Liquid supply arm, chemical mechanical polishing device and equipment

By designing the positioning mechanism and reset assembly of the liquid supply arm, the deviation of the swing arm from the working position is automatically corrected, which solves the problem of scattered polishing liquid dripping positions and improves the polishing effect and workpiece stability.

CN120755793APending Publication Date: 2025-10-10HWATSING TECHNOLOGY CO LTD
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Patent Information

Application Number
CN202510882962.2
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-12-19
Publication Date
2025-10-10

AI Technical Summary

Technical Problem

In the prior art, the polishing liquid supply arm is prone to causing the polishing liquid to drop in a dispersed position due to changes in the external environment or vibration of the machine, thereby affecting the stability and consistency of the polishing effect.

Method used

A liquid supply arm is designed, which includes a swing arm, a rotating shaft, a positioning mechanism and a reset assembly. The positioning mechanism automatically corrects the swing arm from deviating from the working position to ensure accurate delivery of polishing liquid.

Benefits of technology

It improves the dripping accuracy of the polishing liquid and the polishing effect of the workpiece, solves the problem of scattered polishing liquid dripping positions, and ensures the stability and consistency of the polishing process.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention provides a liquid supply arm, a chemical mechanical polishing device and equipment. The liquid supply arm comprises a swing arm and is used for conveying polishing liquid to the polishing pad; the swing arm is in contact connection with the rotating shaft and can rotate relative to the rotating shaft; the positioning mechanism is arranged on the swing arm and the rotating shaft and used for controlling the swing arm to be repositioned to the working position when the swing arm deviates from the working position; the working position is the position of the swing arm relative to the rotating shaft when the swing arm conveys polishing liquid to the polishing pad; the reset assembly is connected to the swing arm, and a contact end is formed on the reset assembly; the positioning piece is arranged between the rotating shaft and the swing arm and connected to the rotating shaft, the contact end of the reset assembly can slide relative to the positioning piece, the positioning piece is provided with a positioning groove, the swing arm is arranged at the working position when the contact end is arranged in the positioning groove, and the reset assembly is used for controlling the contact end to slide into the positioning groove again when the contact end is separated from the positioning groove. The position of the polishing solution supply arm can be kept consistent and accurate, and it is ensured that the polishing solution is accurately fed and accurately drips to the target position.
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Description

[0001] This application is a divisional case of the invention patent with application number 2024118739948 filed on December 19, 2024 and named “Liquid supply arm, chemical mechanical polishing device and equipment”. Technical Field

[0002] The embodiments of the present application relate to the field of semiconductor processing technology, and in particular to a liquid supply arm, a chemical mechanical polishing device and equipment. Background Art

[0003] Chemical mechanical polishing (CMP) is a critical process in semiconductor processing. The placement of the polishing slurry significantly impacts the quality of the polished surface. Unstable placement of the polishing slurry can cause the chemical and mechanical forces to fluctuate during the polishing process, making it difficult to ensure consistent and stable surface quality on workpieces (such as wafers). Therefore, precise control of the polishing slurry's placement is crucial.

[0004] At present, the polishing liquid supply arm in the related art is prone to cause the polishing liquid dripping position to disperse when the external environment changes or the machine vibrates, thereby affecting the accuracy of the polishing liquid landing point, and further having an adverse effect on the polishing effect of the workpiece. Summary of the Invention

[0005] In view of this, embodiments of the present application provide a liquid supply arm and a chemical mechanical polishing device to at least partially solve the above-mentioned problems.

[0006] According to the first aspect of the embodiment of the present application, a liquid supply arm is provided, which includes: a swing arm for conveying polishing liquid to the polishing pad; a rotating shaft, the swing arm is in contact with and connected to the rotating shaft and can rotate relative to the rotating shaft; a positioning mechanism, arranged on the swing arm and the rotating shaft, for controlling the swing arm to be repositioned to the working position when the swing arm deviates from the working position; the working position is the position of the swing arm relative to the rotating shaft when the swing arm conveys polishing liquid to the polishing pad; a reset assembly, connected to the swing arm, the reset assembly is formed with a contact end; a positioning piece, arranged between the rotating shaft and the swing arm and connected to the rotating shaft, the contact end of the reset assembly can slide relative to the positioning piece, the positioning piece is provided with a positioning groove, when the contact end is placed in the positioning groove, the swing arm is placed in the working position, and the reset assembly is used to control the contact end to slide back into the positioning groove when the contact end disengages from the positioning groove.

[0007] Furthermore, in the above-mentioned liquid supply arm, the reset assembly includes: a columnar body, the swing arm is provided with an embedding hole, and the columnar body is arranged in the embedding hole; an elastic member is arranged in the embedding hole; a reset body, partially placed in the embedding hole, the elastic member is placed between the columnar body and the reset body, and the part of the reset body placed outside the connecting hole forms the contact end, and when the contact end is disengaged from the positioning groove, the elastic member is in a compressed state.

[0008] Furthermore, in the above-mentioned liquid supply arm, the reset body is a sphere.

[0009] Furthermore, in the above-mentioned liquid supply arm, the reset assembly includes: a columnar body, the swing arm is provided with an embedding hole, the columnar body is arranged in the embedding hole, and the columnar body is provided with a cylindrical hole along the axial direction; a spherical body, the spherical body portion is embedded in the cylindrical hole and can rotate relative to the cylindrical hole; an elastic member, the elastic member is arranged in the cylindrical hole and one end abuts against the spherical body portion so that the spherical body portion moves axially under the action of the spring force.

