the loading mechanism includes a first polarizing device with a plurality of positioning holes on its upper side. One of the positioning holes is used to load a piezoelectric element. The first polarizing device has a first probe extending upward into the positioning hole. A second polarizing device is mounted on the polarizing device, and the second polarizing device has a second probe extending downward.

[0012] In one embodiment, the piezoelectric element polarization device further includes an insulated box installed at the polarization position. The insulated box is connected to a heating gas source. The insulated box includes a first shell and a second shell spliced ​​together in the vertical direction. The first shell is vertically detachable, and the second polarization device is fixedly installed on the first shell.

[0013] In one embodiment, the first probe has a fixedly arranged needle tip whose cross-section is adapted to the cross-section of the piezoelectric element. The needle tip is provided with multiple claws corresponding to one of the piezoelectric elements. The second polarization device is provided with multiple second probes, which are configured as elastic probes.

[0014] In one embodiment, cooling stations are also distributed around the circumference of the turntable, and the loading / unloading stations, the preheating stations, the polarization stations, and the cooling stations are distributed sequentially along the first direction.

[0015] In one embodiment, a plurality of loading mechanisms are distributed circumferentially on the turntable. When one loading mechanism is stationed at the loading / unloading station, a plurality of loading mechanisms are stationed at the preheating station, and a loading mechanism is stationed at each of the polarization station and the cooling station.

[0016] In one embodiment, a feed hopper and a feeding device are provided upstream of the turntable, and a discharge hopper and a discharge device are provided downstream of the turntable.

[0017] In one embodiment, the piezoelectric element polarization device further includes a positioning device capable of forming a positioning groove for positioning and engaging the piezoelectric element;

[0018] The positioning device includes a first positioning device located downstream of the feed hopper and upstream of the turntable. The feeding device includes a first feeding device and a second feeding device. The first feeding device is used to transfer the piezoelectric element from the feed hopper to the first positioning device, and the second feeding device is used to transfer the piezoelectric element from the first positioning device to the loading mechanism of the loading and unloading station.

[0019] And / or, the positioning device includes a second positioning device located downstream of the turntable and upstream of the discharge bin, the discharge device includes a first discharge device and a second discharge device, the first discharge device is used to transfer the polarized element from the loading mechanism of the loading / unloading station to the second positioning device, and the second discharge device is used to transfer the polarized element from the second positioning device to the discharge bin.

[0020] In this invention, the functional workstations are arranged in an orderly manner along the circumference of the turntable, and the orderly flow between workstations is achieved through the continuous or intermittent rotation of the turntable. Benefiting from the closed nature of the circular layout, the loading and unloading workstations serve dual functions, acting as both the starting and ending points of the processing cycle. This achieves a high degree of workstation integration, effectively reducing the total number of workstations and thus reducing the overall size and cost of the equipment. Compared to the linear workstation arrangement used in traditional chain-driven feeding methods, the circumferential layout of this solution significantly improves space utilization efficiency, making the equipment structure more compact, greatly reducing the floor space required, and lowering the space requirements for the installation site. Simultaneously, the continuous or quasi-continuous operation mode of the turntable improves the smoothness of process connections, which is beneficial for improving polarization efficiency and product consistency. Attached Figure Description

[0021] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on the structures shown in these drawings without creative effort.

[0022] Figure 1 This is a top view schematic diagram of an embodiment of the piezoelectric element polarization device provided by the present invention;

[0023] Figure 2 for Figure 1 A schematic diagram of the piezoelectric element polarization device from another perspective;

[0024] Figure 3 for Figure 2 A magnified view of a section at point A in the middle;

[0025] Figure 4 for Figure 2 A magnified view of a section at point B in the middle;

[0026] Figure 5 for Figure 2 A magnified view of a section at point C;

[0027] Figure 6 This is a partial structural schematic diagram of an embodiment of the piezoelectric element polarization device provided by the present invention;

[0028] Figure 7 In order to be in Figure 6 A structural diagram after removing some of the original structure;

[0029] Figure 8 for Figure 6 A schematic diagram of the structure of an embodiment of the preheating box;

[0030] Figure 9 for Figure 8 A schematic diagram of the preheating box after removing the sealing brush;

[0031] Figure 10 for Figure 6 A schematic diagram of the device at the Zhongji Chemical Plant.

[0032] Figure 11 for Figure 10 Schematic diagram of the cross-sectional structure along DD;

[0033] Figure 12 for Figure 6 A schematic diagram of the assembly structure of the first-stage chemical equipment in the process;

[0034] Figure 13 for Figure 12 A schematic diagram of the explosion structure of the first-stage chemical equipment in the process;

[0035] Figure 14 for Figure 12 A cross-sectional structural diagram of the first-stage chemical equipment in the process;

[0036] Figure 15 for Figure 14 A magnified view of the area to the left of the dashed line;

[0037] Figure 16 for Figure 13 A schematic diagram of the structure from the first probe's perspective;

[0038] Figure 17 for Figure 13 A schematic diagram of the structure of the first probe from another perspective.

[0039] Explanation of icon numbers:

[0040] 1. Loading and unloading station; 2. Preheating station; 3. Polarizing station; 4. Cooling station;

[0041] 10. Turntable; 11. Clearance hole;

[0042] 20. Loading mechanism; 21. Mounting bracket; 22. First-stage chemical equipment;

[0043] 30. Preheating box; 31. Passageway; 32. Clearance opening;

[0044] 40. Second polarization apparatus; 41. Second probe;

[0045] 50. Insulated box; 51. First box shell; 52. Second box shell;

[0046] 60. Cooling box;

[0047] 71. Mounting platform; 72. Support frame; 721. Support arm; 73. Sealing brush;

[0048] 801. First positioning device; 802. Second positioning device; 81. Positioning groove; 82. Tooling plate;

[0049] 91. Feed hopper; 92. First feeding device; 93. Second feeding device; 94. Discharge hopper; 95. First discharge device; 96. Second discharge device;

[0050] 100. Pad; 110. Clearance hole; 111. Third hole section; 112. Fourth hole section; 113. Second step surface;

[0051] 200. Circuit board; 210. Mounting hole;

[0052] 300. Positioning plate; 310. Positioning hole; 311. First hole section; 312. Second hole section; 313. First step surface;

[0053] 400, First probe; 410, Needle tip; 411, Claw head; 420, Needle body; 430, Third step surface; 440, Vent hole.

[0054] The realization of the objective, functional features and advantages of the present invention will be further explained in conjunction with the embodiments and with reference to the accompanying drawings. Detailed Implementation

[0055] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of the present invention.

[0056] It should be noted that if the embodiments of the present invention involve directional indicators (such as up, down, left, right, front, back, etc.), the directional indicators are only used to explain the relative positional relationship and movement of the components in a specific posture. If the specific posture changes, the directional indicators will also change accordingly.

[0057] Furthermore, if the embodiments of this invention involve descriptions such as "first" or "second," these descriptions are for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined with "first" or "second" may explicitly or implicitly include at least one of those features. Additionally, the use of "and / or" or "and / or" throughout the text includes three parallel solutions. For example, "A and / or B" includes solution A, solution B, or a solution where both A and B are satisfied simultaneously. Furthermore, the technical solutions of the various embodiments can be combined with each other, but this must be based on the ability of those skilled in the art to implement them. When the combination of technical solutions is contradictory or impossible to implement, it should be considered that such a combination of technical solutions does not exist and is not within the scope of protection claimed by this invention.

[0058] This invention proposes a piezoelectric element polarization device.

[0059] Please see Figures 1 to 3 and Figure 6 In one embodiment of the present invention, the piezoelectric element polarization device includes:

[0060] Turntable 10, wherein the turntable 10 has, along a first direction, sequentially distributed a loading / unloading station 1, a preheating station 2, and a polarization station 3; and

[0061] The loading mechanism 20 is fixed to the periphery of the turntable 10. The loading mechanism 20 is configured to load piezoelectric elements. The turntable 10 is configured to drive the loading mechanism 20 to rotate along the first direction, so that the piezoelectric elements can traverse each station distributed around the turntable 10.

[0062] Specifically, taking one processing cycle as an example, the starting position of the loading mechanism 20 is the loading / unloading station 1. At this station, the unpolarized piezoelectric element is transferred to the loading mechanism 20, that is, the loading process is performed at the loading / unloading station 1. Then, the turntable 10 rotates, and the loading mechanism 20, loaded with the unpolarized element, reaches the preheating station 2. The unpolarized element is heated by appropriate means to bring it close to the Curie temperature, preparing it for polarization. Next, the turntable 10 continues to rotate, and the preheated unpolarized element is carried by the loading mechanism 20 to the polarization station 3. Here, a DC high-voltage electric field is applied to achieve directional polarization of the piezoelectric properties. The loading mechanism 20 brings the polarized piezoelectric element loaded on it back to the loading / unloading station 1. At this station, the polarized element is transferred from the loading mechanism 20, that is, the unloading process is performed at the loading / unloading station 1, thus completing one processing cycle. It is understandable that after the polarized components are transferred, the loading mechanism 20 will remain at the loading / unloading station 1, waiting for the unpolarized components to be loaded, and then the loading process will be performed at the loading / unloading station 1.

[0063] In this invention, the functional workstations are arranged in an orderly manner along the circumference of the turntable 10, and the orderly flow between workstations is achieved through the continuous or intermittent rotation of the turntable 10. Benefiting from the closed nature of the circular layout, the loading and unloading workstation 1 serves as both the starting and ending point of the processing cycle, achieving a high degree of workstation integration, effectively reducing the total number of workstations, and thus reducing the overall size and cost of the equipment. Compared to the linear workstation arrangement used in traditional chain-driven feeding methods, the circumferential layout of this solution significantly improves space utilization efficiency, making the equipment structure more compact, greatly reducing the floor space required, and lowering the space requirements for the installation site. Simultaneously, the continuous or quasi-continuous operation mode of the turntable improves the smoothness of process connections, which is beneficial for improving polarization efficiency and product consistency.

[0064] In one implementation, please refer to Figure 6 The turntable 10 also has cooling stations 4 distributed around its circumference. The loading / unloading station 1, the preheating station 2, the polarization station 3, and the cooling station 4 are sequentially distributed along the first direction. That is, the polarized piezoelectric element first passes through the cooling station 4 before reaching the loading / unloading station 1 for unloading. Specifically, after the loading mechanism 20 carries the polarized piezoelectric element away from the polarization station 3, it rotates with the turntable 10 into the cooling station 4. During this process, the piezoelectric element achieves a slow and uniform cooling from near the Curie temperature in a controlled cooling environment (such as forced air cooling or a natural cooling channel). This cooling process is a key component of the polarization process, helping to stabilize the domain orientation and improve the consistency and reliability of piezoelectric performance. Integrating the cooling station 4 into the circumferential process chain of the turntable 10 realizes a continuous, integrated operation from loading, preheating, polarization to cooling, avoiding the mid-process transfer of the polarized element, reducing heat loss and external interference, and improving the process closed-loop and automation level. Meanwhile, the orderly arrangement of cooling stations 4 maintains the symmetry and rhythm matching of the turntable 10 layout, which is conducive to the stable operation of the equipment and the improvement of production capacity.