[0010] Furthermore, in the above-mentioned liquid supply arm, the columnar body is provided with a columnar hole along the axial direction, and the elastic member is arranged in the columnar hole; the spherical body is partially embedded in the columnar hole and can rotate relative to the columnar hole.

[0011] Furthermore, in the above-mentioned liquid supply arm, the reset component is a ball plunger provided with a spring, and the ball head of the ball plunger is rollably provided in the positioning groove.

[0012] Furthermore, in the above-mentioned liquid supply arm, the number of the positioning groove is one; or, the number of the positioning grooves is multiple and distributed along the circumference of the positioning member.

[0013] Furthermore, in the above-mentioned liquid supply arm, the swing arm includes: a rotating body, which is rotatably arranged on the rotating shaft, and the reset assembly is arranged on the rotating body; a flange, which is connected to the side of the rotating body facing the positioning member and is slidably contacted with the positioning member; a cantilever, one end of which is connected to the rotating body and the other end is a free end.

[0014] Furthermore, in the above-mentioned liquid supply arm, the surface of the positioning member that is in contact with the flange is formed with a damping zone and a non-damping zone along the circumferential direction; when the flange is in contact and connected with the damping zone, a damping connection is formed between the positioning member and the flange; when the flange is in contact and connected with the non-damping zone, a non-damping connection is formed between the positioning member and the flange.

[0015] Furthermore, in the above-mentioned liquid supply arm, a groove and a first boss are formed on the surface of the positioning member for contacting and connecting with the flange; a second boss is formed on the surface of the flange for contacting and connecting with the positioning member; when the second boss is in contact with the groove, a non-damping connection is formed between the positioning member and the flange; when the second boss is in contact with the first boss, a damping connection is formed between the positioning member and the flange.

[0016] Furthermore, in the above-mentioned liquid supply arm, the groove is an arc-shaped groove coaxial with the positioning member, the first boss is an arc-shaped platform coaxial with the positioning member; the second boss is an arc-shaped platform coaxial with the flange, and the second boss is adapted to the shape of the arc-shaped groove and the first boss.

[0017] Furthermore, in the above-mentioned liquid supply arm, the positioning groove is placed on a side of the groove and / or the first boss away from the axis of the positioning member.

[0018] Furthermore, in the above-mentioned liquid supply arm, the circumferential length of the groove is greater than the circumferential length of the first boss.

[0019] Furthermore, in the above-mentioned liquid supply arm, the swing arm further includes: an adjusting plate, which is arranged between the rotating body and the flange and connected to the rotating body through a tightening screw, and is used to adjust the damping force between the flange and the positioning member.

[0020] Furthermore, the above-mentioned liquid supply arm also includes: a base, which is provided with a base hole, the rotating shaft is rotatably set in the base hole, and the side wall of the base is provided with a locking hole connected to the base hole; an arc nut, which is provided in the base hole and is attached to the rotating shaft along the circumference of the rotating shaft, and the arc nut is provided with a connecting hole facing the surface of the base; a locking piece, which is passed through the locking hole and connected to the connecting hole to lock the rotating shaft and the base.

[0021] Furthermore, in the above-mentioned liquid supply arm, an arc-shaped boss is formed on the surface of the arc-shaped nut close to the base, and correspondingly, an arc-shaped groove is opened on the side wall of the base hole, and the arc-shaped boss is embedded in the arc-shaped groove.

[0022] Furthermore, in the above-mentioned liquid supply arm, a grid structure is formed on the outer side of the arc-shaped nut facing the base to increase the friction between the arc-shaped nut and the side wall of the base hole.

[0023] Furthermore, in the above-mentioned liquid supply arm, a cutout is provided on the inner side surface of the arc-shaped nut toward the rotating shaft, so as to cause the arc-shaped nut to deform during the locking connection to increase the friction between the arc-shaped nut and the rotating shaft.

[0024] Furthermore, in the above-mentioned liquid supply arm, there is one connecting hole; or, there are multiple connecting holes arranged along the arc direction of the arc nut; accordingly, the base is provided with multiple locking holes corresponding one-to-one to the connecting holes.

[0025] Furthermore, in the above-mentioned liquid supply arm, there is one arc-shaped nut; or, there are multiple arc-shaped nuts that are evenly distributed along the circumference of the rotating shaft; accordingly, the base is provided with a locking hole corresponding to each of the arc-shaped nuts.

[0026] According to a second aspect of an embodiment of the present application, a chemical mechanical polishing device is provided, comprising a polishing head, a loading platform, a polishing pad disposed on the loading platform, and any one of the above-mentioned liquid supply arms.

[0027] According to a third aspect of an embodiment of the present application, there is provided an apparatus for wafer processing, the apparatus comprising the chemical mechanical polishing device described in the aforementioned aspect.

[0028] In this embodiment, during the process of the swing arm delivering polishing liquid to the polishing pad, if the swing arm deviates from its working position due to factors such as changes in the external environment or vibration of the machine, the positioning mechanism will automatically correct the swing arm and reposition it to the working position, ensuring that the position of the polishing liquid supply arm can maintain consistency and accuracy throughout the entire delivery process, ensuring the precise delivery of the polishing liquid and accurately dripping it at the target position, solving the problem of scattered and inaccurate polishing liquid dripping position caused by the shaking of the supply arm in related technologies, and improving the polishing effect of the workpiece.

[0029] It should be understood that the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] The above and other objects, features and advantages of the present application will become more apparent by describing in more detail exemplary embodiments of the present application in conjunction with the accompanying drawings, wherein the same reference numerals generally represent the same components in the exemplary embodiments of the present application.

[0031] Figure 1 This is a schematic structural diagram of the liquid supply arm proposed in an embodiment of the present application;

[0032] Figure 2 This is another structural schematic diagram of the liquid supply arm proposed in an embodiment of the present application;

[0033] Figure 3 This is another structural schematic diagram of the liquid supply arm proposed in an embodiment of the present application;

[0034] Figure 4 This is a schematic diagram of the circumferentially expanded structure of the reset assembly in the liquid supply arm proposed in an embodiment of the present application;

[0035] Figure 5 Another structure diagram of the liquid supply arm according to the embodiment of the present application;

[0036] Figure 6 Another structure diagram of the liquid supply arm according to the embodiment of the present application;

[0037] Figure 7 Another structure diagram of the liquid supply arm according to the embodiment of the present application;

[0038] Figure 8 Another structure diagram of the liquid supply arm according to the embodiment of the present application;

[0039] Figure 9 Another structure diagram of the liquid supply arm according to the embodiment of the present application;

[0040] Reference signs:

[0041] Swing arm 100; embedded hole 110; swivel body 120; flange 130; second boss 131; cantilever 140; adjusting piece 150; tightening screw 160; positioning pin 170; rotating shaft 200; positioning mechanism 300; reset assembly 310; columnar body 311; elastic member 312; reset body 313; positioning member 320; positioning groove 321; groove 322; first boss 323; base 400; base hole 410; locking hole 420; locking member 430; arc-shaped nut 440; connecting hole 441; arc-shaped boss 442; grid structure 443; cutout 444; nozzle seat 500; nozzle 510; polishing liquid supply pipe 600; cover 700; locking mechanism 800; sleeve 900. DETAILED DESCRIPTION

[0042] The preferred embodiments of the present application will be described in detail with reference to the drawings. Although the preferred embodiments of the present application are shown in the drawings, it should be understood that the present application can be implemented in various forms and should not be limited by the embodiments set forth herein. Rather, these embodiments are provided so that the present application will be thorough and complete, and will fully convey the scope of the present application to those skilled in the art.

[0043] The terms used in the present application are merely for the purpose of describing particular embodiments and are not intended to limit the present application. The singular forms "a," "an," and "the" used in the present application and the appended claims are intended to include plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms "and / or," as used herein, refer to and encompass any or all possible combinations of one or more of the associated listed items.

[0044] It should be understood that although the terms "first", "second", "third", etc. may be used in this application to describe various components, these components should not be limited to these terms. These terms are only used to distinguish components of the same type from each other. For example, without departing from the scope of this application, the first component may also be referred to as the second component, and similarly, the second component may also be referred to as the first component. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of this application, "plurality" means two or more, unless otherwise clearly and specifically defined.

[0045] In the description of this application, it should be understood that the terms "length", "width", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on this application.

[0046] Unless otherwise expressly specified or limited, terms such as "mounted," "connected," "connect," and "fixed" should be interpreted broadly. For example, they may refer to fixed or detachable connections, or integration; mechanical or electrical connections; direct or indirect connections through an intermediary; and internal communication between two components or interaction between two components. Those skilled in the art will understand the specific meanings of these terms in this application based on the specific circumstances.

[0047] When polishing a workpiece, it is typically secured to the polishing head of a polishing machine to maintain the correct position and pressure during the polishing process. A liquid supply arm delivers polishing liquid to a rotating polishing pad. As the polishing head moves, the workpiece comes into contact with the polishing pad, where it is ground and polished by the combined action of the polishing liquid and abrasive. However, in related art, when the polishing liquid supply arm is exposed to environmental fluctuations or machine vibrations, the polishing liquid can easily become scattered, affecting the accuracy of the polishing liquid's landing point and, in turn, adversely affecting the workpiece's polishing performance.

[0048] In response to the above problems, an embodiment of the present application provides a liquid supply arm to solve the problem of scattered polishing liquid droplets.

[0049] The technical solutions of the embodiments of the present application are described in detail below with reference to the accompanying drawings.

[0050] See also Figures 1 to 3 、 Figure 8According to one embodiment of the present application, a liquid supply arm includes a swing arm 100, a rotating shaft 200, and a positioning mechanism 300. The swing arm 100 is used to supply polishing liquid to the polishing pad. The swing arm 100 is in contact with and connected to the rotating shaft 200 and can rotate relative to the rotating shaft 200. The positioning mechanism 300 is disposed between the swing arm 100 and the rotating shaft 200 and is used to control the swing arm 100 to reposition to the working position when the swing arm 100 deviates from the working position. The working position is the position of the swing arm 100 relative to the rotating shaft 200 when the swing arm 100 is supplying polishing liquid to the polishing pad.