[0065] In other embodiments, the cooling station 4 can also be located downstream of the loading / unloading station 1. That is, after polarization is completed, the components are first unloaded to an external conveyor line or buffer area, and then subjected to independent cooling. This solution is suitable for scenarios with long cooling cycles or requiring special environmental control, and offers greater process flexibility. Both layout options can be flexibly selected based on actual production cycle time and space requirements, balancing efficiency, performance, and equipment adaptability.

[0066] Specifically, cooling station 4 is equipped with a cooling box 60. The cooling box 60 can be circulated with ambient air at room temperature or other gases at other temperatures to force convection heat exchange with the piezoelectric element. The cooling box 60 needs to be provided with a channel for the loading mechanism 20 to pass through. To ensure the cooling effect and avoid interference from external airflow or leakage of internal airflow, the opening of this channel can be sealed with a sealing brush 73. In other embodiments, the piezoelectric element can also be cooled by liquid cooling or other methods.

[0067] In one implementation, please refer to Figure 7 The turntable 10 has multiple loading mechanisms 20 distributed circumferentially. When one loading mechanism 20 is stationed at the loading / unloading station 1, multiple loading mechanisms 20 are correspondingly stationed at the preheating station 2, and one loading mechanism 20 is correspondingly stationed at each of the polarization station 3 and the cooling station 4. The layout design in this embodiment fully considers the differences in the time required for each process stage. The preheating process usually takes a long time, and it is necessary to ensure that the piezoelectric element is fully and uniformly heated to near the Curie temperature. Therefore, multiple loading mechanisms 20 are set up at the preheating station 2 to heat simultaneously, which is equivalent to extending the dwell time of the effective heating zone, meeting the process thermal response requirements, and avoiding a reduction in the overall cycle time due to excessive dwell time at a single station. The polarization and cooling processes are relatively short, and one loading mechanism 20 is sufficient to meet the process cycle matching and achieve cycle time balance between processes.

[0068] The distributed configuration of multiple loading mechanisms 20 on the turntable 10, which rotates intermittently, enables a highly efficient operation mode of "multi-station parallel processing and single-station sequential flow." Specifically, the rotation time interval of the turntable 10 is sufficient to allow for the unloading of polarized components and the loading of unpolarized components at loading / unloading station 1, and to allow the piezoelectric components to complete polarization at polarization station 3 and cooling at cooling station 4. Piezoelectric components entering preheating station 2 require multiple rotations of the turntable 10 before leaving, thus ensuring prolonged heating at preheating station 2 and guaranteeing effective heating of the piezoelectric components. The number of loading mechanisms 20 corresponding to preheating station 2 can be 2, 3, 4, or 5, depending on actual requirements.

[0069] In one implementation, please refer to Figures 6 to 9 The preheating station 2 is equipped with a preheating box 30. The preheating box 30 has two openings 31 that are relatively distributed in the first direction and a clearance opening 32 that connects the two openings 31 at both ends. The openings 31 and the clearance opening 32 are used to avoid the loading mechanism 20. The preheating box 30 is provided with a sealing brush 73 to cover the clearance opening 32 and the opening 31.

[0070] It is understood that the clearance opening 32 is located on the wall of the preheating chamber 30 and communicates with the inner cavity of the preheating chamber 30. When the turntable 10 drives the loading mechanism 20 to rotate to the preheating station 2, the loading mechanism 20 enters the preheating chamber 30 through the side opening 31. The piezoelectric element carried on it then enters the inner cavity of the preheating chamber 30 and is uniformly heated to near the Curie temperature under the action of the hot air circulation system or the built-in heating element, completing the preheating preparation before polarization. During the process of the loading mechanism 20 passing through the interior of the preheating chamber 30, the clearance opening 32 provides sufficient space for its movement path to avoid interference with the movement of the loading mechanism 20 and ensure smooth and stable operation. After heating is completed, the loading mechanism 20 leaves the preheating chamber 30 through the other side opening 31 and continues to rotate to the next station.

[0071] In the non-passing state, the sealing brush 73 effectively seals the passage 31 and the avoidance opening 32 through its fine and soft bristle structure, significantly reducing the leakage of hot air inside the chamber and inhibiting the intrusion of cold air from the outside. This maintains the uniformity and stability of the temperature field inside the preheating chamber 30, improves thermal efficiency, and reduces energy consumption. When the loading mechanism 20 passes through, the sealing brush 73 can be flexibly pushed open, allowing the relevant structures to pass smoothly with minimal motion resistance, not affecting the continuous operation of the turntable 10. At the same time, the sealing brush 73 can still maintain close contact with the relevant structures under elastic recovery, continuously providing a certain degree of sealing effect during dynamic processes, further enhancing the thermal insulation performance. This sealing structure takes into account both thermal efficiency and motion reliability, which is beneficial to improving the stability and consistency of the polarization process.

[0072] Specifically, the preheating box 30 is connected to a heating gas source, through which high-temperature gas is generated and introduced into the preheating box 30. Correspondingly, ventilation channels are provided in multiple locations within the preheating box 30, so that the high-temperature gas can be evenly distributed within the preheating box 30, thereby ensuring a uniform temperature field within the preheating box 30. The heating gas source can be a combination of a blower and a heating device or a gas compression device.

[0073] In one embodiment, please refer to the following: Figures 6 to 9 The preheating box 30 is disposed above and spaced apart from the turntable 10. The clearance opening 32 is disposed on the lower side of the preheating box 30. The loading mechanism 20 includes a mounting bracket 21 protruding above the turntable 10, and the clearance opening 32 is used to avoid the mounting bracket 21. It should be noted that the up and down directions mentioned in this invention are all relative to the ground. The direction facing the ground is downward, that is, the side of the relevant structure facing the ground corresponds to its lower side, and the direction away from the ground is upward, that is, the side of the relevant structure away from the ground corresponds to its upper side.