[0051] It will be appreciated that in some embodiments, the liquid supply arm may further include a base 400, a nozzle holder 500, a polishing liquid supply tube 600, a protective cover 700, a locking mechanism 800, and a sleeve 900. The base 400 defines a base hole 410, within which the rotating shaft 200 is rotatably disposed. A locking hole 420 extending through the base 400 is defined in the sidewall of the base hole 410 corresponding to the rotating shaft 200. The locking hole 420 communicates with the base hole 410, and a locking member 430 is disposed in the locking hole 420 to lock the rotating shaft 200 and the base 400. When the locking member 430 is locked, the rotating shaft 200 cannot rotate relative to the base 400. When the locking member 430 is unlocked, the rotating shaft 200 can rotate relative to the base 400.

[0052] The nozzle holder 500, the polishing liquid supply pipe 600 and the protective cover 700 are all arranged on the swing arm 100. The nozzle holder 500 is equipped with a nozzle 510, and the polishing liquid supply pipe 600 is connected to the nozzle 510. The nozzle 510 is used to transport the polishing liquid in the polishing liquid supply pipe 600 to the polishing pad. The protective cover 700 is adapted to the shape of the swing arm 100 and is arranged above the swing arm 100 (relative to the Figure 1 In a specific implementation, the rotating shaft 200 is an annular body, and the polishing liquid supply pipe 600 is disposed in the annular body and extends into the swing arm 100 to communicate with the nozzle 510 disposed on the nozzle holder 500.

[0053] The sleeve 900 is rotatably disposed on the exterior of the rotating shaft 200. The locking mechanism 800 is disposed between the swing arm 100 and the sleeve 900. The locking mechanism 800 can fixedly connect the swing arm 100 and the sleeve 900. The swing arm 100 and the sleeve 900 can rotate integrally relative to the rotating shaft 200 to adjust the position of the swing arm 100. In a specific implementation, the locking mechanism 800 can be a positioning pin, etc., and both the swing arm 100 and the sleeve 900 are provided with positioning holes. The positioning pin passes through the positioning holes on the swing arm 100 and the sleeve 900 to lock the swing arm 100 and the sleeve 900.

[0054] When the position of the swing arm 100 needs to be adjusted, the sleeve 900 can be operated to rotate relative to the rotating shaft 200, thereby driving the swing arm 100 to rotate relative to the rotating shaft 200, which is easy to operate.

[0055] The swing arm 100 is in contact with and connected to the rotating shaft 200 and can rotate relative to the rotating shaft 200. The swing arm 100 does not rotate or swing relative to the rotating shaft 200 when transporting polishing liquid to the polishing pad in the working position, but may deviate from the working position when subjected to external force, that is, the swing arm 100 rotates relative to the rotating shaft 200. At this time, the positioning mechanism 300 in this embodiment can control the swing arm 100 to return to the working position.

[0056] In this embodiment, the locking member 430 is placed in an unlocked state. At this time, the rotating shaft 200 can drive the swing arm 100 to rotate relative to the base 400, thereby adjusting the position of the swing arm 100. After the swing arm 100 is adjusted to the preset position, the locking member 430 is locked. At this time, the rotating shaft 200 is fixed relative to the base 400.

[0057] When the swing arm 100 delivers polishing liquid to the polishing pad, the position of the swing arm 100 relative to the rotating shaft 200 remains unchanged. At this time, the position of the swing arm 100 relative to the rotating shaft 200 is the working position of the swing arm 100.

[0058] In this embodiment, during the process of the swing arm 100 conveying polishing liquid to the polishing pad, if the swing arm 100 deviates from its working position due to factors such as changes in the external environment or vibration of the machine, the positioning mechanism 300 will automatically correct the swing arm 100 and reposition it to the working position, ensuring that the position of the polishing liquid supply arm can maintain consistency and accuracy throughout the entire conveying process, ensuring the precise delivery of the polishing liquid and accurately dripping it at the target position, solving the problem of scattered and inaccurate polishing liquid dripping position caused by the shaking of the supply arm in related technologies, and improving the polishing effect of the workpiece.

[0059] In some embodiments, see Figure 2 and Figure 4 The positioning mechanism 300 includes a reset assembly 310 and a positioning member 320. The reset assembly 310 is connected to the swing arm 100 and can rotate with the swing arm 100. The reset assembly 310 is formed with a contact end. The positioning member 320 is disposed between the rotating shaft 200 and the swing arm 100 and is connected to the rotating shaft 200. The positioning member 320 can rotate with the rotating shaft 200. The contact end of the reset assembly 310 can slide relative to the positioning member 320. The positioning member 320 is provided with a positioning groove 321. When the contact end of the reset assembly 310 is placed in the positioning groove 321, the swing arm 100 is placed in the working position. When the contact end of the reset assembly 310 is out of the positioning groove 321, the reset assembly 310 can control the contact end to slide back into the positioning groove 321.

[0060] In this embodiment, the swing arm 100 is positioned by the positioning groove 321. When the contact end of the reset assembly 310 is within the positioning groove 321, the swing arm 100 is in the working position, at which point the swing arm 100 supplies polishing liquid to the polishing pad. If the contact end of the swing arm 100 moves out of the positioning groove 321 due to factors such as machine vibration, the swing arm 100 will swing near its working position. At this point, the reset assembly 310 can guide the contact end back into the positioning groove 321. Through this reset process, the swing arm 100 is returned to its correct working position, ensuring accurate supply of polishing liquid and proper polishing of the workpiece.