[0074] In this embodiment, the preheating box 30 does not need to enclose the turntable 10; the turntable 10 is located outside the preheating box 30, effectively avoiding the long-term thermal impact of high temperature on the turntable 10 body and drive components, thus improving the stability and service life of the equipment. Simultaneously, it avoids heat waste caused by the preheating box 30 heating the turntable 10. The mounting bracket 21 has a relatively small volume, and by controlling the protrusion height of the mounting bracket 21 and the spacing between the preheating box 30 and the turntable 10, the height ratio of the mounting bracket 21 entering the preheating box 30 can be controlled, which is beneficial for improving thermal energy utilization efficiency and reducing energy consumption. In other embodiments, the outer periphery of the turntable 10 can also have a self-avoiding opening 32 inserted into the preheating box 30; in this case, the opening 32 is used to avoid the turntable 10.

[0075] In one implementation, please refer to Figure 6 The preheating box 30 is arc-shaped, extending along the first direction. This arc-shaped structure of the preheating box 30 is highly matched with the rotational trajectory of the turntable 10, ensuring smooth and interference-free operation of the loading mechanism 20 during its passage. Preferably, the central angle of the preheating box 30 is greater than 90 degrees, but can be less than or greater than 180 degrees. That is, the preheating box 30 occupies a large angular range around the turntable 10, thereby extending the effective residence time of the loading mechanism 20 and its supported piezoelectric elements within the preheating box 30. Since the polarization process requires the elements to be uniformly heated to near the Curie temperature and maintained for a sufficient time to achieve thermal equilibrium, a longer preheating time is crucial to ensuring polarization quality. By setting a large-angle arc-shaped preheating box 30, the heating stroke is significantly extended without increasing the overall size of the equipment, allowing multiple loading mechanisms 20 to be simultaneously within the preheating area, achieving batch continuous heating, and improving thermal energy utilization efficiency and process stability. In other embodiments, the central angle corresponding to the preheating box 30 may also be less than or equal to 90 degrees, as long as the preheating requirements are met.

[0076] In one implementation, please refer to Figure 6 and Figure 12The loading mechanism 20 includes a first electrode assembly 22, with multiple positioning holes 310 on its upper side. One positioning hole 310 is used to load a piezoelectric element. The first electrode assembly 22 has a first probe 400 extending upward into the positioning hole 310. The electrode assembly 3 is equipped with a second electrode assembly 40, which has a second probe 41 extending downward. It can be understood that when the loading mechanism 20 rotates with the turntable 10 and is positioned at the electrode assembly 3, the first electrode assembly 22 is directly below the second electrode assembly 40, and the two are precisely aligned vertically. At this time, the piezoelectric element is clamped between the first probe 400 and the second probe 41, with its lower surface reliably in contact with the first probe 400 in the first electrode assembly 22, and its upper surface in close contact with the second probe 41 extending downward from the second electrode assembly 40, forming a stable upper and lower electrode connection. The high-voltage DC output from the high-voltage power supply is input via the second probe 41, passes through the piezoelectric element body, and is then output via the first probe 400, forming a complete polarization current loop. In other embodiments, the polarization electrode 3 may have two polarization devices that are relatively distributed in the vertical direction.

[0077] In one implementation, please refer to Figure 6 , Figure 10 and Figure 11 The piezoelectric element polarization device further includes a heat-insulating box 50 installed at the polarization station 3. The heat-insulating box 50 is connected to a heating gas source. The heat-insulating box 50 includes a first shell 51 and a second shell 52 spliced ​​together in the vertical direction. The first shell 51 is vertically movable, and the second polarization device 40 is fixedly installed on the first shell 51. Thus, by introducing high-temperature gas into the heat-insulating box 50, the temperature of the piezoelectric element can be maintained, thereby ensuring the polarization effect. In other embodiments, a heating lamp can also be installed at the polarization station 3.

[0078] It is understood that before the loading mechanism 20 rotates to the polarization position 3, the first housing 51 should be raised to avoid interference with the loading mechanism 20 and also to avoid interference between the second probe 41 and the piezoelectric element. After the loading mechanism 20 reaches the polarization position 3, the first housing 51 is lowered until the first housing 51 and the second housing 52 are joined together, and at the same time, the second probe 41 will also abut against the upper surface of the piezoelectric element. In other embodiments, the second polarization device 40 may also be vertically and vertically mounted inside the insulation box 50.

[0079] It should be noted that the side of the lower box shell should be provided with a passage to allow the loading mechanism 20 to enter and exit. In order to improve the insulation effect of the insulated box 50, a sealing brush 73 can be installed to cover the passage, and at the same time cover the joint between the first box shell 51 and the second box shell 52.

[0080] In one embodiment, the first probe 400 has a fixedly disposed needle head 410, the cross-section of the needle head 410 being adapted to the cross-section of the piezoelectric element, and the needle head 410 having a plurality of claw heads 411; corresponding to one of the piezoelectric elements, the second polarizing apparatus 40 is configured with a plurality of second probes 41, and the second probes 41 are configured as elastic probes.

[0081] Specifically, the lower first probe 400 is fixedly mounted on the first polarization device 22 of the loading mechanism 20, and the size of its needle 410 is adapted to the size of the piezoelectric element, that is, it is relatively close. It can provide good support for the piezoelectric element through multiple claws 411 and form a multi-point distributed contact for the piezoelectric element. This significantly reduces the risk of local contact failure caused by minor unevenness, oxidation or contamination on the surface of the piezoelectric element. Even if some claws 411 fail to conduct completely, the remaining claws 411 can still maintain an effective electrical connection, thereby greatly improving the overall conductivity yield and effectively avoiding the problem of insufficient or uneven polarization caused by poor contact, which is conducive to improving the polarization yield of the piezoelectric element. The upper second probe 41 is configured as a retractable elastic probe, which can be compressed axially when in contact with the piezoelectric element. Through the adaptive deformation of multiple second probes 41 at different positions of the same piezoelectric element, it is ensured that each second probe 41 can maintain a tight fit with the upper surface of the piezoelectric element, ensuring that the high voltage electric field is stably applied throughout the polarization process.

[0082] In other embodiments, both the first probe 400 and the second probe 41 may be configured as elastic probes.

[0083] In one implementation, please refer to Figure 2 and Figure 3 The piezoelectric element polarization device is equipped with a mounting platform 71, on which a turntable 10 is rotatably mounted. A clearance hole 11 is provided in the central area of ​​the turntable 10. A support frame 72 is inserted upwards through the clearance hole 11 and fixedly connected to the mounting platform 71. The support frame 72 includes multiple support arms 721 radially distributed along the circumference, providing structural support for the relevant devices at at least one of the preheating station 2, polarization station 3, and insulation station. By arranging the support arms 721 within the inner space of the turntable 10, the unused space in the central area of ​​the turntable 10 is fully utilized, avoiding additional occupation of the surrounding installation area and effectively improving space utilization.

[0084] Specifically, the lower shell of the insulation box 50 is supported by one support arm 721, and the preheating box 30 is supported by multiple support arms 721. Furthermore, a support structure can be set on the outer periphery of the turntable 10 to support the outer periphery of the preheating box 30. Combined with the support of the support arms 721 on the inner periphery of the preheating box 30, the installation stability of the preheating box 30 can be guaranteed. This helps to suppress the deformation or displacement of the preheating box 30 caused by equipment operation vibration or thermal expansion and contraction, ensure the relative positional accuracy between the preheating box 30 and the loading mechanism 20, and ensure the adhesion effect of the sealing brush 73 and the smoothness of the loading mechanism 20 passing through the avoidance channel.

[0085] In one implementation, please refer to Figures 12 to 15 The first polarization device 22 includes a pad 100, a circuit board 200, and a positioning plate 300 stacked sequentially along a second direction. The positioning plate 300 has multiple positioning holes 310. The side of the positioning holes 310 facing away from the circuit board 200 is used for placing piezoelectric elements. Multiple first probes 400 are mounted on the circuit board 200 and electrically connected to the circuit of the circuit board 200. Each first probe 400 includes a needle 410, and the needles 410 of the multiple first probes 400 are inserted one-to-one into the multiple positioning holes 310. The side of the needle 410 facing away from the circuit board 200 has multiple claws 411. It can be understood that the pad 100 is mounted on the mounting bracket 21, and the second direction is the direction facing away from the mounting bracket 21, that is, the upward direction. The piezoelectric element can be a piezoelectric ceramic, a ferroelectric single crystal, or a ferroelectric polymer. The stacked pad 100, circuit board 200, and positioning plate 300 can be fixed by fasteners.

[0086] By setting up a stacked structure of pad 100, circuit board 200 and positioning plate 300, the pad 100 provides support, the positioning plate 300 restricts the relative position between the needle 410 of the first probe 400 and the piezoelectric element to be polarized, and the circuit board 200 provides external power, that is, voltage can be applied to the piezoelectric element through the first probe 400. The multiple positioning holes 310 on the positioning plate 300 are aligned one-to-one with the needles 410 of the multiple piezoelectric elements and the multiple first probes 400, ensuring that each first probe 400 can be precisely aligned with its corresponding piezoelectric element, thereby ensuring that all claws 411 can abut against the piezoelectric element. The pad 100 can provide support for the first probe 400 directly or indirectly in the second direction, ensuring that all claws 411 on the first probe 400 are at the same height, thereby ensuring that all claws 411 can apply pressure synchronously and uniformly when in contact with the piezoelectric element.

[0087] The claw head 411 should be a conical structure, with its tip used to contact the surface of the piezoelectric element. The conical tip design generates higher pressure per unit area when contact pressure is applied, which helps to pierce any oxide layer or contaminants that may be present on the surface of the piezoelectric element, achieving direct conductive contact between conductors. This effectively reduces the overall contact resistance, ensures the stable application of the high-voltage electric field, and improves the reliability and uniformity of the polarization process. The claw head 411 can be a conical, triangular pyramid, or square pyramidal polygonal conical structure. Multiple claw heads 411 can be distributed in a rectangular array on the surface of the needle head 410, or arranged in multiple ring arrays.

[0088] In one implementation, please refer to Figure 15 The positioning hole 310 includes a first hole segment 311 and a second hole segment 312 connected by a first stepped surface 313. The cross-section of the first hole segment 311 is larger than the cross-section of the second hole segment 312. When both the first hole segment 311 and the second hole segment 312 are configured as circular holes, the diameter of the first hole segment 311 is larger than the diameter of the second hole segment 312. The first hole segment 311 is used to place the piezoelectric element, and the needle 410 is inserted into the second hole segment 312. That is, in the second direction, the second hole segment 312 and the first hole segment 311 will be distributed sequentially. The first hole segment 311 is located on the side away from the circuit board 200. After the piezoelectric element is placed, it can be supported by the first stepped surface 313. Especially in polarization fixtures, the piezoelectric element will also be subjected to pressure from the probe of another fixture on this side. The support of the piezoelectric element by the first stepped surface 313 can well ensure the structural stability of the piezoelectric element, thereby ensuring the reliability of the polarization process and the consistency of the process. In other embodiments, the piezoelectric element itself may form a stepped structure that mates with the positioning hole 310.