[0061] In some embodiments, see Figure 4 The reset assembly 310 includes a columnar body 311, an elastic member 312, and a reset body 313. The swing arm 100 has an embedding hole 110, with the columnar body 311 and the elastic member 312 both disposed within the embedding hole 110. The reset body 313 is partially disposed within the embedding hole 110, with the elastic member 312 disposed between the columnar body 311 and the reset body 313. The portion of the reset body 313 disposed outside the embedding hole 110 is formed with a contact end, which is slidably disposed within a positioning groove 321. When the contact end is disengaged from the positioning groove 321, the elastic member 312 is in a compressed state. When the contact end is in the positioning groove 321, the elastic member 312 can be in a compressed state or in a free state (the elastic member 312 is unstressed and maintains its original length and shape).

[0062] In a specific implementation, the elastic member 312 may be a spring, an elastic sheet, or the like. One end of the elastic member 312 may or may not be connected to the columnar body 311, and the other end of the elastic member 312 may or may not be connected to the reset body 313. The cross-sectional shape of the columnar body 311 may be circular, elliptical, or the like, and this embodiment does not impose any restrictions on the cross-sectional shape of the columnar body. The shape of the positioning groove 321 may be adapted to the shape of the contact end, or may be a more common shape such as a V-shaped groove.

[0063] In order to reduce the friction between the positioning member 320 and avoid damage to the positioning member 320, in a specific implementation, the contact end of the reset body 313 may have a smooth surface, such as a curved surface, a spherical surface, etc.

[0064] In this embodiment, when the reset body 313 is separated from the positioning groove 321 and swings near the positioning groove 321 due to reasons such as machine vibration, since the elastic member 312 is in a compressed state at this time, when it swings to the position of the positioning groove 321, the rebound force of the elastic member 312 can bounce the reset body 313 back into the positioning groove 321, thereby quickly restoring the swing arm 100 to the working position.

[0065] Furthermore, in some embodiments, the reset body 313 is a sphere, and the reset body 313 rolls on the surface of the positioning member 320 to reduce friction between the reset body 313 and the positioning member 320 and avoid damage to the positioning member 320 during the sliding process.

[0066] In some embodiments, see Figure 4 The reset assembly 310 includes a columnar body 311, an elastic member 312, and a sphere. The swing arm 100 defines an embedding hole 110, within which the columnar body 311 is disposed. The columnar body 311 also defines an axially defined cylindrical hole, within which the elastic member 312 is disposed. The sphere is embedded in the cylindrical hole and is rotatable relative thereto. One end of the elastic member 312 abuts against the sphere, allowing the sphere to move axially under the action of the spring force. The elastic member 312 is not connected to the sphere.

[0067] In this embodiment, the reset body 313 is a sphere, thereby forming a rolling connection with the positioning member 320 to further reduce the friction between the reset body 313 and the positioning member 320 .

[0068] In some embodiments, the reset assembly 310 can be a ball plunger equipped with a spring, and the ball of the ball plunger can be rolled in the positioning groove 321. When the ball is out of the positioning groove 321, the rebound force of the spring can bounce the ball back into the positioning groove 321, thereby completing the reset action of the swing arm 100.

[0069] In some embodiments, there is only one positioning slot 321, that is, the swing arm 100 has only one fixed working position, which means that the swing arm 100 does not need to switch between multiple positions, but always remains in the same working position. This single working position design not only reduces mechanical complexity, but also improves the stability of the system and the reliability of operation.

[0070] In other embodiments, there are multiple (eg, two or more) positioning grooves 321 and the positioning grooves 321 are distributed along the circumference of the positioning member 320 .

[0071] For example, Figure 6 and Figure 7 The positioning member 320 shown in the figure has three positioning grooves 321. When the swing arm 100 drives the reset assembly 310 to rotate so that the contact end enters the positioning groove 321, the polishing liquid supply arm is in the working position.

[0072] In this embodiment, the swing arm 100 can switch between multiple preset working positions according to different work requirements, increasing the flexibility of the system to meet the polishing needs of workpieces of different sizes and shapes. In addition, the evenly distributed positioning grooves 321 ensure the stability of the swing arm 100 in each working position, further improving the precision and efficiency of the polishing process.

[0073] Understandably, see Figure 3 and Figure 5 In some embodiments, the swing arm 100 may further include: a rotating body 120, a flange 130, and a cantilever 140. The rotating body 120 can rotate relative to the rotating shaft 200, the reset assembly 310 is arranged on the rotating body 120, and the flange 130 is connected to the side of the rotating body 120 facing the positioning member and can rotate synchronously with the rotating body 120. The flange 130 is slidably connected to the positioning member 320, and the rotating body 120 can drive the flange 130 to rotate relative to the positioning member 320. One end of the cantilever 140 is connected to the rotating body 120, and the other end of the cantilever 140 is a free end. The rotating body 120 can drive the cantilever 140 to rotate relative to the rotating shaft 200. The nozzle holder 500, the polishing liquid supply pipe 600, and the protective cover 700 are all arranged on the cantilever 140.

[0074] In a specific implementation, the reset assembly 310 may be disposed on the outside of the flange 130. The flange 130 may be a wear-resistant flange made of a wear-resistant material, such as carbon steel, stainless steel, ductile iron, gray cast iron, and the like.