[0089] In one embodiment, the height of the first probe 400 is less than or equal to 4 mm. It can be understood that the height of the first probe 400 is also its extension length along the second direction. Within this range, the height of the first probe 400 shortens the conductive path, enhances its structural rigidity and bending resistance, and allows it to withstand mechanical pressure and electric field force during polarization under a high-voltage electric field. It is less prone to bending, tilting, or vibration under pressure, thus ensuring the stability and perpendicularity of the contact between the first probe 400 and the piezoelectric element. This prevents uneven contact pressure or displacement caused by deformation of the first probe 400, ensuring the polarization yield of the piezoelectric element and extending its service life. Simultaneously, it also helps reduce the thickness of the polarization fitting, reducing the space occupied by the polarization fitting. Preferably, the height of the first probe 400 is greater than or equal to 1 mm. That is, the height of the first probe 400 can be 1 mm, 1.5 mm, 2 mm, 2.5 mm, 3 mm, 3.5 mm, or 4 mm, etc. In other embodiments, the height of the first probe 400 may also be 0.8 mm, 4.5 mm, 5 mm, or 5.5 mm, etc.

[0090] In one embodiment, the outer periphery of the first probe 400 is circular, and the diameter of the cross-section of the needle tip 410 is 5 mm to 8 mm. This ensures that the needle tip 410 has sufficient structural strength to support multiple claw tips 411, while also providing a sufficient surface area to distribute a larger number of claw tips 411, thereby guaranteeing the polarization yield of the piezoelectric element and the service life of the first probe 400. The diameter of the cross-section of the needle tip 410 can be 5 mm, 5.5 mm, 6 mm, 6.5 mm, 7 mm, 7.5 mm, or 8 mm, etc.

[0091] In other embodiments, the outer periphery of the first probe 400 can also be configured as a polygon or an ellipse, and the diameter of the cross-section of the needle 410 can be 4mm, 4.5mm, 8.5mm, or 9mm, etc. The shape of the outer periphery of the first probe 400, mainly the outer periphery of the needle 410, can be adapted to the outer periphery of the piezoelectric element, and the shape of the cross-sectional profile of the positioning hole 310 is also adapted accordingly. It is not limited to a circular shape, but can also be a polygonal shape, and the size can also be adapted to ensure the polarization effect.

[0092] In one embodiment, the number of claws 411 corresponding to one needle 410 is greater than or equal to 10. This allows for the formation of a high-density array of claws 411, which, upon contact with the piezoelectric element, facilitates the formation of a dense conductive network on the surface of the piezoelectric element. Even if the surface of the piezoelectric element has small particles, localized oxidation, or slight warping, the large number of redundant contact points ensures stable current introduction, greatly improving the uniformity and integrity of the applied electric field, and thus improving the polarization yield of the piezoelectric element. The number of claws 411 on one needle 410 can be 10, 15, 20, 25, 30, etc. In other embodiments, it can also be configured as 8, 35, 40, etc.

[0093] In one implementation, please refer to Figures 15 to 17 The first probe 400 is provided with a vent 440 extending along the second direction, and the pad 100 is provided with a plurality of clearance holes 110 extending along the second direction. A vent 440 of the first probe 400 is correspondingly connected to a clearance hole 110. After the piezoelectric element enters the high-temperature gas environment, the side of the piezoelectric element facing away from the pad 100 is naturally exposed outside the positioning hole 310, making it easily heated by the high-temperature gas. The high-temperature gas passes sequentially through the clearance hole 110, the vent 440, and the second hole segment 312 of the positioning hole 310, reaching the side of the piezoelectric element near the pad 100, thereby heating that side of the piezoelectric element. This allows for uniform and efficient heating of the piezoelectric element. Furthermore, as the high-temperature gas flows through the vent 440, it also heats the first probe 400, making the first probe 400 itself a heat conduction medium. This not only helps maintain the temperature stability of the contact interface between the first probe 400 and the piezoelectric element, reducing the temperature gradient caused by heat loss, but also improves the thermal uniformity of the entire contact area, preventing local overcooling or overheating, and further ensuring the consistency of polarization quality. In other embodiments, the relevant structures of the first polarization device 22 (pad 100, positioning plate 300, etc.) can also be configured with highly thermally conductive materials, which can efficiently conduct the heat of the high-temperature gas to the piezoelectric element.

[0094] In one implementation, please refer to Figure 15 The clearance hole 110 includes a third hole segment 111 and a fourth hole segment 112 connected by a second step surface 113. The cross-section of the third hole segment 111 is larger than the cross-section of the fourth hole segment 112. The first probe 400 is inserted into the third hole segment 111 and spaced apart from the second step surface 113. The vent hole 440 is opposite to the fourth hole segment 112.

[0095] It is understood that the third hole segment 111 and the fourth hole segment 112 are configured to correspond to the shape of the first probe 400. Both are circular holes, with the diameter of the third hole segment 111 being larger than the diameter of the fourth hole segment 112. This creates an annular second stepped surface 113 at their connection. A claw head 411 is positioned at one end of the first probe 400, and the other end of the first probe 400 is inserted into the third hole segment 111, spaced apart from the second stepped surface 113. The vent hole 440 and the fourth hole segment 112 are positioned opposite each other, allowing them to communicate. High-temperature gas flows into the vent hole 440 through the fourth hole segment 112, thus entering the interior of the first probe 400. The high-temperature gas can also enter the third hole segment 111, surrounding the periphery of the end of the first probe 400, thus fully heating the first probe 400. In other embodiments, the end face of the first probe 400 can directly abut against the second stepped surface 113.

[0096] In one embodiment, the diameter of the vent 440 is 1.5 mm to 2.5 mm. That is, the vent 440 is configured as a circular hole with a relatively smooth inner wall, which can avoid excessive resistance to the flow of high-temperature gas. The diameter of the vent 440 is within the range of this embodiment, which can ensure sufficient high-temperature gas supply flow and supply efficiency, thereby ensuring the polarization efficiency and polarization effect of the voltage element. The diameter of the vent 440 can be 1.5 mm, 2 mm, or 2.5 mm; in other embodiments, it can also be 1.2 mm, 2.8 mm, or 3 mm, etc.