[0075] In some embodiments, the surface of the positioning member 320 that contacts the flange 130 is circumferentially formed with a damping region and a non-damping region. When the flange 130 contacts the damping region, a damping connection is formed between the positioning member 320 and the flange 130; when the flange 130 contacts the non-damping region, a non-damping connection is formed between the positioning member 320 and the flange 130. When the non-damping connection is formed between the positioning member 320 and the flange 130, the contact end of the reset assembly 310 is positioned within the positioning groove 321.

[0076] It should be noted that, in this embodiment, the damping area and the non-damping area refer to different areas on the surface of the positioning member 320 that are in contact with the flange 130 , and they have different functions.

[0077] When flange 130 contacts the damping area of ​​locating member 320, a damping connection is formed between the two. This connection creates a certain amount of friction or resistance between flange 130 and locating member 320 to slow or control the movement of flange 130, preventing it from accidentally moving due to vibration or other external forces during operation. The damping connection helps maintain the stable position of flange 130.

[0078] In contrast to the damping zone, the non-damping zone is another area on the positioning member 320. When the flange 130 contacts the non-damping zone, a non-damping connection is formed between them. A non-damping connection can be completely frictionless, for example, when the non-damping zone is configured as a hollow structure, or it can be relatively frictionless, for example, when the non-damping zone is configured as an area with a relatively smooth surface. In this embodiment, the non-damping zone is used to reduce the friction between the flange 130 and the positioning member 320, allowing the flange 130 to rotate freely within a certain range and to smoothly return to its original position after being subjected to external forces.

[0079] In a specific implementation, the positioning member 320 and the flange 130 can both be annular bodies, and the diameter of the positioning member 320 can be larger than the diameter of the flange 130. The flange 130 is in contact and connected with the annular area of ​​the positioning member 320 close to the axis, and the positioning groove 321 is arranged in the area close to the edge of the positioning member 320 away from the axis.

[0080] When the polishing liquid supply arm is in the working position, flange 130 contacts and connects with the non-damping area of ​​positioning member 320. At this point, swing arm 100 is fixed in position. If factors such as machine vibration cause swing arm 100 to move left or right near positioning slot 321, reset assembly 310 automatically causes the contact end to rebound into positioning slot 321. In other words, swing arm 100 automatically rebounds to the working position, ensuring that the polishing liquid's landing point does not shift. This non-damping area contact allows swing arm 100 to smoothly reset.

[0081] When the staff repairs or maintains the swing arm 100, the staff can push the swing arm 100 to swing to the damping area, and the flange 130 is in contact with the damping area of ​​the positioning part 320. At this time, due to the existence of the damping force, the swing arm 100 can stay in any position without affecting the operator, thereby avoiding the polishing liquid supply arm from swinging freely and affecting the normal operation of the operator.

[0082] Further, see Figure 6 and Figure 7 In some embodiments, the surface of the positioning member 320 that is in contact with the flange 130 is formed with a groove 322 and a first boss 323; the surface of the flange 130 that is in contact with the positioning member 320 is formed with a second boss 131. When the second boss 131 is in contact with the groove 322, a non-damping connection is formed between the positioning member 320 and the flange 130, such as Figure 6 When the second boss 131 is in contact with the first boss 323, a damping connection is formed between the positioning member 320 and the flange 130, as shown; Figure 7 shown.

[0083] In one specific implementation, the groove 322 can be an arcuate groove coaxial with the positioning member 320, and the first boss 323 can be an arcuate platform coaxial with the positioning member 320. The second boss 131 can be an arcuate platform coaxial with the flange 130, and the second boss 131 is shaped to match the arcuate groove and the first boss 323. The positioning groove 321 is located on the side of the groove 322 and / or the first boss 323 away from the axis of the positioning member 320. When the second boss 131 is in contact with the groove 322, the contact end of the reset body 313 is positioned within the positioning groove 321.

[0084] In a specific implementation, the number of grooves 322 and first bosses 323 can be determined according to actual conditions. For example, there can be two of each and they can be arranged alternately. Of course, more than two can also be provided, and this embodiment does not impose any restrictions on this. The number of second bosses 131 should be compatible with the number of grooves 322 and first bosses 323.

[0085] In this embodiment, the positioning member 320 is formed with a groove 322 and a first boss 323 , which intermittently overlaps with the flange 130 to control the area where the damping force is generated between the flange 130 and the positioning member 320 .

[0086] Furthermore, in some embodiments, the circumferential length of the groove 322 is greater than the circumferential length of the first boss 323, so that when the swing arm 100 is working, when the swing arm 100 is swung and reset by external force, the second boss 131 is always within the range of the groove 322 (non-damping contact) and will not swing into the range of the first boss 323 (damping contact), so as to avoid the second boss 131 reaching the first boss 323 and preventing the reset assembly 310 from resetting to the working position due to the existence of the damping force.

[0087] See also Figure 5 and Figure 8 In some embodiments, the swing arm 100 further includes an adjustment plate 150 . The adjustment plate 150 is disposed between the rotating body 120 and the flange 130 and connected to the rotating body 120 via a tightening screw 160 , and is used to adjust the damping force between the flange 130 and the positioning member 320 .