[0097] In one embodiment, the needle 410 is fixed to the circuit board 200. That is, the first probe 400 is configured as a fixed first probe 400. In this way, the first polarization device 22 can be positioned below the piezoelectric element. After the claw 411 contacts the piezoelectric element, the supporting force of the pad 100 can be transmitted to the piezoelectric element through the needle 410, thereby supporting the piezoelectric element. This not only ensures the positional stability of the first probe 400 during energization and heating, but also avoids warping or deformation of the piezoelectric element due to uneven local force or insufficient support, helping to maintain good electrical contact and improving the reliability and consistency of the polarization process. In other embodiments, the first probe 400 can also be configured as an elastic first probe 400, that is, the needle 410 is connected to the needle body 420 or the circuit board 200 through an elastic structure such as a spring.

[0098] In one implementation, please refer to Figures 15 to 17The first probe 400 further includes a needle body 420, with the needle body 420 and the claw head 411 respectively disposed on opposite sides of the needle head 410. The needle body 420, the needle head 410, and the claw head 411 are integrally formed. The circuit board 200 has multiple mounting holes 210. Each first probe 400 is inserted into a mounting hole 210 through its needle body 420 and fixed to the mounting hole 210 by welding. In this embodiment, the first probe 400 adopts an integral forming process, ensuring that the needle body 420, the needle head 410, and the claw head 411 have continuous structure and uniform materials, eliminating the thermal resistance, poor electrical contact, and mechanical weak points that may occur with separate connections. This integral structure has excellent electrical conductivity, thermal conductivity, and mechanical strength, and is particularly suitable for high-temperature and high-pressure polarization environments. The needle body 420 is inserted into the mounting hole 210 of the circuit board 200 and fixed by soldering. The first probe 400, through the solder and the typical circuit diagram on the circuit board 200, not only achieves a low-resistance electrical connection but also forms a strong mechanical anchor, preventing the first probe 400 from loosening or shifting under thermal expansion and contraction or gas flow impact. In other embodiments, the first probe 400 may not have a needle body 420; the needle tip 410 may be directly mounted on the circuit board 200.

[0099] In one embodiment, the needle body 420 and the needle tip 410 are connected by a third stepped surface 430, which abuts against the side of the circuit board 200 opposite to the pad 100. When the outer periphery of the first probe 400 is circular, both the needle body 420 and the needle tip 410 are cylindrical, and the third stepped surface 430 at their connection is also correspondingly annular. The third stepped surface 430 can abut against the surface of the circuit board 200, or a stepped surface can be provided within the mounting hole 210 to abut against the third stepped surface 430, thereby providing a precise axial positioning reference for the first probe 400. After welding and fixing, the contact surface between the third stepped surface 430 and the circuit board 200 becomes an additional support surface, which helps to disperse the thermal stress and mechanical load borne by the first probe 400 during operation, improving the installation stability of the first probe 400 and the reliability of the overall tooling structure.

[0100] In one embodiment, the height ratio of the needle tip 410 to the needle body 420 is 0.3 to 0.5. Maintaining this height ratio, i.e., the needle tip 410 is lower, greatly reduces the risk of bending deformation and stress concentration, improves the overall rigidity and fatigue resistance of the first probe 400, and ensures long-term reliability. Simultaneously, the higher height of the needle body 420 provides sufficient insertion depth, allowing the first probe 400 to reliably engage with the mounting holes 210 of the circuit board 200 and the clearance holes 110 of the pad 100. A sufficiently strong solder joint can be formed between the needle body 420 and the circuit board 200, and the pad 100 can reliably support the first probe 400 through the contact between the second stepped surface 113 and the end face of the needle body 420. The height ratio of the needle tip 410 to the needle body 420 can be 0.3, 0.35, 0.4, 0.45, or 0.5. In other embodiments, the height ratio may also be 0.2, 0.25, 0.55, or 0.6.

[0101] In one embodiment, the diameter ratio of the cross-section of the needle tip 410 to the cross-section of the needle body 420 is 1.1 to 1.5. That is, the needle tip 410 and the needle body 420 are relatively uniform in thickness, which helps maintain the structural stability of the first probe 400. At the same time, the third step surface 430 formed at the connection between the two can also have an appropriate size, thereby ensuring the reliable contact between the third step surface 430 and the circuit board 200. Specifically, this diameter ratio can be 1.1, 1.2, 1.3, 1.4, or 1.5. In other embodiments, the diameter ratio can also be 1.05, 1.6, or 1.7.

[0102] In one implementation, please refer to Figure 1 and Figure 2 The turntable 10 has an upstream feed bin 91 and a feeding device, and a downstream discharge bin 94 and a discharge device. The feed bin 91 holds the element to be polarized, and the feeding device transfers the element from the feed bin 91 to the loading mechanism 20 of the loading / unloading station 1 of the turntable 10. The discharge bin 94 holds the polarized element, and the discharge device transfers the polarized element from the loading mechanism 20 of the loading / unloading station 1 of the turntable 10 to the discharge bin 94. It should be noted that the upstream and downstream locations in this invention refer to the sequence of the piezoelectric element production process, and do not limit the relative positions of the related devices. The related structures can be distributed around the turntable 10 or linearly distributed with the turntable 10.

[0103] Furthermore, the piezoelectric element polarization device also includes a positioning device, which forms a positioning groove 81 for positioning and engaging the piezoelectric element. The positioning device can be used during the feeding or discharging process to position the piezoelectric element through the positioning groove 81, thereby ensuring that the piezoelectric element maintains a stable position during transportation, and can be reliably placed in the accurate position at each station to ensure the reliable operation of related processes.