[0088] For specific implementation, see Figure 8 The flange 130 and the adjusting piece 150 can be kept relatively fixed in radial position with the swing arm 100 through the positioning pin 170, and the swing arm 100 can drive the flange 130 and the adjusting piece 150 to rotate.

[0089] In the embodiment, the positioning member 320 is fixedly connected with the rotating shaft 200, the flange 130 is fixedly connected with the rotating body 120, and the damping force between the flange 130 and the positioning member 320 can be adjusted by adjusting the screw-in depth of the tightening screw 160, moving the adjusting piece 150 along the axial direction of the flange 130, adjusting the contact pressure between the flange 130 and the positioning member 320, and then changing the damping force between the flange 130 and the positioning member 320.

[0090] In some embodiments, referring to Figure 2 、 Figure 3 and Figure 9 , the arc-shaped nut 440 is further included. The arc-shaped nut 440 is arranged in the base hole 410 and attached to the rotating shaft 200 along the circumferential direction of the rotating shaft 200, and the arc-shaped nut 440 is provided with a connecting hole 441 on the surface thereof facing the base 400. The locking member 430 is connected to the connecting hole 441 on the arc-shaped nut 440 through the locking hole 420, so as to lock the rotating shaft 200 and the base 400.

[0091] In a specific implementation, the arc-shaped nut 440 can be coaxially arranged with the rotating shaft 200, and the locking member 430 can be a screw or the like. In the embodiment, the locking member 430 can be connected to the connecting hole 441 on the arc-shaped nut 440 through the locking hole 420, so as to realize the locking and unlocking functions of the base 400 and the rotating shaft 200, and facilitate the multi-angle adjustment of the landing point. Since the arc-shaped nut 440 is arc-shaped, the contact between the arc-shaped nut 440 and the rotating shaft 200 is surface contact, which increases the friction force compared with the point contact in the related art, and the locking force is large, so that the base 400 and the positioned rotating shaft 200 are fixed firmly and reliably, and are not deviated to cause inaccuracy of the landing point position, effectively avoiding the misalignment of the rotating shaft 200 relative to the base 400 in the locking process, and then affecting the landing point.

[0092] In some embodiments, the arc-shaped nut 440 is provided with one connecting hole 441, and the base 400 is provided with one locking hole 420 corresponding to the arc-shaped nut 440.

[0093] In other embodiments, each arc-shaped nut 440 is provided with a plurality of (for example, two or more) connecting holes 441, and the plurality of connecting holes 441 are uniformly distributed along the arc direction of the arc-shaped nut 440. Correspondingly, referring to Figure 3 , the base 400 is provided with a plurality of locking holes 420 corresponding to the connecting holes 441 one by one, and the base 400 and the rotating shaft 200 can be locked and fixed by the plurality of locking members 430.

[0094] In the embodiment, the uniformly distributed connecting holes 441 provide multiple locking points, increase the connection stability between the arc-shaped nut 440 and the base 400, effectively disperse the stress of the connecting points, and reduce the burden of a single connecting point. The uniformly distributed connecting holes 441 also help balance the load, especially when the arc-shaped nut 440 bears a rotating or vibrating load, the connecting manner can reduce deformation or wear caused by uneven load. In addition, the multiple connecting holes 441 also facilitate maintenance and replacement, when a certain connecting hole 441 is worn or damaged, it can be fixed through other connecting holes 441 without the need to completely replace the entire arc-shaped nut 440, thereby reducing maintenance costs and downtime.

[0095] In some embodiments, a plurality of (for example, two or more) arc-shaped nuts 440 can also be provided, and each arc-shaped nut 440 is uniformly distributed along the circumference of the rotating shaft 200; accordingly, the base 400 is provided with locking holes 420 corresponding to each arc-shaped nut 440, and the uniformly distributed multiple locking points can effectively prevent the rotating shaft 200 from rotating relative to the base 400, and ensure the positional accuracy of the rotating shaft 200 during operation.

[0096] Further, in some embodiments, the arc-shaped nut 440 is formed with an arc-shaped boss 442 near the surface of the base 400, and accordingly, the sidewall of the base hole 410 is provided with an arc-shaped groove, and the arc-shaped boss 442 is embedded in the arc-shaped groove to fix the arc-shaped nut 440.

[0097] In some embodiments, the arc-shaped nut 440 is formed with a grid structure 443 on the outer side surface thereof toward the base 400, that is, the outer side surface of the arc-shaped nut 440 is provided with a grid texture treatment to further increase the friction between the arc-shaped nut 440 and the sidewall of the base hole 410.

[0098] In some embodiments, the arc-shaped nut 440 is provided with a cutout 444 on the inner side surface thereof toward the rotating shaft 200, which is used to deform the arc-shaped nut 440 to increase the friction between the arc-shaped nut 440 and the rotating shaft 200 when locked and connected.

[0099] In specific implementation, the cutout 444 can be one or more, and when the cutout 444 is more than one, the cutouts 444 can be distributed along the arc direction of the arc-shaped nut 440.

[0100] When the locking member 430 (for example, a screw) tightens the arc-shaped nut 440, the arc-shaped nut 440 is deformed to better fit the rotating shaft 200 and increase the friction.

[0101] The embodiments of the present application also provide a chemical mechanical polishing device, which comprises a polishing head, a loading table, a polishing pad arranged on the loading table, and any one of the liquid supply arms.

[0102] Among them, the specific implementation process of the liquid supply arm can be found in the above description, and this application will not go into details here.

[0103] The present application also provides an apparatus for wafer processing, comprising the aforementioned chemical mechanical polishing apparatus. For example, the apparatus is a wafer processing integrated thinning and polishing apparatus, which may include the aforementioned chemical mechanical polishing apparatus and a wafer thinning apparatus. During the processing, the wafer may first be thinned by the thinning apparatus on the back side, and then polished by the chemical mechanical polishing apparatus on the surface to remove surface stress.

[0104] In this embodiment, during the process of the swing arm 100 conveying polishing liquid to the polishing pad, if the swing arm 100 deviates from its working position due to factors such as changes in the external environment or vibration of the machine, the positioning mechanism 300 will automatically correct the swing arm 100 and reposition it to the working position, ensuring that the position of the polishing liquid supply arm can maintain consistency and accuracy throughout the entire conveying process, ensuring the precise delivery of the polishing liquid and accurately dripping it at the target position, solving the problem of scattered and inaccurate polishing liquid dripping position caused by the shaking of the supply arm in related technologies, and improving the polishing effect of the workpiece.

[0105] Obviously, those skilled in the art may make various changes and modifications to this application without departing from the spirit and scope of this application. Thus, if these modifications and variations of this application fall within the scope of the claims of this application and their equivalents, this application is intended to include these modifications and variations.

Claims

1. A liquid supply arm, characterized in that: include: shaft; a swing arm for delivering polishing liquid to the polishing pad, comprising: a rotating body rotatably disposed on the rotating shaft, a flange connected to the rotating body and rotating synchronously with the rotating body, and a cantilever having one end connected to the rotating body; a positioning mechanism for controlling the swing arm to reposition to the working position when the swing arm deviates from the working position during the process of the swing arm conveying polishing liquid to the polishing pad, so as to concentrate the landing point of the polishing liquid on the polishing pad; the working position is the position of the swing arm relative to the rotating shaft when the swing arm conveys polishing liquid to the polishing pad; the positioning mechanism comprises: a positioning member, which is configured as an annular plate and is disposed between the rotating shaft and the swing arm; the positioning member is connected to the rotating shaft and is slidably connected to the flange; a surface of the positioning member in contact with the flange is circumferentially formed with a damping area and a non-damping area; the positioning member is provided with a positioning groove; a reset assembly, disposed on the rotating body, the reset assembly being formed with a contact end exposed from the swing arm, the contact end being slidably disposed in the positioning groove; The non-damping area is used to reduce the friction between the flange and the positioning member, so that the swing arm can be reset under the action of the reset assembly; when the flange is in contact with the non-damping area, a non-damping connection is formed between the positioning member and the flange, and the contact end is placed in the positioning groove, and the swing arm is placed in the working position; the reset assembly is used to control the contact end to slide back into the positioning groove when the contact end is out of the positioning groove.

2. The liquid supply arm according to claim 1, characterized in that: The positioning groove is configured as a V-shaped groove.

3. The liquid supply arm according to claim 1, characterized in that: The contact end has a smooth surface, and the smooth surface is an arc surface or a spherical surface.

4. The liquid supply arm according to claim 1, characterized in that: The reset component includes: A columnar body, wherein the swing arm is provided with an embedding hole, and the columnar body is disposed in the embedding hole; an elastic member, disposed in the embedding hole; The reset body is partially placed in the embedding hole, the elastic member is placed between the columnar body and the reset body, and the part of the reset body placed outside the embedding hole is formed with the contact end. When the contact end is separated from the positioning groove, the elastic member is in a compressed state.

5. The liquid supply arm according to claim 1, characterized in that: The reset component includes: A cylindrical body, wherein the swing arm is provided with an embedding hole, the cylindrical body is arranged in the embedding hole, and the cylindrical body is provided with a cylindrical hole along the axial direction; a sphere, the sphere being partially embedded in the cylindrical hole and rotatable relative to the cylindrical hole; An elastic member is disposed in the cylindrical hole and has one end abutting against the spherical portion so that the spherical portion moves axially under the action of a spring force.

6. The liquid supply arm according to claim 1, characterized in that: The surface of the positioning member used for contacting and connecting with the flange is formed with a groove and a first boss; A second boss is formed on the surface of the flange used for contacting and connecting with the positioning member; When the second boss is in contact with the groove, a non-damping connection is formed between the positioning member and the flange; When the second boss is in contact with and connected to the first boss, a damping connection is formed between the positioning member and the flange.

7. The liquid supply arm according to claim 6, characterized in that: The groove is an arc-shaped groove coaxial with the positioning member, and the first boss is an arc-shaped boss coaxial with the positioning member; The second boss is an arc-shaped boss coaxial with the flange, and the second boss is adapted to the shape of the arc-shaped groove and the first boss.

8. The liquid supply arm according to claim 6, characterized in that: The positioning groove is placed on a side of the groove and / or the first boss away from the axis of the positioning member, and the circumferential length of the groove is greater than the circumferential length of the first boss.

9. A chemical mechanical polishing device, characterized in that: The invention comprises a polishing head, a loading platform, a polishing pad arranged on the loading platform, and a liquid supply arm according to any one of claims 1 to 8.

10. A device for wafer processing, characterized in that: The apparatus comprises the chemical mechanical polishing device according to claim 9.