[0104] In one implementation, please refer to Figure 2 and Figure 4 The positioning device includes a first positioning device 801 located downstream of the feed hopper 91 and upstream of the turntable 10. The feeding device includes a first feeding device 92 and a second feeding device 93. The first feeding device 92 is used to transfer the piezoelectric element from the feed hopper 91 to the first positioning device 801, and the second feeding device 93 is used to transfer the piezoelectric element from the first positioning device 801 to the loading mechanism 20 of the loading / unloading station 1. It is understandable that after the unpolarized element is transported, the relative position of the piezoelectric element may be offset or misaligned. The first positioning device 801 can be equipped with two tooling plates 82, which are joined together to form a positioning groove 81. When the first feeding device 92 transfers the piezoelectric element, a certain distance can be maintained between the two tooling plates 82 so that the piezoelectric element can be located within the positioning groove 81. Then, the two tooling plates 82 move towards each other to join together to form the positioning groove 81, which can push the piezoelectric element so that it falls into the positioning groove 81. After that, the piezoelectric element picked up by the second feeding device 93 can be accurately aligned and placed in the positioning hole 310 on the upper side of the loading mechanism 20.

[0105] In one implementation, please refer to Figure 2 and Figure 5 The positioning device includes a second positioning device 802 located downstream of the turntable 10 and upstream of the discharge bin 94. The discharge device includes a first discharge device 95 and a second discharge device 96. The first discharge device 95 is used to transfer the polarized element from the loading mechanism 20 of the loading / unloading station 1 to the second positioning device 802, and the second discharge device 96 is used to transfer the polarized element from the second positioning device 802 to the discharge bin 94. The second positioning device 802, by forming positioning grooves 81 with multiple holes in the tooling plate 82, can meet the positioning requirements of the piezoelectric element. Furthermore, during discharge, the first discharge device 95 first transfers the polarized element to the second positioning device 802, which can serve as a buffer.

[0106] The above description is merely an exemplary embodiment of the present invention and does not limit the scope of protection of the present invention. Any equivalent structural transformations made based on the technical concept of the present invention and the contents of the specification and drawings of the present invention, or direct / indirect applications in other related technical fields, are included within the scope of protection of the present invention.

Claims

1. A piezoelectric element polarization device, characterized in that, include: The turntable has loading and unloading stations, a preheating station, and an polarization station distributed sequentially along the first direction on its circumference. as well as A loading mechanism is fixed to the periphery of the turntable. The loading mechanism is configured to load piezoelectric elements. The turntable is configured to drive the loading mechanism to rotate along the first direction, so that the piezoelectric elements can traverse each workstation distributed around the circumference of the turntable. The loading mechanism includes a first polarizing device, the upper side of which is provided with a plurality of positioning holes, one of which is used to load a piezoelectric element, the first polarizing device having a first probe extending upward into the positioning hole, and a second polarizing device being installed on the polarizing device, the second polarizing device having a second probe extending downward. The first probe has a fixedly set needle tip, the cross-section of which is adapted to the cross-section of the piezoelectric element, and the needle tip is provided with multiple claws; Corresponding to the piezoelectric element, the second electrode assembly is equipped with a plurality of second probes, and the second probes are configured as elastic probes.

2. The piezoelectric element polarization device as described in claim 1, characterized in that, The preheating station is equipped with a preheating box, which has two openings that are relatively distributed in the first direction and a clearance opening that connects the two openings at both ends. The openings and the clearance openings are used to avoid the loading mechanism. The preheating box is provided with a sealing brush to cover the clearance openings and the openings.

3. The piezoelectric element polarization device as described in claim 2, characterized in that, The preheating box is disposed above the turntable and spaced apart from the turntable, the clearance is disposed on the lower side of the preheating box, and the loading mechanism includes a mounting bracket protruding above the turntable, the clearance being used to avoid the mounting bracket; And / or, the preheating box is in the shape of an arc extending along the first direction; And / or, the preheating box is connected to a heating gas source.

4. The piezoelectric element polarization device as described in claim 1, characterized in that, The piezoelectric element polarization device also includes an insulated box installed at the polarization position. The insulated box is connected to a heating gas source. The insulated box includes a first shell and a second shell spliced ​​together in the vertical direction. The first shell is vertically adjustable, and the second polarization device is fixedly installed on the first shell.

5. The piezoelectric element polarization device as described in claim 1, characterized in that, Cooling stations are also distributed around the circumference of the turntable, and the loading / unloading stations, the preheating stations, the polarization stations, and the cooling stations are distributed sequentially along the first direction.

6. The piezoelectric element polarization device as described in claim 5, characterized in that, The turntable has multiple loading mechanisms distributed around its circumference. When one loading mechanism is stationed at the loading / unloading station, multiple loading mechanisms are stationed at the preheating station, and one loading mechanism is stationed at each of the polarization station and the cooling station.

7. The piezoelectric element polarization device according to any one of claims 1 to 6, characterized in that, The turntable is provided with a feeding bin and a feeding device upstream, and a discharging bin and a discharging device downstream.

8. The piezoelectric element polarization device as described in claim 7, characterized in that, The piezoelectric element polarization device also includes a positioning device, which can form a positioning groove for positioning and fitting the piezoelectric element; The positioning device includes a first positioning device located downstream of the feed hopper and upstream of the turntable. The feeding device includes a first feeding device and a second feeding device. The first feeding device is used to transfer the piezoelectric element from the feed hopper to the first positioning device, and the second feeding device is used to transfer the piezoelectric element from the first positioning device to the loading mechanism of the loading and unloading station. And / or, the positioning device includes a second positioning device located downstream of the turntable and upstream of the discharge bin, the discharge device includes a first discharge device and a second discharge device, the first discharge device is used to transfer the polarized element from the loading mechanism of the loading / unloading station to the second positioning device, and the second discharge device is used to transfer the polarized element from the second positioning device to the discharge bin.

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